JP2007031737A - Film forming apparatus and film forming method - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a film forming method by AD method and a film forming apparatus capable of forming a structure having a uniform film quality by controlling the aerosol speed.
SOLUTION: A film forming apparatus includes a container in which raw material powder is disposed, and an aerosol generation unit 1 to 4 that generates aerosol by supplying gas into the container to disperse the raw material powder, and a substrate Acquires information regarding the deposition chamber 8 to be disposed, the spray nozzle 11 disposed in the deposition chamber and spraying the aerosol generated by the aerosol generation unit toward the substrate, and the velocity of the aerosol sprayed from the spray nozzle Based on the information acquired by the pressure gauges 6 and 13, the gas supply adjusting units 7 a and 7 b that adjust the velocity of the aerosol injected from the injection nozzle, the vacuum valve 10, and the pressure gauges 6 and 13 And supply control units 7a and 7b, or a feedback control unit 14 that performs feedback control of the vacuum valve 10.
[Selection] Figure 1

Description

  The present invention relates to a film forming method and a film forming apparatus using an aerosol deposition method in which raw material powder is sprayed onto a substrate to deposit the raw material powder on the substrate.

  In recent years, in the field of micro electrical mechanical systems (MEMS), electrons that exhibit a predetermined function by applying voltage, such as dielectrics, piezoelectrics, magnetics, pyroelectrics, and semiconductors. Research for manufacturing elements including functional materials such as ceramics by using a film forming technique is actively underway.

  For example, in order to enable high-definition and high-quality printing in an inkjet printer, it is necessary to make the ink nozzles of the inkjet head fine and highly integrated. Therefore, miniaturization and high integration are also required for the piezoelectric actuator that drives each ink nozzle. In such a case, a film forming technique capable of forming a layer thinner than the bulk material and capable of forming a fine pattern is advantageous.

  Recently, an aerosol deposition method (hereinafter referred to as “AD method”), which is known as a film forming technique for ceramics and metals, has attracted attention as one of film forming techniques. The AD method is a film forming method in which a raw material powder (raw material powder) is made into an aerosol state and sprayed from a nozzle toward the substrate to deposit the raw material on the substrate. Here, the aerosol refers to solid or liquid fine particles suspended in a gas. The AD method is also called a jet deposition method or a gas deposition method.

  In the AD method, a raw material powder is crushed by colliding with a substrate or a structure formed earlier, and a film is formed by a mechanism in which fine particles of the raw material powder are bonded to each other on an active new surface generated at that time. . This film forming mechanism is called mechanochemical reaction. According to such an AD method, a dense and strong film can be formed. Therefore, it is expected to improve the performance of a device to which various functional films are applied.

  As a related technique, Patent Document 1 discloses a gas deposition method in which an aerosol containing ceramic fine particles is sprayed onto a substrate at a high speed to form a ceramic structure. In order to generate aerosol and adjust the deposition height of the ceramic structure, a ceramic structure manufacturing apparatus is disclosed in which the amount of ceramic fine particles in the aerosol is sensed by a sensor and a signal output from the sensor is fed back. .

  In Patent Document 2, in the gas deposition method in which ultrafine particles are aerosolized and sprayed onto a substrate together with a carrier gas to form a thin film, a part of the aerosolized ultrafine particles is introduced into a particle measuring device to measure particles. There is disclosed an ultrafine particle film forming apparatus that measures either or both of the particle size distribution and particle concentration of ultrafine particles and controls either or both of the flow rate of carrier gas and heating energy.

In order to form a dense and high-quality film by the AD method, depending on the composition of the raw material powder, the composition of the substrate material, film formation temperature, aerosol concentration, injection pressure, etc. It is necessary to satisfy the film conditions. For example, when the collision energy when the raw material powder collides with the substrate is small, the raw material powder is not crushed, and a dense film cannot be formed by mechanochemical reaction. On the other hand, when the collision energy is too large, when the raw material powder collides with the previously formed film, the film is scraped (blasted), which results in hindering the film formation. Furthermore, if the film forming conditions are not stable, the film quality and film thickness become non-uniform. Therefore, in Patent Document 1 described above, in order to adjust the deposition height of the structure, the concentration of ceramic particles (raw material powder) in the aerosol is measured and feedback controlled to stabilize the aerosol concentration. ing. In Patent Document 2, control is performed to make the particle size of the aerosol fine particles uniform and stabilize the concentration.
JP 2001-348659 A (first page, FIG. 1) Japanese Patent Laid-Open No. 2003-313656 (first page, FIG. 1)

However, conventionally, there has been no viewpoint of controlling the velocity of aerosol particles. Here, the kinetic energy of the injected aerosol particles is used as the collision energy of the aerosol particles. This kinetic energy K is expressed by K = (1/2) mv ² using the mass m and velocity v of the aerosol particles. As is apparent from this equation, the kinetic energy K is proportional to the square of the velocity, so that even a slight change in the velocity of the aerosol particles leads to a large impact energy change. That is, when the aerosol velocity is not stable, a low quality film with unstable film quality and film thickness is formed.

  Therefore, in view of the above points, the present invention provides a film formation method by AD method capable of forming a structure having uniform film quality by controlling the velocity of aerosol, and such a film formation method. An object is to provide a film forming apparatus to be used.

  In order to solve the above problems, a film forming apparatus according to the present invention is a film forming apparatus using an aerosol deposition method in which raw material powder is sprayed on a substrate to deposit the raw material powder on the substrate. An aerosol generating means for generating an aerosol by supplying a gas into the container to disperse the raw material powder, a film forming chamber in which the substrate is disposed, and a film forming chamber. , An injection nozzle for injecting the aerosol generated by the aerosol generation means toward the substrate, a speed information acquisition means for acquiring information on the velocity of the aerosol injected from the injection nozzle, and the velocity of the aerosol injected from the injection nozzle Aerosol speed adjusting means for adjusting the speed, and control means for feedback controlling the speed adjusting means based on the information acquired by the speed information acquiring means Comprising a.

  Further, the film forming method according to the present invention is a film forming method by an aerosol deposition method in which the raw material powder is sprayed on the substrate to deposit the raw material powder on the substrate, and the raw material powder disposed in the container is A step (a) of generating an aerosol by supplying and dispersing a gas in a container, and an aerosol generated in step (a) is sprayed from a spray nozzle disposed in a film forming chamber toward a substrate. Step (b) for depositing raw material powder on the substrate, step (c) for acquiring information on the velocity of the aerosol injected from the injection nozzle in step (b), and information acquired in step (c) And (d) performing feedback control of the velocity of the aerosol ejected from the ejection nozzle based on the above.

  According to the present invention, information on the velocity of the aerosol ejected from the ejection nozzle is acquired, and each part is feedback-controlled based on the information, so that the aerosol velocity can always be stabilized. Therefore, a high-quality structure having a uniform film quality and film thickness can be manufactured.

Hereinafter, the best mode for carrying out the present invention will be described in detail with reference to the drawings. The same constituent elements are denoted by the same reference numerals, and the description thereof is omitted.
FIG. 1 is a schematic diagram showing a configuration of a film forming apparatus according to the first embodiment of the present invention. As shown in FIG. 1, the film forming apparatus according to the present embodiment includes an aerosol generation chamber 1, a vibration table 2, a hoisting gas nozzle 3, an pressure generating gas nozzle 4, an aerosol generating unit, an aerosol transport pipe 5, 1 a pressure gauge (vacuum gauge) 6, gas supply control parts 7 a and 7 b, a film forming chamber 8, an injection nozzle 11, a film forming part including a substrate stage 12, an exhaust pipe 9, a vacuum valve 10, A second pressure gauge (vacuum gauge) 13 and a feedback control unit 14 are included.

The aerosol generation chamber 1 is a container in which the raw material powder 15 is disposed, and aerosol is generated here. The aerosol generation chamber 1 is installed on a vibration table 2 that vibrates at a predetermined frequency in order to stir the raw material powder 15.
The winding gas nozzle 3 generates a cyclone flow by introducing the carrier gas supplied from an external gas cylinder into the aerosol generation chamber 1. Thereby, the raw material powder 15 arrange | positioned in the aerosol production | generation chamber 1 is wound up and disperse | distributed, and an aerosol is produced | generated.

On the other hand, the pressure adjusting gas nozzle 4 adjusts the gas pressure in the aerosol generating chamber 1 by introducing the carrier gas supplied from the external gas cylinder into the aerosol generating chamber 1. By controlling the pressure in the aerosol generation chamber 1 in this way, the speed of the air flow (winding gas) generated in the aerosol generation chamber 1 is controlled.
Examples of the carrier gas supplied by the hoisting gas nozzle 3 and the pressure adjusting gas nozzle 4 include oxygen (O ₂ ), nitrogen (N ₂ ), helium (He), argon (Ar), a mixed gas thereof, or dry air. Etc. are used.

The aerosol transport pipe 5 transports the aerosol generated in the aerosol generation chamber 1 to the nozzle 11 disposed in the film forming chamber 8.
The first pressure gauge 6 measures the pressure in the aerosol generation chamber 1 and outputs a voltage signal representing the measurement result to the feedback control unit 14. The first pressure gauge 6 includes a U-tube manometer, McLeod vacuum gauge, Bourdon vacuum gauge, diaphragm vacuum gauge, Pirani vacuum gauge, thermocouple vacuum gauge, thermistor vacuum gauge, ionization vacuum gauge, BA type vacuum gauge, alpha An appropriate one selected from the TRON vacuum gauge, the Penning vacuum gauge, the magnetron vacuum gauge, the Knudsen vacuum gauge, the viscosity vacuum gauge, etc. according to the pressure in the aerosol generation chamber 1 is used. The method of the pressure gauge 6 is not particularly limited, but it is desirable to use a Pirani vacuum gauge from the viewpoints of ease, ease of electrical control, wide measurement range, and the like.

  The gas supply adjusting units 7 a and 7 b adjust the flow rate of the carrier gas supplied to the aerosol generation chamber 1 via the pressure adjusting gas nozzle 4 and the hoisting gas nozzle 3. The operations of the gas supply adjusting units 7a and 7b are controlled by the feedback control unit 14. As the gas supply control units 7a and 7b, a normal flow meter can be used, but it is preferable to use a gas flow controller such as a mass flow controller that can handle electromagnetic control.

  The inside of the film forming chamber 8 is evacuated by an evacuation pump connected to an evacuation pipe 9, thereby maintaining a predetermined degree of vacuum. The vacuum valve 10 adjusts the pressure in the film forming chamber 8 by opening and closing the valve under the control of the feedback control unit 14. As the vacuum valve 10, an L-shaped valve, a straight valve, a butterfly valve, a gate valve, or the like can be used. Here, the butterfly valve is a valve that adjusts the degree of opening and closing of the valve by changing the angle of the butterfly. As in the present embodiment, when the control is performed by the feedback control unit 14, it is preferable to use an electromagnetically operated valve such as a butterfly valve.

The injection nozzle 11 has an opening having a predetermined shape and size, and injects the aerosol supplied from the aerosol generation chamber 1 via the aerosol transport pipe 5 toward the substrate 16 at a high speed.
The substrate stage 12 on which the substrate 16 is placed is a three-dimensionally movable stage for controlling the relative position and relative speed between the substrate 16 and the nozzle 11. By adjusting this relative speed, the thickness of the film formed per reciprocation can be controlled.

  The second pressure gauge 13 measures the pressure in the film forming chamber 8 and outputs a voltage signal representing the measurement result to the feedback control unit 14. As with the first pressure gauge 6, the second pressure gauge 13 is also used by selecting an appropriate one according to the pressure from vacuum gauges using various methods.

  The feedback control unit 14 constantly monitors the output signal from the first pressure gauge 6 and the output signal from the second pressure gauge 13, and when a change occurs in the output signal, the gas supply adjusting units 7a, 7b, Alternatively, by controlling the vacuum valve 10, the flow rate of the carrier gas, the pressure in the aerosol generation chamber 1, the pressure in the film forming chamber 8, and the like are adjusted. For example, when the capacity of the vacuum pump decreases and the pressure in the film forming chamber 8 increases, the feedback control unit 14 opens the vacuum valve 10 to decrease the pressure in the film forming chamber 8. Accordingly, the aerosol velocity is maintained within a predetermined range by feedback control of the pressure in the aerosol generation chamber 1 and the pressure in the film forming chamber 8 or the difference between the pressures. Note that the feedback control unit 14 may control at least one of the gas supply adjusting units 7 a and 7 b and the vacuum valve 10.

  In such a film forming apparatus, the raw material powder 15 is disposed in the aerosol generating chamber 1 and the substrate 16 is set on the substrate stage 12 and kept at a predetermined film forming temperature. Further, the pressure in the aerosol generation chamber 1 and the pressure in the film forming chamber 8 are set to predetermined values. Due to these pressure differences, the aerosol generated in the aerosol generation chamber 1 is sucked to the film forming chamber 8 side through the aerosol transport pipe 5 and is sprayed from the spray nozzle 11. A film is formed by a mechanochemical reaction in a region on the substrate 16 to which the aerosol is sprayed. In the meantime, the feedback control unit 14 performs feedback control of each part, so that the pressure difference between the aerosol generation chamber 1 and the film forming chamber 8 is kept constant, so that the aerosol can be continuously injected at a stable speed. it can.

  As an example, an experiment was performed in which a film having a thickness of 20 μm was formed on a substrate using the film forming apparatus shown in FIG. 1 under the following film forming conditions. In this embodiment, as the pressure gauges 6 and 13 shown in FIG. 1, G-TRAN Pirani gauge manufactured by ULVAC, Inc. is used, and as the gas supply control unit 7b, manufactured by Nippon KS Corporation. The gas supply system Mass-Flo was used, and the vacuum valve 10 was a butterfly valve BV-N series manufactured by Fuji Technology Co., Ltd.). The control for maintaining the aerosol velocity was performed by adjusting the flow rate of the hoisting gas nozzle 3 to control the pressure in the aerosol generation chamber 1. That is, when the pressure in the aerosol generation chamber 1 is reduced, the flow rate of the carrier gas is increased. When the pressure in the aerosol generation chamber 1 is increased, the flow rate of the carrier gas is decreased, thereby reducing the flow rate of the carrier gas. The pressure inside was kept constant.

Film formation conditions Raw material powder: PZT (lead zirconate titanate) particles, 40 g
Substrate: YSZ (yttrium stabilized zirconia)
Substrate temperature: 600 ° C
Winding gas flow rate: 4.75 liters / minute Pressure adjusting gas flow rate: 3.5 liters / minute Aerosol generation chamber pressure: 93 kPa
Deposition chamber pressure: 80 Pa

As a comparative example, an experiment was performed in which a similar film was formed in the film forming apparatus shown in FIG. 1 without performing feedback control of the aerosol velocity. The film forming conditions were set in the same manner as in the example.
Furthermore, the film quality was evaluated by measuring the Vickers hardness of the four PZT films obtained by the examples and the four PZT films obtained by the comparative examples. In addition, Vickers hardness was calculated | required by measuring 10 times by applying a load 10g in the micro hardness tester DUH-W201 by Shimadzu Corporation, and calculating | requiring the average of those values.

As a result, the following results were obtained.
Deposition chamber Aerosol generation chamber Vickers hardness Example (1-1) 80 Pa 93 kPa 600
〃 (1-2) 80Pa 93kPa 590
〃 (1-3) 80Pa 93kPa 580
〃 (1-4) 80 Pa 93 kPa 620
Comparative Example (1-1) 80 Pa 93 kPa 590
〃 (1-2) 80Pa 90kPa 560
〃 (1-3) 80Pa 88kPa 480
〃 (1-4) 80Pa 87kPa 500

  As described above, as a result of performing feedback control on the example, it was possible to obtain a substantially stable pressure in the film formation chamber and the aerosol generation chamber. Therefore, it is considered that the aerosol velocity determined mainly by the pressure difference was also stable. On the other hand, in the comparative example, the pressure in the film forming chamber was stable at about 80 Pa, but the pressure in the aerosol generation chamber gradually decreased from 93 kPa to 87 kPa. Therefore, it is considered that the aerosol velocity was constantly changing.

  Moreover, about the Vickers hardness of the formed film | membrane, the clear difference appeared between the Example and the comparative example. That is, the variation range of the Vickers hardness in the example is within 40, whereas the variation range of the Vickers hardness in the comparative example is as large as 110. From this result, it was confirmed that variation in film quality can be suppressed by performing feedback control.

  As described above, according to the present embodiment, feedback control is performed so as to maintain the difference between the pressure in the aerosol generation chamber and the pressure in the film forming chamber, which are factors for determining the aerosol velocity, in a predetermined range, A structure with uniform film quality can be formed.

Next, a film forming apparatus according to a second embodiment of the present invention will be described with reference to FIG.
As shown in FIG. 2, the film forming apparatus according to the present embodiment includes a speed gauge (speed measuring device) 20, instead of the first pressure gauge 6, the second pressure gauge 13, and the feedback control unit 14 shown in FIG. 1. A feedback control unit 21 is included. Other configurations are the same as those in the film forming apparatus shown in FIG.

  The velocity gauge 20 measures the velocity of the aerosol ejected from the ejection nozzle 11 and outputs information related to the aerosol velocity to the feedback control unit 21. As the velocity gauge 20, a measuring device using a measuring method such as an ultrasonic Doppler measuring method, a microwave Doppler method, a laser Doppler method, a high speed camera system, or the like can be used. Specifically, ultrasonic gas flowmeter MGF-10 (ultrasonic Doppler velocimeter) manufactured by Tokimec Co., Ltd., Smart LDV system or 2D-FDV system (Laser Doppler velocimeter) manufactured by Nippon Kanomax Co., Ltd., Nippon Kanomax A high-speed camera system capable of recognizing the position of particles can be used, such as the Flow Master PIV (Visualized Image Velocity Measurement System) series of La Vision, Inc. . Among these, since it may be difficult to measure with ultrasound in an environment where aerosol is injected into a vacuum, a high-speed camera system, a laser Doppler velocimeter, or a microwave Doppler velocimeter is required. It is relatively desirable to use. In particular, it is desirable to use a high-speed camera system because the configuration of the optical system is easy and the speed measurement range is wide.

  If necessary, an appropriate window may be provided in the film forming chamber 8 or an optical system may be installed in the film forming chamber 8. In that case, in order to prevent contamination by the raw material powder not used for film formation, it is desirable to provide a mechanism for attaching a wiper to the window or for blowing the raw material powder attached to the window or the optical system with air.

  The feedback control unit 21 constantly monitors information on the aerosol velocity output from the velocity gauge 20, and when a change occurs in the aerosol velocity, the pressure in the aerosol generation chamber 1 and the pressure in the film forming chamber 8. Alternatively, at least one of the gas supply adjusting units 7a and 7b and the vacuum valve 10 is controlled so that the pressure difference is maintained within a predetermined range. For example, when the aerosol speed is slower than a desired speed, the flow rate of the carrier gas supplied via the hoisting gas nozzle 3 or the pressure adjusting gas nozzle 4 is increased to increase the pressure in the aerosol generating chamber 1, or the vacuum valve 10 Is opened to lower the pressure in the film forming chamber 8, thereby increasing the pressure difference. In this way, it is possible to stabilize the aerosol velocity that fluctuates according to the pressure difference.

  As an example, an experiment was performed to form a 20 μm film on a substrate under the following film forming conditions using the film forming apparatus shown in FIG. In this embodiment, a flow master PIV system is used as the speed gauge 20 shown in FIG. 2, and a control system is constructed so that speed information is input from the information processing device (PC) included in this system to the feedback control unit 21. did. As the velocity information, the aerosol velocity immediately after being ejected from the ejection nozzle 11 in the velocity distribution indicated by the two-dimensional image was used. Furthermore, in the present embodiment, Mass-Flo, which is a gas supply system manufactured by Nippon KS Co., Ltd., is used as the gas supply adjusting unit 7b, and control for maintaining the aerosol velocity is performed by the hoisting gas nozzle 3. This was done by adjusting only the flow rate. That is, the carrier gas flow rate was increased when the aerosol velocity decreased, and the carrier gas flow rate was decreased when the aerosol velocity increased.

Film formation conditions Raw material powder: PZT (lead zirconate titanate) particles, 40 g
Substrate: YSZ (yttrium stabilized zirconia)
Substrate temperature: 600 ° C

As a comparative example, an experiment was performed in which a similar film was formed in the film forming apparatus shown in FIG. 2 without performing feedback control of the aerosol velocity. The film forming conditions were set in the same manner as in the example.
Furthermore, the film quality was evaluated by measuring the Vickers hardness of the four PZT films obtained by the examples and the four PZT films obtained by the comparative examples. As a result, the following results were obtained.
Aerosol speed Vickers hardness Example (2-1) 150 m / s 580
〃 (2-2) 150m / s 610
〃 (2-3) 150m / s 600
〃 (2-4) 150m / s 590
Comparative Example (2-1) 150 m / s 590
〃 (2-2) 140m / s 530
〃 (2-3) 130m / s 510
〃 (2-4) 130m / s 480

As is clear from the above results, in the examples, an almost constant aerosol velocity was obtained, and the film quality of the PZT film was almost uniform. On the other hand, in the comparative example, the aerosol velocity gradually decreased, and the film quality of the formed PZT film was greatly changed accordingly.
As described above, according to the present embodiment, it is possible to form a film with stable quality by feedback control of the aerosol velocity that directly affects the film quality.

  In the first and second embodiments of the present invention described above, in order to form a structure having a uniform film quality, each part is feedback controlled so as to maintain the aerosol velocity constant. However, each part may be feedback controlled so as to change the aerosol velocity according to the purpose. For example, in the case of changing the film quality from a dense film to a porous film in an inclined manner, the aerosol velocity is gradually decreased from a high speed to a low speed. Further, in order to improve the adhesion between the film and the substrate, the aerosol speed immediately after the start of film formation is increased. On the other hand, when the film is easily peeled off from the substrate, a porous film is formed by lowering the aerosol speed immediately after the start of film formation, and then the aerosol speed is recovered to a predetermined value to obtain a dense film. A thick film is formed.

  In addition to the carrier gas flow rate and the aerosol generation chamber pressure described in the first and second embodiments, other factors such as the chamber pressure and the substrate temperature may be feedback controlled. For example, when the deposition rate is reduced, the aerosol is more likely to reach the substrate by reducing the temperature difference between the carrier gas and the substrate (or the temperature gradient of the atmosphere around the substrate) by lowering the substrate temperature. As a result, the deposition rate can be improved.

  The present invention can be used in a film forming method and a film forming apparatus using an aerosol deposition method in which raw material powder is sprayed onto a substrate to deposit the raw material powder on the substrate.

It is a schematic diagram which shows the structure of the film-forming apparatus which concerns on the 1st Embodiment of this invention. It is a schematic diagram which shows the structure of the film-forming apparatus which concerns on the 2nd Embodiment of this invention.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 Aerosol production | generation chamber 2 Shaking table 3 Hoisting gas nozzle 4 Pressure adjustment gas nozzle 5 Aerosol conveyance pipes 6 and 13 Pressure gauges 7a and 7b Gas supply control part 8 Film formation chamber 9 Exhaust pipe 10 Vacuum valve 11 Injection nozzle 12 Substrate stage 14 and 21 Feedback Control unit 15 Raw material powder 16 Substrate 20 Speed gauge

Claims (14)

A film forming apparatus using an aerosol deposition method in which raw material powder is sprayed onto a substrate to deposit the raw material powder on the substrate,
An aerosol generating means for generating an aerosol by supplying a gas into the container to disperse the raw material powder;
A film forming chamber in which a substrate is disposed;
An injection nozzle that is disposed in the film formation chamber and injects the aerosol generated by the aerosol generation means toward the substrate;
Speed information acquisition means for acquiring information on the speed of the aerosol sprayed from the spray nozzle;
Aerosol speed adjusting means for adjusting the speed of aerosol sprayed from the spray nozzle;
Control means for feedback controlling the speed adjusting means based on the information obtained by the speed information obtaining means;
A film forming apparatus comprising:   The film forming apparatus according to claim 1, wherein the velocity information acquisition unit measures a velocity of the aerosol ejected from the ejection nozzle.   The film forming apparatus according to claim 2, wherein the velocity information acquisition unit measures an aerosol velocity by using an ultrasonic Doppler measurement method, a microwave Doppler method, a laser Doppler method, or a high-speed camera system.   The film forming apparatus according to claim 1, wherein the speed information acquisition unit measures a pressure in the container and / or a pressure in the film forming chamber.   The film forming apparatus according to claim 1, wherein the speed adjusting unit adjusts a flow rate of a gas supplied into the container.   The film forming apparatus according to claim 1, wherein the speed adjusting unit adjusts the pressure in the container and / or the pressure in the film forming chamber.   The said control means feedback-controls the said speed adjustment means so that the speed of the aerosol injected from the said injection nozzle may become uniform based on the information acquired by the said speed information acquisition means. The film-forming apparatus of any one of these. A film formation method by an aerosol deposition method in which raw material powder is sprayed onto a substrate to deposit the raw material powder on the substrate,
A step (a) of generating an aerosol by supplying a gas into the container and dispersing the raw material powder disposed in the container;
(B) depositing raw material powder on the substrate by spraying the aerosol generated in step (a) toward the substrate from an injection nozzle disposed in the film forming chamber;
Obtaining information on the velocity of the aerosol injected from the injection nozzle in step (b);
Feedback control of the velocity of the aerosol injected from the injection nozzle based on the information acquired in step (c); and
A film forming method comprising:   The film forming method according to claim 8, wherein step (c) includes measuring a velocity of the aerosol ejected from the ejection nozzle.   The film formation according to claim 9, wherein step (c) comprises measuring the velocity of the aerosol by using an ultrasonic Doppler measurement method, a microwave Doppler method, a laser Doppler method, or a high-speed camera system. Method.   The film forming method according to claim 8, wherein step (c) includes measuring a pressure in the container and / or a pressure in the film forming chamber.   The film forming method according to claim 8, wherein step (d) includes adjusting a flow rate of gas supplied into the container.   The film forming method according to claim 8, wherein step (d) includes adjusting a pressure in the container and / or a pressure in the film forming chamber.   The film forming method according to claim 8, wherein step (d) includes feedback control so that the velocity of the aerosol ejected from the ejection nozzle is uniform.

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