JP2006278206A - Method for manufacturing organic el element - Google Patents
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Abstract
Description
本発明は、凸版印刷法により有機発光層を形成した有機EL素子の製造方法に関する。 The present invention relates to a method for producing an organic EL element in which an organic light emitting layer is formed by a relief printing method.
コンピュータの情報表示用あるいはテレビジョン画面表示用などとして、軽量で高効率のフラットパネルディスプレイの研究開発が進められている。従来から主流とされてきたディスプレイとして広く用いられているのは、輝度と色再現性に優れたブラウン管(CRT)であるが、このブラウン管は重量が大きく奥行き寸法も大きいので、今日では薄型のフラットパネルディスプレイとして、液晶パネルディスプレイあるいはプラズマパネルディスプレイが商品化され、一部の商品では置き換えが進みつつある状況になっている。しかし、液晶パネルディスプレイは視野角が狭く、高速画素信号に対して応答性が充分ではないという問題があり、プラズマパネルディスプレイは消費電力が大きく、現在以上の大型化には技術的解決課題が多いという問題がある。 Research and development of lightweight, high-efficiency flat panel displays for computer information display or television screen display is underway. A cathode ray tube (CRT) that has been widely used as a display that has been mainly used in the past is a cathode ray tube (CRT) that has excellent luminance and color reproducibility. As panel displays, liquid crystal panel displays or plasma panel displays have been commercialized, and some products are being replaced. However, the liquid crystal panel display has a problem that the viewing angle is narrow and the responsiveness to high-speed pixel signals is not sufficient, and the plasma panel display consumes a large amount of power. There is a problem.
これらに対して最近注目されているものが、有機発光材料を用いた有機エレクトロルミネッセンス素子(以下、有機EL素子とする。)であり、有機化合物を発光材料として用いることで自発光であっても応答速度が高速であり、更に視野角依存性が無い低消費電力のフラットパネルディスプレイを実現できるものとして期待されている。
図5はこの種の有機EL素子の一構造例を示すもので、この例の有機EL素子100は透明のガラス基板101の上にITO(インジウムスズ酸化物)からなる透明の画素電極(陽極)102と、ホール輸送層103と発光層104と電子輸送層105と金属の陰極106を例えば真空蒸着法などで順次成膜してなる構成とされてなる。
Recently, an organic electroluminescence element using an organic light emitting material (hereinafter referred to as an organic EL element) has been attracting attention. Even if the organic compound is used as a light emitting material, it is self-luminous. It is expected to realize a flat panel display with low power consumption and high response speed and no viewing angle dependency.
FIG. 5 shows an example of the structure of this type of organic EL element. The organic EL element 100 of this example is a transparent pixel electrode (anode) made of ITO (indium tin oxide) on a transparent glass substrate 101. 102, a hole transport layer 103, a light emitting layer 104, an electron transport layer 105, and a metal cathode 106 are sequentially formed by, for example, a vacuum deposition method.
この構成の有機EL素子100においては、陽極の画素電極102と陰極106との間に直流電源107から直流電圧を印加すると、画素電極102から注入されたキャリアとしてのホール(正孔)がホール輸送層103を経て各々移動し、発光層104において、それら電子−正孔対の再結合が生じ、そこから所定波長の発光108が生じ、これを透明のガラス基板101の外側から観察することができる。
また、上述の有機EL素子100の具体的層構造の他の例として図6に示すように、ホール輸送層103の材料にポリ(3,4)−エチレンジオキシチオフェン(以下、PEDOTと略す。)を用い、電子輸送層と発光層を兼用した層としてポリ(2−メトキシ−5−(2’−エチルヘキシロキシ)−1,4−フェニレンビニレン)(以下、MEH−PPVと略す)の電子輸送性発光層110を用い、この上層には電子の注入性を高めるカルシウム(Ca)層111及びアルミニウムの電極層からなる陰極106を設けた構造も知られている。
In the organic EL element 100 having this configuration, when a DC voltage is applied between the anode pixel electrode 102 and the cathode 106 from the DC power source 107, holes (holes) as carriers injected from the pixel electrode 102 are transported by holes. Each of them moves through the layer 103, and in the light emitting layer 104, recombination of these electron-hole pairs occurs, and light emission 108 having a predetermined wavelength is generated therefrom, which can be observed from the outside of the transparent glass substrate 101. .
Further, as another example of the specific layer structure of the organic EL element 100 described above, as shown in FIG. 6, the material of the hole transport layer 103 is poly (3,4) -ethylenedioxythiophene (hereinafter abbreviated as PEDOT). ), And the electron of poly (2-methoxy-5- (2′-ethylhexyloxy) -1,4-phenylenevinylene) (hereinafter abbreviated as MEH-PPV) as a layer that doubles as an electron transport layer and a light-emitting layer A structure is also known in which a transporting light emitting layer 110 is used, and a cathode 106 made of an aluminum electrode layer and a calcium (Ca) layer 111 that enhances electron injectability is provided on the upper layer.
次に図7に、図5または図6に示す基本構造の有機EL素子を平面ディスプレイ装置に適用した一構成例を示す。
図示の如く、電子輸送層115とホール輸送層116とからなる有機積層構造が陰極117と陽極118の間に所定パターンに配置されている。陰極117及び陽極118は、互いに交差するストライプ状に設けられ、それぞれ、輝度信号回路120及びシフトレジスタ内蔵の制御回路121により選択されて信号電圧が印加される。これにより、選択された陰極117及び陽極118が交差する位置(画素)に存在するEL素子部分が個々に発光するように構成されている。
Next, FIG. 7 shows a configuration example in which the organic EL element having the basic structure shown in FIG. 5 or 6 is applied to a flat display device.
As shown in the drawing, an organic laminated structure composed of an electron transport layer 115 and a hole transport layer 116 is disposed between the cathode 117 and the anode 118 in a predetermined pattern. The cathode 117 and the anode 118 are provided in stripes crossing each other, and are selected by the luminance signal circuit 120 and the control circuit 121 with a built-in shift register, respectively, and applied with a signal voltage. Thus, the EL element portions existing at the positions (pixels) where the selected cathode 117 and anode 118 intersect each other are configured to emit light individually.
上記の有機EL素子の発光層の作成方法として、有機発光材料を印刷で形成する方法が種々研究されており、その一つに凸版印刷法が挙げられる。特許文献1〜3では、凸版印刷法を用いた有機ELディスプレイの作製について記載されている。 Various methods for forming an organic light-emitting material by printing have been studied as a method for forming the light-emitting layer of the organic EL element, and one of them is a relief printing method. Patent Documents 1 to 3 describe production of an organic EL display using a relief printing method.
凸版印刷法では、アニロックスロール等を介して有機発光体をフレキソ版等の凸版に転写し、この有機発光体を、フレキソ版から電極が形成された基材上に印刷して、有機発光層を形成する方法が知られている。しかし、凸版印刷法によると、凸版のうち、印圧の均一な中央部と、中央部と比べ印圧の高い端部の間で印圧のムラが発生するため、外縁部に印刷されたパターンでは欠損・不良を発生したり、版の中央部と端部で印刷されたパターンの高さのムラがでる問題あった。また、凸版にフレキソ版を用いると、版現像時に外縁部がダメージを受けやすい問題もあった。このため、凸版印刷により印刷された有機発光層は、パターンの線が欠けたり、層の厚さのムラが発生した。 In the relief printing method, an organic light emitter is transferred to a relief plate such as a flexographic plate via an anilox roll, and this organic light emitter is printed on a substrate on which an electrode is formed from the flexographic plate, thereby forming an organic light emitting layer. Methods of forming are known. However, according to the relief printing method, the unevenness of the printing pressure is generated between the central portion where the printing pressure is uniform and the end portion where the printing pressure is higher than the central portion of the relief printing, so the pattern printed on the outer edge portion However, there was a problem in that defects or defects occurred, and the height of the pattern printed at the center and edge of the plate was uneven. Further, when a flexographic plate is used for the relief plate, there is a problem that the outer edge portion is easily damaged during plate development. For this reason, the organic light emitting layer printed by letterpress printing lacked pattern lines or caused uneven thickness of the layer.
本発明は上記問題を解決するためになされたものであり、その課題とするところは、有機EL素子の製造方法において、欠損のなく、均一な層厚の有機発光層を有する有機EL素子の製造方法を提供することを目的とする。 The present invention has been made in order to solve the above-mentioned problems, and the object of the present invention is to manufacture an organic EL device having an organic light-emitting layer having a uniform thickness without defects in a method for manufacturing an organic EL device. It aims to provide a method.
ところで、本発明者の検討によれば、従来、有機EL素子の電極上に有機発光体を形成するために必要だった凸版よりも、大きな凸版を用意し、該凸版のうち、中央部のみを、電極上に有機発光体を印刷するために用いたところ、欠損がなく、均一な膜厚の有機発光層を有する有機EL素子を得られること見出した。 By the way, according to the study of the present inventor, a relief plate larger than the relief plate conventionally required for forming the organic light emitter on the electrode of the organic EL element is prepared, and only the central portion of the relief plate is prepared. The present inventors have found that when an organic light-emitting material is printed on an electrode, an organic EL device having an organic light-emitting layer having a uniform film thickness without defects is found.
本発明はこのような知見に基づいてなされたもので、請求項1に記載の発明は、基材上の電極が設けられた領域に、凸版印刷法で有機発光材料を印刷し、有機発光層を形成する工程を含む有機EL素子の製造方法において、
凸版印刷に用いる凸版が、画像形成領域と、画像形成領域の外縁部に位置するダミー領域を備え、前記凸版と前記基材が接触する際に、前記凸版の前記画像形成領域は、前記基材上の電極が設けられた領域を含み、前記凸版の前記ダミー領域は、前記基材上の電極の設けられた領域を含まないことを特徴とする、有機EL素子の製造方法である。
The present invention has been made on the basis of such knowledge. The invention according to claim 1 is a method in which an organic light emitting material is printed by a relief printing method on a region where an electrode on a substrate is provided, and an organic light emitting layer is formed. In the manufacturing method of the organic EL element including the process of forming
The relief printing used for relief printing comprises an image forming area and a dummy area located at the outer edge of the image forming area, and when the relief printing plate and the base material are in contact, the image forming area of the relief printing is the base material. The method of manufacturing an organic EL element includes an area where the upper electrode is provided, and the dummy area of the relief plate does not include an area where the electrode is provided on the base material.
請求項2に記載の発明は、凸版が、複数本の平行線で構成されたラインパターンを含み、
前記凸版のうち、少なくとも、前記平行線のうち両端の線が占める領域をダミー領域とし、
前記凸版のうち、ダミー領域の内側領域を画像形成領域とすることを特徴とする、請求項1に記載の有機EL素子の製造方法である。
The invention according to claim 2 includes a line pattern in which the relief plate is composed of a plurality of parallel lines,
Of the letterpress, at least the area occupied by both ends of the parallel lines is a dummy area,
2. The method of manufacturing an organic EL element according to claim 1, wherein an inner region of the dummy region of the relief plate is an image forming region.
請求項3に記載の発明は、画像形成領域の外縁とダミー領域の外縁の最小の間隔が、100μm以上であることを特徴とする請求項1又は請求項2に記載の有機EL素子の製造方法である。 The invention according to claim 3 is characterized in that the minimum distance between the outer edge of the image forming area and the outer edge of the dummy area is 100 μm or more. It is.
請求項4に記載の発明は、基材上の電極が設けられた領域に、凸版印刷法で有機発光材料を印刷し、有機発光層を形成する工程を含む有機EL素子の製造に用いる凸版において、
前記凸版が、画像形成領域と、画像形成領域の外縁部に位置するダミー領域を備え、前記凸版と前記基材が接触する際に、前記凸版の前記画像形成領域は、前記基材上の電極が設けられた領域を含み、前記凸版の前記ダミー領域は、前記基材上の電極の設けられた領域を含まないことを特徴とする凸版である。
In the relief printing used for manufacture of the organic EL element including the process of printing an organic light emitting material by the relief printing method in the area | region in which the electrode on the base material was provided, and forming an organic light emitting layer in invention of Claim 4 ,
The relief plate includes an image forming area and a dummy area located at an outer edge of the image formation area, and when the relief plate and the base material are in contact with each other, the image forming area of the relief plate is an electrode on the base material. And the dummy area of the relief plate does not include the area where the electrode is provided on the substrate.
請求項5に記載の発明は、前記凸版に樹脂凸版を用いることを特徴とする請求項4に記載の凸版である。 The invention described in claim 5 is the relief printing plate according to claim 4, wherein a resin relief printing plate is used for the relief printing plate.
請求項6に記載の発明は、請求項1〜3のいずれかに記載の製造方法で製造したことを特徴とする有機EL素子である。 The invention according to claim 6 is an organic EL element manufactured by the manufacturing method according to any one of claims 1 to 3.
請求項7に記載の発明は、請求項4又は5に記載の凸版を用いて、凸版印刷法で有機発効材料を印刷することを特徴とする有機EL素子。 The invention according to claim 7 is an organic EL device characterized in that an organic effect material is printed by a relief printing method using the relief plate according to claim 4 or 5.
本発明によれば、凸版の中央部と端部の間に生じる印圧のムラに起因する、有機発光体層のパターン不良、層厚のムラの問題を解決することができた。そして、このため、安定で良好な発光特性を有する有機EL素子を製造することができた。 According to the present invention, it was possible to solve the problems of the pattern defect and the layer thickness unevenness of the organic light-emitting layer caused by the uneven printing pressure generated between the central portion and the end portion of the relief printing plate. For this reason, an organic EL element having stable and good light emission characteristics could be manufactured.
以下、この発明の実施の形態を図面に基づいて説明する。
図1は本実施形態における有機EL素子作製用凸版の1例を示す概略図である。
図1(a)が該凸版を上から見た図であり、図1(b)は該凸版の断面図である。
Hereinafter, embodiments of the present invention will be described with reference to the drawings.
FIG. 1 is a schematic view showing an example of a relief plate for producing an organic EL element in the present embodiment.
FIG. 1A is a view of the relief plate as viewed from above, and FIG. 1B is a cross-sectional view of the relief plate.
本実施形態の有機EL素子作製用の凸版1は、少なくとも表面が凸型になっていればよく、材質は金属版、樹脂版といった凸版印刷に通常用いる版材料を用いることができる。また凸版の凸部11の先端にインキを保持させるための凹部や凸部といった形状を作製することもできる。さらに、凸版の凹部に撥インキ性を持たせても良い。また、凸版1が少なくとも画像形成領域101において、有機EL素子の電極22と同じ凸パターンを有していることは言うまでもない。凸版1のダミー領域102は、電極上に有機発光体層を形成するために用いないので、任意の凸パターンを形成することができる。 The relief plate 1 for producing an organic EL element according to the present embodiment only needs to have a convex surface at least, and the material can be a plate material usually used for relief printing such as a metal plate or a resin plate. In addition, a shape such as a concave portion or a convex portion for holding ink at the tip of the convex portion 11 of the relief printing plate can be produced. Furthermore, ink repellency may be imparted to the concave portions of the relief printing plate. Needless to say, the relief plate 1 has the same convex pattern as the electrode 22 of the organic EL element at least in the image forming region 101. Since the dummy region 102 of the relief plate 1 is not used for forming the organic light emitting layer on the electrode, an arbitrary convex pattern can be formed.
また、凸版1にフレキソ版を用いた場合、前記の通り、現像により端部がダメージを受けやすいという問題があった。しかし、本発明によれば、現像によりダメージを受けやすい領域が、電極上に有機発光体を印刷するために使われず、現像によりダメージを受けない領域が、電極上に有機発光体を印刷するために使われる。このため、凸版にフレキソ版を用いた場合においても、欠損が無く、均一な膜厚の有機発光層を形成することができる。 Further, when a flexographic plate is used for the relief plate 1, as described above, there is a problem that the end portion is easily damaged by the development. However, according to the present invention, the area susceptible to damage by development is not used for printing the organic light emitter on the electrode, and the area not damaged by development prints the organic light emitter on the electrode. Used for. For this reason, even when a flexographic plate is used as the relief plate, an organic light-emitting layer having a uniform film thickness can be formed without any defects.
図2は有機EL素子基材の概略図である。図2(a)は、該有機EL素子基材を上から見た図であり、図2(b)は該有機EL素子基材2の断面図である。有機EL素子基材2は、基材21上に電極22がパターン形成されている。有機EL素子の電極22のパターンは、平行線を複数本設けたラインパターン、ラインパターンを垂直に交差させたマトリクスパターンなど公知のパターンを適用することが出来る。図2〜図4では上記ラインパターンの例を示している。 FIG. 2 is a schematic view of an organic EL element substrate. FIG. 2A is a view of the organic EL element substrate as viewed from above, and FIG. 2B is a cross-sectional view of the organic EL element substrate 2. In the organic EL element substrate 2, electrodes 22 are patterned on a substrate 21. As the pattern of the electrode 22 of the organic EL element, a known pattern such as a line pattern in which a plurality of parallel lines are provided, or a matrix pattern in which the line patterns are vertically intersected can be applied. 2 to 4 show examples of the line pattern.
図3は、有機発光体が転写される際の凸版1と有機EL素子基材2の、位置関係を示す概略図である。図3(a)は、凸版1を示し、図3(b)は有機EL素子基材2を示す。
図3(a)に示すとおり、凸版1は画像形成領域101(斜線部で示された領域)と、その外縁部に位置するダミー領域102(斜線部の外側の領域)を備える。前述したように、フレキソ版を用いた場合、版の外縁部は中央部と比べダメージを受けやすく、その結果、印刷した有機EL素子も基材の外縁部においてパターン不良を発生する。しかし、本発明に係る製造方法によると、図3(b)で示すように、画像形成領域101は、有機EL素子基材2の電極22が占める領域を全て含むため、有機EL素子の電極22に転写される有機発光体は、凸版1のうち画像形成領域101により転写される。すなわち、凸版1のうち、外縁部のダミー領域102に受理された有機発光体は電極22上に転写されないので、電極22上に形成される有機発光層のパターンは欠損が無く、また膜厚が一定のものとなる。
FIG. 3 is a schematic view showing the positional relationship between the relief plate 1 and the organic EL element substrate 2 when the organic light emitter is transferred. FIG. 3A shows the relief 1 and FIG. 3B shows the organic EL element substrate 2.
As shown in FIG. 3A, the relief plate 1 includes an image forming area 101 (area shown by a hatched area) and a dummy area 102 (area outside the hatched area) located at the outer edge thereof. As described above, when the flexographic plate is used, the outer edge portion of the plate is more easily damaged than the central portion, and as a result, the printed organic EL element also causes a pattern defect at the outer edge portion of the substrate. However, according to the manufacturing method according to the present invention, as shown in FIG. 3B, the image forming region 101 includes the entire region occupied by the electrode 22 of the organic EL element substrate 2, and therefore the electrode 22 of the organic EL element. The organic luminescent material transferred to the image forming area 101 is transferred from the relief plate 1. That is, in the relief printing plate 1, the organic light-emitting body received in the dummy region 102 at the outer edge is not transferred onto the electrode 22, so the pattern of the organic light-emitting layer formed on the electrode 22 is free from defects and has a film thickness. It will be constant.
次に、本発明の有機EL素子作製用の凸版1を用いた有機EL素子の製造方法の一例について詳細に述べる。図5に該凸版を用いた有機EL素子製造装置の一例を示す。インキ補充装置41から凸版へのインキング装置42へ有機発光材料を含むインキ43の補充を行い、インキング装置42に補充された有機発光材料を含むインキ43はドクター装置44により除去することができる。インキ補充装置には、滴下型の補充装置の他に、ファウンテンロールやスリットコータ、ダイコータ、キャップコータなどのコータやそれらを組み合わせたものなどを用いることもできる。ドクター装置44にはドクターロールの他にドクターブレードを用いることもできる。 Next, an example of the manufacturing method of the organic EL element using the relief plate 1 for producing the organic EL element of the present invention will be described in detail. FIG. 5 shows an example of an organic EL element manufacturing apparatus using the relief plate. The ink 43 containing the organic light emitting material is replenished from the ink replenishing device 41 to the inking device 42 on the relief printing plate, and the ink 43 containing the organic light emitting material replenished to the inking device 42 can be removed by the doctor device 44. . As the ink replenishing device, a coater such as a fountain roll, a slit coater, a die coater, a cap coater, or a combination thereof can be used in addition to the dropping type replenishing device. In addition to the doctor roll, a doctor blade can also be used for the doctor device 44.
ドクター装置44により余剰なインキが除去された後、少なくとも表面が有機EL素子作製用凸版47となっているシリンダー45へのインキングを行う。有機EL素子作製用凸版47へのインキングは、少なくとも該版の画像形成部分に行われれば良い。有機EL素子作製用凸版47へインキングされたインキは、被転写体46へ印刷される。被転写体46に用いることができる基材としては、ガラスの他に水蒸気などに対するバリア性を持ったフィルムなどの透光性基材を用いることができる。被転写体46へ印刷された有機発光材料を含むインキ43は乾燥することにより、有機EL素子の有機発光層を形成する。 After the excess ink is removed by the doctor device 44, at least the surface is inked into the cylinder 45 having the relief plate 47 for producing the organic EL element. The inking to the relief plate 47 for producing the organic EL element may be performed at least on the image forming portion of the plate. The ink inked to the relief plate 47 for producing the organic EL element is printed on the transfer body 46. As a base material that can be used for the transfer object 46, a translucent base material such as a film having a barrier property against water vapor or the like can be used in addition to glass. The ink 43 containing the organic light emitting material printed on the transfer body 46 is dried to form an organic light emitting layer of the organic EL element.
図4に、本発明の製造方法により有機発光体を形成した有機EL素子の一例の概略図を示す。図4(a)は上視図であり、図4(b)はその断面図である。電極22上には、凸版の画像形成領域101により印刷された有機発光体層が形成されている。また、凸版のダミー領域102により、有機EL素子基材2に有機発光体が印刷された場合、基材上にはダミー領域202により印刷された有機発光体層のパターン202が形成される。 In FIG. 4, the schematic of an example of the organic EL element in which the organic light-emitting body was formed with the manufacturing method of this invention is shown. 4A is a top view, and FIG. 4B is a cross-sectional view thereof. On the electrode 22, an organic light emitting layer printed by the relief image forming area 101 is formed. In addition, when an organic light emitter is printed on the organic EL element base material 2 by the relief dummy area 102, an organic light emitter layer pattern 202 printed by the dummy area 202 is formed on the base material.
本発明は高精細なパターン印刷を行うのに好適であり、特に電子材料の印刷を行うのに適している。一例として、図6にこの製造方法によって得られる有機EL素子の一発光単位30を示す。この有機EL素子の一発光単位30は、透光性基板31と透明導電層32とホール注入層33と有機発光層34と陰極層35とを具備するものである。この有機EL素子において、透光性基板31を基材2、透明導電層32を電極22、有機発光層34を画像形成領域により転写された有機発光体201として、本発明の製造方法を適用することができる。 The present invention is suitable for high-definition pattern printing, and particularly suitable for printing electronic materials. As an example, FIG. 6 shows one light emitting unit 30 of an organic EL element obtained by this manufacturing method. One light emitting unit 30 of the organic EL element includes a light transmissive substrate 31, a transparent conductive layer 32, a hole injection layer 33, an organic light emitting layer 34, and a cathode layer 35. In this organic EL element, the manufacturing method of the present invention is applied using the translucent substrate 31 as the base material 2, the transparent conductive layer 32 as the electrode 22, and the organic light emitting layer 34 as the organic light emitting body 201 transferred by the image forming region. be able to.
この有機EL素子の一単位30において、透光性基板31としては、ガラス基板やプラスチック製のフィルムまたはシートを用いることができる。プラスチック製のフィルムを用いれば、巻き取りにより有機発光素子の製造が可能となり、安価に素子を提供できる。そのプラスチックとしては、例えば、ポリエチレンテレフタレート、ポリプロピレン、シクロオレフィンポリマー、ポリアミド、ポリエーテルスルホン、ポリメタクリル酸メチル、ポリカーボネート等を用いることができる。また、透明導電層32を成膜しない側にセラミック蒸着フィルムやポリ塩化ビニリデン、ポリ塩化ビニル、エチレン−酢酸ビニル共重合体鹸化物等の他のガスバリア性フィルムを積層してもよい。 In each unit 30 of the organic EL element, a glass substrate or a plastic film or sheet can be used as the translucent substrate 31. If a plastic film is used, an organic light emitting device can be manufactured by winding, and the device can be provided at low cost. As the plastic, for example, polyethylene terephthalate, polypropylene, cycloolefin polymer, polyamide, polyethersulfone, polymethyl methacrylate, polycarbonate and the like can be used. Moreover, you may laminate | stack other gas barrier films, such as a ceramic vapor deposition film, a polyvinylidene chloride, a polyvinyl chloride, an ethylene-vinyl acetate copolymer saponified material, on the side which does not form the transparent conductive layer 32 into a film.
透明導電層32をなす材料としては、インジウムと錫の複合酸化物(以下ITOという)が挙げられる。また、アルミニウム、金、銀等の金属が半透明状に蒸着されたものや、ポリアニリン等の有機半導体などが挙げられる。
正孔注入層33をなす材料としては、ポリアニリン誘導体、ポリチオフェン誘導体、ポ
リビニルカルバゾール誘導体、ポリ(3,4−エチレンジオキシチオフェン)とポリスチ
レンスルホン酸との混合物等の導電性高分子材料が挙げられる。
Examples of the material forming the transparent conductive layer 32 include a composite oxide of indium and tin (hereinafter referred to as ITO). In addition, a semi-transparent metal such as aluminum, gold, or silver, or an organic semiconductor such as polyaniline may be used.
Examples of the material forming the hole injection layer 33 include conductive polymer materials such as a polyaniline derivative, a polythiophene derivative, a polyvinylcarbazole derivative, and a mixture of poly (3,4-ethylenedioxythiophene) and polystyrenesulfonic acid.
有機発光層34は有機発光体を含有する層であり、電圧の印加により発光する層である。有機発光材料としては、例えば、クマリン系、ペリレン系、ピラン系、アンスロン系、ポルフィリン系、キナクリドン系、N,N’−ジアルキル置換キナクリドン系、ナフタルイミド系、N,N’−ジアリール置換ピロロピロール系、イリジウム錯体系等の有機溶剤に可溶な有機発光材料や該有機発光材料をポリスチレン、ポリメチルメタクリレート、ポリビニルカルバゾール等の高分子中に分散させたものや、ポリアリーレン系、ポリアリーレンビニレン系やポリフルオレン系などの高分子有機発光材料が挙げられる。 The organic light emitting layer 34 is a layer containing an organic light emitter, and emits light when a voltage is applied. Examples of organic light emitting materials include coumarin, perylene, pyran, anthrone, porphyrin, quinacridone, N, N′-dialkyl substituted quinacridone, naphthalimide, N, N′-diaryl substituted pyrrolopyrrole. Organic light-emitting materials soluble in organic solvents such as iridium complexes, organic light-emitting materials dispersed in polymers such as polystyrene, polymethyl methacrylate, polyvinyl carbazole, polyarylenes, polyarylene vinylenes, Examples thereof include polymer organic light emitting materials such as polyfluorene-based materials.
陰極層35をなす材料としては、有機発光媒体層の発光特性に応じたものを使用でき、
例えば、リチウム、マグネシウム、カルシウム、イッテルビウム、アルミニウムなどの金
属単体やこれらと金、銀などの安定な金属との合金などが挙げられる。また、インジウム、亜鉛、錫などの導電性酸化物を用いることもできる。
As a material for forming the cathode layer 35, a material corresponding to the light emitting characteristics of the organic light emitting medium layer can be used.
Examples thereof include simple metals such as lithium, magnesium, calcium, ytterbium, and aluminum, and alloys of these with stable metals such as gold and silver. Alternatively, a conductive oxide such as indium, zinc, or tin can be used.
上述した有機発光素子を、本発明を用いて製造するには、被転写体26として透光性基板31上に透明導電層32、ホール注入層33を積層したものを用い、インキ22として有機発光材料を含むインキを用いる。 In order to manufacture the above-described organic light-emitting device using the present invention, a material in which a transparent conductive layer 32 and a hole injection layer 33 are laminated on a translucent substrate 31 is used as the transfer target 26, and organic light-emitting is used as the ink 22. Use ink containing material.
有機発光材料を含むインキは上述のように凸版の凸部へ供給され、上述の被転写基板26へ印刷される。発光材料を溶解または分散させるような、インキに用いられる溶剤としては、例えば、トルエン、キシレン、アセトン、メチルエチルケトン、メチルイソブチルケトン、シクロヘキサノン、メタノール、エタノール、イソプロピルアルコール、酢酸エチル、酢酸ブチル、クロロホルム、塩化メチレン、ジクロロエタン、トリクロロエタン、テトラクロロエチレン、水などの単独またはこれらの混合溶媒などが挙げられる。特に芳香族系溶剤およびハロゲン系溶剤は有機発光材料を溶かすのに優れている。
また、有機発光材料を含むインキには、必要に応じて、界面活性剤、酸化防止剤、粘度調整剤、紫外線吸収剤、乾燥剤などが添加されても良い。
The ink containing the organic light emitting material is supplied to the convex portion of the relief printing as described above, and is printed on the transfer substrate 26 described above. Solvents used in inks that dissolve or disperse luminescent materials include, for example, toluene, xylene, acetone, methyl ethyl ketone, methyl isobutyl ketone, cyclohexanone, methanol, ethanol, isopropyl alcohol, ethyl acetate, butyl acetate, chloroform, chloride. Examples thereof include methylene, dichloroethane, trichloroethane, tetrachloroethylene, water alone or a mixed solvent thereof. In particular, aromatic solvents and halogen solvents are excellent for dissolving organic light emitting materials.
Moreover, surfactant, antioxidant, a viscosity modifier, a ultraviolet absorber, a desiccant, etc. may be added to the ink containing an organic luminescent material as needed.
以下、本発明の具体的態様を実施例、比較例を用いて詳細に説明する。
<実施例1>
上記の実施形態における有機EL素子製造装置としてフレキソ校正機に、凸部幅が120μm、凹部幅が380μmのラインパターンを有し、32mm×35mmの画像形成領域とダミー領域を含む、35mm×37mmの樹脂凸版を用いた。
有機発光体として、有機発光材料を含むポリアリーレンビニレン1.0重量%のトルエン溶液を用いた。さらにガラス基板上にITO、ポリ(3,4−エチレンジオキシチオフェン)とポリスチレンスルホン酸との混合物を積層させた被転写基板とした。この被転写基板に、上記の凸版を用いた印刷を行ったのち、陰極としてカルシウムを10nm、銀を300nm蒸着し、ガラス封止をおこなった。この有機EL素子の発光特性を見たところ、発光面全面で均一な発光が見られた。
Hereinafter, specific embodiments of the present invention will be described in detail using examples and comparative examples.
<Example 1>
The flexo proofing machine as the organic EL element manufacturing apparatus in the above embodiment has a line pattern with a convex portion width of 120 μm and a concave portion width of 380 μm, and includes a 32 mm × 35 mm image forming region and a dummy region, 35 mm × 37 mm. Resin letterpress was used.
As the organic light emitter, a 1.0% by weight toluene solution of polyarylene vinylene containing an organic light emitting material was used. Furthermore, it was set as the to-be-transferred board | substrate which laminated | stacked the mixture of ITO, poly (3,4-ethylene dioxythiophene), and polystyrene sulfonic acid on the glass substrate. After printing using the above relief printing on this transfer substrate, 10 nm of calcium and 300 nm of silver were vapor-deposited as a cathode, and glass sealing was performed. When the light emission characteristics of the organic EL element were observed, uniform light emission was observed over the entire light emitting surface.
<実施例2>
上記の実施形態における有機EL素子製造装置として実施例1と同様のフレキソ校正機に、凸部が120μm、凹部が380μmのラインパターンを70本有し、そのうち、両端の3本ずつのパターンが占める領域をダミー領域とし、ダミーパターンの内側の64本のパターンが占める領域を画像形成領域とした。
有機発光体として、有機発光材料を含むポリアリーレンビニレン1.0重量%のトルエン溶液を用いて、ガラス上にITO、ポリ(3,4−エチレンジオキシチオフェン)とポリスチレンスルホン酸との混合物を積層させた被転写基板へ、上記の凸版を用いた印刷を行ったのち、陰極としてカルシウムを10nm、銀を300nm蒸着し、ガラス封止をおこなった。この有機EL素子の発光特性を見たところ、発光面全面で均一な発光が見られた。
<Example 2>
The flexo proofing machine similar to Example 1 as the organic EL element manufacturing apparatus in the above embodiment has 70 line patterns having a convex portion of 120 μm and a concave portion of 380 μm, of which three patterns are occupied at both ends. The area was a dummy area, and the area occupied by 64 patterns inside the dummy pattern was an image forming area.
A mixture of ITO, poly (3,4-ethylenedioxythiophene) and polystyrene sulfonic acid is laminated on glass using a toluene solution of 1.0% by weight of polyarylene vinylene containing an organic light emitting material as an organic light emitter. After printing using the above-mentioned relief printing on the transferred substrate, calcium was deposited at a thickness of 10 nm and silver at a thickness of 300 nm as a cathode, followed by glass sealing. When the light emission characteristics of the organic EL element were observed, uniform light emission was observed over the entire light emitting surface.
<比較例>
上記の実施形態における有機EL素子製造装置として、実施例1と同様のフレキソ校正機に、凸部が120μm、凹部が380μmのラインパターンを有し、32mm×35mmの画像形成領域のみを有する凸版を用いた。有機発光体として、有機発光材料を含むポリアリーレンビニレン1.0重量%のトルエン溶液を用いて、ガラス上にITO、ポリ(3,4−エチレンジオキシチオフェン)とポリスチレンスルホン酸との混合物を積層させた被転写基板への印刷を行ったのち、陰極としてカルシウムを10nm、銀を300nm蒸着し、ガラス封止をおこなった。この有機EL素子の発光特性を見たところ、発光面の端部において、不均一な発光ムラが見られた。印刷時の圧力ムラを富士フイルム製プレスケールにより測定した。その結果を図7に示す。圧力の高い部分ほど色が濃く表示されている。図7で示されるように画像形成領域の端部において、印圧のムラが見られた。不均一な発光は、この印圧ムラにより有機発光層の膜厚に不均一性が生じたためと思われる。
<Comparative example>
As an organic EL element manufacturing apparatus in the above embodiment, a relief printing machine similar to that in Example 1 is provided with a relief plate having a line pattern having a convex portion of 120 μm and a concave portion of 380 μm and having only an image forming area of 32 mm × 35 mm. Using. A mixture of ITO, poly (3,4-ethylenedioxythiophene) and polystyrene sulfonic acid is laminated on glass using a toluene solution of 1.0% by weight of polyarylene vinylene containing an organic light emitting material as an organic light emitter. After printing on the transferred substrate, the glass was sealed by depositing 10 nm of calcium and 300 nm of silver as a cathode. As a result of examining the light emission characteristics of the organic EL element, uneven light emission was observed at the end of the light emitting surface. Pressure unevenness during printing was measured with a Fujifilm prescale. The result is shown in FIG. The higher the pressure, the darker the color is displayed. As shown in FIG. 7, uneven printing pressure was observed at the end of the image forming area. The non-uniform light emission seems to be due to the non-uniformity in the film thickness of the organic light-emitting layer due to this uneven printing pressure.
1 凸版
11 凸部
2 有機EL素子基材
21 基材
101 画像形成領域
102 ダミー領域
201 画像形成領域により転写された有機発光体
202 ダミー領域により転写された有機発光体
41 インキ補充装置
42 インキング装置
43 インキ
44 ドクター装置
45 シリンダー
46 被転写体
47 有機EL素子作製用凸版
30 有機EL素子の一単位
31 透光性基板
32 透明導電層
33 正孔注入層
34 有機発光層
35 陰極層
DESCRIPTION OF SYMBOLS 1 Letterpress 11 Protrusion part 2 Organic EL element base material 21 Base material 101 Image formation area 102 Dummy area 201 Organic light-emitting body 202 transferred by image formation area Organic light-emitting body 41 transferred by dummy area Ink replenishing apparatus 42 Inking apparatus 43 Ink 44 Doctor Device 45 Cylinder 46 Transferred Material 47 Letterpress 30 for Organic EL Element Production One Unit of Organic EL Element 31 Translucent Substrate 32 Transparent Conductive Layer 33 Hole Injection Layer 34 Organic Light-Emitting Layer 35 Cathode Layer
Claims (7)
凸版印刷に用いる凸版が、
画像形成領域と、
画像形成領域の外縁部に位置するダミー領域を備え、前記凸版と前記基材が接触する際に、
前記凸版の前記画像形成領域は、前記基材上の電極が設けられた領域を含み、
前記凸版の前記ダミー領域は、前記基材上の電極の設けられた領域を含まないことを特徴とする、有機EL素子の製造方法。 In the method of manufacturing an organic EL element including a step of printing an organic light emitting material by a relief printing method on a region where an electrode on a substrate is provided, and forming an organic light emitting layer,
The letterpress used for letterpress printing is
An image forming area;
A dummy area located at the outer edge of the image forming area, and when the relief plate and the substrate come into contact,
The image forming area of the relief plate includes an area where an electrode on the substrate is provided,
The method for manufacturing an organic EL element, wherein the dummy area of the relief plate does not include an area where an electrode is provided on the substrate.
前記凸版のうち、少なくとも、前記平行線のうち両端の線が占める領域をダミー領域とし、
前記凸版のうち、ダミー領域の内側領域を画像形成領域とすることを特徴とする、請求項1に記載の有機EL素子の製造方法。 The letterpress includes a line pattern composed of a plurality of parallel lines,
Of the letterpress, at least the area occupied by both ends of the parallel lines is a dummy area,
2. The method of manufacturing an organic EL element according to claim 1, wherein an inner region of a dummy region of the relief printing plate is an image forming region.
前記凸版が、
画像形成領域と、
画像形成領域の外縁部に位置するダミー領域を備え、前記凸版と前記基材が接触する際に、
前記凸版の前記画像形成領域は、前記基材上の電極が設けられた領域を含み、
前記凸版の前記ダミー領域は、前記基材上の電極の設けられた領域を含まないことを特徴とする凸版。 In the relief printing used for the manufacture of the organic EL element including the step of printing the organic light emitting material by the relief printing method and forming the organic light emitting layer in the region provided with the electrode on the substrate,
The letterpress is
An image forming area;
A dummy area located at the outer edge of the image forming area, and when the relief plate and the substrate come into contact,
The image forming area of the relief plate includes an area where an electrode on the substrate is provided,
The relief printing plate according to claim 1, wherein the dummy region of the relief printing plate does not include a region provided with electrodes on the substrate.
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Cited By (2)
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JP2009088167A (en) * | 2007-09-28 | 2009-04-23 | Toppan Printing Co Ltd | Organic el element and manufacturing method thereof |
JP2010023483A (en) * | 2008-06-20 | 2010-02-04 | Toppan Printing Co Ltd | Pattern forming letterpress, organic el element, and electronic circuit |
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JP2003332053A (en) * | 2002-05-16 | 2003-11-21 | Fuji Photo Film Co Ltd | Method and device for manufacturing pattern member |
JP2004178915A (en) * | 2002-11-26 | 2004-06-24 | Sony Corp | Manufacturing method for organic electro-luminescence device |
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JP2003332053A (en) * | 2002-05-16 | 2003-11-21 | Fuji Photo Film Co Ltd | Method and device for manufacturing pattern member |
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