JP2006267802A - Exposure apparatus and exposure method - Google Patents

Abstract

The present invention provides an exposure apparatus and an exposure method with high production efficiency in an exposure apparatus that performs exposure processing in a photolithography process of a large substrate for a flat display panel used in a flat display device.
A large substrate is mounted on a cassette in an XY stage pre-stage part by an import means, and a large substrate is placed on the XY stage from the XY stage pre-stage part by a transfer unit. The large substrate 150 together with the cassette 140 is taken out from the XY stage to the rear stage portion of the XY stage, and the large substrate is unloaded from the cassette 140 at the rear stage portion XY stage 130 by the unloading means 180.
[Selection] Figure 1

Description

  The present invention relates to an exposure apparatus and an exposure method for performing exposure processing of a large substrate for a display panel.

  In recent years, flat display devices (hereinafter referred to as flat displays) have been used in many fields and places, and their importance has been increasing as information technology advances. Currently, a typical flat display is a liquid crystal display (hereinafter also referred to as LCD), but as a flat display based on a display principle different from LCD, organic EL, inorganic EL, plasma display panel (also referred to as PDP), light Development of an emitting diode display device (also referred to as LED), a fluorescent display tube display device (also referred to as VFD), a field emission display (also referred to as FED), and the like has been actively conducted.

Under such circumstances, panel substrates such as glass substrates for display panels are conveyed while being controlled by a belt conveyor or a roller conveyor, etc., as necessary, in the production line. In FIG. 5, processing such as exposure processing is performed.
For example, in an exposure processing process involving a photolithographic process, exposure is performed by transferring the pattern of the original plate 1: 1 to the photosensitive material on the substrate side by a proximity exposure type exposure apparatus, but the XY of the exposure unit 300 of the panel substrate is used. Conventionally, mounting on the stage and removal from the XY stage have been performed using a transfer robot 380 as shown in FIG.
In the exposure apparatus shown in FIG. 5A, conveyance and exposure processing are simply performed as follows.
First, a panel substrate 350 for performing an exposure process is taken out from the production line by a carry-in robot 370, transported to an XY stage front stage (also referred to as a plate base) 320, mounted thereon, and further, an XY stage front stage. The panel substrate 350 is taken out from 320 by the transfer robot 380, transferred to the precision alignment plate base 330, and mounted.
The panel substrate 350 is taken out by the transfer robot 380 in the state of being precisely aligned by the precision alignment plate pedestal 330, transported from the precision alignment plate pedestal 330 to the XY stage 310, mounted, and further subjected to exposure processing. Later, the transfer substrate 380 transfers the panel substrate 350 from the XY stage 310 to the transfer unit 360.
The loading and unloading of the panel substrate 350 to and from each part by each robot is basically performed by inserting and removing the hand of each robot while the panel substrate 350 is lifted by the lift pins of each part.
Here, as shown in FIG. 5 (c), a double hand in which an upper hand 382 as a panel substrate mounting hand and a lower hand 381 as a panel substrate takeout hand are provided separately. The method is adopted.
When the panel substrate 350 is mounted on the XY stage 310, as shown in FIG. 5B, a plurality of lift pins 315 are raised so as to penetrate the upper surface of the XY stage 310, and the upper ends thereof are aligned horizontally. The hand 382 is moved between the lift pins 315 and the upper panel substrate 350 is placed on the upper end of the lift pins 315. The hand 382 is lowered and separated from the panel substrate 350, and between the upper surface of the XY stage 310 and the panel substrate 350. The hand 382 is moved between the lift pins 315, and the hand 382 is taken out from the XY stage 310 side.
Further, when the panel substrate 350 is taken out from the XY stage 310, as shown in FIG. 5B, a plurality of lift pins 315 are raised so as to penetrate through the upper surface of the XY stage 310, and the upper ends thereof are aligned horizontally. With the substrate 350 placed on the upper end of the lift pins 315, the hand 381 is moved between the upper surface of the XY stage 310 and the panel substrate 350 and between the lift pins 315, and is sent to the XY stage 310 side. Then, the hand 381 is raised and mounted on the panel substrate 350 hand 381, and the hand 381 is moved between the lift pins 315 while being separated from the lift pins 315, and is taken out from the XY stage 310 side.
In this way, using the lift pin, the method of placing the processing substrate on each part and taking out the processing substrate from each part, hereinafter referred to as a lift pin method,
In the conventional exposure apparatus shown in FIG. 5A, the transfer robot 380 used for loading and unloading the panel substrate 350 on the XY stage 310 has only one robot arm (robot hand). In addition, a double hand method is employed in which an upper hand 382 as a panel substrate mounting hand and a lower hand 381 as a panel substrate take-out hand are provided separately. As shown in b), the unexposed panel substrate 350a from the precision alignment plate base 330 and the exposed panel substrate 350b taken out from the XY stage 310 can be mounted on the hand 382 and the hand 381, respectively. Other external setup of loading and unloading the panel substrate 350 on the XY stage 310 The work can be performed in BanKo, and the like as a whole, to shorten the processing tact.

However, in the exposure apparatus shown in FIG. 5, since the pre-alignment of the panel substrate 350, the upper and lower pins, and the suction are performed on the XY stage, the substrate on the XY stage has a high ratio in the total tact of the exposure apparatus. Had to spend on handling.
In this method, for example, when a color filter substrate for a liquid crystal display device (hereinafter also referred to as a CF substrate) is manufactured, there is no problem in an exposure apparatus up to the fourth generation (for example, a 730 mm × 920 mm substrate). In an exposure apparatus of 5 generations (typical example, 1100 mm × 1300 mm) or more, such handling has become one of the factors for hindering tact-up, and the exposure apparatus is a bottleneck process for tact-up inhibition in the production line of the CF substrate. It has become.
In addition, in the sixth generation (for example, 1500 mm × 1800 mm) or later, the double arm transfer of the robot becomes physically more difficult, and in this case, it is necessary to improve the substrate handling method.
In FIG. 5, 300 is an exposure unit (also referred to as an exposure apparatus main body), 310 is an XY stage, 311 is a support unit, 315 is a lift pin, 320 is an XY stage front stage (plate base), 325 is a lift pin, and 330 is a precision unit. Alignment plate base, 335 lift pins, 336 alignment pins, 350 a panel substrate (also called a processing substrate), 350a an unexposed panel substrate (processing substrate), 350b an exposed panel substrate ( Processing substrate), 360 is a transport unit, 365 is a luft pin, 366 is a shaft, 367 is a roller, 370 is a loading robot, 371 is a hand, 380 is a transport robot, 381 is a lower hand, and 381A is a hand support transport unit , 382 are upper-side hands, and 382A is a hand supporting and conveying unit.
Moreover, the arrow has shown the advancing direction of the board | substrate for panels.

The inventors of the present application have proposed a large glass substrate transfer device in Japanese Patent Application Laid-Open No. 2004-79614.
JP 2004-79614 A

As described above, in recent years, the size of a substrate for a flat display panel (also referred to as an FDP) used in a flat display device has been increased, and in a production line for producing such a substrate, the exposure process in the photolithography process has been tacted up. It has become a bottleneck process for inhibition.
Accordingly, the present invention is an exposure apparatus for performing exposure processing in a photolithography process of a large substrate for a flat display panel used in a flat display device, and to provide an exposure apparatus and an exposure method with high production efficiency. It is what.

The exposure apparatus of the present invention is an exposure apparatus that performs exposure processing of a large substrate for a display panel, and has a cassette for performing exposure processing and conveyance in a state where the large substrate is mounted, and the large substrate is placed together with the cassette. An exposure unit (exposure machine main body) having an XY stage for performing exposure in a state, an XY stage front stage part for placing a large substrate mounted on a cassette before being mounted on the XY stage, and taking out from the XY stage In addition, an XY stage rear stage for arranging a large substrate mounted on the cassette is arranged, and a carrying-in means for mounting the large substrate on the cassette at the XY stage front stage, and the XY stage rear part at the rear stage. The unloading means for taking out the large substrate from the cassette, the XY stage front part to the XY stage, and the XY stage to the XY stage rear part, And a transport unit that transports the large substrate in a horizontal state together with the robot, the large substrate is mounted on the cassette at the front stage of the XY stage by the carry-in means, and the cassette from the front stage of the XY stage by the transport unit. The large substrate is placed on the XY stage and exposed, the large substrate is removed from the XY stage to the rear stage of the XY stage, and the large board is unloaded from the cassette at the rear stage of the XY stage by the unloading means. It is characterized by being.
In the above-described exposure apparatus, the transport unit transports from the front part of the XY stage to the XY stage and from the XY stage to the rear part of the XY stage at a position close to the XY stage surface. Is.
Further, in any one of the above exposure apparatuses, the carry-in means and the carry-out means are both capable of carrying at least a predetermined angle θ rotational movement and a predetermined height direction (Z direction), and a large substrate carrying hand. It is characterized by comprising a transfer robot having
In any of the above exposure apparatuses, the transport unit is a roller transport unit (roller conveyor).
Further, in any one of the above exposure apparatuses, the transport unit includes a hand for transporting a large substrate capable of at least a predetermined angle θ rotational movement, a predetermined height direction (Z direction) movement, and a one-way expansion / contraction movement. It is characterized by comprising a robot, and the hand has a plurality of plate portions arranged in parallel to each other in the longitudinal direction, and a large substrate is mounted on the plurality of plate portions, The XY stage is provided with a notch groove for allowing the plate portion of the robot hand to pass through in a horizontal state on the surface portion of the XY stage. A large substrate is mounted on the XY stage together with the cassette so that it fits into the notch groove from the upper surface side, and the plate portion is passed along the notch groove in a horizontal state, separated from the XY stage, and then on the XY stage. Cassette In addition, the plate portion of the hand is horizontally passed along the notch groove and sent to the XY stage, and the plate portion is transferred to the upper surface side of the XY stage with the large substrate together with the cassette. The large substrate is taken out together with the cassette from the XY stage by lifting.
In addition, any one of the above-described exposure apparatuses is a proximity exposure type exposure apparatus.
Further, in any of the above exposure apparatuses, the large substrate for the display panel is
It is a substrate for forming a color filter.
Here, “convey at a position close to the XY stage surface” means that the large substrate is transported at a position close to the XY stage surface with little vertical movement for each cassette.
In addition, the predetermined angle θ and the predetermined height in “at least a predetermined angle θ can be rotated and moved in the predetermined height direction (Z direction)” mean a rotation driving angle and a vertical movement distance necessary for conveyance. To do.

The exposure method of the present invention is an exposure method for a large substrate for a display panel, in which the exposure is performed with the large substrate placed on the XY stage together with the cassette, and the large substrate is placed on the cassette at the front stage of the XY stage. A substrate is mounted, a large substrate together with the cassette is placed on the XY stage from the front part of the XY stage, exposure is performed, and the large substrate together with the cassette is taken out from the XY stage to the rear part of the XY stage, and the XY stage. The large substrate is transported in a horizontal state together with the cassette from the front stage to the XY stage and from the XY stage to the rear stage of the XY stage.
In the above exposure method, the large substrate for each cassette is transported at a position close to the XY stage surface from the XY stage front part to the XY stage and from the XY stage to the XY stage rear part. It is what.
In any one of the above exposure methods, the transport movement is performed by roller transport (roller conveyor).
Alternatively, the exposure method according to any one of claims 9 to 10, wherein at least a predetermined angle θ rotation movement, a predetermined height direction (Z direction) movement, and a one-way telescopic movement are possible. Using the transfer robot, wherein the hand has a plurality of plate portions arranged in parallel with each other in the longitudinal direction, and a large substrate is mounted on the plurality of plate portions, and The XY stage having a notch groove for passing the plate portion of the substrate mounting hand in a horizontal state on the surface portion thereof is used for the transfer movement, and the plate portion of the hand is attached to the XY stage. A large substrate is mounted on the XY stage together with the cassette so that it fits into the notch groove from the upper surface side, the plate portion is passed along the notch groove in a horizontal state, separated from the XY stage, and placed on the XY stage. A large substrate is mounted for each set, and the plate portion of the hand is horizontally passed along the notch groove and sent to the XY stage, and the plate portion is transferred to the upper surface side of the XY stage along with the cassette. And a large substrate is taken out from the XY stage together with the cassette.
In addition, any one of the above exposure methods is a proximity exposure type exposure method.
In any one of the above exposure methods, the large substrate for the display panel is a substrate for forming a color filter.

(Function)
The exposure apparatus of the present invention is an exposure apparatus that performs exposure processing in a photolithographic process of a large substrate for a flat display panel used in a flat display device, and provides an exposure apparatus with high production efficiency. It is possible.
By operating the entire cassette, it is possible to reduce the time spent for handling a large substrate on the XY stage.
Also, the surface of the cassette itself on the large substrate side does not require extra uneven patterns such as nicks and roller holes, and the unevenness due to the uneven shape of the stage during exposure should be extremely small. It is supposed to be possible.
Specifically, a cassette for performing exposure processing and transport with a large substrate mounted thereon, and an exposure unit (exposure machine main body) having an XY stage for performing exposure with the large substrate placed together with the cassette XY stage front stage for placing a large substrate mounted on a cassette before mounting on the XY stage, and XY stage rear stage for placing a large substrate mounted on the cassette taken out from the XY stage, , A carry-in means for mounting the large substrate on the cassette at the front part of the XY stage, a carry-out means for taking out the large substrate from the cassette at the rear part of the XY stage, and an XY stage from the front part of the XY stage. And a transfer unit for transferring the large substrate in a horizontal state together with the cassette from the XY stage to the latter stage of the XY stage, The large substrate is mounted on the cassette at the front stage portion of the XY stage, and the large substrate is placed on the XY stage from the front stage portion of the XY stage by the transport unit, and exposure is performed. This is achieved by taking out the large substrate from the XY stage to the rear stage of the XY stage and carrying out the large substrate from the cassette at the rear stage of the XY stage by the carry-out means.
Specifically, a large substrate is mounted on the cassette at the front stage of the XY stage by the loading means, and a large substrate is placed on the XY stage together with the cassette from the front stage of the XY stage by the transport unit, and exposure is performed. The large substrate is taken out from the XY stage to the rear stage portion of the XY stage, and the large substrate is unloaded from the cassette at the rear stage portion of the XY stage by the unloading means. It is possible to efficiently take out a large substrate from each cassette. In addition, the cassette and the large substrate can be adjusted at the front stage of the XY stage, and it is possible to substantially set up the exposure work.
For example, at least three or more cassettes are used, and in parallel with the exposure process in the exposure unit in the XY stage, the mounting process of the large substrate in the front stage part of the XY stage, the cassette of the large board in the rear stage part of the XY stage As a result, the exposure work can be set up outside.
As a result, it is possible to provide an exposure apparatus that can efficiently perform exposure processing on a large substrate.
In particular, the transport unit transports the XY stage from the front stage to the XY stage and from the XY stage to the back stage of the XY stage at a position close to the XY stage surface. It is possible to more efficiently mount large substrates for each cassette on the stage and take out large substrates for each cassette from the XY stage.

  As the carry-in means and the carry-out means, the form of claim 3 using a transfer robot having a large substrate transfer hand that can move at least a predetermined angle θ rotational movement and a predetermined height direction (Z direction) can be mentioned.

By adopting the form of the invention of claim 4 that uses a roller transport unit (roller conveyor) as the transport unit, the large-sized substrate for each cassette is mounted on the XY stage without being substantially affected by the size and weight of the large substrate. It is possible to efficiently take out a large substrate for each cassette from the XY stage.
That is, in the case of this form, in the sixth generation (for example, 1500 mm × 1800 mm) and later, it is possible to cope with an increase in the size of the substrate and to achieve an efficient exposure process.
In the case of this form, mounting of a large substrate for each cassette on the XY stage and removal of a large substrate for each cassette from the XY stage can be performed simultaneously, mounting of the large substrate on the XY stage, and large size from the XY stage. The time required for taking out the substrate can be shortened.
In particular, it is possible to shorten the lift pin ascending / descending time on the XY stage for exposure, which has conventionally caused a decrease in tact efficiency.

The invention according to claim 5, wherein the transfer unit includes a transfer robot having a large substrate transfer hand capable of at least a predetermined angle θ rotational movement, a predetermined height direction (Z direction) movement, and a one-way expansion / contraction movement. Can be mentioned.
More specifically, the hand has a plurality of plate portions arranged in parallel with each other in the longitudinal direction, and a large substrate is mounted on the plurality of plate portions. In addition, the XY stage includes: The surface portion is provided with a notch groove for allowing the plate portion of the robot hand to pass through in a horizontal state, and the transfer portion has the hand plate portion formed as a notch groove from the upper surface side of the XY stage. The large substrate is mounted on the XY stage so as to fit the cassette, the plate portion is horizontally passed along the notch groove, separated from the XY stage, and the large substrate for each cassette on the XY stage. Mounting, and passing the plate portion of the hand horizontally along the notch groove and feeding it to the XY stage, lifting the large substrate together with the cassette to the upper surface side of the XY stage, the XY stage From casserole Taken out every large substrate preparative include those in the form of the invention of claim 6.
In this case as well, as in the case of the invention of claim 4, the lift pin ascending / descending time in the XY stage for exposure, which has been the cause of the decrease in tact efficiency, can be shortened. The time required for taking out can be shortened.
An exposure apparatus includes a proximity exposure system.
A large substrate for a display panel includes a substrate for forming a color filter.

  The exposure method of the present invention can provide an exposure method capable of increasing the production efficiency of the exposure process of the photolithography process of a large substrate for a flat display panel used in a flat display device by adopting such a configuration. .

As described above, the present invention is an exposure apparatus that performs exposure processing in a photolithography process of a large substrate for a flat display panel used in a flat display device, and can provide an exposure apparatus and an exposure method with high production efficiency.
In addition, by operating the entire cassette, it has become possible to minimize the unevenness caused by the uneven shape of the stage during exposure, which has been a problem in the past.

Embodiments of the present invention will be described with reference to the drawings.
FIG. 1 is a schematic block diagram of a first example of an embodiment of the exposure apparatus of the present invention, FIG. 2 is a schematic block diagram of a second example of the embodiment of the exposure apparatus of the present invention, and FIG. FIG. 4 is a diagram showing a cross section of a cassette provided for the exposure apparatus of the invention, and FIG. 4 is a schematic block diagram of a modification of the exposure apparatus shown in FIG.
1 to 5, 100 is an exposure unit (also referred to as an exposure apparatus main body), 110 is an XY stage, 111 is a roller transport unit, 116 is a convex part (also referred to as a fitting convex part), 120 is a front stage part of the XY stage, 121 is a roller conveyance unit, 125 is a lift pin, 126 is a convex portion (also referred to as a fitting convex portion), 130 is an XY stage rear stage portion, 131 is a roller conveying portion, 135 is a lift pin, 136 is a convex portion (also called a fitting convex portion) 140 is a cassette, 145 is a vacuum drawing hole, 146 is a recess (also referred to as a fitting recess), 147 is a pipe, 148 is a buffer tank, 149 is a check valve, and 150 is a large substrate (also referred to as a processing substrate). , 170 is a loading means (also referred to as a loading robot), 171 is a hand, 180 is a loading means (unloading robot), 181 is a hand, 190A is a conveying means (also referred to as a conveying robot), 191A Hand, 196A is a fitting part (also called a fitting convex part), 190B is a conveying means (also called a conveying robot), 191B is a hand, 196B is a fitting part (also called a fitting convex part), 210 is an XY stage, 211 is a fitting portion (also referred to as a fitting convex portion), 213 is a notch groove, 220 is a front stage portion of an XY stage, 221 is a fitting portion (also referred to as a fitting convex portion), 225 is a lift pin, and 227 is an (XY stage) The pedestal (at the front stage), 230 is the rear stage part of the XY stage, 237 is the base (at the rear stage part of the XY stage), 240 is the cassette, 246 is the fitting part (also referred to as the fitting concave part), and 250 is the large substrate (both the processing substrate) 270 is a carrying means (also called a carrying robot), 271 is a hand, 275 is a roller, 276 is a shaft part, 277 is a lift pin, 280 is a carrying means (carrying robot), 281 is a hand, 2 5 rollers, 286 shaft portion 287 lift pins 290 (also referred to as the transport robot) conveying unit, 291 hand, 296 is an engaging portion (also referred to as a fitting convex portion).
In FIG. 1, P1 to P5 indicate positions.
The dotted line arrow indicates the traveling direction of the large substrate, and the double line arrow indicates the traveling direction of the cassette.

First, a first example of the embodiment of the exposure apparatus of the present invention will be described with reference to FIG.
The exposure apparatus of the first example is an exposure apparatus that performs exposure processing of a photolithography process of a large substrate for a flat display panel, and is an exposure apparatus that performs exposure processing of a large substrate for a display panel, and includes a large substrate 150. An exposure unit (exposure machine main body) having a plurality of (five) cassettes 140 for performing exposure processing and conveyance in the prepared state, and an XY stage 110 for performing exposure in a state where the large substrate 150 is placed together with the cassette 140. 100, an XY stage front stage 120 for placing a large substrate 150 mounted on the cassette 140 before mounting on the XY stage 110, and a large substrate 150 mounted on the cassette 140 taken out from the XY stage 110. An XY stage rear stage 130 for placement is arranged, and the large substrate 150 is separated by the XY stage front stage 120. Loading means 170 for mounting on the stage 140, unloading means 180 for taking out the large substrate 150 from the cassette 140 at the XY stage rear stage 130, the XY stage front stage 120, the XY stage 110, and the XY stage rear stage 130 A transport unit composed of roller transport units 121, 111, and 131 is provided for transporting the cassette 140 in a horizontal state at a position close to the XY stage surface.
Then, a large substrate 150 is mounted on the cassette 140 in the XY stage front stage 120 by the loading means 170, and the large substrate 150 together with the cassette 140 is transferred from the XY stage front stage 120 by the transport unit including the roller transport units 121, 111, and 131. Is placed on the XY stage 110 for exposure, and the large substrate 150 together with the cassette 140 is taken out from the XY stage 110 to the rear stage portion 130 of the XY stage. 150 is carried out.
The exposure unit (also referred to as exposure apparatus main body) 100 includes, for example, a proximity exposure type exposure unit, but is not limited thereto.

  In this example, the carry-in means 170 and the carry-out means 180 are both transport robots having large substrate transport hands 171 and 181 that can move at least a predetermined angle θ rotation and a predetermined height direction (Z direction). Become.

In this example, the conveyance unit connects roller conveyance units (also referred to as roller conveyors) 121 and 111, and the large substrate 150 together with the cassette 140 from the XY stage front stage unit 120 is placed on the XY stage 110 and exposed. Thereafter, the roller transport units 111 and 131 are connected, and the large substrate 150 together with the cassette 140 is taken out from the XY stage 110 to the rear stage unit XY stage by roller transport.
The upper surfaces of the roller transport units (also referred to as roller conveyors) 121, 111, and 131 are arranged almost horizontally and at positions close to the XY stage surface.
The positioning of the cassette 140 on the XY stage 110 is performed by a concave portion 146 provided at the bottom of the cassette 140 and a convex portion (not shown) provided on the XY stage 110.
The exposure apparatus of this example performs exposure processing of a photolithography process of a large substrate for a flat display panel used in a flat display device by adopting a configuration in which the large substrate 140 is conveyed and exposed together with such a cassette 140. Therefore, it is possible to increase production efficiency (exposure efficiency).
Then, by exposing the large substrate 150 together with the cassette 140, the surface of the cassette itself on the large substrate side does not require an extra uneven pattern such as a scraper or a hole in the roller, and the stage of the stage at the time of exposure. Unevenness caused by the uneven shape can be made extremely small.
Further, in this example, as in the prior art (see FIG. 5), the processing substrate is transferred to the XY stage for exposure and the processing substrate is transferred from the XY stage by the double arm of the transfer robot. It is possible to physically cope with the sixth generation (for example, 1500 mm × 1800 mm) or later, instead of the above-mentioned conveyance.

As the cassette 140, for example, as shown in FIG.
Note that FIG. 3 does not show a concave portion (146 in FIG. 1) for fitting with a convex portion provided on the XY stage 110 side for positioning with the XY stage 110.
It is sufficient to suppress the displacement of the large substrate 150 due to the movement of the position, and the check valve 149 and the buffer tank 148 are used.
The cassette 140 itself can also be flattened by vacuum suction on the XY stage 110.
At this time, if the large substrate 150 is also vacuum-sucked at the same time, the large substrate 150 can be adapted to the XY stage 110.
The cassette 140 is temperature-controlled to the same temperature as the large substrate 150 before mounting the substrate.
After that, ambient temperature control is performed so that the temperature can be kept constant.
The cassette surface with which the large substrate 150 comes into contact may be of Kenzan type, but may be solid in terms of temperature transmission.
Further, a cleaning mechanism for the upper surface of the cassette may be provided between P4 and P5 in order to prevent foreign matter from adhering to the cassette 140.
The material of the cassette 140 can be freely selected by comprehensively judging stone, ceramic, aluminum and the like.

The exposure operation of the exposure apparatus of this example will be briefly described below.
This is an example of the embodiment of the exposure method of the present invention.
In this example, the large substrate 150 is first mounted on the cassette 140 of the pre-stage portion XY stage 120 by the loading means 170.
In mounting on the cassette 140, the plurality of lift pins 125 are lifted from the lower side to release the hand 171 in a state where the large substrate 150 is lifted from the hand 171, and then the plurality of lift pins 125 are lowered to be placed on the roller transport unit 121. This is performed by placing a large substrate 150 thereon.
Next, roller transport units (also referred to as roller conveyors) 121 and 111 are connected, and the large substrate 150 together with the cassette 140 is placed on the XY stage 110 from the XY stage front stage 120.
The positioning of the cassette on the XY stage 110 is performed by fitting a recess 146 provided at the bottom of the cassette 140 and a protrusion 116 provided on the XY stage 110.
Next, exposure is performed with the large substrate 150 fixed on the XY stage 110.
After the exposure, the concave portion 148 and the convex portion provided on the XY stage 110 are disengaged, the roller transport portions 111 and 131 are connected, and the large substrate 150 together with the cassette 140 is transferred from the XY stage 110 to the XY stage by roller transport. Take out to the rear stage 130.
Next, the large-sized substrate 150 is taken out from the cassette 140 of the rear stage part XY stage 130 by the unloading means 180.
The large substrate 150 is removed from the cassette 140 by inserting the hand 181 into the gap between the large substrate 150 and the cassette 140 in a state where the large substrate 150 is lifted from the cassette 140 by raising a plurality of lift pins 135 from below. The lift pins 125 are lowered and the large substrate 150 is placed on the hand 181.
The large substrate is placed on the hand 171 of the carry-in means 170 from the transport line before the exposure apparatus by the carry-in means 170, for example, in the same manner as the large-size substrate 150 is taken out from the cassette 140, and the exposure apparatus is followed. The large substrate 150 is placed on the transfer line 180 from the carry-out means 180, for example, by the carry-in means 170, as described above, in the same manner as the loading on the cassette 140 on the XY stage front stage 120.
As described above, as described above, a method of placing and taking out a large substrate alone or a large substrate for each cassette using a lift pin in each part is called a lift pin method.
On the other hand, the five cassettes 140 are respectively conveyed at positions P1, P2, P3, P4, and P5 in order, and are supplied to P1 again.
The cassette 140 is transported between P1 and P3 with the large substrate 150 mounted thereon, and is transported from P3 to P4 to P5 to P1 without mounting the large substrate 150.
By mounting and transporting the large substrate 150 on the cassette 140 at each of the positions P1, P2, and P3, the external setup of the exposure work can be performed at the positions P1 and P3.
The outer setup work may be completed before the exposure of the large substrate 150 is completed.
As a transport method for transporting between P1 and P3, roller transport is used in this example, but is not limited thereto.
A simple and inexpensive transport method such as shuttle transport may be selected.
In this example, delivery of the large substrate 150 by the carry-in means 170 and the carry-out means 180 can be performed without interfering with the exposure unit 100.
In addition, it is not limited to the delivery of the lift pin system of the large sized board | substrate 150 by use of the rollers 121, 111, 131 of this example.
For example, if the cassette is processed into a claw, it can be freely transferred by shuttle transport.
When the shuttle transport method is selected, the cassette 140 may be created for each large substrate size and have a dedicated grip groove.

As a modification of the first example, for example, an exposure apparatus configured as shown in FIG. In the modified example, the transfer robot 190A is used to transfer between the XY stage front stage 120 and the XY stage 110 without using the roller transfer units 121, 111, and 131, and the transfer robot 190B is used to transfer the XY stage. 110, transport between the XY stage rear stage 130.
In the first example, the modified example has a configuration in which the set of roller transport units 121 and 111 is replaced with a transfer robot 190A, and the set of roller transfer units 111 and 131 is replaced with a transfer robot 190B. Basically, it is the same as the first example, and the description is omitted.
A total of two transfer robots are used to mount the processing substrate 150 on the XY stage 110 and to remove the processing substrate 150 from the XY stage 110.
Other than that, it is the same as the first example and will not be described.
Also in the case of the exposure apparatus of this example, as in the first example, by adopting a configuration in which such a cassette is transported and exposed, exposure processing in a photolithography process of a large substrate for a flat display panel used in a flat display device In the exposure apparatus that performs the above, production efficiency (exposure efficiency) can be increased, and unevenness caused by unevenness on the XY stage surface can be extremely reduced.
In the case of the modification, it is possible to cope with an increase in the size of the processing substrate as compared with the case of the conventional exposure apparatus shown in FIG.
Note that the transfer robots 190A and 190B of the modified example are both lift pin systems.

Next, a second example of the embodiment of the exposure apparatus of the present invention will be described with reference to FIG.
Similarly to the first example, the exposure apparatus of the second example is an exposure apparatus that performs an exposure process in a photolithography process of a large substrate for a flat display panel, and performs exposure with the large substrate 250 mounted on the cassette 240 together. XY stage 210 for mounting, XY stage front stage 220 for placing large substrate 250 mounted on cassette 240 before mounting on XY stage 210, and cassette 240 taken out from XY stage 210 An XY stage rear stage 230 for arranging the large substrate 250 is arranged, and a carrying-in means 270 for mounting the large substrate 250 on the cassette 240 at the XY stage front stage 220 and a large substrate at the XY stage rear stage 230. Unloading means 280 for removing 250 from the cassette 240, XY stage front stage 220, XY stage The cassette 240 is in a horizontal state across the stage 210 and the rear stage 230 of the XY stage, and is transported at a position close to the XY stage surface. At least a predetermined angle θ rotational movement, a predetermined height direction (Z direction) movement, and a one-way extension movement A transfer unit 290 including a single transfer robot having a large substrate transfer hand is provided.
Although not explicitly shown in FIG. 2, the transfer robot 290 of this example includes an upper hand and a lower hand, as in the case of the transfer robot 380 shown in FIG. In the same manner as the transfer robot shown in FIG. 1, the upper-stage hand is used to transfer the unexposed processing substrate, and the lower-stage hand is used to transfer the exposed processing substrate.

In the second example, the hand 291 (both the upper hand and the lower hand) of the transport unit 290 has a plurality of plate portions arranged in parallel with each other in the longitudinal direction, and the plurality of plate portions are arranged on the plurality of plate portions. The XY stage 210 is provided with a notch groove 213 for allowing the plate portion of the hand 291 to pass through in a horizontal state.
In this example, the cassette 240 is transported in a horizontal state near the XY stage surface across the XY stage front stage 220, XY stage 210, and XY stage rear stage 230, and the entire cassette is transported and exposed. In an exposure apparatus that performs exposure processing in a photolithographic process of a large substrate for a flat display panel used in a flat display device, production efficiency can be increased.
Of course, by exposing the entire cassette, the surface on the large substrate side of the cassette itself does not require an extra uneven pattern such as scraping or a hole in the roller, and is caused by the uneven shape of the stage during exposure. Unevenness can be extremely small.
In this example, the transfer robot 290 mounts the large substrate 250 together with the cassette 240 on the XY stage 210 so that the plate portion of the upper hand fits into the notch groove 213 from the upper surface side of the XY stage. The plate portion is passed along the notch groove 1213 in a horizontal state and separated from the XY stage 210, and the large substrate 250 for each cassette 240 is mounted on the XY stage 210.
Further, the plate part of the lower hand is passed through the notch groove 213 in a horizontal state and sent to the XY stage 210, and the large substrate 250 is lifted together with the cassette 240 to the upper surface side of the XY stage 210. The large substrate 250 is taken out from the XY stage 210 together with the cassette 240.

Here, the operation of the second example will be further simplified below.
In the second exposure apparatus, first, the large substrate 250 is mounted on the cassette 240 of the XY stage front stage 220 from the production line side by the carry-in robot 270 by the lift pin method.
Next, the cassette 240 and the large substrate 250 are placed on the XY stage 210 from the front stage 220 of the XY stage by the upper stage hand of the transfer robot 290.
Next, exposure is performed with the large substrate 250 fixed on the XY stage 210.
After the exposure, the XY stage 210 is taken out of the XY stage 210 from the XY stage 210 to the rear stage 230 of the XY stage by using the lower hand of the transfer robot 290 together with the cassette 240.
As described above, the transfer robot 290 mounts the large substrate 250 together with the cassette 240 on the XY stage 210 so that the plate portion of the upper hand fits into the notch groove 213 from the upper surface side of the XY stage. The plate portion is passed along the notch groove 1213 in a horizontal state and separated from the XY stage 210, and the large substrate 250 for each cassette 240 is mounted on the XY stage 210.
Further, the plate part of the lower hand is passed through the notch groove 213 in a horizontal state and sent to the XY stage 210. The plate part is lifted together with the cassette 240 to the upper surface side of the XY stage 210, The large substrate 250 is taken out from the XY stage 210 together with the cassette 240.
Next, the large-sized substrate 250 is taken out from the cassette 240 of the XY stage rear stage 230 by the carry-out robot 280 and transferred to the subsequent production line.
The large substrate 250 is removed from the cassette 240 by a lift pin method.
On the other hand, the cassette 240 from which the large substrate 250 of the XY stage rear stage 230 is taken out is transported to the XY stage front stage 220 side, and is again supplied to transport the large substrate 250.
Also in the exposure apparatus of this example, if the outer setup work is completed before the exposure of the large substrate 250 is completed, the efficiency is improved.

It is a schematic block diagram of the 1st example of embodiment of the exposure apparatus of this invention. It is a schematic block diagram of the 2nd example of embodiment of the exposure apparatus of this invention. It is the figure which showed the cross section of the cassette provided to the exposure apparatus of this invention. It is a schematic block diagram of the modification of the exposure apparatus of a 1st example. It is a schematic block diagram of the conventional exposure apparatus.

Explanation of symbols

100 exposure unit (also called exposure apparatus main body)
110 XY stage 111 roller conveyance part 116 convex part (it is also called a fitting convex part)
120 XY stage front stage part 121 roller transport part 125 lift pin 126 convex part (also called fitting convex part)
130 XY stage rear stage part 131 roller transport part 135 lift pin 136 convex part (also referred to as fitting convex part)
140 Cassette 145 Vacuum pulling hole 146 Recess (also referred to as fitting recess)
147 Piping 148 Buffer tank 149 Check valve 150 Large substrate (also called processing substrate)
170 Loading means (also called loading robot)
171 Hand 180 Unloading means (unloading robot)
181 Hand 190A Transport means (also referred to as a transport robot)
191A Hand 196A Fitting part (also called fitting convex part)
190B Transport means (also called transport robot)
191B Hand 196B Fitting part (also called fitting convex part)
210 XY stage 211 fitting part (also called fitting convex part)
213 Notch groove 220 XY stage front stage part 221 Fitting part (also called fitting convex part)
225 Lift pin 227 Base 230 of XY stage front stage XY stage rear stage 237 Base of XY stage rear stage 240 Cassette 246 Fitting part (also referred to as fitting recess)
250 Large substrate (also called processing substrate)
270 Loading means (also called loading robot)
271 Hand 275 Roller 276 Shaft 277 Lift pin 280 Unloading means (unloading robot)
281 Hand 285 Roller 286 Shaft part 287 Lift pin 290 Conveying part (also called conveying robot)
291 Hand 296 fitting part (also called fitting convex part)
300 Exposure section (also called exposure apparatus main body)
310 XY stage 311 support part 315 lift pin 320 XY stage front part (plate base)
325 Lift pin 330 Precision alignment plate base 335 Lift pin 336 Alignment pin 350 Panel substrate (also called processing substrate)
350a Unexposed panel substrate (processing substrate)
350b Exposed panel substrate (processing substrate)
360 Transport unit 365 Luft pin 366 Shaft unit 367 Roller 370 Carry-in robot 371 Hand 380 Transport robot 381 Lower hand 381A Hand support transport unit 382 Upper hand 382A Hand support transport unit

Claims (14)

  An exposure apparatus for performing exposure processing of a large substrate for a display panel, for performing exposure processing in a state in which the large substrate is mounted, and a cassette for performing exposure processing and transport, and a large substrate mounted together with the cassette. An exposure unit (exposure machine main body) having an XY stage, an XY stage front stage part for placing a large substrate mounted on the cassette before mounting on the XY stage, and a cassette taken out from the XY stage. An XY stage rear stage for placing a large substrate is arranged, and a loading means for mounting the large substrate on the cassette at the front stage of the XY stage, and the large substrate is taken out from the cassette at the rear stage of the XY stage. A large substrate together with the cassette from the XY stage front stage to the XY stage, and from the XY stage to the rear stage of the XY stage. A large-sized substrate mounted on the cassette at the front stage of the XY stage by the carry-in means, and the large-sized substrate together with the cassette from the front stage of the XY stage is moved by the transport unit to the XY stage. It is placed on the substrate, exposed, the large substrate together with the cassette is taken out from the XY stage to the rear stage of the XY stage, and the large substrate is carried out from the cassette at the rear stage of the XY stage by the unloading means. Exposure equipment to do.   The exposure apparatus according to claim 1, wherein the transport unit transports from the XY stage front stage part to the XY stage and from the XY stage to the XY stage back stage part at a position close to the XY stage surface. An exposure apparatus.   3. The exposure apparatus according to claim 1, wherein each of the carry-in means and the carry-out means is capable of at least a predetermined angle θ rotation movement and a predetermined height direction (Z direction) movement. An exposure apparatus comprising a transfer robot having a hand for transferring a large substrate.   4. The exposure apparatus according to claim 1, wherein the transport unit is a roller transport unit (roller conveyor).   4. The exposure apparatus according to claim 1, wherein the transport unit is capable of at least a predetermined angle θ rotational movement, a predetermined height direction (Z direction) movement, and a one-way expansion and contraction movement. 5. An exposure apparatus comprising a transfer robot having a transfer hand.   6. The exposure apparatus according to claim 5, wherein the hand has a plurality of plate portions arranged in parallel with each other in the longitudinal direction, and a large substrate is mounted on the plurality of plate portions. The XY stage is provided with a notch groove for allowing the plate portion of the robot hand to pass through in a horizontal state on the surface portion of the XY stage. A large substrate is mounted on the XY stage together with the cassette so that it fits into the notch groove from the upper surface side, and the plate portion is passed along the notch groove in a horizontal state, separated from the XY stage, and then on the XY stage. A large substrate is mounted for each cassette, and the plate portion of the hand is horizontally passed along the notch groove and sent to the XY stage. The plate portion is transferred to the upper surface side of the XY stage with the large cassette. Lift the board Exposure apparatus characterized by the XY stage is intended to take out the large substrate per cassette.   7. The exposure apparatus according to claim 1, wherein the exposure apparatus is a proximity exposure type exposure apparatus.   8. The exposure apparatus according to claim 1, wherein the large substrate for the display panel is a substrate for forming a color filter.   A method for exposing a large substrate for a display panel, wherein the exposure is performed with the large substrate placed on the XY stage together with the cassette. The large substrate is mounted on the cassette at the front stage of the XY stage, and the XY Place the large substrate with the cassette on the XY stage from the front stage of the stage, perform exposure, take out the large substrate with the cassette from the XY stage to the rear stage of the XY stage, and from the front stage of the XY stage to the XY stage, An exposure method characterized in that the large substrate is transported in a horizontal state together with the cassette from the XY stage to the rear stage of the XY stage.   10. The exposure method according to claim 9, wherein the transfer of the large substrate for each cassette from the XY stage front part to the XY stage and from the XY stage to the XY stage rear part is performed at a position close to the XY stage surface. An exposure method characterized by the above.   The exposure method according to claim 9, wherein the transport movement is performed by a roller transport (roller conveyor).   11. The exposure method according to any one of claims 9 to 10, wherein the hand for carrying a large substrate capable of at least a predetermined angle θ rotation movement, a predetermined height direction (Z direction) movement, and a one-way expansion / contraction movement. Using the transfer robot, wherein the hand has a plurality of plate portions arranged in parallel with each other in the longitudinal direction, and a large substrate is mounted on the plurality of plate portions, and The XY stage having a notch groove for passing the plate portion of the substrate mounting hand in a horizontal state on the surface portion thereof is used for the transfer movement, and the plate portion of the hand is attached to the XY stage. A large substrate is mounted on the XY stage together with the cassette so that it fits into the notch groove from the upper surface side, the plate portion is passed along the notch groove in a horizontal state, separated from the XY stage, and placed on the XY stage. cassette In addition, the plate portion of the hand is horizontally passed along the notch groove and sent to the XY stage, and the plate portion is transferred to the upper surface side of the XY stage with the large substrate together with the cassette. An exposure method comprising lifting and taking out a large substrate together with a cassette from an XY stage.   The exposure method according to any one of claims 9 to 12, wherein the exposure method is a proximity exposure method. 14. The exposure method according to claim 9, wherein the large substrate for the display panel is a substrate for forming a color filter.

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