JP2006189898A - Display device - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To propose a configuration with an auxiliary capacity and a light shielding film or a shielding pattern in an active matrix display used for a projector. <P>SOLUTION: The display uses a pixel matrix circuit having thin film transistors, has a first insulation film, first and second electrodes, a silicon nitride film and an electrode pattern sequentially formed on the thin-film transistor, a second insulation film formed on the silicon nitride film and the electrode pattern, the light shielding film sequentially formed on the second insulation film, a third insulation film, and a pixel electrode formed on the third insulation film and connected to the first electrode. The capacity is formed by the first electrode, the silicon nitride film and the electrode pattern. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

  The invention disclosed in this specification relates to a configuration of a reflective liquid crystal display device in which peripheral drive circuits are integrated.

  There is known a structure in which an active matrix circuit in which a TFT is arranged in each pixel and a peripheral driving circuit for driving the circuit are integrated on the same substrate. This configuration is referred to as a peripheral drive circuit integrated active matrix display.

  Until now, the peripheral drive circuit has generally been composed of a circuit represented by a shift register and a bunfer circuit for supplying a signal to the active matrix circuit.

  However, as a future technology trend, a circuit that can handle image information, various timing signals, etc. (previously configured with an external IC) is also configured with TFTs, and the peripheral drive circuit is on the same substrate as the active matrix circuit. It is thought that the tendency to accumulate will progress.

  The active matrix circuit basically has a structure in which source lines and gate lines are arranged in a lattice pattern, and TFTs are arranged near the intersections.

  On the other hand, although the peripheral drive circuit is based on a CMOS circuit, it is expected that the circuit configuration will become increasingly complex in the future.

  In such a configuration, it is necessary to use multilayer wiring in order to reduce the occupied area.

  However, forming a new layer to form a multilayer wiring has a problem in that the manufacturing process becomes complicated.

  An object of the invention disclosed in this specification is to provide a configuration that more easily realizes multilayer wiring required for a peripheral drive circuit in an integrated structure of an active matrix circuit and a peripheral drive circuit.

  The invention disclosed in this specification focuses on a reflective liquid crystal display device. A reflective liquid crystal display device uses a metal electrode as a reflective electrode. For example, a material mainly composed of aluminum is used.

  The invention disclosed in this specification focuses on the material of the reflective electrode. That is, with the material constituting the pixel electrode, the wiring arranged in the peripheral drive circuit is formed simultaneously with the formation of the pixel electrode.

  By doing so, it is possible to form a multilayer wiring required for the peripheral driving circuit without increasing the manufacturing process (the pattern becomes complicated).

  Since the reflective electrode can be made of a low resistance material such as aluminum, it is suitable for forming the wiring of the peripheral drive circuit.

  Note that in a transmissive liquid crystal display device, a material having a relatively high resistance, such as ITO, is used for the pixel electrode. Therefore, it is not preferable to use the invention disclosed in this specification.

  In addition, the peripheral drive circuit in this specification includes a circuit that generates various timing signals, a circuit that handles image information, a circuit that handles image information, and various memory circuits in addition to a circuit that directly drives an active matrix circuit such as a shift register circuit and a buffer circuit. And arithmetic circuits.

One of the inventions disclosed in this specification is:
An active matrix circuit;
A peripheral circuit including at least a circuit for driving the active matrix circuit;
Has a structure composed of thin film transistors on the same substrate,
The active matrix circuit is provided with reflective pixel electrodes arranged in a matrix,
The wiring of the peripheral circuit is formed of the same material as the reflective pixel electrode.

  In the above structure, the active matrix circuit can be exemplified by a structure in which thin film transistors are arranged in the vicinity of intersections of source lines and gate lines arranged in a lattice pattern, and the drains of the thin film transistors are arranged in pixel electrodes.

  Peripheral circuits include a shift register circuit, an analog switch, a peripheral drive circuit that is usually called a buffer, and a circuit equipped with an oscillation circuit, a circuit that handles image information, a memory circuit, etc. it can.

  As a future technical trend, it is considered that a peripheral circuit having various functions is required. Therefore, the peripheral circuits in this specification include not only a circuit for driving an active matrix circuit but also a circuit having various functions such as a system on panel.

  As a type of the thin film transistor, a top gate type, a bottom gate type, or a multi-gate type in which a large number of TFTs are equivalently connected in series can be used.

  As a material constituting the reflective electrode, it is preferable to use a material having a high reflectivity represented by aluminum and a low resistance.

  For example, in the case of the VGA standard (640 pixels × 480 pixels), if the screen is rewritten 60 times per second in the circuit on the horizontal scanning side (the peripheral driver circuit side on the source line side), 640 × 480 × 60 = 18.5 MHz Operating speed is required.

  In the case of the XGA standard (1024 pixels × 768 pixels), an operation speed of 1024 × 768 × 60 = 47 MHz is required.

  In such a case, it is preferable to employ a wiring having a low resistance as much as possible in the peripheral drive circuit. Therefore, in such a case, the invention disclosed in this specification is extremely useful.

  The wiring of the peripheral circuit is formed of the same material as that of the reflective pixel electrode. As shown in a specific example in FIG. 6, when the pixel electrode 141 is configured, the peripheral circuit is formed of the same material. Forming the wiring 142.

  This is realized by simultaneously forming the pattern of the pixel electrode 141 and the pattern of the wiring 142 when patterning a conductive film (not shown) constituting the pixel electrode when forming the pixel electrode 141.

  Whether they were formed at the same time was taken by taking an electron micrograph of the cross section, whether the pixel electrode and the wiring existed on the same layer, whether the film thickness was the same, and the same material by impurity measurement etc. It can be determined by measuring whether or not.

  By utilizing the invention disclosed in this specification, a multilayer wiring required for the peripheral drive circuit can be more easily realized in an integrated structure of the active matrix circuit and the peripheral drive circuit.

  As shown in FIG. 6, in the reflective liquid crystal panel, the wiring 142 of the peripheral circuit is formed simultaneously with the formation of the reflective electrode 141 arranged in the pixel matrix.

  Thus, wirings forming the peripheral circuit can be provided in a separate process, and the manufacturing process and the configuration can be simplified.

  Furthermore, since the reflective electrode can be made of a metal material having a low resistance, the peripheral drive wiring formed simultaneously can also be formed with a low resistance.

  1 to 7 show an outline of manufacturing steps of this embodiment. Here, an example is shown in which, in a reflective active matrix liquid crystal display device, an N-channel TFT disposed in a pixel matrix circuit and a CMOS circuit constituting a peripheral driver circuit are manufactured at the same time.

  First, a glass substrate (or quartz substrate) 101 is prepared as shown in FIG. When the flatness of the substrate is poor, it is preferable to form a silicon oxide film or a silicon oxynitride film on the surface.

  In general, a substrate having an insulating surface can be used as the substrate. As a substrate having an insulating surface, a glass substrate, a quartz substrate, a substrate in which an insulating film such as a silicon oxide film is formed on the surface of a glass substrate or a quartz substrate, or an oxide film is formed on the surface of a semiconductor substrate such as a silicon wafer And the like.

  When the substrate 101 is prepared, an amorphous silicon film (not shown) is formed to a thickness of 50 nm on the surface by low pressure CVD.

  Next, the amorphous silicon film is crystallized by heat treatment to obtain a crystalline silicon film. As a crystallization method, laser light irradiation or strong light irradiation may be used.

  Next, by patterning the obtained crystalline silicon film, island-shaped patterns indicated by 102, 103, and 104 are obtained. This island-shaped pattern becomes the active layer of the TFT.

  Here, reference numeral 102 denotes an active layer of an N-channel TFT (referred to as NTFT) disposed in the pixel matrix circuit. Reference numeral 103 denotes an active layer of a P-channel TFT (referred to as PTFT) constituting a CMOS circuit constituting a peripheral driver circuit. Reference numeral 104 denotes an active layer of an N-channel TFT (referred to as NTFT) constituting a CMOS circuit constituting a peripheral driver circuit.

  Thus, the state shown in FIG. 1 is obtained. Next, as shown in FIG. 2, a silicon oxide film 105 is formed as a gate insulating film to a thickness of 100 nm by plasma CVD.

  Further, an aluminum film is formed by sputtering to a thickness of 400 nm, and the film is further patterned to form patterns 106, 107, and 108. This pattern becomes a gate electrode (and a gate wiring extending therefrom) of each TFT.

  After the aluminum patterns 106, 107, and 108 are formed, anodic oxide films 109, 110, and 111 are formed on the surfaces thereof to a thickness of 60 nm.

  The anodic oxide film has a function of electrically insulating and protecting each aluminum pattern.

  Next, the upper part of PTFT is covered with a resist mask (not shown), and P (phosphorus) ions are doped by plasma doping.

  By doping with P (phosphorus) ions, the NTFT source region 112, channel region 113, and drain region 114 arranged in the pixel matrix are formed in a self-aligned manner. Also, the NTFT source region 120, channel region 119, and drain region 118 constituting the CMOS circuit of the peripheral driver circuit are formed in a self-aligned manner.

  Next, the resist mask covering the upper part of the PTFT is removed, and a resist mask is arranged on the upper part of the NTFT. In this state, B (boron) is further doped by plasma doping.

  In this process, the source region 115, channel region 116, and drain region 117 of the PTFT constituting the CMOS circuit of the peripheral drive circuit are formed in a self-aligned manner.

  When the doping is completed, the resist mask (not shown) is removed. Then, laser light irradiation is performed to improve the crystallinity of the region doped with impurities and to activate the dopant element.

  In this way, the state shown in FIG. 2 is obtained.

  Next, as shown in FIG. 3, a silicon oxide film 121 is formed as an interlayer insulating film to a thickness of 500 nm by plasma CVD.

  Further, contact holes are formed, and a laminated film of a titanium film, an aluminum film and a titanium film (not shown) is formed by sputtering.

  Here, the thickness of the titanium film is 100 nm and the thickness of the aluminum film is 400 nm. The titanium film functions to make good electrical contact with the semiconductor and the electrode.

  Next, by patterning the laminated film of the titanium film, the aluminum film, and the titanium film, a state as shown in FIG. 3 is obtained.

  FIG. 3 shows a laminated film pattern composed of a titanium film 122, an aluminum film 123, and a titanium film 124 that constitute the source electrode of the NTFT arranged in the pixel matrix.

  In addition, a laminated film pattern including a titanium film 125, an aluminum film 126, and a titanium film 127 constituting the drain electrode of the NTFT arranged in the pixel matrix is shown.

  Further, a laminated film pattern composed of a titanium film 128, an aluminum film 129, and a titanium film 130 constituting the source electrode of the PTFT of the CMOS circuit is shown.

  Further, a laminated film pattern composed of a titanium film 131, an aluminum film 132, and a titanium film 133 constituting the drain electrode of the PTFT of the CMOS circuit is shown.

  In addition, a laminated film pattern including a titanium film 134, an aluminum film 135, and a titanium film 136 constituting the drain electrode of the NTFT of the CMOS circuit is shown.

  A laminated film pattern composed of a titanium film 131, an aluminum film 132, and a titanium film 133 constituting the drain electrode of the NTFT of the CMOS circuit is shown.

  In this way, the state shown in FIG. 3 is obtained.

  Next, a silicon nitride film 137 shown in FIG. 4 is formed to a thickness of 50 nm by plasma CVD. This silicon nitride film 137 constitutes a dielectric film of an auxiliary capacity.

  Next, a titanium film (not shown) is formed to a thickness of 150 nm by sputtering. Then, the auxiliary capacitor electrode pattern 138 is formed by patterning this film.

  The auxiliary capacitance is configured by sandwiching a silicon nitride film 137 as a dielectric film between an electrode composed of the titanium film 122, the aluminum film 123, and the titanium film 124 and the titanium electrode 138.

  Here, since the silicon nitride film has a large dielectric constant and can be thinned, a large capacity can be obtained.

  When the size is as small as 2 inches diagonal or less like a liquid crystal panel for projection, the area of the pixel becomes small, and it is generally difficult to obtain an auxiliary capacity.

  However, the difficulty can be solved by forming a capacitor with a structure as shown in this embodiment.

  When the state shown in FIG. 4 is obtained, a polyimide resin film 139 is formed as an interlayer insulating film as shown in FIG. The film thickness of the polyimide resin film 139 is adjusted to be 1 μm at the maximum.

  In addition to polyimide, resins such as polyamide, polyimide amide, epoxy, and acrylic can be used.

  Next, a titanium film having a thickness of 150 nm is formed by sputtering, and is patterned to form a pattern indicated by 140 in FIG. This pattern functions as a shield pattern for preventing the pixel electrode and wiring formed above and the TFT and wiring disposed below from electrically interfering with each other.

  The portion above the drive circuit of the shield pattern 140 functions as a light-shielding film that prevents the peripheral drive circuit from being irradiated with light.

  Thus, the state shown in FIG. 5 is obtained. Next, contact holes are formed, and an aluminum film to be a pixel electrode is formed to a thickness of 350 nm by sputtering.

  Then, by patterning this aluminum film, the pixel electrode 141 and the wiring 142 for connecting the peripheral drive circuit and the pixel matrix TFT are formed simultaneously. (Fig. 6)

  Since the wiring 142 is formed using an aluminum film that forms the pixel electrode 141, it is not necessary to employ an independent manufacturing process. That is, it is not necessary to increase the number of steps for providing the wiring 142.

  When the state shown in FIG. 6 is obtained, an alignment film 143 made of a polyimide resin functioning as an alignment film is formed to a thickness of 150 nm as shown in FIG. Then, an alignment process is performed to complete one substrate on which a circuit composed of TFTs is formed.

  When the state shown in FIG. 7 is obtained, the other glass substrate (or quartz substrate) is prepared and bonded to the substrate (referred to as a TFT substrate) in FIG. Then, a liquid crystal is filled in the gap between the two substrates to obtain a reflective active matrix liquid crystal panel shown in FIG.

  In the liquid crystal panel shown in FIG. 8, reference numeral 147 denotes a counter substrate (a counter substrate with respect to the TFT side substrate), and 146 opposes a counter electrode made of ITO (a pixel electrode 141 provided on the TFT substrate side). Electrode).

  Reference numeral 148 denotes a sealing material (sealing material), which has a function of bonding the substrate 147 and the substrate 101 together. In addition, the liquid crystal material has a function of sealing so as not to leak to the outside.

  144 is a liquid crystal material. In the case of a reflective liquid crystal panel, display in a birefringence mode is performed. That is, the plane of polarization of light traveling in a direction perpendicular to the substrate surface in a liquid crystal molecular layer aligned in a direction parallel to the substrate changes from vertical polarization to elliptical polarization to circular polarization to elliptical polarization to horizontal polarization. Display using the phenomenon.

  In this embodiment, an example of an apparatus provided with a liquid crystal panel using the present invention is shown. Examples of such a device include a video camera, a digital still camera, a head mounted display, a car navigation system, a personal computer, a portable information terminal (mobile computer, mobile phone, etc.), and the like.

  FIG. 9A illustrates a mobile computer, which includes a main body 2001, a camera portion 2002, an image receiving portion 2003, an operation switch 2004, and a reflective liquid crystal panel 2005.

  FIG. 9B illustrates a head mounted display which includes a main body 2101, a reflective liquid crystal panel 2102, and a band portion 2103.

  FIG. 9C illustrates a front projection type liquid crystal panel. In this apparatus, light from a light source 2202 is guided to a reflective liquid crystal display device 2203 by an optical system 2204, and an image optically modulated by the reflective liquid crystal panel 2203 is enlarged by the optical system 2204 and projected onto a screen 2205. It is.

  This type of projection requires a screen 2205 separately from the main body 2201.

  FIG. 9D illustrates a mobile phone, which includes a main body 2301, an audio output portion 2302, an audio input portion 2303, a reflective liquid crystal panel 2304, operation switches 2305, and an antenna 2306.

  FIG. 9E illustrates a video camera which includes a main body 2401, a reflective liquid crystal display device 2402, an audio input portion 2403, operation switches 2404, a battery 2405, and an image receiving portion 2406.

  FIG. 9F illustrates an apparatus called a rear projection type. In this apparatus, light emitted from a light source 2502 is optically modulated by a reflective liquid crystal panel 2503 by a polarizing beam splitter 2504, reflected by reflectors 2505 and 2506, and projected onto a screen 2507. In this type of apparatus, a screen 2507 is arranged on a main body 2501.

  The present embodiment is an example in the case where a material mainly composed of silicon is used as the gate electrode in the configuration shown in the first embodiment.

  FIG. 10 shows an outline of the present embodiment. Here, as the gate electrodes 1001, 1002, and 1003, a silicon material imparted with one conductivity type is used.

  As other materials constituting the gate electrode, various silicides and metal materials can be used.

Sectional drawing which shows the manufacturing process of a liquid crystal panel. Sectional drawing which shows the manufacturing process of a liquid crystal panel. Sectional drawing which shows the manufacturing process of a liquid crystal panel. Sectional drawing which shows the manufacturing process of a liquid crystal panel. Sectional drawing which shows the manufacturing process of a liquid crystal panel. Sectional drawing which shows the manufacturing process of a liquid crystal panel. Sectional drawing which shows the manufacturing process of a liquid crystal panel. Sectional drawing which shows the manufacturing process of a liquid crystal panel. The figure which shows the example of the apparatus provided with the liquid crystal panel using invention. The figure which shows another Example.

Explanation of symbols

101 Glass substrate (or quartz substrate)
102 NTFT active layer disposed in the pixel matrix circuit 103 PTFT active layer disposed in the peripheral driving circuit 104 NTFT active layer disposed in the peripheral driving circuit 112 Drain region 113 Channel region 114 Source region 115 Source region 116 Channel Region 117 Drain region 118 Drain region 119 Channel region 120 Source region 122 Titanium film 123 Aluminum film 124 Titanium film 125 Titanium film 126 Aluminum film 127 Titanium film 128 Titanium film
129 Aluminum film 130 Titanium film 131 Titanium film 132 Aluminum film 133 Titanium film 134 Titanium film 135 Aluminum film 136 Titanium film 137 Silicon nitride film 138 Titanium film 139 Polyimide resin film 140 Titanium film 141 Pixel electrode (aluminum film)
142 Wiring (aluminum wiring)
143 Alignment film (polyimide resin film)
144 Liquid crystal material 145 Alignment film (Polyimide resin film)
146 Counter electrode (ITO electrode)
147 Counter glass substrate 148 Sealing material

Claims (11)

A display device using a pixel matrix circuit having a thin film transistor,
A first insulating film formed on the thin film transistor;
A first electrode and a second electrode formed on the first insulating film;
A silicon nitride film formed on the first and second electrodes;
An electrode pattern formed on the silicon nitride film;
A second insulating film formed on the silicon nitride film and the electrode pattern;
A light shielding film formed on the second insulating film;
A third insulating film formed on the light shielding film;
A pixel electrode formed on the third insulating film and connected to the first electrode;
A display device, wherein a capacitor is formed by the first electrode, the silicon nitride film, and the electrode pattern. A display device using a pixel matrix circuit having a thin film transistor,
A first insulating film formed on the thin film transistor;
A first electrode and a second electrode formed on the first insulating film;
A silicon nitride film formed on the first and second electrodes;
An electrode pattern formed on the silicon nitride film;
A second insulating film formed on the silicon nitride film and the electrode pattern;
A shield pattern formed on the second insulating film;
A third insulating film formed on the shield pattern;
A pixel electrode formed on the third insulating film and connected to the first electrode;
A display device, wherein a capacitor is formed by the first electrode, the silicon nitride film, and the electrode pattern. In claim 1,
The display device, wherein the light shielding film is made of a titanium film. In claim 2,
The display device, wherein the shield pattern is made of a titanium film. In any one of Claims 1 thru | or 4,
The display device according to claim 1, wherein the gate electrode of the thin film transistor is made of a material containing silicon as a main component. In any one of Claims 1 thru | or 5,
The display device, wherein the first insulating film is a silicon oxide film. In any one of Claims 1 thru | or 6,
The display device, wherein the second electrode is electrically connected to a wiring arranged in a peripheral driving circuit for driving the pixel matrix circuit. In claim 7,
The display device, wherein the pixel electrode and the wiring are made of the same material. In claim 7 or claim 8,
A display device comprising a sealing material above the wiring. In any one of Claims 1 thru | or 9,
The display device, wherein the thin film transistor is a top gate type, bottom gate type, or multigate type thin film transistor.   A liquid crystal panel for projection, comprising the display device according to any one of claims 1 to 10.

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