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JP2006099942A - Manufacturing method and apparatus of glass substrate for magnetic recording medium - Google Patents

Manufacturing method and apparatus of glass substrate for magnetic recording medium Download PDF

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JP2006099942A
JP2006099942A JP2005243759A JP2005243759A JP2006099942A JP 2006099942 A JP2006099942 A JP 2006099942A JP 2005243759 A JP2005243759 A JP 2005243759A JP 2005243759 A JP2005243759 A JP 2005243759A JP 2006099942 A JP2006099942 A JP 2006099942A
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substrate
glass substrate
carrier
rack
cleaning
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Katsuaki Aida
克昭 会田
Hiroyuki Machida
裕之 町田
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Resonac Holdings Corp
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Showa Denko KK
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  • Manufacturing Of Magnetic Record Carriers (AREA)

Abstract

<P>PROBLEM TO BE SOLVED: To provide a manufacturing method and apparatus of a glass substrate for a magnetic recording medium by which dust generation due to contact of a substrate carrier with a rack for holding the substrate carrier can be prevented when the glass substrate is polished and then immersed in a washing liquid to be washed. <P>SOLUTION: In the manufacturing method and apparatus of the glass substrate for the magnetic recording medium, when the glass substrate is polished using abrasive grains and then immersed in the washing liquid to be washed, a member of a fluororesin or an acetal resin is attached to either one contact part of the substrate carrier for washing and the rack for holding the carrier or both contact parts of the carrier and the rack to perform washing treatment. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

本発明は、磁気記録媒体用ガラス基板の製造方法および装置に関する。より詳しくは、本発明は、ガラス基板を研磨後、テクスチャー処理前に、洗浄を行うことからなる磁気記録媒体用ガラス基板の製造方法およびその装置に関する。   The present invention relates to a method and apparatus for manufacturing a glass substrate for a magnetic recording medium. More specifically, the present invention relates to a method for manufacturing a glass substrate for a magnetic recording medium and an apparatus therefor, comprising washing after the glass substrate is polished and before texture treatment.

ハードディスク等の磁気記録媒体に用いるためのガラス基板には、高度の平坦性や平滑性が求められる。そのため、ガラス基板は、その表面の研磨のための工程とそれに続く洗浄工程に付される。そして、これによって得られた磁気記録媒体用ガラス基板は、表面処理のためのテクスチャー工程に付される。   A glass substrate for use in a magnetic recording medium such as a hard disk is required to have a high degree of flatness and smoothness. Therefore, the glass substrate is subjected to a process for polishing the surface and a subsequent cleaning process. And the glass substrate for magnetic recording media obtained by this is attached | subjected to the texture process for surface treatment.

ガラス基板表面を効率よく研磨するためには、研磨剤として、酸化セリウムを酸化ジルコニウム等の研磨砥粒が用いられるが、これらの研磨砥粒はガラス表面に付着するという問題がある。そのため、研磨工程で付着した研磨砥粒やガラスの削り屑等を、テクスチャー処理の前に、洗浄により除去することが必要になる。   In order to polish the glass substrate surface efficiently, abrasive grains such as cerium oxide and zirconium oxide are used as an abrasive, but there is a problem that these abrasive grains adhere to the glass surface. Therefore, it is necessary to remove the abrasive grains and glass shavings adhering in the polishing step by washing before the texture treatment.

磁気記録媒体用ガラス基板の製造において、ガラス基板を蓚酸等の有機酸やフッ酸、硫酸、硝酸、燐酸、塩酸等の無機酸の水溶液または強アルカリ水溶液を用いて洗浄することは知られている(例えば、特許文献1〜3参照)。かかる洗浄は、一般に、ステンレススチール等の金属からなる基板キャリアとそれを保持するためのラックとを組み合わせて用い、多数枚(通常は約50〜100枚)の基板を基板キャリアに装填し、このキャリアをそれを保持するためのラックにより吊り下げ保持して洗浄液を含む洗浄槽中に浸漬し、一定時間経過後に洗浄槽から引き上げることにより行われる。   In the production of a glass substrate for a magnetic recording medium, it is known to wash the glass substrate with an organic acid such as oxalic acid, an aqueous solution of an inorganic acid such as hydrofluoric acid, sulfuric acid, nitric acid, phosphoric acid, hydrochloric acid, or a strong alkaline aqueous solution. (For example, see Patent Documents 1 to 3). Such cleaning generally uses a combination of a substrate carrier made of metal such as stainless steel and a rack for holding the substrate carrier, and a large number (usually about 50 to 100) of substrates are loaded on the substrate carrier. The carrier is suspended and held by a rack for holding it, immersed in a cleaning tank containing a cleaning liquid, and pulled up from the cleaning tank after a certain period of time.

しかるに、この場合、キャリアとラックとが接触する部分において、それらの接触により金属が擦られる結果発埃を生じ、それに起因して洗浄後に得られる基板に新たな表面欠陥が生じる恐れがある。   However, in this case, at the portion where the carrier and the rack are in contact with each other, dust is generated as a result of the metal being rubbed by the contact, which may cause a new surface defect in the substrate obtained after cleaning.

特開2004−2163号公報JP 2004-2163 A 特開2000−311336号公報JP 2000-31336 A 特開2000−302482号公報JP 2000-30482 A

本発明は、ガラス基板を研磨後、洗浄液中に浸漬して洗浄するに当たり、基板キャリアとそれを保持するためのラックとの接触による発埃を防止することのできる磁気記録媒体用ガラス基板の製造方法および装置を提供しようとするものである。   The present invention provides a glass substrate for a magnetic recording medium capable of preventing dust generation due to contact between a substrate carrier and a rack for holding the substrate when the glass substrate is polished and then immersed in a cleaning solution for cleaning. It is an object to provide a method and apparatus.

本発明者らは、上記課題を解決するため鋭意検討の結果、ガラス基板の研磨後の洗浄液による浸漬洗浄に用いる基板キャリアとそれを保持するためのラックとの接触部にフッ素樹脂またはアセタール樹脂からなる部材を取り付けて、それらの接触部が直接的に接触して擦られることによる発埃を無くし、これによって基板表面に新たに欠陥が生じるのを防止することができることを見出し、この知見に基づき本発明を完成させるに至ったものである。   As a result of intensive studies to solve the above-mentioned problems, the present inventors have made fluororesin or acetal resin into the contact portion between the substrate carrier used for immersion cleaning with the cleaning liquid after polishing the glass substrate and the rack for holding it. Based on this finding, it is possible to eliminate the generation of dust caused by rubbing the contact parts directly contacting and rubbing, thereby preventing new defects on the substrate surface. The present invention has been completed.

よって、本発明は、例えば、下記の事項からなる。   Therefore, this invention consists of the following matters, for example.

〔1〕 ガラス基板を研磨砥粒を用いて研磨した後、洗浄液中に浸漬して洗浄するに当たり、洗浄用の基板キャリアとこのキャリアを保持するためのラックのいずれか一方または両方のキャリアとラックとの接触部にフッ素樹脂またはアセタール樹脂からなる部材を取り付けて洗浄処理操作を行うことを特徴とする磁気記録媒体用ガラス基板の製造方法。   [1] When a glass substrate is polished by using abrasive grains and then immersed in a cleaning solution for cleaning, either a cleaning substrate carrier and / or a rack for holding this carrier, and both carriers and racks A method for producing a glass substrate for a magnetic recording medium, wherein a cleaning treatment operation is performed by attaching a member made of a fluororesin or an acetal resin to a contact portion with the magnetic recording medium.

〔2〕 ガラス基板を研磨砥粒を用いて研磨した後、洗浄液中に浸漬して洗浄する際に用いる、洗浄用の基板キャリアとこのキャリアを保持するためのラックのいずれか一方または両方のキャリアとラックとの接触部にフッ素樹脂またはアセタール樹脂からなる部材を取り付けたことを特徴とする磁気記録媒体用ガラス基板の製造装置。   [2] After polishing a glass substrate with abrasive grains and immersing it in a cleaning solution for cleaning, either or both of a cleaning substrate carrier and a rack for holding the carrier are used. An apparatus for producing a glass substrate for a magnetic recording medium, wherein a member made of a fluororesin or an acetal resin is attached to a contact portion between the rack and the rack.

本発明によれば、研磨後のガラス基板を洗浄するに当たり、基板キャリアとそれを保持するためのラックとの接触による発埃を防止し、基板表面に新たな欠陥が生じさせることなく磁気記録媒体用ガラス基板を製造することができる。   According to the present invention, when a glass substrate after polishing is cleaned, dust generation due to contact between a substrate carrier and a rack for holding the substrate carrier is prevented, and a magnetic recording medium without causing new defects on the substrate surface Glass substrates can be manufactured.

以下、本発明の好ましい実施の形態につき説明する。ただし、これらの説明は本発明を実施する場合の好ましい例を具体的に説明することを主眼とするものであって、これによって本発明に何らの限定を加えようとするものではないことを理解されたい。   Hereinafter, preferred embodiments of the present invention will be described. However, it is understood that these explanations are intended to specifically describe preferred examples for carrying out the present invention, and are not intended to limit the present invention in any way. I want to be.

本発明においては、好ましくは、ガラス基板として通常の板状ガラスが用いられる。   In the present invention, an ordinary plate glass is preferably used as the glass substrate.

ガラス基板表面の研磨には、研磨剤として、酸化セリウムや酸化ジルコニウム、酸化アルミニウム、酸化珪素などの研磨砥粒を用いることができる。なかでも、研磨効率等の観点から、酸化セリウムからなる研磨砥粒を用いるのが好ましい。研磨剤は、これらの砥粒を水に懸濁させて懸濁液として用いられるのがよい。   For polishing the surface of the glass substrate, abrasive grains such as cerium oxide, zirconium oxide, aluminum oxide, and silicon oxide can be used as an abrasive. Among these, from the viewpoint of polishing efficiency and the like, it is preferable to use polishing abrasive grains made of cerium oxide. The abrasive is preferably used as a suspension by suspending these abrasive grains in water.

研磨されたガラス基板は、次いで、洗浄工程に付される。洗浄は、一般に、ステンレススチール等の金属からなる基板キャリアとそれを保持するためのラックとを組み合わせて用い、多数枚(通常は約50〜100枚)の基板を基板キャリアに装填し、このキャリアをそれを保持するためのラックにより吊り下げ保持して洗浄液を含む洗浄槽中に浸漬し、一定時間経過後に洗浄槽から引き上げることにより行われる。   The polished glass substrate is then subjected to a cleaning process. Cleaning is generally performed using a combination of a substrate carrier made of metal such as stainless steel and a rack for holding the substrate carrier, and a large number (usually about 50 to 100) of substrates are loaded on the substrate carrier. Is suspended by a rack for holding it, immersed in a cleaning tank containing a cleaning liquid, and pulled up from the cleaning tank after a certain period of time.

図1は、基板キャリアとラックとを組み合わせ使用する状態を示す模式平面図である。図2は、それらの基板キャリアとラックとを組み合わせて用い、基板が装填されたキャリアを洗浄槽中に浸漬した状態を示す模式断面図である。図に示すように、基板1を多数枚まとめて基板キャリア2に装填し、これをラック3により吊り下げ保持して、洗浄液4が充填された洗浄槽5中に浸漬させ、次いで一定時間後に洗浄槽から引き上げて洗浄を行うのである。そして、本発明においては、例えば、キャリアとラックとが直接接触する部分をフッ素樹脂またはアセタール樹脂、例えば、ポリテトラフルオロエチレンまたはそれに類似の材料からなるチューブで覆い、またはこの接触部をフッ素樹脂またはアセタール樹脂、例えば、ポリテトラフルオロエチレンまたはそれに類似の材料を用いて構成することにより、キャリアやラックを構成している金属部分が直接接触することを妨げ、これによって金属が擦れて発埃が生じるのを防止するのである。この場合、このポリテトラフルオロエチレン系の材料からなる部材を取り付ける接触部分は、特に限定されるものではなく、基板キャリア側もしくはラック側のいずれか一方であってもよく、あるいはその両方であってもよい。   FIG. 1 is a schematic plan view showing a state in which a substrate carrier and a rack are used in combination. FIG. 2 is a schematic cross-sectional view showing a state in which the substrate carrier and the rack are used in combination, and the carrier loaded with the substrate is immersed in the cleaning tank. As shown in the figure, and loaded into the substrate carrier 2 to the substrate 1 large number together, which was suspended held by the rack 3 washing, the washing liquid 4 is immersed in the cleaning tank 5 filled, then after a predetermined time It is lifted from the tank and washed. In the present invention, for example, the part where the carrier and the rack are in direct contact is covered with a fluororesin or acetal resin, for example, a tube made of polytetrafluoroethylene or a similar material, or the contact part is covered with fluororesin or By using an acetal resin such as polytetrafluoroethylene or a similar material, the metal parts constituting the carrier and the rack are prevented from coming into direct contact, and the metal is rubbed to generate dust. It prevents it. In this case, the contact portion to which the member made of the polytetrafluoroethylene material is attached is not particularly limited, and may be either the substrate carrier side or the rack side, or both. Also good.

以下、実施例により、本発明をさらに説明する。   The following examples further illustrate the present invention.

90質量%の骨格成分組成がB23+Al23+SiO2であり、7質量%の残部成分組成がLi2O+Na2O+K2Oであるアモルファスガラスを用いて磁気記録媒体用基板を作成した。 A substrate for a magnetic recording medium is prepared using amorphous glass having a skeleton component composition of 90% by mass of B 2 O 3 + Al 2 O 3 + SiO 2 and a remaining component composition of 7% by mass of Li 2 O + Na 2 O + K 2 O. did.

先ず、上記組成の原料ガラスを溶融し、プレス成形して、円盤状の板状ガラスを得た。この板状ガラスにドリルを用いて内径孔を形成した。次いで、基板の主面に粗ラップ加工および精密ラップ加工の2段ラップ加工を施し、基板の厚さを調整した。次に、この基板の内径孔に面する内周側端面と外周側の端面とにそれぞれ面取り加工を施して面取り部を形成した。   First, melting the raw glass having the above composition was press-molded to obtain a disk-shaped sheet glass. An inner diameter hole was formed in the plate glass using a drill. Next, the main surface of the substrate was subjected to two-stage lapping including rough lapping and precision lapping to adjust the thickness of the substrate. Next, a chamfered portion was formed by chamfering the inner peripheral end face and the outer peripheral end face facing the inner diameter hole of the substrate.

以上のように処理したガラス基板の内周側端面と外周側の端面を鏡面に研磨加工した後、さらに基板の主面を最終的に鏡面に研磨加工した。研磨剤として、酸化セリウム粉末を含む研磨剤(三井金属鉱業社製のミレーク)を用いた。   The inner peripheral side end surface and the outer peripheral side end surface of the glass substrate treated as described above were polished into a mirror surface, and then the main surface of the substrate was finally polished into a mirror surface. As the abrasive, an abrasive containing cerium oxide powder (Mirek manufactured by Mitsui Kinzoku Mining Co., Ltd.) was used.

得られた基板に対して、引き続いて、ブラシスクラブ洗浄を行い、次いで硫酸、フッ酸、ケイフッ酸、蓚酸または硝酸等の酸の水溶液による浸漬洗浄を行い、表面の付着物を除去して、磁気記録媒体用ガラス基板を得た。   The obtained substrate and subsequently subjected to brush scrubbing cleaning, and then sulfuric acid, hydrofluoric acid, hydrosilicofluoric acid, subjected to immersion washing with an aqueous solution of oxalic acid or an acid such as nitric acid to remove the deposits on the surface, the magnetic A glass substrate for recording medium was obtained.

このとき、浸漬洗浄を、図2に示すように、基板を装填したステンレススチール製の基板キャリアとラックとを組み合わせて用い、ラックにより基板キャリアを吊り下げ保持し、前記洗浄液を充填した洗浄槽中に浸漬し、次いで所定時間(約2分)後に引き上げることにより行い、基板キャリア側とラック側の両方において、基板キャリアとラックとの接触部をポリテトラフルオロエチレンのチューブで覆った場合とそのような覆いを用いなかった場合とにおいて、得られた基板の表面欠陥を発生の程度を比較した。この場合、表面欠陥の評価は、日立ハイテクノロジー社製のODT(Optical Defecttester) RZ3500を用いて、slice10nmで行った。   In this case, the immersion washing, as shown in FIG. 2, used in combination with stainless steel substrate carrier and the rack loaded with substrates, hanging to hold the substrate carrier by a rack, washing bath filled with the cleaning fluid And then pulling up after a predetermined time (about 2 minutes), and the contact portion between the substrate carrier and the rack is covered with a polytetrafluoroethylene tube on both the substrate carrier side and the rack side. The degree of occurrence of surface defects on the obtained substrate was compared with the case where no cover was used. In this case, the surface defects were evaluated at slice 10 nm using ODT (Optical Defecttester) RZ3500 manufactured by Hitachi High-Technology Corporation.

結果を下記に示す。   The results are shown below.

ポリテトラフルオロエチレンの覆いなし:ODT P/N=10.3/8.6
ポリテトラフルオロエチレンの覆いあり:ODT P/N=5.2/4.8
No polytetrafluoroethylene covering: ODT P / N = 10.3 / 8.6
With polytetrafluoroethylene covering: ODT P / N = 5.2 / 4.8

本発明は、基板の研磨後の洗浄液による浸漬洗浄において発埃を防止し、基板表面に新たな欠陥を生じさせることなく磁気記録媒体用ガラス基板を製造することを可能にするので、産業上極めて有用である。   The present invention prevents dust generation in the immersion cleaning with the cleaning liquid after polishing the substrate, and makes it possible to manufacture a glass substrate for a magnetic recording medium without causing new defects on the substrate surface. Useful.

基板キャリアとラックとを組み合わせ使用する状態を示す模式平面図。The schematic plan view which shows the state which uses a combination of a substrate carrier and a rack. 基板キャリアとラックとを組み合わせて用い、基板が装填されたキャリアを洗浄槽中に浸漬した状態を示す模式断面図。The schematic cross section which shows the state which used the board | substrate carrier and the rack in combination and the carrier with which the board | substrate was loaded was immersed in the washing tank.

符号の説明Explanation of symbols

1 基板
2 基板キャリア
3 ラック
4 洗浄液
5 洗浄槽
1 substrate 2 substrate carrier 3 rack 4 cleaning solution 5 cleaning tank

Claims (2)

ガラス基板を研磨砥粒を用いて研磨した後、洗浄液中に浸漬して洗浄するに当たり、洗浄用の基板キャリアとこのキャリアを保持するためのラックのいずれか一方または両方のキャリアとラックとの接触部にフッ素樹脂またはアセタール樹脂からなる部材を取り付けて洗浄処理操作を行うことを特徴とする磁気記録媒体用ガラス基板の製造方法。   When a glass substrate is polished with abrasive grains and then immersed in a cleaning solution for cleaning, the substrate carrier for cleaning and the rack for holding this carrier, or the contact between the carrier and the rack A method for producing a glass substrate for a magnetic recording medium, wherein a cleaning treatment operation is performed by attaching a member made of a fluororesin or an acetal resin to the part. ガラス基板を研磨砥粒を用いて研磨した後、洗浄液中に浸漬して洗浄する際に用いる、洗浄用の基板キャリアとこのキャリアを保持するためのラックのいずれか一方または両方のキャリアとラックとの接触部にフッ素樹脂またはアセタール樹脂からなる部材を取り付けたことを特徴とする磁気記録媒体用ガラス基板の製造装置。
After polishing a glass substrate with abrasive grains and immersing it in a cleaning solution for cleaning, either a substrate carrier for cleaning and a rack for holding this carrier or both carriers and racks are used. An apparatus for producing a glass substrate for a magnetic recording medium, wherein a member made of a fluororesin or an acetal resin is attached to the contact portion.
JP2005243759A 2004-08-31 2005-08-25 Manufacturing method and apparatus of glass substrate for magnetic recording medium Pending JP2006099942A (en)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012208994A (en) * 2011-03-30 2012-10-25 Konica Minolta Advanced Layers Inc Manufacturing method of glass substrate for magnetic disks
JP2012208993A (en) * 2011-03-30 2012-10-25 Konica Minolta Advanced Layers Inc Manufacturing method of glass substrate for magnetic disks

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012208994A (en) * 2011-03-30 2012-10-25 Konica Minolta Advanced Layers Inc Manufacturing method of glass substrate for magnetic disks
JP2012208993A (en) * 2011-03-30 2012-10-25 Konica Minolta Advanced Layers Inc Manufacturing method of glass substrate for magnetic disks

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