JP2006038488A - Lens assembly support device - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To conduct support for carrying out precisely and efficiently eccentricity regulation and lens space regulation in an inspected optical system, by making constitution capable of measuring an eccentric comatic aberration and a transmission wave front aberration in the inspected optical system, by one device. <P>SOLUTION: The first regulation optical system for regulating the eccentricity of an objective lens 1 having an incident optical system 19, a spherical mirror 15 and a point image magnifying optical system 27 is integrated with the second regulation optical system for regulating a lens space of the objective lens 1 having the incident optical system 19, the spherical mirror 15 and an interferometer 23, and the eccentricity of the objective lens 1 or the lens space of the objective lens 1 is regulated by insertion/pulling-off to/from respective optical axes of a shutter 32 and a Bertrand's lens 33, by an optical switching mechanism 31. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

  The present invention provides a decentration coma aberration of a test optical system in order to adjust the decentration adjustment between each lens of the test optical system such as an objective lens composed of a plurality of lenses used in a microscope, for example, and to adjust the gap between the lenses. The present invention also relates to a lens assembly support apparatus for obtaining a transmitted wavefront aberration of a test optical system.

  For example, an objective lens having a high NA (numerical aperture) and high magnification used for a microscope (hereinafter referred to as a high NA / high magnification objective lens) is required to have strict specification performance. Such an objective lens is generally composed of a lens system having a large number of lenses, and is composed of, for example, about 15 lenses.

  In order to guarantee the optical performance of such a lens system having a large number of lenses, the decentration coma generated by the decentering of each lens constituting the lens system, the wall thickness error of each lens, and the gap between the lenses can be used. It is required to adjust the generated spherical aberration, off-axis coma aberration, and astigmatism with high accuracy.

  In recent high NA / high magnification objective lenses and the like, it is necessary to realize a decentration tolerance between each lens, for example, within a level of several μm in order to suppress decentration coma. In order to realize such a level of allowable eccentricity, it is impossible to cope with the problem by simply increasing the processing accuracy of each lens and the lens frame that supports each lens. For this reason, after assembling the lens system, a process for adjusting the eccentricity of the lens system with high accuracy is essential.

  Further, there are many cases where the target performance cannot be achieved only by improving the processing accuracy of the thickness of each lens frame that defines the distance between the lenses, and an adjustment process for adjusting the distance between the lenses is necessary.

  First, the eccentric adjustment of the lens system will be described. In the actual decentering adjustment step, the decentering adjustment of all the lenses constituting the lens system (hereinafter referred to as the test optical system) is not performed, but a lens suitable for decentering adjustment in the test lens (hereinafter referred to as the adjusting lens). And asymmetrical aberration of the test optical system is suppressed by adjusting the decentering of the adjustment lens with respect to the entire test optical system. Although the number of adjusting lenses is not limited to one, it is desirable that the number is as small as possible.

  In the decentering adjustment step, it is assumed that the decentration coma aberration of the optical system to be measured is evaluated or measured. In the decentering adjustment, generally, a circular chart having a size of several tens of μm to several hundreds of μm is placed near the optical axis of the test optical system, the test optical system is transmitted and illuminated with a lamp light source, and a chart image by the test optical system is observed or Take an image. If the test optical system has decentration coma, the chart image is not circular but deforms asymmetrically like an egg shape, for example. The operator adjusts the optical system to be decentered while evaluating the chart image, and drives the chart image into a symmetric circle.

  FIG. 11 shows a specific example of eccentricity adjustment. The test optical system 1 is composed of a plurality of lenses, a first partial lens 2 having a plurality of lenses, a second partial lens 3 having a plurality of lenses, and an adjustment lens 4 for example. Have A chart 5 is provided on the optical axis P of the test optical system 1. In this chart 5, for example, a circular opening pattern is formed as shown in FIG.

  Light emitted from the light source 6 such as a halogen lamp illuminates the chart 5 via the illumination lens 7. The chart image that has passed through the chart 5 enters the CCD camera 8 through the test optical system 1 and is imaged by the CCD camera 8. The captured chart image is displayed on a monitor, for example, and observed and evaluated.

  If the test optical system 1 has an axial asymmetric aberration, the chart image loses symmetry as shown in FIG. The operator adjusts the eccentricity of the adjustment lens 4 in the optical system 1 to be examined while observing the chart image. The decentration adjustment of the test optical system 1 may be performed using a computer in addition to visual evaluation of the chart image on the monitor. The decentration adjustment of the test optical system 1 using a computer is performed by calculating the asymmetric aberration of the chart image by the computer and calculating the decentering direction and the amount of adjustment numerically and displaying them on the monitor. The operator adjusts the eccentricity of the adjusting lens 4 based on the eccentric direction and the adjustment amount of the asymmetric aberration displayed on the monitor.

  When the production amount of the test optical system 1 is very large, the eccentricity adjustment may be automatically performed based on the eccentricity adjustment amount digitized by the computer. Such a case is disclosed in Patent Document 1, for example.

  The chart 5 may be a slit or the like in addition to the circle. However, in the case of a slit, since the asymmetric aberration of the optical system 1 to be tested can be determined only in the one-dimensional direction, it is necessary to evaluate by rotating the slit in various directions.

Next, the distance adjustment between the lenses will be described. Adjustment of the distance between the lenses generally contributes to spherical aberration on the optical axis P of the optical system 1 to be tested, coma aberration, astigmatism, etc. outside the optical axis P. Therefore, when adjusting the distance between the lenses, it is necessary to evaluate each aberration state outside and on the optical axis P. In order to realize this, the distance between the lenses is adjusted while evaluating an image having a circular opening not only on the optical axis P but also outside the optical axis P using the chart 5 having a plurality of circular openings. . An interferometer used for adjusting the distance between the lenses is disclosed in Patent Document 2, for example.
JP 2000-121902 A JP-A-10-96679

  However, in the method based on the deformation of the chart image by the above-mentioned transmission illumination (hereinafter referred to as a transmission chart image method), there are cases where the evaluation sensitivity of the aberration is insufficient. For example, in a high NA / high magnification objective lens and the like, the demand for reducing the decentration coma aberration is very strict. However, in order to efficiently perform the work of adjusting the eccentricity by the operator, it is necessary to achieve both the improvement of the sensitivity of the evaluation of the eccentric coma aberration and the real time property of the evaluation.

  As a method of increasing the evaluation sensitivity of the decentering coma aberration by the transmission chart image method, a method of reducing the diameter (or slit width) of the transmission circular chart 5 and easily determining the deformation of the chart image is conceivable. The principle of this method is that if, for example, the circular aperture pattern formed on the chart 5 is made smaller, the higher-order diffracted wave intensity at the edge portion of the circular aperture pattern with respect to the 0th-order light intensity transmitted through the circular aperture pattern of the chart 5 as it is. This is based on the fact that the relative intensity of the light increases the intensity of light passing through the high NA region of the optical system 1 to be tested, thereby enhancing the decentration coma aberration. Furthermore, since the diffracted wave by an infinitely small pinhole diffracts light with uniform intensity in all directions, it can be said that it is theoretically the most ideal chart.

  However, if the chart 5 has a very small circular aperture pattern, the amount of light taken into the optical system 1 to be tested is greatly reduced, and the chart image becomes a very dark image. In reality, a chart equivalent to the air disk diameter φ_airy determined by the numerical aperture NA and the wavelength λ of the optical system 1 to be measured is ideal. For example, when calculating the air disk diameter of the objective lens with NA = 0.9 and λ = 0.55 μm, φ_airy = 1.22 × λ / NA = 1.22 × 0.55 μm / 0.9 = 0 .74 μm.

  In the chart 5, the edge of the circular opening pattern is neatly processed and the symmetry of the shape is required. It is very difficult to obtain such a fine transmission chart. In the case of an objective lens in the ultraviolet band of NA = 0.9 and λ = 0.3 μm, φ_airy = 0.4 μm, and it can be said that it is impossible to obtain such a fine transmission chart.

  In recent years, an example in which an objective lens of a microscope is applied to a laser optical system is increasing. In this case, the objective lens only needs to secure performance at a specific wavelength of a narrow spectrum defined by the laser light source, but severe optical performance is required at the laser wavelength. Inevitably, it is necessary to adjust the eccentricity using a laser light source in which an objective lens is used.

  However, in the evaluation method based on the asymmetric deformation of the chart image by transmitted illumination, the coherent laser beam is illuminated onto the chart 5 having a certain area. For this reason, speckle noise is added to the chart image obtained by passing through the chart 5. When this speckle noise is added, the decentration coma aberration is buried in the speckle noise, and it becomes impossible to evaluate the decentration coma aberration. For this reason, it is a big problem when measuring and evaluating the decentration coma aberration of the objective lens applied to the laser optical system with high sensitivity.

  As a method for eliminating speckle noise and evaluating the decentration coma with high sensitivity, there is a method of preparing a chart 5 having an air disk diameter φ_airy or less of the optical system 1 to be tested. It may be said that it is impossible, and I have to give up preparing the chart 5.

  As a transmission evaluation method that does not use the chart 5, for example, a reference lens method as shown in FIG. 14 is considered. A reference lens 9 that can be treated as non-aberration is prepared. The focal point of the reference lens 9 and the focal point of the test optical system 1 are matched. If the NA of the reference lens 9 is equal to or greater than the NA of the test optical system 1, the point image by the test optical system 1 is evaluated when the point image by the reference lens 9 is re-imaged by the test optical system 1. You may consider that By taking a point image by the test optical system 1 with the CCD 8 with sufficient pixel resolution, the decentration coma aberration of the test optical system 1 can be evaluated with high sensitivity.

  With this method, it is not necessary to use the chart 5, and even if a laser is used, only the point image by the reference lens 9 is evaluated, so speckle noise that occurs when a somewhat large transmission chart is evaluated by the laser does not occur. .

  However, it is unrealistic to prepare a reference lens 9 having an NA equal to or greater than that of the optical system 1 to be examined for the following reason. As described above, when a microscope objective lens or the like is considered as the test optical system 1, it may be an objective lens designed exclusively for a specific wavelength or an objective lens designed exclusively for a laser wavelength. As a result, the same number of reference lenses 9 as in the test optical system 1 are required. Moreover, the lens must be preliminarily regarded as having no aberration with an NA equal to or greater than that of the optical system 1 to be tested. For this reason, the reference lens system shown in FIG. 14 is too expensive and time consuming to prepare the reference lens 9, which is inefficient and impractical.

  When adjusting a test optical system composed of a plurality of lenses, it is necessary to adjust not only the eccentricity of each lens but also the distance between the lenses. Adjustment of the distance between the lenses affects spherical aberration on the optical axis P, and affects coma and astigmatism outside the optical axis P. Therefore, when performance outside the optical axis P is required, it is important to adjust the distance between the lenses.

  In the adjustment of the distance between the lenses, the wavefront aberration of the objective lens is quantitatively measured using an ordinary interferometer, and the distance between the lenses constituting the objective lens is adjusted based on the measurement result. For example, wavefront aberration measurement is performed by being attached to an interferometer of a wavefront aberration measuring apparatus as disclosed in Patent Document 2. Based on the measurement result, the objective lens is once disassembled and the interval is adjusted. Thereafter, when the objective lens is reassembled, it is necessary to adjust the eccentricity again.

  As described above, the decentering adjustment of each lens of the objective lens is performed by, for example, a method using the chart 5 as shown in FIG. 11 or a method using the reference lens 9 as shown in FIG. The interval adjustment is performed by attaching to the interferometer of the wavefront aberration measuring apparatus disclosed in Patent Document 2, for example. In other words, the eccentric adjustment and the interval adjustment of each lens are performed using different devices with different objective lenses. The distance adjustment and the eccentricity adjustment are alternately repeated several times to converge the degree of assembly adjustment of the objective lens. For this reason, the distance adjustment and the eccentricity adjustment of the objective lens are inefficient in time.

  An objective lens that requires performance outside the optical axis P needs to evaluate not only the performance on the optical axis P of the lens but also the performance outside the optical axis P with high sensitivity.

  The present invention includes an incident optical system that makes light incident on a test optical system, a reciprocating optical system that is provided on the optical axis of the test optical system, and that reciprocates light at least once in the test optical system, The point image magnification optical system for adjusting the decentration of the test optical system that emphasizes and enlarges the point image that appears due to the test light reciprocating to the test optical system, and the interference between the test light reciprocating to the test optical system and the reference light Interferometer for adjusting the lens interval of the test optical system that generates interference fringes reflecting the transmitted wavefront aberration of the test optical system, point image enhancement and point fringing by the point image magnification optical system, and generation of interference fringes by the interferometer It is a lens assembly support apparatus provided with the optical system switching mechanism which switches.

  The present invention includes an incident optical system that makes light incident on a test optical system, a reciprocating optical system that is provided on the optical axis of the test optical system, and that reciprocates light at least once in the test optical system, The point image enlarging optical system that emphasizes and enlarges the point image that appears due to the test light reciprocating to the test optical system, and the transmitted wavefront aberration of the test optical system due to interference between the test light reciprocating to the test optical system and the reference light An interferometer that generates reflected interference fringes, an optical system switching mechanism that switches between point-image enhancement and point-interference magnifying and point-interference-enhanced fringe generation, and point-enlarged and point-enhanced optical systems An image sensor that captures an interference fringe generated by an image or an interferometer, and decentration coma aberration of the test optical system is obtained based on image data of a point image acquired by the image sensor, or by imaging of the image sensor Optical system under test based on acquired interference fringe image data A lens assembly support device having an analysis device for determining the transmitted wavefront aberration.

  The present invention has a configuration in which the decentration coma aberration and the transmitted wavefront aberration of the test optical system can be measured with a single unit, thereby performing decentration adjustment and lens interval adjustment of the test optical system with high accuracy and efficiency. A lens assembly support device can be provided.

  Hereinafter, a first embodiment of the present invention will be described with reference to the drawings.

  FIG. 1 is a configuration diagram of a lens assembly support device. In this lens assembly support device, each aberration of each optical component other than the test optical system 1 does not have to be a problem.

  The housing 10 is formed in a U shape in which a support member 12 is erected on a base member 11 and an arm member 13 is supported on the support member 12 in the lateral direction. An XYZ stage 14 is provided on the base member 11. A spherical mirror 15 is provided on the XYZ stage 14. The XYZ stage 14 moves the spherical mirror 15 in the XYZ directions.

  An objective lens mounting member 16 is provided on the lower surface of the arm member 13, and an objective lens is mounted on the objective lens mounting member 16 as a test optical system. Hereinafter, the test optical system will be described as the objective lens 1. As shown in FIG. 11, the objective lens 1 includes a first partial lens 2 having a plurality of lenses, a second partial lens 3 having a plurality of lenses, and an adjustment lens 4, for example. Have. The objective lens 1 is attached to an objective lens attachment member 16 with the tip side facing the spherical mirror 15.

  The arm member 13 and the objective lens mounting member 16 are provided with holes 17 and 18 for passing light that pass through the arm member 13 and the objective lens mounting member 16, respectively.

  The spherical mirror 15 is formed on the concave spherical surface 15 a, and the center of curvature thereof coincides with the condensing point S of the objective lens 1. The spherical mirror 15 is provided on the optical axis of the objective lens 1, and is a reciprocating optical device that reflects the laser light that has passed through the objective lens 1 and makes the laser light reciprocate once through the objective lens 1 by passing through the objective lens 1 again. Configure the system. The spherical mirror 15 needs to be a very high-precision spherical surface and generally has no coating on the reflecting surface. Therefore, the reflectance of the spherical mirror 15 is determined by the material. The material of the ordinary spherical mirror 15 is glass (many of quartz and the like), but since glass has a low reflectance of about 4%, a silicon-made one having a high reflectance of about 40% is preferable.

  The incident optical system 19 is for entering laser light into the objective lens 1 and includes a laser light source 20 that outputs laser light. One end of an optical fiber 21 is connected to the laser output end of the laser light source 20. The other end of the optical fiber 21 is disposed, for example, above the arm member 13 and emits a guided laser beam. On the optical axis of the laser light emitted from the other end of the optical fiber 21, a collimator lens 22 is provided for collimating the laser light emitted from the other end of the optical fiber 21 into parallel light.

  On the other hand, a Twiman Green interferometer 23 is provided. That is, the beam splitter 24 is provided on the light passage hole 17 provided in the arm member 13. A reference plane mirror 25 is provided on the transmission optical axis of the laser light collimated by the collimating lens 22 in the beam splitter 24.

  The reference plane mirror 25 reflects the laser light transmitted through the beam splitter 24 as reference light. The reference plane mirror 25 is provided on a moving element 26 such as a piezo element (PZT). The moving element 26 slightly displaces the reference plane mirror 24 in the same direction as the optical axis direction of the laser light transmitted through the beam splitter 23 every time a voltage is applied from the piezo element driving circuit 27.

  The beam splitter 24 is provided on the light passage hole 17 provided in the arm member 13, reflects a part of the laser light collimated by the collimating lens 22 to the lower side to which the objective lens 1 is attached, The remaining laser light is transmitted to the side where the reference plane mirror 25 is provided. The beam splitter 24 also generates interference fringes between the test light from the objective lens 1 side and the reference light from the reference plane mirror 25.

  A point image enlarging optical system 28 is provided on the optical axis of the light reflected upward by the beam splitter 24. The point image enlarging optical system 28 emphasizes and enlarges the point image that appears by the laser beam reciprocating to the objective lens 1. The point image enlarging optical system 28 includes an imaging lens 29 and an image pickup device 30 such as a CCD camera having a small pixel size on the optical axis.

  The optical system switching mechanism 31 includes a first adjustment optical system for adjusting the eccentricity of the objective lens 1 having the incident optical system 19, the spherical mirror 15, and the point image magnification optical system 28, the incident optical system 19, and the spherical mirror 15. The objective lens 1 having the interferometer 23 is switched to one of the second adjustment optical system for adjusting the lens interval. Specifically, the optical system switching mechanism 31 has a shutter 32 that can be inserted into and removed from the optical axis between the beam splitter 24 and the reference plane mirror 25 in the interferometer 23 and the optical axis of the point image enlarging optical system 28. And a belt run lens 33 as an optical element that can be inserted and removed.

  The shutter 32 is inserted into and removed from the optical axis of the interferometer 23 by the light shielding mechanism drive circuit 34. The light shielding mechanism drive circuit 34 inserts the shutter 32 on the optical axis of the interferometer 23 when the point image is emphasized and enlarged by the point image enlarging optical system 28, and the interference is generated when the interferometer 23 generates interference fringes. The shutter 32 is extracted from the optical axis of the meter.

  The Bertrand lens 33 is inserted into and removed from the optical axis of the point image enlarging optical system 28 by the insertion / removal mechanism drive circuit 35. The insertion / removal mechanism driving circuit 35 extracts the belt run lens 33 from the optical axis of the point image enlarging optical system 28 when obtaining the decentered coma aberration of the objective lens 1 and obtaining the transmission wavefront aberration of the objective lens 1. Is inserted on the optical axis of the point image enlarging optical system 28.

  The image sensor 30 captures the point image that has been enhanced and magnified by the point image enlarging optical system 28 and outputs the image signal. The image sensor 30 captures the interference fringes generated by the interferometer 23 transmitted by the point image enlarging optical system 28 with the belt run lens 33 inserted on the optical axis of the point image enlarging optical system 28. Output the image signal.

  The analysis device 36 receives the image signal output from the image sensor 30 and receives the first image data of the point image that is emphasized and enlarged by the point image enlarging optical system 28 or the first interference fringe generated by the interferometer 23. 2 is stored in the internal memory as image data. The analysis device 36 analyzes the first image data to obtain the decentration coma aberration of the objective lens 1 and analyzes the intensity distribution of the point image enhanced and enlarged by the point image enlarging optical system 28.

  The analyzing device 36 analyzes the second image data to obtain the transmitted wavefront aberration of the objective lens 1 and further obtains the second image data of each interference fringe having different phases obtained by moving the reference plane mirror 25. From this, the transmitted wavefront aberration of the objective lens 1 is obtained. The analysis device 36 displays the decentration coma aberration of the objective lens 1 as an analysis result, the intensity distribution of the emphasized and enlarged point image, and the transmitted wavefront aberration of the objective lens 1 on a monitor 37 such as a CRT display or a liquid crystal display.

  Next, the operation of the apparatus configured as described above will be described.

  First, the support operation when adjusting the eccentricity of the objective lens 1 will be described. When the decentering adjustment of the objective lens 1 is performed, the light shielding mechanism drive circuit 34 inserts the shutter 32 on the optical axis of the interferometer 23 as shown in FIG. The belt run lens 33 is extracted from the optical axis of the system 28.

  When laser light is output from the laser light source 20, the laser light is transmitted through the optical fiber 21 and emitted radially from the other end. The laser light emitted from the optical fiber 21 is collimated into parallel light by the collimating lens 22 and enters the beam splitter 24. The laser light incident on the beam splitter 24 is branched in two directions by the beam splitter 24, and one laser light is reflected downward and enters the objective lens 1 through the holes 18 and 17. The other laser beam is shielded by the shutter 32.

  The laser light incident on and transmitted through the objective lens 1 is once condensed at the condensing point S of the objective lens 1, and then diverges and travels toward the concave spherical surface 15 a of the spherical mirror 15. Since the center of curvature of the spherical mirror 15 coincides with the condensing point S of the objective lens 1, all the laser light transmitted through the objective lens 1 is incident on the concave spherical surface 15 a of the spherical mirror 15 in the vertical direction. And reflected on the same optical path as the direction perpendicular to the concave spherical surface 15a, that is, the incident direction of the laser beam.

  Here, the operation of the spherical mirror 15 will be described in detail. In FIG. 2, among the laser beams incident on the objective lens 1, laser beams that are symmetric with respect to the optical axis are represented by a thin line and a thick line. The laser beam represented by the thin line is reflected by the spherical mirror 15 and is emitted again to the objective lens 1 following the same optical path in the objective lens 1. Similarly, the laser beam indicated by the thick line is reflected by the spherical mirror 15 and is emitted from the objective lens 1 again following the same optical path in the objective lens 1. Therefore, the laser beam reciprocates once in the objective lens 1, whereby an aberration that enhances the aberration of the objective lens 1 twice is added to the laser beam.

  If a plane mirror is used instead of the spherical mirror 15, the plane mirror is installed on the focal plane of the objective lens 1, but information on asymmetric aberrations such as decentration coma possessed by the objective lens 1 is lost. Is clear. For this reason, a plane mirror cannot be used. For this reason, it is necessary to use the spherical mirror 15.

  The laser beam that has been doubled in the objective lens 1 and has been subjected to double aberration passes through the holes 17 and 18 as parallel light to be detected, passes through the beam splitter 24, and passes through the point splitter optical system 28. Head for. The point image enlarging optical system 28 emphasizes and enlarges the point image that appears by the laser beam reciprocating to the objective lens 1. The image sensor 30 captures the point image that has been enhanced and magnified by the point image enlarging optical system 28 and outputs the image signal.

  The analysis device 36 receives the image signal output from the image sensor 30, and stores the point image enhanced and enlarged by the point image enlarging optical system 28 in the internal memory as first image data. The analysis device 36 analyzes the first image data to obtain the decentration coma aberration of the objective lens 1 and analyzes the intensity distribution of the point image enhanced and enlarged by the point image enlarging optical system 28.

  Here, the operation of the point image enlarging optical system 28 will be described in detail. The point image enlarging optical system 28 enlarges and observes a point image to which an aberration twice as large as that of the objective lens 1 is added. In order to perform this enlargement observation, the point image obtained by the imaging lens 29 is enlarged. It is conceivable that the image sensor 30 such as a CCD has a small pixel size.

  For example, the focal length of the imaging lens 29 and the pixel of the image sensor 30 when considering the objective lens 1 of a microscope with NA = 0.9, focal length f_ob = 1.8 mm, wavelength λ = 0.55 μm as the objective lens 1. Consider the resolution.

Airy disk diameter φ_airy when objective lens 1 has no aberration is
φ_airy = 1.22 × λ / NA = 1.22 × 0.55 μm / 0.9 = 0.75 μm
It becomes.

When the focal length of the imaging lens 29 is f_TL, the optical magnification M of the point image of the objective lens 1 is
M = f_TL / f_ob
It becomes. For example, if the focal length f_TL of the imaging lens 29 is 360 mm, the optical magnification M is 200 times, and the air disk diameter projected onto the image sensor 30 is
0.75 μm × 200 = 150 μm
It becomes. If one pixel of the image sensor 30 is 7.5 μm, for example,
150 μm / 7.5 μm = 20
It becomes. That is, it becomes an enlarged observation system that can image the inside of a point image air disk with a pixel resolution of 20 × 20 pixels. Actually, even in imaging with a pixel resolution of about 10 × 10 pixels in a point image air disk, there is no practical problem in observing aberrations.

  Thus, if a point image to which twice the aberration of the objective lens 1 is added is picked up by the imaging device 30 having sufficient pixel resolution, the point image affected by the aberration of the objective lens 1 is sufficiently displayed on the monitor 37. Magnification can be observed, and the aberration can be observed with high sensitivity.

  Observation may be performed with an eyepiece that can be regarded as aberration-free instead of the CCD. However, since the number of optical systems increases, the point image enlarging optical system 28 having the imaging lens 29 and the image sensor 30 is more desirable.

  FIG. 3 shows a point image of an ideal objective lens 1 without decentration coma. The ideal point image of the objective lens 1 is a rotationally symmetric circle. FIG. 4 shows a point image of the objective lens 1 when the decentration coma aberration is 0.05λ in terms of the wavefront aberration rms value. The point image of the objective lens 1 in which decentration coma is present is not circular but is deformed into an elliptical asymmetric image with the center being decentered. FIG. 5 shows a point image corresponding to, for example, an eccentric coma aberration of 0.02λrms.

  The analysis device 36 displays the first image data on the monitor 37 in real time as the image of the point image enhanced and enlarged by the point image enlarging optical system 28 as shown in FIGS. Accordingly, the operator can adjust the adjustment lens 4 shown in FIG. 11 while observing the image of the point image emphasized and enlarged by the point image enlargement optical system 28 as shown in FIGS. 3 to 5 displayed on the monitor 37 in real time. The point image is made rotationally symmetric by performing an eccentricity adjustment operation on the entire objective lens 1.

  As described above, in the decentering adjustment of the objective lens 1, the point image appearing by the laser beam reciprocating to the objective lens 1 is enhanced and enlarged by the point image enlarging optical system 28, and this enhanced and enlarged point image is displayed on the monitor 37 in real time. Therefore, the operator can adjust the eccentricity so that the point image is rotationally symmetric while observing the point image displayed in real time on the monitor 37, and can efficiently perform the eccentricity adjusting operation.

  Since the point image can be displayed in real time on the monitor 37, asymmetry of the point image can be confirmed even with a low aberration equivalent to the decentration coma aberration of 0.02λrms as shown in FIG. Can be supported, and the eccentricity adjustment work can be performed with high accuracy.

  In this way, the decentration coma aberration of the objective lens 1 can be observed with high sensitivity, and the apparatus has further practical advantages. The first merit is freed from the difficulty of manufacturing a small transmission chart on the order of sub-μm. The second merit is that speckle noise does not occur even when laser light is used. The third merit is that it is not necessary to manufacture the same number of reference lenses as the type of the objective lens 1 unlike the reference lens system.

  Although it is necessary to prepare the spherical mirror 15, since it is a reflecting mirror, it can be used in common for the objective lens 1 of all wavelengths. Thus, only one spherical mirror 15 that can be regarded as having no aberration needs to be prepared.

  For checking the spherical mirror 15, for example, an interferometer using a He—Ne laser is commercially available, so that the aberration (deviation from the spherical surface) of the spherical mirror 15 need only be checked once by this interferometer. Thereby, if only the spherical mirror 15 is produced, the aberration of the objective lens 1 having various wavelengths can be observed immediately.

  Therefore, this apparatus can not only observe the aberration of the objective lens 1 with high sensitivity, but also support a very efficient aberration observation environment in terms of time and cost required for the decentering adjustment work. Furthermore, the analysis device 36 analyzes the point image, converts the symmetry of the point image into a numerical value or a graph, and displays the numerical value or the graph on the monitor 37 in real time so that the operator can perform the eccentricity adjustment work. An analysis function that assists may be added.

  Next, the assisting operation when adjusting the distance between the lenses of the objective lens 1 will be described. When adjusting the lens spacing of the objective lens 1, as shown in FIG. 1, the light shielding mechanism drive circuit 34 extracts the shutter 32 from the optical axis of the interferometer 23, and the insertion / removal mechanism drive circuit 35 enlarges the point image. A belt run lens 33 is inserted on the optical axis of the optical system 28.

  Laser light output from the laser light source 20 is transmitted through the optical fiber 21 and emitted radially from the other end, collimated into parallel light by the collimating lens 22, and enters the beam splitter 24. The laser light incident on the beam splitter 24 is branched in two directions by the beam splitter 24, and one laser light is reflected downward and enters the objective lens 1 through the holes 18 and 17.

  The laser light incident on and transmitted through the objective lens 1 is once condensed at the condensing point S of the objective lens 1 and then diverges and travels toward the concave spherical surface 15a of the spherical mirror 15, as described above. The light enters the concave spherical surface 15a of the spherical mirror 15 in the vertical direction and reflects in the vertical direction with respect to the concave spherical surface 15a. Then, the laser beam having doubled aberration after one reciprocation in the objective lens 1 passes through the holes 17 and 18 as parallel light to be detected and enters the beam splitter 24.

  The other laser beam branched by the beam splitter 24 passes through the beam splitter 24 and is reflected by the reference plane mirror 25. The laser light reflected by the reference plane mirror 25 is incident on the beam splitter 24 again as reference light. As a result, the test light from the objective lens 1 side and the reference light from the reference plane mirror 25 interfere with each other, and interference fringes reflecting the transmitted wavefront aberration at the pupil position of the objective lens 1 as shown in FIG. 6 are generated. Is done.

  Since the Bertrand lens 33 is inserted and the pupil position of the objective lens 1 and the imaging element 30 are in a conjugate relationship, the interference fringes reflecting the transmitted wavefront aberration at the pupil position of the objective lens 1 are on the imaging surface of the imaging element 30. To form an image. The image sensor 30 images the incident interference fringes and outputs the image signal.

  In this state, the reference plane mirror 25 moves every minute distance in the same direction as the optical axis direction of the laser light by a minute displacement of the moving element 26 such as a piezo element (PZT). By the movement of the reference plane mirror 25 for each minute distance, each interference fringe for each different phase is generated. The image sensor 30 images each interference fringe and outputs each image signal.

  The analysis device 36 analyzes the second image data of the interference fringes generated by the interferometer 23 and obtains the transmitted wavefront aberration of the objective lens 1. The analysis device 36 analyzes each second image data of each interference fringe for each phase to obtain each transmitted wavefront aberration of the objective lens 1 and quantifies these transmitted wavefront aberrations. Interference fringe analysis by Then, the analysis device 36 displays the analyzed result of each transmitted wavefront aberration of the objective lens 1 on the monitor 37 in real time.

  Therefore, the operator moves the adjustment lens 4 shown in FIG. 11 in the optical axis direction of the objective lens 1 while viewing the result of each transmitted wavefront aberration of the objective lens 1 displayed in real time on the monitor 37 to adjust the lens interval. Do work. In this lens interval adjustment operation, the amount of spherical aberration is extracted based on the result of the transmitted wavefront aberration measured by the interferometer 23, and each lens constituting the objective lens 1 is set so that the amount of spherical aberration falls within the target value. The interval can be adjusted quantitatively.

  When adjusting the spherical aberration, the objective lens 1 is disassembled and the interval frame between the lenses is exchanged or the washer is inserted and removed. Therefore, after the objective lens 1 is reassembled, the eccentricity of the objective lens 1 is adjusted again by the above-described point image observation, and the adjustment of the objective lens 1 is completed. The determination of the end of adjustment of the objective lens 1 is made by measuring the transmitted wavefront aberration again and determining whether each aberration component has entered the target value.

  As described above, according to the first embodiment, the first adjustment optical system for adjusting the decentration of the objective lens 1 having the incident optical system 19, the spherical mirror 15, and the point image enlarging optical system 28, and the incident optical system. The second adjustment optical system for adjusting the lens interval of the objective lens 1 having the system 19, the spherical mirror 15, and the interferometer 23 is integrated, and the optical system switching mechanism 31 moves the optical axes of the shutter 32 and the belt run lens 33 to each optical axis. Since the eccentricity adjustment of the objective lens 1 or the lens interval adjustment of the objective lens 1 is performed by inserting and removing the lens, the point image observation function and the interferometer function can be easily switched with a single device, and it is highly accurate and efficient. Thus, the objective lens 1 can be evaluated and adjusted. Thereby, the eccentric adjustment of the objective lens 1 and the interval adjustment of each lens can be efficiently performed in a short time, and no cost is required.

  In the decentration adjustment of the objective lens 1, the combination of the epi-illumination and the spherical mirror 15 causes the laser beam to reciprocate with respect to the objective lens 1 to receive double aberration, and the point image of the objective lens 1 itself is magnified in real time. Since observation (spot observation) is performed, the decentration coma aberration of the objective lens 1 can be adjusted efficiently and with high accuracy. In the lens interval adjustment of the objective lens 1, since the interference fringes of the pupil of the objective lens 1 are observed or the wavefront aberration is measured, the lens interval adjustment can be performed with high accuracy and efficiency.

  Next, a second embodiment of the present invention will be described with reference to the drawings. The same parts as those in FIG. 1 are denoted by the same reference numerals, and detailed description thereof is omitted.

  FIG. 7 is a configuration diagram of the lens assembly support device. This lens assembly support device supports off-axis evaluation and adjustment of the objective lens 1. On the gantry 41, the housing 10 and the tilt mechanism 40 are provided. The tilt mechanism 40 integrally tilts the objective lens 1, the spherical mirror 46, and the XYZ stage 14 around the pupil position E of the objective lens 1.

  Specifically, the tilting mechanism 40 is provided with a push screw base 42 on a gantry 41, and a push screw 43 is rotatably provided by being screwed to the push screw base 42. The push screw 43 penetrates the support member 12, and a tip portion thereof is in contact with a side surface of the support frame 44. A handle 45 is attached to the push screw 43. The support frame 44 is formed in a frame shape and supports the XYZ stage 14 provided with the spherical mirror 15. Although not shown, the support frame 44 is provided with a rotation axis at the same position as the pupil position E of the objective lens 1, and the rotation axis is provided so as to be rotatable with respect to the housing 10. A rotation attachment member 46 is provided on the upper portion of the support frame 44. The rotation attachment member 46 attaches the objective lens 1 and rotates the objective lens 1 around its optical axis as a rotation axis.

  Such a tilt mechanism 40 rotates the support frame 44 around the pupil position E of the objective lens 1 by pressing or returning the tip of the push screw 43 against the side surface of the support frame 44 by rotating the handle 45. Let Thereby, the objective lens 1, the spherical mirror 15, and the XYZ stage 14 are integrally inclined.

  Note that the tilt mechanism 40 may be configured to automatically tilt the objective lens 1, the spherical mirror 15, and the XYZ stage 14 automatically by connecting a motor shaft to the push screw 43 instead of the handle 45. In this case, the inclination angles of the objective lens 1, the spherical mirror 15, and the XYZ stage 14 can be achieved by controlling the rotation angle of the motor.

  Next, the operation of the apparatus configured as described above will be described.

  The light shielding mechanism driving circuit 34 inserts the shutter 32 on the optical axis of the interferometer 23, and the insertion / removal mechanism driving circuit 35 is in a state where the belt run lens 33 is extracted from the optical axis of the point image enlarging optical system 28.

  On the other hand, the tilt mechanism 40 tilts the objective lens 1, the spherical mirror 15, and the XYZ stage 14 integrally. In this state, the laser light output from the laser light source 20 is transmitted through the optical fiber 21 and emitted radially from the other end, collimated into parallel light by the collimating lens 22 and incident on the beam splitter 24, and this beam splitter. The laser beam incident on 24 is branched in two directions by the beam splitter 24, and one of the laser beams is reflected downward and enters the objective lens 1 through the holes 18 and 17.

  Since the objective lens 1 is tilted with respect to the optical axis direction of the laser light incident by the tilt mechanism 40, the parallel laser light incident on the objective lens 1 is condensed off the axis of the objective lens 1. .

  Thereafter, the center of curvature of the spherical mirror 15 mounted on the XYZ stage 14 is moved to the off-axis condensing position of the objective lens 1. As a result, the laser light reflected by the spherical mirror 15 follows the same path in the objective lens 1 and enters the point image enlarging optical system 28 as in the first embodiment.

  The point image enlarging optical system 28 emphasizes and enlarges the point image that appears by the laser beam reciprocating to the objective lens 1. This point image is an off-axis point image of the objective lens 1. Therefore, if the tilt angle of the objective lens 1 is changed by the tilt mechanism 40, each point image at each position off the axis of the objective lens 1 is obtained. Further, the rotation mounting member 46 rotates the objective lens 1 with its optical axis as a rotation axis. Thereby, each point image in each position off-axis of the said objective lens 1 when the objective lens 1 rotates is obtained.

  Therefore, if the objective lens 1 is tilted and rotated, point images at all off-axis positions of the objective lens 1 can be obtained.

  The image sensor 30 captures each point image at each off-axis position of the objective lens 1 enhanced and magnified by the point image enlarging optical system 28 and outputs the image signal. The analysis device 36 receives the image signal output from the image pickup device 30, and the first image data represents the image of each point image at each position off-axis of the objective lens 1 that is emphasized and enlarged by the point image enlargement optical system 28. Is stored in the internal memory, and the first image data is analyzed to determine the decentration coma aberration of the objective lens 1, and the intensity distribution of the point image enhanced and enlarged by the point image enlarging optical system 28 is analyzed and enhanced The enlarged point image is displayed on the monitor 37 in real time.

  On the other hand, when adjusting each lens interval of the objective lens 1, as shown in FIG. 1, the light shielding mechanism drive circuit 34 extracts the shutter 32 from the optical axis of the interferometer 23, and the insertion / removal mechanism drive circuit 35 A belt run lens 33 is inserted on the optical axis of the image magnification optical system 28.

  In this state, the laser light output from the laser light source 20 is transmitted through the optical fiber 21 and emitted radially from the other end, collimated into parallel light by the collimating lens 22 and incident on the beam splitter 24, and this beam splitter. 24 is branched into two directions, and one of the laser beams is incident on the objective lens 1, is transmitted there, and is condensed off-axis of the objective lens 1. The laser light reflected by the spherical mirror 15 follows the same path in the objective lens 1 and enters the beam splitter 24 in the same manner as described above. The other laser light passes through the beam splitter 24, is reflected by the reference plane mirror 25, and enters the beam splitter 24 again as reference light. As a result, the test light from the objective lens 1 side and the reference light from the reference plane mirror 25 interfere with each other, and interference fringes reflecting the transmitted wavefront aberration of the objective lens 1 are generated.

  The interference fringes reflecting the transmitted wavefront aberration of the objective lens 1 form an image on the imaging surface of the imaging element 30 that is conjugate with the pupil position of the objective lens 1 through the belt run lens 33 and the imaging lens 29.

  In this state, when the reference plane mirror 25 moves every minute distance in the same direction as the optical axis direction of the laser beam by a minute displacement of the moving element 26 such as a piezo element (PZT), each minute distance of the reference plane mirror 25. Interference fringes for each different phase are generated by each movement. The image sensor 30 images each interference fringe and outputs each image signal.

  The analysis device 36 analyzes each second image data of each interference fringe for each phase generated by the interferometer 23 to obtain each transmitted wavefront aberration of the objective lens 1 and quantifies these transmitted wavefront aberrations. An analysis method of interference fringes by the so-called phase shift method is performed. Then, the analysis device 36 displays the analyzed result of each transmitted wavefront aberration of the objective lens 1 on the monitor 37 in real time.

  Thus, according to the second embodiment, since the tilt mechanism 40 that tilts the objective lens 1 around the pupil position E of the objective lens 1 is provided, in addition to the first embodiment, Each point image at each off-axis position of the objective lens 1 can be observed in real time. In addition, since the objective lens 1 is rotated about the optical axis of the objective lens 1 by the rotation attachment member 46, each point image can be observed at all off-axis positions of the objective lens 1. Therefore, the performance of the objective lens 1 can be evaluated on the axis and off the axis.

  In addition, this invention is not limited to said each embodiment, You may deform | transform as follows.

  In each of the above embodiments, the concave spherical spherical mirror 15 is used. However, as shown in FIG. 8, a spherical mirror 50 formed on a convex spherical surface may be used.

  The spherical mirror shown in FIG. 9 is suitable for point image observation in assembling and adjusting an objective lens mounted on a biological microscope, for example.

  In general, a biological specimen is sliced and placed on a slide glass, and a cover glass having a thickness of, for example, about 0.17 mm is placed on the biological specimen on the slide glass and observed. Therefore, an objective lens for observing a biological specimen is designed so that aberration is minimized when a cover glass is installed.

  In addition, the biological specimen may be practically considered to have an optical refractive index approximately equal to that of physiological saline. In order to observe the point image of the objective lens 1 in a state close to the observation of such a biological specimen, the spherical mirror 51 shown in FIG. 9 is suitable. The spherical mirror 51 is formed in, for example, a hemispherical shape obtained by cutting a high-precision glass ball lens, and includes a flat surface 52 and a hemispherical reflecting surface 53. A biological specimen is placed on the plane 52, and a cover glass 54 is placed thereon.

  The focal position of the objective lens 1 is set on the plane 52 of the spherical mirror 51 that has passed through the cover glass 54. It should be noted that the spherical mirror 51 may be glass that has a glass inside and that can be regarded as a refractive index practically close to that even if the refractive index is not the same as that of physiological saline.

  In such a spherical mirror 51, the laser light reflected by the reflecting surface 53 of the spherical mirror 51 again passes through the objective lens 1 along the original path, and twice as much aberration as that of the objective lens 1 is added. A point image can be observed. Further, when the objective lens 1 is an oil immersion objective lens often used in a biological microscope, the oil may be filled between the cover glass 54 and the objective lens 1 shown in FIG.

  In the second embodiment, the objective lens 1, the spherical mirror 15, and the XYZ stage 14 are integrally tilted. However, the present invention is not limited to this. 24. Even if the point image enlarging optical system 28 is tilted integrally, an off-axis point image of the objective lens 1 can be observed. To be exact, it goes without saying that the objective lens 1, the spherical mirror 15, and the XYZ stage 14 need only be integrally and relatively inclined.

  Note that if the rotation axis when tilting deviates from the pupil position of the objective lens 1, the luminous flux will be vignetted at the pupil frame of the objective lens 1 at the time of tilting. It is preferable that the position of the objective lens 1 is approximately the pupil position.

  A laser light source 20 is used as a light source, and a single mode optical fiber 21 is desirable as a means for transmitting laser light output from the laser light source 20. The laser light may be directly introduced from the laser light source 20 without introducing the laser light through the optical fiber 21.

  Although the interferometer 23 has been described as a Twiman Green type, another type of interferometer may be used as long as it can easily switch between point image observation and interference fringe observation.

  In the first and second embodiments, the laser light is reciprocated once in the objective lens 1, but it may be reciprocated a plurality of times. In such a reciprocating optical system, for example, a partially reflecting mirror 55 is provided in the arm member 13 as shown in FIG. The partial reflection mirror 55 is disposed opposite to the spherical mirror 15 via the objective lens 1, reflects a part of the laser light reflected by the spherical mirror 15 and transmitted through the objective lens 1, and again the objective lens 1. Make it transparent. Therefore, the laser light reciprocates the objective lens 1 a plurality of times. Thereby, the point image of the laser beam in which the aberration of the objective lens 1 is added multiple times can be observed in real time, and the eccentric coma aberration of the objective lens 1 can be adjusted efficiently and with high accuracy.

BRIEF DESCRIPTION OF THE DRAWINGS The block diagram which shows 1st Embodiment of the lens assembly assistance apparatus which concerns on this invention. The block diagram when adjusting the eccentricity of the objective lens in the same apparatus. The figure which shows the point image of the ideal objective lens without the decentration coma aberration obtained by the same apparatus. The figure which shows the point image of an objective lens when the eccentric coma aberration obtained by the same apparatus exists. The figure which shows the point image of an objective lens when the eccentric coma aberration obtained by the same apparatus exists. The figure which shows the interference fringe obtained by the same apparatus. The block diagram which shows 2nd Embodiment of the lens assembly assistance apparatus which concerns on this invention. The figure which shows the modification of the spherical mirror used for the lens assembly assistance apparatus which concerns on this invention. The figure which shows the modification of the spherical mirror used for the lens assembly assistance apparatus which concerns on this invention. The figure which shows the modification of the reciprocating optical system used for the lens assembly assistance apparatus which concerns on this invention. The figure which shows the specific example of the conventional eccentricity adjustment. The figure which shows the chart in which the circular opening pattern used for the eccentric adjustment was formed. The figure which shows the image obtained by the same chart. The figure which shows the reference | standard lens system which is the transmission evaluation system which does not use the conventional chart.

Explanation of symbols

  1: Test optical system (objective lens), 2: First sub lens, 3: Second sub lens, 4: Adjustment lens, 10: Housing, 11: Base member, 12: Support member, 13 : Arm member, 14: XYZ stage, 15: spherical mirror, 16: objective lens mounting member, 17, 18: hole, 19: incident optical system, 20: laser light source, 21: optical fiber, 22: collimating lens, 23: interference 24: Beam splitter, 25: Reference plane mirror, 26: Moving element, 27: Piezo element driving circuit, 28: Point image enlarging optical system, 29: Imaging lens, 30: Image sensor, 31: Optical system switching mechanism 32: shutter, 33: belt run lens, 34: light shielding mechanism drive circuit, 35: insertion / removal mechanism drive circuit, 36: analysis device, 37: monitor, 40: mount, 41: mount, 42: push screw mount, 43: Push Screw, 44: support frame 45: steering wheel, 46: rotation attachment member, 50: spherical mirror, 51: spherical mirror, 52: plane, 53: reflective surface, 54: cover glass, 55: a portion reflecting mirror.

Claims (24)

An incident optical system for making light incident on the optical system to be tested;
A reciprocating optical system which is provided on the optical axis of the test optical system and reciprocates the light at least once in the test optical system;
A point image enlarging optical system for adjusting the decentration of the test optical system for enhancing and enlarging the point image appearing by the test light reciprocating to the test optical system;
An interferometer for adjusting the lens of the test optical system that generates interference fringes reflecting the transmitted wavefront aberration of the test optical system due to interference between the test light and the reference light reciprocating to the test optical system;
An optical system switching mechanism for switching between enhancement of the point image by the point image magnification optical system and generation of the interference fringes by the interferometer;
A lens assembly support apparatus comprising: An incident optical system for making light incident on the optical system to be tested;
A reciprocating optical system which is provided on the optical axis of the test optical system and reciprocates the light at least once in the test optical system;
A point image enlarging optical system for enhancing and enlarging a point image appearing by the test light reciprocated to the test optical system by the reciprocating optical system;
An interferometer that generates interference fringes reflecting the transmitted wavefront aberration of the test optical system due to interference between the test light and the reference light reciprocated to the test optical system by the reciprocating optical system;
An optical system switching mechanism that switches between enhancement of the point image by the point image magnification optical system or generation of the interference fringes by the interferometer;
An analyzer for obtaining a transmitted wavefront aberration of the optical system to be measured based on image data of the interference fringes generated by the interferometer;
A lens assembly support apparatus comprising:   The optical system switching mechanism includes a first adjustment optical system for adjusting the decentering of the optical system to be measured, the optical system switching mechanism including the incident optical system, the reciprocating optical system, and the point image enlarging optical system, the incident optical system, and the 3. The lens assembly support device according to claim 1, wherein the lens assembly support device is switched to a second adjustment optical system for adjusting the lens of the optical system to be detected, which includes a reciprocating optical system and the interferometer. The optical system switching mechanism includes a light shielding mechanism capable of shielding the optical axis of the interferometer,
In a state where the optical axis of the interferometer is shielded by the light shielding mechanism, the optical axis of the point image magnification optical system is extracted, and the optical axis of the interferometer is not shielded by the light shielding mechanism, An optical element inserted on the optical axis of the point image enlarging optical system to transmit the interference fringes to the point image enlarging optical system;
The lens assembly support device according to claim 1, further comprising:   The light shielding mechanism shields the optical axis of the interferometer when the point image is emphasized and magnified by the point image enlarging optical system, and from the optical axis of the interferometer when the interference fringe is generated by the interferometer. 3. The lens assembly support device according to claim 1, wherein the lens assembly support device is extracted.   5. The lens assembly support device according to claim 4, wherein the light shielding mechanism has a shutter that can be inserted into and removed from the optical axis of the interferometer. The point image enlarging optical system has an image sensor that captures the point image by the test light reciprocating to the test optical system,
5. The lens according to claim 4, wherein the optical element is inserted on an optical axis of the point image enlarging optical system so that the pupil position of the test optical system and the imaging element are in a conjugate relationship. Assembly support device.   The lens assembly support device according to claim 4, wherein the optical element includes a belt run lens.   9. The lens assembly support device according to claim 8, further comprising an insertion / removal mechanism for inserting / removing the belt run lens with respect to the optical axis of the point image enlarging optical system.   The insertion / removal mechanism extracts the Bertrand lens from the optical axis of the point image enlarging optical system when obtaining the decentered coma aberration of the test optical system, and obtains the transmitted wavefront aberration of the test optical system The lens assembly support apparatus according to claim 9, wherein the belt run lens is inserted on the optical axis of the point image enlarging optical system.   The lens assembly support device according to claim 10, wherein the point image enlarging optical system transmits the interference fringes generated by the interferometer to the image sensor when the belt run lens is inserted.   The reciprocating optical system is disposed on an optical path of the light that has been incident on the incident optical system and transmitted through the test optical system, reflects the light transmitted through the test optical system, and again reflects the test optical. 3. The lens assembly support apparatus according to claim 1, further comprising a spherical mirror that transmits the light to the system.   The lens assembly support device according to claim 12, wherein the spherical mirror has a concave spherical surface or a convex spherical surface. The reciprocating optical system is disposed on an optical path of the light that has been incident on the incident optical system and transmitted through the test optical system, reflects the light transmitted through the test optical system, and again reflects the test optical. A spherical mirror that is transmitted through the system,
The spherical mirror is disposed to face the test optical system, reflects a part of the light reflected by the spherical mirror and transmitted through the test optical system, and transmits again to the test optical system. A partially reflecting mirror
The lens assembly support device according to claim 1, further comprising: The point image enlarging optical system is an imaging optical system for enlarging and projecting the point image by the test light reciprocating to the test optical system;
An image sensor that captures the point image enlarged and projected by the imaging optical system;
The lens assembly support device according to claim 1, further comprising: The incident optical system includes a laser light source that outputs laser light;
An optical fiber for guiding the laser light output from the laser light source;
A collimating lens for collimating the laser light emitted from the optical fiber;
The lens assembly support device according to claim 1, further comprising: The interferometer includes a reference plane mirror that reflects the light from the incident optical system as the reference light;
A moving element that moves the reference plane mirror in the optical axis direction of the light;
The lens assembly support device according to claim 1, further comprising:   The lens assembly support device according to claim 17, wherein the moving element includes a piezo element.   3. The lens assembly support apparatus according to claim 1, further comprising a tilt mechanism that tilts the test optical system and the spherical mirror integrally with respect to a pupil position of the test optical system.   20. The lens assembly support device according to claim 19, wherein the tilt mechanism includes a rotation mounting member that rotates the test optical system while mounting the test optical system on the tilt mechanism.   The lens assembly support device according to claim 2, wherein the analysis device analyzes an intensity distribution of the point image emphasized and enlarged by the enlargement optical system. The interferometer includes a reference plane mirror that reflects the light from the incident optical system as the reference light, and a moving element that moves the reference plane mirror in the optical axis direction of the light,
The analyzing apparatus obtains the transmitted wavefront aberration of the optical system to be measured from a plurality of images of the interference fringes having different phases obtained by moving the reference plane mirror;
The lens assembly support device according to claim 2, wherein: A tilting mechanism for tilting the test optical system and the spherical mirror integrally around the pupil position of the test optical system, and the tilting mechanism integrally connects the test optical system and the spherical mirror In a state in which the test optical system is tilted around the pupil position, the analysis device obtains decentration coma aberration of the test optical system outside the optical axis of the test optical system, or the test optical system To determine the transmitted wavefront aberration off the optical axis of
The lens assembly support device according to claim 2, wherein:   The lens assembly support device according to claim 1, wherein the test optical system is formed by arranging a plurality of lenses on the same optical axis.

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