JP2005255728A - Azo metal chelate compound and optical recording medium using the same - Google Patents
Azo metal chelate compound and optical recording medium using the same Download PDFInfo
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- JP2005255728A JP2005255728A JP2004066046A JP2004066046A JP2005255728A JP 2005255728 A JP2005255728 A JP 2005255728A JP 2004066046 A JP2004066046 A JP 2004066046A JP 2004066046 A JP2004066046 A JP 2004066046A JP 2005255728 A JP2005255728 A JP 2005255728A
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- carbon atoms
- metal chelate
- chelate compound
- recording
- Prior art date
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- 150000001875 compounds Chemical class 0.000 title claims abstract description 87
- 229910052751 metal Inorganic materials 0.000 title claims abstract description 73
- 239000002184 metal Substances 0.000 title claims abstract description 73
- 239000013522 chelant Substances 0.000 title claims abstract description 51
- 230000003287 optical effect Effects 0.000 title claims abstract description 39
- -1 azo compound Chemical class 0.000 claims abstract description 95
- 150000003839 salts Chemical class 0.000 claims abstract description 17
- 125000002029 aromatic hydrocarbon group Chemical group 0.000 claims abstract 2
- 125000004432 carbon atom Chemical group C* 0.000 claims description 93
- 125000001424 substituent group Chemical group 0.000 claims description 28
- 239000000758 substrate Substances 0.000 claims description 27
- 125000000217 alkyl group Chemical group 0.000 claims description 17
- 125000003342 alkenyl group Chemical group 0.000 claims description 16
- 125000003545 alkoxy group Chemical group 0.000 claims description 14
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 11
- 125000003118 aryl group Chemical group 0.000 claims description 9
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 9
- 125000002252 acyl group Chemical group 0.000 claims description 8
- 125000004453 alkoxycarbonyl group Chemical group 0.000 claims description 8
- 125000005078 alkoxycarbonylalkyl group Chemical group 0.000 claims description 8
- 125000003282 alkyl amino group Chemical group 0.000 claims description 8
- 125000003806 alkyl carbonyl amino group Chemical group 0.000 claims description 8
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 8
- 125000004093 cyano group Chemical group *C#N 0.000 claims description 8
- 125000005843 halogen group Chemical group 0.000 claims description 8
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 claims description 8
- 125000003277 amino group Chemical group 0.000 claims description 7
- 229910052799 carbon Inorganic materials 0.000 claims description 7
- 125000002485 formyl group Chemical group [H]C(*)=O 0.000 claims description 7
- 125000002768 hydroxyalkyl group Chemical group 0.000 claims description 7
- 125000002883 imidazolyl group Chemical group 0.000 claims description 6
- 125000004076 pyridyl group Chemical group 0.000 claims description 6
- 229910052802 copper Inorganic materials 0.000 claims description 5
- 125000000623 heterocyclic group Chemical group 0.000 claims description 5
- 229910052759 nickel Inorganic materials 0.000 claims description 5
- 229910052757 nitrogen Inorganic materials 0.000 claims description 5
- 125000004739 (C1-C6) alkylsulfonyl group Chemical group 0.000 claims description 4
- 125000006700 (C1-C6) alkylthio group Chemical group 0.000 claims description 4
- RGTVXXNMOGHRAY-WDSKDSINSA-N Cys-Arg Chemical compound SC[C@H](N)C(=O)N[C@H](C(O)=O)CCCN=C(N)N RGTVXXNMOGHRAY-WDSKDSINSA-N 0.000 claims description 4
- 125000004433 nitrogen atom Chemical group N* 0.000 claims description 4
- 125000004430 oxygen atom Chemical group O* 0.000 claims description 4
- 229910052717 sulfur Inorganic materials 0.000 claims description 4
- 125000004434 sulfur atom Chemical group 0.000 claims description 4
- 125000002541 furyl group Chemical group 0.000 claims description 3
- 125000001544 thienyl group Chemical group 0.000 claims description 3
- 125000006615 aromatic heterocyclic group Chemical group 0.000 abstract description 2
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- 125000000751 azo group Chemical group [*]N=N[*] 0.000 description 13
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- 239000011347 resin Substances 0.000 description 11
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 10
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- 230000006866 deterioration Effects 0.000 description 7
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- 125000004414 alkyl thio group Chemical group 0.000 description 4
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- 239000004202 carbamide Substances 0.000 description 4
- 238000005229 chemical vapour deposition Methods 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 4
- 125000001995 cyclobutyl group Chemical group [H]C1([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 4
- 125000000596 cyclohexenyl group Chemical group C1(=CCCCC1)* 0.000 description 4
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 4
- 125000002433 cyclopentenyl group Chemical group C1(=CCCC1)* 0.000 description 4
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- 238000000354 decomposition reaction Methods 0.000 description 4
- 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 description 4
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 4
- 238000000921 elemental analysis Methods 0.000 description 4
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 4
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- 238000011156 evaluation Methods 0.000 description 4
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- 238000001746 injection moulding Methods 0.000 description 4
- 125000003253 isopropoxy group Chemical group [H]C([H])([H])C([H])(O*)C([H])([H])[H] 0.000 description 4
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 4
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 4
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 4
- 239000011259 mixed solution Substances 0.000 description 4
- 238000002156 mixing Methods 0.000 description 4
- 125000006606 n-butoxy group Chemical group 0.000 description 4
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 4
- 125000001298 n-hexoxy group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])O* 0.000 description 4
- 125000003935 n-pentoxy group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])O* 0.000 description 4
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 4
- 125000003506 n-propoxy group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])O* 0.000 description 4
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 4
- 229940078487 nickel acetate tetrahydrate Drugs 0.000 description 4
- OINIXPNQKAZCRL-UHFFFAOYSA-L nickel(2+);diacetate;tetrahydrate Chemical compound O.O.O.O.[Ni+2].CC([O-])=O.CC([O-])=O OINIXPNQKAZCRL-UHFFFAOYSA-L 0.000 description 4
- 239000000049 pigment Substances 0.000 description 4
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 4
- 125000004368 propenyl group Chemical group C(=CC)* 0.000 description 4
- 238000002310 reflectometry Methods 0.000 description 4
- 125000005920 sec-butoxy group Chemical group 0.000 description 4
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 4
- 239000001632 sodium acetate Substances 0.000 description 4
- 235000017281 sodium acetate Nutrition 0.000 description 4
- 238000003786 synthesis reaction Methods 0.000 description 4
- 125000004213 tert-butoxy group Chemical group [H]C([H])([H])C(O*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 4
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 4
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- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 4
- QGKMIGUHVLGJBR-UHFFFAOYSA-M (4z)-1-(3-methylbutyl)-4-[[1-(3-methylbutyl)quinolin-1-ium-4-yl]methylidene]quinoline;iodide Chemical compound [I-].C12=CC=CC=C2N(CCC(C)C)C=CC1=CC1=CC=[N+](CCC(C)C)C2=CC=CC=C12 QGKMIGUHVLGJBR-UHFFFAOYSA-M 0.000 description 3
- CSUFEOXMCRPQBB-UHFFFAOYSA-N 1,1,2,2-tetrafluoropropan-1-ol Chemical compound CC(F)(F)C(O)(F)F CSUFEOXMCRPQBB-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
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- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
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- 238000004519 manufacturing process Methods 0.000 description 3
- 150000002736 metal compounds Chemical class 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
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- AAAQKTZKLRYKHR-UHFFFAOYSA-N triphenylmethane Chemical compound C1=CC=CC=C1C(C=1C=CC=CC=1)C1=CC=CC=C1 AAAQKTZKLRYKHR-UHFFFAOYSA-N 0.000 description 3
- 238000007740 vapor deposition Methods 0.000 description 3
- 125000004191 (C1-C6) alkoxy group Chemical group 0.000 description 2
- POILWHVDKZOXJZ-ARJAWSKDSA-M (z)-4-oxopent-2-en-2-olate Chemical class C\C([O-])=C\C(C)=O POILWHVDKZOXJZ-ARJAWSKDSA-M 0.000 description 2
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- QPFMBZIOSGYJDE-UHFFFAOYSA-N 1,1,2,2-tetrachloroethane Chemical compound ClC(Cl)C(Cl)Cl QPFMBZIOSGYJDE-UHFFFAOYSA-N 0.000 description 2
- YQTCQNIPQMJNTI-UHFFFAOYSA-N 2,2-dimethylpropan-1-one Chemical group CC(C)(C)[C]=O YQTCQNIPQMJNTI-UHFFFAOYSA-N 0.000 description 2
- BCHZICNRHXRCHY-UHFFFAOYSA-N 2h-oxazine Chemical compound N1OC=CC=C1 BCHZICNRHXRCHY-UHFFFAOYSA-N 0.000 description 2
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- RXQNKKRGJJRMKD-UHFFFAOYSA-N 5-bromo-2-methylaniline Chemical compound CC1=CC=C(Br)C=C1N RXQNKKRGJJRMKD-UHFFFAOYSA-N 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 2
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- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 2
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- 125000004817 pentamethylene group Chemical group [H]C([H])([*:2])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[*:1] 0.000 description 2
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Images
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- Thermal Transfer Or Thermal Recording In General (AREA)
- Plural Heterocyclic Compounds (AREA)
- Optical Record Carriers And Manufacture Thereof (AREA)
Abstract
Description
本発明は、アゾ金属キレート化合物を用いた、従来に比較して高密度に記録および再生可能な光記録媒体に関する。 The present invention relates to an optical recording medium using an azo metal chelate compound and capable of recording and reproducing at a higher density than in the past.
画像、映像、音声等のデータを記録再生することのできる媒体として、有機色素を記録材料として用いるCD−Rが広く知られている。現在、扱われるデータ量の増大に伴い、CD−Rと比較して大容量な記録再生可能な光記録媒体の普及が望まれ、中でもCD−R同様有機色素を記録材料とするDVD−Rが、次世代を担う媒体として開発され、商品化されるに至っている。 A CD-R using an organic dye as a recording material is widely known as a medium capable of recording and reproducing data such as images, videos, and sounds. At present, with the increase in the amount of data to be handled, it is desired that an optical recording medium capable of recording and reproducing a large volume compared with a CD-R is desired. In particular, a DVD-R using an organic dye as a recording material is similar to a CD-R. Developed and commercialized as the next generation medium.
DVD−Rでは高密度記録を行うためにレーザー光の発信波長が630nm〜680nm近傍とCD−Rの場合よりも短波長化している。このような短波長用途の有機色素系光記録媒体の色素としては、シアニン、アゾ、ポルフィリン系色素他、インジゴ類、ジオキサジン、クマリン、ペリレン、ナフトラクタム、トリフェニルメタン、サブフタロシアニン、ジベンゾピラン、ジピロメテン等が提案されている。 In DVD-R, in order to perform high-density recording, the transmission wavelength of laser light is near 630 nm to 680 nm and shorter than in the case of CD-R. Examples of such dyes for organic dye-based optical recording media for short wavelengths include cyanine, azo, porphyrin dyes, indigo, dioxazine, coumarin, perylene, naphtholactam, triphenylmethane, subphthalocyanine, dibenzopyran, dipyrromethene, and the like. Has been proposed.
しかしながら、耐久性の問題や、特に短波長用途に固有の問題、例えば、絞られたレーザー光で小さなピットを開けるべきところが、周りへの影響が大きく、分布の大きいピット形成に起因するジッターの悪化、半径方向へのクロストークの悪化や、ピットが極端に小さくなることに起因する変調度の悪化、あるいは、目的とするレーザー波長において、不適切な光学定数(屈折率、消衰係数)を有する有機色素を記録層に選択することに起因する反射率の低下や感度の悪化については未だ改善の余地が残されている。 However, durability problems, especially problems that are specific to short-wavelength applications, such as where small pits should be opened with focused laser light, have a large impact on the surroundings, and jitter deterioration due to pit formation with a large distribution , Deterioration of radial crosstalk, deterioration of modulation due to extremely small pits, or inappropriate optical constant (refractive index, extinction coefficient) at the target laser wavelength There is still room for improvement in the reduction in reflectance and the deterioration in sensitivity caused by the selection of the organic dye as the recording layer.
更に、CD−Rにおける記録速度の高速化に見られるように、DVD−Rにおいても標準の記録速度に比べ、4倍速や8倍速、若しくはそれ以上の16倍速に対応した光記録媒体が望まれている。また、標準の記録速度から高速の記録速度のいずれの速度で記録しても良好な記録を行うことのできる光記録媒体の実現が望まれている。 Furthermore, as seen in the increase in recording speed in CD-R, an optical recording medium corresponding to 16 times speed, 4 times speed, 8 times speed or more is desired in DVD-R as compared with the standard recording speed. ing. Also, it is desired to realize an optical recording medium that can perform good recording regardless of whether the recording speed is a standard recording speed or a high recording speed.
しかし、記録速度の高速化に伴い、ピット形成時の記録層色素の分解挙動を制御することは困難となり、これに起因する記録感度の悪化、ジッターの悪化等の問題を有している。また、標準速記録における記録特性と高速記録における記録特性は、トレードオフの関係にあり、いずれか一方の特性を満足するためには、他方の特性を犠牲にする必要があるという問題を有している。 However, with the increase in recording speed, it becomes difficult to control the decomposition behavior of the recording layer dye during pit formation, which causes problems such as deterioration in recording sensitivity and deterioration in jitter. In addition, the recording characteristics in standard speed recording and the recording characteristics in high speed recording are in a trade-off relationship, and in order to satisfy one of the characteristics, it is necessary to sacrifice the other characteristic. ing.
本発明者の目的は、波長520〜690nmの短波長レーザーでの記録および再生が可能でかつ、標準の記録速度のみならず高速度の記録においても良好な記録特性を有する、耐久性に優れた高密度光記録媒体を提供することにある。 The object of the present inventor is to record and reproduce with a short wavelength laser having a wavelength of 520 to 690 nm, and has good recording characteristics not only at standard recording speed but also at high speed recording, and excellent in durability. The object is to provide a high-density optical recording medium.
本発明者らは、上記課題を解決すべく鋭意検討を進めた結果、特定の構造を有するアゾ金属キレート化合物を用いることにより、標準速記録における記録特性や、耐久性に優れるばかりでなく、高速記録にも対応が可能な光記録媒体が得られることを見出し、本発明を完成するに至った。 As a result of intensive studies to solve the above problems, the present inventors have not only excellent recording characteristics and durability in standard speed recording but also high speed by using an azo metal chelate compound having a specific structure. The inventors have found that an optical recording medium capable of recording can be obtained, and have completed the present invention.
即ち、本発明は、
〔1〕互いに異なっていても、同一であっても良い2以上のアゾ化合物と2価以上の金属塩とから形成される金属キレート化合物であって、該アゾ化合物のうち少なくとも1つが下記一般式(1)で示されるアゾ化合物であることを特徴とする金属キレート化合物、
That is, the present invention
[1] A metal chelate compound formed from two or more azo compounds which may be the same or different from each other and a divalent or higher metal salt, and at least one of the azo compounds is represented by the following general formula: A metal chelate compound characterized by being an azo compound represented by (1),
(式中、環A、Xはそれぞれ独立に置換基を有していてもよい複素環を表わし、環Bは芳香族炭化水素環を表わす。) (In the formula, rings A and X each independently represent a heterocyclic ring optionally having a substituent, and ring B represents an aromatic hydrocarbon ring.)
〔2〕一般式(1)において、環Aが置換基を有していてもよい
イミダゾイル基、オキサゾイル基、チアゾイル基、
ピラゾイル基、イソオキサゾイル基、イソチアゾイル基、
トリアゾイル基、チアジアゾイル基、イソチアジアゾイル基、ピリジル基
である〔1〕記載の金属キレート化合物、
[2] In general formula (1), ring A may have a substituent, an imidazolyl group, an oxazoyl group, a thiazoyl group,
Pyrazoyl group, isoxazoyl group, isothiazoyl group,
The metal chelate compound according to [1], which is a triazoyl group, a thiadiazoyl group, an isothiadiazoyl group, or a pyridyl group;
〔3〕一般式(1)において、Xが置換基を有していてもよい
イミダゾイル基、オキサゾイル基、チアゾイル基、
ピラゾイル基、イソオキサゾイル基、イソチアゾイル基、
フリル基、チエニル基、ピリジル基
である〔1〕記載の金属キレート化合物、
[3] In the general formula (1), X may have a substituent, an imidazolyl group, an oxazoyl group, a thiazoyl group,
Pyrazoyl group, isoxazoyl group, isothiazoyl group,
The metal chelate compound according to [1], which is a furyl group, a thienyl group, or a pyridyl group;
〔4〕互いに異なっていても、同一であっても良い2つの下記一般式(2)で示されるアゾ化合物とNi、CoまたはCuの金属塩とから形成される金属キレート化合物、 [4] A metal chelate compound formed from two azo compounds represented by the following general formula (2), which may be the same or different from each other, and a metal salt of Ni, Co or Cu,
(式中、Y1、Y2、Y3、Y4、Y5、Y6およびY7はそれぞれ独立に炭素原子、窒素原子、酸素原子、硫黄原子、C−R4、N−R4を表わし(R4は水素原子、ハロゲン原子、ホルミル基、ヒドロキシル基、カルボキシル基、シアノ基、ニトロ基、アミノ基、炭素数1〜6のアルキル基、炭素数1〜6のアルコキシ基、炭素数2〜7のアシル基、炭素数2〜6のアルケニル基、炭素数1〜6のヒドロキシアルキル基、炭素数2〜7のアルコキシカルボニル基、炭素数1〜12のアルキルアミノ基、炭素数3〜7のアルコキシカルボニルアルキル基、炭素数1〜6のアルキルチオ基、炭素数1〜6のアルキルスルホニル基、炭素数2〜6のアルキルカルボニルアミノ基を表わす。)、R1、R2およびR3はそれぞれ独立に水素原子、炭素数1〜6のアルキル基、炭素数1〜6のアルコキシ基、炭素数6〜16のアリール基、炭素数2〜6のアルケニル基を表わし、R1とR2若しくはR3、R2とR3は連結して5〜6員環を形成してもよい。) (Wherein Y 1 , Y 2 , Y 3 , Y 4 , Y 5 , Y 6 and Y 7 are each independently a carbon atom, nitrogen atom, oxygen atom, sulfur atom, C—R 4 , N—R 4 . (R 4 is a hydrogen atom, a halogen atom, a formyl group, a hydroxyl group, a carboxyl group, a cyano group, a nitro group, an amino group, an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, or 2 carbon atoms. -7 acyl group, alkenyl group having 2 to 6 carbon atoms, hydroxyalkyl group having 1 to 6 carbon atoms, alkoxycarbonyl group having 2 to 7 carbon atoms, alkylamino group having 1 to 12 carbon atoms, 3 to 7 carbon atoms R 1 , R 2, and R 3 are each an alkoxycarbonylalkyl group, a C 1-6 alkylthio group, a C 1-6 alkylsulfonyl group, or a C 2-6 alkylcarbonylamino group. Germany Hydrogen atom, an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, an aryl group having 6 to 16 carbon atoms, an alkenyl group having 2 to 6 carbon atoms, R 1 and R 2 or R 3 R 2 and R 3 may be linked to form a 5- to 6-membered ring.)
〔5〕基板上に少なくとも記録層および反射層を有する光記録媒体において、記録層中に、〔1〕〜〔4〕のいずれか1項に記載の金属キレート化合物を少なくとも1種含有する光記録媒体、に関するものである。 [5] In an optical recording medium having at least a recording layer and a reflective layer on a substrate, the recording layer contains at least one metal chelate compound according to any one of [1] to [4]. Media.
本発明の新規な金属キレート化合物を記録層として用いることにより、波長520〜690nmのレーザーで記録再生が可能であり、かつ耐久性に優れた高密度、高速記録に適した追記型光記録媒体を提供することが可能となる。 By using the novel metal chelate compound of the present invention as a recording layer, a write-once type optical recording medium suitable for high-density and high-speed recording that can be recorded and reproduced with a laser having a wavelength of 520 to 690 nm and has excellent durability It becomes possible to provide.
以下、本発明を詳細に説明する。 Hereinafter, the present invention will be described in detail.
本発明の金属キレート化合物とは、互いに異なっていても、同一であっても良い2以上のアゾ化合物と2価以上の金属塩とから形成される金属キレート化合物であって、該アゾ化合物のうち少なくとも1つが下記一般式(1)で示されるアゾ化合物であることを特徴とする金属キレート化合物である。 The metal chelate compound of the present invention is a metal chelate compound formed from two or more azo compounds which may be the same or different from each other and a metal salt having two or more valences, At least one of the metal chelate compounds is an azo compound represented by the following general formula (1).
本発明の金属キレート化合物を形成するアゾ化合物において、下記一般式(1)で示されるアゾ化合物以外のアゾ化合物としては、公知のアゾ化合物であればよく、特に制限はない。 In the azo compound forming the metal chelate compound of the present invention, the azo compound other than the azo compound represented by the following general formula (1) may be a known azo compound, and is not particularly limited.
本発明における金属キレート化合物を形成するアゾ化合物として、下記一般式(1)で表されるアゾ化合物についてより具体的に説明する。 As the azo compound forming the metal chelate compound in the present invention, the azo compound represented by the following general formula (1) will be described more specifically.
(式中、環A、Xはそれぞれ独立に置換基を有していてもよい複素環を表わし、環Bは芳香族炭化水素環を表わす。) (In the formula, rings A and X each independently represent a heterocyclic ring optionally having a substituent, and ring B represents an aromatic hydrocarbon ring.)
一般式(1)で表されるアゾ化合物において、環AおよびXは複素環であればよく、特に制限されるものではないが、好ましくは芳香族複素環であり、これらの複素環は置換基を有していても良い。環AおよびXとしては、5員環または6員環が好ましく、更に好ましくは、環Aではイミダゾイル基、オキサゾイル基、チアゾイル基、
ピラゾイル基、イソオキサゾイル基、イソチアゾイル基、
トリアゾイル基、チアジアゾイル基、イソチアジアゾイル基、ピリジル基であり、
Xではイミダゾイル基、オキサゾイル基、チアゾイル基、
ピラゾイル基、イソオキサゾイル基、イソチアゾイル基、
フリル基、チエニル基、ピリジル基である。具体的には下記の構造が挙げられる。
In the azo compound represented by the general formula (1), the rings A and X are not particularly limited as long as they are heterocyclic rings, but are preferably aromatic heterocyclic rings, and these heterocyclic rings are substituents. You may have. As the rings A and X, a 5-membered ring or a 6-membered ring is preferable, and in the ring A, an imidazolyl group, an oxazoyl group, a thiazoyl group,
Pyrazoyl group, isoxazoyl group, isothiazoyl group,
Triazoyl group, thiadiazoyl group, isothiadiazoyl group, pyridyl group,
In X, an imidazolyl group, an oxazoyl group, a thiazoyl group,
Pyrazoyl group, isoxazoyl group, isothiazoyl group,
A furyl group, a thienyl group, and a pyridyl group; Specific examples include the following structures.
式中R5は全て同じでも異なってもよく、
水素原子;フッ素原子、塩素原子、臭素原子等のハロゲン原子;ホルミル基;ヒドロキシル基;カルボキシル基;シアノ基;ニトロ基;アミノ基;
メチル基、トリフルオロメチル基、エチル基、ペンタフルオロエチル基、n−プロピル基、イソプロピル基、n−ブチル基、sec−ブチル基、tert−ブチル基、n−ペンチル基、n−ヘキシル基、シクロプロピル基、シクロブチル基、シクロペンチル基、シクロヘキシル基等の炭素数1〜6のアルキル基;
メトキシ基、エトキシ基、n−プロポキシ基、イソプロポキシ基、n−ブトキシ基、tert−ブトキシ基、sec−ブトキシ基、n−ペンチルオキシ基、n−ヘキシルオキシ基等の炭素数1〜6のアルコキシ基;
アセチル基、プロピオル基、ブチリル基、イソブチリル基、バレリル基、イソバレリル基、ピバロイル基、ヘキサノイル基、ヘプタノイル基等の炭素数2〜7のアシル基;
ビニル基、プロペニル基、ブテニル基、ペンテニル基、ヘキセニル基、シクロペンテニル基、シクロヘキセニル基等の炭素数2〜6のアルケニル基;
ヒドロキシメチル基、ヒドロキシエチル基等の炭素数1〜6のヒドロキシアルキル基;
メトキシカルボニル基、エトキシカルボニル基、n−プロポキシカルボニル基、イソプロポキシカルボニル基、n−ブトキシカルボニル基、tert−ブトキシカルボニル基、sec−ブトキシカルボニル基、n−ペンチルオキシカルボニル基、n−ヘキシルオキシカルボニル基等の炭素数2〜7のアルコキシカルボニル基;
メチルアミノ基、エチルアミノ基、n−プロピルアミノ基、n−ブチルアミノ基、ジメチルアミノ基、ジエチルアミノ基、ジ−n−プロピルアミノ基、ジ−n−ブチルアミノ基等の炭素数1〜12のアルキルアミノ基;
メトキシカルボニルメチル基、エトキシカルボニルメチル基、n−プロポキシカルボニルメチル基、イソプロポキシカルボニルエチル基等の炭素数3〜7のアルコキシカルボニルアルキル基;
メチルチオ基、エチルチオ基、n−プロピルチオ基、tert−ブチルチオ基、sec−ブチルチオ基、n−ペンチルチオ基、n−ヘキシルチオ基等の炭素数1〜6のアルキルチオ基;
メチルスルホニル基、エチルスルホニル基、n−プロピルスルホニル基、イソプロピルスルホニル基、n−ブチルスルホニル基、tert−ブチルスルホニル基、sec−ブチルスルホニル基、n−ペンチルスルホニル基、n−ヘキシルスルホニル基等の炭素数1〜6のアルキルスルホニル基;
メチルカルボニルアミノ基、エチルカルボニルアミノ基、n−プロピルカルボニルアミノ基、イソプロピルカルボニルアミノ基、n−ブチルカルボニルアミノ基、tert−ブチルカルボニルアミノ基、sec−ブチルカルボニルアミノ基、n−ペンチルカルボニルアミノ基等の炭素数2〜6のアルキルカルボニルアミノ基を表わす。
In which R 5 may all be the same or different,
Hydrogen atom; halogen atom such as fluorine atom, chlorine atom, bromine atom; formyl group; hydroxyl group; carboxyl group; cyano group; nitro group;
Methyl, trifluoromethyl, ethyl, pentafluoroethyl, n-propyl, isopropyl, n-butyl, sec-butyl, tert-butyl, n-pentyl, n-hexyl, cyclo An alkyl group having 1 to 6 carbon atoms such as propyl group, cyclobutyl group, cyclopentyl group, cyclohexyl group;
C1-C6 alkoxy such as methoxy group, ethoxy group, n-propoxy group, isopropoxy group, n-butoxy group, tert-butoxy group, sec-butoxy group, n-pentyloxy group, n-hexyloxy group, etc. Group;
An acyl group having 2 to 7 carbon atoms such as acetyl group, propiol group, butyryl group, isobutyryl group, valeryl group, isovaleryl group, pivaloyl group, hexanoyl group, heptanoyl group;
An alkenyl group having 2 to 6 carbon atoms such as vinyl group, propenyl group, butenyl group, pentenyl group, hexenyl group, cyclopentenyl group, cyclohexenyl group;
A hydroxyalkyl group having 1 to 6 carbon atoms such as a hydroxymethyl group and a hydroxyethyl group;
Methoxycarbonyl group, ethoxycarbonyl group, n-propoxycarbonyl group, isopropoxycarbonyl group, n-butoxycarbonyl group, tert-butoxycarbonyl group, sec-butoxycarbonyl group, n-pentyloxycarbonyl group, n-hexyloxycarbonyl group An alkoxycarbonyl group having 2 to 7 carbon atoms, such as
1 to 12 carbon atoms such as methylamino group, ethylamino group, n-propylamino group, n-butylamino group, dimethylamino group, diethylamino group, di-n-propylamino group, di-n-butylamino group, etc. An alkylamino group;
An alkoxycarbonylalkyl group having 3 to 7 carbon atoms such as a methoxycarbonylmethyl group, an ethoxycarbonylmethyl group, an n-propoxycarbonylmethyl group, an isopropoxycarbonylethyl group;
An alkylthio group having 1 to 6 carbon atoms such as methylthio group, ethylthio group, n-propylthio group, tert-butylthio group, sec-butylthio group, n-pentylthio group, n-hexylthio group;
Carbon such as methylsulfonyl group, ethylsulfonyl group, n-propylsulfonyl group, isopropylsulfonyl group, n-butylsulfonyl group, tert-butylsulfonyl group, sec-butylsulfonyl group, n-pentylsulfonyl group, n-hexylsulfonyl group 1-6 alkylsulfonyl groups;
Methylcarbonylamino group, ethylcarbonylamino group, n-propylcarbonylamino group, isopropylcarbonylamino group, n-butylcarbonylamino group, tert-butylcarbonylamino group, sec-butylcarbonylamino group, n-pentylcarbonylamino group, etc. Represents an alkylcarbonylamino group having 2 to 6 carbon atoms.
ここで、環A及びXが有していてもよい置換基としては、例えば、ハロゲン原子、ホルミル基、ヒドロキシル基、カルボキシル基、シアノ基、ニトロ基、アミノ基、置換基を有していてもよいアルキル基、置換基を有していてもよいアルコキシ基、置換基を有していてもよいアシル基、置換基を有していてもよいアルケニル基、置換基を有していてもよいヒドロキシアルキル基、置換基を有していてもよいアルコキシカルボニル基、置換基を有していてもよいアルキルアミノ基、置換基を有していてもよいアルコキシカルボニルアルキル基、置換基を有していてもよいアルキルチオ基、置換基を有していてもよいアルキルスルホニル基、置換基を有していてもよいアルキルカルボニルアミノ基等が挙げられる。 Here, examples of the substituent that the rings A and X may have include a halogen atom, a formyl group, a hydroxyl group, a carboxyl group, a cyano group, a nitro group, an amino group, and a substituent. A good alkyl group, an alkoxy group which may have a substituent, an acyl group which may have a substituent, an alkenyl group which may have a substituent, and a hydroxy which may have a substituent An alkyl group, an alkoxycarbonyl group which may have a substituent, an alkylamino group which may have a substituent, an alkoxycarbonylalkyl group which may have a substituent, and a substituent. And an alkylthio group which may have a substituent, an alkylsulfonyl group which may have a substituent, and an alkylcarbonylamino group which may have a substituent.
好ましくは、ハロゲン原子、ホルミル基、ヒドロキシル基、カルボキシル基、シアノ基、ニトロ基、アミノ基、炭素数1〜6のアルキル基、炭素数1〜6のアルコキシ基、炭素数2〜7のアシル基、炭素数2〜6のアルケニル基、炭素数1〜6のヒドロキシアルキル基、炭素数2〜7のアルコキシカルボニル基、炭素数1〜12のアルキルアミノ基、炭素数3〜7のアルコキシカルボニルアルキル基、炭素数1〜6のアルキルチオ基、炭素数1〜6のアルキルスルホニル基、炭素数2〜6のアルキルカルボニルアミノ基が挙げられ、
より具体的には、フッ素原子、塩素原子、臭素原子等のハロゲン原子;
ホルミル基;ヒドロキシル基;カルボキシル基;シアノ基;ニトロ基;アミノ基;
メチル基、トリフルオロメチル基、エチル基、ペンタフルオロエチル基、n−プロピル基、イソプロピル基、n−ブチル基、sec−ブチル基、tert−ブチル基、n−ペンチル基、n−ヘキシル基、シクロプロピル基、シクロブチル基、シクロペンチル基、シクロヘキシル基等の炭素数1〜6のアルキル基;
メトキシ基、エトキシ基、n−プロポキシ基、イソプロポキシ基、n−ブトキシ基、tert−ブトキシ基、sec−ブトキシ基、n−ペンチルオキシ基、n−ヘキシルオキシ基等の炭素数1〜6のアルコキシ基;
アセチル基、プロピオル基、ブチリル基、イソブチリル基、バレリル基、イソバレリル基、ピバロイル基、ヘキサノイル基、ヘプタノイル基等の炭素数2〜7のアシル基;
ビニル基、プロペニル基、ブテニル基、ペンテニル基、ヘキセニル基、シクロペンテニル基、シクロヘキセニル基等の炭素数2〜6のアルケニル基;
ヒドロキシメチル基、ヒドロキシエチル基等の炭素数1〜6のヒドロキシアルキル基;
メトキシカルボニル基、エトキシカルボニル基、n−プロポキシカルボニル基、イソプロポキシカルボニル基、n−ブトキシカルボニル基、tert−ブトキシカルボニル基、sec−ブトキシカルボニル基、n−ペンチルオキシカルボニル基、n−ヘキシルオキシカルボニル基等の炭素数2〜7のアルコキシカルボニル基;
メチルアミノ基、エチルアミノ基、n−プロピルアミノ基、n−ブチルアミノ基、ジメチルアミノ基、ジエチルアミノ基、ジ−n−プロピルアミノ基、ジ−n−ブチルアミノ基等の炭素数1〜12のアルキルアミノ基;
メトキシカルボニルメチル基、エトキシカルボニルメチル基、n−プロポキシカルボニルメチル基、イソプロポキシカルボニルエチル基等の炭素数3〜7のアルコキシカルボニルアルキル基;
メチルチオ基、エチルチオ基、n−プロピルチオ基、tert−ブチルチオ基、sec−ブチルチオ基、n−ペンチルチオ基、n−ヘキシルチオ基等の炭素数1〜6のアルキルチオ基;
メチルスルホニル基、エチルスルホニル基、n−プロピルスルホニル基、イソプロピルスルホニル基、n−ブチルスルホニル基、tert−ブチルスルホニル基、sec−ブチルスルホニル基、n−ペンチルスルホニル基、n−ヘキシルスルホニル基等の炭素数1〜6のアルキルスルホニル基;
メチルカルボニルアミノ基、エチルカルボニルアミノ基、n−プロピルカルボニルアミノ基、イソプロピルカルボニルアミノ基、n−ブチルカルボニルアミノ基、tert−ブチルカルボニルアミノ基、sec−ブチルカルボニルアミノ基、n−ペンチルカルボニルアミノ基等の炭素数2〜6のアルキルカルボニルアミノ基;
が挙げられる。
Preferably, a halogen atom, formyl group, hydroxyl group, carboxyl group, cyano group, nitro group, amino group, alkyl group having 1 to 6 carbon atoms, alkoxy group having 1 to 6 carbon atoms, acyl group having 2 to 7 carbon atoms , An alkenyl group having 2 to 6 carbon atoms, a hydroxyalkyl group having 1 to 6 carbon atoms, an alkoxycarbonyl group having 2 to 7 carbon atoms, an alkylamino group having 1 to 12 carbon atoms, and an alkoxycarbonylalkyl group having 3 to 7 carbon atoms , An alkylthio group having 1 to 6 carbon atoms, an alkylsulfonyl group having 1 to 6 carbon atoms, and an alkylcarbonylamino group having 2 to 6 carbon atoms,
More specifically, halogen atoms such as fluorine atom, chlorine atom, bromine atom;
Hydroxyl group; carboxyl group; cyano group; nitro group; amino group;
Methyl, trifluoromethyl, ethyl, pentafluoroethyl, n-propyl, isopropyl, n-butyl, sec-butyl, tert-butyl, n-pentyl, n-hexyl, cyclo An alkyl group having 1 to 6 carbon atoms such as propyl group, cyclobutyl group, cyclopentyl group, cyclohexyl group;
C1-C6 alkoxy such as methoxy group, ethoxy group, n-propoxy group, isopropoxy group, n-butoxy group, tert-butoxy group, sec-butoxy group, n-pentyloxy group, n-hexyloxy group, etc. Group;
An acyl group having 2 to 7 carbon atoms such as acetyl group, propiol group, butyryl group, isobutyryl group, valeryl group, isovaleryl group, pivaloyl group, hexanoyl group, heptanoyl group;
An alkenyl group having 2 to 6 carbon atoms such as vinyl group, propenyl group, butenyl group, pentenyl group, hexenyl group, cyclopentenyl group, cyclohexenyl group;
A hydroxyalkyl group having 1 to 6 carbon atoms such as a hydroxymethyl group and a hydroxyethyl group;
Methoxycarbonyl group, ethoxycarbonyl group, n-propoxycarbonyl group, isopropoxycarbonyl group, n-butoxycarbonyl group, tert-butoxycarbonyl group, sec-butoxycarbonyl group, n-pentyloxycarbonyl group, n-hexyloxycarbonyl group An alkoxycarbonyl group having 2 to 7 carbon atoms, such as
1 to 12 carbon atoms such as methylamino group, ethylamino group, n-propylamino group, n-butylamino group, dimethylamino group, diethylamino group, di-n-propylamino group, di-n-butylamino group, etc. An alkylamino group;
An alkoxycarbonylalkyl group having 3 to 7 carbon atoms such as a methoxycarbonylmethyl group, an ethoxycarbonylmethyl group, an n-propoxycarbonylmethyl group, an isopropoxycarbonylethyl group;
An alkylthio group having 1 to 6 carbon atoms such as methylthio group, ethylthio group, n-propylthio group, tert-butylthio group, sec-butylthio group, n-pentylthio group, n-hexylthio group;
Carbon such as methylsulfonyl group, ethylsulfonyl group, n-propylsulfonyl group, isopropylsulfonyl group, n-butylsulfonyl group, tert-butylsulfonyl group, sec-butylsulfonyl group, n-pentylsulfonyl group, n-hexylsulfonyl group 1-6 alkylsulfonyl groups;
Methylcarbonylamino group, ethylcarbonylamino group, n-propylcarbonylamino group, isopropylcarbonylamino group, n-butylcarbonylamino group, tert-butylcarbonylamino group, sec-butylcarbonylamino group, n-pentylcarbonylamino group, etc. An alkylcarbonylamino group having 2 to 6 carbon atoms;
Is mentioned.
一般式(1)で表されるアゾ化合物において、環Bは芳香族炭化水素環であり、これらの芳香族炭化水素環は置換基を有していても良い。環Bとしては、6員環が好ましく、特に下記一般式(3) In the azo compound represented by the general formula (1), the ring B is an aromatic hydrocarbon ring, and these aromatic hydrocarbon rings may have a substituent. As ring B, a 6-membered ring is preferable, and in particular, the following general formula (3)
式中、R1、R2およびR3は水素原子、炭素数1〜6のアルキル基、炭素数1〜6のアルコキシ基、炭素数6〜16のアリール基、炭素数2〜6のアルケニル基を表わし、R1とR2若しくはR3、R2とR3は連結して5〜6員環を形成してもよい。Xは前記と同じ意味を表わす。
In the formula, R 1 , R 2 and R 3 are a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, an aryl group having 6 to 16 carbon atoms, and an alkenyl group having 2 to 6 carbon atoms. R 1 and R 2 or R 3 , R 2 and R 3 may be linked to form a 5- to 6-membered ring. X represents the same meaning as described above.
炭素数1〜6のアルキル基の具体例としては、メチル基、エチル基、n−プロピル基、イソプロピル基、n−ブチル基、sec−ブチル基、tert−ブチル基、n−ペンチル基、n−ヘキシル基、シクロプロピル基、シクロブチル基、シクロペンチル基、シクロヘキシル基等が挙げられ、炭素数1〜6のアルコキシ基の具体例としては、メトキシ基、エトキシ基、n−プロポキシ基、イソプロポキシ基、n−ブトキシ基、tert−ブトキシ基、sec−ブトキシ基、n−ペンチルオキシ基、n−ヘキシルオキシ基等が挙げられ、炭素数6〜16のアリール基の具体例としては、フェニル基、トリル基、キシリル基、ナフチル基等が挙げられ、炭素数2〜6のアルケニル基の具体例としては、ビニル基、プロペニル基、ブテニル基、ペンテニル基、ヘキセニル基、シクロペンテニル基、シクロヘキセニル基等が挙げられる。 Specific examples of the alkyl group having 1 to 6 carbon atoms include methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, sec-butyl group, tert-butyl group, n-pentyl group, n- A hexyl group, a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, a cyclohexyl group and the like can be mentioned. Specific examples of the alkoxy group having 1 to 6 carbon atoms include a methoxy group, an ethoxy group, an n-propoxy group, an isopropoxy group, n -Butoxy group, tert-butoxy group, sec-butoxy group, n-pentyloxy group, n-hexyloxy group and the like. Specific examples of the aryl group having 6 to 16 carbon atoms include phenyl group, tolyl group, Xylyl group, naphthyl group, and the like. Specific examples of the alkenyl group having 2 to 6 carbon atoms include vinyl group, propenyl group, butenyl group, pentene group, and the like. Group, hexenyl group, cyclopentenyl group, cyclohexenyl group and the like.
R2とR3が連結して5〜6員環を形成する具体例としては、 As a specific example in which R 2 and R 3 are linked to form a 5- to 6-membered ring,
R1とR2若しくはR3が連結して5〜6員環を形成する具体例としては、 As a specific example in which R 1 and R 2 or R 3 are linked to form a 5- to 6-membered ring,
式中、R2、R3、およびXは前記と同じ意味を表し、R6は水素原子、炭素数1〜6のアルキル基、炭素数1〜6のアルコキシ基、炭素数6〜16のアリール基、炭素数2〜6のアルケニル基を表わす。 In the formula, R 2 , R 3 , and X represent the same meaning as described above, and R 6 is a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, and an aryl having 6 to 16 carbon atoms. Group represents an alkenyl group having 2 to 6 carbon atoms.
炭素数1〜6のアルキル基の具体例としては、メチル基、エチル基、n−プロピル基、イソプロピル基、n−ブチル基、sec−ブチル基、tert−ブチル基、n−ペンチル基、n−ヘキシル基、シクロプロピル基、シクロブチル基、シクロペンチル基、シクロヘキシル基等が挙げられ、炭素数1〜6のアルコキシ基の具体例としては、メトキシ基、エトキシ基、n−プロポキシ基、イソプロポキシ基、n−ブトキシ基、tert−ブトキシ基、sec−ブトキシ基、n−ペンチルオキシ基、n−ヘキシルオキシ基等が挙げられ、炭素数6〜16のアリール基の具体例としては、フェニル基、トリル基、キシリル基、ナフチル基等が挙げられ、炭素数2〜6のアルケニル基の具体例としては、ビニル基、プロペニル基、ブテニル基、ペンテニル基、ヘキセニル基、シクロペンテニル基、シクロヘキセニル基等が挙げられる。 Specific examples of the alkyl group having 1 to 6 carbon atoms include methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, sec-butyl group, tert-butyl group, n-pentyl group, n- A hexyl group, a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, a cyclohexyl group and the like can be mentioned. Specific examples of the alkoxy group having 1 to 6 carbon atoms include a methoxy group, an ethoxy group, an n-propoxy group, an isopropoxy group, n -Butoxy group, tert-butoxy group, sec-butoxy group, n-pentyloxy group, n-hexyloxy group and the like. Specific examples of the aryl group having 6 to 16 carbon atoms include phenyl group, tolyl group, Xylyl group, naphthyl group, and the like. Specific examples of the alkenyl group having 2 to 6 carbon atoms include vinyl group, propenyl group, butenyl group, pentene group, and the like. Group, hexenyl group, cyclopentenyl group, cyclohexenyl group and the like.
ここで、環Bが有していてもよい置換基としては、前述の環AおよびXに置換する置換基と同様のものが挙げられ、その具体例としても前述と同様な置換基が挙げられる。 Here, examples of the substituent that the ring B may have include the same substituents as those substituted on the aforementioned rings A and X, and specific examples thereof include the same substituents as described above. .
本発明において、アゾ化合物とのキレート化合物を生成させる金属塩の具体例としては、Mg、Al、Ti、V、Cr、Mn、Fe、Co、Ni、Cu、Zn、Zr、Ru、Rh、Pd、In、Sn、Hf、Os、Pt、またはHgであり、特に、Co、Ni、Cuのアゾ金属キレート化合物は、光記録材料として光学特性が優れており好ましい。 In the present invention, specific examples of the metal salt that forms a chelate compound with an azo compound include Mg, Al, Ti, V, Cr, Mn, Fe, Co, Ni, Cu, Zn, Zr, Ru, Rh, and Pd. In, Sn, Hf, Os, Pt, or Hg, azo metal chelate compounds of Co, Ni, and Cu are particularly preferable as optical recording materials because of their excellent optical characteristics.
本発明の金属キレート化合物を形成するアゾ化合物として、下記一般式(2)で表されるアゾ化合物についてより具体的に説明する。 As the azo compound forming the metal chelate compound of the present invention, the azo compound represented by the following general formula (2) will be described more specifically.
(式中、Y1、Y2、Y3、Y4、Y5、Y6およびY7はそれぞれ独立に炭素原子、窒素原子、酸素原子、硫黄原子、C−R4、N−R4を表わし(R4は水素原子、ハロゲン原子、ホルミル基、ヒドロキシル基、カルボキシル基、シアノ基、ニトロ基、アミノ基、炭素数1〜6のアルキル基、炭素数1〜6のアルコキシ基、炭素数2〜7のアシル基、炭素数2〜6のアルケニル基、炭素数1〜6のヒドロキシアルキル基、炭素数2〜7のアルコキシカルボニル基、炭素数1〜12のアルキルアミノ基、炭素数3〜7のアルコキシカルボニルアルキル基、炭素数1〜6のアルキルチオ基、炭素数1〜6のアルキルスルホニル基、炭素数2〜6のアルキルカルボニルアミノ基を表わす。)、R1、R2およびR3はそれぞれ独立に水素原子、炭素数1〜6のアルキル基、炭素数1〜6のアルコキシ基、炭素数6〜16のアリール基、炭素数2〜6のアルケニル基を表わし、R1とR2若しくはR3、R2とR3は連結して5〜6員環を形成してもよい。) (Wherein Y 1 , Y 2 , Y 3 , Y 4 , Y 5 , Y 6 and Y 7 are each independently a carbon atom, nitrogen atom, oxygen atom, sulfur atom, C—R 4 , N—R 4 . (R 4 is a hydrogen atom, a halogen atom, a formyl group, a hydroxyl group, a carboxyl group, a cyano group, a nitro group, an amino group, an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, or 2 carbon atoms. -7 acyl group, alkenyl group having 2 to 6 carbon atoms, hydroxyalkyl group having 1 to 6 carbon atoms, alkoxycarbonyl group having 2 to 7 carbon atoms, alkylamino group having 1 to 12 carbon atoms, 3 to 7 carbon atoms R 1 , R 2, and R 3 are each an alkoxycarbonylalkyl group, a C 1-6 alkylthio group, a C 1-6 alkylsulfonyl group, or a C 2-6 alkylcarbonylamino group. Germany Hydrogen atom, an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, an aryl group having 6 to 16 carbon atoms, an alkenyl group having 2 to 6 carbon atoms, R 1 and R 2 or R 3 R 2 and R 3 may be linked to form a 5- to 6-membered ring.)
一般式(2)において、Y1、Y2、Y3、Y4、Y5、Y6およびY7はそれぞれ独立に炭素原子、窒素原子、酸素原子、硫黄原子、C−R4、N−R4を表わし、R4は、水素原子、ハロゲン原子、ホルミル基、ヒドロキシル基、カルボキシル基、シアノ基、ニトロ基、アミノ基、炭素数1〜6のアルキル基、炭素数1〜6のアルコキシ基、炭素数2〜7のアシル基、炭素数2〜6のアルケニル基、炭素数1〜6のヒドロキシアルキル基、炭素数2〜7のアルコキシカルボニル基、炭素数1〜12のアルキルアミノ基、炭素数3〜7のアルコキシカルボニルアルキル基、炭素数1〜6のアルキルチオ基、炭素数1〜6のアルキルスルホニル基、炭素数2〜6のアルキルカルボニルアミノ基を表わす。 In the general formula (2), Y 1 , Y 2 , Y 3 , Y 4 , Y 5 , Y 6 and Y 7 are each independently a carbon atom, nitrogen atom, oxygen atom, sulfur atom, C—R 4 , N— represents R 4, R 4 is a hydrogen atom, a halogen atom, a formyl group, a hydroxyl group, a carboxyl group, a cyano group, a nitro group, an amino group, an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms , An acyl group having 2 to 7 carbon atoms, an alkenyl group having 2 to 6 carbon atoms, a hydroxyalkyl group having 1 to 6 carbon atoms, an alkoxycarbonyl group having 2 to 7 carbon atoms, an alkylamino group having 1 to 12 carbon atoms, carbon A C3-C7 alkoxycarbonylalkyl group, a C1-C6 alkylthio group, a C1-C6 alkylsulfonyl group, and a C2-C6 alkylcarbonylamino group are represented.
また、R1、R2およびR3はそれぞれ独立に水素原子、炭素数1〜6のアルキル基、炭素数1〜6のアルコキシ基、炭素数6〜16のアリール基、炭素数2〜6のアルケニル基を表わし、R1とR2若しくはR3、R2とR3は連結して5〜6員環を形成してもよい。 R 1 , R 2 and R 3 are each independently a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, an aryl group having 6 to 16 carbon atoms, or an aryl group having 2 to 6 carbon atoms. Represents an alkenyl group, R 1 and R 2 or R 3 , R 2 and R 3 may be linked to form a 5- to 6-membered ring.
上記R1、R2、R3及びR4における各置換基の具体的な例としては、前述と同様の置換基が挙げられる。 Specific examples of the substituents in R 1 , R 2 , R 3 and R 4 include the same substituents as described above.
一般式(2)において特に好ましいアゾ化合物の例としては、下記のものが挙げられる。 Examples of particularly preferred azo compounds in the general formula (2) include the following.
また、一般式(2)で示されるアゾ化合物と金属塩とから形成される金属キレート化合物の特に好ましい例としては、下記のものが挙げられる。 Moreover, the following are mentioned as a particularly preferable example of the metal chelate compound formed from the azo compound represented by the general formula (2) and a metal salt.
本発明の金属キレート化合物は、一般式(4) The metal chelate compound of the present invention has the general formula (4)
(式中Aは前記と同じ)で示されるアミノ化合物を公知の方法によりジアゾ化し、一般式(5) (Wherein A is the same as described above) is diazotized by a known method to give a compound of the general formula (5)
(式B、Xは前記と同じ)で示されるカップリング成分と反応させることにより合成される一般式(1)で示されるアゾ化合物に、メチルアルコール、テトラヒドロフラン、アセトンなどの有機溶媒中で金属化合物のメタノール溶液や水溶液を加えることにより得られる。 The azo compound represented by the general formula (1) synthesized by reacting with a coupling component represented by the formulas (B and X are the same as above) is converted into a metal compound in an organic solvent such as methyl alcohol, tetrahydrofuran and acetone. It can be obtained by adding a methanol solution or an aqueous solution.
本発明の金属キレート化合物は、2以上のアゾ化合物と2価以上の金属塩とから形成されるが、アゾ化合物同士が同一であっても、互いに異なっていてもよい。互いに異なるアゾ化合物と2価以上の金属塩とから形成される金属キレート化合物は、上記方法によって得られた互いに異なるアゾ化合物の混合物に、メチルアルコール、テトラヒドロフラン、アセトンなどの有機溶媒中で金属化合物のメタノール溶液や水溶液を加えることにより得られる。 The metal chelate compound of the present invention is formed from two or more azo compounds and a divalent or higher metal salt, and the azo compounds may be the same or different from each other. A metal chelate compound formed from a different azo compound and a divalent or higher valent metal salt is obtained by mixing a metal compound in a mixture of different azo compounds obtained by the above method in an organic solvent such as methyl alcohol, tetrahydrofuran, and acetone. It can be obtained by adding a methanol solution or an aqueous solution.
本発明における光記録媒体に関し、その具体的な構成について以下に説明する。 A specific configuration of the optical recording medium in the present invention will be described below.
光記録媒体とは予め情報を記録されている再生専用の光再生専用媒体及び情報を記録して再生することのできる光記録媒体の両方を示すものである。但し、ここでは適例として後者の情報を記録して再生のできる光記録媒体、特に基板上に記録層、反射層を有する光記録媒体に関して説明する。本発明の光記録媒体は図1に示すような貼り合わせ構造を有している。すなわち、基板1上に記録層2が形成されており、その上に密着して反射層3が設けられており、さらにその上に接着層4を介して基板5が貼り合わされている。ただし、記録層2の下または上に別の層があっても良く、反射層3の上に別の層があっても良い。ここでは、既存のDVDとの互換性のため、板厚が0.6mm、外径120mmΦ、内径15mmφの円盤状基板が2枚貼り合わされた構造である。
The optical recording medium refers to both a reproduction-only optical reproduction medium in which information is recorded in advance and an optical recording medium in which information can be recorded and reproduced. However, here, as an example, an optical recording medium that can record and reproduce the latter information, particularly an optical recording medium having a recording layer and a reflective layer on a substrate will be described. The optical recording medium of the present invention has a bonding structure as shown in FIG. That is, the
次に、本発明の記録媒体の構成各層の必要特性及びその構成材料について説明する。 Next, the required characteristics of each layer constituting the recording medium of the present invention and its constituent materials will be described.
1)基板
基板の材質としては、基本的には記録光および再生光の波長で透明であればよい。例えば、ポリカーボネート樹脂、塩化ビニル樹脂、ポリメタクリル酸メチル等のアクリル樹脂、ポリスチレン樹脂、エポキシ樹脂等の高分子材料やガラス等の無機材料が利用される。これらの基板材料は射出成形法等により円盤状に基板に成形される。基板表面には記録位置を表すプリグルーブやプリピット、一部再生専用情報等のためのプリピットを有していてもよい。これらのプリグルーブやプリピットは、射出成形法等により基板作製時にスタンパー原盤から転写付与する方法が通常とられる。また、レーザーカッティング法(プリライト)や2P(Photo Polymer)法により作製してもよい。
1) Substrate The material of the substrate may be basically transparent at the wavelengths of recording light and reproducing light. For example, an acrylic resin such as polycarbonate resin, vinyl chloride resin or polymethyl methacrylate, a polymer material such as polystyrene resin or epoxy resin, or an inorganic material such as glass is used. These substrate materials are formed into a disk shape by an injection molding method or the like. The substrate surface may have pregrooves and prepits representing recording positions, and prepits for partial reproduction-only information. These pregrooves and prepits are usually transferred and applied from a stamper master during substrate production by an injection molding method or the like. Moreover, you may produce by the laser cutting method (prelight) and 2P (Photo Polymer) method.
基板の溝ピッチは0.7μm〜1.0μmであり、溝深さは100nm〜200nm、好ましくは140nm〜185nmである。溝幅は、0.25μm〜0.40μm、好ましくは0.30μm〜0.35μmである。溝深さが100nm未満の場合、トラッキングのためのプッシュプル信号振幅を得ることが困難になる傾向があり、200nmを越える場合は、射出成形時の転写プロセスが生産上実用的ではない。また、溝幅が0.25μm未満の場合、クロストークが悪化する傾向があり、0.4μmを越える場合、射出成形時の転写プロセスが生産上実用的ではない。これら溝形状は、He−Cdレーザーの照射による回折光解析またはAFM等のプロファイルから求められる。 The groove pitch of the substrate is 0.7 μm to 1.0 μm, and the groove depth is 100 nm to 200 nm, preferably 140 nm to 185 nm. The groove width is 0.25 μm to 0.40 μm, preferably 0.30 μm to 0.35 μm. When the groove depth is less than 100 nm, it tends to be difficult to obtain a push-pull signal amplitude for tracking. When the groove depth exceeds 200 nm, the transfer process at the time of injection molding is not practical for production. Further, when the groove width is less than 0.25 μm, the crosstalk tends to deteriorate, and when it exceeds 0.4 μm, the transfer process at the time of injection molding is not practical in production. These groove shapes are obtained from a diffracted light analysis by He-Cd laser irradiation or a profile such as AFM.
2)記録層
本発明においては、基板上に記録層を設けるが、本発明の記録層は、λmaxが450nm〜630nm付近に存在する一般式(1)で示されるアゾ化合物と金属塩とから形成される金属キレート化合物を含有する。中でも、520nm〜690nmより選択される記録および再生レーザー波長に対して適度な光学定数(光学定数は複素屈折率(n+ki)で表現される。式中のn、kは、実数部nと虚数部kとに相当する係数である。ここでは、nを屈折率、kを消衰係数とする。)を有する必要がある。
2) Recording layer In the present invention, a recording layer is provided on a substrate. The recording layer of the present invention is formed from an azo compound represented by the general formula (1) having a λmax of around 450 nm to 630 nm and a metal salt. Containing metal chelate compounds. Among them, an appropriate optical constant for the recording and reproducing laser wavelength selected from 520 nm to 690 nm (the optical constant is expressed by a complex refractive index (n + ki). N and k in the formula are a real part n and an imaginary part. It is necessary to have a coefficient corresponding to k, where n is a refractive index and k is an extinction coefficient.
一般に有機色素は、波長λに対し、屈折率nと消衰係数kが大きく変化する特徴がある。nが1.8より小さい値になると正確な信号読み取りに必要な反射率と信号変調度は得られず、kが0.40を越えても反射率が低下して良好な再生信号が得られないだけでなく、再生光により信号が変化しやすく実用に適さない。この特徴を考慮して、目的とするレーザー波長において好ましい光学定数を有する有機色素を選択し記録層を成膜することで、高い反射率を有し、かつ、感度の良い媒体とすることができる。 In general, organic dyes are characterized in that the refractive index n and the extinction coefficient k greatly change with respect to the wavelength λ. When n is less than 1.8, the reflectivity and signal modulation necessary for accurate signal reading cannot be obtained, and even if k exceeds 0.40, the reflectivity decreases and a good reproduction signal is obtained. Not only is the signal easily changed by the reproduction light, but it is not suitable for practical use. In consideration of this feature, an organic dye having a preferable optical constant at a target laser wavelength is selected and a recording layer is formed, so that a medium having high reflectance and high sensitivity can be obtained. .
本発明で使用する一般式(1)で示されるアゾ化合物と金属塩とから形成される金属キレート化合物は、通常の有機色素に比べ、吸光係数が高く、また置換基の選択により吸収波長域を任意に選択できるため、前記レーザー光の波長において記録層に必要な光学定数(nが1.8以上、且つ、kが0.04から0.40であり、好ましくは、nが2.0以上、且つ、kが0.04〜0.20)を満足する。 The metal chelate compound formed from the azo compound represented by the general formula (1) and the metal salt used in the present invention has a higher extinction coefficient than that of a normal organic dye, and has an absorption wavelength range by selecting a substituent. Since it can be arbitrarily selected, the optical constant required for the recording layer at the wavelength of the laser beam (n is 1.8 or more, and k is 0.04 to 0.40, preferably n is 2.0 or more. And k satisfies 0.04 to 0.20).
更に、一般式(1)で示されるアゾ化合物と金属塩とから形成される金属キレート化合物は、記録レーザー照射時に発生する熱による分解が適度に促進され、高速記録時においても感度が良く、また熱干渉によるピットジッターの悪化が十分低く抑制でき、極めて有用である。 Furthermore, the metal chelate compound formed from the azo compound represented by the general formula (1) and the metal salt has moderately accelerated decomposition due to heat generated at the time of recording laser irradiation, and has high sensitivity even at high speed recording. Deterioration of pit jitter due to thermal interference can be suppressed sufficiently low, which is extremely useful.
本発明の記録層においては、更に、記録特性などの改善のために、一般式(1)で示されるアゾ化合物と金属塩とから形成される金属キレート化合物を2種以上を混合しても良い。アゾ金属キレート化合物の混合割合については特に制限はされないが、前記の理由で、光学定数nが1.8以上、好ましくは2.0以上で、且つ、kが0.04から0.40であり、好ましくは0.04〜0.20になるように混合するのが好ましい。 In the recording layer of the present invention, two or more kinds of metal chelate compounds formed from the azo compound represented by the general formula (1) and a metal salt may be mixed in order to improve recording characteristics and the like. . The mixing ratio of the azo metal chelate compound is not particularly limited, but for the above reasons, the optical constant n is 1.8 or more, preferably 2.0 or more, and k is 0.04 to 0.40. It is preferable to mix so that it may become 0.04-0.20 preferably.
また、波長450nm〜630nmに吸収極大を有し、520nm〜690nmでの屈折率が大きい前記以外の色素と混合しても良い。具体的には、シアニン系色素、スクアリリウム系色素、ナフトキノン系色素、アントラキノン系色素、ポルフィリン系色素、アザポルフィリン系色素、テトラピラポルフィラジン系色素、インドフェノール系色素、ピリリウム系色素、チオピリリウム系色素、アズレニウム系色素、トリフェニルメタン系色素、キサンテン系色素、インダスレン系色素、インジゴ系色素、チオインジゴ系色素、メロシアニン系色素、チアジン系色素、アクリジン系色素、オキサジン系色素等があり、複数の色素の混合であっても良い。これらの色素の混合割合は、0.1〜30%程度である。 Further, it may be mixed with a dye other than the above having an absorption maximum at a wavelength of 450 nm to 630 nm and a large refractive index at 520 nm to 690 nm. Specifically, cyanine dyes, squarylium dyes, naphthoquinone dyes, anthraquinone dyes, porphyrin dyes, azaporphyrin dyes, tetrapyraporphyrazine dyes, indophenol dyes, pyrylium dyes, thiopyrylium dyes, Azurenium dyes, triphenylmethane dyes, xanthene dyes, indanthrene dyes, indigo dyes, thioindigo dyes, merocyanine dyes, thiazine dyes, acridine dyes, oxazine dyes, etc. It may be mixed. The mixing ratio of these pigments is about 0.1 to 30%.
更に、一般式(1)で示されるアゾ化合物と金属塩とから形成される金属キレート化合物の、520nm〜690nmから選択される記録及び再生レーザー波長に対してのkが小さい場合には、記録特性などの改善のために、波長600nm〜900nmに吸収極大を有する光吸収化合物と混合しても良い。具体的には、シアニン系色素、スクアリリウム系色素、ナフトキノン系色素、アントラキノン系色素、ポルフィリン系色素、アザポルフィリン系色素、テトラピラポルフィラジン系色素、インドフェノール系色素、ピリリウム系色素、チオピリリウム系色素、アズレニウム系色素、トリフェニルメタン系色素、キサンテン系色素、インダスレン系色素、インジゴ系色素、チオインジゴ系色素、メロシアニン系色素、チアジン系色素、アクリジン系色素、オキサジン系色素、フタロシアニン系色素、ナフタロシアニン系色素等があり、複数の色素の混合であっても良い。これらの色素の混合割合は、0.1〜30%程度である。 Further, when the metal chelate compound formed from the azo compound represented by the general formula (1) and the metal salt has a small k for recording and reproducing laser wavelengths selected from 520 nm to 690 nm, the recording characteristics In order to improve the above, a light absorbing compound having an absorption maximum at a wavelength of 600 nm to 900 nm may be mixed. Specifically, cyanine dyes, squarylium dyes, naphthoquinone dyes, anthraquinone dyes, porphyrin dyes, azaporphyrin dyes, tetrapyraporphyrazine dyes, indophenol dyes, pyrylium dyes, thiopyrylium dyes, Azurenium dye, triphenylmethane dye, xanthene dye, indanthrene dye, indigo dye, thioindigo dye, merocyanine dye, thiazine dye, acridine dye, oxazine dye, phthalocyanine dye, naphthalocyanine dye There are pigments and the like, and a mixture of a plurality of pigments may be used. The mixing ratio of these pigments is about 0.1 to 30%.
記録層を製膜する際に、必要に応じてクエンチャー、色素分解促進剤、紫外線吸収剤、接着剤、吸熱分解化合物などを混合するか、あるいは、そのような効果を有する化合物を一般式(1)で示されるアゾ化合物と金属塩とから形成される金属キレート化合物の置換基として導入することも可能である。 When forming the recording layer, if necessary, a quencher, a dye decomposition accelerator, an ultraviolet absorber, an adhesive, an endothermic decomposition compound, or the like is mixed, or a compound having such an effect is represented by the general formula ( It can also be introduced as a substituent of a metal chelate compound formed from the azo compound shown in 1) and a metal salt.
クエンチャーの具体例としては、アセチルアセトナート系化合物、ビスジチオ−α−ジケトン系化合物やビスフェニルジチオール系化合物などのビスジチオール系化合物、チオカテコール系化合物、サリチルアルデヒドオキシム系化合物、チオビスフェノレート系化合物などの金属錯体が好ましい。また、アミン化合物も好適である。 Specific examples of quenchers include acetylacetonate compounds, bisdithio-α-diketone compounds, bisdithiol compounds such as bisphenyldithiol compounds, thiocatechol compounds, salicylaldehyde oxime compounds, thiobisphenolate compounds Metal complexes such as compounds are preferred. Amine compounds are also suitable.
熱分解促進剤としては、例えば、金属系アンチノッキング剤、メタロセン化合物、アセチルアセトナート系金属錯体などの金属化合物が挙げられる。 Examples of the thermal decomposition accelerator include metal compounds such as metal anti-knock agents, metallocene compounds, and acetylacetonate metal complexes.
さらに、必要に応じて、バインダー、レベリング剤、消泡剤などを併用することもできる。好ましいバインダーとしては、ポリビニルアルコール、ポリビニルピロリドン、ニトロセルロース、酢酸セルロース、ケトン樹脂、アクリル樹脂、ポリスチレン樹脂、ウレタン樹脂、ポリビニルブチラール、ポリカーボネート、ポリオレフィンなどが挙げられる。 Furthermore, a binder, a leveling agent, an antifoaming agent, etc. can also be used together as needed. Preferred binders include polyvinyl alcohol, polyvinyl pyrrolidone, nitrocellulose, cellulose acetate, ketone resin, acrylic resin, polystyrene resin, urethane resin, polyvinyl butyral, polycarbonate, polyolefin and the like.
記録層を基板の上に成膜する際に、基板の耐溶剤性や反射率、記録感度などを向上させるために、基板の上に無機物やポリマーからなる層を設けても良い。 When the recording layer is formed on the substrate, a layer made of an inorganic substance or a polymer may be provided on the substrate in order to improve the solvent resistance, reflectance, recording sensitivity, etc. of the substrate.
記録層を設ける方法は、例えば、スピンコート法、スプレー法、キャスト法、浸漬法などの塗布法、スパッタ法、化学蒸着法、真空蒸着法などが挙げられるが、スピンコート法が簡便で好ましい。 Examples of the method for providing the recording layer include spin coating, spraying, casting, dipping, and other coating methods, sputtering, chemical vapor deposition, and vacuum vapor deposition. The spin coating method is simple and preferable.
スピンコート法等の塗布法を用いる場合には、一般式(1)で示されるアゾ化合物と金属塩とから形成される金属キレート化合物を1〜40重量%、好ましくは3〜30重量%となるように溶媒に溶解あるいは分散させた塗布液を用いるが、この際、溶媒は基板にダメージを与えないものを選ぶことが好ましい。例えば、メタノール、エタノール、イソプロピルアルコール、オクタフルオロペンタノール、アリルアルコール、メチルセロソルブ、エチルセロソルブ、テトラフルオロプロパノールなどのアルコール系溶媒、ヘキサン、ヘプタン、オクタン、デカン、シクロヘキサン、メチルシクロヘキサン、エチルシクロヘキサン、ジメチルシクロヘキサンなどの脂肪族または脂環式炭化水素系溶媒、トルエン、キシレン、ベンゼンなどの芳香族炭化水素系溶媒、四塩化炭素、クロロホルム、テトラクロロエタン、ジブロモエタンなどのハロゲン化炭化水素系溶媒、ジエチルエーテル、ジブチルエーテル、ジイソプロピルエーテル、ジオキサンなどのエーテル系溶媒、アセトン、3-ヒドロキシ-3-メチル-2-ブタノンなどのケトン系溶媒、酢酸エチル、乳酸メチルなどのエステル系溶媒、水などが挙げられる。これらは単独で用いても良く、あるいは、複数混合しても良い。 When a coating method such as spin coating is used, the metal chelate compound formed from the azo compound represented by the general formula (1) and the metal salt is 1 to 40% by weight, preferably 3 to 30% by weight. As described above, a coating solution dissolved or dispersed in a solvent is used. In this case, it is preferable to select a solvent that does not damage the substrate. For example, alcohol solvents such as methanol, ethanol, isopropyl alcohol, octafluoropentanol, allyl alcohol, methyl cellosolve, ethyl cellosolve, tetrafluoropropanol, hexane, heptane, octane, decane, cyclohexane, methylcyclohexane, ethylcyclohexane, dimethylcyclohexane Aliphatic or alicyclic hydrocarbon solvents such as, aromatic hydrocarbon solvents such as toluene, xylene, benzene, halogenated hydrocarbon solvents such as carbon tetrachloride, chloroform, tetrachloroethane, dibromoethane, diethyl ether, Ether solvents such as dibutyl ether, diisopropyl ether and dioxane, ketone solvents such as acetone and 3-hydroxy-3-methyl-2-butanone, ethyl acetate and lactic acid Ester solvents such as Le, and water. These may be used alone or in combination.
なお、必要に応じて、記録層の色素を高分子薄膜などに分散して用いたりすることもできる。 If necessary, the dye of the recording layer can be dispersed in a polymer thin film or the like.
また、基板にダメージを与えない溶媒を選択できない場合は、スパッタ法、化学蒸着法や真空蒸着法などが有効である。 In addition, when a solvent that does not damage the substrate cannot be selected, a sputtering method, a chemical vapor deposition method, a vacuum vapor deposition method, or the like is effective.
色素層の膜厚は、特に限定するものではないが、基板の案内溝(グルーブ)上の膜厚が30nm〜150nmの範囲が好ましく、基板の案内溝間(ランド)の膜厚は、10nm〜80nmの範囲が好ましい。グルーブの膜厚が150nmを越すと、最短ピットが潰れ、好ましくない。また、30nmよりも薄い場合、良好な記録感度、記録変調度が得られない。ランド上の膜厚は極力薄いことが特に好ましい。これらの記録層の膜厚制御は、上記の有機溶媒を複数混合して用いることで可能である。 The film thickness of the dye layer is not particularly limited, but the film thickness on the guide grooves (grooves) of the substrate is preferably in the range of 30 nm to 150 nm, and the film thickness between the guide grooves (lands) of the substrate is 10 nm to A range of 80 nm is preferred. If the thickness of the groove exceeds 150 nm, the shortest pit is crushed, which is not preferable. On the other hand, when the thickness is smaller than 30 nm, good recording sensitivity and recording modulation degree cannot be obtained. It is particularly preferable that the film thickness on the land is as thin as possible. The film thickness of these recording layers can be controlled by using a mixture of a plurality of the above organic solvents.
3)反射層
記録層の上に、好ましくは50nm〜300nmの厚さの反射層を形成する。反射層の材料としては、再生光の波長で反射率の十分高いもの、例えば、Au、Al、Ag、Cu、Ti、Cr、Ni、Pt、TaおよびPdの金属を単独あるいは合金にして用いることが可能である。この中でもAu、Al、Agは反射率が高く反射層の材料として適している。これ以外でも下記のものを含んでいても良い。例えば、Mg、Se、Hf、V、Nb、Ru、W、Mn、Re、Fe、Co、Rh、Ir、Zn、Cd、Ga、In、Si、Ge、Te、Pb、Po、Sn、Biなどの金属および半金属を挙げることができる。また、Auを主成分とするものは反射率の高い反射層が容易に得られるため好適である。ここで主成分というのは含有率が50%以上のものをいう。金属以外の材料で低屈折率薄膜と高屈折率薄膜を交互に積み重ねて多層膜を形成し、反射層として用いることも可能である。
3) Reflective layer A reflective layer having a thickness of preferably 50 nm to 300 nm is formed on the recording layer. As a material for the reflective layer, a material having a sufficiently high reflectance at the wavelength of the reproduction light, for example, Au, Al, Ag, Cu, Ti, Cr, Ni, Pt, Ta, and Pd metal may be used alone or as an alloy. Is possible. Among these, Au, Al, and Ag have high reflectivity and are suitable as the material for the reflective layer. Other than this, the following may be included. For example, Mg, Se, Hf, V, Nb, Ru, W, Mn, Re, Fe, Co, Rh, Ir, Zn, Cd, Ga, In, Si, Ge, Te, Pb, Po, Sn, Bi, etc. And metals and metalloids. In addition, a material containing Au as a main component is preferable because a reflective layer having a high reflectance can be easily obtained. Here, the main component means that the content is 50% or more. It is also possible to form a multilayer film by alternately stacking a low refractive index thin film and a high refractive index thin film using a material other than metal, and use it as a reflective layer.
反射層を形成する方法としては、例えば、スパッタ法、イオンプレーティング法、化学蒸着法、真空蒸着法などが挙げられる。また、基板の上や反射層の下に反射率の向上、記録特性の改善、密着性の向上などのために公知の無機系または有機系の中間層、接着層を設けることもできる。 Examples of the method for forming the reflective layer include sputtering, ion plating, chemical vapor deposition, and vacuum vapor deposition. In addition, a known inorganic or organic intermediate layer or adhesive layer may be provided on the substrate or below the reflective layer in order to improve reflectivity, recording characteristics, and adhesion.
4)保護層
反射層の上の保護層の材料としては反射層を外力から保護するものであれば特に限定しない。有機物質としては、熱可塑性樹脂、熱硬化性樹脂、電子線硬化性樹脂、紫外線硬化性樹脂などを挙げることができる。また、無機物質としては、SiO2、Si3N4、MgF2、SnO2などが挙げられる。熱可塑性樹脂、熱硬化性樹脂などは適当な溶媒に溶解して塗布液を塗布し、乾燥することによって形成することができる。紫外線硬化性樹脂は、そのままもしくは適当な溶媒に溶解して塗布液を調製した後にこの塗布液を塗布し、紫外線を照射して硬化させることによって形成することができる。紫外線硬化性樹脂としては、例えば、ウレタンアクリレート、エポキシアクリレート、ポリエステルアクリレートなどのアクリレート樹脂を用いることができる。これらの材料は単独であるいは混合して用いても良く、1層だけでなく多層膜にして用いても良い。
4) Protective layer The material of the protective layer on the reflective layer is not particularly limited as long as it protects the reflective layer from external force. Examples of the organic substance include a thermoplastic resin, a thermosetting resin, an electron beam curable resin, and an ultraviolet curable resin. Examples of inorganic substances include SiO 2 , Si 3 N 4 , MgF 2 , SnO 2 and the like. A thermoplastic resin, a thermosetting resin, etc. can be formed by dissolving in an appropriate solvent, applying a coating solution, and drying. The ultraviolet curable resin can be formed by preparing a coating solution as it is or by dissolving in an appropriate solvent, and then applying the coating solution and curing it by irradiating with ultraviolet rays. As the ultraviolet curable resin, for example, acrylate resins such as urethane acrylate, epoxy acrylate, and polyester acrylate can be used. These materials may be used alone or in combination, and may be used not only as a single layer but also as a multilayer film.
保護層の形成の方法としては、記録層と同様にスピンコート法やキャスト法などの塗布法やスパッタ法や化学蒸着法などの方法が用いられるが、この中でもスピンコート法が好ましい。 As a method for forming the protective layer, a coating method such as a spin coating method and a casting method, a sputtering method, a chemical vapor deposition method, and the like are used as in the recording layer. Among these, a spin coating method is preferable.
保護層の膜厚は、一般には0.1μm〜100μmの範囲であるが、本発明においては、3μm〜30μmであり、より好ましくは5μm〜20μmである。 The thickness of the protective layer is generally in the range of 0.1 μm to 100 μm, but in the present invention, it is 3 μm to 30 μm, more preferably 5 μm to 20 μm.
保護層の上にさらにレーベルなどの印刷を行うこともできる。また、反射層面に保護シートまたは基板を張り合わせる、あるいは反射層面相互を内側とし対向させ、光記録媒体2枚を貼り合わせるなどの手段を用いても良い。また、基板鏡面側に、表面保護やごみ等の付着防止のために紫外線硬化性樹脂、無機系薄膜等を製膜しても良い。 A label or the like can be further printed on the protective layer. Alternatively, a protective sheet or substrate may be bonded to the reflective layer surface, or two optical recording media may be bonded to each other with the reflective layer surfaces facing each other. Further, an ultraviolet curable resin, an inorganic thin film, or the like may be formed on the mirror surface side of the substrate in order to protect the surface and prevent adhesion of dust and the like.
本発明でいう波長520nm〜690nmのレーザーは、特に制限はないが、例えば、可視光領域の広範囲で波長選択のできる色素レーザーや波長633nmのヘリウムネオンレーザー、波長680、650、635nm付近の高出力半導体レーザー、波長532nmの高調波変換YAGレーザーなどが挙げられる。本発明では、これらから選択される1波長または複数波長において高密度記録および再生が可能となる。 The laser having a wavelength of 520 nm to 690 nm as used in the present invention is not particularly limited. Examples thereof include a semiconductor laser and a harmonic conversion YAG laser having a wavelength of 532 nm. In the present invention, high-density recording and reproduction are possible at one wavelength or a plurality of wavelengths selected from these.
以下に本発明の実施例を示すが、本発明はこれによりなんら限定されるものではない。 Examples of the present invention will be shown below, but the present invention is not limited thereto.
金属キレート化合物(AM−1)の合成
水 24g、36%塩酸4.15gの混合溶液に下記構造式(4−a)で示される化合物 0.83gを溶解し、0−5℃にて亜硝酸ナトリウム0.48gの水溶液を滴下した。同温度で1時間攪拌し、ジアゾ化した。下記構造式(5−a)で示される化合物 2.00g、尿素0.26g、酢酸ナトリウム2.56gをメタノール80gに溶解させ、得られたジアゾ液を0−5℃で滴下装入した。同温度で3時間攪拌後、一晩放置した。析出した結晶を濾別、水洗、乾燥して、下記構造式(6−a)で示される化合物 2.00gを得た。
Synthesis of metal chelate compound (AM-1) 0.83 g of the compound represented by the following structural formula (4-a) was dissolved in a mixed solution of 24 g of water and 4.15 g of 36% hydrochloric acid, and nitrous acid at 0-5 ° C. An aqueous solution of 0.48 g of sodium was added dropwise. The mixture was stirred at the same temperature for 1 hour to diazotize. 2.00 g of the compound represented by the following structural formula (5-a), 0.26 g of urea and 2.56 g of sodium acetate were dissolved in 80 g of methanol, and the obtained diazo solution was added dropwise at 0-5 ° C. The mixture was stirred at the same temperature for 3 hours and then left overnight. The precipitated crystals were separated by filtration, washed with water and dried to obtain 2.00 g of a compound represented by the following structural formula (6-a).
次に、メタノール45gに式(6−a)で示される化合物 2.00gを溶解し、炭酸カリウム0.71g、ジメチル硫酸0.65gを加え、室温にて2時間攪拌した。析出した結晶を濾別、水洗、乾燥して、化合物(1−1)1.88gを得た。 Next, 2.00 g of the compound represented by the formula (6-a) was dissolved in 45 g of methanol, 0.71 g of potassium carbonate and 0.65 g of dimethylsulfuric acid were added, and the mixture was stirred at room temperature for 2 hours. The precipitated crystals were separated by filtration, washed with water and dried to obtain 1.88 g of compound (1-1).
次に、メタノール80g、テトラヒドロフラン 16gに式(1−1)で示される化合物 1.88gを溶解し、50−55℃で酢酸ニッケル四水和物 0.59gをメタノール5gに溶解した液を滴下し、同温度で1時間攪拌した。室温まで冷却後、析出した結晶を濾別、水洗、乾燥して、金属キレート化合物(AM−1)1.67gを得た。 Next, a solution prepared by dissolving 1.88 g of the compound represented by the formula (1-1) in 80 g of methanol and 16 g of tetrahydrofuran, and dropwise adding a solution of 0.59 g of nickel acetate tetrahydrate in 5 g of methanol at 50 to 55 ° C. The mixture was stirred at the same temperature for 1 hour. After cooling to room temperature, the precipitated crystals were separated by filtration, washed with water and dried to obtain 1.67 g of metal chelate compound (AM-1).
下記の分析結果より、目的物であることを確認した。
元素分析値(C42H40N18O6S2Ni)
From the following analysis results, it was confirmed to be the target product.
Elemental analysis (C 42 H 40 N 18 O 6
このようにして得られた化合物は、クロロホルム溶液中において543.0nmに吸収極大を示し、グラム吸光係数は1.03×105ml/g.cmであった。 The compound thus obtained showed an absorption maximum at 543.0 nm in a chloroform solution, and the gram extinction coefficient was 1.03 × 10 5 ml / g. cm.
金属キレート化合物(AM−3)の合成
水 32g、36%塩酸6.00gの混合溶液に下記構造式(4−a)で示される化合物 1.19gを溶解し、0−5℃にて亜硝酸ナトリウム0.68gの水溶液を滴下した。同温度で1時間攪拌し、ジアゾ化した。下記構造式(5−b)で示される化合物 3.02g、尿素0.38g、酢酸ナトリウム3.67gをメタノール120gに溶解させ、得られたジアゾ液を0−5℃で滴下装入した。同温度で2時間攪拌後、一晩放置した。析出した結晶を濾別、水洗、乾燥して、下記構造式(6−b)で示される化合物 3.54gを得た。
Synthesis of metal chelate compound (AM-3) 1.19 g of the compound represented by the following structural formula (4-a) was dissolved in a mixed solution of 32 g of water and 6.00 g of 36% hydrochloric acid, and nitrous acid was added at 0-5 ° C. An aqueous solution of 0.68 g of sodium was added dropwise. The mixture was stirred at the same temperature for 1 hour to diazotize. A compound represented by the following structural formula (5-b) (3.02 g), urea (0.38 g) and sodium acetate (3.67 g) were dissolved in methanol (120 g), and the obtained diazo solution was added dropwise at 0-5 ° C. The mixture was stirred at the same temperature for 2 hours and left overnight. The precipitated crystals were separated by filtration, washed with water and dried to obtain 3.54 g of a compound represented by the following structural formula (6-b).
次に、アセトン140gに式(6−b)で示される化合物 3.52gを溶解し、炭酸カリウム2.53g、ジメチル硫酸1.11gを加え、室温にて1時間攪拌した。析出した結晶を濾別、水洗、乾燥して、化合物(1−3)2.15gを得た。 Next, 3.52 g of the compound represented by the formula (6-b) was dissolved in 140 g of acetone, 2.53 g of potassium carbonate and 1.11 g of dimethylsulfuric acid were added, and the mixture was stirred at room temperature for 1 hour. The precipitated crystals were separated by filtration, washed with water and dried to obtain 2.15 g of compound (1-3).
次に、メタノール40g、テトラヒドロフラン 40gに式(1−3)で示される化合物 2.14gを溶解し、50−55℃で酢酸ニッケル四水和物 0.64gをメタノール8gに溶解した液を滴下し、同温度で2時間攪拌した。室温まで冷却後、析出した結晶を濾別、水洗、乾燥して、金属キレート化合物(AM−3)1.51gを得た。 Next, 2.14 g of the compound represented by the formula (1-3) is dissolved in 40 g of methanol and 40 g of tetrahydrofuran, and a solution obtained by dissolving 0.64 g of nickel acetate tetrahydrate in 8 g of methanol at 50 to 55 ° C. is dropped. The mixture was stirred at the same temperature for 2 hours. After cooling to room temperature, the precipitated crystals were separated by filtration, washed with water and dried to obtain 1.51 g of metal chelate compound (AM-3).
下記の分析結果より、目的物であることを確認した。
元素分析値(C42H40N18O4S4Ni)
From the following analysis results, it was confirmed to be the target product.
Elemental analysis (C 42 H 40 N 18 O 4
このようにして得られた化合物は、クロロホルム溶液中において549.0nmに吸収極大を示し、グラム吸光係数は1.00×105ml/g.cmであった。 The compound thus obtained exhibited an absorption maximum at 549.0 nm in a chloroform solution, and the gram extinction coefficient was 1.00 × 10 5 ml / g. cm.
金属キレート化合物(AM−54)の合成
酢酸6.8g、プロピオン酸4.0gの混合溶液に下記構造式(4−b)で示される化合物 0.75gを溶解し、0−5℃にてりん酸1.9g、40%ニトロシル硫酸2.82gを滴下した。同温度で1時間攪拌し、ジアゾ化した。下記構造式(5−a)で示される化合物 2.38g、尿素0.31g、酢酸ナトリウム3.00gをメタノール70gに溶解させ、得られたジアゾ液を0−5℃で滴下装入した。同温度で2時間攪拌後、一晩放置した。析出した結晶を濾別、水洗、乾燥して、下記構造式(1−54)で示される化合物 2.00gを得た。
Synthesis of metal chelate compound (AM-54) In a mixed solution of 6.8 g of acetic acid and 4.0 g of propionic acid, 0.75 g of the compound represented by the following structural formula (4-b) was dissolved, and phosphorous was added at 0-5 ° C. 1.9 g of acid and 2.82 g of 40% nitrosylsulfuric acid were added dropwise. The mixture was stirred at the same temperature for 1 hour to diazotize. 2.38 g of the compound represented by the following structural formula (5-a), 0.31 g of urea and 3.00 g of sodium acetate were dissolved in 70 g of methanol, and the obtained diazo solution was charged dropwise at 0-5 ° C. The mixture was stirred at the same temperature for 2 hours and left overnight. The precipitated crystals were separated by filtration, washed with water and dried to obtain 2.00 g of a compound represented by the following structural formula (1-54).
次に、メタノール80g、テロラヒドロフラン40gに式(1−54)で示される化合物 1.95gを溶解し、50−55℃で酢酸ニッケル四水和物 0.67gを加えて、同温度で3時間攪拌した。析出した結晶を濾別、水洗、乾燥して、化合物(AM−54)1.89gを得た。 Next, 1.95 g of the compound represented by the formula (1-54) is dissolved in 80 g of methanol and 40 g of terahydrofuran, and 0.67 g of nickel acetate tetrahydrate is added at 50 to 55 ° C. Stir for hours. The precipitated crystals were separated by filtration, washed with water and dried to obtain 1.89 g of compound (AM-54).
下記の分析結果より、目的物であることを確認した。
元素分析値(C34H36N14O6S4Ni)
From the following analysis results, it was confirmed to be the target product.
Elemental analysis (C 34 H 36 N 14 O 6
このようにして得られた化合物は、クロロホルム溶液中において550.0nmに吸収極大を示し、グラム吸光係数は0.92×105ml/g.cmであった。 The compound thus obtained showed an absorption maximum at 550.0 nm in a chloroform solution, and the gram extinction coefficient was 0.92 × 10 5 ml / g. cm.
金属キレート化合物(AM−58)の合成
酢酸4.0g、プロピオン酸2.0gの混合溶液に下記構造式(4−c)で示される化合物 0.71gを溶解し、0−5℃にて40%ニトロシル硫酸2.18gを滴下した。同温度で1時間攪拌し、ジアゾ化した。下記構造式(5−a)で示される化合物 2.00g、尿素0.37g、酢酸ナトリウム6.2gをメタノール50gに溶解させ、得られたジアゾ液を0−5℃で滴下装入した。同温度で2時間攪拌後、一晩放置した。反応液を水200gに排出し、析出した結晶を濾別、水洗、乾燥して、下記構造式(1−58)で示される化合物 2.68gを得た。
Synthesis of metal chelate compound (AM-58) In a mixed solution of 4.0 g of acetic acid and 2.0 g of propionic acid, 0.71 g of the compound represented by the following structural formula (4-c) was dissolved, and 40 at 0-5 ° C. 2.18 g of% nitrosylsulfuric acid was added dropwise. The mixture was stirred at the same temperature for 1 hour to diazotize. 2.00 g of the compound represented by the following structural formula (5-a), 0.37 g of urea and 6.2 g of sodium acetate were dissolved in 50 g of methanol, and the obtained diazo solution was charged dropwise at 0-5 ° C. The mixture was stirred at the same temperature for 2 hours and left overnight. The reaction solution was discharged into 200 g of water, and the precipitated crystals were separated by filtration, washed with water and dried to obtain 2.68 g of a compound represented by the following structural formula (1-58).
次に、メタノール80g、テトラヒドロフラン20gに式(1−58)で示される化合物 2.42gを溶解し、50−55℃で酢酸ニッケル四水和物 0.81gをメタノール8gに溶解した溶液を滴下し、同温度で1時間攪拌した。析出した結晶を濾別、水洗、乾燥して、化合物(AM−58)2.34gを得た。 Next, a solution obtained by dissolving 2.42 g of the compound represented by the formula (1-58) in 80 g of methanol and 20 g of tetrahydrofuran, and dropwise adding a solution of 0.81 g of nickel acetate tetrahydrate in 8 g of methanol at 50 to 55 ° C. The mixture was stirred at the same temperature for 1 hour. The precipitated crystals were separated by filtration, washed with water, and dried to obtain 2.34 g of compound (AM-58).
下記の分析結果より、目的物であることを確認した。
元素分析値(C34H36N14O6S4Ni)
From the following analysis results, it was confirmed to be the target product.
Elemental analysis (C 34 H 36 N 14 O 6
このようにして得られた化合物は、クロロホルム溶液中において557.0nmに吸収極大を示し、グラム吸光係数は0.90×105ml/g.cmであった。 The compound thus obtained showed an absorption maximum at 557.0 nm in a chloroform solution, and the gram extinction coefficient was 0.90 × 10 5 ml / g. cm.
厚さ0.6mm,直径120mmΦのスパイラルグルーブ(ピッチ=0.74um,深さ=165nm,幅=0.33um)を有する射出成形ポリカーボネート基板に表2に記載した金属キレート化合物(AM−1)を、テトラフルオロプロパノールに溶解し(20g/l),スピンコーティング法にてほぼ溝上膜厚80nm,溝間膜厚20nmとなるように調整し成膜した。80℃、2時間乾燥処理した後、AgPdCu反射膜をバルザース製スパッタ装置(CDI−900)を用い膜厚80nmで形成し、更にこの反射層上にはUV硬化樹脂:SD17(大日本インク製)を塗布しUV硬化した後、この上に前記と同様0.6mm厚のポリカーボネート基板を貼り合わせJSR製KZ8681ラジカル重合接着剤によりUV光で貼り合わせた光記録媒体を作製した。 The metal chelate compound (AM-1) described in Table 2 is formed on an injection-molded polycarbonate substrate having a spiral groove (pitch = 0.74 um, depth = 165 nm, width = 0.33 um) having a thickness of 0.6 mm and a diameter of 120 mmΦ. Then, it was dissolved in tetrafluoropropanol (20 g / l), and a film was formed by spin coating so that the film thickness on the grooves was approximately 80 nm and the film thickness between the grooves was 20 nm. After drying at 80 ° C. for 2 hours, an AgPdCu reflective film is formed with a film thickness of 80 nm using a sputtering apparatus (CDI-900) manufactured by Balzers, and on this reflective layer, UV curable resin: SD17 (Dainippon Ink) After being coated and UV cured, a 0.6 mm thick polycarbonate substrate was laminated thereon as described above, and an optical recording medium was produced by bonding with UV light using a KZ8681 radical polymerization adhesive manufactured by JSR.
得られた光記録媒体をパルステック工業社製ディスクテスターDDU1000:波長=661nm、NA=0.60にて、線速度=3.5m/s(DVD−R基準記録速度)、線速度=14m/s(DVD−R基準記録速度の4倍速スピード)、及び線速度=28m/s(DVD−R基準記録速度の8倍速スピード)にて各々DVDR対応のEFM+信号を記録した。記録条件はDVD−R規格書(ver2.0)記載のパルス条件を各々1倍速、4倍速、及び8倍速の高速駆動し各ピットに最適となるような調整を施し記録した。それら記録部位をDVD標準速度でジッター計測した。当該実施例に示すDVDR媒体では1倍速、4倍速、及び8倍速いずれにおいても良好なジッター値で幅広いパワーウインドウが確認できた。 Disc tester DDU1000 manufactured by Pulstec Industrial Co., Ltd .: wavelength = 661 nm, NA = 0.60, linear velocity = 3.5 m / s (DVD-R standard recording velocity), linear velocity = 14 m / second. Each DVDR-compatible EFM + signal was recorded at s (4 times the DVD-R standard recording speed) and linear velocity = 28 m / s (8 times the DVD-R standard recording speed). Recording conditions were recorded by adjusting the pulse conditions described in the DVD-R standard (ver. 2.0) at high speeds of 1 ×, 4 ×, and 8 ×, respectively, so as to be optimal for each pit. Jitter measurement was performed on these recording parts at a standard DVD speed. In the DVDR medium shown in this example, a wide power window was confirmed with a good jitter value at any of 1 × speed, 4 × speed, and 8 × speed.
金属キレート化合物(AM−2)をオクタフルオロペンタノールに溶解する以外は実施例5と同様にして光記録媒体を作製した。更に実施例5と同様にして評価を行ったところ、1倍速、4倍速、及び8倍速いずれにおいても良好なジッター値で幅広いパワーウインドウが確認できた。 An optical recording medium was produced in the same manner as in Example 5 except that the metal chelate compound (AM-2) was dissolved in octafluoropentanol. Further, evaluation was performed in the same manner as in Example 5. As a result, a wide power window was confirmed with a good jitter value at any of 1 × speed, 4 × speed, and 8 × speed.
[実施例7〜25]
表2に記載した金属キレート化合物を適宜使用する以外は、実施例5と同様にして光記録媒体を作製した。
[Examples 7 to 25]
An optical recording medium was produced in the same manner as in Example 5 except that the metal chelate compounds described in Table 2 were used as appropriate.
これら光記録媒体を実施例5と同様にして評価を行ったところ、1倍速、4倍速、及び8倍速いずれにおいても良好なジッター値で幅広いパワーウインドウが確認できた。 When these optical recording media were evaluated in the same manner as in Example 5, a wide power window could be confirmed with a good jitter value at any of 1 × speed, 4 × speed, and 8 × speed.
[実施例26]
金属キレート化合物(AM−1)と(AM−21)の混合物(重量比9:1)をテトラフルオロプロパノールに溶解する以外は実施例5と同様にして光記録媒体を作製した。更に実施例5と同様にして評価を行ったところ、1倍速、4倍速、及び8倍速いずれにおいても良好なジッター値で幅広いパワーウインドウが確認できた。
[Example 26]
An optical recording medium was produced in the same manner as in Example 5 except that a mixture of metal chelate compounds (AM-1) and (AM-21) (weight ratio 9: 1) was dissolved in tetrafluoropropanol. Further, evaluation was performed in the same manner as in Example 5. As a result, a wide power window was confirmed with a good jitter value at any of 1 × speed, 4 × speed, and 8 × speed.
[実施例27〜30]
表2に記載した金属キレート化合物の混合物を適宜使用する以外は、実施例26と同様にして光記録媒体を作製した。
[Examples 27 to 30]
An optical recording medium was produced in the same manner as in Example 26 except that a mixture of metal chelate compounds described in Table 2 was appropriately used.
これら光記録媒体を実施例5と同様にして評価を行ったところ、1倍速、4倍速、及び8倍速いずれにおいても良好なジッター値で幅広いパワーウインドウが確認できた。 When these optical recording media were evaluated in the same manner as in Example 5, a wide power window could be confirmed with a good jitter value at any of 1 × speed, 4 × speed, and 8 × speed.
[比較例1]
下記構造式(7)の金属キレート化合物を用いて実施例5と同様にして光記録媒体を作製し、同様の評価を実施した。1倍速、4倍速、及び8倍速いずれにおいても信号特性のジッター値が10%を越え、良好な信号特性が得られなかった。
[Comparative Example 1]
Using the metal chelate compound of the following structural formula (7), an optical recording medium was produced in the same manner as in Example 5, and the same evaluation was performed. The jitter value of the signal characteristics exceeded 10% at any of the 1 × speed, 4 × speed, and 8 × speed, and good signal characteristics were not obtained.
[比較例2]
下記構造式(8)の金属キレート化合物を用いて実施例5と同様にして光記録媒体を作製し、同様の評価を実施した。1倍速、4倍速は良好な信号特性が得られたが、記録感度に劣り、8倍速では良好な記録が行えなかった。
[Comparative Example 2]
An optical recording medium was prepared in the same manner as in Example 5 using the metal chelate compound represented by the following structural formula (8), and the same evaluation was performed. Good signal characteristics were obtained at 1 × speed and 4 × speed, but recording sensitivity was poor, and good recording could not be performed at 8 × speed.
表7には、実施例5〜30、及び比較例1、2において、計測した1倍速、4倍速、及び8倍速のジッター、及び変調度の結果を示した。当該実施例に示すDVDR媒体では、1倍速、4倍速、及び8倍速いずれにおいても良好なジッター値で幅広いパワーウインドウが確認できた。 Table 7 shows the measured 1 × speed, 4 × speed, and 8 × speed jitter and the degree of modulation in Examples 5 to 30 and Comparative Examples 1 and 2. In the DVDR medium shown in this example, a wide power window was confirmed with a good jitter value at any of 1 × speed, 4 × speed, and 8 × speed.
本発明の金属キレート化合物を記録層として用いることにより、高密度光記録媒体である波長520〜690nmのレーザーで記録再生が可能で耐久性に優れた高密度、高速記録に適した追記型光記録媒体を提供することが可能となる。 By using the metal chelate compound of the present invention as a recording layer, recording / reproduction is possible with a laser having a wavelength of 520 to 690 nm, which is a high-density optical recording medium. A medium can be provided.
1 基板
2 記録層
3 反射層
4 接着層
5 基板
DESCRIPTION OF SYMBOLS 1
Claims (5)
イミダゾイル基、オキサゾイル基、チアゾイル基、
ピラゾイル基、イソオキサゾイル基、イソチアゾイル基、
トリアゾイル基、チアジアゾイル基、イソチアジアゾイル基、ピリジル基
である請求項1記載の金属キレート化合物。 In general formula (1), ring A may have a substituent, an imidazolyl group, an oxazoyl group, a thiazoyl group,
Pyrazoyl group, isoxazoyl group, isothiazoyl group,
2. The metal chelate compound according to claim 1, which is a triazoyl group, a thiadiazoyl group, an isothiadiazoyl group, or a pyridyl group.
イミダゾイル基、オキサゾイル基、チアゾイル基、
ピラゾイル基、イソオキサゾイル基、イソチアゾイル基、
フリル基、チエニル基、ピリジル基
である請求項1記載の金属キレート化合物。 In the general formula (1), X may have an optionally substituted imidazolyl group, oxazoyl group, thiazoyl group,
Pyrazoyl group, isoxazoyl group, isothiazoyl group,
2. The metal chelate compound according to claim 1, which is a furyl group, a thienyl group, or a pyridyl group.
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JP2009114344A (en) * | 2007-11-07 | 2009-05-28 | Yamada Chem Co Ltd | Metal complex compound, optical recording medium, optical recording material, and pigment |
JP2009114345A (en) * | 2007-11-07 | 2009-05-28 | Yamada Chem Co Ltd | Metal complex compound, optical recording medium, optical recording material, and pigment |
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JP2009114344A (en) * | 2007-11-07 | 2009-05-28 | Yamada Chem Co Ltd | Metal complex compound, optical recording medium, optical recording material, and pigment |
JP2009114345A (en) * | 2007-11-07 | 2009-05-28 | Yamada Chem Co Ltd | Metal complex compound, optical recording medium, optical recording material, and pigment |
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