JP2005165173A - Image forming method with heat developable photosensitive material - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide an image forming method with a heat developable photosensitive material free of uneven development and giving an image of a stable finish. <P>SOLUTION: In the image forming method in which the heat developable photosensitive material having an image forming layer containing a photosensitive silver halide, a non-photosensitive organic silver salt, a reducing agent and a binder on at least one surface of a support is exposed using a fluorescent screen and heat-developed with a heat developing apparatus including a heating means to form an image, the heat developable photosensitive material also has an antistatic layer. <P>COPYRIGHT: (C)2005,JPO&NCIPI

Description

  The present invention relates to an image forming method using a photothermographic material. In particular, the present invention relates to an image forming method using a heat-developable photosensitive material for medical purposes which gives a stable finished image without uneven development.

  In recent years, in the medical field, reduction of waste processing liquid has been strongly desired from the viewpoint of environmental protection and space saving. Therefore, photosensitive heat for medical diagnosis and photographic technology that can be efficiently exposed by a laser image setter or laser imager and can form a clear black image having high resolution and sharpness. There is a need for techniques relating to developed photographic materials. These photosensitive photothermographic materials can eliminate the use of solution processing chemicals and supply customers with a simpler heat development processing system that does not damage the environment.

  Although there is a similar requirement in the field of general image forming materials, medical images are required to have high image quality with excellent sharpness and graininess because they are required to be finely drawn, and are cooled from the viewpoint of ease of diagnosis. There is a feature that a black tone image is preferred. At present, various hard copy systems using pigments and dyes such as inkjet printers and electrophotography are distributed as general image forming systems. However, there is no satisfactory output system for medical images.

  On the other hand, thermal imaging systems using organic silver salts are disclosed in, for example, the specifications of U.S. Pat. “Thermally Processed Silver Systems” by Shely (Imaging Processes and Materials), 8th edition, Sturges V. Sturges. (Walworth), A. Shepp, 2nd page, 1996). In particular, the photothermographic material generally contains a catalytically active amount of a photocatalyst (eg, silver halide), a reducing agent, a reducible silver salt (eg, an organic silver salt), and a color tone that controls the color tone of silver if necessary. And a photosensitive layer dispersed in a binder matrix. The photothermographic material is heated to a high temperature (for example, 80 ° C. or higher) after image exposure, and is blackened by an oxidation-reduction reaction between silver halide or a reducible silver salt (functioning as an oxidizing agent) and a reducing agent. Form a silver image. The oxidation-reduction reaction is promoted by the catalytic action of the latent image of silver halide generated by exposure. Therefore, a black silver image is formed in the exposure area. Fuji Medical Dry Imager FM-DPL has been put on the market as a medical image forming system using a photothermographic material.

On the other hand, attempts have been made to apply the above-mentioned photothermographic material to a photographic material. The photographic photosensitive material mentioned here is not for writing image information by scanning exposure with a laser beam or the like, but for recording an image by surface exposure. Conventionally, it is generally used in the field of wet-developable photosensitive materials, and in particular, is widely used as a medical image heat-developable photosensitive material such as a direct or indirect X-ray film or a mammograph film. Regarding the use of the photothermographic material in such a field, for example, double-sided coated X-ray photothermographic material using a blue fluorescent intensifying screen (see, for example, Patent Document 1), silver iodobromide. A photothermographic material using a tabular grain (see, for example, Patent Document 2) or (100) a medical photosensitive material in which tabular grains having a main plane and a high silver chloride content are coated on both sides of a support. It is disclosed in a patent document (for example, see Patent Document 3). The double-side coated photothermographic material is also disclosed in other patent documents (for example, see Patent Documents 4 to 7). However, in these known examples, when fine grain silver halide of 0.1 μm or less is used, the haze is not deteriorated, but the sensitivity is low and the film is not practical for photography. When silver halide grains were used, there was a problem of deterioration of image quality due to deterioration of haze due to remaining silver halide and deterioration of printout.
In addition, the photothermographic material is subject to a series of processes in which the photothermographic material and the fluorescent screen are overlapped with each other and subjected to X-ray exposure, the fluorescent screen is removed and the photothermographic apparatus is inserted into the heat developing apparatus and thermally developed. However, there has been no report on what kind of characteristics are newly required.
Japanese Patent No. 3229344 JP 59-142539 A JP-A-10-282602 JP 2000-227642 A Japanese Patent Laid-Open No. 2001-22027 JP 2001-109101 A JP 2002-90941 A

Although the photothermographic material has such a large feature, there is a problem that it is more difficult than expected to obtain an image having a uniform finish. In order to record an X-ray image, X-ray exposure is performed by superimposing on a fluorescent screen, the fluorescent screen is caused to emit light by X-rays, and this is exposed to photosensitive silver halide. In order to select an image with high resolution, it is necessary to improve the close contact between the photosensitive material and the phosphor screen. Exposing the air layer over the entire surface of the sheet, exposure is performed by forming a complete close contact state. After the exposure, the fluorescent screen is peeled off, and only the photosensitive material is developed to obtain a visible image. Even in the case of conventional wet development, electrostatic light emission occurs due to charging called peeling charging when the fluorescent screen is peeled off, and unevenness called static marks may occur in the photosensitive material. In the case of conventional wet development, such a failure is usually solved by including a fluorine compound in the outermost layer in the photosensitive material.
However, it has been found that the situation is completely different in the photothermographic material. In the photothermographic material having an image forming layer containing a photosensitive silver halide, a non-photosensitive organic silver salt, a reducing agent, and a binder, the moisture content of the image forming layer is higher than that of the photosensitive material for wet development. Since it is low, peeling electrification is likely to occur when the fluorescent screen is peeled off, and further, the humidity is lowered during heat development. Further, in the thermal development method in which thermal energy is transmitted by thermal conduction due to contact with the heating member of the thermal development apparatus, the adhesion of the photosensitive material surface to the heating member is important, and smooth surface characteristics are required. This situation further exacerbated the peeling charge caused by the fluorescent screen.
Another unique problem of charging the photothermographic material was in the heat development process. After the X-ray exposure is completed and the fluorescent screen is peeled off, the photothermographic material is heated and developed. In order to increase the speed of the development process and the uniformity of development, a development system in which the photothermographic material is heated while passing between heating members while being conveyed at a constant speed is preferable. A higher conveying speed is preferable in terms of productivity, but the heating zone heated to a high temperature has a low humidity, and if it is conveyed at a high speed, charging failure is very likely to occur. In particular, when at least one of the heating members is a fixed member and the photothermographic material moves with friction, the charging becomes intense and the risk of causing discharge emission increases. In the case of a conventional single-sided photothermographic material, the surface in contact with the fixing member is the back surface, and the back layer itself can take a structure that does not easily cause charged light emission. As a result of being shielded by the antihalation dye and the film base, the influence on the image forming layer on the surface was reduced, so this was not a big problem.

  An object of the present invention is to provide an image forming method capable of solving such a problem of charging in a photothermographic material for X-ray image recording and generating a uniform and uniform image having good image quality.

  The present inventors have found that the above problem can be solved by providing an antistatic layer, and have reached the present invention described in <1> below. The preferred arrangement of the antistatic layer was found, and the inventions <2> to <4> were reached. The present inventors have found an antistatic agent preferable for the present application and have arrived at the inventions <5> to <11>. The inventors have found that the combined use with a fluorine compound is preferable, and have reached the inventions <12> and <13>. The inventors have found a development method that can achieve the effects of the present application, and have reached the inventions <14> to <16>. According to the present invention, a preferable photothermographic material structure has been found, and the inventions <17> to <22> have been achieved.

<1> A photothermographic material having an image forming layer containing a photosensitive silver halide, a non-photosensitive organic silver salt, a reducing agent, and a binder on at least one surface of a support is exposed using a fluorescent screen, An image forming method for forming an image by heat development with a heat developing apparatus having a heating means, wherein the photothermographic material has an antistatic layer.
<2> The image according to <1>, wherein the antistatic layer is provided between the image forming layer and the support or on a surface opposite to the image forming layer with respect to the support. Forming method.
<3> The photothermographic material has a back layer on a surface opposite to the image forming layer with respect to the support, and has the antistatic layer between the back layer and the support. <1> or <2>, wherein the image forming method is characterized.
<4> The image forming layer is provided on both surfaces of the support, and the antistatic layer is provided between the image forming layer and the support on at least one surface. 2>. The image forming method according to 2>.
<5> The image forming method according to <4>, further comprising a non-photosensitive layer containing no antistatic agent between the image forming layer and the antistatic layer.
<6> The image forming method according to any one of <1> to <5>, wherein the antistatic layer contains at least one selected from a metal oxide, a conductive polymer, and a surfactant. .
<7> The image forming method according to any one of <1> to <6>, wherein the antistatic layer contains a metal oxide.
<8> At least one crystalline metal oxide selected from the group consisting of ZnO, TiO ₂ , SnO ₂ , Al ₂ O ₃ , In ₂ O ₃ , SiO ₂ , MgO, BaO and MoO ₃ . Or it is at least 1 sort (s) chosen from the group which consists of these complex oxides, The image forming method as described in <7> characterized by the above-mentioned.
<9> The image forming method according to any one of <1> to <8>, wherein the antistatic layer contains a conductive polymer.
<10> The image forming method according to <9>, wherein the conductive polymer is a water-soluble conductive polymer and a reaction product of a hydrophobic polymer and a curing agent.
<11> The image forming method according to any one of <1> to <10>, wherein the antistatic layer contains a surfactant.
<12> The surfactant is at least one selected from the group consisting of an anionic surfactant, a cationic surfactant, a nonionic surfactant, and a betaine surfactant. <11> The image forming method according to <11>.
<13> At least one outermost layer of the photothermographic material contains a fluorine compound having a fluorinated alkyl group having 2 or more carbon atoms and 12 or less fluorine atoms. 12>. The image forming method according to any one of 12).
<14> The image forming method according to <13>, wherein the fluorine compound has a fluorinated alkyl group represented by the following general formula (A).
Formula (A)
-L ⁰³ -L ⁰⁴ -W
In General Formula (A), L ⁰³ represents an alkylene group having 1 to 4 carbon atoms, L ⁰⁴ represents a perfluoroalkylene group having 2 to 6 carbon atoms, and W represents a hydrogen atom, a fluorine atom, or an alkyl group. .
<15> The heat development apparatus includes a heating unit, and the heating unit includes a plate and a roller that rotates by pressing the photothermographic material against the plate, and heats at least one of the plate and the roller. The image forming method according to any one of <1> to <14>, wherein a heater serving as a source is incorporated.
<16> The image forming method according to any one of <1> to <15>, wherein the photothermographic material is heated while being moved on the heating unit due to frictional resistance.
<17> The image forming method according to any one of <1> to <16>, wherein the photothermographic material is thermally developed while being conveyed at a conveyance speed of 10 mm / second or more.
<18> The image forming method according to any one of <1> to <17>, wherein the photosensitive silver halide is a tabular grain having an aspect ratio of 2 or more.
<19> The image forming method according to <18>, wherein the photosensitive silver halide is a tabular grain having an average sphere equivalent diameter of 0.3 μm or more and 8.0 μm or less.
<20> The image forming method according to any one of <1> to <19>, wherein the photosensitive silver halide has an average iodine content of 40 mol% or more.
<21> The image forming method according to <20>, wherein the photosensitive silver halide has an average iodine content of 90 mol% or more.
<22> The image forming method as described in <20> or <21>, which comprises a compound that substantially reduces visible light absorption derived from photosensitive silver halide grains after heat development.
<23> The image formation according to <22>, which contains a silver iodide complex-forming agent as a compound that substantially reduces visible light absorption derived from the photosensitive silver halide grains after heat development. Method.

  According to the present invention, there is provided an image forming method using a photothermographic material which gives a stable finished image without development unevenness.

The present invention is described in detail below.
(Photothermographic material)
1. Photothermographic material The photothermographic material of the present invention has an image forming layer containing a photosensitive silver halide, a non-photosensitive organic silver salt, a reducing agent, and a binder on at least one surface of a support. . Preferably, the support has an image forming layer and an antistatic layer on both sides. The antistatic layer is preferably disposed between the image forming layer and the support or on the surface opposite to the image forming layer with respect to the support. Preferably, an intermediate layer and a surface protective layer may be provided on the image forming layer. Or you may have a back layer, a back protective layer, etc. on the opposite surface of an image forming layer.
The configuration of each layer and preferred components thereof will be described in detail.

(Antistatic layer)
1) Metal oxide One embodiment of the antistatic layer in the present invention is a conductive layer in which a metal oxide is dispersed in a binder. The side resistance in an environment of 25 ° C. and 10% RH is preferably 10 ¹¹ Ω or less.

Examples of the conductive metal oxide used for the conductive layer in the present invention are selected from the group consisting of ZnO, TiO ₂ , SnO ₂ , Al ₂ O ₃ , In ₂ O ₃ , SiO ₂ , MgO, BaO and MoO _3. At least one kind of crystalline metal oxide or fine particles of these composite oxides (fibrous, needle-like, spherical, plate-like, irregular shape). The fine particles of metal oxides or complex oxides thereof are described in detail in JP-A Nos. 56-143430 and 60-258541. The conductive metal oxide fine particles can be prepared by first firing the metal oxide fine particles by firing and then heat-treating them in the presence of different atoms to improve conductivity, and secondly by oxidizing the metal oxides by firing. For example, a method in which different atoms coexist at the time of preparation of fine particles, and a method of introducing oxygen defects by lowering the oxygen concentration during firing are used. Examples of the hetero atoms include Al and In for ZnO, Nb and Ta for TiO ₂ , and Sb, Nb, P, B, In, V, and halogen for SnO ₂ . The amount of different atoms added is preferably in the range of 0.01 mol% to 30 mol%, particularly preferably 0.1 mol% to 10 mol%. Furthermore, a silicon compound may be added during the formation of fine particles in order to improve fine particle dispersibility and transparency.

Further, as described in Japanese Patent Publication No. 59-6235, a conductive material in which the above metal oxide is attached to other crystalline metal oxide particles or fibrous materials (for example, titanium oxide) may be used. . The conductive metal oxide used in the present invention differs in shape, size, volume resistivity, etc. depending on the type, but the shape is most preferably a fiber with a large aspect ratio in that the coating amount per unit area can be reduced. Next, the order is needle-like, plate-like, irregular shape, and spherical. Further, the volume resistivity is preferably as low as possible, preferably 10 ⁷ Ω · cm or less, more preferably 10 ⁵ Ω · cm or less, and still more preferably 10 ² Ω · cm or less. The amount of coating per unit area, including the shape and volume resistivity of the conductive metal oxide, can be reduced most. The metal oxide containing SnO ₂ as the main component and containing about 5 to 20% of antimony oxide, and others It is a metal oxide, ZnO, TiO ₂ , In ₂ O ₃ (above indefinite shape) containing components (for example, silicon oxide, boron, phosphorus, etc.), and these can be preferably used in the present invention. Among them, particularly preferred is a metal oxide containing SnO ₂ as a main component and containing about 5% by mass to 20% by mass of antimony oxide, and a metal oxide further containing other components (for example, silicon oxide, boron, phosphorus, etc.). It is a thing.

  If the conductive metal oxide used in the present invention is indefinite shape and spherical, the primary particle size is preferably 0.0001 μm to 1 μm, and more preferably 0.001 μm to 0.5 μm because the stability after dispersion is good. Further, it is particularly preferable to use conductive particles having a diameter of 0.001 to 0.3 μm in order to improve the light transmittance because a transparent photosensitive material can be formed. These particles are dispersions and secondary aggregates in which several or more primary particles are usually aggregated in the coating film, and the average particle diameter is preferably 0.5 μm to 0.005 μm, but the unit area From the viewpoint of reducing the coating amount per unit, the thickness is preferably 0.3 μm to 0.005 μm, more preferably 0.2 μm to 0.01 μm, and particularly preferably 0.18 μm to 0.01 μm.

The coating amount of the conductive metal oxide used in the present invention is not particularly limited, but a smaller coating amount per unit area is preferable because coloring of the photosensitive material of the present invention can be suppressed. However, if the coating amount is too small, the antistatic property is lost. Therefore, the coating amount per unit area may be a 1~800mg / m ^2, it is preferably 2~400mg / m ^2, more preferably 5 to 250 mg / m ^2, particularly preferably 10-150 mg / m ² . When the conductive metal oxide is in the form of fibers or needles, the coating amount per unit area can be reduced as the aspect ratio (ratio of major axis / minor axis length) increases. The fibrous and acicular conductive metal oxide preferably used in the present invention has a length of 20 μm or less and a diameter of 1 μm or less, more preferably a length of 10 μm or less and a diameter of 0.3 μm or less, particularly preferably. The length is 10 μm or less and the diameter is 0.1 μm or less. The aspect ratio is 5 or more, preferably 10 or more, and more preferably 20 or more. The coating amount per unit area may be a 0.1 to 500 mg / m ^2, preferably 0.5~300mg / m ^2, more preferably 0.5~150mg / m ^2, particularly preferably 1～120Mg / m ² .

In addition, two or more kinds of conductive metal oxides can be mixed and applied. In particular, the use of a mixture of an indefinite shape, a spherical shape, a fiber shape, and a needle shape is expected to further suppress the coloring of the photothermographic material. There are things you can do. For example, increasing the effect of the mixing V ₂ O ₅ of 1/50 in a weight ratio to the metal oxide as a main component SnO ₂ was contained about 5 wt% to 20 wt% antimony oxide suppress the coloring of the photothermographic material . In the present invention, the conductive metal oxide may be applied from a coating solution without a binder, but considering the adhesion with the polymer layer on the conductive layer and the peeling of the metal oxide during the manufacturing process, It is preferable to apply together. As the binder, all polymers having film-forming properties can be used. For example, water-soluble binders such as gelatin, dextran, polyacrylamide, starch, polyvinyl alcohol, poly (meth) acrylate, polyvinyl acetate, polyurethane, polyvinyl chloride, polyvinylidene chloride, styrene / butadiene copolymer Synthetic polymer binders such as polystyrene, polyester, polyethylene, polyethylene oxide, polypropylene and polycarbonate polyvinyl butyral may be used in an organic solvent, and these polymer binders may be used in the form of an aqueous dispersion. At this time, the mass ratio of the conductive metal oxide / binder is 99/1 to 10/90 if the conductive metal oxide is indefinite shape or spherical, and the mass ratio of the conductive metal oxide / binder is small. In addition, the higher the antistatic property, the better. In order to reduce the conductive metal oxide / binder mass ratio and increase the antistatic property, two or more kinds of binders are mixed to cause phase separation, or an additive such as a metal oxide flocculant is added. In addition, it is preferable to design the metal oxide so that the metal oxides are well connected in a small amount in the conductive layer. The conductive metal oxide / binder mass ratio is preferably 95/5 to 30/70, more preferably 90/10 to 50/50, and particularly preferably 85/15 to 60/40. Further, when the conductive metal oxide is fibrous or needle-shaped, it is 80/20 to 0.1 / 99.9, preferably 70/30 to 1/90, more preferably 50/50 to 1/90. Particularly preferred is 30/70 to 1/90.

In the present specification, the side resistance is the end electrical resistance (Ω) of the photosensitive material. The side resistance is measured by the following method. That is, the photosensitive material was cut into a size of 1.5 cm × 5 cm, and both sides of the long end surface of the sample were soaked in a conductive paste “Dotite” manufactured by Fujikura Kasei Co., Ltd. for about 1 mm for about 5 seconds, and then naturally for 1 hour. Dry and attach the electrodes (attach to the diagonal). The sample thus prepared is conditioned for 2 hours at 25 ° C. and a relative humidity of 10%, and then the resistance between the electrodes is measured. The obtained resistance value is multiplied by the length (5) coated with dotite and divided by the distance (1.5) between the dotes to obtain the side resistance value. The electrical resistance (side resistance) of a photosensitive material including a conductive layer containing a conductive metal oxide in the present invention is preferably as low as possible, and is 10 ¹¹ Ω or less at 25 ° C. and 10% relative humidity, preferably 10 ¹⁰ Ω or less, more preferably 10 ⁹ Ω or less. If the electrical resistance is 10 ¹¹ Ω or less at 25 ° C. and a relative humidity of 10%, the photosensitive layer is exposed by discharging the electrostatic charge accumulated in the photothermographic material before the heat development process, and as a result, the development process is performed. This can prevent failures that later cause dot spots or resin-like line segments, and failures that the accumulated electrostatic charge attracts dust during printing and appears on the screen, and also prevents poor conveyance due to charging of the photothermographic material. be able to.

2) Conductive polymer The water-soluble conductive polymer of the present invention includes at least one conductive group selected from a sulfonic acid group, a sulfate ester group, a quaternary ammonium salt, a tertiary ammonium salt, a carboxyl group, and a polyethylene oxide group. The polymer which has is mentioned. Of these groups, sulfonic acid groups, sulfate ester groups, and quaternary ammonium bases are preferred. The conductive group requires 5% by weight or more per polymer molecule.

  Hereinafter, although the specific compound example of the water-soluble conductive polymer used for this invention is given, it is not limited to this.

  In the above P-1 to P-37, x, y, and z are mole percentages of the respective monomer components, and MW is an average molecular weight (in the present specification, the average molecular weight refers to a weight average molecular weight). Represents.

  The amount of the conductive polymer contained in the antistatic layer and the conductive layer of the silver halide photographic light-sensitive material of the present invention is preferably 0.001 g to 10 g, particularly preferably in terms of solid content per unit m2. Is to add 0.05 g to 5 g.

  When the conductive polymer is used for the backing layer, backing protection or silver halide emulsion layer, it is preferably 0.01 to 10 g in terms of solid content.

  Next, the hydrophobic polymer particles according to the present invention will be described. The hydrophobic polymer particles contained in the water-soluble conductive polymer layer of the present invention are contained in a so-called latex that does not substantially dissolve in water. This hydrophobic polymer is a monomer selected from any combination of styrene, styrene derivatives, alkyl acrylates, alkyl methacrylates, olefin derivatives, halogenated ethylene derivatives, acrylamide derivatives, methacrylamide derivatives, vinyl ester derivatives, acrylonitrile, and the like. Obtained by polymerization. In particular, it is preferable that at least 30 mol% of styrene derivatives, alkyl acrylates and alkyl methacrylates are contained. In particular, 50 mol% or more is preferable.

  There are two methods to make a hydrophobic polymer into a latex form: emulsion polymerization; dissolving a solid polymer in a low-boiling solvent, finely dispersing it, and then distilling off the solvent. Emulsion polymerization is preferred in that it can be produced.

  As the surfactant used in the emulsion polymerization, anionicity and nonionicity are preferably used, and preferably 10% by weight or less based on the monomer. A large amount of surfactant causes fogging of the conductive layer. The molecular weight of the hydrophobic polymer may be 3000 or more, and there is almost no difference in transparency depending on the molecular weight.

  Specific examples of the hydrophobic polymer of the present invention will be given.

  The addition amount of the hydrophobic polymer is 5 to 60% by weight, preferably 10 to 40% by weight, based on the water-soluble conductive polymer.

Next, the curing agent used in the present invention will be described.
As the curing agent used in the present invention, the following various curing agents can be used.

Blocked isocyanate type, polyfunctional aziridine type α-cyanoacrylate type, epoxy type, preferably containing triphenylphosphine, bifunctional ethylene oxide type, N-methylol type cured by electron beam or X-ray irradiation, zinc and zirconium metal Containing metal complex, silane coupling agent, carboxy active type.
Hereinafter, these curing agents will be described.

The blocked isocyanate curing agent used in the present invention is not particularly limited as long as it releases isocyanate upon heating, but preferred examples thereof include the following compounds.

The above compound may be dissolved in water or an organic solvent such as alcohol or acetone and added as it is, or after being dispersed using a surfactant such as dodecylbenzenesulfonate or nonylphenoxyalkylene oxide. It may be added. A preferable addition amount is 1-1000 mg / m ² .

Next, the polyfunctional aziridine curing agent used in the present invention is represented by the following general formula.

Here, R ₁ represents a hydrogen atom, an alkyl or aryl group having up to 20 carbon atoms, a hydroxy group, or a halogen atom, and R ₂ represents a hydrogen atom or an alkyl group having up to 10 carbon atoms.

  The following are preferably used, but are not limited thereto.

Next, the α-cyanoacrylate compound used in the present invention is represented by the following general formula.

[Wherein, R represents a substituted or unsubstituted alkyl group having 1 to 12 carbon atoms. ]
Hereinafter, although a specific example is shown, it is not limited to this.

  Next, the epoxy group-containing curing agent used in the present invention is not particularly limited, but the following compounds are preferably used as specific examples.

Most of the above compounds are commercially available and can be easily obtained. The addition method may be dissolved in water or an organic solvent such as alcohol or acetone and added as it is, or dispersed using a surfactant such as dodecylbenzenesulfinate or nonylphenoxyalkylene oxide. May be added. A preferable addition amount is 1-1000 mg / m ² .

  Moreover, the effect can be further enhanced by using together with the crosslinking agent the triphenylphosphine represented by the following general formula.

[Wherein R _{11 to} R ₁₃ represent a substituted or unsubstituted alkyl group, a hydrogen atom, a halogen atom, a nitro group, a cyano group, a hydroxy group, or an alkoxy group. ]
Although there is no restriction | limiting in particular in a triphenylphosphine, As a specific example, the compound shown below is used preferably.

Next, the bifunctional ethylene oxide compound used in the present invention is represented by the following general formula.

_{CH 2 = CH-L-CH} = CH 2
[Wherein L represents a substituted or unsubstituted alkylene oxide chain group. ]
Hereinafter, although a specific example is shown, it is not limited to this.

  Conventionally, the bifunctional ethylene oxide compound has been crosslinked by a heating method to cure the compound. However, in this method, since the reaction is slow and the crosslinking is insufficient and the efficiency is low, in the present invention, irradiation with an electron beam or X-ray is performed. It is characterized by being cured.

  The electron beam and X-ray intensities necessary for curing are as follows.

Electron beam intensity: 10 ⁻² to 10 ⁶ KW / m ² (50 KW / m ² is particularly preferred)
X-ray intensity: 10 ⁻² to 10 ⁶ KW / m ² (300 KW / m ² is particularly preferable)
Next, although the specific example of the N-methylol type compound used for this invention is shown, it is not limited to this.

Next, although the specific example of the metal complex containing the zinc and zirconium metal used for this invention is shown, it is not limited to this.

The amount of the metal complex used is preferably 10 ⁻³ to 10 ³ mol with respect to 1 mol of the conductive polymer.

  Conventionally, an organic cross-linking agent has been mainly used, but by using the metal complex of the present invention, cross-linking has been sufficiently performed.

In the present invention, a silane coupling agent can also be used as a curing agent as follows.

  Examples of the present invention also include the following carbodiimide type in which a carboxyl group active type curing agent is also used.

  Of the above hardeners, polyfunctional azirine type and epoxy type are preferably used in the present invention.

  The organic conductive polymer in the conductive layer used in the present invention has a molecular weight of 1,000 to 10,000,000, in which a sulfonic acid group or its base is bonded directly to an aromatic ring or heterocyclic group or via a divalent linking group. Particularly preferred are 1 to 500,000 compounds. The polymer can be easily synthesized by polymerizing a monomer obtained commercially or by a conventional method.

The conductivity in the conductive polymer of the present invention is a property such that the specific resistance of the surface of the polyethylene terephthalate film applied alone at 2 g / m ² or more is 10 ¹⁰ Ω / cm (23 ° C., 20% RH) or less. It is what has.

3) Surfactant The surfactant is preferably an anionic, cationic, nonionic or betaine type. Examples of the anionic surfactant preferably used in the present invention include those represented by the following general formulas [I] to [VI].

[Wherein, R ₁ and R ₂ each represent an alkyl group having 1 to 18 carbon atoms, and M represents a hydrogen atom or a cation. m ₁ represents an integer of 0 to 50, and n ₁ represents an integer of 0 to 4. p represents 0 or 1; ].

[Wherein R ₃ represents an alkyl group or alkenyl group having 6 to 20 carbon atoms, and M represents a hydrogen atom or a cation. m ₂ represents an integer of 0 to 50, n ₂ represents an integer of 0 to 4, and a represents an integer of 0 or 1. ].

[Wherein, R ₄ and R ₅ each represent an alkyl group having 6 to 18 carbon atoms, and M represents a hydrogen atom or a cation. ].

[Wherein R ₆ represents an alkyl group having 6 to 20 carbon atoms, R ₇ represents an alkyl group having 1 to 4 carbon atoms, X represents —COOM or —SO ₃ M, and M represents hydrogen. Represents an atom or cation. n ₃ represents an integer of 1-4. ].

[Wherein, R ₈ and R ₉ each represent an alkyl group having 6 to 20 carbon atoms, and M represents a hydrogen atom or a cation. ].

[Wherein, R ₁₀ , R ₁₁ and R ₁₂ each represent an alkyl group having 1 to 16 carbon atoms, and M represents a hydrogen atom or a cation. ].
Examples of the alkyl group having 1 to 18 carbon atoms represented by R ₁ and R ₂ include a methyl group, an ethyl group, a butyl group, an octyl group, a decyl group, a dodecyl group, and an octadecyl group.

Examples of the alkyl group having 6 to 20 carbon atoms represented by R ₃ , R ₆ , R ₈ and R ₉ include hexyl group, heptyl group, octyl group, dodecyl group, octadecyl group and eicosyl group.

Examples of the alkyl group having 6 to 18 carbon atoms represented by R ₄ and R ₅ include hexyl group, heptyl group, dodecyl group, pentadecyl group, octadecyl group and the like.

Examples of the alkyl group having 1 to 4 carbon atoms represented by R ₇ include a methyl group, an ethyl group, a propyl group, and a butyl group.

Examples of the alkyl group having 1 to 16 carbon atoms represented by R ₁₀ , R ₁₁ and R ₁₂ include a methyl group, an ethyl group, a butyl group, a decyl group, a dodecyl group, and a hexadecyl group.

Each alkyl group represented by R _{1 to} R ₁₂ includes those having a substituent, and in this case, the number of carbon atoms does not include the substituent.

  Next, examples of specific compounds are listed, but the present invention is not limited to these.

  Examples of the nonionic surfactant preferably used in the present invention include compounds represented by the following general formulas [N-I], [N-II] and [N-III].

In the formula, R ₁ represents a hydrogen atom or an alkyl group having 1 to 30 carbon atoms, an alkenyl group, or an aryl group, and these groups include those each having a substituent. R ₁ is preferably an alkyl group having 4 to 24 carbon atoms, an alkenyl group, or an aryl group, and particularly preferably a hexyl group, dodecyl group, isostearyl group, oleyl group, t-butylphenyl group, 2,4-di- t-butylphenyl group, 2,4-di-t-pentylphenyl group, p-dodecylphenyl group, m-pentadecaphenyl group, t-octylphenyl group, 2,4-dinonylphenyl group, octylnaphthyl group, etc. It is.

A is —O—, —S—, —COO—, —OCO—,> N—R ₁₀ , —CO— (R ₁₀ ) N— or —SO ₂ — (R ₁₀ ) N— (where R ₁₀ is Represents a hydrogen atom or an alkyl group including those having a substitution value. R ₂ , R ₃ , R ₇ and R ₉ represent a hydrogen atom, alkyl group, aryl group, alkoxy group, aryloxy group, halogen atom, acyl group, amide group, sulfonamido group, carbamoyl group or sulfamoyl group, These groups include those each having a substituent. R ₆ and R ₈ represent an alkyl group, an aryl group, an alkoxy group, an aryloxy group, a halogen atom, an acyl group, an amide group, a sulfonamide group, a carbamoyl group or a sulfamoyl group, and these groups each have a substituent. Is also included.

R ₆ and R ₈ are preferably an aryl group such as an alkyl group having 1 to 20 carbon atoms, a phenyl group, or a p-chlorophenyl group, —OR ₁₅ (wherein R ₁₅ represents an alkyl group or aryl group having 1 to 20 carbon atoms). And these groups include those having a substituent.), An alkoxy group and an aryloxy group, a halogen atom such as a chlorine atom or a bromine atom, an acyl group represented by —COR ₁₅ , —NR ₁₆ An amide group represented by COR ₁₅ (wherein R ₁₆ represents a hydrogen atom or an alkyl group having 1 to 20 carbon atoms), a sulfonamide group represented by —NR ₁₆ SO ₂ R ₁₅ , —CONR ₁₆ R ₁₆ Or a sulfamoyl group represented by —SO ₂ NR ₁₆ R ₁₆ . Of these, R ₆ and R ₈ are more preferably an alkyl group or a halogen atom, and most preferably a tertiary alkyl group such as a t-butyl group, a t-amyl group, or a t-octyl group.

R ₂ , R ₃ , R ₇ and R ₉ are preferably hydrogen atoms or the groups listed as preferred for R ₆ and R ₈ above. Of these, R ₇ and R ₉ are particularly preferably hydrogen atoms.

R ₄ and R ₅ represent a hydrogen atom, an alkyl group or an aryl group, and these groups include those having a substituent. R ₄ and R ₅ are particularly preferably a hydrogen atom, an alkyl group having 1 to 8 carbon atoms, a phenyl group, a furyl group, or the like.

R ₄ and R ₅ , R ₆ and R _7, and R ₈ and R ₉ may be linked to each other to form a ring, for example, a cyclohexyl ring. In the general formula [N-III], the phenyl ring substituent may be asymmetrical.

n ₁ , n ₂ , n _3, and n ₄ are the average number of moles of ethylene oxide added, and are 2 to 50, particularly preferably 5 to 30. n ₃ and n ₄ may be the same or different.
m is an integer of 2-50.

  These compounds are disclosed in U.S. Pat. Nos. 2,982,651, 3,428,456, 3,457,076, 3,454,625, 3,552,972, 3,655, for example. 387, JP-B-51-9610, JP-A-53-29715, JP-A-54-89626, JP-A-57-85764, JP-A-57-90909, “New surfactant” (Sankyo) (Publishing 1975).

  Next, specific examples of nonionic surfactants preferably used in the present invention will be shown.

  Examples of the cationic surfactant preferably used in the present invention include compounds represented by the general formula [CI] or [C-II].

In the formula, R ₁ , R ₂ , R ₃ and R ₄ represent an alkyl group, alkenyl group, alkylaryl group or arylalkyl group having 1 to 22 carbon atoms, and M- represents an anion. The group represented by R _{1 to} R ₄ may be substituted with a hydroxyl group. J is, -C (= O) -NH- ( CH 2) m- and represents, m represents an integer of 1 to 5, p represents an integer of 0 or 1.

  Specific examples of the cationic surfactant preferably used in the present invention are shown below.

  Examples of the betaine surfactant preferably used in the present invention include compounds represented by the general formula [BI] or [B-II].

Wherein, R ₁ to R ₃ represents an alkyl group, an alkenyl group, an alkylaryl group or an arylalkyl group having from 1 to 22 carbon atoms. The group represented by R _{1 to} R ₃ may be substituted with a hydroxyl group. J is -C (= O) -NH- (CH 2) n- and represents, n represents an integer of 0 to 5, p represents an integer of 0 or 1, m represents an integer of 1 to 5.

  Specific examples of the betaine surfactant preferably used in the present invention are shown below.

(Description of fluorine compounds)
The photothermographic material of the invention preferably contains a fluorine compound having a fluorinated alkyl group having 2 or more carbon atoms and 12 or less fluorine atoms. The fluorine compound in the present invention can be used as a surfactant.

  The fluorine compound used in the present invention may have any structure as long as it has the fluorinated alkyl group (hereinafter, the alkyl group substituted with a fluorine atom is referred to as “Rf”). Moreover, the fluorine compound should just have at least 1 or more Rf, and may have 2 or more. Preferably, it is a fluorine compound having two or more.

Specific examples of Rf include the following groups, but are not limited thereto.
-C ₂ F ₅ group, -C ₃ F ₇ group, -C ₄ F ₉ groups, -C ₅ F ₁₁ group, -CH ₂ -C ₄ F ₉ groups, -C ₄ F ₈ -H group, -C ₂ H ₄ -C ₄ F _{9 groups, -C 4 H 8 -C 4 F} 9 _{group, -C 6 H 12 -C 4 F} 9 _{groups, -C 8 H 16 -C 4 F} 9 groups, -C ₄ H ₈ -C ₂ F _{5 group, -C 4 H 8 -C 3 F} 7 _{group, -C 4 H 8 -C 5 F} 11 _{group, -C 8 H 16 -C 2 F} 5 group, -C ₂ H ₄ -C ₄ F ₈ -H _{group, -C 4 H 8 -C 4 F} 8 -H _{group, -C 6 H 12 -C 4 F} 8 -H group _{-C 6 H 12 -C 2 F 4} -H group, -C ₈ H ₁₆ -C ₂ F ₄ -H _{group, -C 6 H 12 -C 4 F} 8 -CH 3 _{group, -C 2 H 4 -C 3 F} 7 _{group, -C 2 H 4 -C 5 F} 11 group , —C ₄ H ₈ —CF (CF ₃ ) ₂ group, —CH ₂ CF ₃ group, —C ₄ H ₈ —CH (C ₂ F ₅ ) ₂ group, —C ₄ H ₈ —CH (CF ₃ ) _{2 groups, -C 4 H 8 -C (CF} 3) 3 group, -CH ₂ -C ₄ F ₈ -H Groups, -CH ₂ -C ₆ F ₁₂ -H group.

  Rf has 12 or less fluorine atoms, preferably 3 or more and 11 or less, more preferably 5 or more and 9 or less. The number of carbon atoms is 2 or more, preferably 4 or more and 16 or less, more preferably 5 or more and 12 or less.

  Rf is not particularly limited as long as it has 2 or more carbon atoms and 12 or less fluorine atoms, but is preferably a group represented by the following general formula (A).

Formula (A)
-L ⁰³ -L ⁰⁴ -W

In the general formula (A), L ⁰³ represents an alkylene group having 1 to 4 carbon atoms, preferably in the range of 1 to 3 carbon atoms, more preferably in the range of 1 to 2. The alkylene group represented by L ⁰³ may be linear or branched.
L ⁰⁴ represents a C 2-6 perfluoroalkylene group, preferably a C 2-4 perfluoroalkylene group. Here, the perfluoroalkylene group refers to an alkylene group in which all hydrogen atoms of the alkylene group are replaced with fluorine atoms. The perfluoroalkylene group may be linear or branched, and may have a cyclic structure.
W represents a hydrogen atom, a fluorine atom or an alkyl group, preferably a hydrogen atom or a fluorine atom. Particularly preferred is a fluorine atom.

The fluorine compound in the present invention can also have a cationic hydrophilic group. The cationic hydrophilic group is a group that becomes a cation when dissolved in water. Specific examples include quaternary ammonium, alkyl pyridium, alkyl imidazolinium, and primary to tertiary aliphatic amines.
The cation is preferably an organic cationic substituent, and more preferably an organic cationic group containing a nitrogen or phosphorus atom. More preferred is a pyridinium cation or an ammonium cation.
The anion species forming the salt may be an inorganic anion or an organic anion. Preferred examples of the inorganic anion include iodo ion, bromine ion, and chlorine ion. Preferred examples of the organic anion include p-toluenesulfonate ion, benzenesulfonate ion, methanesulfonate ion, and trifluoromethanesulfonate ion. It is done.

  A preferred cationic fluorine compound in the present invention is represented by the following general formula (1).

In the formula, R ¹ and R ² each represent a substituted or unsubstituted alkyl group, and at least one of R ¹ and R ² is the aforementioned fluorinated alkyl group (Rf). Preferred is when both R ¹ and R ² are Rf. R ³ , R ⁴ and R ⁵ each independently represents a hydrogen atom or a substituent, X ¹ , X ² and Z each independently represent a divalent linking group or a single bond, and M ⁺ represents a cationic substituent. Represents. Y ⁻ represents a counter anion, but Y ⁻ may not be present when the charge is 0 in the molecule. m is 0 or 1.

In the general formula (1), when R ¹ and R ² each represent a substituted or unsubstituted alkyl group other than Rf, the alkyl group has 1 or more carbon atoms, and is linear, branched and Any of cyclic | annular form may be sufficient. Examples of the substituent include a halogen atom, an alkenyl group, an aryl group, an alkoxyl group, a halogen atom other than fluorine, a carboxylic acid ester group, a carbonamido group, a carbamoyl group, an oxycarbonyl group, and a phosphoric acid ester group.

When R ¹ or R ² represents an alkyl group other than Rf, that is, an alkyl group not substituted with a fluorine atom, the alkyl group is preferably a substituted or unsubstituted alkyl group having 1 to 24 carbon atoms, more preferably It is a substituted or unsubstituted alkyl group having 6 to 24 carbon atoms. Preferred examples of the unsubstituted alkyl group having 6 to 24 carbon atoms include n-hexyl group, n-heptyl group, n-octyl group, tert-octyl group, 2-ethylhexyl group, n-nonyl group, 1,1, 3-trimethylhexyl group, n-decyl group, n-dodecyl group, cetyl group, hexadecyl group, 2-hexyldecyl group, octadecyl group, eicosyl group, 2-octyldodecyl group, docosyl group, tetracosyl group, 2-decyltetra A decyl group, a tricosyl group, a cyclohexyl group, a cycloheptyl group, etc. are mentioned. Preferred examples of the alkyl group having 6 to 24 carbon atoms having a substituent include 2-hexenyl group, oleyl group, linoleyl group, linolenyl group, benzyl group, β-phenethyl group, 2-methoxyethyl group, 4-phenylbutyl group, 4-acetoxyethyl group, 6-phenoxyhexyl group, 12-phenyldodecyl group, 18-phenyloctadecyl group, 12- (p-chlorophenyl) dodecyl group, 2- (diphenyl phosphate) ethyl group, etc. Can be mentioned.

The alkyl group other than Rf represented by R ¹ and R ² is more preferably a substituted or unsubstituted alkyl group having 6 to 18 carbon atoms. Preferred examples of the unsubstituted alkyl group having 6 to 18 carbon atoms include n-hexyl group, cyclohexyl group, n-heptyl group, n-octyl group, 2-ethylhexyl group, n-nonyl group, 1,1,3 -Trimethylhexyl group, n-decyl group, n-dodecyl group, cetyl group, hexadecyl group, 2-hexyldecyl group, octadecyl group, 4-tert-butylcyclohexyl group and the like can be mentioned. Preferable examples of the substituted alkyl group having 6 to 18 carbon atoms having a substituent include phenethyl group, 6-phenoxyhexyl group, 12-phenyldodecyl group, oleyl group, linoleyl group, and linolenyl group. .

The alkyl group other than Rf represented by R ¹ and R ² is particularly preferably an n-hexyl group, a cyclohexyl group, an n-heptyl group, an n-octyl group, a 2-ethylhexyl group, an n-nonyl group, 1,1,3-trimethylhexyl group, n-decyl group, n-dodecyl group, cetyl group, hexadecyl group, 2-hexyldecyl group, octadecyl group, oleyl group, linoleyl group, linolenyl group, most preferably carbon It is a linear, cyclic or branched unsubstituted alkyl group of formula 8-16.

In the general formula (1), R ³ , R ⁴ and R ⁵ each independently represent a hydrogen atom or a substituent. Examples of the substituent include an alkyl group (preferably an alkyl group having 1 to 20 carbon atoms, more preferably 1 to 12 carbon atoms, and particularly preferably 1 to 8 carbon atoms, such as a methyl group, an ethyl group, and isopropyl. Group, tert-butyl group, n-octyl group, n-decyl group, n-hexadecyl group, cyclopropyl group, cyclopentyl group, cyclohexyl group and the like, alkenyl group (preferably having 2 to 20 carbon atoms, more preferably). Is an alkenyl group having 2 to 12 carbon atoms, particularly preferably 2 to 8 carbon atoms, and examples thereof include a vinyl group, an allyl group, a 2-butenyl group, and a 3-pentenyl group, and an alkynyl group (preferably a carbon atom). An alkynyl group having 2 to 20 carbon atoms, more preferably 2 to 12 carbon atoms, particularly preferably 2 to 8 carbon atoms, such as a propargyl group, 3 A pentynyl group), an aryl group (preferably an aryl group having 6 to 30 carbon atoms, more preferably 6 to 20 carbon atoms, and particularly preferably 6 to 12 carbon atoms, such as a phenyl group and p-methyl group). A phenyl group, a naphthyl group, etc.), a substituted or unsubstituted amino group (preferably a carbon number of 0-20, more preferably a carbon number of 0-10, particularly preferably a carbon number of 0-6, For example, an unsubstituted amino group, a methylamino group, a dimethylamino group, a diethylamino group, a dibenzylamino group, etc.)

An alkoxy group (preferably an alkoxy group having 1 to 20 carbon atoms, more preferably 1 to 12 carbon atoms, particularly preferably 1 to 8 carbon atoms, and examples thereof include a methoxy group, an ethoxy group, and a butoxy group). An aryloxy group (preferably an aryloxy group having 6 to 20 carbon atoms, more preferably 6 to 16 carbon atoms, particularly preferably 6 to 12 carbon atoms, and examples thereof include a phenyloxy group and a 2-naphthyloxy group. An acyl group (preferably having a carbon number of 1-20, more preferably a carbon number of 1-16, particularly preferably a carbon number of 1-12, such as an acetyl group, a benzoyl group, a formyl group, a pivaloyl group, etc. An alkoxycarbonyl group (preferably having 2 to 20 carbon atoms, more preferably 2 to 16 carbon atoms, and particularly preferably 2 to 2 carbon atoms). 2 alkoxycarbonyl groups, for example, methoxycarbonyl group, ethoxycarbonyl group and the like, and aryloxycarbonyl groups (preferably having 7 to 20 carbon atoms, more preferably 7 to 16 carbon atoms, and particularly preferably carbon numbers). An aryloxycarbonyl group having 7 to 10 carbon atoms, such as a phenyloxycarbonyl group, an acyloxy group (preferably having 2 to 20 carbon atoms, more preferably 2 to 16 carbon atoms, and particularly preferably 2 to 2 carbon atoms). 10 acyloxy groups such as an acetoxy group and a benzoyloxy group)

An acylamino group (preferably an acylamino group having 2 to 20 carbon atoms, more preferably 2 to 16 carbon atoms, particularly preferably 2 to 10 carbon atoms, such as an acetylamino group and a benzoylamino group), alkoxycarbonyl An amino group (preferably an alkoxycarbonylamino group having 2 to 20 carbon atoms, more preferably 2 to 16 carbon atoms, particularly preferably 2 to 12 carbon atoms, such as a methoxycarbonylamino group), aryloxy Carbonylamino group (preferably an aryloxycarbonylamino group having 7 to 20 carbon atoms, more preferably 7 to 16 carbon atoms, particularly preferably 7 to 12 carbon atoms, such as a phenyloxycarbonylamino group) Sulfonylamino group (preferably having 1 to 20 carbon atoms, more preferred Or a sulfonylamino group having 1 to 16 carbon atoms, particularly preferably 1 to 12 carbon atoms, and examples thereof include a methanesulfonylamino group and a benzenesulfonylamino group, and a sulfamoyl group (preferably having a carbon number of 0 to 20). More preferably, it is a sulfamoyl group having 0 to 16 carbon atoms, particularly preferably 0 to 12 carbon atoms, and examples thereof include a sulfamoyl group, a methylsulfamoyl group, a dimethylsulfamoyl group, and a phenylsulfamoyl group. ), A carbamoyl group (preferably a carbamoyl group having 1 to 20 carbon atoms, more preferably 1 to 16 carbon atoms, and particularly preferably 1 to 12 carbon atoms. For example, an unsubstituted carbamoyl group, a methylcarbamoyl group, diethylcarbamoyl group Group, phenylcarbamoyl group, etc.),

An alkylthio group (preferably an alkylthio group having 1 to 20 carbon atoms, more preferably an alkylthio group having 1 to 16 carbon atoms, particularly preferably 1 to 12 carbon atoms, such as a methylthio group and an ethylthio group), an arylthio group ( Preferably it is C6-C20, More preferably, it is C6-C16, Most preferably, it is C6-C12 arylthio group, for example, a phenylthio group etc. are mentioned, A sulfonyl group (preferably C1-C1). 20, more preferably a sulfonyl group having 1 to 16 carbon atoms, particularly preferably a sulfonyl group having 1 to 12 carbon atoms, such as a mesyl group and a tosyl group, and a sulfinyl group (preferably having a carbon number of 1 to 20, more A sulfinyl group having 1 to 16 carbon atoms, particularly preferably 1 to 12 carbon atoms is preferable. Zensulfinyl groups, etc.), ureido groups (preferably C1-C20, more preferably C1-C16, particularly preferably C1-C12 ureido groups, such as unsubstituted ureido groups, Methylureido group, phenylureido group, etc.), phosphoric acid amide group (preferably having 1 to 20 carbon atoms, more preferably having 1 to 16 carbon atoms, and particularly preferably having 1 to 12 carbon atoms). , For example, diethylphosphoric acid amide group, phenylphosphoric acid amide group, etc.), hydroxy group, mercapto group, halogen atom (for example, fluorine atom, chlorine atom, bromine atom, iodine atom), cyano group, sulfo group, carboxyl Group, nitro group, hydroxamic acid group, sulfino group, hydrazino group, imino group, heterocyclic group (preferably having 1 to 3 carbon atoms) More preferably, it is a 1-12 heterocyclic group, for example, a heterocyclic group having a heteroatom such as a nitrogen atom, an oxygen atom, a sulfur atom, such as an imidazolyl group, a pyridyl group, a quinolyl group, a furyl group, Piperidyl group, morpholino group, benzoxazolyl group, benzimidazolyl group, benzthiazolyl group and the like), silyl group (preferably having 3 to 40 carbon atoms, more preferably 3 to 30 carbon atoms, particularly preferably carbon A silyl group of 3 to 24, and examples thereof include a trimethylsilyl group and a triphenylsilyl group). These substituents may be further substituted. Moreover, when there are two or more substituents, they may be the same or different. If possible, they may be bonded to each other to form a ring.

R ³ , R ⁴ and R ⁵ are preferably an alkyl group or a hydrogen atom, more preferably a hydrogen atom.

In the formula, X ¹ and X ² each represent a divalent linking group or a single bond. The divalent linking group is not particularly limited, but is preferably an arylene group, —O—, —S— or NR ³¹ — (R ³¹ represents a hydrogen atom or a substituent, and the substituents include R ³ , R ⁴ and R ⁵ are the same as the examples of the substituents represented by each, and —R ³¹ is preferably an alkyl group, the aforementioned Rf or a hydrogen atom, and more preferably a hydrogen atom) alone or in combination. It is a group to be obtained, and more preferably —O—, —S— or NR ³¹ . X ¹ and X ² are more preferably —O— or NR ³¹ —, still more preferably —O— or NH—, and particularly preferably —O—.

In the above formula, Z represents a divalent linking group or a single bond. The divalent linking group is not particularly limited, but is preferably an alkylene group, an arylene group, -C (= O)-, -O-, -S-, -S (= O)-, -S (= O) ₂ — or NR ³² — (R ³² represents a hydrogen atom or a substituent, and the substituent is the same as the examples of the substituent represented by R ³ , R ⁴ and R ⁵ , and R ³² is preferably an alkyl group. Or a hydrogen atom, more preferably a hydrogen atom) alone or in combination thereof, more preferably an alkylene group having 1 to 12 carbon atoms, an arylene group having 6 to 12 carbon atoms, -C (═O) —, —O—, —S—, —S (═O) —, —S (═O) ₂ — or —NR ³² — alone or in combination thereof. More preferably, Z is an alkylene group having 1 to 8 carbon atoms, —C (═O) —, —O—, —S—, —S (═O) —, —S (═O) ₂ — or NR ^32. -Is a group obtained alone or in combination thereof, for example,

等が挙げられる。

Etc.

In the above formula, M ⁺ represents a cationic substituent, and M ⁺ is preferably an organic cationic substituent, more preferably an organic cationic group containing a nitrogen or phosphorus atom. More preferred is a pyridinium cation or an ammonium cation, and more preferred is a trialkylammonium cation represented by the following general formula (2).

In the above formula, R ¹³ , R ¹⁴ and R ¹⁵ each independently represents a substituted or unsubstituted alkyl group. As the substituent, those mentioned as the substituents for R ³ , R ⁴ and R ⁵ can be applied. R ¹³ , R ^14, and R ¹⁵ may be combined with each other to form a ring, if possible. R ¹³ , R ¹⁴ and R ¹⁵ are preferably an alkyl group having 1 to 12 carbon atoms, more preferably an alkyl group having 1 to 6 carbon atoms, and still more preferably a methyl group, an ethyl group or a methyl carboxyl group. And particularly preferably a methyl group.

In the above formula, Y ⁻ represents a counter anion and may be an inorganic anion or an organic anion. Further, when the charge becomes 0 in the molecule, Y ⁻ may not be present. Preferred examples of the inorganic anion include iodo ion, bromine ion, and chlorine ion. Preferred examples of the organic anion include p-toluenesulfonate ion, benzenesulfonate ion, methanesulfonate ion, and trifluoromethanesulfonate ion. It is done. Y ^- is more preferably iodo ion, p-toluenesulfonic acid ion or benzenesulfonic acid ion, and still more preferably p-toluenesulfonic acid.

  In the above formula, m represents 0 or 1, preferably 0.

  Among the compounds represented by the general formula (1), compounds represented by the following general formula (1-a) are preferable.

In the formula, each of R ¹¹ and R ²¹ represents a substituted or unsubstituted alkyl group, but at least one of R ¹ and R ² represents the aforementioned Rf, and the total number of carbon atoms of R ¹¹ and R ²¹ is 19 or less. It is. R ¹³ , R ¹⁴ and R ¹⁵ each independently represents a substituted or unsubstituted alkyl group, and may be bonded to each other to form a ring. X ¹¹ and X ²¹ each independently represent —O—, —S— or NR ³¹ —, R ³¹ represents a hydrogen atom or a substituent, and Z represents a divalent linking group or a single bond. Y ⁻ represents a counter anion, but Y ⁻ may not be present when the charge is 0 in the molecule.
m is 0 or 1. In the formula, Z and Y ⁻ have the same meanings as those in the general formula (1), and the preferred ranges are also the same. About R <^13> , R <^14> , R <^15> and m, it is synonymous with those in the said General formula (1), respectively, A preferable range is also the same.

In the formula, X ¹¹ and X ¹² are each —O—, —S—, or NR ³¹ — (R ³¹ represents a hydrogen atom or a substituent, and the substituent is the substituent of R ³ , R ^{4, or} R ⁵ described above. R ³¹ is preferably an alkyl group, the aforementioned Rf, or a hydrogen atom, and more preferably a hydrogen atom. X ¹¹ and X ²¹ are more preferably —O— or —NH—, and still more preferably —O—.

In the above formula, R ¹¹ and R ²¹ have the same meanings as R ¹ and R ² in the general formula (1), respectively, and preferred ranges thereof are also the same. However, the total number of carbon atoms of R ¹¹ and R ²¹ is 19 or less. m is 0 or 1.

  Although the specific example of a compound represented by the said General formula (1) is given, this invention is not restrict | limited at all by the following specific examples. In addition, unless otherwise indicated in the structure description of the following exemplary compounds, an alkyl group and a perfluroalkyl group mean a linear structure. Of the abbreviations in the notation, 2EH means 2-ethylhexyl.

  Next, although an example of the general synthesis | combining method of the compound represented by the said general formula (1) in this invention and (1-a) is shown, this invention is not limited to these.

  These compounds can be synthesized using fumaric acid derivatives, maleic acid derivatives, itaconic acid derivatives, glutamic acid derivatives, aspartic acid derivatives and the like as raw materials. For example, when a fumaric acid derivative, a maleic acid derivative, or an itaconic acid derivative is used as a raw material, the double bond can be synthesized by performing a Michael addition reaction with a nucleophilic species and then cationizing with an alkylating agent. .

The fluorine compound in the present invention can also have an anionic hydrophilic group.
An anionic hydrophilic group means an acidic group having a pKa of 7 or less and an alkali metal salt or ammonium salt thereof. Specific examples include a sulfo group, a carboxyl group, a phosphonic acid group, a carbamoylsulfamoyl group, a sulfamoylsulfamoyl group, an acylsulfamoyl group, and salts thereof. Of these, a sulfo group, a carboxyl group, a phosphonic acid group and salts thereof are preferred, and a sulfo group and salts thereof are more preferred. Examples of the cation species that form salts include lithium, sodium, potassium, cesium, ammonium, tetramethylammonium, tetrabutylammonium, and methylpyridinium, and lithium, sodium, potassium, and ammonium are preferable.

In the present invention, preferred fluorine compounds having an anionic hydrophilic group are:
It is represented by the following general formula (3).
General formula (3)

In the formula, R ¹ and R ² each independently represent an alkyl group, but at least one of them represents Rf. When R ¹ and R ² represent an alkyl group that is not a fluorinated alkyl group, the alkyl group preferably has 2 to 18 carbon atoms, and more preferably has 4 to 12 carbon atoms. R ³ and R ⁴ each independently represents a hydrogen atom or a substituted or unsubstituted alkyl group.
Specific examples of the fluorinated alkyl group represented by R ¹ and R ² include the aforementioned groups, and the preferred structure is also the structure represented by the aforementioned general formula (A). Moreover, the preferable structure in it is the same as that of the description of the above-mentioned fluorinated alkyl group. All of the alkyl groups represented by R ¹ and R ² are preferably the aforementioned fluorinated alkyl groups.
The substituted or unsubstituted alkyl group represented by R ³ and R ⁴ may be linear, branched, or have a cyclic structure. The substituent may be any substituent, but an alkenyl group, aryl group, alkoxy group, halogen atom (preferably Cl), carboxylic acid ester group, carbonamido group, carbamoyl group, oxycarbonyl group, phosphoric acid ester group, etc. Is preferred.
A represents -L _b -SO ₃ M, M represents a cation. Here, preferable examples of the cation represented by M include alkali metal ions (lithium ions, sodium ions, potassium ions, etc.), alkaline earth metal ions (barium ions, calcium ions, etc.), ammonium ions, and the like. . Of these, more preferably lithium ion, sodium ion, potassium ion or ammonium ion, still more preferably lithium ion, sodium ion or potassium ion, the total number of carbon atoms and substituents of the compound of the general formula (3), It can be appropriately selected depending on the degree of branching of the alkyl group. When the total number of carbon atoms of R ¹ , R ² , R ³ and R ⁴ is 16 or more, if M is a lithium ion, the viewpoint of compatibility between solubility (especially with respect to water) and antistatic ability or coating uniformity Is excellent.
L _b represents a single bond or a substituted or unsubstituted alkylene group. As the substituent, those exemplified for R ³ are preferable. When L _b is an alkylene group, the number of carbon atoms is preferably 2 or less. L _b is preferably a single bond or a CH ₂ — group, and most preferably a —CH ₂ — group.
The general formula (3) is more preferably a combination of the above preferred embodiments.

Specific examples of the fluorine compound used in the present invention are illustrated below, but the present invention is not limited by the following specific examples.
Unless otherwise specified, the alkyl group and the perfluoroalkyl group in the structure notation of the following exemplified compounds mean a straight chain structure.

The fluorine compound in the present invention can also have a nonionic hydrophilic group.
The nonionic hydrophilic group means a group that dissolves in water without dissociating into ions.
Specific examples include poly (oxyethylene) alkyl ethers and polyhydric alcohols, but are not limited thereto.

In the present invention, a preferred nonionic fluorine compound is represented by the following general formula (4).
General formula (4)

  In the general formula (4), Rf is the above-mentioned fluorinated alkyl group, specific examples of Rf include the above-mentioned groups, and a preferred structure is also a structure represented by the above-mentioned general formula (A). In addition, preferred structures in the same are the same as those described for Rf.

等があげられる。 X in the general formula (4) represents a divalent linking group and is not particularly limited.

Etc.

  In General formula (4), n represents the integer of 2 or 3, and m represents the integer of 1-30. R is a group having at least one hydrogen atom, alkyl group, aryl group, heterocyclic group, Rf or Rf as a substituent.

  Specific examples of the nonionic fluorine compound used in the present invention are illustrated below, but the present invention is not limited to the following specific examples.

  The fluorine compound used in the present invention is preferably used as a surfactant in a coating composition for forming any layer on the side provided with an image forming layer. Among these, it is particularly preferable to use it for forming the outermost layer of the photographic light-sensitive material because effective antistatic ability and coating uniformity can be obtained. The fluorine compound in the present invention is useful in that it exhibits antistatic ability and uniformity in coating, but is also effective for improving storage stability and use environment dependency.

There is no restriction | limiting in particular about the usage-amount of the fluorine compound in this invention, The usage-amount is arbitrarily determined according to the structure of the fluorine compound to be used, a place to use, and the kind and amount of other materials contained in the composition. be able to. For example, when used as a coating solution for the outermost layer of the photothermographic material, the coating amount of the fluorine compound in the coating composition is preferably 0.1 to 100 mg / m ² , and preferably 0.5 to ²⁰ mg / m ^{2. 2} is more preferable.

  In the present invention, one fluorine compound may be used alone, or two or more fluorine compounds may be mixed and used. Further, a fluorine compound other than the fluorine compound in the present invention may be mixed and used. In addition, a surfactant other than the fluorine compound may be used in combination with the fluorine compound in the present invention.

(Description of organic silver salt)
1) Composition The organic silver salt that can be used in the present invention is relatively stable to light, but is heated to 80 ° C. or higher in the presence of exposed photosensitive silver halide and a reducing agent. In this case, the silver salt functions as a silver ion supplier to form a silver image. The organic silver salt may be any organic substance that can supply silver ions that can be reduced by a reducing agent. As for such non-photosensitive organic silver salt, paragraph numbers 0048 to 0049 of JP-A-10-62899, page 18 line 24 to page 19 line 37 of European Patent Publication No. 0803764A1, European Patent Publication. No. 0968212A1, JP-A-11-349591, JP-A-2000-7683, JP-A-2000-72711, and the like. Silver salts of organic acids, particularly silver salts of long-chain aliphatic carboxylic acids (having 10 to 30, preferably 15 to 28 carbon atoms) are preferred. Preferred examples of the fatty acid silver salt include silver lignocerate, silver behenate, silver arachidate, silver stearate, silver oleate, silver laurate, silver caproate, silver myristate, silver palmitate, silver erucate and the like. Including a mixture of In the present invention, among these fatty acid silvers, the silver behenate content is preferably 50 mol% to 100 mol%, more preferably 85 mol% to 100 mol%, still more preferably 95 mol% to 100 mol%. The following fatty acid silver is preferably used. Furthermore, it is preferable to use fatty acid silver having a silver erucate content of 2 mol% or less, more preferably 1 mol% or less, and still more preferably 0.1 mol% or less.

2) Shape The shape of the organic silver salt that can be used in the present invention is not particularly limited, and may be any of a needle shape, a rod shape, a flat plate shape, and a flake shape.

  The particle size distribution of the organic silver salt is preferably monodispersed. Monodispersion is preferably 100% or less, more preferably 80% or less, and even more preferably 50% of the value obtained by dividing the standard deviation of the lengths of the short and long axes by the short and long axes. It is as follows. The method for measuring the shape of the organic silver salt can be determined from a transmission electron microscope image of the organic silver salt dispersion. As another method for measuring monodispersity, there is a method for obtaining the standard deviation of the volume weighted average diameter of the organic silver salt, and the percentage (variation coefficient) of the value divided by the volume weighted average diameter is preferably 100% or less, more Preferably it is 80% or less, More preferably, it is 50% or less. As a measuring method, for example, it is obtained from the particle size (volume weighted average diameter) obtained by irradiating an organic silver salt dispersed in a liquid with laser light and obtaining an autocorrelation function with respect to the temporal change of the fluctuation of the scattered light. Can do.

3) Preparation Known methods and the like can be applied to the production and dispersion method of organic acid silver used in the present invention. For example, the above-mentioned JP-A-10-62899, European Patent Publication No. 0803763A1, European Patent Publication No. 0968212A1, JP-A-11-349591, JP-A-2000-7683, JP-A-2000-72711, JP-A-2001-163889, 2001-163890, 2001-163825, 2001-33907, 2001-188313, 2001-83651, 2002-6442, 2002-49117, 2002-31870, 2002-107868 You can refer to the issue.

  In addition, when the photosensitive silver salt is allowed to coexist at the time of dispersion of the organic silver salt, the fog is increased and the sensitivity is remarkably reduced. Therefore, it is more preferable that the photosensitive silver salt is not substantially contained at the time of dispersion. In the present invention, the amount of the photosensitive silver salt in the aqueous dispersion to be dispersed is preferably 1 mol% or less, more preferably 0.1 mol% relative to 1 mol of the organic acid silver salt in the liquid. The following is more preferable, and positive addition of photosensitive silver salt is not performed.

  In the present invention, it is possible to produce a photosensitive material by mixing an organic silver salt aqueous dispersion and a photosensitive silver salt aqueous dispersion, but the mixing ratio of the organic silver salt and the photosensitive silver salt can be selected according to the purpose, The ratio of the photosensitive silver salt to the organic silver salt is preferably in the range of 1 mol% to 30 mol%, more preferably in the range of 2 mol% to 20 mol%, particularly 3 mol% to 15 mol%. Mixing two or more organic silver salt water dispersions and two or more photosensitive silver salt water dispersions when mixing is a method preferably used for adjusting photographic properties.

4) Addition Amount organic silver salt in the invention can be used in a desired amount, preferably 0.1g / m ² ~5.0g / m ² as the total amount of coated silver halide silver was also included, and more preferably 0 ^{.3g / m 2 ~3.0g / m 2} , more preferably from ^{0.5g / m 2 ~2.0g / m 2} . In particular, in order to improve image storability, the total coated silver amount is preferably 1.8 g / m ² or less, more preferably 1.6 g / m ² or less. If the preferred reducing agent of the present invention is used, it is possible to obtain a sufficient image density even with such a low silver amount.

(Description of reducing agent)
The photothermographic material of the present invention preferably contains a heat developer which is a reducing agent for the organic silver salt. The reducing agent for the organic silver salt may be any substance (preferably an organic substance) that reduces silver ions to metallic silver. Examples of such reducing agents are described in JP-A No. 11-65021, paragraphs 0043 to 0045, and European Patent Publication No. 0803764A1, page 7, line 34 to page 18, line 12.
In the present invention, the reducing agent is preferably a so-called hindered phenol-based reducing agent or bisphenol-based reducing agent having a substituent at the ortho position of the phenolic hydroxyl group, and more preferably a compound represented by the following general formula (R).
General formula (R)

(In the general formula (R), R ¹¹ and R ¹¹ ′ each independently represents an alkyl group having 1 to 20 carbon atoms. R ¹² and R ¹² ′ are each independently a substituent which can be substituted on a hydrogen atom or a benzene ring. the representative .L -S- group or a -CHR ¹³ - group .R ¹³ is a hydrogen atom or a benzene ring .X ¹ and X ¹ 'each independently represents a hydrogen atom or an alkyl group having 1 to 20 carbon atoms Represents a substitutable group.)

The general formula (R) will be described in detail.
1) R ¹¹ and R ¹¹ '
R ¹¹ and R ¹¹ ′ are each independently a substituted or unsubstituted alkyl group having 1 to 20 carbon atoms, and the substituent of the alkyl group is not particularly limited, but is preferably an aryl group, a hydroxy group, Examples thereof include an alkoxy group, an aryloxy group, an alkylthio group, an arylthio group, an acylamino group, a sulfonamide group, a sulfonyl group, a phosphoryl group, an acyl group, a carbamoyl group, an ester group, a ureido group, a urethane group, and a halogen atom.

2) R ¹² and R ¹² ', X ¹ and X ¹ '
R ¹² and R ¹² ′ each independently represent a hydrogen atom or a substituent capable of substituting for a benzene ring, and X ¹ and X ¹ ′ each independently represent a hydrogen atom or a group capable of substituting for a benzene ring. Preferred examples of each group that can be substituted on the benzene ring include an alkyl group, an aryl group, a halogen atom, an alkoxy group, and an acylamino group.

3) L
L represents an —S— group or a —CHR ¹³ — group. R ¹³ represents a hydrogen atom or an alkyl group having 1 to 20 carbon atoms, and the alkyl group may have a substituent. Specific examples of the unsubstituted alkyl group represented by R ¹³ include a methyl group, an ethyl group, a propyl group, a butyl group, a heptyl group, an undecyl group, an isopropyl group, a 1-ethylpentyl group, and a 2,4,4-trimethylpentyl group. can give. Examples of the substituent of the alkyl group are the same as the substituent of R ¹¹ , and are a halogen atom, alkoxy group, alkylthio group, aryloxy group, arylthio group, acylamino group, sulfonamido group, sulfonyl group, phosphoryl group, oxycarbonyl group, Examples thereof include a carbamoyl group and a sulfamoyl group.

4) Preferred substituents R ¹¹ and R ¹¹ ′ are preferably secondary or tertiary alkyl groups having 3 to 15 carbon atoms, specifically isopropyl, isobutyl, t-butyl, t-amyl groups. , T-octyl group, cyclohexyl group, cyclopentyl group, 1-methylcyclohexyl group, 1-methylcyclopropyl group and the like. R ¹¹ and R ¹¹ ′ are more preferably a tertiary alkyl group having 4 to 12 carbon atoms, and among them, a t-butyl group, a t-amyl group, and a 1-methylcyclohexyl group are more preferable, and a t-butyl group is most preferable. .

R ¹² and R ¹² ′ are preferably an alkyl group having 1 to 20 carbon atoms, specifically, a methyl group, an ethyl group, a propyl group, a butyl group, an isopropyl group, a t-butyl group, a t-amyl group, a cyclohexyl group. Group, 1-methylcyclohexyl group, benzyl group, methoxymethyl group, methoxyethyl group and the like. More preferred are methyl group, ethyl group, propyl group, isopropyl group and t-butyl group.
X ¹ and X ¹ ′ are preferably a hydrogen atom, a halogen atom, or an alkyl group, and more preferably a hydrogen atom.

L is preferably a —CHR ¹³ — group.
R ¹³ is preferably a hydrogen atom or an alkyl group having 1 to 15 carbon atoms, and the alkyl group is preferably a methyl group, an ethyl group, a propyl group, an isopropyl group, or a 2,4,4-trimethylpentyl group. R ¹³ is particularly preferably a hydrogen atom, a methyl group, an ethyl group, a propyl group or an isopropyl group.

When R ¹³ is a hydrogen atom, R ¹² and R ¹² ′ are preferably an alkyl group having 2 to 5 carbon atoms, more preferably an ethyl group or a propyl group, and most preferably an ethyl group.
When R ¹³ is a primary or secondary alkyl group having 1 to 8 carbon atoms, R ¹² and R ¹² ′ are preferably methyl groups. As the primary or secondary alkyl group having 1 to 8 carbon atoms for R ^13, a methyl group, an ethyl group, a propyl group, or an isopropyl group is more preferable, and a methyl group, an ethyl group, or a propyl group is still more preferable.
When all of R ¹¹ , R ¹¹ ′, R ¹² and R ¹² ′ are methyl groups, R ¹³ is preferably a secondary alkyl group. In this case, the secondary alkyl group of R ¹³ is preferably an isopropyl group, an isobutyl group, or a 1-ethylpentyl group, and more preferably an isopropyl group.
The reducing agent has different heat developability, developed silver color tone, and the like depending on the combination of R ¹¹ , R ¹¹ ′, R ¹² , R ¹² ′ and R ¹³ . Since these can be adjusted by combining two or more kinds of reducing agents, it is preferable to use two or more kinds in combination depending on the purpose.

  Although the specific example of the reducing agent of this invention including the compound represented by general formula (R) of this invention below is shown, this invention is not limited to these.

Examples of preferable reducing agents of the present invention other than the above are compounds described in JP-A Nos. 2001-188314, 2001-209145, 2001-350235, and 2002-156727.
The addition amount of the reducing agent is preferably a ^{0.1g / m 2 ~3.0g / m 2} , more preferably ^{0.2g / m 2 ~1.5g / m 2} , more preferably 0 .3 g / m ^{2 to} 1.0 g / m ² . It is preferably contained in an amount of 5 mol% to 50 mol%, more preferably 8 mol% to 30 mol%, and more preferably 10 mol% to 20 mol%, based on 1 mol of silver on the surface having the image forming layer. More preferably. The reducing agent is preferably contained in the image forming layer.

The reducing agent may be contained in the coating solution by any method such as a solution form, an emulsified dispersion form, or a solid fine particle dispersion form, and may be contained in the photosensitive material.
Well-known emulsification dispersion methods include dissolving oil using an oil such as dibutyl phthalate, tricresyl phosphate, glyceryl triacetate or diethyl phthalate, or an auxiliary solvent such as ethyl acetate or cyclohexanone, and mechanically emulsifying the dispersion. The method of producing is mentioned.

In addition, as a solid fine particle dispersion method, a reducing agent powder is dispersed in an appropriate solvent such as water by a ball mill, a colloid mill, a vibration ball mill, a sand mill, a jet mill, a roller mill, or an ultrasonic wave to create a solid dispersion. A method is mentioned. In this case, a protective colloid (for example, polyvinyl alcohol) or a surfactant (for example, an anionic surfactant such as sodium triisopropylnaphthalenesulfonate (a mixture of three isopropyl groups having different substitution positions)) may be used. Good. In the mills, beads such as zirconia are usually used as a dispersion medium, and Zr and the like eluted from these beads may be mixed in the dispersion. Although it depends on the dispersion conditions, it is usually in the range of 1 ppm to 1000 ppm. If the Zr content in the light-sensitive material is 0.5 mg or less per 1 g of silver, there is no practical problem.
The aqueous dispersion preferably contains a preservative (for example, benzoisothiazolinone sodium salt).
Particularly preferred is a solid particle dispersion method of a reducing agent, and it is preferable to add fine particles having an average particle size of 0.01 μm to 10 μm, preferably 0.05 μm to 5 μm, more preferably 0.1 μm to 2 μm. In the present application, it is preferable to use other solid dispersions dispersed in a particle size within this range.

(Description of development accelerator)
In the photothermographic material of the present invention, a sulfonamide phenol compound represented by the general formula (A) described in JP-A-2000-267222, JP-A-2000-330234, or the like as a development accelerator, Hindered phenol compounds represented by general formula (II) described in JP-A-2001-92075, general formula (I) described in JP-A-10-62895, JP-A-11-15116, and the like, A hydrazine-based compound represented by the general formula (D) of JP-A No. 2002-156727 or the general formula (1) described in Japanese Patent Application No. 2001-074278, and described in the specification of JP-A No. 2001-264929 A phenolic or naphtholic compound represented by the general formula (2) is preferably used. These development accelerators are used in the range of 0.1 to 20 mol% with respect to the reducing agent, preferably in the range of 0.5 to 10 mol%, more preferably in the range of 1 to 5 mol%. The introduction method to the light-sensitive material includes the same method as the reducing agent, but it is particularly preferable to add as a solid dispersion or an emulsion dispersion. When added as an emulsified dispersion, it is added as an emulsified dispersion dispersed using a high-boiling solvent and a low-boiling auxiliary solvent that are solid at room temperature, or as a so-called oilless emulsified dispersion that does not use a high-boiling solvent. It is preferable to add.
In the present invention, among the development accelerators described above, hydrazine compounds represented by the general formula (D) described in JP-A No. 2002-156727 and those described in JP-A No. 2001-264929 A phenol-based or naphthol-based compound represented by the formula (2) is more preferable.

Particularly preferred development accelerators of the present invention are compounds represented by the following general formulas (A-1) and (A-2).
Formula (A-1)
Q1-NHNH-Q2
(In the formula, Q1 represents an aromatic group or a heterocyclic group bonded to —NHNH-Q2 at a carbon atom, and Q2 represents a carbamoyl group, an acyl group, an alkoxycarbonyl group, an aryloxycarbonyl group, a sulfonyl group, or a sulfamoyl group. Represents.)

  In the general formula (A-1), the aromatic group or heterocyclic group represented by Q1 is preferably a 5- to 7-membered unsaturated ring. Preferred examples include benzene ring, pyridine ring, pyrazine ring, pyrimidine ring, pyridazine ring, 1,2,4-triazine ring, 1,3,5-triazine ring, pyrrole ring, imidazole ring, pyrazole ring, 1,2 , 3-triazole ring, 1,2,4-triazole ring, tetrazole ring, 1,3,4-thiadiazole ring, 1,2,4-thiadiazole ring, 1,2,5-thiadiazole ring, 1,3,4 -Oxadiazole ring, 1,2,4-oxadiazole ring, 1,2,5-oxadiazole ring, thiazole ring, oxazole ring, isothiazole ring, isoxazole ring, thiophene ring, etc. are preferable, and these Also preferred are fused rings in which the rings are fused together.

  These rings may have a substituent, and when they have two or more substituents, these substituents may be the same or different. Examples of substituents include halogen atoms, alkyl groups, aryl groups, carbonamido groups, alkylsulfonamido groups, arylsulfonamido groups, alkoxy groups, aryloxy groups, alkylthio groups, arylthio groups, carbamoyl groups, sulfamoyl groups, cyano Groups, alkylsulfonyl groups, arylsulfonyl groups, alkoxycarbonyl groups, aryloxycarbonyl groups, and acyl groups. When these substituents are substitutable groups, they may further have substituents. Examples of preferred substituents include halogen atoms, alkyl groups, aryl groups, carbonamido groups, alkylsulfonamido groups, aryls. A sulfonamide group, alkoxy group, aryloxy group, alkylthio group, arylthio group, acyl group, alkoxycarbonyl group, aryloxycarbonyl group, carbamoyl group, cyano group, sulfamoyl group, alkylsulfonyl group, arylsulfonyl group, and acyloxy group; Can be mentioned.

  The carbamoyl group represented by Q2 is preferably a carbamoyl group having 1 to 50 carbon atoms, more preferably 6 to 40 carbon atoms, such as unsubstituted carbamoyl, methylcarbamoyl, N-ethylcarbamoyl, N-propylcarbamoyl, N-sec-butylcarbamoyl, N-octylcarbamoyl, N-cyclohexylcarbamoyl, N-tert-butylcarbamoyl, N-dodecylcarbamoyl, N- (3-dodecyloxypropyl) carbamoyl, N-octadecylcarbamoyl, N- {3- (2,4-tert-pentylphenoxy) propyl} carbamoyl, N- (2-hexyldecyl) carbamoyl, N-phenylcarbamoyl, N- (4-dodecyloxyphenyl) carbamoyl, N- (2-chloro-5-dodecyl) Oxycarbo Butylphenyl) carbamoyl, N- naphthylcarbamoyl, N-3- pyridylcarbamoyl include N- benzylcarbamoyl.

  The acyl group represented by Q2 is preferably an acyl group having 1 to 50 carbon atoms, more preferably 6 to 40 carbon atoms. For example, formyl, acetyl, 2-methylpropanoyl, cyclohexylcarbonyl, octanoyl, 2- Examples include hexyldecanoyl, dodecanoyl, chloroacetyl, trifluoroacetyl, benzoyl, 4-dodecyloxybenzoyl, and 2-hydroxymethylbenzoyl. The alkoxycarbonyl group represented by Q2 is preferably an alkoxycarbonyl group having 2 to 50 carbon atoms, more preferably 6 to 40 carbon atoms, such as methoxycarbonyl, ethoxycarbonyl, isobutyloxycarbonyl, cyclohexyloxycarbonyl, dodecyl. Examples include oxycarbonyl and benzyloxycarbonyl.

  The aryloxycarbonyl group represented by Q2 is preferably an aryloxycarbonyl group having 7 to 50 carbon atoms, more preferably 7 to 40 carbon atoms, such as phenoxycarbonyl, 4-octyloxyphenoxycarbonyl, 2-hydroxymethyl. Phenoxycarbonyl and 4-dodecyloxyphenoxycarbonyl are mentioned. The sulfonyl group represented by Q2 is preferably a sulfonyl group having 1 to 50 carbon atoms, more preferably 6 to 40 carbon atoms, such as methylsulfonyl, butylsulfonyl, octylsulfonyl, 2-hexadecylsulfonyl, 3-dodecyl. Examples include oxypropylsulfonyl, 2-octyloxy-5-tert-octylphenylsulfonyl, and 4-dodecyloxyphenylsulfonyl.

  The sulfamoyl group represented by Q2 is preferably a sulfamoyl group having 0 to 50 carbon atoms, more preferably 6 to 40 carbon atoms, such as an unsubstituted sulfamoyl group, an N-ethylsulfamoyl group, N- (2-ethylhexyl). ) Sulfamoyl, N-decylsulfamoyl, N-hexadecylsulfamoyl, N- {3- (2-ethylhexyloxy) propyl} sulfamoyl, N- (2-chloro-5-dodecyloxycarbonylphenyl) sulfamoyl, N -(2-tetradecyloxyphenyl) sulfamoyl is mentioned. The group represented by Q2 may further have the groups mentioned as examples of the substituent of the 5- to 7-membered unsaturated ring represented by Q1 at the substitutable position. In the case of having a substituent, these substituents may be the same or different.

  Next, preferred range for the compound represented by formula (A-1) is to be described. Q1 is preferably a 5- to 6-membered unsaturated ring, such as a benzene ring, a pyrimidine ring, a 1,2,3-triazole ring, a 1,2,4-triazole ring, a tetrazole ring, a 1,3,4-thiadiazole ring, 1,2,4-thiadiazole ring, 1,3,4-oxadiazole ring, 1,2,4-oxadiazole ring, thiazole ring, oxazole ring, isothiazole ring, isoxazole ring, and these rings More preferred is a ring fused with a benzene ring or an unsaturated heterocycle. Q2 is preferably a carbamoyl group, particularly preferably a carbamoyl group having a hydrogen atom on the nitrogen atom.

  Formula (A-2)

In the general formula (A-2), R ₁ represents an alkyl group, an acyl group, an acylamino group, a sulfonamide group, an alkoxycarbonyl group, or a carbamoyl group. R ₂ represents a hydrogen atom, a halogen atom, an alkyl group, an alkoxy group, an aryloxy group, an alkylthio group, an arylthio group, an acyloxy group, or a carbonate group. R ₃ and R ₄ each represents a group that can be substituted on the benzene ring mentioned in the example of the substituent of formula (A-1). R ₃ and R ₄ may be connected to each other to form a condensed ring.
R ₁ is preferably an alkyl group having 1 to 20 carbon atoms (eg, methyl group, ethyl group, isopropyl group, butyl group, tert-octyl group, cyclohexyl group, etc.), acylamino group (eg, acetylamino group, benzoylamino group, methyl group). Ureido group, 4-cyanophenylureido group, etc.), carbamoyl group (n-butylcarbamoyl group, N, N-diethylcarbamoyl group, phenylcarbamoyl group, 2-chlorophenylcarbamoyl group, 2,4-dichlorophenylcarbamoyl group, etc.) acylamino Groups (including ureido groups and urethane groups) are more preferred.
R ₂ is preferably a halogen atom (more preferably a chlorine atom or a bromine atom), an alkoxy group (for example, a methoxy group, a butoxy group, an n-hexyloxy group, an n-decyloxy group, a cyclohexyloxy group, a benzyloxy group, etc.), aryl An oxy group (phenoxy group, naphthoxy group, etc.).
R ₃ is preferably a hydrogen atom, a halogen atom, or an alkyl group having 1 to 20 carbon atoms, and most preferably a halogen atom. R ₄ is preferably a hydrogen atom, an alkyl group, or an acylamino group, and more preferably an alkyl group or an acylamino group. Examples of these preferable substituents are the same as those for R ₁ . When R ₄ is an acylamino group, R ₄ is preferably linked to R ₃ to form a carbostyryl ring.

In the general formula (A-2), when R ₃ and R ₄ are connected to each other to form a condensed ring, a naphthalene ring is particularly preferable as the condensed ring. The same substituent as the example of a substituent quoted by general formula (A-1) may couple | bond with the naphthalene ring. When general formula (A-2) is a naphthol-based compound, R ₁ is preferably a carbamoyl group. Of these, a benzoyl group is particularly preferable. R ₂ is preferably an alkoxy group or an aryloxy group, and particularly preferably an alkoxy group.

  Hereinafter, preferred specific examples of the development accelerator of the present invention will be given. The present invention is not limited to these.

(Description of hydrogen bonding compound)
When the reducing agent in the present invention has an aromatic hydroxyl group (—OH) or an amino group (—NHR, R is a hydrogen atom or an alkyl group), particularly in the case of the aforementioned bisphenols, these groups and hydrogen bonds It is preferable to use together a non-reducing compound having a group capable of forming.
Examples of the group that forms a hydrogen bond with a hydroxyl group or an amino group include a phosphoryl group, a sulfoxide group, a sulfonyl group, a carbonyl group, an amide group, an ester group, a urethane group, a ureido group, a tertiary amino group, and a nitrogen-containing aromatic group. Can be mentioned. Among them, preferred are a phosphoryl group, a sulfoxide group, an amide group (however, it has no> N—H group and is blocked like> N—Ra (Ra is a substituent other than H)), a urethane group. (However, it has no> N—H group and is blocked like> N—Ra (Ra is a substituent other than H)), a ureido group (however, it has no> N—H group,> N-Ra (Ra is a substituent other than H).)
In the present invention, a particularly preferred hydrogen bonding compound is a compound represented by the following general formula (D).

Formula (D)

In the general formula (D), R ²¹ to R ²³ each independently represents an alkyl group, an aryl group, an alkoxy group, an aryloxy group, an amino group or a heterocyclic group, and these groups may be substituted even if they are unsubstituted. You may have.
When R ²¹ to R ²³ have a substituent, examples of the substituent include a halogen atom, an alkyl group, an aryl group, an alkoxy group, an amino group, an acyl group, an acylamino group, an alkylthio group, an arylthio group, a sulfonamide group, an acyloxy group, Examples thereof include an oxycarbonyl group, a carbamoyl group, a sulfamoyl group, a sulfonyl group, and a phosphoryl group. Preferred examples of the substituent include an alkyl group or an aryl group such as a methyl group, an ethyl group, an isopropyl group, a t-butyl group, and a t-octyl group. Group, phenyl group, 4-alkoxyphenyl group, 4-acyloxyphenyl group and the like.
Specific examples of the alkyl group represented by R ²¹ to R ²³ include a methyl group, an ethyl group, a butyl group, an octyl group, a dodecyl group, an isopropyl group, a t-butyl group, a t-amyl group, a t-octyl group, a cyclohexyl group, Examples include 1-methylcyclohexyl group, benzyl group, phenethyl group, 2-phenoxypropyl group and the like.
Examples of the aryl group include phenyl group, cresyl group, xylyl group, naphthyl group, 4-t-butylphenyl group, 4-t-octylphenyl group, 4-anisidyl group, and 3,5-dichlorophenyl group.
Alkoxy groups include methoxy, ethoxy, butoxy, octyloxy, 2-ethylhexyloxy, 3,5,5-trimethylhexyloxy, dodecyloxy, cyclohexyloxy, 4-methylcyclohexyloxy, benzyl An oxy group etc. are mentioned.
Examples of the aryloxy group include a phenoxy group, a cresyloxy group, an isopropylphenoxy group, a 4-t-butylphenoxy group, a naphthoxy group, and a biphenyloxy group.
Examples of the amino group include a dimethylamino group, a diethylamino group, a dibutylamino group, a dioctylamino group, an N-methyl-N-hexylamino group, a dicyclohexylamino group, a diphenylamino group, and an N-methyl-N-phenylamino group. .

R ²¹ to R ²³ are preferably an alkyl group, an aryl group, an alkoxy group, or an aryloxy group. In view of the effect of the present invention, at least one of R ²¹ to R ²³ is preferably an alkyl group or an aryl group, and more preferably two or more are an alkyl group or an aryl group. In addition, it is preferable that R ²¹ to R ²³ are the same group in that they can be obtained at low cost.
Specific examples of the hydrogen bonding compound including the compound of the general formula (D) in the present invention are shown below, but the present invention is not limited thereto.

Specific examples of the hydrogen bonding compound include those described in European Patent No. 1096310, Japanese Patent Application Laid-Open No. 2002-156727, and Japanese Patent Application No. 2001-12496 in addition to the above.
The compound of the general formula (D) of the present invention can be used in a light-sensitive material by being incorporated in a coating solution in the form of a solution, an emulsified dispersion, or a solid dispersion fine particle dispersion in the same manner as the reducing agent. It is preferable to use it as a product. The compound of the present invention forms a hydrogen-bonding complex with a compound having a phenolic hydroxyl group or an amino group in a solution state, and depending on the combination of the reducing agent and the compound of the general formula (D) of the present invention, It can be isolated in the crystalline state.
The use of the crystal powder isolated in this way as a solid dispersed fine particle dispersion is particularly preferable for obtaining stable performance. Further, a method in which the reducing agent and the compound of the general formula (D) of the present invention are mixed as a powder and complexed at the time of dispersion with a sand grinder mill or the like using an appropriate dispersant can be preferably used.
The compound of the general formula (D) of the present invention is preferably used in the range of 1 to 200 mol%, more preferably in the range of 10 to 150 mol%, still more preferably 20 to 100 mol, based on the reducing agent. % Range.

(Photosensitive silver halide)
1) Halogen composition The photosensitive silver halide used in the present invention may have any halogen composition, but preferably has a high silver iodide content of 40 mol% or more and 100 mol% or less. is there. The rest is not particularly limited and can be selected from silver chloride, silver bromide, or organic silver salts such as silver thiocyanate and silver phosphate. Silver bromide and silver chloride are particularly preferred. By using such a silver halide having a high silver iodide content, it is possible to design a preferable photothermographic material in which image storage stability after development processing, in particular, an increase in fog due to light irradiation is remarkably small.

  Further, the silver iodide content is preferably 80 mol% or more and 100 mol% or less, and particularly preferably 90 mol% or more and 100 mol% or less from the viewpoint of image storage stability against light irradiation after processing.

  The distribution of the halogen composition in the grains may be uniform, the halogen composition may be changed stepwise, or may be continuously changed. Further, silver halide grains having a core / shell structure can also be preferably used. A preferable structure is a 2- to 5-fold structure, more preferably 2- to 4-fold core / shell particles. A core high silver iodide structure having a high silver iodide content in the core part or a shell high silver iodide structure having a high silver iodide content in the shell part can also be preferably used. Further, a technique of localizing silver chloride or silver bromide as an epitaxial portion on the surface of the grain can be preferably used.

2) Average grain size The average grain size of silver halide that can be used in the present invention has two preferred regions.
One region is sufficiently smaller than conventional silver bromide and silver iodobromide having a low iodine content. The average grain size of silver halide is preferably 5 nm to 70 nm, and more preferably 5 nm to 55 nm. The term “particle size” as used herein means an average diameter when converted into a circular image having the same area as the projected area observed with an electron microscope.
Another preferred region has an average sphere equivalent diameter of 0.3 μm or more and 8.0 μm or less, and more preferably 0.5 μm or more and 3.0 μm or less. The average equivalent sphere diameter here refers to the average of the diameters when the particle volume is obtained from each projected area and thickness observed with an electron microscope and converted to a sphere having the same volume.

3) Coating amount The coating amount of such silver halide grains is 0.5 mol% or more and 15 mol% or less, preferably 0.5 mol% or more, based on 1 mol of silver in the non-photosensitive organic silver salt described later. More preferably, it is 12 mol% or less and 10 mol% or less. It is more preferably 1 mol% or more and 9 mol% or less, and particularly preferably 1 mol% or more and 7 mol% or less.

4) Grain Forming Methods Methods for forming photosensitive silver halide are well known in the art and are described, for example, in Research Disclosure No. 17029, June 1978, and US Pat. No. 3,700,458. In particular, a photosensitive silver halide is prepared by adding a silver supply compound and a halogen supply compound in gelatin or other polymer solution, and then mixed with an organic silver salt. Use the method. Further, the method described in paragraph Nos. 0217 to 0224 of JP-A No. 11-119374, and the method described in JP-A No. 11-352627 and Japanese Patent Application No. 2000-42336 are also preferable.

5) Grain shape Examples of the shape of the silver halide grains in the present invention include cubes, octahedrons, dodecahedrons, tetrahedrons, tabular grains, spherical grains, rod-shaped grains, and potato grains. In the present invention, tabular grains, dodecahedrons, and tetradecahedrals are particularly preferable. The dodecahedron particles referred to here are particles having (001), {1 (-1) 0}, {101} faces, and the tetradecahedral particles are (001), {100}, {101. } A particle having a face. Here, {100} represents a crystal plane group having a plane index equivalent to the (100) plane.
The silver iodide in the present invention can have any β phase and γ phase content. The β phase refers to a high silver iodide structure having a hexagonal wurtzite structure, and the γ phase refers to a high silver iodide structure having a cubic zinc blend structure.
The average γ phase ratio here is C.I. R. It is determined using the method proposed by Berry. This method is determined based on the peak ratio of the silver iodide β phase (100), (101), (002) and the γ phase (111) in the powder X-ray diffraction method. Reference can be made to Physical Review, Volume 161, Number 3, Page 848-851, 1967.

Regarding the method for forming tabular grains of silver iodide, the methods described in JP-A-59-119350 and JP-A-59-119344 are preferably used. The dodecahedron, the tetrahedron, and the octahedron can be prepared with reference to Japanese Patent Application Nos. 2002-081020, 2002-87955, and 2002-91756.
The average sphere equivalent diameter of the tabular silver halide is 0.3 μm or more and 8.0 μm or less, and more preferably 0.5 μm or more and 3.0 μm or less. The equivalent sphere diameter here means the diameter of a sphere having the same volume as that of one silver halide grain. As a measuring method, it can obtain | require by calculating | requiring the particle | grain volume from each projected area and thickness observed with the electron microscope, and converting into the sphere of the same volume as the volume.
The average thickness of the tabular silver halide is preferably 0.3 μm or less, more preferably 0.2 μm or less, and still more preferably 0.15 μm or less.
The tabular grains preferably have an aspect ratio of 2 or more and 100 or less, more preferably 5 or more and 50 or less.

  The silver halide having a high silver iodide content in the present invention can take a complicated form. L. JENKINS et al. J of Photo. Sci. Vol. 28 (1980) p164-Fig1. FIG. Tabular grains as shown in Fig. 1 are also preferably used. Grains with rounded corners of silver halide grains can also be preferably used. The surface index (Miller index) of the outer surface of the photosensitive silver halide grain is not particularly limited, but the ratio of the [100] plane having high spectral sensitization efficiency when the spectral sensitizing dye is adsorbed is high. preferable. The ratio is preferably 50% or more, more preferably 65% or more, and still more preferably 80% or more. The ratio of the Miller index [100] plane is determined by T.T. Tani; Imaging Sci. 29, 165 (1985).

6) Heavy metal The photosensitive silver halide grain in the invention may contain a metal or metal complex of Group 8 to Group 10 of the Periodic Table (showing Groups 1 to 18). As the central metal of the group 8 to group 10 metal or metal complex of the periodic table, rhodium, ruthenium and iridium are preferable. One kind of these metal complexes may be used, or two or more kinds of complexes of the same metal and different metals may be used in combination. The preferred content is in the range of 1 × 10 ⁻⁹ mol to 1 × 10 ⁻³ mol with ^respect to 1 mol of silver. These heavy metals and metal complexes and methods for adding them are described in JP-A-7-225449, JP-A-11-65021, paragraphs 0018 to 0024, and JP-A-11-119374, paragraphs 0227 to 0240.

In the present invention, silver halide grains in which a hexacyano metal complex is present on the outermost surface of the grains are preferred. The hexacyano metal complexes include [Fe (CN) ₆ ] ⁴⁻ , [Fe (CN) ₆ ] ³⁻ , [Ru (CN) ₆ ] ⁴⁻ , [Os (CN) ₆ ] ⁴⁻ , [Co ( CN) ₆ ] ³⁻ , [Rh (CN) ₆ ] ³⁻ , [Ir (CN) ₆ ] ³⁻ , [Cr (CN) ₆ ] ³⁻ , [Re (CN) ₆ ] ^{3− and the} like. . In the present invention, a hexacyano Fe complex is preferred.

  The hexacyano metal complex is present in the form of ions in aqueous solution, so the counter cation is not important, but it is easy to mix with water and is suitable for precipitation of silver halide emulsions. Sodium ion, potassium ion, rubidium It is preferable to use alkali metal ions such as ions, cesium ions, and lithium ions, ammonium ions, and alkylammonium ions (for example, tetramethylammonium ions, tetraethylammonium ions, tetrapropylammonium ions, tetra (n-butyl) ammonium ions).

  In addition to water, the hexacyano metal complex is miscible with a mixed solvent or gelatin with an appropriate organic solvent miscible with water (for example, alcohols, ethers, glycols, ketones, esters, amides, etc.). Can be added.

The addition amount of the hexacyano metal complex is preferably 1 × 10 ⁻⁵ mol or more and 1 × 10 ⁻² mol or less, more preferably 1 × 10 ⁻⁴ mol or more and 1 × 10 ⁻³ mol or less per mol of silver.

  In order for the hexacyano metal complex to be present on the outermost surface of the silver halide grain, the chalcogen sensitization of sulfur sensitization, selenium sensitization and tellurium sensitization is completed after the addition of the aqueous silver nitrate solution used for grain formation. It is added directly before the completion of the preparation step before the chemical sensitization step for performing noble metal sensitization such as sensitization and gold sensitization, during the washing step, during the dispersion step, or before the chemical sensitization step. In order to prevent the silver halide fine grains from growing, it is preferable to add the hexacyano metal complex immediately after the grain formation, and it is preferable to add it before the completion of the preparation step.

The addition of the hexacyano metal complex may be started after adding 96% by mass of the total amount of silver nitrate to be added to form grains, more preferably starting after adding 98% by mass, The addition of 99% by mass is particularly preferable.
When these hexacyanometal complexes are added after the addition of the aqueous silver nitrate solution just before the completion of grain formation, they can be adsorbed on the outermost surface of the silver halide grains, and most of them form slightly soluble salts with silver ions on the grain surface. To do. This silver salt of hexacyanoiron (II) is a less soluble salt than AgI, so that re-dissolution by fine particles can be prevented and silver halide fine particles having a small particle size can be produced. .

Further, regarding a metal atom (for example, [Fe (CN) ₆ ] ⁴⁻ ), a silver halide emulsion desalting method and a chemical sensitization method which can be contained in the silver halide grains used in the present invention, JP-A No. 11-101. No. 84574, paragraph numbers 0046 to 0050, JP-A No. 11-65021, paragraph numbers 0025 to 0031, and JP-A No. 11-119374, paragraph numbers 0242 to 0250.

7) Gelatin As the gelatin contained in the photosensitive silver halide emulsion used in the present invention, various gelatins can be used. It is necessary to maintain a good dispersion state of the photosensitive silver halide emulsion in the coating solution containing an organic silver salt, and it is preferable to use a low molecular weight gelatin having a molecular weight of 10,000 to 100,000. It is also preferred to use phthalated gelatin. These gelatins may be used at the time of grain formation or at the time of dispersion after desalting, but are preferably used at the time of grain formation.

8) Chemical sensitization The photosensitive silver halide used in the present invention may be non-chemically sensitized, but chemically sensitized by at least one of a chalcogen sensitization method, a gold sensitization method, and a reduction sensitization method. Is preferred. Examples of the chalcogen sensitizing method include a sulfur sensitizing method, a selenium sensitizing method, and a tellurium sensitizing method.

In sulfur sensitization, unstable sulfur compounds are used. The unstable sulfur compounds described in Grafkides, Chimie et Physique Photographic (published by Paul Momtel, 1987, 5th edition), Research Disclosure 307, 307105, and the like can be used.
Specifically, thiosulfate (for example, hypo), thioureas (for example, diphenylthiourea, triethylthiourea, N-ethyl-N ′-(4-methyl-2-thiazolyl) thiourea, carboxymethyltrimethylthiourea), thioamides (Eg, thioacetamide), rhodanines (eg, diethyl rhodanine, 5-benzylidene-N-ethyl rhodanine), phosphine sulfides (eg, trimethylphosphine sulfide), thiohydantoins, 4-oxo-oxazolidin-2 Known sulfur compounds such as -thiones, disulfides or polysulfides (for example, dimorpholine disulfide, cystine, lenthionine), polythionates, elemental sulfur, and active gelatin can also be used. Particularly preferred are thiosulfates, thioureas and rhodanines.

  In selenium sensitization, unstable selenium compounds are used, and Japanese Patent Publication Nos. 43-13489, 44-15748, JP-A-4-25832, JP-A-4-109340, JP-A-4-271341, and JP-A-5-40324. No. 5-11385, Japanese Patent Application No. Hei 4-202415, No. 4-330495, No. 4-333030, No. 5-4203, No. 5-4204, No. 5-106977, No. 5-236538. Selenium compounds described in JP-A-5-241642 and JP-A-5-286916 can be used.

  Specifically, colloidal metal selenium, selenoureas (eg, N, N-dimethylselenourea, trifluoromethylcarbonyl-trimethylselenourea, acetyl-trimethylselenourea), selenoamides (eg, selenoamide, N, N-diethyl) Phenylselenoamide), phosphine selenides (eg, triphenylphosphine selenide, pentafluorophenyl-triphenylphosphine selenide), selenophosphates (eg, tri-p-tolylselenophosphate, tri-n) -Butylselenophosphate), selenoketones (for example, selenobenzophenone), isoselenocyanates, selenocarboxylic acids, selenoesters, diacyl selenides and the like may be used. Furthermore, non-labile selenium compounds described in JP-B Nos. 46-4553 and 52-34492, such as selenite, selenocyanate, selenazoles, and selenides can also be used. In particular, phosphine selenides, selenoureas and selenocyanates are preferred.

  In tellurium sensitization, an unstable tellurium compound is used, and JP-A-4-224595, JP-A-4-271341, JP-A-4-3333043, JP-A-5-303157, JP-A-6-27573, JP-A-6-175258, The unstable tellurium described in JP-A-6-180478, JP-A-6-208186, JP-A-6-208184, JP-A-6-317867, JP-A-7-140579, JP-A-7-301879, JP-A-7-301880, etc. A compound can be used.

  Specifically, phosphine tellurides (for example, butyl-diisopropylphosphine telluride, tributylphosphine telluride, tributoxyphosphine telluride, ethoxydiphenylphosphine telluride), diacyl (di) tellurides ( For example, bis (diphenylcarbamoyl) ditelluride, bis (N-phenyl-N-methylcarbamoyl) ditelluride, bis (N-phenyl-N-methylcarbamoyl) telluride, bis (N-phenyl-N-benzylcarbamoyl) telluride, bis (ethoxycarbonyl) Telluride), telluroureas (for example, N, N′-dimethylethylenetellurourea, N, N′-diphenylethylenetellurourea) telluramides, telluroesters and the like may be used. In particular, diacyl (di) tellurides and phosphine tellurides are preferable. Particularly, compounds described in literatures described in paragraph No. 0030 of JP-A-11-65021, general formula (II) in JP-A-5-313284, Compounds represented by (III) and (IV) are more preferred.

  In the chalcogen sensitization in the present invention, selenium sensitization and tellurium sensitization are particularly preferable, and tellurium sensitization is particularly preferable.

  In gold sensitization, P.I. Gold sensitizers described by Grafkides, Chimie et Physique Photographic (published by Paul Momtel, 1987, 5th edition), Research Disclosure 307, No. 307105 can be used. Specifically, chloroauric acid, potassium chloroaurate, potassium aurithiocyanate, gold sulfide, gold selenide and the like, in addition to these, U.S. Pat. Nos. 2,642,361, 5,049,484, 5,049,485, 5,169,751, Gold compounds described in 5252455, Belgian Patent No. 691857 and the like can also be used. P. Precious metals such as platinum, palladium, iridium, etc. other than gold described in Grafkides, Chimie et Physique Photographic (published by Paul Momtel, 1987, 5th edition), Research Disclosure 307, 307105 are also used. I can do it.

  Although gold sensitization can be used alone, it is preferably used in combination with the chalcogen sensitization described above. Specifically, gold sulfur sensitization, gold selenium sensitization, gold tellurium sensitization, gold sulfur selenium sensitization, gold sulfur tellurium sensitization, gold selenium tellurium sensitization, and gold sulfur selenium tellurium sensitization.

In the present invention, chemical sensitization can be performed in the presence of a silver halide solvent. Specifically, thiocyanate (for example, potassium thiocyanate), a thioether compound (for example, compounds described in U.S. Pat. In particular, 3,6-dithia-1,8-octanediol), tetrasubstituted thiourea compounds (for example, compounds described in JP-B-59-11892, US Pat. No. 4,221,863, etc., particularly tetramethylthiourea), Examples thereof include thione compounds described in JP-B-60-11341, selenoether compounds described in JP-B-63-29727, U.S. Pat. No. 4,782013, etc., telluroether compounds described in JP-A-2-118566, and sulfites. . In particular, among these, thiocyanate, thioether compound, tetra-substituted thiourea compound and thione compound are preferable, and among these, thiocyanate is more preferable. As the amount used, about 10 ⁻⁵ mol to 10 ⁻³ mol per mol of silver halide can be used.

  In the present invention, chemical sensitization can be performed at any time after particle formation and before coating. After desalting, (1) before spectral sensitization, (2) simultaneously with spectral sensitization, (3) spectral After sensitization, there may be (4) immediately before application.

The amount of chalcogen sensitizer used in the present invention varies depending on the silver halide grains used, chemical ripening conditions, and the like, but is 10 ^-8 to 10 ^-1 mol, preferably 10 ^-7 to 1 mol per mol of silver halide. About 10 ^-2 mol is used.
Similarly, the amount of the gold sensitizer used in the present invention varies depending on various conditions, but as a guideline, it is 10 ⁻⁷ mol to 10 ⁻² mol, more preferably 10 ⁻⁶ mol to 1 mol of silver halide. 5 × 10 ⁻³ mol. The environmental conditions for chemically sensitizing this emulsion can be selected under any conditions, but the pAg is 8 or less, preferably 7.0 or less to 6.5 or less, particularly 6.0 or less, and the pAg is 1.5 or less. Above, preferably 2.0 or more, particularly preferably 2.5 or more, pH is 3 to 10, preferably 4 to 9, temperature is 20 to 95 ° C., preferably about 25 to 80 ° C. is there.

In the present invention, reduction sensitization can be used in combination with chalcogen sensitization or gold sensitization. In particular, it is preferably used in combination with chalcogen sensitization.
As specific compounds for reduction sensitization, ascorbic acid, thiourea dioxide, and dimethylamine borane are preferable. In addition, stannous chloride, aminoiminomethanesulfinic acid, hydrazine derivatives, borane compounds, silane compounds, polyamine compounds, etc. It is preferable to use it. The reduction sensitizer may be added at any stage in the photosensitive emulsion production process from crystal growth to the preparation process immediately before coating. Further, reduction sensitization is also preferable by ripening while maintaining the pH of the emulsion at 8 or more or pAg at 4 or less, and reduction sensitization is performed by introducing a single addition portion of silver ions during grain formation. Is also preferable.
The amount of the reduction sensitizer, likewise may vary depending on various conditions, per mol of silver halide 10 ^-7 mol to 10 ^-1 mol as a guide, and more preferably 10 ^-6 mol to 5 × 10 ^{- 2} moles.

A thiosulfonic acid compound may be added to the silver halide emulsion used in the present invention by the method shown in European Patent Publication No. 293,917.
The photosensitive silver halide grains in the invention are preferably chemically sensitized by at least one of gold sensitization and chalcogen sensitization from the viewpoint of designing a high-sensitivity photothermographic material.

9) Compound in which 1-electron oxidant produced by 1-electron oxidation can emit 1 electron or more electrons In the photothermographic material of the present invention, 1-electron oxidant produced by 1-electron oxidation is 1 electron or 1 electron or more. It is preferable to contain a compound capable of emitting more electrons. The compound can be used alone or in combination with the above-described various chemical sensitizers, and can increase the sensitivity of silver halide.

The one-electron oxidant produced by one-electron oxidation contained in the photosensitive material in the present invention is a compound selected from the following types 1 and 2 that can emit one electron or more.
(Type 1)
A compound in which a one-electron oxidant produced by one-electron oxidation can further emit one or more electrons with a subsequent bond cleavage reaction.
(Type 2)
A compound capable of emitting one or more electrons after a one-electron oxidant produced by one-electron oxidation undergoes a subsequent bond formation reaction.

First, the compound of type 1 will be described.
JP-A-9-211769 (specific example: 28-) is a compound that is a type 1 compound, and a one-electron oxidant produced by one-electron oxidation can further emit one electron with a subsequent bond cleavage reaction. Compounds PMT-1 to S-37 described in Table E and Table F on page 32), JP-A-9-211774, JP-A-11-95355 (specific examples: compounds INV1-36), JP-T 2001-500996 (Specific examples: Compounds 1-74, 80-87, 92-122), US Pat. No. 5,747,235, US Pat. No. 5,747,236, European Patent 786692A1 (Specific examples: Compounds INV 1-35), “One-photon two-electron sensitizer” or “deprotonated electron donation” described in patents such as European Patent No. 893732A1, US Pat. No. 6,054,260, US Pat. No. 5,994,051 Compound called sensitive agent "and the like. The preferred ranges of these compounds are the same as the preferred ranges described in the cited patent specifications.

  In addition, as a compound of type 1 that can be emitted by one-electron oxidant produced by one-electron oxidation and further releasing one electron or more with a subsequent bond cleavage reaction, a compound represented by the general formula (1) ( General formula (1) described in JP-A-2003-114487), general formula (2) (synonymous with general formula (2) described in JP-A-2003-114487), general formula (3) General formula (1) described in 2003-114488), general formula (4) (synonymous with general formula (2) described in Japanese Patent Application Laid-Open No. 2003-114488), general formula (5) (Japanese Patent Application Laid-Open No. 2003-114488). 114488 (synonymous with general formula (3)), general formula (6) (synonymous with general formula (1) described in JP-A-2003-75950), and general formula (7) (JP-A-2003-75950). Synonymous with general formula (2) described in , General formula (8) (synonymous with general formula (1) described in Japanese Patent Application No. 2003-25886), or chemical reaction formula (1) (chemical reaction formula (1) described in Japanese Patent Application No. 2003-33446) And the compound represented by the general formula (9) (synonymous with the general formula (3) described in Japanese Patent Application No. 2003-33446). The preferred ranges of these compounds are the same as the preferred ranges described in the cited patent specifications.

In the formula, RED ₁ and RED ₂ represent a reducing group. R ₁ represents a non-metallic atomic group capable of forming a cyclic structure corresponding to a tetrahydro form of a 5-membered or 6-membered aromatic ring (including an aromatic heterocycle) or an octahydro form together with carbon atom (C) and RED _1. Represent. R ₂ represents a hydrogen atom or a substituent. When a plurality of R ₂ are present in the same molecule, these may be the same or different. L ₁ represents a leaving group. ED represents an electron donating group. Z ₁ represents an atomic group capable of forming a 6-membered ring with a nitrogen atom and two carbon atoms of a benzene ring. X ₁ represents a substituent, and m 1 represents an integer of 0 to 3. Z ₂ represents —CR ₁₁ R ₁₂ —, —NR ₁₃ —, or —O—. R ₁₁ and R ₁₂ each independently represents a hydrogen atom or a substituent. R ₁₃ represents a hydrogen atom, an alkyl group, an aryl group, or a heterocyclic group. X ₁ represents an alkoxy group, an aryloxy group, a heterocyclic oxy group, an alkylthio group, an arylthio group, a heterocyclic thio group, an alkylamino group, an arylamino group, or a heterocyclic amino group. L ₂ represents a carboxy group or a salt thereof, or a hydrogen atom. X ₂ represents a group which forms a 5-membered heterocycle with C═C. Y ₂ represents a group which forms a 5- or 6-membered aryl group or heterocyclic group with C═C. M represents a radical, a radical cation, or a cation.

Next, the type 2 compound will be described.
As a compound that can be emitted by one-electron oxidant generated by one-electron oxidation with a type 2 compound and further with one subsequent bond formation reaction, a compound represented by the general formula (10) is disclosed. The reaction represented by the general formula (1) described in 2003-140287) and the chemical reaction formula (1) (synonymous with the chemical reaction formula (1) described in Japanese Patent Application No. 2003-33446) may occur. And a compound represented by the general formula (11) (synonymous with the general formula (2) described in Japanese Patent Application No. 2003-33446). The preferred ranges of these compounds are the same as the preferred ranges described in the cited patent specifications.

In the formula, X represents a reducing group that is one-electron oxidized. Y reacts with a one-electron oxidant produced by one-electron oxidation of X to form a new bond, a carbon-carbon double bond site, a carbon-carbon triple bond site, an aromatic group site, or a benzo The reactive group containing the non-aromatic heterocyclic part of a condensed ring is represented. L ₂ represents a linking group for linking X and Y. R ₂ represents a hydrogen atom or a substituent. When a plurality of R ₂ are present in the same molecule, these may be the same or different. X ₂ represents a group which forms a 5-membered heterocycle with C═C. Y ₂ represents a group which forms a 5- or 6-membered aryl group or heterocyclic group with C═C. M represents a radical, a radical cation, or a cation.

  Of the compounds of types 1 and 2, “a compound having an adsorptive group to silver halide in the molecule” or “a compound having a partial structure of a spectral sensitizing dye in the molecule” is preferable. Typical examples of the adsorptive group to silver halide include those described in JP-A No. 2003-156823, page 16, right line 1 to page 17, right line 12. The partial structure of the spectral sensitizing dye is a structure described on page 17, right line 34 to page 18, left line 6 of the same specification.

  More preferably, the compound of type 1 or 2 is “a compound having at least one adsorptive group to silver halide in the molecule”. More preferred is “a compound having two or more adsorptive groups to silver halide in the same molecule”. When two or more adsorptive groups are present in a single molecule, these adsorptive groups may be the same or different.

  The adsorptive group is preferably a mercapto-substituted nitrogen-containing heterocyclic group (for example, 2-mercaptothiadiazole group, 3-mercapto-1,2,4-triazole group, 5-mercaptotetrazole group, 2-mercapto-1,3,4). -Oxadiazole group, 2-mercaptobenzoxazole group, 2-mercaptobenzthiazole group, 1,5-dimethyl-1,2,4-triazolium-3-thiolate group, etc.) or imino silver (> NAg) And a nitrogen-containing heterocyclic group having a —NH— group as a heterocyclic partial structure (for example, a benzotriazole group, a benzimidazole group, an indazole group, etc.). Particularly preferred are a 5-mercaptotetrazole group, a 3-mercapto-1,2,4-triazole group, and a benzotriazole group, and most preferred are a 3-mercapto-1,2,4-triazole group, and 5 -Mercaptotetrazole group.

  It is also particularly preferred that the adsorptive group has two or more mercapto groups as a partial structure in the molecule. Here, the mercapto group (—SH) may be a thione group if it can be tautomerized. Preferred examples of the adsorptive group having two or more mercapto groups as a partial structure (such as a dimercapto-substituted nitrogen-containing heterocyclic group) include 2,4-dimercaptopyrimidine group, 2,4-dimercaptotriazine group, 3, A 5-dimercapto-1,2,4-triazole group may be mentioned.

  A quaternary salt structure of nitrogen or phosphorus is also preferably used as the adsorptive group. Specific examples of the quaternary salt structure of nitrogen include an ammonio group (such as a trialkylammonio group, a dialkylaryl (or heteroaryl) ammonio group, an alkyldiaryl (or heteroaryl) ammonio group) or a quaternized nitrogen atom. A group containing a nitrogen-containing heterocyclic group containing The quaternary salt structure of phosphorus includes a phosphonio group (trialkyl phosphonio group, dialkylaryl (or heteroaryl) phosphonio group, alkyldiaryl (or heteroaryl) phosphonio group, triaryl (or heteroaryl) phosphonio group, etc.) Is mentioned. More preferably, a quaternary salt structure of nitrogen is used, and more preferably a 5-membered or 6-membered nitrogen-containing aromatic heterocyclic group containing a quaternized nitrogen atom is used. Particularly preferably, a pyridinio group, a quinolinio group, or an isoquinolinio group is used. These nitrogen-containing heterocyclic groups containing a quaternized nitrogen atom may have an arbitrary substituent.

Examples of counter anions of quaternary salts include halogen ions, carboxylate ions, sulfonate ions, sulfate ions, perchlorate ions, carbonate ions, nitrate ions, BF ₄ ⁻ , PF ₆ ⁻ , Ph ₄ B ^{− and the} like. It is done. When a group having a negative charge in the carboxylate group or the like is present in the molecule, an inner salt may be formed together with the group. As a counter anion not present in the molecule, a chlorine ion, a bromo ion or a methanesulfonate ion is particularly preferable.

  A preferred structure of the compound represented by types 1 and 2 having a quaternary salt structure of nitrogen or phosphorus as the adsorptive group is represented by the general formula (X).

Formula (X) (PQ ₁ −) _i −R (−Q ₂ −S) _j

In the general formula (X), P and R each independently represent a quaternary salt structure of nitrogen or phosphorus that is not a partial structure of a sensitizing dye. Q ₁ and Q ₂ each independently represent a linking group. Specifically, a single bond, an alkylene group, an arylene group, a heterocyclic group, —O—, —S—, —NR _N —, —C (= O) —, —SO ₂ —, —SO—, —P (═O) — each independently represents a group consisting of a combination of these groups. Here, _RN represents a hydrogen atom, an alkyl group, an aryl group, or a heterocyclic group. S is a residue obtained by removing one atom from a compound represented by type (1) or (2). i and j are integers of 1 or more, and i + j is selected from the range of 2-6. Preferably, i is 1 to 3, and j is 1 to 2, more preferably i is 1 or 2, and j is 1, and particularly preferably i is 1 and j is 1. The compound represented by the general formula (X) preferably has a total carbon number of 10 to 100. More preferably, it is 10-70, More preferably, it is 11-60, Most preferably, it is 12-50.

  The compounds of type 1 and type 2 in the present invention may be used at any time during the preparation of the photosensitive silver halide emulsion and during the process of producing the photothermographic material. For example, at the time of photosensitive silver halide grain formation, desalting step, chemical sensitization, before coating. Moreover, it can also add in several steps in these processes. The addition position is preferably from the end of formation of the photosensitive silver halide grains to before the desalting step, at the time of chemical sensitization (immediately after the start of chemical sensitization to immediately after completion), and before coating, more preferably from the time of chemical sensitization Until before mixing with the non-photosensitive organic silver salt.

  The compounds of type 1 and type 2 in the present invention are preferably added after being dissolved in water, a water-soluble solvent such as methanol or ethanol, or a mixed solvent thereof. When the compound is dissolved in water, the compound having higher solubility when the pH is raised or lowered may be dissolved at a higher or lower pH and added.

The compounds of type 1 and type 2 in the present invention are preferably used in an image forming layer containing a photosensitive silver halide and a non-photosensitive organic silver salt, but the photosensitive silver halide and the non-photosensitive organic silver salt are used. It may be added to the protective layer or intermediate layer together with the image forming layer containing, and diffused during coating. The addition timing of these compounds is preferably 1 × 10 ^{−9 to} 5 × 10 ⁻¹ mol, more preferably 1 × 10 ^{−8 to} 5 mol, per mol of silver halide, regardless of before and after the sensitizing dye. X10 ^-2 mol of silver halide emulsion layer (image forming layer).

10) Adsorbing redox compound having an adsorbing group and a reducing group In the present invention, an adsorbing redox compound having an adsorbing group and a reducing group for silver halide is preferably contained in the molecule. The adsorptive redox compound is preferably a compound represented by the following formula (I).

Formula (I) A- (W) n-B
In formula (I), A represents a group that can be adsorbed to silver halide (hereinafter referred to as an adsorbing group), W represents a divalent linking group, n represents 0 or 1, and B represents a reducing group. Represent.

  In the formula (I), the adsorption group represented by A is a group that directly adsorbs to silver halide, or a group that promotes adsorption to silver halide, and specifically, a mercapto group (or a salt thereof). , A thione group (—C (═S) —), a heterocyclic group, a sulfide group, a disulfide group, a cationic group, or an ethynyl group containing at least one atom selected from a nitrogen atom, a sulfur atom, a selenium atom, and a tellurium atom Etc.

The mercapto group (or salt thereof) as the adsorptive group means the mercapto group (or salt thereof) itself, and more preferably a heterocyclic group or aryl group substituted with at least one mercapto group (or salt thereof) or Represents an alkyl group. Here, the heterocyclic group is at least a 5- to 7-membered monocyclic or condensed aromatic or non-aromatic heterocyclic group such as an imidazole ring group, a thiazole ring group, an oxazole ring group, or a benzimidazole ring. Group, benzothiazole ring group, benzoxazole ring group, triazole ring group, thiadiazole ring group, oxadiazole ring group, tetrazole ring group, purine ring group, pyridine ring group, quinoline ring group, isoquinoline ring group, pyrimidine ring group, And triazine ring group. Moreover, the heterocyclic group containing the quaternized nitrogen atom may be sufficient, and in this case, the substituted mercapto group may dissociate and it may become a meso ion. When the mercapto group forms a salt, the counter ion is a cation such as an alkali metal, alkaline earth metal or heavy metal (Li ⁺ , Na ⁺ , K ⁺ , Mg ²⁺ , Ag ⁺ , Zn ²⁺ etc.), ammonium ion Examples thereof include a heterocyclic group containing a quaternized nitrogen atom, a phosphonium ion, and the like.
Further, the mercapto group as the adsorptive group may be tautomerized into a thione group.
The thione group as an adsorbing group also includes a chain or cyclic thioamide group, thioureido group, thiourethane group, or dithiocarbamate group.
A heterocyclic group containing at least one atom selected from a nitrogen atom, a sulfur atom, a selenium atom and a tellurium atom as the adsorptive group is a -NH- group capable of forming imino silver (> NAg) as a partial structure of the heterocyclic ring. A nitrogen-containing heterocyclic group, or a “—S—” group, a “—Se—” group, a “—Te—” group or a “═N—” group that can be coordinated to a silver ion by a coordination bond. A heterocyclic group having a partial structure of benzotriazole group, triazole group, indazole group, pyrazole group, tetrazole group, benzimidazole group, imidazole group, purine group and the like as thiophene group as the latter example , Thiazole group, oxazole group, benzothiophene group, benzothiazole group, benzoxazole group, thiadiazole group, oxadiazole group, tri Jin group, seleno azole group, benzoselenazole group, tellurium azole group, such as benzo tellurium azole group.
Examples of the sulfide group or disulfide group as the adsorptive group include all groups having a partial structure of -S- or -SS-.
The cationic group as the adsorptive group means a group containing a quaternized nitrogen atom, specifically, an ammonio group or a group containing a nitrogen-containing heterocyclic group containing a quaternized nitrogen atom. Examples of the nitrogen-containing heterocyclic group containing a quaternized nitrogen atom include a pyridinio group, a quinolinio group, an isoquinolinio group, an imidazolio group, and the like.
An ethynyl group as an adsorptive group means a —C≡CH group, and the hydrogen atom may be substituted.
The adsorbing group may have an arbitrary substituent.

  Further, specific examples of the adsorbing group include those described in the specifications p4 to p7 of JP-A No. 11-95355.

  In the formula (I), preferred as the adsorptive group represented by A is a mercapto-substituted heterocyclic group (for example, 2-mercaptothiadiazole group, 2-mercapto-5-aminothiadiazole group, 3-mercapto-1,2,4). -Triazole group, 5-mercaptotetrazole group, 2-mercapto-1,3,4-oxadiazole group, 2-mercaptobenzimidazole group, 1,5-dimethyl-1,2,4-triazolium-3-thiolate group 2,4-dimercaptopyrimidine group, 2,4-dimercaptotriazine group, 3,5-dimercapto-1,2,4-triazole group, 2,5-dimercapto-1,3-thiazole group), or Nitrogen-containing heterocyclic group having —NH— group capable of forming imino silver (> NAg) as a partial structure of heterocyclic ring (for example, benzotriazo Group, benzimidazole group, an indazole group), more preferable as an adsorptive group is a 2-mercaptobenzimidazole group, a 3,5-dimercapto-1,2,4-triazole group.

In formula (I), W represents a divalent linking group. Any linking group may be used as long as it does not adversely affect photographic properties. For example, a divalent linking group composed of a carbon atom, a hydrogen atom, an oxygen atom, a nitrogen atom, or a sulfur atom can be used. Specifically, an alkylene group having 1 to 20 carbon atoms (for example, a methylene group, an ethylene group, a trimethylene group, a tetramethylene group, a hexamethylene group, etc.), an alkenylene group having 2 to 20 carbon atoms, and an alkynylene group having 2 to 20 carbon atoms. , An arylene group having 6 to 20 carbon atoms (eg, phenylene group, naphthylene group, etc.), —CO—, —SO ₂ —, —O—, —S—, —NR ₁ —, combinations of these linking groups, and the like. It is done. Here, R ₁ represents a hydrogen atom, an alkyl group, a heterocyclic group, or an aryl group.
The linking group represented by W may have an arbitrary substituent.

  In formula (I), the reducing group represented by B represents a group capable of reducing silver ions. For example, a triple bond group such as formyl group, amino group, acetylene group or propargyl group, mercapto group, hydroxylamines. Hydroxamic acids, hydroxyureas, hydroxyurethanes, hydroxysemicarbazides, reductones (including reductone derivatives), anilines, phenols (chroman-6-ols, 2,3-dihydrobenzofuran-5-ols, (Including aminophenols, sulfonamidophenols, and hydroquinones, catechols, resorcinols, polyphenols such as benzenetriols, bisphenols), acylhydrazines, carbamoylhydrazines, 3-pyrazolidones, etc. Residue with one removed And the like. Of course, these may have an arbitrary substituent.

In the formula (I), the reducing group represented by B shows its oxidation potential by Akira Fujishima “Electrochemical measurement method” (pages 150-208, published by Gihodo) or “The Experimental Chemistry Course” edited by the Chemical Society of Japan, 4th edition ( 9 pages 282-344, Maruzen). For example, by a rotating disk voltammetry technique, specifically, a sample is dissolved in a solution of methanol: pH 6.5 Briton-Robinson buffer = 10%: 90% (volume%), and nitrogen gas is used for 10 minutes. , A glassy carbon rotating disk electrode (RDE) is used as a working electrode, a platinum wire is used as a counter electrode, a saturated calomel electrode is used as a reference electrode, 25 ° C., 1000 rev / min, 20 mV / sec. Can be measured at sweep speed. A half-wave potential (E1 / 2) can be obtained from the obtained voltammogram.
In the present invention, the reducing group represented by B preferably has an oxidation potential in the range of about -0.3 V to about 1.0 V when measured by the above measurement method. More preferably, it is in the range of about -0.1V to about 0.8V, and particularly preferably in the range of about 0 to about 0.7V.

  In the formula (I), the reducing group represented by B is preferably selected from hydroxylamines, hydroxamic acids, hydroxyureas, hydroxysemicarbazides, reductones, phenols, acylhydrazines, carbamoylhydrazines, and 3-pyrazolidones. A residue obtained by removing one hydrogen atom.

  The compound of the formula (I) in the present invention may be one in which a ballast group or polymer chain commonly used in an immobile photographic additive such as a coupler is incorporated. Examples of the polymer include those described in JP-A-1-100530.

  The compound of the formula (I) in the present invention may be a bis form or a tris form. The molecular weight of the compound of formula (I) in the present invention is preferably between 100 and 10000, more preferably between 120 and 1000, particularly preferably between 150 and 500.

  Examples of the compound of formula (I) in the present invention are shown below, but the present invention is not limited thereto.

  Further, specific compounds 1 to 30 and 1 ″ -1 to 1 ″ -77 described in European Patent No. 1308776A2 P73 to P87 are also preferable examples of the compound having an adsorbing group and a reducing group in the present invention. .

  These compounds can be easily synthesized according to known methods. As the compound of the formula (I) in the present invention, one kind of compound may be used alone, but it is also preferred to use two or more kinds of compounds at the same time. When two or more kinds of compounds are used, they may be added in the same layer or in different layers, and the addition methods may be different.

The compound of formula (I) in the present invention is preferably added to the silver halide emulsion layer, and more preferably added during preparation of the emulsion. When added at the time of emulsion preparation, it can be added at any time during the process. For example, silver halide grain formation process, before the start of desalting process, desalting process, chemical ripening Examples include a step before starting, a chemical ripening step, and a step before preparing a finished emulsion. Moreover, it can also be added in several steps in these processes. Although it is preferably used for the image forming layer, it may be added to the adjacent protective layer or intermediate layer together with the image forming layer and diffused during coating.
The preferred addition amount largely depends on the above-mentioned addition method and the kind of compound to be added, but generally 1 × 10 ⁻⁶ mol to 1 mol, preferably 1 × 10 ⁻⁵ mol, per mol of photosensitive silver halide. The amount is 5 × 10 ⁻¹ mol or less, more preferably 1 × 10 ⁻⁴ mol or more and 1 × 10 ⁻¹ mol or less.

  The compound of the formula (I) in the present invention can be added after being dissolved in water, a water-soluble solvent such as methanol or ethanol, or a mixed solvent thereof. At this time, the pH may be appropriately adjusted with an acid or a base, and a surfactant may be allowed to coexist. Furthermore, it can also be dissolved in a high boiling point organic solvent and added as an emulsified dispersion. It can also be added as a solid dispersion.

11) Sensitizing dye The sensitizing dye that can be applied to the present invention can spectrally sensitize silver halide grains in a desired wavelength region when adsorbed on silver halide grains, and is suitable for spectral characteristics of the exposure light source. Sensitizing dyes with sensitivity can be advantageously selected. In particular, the photothermographic material in the invention is preferably spectrally sensitized so as to have a spectral sensitivity peak at 600 nm to 900 nm or 300 nm to 500 nm. Regarding the sensitizing dye and the addition method, paragraphs 0103 to 0109 of JP-A-11-65021, compounds represented by the general formula (II) of JP-A-10-186572, and general formulas (I) of JP-A-11-119374 ) And the dye described in Example 5 of U.S. Pat. Nos. 5,510,236 and 3,871,887, JP-A-2-96131, JP-A-59-48753. Dyes disclosed in Japanese Patent Application No. 0803764A1, page 19, line 38 to page 20, line 35, Japanese Patent Application No. 2000-86865, Japanese Patent Application No. 2000-102560, Japanese Patent Application No. 2000-205399, etc. It is described in. These sensitizing dyes may be used alone or in combination of two or more.

The addition amount of the sensitizing dye in the present invention can be set to a desired amount in accordance with sensitivity and fogging performance, but is preferably 10 ⁻⁶ to 1 mol, more preferably 1 mol per mol of silver halide in the photosensitive layer. Is 10 ⁻⁴ to 10 ⁻¹ mol.

  In the present invention, a supersensitizer can be used to improve spectral sensitization efficiency. As the supersensitizer used in the present invention, European Patent Publication No. 587,338, US Pat. Nos. 3,877,943, 4,873,184, JP-A-5-341432, 11- 109547, 10-111543, etc. are mentioned.

12) Combined use of silver halide The photosensitive silver halide emulsion in the photothermographic material used in the invention may be only one kind, or two or more kinds (for example, those having different average grain sizes, those having different halogen compositions). , Different crystal habits, different chemical sensitization conditions). The gradation can be adjusted by using a plurality of types of photosensitive silver halides having different sensitivities. Examples of these technologies include JP-A-57-119341, 53-106125, 47-3929, 48-55730, 46-5187, 50-73627, 57-150841 and the like. Can be mentioned. The sensitivity difference is preferably 0.2 log E or more for each emulsion.

13) Mixing of silver halide and organic silver salt It is particularly preferred that the photosensitive silver halide grains in the present invention are formed in the absence of non-photosensitive organic silver salt and chemically sensitized. This is because sufficient sensitivity may not be achieved by the method of forming silver halide by adding a halogenating agent to the organic silver salt.
As a method of mixing silver halide and organic silver salt, a method of mixing separately prepared photosensitive silver halide and organic silver salt with a high speed stirrer, ball mill, sand mill, colloid mill, vibration mill, homogenizer, etc. Alternatively, there may be mentioned a method of preparing an organic silver salt by mixing photosensitive silver halide which has been prepared at any timing during the preparation of the organic silver salt. Any method can preferably obtain the effects of the present invention.

14) Mixing of silver halide into coating solution In the present invention, silver halide is preferably added to the image forming layer coating solution from 180 minutes before application, preferably from 60 minutes to 10 seconds before application. However, the mixing method and mixing conditions are not particularly limited as long as the effects of the present invention are sufficiently exhibited. Specific mixing methods include mixing in a tank in which the average residence time calculated from the addition flow rate and the amount of liquid fed to the coater is a desired time, and N.I. Harnby, M.M. F. Edwards, A.D. W. There is a method using a static mixer described in Chapter 8 of Nienow's “Liquid Mixing Technology” (Nikkan Kogyo Shimbun, 1989), translated by Koji Takahashi.

(Compound that effectively reduces visible light absorption derived from photosensitive silver halide after heat development)
In the present invention, it is preferable to contain a compound that practically reduces visible light absorption derived from photosensitive silver halide after heat development compared to before heat development.
As the compound that effectively reduces the visible light absorption derived from the photosensitive silver halide after heat development, it is particularly preferable to use a silver iodide complex-forming agent.

<Silver iodide complex forming agent>
The silver iodide complex-forming agent in the present invention can contribute to a Lewis acid-base reaction in which at least one of a nitrogen atom or a sulfur atom in a compound donates an electron to a silver ion as a coordination atom (electron donor: Lewis base). Is possible. The stability of the complex is defined by the sequential stability constant or the total stability constant, but depends on the combination of the three of silver ion, iodide ion and the silver complexing agent. As a general guideline, a large stability constant can be obtained by means such as a chelate effect due to intramolecular chelate ring formation and an increase in the acid-base dissociation constant of the ligand.

  The ultraviolet-visible absorption spectrum of the photosensitive silver halide can be measured by a transmission method or a reflection method. If the absorption derived from other compounds added to the photothermographic material overlaps with the absorption of the photosensitive silver halide, the difference spectrum or the removal of other compounds with a solvent can be used alone or in combination. The UV-visible absorption spectrum of photosensitive silver halide can be observed.

The silver iodide complex forming agent in the present invention is preferably a 5- to 7-membered heterocyclic compound containing at least one nitrogen atom. When the compound does not have a mercapto group, sulfide group or thione group as a substituent, the nitrogen-containing 5- to 7-membered heterocyclic ring may be saturated or unsaturated, and has other substituents. It may be. Moreover, the substituents on the heterocycle may be bonded to each other to form a ring.
Examples of preferred 5-7 membered heterocyclic compounds include pyrrole, pyridine, oxazole, isoxazole, thiazole, isothiazole, imidazole, pyrazole, pyrazine, pyrimidine, pyridazine, indole, isoindole, indolizine, quinoline, isoquinoline, benzo Imidazole, 1H-imidazole, quinoxaline, quinazoline, cinnoline, phthalazine, naphthyridine, purine, pteridine, carbazole, acridine, phenanthridine, phenanthroline, phenazine, phenoxazine, phenothiazine, benzothiazole, benzoxazole, benzimidazole, 1,2, 4-triazine, 1,3,5-triazine, pyrrolidine, imidazolidine, pyrazolidine, piperidine, piperazine, morpholine, in Phosphorus, and the like isoindoline. More preferably pyridine, imidazole, pyrazole, pyrazine, pyrimidine, pyridazine, indole, isoindole, indolizine, quinoline, isoquinoline, benzimidazole, 1H-imidazole, quinoxaline, quinazoline, cinnoline, phthalazine, 1,8-naphthyridine, 1, Examples thereof include 10-phenanthroline, benzimidazole, benzotriazole, 1,2,4-triazine, 1,3,5-triazine and the like. Particularly preferred are pyridine, imidazole, pyrazine, pyrimidine, pyridazine, phthalazine, triazine, 1,8-naphthyridine, 1,10-phenanthroline and the like.

These rings may have a substituent, and the substituent may be any substituent as long as it does not adversely affect photographic properties. Preferred examples include a halogen atom (a fluorine atom, a chlorine atom, a bromine atom, or an iodine atom), an alkyl group (a linear, branched, or cyclic alkyl group, including a bicycloalkyl group or an active methine group), an alkenyl group, or an alkynyl group. Group, aryl group, heterocyclic group (substitution position is not limited), acyl group, alkoxycarbonyl group, aryloxycarbonyl group, heterocyclic oxycarbonyl group, carbamoyl group, N-acylcarbamoyl group, N-sulfonylcarbamoyl group, N-carbamoylcarbamoyl group, N-sulfamoylcarbamoyl group, carbazoyl group, carboxy group or a salt thereof, oxalyl group, oxamoyl group, cyano group, carbonimidoyl group (Carbonimidoyl group), formyl group, hydroxy group, alkoxy group ( Ethyleneoxy Or an aryloxy group, heterocyclic oxy group, acyloxy group, (alkoxy or aryloxy) carbonyloxy group, carbamoyloxy group, sulfonyloxy group, amino group, (alkyl, aryl) , Or heterocycle) amino group, acylamino group, sulfonamide group, ureido group, thioureido group, imide group, (alkoxy or aryloxy) carbonylamino group, sulfamoylamino group, semicarbazide group, ammonio group, oxamoylamino group N- (alkyl or aryl) sulfonylureido group, N-acylureido group, N-acylsulfamoylamino group, nitro group, heterocyclic group containing a quaternized nitrogen atom (for example, pyridinio group, imidazolio group, Norinio group, isoquinolinio group), isocyano group, imino group, (alkyl or aryl) sulfonyl group, (alkyl or aryl) sulfinyl group, sulfo group or a salt thereof, sulfamoyl group, N-acylsulfamoyl group, N-sulfonylsulfuric group Examples include a famoyl group or a salt thereof, a phosphino group, a phosphinyl group, a phosphinyloxy group, a phosphinylamino group, and a silyl group. Here, the active methine group means a methine group substituted with two electron-withdrawing groups, and the electron-withdrawing group here means an acyl group, an alkoxycarbonyl group, an aryloxycarbonyl group, a carbamoyl group, An alkylsulfonyl group, an arylsulfonyl group, a sulfamoyl group, a trifluoromethyl group, a cyano group, a nitro group, or a carbonimidoyl group (Carbonimidoyl group) is meant. Here, the two electron withdrawing groups may be bonded to each other to form a cyclic structure. The salt means a cation such as alkali metal, alkaline earth metal or heavy metal, or an organic cation such as ammonium ion or phosphonium ion. These substituents may be further substituted with these substituents.
These heterocycles may be further condensed with other rings. Further, the substituent is an anionic group _{^{(e.g., -CO 2 -, -SO 3 -}} , -S - , etc.), the nitrogen-containing heterocyclic ring of the present invention is a cation (e.g., pyridinium, triazolium Etc.) to form an inner salt.

When the heterocyclic compound is a pyridine, pyrazine, pyrimidine, pyridazine, phthalazine, triazine, naphthyridine or phenanthroline derivative, a tetrahydrofuran / water (3/2) mixed solution of the conjugate acid of the nitrogen-containing heterocyclic moiety in the acid dissociation equilibrium of the compound The acid dissociation constant (pKa) at 25 ° C. is more preferably 3 to 8. More preferably, the pKa is 4 to 7.
Such a heterocyclic compound is preferably a pyridine, pyridazine or phthalazine derivative, and particularly preferably a pyridine or phthalazine derivative.

  When these heterocyclic compounds have a mercapto group, sulfide group or thione group as a substituent, pyridine, thiazole, isothiazole, oxazole, isoxazole, imidazole, pyrazole, pyrazine, pyrimidine, pyridazine, triazine, triazole, thiadiazole or oxadioxide Diazole derivatives are preferable, and thiazole, imidazole, pyrazole, pyrazine, pyrimidine, pyridazine, triazine, and triazole derivatives are particularly preferable.

  For example, a compound represented by the following general formula (1) or general formula (2) can be used as the silver iodide complex forming agent.

In formula (1), R ¹¹ and R ¹² represents a hydrogen atom or a substituent. In the general formula (2), R ²¹ and R ²² represent a hydrogen atom or a substituent. However, R ¹¹ and R ¹² are not both hydrogen atoms, and R ²¹ and R ²² are not both hydrogen atoms. Examples of the substituent herein include those described as the substituent of the nitrogen-containing 5- to 7-membered heterocyclic silver iodide complex forming agent.

  Moreover, the compound represented by the following general formula (3) can also be preferably used.

In the general formula (3), R ^{31 to} R ³⁵ each independently represents a hydrogen atom or a substituent. Examples of the substituent represented by R ³¹ -R ³⁵ include those described above as the substituent of the nitrogen-containing 5-7-membered heterocyclic silver iodide complex forming agent. When the compound represented by the general formula (3) has a substituent, preferred substitution positions are R ^{32 to} R ³⁴ . R ^{31 to} R ³⁵ may be bonded to each other to form a saturated or unsaturated ring. Preferred are a halogen atom, alkyl group, aryl group, carbamoyl group, hydroxy group, alkoxy group, aryloxy group, carbamoyloxy group, amino group, acylamino group, ureido group, (alkoxy or aryloxy) carbonylamino group, and the like. .

  The compound represented by the general formula (3) has an acid dissociation constant (pKa) at 25 ° C. of 3 to 8 in a tetrahydrofuran / water (3/2) mixed solution of a conjugate acid of a pyridine ring portion. It is preferably 4 to 7, and particularly preferably.

  Furthermore, the compound represented by General formula (4) is also preferable.

In the general formula (4), R ⁴¹ -R ⁴⁴ each independently represent a hydrogen atom or a substituent. R ^{41 to} R ⁴⁴ may be bonded to each other to form a saturated or unsaturated ring. Examples of the substituent represented by R ^{41 to} R ⁴⁴ include those described as the substituent of the nitrogen-containing 5 to 7-membered heterocyclic silver iodide complex forming agent. Preferred groups include alkyl groups, alkenyl groups, alkynyl groups, aryl groups, hydroxy groups, alkoxy groups, aryloxy groups, heterocyclic oxy groups, and the formation of phthalazine rings by benzo condensed rings. When a hydroxyl group is substituted on the carbon adjacent to the nitrogen atom of the compound represented by the general formula (4), an equilibrium exists with pyridazinone.

The compound represented by the general formula (4) more preferably forms a phthalazine ring represented by the following general formula (5), and the phthalazine ring further has at least one substituent. It is particularly preferable. Examples of R ⁵¹ -R ⁵⁶ in the general formula (5) include those described as substituents of the nitrogen-containing 5- to 7-membered heterocyclic silver iodide complex forming agent. More preferred substituents include alkyl groups, alkenyl groups, alkynyl groups, aryl groups, hydroxy groups, alkoxy groups, aryloxy groups and the like. An alkyl group, an alkenyl group, an aryl group, an alkoxy group, and an aryloxy group are preferable, and an alkyl group, an alkoxy group, and an aryloxy group are more preferable.

  A compound represented by the following general formula (6) is also a preferred form.

In the general formula (6), R ^{61 to} R ⁶³ each independently represents a hydrogen atom or a substituent. Examples of the substituent represented by R ⁶² include those described as the substituent of the nitrogen-containing 5 to 7-membered heterocyclic silver iodide complex forming agent.

  A compound represented by the following general formula (7) is preferably used.

In the general formula (7), R ⁷¹ -R ⁷² each independently represent a hydrogen atom or a substituent. L represents a divalent linking group. n represents 0 or 1. Examples of the substituent represented by R ^{71 to} R ⁷² include an alkyl group (including a cycloalkyl group), an alkenyl group (including a cycloalkenyl group), an alkynyl group, an aryl group, a heterocyclic group, an acyl group, and aryloxycarbonyl. Examples include a group, an alkoxycarbonyl group, a carbamoyl group, an imide group, and a composite substituent containing these. The divalent linking group represented by L is preferably a linking group having a length of 1 to 6 atoms, more preferably 1 to 3 atoms, and may further have a substituent.

  One of the compounds preferably used is a compound represented by the general formula (8).

In the general formula (8), R ^{81 to} R ⁸⁴ each independently represents a hydrogen atom or a substituent. Examples of the substituent represented by R ^{81 to} R ⁸⁴ include an alkyl group (including a cycloalkyl group), an alkenyl group (including a cycloalkenyl group), an alkynyl group, an aryl group, a heterocyclic group, an acyl group, and an aryloxycarbonyl. Examples include a group, an alkoxycarbonyl group, a carbamoyl group, and an imide group.

  More preferable among the silver iodide complex-forming agents are compounds represented by the general formulas (3), (4), (5), (6) and (7), and the general formula (3), The compound represented by (5) is particularly preferred.

  Although the preferable example of the silver iodide complex formation agent in this invention is given to the following, this invention is not limited to these.

  The silver iodide complex-forming agent in the present invention may be a common compound with the color tone agent when it functions as a conventionally known color tone agent. The silver iodide complex-forming agent in the present invention can be used in combination with a toning agent. Two or more silver iodide complex forming agents may be used in combination.

  The silver iodide complex-forming agent in the present invention is preferably present in the film in a state separated from the photosensitive silver halide, such as being present in the film in a solid state. It is also preferable to add to the adjacent layer. It is preferable to adjust the melting point of the compound to an appropriate range so that the silver iodide complex-forming agent in the present invention melts when heated to the heat development temperature.

  In the present invention, the absorption intensity of the ultraviolet-visible absorption spectrum of the photosensitive silver halide after heat development is preferably 80% or less, more preferably 40% or less, compared with that before heat development. It is particularly preferable that

The silver iodide complex-forming agent in the present invention may be contained in the coating solution by any method such as a solution form, an emulsified dispersion form, or a solid fine particle dispersion form, and may be contained in the photosensitive material.
Well-known emulsification dispersion methods include dissolving oil using an oil such as dibutyl phthalate, tricresyl phosphate, glyceryl triacetate or diethyl phthalate, or an auxiliary solvent such as ethyl acetate or cyclohexanone, and mechanically emulsifying the dispersion. The method of producing is mentioned.

As the solid fine particle dispersion method, the silver iodide complex-forming powder in the present invention is dispersed in an appropriate solvent such as water by a ball mill, a colloid mill, a vibration ball mill, a sand mill, a jet mill, a roller mill, or an ultrasonic wave. And a method of preparing a solid dispersion. In this case, a protective colloid (for example, polyvinyl alcohol) or a surfactant (for example, an anionic surfactant such as sodium triisopropylnaphthalenesulfonate (a mixture of three isopropyl groups having different substitution positions)) may be used. Good. In the mills, beads such as zirconia are usually used as a dispersion medium, and Zr and the like eluted from these beads may be mixed in the dispersion. Although it depends on the dispersion conditions, it is usually in the range of 1 ppm to 1000 ppm. If the Zr content in the light-sensitive material is 0.5 mg or less per 1 g of silver, there is no practical problem.
The aqueous dispersion preferably contains a preservative (for example, benzoisothiazolinone sodium salt).
The silver iodide complex-forming agent in the present invention is preferably used as a solid dispersion.

  The silver iodide complex-forming agent in the present invention is preferably used in the range of 1 mol% to 5000 mol%, more preferably in the range of 10 mol% to 1000 mol%, relative to the photosensitive silver halide. More preferably, it is the range of 50 mol%-300 mol%.

(Description of binder)
Any polymer may be used as the binder of the organic silver salt-containing layer of the present invention, and suitable binders are transparent or translucent and generally colorless, and include natural resins, polymers and copolymers, synthetic resins, polymers and copolymers, etc. Film-forming media such as gelatins, rubbers, poly (vinyl alcohol) s, hydroxyethyl celluloses, cellulose acetates, cellulose acetate butyrates, poly (vinyl pyrrolidone) s, casein, starch, poly (acrylic acid) ), Poly (methyl methacrylic acid), poly (vinyl chloride), poly (methacrylic acid), styrene-maleic anhydride copolymers, styrene-acrylonitrile copolymers, styrene-butadiene copolymers , Poly (vinyl acetal) s (eg, poly (vinyl Lumar) and poly (vinyl butyral)), poly (esters), poly (urethane) s, phenoxy resins, poly (vinylidene chloride) s, poly (epoxides), poly (carbonates), poly (vinyl acetate) s , Poly (olefin) s, cellulose esters, and poly (amides). The binder may be coated from water or an organic solvent or emulsion.

  In the present invention, the glass transition temperature of the binder that can be used in combination with the layer containing the organic silver salt is preferably 0 ° C. or higher and 80 ° C. or lower (hereinafter sometimes referred to as a high Tg binder), and preferably 10 ° C. to 70 ° C. Is more preferable, and it is still more preferable that it is 15 to 60 degreeC.

In this specification, Tg was calculated by the following formula.
1 / Tg = Σ (Xi / Tgi)
Here, it is assumed that n monomer components from i = 1 to n are copolymerized in the polymer. Xi is the weight fraction of the i-th monomer (ΣXi = 1), and Tgi is the glass transition temperature (absolute temperature) of the homopolymer of the i-th monomer. However, Σ is the sum from i = 1 to n. The homopolymer glass transition temperature (Tgi) of each monomer was the value of Polymer Handbook (3rd Edition) (by J. Brandrup, EH Immergut (Wiley-Interscience, 1989)).

  Two or more binders may be used in combination as required. Further, a glass transition temperature of 20 ° C. or higher and a glass transition temperature of less than 20 ° C. may be used in combination. When two or more kinds of polymers having different Tg are blended, the weight average Tg is preferably within the above range.

In the present invention, the organic silver salt-containing layer is preferably applied and dried using a coating solution in which 30% by mass or more of the solvent is water to form a film.
In the present invention, when the organic silver salt-containing layer is formed using a coating solution in which 30% by mass or more of the solvent is water and dried, the binder of the organic silver salt-containing layer is further added to an aqueous solvent ( When it is soluble or dispersible in an aqueous solvent), the performance is improved particularly when it is made of a latex of a polymer having an equilibrium water content of 2% by mass or less at 25 ° C. and 60% RH. The most preferable form is one prepared so that the ionic conductivity is 2.5 mS / cm or less, and as such a preparation method, there is a method of performing purification treatment using a separation functional membrane after polymer synthesis.

  The aqueous solvent in which the polymer is soluble or dispersible here is a mixture of water or water and 70% by mass or less of a water-miscible organic solvent. Examples of the water-miscible organic solvent include alcohols such as methyl alcohol, ethyl alcohol and propyl alcohol, cellosolves such as methyl cellosolve, ethyl cellosolve and butyl cellosolve, ethyl acetate and dimethylformamide.

  In the case of a system in which the polymer is not dissolved thermodynamically and exists in a so-called dispersed state, the term aqueous solvent is used here.

The “equilibrium moisture content at 25 ° C. and 60% RH” is the following using the weight W1 of the polymer in the humidity-controlled equilibrium under the atmosphere of 25 ° C. and 60% RH and the weight W0 of the polymer in the absolutely dry state at 25 ° C. It can be expressed as
Equilibrium water content at 25 ° C. and 60% RH = [(W1-W0) / W0] × 100 (mass%)

  For the definition and measurement method of moisture content, for example, Polymer Engineering Course 14, Polymer Material Testing Method (Edited by Society of Polymer Sciences, Jinshokan) can be referred to.

  The equilibrium moisture content at 25 ° C. and 60% RH of the binder polymer of the present invention is preferably 2% by mass or less, more preferably 0.01% by mass or more and 1.5% by mass or less, and further preferably 0.02% by mass. % To 1% by mass is desirable.

  In the present invention, a polymer dispersible in an aqueous solvent is particularly preferred. Examples of the dispersed state may be either latex in which fine particles of a water-insoluble hydrophobic polymer are dispersed or polymer molecules dispersed in a molecular state or a micelle form. preferable. The average particle size of the dispersed particles is 1 to 50000 nm, preferably 5 to 1000 nm, more preferably 10 to 500 nm, and still more preferably 50 to 200 nm. The particle size distribution of the dispersed particles is not particularly limited, and may have a wide particle size distribution or a monodispersed particle size distribution. Mixing two or more types having a monodispersed particle size distribution is also a preferable method for controlling the physical properties of the coating solution.

  In the present invention, preferred embodiments of the polymer that can be dispersed in an aqueous solvent include acrylic polymers, poly (esters), rubbers (eg, SBR resin), poly (urethanes), poly (vinyl chloride) s, poly (acetic acid). Hydrophobic polymers such as vinyl), poly (vinylidene chloride) and poly (olefin) can be preferably used. These polymers may be linear polymers, branched polymers, crosslinked polymers, so-called homopolymers obtained by polymerizing a single monomer, or copolymers obtained by polymerizing two or more types of monomers. In the case of a copolymer, it may be a random copolymer or a block copolymer. These polymers have a number average molecular weight of 5,000 to 1,000,000, preferably 10,000 to 200,000. When the molecular weight is too small, the mechanical strength of the image forming layer is insufficient, and when the molecular weight is too large, the film formability is poor, which is not preferable. Further, a crosslinkable polymer latex is particularly preferably used.

<Specific examples of latex>
Specific examples of preferable polymer latex include the following. Below, it represents using a raw material monomer, the numerical value in a parenthesis is the mass%, and molecular weight is a number average molecular weight. When a polyfunctional monomer was used, the concept of molecular weight was not applicable because a crosslinked structure was formed, so it was described as crosslinkability, and the description of molecular weight was omitted. Tg represents the glass transition temperature.

Latex of P-1; -MMA (70) -EA (27) -MAA (3)-(molecular weight 37000, Tg 61 ° C.)
Latex of P-2; -MMA (70) -2EHA (20) -St (5) -AA (5)-(molecular weight 40000, Tg 59 ° C.)
P-3; latex of -St (50) -Bu (47) -MAA (3)-(crosslinkability, Tg-17 ° C)
Latex of P-4; -St (68) -Bu (29) -AA (3)-(crosslinkability, Tg 17 ° C.)
Latex of P-5; -St (71) -Bu (26) -AA (3)-(crosslinkability, Tg 24 ° C.)
Latex of P-6; -St (70) -Bu (27) -IA (3)-(crosslinkability)
Latex of P-7; -St (75) -Bu (24) -AA (1)-(crosslinkability, Tg 29 ° C.)
P-8; Latex (crosslinkable) of -St (60) -Bu (35) -DVB (3) -MAA (2)-
Latex (crosslinkability) of P-9; -St (70) -Bu (25) -DVB (2) -AA (3)-
P-10; latex of VC (50) -MMA (20) -EA (20) -AN (5) -AA (5)-(molecular weight 80000)
P-11; latex of VDC (85) -MMA (5) -EA (5) -MAA (5)-(molecular weight 67000)
Latex of P-12; -Et (90) -MAA (10)-(molecular weight 12000)
P-13; Latex of -St (70) -2EHA (27) -AA (3) (molecular weight 130000, Tg 43 ° C)
P-14; latex of MMA (63) -EA (35) -AA (2) (molecular weight 33,000, Tg 47 ° C.)
Latex of P-15; -St (70.5) -Bu (26.5) -AA (3)-(crosslinkability, Tg 23 ° C.)
Latex of P-16; -St (69.5) -Bu (27.5) -AA (3)-(crosslinkability, Tg 20.5 ° C)

  The abbreviations for the above structures represent the following monomers. MMA; methyl methacrylate, EA; ethyl acrylate, MAA; methacrylic acid, 2EHA; 2-ethylhexyl acrylate, St; styrene, Bu; butadiene, AA; acrylic acid, DVB; divinylbenzene, VC; vinyl chloride, AN; Vinylidene chloride, Et; ethylene, IA; itaconic acid.

  The polymer latex described above is also commercially available, and the following polymers can be used. Examples of the acrylic polymer include Sebian A-4635, 4718, 4601 (manufactured by Daicel Chemical Industries, Ltd.), Nipol Lx811, 814, 821, 820, 857 (manufactured by Nippon Zeon Co., Ltd.), poly ( Examples of esters) include, for example, poly (urethanes) such as FINITEX ES650, 611, 675, 850 (above Dainippon Ink and Chemicals), WD-size, WMS (Eastman Chemical). Examples of rubbers such as HYDRAN AP10, 20, 30, 40 (above made by Dainippon Ink Chemical Co., Ltd.) include LACSTAR 7310K, 3307B, 4700H, 7132C (made by Dainippon Ink Chemical Co., Ltd.) , Nipol Lx416, 410, 438C, 2507 (all manufactured by Nippon Zeon Co., Ltd.) However, examples of poly (vinyl chloride) include G351 and G576 (manufactured by Nippon Zeon Co., Ltd.), and examples of poly (vinylidene chloride) include L502 and L513 (manufactured by Asahi Kasei Kogyo Co., Ltd.). Examples of poly (olefin) s include Chemipearl S120, SA100 (manufactured by Mitsui Petrochemical Co., Ltd.).

  These polymer latexes may be used alone or in combination of two or more as required.

<Preferred latex>
As the polymer latex used in the present invention, a styrene-butadiene copolymer latex is particularly preferable. The weight ratio of the styrene monomer unit to the butadiene monomer unit in the styrene-butadiene copolymer is preferably 40:60 to 95: 5. The proportion of the styrene monomer unit and the butadiene monomer unit in the copolymer is preferably 60 to 99% by mass. Moreover, it is preferable that the polymer latex of this invention contains 1-6 mass% of acrylic acid or methacrylic acid with respect to the sum of styrene and butadiene, More preferably, it contains 2-5 mass%. The polymer latex of the present invention preferably contains acrylic acid. The preferred molecular weight range is the same as described above.

  Examples of latexes of styrene-butadiene acid copolymer that are preferably used in the present invention include the aforementioned P-3 to P-8,15, commercially available LACSTAR-3307B, 7132C, Nipol Lx416, and the like.

  If necessary, a hydrophilic polymer such as gelatin, polyvinyl alcohol, methylcellulose, hydroxypropylcellulose, carboxymethylcellulose may be added to the organic silver salt-containing layer of the light-sensitive material of the present invention. The amount of these hydrophilic polymers added is preferably 30% by mass or less, more preferably 20% by mass or less, based on the total binder of the organic silver salt-containing layer.

  The organic silver salt-containing layer (that is, the image forming layer) of the present invention is preferably formed using a polymer latex. The amount of binder in the organic silver salt-containing layer is such that the weight ratio of total binder / organic silver salt is 1/10 to 10/1, more preferably 1/3 to 5/1, and still more preferably 1/1 to 3/1. / 1 range.

  In addition, such an organic silver salt-containing layer is usually a photosensitive layer (emulsion layer) containing a photosensitive silver halide which is a photosensitive silver salt. The weight ratio of silver is 400-5, more preferably 200-10.

The total binder amount of the image forming layer of the present invention is preferably 0.2 g / m ^{2 to} 30 g / m ² , more preferably 1 g / m ^{2 to} 15 g / m ² , and still more preferably 2 g / m ^{2 to} 10 g / m ^2. Range. The image forming layer of the present invention may contain a crosslinking agent for crosslinking, a surfactant for improving coating properties, and the like.
<Preferable solvent for coating solution>

  In the present invention, the solvent of the organic silver salt-containing layer coating solution of the light-sensitive material (here, for simplicity, the solvent and the dispersion medium are collectively referred to as a solvent) is preferably an aqueous solvent containing 30% by mass or more of water. As a component other than water, any water-miscible organic solvent such as methyl alcohol, ethyl alcohol, isopropyl alcohol, methyl cellosolve, ethyl cellosolve, dimethylformamide, and ethyl acetate may be used. The water content of the solvent of the coating solution is preferably 50% by mass or more, more preferably 70% by mass or more. Examples of preferred solvent compositions include water, water / methyl alcohol = 90/10, water / methyl alcohol = 70/30, water / methyl alcohol / dimethylformamide = 80/15/5, water / methyl alcohol / Ethyl cellosolve = 85/10/5, water / methyl alcohol / isopropyl alcohol = 85/10/5, etc. (numerical values are mass%).

(Description of antifogging agent)
Antifoggants, stabilizers and stabilizer precursors which can be used in the present invention are disclosed in paragraph No. 0070 of JP-A No. 10-62899, page 20, line 57 to page 21, line 7 of European Patent Publication No. 0803764A1. Compounds described in JP-A-9-281737 and JP-A-9-329864, compounds described in US Pat. Nos. 6,083,681, 6,083,681, and European Patent 1048875 It is done. The antifoggant preferably used in the present invention is an organic halide, and examples thereof include those disclosed in the patents described in paragraph Nos. 0111 to 0112 of JP-A No. 11-65021. In particular, an organic halogen compound represented by formula (P) in JP-A No. 2000-284399, an organic polyhalogen compound represented by formula (II) in JP-A No. 10-339934, JP-A No. 2001-31644 and JP-A No. 2001-31644 are disclosed. The organic polyhalogen compounds described in 2001-33911 are preferred.

1) Organic polyhalogen compound Hereinafter, preferred organic polyhalogen compounds in the present invention will be described in detail. A preferred polyhalogen compound of the present invention is a compound represented by the following general formula (H).
General formula (H)
Q- (Y) n-C (Z ₁ ) (Z ₂ ) X
In the general formula (H), Q represents an alkyl group, an aryl group or a heterocyclic group, Y represents a divalent linking group, n represents 0 or 1, Z ₁ and Z ₂ represent a halogen atom, X represents a hydrogen atom or an electron withdrawing group.
In general formula (H), Q is preferably an aryl group or a heterocyclic group.
In the general formula (H), when Q is a heterocyclic group, a nitrogen-containing heterocyclic group containing 1 to 2 nitrogen atoms is preferable, and a 2-pyridyl group and a 2-quinolyl group are particularly preferable.
In the general formula (H), when Q is an aryl group, Q preferably represents a phenyl group substituted with an electron-attracting group having a positive Hammett's substituent constant σp. For Hammett's substituent constants, see Journal of Medicinal Chemistry, 1973, Vol. 16, no. 11, 1207-1216 etc. can be referred to. Examples of such an electron withdrawing group include a halogen atom (fluorine atom (σp value: 0.06), chlorine atom (σp value: 0.23), bromine atom (σp value: 0.23), iodine atom. (Σp value: 0.18)), trihalomethyl group (tribromomethyl (σp value: 0.29), trichloromethyl (σp value: 0.33), trifluoromethyl (σp value: 0.54)), Cyano group (σp value: 0.66), nitro group (σp value: 0.78), aliphatic aryl, or heterocyclic sulfonyl group (for example, methanesulfonyl (σp value: 0.72)), aliphatic aryl Or a heterocyclic acyl group (for example, acetyl (σp value: 0.50), benzoyl (σp value: 0.43)), alkynyl group (for example, C≡CH (σp value: 0.23)), aliphatic Aryl or heterocyclic oxycarbo Group (for example, methoxycarbonyl (σp value: 0.45), phenoxycarbonyl (σp value: 0.44)), carbamoyl group (σp value: 0.36), sulfamoyl group (σp value: 0.57), Examples thereof include a sulfoxide group, a heterocyclic group, and a phosphoryl group. The σp value is preferably in the range of 0.2 to 2.0, more preferably in the range of 0.4 to 1.0. Particularly preferred as the electron withdrawing group is a carbamoyl group, an alkoxycarbonyl group, an alkylsulfonyl group or an alkylphosphoryl group, and among them, a carbamoyl group is most preferred.
X is preferably an electron-withdrawing group, more preferably a halogen atom, aliphatic / aryl or heterocyclic sulfonyl group, aliphatic / aryl or heterocyclic acyl group, aliphatic / aryl or heterocyclic oxycarbonyl group, A carbamoyl group and a sulfamoyl group, particularly preferably a halogen atom. Among the halogen atoms, a chlorine atom, a bromine atom and an iodine atom are preferable, a chlorine atom and a bromine atom are more preferable, and a bromine atom is particularly preferable.
Y preferably represents —C (═O) —, —SO— or —SO ₂ —, more preferably —C (═O) — or —SO ₂ —, and particularly preferably —SO ₂ —. . n represents 0 or 1, and is preferably 1.

  Specific examples of the compound of the general formula (H) of the present invention are shown below.

Other preferred polyhalogen compounds of the present invention include compounds described in JP-A Nos. 2001-31644, 2001-56526, and 2001-209145.
The compound represented by the general formula (H) of the present invention is preferably used in the range of 10 ⁻⁴ mol to 1 mol, more preferably 10 ⁻³ mol, per mol of the non-photosensitive silver salt in the image forming layer. It is preferable to use in the range of ˜0.5 mol, more preferably in the range of 1 × 10 ⁻² mol to 0.2 mol.
In the present invention, the antifoggant is added to the light-sensitive material by the method described in the method for containing a reducing agent, and the organic polyhalogen compound is also preferably added as a solid fine particle dispersion.

2) Other antifoggants Other antifoggants include mercury (II) salts described in paragraph No. 0113 of JP-A No. 11-65021, benzoic acids described in paragraph No. 0114 of the same, salicylic acid derivatives disclosed in JP-A No. 2000-206642, A formalin scavenger compound represented by the formula (S) in JP-A-2000-221634, a triazine compound according to claim 9 in JP-A-11-352624, and a compound represented by the general formula (III) in JP-A-6-11791 4-hydroxy-6-methyl-1,3,3a, 7-tetrazaindene and the like.

The photothermographic material in the invention may contain an azolium salt for the purpose of fog prevention. Examples of the azolium salt include compounds represented by general formula (XI) described in JP-A-59-193447, compounds described in JP-B-55-12581, and general formula (II) described in JP-A-60-153039. And the compounds represented. The azolium salt may be added to any part of the photosensitive material, but the addition layer is preferably added to the layer having the photosensitive layer, and more preferably to the organic silver salt-containing layer. The azolium salt may be added at any step in the coating solution preparation. When added to the organic silver salt-containing layer, any step from the preparation of the organic silver salt to the preparation of the coating solution may be used. To immediately before coating. The azolium salt may be added by any method such as powder, solution, fine particle dispersion. Moreover, you may add as a solution mixed with other additives, such as a sensitizing dye, a reducing agent, and a color toning agent. In the present invention, the azolium salt may be added in any amount, but it is preferably 1 × 10 ⁻⁶ mol or more and 2 mol or less, more preferably 1 × 10 ⁻³ mol or more and 0.5 mol or less per 1 mol of silver.

(Other additives)
1) Mercapto, disulfide, and thiones In the present invention, mercapto compounds and disulfide compounds are used to control development by suppressing or accelerating development, to improve spectral sensitization efficiency, and to improve storage stability before and after development. And thione compounds, paragraphs 0067 to 0069 of JP-A-10-62899, compounds represented by formula (I) of JP-A-10-186572, and specific examples thereof include paragraph numbers 0033 to 0052. , European Patent Publication No. 0803764A1, page 20, lines 36-56. Of these, mercapto-substituted heteroaromatic compounds described in JP-A-9-297367, JP-A-9-304875, JP-A-2001-100388, JP-A-2001-104213, JP-A-2001-104214, and the like are preferable.

2) Toning Agent In the photothermographic material of the present invention, it is preferable to add a toning agent. For the toning agent, paragraph Nos. 0054 to 0055 of JP-A No. 10-62899, page 21 to No. 23 of European Patent Publication No. 0803764A1. Line 48, described in JP-A No. 2000-356317 and JP-A No. 2000-187298, and in particular, phthalazinones (phthalazinone, phthalazinone derivatives or metal salts; for example, 4- (1-naphthyl) phthalazinone, 6-chlorophthalazinone. 5,7-dimethoxyphthalazinone and 2,3-dihydro-1,4-phthalazinedione); phthalazinones and phthalic acids (eg, phthalic acid, 4-methylphthalic acid, 4-nitrophthalic acid, diammonium phthalate) , Sodium phthalate, potassium phthalate and tetrachlorophthalic anhydride) Phthalazines (phthalazine, phthalazine derivatives or metal salts; for example, 4- (1-naphthyl) phthalazine, 6-isopropylphthalazine, 6-t-butylphthalazine, 6-chlorophthalazine, 5,7-dimethoxy Phthalazine and 2,3-dihydrophthalazine); a combination of phthalazines and phthalic acids is preferred, and a combination of phthalazines and phthalic acids is particularly preferred. Of these, a particularly preferred combination is a combination of 6-isopropylphthalazine and phthalic acid or 4-methylphthalic acid.

3) Plasticizers and lubricants Plasticizers and lubricants that can be used in the photosensitive layer of the present invention are described in paragraph No. 0117 of JP-A No. 11-65021. The slip agent is described in JP-A No. 11-84573, paragraph numbers 0061 to 0064 and Japanese Patent Application No. 11-106881, paragraph numbers 0049 to 0062.

4) Dye and Pigment The photosensitive layer of the present invention has various dyes and pigments (for example, CI Pigment Blue 60, CI Pigment, etc.) from the viewpoints of color tone improvement, prevention of interference fringes during laser exposure, and prevention of irradiation. Blue 64, CI Pigment Blue 15: 6) can be used. These are described in detail in WO98 / 36322, JP-A-10-268465, JP-A-11-338098 and the like.

5) Nucleator The photothermographic material of the invention may contain a nucleator in the image forming layer. As for the nucleating agent and its addition method and addition amount, the formula (H of JP-A-11-65021, paragraph number 0118, JP-A-11-223898, paragraph numbers 0136 to 0193, and Japanese Patent Application No. ), Formulas (1) to (3), compounds of formulas (A) and (B), compounds of general formulas (III) to (V) described in Japanese Patent Application No. 11-91652 (specific compounds: 21 to 24) and the high contrast accelerator are described in paragraph No. 0102 of JP-A No. 11-65021 and paragraph Nos. 0194 to 0195 of JP-A No. 11-223898.

In order to use formic acid or formate as a strong fogging substance, it is preferably contained at 5 mmol or less, more preferably 1 mmol or less, per mol of silver on the side having the image forming layer containing photosensitive silver halide.
When a nucleating agent is used in the photothermographic material of the invention, it is preferable to use an acid formed by hydrating diphosphorus pentoxide or a salt thereof in combination. Acids or salts thereof formed by hydration of diphosphorus pentoxide include metaphosphoric acid (salt), pyrophosphoric acid (salt), orthophosphoric acid (salt), triphosphoric acid (salt), tetraphosphoric acid (salt), hexametalin An acid (salt) etc. can be mentioned. Examples of the acid or salt thereof formed by hydrating diphosphorus pentoxide particularly preferably include orthophosphoric acid (salt) and hexametaphosphoric acid (salt). Specific examples of the salt include sodium orthophosphate, sodium dihydrogen orthophosphate, sodium hexametaphosphate, ammonium hexametaphosphate and the like.
The amount of acid or salt thereof formed by hydration of diphosphorus pentoxide (the coating amount per 1 m ^{2 of} photosensitive material) may be a desired amount according to the performance such as sensitivity and fog, but is 0.1 mg / m ^2. ˜500 mg / m ² is preferable, and 0.5 mg / m ^{2 to} 100 mg / m ² is more preferable.

(Preparation and application of coating solution)
The preparation temperature of the image forming layer coating solution of the present invention is preferably from 30 ° C. to 65 ° C., more preferably from 35 ° C. to less than 60 ° C., and more preferably from 35 ° C. to 55 ° C. Moreover, it is preferable that the temperature of the image forming layer coating liquid immediately after the addition of the polymer latex is maintained at 30 ° C. or higher and 65 ° C. or lower.

(Layer structure and components)
The image forming layer of the present invention is composed of one or more layers on a support. In the case of a single layer, it consists of an organic silver salt, a photosensitive silver halide, a reducing agent and a binder, and optionally contains additional materials such as toning agents, coating aids and other auxiliary agents. In the case of two or more layers, an organic silver salt and a light-sensitive silver halide are contained in the first image forming layer (usually a layer adjacent to the support), and some in the second image forming layer or both layers. Must contain other ingredients.
The photothermographic material of the present invention can have a non-photosensitive layer in addition to the image forming layer. The non-photosensitive layer includes (a) a surface protective layer provided on the image forming layer (on the side farther than the support), (b) between the plurality of image forming layers and between the image forming layer and the protective layer. It can be classified into an intermediate layer provided therebetween, (c) an undercoat layer provided between the image forming layer and the support, and (d) a back layer provided on the opposite side of the image forming layer.

  In addition, although a layer acting as an optical filter can be provided, it is provided as the layer (a) or (b). The antihalation layer is provided on the photosensitive material as the layer (c) or (d).

1) Surface protective layer The photothermographic material according to the invention may be provided with a surface protective layer for the purpose of preventing adhesion of the image forming layer. The surface protective layer may be a single layer or a plurality of layers.
The surface protective layer is described in JP-A No. 11-65021, paragraph numbers 0119 to 0120 and JP-A No. 2000-171936.
As the binder for the surface protective layer of the present invention, gelatin is preferable, but it is also preferable to use polyvinyl alcohol (PVA) or a combination thereof. As gelatin, inert gelatin (for example, Nitta gelatin 750), phthalated gelatin (for example, Nitta gelatin 801), and the like can be used. Examples of PVA include those described in paragraph Nos. 0009 to 0020 of JP-A No. 2000-171936. Completely saponified PVA-105, partially saponified PVA-205, PVA-335, and modified polyvinyl alcohol MP- Preferred is 203 (trade name, manufactured by Kuraray Co., Ltd.). Preferably 0.3g / m ² ~4.0g / m ² as a polyvinyl alcohol coating amount (per support 1 m ²⁾ of the protective layer (per one ^{layer), 0.3g / m 2 ~2.0g /} m 2 Is more preferable.

All (including water-soluble polymer and latex polymer) binder preferably 0.3g / m ² ~5.0g / m ² as a coating amount (per support 1 m ²⁾ of the surface protective layer (per one layer), 0. 3g / m ² ~2.0g / m ² is more preferable.

2) Antihalation layer In the photothermographic material of the invention, the antihalation layer can be provided on the side farther from the light source than the photosensitive layer.

As for the antihalation layer, paragraphs 0123 to 0124 of JP-A-11-65021, JP-A-11-223898, 9-230531, 10-36695, 10-104779, 11-231457, 11 -352625, 11-352626 and the like.
The antihalation layer contains an antihalation dye having absorption at the exposure wavelength. When the exposure wavelength is in the infrared region, an infrared absorbing dye may be used, and in that case, a dye having no absorption in the visible region is preferable.
When antihalation is performed using a dye having absorption in the visible range, it is preferable that substantially no dye color remains after image formation, and a means for decoloring by the heat of heat development is used. In particular, it is preferable to add a thermally decolorable dye and a base precursor to the non-photosensitive layer to function as an antihalation layer. These techniques are described in JP-A-11-231457 and the like.

The amount of decoloring dye added is determined by the use of the dye. In general, the optical density (absorbance) measured at the target wavelength is used in an amount exceeding 0.1. The optical density is preferably 0.15 to 2, and more preferably 0.2 to 1. The amount of the dye for obtaining such an optical density is generally 0.001g / m ² ~1g / m ² approximately.

When the dye is decolored in this way, the optical density after heat development can be reduced to 0.1 or less. Two or more kinds of decoloring dyes may be used in combination in a heat decoloring type photothermographic material or photothermographic material. Similarly, two or more kinds of base precursors may be used in combination.
In thermal decoloration using such decoloring dye and base precursor, substances that lower the melting point by 3 ° C. or more when mixed with a base precursor as described in JP-A-11-352626 (for example, diphenylsulfone, 4-chlorophenyl, etc.) (Phenyl) sulfone), 2-naphthylbenzoate, and the like are preferably used in view of thermal decoloring properties.

3) Back Layer Back layers that can be applied to the present invention are described in paragraph Nos. 0128 to 0130 of JP-A No. 11-65021.

In the present invention, a colorant having an absorption maximum at 300 to 450 nm can be added for the purpose of improving the silver color tone and the temporal change of the image. Such colorants are disclosed in JP-A-62-210458, JP-A-63-104046, JP-A-63-103235, JP-A-63-208846, JP-A-63-306436, JP-A-63-141435, and JP-A-01-61745. No. 1, Japanese Patent Laid-Open No. 2001-100363, and the like.
Such a colorant is usually added in the range of 0.1 mg / m ^{2 to 1} g / m ² , and the back layer provided on the opposite side of the photosensitive layer is preferable as the layer to be added.
In order to adjust the base color tone, it is preferable to use a dye having an absorption peak at 580 to 680 nm. As the dye for this purpose, azomethine oil-soluble dyes described in JP-A-4-359967 and JP-A-4-359968, which have a small absorption intensity on the short wavelength side, and phthalocyanine water-soluble dyes described in Japanese Patent Application No. 2002-96797 are preferable. The dye for this purpose may be added to any layer, but is more preferably added to the non-photosensitive layer on the emulsion surface side or the back surface side.

4) Matting Agent In the present invention, it is preferable to add a matting agent for improving transportability, and the matting agent is described in paragraph Nos. 0126 to 0127 of JP-A No. 11-65021. When the matting agent is indicated by the coating amount per the photosensitive material 1 m ^2, preferably from ^{1mg / m 2 ~400mg / m 2} , more preferably ^{5mg / m 2 ~300mg / m 2} .
In the present invention, the shape of the matting agent may be either a regular shape or an irregular shape, but is preferably a regular shape, and a spherical shape is preferably used. The average particle size is preferably 0.5 μm to 10 μm, more preferably 1.0 μm to 8.0 μm, and still more preferably 2.0 μm to 6.0 μm. The variation coefficient of the size distribution is preferably 50% or less, more preferably 40% or less, and still more preferably 30% or less. Here, the coefficient of variation is a value represented by (standard deviation of particle size) / (average value of particle size) × 100. It is also preferable to use two types of matting agents having a small variation coefficient and having an average particle size ratio larger than 3.
The emulsion surface may have any matte degree as long as no stardust failure occurs, but the Beck smoothness is preferably 30 seconds or more and 2000 seconds or less, and particularly preferably 40 seconds or more and 1500 seconds or less. The Beck smoothness can be easily determined by Japanese Industrial Standard (JIS) P8119 "Smoothness test method using Beck tester for paper and paperboard" and TAPPI standard method T479.

  In the present invention, the matte degree of the back layer is preferably a Beck smoothness of 1200 seconds or less and 10 seconds or more, preferably 800 seconds or less and 20 seconds or more, and more preferably 500 seconds or less and 40 seconds or more.

  In the present invention, the matting agent is preferably contained in the outermost surface layer of the photosensitive material, the layer functioning as the outermost surface layer, or a layer close to the outer surface, and is contained in a layer acting as a so-called protective layer. It is preferable.

5) Polymer Latex When the photothermographic material of the present invention is used for printing applications in which dimensional change is a problem, it is preferable to use a polymer latex for the surface protective layer or the back layer. For such polymer latex, “Synthetic resin emulsion (Hiraku Okuda, Hiroshi Inagaki, published by Kobunshi Publishing (1978))”, “Application of synthetic latex (Takaaki Sugimura, Ikuo Kataoka, Junichi Suzuki, Keiji Kasahara, Takashi "Molecular Publications (1993))" and "Synthetic Latex Chemistry (Muroichi Muroi, published by High Polymers Publication (1970))", specifically, methyl methacrylate (33.5% by mass) / Ethyl acrylate (50 wt%) / methacrylic acid (16.5 wt%) copolymer latex, methyl methacrylate (47.5 wt%) / butadiene (47.5 wt%) / itaconic acid (5 wt%) copolymer Latex, latex of ethyl acrylate / methacrylic acid copolymer, methyl methacrylate (58.9% by mass) / 2-ethyl Latex of xyl acrylate (25.4 mass%) / styrene (8.6 mass%) / 2-hydroxyethyl methacrylate (5.1 mass%) / acrylic acid (2.0 mass%) copolymer, methyl methacrylate (64. 0 mass%) / styrene (9.0 mass%) / butyl acrylate (20.0 mass%) / 2-hydroxyethyl methacrylate (5.0 mass%) / acrylic acid (2.0 mass%) copolymer latex, etc. Is mentioned. Furthermore, as a binder for the surface protective layer, a combination of polymer latex described in Japanese Patent Application No. 11-6872 and a technique described in Paragraph Nos. 0021 to 0025 of Japanese Patent Application Laid-Open No. 2000-267226, Japanese Patent Application No. 11-6872 The technology described in paragraph numbers 0027 to 0028 of the specification and the technology described in paragraph numbers 0023 to 0041 of JP 2000-19678 may be applied. The ratio of the polymer latex in the surface protective layer is preferably 10% by mass or more and 90% by mass or less, and particularly preferably 20% by mass or more and 80% by mass or less of the total binder.

6) Membrane pH
The photothermographic material of the present invention preferably has a film surface pH of 7.0 or less, more preferably 6.6 or less before heat development. The lower limit is not particularly limited, but is about 3. The most preferred pH range is in the range of 4 to 6.2. For the adjustment of the film surface pH, it is preferable to use an organic acid such as a phthalic acid derivative, a non-volatile acid such as sulfuric acid, and a volatile base such as ammonia from the viewpoint of reducing the film surface pH. In particular, ammonia is volatile and is preferable for achieving a low film surface pH because it can be removed before the coating process or heat development.
In addition, it is also preferable to use ammonia in combination with a nonvolatile base such as sodium hydroxide, potassium hydroxide, or lithium hydroxide. In addition, the measuring method of film surface pH is described in paragraph number 0123 of Unexamined-Japanese-Patent No. 2000-284399.

7) Hardener A hardener may be used for each layer such as the photosensitive layer, protective layer, and back layer of the present invention. Examples of hardeners include T.W. H. There are various methods described in "THE THEORY OF THE PHOTOGRAPHIC PROCESS FOURTH EDITION" written by James (published by Macmillan Publishing Co., Inc., published in 1977), pages 77 to 87. -S-triazine sodium salt, N, N-ethylenebis (vinylsulfoneacetamide), N, N-propylenebis (vinylsulfoneacetamide), polyvalent metal ions described on page 78 of the same, U.S. Pat. No. 4,281, Polyisocyanates such as 060 and JP-A-6-208193, epoxy compounds such as US Pat. No. 4,791,042, and vinyl sulfone compounds such as JP-A 62-89048 are preferably used.

  The hardening agent is added as a solution, and the addition time of this solution into the protective layer coating solution is from 180 minutes before to immediately before application, preferably from 60 minutes to 10 seconds before application. As long as the effects of the present invention are sufficiently exhibited, there is no particular limitation. Specific mixing methods include mixing in a tank in which the average residence time calculated from the addition flow rate and the amount of liquid fed to the coater is a desired time, and N.I. Harnby, M.M. F. Edwards, A.D. W. There is a method using a static mixer described in Chapter 8 of Nienow's “Liquid Mixing Technology” (Nikkan Kogyo Shimbun, 1989), translated by Koji Takahashi.

8) Surfactant Regarding the surfactant for coating of the present invention, paragraph No. 0132 of JP-A No. 11-65021, paragraph No. 0133 of the solvent, paragraph No. 0134 of the support, and antistatic or conductive layer Paragraph No. 0135 for the method of obtaining a color image, paragraph No. 0136 for JP-A No. 11-84573 and paragraph Nos. 0049 to 0062 of Japanese Patent Application No. 11-106881 for the slip agent. Has been.

9) Support The transparent support was subjected to a heat treatment in a temperature range of 130 to 185 ° C. in order to relieve internal strain remaining in the film during biaxial stretching and to eliminate heat shrinkage strain generated during heat development processing. Polyester, particularly polyethylene terephthalate is preferably used. In the case of a photothermographic material for medical use, the transparent support may be colored with a blue dye (for example, dye-1 described in Examples of JP-A-8-240877) or may be uncolored. Examples of the support include water-soluble polyesters disclosed in JP-A-11-84574, styrene-butadiene copolymers described in JP-A-10-186565, and vinylidene chloride described in JP-A-2000-39684 and Japanese Patent Application No. 11-106881, paragraphs 0063-0080. It is preferable to apply an undercoating technique such as a copolymer. When the emulsion layer or the back layer is coated on the support, the water content of the support is preferably 0.5% by mass or less.

10) Other additives The photothermographic material may further contain an antioxidant, a stabilizer, a plasticizer, an ultraviolet absorber or a coating aid. Various additives are added to either the photosensitive layer or the non-photosensitive layer. With respect to these, WO 98/36322, EP 803764A1, JP-A-10-186567, 10-18568 and the like can be referred to.

11) Coating method The photothermographic material in the invention may be coated by any method. Specifically, various coating operations including extrusion coating, slide coating, curtain coating, dip coating, knife coating, flow coating, or extrusion coating using a hopper of the type described in US Pat. No. 2,681,294. And Stephen F. Kistler, Peter M. et al. Extrusion coating or slide coating described in pages 399 to 536 of “LIQUID FILM COATING” (CHAPMAN & HALL, 1997) by Schweizer is preferably used, and slide coating is particularly preferably used. An example of the shape of a slide coater used for slide coating is shown in FIG. 11b. 1 If desired, two or more layers can be simultaneously coated by the method described on pages 399 to 536 of the same document, the method described in US Pat. No. 2,761,791 and British Patent No. 837,095. . In the present invention, particularly preferred coating methods are those described in JP-A Nos. 2001-194748, 2002-153808, 2002-153803, and 2002-182333.

The organic silver salt-containing layer coating solution in the present invention is preferably a so-called thixotropic fluid. Regarding this technique, JP-A-11-52509 can be referred to. The organic silver salt-containing layer coating solution in the present invention has a viscosity at a shear rate of 0.1 S ⁻¹ of preferably 400 mPa · s or more and 100,000 mPa · s or less, more preferably 500 mPa · s or more and 20,000 mPa · s or less. . Further, at a shear rate of 1000 S ⁻¹ , 1 mPa · s to 200 mPa · s is preferable, and 5 mPa · s to 80 mPa · s is more preferable.

In the case of preparing the coating liquid of the present invention, a known in-line mixer or implant mixer is preferably used when mixing two kinds of liquids. A preferred in-line mixer of the present invention is described in JP-A No. 2002-85948, and an implant mixer is described in JP-A No. 2002-90940.
The coating solution in the present invention is preferably subjected to defoaming treatment in order to keep the coated surface state good. A preferable defoaming treatment method of the present invention is the method described in JP-A No. 2002-66431.
When applying the coating solution of the present invention, it is preferable to perform static elimination in order to prevent adhesion of dust, dust, and the like due to electric resistance of the support. An example of a preferable static elimination method in the present invention is described in JP-A No. 2002-143747.
In the present invention, it is important to precisely control the drying air and the drying temperature in order to dry the non-setting image forming layer coating solution. The preferred drying method of the present invention is described in detail in JP-A Nos. 2001-194749 and 2002-139814.
The photothermographic material of the present invention is preferably subjected to a heat treatment immediately after coating and drying in order to improve film formability. The temperature of the heat treatment is preferably in the range of 60 ° C. to 100 ° C. as the film surface temperature, and the heating time is preferably in the range of 1 second to 60 seconds. A more preferable range is a film surface temperature of 70 to 90 ° C. and a heating time of 2 to 10 seconds. A preferable heat treatment method of the present invention is described in JP-A No. 2002-107872.
In order to stably and continuously produce the photothermographic material of the present invention, the production methods described in JP-A Nos. 2002-156728 and 2002-182333 are preferably used.

  The photothermographic material is preferably a mono-sheet type (a type capable of forming an image on the photothermographic material without using another sheet such as an image receiving material).

12) Packaging material The photosensitive material of the present invention is packaged with a packaging material having a low oxygen permeability and / or moisture permeability in order to suppress fluctuations in photographic performance during raw storage or to improve curling, curling, etc. It is preferable. The oxygen permeability is preferably 50 ml / atm · m ² · day or less at 25 ° C., more preferably 10 ml / atm · m ² · day or less, more preferably 1.0 ml / atm · m ² · day or less. is there. The moisture permeability is preferably 10 g / atm · m ² · day or less, more preferably 5 g / atm · m ² · day or less, and still more preferably 1 g / atm · m ² · day or less.
Specific examples of the packaging material having a low oxygen permeability and / or moisture permeability are disclosed in, for example, JP-A-8-254793. This is a packaging material described in JP-A-2000-206653.

13) Other technologies that can be used Techniques that can be used in the photothermographic material of the present invention include EP80364A1, EP883022A1, WO98 / 36322, JP-A-56-62648, JP-A-58-62644, and JP-A-5-62644. 9-43766, 9-281737, 9-297367, 9-304869, 9-31405, 9-329865, 10-10669, 10-62899, 10-69023 10-186568, 10-90823, 10-171603, 10-186565, 10-186567, 10-186567 to 10-186572, 10-197974, Nos. 10-197982, 10-197983, 10-197985 to 1 No. 0-197987, No. 10-207001, No. 10-207004, No. 10-221807, No. 10-282601, No. 10-288823, No. 10-288824, No. 10-307365, No. 10- No. 312038, No. 10-339934, No. 11-7100, No. 11-15105, No. 11-24200, No. 11-24201, No. 11-30832, No. 11-84574, No. 11-65021 11-109547, 11-125880, 11-129629, 11-133536 to 11-133539, 11-133542, 11-133543, 11-223898, 11-352627, 11-305377, 11-305378, 11-305 84, 11-305380, 11-316435, 11-327076, 11-338096, 11-338098, 11-338099, 11-343420, JP 2000-187298 , 2000-10229, 2000-47345, 2000-206642, 2000-98530, 2000-98531, 2000-112059, 2000-112060, 2000-112104, Examples thereof include 2000-112064 and 2000-171936.

(Image forming method)
1) Exposure red to infrared emission He—Ne laser, red semiconductor laser, blue to green emission Ar ⁺ , He—Ne, He—Cd laser, blue semiconductor laser. Preferred is a red to infrared semiconductor laser, and the peak wavelength of the laser light is 600 nm to 900 nm, preferably 620 nm to 850 nm. On the other hand, in recent years, in particular, a module in which an SHG (Second Harmonic Generator) element and a semiconductor laser are integrated and a blue semiconductor laser have been developed, and a laser output device in a short wavelength region has been closed up. The blue semiconductor laser is expected to increase in demand in the future because high-definition image recording is possible, the recording density is increased, and a stable output is obtained with a long lifetime. The peak wavelength of the blue laser light is preferably 300 nm to 500 nm, particularly preferably 400 nm to 500 nm.
It is also preferable that the laser light is oscillated in a vertical multi by a method such as high frequency superposition.

2) Photothermographic development The photothermographic material of the present invention may be developed by any method, but is usually developed by raising the temperature of the photothermographic material exposed imagewise. The preferred development temperature is 110 ° C to 180 ° C, preferably 110 ° C to 140 ° C, more preferably 110 ° C to 130 ° C. The development time is usually 1 second to 60 seconds, preferably 3 seconds to 30 seconds, more preferably 7 seconds to 20 seconds.

  Either a drum type heater or a plate type heater may be used as the thermal development method, but the plate type heater method is more preferable. The heat development method using the plate type heater method is preferably a method described in JP-A-11-133572, and a visible image is obtained by bringing a photothermographic material having a latent image formed thereon into contact with a heating means in a heat developing unit. In the heat development apparatus, the heating unit includes a plate heater, and a plurality of press rollers are disposed to face each other along one surface of the plate heater, and the press roller is disposed between the press roller and the plate heater. A heat development apparatus characterized in that heat development is performed by passing a photothermographic material. It is preferable to divide the plate heater into 2 to 6 stages and lower the temperature about 1 to 10 ° C. at the tip. For example, there are examples in which four sets of plate heaters that can be independently controlled are used and controlled so as to be 112 ° C., 119 ° C., 121 ° C., and 120 ° C.

  In order to reduce the size of the heat developing machine and shorten the heat development time, it is preferable to be able to control the heater more stably. In addition, the exposure of one sheet of photosensitive material is started from the top and the exposure is finished to the rear end. It is desirable to start the heat development before the time. Imagers capable of rapid processing preferred in the present invention are described in, for example, Japanese Patent Application Nos. 2001-088832 and 091114. If this imager is used, for example, heat development can be performed in 14 seconds with a three-stage plate heater controlled at 107 ° C.-121 ° C.-121 ° C., and the output time of the first sheet is reduced to about 60 seconds. be able to. Such rapid development processing has the above-mentioned various problems, and it is particularly preferable to use the photothermographic material of the present invention in combination.

(Use of the present invention)
The image forming method of the present invention forms a black and white image using a silver image and can be used as a photothermographic material for medical diagnosis.

  EXAMPLES Hereinafter, the present invention will be specifically described with reference to examples, but the present invention is not limited to these examples.

Example 1
(Preparation of PET support)
1-1. Film Formation Using terephthalic acid and ethylene glycol, PET having an intrinsic viscosity of IV = 0.66 (measured in phenol / tetrachloroethane = 6/4 (weight ratio) at 25 ° C.) was obtained. This was pelletized, dried at 130 ° C. for 4 hours, melted at 300 ° C., extruded from a T-die, and rapidly cooled to prepare an unstretched film.

This was longitudinally stretched 3.3 times using rolls with different peripheral speeds, and then stretched 4.5 times with a tenter. The temperatures at this time were 110 ° C. and 130 ° C., respectively. Thereafter, the film was heat-fixed at 240 ° C. for 20 seconds and relaxed by 4% in the lateral direction at the same temperature. Thereafter, the chuck portion of the tenter was slit and then knurled at both ends, and wound at 4 kg / cm ² to obtain a roll having a thickness of 175 μm.

1-2. Surface Corona Discharge Treatment Using a solid state corona discharge treatment machine 6KVA model manufactured by Pillar, both surfaces of the support were treated at room temperature at 20 m / min. From the current and voltage readings at this time, it was found that the support was processed at 0.375 kv · A · min / m ² . The treatment frequency at this time was 9.6 kHz, and the gap clearance between the electrode and the dielectric roll was 1.6 mm.

1-3. Undercoat 1) Preparation of coating solution for undercoat layer Pesresin A-520 (30% by mass solution) manufactured by Takamatsu Yushi Co., Ltd. 46.8 g
Toyobo Co., Ltd. made baironal WD-1200 10.4g
Polyethylene glycol monononyl phenyl ether (average number of ethylene oxides = 8.5) 1% by weight solution 11.0 g
MP-1000 manufactured by Soken Chemical Co., Ltd. (PMMA polymer fine particles, average particle size 0.4 μm)
0.91g
931 ml of distilled water

2) Undercoating The corona discharge treatment was applied to both sides of the biaxially stretched polyethylene terephthalate support having a thickness of 175 μm, and then the wet coating amount of the undercoating liquid formulation was 6.6 ml / m ² (per one side) using a wire bar. And then dried at 180 ° C. for 5 minutes to prepare an undercoat support.

2. Antistatic Layer 1) Preparation of Antistatic Agent Processing Solution-1 Inert gelatin 85 g dissolved in water, and compound No. 1 as an antistatic agent therein. N-1 was added in the amounts shown in Table 1, 0.5 g of Proxel (Avicia) was added, and water was added to 1000 g, followed by stirring to prepare an antistatic agent processing liquid-1.
2) Preparation of antistatic agent processing liquids 2 to 4 In the same manner as the preparation of antistatic agent dispersion-1, antistatic agent processing liquids shown below were prepared.
Antistatic agent processing liquid-2: Antistatic agent compound no. C-1,
Antistatic agent processing liquid-3: Antistatic agent compound no. P-6
Antistatic agent processing liquid-4: Antistatic agent compound;

3) Preparation of antistatic agent processing liquid-5 SnO ₂ / SbO (9/1 mass ratio, average particle size 0.5 μm, 17 mass% dispersion) 117 g
Gelatin 85g
10g Metros TC-5 (2% by weight aqueous solution) manufactured by Shin-Etsu Chemical
10% 1% by weight aqueous solution of sodium dodecylbenzenesulfonate
NaOH (1% by mass) 7g
Proxel (Abyssia) 0.5g
1000g with water

  When the antistatic processing liquids -1 to 5 are overcoated on the second surface protective layer, the fluorine-based surfactants F-1 and F-2 added to the second surface protective layer are used. Was removed from the second surface protective layer and added to antistatic processing liquids 1-5. The coating amount was the same as that of the second surface protective layer.

4) Application It was applied as described in Table 1. Coating was carried out so that the coating amount of gelatin was 0.5 g / m ² .
In the table, the OC layer means an outer layer close to the second surface protective layer as viewed from the support, and the UC layer means a layer between the support and the image forming layer.

3. 3. Image forming layer, intermediate layer, and surface protective layer 3-1. Preparation of coating materials 1) Silver halide emulsion (Preparation of silver halide emulsion A)
4.3 ml of 1% by weight potassium iodide solution is added to 1421 ml of distilled water, and 3.5 ml of 0.5 mol / L sulfuric acid, 36.5 g of phthalated gelatin, and 5 mass of 2,2 ′-(ethylenedithio) diethanol. The solution to which 160 ml of methanol solution was added was stirred in a stainless steel reaction vessel while maintaining the liquid temperature at 75 ° C., and 22.22 g of silver nitrate was added to distilled water and diluted to 218 ml. Solution B in which 6 g was diluted to 366 ml with distilled water was added in a total amount over 16 minutes at a constant flow rate, and solution B was added by the control double jet method while maintaining pAg at 10.2. Thereafter, 10 ml of a 3.5% by mass aqueous hydrogen peroxide solution was added, and 10.8 ml of a 10% by mass aqueous solution of benzimidazole was further added. Further, a solution C in which distilled water was added to 51.86 g of silver nitrate and diluted to 508.2 ml, and a solution D in which 63.9 g of potassium iodide were diluted to 639 ml with distilled water, and solution C was added at a constant flow rate over 80 minutes. The entire amount was added, and Solution D was added by the control double jet method while maintaining pAg at 10.2. The total amount of potassium hexachloroiridium (III) was added 10 minutes after the start of the addition of Solution C and Solution D to 1 × 10 ⁻⁴ mole per mole of silver. Further, 5 seconds after the completion of the addition of the solution C, an aqueous solution of potassium iron (II) hexacyanide was added in an amount of 3 × 10 ⁻⁴ mol per mol of silver. The pH was adjusted to 3.8 using 0.5 mol / L sulfuric acid, stirring was stopped, and a precipitation / desalting / water washing step was performed. The pH was adjusted to 5.9 with 1 mol / L sodium hydroxide to prepare a silver halide dispersion having a pAg of 11.0.

  The silver halide emulsion A is a pure silver iodide emulsion and has a plate shape having an average projected area diameter of 0.93 μm, an average projected area diameter variation coefficient of 17.7%, an average thickness of 0.057 μm, and an average aspect ratio of 16.3. The grains accounted for over 80% of the total projected area. The equivalent sphere diameter was 0.42 μm. As a result of analysis by X-ray powder diffraction analysis, 90% or more of silver iodide was present in the γ phase.

(Preparation of silver halide emulsion B)
One mole of tabular grain AgI emulsion prepared with silver halide emulsion A was placed in a reaction vessel. The pAg was 10.2 measured at 38 ° C. Then, by double jet addition, 0.5 mol / liter KBr solution and 0.5 mol / liter AgNO ₃ solution were added over 10 minutes at 10 ml / min, and substantially 5 mol% silver bromide was added to the AgI host. Epitaxially precipitated on the emulsion. During operation, pAg was maintained at 10.2.
Furthermore, the pH was adjusted to 3.8 using 0.5 mol / L sulfuric acid, stirring was stopped, and a precipitation / desalting / water washing step was performed. The pH was adjusted to 5.9 with 1 mol / L sodium hydroxide to prepare a silver halide dispersion having a pAg of 11.0.

The silver halide dispersion was maintained at 38 ° C. with stirring, 5 ml of a 0.34 mass% methanol solution of 1,2-benzisothiazolin-3-one was added, and the temperature was raised to 60 ° C. after 40 minutes. 20 minutes after the temperature increase, sodium benzenethiosulfonate was added in a methanol solution to 7.6 × 10 ⁻⁵ moles per 1 mole of silver. The mixture was aged for 91 minutes by adding 0 × 10 ⁻⁵ mol. Thereafter, 1.3 ml of a 0.8 mass% methanol solution of N, N′-dihydroxy-N ″ and N ″ -diethylmelamine was added, and after 4 minutes, 5-methyl-2-mercaptobenzimidazole was added to the methanol solution. 4.8 × 10 ⁻³ mole per mole of silver and 5.4 × 10 ^{−3 of} 1-phenyl-2-heptyl-5-mercapto-1,3,4-triazole in 1 mol of silver with a methanol solution. Mole and 1- (3-methylureidophenyl) -5-mercaptotetrazole was added in an aqueous solution to 8.5 × 10 ⁻³ mol per mol of silver to prepare silver halide emulsion B.

(Preparation of silver halide emulsion C)
In the same manner as silver halide emulsion A, the addition amount of a 5% by weight methanol solution of 2,2 ′-(ethylenedithio) diethanol, the temperature at the time of grain formation, and the addition time of solution A were appropriately changed. Emulsion C was prepared. Silver halide Emulsion C is a pure silver iodide emulsion, tabular grains having an average projected area diameter of 1.369 μm, an average projected area diameter variation coefficient of 19.7%, an average thickness of 0.130 μm, and an average aspect ratio of 11.1. Accounted for more than 80% of the total projected area. The equivalent sphere diameter was 0.71 μm. As a result of analysis by X-ray powder diffraction analysis, 90% or more of silver iodide was present in the γ phase.

(Preparation of silver halide emulsion D)
A silver halide emulsion D containing 5 mol% of silver bromide epitaxial was prepared in exactly the same manner as the silver halide emulsion B except that the silver halide emulsion C was used.

<Preparation of mixed emulsion for coating solution>
Dissolve silver halide emulsion B and silver halide emulsion D in a silver molar ratio of 3: 2, and add 7 × 10 ⁻³ mol of benzothiazolium iodide per mol of silver in a 1% by mass aqueous solution. did. Further, the amount of the compound compounds 1, 2 and 3 that can be emitted by one-electron oxidation by one-electron oxidant to emit one or more electrons is 2 × 10 ⁻³ mol per mol of silver halide. Was added.
Further, compounds 1 and 2 having an adsorbing group and a reducing group were added in an amount of 8 × 10 ⁻³ mol per mol of silver halide.
Further, water was added so that the silver halide content per liter of the mixed emulsion for coating solution was 15.6 g as silver.

2) Preparation of fatty acid silver dispersion <Preparation of recrystallized behenic acid>
100 kg of behenic acid (product name Edenor C22-85R) manufactured by Henkel was mixed in 1200 kg of isopropyl alcohol, dissolved at 50 ° C., filtered through a 10 μm filter, cooled to 30 ° C., and recrystallized. The cooling speed during recrystallization was controlled at 3 ° C./hour. The obtained crystals were centrifugally filtered, washed with 100 kg of isopropyl alcohol, and then dried. When the obtained crystals were esterified and subjected to GC-FID measurement, the behenic acid content was 96 mol%, and in addition, lignoceric acid was 2 mol%, arachidic acid was 2 mol%, and erucic acid was 0.001 mol%. It was.

<Preparation of fatty acid silver dispersion-A>
Recrystallized behenic acid 88 kg, distilled water 422 L, 5 mol / L NaOH aqueous solution 49.2 L and t-butyl alcohol 120 L were mixed and stirred at 75 ° C. for 1 hour to react to obtain sodium behenate solution B. Separately, 206.2 L (pH 4.0) of an aqueous solution containing 40.4 kg of silver nitrate was prepared and kept warm at 10 ° C. A reaction vessel containing 635 L of distilled water and 30 L of t-butyl alcohol was kept at 30 ° C., and with sufficient agitation, the total amount of the previous sodium behenate solution and the total amount of silver nitrate aqueous solution were kept at a constant flow rate of 93 minutes and 15 seconds, respectively. And added over 90 minutes. At this time, only the silver nitrate aqueous solution is added for 11 minutes after the start of the addition of the aqueous silver nitrate solution, and then the addition of the sodium behenate solution is started. After the addition of the aqueous silver nitrate solution, only the sodium behenate solution is added for 14 minutes and 15 seconds. It was made to be. At this time, the temperature in the reaction vessel was 30 ° C., and the external temperature was controlled so that the liquid temperature was constant. The pipe of the addition system for the sodium behenate solution was kept warm by circulating hot water outside the double pipe so that the liquid temperature at the outlet at the tip of the addition nozzle was 75 ° C. Moreover, the piping of the addition system of the silver nitrate aqueous solution was kept warm by circulating cold water outside the double pipe. The addition position of the sodium behenate solution and the addition position of the aqueous silver nitrate solution were arranged symmetrically around the stirring axis, and were adjusted so as not to contact the reaction solution.

  After completion of the addition of the sodium behenate solution, the mixture was left stirring for 20 minutes at the same temperature, heated to 35 ° C. over 30 minutes, and then aged for 210 minutes. Immediately after completion of aging, the solid content was separated by centrifugal filtration, and the solid content was washed with water until the conductivity of filtered water reached 30 μS / cm. Thus, a fatty acid silver salt was obtained. The obtained solid content was stored as a wet cake without drying.

  When the morphology of the obtained silver behenate particles was evaluated by electron microscope photography, the average values were a = 0.21 μm, b = 0.4 μm, c = 0.4 μm, average aspect ratio 2.1, and equivalent sphere diameter. It was a crystal having a variation coefficient of 11% (a, b, and c are defined in the text).

  19.3 kg of polyvinyl alcohol (trade name: PVA-217) and water are added to a wet cake corresponding to a dry solid content of 260 kg to make a total amount of 1000 kg, and then slurried with a dissolver blade. : PM-10 type).

Next, the pre-dispersed stock solution is adjusted to a pressure of 1150 kg / cm ² in a disperser (trade name: Microfluidizer M-610, manufactured by Microfluidics International Corporation, using a Z-type interaction chamber) three times. Treatment gave a silver behenate dispersion. The cooling operation was carried out by installing a serpentine heat exchanger before and after the interaction chamber, and adjusting the temperature of the refrigerant to a dispersion temperature of 18 ° C.

3) Preparation of reducing agent dispersion <Preparation of reducing agent-1 dispersion>
Reducing agent-1 (2,2′-methylenebis- (4-ethyl-6-tert-butylphenol)) 10 kg and denatured polyvinyl alcohol (Kuraray Co., Ltd., Poval MP-203) 10% by weight aqueous solution 16 kg, 10 kg was added and mixed well to make a slurry. This slurry was fed with a diaphragm pump, dispersed for 3 hours in a horizontal sand mill (UVM-2: manufactured by Imex Co., Ltd.) filled with zirconia beads having an average diameter of 0.5 mm, and then benzoisothiazolinone sodium salt 0. 2 g and water were added to prepare a reducing agent concentration of 25% by mass. This dispersion was heat-treated at 60 ° C. for 5 hours to obtain a reducing agent-1 dispersion. The reducing agent particles contained in the reducing agent dispersion thus obtained had a median diameter of 0.40 μm and a maximum particle diameter of 1.4 μm or less. The obtained reducing agent dispersion was filtered through a polypropylene filter having a pore size of 3.0 μm to remove foreign substances such as dust and stored.

<Preparation of reducing agent-2 dispersion>
Of reducing agent-2 (6,6′-di-t-butyl-4,4′-dimethyl-2,2′-butylidenediphenol) and modified polyvinyl alcohol (Kuraray Co., Ltd., Poval MP-203) 10 kg of water was added to 16 kg of a 10% by mass aqueous solution and mixed well to obtain a slurry. This slurry was fed with a diaphragm pump and dispersed for 3 hours 30 minutes in a horizontal sand mill (UVM-2: manufactured by Imex Co., Ltd.) filled with zirconia beads having an average diameter of 0.5 mm, and then benzoisothiazolinone sodium salt 0.2 g and water were added to prepare a reducing agent concentration of 25% by mass. This dispersion was heated at 40 ° C. for 1 hour, and then further heated at 80 ° C. for 1 hour to obtain a reducing agent-2 dispersion. The reducing agent particles contained in the reducing agent dispersion thus obtained had a median diameter of 0.50 μm and a maximum particle diameter of 1.6 μm or less. The obtained reducing agent dispersion was filtered through a polypropylene filter having a pore size of 3.0 μm to remove foreign substances such as dust and stored.

4) Preparation of hydrogen bonding compound dispersion <Preparation of hydrogen bonding compound-1 dispersion>
10 kg of water was added to 16 kg of a 10% aqueous solution of hydrogen bonding compound-1 (tri (4-t-butylphenyl) phosphine oxide) and modified polyvinyl alcohol (Kuraray Co., Ltd., Poval <P-203). And mixed well to obtain a slurry. This slurry was fed with a diaphragm pump, and dispersed for 4 hours in a horizontal sand mill (UVM-2: manufactured by Imex Co., Ltd.) filled with zirconia beads having an average diameter of 0.5 mm. 2 g and water were added to prepare a hydrogen bonding compound concentration of 25% by mass. The dispersion was heated at 40 ° C. for 1 hour and then further heated at 80 ° C. for 1 hour to obtain a hydrogen bonding compound-1 dispersion. The hydrogen bonding compound particles contained in the hydrogen bonding compound dispersion thus obtained had a median diameter of 0.45 μm and a maximum particle diameter of 1.3 μm or less. The obtained hydrogen bonding compound dispersion was filtered through a polypropylene filter having a pore size of 3.0 μm to remove foreign substances such as dust and stored.

5) Preparation of development accelerator dispersion and color tone modifier dispersion <Preparation of development accelerator-1 dispersion>
10 kg of development accelerator-1 and 20 kg of 10% by weight aqueous solution of modified polyvinyl alcohol (Kuraray Co., Ltd., Poval MP-203) were added to 10 kg of water and mixed well to obtain a slurry. This slurry was fed with a diaphragm pump and dispersed for 3 hours 30 minutes in a horizontal sand mill (UVM-2: manufactured by Imex Co., Ltd.) filled with zirconia beads having an average diameter of 0.5 mm, and then benzoisothiazolinone sodium salt 0.2 g and water were added to adjust the concentration of the development accelerator to 20% by mass to obtain a development accelerator-1 dispersion. The development accelerator particles contained in the development accelerator dispersion thus obtained had a median diameter of 0.48 μm and a maximum particle diameter of 1.4 μm or less. The obtained development accelerator dispersion was filtered through a polypropylene filter having a pore size of 3.0 μm to remove foreign substances such as dust and stored.

  The solid dispersions of the development accelerator-2 and the color tone modifier-1 were also dispersed by the same method as the development accelerator-1, and 20% by mass and 15% by mass of a dispersion liquid were obtained, respectively.

6) Preparation of polyhalogen compound dispersion <Preparation of organic polyhalogen compound-1 dispersion>
10 kg of organic polyhalogen compound-1 (tribromomethanesulfonylbenzene), 10 kg of 20% by weight aqueous solution of modified polyvinyl alcohol (Poval MP-203 manufactured by Kuraray Co., Ltd.), and 20% by weight aqueous solution of sodium triisopropylnaphthalenesulfonate. 4 kg and 14 kg of water were added and mixed well to obtain a slurry. This slurry was fed with a diaphragm pump and dispersed for 5 hours in a horizontal sand mill (UVM-2: manufactured by Imex Co., Ltd.) filled with zirconia beads having an average diameter of 0.5 mm. 2 g and water were added to prepare an organic polyhalogen compound concentration of 30% by mass to obtain an organic polyhalogen compound-1 dispersion. The organic polyhalogen compound particles contained in the polyhalogen compound dispersion thus obtained had a median diameter of 0.41 μm and a maximum particle diameter of 2.0 μm or less. The obtained organic polyhalogen compound dispersion was filtered through a polypropylene filter having a pore size of 10.0 μm to remove foreign substances such as dust and stored.

<Preparation of organic polyhalogen compound-2 dispersion>
10 kg of an organic polyhalogen compound-2 (N-butyl-3-tribromomethanesulfonylbenzoamide), 20 kg of a 10% by weight aqueous solution of modified polyvinyl alcohol (Poval MP203 manufactured by Kuraray Co., Ltd.), and 20 of sodium triisopropylnaphthalenesulfonate 0.4 kg of a mass% aqueous solution was added and mixed well to obtain a slurry. This slurry was fed with a diaphragm pump and dispersed for 5 hours in a horizontal sand mill (UVM-2: manufactured by Imex Co., Ltd.) filled with zirconia beads having an average diameter of 0.5 mm. 2 g and water were added to prepare an organic polyhalogen compound concentration of 30% by mass. This dispersion was heated at 40 ° C. for 5 hours to obtain an organic polyhalogen compound-2 dispersion. The organic polyhalogen compound particles contained in the polyhalogen compound dispersion thus obtained had a median diameter of 0.40 μm and a maximum particle diameter of 1.3 μm or less. The obtained organic polyhalogen compound dispersion was filtered through a polypropylene filter having a pore size of 3.0 μm to remove foreign substances such as dust and stored.

7) Preparation of silver iodide complex-forming agent 8 kg of modified polyvinyl alcohol MP-203 manufactured by Kuraray Co., Ltd. was dissolved in 174.57 kg of water, and then 3.15 kg of 20 mass% aqueous solution of sodium triisopropylnaphthalenesulfonate and 6- 14.28 kg of a 70% by weight aqueous solution of isopropylphthalazine was added to prepare a 5% by weight solution of a silver iodide complex forming agent.

8) Preparation of mercapto compound <Preparation of aqueous solution of mercapto compound-1>
7 g of mercapto compound-1 (1- (3-sulfophenyl) -5-mercaptotetrazole sodium salt) was dissolved in 993 g of water to obtain a 0.7% by mass aqueous solution.

<Preparation of Mercapto Compound-2 Aqueous Solution>
20 g of mercapto compound-2 (1- (3-methylureidophenyl) -5-mercaptotetrazole) was dissolved in 980 g of water to obtain a 2.0 mass% aqueous solution.

9) Preparation of SBR latex solution SBR latex was prepared as follows.
In a polymerization kettle of a gas monomer reactor (TAS-2J type manufactured by Pressure Glass Industrial Co., Ltd.), 287 g of distilled water and a surfactant (Pionin A-43-S (manufactured by Takemoto Yushi Co., Ltd.)): solid content 48.5 (Mass%) 7.73 g, 1 mol / liter NaOH 14.06 ml, ethylenediaminetetraacetic acid tetrasodium salt 0.15 g, styrene 255 g, acrylic acid 11.25 g, tert-dodecyl mercaptan 3.0 g were put, the reaction vessel was sealed and the stirring speed was Stir at 200 rpm. After degassing with a vacuum pump and repeating nitrogen gas replacement several times, 108.75 g of 1,3-butadiene was injected and the internal temperature was raised to 60 ° C. A solution obtained by dissolving 1.875 g of ammonium persulfate in 50 ml of water was added thereto, and the mixture was stirred as it was for 5 hours. The temperature was further raised to 90 ° C. and stirred for 3 hours. After the reaction was completed, the internal temperature was lowered to room temperature, and then Na ⁺ ion: NH ₄ ⁺ ion = 1: 1 using 1 mol / liter NaOH and NH ₄ OH. Addition treatment was performed so that the molar ratio was 5.3 (molar ratio), and the pH was adjusted to 8.4. Thereafter, the mixture was filtered through a polypropylene filter having a pore size of 1.0 μm to remove foreign substances such as dust and stored to obtain 774.7 g of SBR latex. When the halogen ions were measured by ion chromatography, the chloride ion concentration was 3 ppm. As a result of measuring the concentration of the chelating agent by high performance liquid chromatography, it was 145 ppm.

  The latex has an average particle size of 90 nm, Tg = 17 ° C., solid content concentration of 44 mass%, equilibrium moisture content at 25 ° C. and 60% RH, 0.6 mass%, ion conductivity of 4.80 mS / cm (measurement of ion conductivity is Using a conductivity meter CM-30S manufactured by Toa Denpa Kogyo Co., Ltd., a latex stock solution (44% by mass) measured at 25 ° C.), pH 8.4.

3-2. Preparation of coating solution 1) Preparation of coating solution for image forming layer 1000 g of the fatty acid silver dispersion obtained above, 276 ml of water, pigment-1 dispersion, organic polyhalogen compound-1 dispersion, organic polyhalogen compound-2 dispersion Phthalazine compound-1 solution, SBR latex (Tg = 17 ° C.) solution, reducing agent-1 dispersion, reducing agent-2 dispersion, hydrogen bonding compound-1 dispersion, development accelerator-1 dispersion, development acceleration Agent-2 dispersion, color tone modifier-1 dispersion, mercapto compound-1 aqueous solution, mercapto compound-2 aqueous solution were added in sequence, and silver halide emulsion for coating solution mixing was added immediately before coating, and well mixed to form an image. The layer coating solution was fed directly to the coating die and applied.

The viscosity of the image forming layer coating solution was 25 [mPa · s] at 40 ° C. (No. 1 rotor, 60 rpm) as measured with a B-type viscometer of Tokyo Keiki.
The viscosity of the coating solution at 25 ° C. using an RFS fluid spectrometer manufactured by Rheometrics Far East Co., Ltd. is 242, 65, 48 at shear rates of 0.1, 1, 10, 100, and 1000 [1 / second], respectively. 26 and 20 [mPa · s].

  The amount of zirconium in the coating solution was 0.52 mg per 1 g of silver.

2) Preparation of intermediate layer coating solution 1000 g of polyvinyl alcohol PVA-205 (manufactured by Kuraray Co., Ltd.), 272 g of pigment-1 dispersion, methyl methacrylate / styrene / butyl acrylate / hydroxyethyl methacrylate / acrylic acid copolymer (copolymerization weight) Ratio 64/9/20/5/2) 27 ml of 5% by weight aqueous solution of aerosol OT (manufactured by American Cyanamid Co., Ltd.) in 4200 ml of 19% by weight latex, 135 ml of 20% by weight aqueous solution of diammonium phthalate salt, Water was added so that the total amount was 10,000 g, and it was adjusted with NaOH so that the pH was 7.5 to obtain an intermediate layer coating solution, which was fed to the coating die so as to be 9.1 ml / m ² .
The viscosity of the coating solution was 58 [mPa · s] at a B-type viscometer of 40 ° C. (No. 1 rotor, 60 rpm).

3) Preparation of surface protective layer first layer coating solution 64 g of inert gelatin was dissolved in water and a methyl methacrylate / styrene / butyl acrylate / hydroxyethyl methacrylate / acrylic acid copolymer (copolymerization weight ratio 64/9/20/5). / 2) 112 g of latex 19.0 wt% solution, 30 ml of 15 wt% methanol solution of phthalic acid, 23 ml of 10 wt% aqueous solution of 4-methylphthalic acid, 28 ml of 0.5 mol / L sulfuric acid, Aerosol OT (American 5 ml of a 5% by weight aqueous solution (made by Cyanamid), 0.5 g of phenoxyethanol, and 0.1 g of benzoisothiazolinone are added to form a coating solution by adding water to a total amount of 750 g. 26 ml of 4% by weight chromium alum consisting of which had been mixed with a static mixer to 18.6ml / m ² to immediately before coating It was fed to a coating die.
The viscosity of the coating solution was 20 [mPa · s] at a B-type viscometer of 40 ° C. (No. 1 rotor, 60 rpm).

4) Preparation of surface protective layer second layer coating solution 80 g of inert gelatin was dissolved in water and methyl methacrylate / styrene / butyl acrylate / hydroxyethyl methacrylate / acrylic acid copolymer (copolymer weight ratio 64/9/20/5). / 2) 102 g of latex 27.5% by mass solution, 5.4 ml of 2% by mass solution of fluorosurfactant (F-1), and 5% by mass of 2% by mass aqueous solution of fluorosurfactant (F-2). 4 ml, 23 ml of a 5% by mass solution of aerosol OT (manufactured by American Cyanamid), 4 g of polymethyl methacrylate fine particles (average particle size 0.7 μm, volume weighted average distribution 30%), polymethyl methacrylate fine particles (average particle) Diameter 3.6 μm, volume weighted average distribution 60%) 21 g, 4-methylphthalic acid 1.6 g, phthalic acid 4.8 g, 0.5 mol / L concentration Water was added to 44 ml of sulfuric acid and 10 mg of benzoisothiazolinone to a total amount of 650 g, and 445 ml of an aqueous solution containing 4% by weight chromium alum and 0.67% by weight phthalic acid was mixed with a static mixer immediately before coating. The resulting solution was used as a surface protective layer coating solution and fed to a coating die so as to be 8.3 ml / m ² .
The viscosity of the coating solution was 19 [mPa · s] at a B-type viscometer of 40 ° C. (No. 1 rotor, 60 rpm).

3-3. Preparation of photothermographic material-1

A photothermographic material sample was prepared on the both sides of the support by simultaneous multi-layer coating by the slide bead coating method in the order of the image forming layer, the intermediate layer, the first surface protective layer, and the second surface protective layer. At this time, the image forming layer and the intermediate layer were adjusted to 31 ° C., the first surface protective layer was adjusted to 36 ° C., and the second surface protective layer was adjusted to 37 ° C. The coated silver amount of the image forming layer was 0.821 g / m ² per side in total of the fatty acid silver and the silver halide. This was applied to both sides of the support.

The coating amount (g / m ² ) of each compound per side of the image forming layer was as follows, and the thickness was 10 μm.

Fatty acid silver 2.80
Polyhalogen compound-1 0.028
Polyhalogen compound-2 0.094
Silver iodide complex forming agent 0.46
SBR latex 5.20
Reducing agent-1 0.33
Reducing agent-2 0.13
Hydrogen bonding compound-1 0.15
Development accelerator-1 0.005
Development accelerator-2 0.035
Color tone adjusting agent-1 0.002
Mercapto Compound-1 0.001
Mercapto compound-2 0.003
Silver halide (as Ag) 0.146

The coating and drying conditions are as follows.
The support was neutralized with ion wind before coating, and coating was performed at a speed of 160 m / min. The coating and drying conditions were adjusted within the following ranges for each sample, and were set to conditions that would provide the most stable surface shape.
The gap between the coating die tip and the support is 0.10 to 0.30 mm.
The pressure in the decompression chamber is set to 196 to 882 Pa lower than the atmospheric pressure.
In the subsequent chilling zone, the coating solution is cooled with air at a dry bulb temperature of 10 to 20 ° C.
It is transported in a non-contact manner, and dried with a dry air having a dry bulb temperature of 23 to 45 ° C. and a wet bulb temperature of 15 to 21 ° C. in a helical contactless dryer.
After drying, the humidity is adjusted at 25 ° C. and humidity of 40-60% RH.
Subsequently, the film surface was heated to 70 to 90 ° C., and after the heating, the film surface was cooled at 25 ° C.

  The photothermographic material thus produced had a matte degree of Beck smoothness and a photosensitive layer surface side of 550 seconds. Further, the pH of the film surface was measured and found to be 6.0.

  The chemical structures of the compounds used in the examples of the present invention are shown below.

4). Evaluation of photographic performance 1) Preparation The obtained samples were cut into half-cut sizes, packaged in the following packaging materials in an environment of 25 ° C. and 50% RH, stored at room temperature for 2 weeks, and then evaluated as follows. .
2) Packaging material: PET 10 μm / PE 12 μm / aluminum foil 9 μm / Ny 15 μm / polyethylene 50 μm containing 3% by mass of carbon:
Oxygen permeability: 0.02 ml / atm · m ² · 25 ° C · day,
Moisture permeability: 0.10 g / atm · m ² · 25 ° C · day.

3) Exposure and development of photosensitive material <Exposure>
An X-ray regular screen HI-SCREEN B3 (using CaWO ₄ as the phosphor, emission peak wavelength: 425 m) made by FUJIFILM Co., Ltd. is used, and a sample is sandwiched between them to create an image forming assembly. did. This assembly was subjected to X-ray exposure for 0.05 seconds, and X-ray sensitometry was performed. The X-ray apparatus used was a trade name DRX-3724HD manufactured by Toshiba Corporation, and a tungsten target was used. A voltage of 80 kVp was applied to the three phases with a pulse generator, and X-rays passed through a 7 cm water filter having absorption equivalent to that of the human body were used as a light source. The X-ray exposure was changed by the distance method, and step exposure was performed with a width of logE = 0.15.

<Heat development>
The heat development unit of the Fuji Medical Dry Laser Imager FM-DPL was modified to produce a heat development machine that can be heated from both sides. In addition, the film was remodeled so that the film sheet could be conveyed by changing the conveyance roller of the heat developing unit to a heat drum. Four panel heaters were set to 112 ° C-118 ° C-120 ° C-120 ° C, and the temperature of the heat drum was set to 120 ° C. Furthermore, the conveyance speed was increased and set to a total of 14 seconds.

4) Evaluation method <Photographic performance>
Fog: the minimum density of the developed photosensitive material.
Sensitivity: Expressed as a relative value when the sensitivity of the photosensitive material of sample No. 1 is 100.
Gradation: The average gradation of the minimum density +0.03 to +0.08 was used as the gradation.

<Development unevenness>
100 photosensitive materials were exposed using a phosphor intensifying screen in an environment of 25 ° C. and 10% RH. Thereafter, heat development was performed using the above-described heat developing machine under the same environment. As a result, when there was a photosensitive material in which development unevenness occurred even a little, it was rated as x, and when there was no development unevenness, it was marked as ○.
Further, as a forced experiment, exposure was performed using a phosphor intensifying screen in an environment of 25 ° C. and 10% RH. Then, before peeling off from the screen, the wafer was rubbed back and forth for 60 minutes at an amplitude of 5 cm. Immediately after that, the screen and the photosensitive material were peeled off, and then heat development was performed using the above-described heat developing machine in the same environment. As a result, when there was a photosensitive material in which development unevenness occurred even a little, it was rated as ○, and when there was no development unevenness, it was marked as ◎.
<Evaluation of raw preservation>
The photosensitive material stored for 60 days at 30 ° C. in the state of the processed product and the photosensitive material stored for 60 days at 5 ° C. were developed with a heat developing machine. The raw preservation was evaluated with the sensitivity difference between them.
<Evaluation of image preservation>
The sample after heat development was exposed to 10000 Lux light for 10 minutes in an environment of 25 ° C. and 50% RH and then stored in a dark place at 60 ° C. for 72 hours.

5) Evaluation results Table 1 shows the evaluation results.
From the results in Table 1, the charging characteristics of the photosensitive material of the present invention were excellent. In particular, by using the non-photosensitive UC layer, the raw storability and the image storability were improved, which was a more preferable result.

Claims (23)

  A photothermographic material having an image forming layer containing a photosensitive silver halide, a non-photosensitive organic silver salt, a reducing agent, and a binder on at least one surface of the support is exposed using a fluorescent screen, An image forming method in which an image is formed by heat development with a heat developing apparatus having the image forming method, wherein the photothermographic material has an antistatic layer.   The image forming method according to claim 1, wherein the antistatic layer is provided between the image forming layer and the support or on the surface opposite to the image forming layer with respect to the support.   The photothermographic material has a back layer on the surface opposite to the image forming layer with respect to the support, and has the antistatic layer between the back layer and the support. The image forming method according to claim 1.   The image forming layer is provided on both sides of the support, and the antistatic layer is provided between the image forming layer and the support on at least one side. The image forming method described.   The image forming method according to claim 4, further comprising a non-photosensitive layer containing no antistatic agent between the image forming layer and the antistatic layer.   6. The image forming method according to claim 1, wherein the antistatic layer contains at least one selected from a metal oxide, a conductive polymer, and a surfactant.   The image forming method according to claim 1, wherein the antistatic layer contains a metal oxide. The metal oxide is at least one crystalline metal oxide selected from the group consisting of ZnO, TiO ₂ , SnO ₂ , Al ₂ O ₃ , In ₂ O ₃ , SiO ₂ , MgO, BaO and MoO ₃ , or these The image forming method according to claim 7, wherein the image forming method is at least one selected from the group consisting of complex oxides.   The image forming method according to claim 1, wherein the antistatic layer contains a conductive polymer.   The image forming method according to claim 9, wherein the conductive polymer is a water-soluble conductive polymer, and is a reaction product of a hydrophobic polymer and a curing agent.   The image forming method according to claim 1, wherein the antistatic layer contains a surfactant.   The image according to claim 11, wherein the surfactant is at least one selected from an anionic surfactant, a cationic surfactant, a nonionic surfactant, and a betaine surfactant. Forming method.   The outermost layer of at least one of the photothermographic materials contains a fluorine compound having a fluorinated alkyl group having 2 or more carbon atoms and 12 or less fluorine atoms. The image forming method according to any one of the above. The image forming method according to claim 13, wherein the fluorine compound has a fluorinated alkyl group represented by the following general formula (A).
Formula (A)
-L ⁰³ -L ⁰⁴ -W
In General Formula (A), L ⁰³ represents an alkylene group having 1 to 4 carbon atoms, L ⁰⁴ represents a perfluoroalkylene group having 2 to 6 carbon atoms, and W represents a hydrogen atom, a fluorine atom, or an alkyl group. .   The heat development apparatus includes a heating unit, and the heating unit includes a plate and a roller that rotates by pressing the photothermographic material against the plate, and serves as a heating source for at least one of the plate and the roller. The image forming method according to claim 1, further comprising a heater.   16. The image forming method according to claim 1, wherein the photothermographic material is heated while being moved by receiving frictional resistance on the heating means.   17. The image forming method according to claim 1, wherein the photothermographic material is thermally developed while being conveyed at a conveying speed of 10 mm / second or more.   18. The image forming method according to claim 1, wherein the photosensitive silver halide is a tabular grain having an aspect ratio of 2 or more.   The image forming method according to claim 18, wherein the photosensitive silver halide is a tabular grain having an average sphere equivalent diameter of 0.3 μm or more and 8.0 μm or less.   20. The image forming method according to claim 1, wherein the photosensitive silver halide has an average iodine content of 40 mol% or more.   21. The image forming method according to claim 20, wherein the photosensitive silver halide has an average iodine content of 90 mol% or more.   The image forming method according to claim 20 or 21, further comprising a compound that substantially reduces visible light absorption derived from photosensitive silver halide grains after heat development.   23. The image forming method according to claim 22, further comprising a silver iodide complex forming agent as a compound that substantially reduces visible light absorption derived from the photosensitive silver halide grains after heat development.