JP2005154187A - Optical element molding die and method and apparatus for producing the same - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide an optical element molding die which has a molding surface improved in adhesion to a film formed by ion implantation and a film-forming surface formed in a method different from that and having high adhesive strength. <P>SOLUTION: The method for producing the optical element molding die comprises a first step (S01) of generating a plasma containing Pt ions being noble metal ions around the base material 2 set in a vacuum container 4, extracting only ions from the plasma around the base material 2 by applying a pulse voltage to the base material 2, and implanting the ions into the molding surface 2A of the base material 2 and a second step (S02) of forming a film comprising Pt on the molding surface 2A subjected to the first step (S01) by sputtering. <P>COPYRIGHT: (C)2005,JPO&NCIPI

Description

  The present invention relates to an optical element molding die, a manufacturing method thereof, and a manufacturing apparatus.

In the manufacture of optical elements, the mold is severely deteriorated because highly reactive glass containing various metal oxides and alkali components is used at high temperatures.
For this reason, the molding surface of the base material of the molding die is subjected to a surface treatment such as a metal-based film or a carbon-based film for the purpose of extending the life of the mold and improving the releasability from glass.
As such a surface treatment method, a plasma containing element ions to be formed around the mold is generated, and a negative pulse voltage is applied to the mold to form the element ions to be formed from the plasma. A method of injecting or adhering (attaching a film) to a surface has been proposed (see, for example, Patent Document 1).
JP 2001-322828 A

However, in the above-described conventional method for producing an optical element molding die, when plasma is generated and deposited on the molding surface (film formation), the plasma supply time becomes longer (the number of repetitions of plasma generation increases). In some cases, droplets (droplets) generated during arc discharge adhere to the film-forming surface formed on the molding surface, and a smooth film-forming surface cannot be obtained.
The present invention has been made in view of the above circumstances, and improves the adhesion strength between a film formed after ion implantation and a molding surface by ion implantation, and provides a smooth film formation surface by a different method. An object of the present invention is to provide an optical element molding die having high adhesion strength.

The present invention employs the following means in order to solve the above problems.
An optical element molding die manufacturing method according to the present invention is an optical element molding die manufacturing method used for press molding of an optical element. In addition, a plasma containing at least one kind of noble metal ions is generated, and only ions are extracted from the plasma around the base material by applying a pulse voltage to the base material, and the ions are injected into at least the molding surface of the base material. Alternatively, a first step for performing both attachment or injection and attachment, and a film made of at least one kind of noble metal are formed on the molding surface after the first step by a film formation method different from the first step. And a second step.

In this method for manufacturing an optical element molding die, noble metal ions are implanted into at least the molding surface of the base material in the first step, so that both components of the base material and the noble metal are mixed into the implanted surface. A layer can be formed, and the adhesion of the noble metal film to the base material and the durability of the film can be improved.
In the second step, a film containing a noble metal is formed on the molding surface after the first step by a method different from that in the first step. Therefore, a drop generated when arc plasma is generated in the first step. It is possible to produce a film formation surface in which the adhesion of the let is suppressed and the unevenness is suppressed.

The method for manufacturing an optical element molding die according to the present invention is a method for manufacturing the optical element molding die, wherein the second step is a sputtering method in which the noble metal is attached to the molding surface by an ion beam. It is characterized by being.
The method for manufacturing an optical element molding die according to the present invention is a method for manufacturing the optical element molding die, wherein the second step is any one of a vapor deposition method, a CVD method, and an ion plating method. It is characterized by being one.
The method for manufacturing an optical element molding die according to the present invention is a method for manufacturing the optical element molding die, wherein the noble metal is at least one of Pt, Au, Ir, Re, Ag, Os, and Ta. It is characterized by having.
The method for producing an optical element molding die of the present invention is the method for producing the optical element molding die, wherein the base material is any one of cemented carbide, silicon carbide, or carbon. It is characterized by.

An optical element molding die manufacturing apparatus according to the present invention generates a plasma including at least one kind of noble metal ions on a molding surface of a vacuum container in which a base material of an optical element molding die is disposed. A means different from the ion implantation means capable of extracting only ions from the plasma around the base material by applying a pulse voltage to the base material and the ion implantation means capable of forming a film made of at least one kind of noble metal. And a shutter that selectively shields between the base material and the ion implantation means or between the base material and the different means.
The optical element molding die manufacturing apparatus according to the present invention is the optical element molding mold manufacturing apparatus, wherein the different means is a sputtering means for attaching the noble metal to the molding surface by an ion beam. It is characterized by that.

  This optical element mold manufacturing apparatus is an optical device having a film-forming surface that is smooth and has high adhesion strength with a base material, and that has little droplet adhesion when arc plasma is generated during ion implantation. An element molding die can be manufactured.

The optical element molding die according to the present invention is manufactured by the method for manufacturing an optical element molding die according to the present invention or the optical element molding die manufacturing apparatus according to the present invention.
Since this optical element molding die is manufactured by the optical element molding die manufacturing method or manufacturing apparatus according to the present invention, it is smooth and has high adhesion strength with the base material, and arc plasma at the time of ion implantation is It is possible to provide a film formation surface with little adhesion of droplets generated when it is generated, and to improve the life and releasability from glass.

  According to the present invention, it is possible to obtain an optical element molding die, a manufacturing method thereof, and a manufacturing apparatus that have a high adhesion strength on a smooth film-forming surface, an extended life, and improved releasability from glass. .

An embodiment according to the present invention will be described with reference to FIGS.
As shown in FIG. 1, the optical element molding die 1 according to the present embodiment is composed of a base material 2 formed entirely of cemented carbide. The molding surface 2A of the base material 2 has an opening diameter of 8 mm and a curvature radius of 5 mm, for example, and is mirror-polished.

2 and 3 show an apparatus 3 for manufacturing the optical element molding die 1 for forming a film. The manufacturing apparatus 3 includes a vacuum container 4 in which the base material 2 is disposed.
The vacuum vessel 4 is connected to the ground, and a conductive sample holder 5 is disposed in the upper portion of the vacuum vessel 4. A base material 2 to be deposited is held by a sample holder 5 and connected to a DC pulse bias power source 6 through the sample holder 5.

  Below the sample holder 5, a plasma containing Pt (noble metal) ions is generated on the molding surface 2A of the base material 2 and a pulse voltage is applied to the base material 2, thereby generating a plasma (Pt) that generates plasma. A target 7, a trigger electrode 8 that causes an initial discharge for generating plasma, and an arc electrode 9 that discharges the solid target 7 to generate plasma are installed.

The trigger electrode 8 is not electrically connected to the solid target 7 and is disposed in the vicinity of the solid target 7 via an insulator (not shown) so as to be electrically connected by discharge when a high voltage is applied. . The trigger electrode 8 is connected to the trigger power source 10 and the arc electrode 9 is connected to the arc power source 11. In the sample holder 5, the DC pulse bias power source 6, the target 7, the trigger electrode 8, the arc electrode 9, the trigger power source 10, and the arc power source 11, the molding surface 2A of the base material 2 contains Pt (noble metal ions). By generating a plasma and applying a pulse voltage to the base material 2, an ion implantation means A that can extract only Pt ions from the plasma around the base material 2 is configured.
The DC pulse bias power source 6 is controlled by a computer (not shown) so as to generate a negative voltage at the same time as or after the discharge of the arc electrode 9 starts. Reference numerals 4 a and 4 b denote exhaust ports for exhausting the inside of the vacuum vessel 4.

In the vacuum vessel 4, as a sputtering means B for forming a film by a method different from the method by the ion implantation means A, a target holder 12 on which a plurality of targets for film formation can be installed, and attached to the target holder 12 The film forming target 13, the ion source 16 for generating the ion beam 15 to be irradiated for releasing the sputtered particles 14 from the film forming target 13, and the acceleration voltage and beam current amount of the ion beam 15 are controlled. And a controller that does not.
Further, it has a moving mechanism 17A, and selectively blocks between the base material 2 and the ion implantation means A, or between the base material 2 and the sputtering means B, and the ion implantation means A and the sputtering means B. A shutter 17 capable of switching the film formation is provided.

As shown in FIG. 2, when the shutter 17 is disposed between the base material 2 installed in the sample holder 5 and the film formation target 13 (this case is a closed position), the sputtered particles. 14 can be blocked from reaching the base material 2 or, as shown in FIG. 3, when it is disposed between the base material 2 and the target 7 (this case is referred to as an open position). It is possible to shield the plasma generated by the arc electrode 9 from reaching the base material 2.
The Pt constituting the target 7 and the film-forming target 13 has a purity of 99.999%, for example.

Next, the manufacturing method of the optical element molding die 1 according to the present embodiment, and the operation and effect thereof will be described below.
In the method for manufacturing the optical element molding die 1 according to the present embodiment, as shown in FIG. 4, plasma containing Pt ions, which are noble metal ions, is generated around the base material 2 installed in the vacuum vessel 4. A first step (S01) of extracting only ions from plasma around the base material 2 by applying a pulse voltage to the base material 2 and injecting the ions into the molding surface 2A of the base material 2; A second step (S02) in which a film made of Pt is formed by sputtering on the molding surface 2A after the step (S01) is provided.

In the first step (S01), first, the base material 2 is set on the sample holder 5, and then the movement mechanism 17A is driven to move the shutter 17 to the closed position. Then, the inside of the vacuum vessel 4 is exhausted from the exhaust ports 4a and 4b, the pressure is reduced to 1 × 10 ⁻⁴ Pa or less, a voltage of 60 V is applied to the arc electrode 9, and a voltage of 4.5 kV is instantaneously applied to the trigger electrode 8. To cause trigger discharge.

With this trigger discharge as a trigger, a discharge occurs from the arc electrode 9 to the solid target 7, and Pt plasma is generated from the surface of the solid target 7. At that moment, the plasma reaches the periphery of the base material 2 in the vacuum vessel 4. At the same time, a DC pulse bias voltage of −15 kV is applied 100 times to the base material 2 by a DC pulse bias power source 6 at intervals of 12 μsec and 13 μsec. As a result, ions contained in the plasma around the base material 2 are extracted by the DC pulse bias voltage and injected into the base material 2. This injection operation was repeated 100 to 1000 times. At this time, since the extracted ions are based on an electric force, all the surfaces are implanted in the direction perpendicular to the surfaces even in a three-dimensional shape.
In this way, an inclined injection layer composed of Pt and the base material of the base material 2 is formed on the surface of the molding surface 2A of the base material 2.

Next, the process proceeds to the second step (S02).
First, pre-sputtering is performed for the purpose of removing impurities attached to the surface of the deposition target 13.
That is, in order to prevent the sputtered particles 14 including impurities sputtered by pre-sputtering from adhering to the base material 2, the shutter 17 is in a closed position, and a desired acceleration energy and beam current amount are controlled by a controller (not shown). The ion beam 15 is irradiated to the film forming target 13 from the ion source 16. As a result, impurities on the surface of the deposition target 13 are removed.

When a certain time has elapsed, the shutter 17 is moved to the open position. At this time, the sputtered particles 14 sputtered from the film forming target 13 by the irradiation of the ion beam 15 reach the surface of the base material 2 and adhere thereto, and a molded film made of Pt is formed.
Further, when the time for forming a desired film thickness has elapsed, the shutter 17 is closed to complete the film formation.

According to the method for manufacturing the optical element molding die 1, since Pt ions are implanted into the molding surface 2A of the base material 2 in the first step (S01), the base material 2 and Pt are formed on the implanted surface. A layer in which both components are mixed can be formed, and the adhesion of the Pt film to the base material 2 and the durability of the film can be improved.
In the second step (S02), since a film containing Pt is formed on the molding surface 2A after the first step (S01) by sputtering, arc plasma is generated in the first step (S01). It is possible to produce a film-formed surface in which the adhesion of droplets generated at the time is suppressed and unevenness is suppressed.
Therefore, it is possible to increase the life of the mold, improve the releasability from the glass, and the like through both processes, and it is possible to manufacture the optical element molding mold 1 having high adhesion strength on a smooth film-formed surface.

The technical scope of the present invention is not limited to the above embodiment, and various modifications can be made without departing from the spirit of the present invention.
For example, although Pt is used as the target 7 and the film formation target 13 in the above embodiment, it is not limited to Pt, and may be a noble metal such as Au, Ir, Re, Ag, Os, Ta, or an alloy thereof.
Moreover, although the base material 2 is a cemented carbide, it is not limited to a cemented carbide but may be silicon carbide or carbon.
Furthermore, the film forming method in the second step is not limited to the sputtering method, and may be any one of a vapor deposition method, a CVD method, and an ion plating method.

1 is a perspective view showing an optical element molding die according to an embodiment of the present invention. It is sectional drawing which shows the manufacturing apparatus used for manufacture of the optical element shaping | molding die concerning one Embodiment of this invention. It is sectional drawing which shows the manufacturing apparatus used for manufacture of the optical element shaping | molding die concerning one Embodiment of this invention. It is a flowchart which shows the manufacturing method of the optical element shaping | molding die concerning one Embodiment of this invention.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 Optical element shaping | molding die 2 Base material 2A Molding surface 3 Manufacturing apparatus 4 Vacuum container A Ion implantation means B Sputtering means

Claims (8)

In the method of manufacturing an optical element molding die used for press molding of an optical element,
A plasma containing at least one kind of noble metal ions is generated around a base material of the optical element molding die installed in a vacuum vessel, and a pulse voltage is applied to the base material to apply the pulse around the base material. A first step of extracting only ions from plasma and injecting or adhering the ions to at least the molding surface of the base material, or both injecting and adhering;
An optical element comprising: a second step of forming a film made of at least one kind of noble metal on the molding surface after the first step by a film forming method different from the first step. A method for manufacturing a mold for molding.   2. The method for manufacturing an optical element molding die according to claim 1, wherein the second step is a sputtering method in which the noble metal is attached to the molding surface by an ion beam.   The method for producing an optical element molding die according to claim 1, wherein the second step is any one of a vapor deposition method, a CVD method, and an ion plating method.   The optical element molding die according to any one of claims 1 to 3, wherein the noble metal includes at least one of Pt, Au, Ir, Re, Ag, Os, and Ta. Production method.   The method for producing an optical element molding die according to any one of claims 1 to 4, wherein the base material is any one of cemented carbide, silicon carbide, and carbon. A vacuum container in which a base material for an optical element molding die is disposed;
An ion implantation means capable of generating a plasma containing at least one kind of noble metal ions on the molding surface of the base material and extracting only ions from the plasma around the base material by applying a pulse voltage to the base material;
Means different from the ion implantation means capable of forming a film made of at least one kind of noble metal;
An optical element molding die, comprising: a shutter that selectively shields between the base material and the ion implantation means, or between the base material and the different means. apparatus.   The optical element molding die manufacturing apparatus according to claim 6, wherein the different unit is a sputtering unit that adheres the noble metal to the molding surface by an ion beam. An optical element molding die produced by the method for producing an optical element molding die according to any one of claims 1 to 5, or the optical element molding die manufacturing apparatus according to claim 6 or 7. Type.

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