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JP2005074397A - Washing method of electronic equipment and its evaluating method - Google Patents

Washing method of electronic equipment and its evaluating method Download PDF

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JP2005074397A
JP2005074397A JP2003311536A JP2003311536A JP2005074397A JP 2005074397 A JP2005074397 A JP 2005074397A JP 2003311536 A JP2003311536 A JP 2003311536A JP 2003311536 A JP2003311536 A JP 2003311536A JP 2005074397 A JP2005074397 A JP 2005074397A
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cleaning
electronic device
weight
alcohol
surfactant
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Yoko Todo
洋子 藤堂
Akira Sawada
彰 澤田
Hiroshi Hashimoto
央 橋本
Shigehito Kodera
繁仁 小寺
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Toshiba Corp
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Toshiba Corp
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a washing method of electronic equipment and its evaluating method by which regenerative washing of high reliability can be performed in a short time from washing to evaluation after washing according to an object to be washed of electronic equipment, a position thereof to be washed and soiling situations thereof. <P>SOLUTION: The washing method of the electronic equipment comprises a first washing process A2 in which the electronic equipment containing a soiled energized part is subjected to non-immersion washing with a first alcoholic aqueous solution of ≤60wt%, a second washing process A3 in which a residue of the first washing process is subjected to non-immersion washing with a second alcoholic aqueous solution of ≤60wt%, a purge process A4 for removing the residue after the second washing process and a drying process A5 for drying the electronic equipment after the purge process. <P>COPYRIGHT: (C)2005,JPO&NCIPI

Description

本発明は、電子機器の洗浄方法及びその評価方法に係り、特に、電子機器が設置される各種のフィールドの環境下で長期間使用された制御盤、配電盤等に搭載される電子回路基板や電気・電子部品、金属構造物等の電子機器の洗浄方法及びその評価方法に関する。   The present invention relates to an electronic device cleaning method and an evaluation method thereof, and more particularly, to an electronic circuit board or an electric circuit mounted on a control panel, a switchboard or the like that has been used for a long period of time in various field environments where the electronic device is installed. -It is related with the washing | cleaning method of electronic devices, such as an electronic component and a metal structure, and its evaluation method.

フィールドで使用される電子回路基板を搭載した電子機器の電子部品や金属構造物の表面には、設置環境に存在する塵埃や腐食性ガス等の汚損物質が付着し、蓄積する。この汚損物質により絶縁劣化、接触不良、金属の腐食等の劣化が進行し、やがて電子機器の故障を引き起こす要因となる。   Fouling substances such as dust and corrosive gas existing in the installation environment adhere to and accumulate on the surfaces of electronic components and metal structures of electronic devices equipped with electronic circuit boards used in the field. This fouling substance causes deterioration such as insulation deterioration, poor contact, and metal corrosion, and eventually causes a failure of electronic equipment.

一般に、このような汚損物質は掃除機による吸取りやアルコールを染み込ませた布による拭き取り清掃によって除去している。   In general, such fouling substances are removed by vacuuming or wiping with a cloth soaked with alcohol.

また、火災等が原因で電子機器が煤、燃焼ガス及び消火粉末をかぶってしまうことも起きる。この場合、煤、燃焼ガス、及び熱影響を受けた消火粉末は、電子機器に有害な汚損物質を吸湿しやすくなるため、このような状態に置かれた電子機器を素早く復旧させるには、火災発生後、短時間で汚損物質を除去する必要がある。   In addition, fires and the like may cause electronic equipment to be covered with soot, combustion gas, and fire extinguishing powder. In this case, fire extinguishing powder affected by soot, combustion gas, and heat easily absorbs pollutants that are harmful to electronic equipment, so to quickly restore an electronic equipment placed in such a state, It is necessary to remove the pollutant in a short time after the occurrence.

しかし、このように吸湿性が高い汚損物質は梅雨等の高湿度な環境においては、べたついた汚損物質となるため、掃除機では吸引することが困難で、拭き取り清掃だけで対処することが多い。   However, such a highly hygroscopic fouling substance becomes a sticky fouling substance in a high humidity environment such as the rainy season, and therefore, it is difficult to suck with a vacuum cleaner, and it is often handled only by wiping and cleaning.

このような汚損物質の除去方法では、手の届く範囲、あるいは掃除機のノズルが届く範囲でしか汚損物質を除去することができないので、汚損物質が相当量残留してしまうため、清掃後に故障が発生することが多い。   In such a method for removing fouling substances, since fouling substances can be removed only within the reach of the hand or the nozzle of the vacuum cleaner, a considerable amount of fouling substances remain, so that a failure occurs after cleaning. Often occurs.

電子機器に搭載される電子回路基板等の洗浄方法としては、水に浸漬して表面の汚損物質を除去する洗浄方法が行われている。この水による浸漬洗浄は、絶縁劣化や腐食の要因であるイオン性汚損の除去には効果的であるが、水は表面張力が大きいため実装部品の細部への浸透性が悪く、また乾燥性も悪いため、洗浄後に長時間の乾燥が必要であった。   As a method for cleaning an electronic circuit board or the like mounted on an electronic device, a cleaning method is performed in which the surface pollutant is removed by immersion in water. This immersion cleaning with water is effective in removing ionic contamination, which is a cause of insulation deterioration and corrosion, but water has a high surface tension, so it does not penetrate well into the details of mounted parts and also has a drying property. Since it was bad, drying for a long time was necessary after washing.

また、電子機器の細部構造への浸透性がよく、乾燥性にも優れる有機溶剤による洗浄方法は、有機溶剤が消防法で定められた危険物であるため、洗浄場所が限定されること、さらには、プラスチック等の場合は有機溶剤によって膨潤や溶解する作用があるため、洗浄前に構成材料に劣化が発生しないか否かを予め確認しておく必要であることなど、作業効率に問題があった。   In addition, organic solvent cleaning methods that have good penetration into the detailed structure of electronic equipment and excellent drying properties are limited in places where they can be cleaned because organic solvents are dangerous substances stipulated by the Fire Service Act. However, in the case of plastics and the like, there is a problem in work efficiency such as it is necessary to confirm in advance whether or not the constituent materials will be deteriorated before washing because it has the effect of swelling or dissolving with an organic solvent. It was.

そこで発明者らは、絶縁劣化や腐食の要因となるイオン性汚損物質の洗浄効果が高く、汚損された洗浄対象物が洗浄によって損傷しない、乾燥性に優れたアルコール水溶液を使用した洗浄方法を開発した(例えば、特許文献1参照。)。   Therefore, the inventors have developed a cleaning method using an aqueous alcohol solution that has a high cleaning effect on ionic fouling substances that cause insulation deterioration and corrosion, and that does not damage the contaminated cleaning object due to cleaning. (For example, see Patent Document 1).

しかし、この方法は油性の汚損物質が存在する場合、洗浄力が不十分なため洗浄に長時間かかってしまい、その結果乾燥にも長時間を要する問題があった。   However, this method has a problem that when an oily fouling substance is present, it takes a long time for cleaning because of insufficient cleaning power, resulting in a long time for drying.

また、洗浄対象物が電子回路基板等の精密部品で構成されている場合には、表面に付着した汚損物質を除去するために、汚損物がさらに浸透しないように長時間洗浄液に浸漬して、汚損物質を浮き上がらせるという方法も行われている。   In addition, when the object to be cleaned is composed of precision parts such as an electronic circuit board, in order to remove the pollutant adhering to the surface, soak in the cleaning liquid for a long time so that the pollutant does not further penetrate, There is also a method of raising fouling substances.

この方法では、浸漬洗浄液中に汚損物質が溶け出し再汚染される恐れがあるため、浸漬洗浄液の浸透が懸念される部品すべてについてマスキング処理を施す必要がある。そのため、作業性が極端に低下する問題があった。   In this method, since a fouling substance may be dissolved and recontaminated in the immersion cleaning liquid, it is necessary to perform a masking process on all the parts that are liable to penetrate the immersion cleaning liquid. Therefore, there is a problem that workability is extremely lowered.

また、上記のような方法で表面に付着した汚損物質の洗浄処理の最終工程は、汚損防止のため、例えば、電子回路基板の場合には表面にコーティング処理を実施している。しかし、金属構造物等の塗装面の場合には、再塗装膜の再汚損防止効果を有する有効な洗浄方法がなかったため、汚損防止対策が困難であった。   Further, in the final step of the cleaning process of the pollutant adhered to the surface by the above method, for example, in the case of an electronic circuit board, the surface is coated to prevent the pollutant. However, in the case of a painted surface of a metal structure or the like, since there was no effective cleaning method having an effect of preventing re-fouling of the re-painted film, it was difficult to take measures for preventing fouling.

また、大気の影響を受けやすい電子機器の金属部、例えば、車両等で使用されているアルミニュム製の冷却フィンは、使用環境中の海塩粒子や亜硫酸ガス等のイオン性汚損物質により腐食が発生しやすい。この金属部の洗浄は、水をジェット噴射して汚損物質を溶解除去する洗浄方法とすることが多い。   Also, metal cooling parts of electronic devices that are easily affected by the atmosphere, such as aluminum cooling fins used in vehicles, are corroded by ionic pollutants such as sea salt particles and sulfurous acid gas in the environment of use. It's easy to do. This cleaning of the metal part is often a cleaning method in which fouling substances are dissolved and removed by jetting water.

しかし、このような洗浄方法では、水は複雑な形状や隙間部を有する電子機器の構造物の細部まで浸透せず、かえって隙間部に汚損が溶解した水がたまり、残留した高濃度の汚損物質によって腐食される問題があった。   However, in such a cleaning method, water does not penetrate into the details of the structure of the electronic device having a complicated shape or gap, but rather, the water in which the dirt is dissolved accumulates in the gap, and the remaining high-concentration pollutant There was a problem of being corroded by.

また、電子機器等の洗浄効果の評価方法としては、表面に電極用の導電テープを貼り付けて絶縁抵抗を測定し、所定の抵抗値が回復したことで良否判定していたが、測定時の温度や湿度の影響を受け易く、この方法では正確な判定が困難であった。
特開平9−71884号公報
In addition, as a method for evaluating the cleaning effect of electronic equipment, etc., the insulation resistance was measured by sticking a conductive tape for electrodes on the surface, and it was determined that the predetermined resistance value was restored. It is easily affected by temperature and humidity, and accurate determination is difficult with this method.
JP-A-9-71884

以上述べたように、従来の電子機器の洗浄方法は、電子機器の洗浄対象物、その電子機器の設置環境、汚損物質及び汚損状態によって、種々の洗浄が試みられていたが、電子機器の汚損原因となる設置された汚損環境とその汚損箇所に対して体系化された、効果的な洗浄方法が確立されていなかった。   As described above, conventional cleaning methods for electronic devices have been attempted for various types of cleaning depending on the cleaning target of the electronic device, the installation environment of the electronic device, the fouling substance, and the fouling state. An effective cleaning method has not been established that is systematized for the cause of the installed polluted environment and the damaged site.

すなわち、電子機器の汚損状態がイオン性物質や油状物質を含む汚損物質の場合、浸漬洗浄を行うと、洗浄液に溶解したイオン性物質や油状物質によって再汚染される恐れがあるため、洗浄液の成分、洗浄液の交換タイミングが難しい問題がある。また、洗浄時に洗浄液の浸透が懸念される部品についてはマスキングが必要になるなど作業性が悪い問題もある。   That is, if the fouling state of the electronic device is a fouling substance containing an ionic substance or oily substance, there is a risk of recontamination by ionic substance or oily substance dissolved in the washing liquid when immersion cleaning is performed. There is a problem that it is difficult to replace the cleaning liquid. In addition, there is a problem that workability is poor, such as masking required for parts that are likely to be infiltrated with cleaning liquid during cleaning.

また、電子機器の樹脂コーティング剤の表面、電子機器外箱などの塗装表面の再汚損防止対策として再塗装処理を施す場合があるが、再塗装膜の再汚損防止効果として有効な洗浄方法がなかった。   In addition, re-coating treatment may be applied to prevent re-fouling of the resin coating agent surface of electronic equipment and the coating surface of electronic equipment outer packaging, etc., but there is no effective cleaning method for preventing re-fouling of the re-coated film. It was.

また、電子機器の複雑な形状を有する金属構造部等にイオン性汚損物質が付着した場合、水によるジェット噴水洗浄方法を行うと隙間部分に高濃度の洗浄液が残留し、ピット状の孔食腐食の原因となる問題がある。   In addition, when ionic fouling substances adhere to metal structures having complicated shapes in electronic equipment, a high-concentration cleaning liquid remains in the gaps when the water jet fountain cleaning method is used, resulting in pit-like pitting corrosion. There is a problem that causes

さらに、これらの電子機器の回復度合いを示す絶縁抵抗値の測定方法にも満足の行く方法がなく、洗浄の結果の良否判定が困難であった。   Furthermore, there is no satisfactory method for measuring the insulation resistance value indicating the degree of recovery of these electronic devices, and it has been difficult to determine the quality of the cleaning result.

本発明は、上記問題点を解決するためになされたもので、電子機器の洗浄対象物、汚損された洗浄対象箇所及びその汚損状態によって、洗浄から洗浄後の評価までを短時間で、信頼度の高い再生洗浄をすることができる、電子機器の洗浄方法及びその評価方法を提供することを目的とする。   The present invention has been made to solve the above-mentioned problems, and the reliability from the cleaning to the evaluation after the cleaning is short and reliable depending on the cleaning object of the electronic device, the contaminated object to be cleaned and the contamination state thereof. It is an object of the present invention to provide a method for cleaning an electronic device and a method for evaluating the same, which can perform regenerative cleaning with high accuracy.

請求項1においては、汚損された通電部分を含む電子機器を、60重量%以下の第1のアルコール水溶液で非浸漬洗浄する第1の洗浄工程と、60重量%以下の第2のアルコール水溶液で前記第1の洗浄工程の残さを非浸漬洗浄する第2の洗浄工程と、前記第2の洗浄工程後の残さを除去するパージ工程と、
前記パージ工程の後、前記電子機器を乾燥する乾燥工程とを備えたことを特徴とする。
In claim 1, the electronic device including the contaminated current-carrying part is washed with a first alcohol aqueous solution of 60% by weight or less in the first alcohol aqueous solution, and the second alcohol aqueous solution of 60% by weight or less. A second cleaning step for non-immersing and cleaning the residue of the first cleaning step; and a purge step for removing the residue after the second cleaning step;
And a drying step of drying the electronic device after the purging step.

本発明によれば、電子機器の電子回路基板およびその基板上の電子部品を、60重量%以下のアルコール水溶液で非浸漬洗浄するので、大気中の環境で経年的に付着する汚損物質、すなわち、電気的特性に影響を与える可能性の高いイオン性の塵埃である、大気中の海塩粒子、NOx,SOx等の腐食性ガスが吸着した塵埃粒子による汚損物質を、短時間で除去できる効率的な洗浄が可能となる。   According to the present invention, since the electronic circuit board of the electronic device and the electronic component on the board are non-immersed and washed with an alcohol aqueous solution of 60% by weight or less, a fouling substance that adheres over time in an atmospheric environment, that is, Efficient to remove pollutants in a short time due to dust particles adsorbed by corrosive gases such as sea salt particles, NOx and SOx in the atmosphere, which are ionic dusts that have a high potential to affect electrical characteristics Cleaning is possible.

また、この洗浄液は電子機器の各種部品や材料に損傷を与えることがないので、マスキングや事前の洗浄評価試験を実施する必要がない。   In addition, since this cleaning liquid does not damage various parts and materials of the electronic equipment, it is not necessary to perform masking or prior cleaning evaluation tests.

請求項2においては、汚損された通電部分を含む電子機器を、界面活性剤を添加した40乃至60重量%の第1のアルコール水溶液で非浸漬洗浄する第1の洗浄工程と、界面活性剤を含まない60重量%以下の第2のアルコール水溶液で前記第1の洗浄工程の残さを非浸漬洗浄する第2の洗浄工程と、前記第2の洗浄工程後の残さを除去するパージ工程と、前記パージ工程の後、前記電子機器を乾燥する乾燥工程とを備えたことを特徴とする。   According to a second aspect of the present invention, there is provided a first cleaning step for non-immersing and cleaning the electronic device including the contaminated energized portion with a 40 to 60 wt% first alcohol aqueous solution to which a surfactant is added, and the surfactant. A second cleaning step in which the residue of the first cleaning step is non-immersed and washed with an aqueous solution of 60% by weight or less of the second alcohol that is not included; a purge step of removing the residue after the second cleaning step; And a drying step of drying the electronic device after the purge step.

本発明によれば、電子機器の電子回路基板及びその基板上の電子部品を、イオン性汚損物質及び油性汚損物質のいずれに対しても溶解性の高い40乃至60重量%のアルコール水溶液とし、これに界面活性剤を添加して非浸漬洗浄するので、油煙等を含む工場の雰囲気環境に長期間置かれた電子機器の電子回路基板及びその基板上の電子部品表面に付着した汚損物質を短時間で効率良く洗浄できる。   According to the present invention, an electronic circuit board of an electronic device and an electronic component on the board are made into a 40 to 60% by weight alcohol aqueous solution having high solubility in both ionic and oily pollutants, Since surfactants are added to the product and non-immersed cleaning is performed, the fouling substances adhering to the electronic circuit boards of electronic devices and the electronic component surfaces on the boards that have been placed in a factory atmosphere containing oily smoke for a long period of time can be removed for a short time. Can be cleaned efficiently.

また、その後界面活性剤を含まない60重量%アルコール水溶液で非浸漬洗浄するので、腐食性の原因となるイオン性物質を水洗浄と同等で、且つ水洗浄の場合よりも短時間で乾燥できる。   In addition, since the non-immersion cleaning is performed with a 60% by weight alcohol aqueous solution that does not contain a surfactant, the ionic substance that causes corrosiveness is equivalent to the water cleaning and can be dried in a shorter time than the case of the water cleaning.

請求項4によれば、汚損された電子機器の非通電部を、界面活性剤を添加した40%乃至60重量%の第1のアルコール水溶液で非浸漬洗浄する第1の洗浄工程と、界面活性剤を含まない60重量%以下の第2のアルコール水溶液で前記第1の洗浄工程の残さを非浸漬洗浄する第2の洗浄工程と、前記第2の洗浄工程後の残さを除去するパージ工程と、前記パージ工程の後、帯電防止剤または防滴剤を添加した60重量%以下の第3のアルコール水溶液を噴霧する防滴仕上げ工程と、前記防滴仕上げ工程の後、前記電子機器を乾燥する乾燥工程とを備えたことを特徴とする。   According to the fourth aspect of the present invention, there is provided a first cleaning step in which a non-conducting portion of a soiled electronic device is non-immersed and cleaned with a 40% to 60% by weight first alcohol aqueous solution to which a surfactant is added; A second cleaning step in which the residue of the first cleaning step is non-immersed and cleaned with a 60% by weight or less second alcohol aqueous solution not containing an agent; and a purge step in which the residue after the second cleaning step is removed. After the purge step, the electronic device is dried after the drip-proofing step of spraying a third alcohol aqueous solution of 60% by weight or less to which an antistatic agent or a drip-proofing agent is added, and after the drip-proof finishing step. And a drying step.

本発明によれば、電子機器の非通電部の汚れ防止処理が出来ない構造物に対して、帯電防止剤または防滴剤を添加した60重量%以下のアルコール水溶液を噴霧する防滴仕上げを行うので、汚損物質の再付着を抑制することができる。   According to the present invention, a drip-proof finish is performed by spraying a 60% by weight or less alcohol aqueous solution to which an antistatic agent or a drip-proofing agent is added, on a structure in which a non-contamination treatment cannot be performed on a non-conducting portion of an electronic device. Therefore, the reattachment of the fouling substance can be suppressed.

請求項5によれば、前記界面活性剤は、非イオン系界面活性剤と陰イオン系界面活性剤の混合物とし、添加量は前記第1のアルコール水溶液の0.1乃至0.3重量%としたことを特徴とする。   According to claim 5, the surfactant is a mixture of a nonionic surfactant and an anionic surfactant, and the addition amount is 0.1 to 0.3% by weight of the first aqueous alcohol solution. It is characterized by that.

本発明によれば、泡立ちが少なく且つ泡切れの良い、非イオン系、陰イオン系の混合物の界面活性剤を少量添加したので、短時間で効率的な油状汚損物質の洗浄ができる。   According to the present invention, since a small amount of a nonionic or anionic mixture of surfactants with less foaming and good foaming is added, the oily fouling substance can be efficiently washed in a short time.

請求項6によれば、前記帯電防止剤または防滴剤は、陰イオン系(アニオン系)界面活性剤、陽イオン系(カチオン系)界面活性剤または非イオン系(ノニオン系)界面活性剤、及びそれらの混合剤のいずれかとしたことを特徴とする。   According to claim 6, the antistatic agent or drip-proofing agent is an anionic (anionic) surfactant, a cationic (cationic) surfactant or a nonionic (nonionic) surfactant, And any one of these admixtures.

本発明によれば、洗浄される対象材料により界面活性剤を選択するので、汚れの再付着を抑制することができる。   According to the present invention, since the surfactant is selected depending on the target material to be cleaned, it is possible to suppress the reattachment of dirt.

請求項7によれば、汚損された電子機器の金属部を60℃以上の温水で非浸漬洗浄する第1の温水洗浄工程と、腐食抑制剤を添加した30重量%以上のアルコール水溶液で非浸漬洗浄する第2の防食仕上げ洗浄工程とを備えたことを特徴とする。   According to the seventh aspect of the present invention, the first hot water cleaning step of non-immersing and cleaning the metal part of the damaged electronic device with hot water of 60 ° C. or higher, and non-immersing with an aqueous solution of 30% by weight or more of alcohol added with a corrosion inhibitor. And a second anticorrosive finish cleaning step for cleaning.

本発明によれば、電子機器の金属部を、60℃以上の温水で非浸漬洗浄するので金属表面に付着した腐食性因子の溶解性を高なる。さらに、金属の種類に適合する腐食抑制剤を添加した30重量%以上のアルコール水溶液で非浸漬の仕上げ洗浄を行うので、防食特性を付与するとともに、乾燥時間も短縮することができる。   According to the present invention, since the metal portion of the electronic device is non-immersed and washed with hot water of 60 ° C. or higher, the solubility of the corrosive factor attached to the metal surface is increased. Furthermore, since non-immersed finish cleaning is performed with an alcohol aqueous solution of 30% by weight or more to which a corrosion inhibitor suitable for the type of metal is added, anticorrosion properties can be imparted and drying time can be shortened.

請求項10によれば、被測定対象となる絶縁部の等価塩分量と表面絶縁抵抗を予め測定し、前記等価塩分量と表面絶縁抵抗との相関関係をデータベースとして記憶しておき、前記被測定対象表面の等価塩分量を測定し、この測定結果と前記データベースを比較し、所定の表面絶縁抵抗の範囲内に回復しているか否かを判定することを特徴とする。   According to claim 10, the equivalent salt content and the surface insulation resistance of the insulation part to be measured are measured in advance, and the correlation between the equivalent salt content and the surface insulation resistance is stored as a database, and the measurement object The equivalent salinity amount of the target surface is measured, and the measurement result is compared with the database to determine whether or not the target surface has recovered within a predetermined range of surface insulation resistance.

本発明によれば、洗浄対象表面の等価塩分量の測定から、汚損物質の除去率と測定環境条件を加味した絶縁抵抗値の推定が可能となるので、洗浄の良否を短時間で定量的に判定できる。   According to the present invention, it is possible to estimate the insulation resistance value in consideration of the removal rate of fouling substances and the measurement environmental conditions from the measurement of the equivalent salt content on the surface to be cleaned. Can be judged.

以上述べたように、本発明によれば、電子機器の汚損箇所とその汚損状態によって最適な、短時間で回復が可能な洗浄方法が選択でき、更に洗浄結果の良否判定を定量的におこなうことができるので信頼度の高い電子機器の洗浄方法及びその評価方法を提供することができる。   As described above, according to the present invention, it is possible to select an optimal cleaning method that can be recovered in a short time depending on the location and state of contamination of the electronic device, and quantitatively determine the quality of the cleaning result. Therefore, it is possible to provide a highly reliable electronic device cleaning method and its evaluation method.

電子機器の汚損状態を示す代表的な4つのモデルについて、実施例1乃至実施例5その最良の形態を説明する。   The best modes of the first to fifth embodiments will be described with respect to four representative models showing the fouling state of an electronic device.

実施例1は、塵埃や排気ガス等の大気に触れる環境下に長期間置かれた電子機器の洗浄、実施例2は、油煙の多い工場で使用された電子機器及び火災による燃焼ガスや消化粉末で汚損された場合の電子機器の洗浄、実施例3は、道路の照明設備等、車の排気ガスや臨海地帯の海塩粒子に触れる大気環境に長期間置かれた電子機器の外箱等の塗装面の洗浄、及び、実施例4は、レール上の走行環境に置かれた、車輛等に搭載される電子機器の金属構造物の洗浄について、夫々の最良の形態を説明する。   Example 1 is cleaning of electronic equipment that has been placed in an environment exposed to the atmosphere such as dust and exhaust gas for a long period of time, Example 2 is electronic equipment used in a factory with a lot of oily smoke, and combustion gas and digested powder due to fire Cleaning the electronic equipment when it is soiled by the air, Example 3 is a case of roadside lighting equipment, etc., such as the outer box of electronic equipment that has been placed in an atmospheric environment that is exposed to car exhaust gas or sea salt particles in the coastal zone for a long time. The cleaning of the painted surface and the fourth embodiment will explain the best mode for cleaning the metal structure of the electronic device mounted on the vehicle or the like placed in the traveling environment on the rail.

また、絶縁抵抗値の測定方法による洗浄の評価方法を実施例5で説明する。   In addition, a cleaning evaluation method using an insulation resistance value measuring method will be described in Example 5.

通電部分を含む電子機器の電子回路基板およびその基板上の電子部品は、海塩粒子、NOx,SOx等の腐食性ガスが吸着したイオン性塵埃粒子を含む大気中の環境において長期間使用された場合には、これらの塵埃粒子が付着することによって経年的に電子機器の劣化が進行する。   An electronic circuit board of an electronic device including a current-carrying portion and an electronic component on the board have been used for a long period of time in an atmospheric environment containing ionic dust particles adsorbed with corrosive gas such as sea salt particles, NOx, SOx, etc. In some cases, the deterioration of electronic equipment progresses over time due to the adhesion of these dust particles.

図1はこうした汚染された大気環境で使用された電子回路基板の洗浄工程を示すフロー図である。以下図1を参照して本実施例を説明する。   FIG. 1 is a flowchart showing a cleaning process of an electronic circuit board used in such a polluted atmospheric environment. Hereinafter, this embodiment will be described with reference to FIG.

洗浄工程は、洗浄前処理作業としての塵埃を除去する塵埃除去工程A1、塵埃が目視できない程度の状態になるまで洗浄液を基板表面に噴霧して、塵埃粒子を主に非浸漬で洗浄する予備洗浄工程A2、主にイオン性汚損物質を除去する仕上げ洗浄工程A3、洗浄液を吹き飛ばすパージ工程A4及びパージ後の乾燥工程A5とからなる。   The cleaning process is a dust cleaning process A1 for removing dust as a pre-cleaning operation, a pre-cleaning process in which a cleaning liquid is sprayed on the substrate surface until the dust is in a state where it cannot be visually observed, and dust particles are mainly cleaned without being immersed. The process includes a process A2, a final cleaning process A3 for mainly removing ionic fouling substances, a purge process A4 for blowing off the cleaning liquid, and a drying process A5 after the purge.

次に各工程の洗浄方法について同じく図1を参照して説明する。先ず、電子回路基板1a表面の塵埃量が多い場合は、塵埃除去工程A1で掃除機1cのような吸引装置で、表面の塵埃を柔らかいブラシ1bでブラッシングしながら吸引除去する。塵埃が少ない場合は、塵埃除去工程A1は省略することができる。   Next, the cleaning method in each step will be described with reference to FIG. First, when the amount of dust on the surface of the electronic circuit board 1a is large, the dust on the surface is sucked and removed by brushing with a soft brush 1b with a suction device such as the vacuum cleaner 1c in the dust removing step A1. When there is little dust, the dust removal step A1 can be omitted.

次に、予備洗浄工程A2では、帯電防止容器2c内に基板ラック2dを置き、その上に電子回路基板1aをセットする。このとき洗浄液としては、蒸留水またはイオン交換水57重量%、エチルアルコール41重量%、及びイソプロピルアルコール2重量%の組成からなるアルコール水溶液を噴霧器2e入れ、噴霧器2eによって電子回路基板1a表面に洗浄液を噴射する。   Next, in the preliminary cleaning step A2, the substrate rack 2d is placed in the antistatic container 2c, and the electronic circuit board 1a is set thereon. At this time, as the cleaning liquid, an alcohol aqueous solution composed of 57% by weight of distilled water or ion-exchanged water, 41% by weight of ethyl alcohol and 2% by weight of isopropyl alcohol is put in the sprayer 2e, and the cleaning liquid is applied to the surface of the electronic circuit board 1a by the sprayer 2e. Spray.

噴射しただけでは汚損物質を除去できない場合には、柔らかいブラシ1bによる軽いブラッシングと洗浄液の噴射を交互に繰り返し、塵埃粒子が除去できるまで非浸漬洗浄を施す。この洗浄の良否は目視で判定する。   If the pollutant cannot be removed simply by spraying, light brushing with the soft brush 1b and spraying of the cleaning liquid are alternately repeated, and non-immersion cleaning is performed until dust particles can be removed. The quality of this cleaning is judged visually.

このアルコール水溶液のアルコール濃度は、イオン性物質と油性物質の双方に溶解性の高い40乃至60重量%の範囲とし、且つ、アルコールは水と無限大に相溶性のある、炭素数4以上脂肪族アルコール、例えば、メチルアルコール、エチルアルコール、n−プロピルアルコール、イソプロピルアルコールを組み合わせたものを使用する。   The alcohol concentration of this aqueous alcohol solution is in the range of 40 to 60% by weight, which is highly soluble in both ionic substances and oily substances, and the alcohol is infinitely compatible with water and has an aliphatic content of 4 or more carbon atoms. A combination of alcohols such as methyl alcohol, ethyl alcohol, n-propyl alcohol, isopropyl alcohol is used.

このアルコール水溶液の濃度の選択とその洗浄効果については、既に、本発明者らが特開平7−71884で公開している。   The selection of the concentration of the aqueous alcohol solution and its cleaning effect have already been disclosed by the present inventors in JP-A-7-71884.

次に、仕上げ洗浄工程A3では、予備洗浄工程でA2において塵埃粒子が除去後のイオン性汚損物質の除去を主目的とするので、予備洗浄工程A2で使用した60重量%以下のアルコール水溶または、それよりも濃度の低い、例えば、40重量%以下のアルコール水溶液を噴霧器2eにいれて、電子回路基板1a表面に噴射し、非浸漬洗浄する。   Next, in the final cleaning step A3, the main purpose is to remove the ionic fouling substances after the dust particles are removed in A2 in the preliminary cleaning step. Therefore, the aqueous solution of 60 wt% or less used in the preliminary cleaning step A2 or An alcohol aqueous solution having a lower concentration, for example, 40% by weight or less, is placed in the sprayer 2e, sprayed onto the surface of the electronic circuit board 1a, and washed without immersion.

この様に予備洗浄工程A2と仕上げ洗浄工程A3とで洗浄液のアルコール濃度を変えることによって、アルコールの使用量を抑制して、より経済性の高い洗浄効果が可能となる。   In this way, by changing the alcohol concentration of the cleaning liquid between the preliminary cleaning step A2 and the final cleaning step A3, the amount of alcohol used is suppressed, and a more economical cleaning effect becomes possible.

この洗浄も帯電防止容器2c内に基板ラック2dを置き、電子回路基板1aが帯電防止容器2cの底に溜まった洗浄液に触れ、再汚損しないようにして行う。   This cleaning is also performed by placing the substrate rack 2d in the antistatic container 2c so that the electronic circuit board 1a touches the cleaning liquid accumulated on the bottom of the antistatic container 2c and does not re-contamination.

また、電子回路基板1a上の表面には、洗浄液が内部に侵入する可能性があるリレー、トランス、ボリューム抵抗等が取り付けられているが、これらの部品について、予め洗浄前後で電気特性に変化がなく、侵入した洗浄液は蒸発し内部を汚損しないことを検証しておく。   In addition, a relay, a transformer, a volume resistor and the like that may allow the cleaning liquid to enter the inside are attached to the surface on the electronic circuit board 1a. However, the electrical characteristics of these parts change before and after cleaning in advance. It is verified that the invading cleaning liquid evaporates and does not contaminate the inside.

これらの電子部品については、40℃の洗浄液に30分間浸漬後、その前後の電気的特性を比較検証した結果、差異がなく再利用できたことから洗浄液侵入防止のためのマスキング処理は不要であることが確認された。   These electronic components were immersed in a cleaning solution at 40 ° C. for 30 minutes, and the electrical characteristics before and after the comparison were verified. As a result, they could be reused without any difference. It was confirmed.

次に、仕上げ洗浄工程A3終了後、速やかにパージ工程A4で窒素ガスまたは圧縮空気ボンベに繋いだエアーガン4gを使用して、清浄空気または窒素ガスを電子回路基板1a表面に吹き付け、付着している洗浄液を吹き飛ばす。このパージ工程A4によりで電子回路基板1aに実装された電子部品の下やコネクタの内部に入った洗浄液を吹き飛ばすことができる。   Next, after the finish cleaning step A3 is completed, clean air or nitrogen gas is sprayed and adhered to the surface of the electronic circuit board 1a immediately using the air gun 4g connected to the nitrogen gas or compressed air cylinder in the purge step A4. Blow away the cleaning solution. By this purging step A4, it is possible to blow away the cleaning liquid that has entered under the electronic components mounted on the electronic circuit board 1a or inside the connector.

次に、パージ工程A4後、速やかに乾燥工程A5で、洗浄した電子回路基板1aを60℃に設定した乾燥炉5hで2時間乾燥する。長期間使用された電子回路基板1aなので乾燥温度は、例えば、電子部品の保存温度範囲内の、最高60℃とする。   Next, after the purge process A4, the cleaned electronic circuit board 1a is quickly dried in the drying furnace 5h set at 60 ° C. for 2 hours in the drying process A5. Since the electronic circuit board 1a has been used for a long period of time, the drying temperature is, for example, a maximum of 60 ° C. within the storage temperature range of the electronic component.

この乾燥時間を2時間に設定した根拠について図2を参照して説明する。電子回路基板1aは高密度実装された基板を一度洗浄乾燥し、電子回路基板1aの基板重量と基板表面の絶縁抵抗を測定する。   The basis for setting the drying time to 2 hours will be described with reference to FIG. The electronic circuit board 1a once cleans and dries the board mounted with high density, and measures the weight of the electronic circuit board 1a and the insulation resistance of the substrate surface.

図2は、この基板重量と絶縁抵抗値を初期値として、前述した洗浄工程で洗浄し、窒素ガスパージ直後から乾燥温度60℃とした乾燥工程での基板重量および電極間の絶縁抵抗の経時変化を調査した結果を示したものである。   FIG. 2 shows the changes over time in the substrate weight and the insulation resistance between the electrodes in the drying process, in which the substrate weight and the insulation resistance value are set as initial values in the drying process after the nitrogen gas purge and the drying temperature is set to 60 ° C. The results of the investigation are shown.

同図に示す様に、基板重量は乾燥時間15分で洗浄前の重量に戻ることから、この時点で基板表面の洗浄液はほとんど蒸発している。一方、破線で示したように絶縁抵抗値は110分後にこの基板としての所定の値(1012=1.E+12Ω)以上に回復することから、洗浄後に短時間で通電することを想定して、乾燥時間は2時間と設定した。 As shown in the figure, the weight of the substrate returns to the weight before the cleaning in a drying time of 15 minutes, and at this time, the cleaning liquid on the surface of the substrate is almost evaporated. On the other hand, as indicated by the broken line, the insulation resistance value recovers to a predetermined value (10 12 = 1.E +12 Ω) or more after 110 minutes, so that it is assumed that power is supplied in a short time after cleaning. The drying time was set to 2 hours.

この乾燥時間は、パージ工程A4の後にエチルアルコールを電子回路基板1a表面に噴射し、基板表面の洗浄液をアルコールで置換すれば、短縮される。また、乾燥炉5gを減圧し、内部に浸透した洗浄液の蒸発を加速すれば、さらに短縮される。   This drying time can be shortened by spraying ethyl alcohol onto the surface of the electronic circuit board 1a after the purge step A4 and replacing the cleaning liquid on the substrate surface with alcohol. Further, if the drying furnace 5g is decompressed to accelerate the evaporation of the cleaning liquid that has penetrated into the drying furnace, the time is further shortened.

このような工程で洗浄された3種類の汚損レベルの異なる電子回路基板1a(基板1乃至基板3)について、洗浄前後の等価塩分量の測定結果を図3に示す。図3に示す様に、洗浄前の汚損のレベルが異なっていても、洗浄後の等価塩分量は0.01mg/cm以下まで低減され、洗浄された電子回路基板1aは、所定の絶縁抵抗値1012Ω(=1.E+12)以上に回復した。その結果再使用が可能と判断され、この洗浄方法による効果が確認された。 FIG. 3 shows the measurement results of the equivalent salinity before and after cleaning of the three types of electronic circuit boards 1a (board 1 to board 3) having different fouling levels cleaned in such a process. As shown in FIG. 3, even if the level of fouling before cleaning is different, the equivalent salt content after cleaning is reduced to 0.01 mg / cm 2 or less, and the cleaned electronic circuit board 1a has a predetermined insulation resistance. The value recovered to 10 12 Ω (= 1.E +12 ) or more. As a result, it was judged that it could be reused, and the effect of this cleaning method was confirmed.

尚、この等価塩分量と絶縁抵抗との相関関係から、洗浄結果の良否を判定する方法については、夫々の実施例に共通する評価方法であるので実施例5においてその詳細を説明する。   The method for determining the quality of the cleaning result based on the correlation between the equivalent salt content and the insulation resistance is an evaluation method common to the respective examples, and will be described in detail in Example 5.

上記実施例は電子回路基板1aの例で説明したが、それ以外に基板を収納したユニット全体を洗浄する場合にも適用できる。電子機器は分解して洗浄した方が、洗浄効果が高い。しかし短時間の復旧が要求され、分解ができない場合には、本実施例の洗浄工程に基づいて、電子機器毎丸洗いしても洗浄の効果が得られる。   Although the said Example demonstrated the example of the electronic circuit board 1a, it is applicable also when wash | cleaning the whole unit which accommodated the board | substrate other than that. Cleaning and disassembling electronic equipment has a higher cleaning effect. However, if a short recovery time is required and disassembly is not possible, the cleaning effect can be obtained even if the entire electronic device is washed based on the cleaning process of this embodiment.

電子機器の電子回路基板及びその基板上の電子部品は、機械油等を使用する油煙等を含む工場の雰囲気や、製鉄所の圧延工場内のオイルミストを含む雰囲気等に触れる環境に長期間設置される場合がある。こうした電子機器の電子回路基板及びその基板上の電子部品は、これらの油成分を含んだ汚損物質が堆積し、経年的に劣化が進行する。   Electronic circuit boards of electronic equipment and electronic parts on the boards are installed for a long time in an environment that touches the atmosphere of a factory containing oily smoke using machine oil, etc., or the atmosphere containing oil mist in a steel mill rolling mill. May be. The electronic circuit board of such an electronic device and the electronic components on the board are accumulated with a fouling substance containing these oil components, and the deterioration progresses over time.

また、こうした油成分の多い工場においてはまれに火災等が発生しすることもあり、消化活動に伴う消化粉末やケーブルなどの燃焼ガスによって汚損された電子回路基板を短時間で復旧の目途を立てたい場合がある。   In addition, fires may occur rarely in factories with a large amount of oil components, and it is possible to quickly restore electronic circuit boards that have been contaminated by digestion powder and cables such as cables accompanying digestion activities. Sometimes you want to.

本実施例2は、こうした環境に置かれた電子機器の電子回路基板及びその基板上の電子部品を短時間で再生復旧させる場合の洗浄方法で、同じく図1を参照して説明する。   The second embodiment is a cleaning method in the case where an electronic circuit board of an electronic device placed in such an environment and electronic components on the board are regenerated and restored in a short time, and will be described with reference to FIG.

実施例2が実施例1と異なる点は、予備洗浄工程A2において、主たる汚損物質である油成分を除去するため、界面活性剤を添加した洗浄液を噴霧して洗浄する点が異なる。その他の工程は、実施例1で述べた洗浄工程と同じであるので説明を省略する。   The difference between Example 2 and Example 1 is that, in the pre-cleaning step A2, in order to remove the oil component that is the main fouling substance, cleaning is performed by spraying a cleaning liquid to which a surfactant is added. Other steps are the same as the cleaning step described in the first embodiment, and thus the description thereof is omitted.

実施例2における予備洗浄工程A2においては、少量の界面活性剤を添加した洗浄液を使用する。この界面活性剤には、例えば、泡切れが良い非イオン系性界面活性剤である下記(化1)に示したポリオキシエチレンアルキルエーテルと、分散力に優れた陰イオン系性界面活性剤である下記(化2)に示したアルキルエーテル硫酸エステルナトリウムがある。   In the preliminary cleaning step A2 in Example 2, a cleaning liquid to which a small amount of a surfactant is added is used. This surfactant includes, for example, a polyoxyethylene alkyl ether represented by the following (Chemical Formula 1), which is a nonionic surfactant with good foam removal, and an anionic surfactant with excellent dispersibility. There is a certain sodium alkyl ether sulfate ester shown in the following (Chemical Formula 2).

RO-(CHCHO)−OH ・・・(化1)
ここで、Rは、アルキル基またはアルキルフェニル基を示し、
RO−SONa ・・・(化2)
ここで、Rは、アルキル基を示す。
RO— (CH 2 CH 2 O) n —OH (1)
Here, R represents an alkyl group or an alkylphenyl group,
RO-SO 3 Na (chemical formula 2)
Here, R represents an alkyl group.

添加する界面活性剤の濃度は、油性汚損物質の量および洗浄性により、アルコール水溶液の対して3重量%まで増加してもよい。これ以上添加量が多いと、泡立ちすぎて、仕上げ洗浄工程A3後も界面活性剤が残留し、洗浄に時間がかかってしまう。   The concentration of the surfactant to be added may be increased up to 3% by weight with respect to the aqueous alcohol solution, depending on the amount of oily fouling substance and detergency. If the added amount is too much, foaming occurs too much, and the surfactant remains even after the final cleaning step A3, and cleaning takes time.

即ち、推奨する洗浄液は、油性物質の溶解性が高く、且つイオン性物質の溶解性も高い、例えば、蒸留水またはイオン交換水57重量%、エチルアルコール41重量%、イソプロピルアルコール2重量%の混合液に、前述した界面活性剤を0.1乃至0.3重量%を添加したものを噴霧器2eに入れ噴霧し、電子回路基板1a表面の塵埃粒子及び油成分による黒ずみが目視観察では見えなくなるまで、非浸漬洗浄を繰り返す。   That is, the recommended cleaning liquid has high solubility of oily substances and high solubility of ionic substances, for example, a mixture of 57% by weight of distilled water or ion-exchanged water, 41% by weight of ethyl alcohol, and 2% by weight of isopropyl alcohol. A solution obtained by adding 0.1 to 0.3% by weight of the above-described surfactant to the liquid is sprayed into the sprayer 2e until the darkening due to dust particles and oil components on the surface of the electronic circuit board 1a is not visible by visual observation. Repeat the non-immersion cleaning.

また、この場合のアルコール水溶液のアルコール濃度は、前述した様に、油性物質の溶解性を確保する上で40乃至60重量%の範囲の濃度であればほぼ同じ効果が得られる。   In addition, the alcohol concentration of the aqueous alcohol solution in this case is almost the same as long as it is in the range of 40 to 60% by weight in order to ensure the solubility of the oily substance, as described above.

アルコールの種類としては、水と無限大に相溶性がある炭素数が4以上のアルコール、例えば、メチルアルコール、エチルアルコール、n−プロピルアルコール及びイソプロピルアルコール等であれば良い。   The alcohol may be an alcohol having 4 or more carbon atoms that is infinitely compatible with water, such as methyl alcohol, ethyl alcohol, n-propyl alcohol, isopropyl alcohol, and the like.

次に、仕上げ洗浄工程A3では、添加した界面活性剤の残留を、界面活性剤を添加しない実施例1と同じイオン性物質の溶解にも有効な60重量%以下のアルコール水溶液を噴霧器2eに入れ、基板表面に噴射して非浸漬洗浄する。この界面活性剤の除去効果の確認は、目視により確認する。   Next, in the final cleaning step A3, the residual surfactant is added to the sprayer 2e with an alcohol aqueous solution of 60% by weight or less that is also effective for dissolving the same ionic substance as in Example 1 in which no surfactant is added. The substrate is sprayed onto the surface of the substrate to perform non-immersion cleaning. The confirmation of the effect of removing the surfactant is visually confirmed.

仕上げ洗浄工程A3終了後、速やかにパージ工程A4で圧縮空気または窒素ガスを基板表面に吹き付けて、付着している洗浄液を吹き飛ばす。この工程により実装部品の下やコネクタの内部に入った洗浄液を吹き飛ばすことができる。   Immediately after the finish cleaning step A3, compressed air or nitrogen gas is sprayed onto the substrate surface in the purge step A4 to blow off the attached cleaning liquid. By this process, the cleaning liquid that has entered under the mounted component or inside the connector can be blown off.

上述した洗浄工程による洗浄事例として、火災現場で消化液と消化ガス及び油成分により汚損された電子回路基板及びその基板上に実装された電子部品についての洗浄効果の例を図4に示す。   As an example of cleaning by the above-described cleaning process, FIG. 4 shows an example of the cleaning effect of an electronic circuit board that is soiled by digestive fluid, digestive gas, and oil components at the fire site and electronic components mounted on the board.

同図に示す様に、洗浄前の基板1、コンタクタ、リレー、電磁開閉器(MCCB)は、洗浄後には夫々等価塩分量が0.1mg/cm以下に回復し、本洗浄工程によって絶縁抵抗値が所定の値以上に回復したことが確認された。 As shown in the figure, the substrate 1, the contactor, the relay, and the electromagnetic switch (MCCB) before cleaning are each restored to an equivalent salt content of 0.1 mg / cm 2 or less after cleaning, and the insulation resistance is improved by this cleaning process. It was confirmed that the value recovered to a predetermined value or more.

また、この洗浄方法は、大型の電気設備の電気品にも使用できる。例えば、パワエレ素子は、パワエレ素子と放熱板の間に放熱のためのグリースが塗布されているが、ここに示した洗浄液はグリースを溶解しないので、丸洗い洗浄が可能である。   This cleaning method can also be used for electrical products of large electrical equipment. For example, the power electronics element is coated with grease for heat dissipation between the power electronics element and the heat radiating plate. However, since the cleaning liquid shown here does not dissolve the grease, it can be washed in a circle.

このように、火災等の災害時から緊急な復旧が求められる場合においても、この洗浄工程は効果的な方法であることが確認された。   Thus, it was confirmed that this cleaning process is an effective method even when urgent recovery is required after a disaster such as a fire.

電子機器には、非通電部分が大気中に設置される電子機器の筐体等の構造物の表面を洗浄したい場合がある。例えば、大気中に置かれるトンネルに付帯する照明設備の器具等の塗装面がある。このような器具等は、海塩粒子、排気ガス、その他大気中の塵埃等によって、器具の塗装面が腐食されるため、定期的に洗浄を行い防食したい場合がある。   There is a case in which the surface of a structure such as a casing of an electronic device in which a non-energized part is installed in the atmosphere is desired for the electronic device. For example, there is a painted surface such as a fixture of lighting equipment attached to a tunnel placed in the atmosphere. Such instruments and the like may be corroded by anti-corrosion because the painted surfaces of the instruments are corroded by sea salt particles, exhaust gas, and other dust in the atmosphere.

実施例3は、このような場合の洗浄方法で、この実施例3が実施例1及び実施例2と異なる点は、パージ工程A4と乾燥工程A5の間に腐食を抑制する防滴仕上げ工程が追加される点が異なる。その他の洗浄工程は、実施例1または実施例2と同じであるのでその説明を省略する。   Example 3 is a cleaning method in such a case. Example 3 differs from Example 1 and Example 2 in that a drip-proof finishing process that suppresses corrosion between the purge process A4 and the drying process A5 is performed. Different points are added. The other cleaning steps are the same as those in Example 1 or Example 2, and therefore the description thereof is omitted.

この場合の防滴仕上げ工程について詳述する。この仕上げ工程で使用する仕上げ剤は、蒸留水またはイオン交換水57重量%、エチルアルコール41重量%及びイソプロピルアルコール2重量%とのアルコール水溶液に、帯電防止剤や防滴材を0.1乃至1.0重量%を添加して作られる。   The drip-proof finishing process in this case will be described in detail. The finishing agent used in this finishing step is 0.1 to 1 of an antistatic agent or a drip-proof material in an alcohol aqueous solution of 57% by weight of distilled or ion-exchanged water, 41% by weight of ethyl alcohol and 2% by weight of isopropyl alcohol. Made by adding 0.0% by weight.

帯電防止剤としては、例えば、陰イオン系界面活性剤のアルキルベンゼンスルホネート、非イオン系界面活性剤のポリオキシエチレンアルキルエーテルなどが使用される。また、防滴剤としては、例えば、ソルビタン脂肪酸モノエスタルが使用される。   As the antistatic agent, for example, an anionic surfactant alkylbenzene sulfonate, a nonionic surfactant polyoxyethylene alkyl ether, or the like is used. Moreover, as a drip-proof agent, sorbitan fatty acid monoestal is used, for example.

そして、この仕上げ剤を洗浄された構造物の表面に噴射し、表面全体がこの仕上げ剤で濡れていることを目視で確認しおく。そして、その表面を自然乾燥または温風乾燥させる。この仕上げ剤による汚損防止効果は、長期間の防食には耐えられないので、定期的にこの仕上げ洗浄を行うようにすることが望ましい。   Then, this finishing agent is sprayed onto the surface of the cleaned structure, and it is visually confirmed that the entire surface is wet with this finishing agent. Then, the surface is naturally dried or warm air dried. Since the antifouling effect by this finishing agent cannot withstand long-term corrosion prevention, it is desirable to perform this finishing cleaning periodically.

このような洗浄は、電子機器や電気機器だけでなく、エポキシ樹脂、不飽和ポリステル樹脂及びフェノール樹脂等の絶縁材料の洗浄にも適用することが可能で、洗浄対象は前記のものに限定されるものではない。   Such cleaning can be applied not only to electronic devices and electrical devices, but also to cleaning of insulating materials such as epoxy resins, unsaturated polyester resins, and phenol resins, and the objects to be cleaned are limited to those described above. It is not a thing.

電子機器は特定の環境、例えば、車輛等の床下に搭載される場合もある。このような環境に置かれた各種の金属構造物も長期間使用することによってピット状の孔食腐食等の劣化が進行する。図5はこうした、例えば、車輛床下に搭載された電子機器のアルミニュム冷却フィンの洗浄工程フロー図である。以下図5を参照して説明する。   The electronic device may be mounted under a specific environment, for example, under the floor of a vehicle or the like. Deterioration such as pit-like pitting corrosion progresses by using various metal structures placed in such an environment for a long period of time. FIG. 5 is a flowchart of a cleaning process for aluminum cooling fins of electronic equipment mounted under the vehicle floor, for example. This will be described below with reference to FIG.

この洗浄工程は、圧縮空気によって塵埃をパージする塵埃除去工程B1、腐食の原因となるイオン性汚損物質を温水を吹き付けて溶解除去する温水洗浄工程B2、腐食抑制剤を吹き付けて防食仕上げ洗浄工程B3及び防食仕上げ液をパージするパージ工程B4とからなる。   This cleaning process includes a dust removing process B1 for purging dust with compressed air, a warm water cleaning process B2 for dissolving and removing ionic fouling substances that cause corrosion by spraying hot water, and a corrosion inhibitor finishing cleaning process B3 by spraying a corrosion inhibitor. And a purge step B4 for purging the anticorrosion finish liquid.

次に各工程の詳細を、同図を参照して説明する。まず塵埃除去工程B1では、圧縮空気を吹き付けて塵埃を除去する。吸引除去では内部に侵入した塵埃が除去できないので、吹き付けで除去する。   Next, details of each step will be described with reference to the same drawing. First, in the dust removing step B1, dust is removed by blowing compressed air. Since dust that has entered inside cannot be removed by suction removal, it is removed by spraying.

次に温水洗浄工程B2では、80℃の温水をフィン表面および内部に噴射して付着している腐食の原因となるイオン性汚損物質を溶解除去する。温水の温度は高いほど効果がある。   Next, in the warm water cleaning step B2, warm water of 80 ° C. is sprayed onto the fin surface and inside to dissolve and remove the ionic fouling substances that cause corrosion. The higher the temperature of the hot water, the more effective.

図6に示す様に、温水洗浄工程B2の洗浄水の温度を15℃と80℃とで洗浄した時の効果をフィン内面に付着した塩素イオン付着量で評価すると、80℃による温水洗浄の方が、より効果が高い。各種の金属について、この様に洗浄水の温度を変えてテストした結果、60℃以上の温水であれば、イオン性汚損物質に対する溶解特性がほぼ同等であることが確認された。   As shown in FIG. 6, when the effect of cleaning with the temperature of the cleaning water in the warm water cleaning step B2 at 15 ° C. and 80 ° C. is evaluated by the adhesion amount of chlorine ions adhering to the inner surface of the fin, But more effective. As a result of testing various kinds of metals while changing the temperature of the washing water in this way, it was confirmed that the solubility characteristics with respect to the ionic fouling substances are almost equal if the temperature is 60 ° C. or higher.

次に防食仕上げ洗浄工程B3では、腐食抑制剤を添加した30重量%以上のアルコール水溶液をフィンの表面および内面に噴射する。この工程では、温水洗浄工程B2で表面張力の大きい水が浸透しなかった隙間部の洗浄およびフィン全体の防食仕上げ洗浄を行う。   Next, in the anticorrosion finish cleaning step B3, a 30 wt% or more alcohol aqueous solution to which a corrosion inhibitor is added is sprayed onto the surface and the inner surface of the fin. In this step, cleaning of the gaps where water having a large surface tension did not permeate in the warm water cleaning step B2 and anticorrosion finish cleaning of the entire fin are performed.

防食仕上げ洗浄工程B3において使用する洗浄液の組成は、例えば、エチルアルコール、イソプロピルアルコールおよびイソプロピルアルコールを任意の濃度で含有したアルコール水溶液を30重量%以上、腐食抑制剤としてメタケイ酸ナトリウムを乃至0.1重量%及び残りを蒸留水またはイオン交換水とした混合液とする。   The composition of the cleaning liquid used in the anticorrosion finishing cleaning step B3 is, for example, 30% by weight or more of an aqueous alcohol solution containing ethyl alcohol, isopropyl alcohol and isopropyl alcohol at an arbitrary concentration, and sodium metasilicate as a corrosion inhibitor to 0.1 to A mixed solution in which the weight% and the remainder are distilled water or ion-exchanged water is used.

この腐食抑制剤の種類と添加濃度及びアルコール濃度は、(表1)に示す評価試験の結果から、対象とする金属の種類によって選択する。以下電子機器に使用される代表的な金属についての洗浄試験による防食効果について説明する。

Figure 2005074397
表1は、鉄、アルミニュム、銅に対する防食効果を、腐食抑制材の種類とその添加濃度変えた70℃の温水に250時間浸漬したときの夫々の金属腐食度合いを調べて、この浸漬試験による夫々の金属の変色度合いから腐食抑制剤の効果を調べた結果を示す。 The type, addition concentration, and alcohol concentration of the corrosion inhibitor are selected according to the type of target metal from the results of the evaluation test shown in (Table 1). Hereinafter, the anticorrosion effect by a cleaning test for typical metals used in electronic devices will be described.
Figure 2005074397
Table 1 shows the anticorrosion effect on iron, aluminum and copper, and the degree of corrosion of each metal when immersed in warm water of 70 ° C. with different types of corrosion inhibitors and their added concentrations for 250 hours. The result of investigating the effect of the corrosion inhibitor from the degree of discoloration of the metal of

表1に示す様に、この腐食抑制剤を添加した温水の温度を70℃として夫々の金属を浸漬し、250時間経過した時点において、鉄、アルミニュムの場合は、メタケイ酸ナトリウムの場合に変色が見られず、また、銅の場合はベンゾトリアゾールの場合に変色が見られず、夫々の腐食抑制剤の防食効果が高いことを示している。   As shown in Table 1, the temperature of the hot water to which this corrosion inhibitor was added was set to 70 ° C., and each metal was immersed. When 250 hours had elapsed, discoloration occurred in the case of iron or aluminum and in the case of sodium metasilicate. In the case of copper, no discoloration was observed in the case of benzotriazole, indicating that each corrosion inhibitor has a high anticorrosive effect.

したがって、洗浄対象とする金属の構成が複数の場合は、ケイ酸塩系のメタケイ酸ナトリウムとリアゾール系のベゾントリアゾールの夫々を、0.01乃至0.1重量%添加した洗浄液で防食仕上げ洗浄を行う。   Therefore, when there are a plurality of metal structures to be cleaned, anticorrosion finish cleaning is performed with a cleaning solution in which 0.01 to 0.1% by weight of each of silicate-based sodium metasilicate and riazole-based bezontriazole is added. I do.

また、表1に示す様に、腐食抑制剤の添加濃度はいずれの場合も0.01重量%程度以上であれば防食効果があることが確認されている。(表1)は浸漬試験による結果であるが、実際の洗浄は非浸漬洗浄とすることからも、腐食抑制剤の添加する濃度は、高めの0.1重量%程度で洗浄することが望ましい。

Figure 2005074397
また、表2は、アルコール濃度を変えた防食仕上げ洗浄液20℃に、鉄、アルミニュム、銅を1200時間の長期間浸漬後、夫々の金属の変色状態から腐食の状態を観察し、アルコール濃度の評価結果を示す。 Further, as shown in Table 1, it has been confirmed that the corrosion inhibitor has an anticorrosive effect if the addition concentration of the corrosion inhibitor is about 0.01% by weight or more in any case. (Table 1) shows the results of the immersion test. However, since the actual cleaning is performed by non-immersion cleaning, it is desirable that the concentration of the corrosion inhibitor added be increased to about 0.1% by weight.
Figure 2005074397
Table 2 shows the evaluation of the alcohol concentration by observing the state of corrosion from the discolored state of each metal after immersing iron, aluminum, and copper for a long period of 1200 hours in an anticorrosive finish cleaning solution having a changed alcohol concentration at 20 ° C. Results are shown.

同表に示す様に、アルコール濃度は30乃至60重量%の範囲としても、防食効果が十分あることが確認されているので、アルコール濃度は、極力低い値とする方が経済的である。   As shown in the table, since it has been confirmed that the alcohol concentration is in the range of 30 to 60% by weight, the anticorrosion effect has been sufficiently confirmed, so it is more economical to set the alcohol concentration as low as possible.

次に、パージ工程B4では、フィン全体についた防食仕上げ洗浄液を圧縮空気で吹き飛ばす。洗浄液を完全に吹き飛ばさなくても、残留した洗浄液には腐食抑制剤が添加されているので、金属が腐食することはない。但し、この防食仕上げ洗浄の効果は有限であるので、定期的に防食仕上げ洗浄を実施することが望ましい。   Next, in the purge step B4, the anticorrosion finish cleaning liquid on the entire fin is blown off with compressed air. Even if the cleaning liquid is not completely blown off, the corrosion is not added to the remaining cleaning liquid, so that the metal is not corroded. However, since the effect of this anticorrosion finish cleaning is limited, it is desirable to periodically perform the anticorrosion finish cleaning.

本実施例ではアルミニュム製の冷却フィンの防食仕上げ洗浄工程B3を説明したが、構成される金属が銅の場合は表1に示したように腐食抑制剤をメタケイ酸ナトリウムの代わりに、ベンゾトリアゾールを添加すると効果的である。   In this embodiment, the anti-corrosion finish cleaning step B3 of the aluminum cooling fin has been described. However, when the metal to be constructed is copper, as shown in Table 1, the corrosion inhibitor is replaced with benzotriazole instead of sodium metasilicate. It is effective when added.

このように、洗浄される対象金属によって腐食抑制剤を選択することによって、効果的な防食仕上げ洗浄を行うことができる。   Thus, effective anticorrosive finish cleaning can be performed by selecting a corrosion inhibitor depending on the metal to be cleaned.

電子機器、電気機器に使用される絶縁物の洗浄には上述した各種の工程の洗浄方法が応用される。これらの洗浄についての良否判定方法は、前述した等価塩分量と絶縁抵抗の相関関係から判定する方法が有効である。   The cleaning methods of the various processes described above are applied to the cleaning of insulators used in electronic devices and electrical devices. As the quality determination method for these cleanings, the method of determining from the correlation between the equivalent salt content and the insulation resistance described above is effective.

洗浄後の良否判定としては、表面の等価塩分量を測定し、予め測定しておいた等価塩分量(NaClmg/cm)と絶縁抵抗(Ω)の相関関係曲線から、任意の温湿度における絶縁抵抗値を推定するようにする。 As the pass / fail judgment after cleaning, the equivalent salt content on the surface is measured, and insulation at an arbitrary temperature and humidity is determined from the correlation curve between the equivalent salt content (NaClmg / cm 2 ) and the insulation resistance (Ω) measured in advance. Try to estimate the resistance.

例えば、図7は、炭酸カルシウムを無機充填剤とした不飽和ポリエステル絶縁板の40℃における湿度条件、相対湿度10%RH、65%RH、80%RH、95%RHとしたときの等価塩分量と絶縁抵抗の相関関係の示したものである。   For example, FIG. 7 shows an equivalent salinity of an unsaturated polyester insulating plate using calcium carbonate as an inorganic filler at 40 ° C. under relative humidity conditions of 10% RH, 65% RH, 80% RH, and 95% RH. And the correlation between the insulation resistance.

このような相関データを、洗浄する対象材料別に、測定温度湿度条件をパラメータとして所有しておけば、年間を通して最悪の温湿度条件においても絶縁抵抗の推定が可能となる。洗浄材料別に予め良否判定基準を設定しておけば、等価塩分量の測定結果から直ちに洗浄結果の良否判定が短時間で、定量的に確認できる。   If such correlation data is owned as a parameter for each material to be cleaned, the insulation resistance can be estimated even under the worst temperature and humidity conditions throughout the year. If a pass / fail judgment criterion is set in advance for each cleaning material, the pass / fail judgment of the cleaning result can be confirmed quantitatively in a short time immediately from the measurement result of the equivalent salinity.

更に、本発明は上述した代表的な汚損モデルについて説明したが、これらの実施例に何ら限定されるものではなく、電子機器のみならず、各種の大型の電気機器等の構造と汚損箇所、汚損状態に対しても、ここに示した洗浄方法の組み合わせ及び選択、また、洗浄液の濃度、添加剤の種類と濃度、洗浄水の温度等を可変することが可能であり、本発明の主旨を逸脱しない範囲で種々変形して実施することが可能である。   Furthermore, the present invention has been described with reference to the above-described typical pollution model. However, the present invention is not limited to these examples, and includes not only electronic devices but also various large-sized electric devices and the like, the contamination points, and the contamination. It is possible to vary the combination and selection of the cleaning methods shown here, the concentration of the cleaning liquid, the type and concentration of the additive, the temperature of the cleaning water, etc., depending on the state, and deviates from the gist of the present invention. Various modifications can be made without departing from the scope.

電子回路基板の洗浄工程の説明図。Explanatory drawing of the washing | cleaning process of an electronic circuit board. 電子回路基板の乾燥時間の説明図。Explanatory drawing of the drying time of an electronic circuit board. 電子回路基板の洗浄効果(等価塩分量の測定)の説明図。Explanatory drawing of the washing | cleaning effect (measurement of an equivalent salt content) of an electronic circuit board. 電子部品の洗浄効果の説明図。Explanatory drawing of the washing | cleaning effect of an electronic component. 金属構造物の洗浄工程を説明するフロー図。The flowchart explaining the washing | cleaning process of a metal structure. 金属構造物の温水洗浄による効果の説明図。Explanatory drawing of the effect by warm water washing | cleaning of a metal structure. 等価塩分量と表面絶縁抵抗の関係を示す測定例。Measurement example showing the relationship between equivalent salt content and surface insulation resistance.

符号の説明Explanation of symbols

A1 塵埃除去工程
A2 予備洗浄工程
A3 仕上げ洗浄工程
A4 パージ工程
A5 乾燥工程
B1 塵埃除去工程
B2 温水洗浄工程
B3 防食仕上げ洗浄工程
B4 パージ工程
1a 電子回路基板
1b ブラシ
1c 掃除機
2c 帯電防止容器
2d 基板ラック
2e 噴霧器
4g エアーガン
5h 乾燥炉
A1 Dust removal process A2 Preliminary cleaning process A3 Finishing cleaning process A4 Purge process A5 Drying process B1 Dust removal process B2 Warm water cleaning process B3 Anticorrosion finishing cleaning process B4 Purge process 1a Electronic circuit board 1b Brush 1c Vacuum cleaner 2c Antistatic container 2d Substrate rack 2e Sprayer 4g Air gun 5h Drying furnace

Claims (10)

汚損された通電部分を含む電子機器を、60重量%以下の第1のアルコール水溶液で非浸漬洗浄する第1の洗浄工程と、
60重量%以下の第2のアルコール水溶液で前記第1の洗浄工程の残さを非浸漬洗浄する第2の洗浄工程と、
前記第2の洗浄工程後の残さを除去するパージ工程と、
前記パージ工程の後、前記電子機器を乾燥する乾燥工程と
を備えたことを特徴とする電子機器の洗浄方法。
A first cleaning step of non-immersing and cleaning an electronic device including a contaminated energized portion with a first alcohol aqueous solution of 60% by weight or less;
A second cleaning step of non-immersing and cleaning the residue of the first cleaning step with 60% by weight or less of a second aqueous alcohol solution;
A purge step for removing residues after the second cleaning step;
An electronic device cleaning method comprising: a drying step of drying the electronic device after the purge step.
汚損された通電部分を含む電子機器を、界面活性剤を添加した40乃至60重量%の第1のアルコール水溶液で非浸漬洗浄する第1の洗浄工程と、
界面活性剤を含まない60重量%以下の第2のアルコール水溶液で前記第1の洗浄工程の残さを非浸漬洗浄する第2の洗浄工程と、
前記第2の洗浄工程後の残さを除去するパージ工程と、
前記パージ工程の後、前記電子機器を乾燥する乾燥工程と
を備えたことを特徴とする電子機器の洗浄方法。
A first cleaning step of non-immersing and cleaning an electronic device including a contaminated energized portion with a 40 to 60 wt% first alcohol aqueous solution to which a surfactant is added;
A second cleaning step of non-immersing the residue of the first cleaning step with a 60% by weight or less second alcohol aqueous solution not containing a surfactant;
A purge step for removing residues after the second cleaning step;
An electronic device cleaning method comprising: a drying step of drying the electronic device after the purge step.
前記乾燥工程は、前記第2の洗浄工程における前記電子機器表面の残さをアルコール液で拭き取り、乾燥炉で加温、減圧乾燥することを特徴とする請求項1及び請求項2に記載の電子機器の洗浄方法。 3. The electronic device according to claim 1, wherein in the drying step, the residue on the surface of the electronic device in the second cleaning step is wiped with an alcohol liquid, heated in a drying furnace, and dried under reduced pressure. Cleaning method. 汚損された電子機器の非通電部を、界面活性剤を添加した40乃至60重量%の第1のアルコール水溶液で非浸漬洗浄する第1の洗浄工程と、
界面活性剤を含まない60重量%以下の第2のアルコール水溶液で前記第1の洗浄工程の残さを非浸漬洗浄する第2の洗浄工程と、
前記第2の洗浄工程後の残さを除去するパージ工程と、
前記パージ工程の後、帯電防止剤または防滴剤を添加した60重量%以下の第3のアルコール水溶液を噴霧する防滴仕上げ工程と、
前記防滴仕上げ工程の後、前記電子機器を乾燥する乾燥工程と
を備えたことを特徴とする電子機器の洗浄方法。
A first cleaning step of non-immersing and cleaning the non-conducting portion of the soiled electronic device with a 40 to 60 wt% first alcohol aqueous solution to which a surfactant is added;
A second cleaning step of non-immersing the residue of the first cleaning step with a 60% by weight or less second alcohol aqueous solution not containing a surfactant;
A purge step for removing residues after the second cleaning step;
After the purge step, a drip-proof finishing step of spraying a third alcohol aqueous solution of 60% by weight or less to which an antistatic agent or a drip-proof agent is added;
An electronic device cleaning method comprising: a drying step of drying the electronic device after the drip-proof finishing step.
前記界面活性剤は、非イオン系界面活性剤と陰イオン系界面活性剤の混合物とし、添加量は前記第1のアルコール水溶液の0.1乃至0.3重量%としたことを特徴とする請求項2及び請求項4に記載の電子機器の洗浄方法。 The surfactant is a mixture of a nonionic surfactant and an anionic surfactant, and is added in an amount of 0.1 to 0.3% by weight of the first aqueous alcohol solution. Item 5. A method for cleaning an electronic device according to item 2 or item 4. 前記帯電防止剤または防滴剤は、陰イオン系界面活性剤、陽イオン系界面活性剤、非イオン系界面活性剤、及びそれらの混合剤のいずれかとしたことを特徴とする請求項4に記載の電子機器の洗浄方法。 The antistatic agent or the drip-proofing agent is any one of an anionic surfactant, a cationic surfactant, a nonionic surfactant, and a mixture thereof. To clean electronic equipment. 汚損された電子機器の金属部を60℃以上の温水で非浸漬洗浄する第1の温水洗浄工程と、
腐食抑制剤を添加した30重量%以上のアルコール水溶液で非浸漬洗浄する第2の防食仕上げ洗浄工程と
を備えたことを特徴とする電子機器の洗浄方法。
A first hot water cleaning step of non-immersing and cleaning the metal part of the damaged electronic device with hot water of 60 ° C. or higher;
A second anti-corrosion finish cleaning step comprising non-immersing and cleaning with an aqueous alcohol solution of 30% by weight or more to which a corrosion inhibitor is added.
前記腐食抑制剤は、トリアゾール系、ケイ酸塩系のいずれか、またはいずれも混合し、その添加量を前記30%重量以上のアルコール水溶液の0.01乃至0.2重量%としたことを特徴とする請求項7に記載の電子機器の洗浄方法。 The corrosion inhibitor is a triazole type or silicate type, or both are mixed, and the amount added is 0.01 to 0.2% by weight of the 30% or more alcohol aqueous solution. The method for cleaning an electronic device according to claim 7. 前記腐食抑制剤は、洗浄対象金属部が鉄及びアルミニュムの場合にはケイ酸塩系とし、洗浄対象金属部が銅の場合にはトリアゾール系としたことを特徴とする請求項8に記載の電子機器の洗浄方法。 9. The electron according to claim 8, wherein the corrosion inhibitor is silicate-based when the metal part to be cleaned is iron and aluminum, and triazole-based when the metal part to be cleaned is copper. How to clean the equipment. 被測定対象となる絶縁部の等価塩分量と表面絶縁抵抗を予め測定し、前記等価塩分量と表面絶縁抵抗との相関関係をデータベースとして記憶しておき、前記被測定対象表面の等価塩分量を測定し、この測定結果と前記データベースを比較し、所定の表面絶縁抵抗の範囲内に回復しているか否かを判定する電子機器の洗浄の評価方法。 Measure the equivalent salt content and surface insulation resistance of the insulation part to be measured in advance, store the correlation between the equivalent salt content and surface insulation resistance as a database, and calculate the equivalent salt content of the surface to be measured. An evaluation method for cleaning an electronic device that measures and compares the measurement result with the database to determine whether or not the measured value is recovered within a predetermined surface insulation resistance range.
JP2003311536A 2003-09-03 2003-09-03 Washing method of electronic equipment and its evaluating method Pending JP2005074397A (en)

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Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011005466A (en) * 2009-06-29 2011-01-13 Asahi Kasei Chemicals Corp Cleaning method of electronic apparatus and cleaning apparatus for electronic apparatus
JP2016187104A (en) * 2015-03-27 2016-10-27 京セラ株式会社 Electronics
CN111947958A (en) * 2020-08-17 2020-11-17 苏州英睿派机电科技有限公司 Method for processing and maintaining equipment damaged by smoking
CN111985657A (en) * 2020-08-17 2020-11-24 苏州英睿派机电科技有限公司 Method for treating and maintaining equipment damaged by water
EA036616B1 (en) * 2018-06-13 2020-11-30 Игорь Николаевич КВАСНИКОВ Method of cleaning electrical equipment
CN113219128A (en) * 2021-03-29 2021-08-06 中国南方电网有限责任公司超高压输电公司检修试验中心 Performance detection method for cleaning agent for silicon rubber external insulation of power system
RU2790719C1 (en) * 2022-11-15 2023-02-28 Евгений Михайлович Ежунов Method for wet cleaning of electrical equipment

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011005466A (en) * 2009-06-29 2011-01-13 Asahi Kasei Chemicals Corp Cleaning method of electronic apparatus and cleaning apparatus for electronic apparatus
JP2016187104A (en) * 2015-03-27 2016-10-27 京セラ株式会社 Electronics
EA036616B1 (en) * 2018-06-13 2020-11-30 Игорь Николаевич КВАСНИКОВ Method of cleaning electrical equipment
CN111947958A (en) * 2020-08-17 2020-11-17 苏州英睿派机电科技有限公司 Method for processing and maintaining equipment damaged by smoking
CN111985657A (en) * 2020-08-17 2020-11-24 苏州英睿派机电科技有限公司 Method for treating and maintaining equipment damaged by water
CN113219128A (en) * 2021-03-29 2021-08-06 中国南方电网有限责任公司超高压输电公司检修试验中心 Performance detection method for cleaning agent for silicon rubber external insulation of power system
RU2790719C1 (en) * 2022-11-15 2023-02-28 Евгений Михайлович Ежунов Method for wet cleaning of electrical equipment
RU2818851C1 (en) * 2023-08-15 2024-05-06 Самед Тагирович Багиров Method of cleaning process equipment (versions)

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