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JP2005062362A5 - - Google Patents

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Publication number
JP2005062362A5
JP2005062362A5 JP2003290845A JP2003290845A JP2005062362A5 JP 2005062362 A5 JP2005062362 A5 JP 2005062362A5 JP 2003290845 A JP2003290845 A JP 2003290845A JP 2003290845 A JP2003290845 A JP 2003290845A JP 2005062362 A5 JP2005062362 A5 JP 2005062362A5
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JP
Japan
Prior art keywords
mask
unit
uniform
pattern
boundary
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Pending
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JP2003290845A
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Japanese (ja)
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JP2005062362A (en
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Priority to JP2003290845A priority Critical patent/JP2005062362A/en
Priority claimed from JP2003290845A external-priority patent/JP2005062362A/en
Publication of JP2005062362A publication Critical patent/JP2005062362A/en
Publication of JP2005062362A5 publication Critical patent/JP2005062362A5/ja
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Claims (9)

複数のレンズのそれぞれに対応する単位マスクパターンに段階的な階調をもたせ、これらのマスクパターンをレジストに転写して光学素子を作製する際に用いるマスクであって、
前記段階的な階調における均一な階調領域の幅および／または該均一な階調領域間の境界の位置が、前記それぞれの単位マスクパターンにおいて異なっていることを特徴とするマスク。 A unit mask pattern corresponding to each of a plurality of lenses has a stepped gradation, and is a mask used when an optical element is manufactured by transferring these mask patterns to a resist,
A mask characterized in that a uniform gradation region width and / or a boundary position between the uniform gradation regions in the stepwise gradation are different in each of the unit mask patterns. 前記段階的な階調を、透過率の変化によって出すようにしたマスクであって、
前記透過率が均一な領域の幅および／または該領域間の境界の位置が、前記それぞれの単位マスクパターンにおいて異なっていることを特徴とする請求項１に記載のマスク。 A mask in which the stepwise gradation is produced by a change in transmittance,
2. The mask according to claim 1, wherein the width of the region having the uniform transmittance and / or the position of the boundary between the regions are different in each of the unit mask patterns. 前記段階的な階調を、解像不可能なピッチで開口部と遮光部を配置して出すようにしたマスクであって、
前記開口部と遮光部の面積比が均一な領域の幅および／または該領域間の境界の位置が、前記それぞれの単位マスクパターンにおいて異なっていることを特徴とする請求項１に記載のマスク。 The stepwise gradation is a mask in which openings and light-shielding portions are arranged at a pitch that cannot be resolved,
2. The mask according to claim 1, wherein a width of a region having a uniform area ratio between the opening and the light-shielding portion and / or a position of a boundary between the regions are different in each of the unit mask patterns. 前記段階的な階調を、遮光材の厚さまたは酸化金属濃度による透過率の変化によって出すようにしたマスクであって、
前記透過率が均一な領域の幅および／または該領域間の境界の位置が、前記それぞれの単位マスクパターンにおいて異なっていることを特徴とする請求項１に記載のマスク。 The stepwise gradation is produced by changing the transmittance depending on the thickness of the light shielding material or the metal oxide concentration,
2. The mask according to claim 1, wherein the width of the region having the uniform transmittance and / or the position of the boundary between the regions are different in each of the unit mask patterns. 前記透過率が均一な領域の幅が、前記それぞれの単位マスクパターンのうちの二つ以上の単位マスクパターンにおいて異なっていることを特徴とする請求項１から３のいずれか１項に記載のマスク。 The width of the transmittance is uniform region, the mask according to any one of claims 1 to 3, characterized in that differ in more than one unit mask pattern of the unit mask pattern of the respective . 前記領域間の境界の位置が、前記それぞれの単位マスクパターンのうちの二つ以上の単位マスクパターンにおいて異なっていることを特徴とする請求項１から３のいずれか１項に記載のマスク。 Position of the boundary between the regions, the mask according to any one of claims 1 to 3, characterized in that differ in more than one unit mask pattern of the unit mask pattern of said respective. 前記透過率が均一な領域の幅および前記領域間の境界の位置が、前記それぞれの単位マスクパターンのうちの二つ以上の単位マスクパターンにおいて異なっていることを特徴とする請求項１から３のいずれか１項に記載のマスク。 The position of the boundary between the width and the area of the transmittance is uniform region, of claims 1 to 3, characterized in that differ in more than one unit mask pattern of the unit mask pattern of the respective The mask of any one of Claims. 前記マスクが、複数のレンズがアレイ状に配列されたレンズパターンを有するマスクであることを特徴とする請求項１から７のいずれか１項に記載のマスク。 The mask according to any one of claims 1 to 7, wherein the mask is a mask having a lens pattern in which a plurality of lenses are arranged in an array. マスクのパターンをレジストに転写して光学素子を作製する光学素子の作製方法において、前記マスクに請求項１から８のいずれか１項に記載のマスクを用いることを特徴とする光学素子の作製方法。 In a method for manufacturing an optical element for producing an optical element by transferring the pattern on the mask onto the resist, a method for manufacturing an optical element, which comprises using a mask according to any one of claims 1 to 8 in the mask .
JP2003290845A 2003-08-08 2003-08-08 Mask to be used for manufacture of optical element, method for manufacturing optical element by using the mask, optical element, optical system, exposure apparatus, and method for manufacturing device Pending JP2005062362A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2003290845A JP2005062362A (en) 2003-08-08 2003-08-08 Mask to be used for manufacture of optical element, method for manufacturing optical element by using the mask, optical element, optical system, exposure apparatus, and method for manufacturing device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003290845A JP2005062362A (en) 2003-08-08 2003-08-08 Mask to be used for manufacture of optical element, method for manufacturing optical element by using the mask, optical element, optical system, exposure apparatus, and method for manufacturing device

Publications (2)

Publication Number Publication Date
JP2005062362A JP2005062362A (en) 2005-03-10
JP2005062362A5 true JP2005062362A5 (en) 2006-09-14

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Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003290845A Pending JP2005062362A (en) 2003-08-08 2003-08-08 Mask to be used for manufacture of optical element, method for manufacturing optical element by using the mask, optical element, optical system, exposure apparatus, and method for manufacturing device

Country Status (1)

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JP (1) JP2005062362A (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5008479B2 (en) * 2007-06-28 2012-08-22 ラピスセミコンダクタ株式会社 Method for forming resist pattern and photomask
JP2014029524A (en) * 2012-07-04 2014-02-13 Fujifilm Corp Microlens manufacturing method

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