JP2005011936A - Processing system - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To enable a person to traverse between both sides of a system for serially and horizontally conveying substrates to be treated through a process flow without having to circumvent the system. <P>SOLUTION: In the processing system for applying and developing resist, oven towers (TB) 76, 78, 80, 82, 84, 86 are provided, respectively, at a terminal end of a conveyor line [A], a starting and a terminal ends of a conveyor line [B], a starting and a terminal ends of a conveyor line [C] and a starting end of a conveyor line [D]. Vertical conveying mechanisms (S/A) 88, 90, 92 are provided, respectively, between oven towers 76 and 86, between 78 and 84, and between 80 and 82. Between the conveying mechanisms 88 and 90, there are provided a path 168 for enabling a person to traverse the resist application and development system within a clean room, and upper and lower extension units 170 for exchanging substrates G between the both conveying mechanisms 88 and 90. <P>COPYRIGHT: (C)2005,JPO&NCIPI

Description

[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a processing system having a transfer line for transferring a substrate to be processed in a process flow in a substantially horizontal direction in one or a series of processing steps.
[0002]
[Prior art]
Recently, in a resist coating and developing processing system in LCD (liquid crystal display) manufacturing, in order to cope with an increase in size of an LCD substrate, the LCD substrate is horizontally placed on a conveyance path in which a conveyance body such as a conveyance roller is laid in a horizontal direction. Equipped with a so-called flat-flow type cleaning processing unit and development processing unit that perform cleaning processing or development processing while being transported, and the entire system is roughly arranged in the order of the process flow according to such flat-flow type processing unit. A system configuration or layout that serially arranges along a horizontal line is widespread (see, for example, Patent Document 1).
[0003]
As described in Patent Document 1, this type of layout includes a horizontally long processing station at the center of the system and a cassette station and an interface station at both ends in the longitudinal direction. In the cassette station, a cassette for storing a plurality of unprocessed or processed substrates is loaded between the stage in the station and the outside of the system, and the substrate is loaded between the cassette on the stage and the processing station. Out is done. In the interface station, the substrate is transferred between the adjacent exposure apparatus and the processing station.
[0004]
The processing station has two lines of transfer lines, a forward path and a return path, each having a cassette station as a start point and an end point, and an interface station as a turning point. In general, the forward path is mainly composed of the transport line of the flat flow type cleaning processing section and the transport line of the coating processing section, and the return path is mainly composed of the transport line of the flat flow type developing processing section. A pair of oven towers formed by collecting and arranging single-wafer type oven units including a hot plate in multiple stages is installed at the start and / or end of each conveyance line. Between both the oven towers, an up-and-down / swivel-type transfer robot for transferring the substrate between the units in the tower is provided.
[0005]
[Patent Document 1]
JP 2002-334918 A
[0006]
[Problems to be solved by the invention]
A processing system having a transfer line for transferring a substrate to be processed in the order of a process flow in a substantially horizontal direction in the order of a process flow with the processing unit of the flat flow type as described above as a standard of layout is in the footsteps as the size of an LCD substrate increases. It is not uncommon for prints, especially in the longitudinal direction, to be larger, and over 50m in length.
[0007]
In this type of conventional processing system, in order for a person to move from one side of the system to the other side, one end of the system, that is, either the cassette station side or the exposure apparatus side must be bypassed. For this reason, it takes considerable labor and time for people to move from one side of the system to the other side during maintenance or when a disaster such as a fire occurs. This problem becomes more serious as the total length of the system increases and the lap distance also increases at twice that rate.
[0008]
In addition, in this type of conventional processing system, for example, when the transfer tact is changed at the turn of a product lot or the like, it is difficult to smoothly and efficiently adjust the transfer tact between different transfer lines. However, if the process flow is delayed, the processing contents being executed in the processing units before and after (especially the upstream side) are affected.
[0009]
The present invention has been made in view of the problems of the prior art, and in a system layout having a transfer line for transferring a substrate to be processed serially in a substantially horizontal direction in the order of the process flow, a person between both sides of the system is required. An object of the present invention is to provide a processing system that can easily and quickly travel without detouring.
[0010]
Another object of the present invention is to provide a processing system that improves the reliability of a process flow or a transfer flow in the system layout as described above.
[0011]
[Means for Solving the Problems]
In order to achieve the above object, a first processing system of the present invention includes a first transport line that transports a substrate to be processed in the order of a process flow in a substantially horizontal direction in one or a series of processing steps. A second transport line provided on an extension of the first transport line and transporting the substrate to be processed in a process flow serially in a substantially horizontal direction in one or a series of processing steps; and the first transport And at least one unloading unit for unloading the substrate to be processed from the first transfer line and at least one processing unit for performing a predetermined process on the substrate to be processed. A first multi-stage unit section that is stacked in multiple stages, a first transport means for transporting a substrate to be processed between the units in the first multi-stage unit section, and the second transport section. At least one carry-in unit for carrying a substrate to be processed into the second transfer line, and at least one processing unit for performing a predetermined process on the substrate to be processed; A second multi-stage unit unit formed by stacking multiple layers, a second transport unit for transporting a substrate to be processed between the units in the second multi-stage unit unit, and the first transport unit. A transfer unit disposed between the two transfer units for transferring the substrate to be processed between the transfer unit and the second transfer unit, and below the transfer unit so that a person can pass through the system. And a passage to be provided.
[0012]
In the first processing system, the first and second transfer means on both sides of the first transfer line are disposed at the center of the area where the first transfer line and the second transfer line are connected. The substrate is transferred between the two. The first transport means can also access each unit in the first multi-stage unit section provided at the end of the first transport line, and the second transport means is provided at the start end of the second transport line. Each unit in the second multistage unit section can also be accessed. In such an area where the transport system and units are three-dimensionally aggregated, the person concerned passes through a passage for passing through the system provided under the transfer section, and a short distance from one side of the system to the other side. You can move in a short time.
[0013]
The second processing system according to the present invention includes a first transport line that forwards a substrate to be processed in the order of a process flow in a substantially horizontal direction in one or a series of processing steps, and the first transport line. And at least one unloading unit for unloading the substrate to be processed from the first transfer line and at least one processing unit for performing a predetermined process on the substrate to be processed. And a first multi-stage unit unit that is stacked and arranged on an extension of the first transfer line, and in one or a series of processing steps, the substrates to be processed are serially arranged in a substantially horizontal direction in the order of the process flow. At least one loading unit for loading a substrate to be processed into the second conveyance line, which is provided at the second conveyance line in the forward path to be conveyed and at the start end of the second conveyance line. And a second multi-stage unit portion in which at least one processing unit for performing a predetermined process on the substrate and a substrate to be processed are arranged in multiple stages, and substantially parallel to the second transport line, A third transfer line on the return path for transferring the substrate to be processed in the order of the process flow in a substantially horizontal direction in one or a series of processing steps; and a terminal portion of the third transfer line. A third multistage in which at least one unloading unit for unloading the substrate to be processed from the transfer line and at least one processing unit for performing a predetermined process on the substrate to be processed are stacked in multiple stages. A unit and an extension of the third transfer line are provided substantially parallel to the first transfer line, and the substrates to be processed are serialized in the order of the process flow in one or a series of processing steps. A fourth transport line on the return path transported in a substantially horizontal direction, and at least one unit for carrying a substrate to be processed into the fourth transport line, provided at a start end of the fourth transport line; A fourth multi-stage unit section in which a carry-in unit and at least one processing unit for performing a predetermined process on the substrate to be processed are stacked in multiple stages; each unit in the first multi-stage unit section; Between the first transport means for transporting the substrate to be processed between the units in the four multi-stage unit section, the units in the second multi-stage unit section, and the units in the third multi-stage unit section. A second transport unit for transporting the substrate to be processed, and a substrate between the first transport unit and the second transport unit for transferring the substrate to be processed. The delivery section, And a passage provided under the transfer portion so that a person can pass through the stem.
[0014]
In the second processing system, the area where the first transfer line and the second transfer line are connected and the area where the third transfer line and the fourth transfer line are connected are collected in one place. The substrate is transferred between the first and second transfer means on both sides thereof via a transfer portion that is disposed and disposed substantially in the center of the connection area. The first transport means is also provided for each unit in the first multi-stage unit section provided at the end of the first transport line and each unit in the fourth multi-stage unit section provided at the start end of the fourth transport line. Accessible. The second transport means is also provided for each unit in the second multi-stage unit provided at the start end of the second transport line and for each unit in the third multi-stage unit provided at the end of the third transport line. Accessible. Stakeholders can easily move from one side of the system to the other side through the passage for passing through the system provided below the transfer section in the area where the transport system and units are three-dimensionally integrated. can do.
[0015]
In the second processing system, the transfer unit has a first transfer unit for transferring the substrate to be processed from the first transfer unit to the second transfer unit, and the second transfer unit to the first transfer unit. It is preferable that the second transfer unit for transferring the substrate to be processed is stacked in multiple stages. According to such a configuration, bidirectional substrate transfer between the first and second transfer means can be performed independently or in parallel, and transfer efficiency can be increased. In addition, since the first and second delivery units are arranged in multiple stages, the footprint is not increased.
[0016]
The third processing system according to the present invention includes a first transport line that forwards a substrate to be processed in the order of a process flow in a substantially horizontal direction in one or a series of processing steps, and the first transport line. And at least one unloading unit for unloading the substrate to be processed from the first transfer line and at least one processing unit for performing a predetermined process on the substrate to be processed. A first multi-stage unit section stacked on the first multi-stage unit, a first transport means for transporting a substrate to be processed between the units in the first multi-stage unit section, and an extension of the first transport line A second transfer line which is provided on the forward path and transfers the substrate to be processed in the order of the process flow in a substantially horizontal direction in one or a series of processing steps; and a start end of the second transfer line And at least one loading unit for loading the substrate to be processed into the second transfer line and at least one processing unit for performing predetermined processing on the substrate to be processed are stacked in multiple stages. A second multi-stage unit section arranged; a second transport means for transporting a substrate to be processed between the units in the second multi-stage unit section; the first transport means; and the second transport section. A first transfer section disposed between the two transfer means for transferring the substrate to be processed between the transfer means and the second transfer line; In the processing step, the substrate is provided in a third transfer line on the return path for serially transferring the substrate to be processed in the order of the process flow in a substantially horizontal direction, and at the end of the third transfer line. Unload processing substrate A third multi-stage unit section in which at least one unloading unit for performing and at least one processing unit for performing a predetermined process on the substrate to be processed are stacked in multiple stages, and the third multi-stage unit A third transport means for transporting the substrate to be processed between the units in the unit, and an extension of the third transport line, provided substantially parallel to the first transport line, and one or a series of In the processing step, the substrate is provided in a fourth transfer line on the return path that serially transfers the substrate to be processed in the order of the process flow in a substantially horizontal direction, and at the start end of the fourth transfer line. A fourth multi-stage unit section in which at least one carry-in unit for carrying in a substrate to be processed and at least one processing unit for performing a predetermined process on the substrate to be processed are stacked in multiple stages. And a fourth transfer means for transferring the substrate to be processed between the units in the fourth multi-stage unit, and the substrate to be processed between the third transfer means and the fourth transfer means A first delivery section disposed between the two conveying means and a first delivery section provided below the first delivery section and the second delivery section so that a person can pass through the system. And a second passage.
[0017]
In the third processing system, the first and the second on both sides of the third processing system via the first delivery section disposed at the approximate center of the area where the first transport line and the second transport line are connected on the forward path side. The substrate is transferred between the second transfer means, and on the return path, the second transfer unit is disposed in the center of the area where the third transfer line and the fourth transfer line are connected. The substrate is transferred between the third and fourth transfer means on both sides of the lever. The first transport means can also access each unit in the first multi-stage unit section provided at the end portion of the first transport line. The second transfer means can also access each unit in the second multi-stage unit provided at the start end of the second transfer line. The third transport means can also access each unit in the third multi-stage unit section provided at the terminal portion of the third transport line. The fourth transfer means can also access each unit in the fourth multi-stage unit portion provided at the start end of the fourth transfer line. In the area where the transport system and the unit are three-dimensionally aggregated, the persons concerned pass through the first and second passages for passing through the system provided below the first and second delivery sections, respectively. You can easily move through from one side of the system to the other.
[0018]
In the third processing system, a configuration in which the first passage and the second passage are arranged substantially in a straight line in a direction crossing the system is preferable from the viewpoint of easy passage and safety.
[0019]
In a preferred embodiment of the processing system of the present invention, at least one unloading unit and a substrate to be processed are provided at a terminal portion of the second transfer line, and the substrate to be processed is transferred from the second transfer line. A fifth multi-stage unit section in which at least one processing unit for performing a predetermined process is stacked in multiple stages and a start end portion of the third transport line are provided to cover the third transport line. A sixth multi-stage unit section in which at least one unloading unit for carrying in the processing substrate and at least one processing unit for performing a predetermined process on the substrate to be processed are stacked in multiple stages; And a fifth transport unit for transporting the substrate to be processed between the units in the multi-stage unit section and the units in the sixth multi-stage unit section. In such a configuration, the end portion of the second transport line on the forward path and the start end portion of the third transport line on the return path are connected via the fifth and sixth multistage unit sections and the fifth transport means, Even when returning from the forward path to the return path, a series of processing in the processing unit for the substrate is efficiently performed. In this case, preferably, the substrate to be processed is carried into another processing system adjacent to the end portion of the second transfer line and the start end portion of the third transfer line, or the substrate to be processed is unloaded from the other processing system. And a third transfer unit arranged between the transfer means for transferring the substrate to be processed between the fifth transfer means and the sixth transfer means. You can do it. In this configuration, inline processing in cooperation with another adjacent processing system can be performed via the sixth transport unit and the third delivery unit.
[0020]
In another preferred embodiment of the processing system, a cassette stage for mounting one or a plurality of cassettes for storing substrates to be processed in multiple stages, a first transfer line start end, and a fourth transfer line end The unprocessed substrate to be processed is taken out from one of the cassettes on the cassette stage and loaded into the first transport line, and the processed substrate is unloaded from the fourth transport line. And having a seventh transport means for accommodating in any cassette on the cassette stage. In such a configuration, the unprocessed substrate stored in the cassette on the cassette stage is carried into the first transport line in the forward path by the seventh transport means, and the first transport line and the subsequent transport line or multi-stage unit. Finally, the substrate is picked up by the seventh transport means as a processed substrate from the fourth transport line on the return path, and returned to the cassette on the stage.
[0021]
In the processing system of the present invention, a preferable embodiment of the conveying means is a vertically movable body that can be moved up and down in the vertical direction, a revolving carrier that can be swung around the vertical axis on this elevating and conveying body, And a transfer arm that can extend and contract in the front-rear direction in a horizontal plane while supporting the substrate to be processed. In such a configuration, the transfer means can move up and down or swivel to access any unit in the adjacent multi-stage unit section to carry in and out the substrate.
[0022]
In the processing system of the present invention, it is preferable that at least one transport line has a transport path in which a transport body for transporting the substrate to be processed is mounted substantially horizontally along the transport line, and on the transport path. And a transport driving means for driving the transport body to transport the substrate to be processed. Such a transport line is suitable for so-called flat-flow processing, particularly liquid processing. In this case, liquid processing means for performing a desired liquid processing on the substrate to be processed on the transport path is provided.
[0023]
In the processing system of the present invention, a typical processing unit included in the multistage unit section is a heat treatment unit for performing a desired thermal process on the substrate to be processed in relation to the process on the transfer line. A preferred form of the transfer unit includes a support plate for placing the substrate to be processed in units of one piece, and a plurality of support pins provided discretely on the support plate to support the substrate substantially horizontally at the tip of the pin. It is the structure which has.
[0024]
In the processing system of the present invention, in order to effectively use the space on the passage, it is preferable that at least one processing unit for performing a predetermined processing on the substrate to be processed is provided on or below the transfer unit. The processing unit may be accessible by at least one transport means that can access the transfer unit. Further, preferably, the processing unit provided so as to be overlapped with the transfer unit may be a unit having a substrate temperature adjusting means for adjusting the temperature of the substrate to be processed to be constant.
[0025]
In the processing system of the present invention, the buffer unit for temporarily holding and storing the substrate to be processed is provided over or below the delivery unit, and is provided by at least one transport means accessible to the delivery unit. The buffer unit may be accessible. In such a configuration, it is possible to temporarily store and store the substrate passing through the transfer unit in the adjacent buffer unit as necessary, and transfer when the transfer tact differs between any two transfer lines. This is effective when timing compensation or adjustment is performed, or when the substrate is withdrawn from the transfer line in the event of a failure or failure in the system, and the reliability of the process flow and transfer flow can be improved.
[0026]
In the treatment system of the present invention, a configuration in which display means for informing the location of the passage and the situation in the system at the same time near the entrance of the passage, or a configuration in which the passage is always open is preferable.
[0027]
DETAILED DESCRIPTION OF THE INVENTION
Hereinafter, preferred embodiments of the present invention will be described with reference to the accompanying drawings.
[0028]
FIG. 1 shows a resist coating and developing system to which the present invention can be applied. This resist coating and developing processing system 10 is installed in a clean room. For example, an LCD substrate is a substrate to be processed, and each process such as cleaning, resist coating, pre-baking, developing, and post-baking in a photolithography process is performed in the LCD manufacturing process. Is what you do. The exposure process is performed by an external exposure device 12 installed adjacent to the system.
[0029]
In the resist coating and developing system 10, a horizontally long process station (P / S) 16 is disposed at the center, and cassette stations (C / S) 14 and interface stations (I / I) are arranged at both ends in the longitudinal direction (X direction). F) 18 is arranged.
[0030]
The cassette station (C / S) 14 is a cassette loading / unloading port of the system 10, and can accommodate up to four cassettes C that can accommodate a plurality of substrates C in a horizontal direction, for example, in the Y direction by stacking substrates G in multiple stages. A cassette stage 20 and a transport mechanism 22 for loading and unloading the substrate G with respect to the cassette C on the stage 20. The transport mechanism 22 has a means for holding the substrate G, for example, a transport arm 22a, and can be operated with four axes of X, Y, Z, and θ. Delivery is now possible.
[0031]
The process station (P / S) 16 has forward transfer lines [A] and [B] and backward transfer lines [C] and [D] extending in the system longitudinal direction (X direction). More specifically, in the forward path from the cassette station (C / S) 14 to the interface station (I / F) 18, the transfer line [A] is laid in the cleaning process unit 24, and the transfer line [B] is the coating process unit. 26.
[0032]
The cleaning process unit 24 includes a scrubber cleaning unit (SCR) 28 and excimer UV irradiation on the transport line [A] at a location adjacent to the cassette station (C / S) 14 of the scrubber cleaning unit (SCR) 28. A unit (e-UV) 30 is arranged. In the scrubber cleaning unit (SCR) 28, the conveyance line [A] is constituted by a flat flow type conveyance path, for example, a roller conveyance path, and the LCD substrate G is moved in a horizontal position on the conveyance line [A] by roller conveyance. The substrate G is subjected to brushing cleaning or blow cleaning.
[0033]
The coating process unit 26 transfers the carry-in unit (IN) 32, the resist coating unit (CT) 34, the reduced-pressure drying unit (VD) 36, the edge remover unit (ER) 38, and the carry-out unit (OUT) 40 to the transfer line [B]. Are arranged in a row along the line. As shown in FIG. 2, these coating system unit groups (IN) 32, (CT) 34, (VD) 36, (ER) 38, (OUT) 40 are placed on a support base 42 according to the order of processing steps. It is arranged in a horizontal row. The substrate G can be directly exchanged between the units by one or a plurality of pairs of transfer arms 46 and 46 that move along a pair of guide rails 44 and 44 laid in parallel on both sides of the support base 42. .
[0034]
The carry-in unit (IN) 32 is provided with a flat-flow type roller conveyance path 50 in which conveyance rollers or rollers 48 on which the substrate G can be placed substantially horizontally are laid in the X direction at regular intervals. This roller transport path 50 is a pass-in unit (PASS) included in an adjacent oven tower (TB) 78 described later. _in ) 102 and is driven by, for example, a conveyance driving unit 52 having a drive motor and a transmission mechanism. Below the roller transport path 50, a pass unit (PASS _in ) A plurality of lift pins 52 that can be moved up and down are provided for lifting the substrate G transported from 102 in a horizontal position and handing it to the transport arms 46 and 46.
[0035]
The resist coating unit (CT) 34 includes a cup-shaped processing container 54 having an open upper surface, a stage 56 that can be moved up and down for horizontally placing and holding the substrate G in the processing container 54, An elevating drive unit (not shown) provided below the processing container 54 for elevating the stage 56, and a resist solution supplying unit (not shown) for supplying a resist solution to the substrate G on the stage 56 have. As a coating method, either a spin coating method or a spinless method may be used. In the case of the spin coating method, the resist solution is dropped from the nozzle of the resist solution supply unit while the stage 56 on which the substrate G is placed is rotated by a rotation driving unit (not shown), and the substrate is generated by the rotational force and centrifugal force. A coating film of a resist solution having a certain film thickness is formed on the upper surface. In the case of the spinless method, the resist solution is continuously discharged in a thin line shape on the entire surface of the substrate while moving or scanning the nozzle of the resist solution supply unit in the horizontal direction relative to the substrate G on the stage 56. Thus, a coating film of a resist solution having a certain film thickness is formed.
[0036]
The vacuum drying unit (VD) 36 includes a tray or shallow container type lower chamber 58 having an open upper surface, and a lid-shaped upper chamber configured to be tightly fitted or fitted to the upper surface of the lower chamber 58. (Not shown). The lower chamber 58 has a substantially rectangular shape, a stage 60 for placing and supporting the substrate G horizontally is disposed at the center, and exhaust ports 62 are provided at the four corners of the bottom surface. Each exhaust port 62 communicates with a vacuum pump (not shown) via an exhaust pipe (not shown). With the lower chamber 58 covered with the upper chamber, the processing space in both chambers can be depressurized to a predetermined degree of vacuum by the vacuum pump.
[0037]
The edge remover unit (ER) 38 includes a stage 64 for horizontally placing and supporting the substrate G, alignment means 66 for positioning the substrate G at a pair of opposite corners, and four sides of the substrate G. There are provided four remover heads 68 and the like for removing excess resist from the peripheral edge (edge). With the alignment means 66 positioning the substrate G on the stage 64, each remover head 68 moves along each side of the substrate G, and removes the excess resist adhering to the peripheral portion of each side of the substrate with a thinner. It dissolves and is removed.
[0038]
The carry-out unit (OUT) 40 has a roller conveyance path and lift pins (not shown) similar to those in the carry-in unit (IN) 32 described above. The transfer arms 46 and 46 transfer the substrate G, which has been subjected to the resist removal processing by the edge remover unit (ER) 38, to the carry-out unit (OUT) 40, and the lift pins receive the substrate G from the transfer arms 46 and 46 and are on the roller transfer path. To be transferred to. Thereafter, the substrate carrying pass unit (PASS) included in the adjacent oven tower (TB) 80 to be described later is used. _out ) 144 up to 144 (FIG. 5).
[0039]
As described above, the coating process unit 26 transports the transport arm (46, 46) movable along the guide rails 44, 44 and the roller transport path in the carry-in unit (IN) 32 and the carry-out unit (OUT) 40. Line [B] is configured.
[0040]
On the return path from the interface station (I / F) 18 to the cassette station (C / S) 14, the transport line [C] is laid on the development process unit 70, and the transport line [D] is laid on the inspection unit 72.
[0041]
The developing process unit 70 includes a flat-flow developing unit (DEV) 74 and an i-ray UV irradiation unit (i-UV) 75. In the development unit (DEV) 74, for example, similarly to the scrubber cleaning unit (SCR) 28, the transport line [C] is constituted by a roller transport path (not shown), and the substrate G is transported along the transport line [C]. A series of development processing steps (liquid accumulation, development reaction, rinsing, drying, etc.) are performed on the substrate G while moving the substrate G. The i-ray UV irradiation unit (i-UV) 75 is for performing a decoloring process of development, and draws a roller conveyance path from the development unit (DEV) 74.
[0042]
The inspection unit 72 also includes a transport line [D] that is a flat-flow transport path, for example, a roller transport path (not shown), and moves the substrate G along the transport line [D] by roller transport. Line width inspection, macro pattern inspection, film quality / film thickness inspection, and the like related to resist patterns are performed.
[0043]
In this resist coating and developing processing system 10, the end of the transfer line [A], the start and end of the transfer line [B], the start and end of the transfer line [C], and the start of the transfer line [D] Are provided with oven towers (TB) 76, 78, 80, 82, 84 and 86, respectively. A vertical transfer mechanism (S / A) between the oven towers (TB) 76 and 86, between the oven towers (TB) 78 and 84, and between the oven towers (TB) 80 and 82. 88, 90, and 92 are provided, respectively.
[0044]
As shown in FIG. 3, the oven tower (TB) 76 located at the end of the transfer line [A] includes, for example, a pass unit (PASS for carrying out a substrate in order from the bottom). _out 94) Heating units for dehydration baking or dehydration baking units (DHP) 96, 98 and heating units for post baking or post baking units (POBAKE) 100 are stacked in multiple stages. Here, pass unit (PASS _out ) 94 is a space for the transport mechanism (S / A) 88 to transport the substrate G, which has been subjected to the previous process (cleaning process) by the upstream scrubber cleaning unit (SCR) 28, from the transport line [A]. A roller transport path (not shown) drawn from the scrubber cleaning unit (SCR) 28 and a lift pin that can be lifted and lowered to lift the substrate G up to the transport path and pass it to the transport mechanism (S / A) 88 (Not shown).
[0045]
The oven tower (TB) 86 located at the start end of the transfer line [D] has, for example, a substrate loading pass unit (PASS) in order from the bottom. _in ) 102, a cooling unit (COL) 104 for adjusting substrate temperature and post-baking units (POBAKE) 106, 108 are stacked in multiple stages. Here, pass unit (PASS _in ) 102 provides a space for the transport mechanism (S / A) 88 to carry the substrate G to be subjected to the post-process (inspection process) in the downstream inspection unit 26 into the transport line [D]. A roller conveyance path (not shown) drawn from the section 72 and lift pins (not shown) that can be moved up and down to receive the substrate G from the conveyance mechanism (S / A) 88 and transfer it onto the conveyance path. is doing.
[0046]
In FIG. 3, the transport mechanism (S / A) 88 can be moved up and down along a guide rail 112 extending in the vertical direction, and can be rotated or swiveled in the θ direction on the lift transport body 114. A revolving transport body 116 and a transport arm or tweezers 118 capable of moving back and forth in the front-rear direction while supporting the substrate G on the revolving transport body 116. A drive unit 120 for raising and lowering the lifting and lowering conveyance body 114 is provided on the proximal end side of the vertical guide rail 112, and a drive unit 122 for driving and turning the swivel conveyance body 116 is attached to the raising and lowering conveyance body 114. A driving unit 124 for advancing and retracting 118 is attached to the swivel carrier 116. Each drive part 120,122,124 may be comprised by the electric motor etc., for example.
[0047]
The transport mechanism (S / A) 88 configured as described above is moved up and down or swiveled at high speed under the control of a controller (not shown) to access any unit in the adjacent oven towers (TB) 76 and 86 to access the substrate. G can be carried in and out.
[0048]
As shown in FIG. 4, the oven tower (TB) 78 positioned at the start end of the transfer line [B] has, for example, a pass unit (PASS for loading substrates) in order from the bottom. _in ) 126, cooling units (COL) 128 and 130 for substrate temperature adjustment and adhesion units (AD) 132 for hydrophobic treatment are stacked in multiple stages. Here, pass unit (PASS _in ) 126 provides a space for the transport mechanism (S / A) 90 to carry the substrate G to be subjected to the subsequent process (resist coating process) in the downstream coating process section 26 into the transport line [B]. The roller transport path 50 (FIG. 2) drawn into the carry-in unit (IN) 32 of the coating process unit 26 and the substrate G received from the transport mechanism (S / A) 90 and transferred onto the transport path 50. It has a lift pin 134 (FIG. 2) that can be raised and lowered.
[0049]
The oven tower (TB) 84 located at the end of the transfer line [C] includes, for example, a pass unit (PASS for carrying out the substrate in order from the bottom). _out ) 136, post-baking units (POBAKE) 138, 140 and an adhesion unit (AD) 142 are stacked in multiple stages. Here, pass unit (PASS _out ) 136 provides a space for the transport mechanism (S / A) 90 to carry out the substrate G that has undergone development processing in the upstream development process section 70 from the transport line [C]. A roller conveyance path (not shown) drawn from the UV irradiation unit (i-UV) 75 and a lift pin (not shown) that lifts the substrate G up to the conveyance path and passes it to the conveyance mechanism (S / A) 90. Z).
[0050]
In FIG. 4, the transport mechanism (S / A) 90 has the same configuration as the transport mechanism (S / A) 88 (FIG. 3) described above, and moves up and down at high speed under the control of a controller (not shown). Alternatively, the substrate G can be carried in and out by accessing the arbitrary units in the oven towers (TB) 78 and 84 on both sides by rotating.
[0051]
As shown in FIG. 5, the oven tower (TB) 80 located at the end of the transfer line [B] includes, for example, a pass unit (PASS for carrying out a substrate in order from the bottom). _out 144, a substrate temperature adjusting cooling unit (COL) 146 and a pre-baking heating unit or pre-baking unit (PREBAKE) 148, 150 are stacked in multiple stages. Here, pass unit (PASS _out 144) provides a space for the transport mechanism (S / A) 92 to unload the substrate G that has been subjected to the previous process (resist coating process) in the upstream coating process section 26 from the transport line [B]. The roller transport path (not shown) drawn from the unloading section (OUT) 40 of the coating process section 26 and the substrate G can be moved up and down to be transferred to the transport mechanism (S / A) 92. Lift pins (not shown).
[0052]
The oven tower (TB) 82 located at the start end of the transfer line [C] has, for example, a pass unit (PASS for loading substrates) in order from the bottom. _in 152, a substrate temperature adjusting cooling unit (COL) 54 and pre-baking units (PREBAKE) 156, 158 are stacked in multiple stages. Here, pass unit (PASS _in ) 152 provides a space for the transport mechanism (S / A) 92 to carry the substrate G to be developed in the downstream development process section 70 into the transport line [C]. ) 74 having a roller conveyance path (not shown) drawn into 74 and lift pins (not shown) that can be moved up and down for receiving the substrate G from the conveyance mechanism (S / A) 92 and transferring it onto the conveyance path. is doing.
[0053]
In FIG. 5, a transport mechanism (S / A) 92 has the same configuration as the transport mechanism (S / A) 88 (FIG. 3) described above, and moves up and down at high speed under the control of a controller (not shown). Alternatively, the substrate G can be carried in and out by accessing the arbitrary units in the oven towers (TB) 80 and 82 adjacent to each other by turning.
[0054]
In FIG. 1, an interface station (I / F) 18 has a transfer device 160 for exchanging the substrate G with an adjacent exposure device 12, around which a buffer stage (BUF) 162 and an extension cooling stage are provided. (EXT · COL) 164 and peripheral devices (TITLER / EE) 166 are arranged. A stationary buffer cassette (not shown) is placed on the buffer stage (BUF) 162. The extension / cooling stage (EXT / COL) 164 is a stage for transferring a substrate having a cooling function, and is used when the substrate G is exchanged with the process station (P / S) 16 side. The peripheral device 166 may have a configuration in which, for example, a titler (TITLER) and a peripheral exposure device (EE) are stacked vertically. The transfer device 160 has a means for holding the substrate G, for example, a transfer arm 160a, and transfers the substrate G to and from the adjacent exposure device 12, each unit (BUF) 162, (EXT / COL) 164, (TITLER / EE) 166. Can be done.
[0055]
In FIG. 1, between the transport mechanism 88 and the transport mechanism 90, a passage 168 that allows a person to pass through the resist coating and developing processing system in the clean room, and both the transport mechanisms 88 and 90. An extension unit (EXT) 170 for exchanging the substrate G between them is provided above and below.
[0056]
FIG. 6 shows a structure or layout around the passage 168 as seen from the front side. A support portion 174 having a U-shaped cross section is provided on the floor surface 172 between the two transport mechanisms (S / A) 88 and 90, and a normal adult M can easily pass through the support portion 174 without bending. A passage 168 (for example, about 190 cm from the floor surface) is formed. The both side walls or legs 174a of the support portion 174 may be configured as a stationary type, or may be configured as a movable type having casters. The horizontal plate portion 174b above the support portion 174 constitutes the ceiling of the passage 168 and constitutes a support base for placing the extension unit (EXT) 170 and other units in multiple stages.
[0057]
In the illustrated example, a cooling unit (COL) 176, extension units (EXT) 170A and 170B, and buffer units (BUF) 178 for substrate temperature adjustment are stacked in multiple stages on the support base 174b in order from the bottom. The cooling unit 176 can be accessed (substrate loading / unloading) from one side, for example, by a transport mechanism (S / A) 88. The extension units (EXT) 170A and 170B can be accessed from both sides, that is, from both of the transport mechanisms (S / A) 88 and 90, but preferably are unidirectional loading and unloading type substrate transfer units in opposite directions. May be used as That is, one extension unit (EXT) 170A has a loading / unloading configuration in which the substrate G is put into the unit exclusively from the transport mechanism 88 side and the substrate G is taken out from the unit on the transport mechanism (S / A) 90 side. The unit (EXT) 170B may be configured to be a loading / unloading mode in which the substrate G is put into the unit exclusively from the transport mechanism (S / A) 90 side and the substrate G is taken out from the unit on the transport mechanism (S / A) 88 side. The buffer unit (BUF) 178 may be configured to be accessible from both of the transport mechanisms (S / A) 88 and 90, or may be configured to be accessible from only one side.
[0058]
FIG. 7 shows a configuration example of the extension unit (EXT) 170. A horizontal support plate 182 having substantially the same shape as the substrate G is accommodated in the unit casing 180, and a large number of support pins 184 having the same height are discretely provided on the horizontal support plate 182 at regular intervals. Yes. The substrate G is horizontally placed on the horizontal support plate 182 so as to be supported by the pin tips of the support pins 184, and is loaded into the unit by the transport arms 118 of the transport mechanisms (S / A) 88, 90. Or carried out of the unit.
[0059]
FIG. 8 shows a configuration example of the cooling unit (COL) 176. In the cooling unit (COL) 176 of this configuration example, a hot plate or a cooling plate 186 is fixedly disposed substantially horizontally at a certain height in a unit casing 184. The hot plate 186 is made of a metal having a high thermal conductivity, such as aluminum, and has a passage through which cooling water whose temperature is adjusted to a set value (for example, 23 ° C.) flows. The substrate G that has been subjected to a heat treatment of, for example, 100 ° C. or more in the previous step and is disposed on the hot plate 186 is cooled to a set temperature by heat radiation by heat conduction to the hot plate 186. Through holes 186a penetrating vertically are formed at a plurality of locations in the heat plate 186 in a discrete arrangement pattern, and each through hole 186a supports for supporting the substrate G so that it can be moved up and down when the substrate G is loaded and unloaded. A lift pin 188 is provided as a member so as to be movable in the vertical direction. These lift pins 188 are coupled to a lifting mechanism 192 via a horizontal base member 190. The lift pins 188 are moved up and down between the lowermost position for retraction (position shown in FIG. 8) and the uppermost position for substrate transfer by the elevating drive of the elevating mechanism 192.
[0060]
The buffer unit (BUF) 178 is a unit for temporarily storing and storing the substrate G that passes through the extension unit (EXT) 170 as necessary. For example, the transfer unit [A], [B], When transport timing is compensated or adjusted when the transport tact differs between any two of [C] and [D], or when the substrate G is withdrawn from the transport line in the event of an emergency or failure in the system Used for. The structure of the buffer unit (BUF) 178 may be a system in which a large number of single-wafer type units (buffs) for storing the substrates G so that they can be taken in and out in a single unit can be stacked in multiple stages, or a plurality of units can be placed in one collective unit. A plurality of shelves (buffs) may be provided, and a substrate G may be stored on each shelf (buff) so that it can be taken in and out one by one. In addition, an opening / closing door or a shutter can be provided in front of the buffer unit (BUF) 178, and an atmosphere of an inert gas such as nitrogen gas can be formed in the unit. The buffer unit (BUF) 178 is preferably arranged at the uppermost stage in the multi-stage unit structure on the passage 168 from the standpoints of variability in substrate storage capacity (height size) and low access frequency.
[0061]
FIG. 9 shows a layout around the passage 168 as viewed obliquely from above. Outside the entrance or exit of the passage 168 is a space S that is open upward, and workers use this space S to access the units (COL), (EXT), and (BUF) on the passage 168. Thus, desired maintenance can be performed. Further, each unit in the adjacent oven tower (TB) 76, 78, 84, 86 can also be accessed from this space S for maintenance.
[0062]
In this embodiment, maintenance of each transport mechanism (S / A) 88, 90, 92 is performed by a worker in the space K between the forward transport line [A, B] and the backward transport line [C, D]. Is done by entering. In order for an operator to enter the space K, it is preferable to provide a suitable passage below at least one of the transfer lines [A] or [D] or at least one of the transfer lines [B] or [C]. For example, as shown in FIG. 10, a passage 198 for entering and exiting the space K can be provided below the substrate carry-in unit (IN) 32 in the coating process unit 26. However, since this passage 198 is usually provided at a height of 1 m or less from the floor surface under the transport line [B], the worker passes through this passage 198 in a bent posture or a prone posture. A door 200 that can be opened and closed may be provided at the entrance of the passage 198.
[0063]
The space K between the forward transfer line [A, B] and the return transfer line [C, D] can be used as an auxiliary transfer space. That is, as shown in FIG. 1, a shuttle 202 capable of horizontally placing the substrates G in units of one is disposed in the space K, and the shuttle 202 is bidirectionally moved in the line direction (X direction) by a drive mechanism (not shown). You may move it. The substrate G can be exchanged between the transport mechanisms 88 and 22 or between the transport mechanisms 90 and 92 via the shuttle 202.
[0064]
FIG. 11 shows a processing procedure in this resist coating and developing processing system. First, in the cassette station (C / S) 14, the transport mechanism 22 takes out one substrate G from a predetermined cassette C on the stage 20, and the excimer of the cleaning process unit 24 of the process station (P / S) 16. It is carried into the UV irradiation unit (e-UV) 30 (Step S ₁ ).
[0065]
In the excimer UV irradiation unit (e-UV) 30, the substrate G is subjected to dry cleaning by ultraviolet irradiation (step S). ₂ ). This UV cleaning mainly removes organic substances on the substrate surface. After completion of the ultraviolet cleaning, the substrate G is moved to the scrubber cleaning unit (SCR) 28 of the cleaning process unit 24 by the transport mechanism 22 of the cassette station (C / S) 14.
[0066]
In the scrubber cleaning unit (SCR) 28, as described above, the surface of the substrate G is subjected to brushing cleaning or blow cleaning while being transported in a flat flow by roller transport on the transport line [A], thereby removing the substrate G from the surface of the substrate. Remove particulate dirt (step S) ₃ ). After the cleaning, the substrate G is rinsed while being conveyed in a flat flow, and finally the substrate G is dried using an air knife or the like.
[0067]
The substrate G that has been subjected to the cleaning process in the scrubber cleaning unit (SCR) 28 is transferred to the carry-out pass unit (PASS) in the oven tower (TB) 76 at the end of the transfer line [A]. _out ) 94, and is carried out of the transport line [A] by the transport mechanism (S / A) 88.
[0068]
The substrate G unloaded from the transfer line [A] is transferred by the transfer mechanism (S / A) 88 to one of the units in the oven tower (TB) 76, 86, for example, dehydration bake units (DHP) 96, 98. Therefore, the dehydration process is performed (step S ₄ ). After the dehydration process, the substrate G is transferred to the transport mechanism (S / A) 90 by the transport mechanism (S / A) 88 via the extension unit (EXT) 170A. The transport mechanism (S / A) 90 moves the substrate G to a unit in the oven tower (TB) 78, 84, for example, one of the cooling units (COL) 128, 130, where it is cooled to a constant substrate temperature. (Step S ₅ ). Thereafter, the substrate G is transferred to one of the adhesion units (AD) 132 and 142 where it is subjected to a hydrophobization process (step S). ₆ ). After completion of the hydrophobic treatment, the substrate G is cooled to a constant substrate temperature by one of the cooling units (COL) 128 and 130 (step S). ₇ ). After that, the substrate G is transferred to the oven tower (TB) 78 by a pass unit (PASS). _in ) 126, where it is carried onto the transport line [B].
[0069]
The substrate G is carried into the coating process unit 26 on the transport line [B], and transferred to the resist coating unit (CT) 34 through the carry-in unit (IN) 32. In the resist coating unit (CT) 34, the substrate G is coated with a resist solution on the upper surface (surface to be processed) of the substrate by a spin coating method or a spinless method. Thereafter, the substrate G is subjected to a drying process by a decompression drying unit (VD) 36 adjacent to the downstream side, and then an unnecessary (unnecessary) resist at the peripheral portion of the substrate is removed by an edge remover unit (ER) 38 adjacent to the downstream side. Removed (step S ₈ ).
[0070]
The substrate G that has undergone the resist coating process as described above passes from the edge remover unit (ER) 38 through the carry-out unit (OUT) 40 to the carry-out pass unit (PASS) belonging to the oven tower (TB) 80. _out ) And then unloaded from the transport line [B] by the transport mechanism (S / A) 92.
[0071]
The substrate G is turned to a unit in the oven tower (TB) 80, 82 in a predetermined sequence by the transport mechanism (S / A) 90, and is subjected to a predetermined process. For example, the substrate G is first transferred to one of the pre-baking units (PREBAKE) 148, 150, 156, 158, where it is baked after resist coating (step S). ₉ ). The substrate G is then transferred to one of the cooling units (COL) 146, 154 where it is cooled to a constant substrate temperature (step S). ₁₀ ). Thereafter, the substrate G is transferred to an extension / cooling stage (EXT / COL) 164 on the interface station (I / F) 18 side.
[0072]
In the interface station (I / F) 18, the substrate G is transferred from the extension / cooling stage (EXT / COL) 164 to the peripheral exposure device (EE) of the peripheral device 166, where the resist adhering to the peripheral portion of the substrate G is removed. After receiving an exposure for removal during development, it is sent to the adjacent exposure apparatus 12 (step S). ₁₁ ).
[0073]
In the exposure device 12, a predetermined circuit pattern is exposed to the resist on the substrate G. When the substrate G that has undergone pattern exposure is returned from the exposure apparatus 12 to the interface station (I / F) 18 (step S). ₁₁ First, it is carried into a titler (TITLERR) of the peripheral device 166, where predetermined information is written at a predetermined part on the substrate (step S). ₁₂ ). Thereafter, the substrate G is returned to the extension / cooling stage (EXT / COL) 164. The transfer of the substrate G in the interface station (I / F) 18 and the exchange of the substrate G with the exposure apparatus 12 are performed by the transfer device 160.
[0074]
In the process station (P / S) 16, the transport mechanism 92 receives the exposed substrate G from the extension / cooling stage (EXT / COL) 164, and carries the carry-in pass unit (PASS) in the oven tower (TB) 82. _in ) 152. The substrate G is a pass unit (PASS _in ) Is carried on the conveyance line [C] in 152 and is sent to the developing unit (DEV) 74 in a flat flow.
[0075]
In the development unit (DEV) 74, a series of development processing steps of development, rinsing, and drying are performed while the substrate G is conveyed in a flat flow by roller conveyance on the conveyance line [C] (step S). ₁₃ ).
[0076]
The substrate G that has undergone the development process in the development process unit 70 is conveyed as it is to the decolorization process unit (i-UV) 75 adjacent to the downstream side, where it undergoes a decolorization process by i-line irradiation (step S). ₁₄ ). The substrate G that has been subjected to the decoloring process is transferred to the carry-out pass unit (PASS) in the oven tower (TB) 86. _out ) The sheet is unloaded from the transfer line [C] by the transfer mechanism (S / A) 90 at 136.
[0077]
The substrate G unloaded from the transfer line [C] is first subjected to a post-baking heat treatment in one of the post-baking units (POBAKE) (step S). ₁₅ ), And then cooled to a predetermined substrate temperature by one of the cooling units (COL) (step S). ₁₆ ). There are two transport sequences in this case.
[0078]
In the first transfer sequence, the transfer mechanism (S / A) 90 that unloads the substrate G from the transfer line [C] is used as it is in the post-baking unit (POBAKE) in the jurisdiction area, for example, in the oven tower (TB) 84. This is a case of bringing into one of the post-baking units (POBAKE) 138 and 140. In this case, the transport mechanism (S / A) 90 transfers the substrate G to the cooling units (COL) in the jurisdiction area, for example, the cooling units (COL) 128 and 130 in the oven tower (TB) 78 after completion of the post-baking process. The substrate G is transferred to one of the substrates, and the substrate G is loaded into the extension unit (EXT) 170B after the substrate temperature adjustment is completed. Thereafter, the transport mechanism (S / A) 88 on the opposite side takes out the substrate G from the extension unit (EXT) 170B, and then carries in the carry-in pass unit (PASS) in the oven tower (TB) 86. _in ) Move to 102.
[0079]
The second transport sequence is a case where the transport mechanism (S / A) 90 directly transfers the substrate G unloaded from the transport line [C] to the extension unit (EXT) 170B. In this case, when the transport mechanism (S / A) 88 takes out the substrate G from the extension unit (EXT) 170B on the opposite side, the post-baking unit (POBAKE) in the jurisdiction area, for example, the oven tower (TB) 76, It is brought into one of the post-baking units (POBAKE) 100, 106, 108 in 86. Then, after the post-baking process is finished, the substrate G is carried into the cooling unit (COL) in the jurisdiction area, for example, the cooling unit (COL) 104 in the oven tower (TB) 86 or the cooling unit (COL) 176 on the passage 168. After completion of the substrate temperature adjustment, the substrate G is transferred into the oven tower (TB) 86 by a pass unit (PASS). _in ) Move to 102.
[0080]
Carry-in pass unit (PASS _in ) The substrate G transferred to 102 is then carried onto the transfer line [D], and sent to the inspection section (AP) 72 in a flat flow. In the inspection section (AP) 72, line width inspection, film quality / film thickness inspection, etc. are performed on the resist pattern on the substrate G while moving the substrate G on the transport line [D] by roller transport (step S). ₁₇ ). At the end of the transport line [D], the carry-out pass unit (PASS _out ) Corresponding to a substrate carry-out portion (not shown). The substrate G that has completed the inspection process is taken up by the transport mechanism 22 on the cassette station (C / S) 14 side via the substrate carry-out section. In the cassette station (C / S) 14, the transport mechanism 22 stores the substrate G taken from the transport line [D] in any one cassette C on the stage 20 (step S). ₁ ).
[0081]
As described above, in this embodiment, the forward transfer lines [A] and [B] extending in the system longitudinal direction (X direction) to the horizontally long process station (P / S) 16 and the return transfer lines [C], In the resist coating and developing processing system in which [D] is provided in two rows, a point connecting the forward transfer lines [A] and [B] and a point connecting the backward transfer lines [C] and [D] are 1 A crossing passage 168 for passing through the system is provided below the extension unit (EXT) 170 that serves as a substrate bridging member and is centrally arranged at the connection point. Furthermore, it is related to the liquid processing on the said conveyance line at the edge part of each conveyance line [A], [B], [C], [D] located in the vicinity of a connection point, or the liquid processing on the conveyance line before and behind. Oven towers (TB) 76, 78, 84, 86 in which oven units for heat treatment are stacked and arranged in multiple stages are installed, and the oven towers (TB) facing each other in a direction parallel to the passage 168 (Y direction) ) 76, 86 and between the oven towers (TB) 78, 84, lift / swivel type transport mechanisms (S / A) 88, 90 that can access each unit in the oven tower are provided. These transport mechanisms (S / A) 88 and 90 exchange the substrate G with each other via an extension unit (EXT) 170.
[0082]
Thus, in this embodiment, the crossing passage 168 for passing through the system is realized in the area where the transport system and the unit are integrated. For this reason, there is an advantage that a substantial increase in footprint is not required when the passage 168 is opened.
[0083]
In this embodiment, the passageway 168 provides a passage for people to move between the sides of the system. When maintenance, patrol, or a disaster such as a fire occurs, a person concerned (usually an operator, a worker, etc.) passes through this passage 168, so that the system end, that is, the cassette station (C / S) 14 or the exposure device 12 can be moved. You can move without difficulty from one side of the system to the other side without difficulty. The advantage of the passage 168 increases as the total length of the system increases and the number of installed systems increases.
[0084]
FIG. 12 shows a layout example when a plurality of (for example, two) resist coating and developing treatment systems in this embodiment are installed in a clean room. Normally, as shown in the figure, a plurality of systems 10A and 10B are installed in the clean room 202 with appropriate intervals and in parallel. Accordingly, the passages 168 of the systems 10A and 10B are aligned in a straight line in the system width direction (Y direction). For example, a fire suddenly occurs in the clean room 202. At that time, as shown in the figure, the person concerned M is behind the system 10A in the front and the system 10B in the back as viewed from the entrance / exit 204, respectively. _a , M _b Suppose there was. In this case, M _b Can pass through the passage 168 of the system 10B as shown by the dotted line, and then continue straight and pass through the passage 168 of the system 10A, thereby reaching the entrance / exit 204 in the shortest distance or the shortest time. In addition, the related party M on the near side _a However, by passing through the passage 168 of the system 10A as indicated by the dotted line, it is possible to reach the entrance / exit 204 in the shortest distance or the shortest time.
[0085]
In the vicinity of the front entrance of the passage 168, preferably a lighting or light-emitting display type passage sign is provided so that the location of the passage 168 can be visually confirmed from any direction. In this embodiment, as shown in FIG. 12, for example, the passage sign 206 may be provided so as to protrude obliquely forward from one corner of the oven tower (TB) 76, 78. According to such an installation form, the installation location of the passage sign 206 can be visually recognized from all directions with a viewing angle of 180 °. In addition, when a plurality of systems 10A and 10B are provided side by side as shown in FIG. 12, the passage sign 206 of the system 10A on the near side can be seen through the passage 168 of the system 10B on the rear side than the ceiling of the passage 168. It is preferable to install the passage sign 206 at a sufficiently low position (FIG. 9).
[0086]
The passage sign 206 may be a dedicated one, but may be a display means for visually displaying and notifying the status of the entire system, such as a signal tower. For example, in an emergency, the signal tower may be lit and displayed in a special color so as to function as a condemnation passage sign 206. By installing a signal tower at such a position, it is possible to check at a glance through the signal tower the operational status of multiple tall systems aligned in parallel in the clean room without moving to the end of the system. is there.
[0087]
In this embodiment, not only the extension unit (EXT) 170 but also the buffer unit (BUF) 178 and the cooling unit (COL) 176 for adjusting the substrate temperature are stacked on the passage 168 in multiple stages. .
[0088]
As described above, the buffer unit (BUF) 178 is a unit for temporarily holding and storing the substrate G passing through the extension unit (EXT) 170 as necessary. For example, it is assumed that the transport tact is changed from the previous 80 seconds to 60 seconds at the change of the product lot without interrupting the transport flow of the substrate G in the system. In this case, during a certain transition period, the end of the transport line [A], that is, the pass unit (PASS in the oven tower (TB) 76). _out ) The substrate G is carried out at intervals of 60 seconds after the change from 94, while the end of the transfer line [C], that is, the pass unit (PASS in the oven tower (TB) 84). _out ) From 136, the substrate G is unloaded at intervals of 80 seconds before the change. For this reason, it is necessary to adjust the timing of the conveyance sequence so that the conveyance tact (60 seconds) system after the change and the conveyance tact (80 seconds) system before the change do not interfere in both conveyance mechanisms (S / A) 88 and 90. Sex comes out. Here, since each transport mechanism (S / A) 88, 90 can hold an arbitrary substrate G on the buffer unit (BUF) 178 for an arbitrary time, it is optimal for timing adjustment between different transport tacts. A recipe on the transfer sequence can be set.
[0089]
Also, the buffer unit (BUF) 178 can be used effectively when the process flow is stopped or stagnated at some point in the system. For example, when a failure occurs in the coating process unit 26 and it becomes impossible to carry the substrate into the process unit 26, the scrubber cleaning unit (SCR) 28 is currently undergoing a flat cleaning process. The substrate G may be cleaned as it is. Accordingly, the cleaned substrates G are successively carried out from the transfer line [A] from the scrubber cleaning unit (SCR) 28 at the same cycle or timing as normal. Each substrate G thus unloaded from the transfer line [A] is subjected to thermal processing in the same sequence as usual in the oven tower (TB) 76, 78, 84, 86 and then transferred to the coating process unit 26. May be stored in a buffer unit (BUF) 178.
[0090]
Thus, by providing the buffer unit (BUF) 178 adjacent to the extension unit (EXT) 170 (preferably vertically stacked), the reliability of the transport flow and process flow can be improved.
[0091]
The cooling unit (COL) 176 on the passage 168 can function as a substitute or complement to the cooling unit (COL) in the adjacent oven tower (TB) 76, 78, 84, 86 as described above. The cooling unit (COL) in the oven tower (TB) overlaps with the heating units (DHP), (AD), (PREBAKE), and (POBAKE), whereas the cooling unit (COL) on the passage 168 is stacked. ) 176 is laminated and stacked with non-heating units such as the extension unit (EXT) 170 and the buffer unit (BUF) 178, so that there is an advantage that it is not necessary to adopt a special heat insulating structure.
[0092]
FIG. 13 shows a layout of a resist coating and developing treatment system according to the second embodiment. In the figure, parts having the same configuration or function as those of the first embodiment (FIGS. 1 to 11) described above are denoted by the same or similar reference numerals.
[0093]
In the second embodiment, the forward transport lines [A] and [B] and the backward transport lines [C] and [D] are connected straight to each other, and the extension unit (EXT) 170 in the above embodiment and Each of the transport mechanisms (S / A) 88, 90 is functionally divided into an outward path side and a return path side.
[0094]
More specifically, on the forward path side, the oven tower (TB) 76 positioned at the end of the transfer line [A] and the oven tower (TB) 78 positioned at the start of the transfer line [B] A transfer mechanism (S / A) 88A for transferring the substrate G between the units in the tower (TB) 76, and an extension for transferring the substrate G from the upstream side to the downstream side of the process flow on the forward path A unit (EXT) 170A and a transport mechanism (S / A) 90A for transporting the substrate G between the units in the oven tower (TB) 78 are arranged in a line. Here, both the transport mechanisms (S / A) 88A and 90A can also access the extension unit (EXT) 170A, and the transport mechanism (S / A) downstream from the transport mechanism (S / A) 88A on the upstream side. ) The substrate G is transferred to 90A through the extension unit (EXT) 170A.
[0095]
On the return path side, an oven tower (TB) is disposed between an oven tower (TB) 84 positioned at the end of the transfer line [C] and an oven tower (TB) 86 positioned at the start of the transfer line [D]. ) A transport mechanism (S / A) 90B for transporting the substrate G between the units in 84, and an extension unit (EXT) for delivering the substrate G from the upstream side to the downstream side of the process flow on the return path ) 170B and a transport mechanism (S / A) 88B for transporting the substrate G between the units in the oven tower (TB) 86 are arranged in a line. Both transport mechanisms (S / A) 90B and 88B can also access the extension unit (EXT) 170B, from the upstream transport mechanism (S / A) 90B to the downstream transport mechanism (S / A) 88B. The substrate G is transferred via an extension unit (EXT) 170B.
[0096]
In the second embodiment, passages 168A and 168B for passing through can be provided under the extension units (EXT) 170A and 170B with the same configuration or mechanism as the first embodiment described above. Participants can easily move from one side of the system to the other without bypassing one end of the system by passing vertically through both passages 168A, 168B in the direction across the system (Y direction). . In the example shown in the figure, both passages 168A and 168B are arranged in a straight line in the system crossing direction (Y direction), so that the person concerned can smoothly and safely pass through both passages 168A and 168B even in an emergency. . However, a configuration in which both the passages 168A and 168B are arranged at positions offset in the system longitudinal direction is also possible.
[0097]
In the second embodiment, since the extension unit (EXT) 170 and the transport mechanisms (S / A) 88 and 90 are arranged in each of the forward path and the return path, the footprint, particularly the system, is more than that of the first embodiment. The overall length of the is slightly larger. On the other hand, each transport mechanism (S / A) 88, 90 has an advantage that maintenance can be performed directly from the outside of the system. Also in this embodiment, a cooling unit (COL) 176, a buffer unit (BUF) 178, and the like for adjusting the substrate temperature can be arranged above and below each of the extension units (EXT) 170A and 170B.
[0098]
The preferred embodiments of the present invention have been described above, but various modifications and changes can be made within the scope of the technical idea of the present invention. For example, the flat flow conveyance path is not limited to the roller conveyance path, and for example, a belt-type conveyance path in which a pair of belts are laid in a horizontal direction with a certain interval is also possible. It is also possible to configure the oven tower to include a processing unit other than the heat treatment system, or to form a multi-stage unit portion similar to the oven tower only by a processing unit other than the heat treatment system.
[0099]
The processing system of the present invention is suitable for application to the resist coating and developing processing system as described above, but is not limited to this, and various modifications can be made in the system configuration and system elements. The present invention can also be applied to an inline system including an apparatus, an etching apparatus, and the like. The substrate to be processed in the present invention is not limited to the LCD substrate, and includes various substrates for flat panel displays and various substrates to be processed such as a semiconductor wafer, a CD substrate, a photomask, and a printed substrate. .
[0100]
【The invention's effect】
As described above, according to the processing system of the present invention, a person bypasses between both sides of the system in a system layout having a transfer line for transferring a substrate to be processed in the order of process flow in a substantially horizontal direction. It is possible to easily and quickly go back and forth. Furthermore, the reliability of the process flow or the transport flow can be improved.
[Brief description of the drawings]
FIG. 1 is a plan view showing a configuration of a resist coating and developing treatment system according to an embodiment of the present invention.
FIG. 2 is a plan view showing a configuration of a coating process section in the processing system.
FIG. 3 is a side view showing configurations of an oven tower and a transport mechanism in the processing system.
FIG. 4 is a side view showing a configuration of an oven tower and a transport mechanism in the processing system.
FIG. 5 is a side view showing configurations of an oven tower and a transport mechanism in the processing system.
FIG. 6 is a front view showing a configuration around a passage in the processing system.
FIG. 7 is a perspective view showing a configuration example of an extension unit (EXT) in the processing system.
FIG. 8 is a cross-sectional view showing a configuration example of a cooling unit (COL) in the processing system.
FIG. 9 is a perspective view showing a through passage and a configuration around the passage in the processing system.
FIG. 10 is a perspective view showing the internal entry passage and the surrounding structure in the processing system.
FIG. 11 is a flowchart showing an overall processing procedure in the processing system;
FIG. 12 is a plan view showing an example of a layout when a plurality of the processing systems are installed in a clean room.
FIG. 13 is a plan view showing a configuration of a resist coating and developing treatment system according to a second embodiment of the present invention.
[Explanation of symbols]
10 Resist coating development system
14 (C / S) Cassette station
16 (P / S) process station
18 (I / F) interface station
24 Cleaning process section
76, 78, 80, 82, 84, 86 (TB) Oven Tower
88, 90, 92 (S / A) transport mechanism
88A, 88B, 90A, 90B (S / A) transport mechanism
168, 168A, 168B passage
170, 170A, 170B (EXT) Extension unit
174 Support part
176 (COL) Cooling unit
178 (BUF) buffer
206 Passage sign
[A], [B], [C], [D] Conveyance line

Claims (18)

A first transfer line for transferring a substrate to be processed in a process flow in a substantially horizontal direction in one or a series of processing steps;
A second transfer line that is provided on an extension of the first transfer line and that transfers the substrate to be processed in the order of the process flow in a substantially horizontal direction in one or a series of processing steps;
At least one unloading unit, which is provided at the end of the first transfer line, for unloading the substrate to be processed from the first transfer line, and at least one for performing a predetermined process on the substrate to be processed A first multi-stage unit section formed by laminating and arranging the processing units in multiple stages,
First transport means for transporting a substrate to be processed between the units in the first multi-stage unit section;
At least one loading unit provided at the start end of the second transfer line for loading the substrate to be processed into the second transfer line and at least one for performing predetermined processing on the substrate to be processed. A second multi-stage unit portion formed by stacking and arranging multiple processing units in a multi-stage;
A second transport means for transporting a substrate to be processed between the units in the second multi-stage unit section;
A transfer unit disposed between the first transfer unit and the second transfer unit between the transfer units in order to transfer the substrate to be processed between the first transfer unit and the second transfer unit;
A treatment system having a passage provided under the transfer section so that a person can pass through the system. A first transfer line in an outward path for serially transferring a substrate to be processed in a process flow in one or a series of processing steps in a substantially horizontal direction;
At least one unloading unit, which is provided at the end of the first transfer line, for unloading the substrate to be processed from the first transfer line, and at least one for performing a predetermined process on the substrate to be processed A first multi-stage unit section formed by laminating and arranging the processing units in multiple stages,
A second transport line that is provided on an extension of the first transport line and that transports the substrate to be processed in the order of the process flow in a substantially horizontal direction in one or a series of processing steps;
At least one loading unit provided at the start end of the second transfer line for loading the substrate to be processed into the second transfer line and at least one for performing predetermined processing on the substrate to be processed. A second multi-stage unit portion formed by stacking and arranging multiple processing units in a multi-stage;
A third transfer line on the return path which is provided substantially parallel to the second transfer line and transfers the substrate to be processed serially in a substantially horizontal direction in the order of the process flow in one or a series of processing steps;
At least one unloading unit for unloading the substrate to be processed from the third transfer line and at least one for performing predetermined processing on the substrate to be processed are provided at the end of the third transfer line. A third multi-stage unit section in which the processing units are stacked in multiple stages,
An extension of the third transfer line is provided substantially in parallel with the first transfer line, and transfers a substrate to be processed in a process flow sequence serially in a substantially horizontal direction in one or a series of processing steps. A fourth transfer line;
At least one loading unit, which is provided at the start end of the fourth transfer line, for carrying the substrate to be processed into the fourth transfer line, and at least one for performing predetermined processing on the substrate to be processed. A fourth multi-stage unit portion formed by stacking and arranging multiple processing units in multiple stages;
First transport means for transporting a substrate to be processed between each unit in the first multi-stage unit section and each unit in the fourth multi-stage unit section;
Second transport means for transporting a substrate to be processed between each unit in the second multi-stage unit section and each unit in the third multi-stage unit section;
A transfer unit disposed between the first transfer unit and the second transfer unit between the transfer units in order to transfer the substrate to be processed between the first transfer unit and the second transfer unit;
A treatment system having a passage provided under the transfer section so that a person can pass through the system. A first transfer unit for transferring the substrate to be processed from the first transfer unit to the second transfer unit; and a process target from the second transfer unit to the first transfer unit. The processing system according to claim 2, wherein a second delivery unit for delivering a substrate is stacked in multiple stages. A first transfer line in an outward path for serially transferring a substrate to be processed in a process flow in one or a series of processing steps in a substantially horizontal direction;
At least one unloading unit, which is provided at the end of the first transfer line, for unloading the substrate to be processed from the first transfer line, and at least one for performing a predetermined process on the substrate to be processed A first multi-stage unit section formed by laminating and arranging the processing units in multiple stages,
First transport means for transporting a substrate to be processed between the units in the first multi-stage unit section;
A second transport line that is provided on an extension of the first transport line and that transports the substrate to be processed in the order of the process flow in a substantially horizontal direction in one or a series of processing steps;
At least one loading unit provided at the start end of the second transfer line for loading the substrate to be processed into the second transfer line and at least one for performing predetermined processing on the substrate to be processed. A second multi-stage unit portion formed by stacking and arranging multiple processing units in a multi-stage;
A second transport means for transporting a substrate to be processed between the units in the second multi-stage unit section;
A first transfer unit disposed between the first transfer unit and the second transfer unit between the transfer units to transfer the substrate to be processed between the first transfer unit and the second transfer unit;
A third transfer line on the return path which is provided substantially parallel to the second transfer line and transfers the substrate to be processed serially in a substantially horizontal direction in the order of the process flow in one or a series of processing steps;
At least one unloading unit for unloading the substrate to be processed from the third transfer line and at least one for performing predetermined processing on the substrate to be processed are provided at the end of the third transfer line. A third multi-stage unit section in which the processing units are stacked in multiple stages,
Third transport means for transporting the substrate to be processed between the units in the third multi-stage unit section;
An extension of the third transfer line is provided substantially in parallel with the first transfer line, and transfers a substrate to be processed in a process flow sequence serially in a substantially horizontal direction in one or a series of processing steps. A fourth transfer line;
At least one loading unit, which is provided at the start end of the fourth transfer line, for carrying the substrate to be processed into the fourth transfer line, and at least one for performing predetermined processing on the substrate to be processed. A fourth multi-stage unit portion formed by stacking and arranging multiple processing units in multiple stages;
A fourth transfer means for transferring a substrate to be processed between the units in the fourth multi-stage unit section;
A second transfer unit disposed between the transfer means for transferring the substrate to be processed between the third transfer means and the fourth transfer means;
A processing system having first and second passages respectively provided under the first and second transfer sections so that a person can traverse the system. The processing system of claim 4, wherein the first passage and the second passage are arranged substantially in a straight line in a direction across the system. At least one unloading unit provided at the end of the second transfer line for unloading the substrate to be processed from the second transfer line and at least one for performing a predetermined process on the substrate to be processed A fifth multi-stage unit portion formed by laminating and arranging the processing units in multiple stages,
At least one unloading unit for carrying in a substrate to be processed into the third transfer line and at least one for performing a predetermined process on the substrate to be processed, which is provided at the start end of the third transfer line. A sixth multi-stage unit portion formed by stacking and arranging multiple processing units in multiple stages;
6. A fifth transport unit for transporting a substrate to be processed between each unit in the fifth multi-stage unit section and each unit in the sixth multi-stage unit section. 6. The processing system described in. A sixth for loading a substrate to be processed into another processing system adjacent to the terminal end of the second transfer line and the starting end of the third transfer line, or for discharging the substrate to be processed from the other processing system. Conveying means,
The process according to claim 6, further comprising: a third transfer unit disposed between the fifth transfer unit and the sixth transfer unit to transfer the substrate to be processed between the transfer unit and the transfer unit. system. Provided between a cassette stage on which one or a plurality of cassettes for storing substrates to be processed in multiple stages are placed, and a start end of the first transfer line and a terminal end of the fourth transfer line; A substrate to be processed is taken out from any of the cassettes on the cassette stage and loaded into the first transfer line, and a substrate to be processed is unloaded from the fourth transfer line and placed on the cassette stage. The processing system according to any one of claims 2 to 7, further comprising a seventh transport unit for accommodating the cassette in any one of the cassettes. In the horizontal plane, the transport means supports a substrate to be processed on the swivel transport body, a swivel transport body that can swing up and down in the vertical direction, a swivel transport body that can swivel around a vertical axis on the lift transport body The processing system according to any one of claims 1 to 8, further comprising a transfer arm that is extendable in the front-rear direction. At least one of the transfer lines for transferring a substrate to be processed on the transfer line, and a transfer path formed by laying a transfer body for transferring the substrate to be processed substantially horizontally along the transfer line. The processing system according to claim 1, further comprising a conveyance driving unit that drives the conveyance body. The processing system according to claim 10, further comprising a liquid processing unit that performs a desired liquid processing on the substrate to be processed on the transport path. The processing system according to any one of claims 1 to 11, wherein the processing unit is a heat treatment unit for performing a desired thermal process on a substrate to be processed in association with a process on the transfer line. The transfer unit includes a support plate for placing the substrate to be processed in units of one piece, and a plurality of support pins provided discretely on the support plate to support the substrate substantially horizontally at the tip of the pin. The processing system according to any one of claims 1 to 12. At least one processing unit for performing a predetermined process on the substrate to be processed is provided on top of or below the transfer unit, and the process unit can be accessed by at least one transfer means that can access the transfer unit. The processing system according to any one of claims 1 to 13. The processing system according to claim 14, wherein the processing unit provided so as to overlap the transfer unit includes a substrate temperature adjusting unit for adjusting the temperature of the substrate to be processed to be constant. A buffer unit for temporarily holding and storing the substrate to be processed is provided on or below the transfer unit, and the buffer unit can be accessed by at least one transfer means that can access the transfer unit. The processing system according to any one of claims 1 to 15. The processing system according to any one of claims 1 to 16, wherein a display unit is provided in the vicinity of an entrance of the passage to simultaneously notify the location of the passage and the situation in the system. The processing system according to claim 1, wherein the passage is always open.

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