JP2004359834A - Stain resistance imparting agent and stain resistant article using the same - Google Patents
Stain resistance imparting agent and stain resistant article using the same Download PDFInfo
- Publication number
- JP2004359834A JP2004359834A JP2003160411A JP2003160411A JP2004359834A JP 2004359834 A JP2004359834 A JP 2004359834A JP 2003160411 A JP2003160411 A JP 2003160411A JP 2003160411 A JP2003160411 A JP 2003160411A JP 2004359834 A JP2004359834 A JP 2004359834A
- Authority
- JP
- Japan
- Prior art keywords
- group
- meth
- stain resistance
- imparting agent
- stain
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229910052809 inorganic oxide Inorganic materials 0.000 claims abstract description 74
- 239000010419 fine particle Substances 0.000 claims abstract description 69
- 238000000576 coating method Methods 0.000 claims abstract description 65
- 239000011248 coating agent Substances 0.000 claims abstract description 60
- 239000003795 chemical substances by application Substances 0.000 claims abstract description 56
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims abstract description 51
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 45
- 239000000203 mixture Substances 0.000 claims abstract description 36
- 125000003647 acryloyl group Chemical group O=C([*])C([H])=C([H])[H] 0.000 claims abstract description 29
- 239000005871 repellent Substances 0.000 claims abstract description 27
- PHYFQTYBJUILEZ-IUPFWZBJSA-N triolein Chemical compound CCCCCCCC\C=C/CCCCCCCC(=O)OCC(OC(=O)CCCCCCC\C=C/CCCCCCCC)COC(=O)CCCCCCC\C=C/CCCCCCCC PHYFQTYBJUILEZ-IUPFWZBJSA-N 0.000 claims abstract description 12
- YYGNTYWPHWGJRM-UHFFFAOYSA-N (6E,10E,14E,18E)-2,6,10,15,19,23-hexamethyltetracosa-2,6,10,14,18,22-hexaene Chemical compound CC(C)=CCCC(C)=CCCC(C)=CCCC=C(C)CCC=C(C)CCC=C(C)C YYGNTYWPHWGJRM-UHFFFAOYSA-N 0.000 claims abstract description 11
- WRIDQFICGBMAFQ-UHFFFAOYSA-N (E)-8-Octadecenoic acid Natural products CCCCCCCCCC=CCCCCCCC(O)=O WRIDQFICGBMAFQ-UHFFFAOYSA-N 0.000 claims abstract description 11
- LQJBNNIYVWPHFW-UHFFFAOYSA-N 20:1omega9c fatty acid Natural products CCCCCCCCCCC=CCCCCCCCC(O)=O LQJBNNIYVWPHFW-UHFFFAOYSA-N 0.000 claims abstract description 11
- QSBYPNXLFMSGKH-UHFFFAOYSA-N 9-Heptadecensaeure Natural products CCCCCCCC=CCCCCCCCC(O)=O QSBYPNXLFMSGKH-UHFFFAOYSA-N 0.000 claims abstract description 11
- 239000005642 Oleic acid Substances 0.000 claims abstract description 11
- ZQPPMHVWECSIRJ-UHFFFAOYSA-N Oleic acid Natural products CCCCCCCCC=CCCCCCCCC(O)=O ZQPPMHVWECSIRJ-UHFFFAOYSA-N 0.000 claims abstract description 11
- BHEOSNUKNHRBNM-UHFFFAOYSA-N Tetramethylsqualene Natural products CC(=C)C(C)CCC(=C)C(C)CCC(C)=CCCC=C(C)CCC(C)C(=C)CCC(C)C(C)=C BHEOSNUKNHRBNM-UHFFFAOYSA-N 0.000 claims abstract description 11
- BAECOWNUKCLBPZ-HIUWNOOHSA-N Triolein Natural products O([C@H](OCC(=O)CCCCCCC/C=C\CCCCCCCC)COC(=O)CCCCCCC/C=C\CCCCCCCC)C(=O)CCCCCCC/C=C\CCCCCCCC BAECOWNUKCLBPZ-HIUWNOOHSA-N 0.000 claims abstract description 11
- PHYFQTYBJUILEZ-UHFFFAOYSA-N Trioleoylglycerol Natural products CCCCCCCCC=CCCCCCCCC(=O)OCC(OC(=O)CCCCCCCC=CCCCCCCCC)COC(=O)CCCCCCCC=CCCCCCCCC PHYFQTYBJUILEZ-UHFFFAOYSA-N 0.000 claims abstract description 11
- PRAKJMSDJKAYCZ-UHFFFAOYSA-N dodecahydrosqualene Natural products CC(C)CCCC(C)CCCC(C)CCCCC(C)CCCC(C)CCCC(C)C PRAKJMSDJKAYCZ-UHFFFAOYSA-N 0.000 claims abstract description 11
- QXJSBBXBKPUZAA-UHFFFAOYSA-N isooleic acid Natural products CCCCCCCC=CCCCCCCCCC(O)=O QXJSBBXBKPUZAA-UHFFFAOYSA-N 0.000 claims abstract description 11
- ZQPPMHVWECSIRJ-KTKRTIGZSA-N oleic acid Chemical compound CCCCCCCC\C=C/CCCCCCCC(O)=O ZQPPMHVWECSIRJ-KTKRTIGZSA-N 0.000 claims abstract description 11
- 229940031439 squalene Drugs 0.000 claims abstract description 11
- TUHBEKDERLKLEC-UHFFFAOYSA-N squalene Natural products CC(=CCCC(=CCCC(=CCCC=C(/C)CCC=C(/C)CC=C(C)C)C)C)C TUHBEKDERLKLEC-UHFFFAOYSA-N 0.000 claims abstract description 11
- 229940117972 triolein Drugs 0.000 claims abstract description 11
- 238000007334 copolymerization reaction Methods 0.000 claims abstract description 9
- 229960002969 oleic acid Drugs 0.000 claims abstract description 9
- 229920006243 acrylic copolymer Polymers 0.000 claims abstract description 7
- 239000002131 composite material Substances 0.000 claims abstract description 6
- -1 acrylate compound Chemical class 0.000 claims description 47
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical group O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 25
- 229920001577 copolymer Polymers 0.000 claims description 22
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 20
- 239000011347 resin Substances 0.000 claims description 9
- 229920005989 resin Polymers 0.000 claims description 9
- 229920001515 polyalkylene glycol Polymers 0.000 claims description 8
- 239000003999 initiator Substances 0.000 claims description 7
- 125000004432 carbon atom Chemical group C* 0.000 claims description 6
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical group OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 claims description 5
- 125000002843 carboxylic acid group Chemical group 0.000 claims description 5
- 239000008119 colloidal silica Substances 0.000 claims description 5
- 125000003827 glycol group Chemical group 0.000 claims description 5
- 150000004812 organic fluorine compounds Chemical group 0.000 claims description 4
- 125000000962 organic group Chemical group 0.000 claims description 4
- 150000003839 salts Chemical class 0.000 claims description 4
- 125000005373 siloxane group Chemical group [SiH2](O*)* 0.000 claims description 4
- 125000000542 sulfonic acid group Chemical group 0.000 claims description 4
- 125000000217 alkyl group Chemical group 0.000 claims description 3
- 230000001678 irradiating effect Effects 0.000 claims description 3
- 229910052751 metal Inorganic materials 0.000 claims description 3
- 239000002184 metal Substances 0.000 claims description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 2
- 125000002947 alkylene group Chemical group 0.000 claims description 2
- 229910052799 carbon Inorganic materials 0.000 claims description 2
- 125000005592 polycycloalkyl group Polymers 0.000 claims description 2
- 239000011342 resin composition Substances 0.000 claims 2
- 239000000919 ceramic Substances 0.000 claims 1
- 239000011521 glass Substances 0.000 claims 1
- 210000002374 sebum Anatomy 0.000 abstract description 26
- 230000000694 effects Effects 0.000 abstract description 7
- 229910052710 silicon Inorganic materials 0.000 abstract description 4
- 230000003287 optical effect Effects 0.000 abstract description 3
- 150000002894 organic compounds Chemical class 0.000 abstract description 3
- 239000010703 silicon Substances 0.000 abstract description 3
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 abstract description 2
- 229910052731 fluorine Inorganic materials 0.000 abstract description 2
- 239000011737 fluorine Substances 0.000 abstract description 2
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 51
- 238000006243 chemical reaction Methods 0.000 description 47
- 239000000178 monomer Substances 0.000 description 42
- 238000000034 method Methods 0.000 description 35
- 239000006087 Silane Coupling Agent Substances 0.000 description 33
- 125000003396 thiol group Chemical group [H]S* 0.000 description 30
- 239000002904 solvent Substances 0.000 description 29
- 229920000642 polymer Polymers 0.000 description 27
- 150000001875 compounds Chemical class 0.000 description 26
- WYGWHHGCAGTUCH-ISLYRVAYSA-N V-65 Substances CC(C)CC(C)(C#N)\N=N\C(C)(C#N)CC(C)C WYGWHHGCAGTUCH-ISLYRVAYSA-N 0.000 description 25
- 125000003700 epoxy group Chemical group 0.000 description 22
- 238000006116 polymerization reaction Methods 0.000 description 20
- 239000007787 solid Substances 0.000 description 19
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 18
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 17
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 17
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 15
- 125000000524 functional group Chemical group 0.000 description 15
- 125000005370 alkoxysilyl group Chemical group 0.000 description 13
- 150000003254 radicals Chemical class 0.000 description 13
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 12
- 239000000126 substance Substances 0.000 description 12
- 238000005299 abrasion Methods 0.000 description 11
- 239000003054 catalyst Substances 0.000 description 11
- 239000003960 organic solvent Substances 0.000 description 11
- 230000015572 biosynthetic process Effects 0.000 description 10
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 9
- 230000000704 physical effect Effects 0.000 description 9
- 238000003756 stirring Methods 0.000 description 9
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 8
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 8
- ZXEKIIBDNHEJCQ-UHFFFAOYSA-N isobutanol Chemical compound CC(C)CO ZXEKIIBDNHEJCQ-UHFFFAOYSA-N 0.000 description 8
- 239000000463 material Substances 0.000 description 8
- 229910052757 nitrogen Inorganic materials 0.000 description 8
- 238000010526 radical polymerization reaction Methods 0.000 description 8
- 238000003786 synthesis reaction Methods 0.000 description 8
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 7
- 238000006482 condensation reaction Methods 0.000 description 7
- 238000004519 manufacturing process Methods 0.000 description 7
- 238000002156 mixing Methods 0.000 description 7
- HMZGPNHSPWNGEP-UHFFFAOYSA-N octadecyl 2-methylprop-2-enoate Chemical compound CCCCCCCCCCCCCCCCCCOC(=O)C(C)=C HMZGPNHSPWNGEP-UHFFFAOYSA-N 0.000 description 7
- 229920003023 plastic Polymers 0.000 description 7
- 239000004033 plastic Substances 0.000 description 7
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 7
- 239000007870 radical polymerization initiator Substances 0.000 description 7
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 7
- 239000000377 silicon dioxide Substances 0.000 description 7
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 6
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 6
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 6
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 6
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 6
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical compound OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 description 6
- 239000003153 chemical reaction reagent Substances 0.000 description 6
- 238000006460 hydrolysis reaction Methods 0.000 description 6
- 229920001223 polyethylene glycol Polymers 0.000 description 6
- TXDNPSYEJHXKMK-UHFFFAOYSA-N sulfanylsilane Chemical group S[SiH3] TXDNPSYEJHXKMK-UHFFFAOYSA-N 0.000 description 6
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 6
- UUEWCQRISZBELL-UHFFFAOYSA-N 3-trimethoxysilylpropane-1-thiol Chemical compound CO[Si](OC)(OC)CCCS UUEWCQRISZBELL-UHFFFAOYSA-N 0.000 description 5
- 239000002202 Polyethylene glycol Substances 0.000 description 5
- MPIAGWXWVAHQBB-UHFFFAOYSA-N [3-prop-2-enoyloxy-2-[[3-prop-2-enoyloxy-2,2-bis(prop-2-enoyloxymethyl)propoxy]methyl]-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(COC(=O)C=C)(COC(=O)C=C)COCC(COC(=O)C=C)(COC(=O)C=C)COC(=O)C=C MPIAGWXWVAHQBB-UHFFFAOYSA-N 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 5
- 150000002170 ethers Chemical class 0.000 description 5
- 239000003112 inhibitor Substances 0.000 description 5
- 239000003921 oil Substances 0.000 description 5
- NWVVVBRKAWDGAB-UHFFFAOYSA-N p-methoxyphenol Chemical compound COC1=CC=C(O)C=C1 NWVVVBRKAWDGAB-UHFFFAOYSA-N 0.000 description 5
- 229920000139 polyethylene terephthalate Polymers 0.000 description 5
- 239000005020 polyethylene terephthalate Substances 0.000 description 5
- 238000002360 preparation method Methods 0.000 description 5
- 239000011541 reaction mixture Substances 0.000 description 5
- 239000000758 substrate Substances 0.000 description 5
- IMNIMPAHZVJRPE-UHFFFAOYSA-N triethylenediamine Chemical compound C1CN2CCN1CC2 IMNIMPAHZVJRPE-UHFFFAOYSA-N 0.000 description 5
- MUTGBJKUEZFXGO-OLQVQODUSA-N (3as,7ar)-3a,4,5,6,7,7a-hexahydro-2-benzofuran-1,3-dione Chemical compound C1CCC[C@@H]2C(=O)OC(=O)[C@@H]21 MUTGBJKUEZFXGO-OLQVQODUSA-N 0.000 description 4
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 4
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 4
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 4
- FALRKNHUBBKYCC-UHFFFAOYSA-N 2-(chloromethyl)pyridine-3-carbonitrile Chemical compound ClCC1=NC=CC=C1C#N FALRKNHUBBKYCC-UHFFFAOYSA-N 0.000 description 4
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 4
- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 4
- LGRFSURHDFAFJT-UHFFFAOYSA-N Phthalic anhydride Natural products C1=CC=C2C(=O)OC(=O)C2=C1 LGRFSURHDFAFJT-UHFFFAOYSA-N 0.000 description 4
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 4
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 4
- 150000008065 acid anhydrides Chemical class 0.000 description 4
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 4
- 239000002585 base Substances 0.000 description 4
- JHIWVOJDXOSYLW-UHFFFAOYSA-N butyl 2,2-difluorocyclopropane-1-carboxylate Chemical compound CCCCOC(=O)C1CC1(F)F JHIWVOJDXOSYLW-UHFFFAOYSA-N 0.000 description 4
- 238000001035 drying Methods 0.000 description 4
- 238000011156 evaluation Methods 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- 230000007062 hydrolysis Effects 0.000 description 4
- 229920001480 hydrophilic copolymer Polymers 0.000 description 4
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 4
- 229910052753 mercury Inorganic materials 0.000 description 4
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 4
- 238000007086 side reaction Methods 0.000 description 4
- 125000005372 silanol group Chemical group 0.000 description 4
- 229940014800 succinic anhydride Drugs 0.000 description 4
- 238000012360 testing method Methods 0.000 description 4
- WJFKNYWRSNBZNX-UHFFFAOYSA-N 10H-phenothiazine Chemical compound C1=CC=C2NC3=CC=CC=C3SC2=C1 WJFKNYWRSNBZNX-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 3
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 3
- 238000004220 aggregation Methods 0.000 description 3
- 230000002776 aggregation Effects 0.000 description 3
- 150000001298 alcohols Chemical class 0.000 description 3
- 239000003513 alkali Substances 0.000 description 3
- 150000001733 carboxylic acid esters Chemical class 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- 238000004132 cross linking Methods 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 125000005442 diisocyanate group Chemical group 0.000 description 3
- 239000003759 ester based solvent Substances 0.000 description 3
- 230000001747 exhibiting effect Effects 0.000 description 3
- 238000001879 gelation Methods 0.000 description 3
- 150000002576 ketones Chemical class 0.000 description 3
- 229950000688 phenothiazine Drugs 0.000 description 3
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 3
- 229920000515 polycarbonate Polymers 0.000 description 3
- 239000004417 polycarbonate Substances 0.000 description 3
- 239000003505 polymerization initiator Substances 0.000 description 3
- 239000004926 polymethyl methacrylate Substances 0.000 description 3
- 229920001451 polypropylene glycol Polymers 0.000 description 3
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 3
- 210000003813 thumb Anatomy 0.000 description 3
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 3
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 3
- NQUXRXBRYDZZDL-UHFFFAOYSA-N 1-(2-prop-2-enoyloxyethyl)cyclohexane-1,2-dicarboxylic acid Chemical compound OC(=O)C1CCCCC1(CCOC(=O)C=C)C(O)=O NQUXRXBRYDZZDL-UHFFFAOYSA-N 0.000 description 2
- RVHOBHMAPRVOLO-UHFFFAOYSA-N 2-ethylbutanedioic acid Chemical compound CCC(C(O)=O)CC(O)=O RVHOBHMAPRVOLO-UHFFFAOYSA-N 0.000 description 2
- VVBLNCFGVYUYGU-UHFFFAOYSA-N 4,4'-Bis(dimethylamino)benzophenone Chemical compound C1=CC(N(C)C)=CC=C1C(=O)C1=CC=C(N(C)C)C=C1 VVBLNCFGVYUYGU-UHFFFAOYSA-N 0.000 description 2
- UPMLOUAZCHDJJD-UHFFFAOYSA-N 4,4'-Diphenylmethane Diisocyanate Chemical compound C1=CC(N=C=O)=CC=C1CC1=CC=C(N=C=O)C=C1 UPMLOUAZCHDJJD-UHFFFAOYSA-N 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- 229920002799 BoPET Polymers 0.000 description 2
- 239000004215 Carbon black (E152) Substances 0.000 description 2
- 229920000298 Cellophane Polymers 0.000 description 2
- 229920002284 Cellulose triacetate Polymers 0.000 description 2
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical class S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 2
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 2
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 2
- 239000005977 Ethylene Substances 0.000 description 2
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 2
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 2
- 239000005057 Hexamethylene diisocyanate Substances 0.000 description 2
- 239000005058 Isophorone diisocyanate Substances 0.000 description 2
- 238000006845 Michael addition reaction Methods 0.000 description 2
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 2
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 2
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- NNLVGZFZQQXQNW-ADJNRHBOSA-N [(2r,3r,4s,5r,6s)-4,5-diacetyloxy-3-[(2s,3r,4s,5r,6r)-3,4,5-triacetyloxy-6-(acetyloxymethyl)oxan-2-yl]oxy-6-[(2r,3r,4s,5r,6s)-4,5,6-triacetyloxy-2-(acetyloxymethyl)oxan-3-yl]oxyoxan-2-yl]methyl acetate Chemical compound O([C@@H]1O[C@@H]([C@H]([C@H](OC(C)=O)[C@H]1OC(C)=O)O[C@H]1[C@@H]([C@@H](OC(C)=O)[C@H](OC(C)=O)[C@@H](COC(C)=O)O1)OC(C)=O)COC(=O)C)[C@@H]1[C@@H](COC(C)=O)O[C@@H](OC(C)=O)[C@H](OC(C)=O)[C@H]1OC(C)=O NNLVGZFZQQXQNW-ADJNRHBOSA-N 0.000 description 2
- UKLDJPRMSDWDSL-UHFFFAOYSA-L [dibutyl(dodecanoyloxy)stannyl] dodecanoate Chemical compound CCCCCCCCCCCC(=O)O[Sn](CCCC)(CCCC)OC(=O)CCCCCCCCCCC UKLDJPRMSDWDSL-UHFFFAOYSA-L 0.000 description 2
- YRKCREAYFQTBPV-UHFFFAOYSA-N acetylacetone Chemical compound CC(=O)CC(C)=O YRKCREAYFQTBPV-UHFFFAOYSA-N 0.000 description 2
- 230000002378 acidificating effect Effects 0.000 description 2
- 229920000122 acrylonitrile butadiene styrene Polymers 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- 230000003373 anti-fouling effect Effects 0.000 description 2
- 239000003963 antioxidant agent Substances 0.000 description 2
- 239000012298 atmosphere Substances 0.000 description 2
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 2
- 239000012965 benzophenone Substances 0.000 description 2
- KXHPPCXNWTUNSB-UHFFFAOYSA-M benzyl(trimethyl)azanium;chloride Chemical compound [Cl-].C[N+](C)(C)CC1=CC=CC=C1 KXHPPCXNWTUNSB-UHFFFAOYSA-M 0.000 description 2
- XUPYJHCZDLZNFP-UHFFFAOYSA-N butyl butanoate Chemical compound CCCCOC(=O)CCC XUPYJHCZDLZNFP-UHFFFAOYSA-N 0.000 description 2
- 239000012986 chain transfer agent Substances 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 239000007810 chemical reaction solvent Substances 0.000 description 2
- 239000000084 colloidal system Substances 0.000 description 2
- 238000013329 compounding Methods 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 239000012973 diazabicyclooctane Substances 0.000 description 2
- XXBDWLFCJWSEKW-UHFFFAOYSA-N dimethylbenzylamine Chemical compound CN(C)CC1=CC=CC=C1 XXBDWLFCJWSEKW-UHFFFAOYSA-N 0.000 description 2
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical group [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 2
- 239000002612 dispersion medium Substances 0.000 description 2
- 239000004210 ether based solvent Substances 0.000 description 2
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 2
- RRAMGCGOFNQTLD-UHFFFAOYSA-N hexamethylene diisocyanate Chemical compound O=C=NCCCCCCN=C=O RRAMGCGOFNQTLD-UHFFFAOYSA-N 0.000 description 2
- 229930195733 hydrocarbon Natural products 0.000 description 2
- 150000002430 hydrocarbons Chemical class 0.000 description 2
- 230000003301 hydrolyzing effect Effects 0.000 description 2
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 2
- 230000001771 impaired effect Effects 0.000 description 2
- NIMLQBUJDJZYEJ-UHFFFAOYSA-N isophorone diisocyanate Chemical compound CC1(C)CC(N=C=O)CC(C)(CN=C=O)C1 NIMLQBUJDJZYEJ-UHFFFAOYSA-N 0.000 description 2
- 239000005453 ketone based solvent Substances 0.000 description 2
- 239000004611 light stabiliser Substances 0.000 description 2
- 125000005647 linker group Chemical group 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 229910001947 lithium oxide Inorganic materials 0.000 description 2
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 2
- 239000011976 maleic acid Substances 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 239000012046 mixed solvent Substances 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 125000005010 perfluoroalkyl group Chemical group 0.000 description 2
- 229920000728 polyester Polymers 0.000 description 2
- 229920001296 polysiloxane Polymers 0.000 description 2
- 239000011164 primary particle Substances 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- YGSDEFSMJLZEOE-UHFFFAOYSA-N salicylic acid Chemical compound OC(=O)C1=CC=CC=C1O YGSDEFSMJLZEOE-UHFFFAOYSA-N 0.000 description 2
- SCPYDCQAZCOKTP-UHFFFAOYSA-N silanol Chemical group [SiH3]O SCPYDCQAZCOKTP-UHFFFAOYSA-N 0.000 description 2
- 125000006850 spacer group Chemical group 0.000 description 2
- 229910052717 sulfur Inorganic materials 0.000 description 2
- 125000000101 thioether group Chemical group 0.000 description 2
- 229910052718 tin Inorganic materials 0.000 description 2
- 238000006276 transfer reaction Methods 0.000 description 2
- 125000005369 trialkoxysilyl group Chemical group 0.000 description 2
- IMFACGCPASFAPR-UHFFFAOYSA-N tributylamine Chemical compound CCCCN(CCCC)CCCC IMFACGCPASFAPR-UHFFFAOYSA-N 0.000 description 2
- FRGPKMWIYVTFIQ-UHFFFAOYSA-N triethoxy(3-isocyanatopropyl)silane Chemical compound CCO[Si](OCC)(OCC)CCCN=C=O FRGPKMWIYVTFIQ-UHFFFAOYSA-N 0.000 description 2
- 239000008096 xylene Substances 0.000 description 2
- QNODIIQQMGDSEF-UHFFFAOYSA-N (1-hydroxycyclohexyl)-phenylmethanone Chemical compound C=1C=CC=CC=1C(=O)C1(O)CCCCC1 QNODIIQQMGDSEF-UHFFFAOYSA-N 0.000 description 1
- 229920002818 (Hydroxyethyl)methacrylate Polymers 0.000 description 1
- KUGVQHLGVGPAIZ-UHFFFAOYSA-N 1,1,1,2,3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10-henicosafluorodecan-2-yl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC(F)(C(F)(F)F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F KUGVQHLGVGPAIZ-UHFFFAOYSA-N 0.000 description 1
- LZDKZFUFMNSQCJ-UHFFFAOYSA-N 1,2-diethoxyethane Chemical compound CCOCCOCC LZDKZFUFMNSQCJ-UHFFFAOYSA-N 0.000 description 1
- MSAHTMIQULFMRG-UHFFFAOYSA-N 1,2-diphenyl-2-propan-2-yloxyethanone Chemical compound C=1C=CC=CC=1C(OC(C)C)C(=O)C1=CC=CC=C1 MSAHTMIQULFMRG-UHFFFAOYSA-N 0.000 description 1
- DKEGCUDAFWNSSO-UHFFFAOYSA-N 1,8-dibromooctane Chemical compound BrCCCCCCCCBr DKEGCUDAFWNSSO-UHFFFAOYSA-N 0.000 description 1
- NFDXQGNDWIPXQL-UHFFFAOYSA-N 1-cyclooctyldiazocane Chemical compound C1CCCCCCC1N1NCCCCCC1 NFDXQGNDWIPXQL-UHFFFAOYSA-N 0.000 description 1
- 239000012956 1-hydroxycyclohexylphenyl-ketone Substances 0.000 description 1
- HFZLSTDPRQSZCQ-UHFFFAOYSA-N 1-pyrrolidin-3-ylpyrrolidine Chemical compound C1CCCN1C1CNCC1 HFZLSTDPRQSZCQ-UHFFFAOYSA-N 0.000 description 1
- PIZHFBODNLEQBL-UHFFFAOYSA-N 2,2-diethoxy-1-phenylethanone Chemical compound CCOC(OCC)C(=O)C1=CC=CC=C1 PIZHFBODNLEQBL-UHFFFAOYSA-N 0.000 description 1
- BTJPUDCSZVCXFQ-UHFFFAOYSA-N 2,4-diethylthioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(CC)=CC(CC)=C3SC2=C1 BTJPUDCSZVCXFQ-UHFFFAOYSA-N 0.000 description 1
- YAAYJRKCGZQWCB-UHFFFAOYSA-N 2-(1-cyanopropyldiazenyl)butanenitrile Chemical compound CCC(C#N)N=NC(CC)C#N YAAYJRKCGZQWCB-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- PFHOSZAOXCYAGJ-UHFFFAOYSA-N 2-[(2-cyano-4-methoxy-4-methylpentan-2-yl)diazenyl]-4-methoxy-2,4-dimethylpentanenitrile Chemical compound COC(C)(C)CC(C)(C#N)N=NC(C)(C#N)CC(C)(C)OC PFHOSZAOXCYAGJ-UHFFFAOYSA-N 0.000 description 1
- WYGWHHGCAGTUCH-UHFFFAOYSA-N 2-[(2-cyano-4-methylpentan-2-yl)diazenyl]-2,4-dimethylpentanenitrile Chemical compound CC(C)CC(C)(C#N)N=NC(C)(C#N)CC(C)C WYGWHHGCAGTUCH-UHFFFAOYSA-N 0.000 description 1
- WMYINDVYGQKYMI-UHFFFAOYSA-N 2-[2,2-bis(hydroxymethyl)butoxymethyl]-2-ethylpropane-1,3-diol Chemical compound CCC(CO)(CO)COCC(CC)(CO)CO WMYINDVYGQKYMI-UHFFFAOYSA-N 0.000 description 1
- FDSUVTROAWLVJA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol;prop-2-enoic acid Chemical compound OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OCC(CO)(CO)COCC(CO)(CO)CO FDSUVTROAWLVJA-UHFFFAOYSA-N 0.000 description 1
- ZCDADJXRUCOCJE-UHFFFAOYSA-N 2-chlorothioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(Cl)=CC=C3SC2=C1 ZCDADJXRUCOCJE-UHFFFAOYSA-N 0.000 description 1
- KMNCBSZOIQAUFX-UHFFFAOYSA-N 2-ethoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OCC)C(=O)C1=CC=CC=C1 KMNCBSZOIQAUFX-UHFFFAOYSA-N 0.000 description 1
- SVONRAPFKPVNKG-UHFFFAOYSA-N 2-ethoxyethyl acetate Chemical compound CCOCCOC(C)=O SVONRAPFKPVNKG-UHFFFAOYSA-N 0.000 description 1
- XMLYCEVDHLAQEL-UHFFFAOYSA-N 2-hydroxy-2-methyl-1-phenylpropan-1-one Chemical compound CC(C)(O)C(=O)C1=CC=CC=C1 XMLYCEVDHLAQEL-UHFFFAOYSA-N 0.000 description 1
- OMIGHNLMNHATMP-UHFFFAOYSA-N 2-hydroxyethyl prop-2-enoate Chemical compound OCCOC(=O)C=C OMIGHNLMNHATMP-UHFFFAOYSA-N 0.000 description 1
- BQZJOQXSCSZQPS-UHFFFAOYSA-N 2-methoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OC)C(=O)C1=CC=CC=C1 BQZJOQXSCSZQPS-UHFFFAOYSA-N 0.000 description 1
- LWRBVKNFOYUCNP-UHFFFAOYSA-N 2-methyl-1-(4-methylsulfanylphenyl)-2-morpholin-4-ylpropan-1-one Chemical compound C1=CC(SC)=CC=C1C(=O)C(C)(C)N1CCOCC1 LWRBVKNFOYUCNP-UHFFFAOYSA-N 0.000 description 1
- AGBXYHCHUYARJY-UHFFFAOYSA-N 2-phenylethenesulfonic acid Chemical compound OS(=O)(=O)C=CC1=CC=CC=C1 AGBXYHCHUYARJY-UHFFFAOYSA-N 0.000 description 1
- LOSLJXKHQKRRFN-UHFFFAOYSA-N 2-trimethoxysilylethanethiol Chemical compound CO[Si](OC)(OC)CCS LOSLJXKHQKRRFN-UHFFFAOYSA-N 0.000 description 1
- PFHKYDQRASKEHL-UHFFFAOYSA-N 2-trimethoxysilylethyl octadecanoate Chemical compound C(CCCCCCCCCCCCCCCCC)(=O)OCC[Si](OC)(OC)OC PFHKYDQRASKEHL-UHFFFAOYSA-N 0.000 description 1
- FRIBMENBGGCKPD-UHFFFAOYSA-N 3-(2,3-dimethoxyphenyl)prop-2-enal Chemical compound COC1=CC=CC(C=CC=O)=C1OC FRIBMENBGGCKPD-UHFFFAOYSA-N 0.000 description 1
- DWTKNKBWDQHROK-UHFFFAOYSA-N 3-[2-(2-methylprop-2-enoyloxy)ethyl]phthalic acid Chemical compound CC(=C)C(=O)OCCC1=CC=CC(C(O)=O)=C1C(O)=O DWTKNKBWDQHROK-UHFFFAOYSA-N 0.000 description 1
- XBIUWALDKXACEA-UHFFFAOYSA-N 3-[bis(2,4-dioxopentan-3-yl)alumanyl]pentane-2,4-dione Chemical compound CC(=O)C(C(C)=O)[Al](C(C(C)=O)C(C)=O)C(C(C)=O)C(C)=O XBIUWALDKXACEA-UHFFFAOYSA-N 0.000 description 1
- PGTQATJFIXSRAO-UHFFFAOYSA-N 3-diethoxysilylbutane-1-thiol Chemical compound CC(CCS)[SiH](OCC)OCC PGTQATJFIXSRAO-UHFFFAOYSA-N 0.000 description 1
- RQXSILXNXSRNES-UHFFFAOYSA-N 3-dimethoxysilylbutane-1-thiol Chemical compound CC(CCS)[SiH](OC)OC RQXSILXNXSRNES-UHFFFAOYSA-N 0.000 description 1
- GNSFRPWPOGYVLO-UHFFFAOYSA-N 3-hydroxypropyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCCO GNSFRPWPOGYVLO-UHFFFAOYSA-N 0.000 description 1
- QZPSOSOOLFHYRR-UHFFFAOYSA-N 3-hydroxypropyl prop-2-enoate Chemical compound OCCCOC(=O)C=C QZPSOSOOLFHYRR-UHFFFAOYSA-N 0.000 description 1
- FMGBDYLOANULLW-UHFFFAOYSA-N 3-isocyanatopropyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)CCCN=C=O FMGBDYLOANULLW-UHFFFAOYSA-N 0.000 description 1
- ARXVXVOLXMVYIT-UHFFFAOYSA-N 3-methylbutyl 2-(dimethylamino)benzoate Chemical compound CC(C)CCOC(=O)C1=CC=CC=C1N(C)C ARXVXVOLXMVYIT-UHFFFAOYSA-N 0.000 description 1
- DCQBZYNUSLHVJC-UHFFFAOYSA-N 3-triethoxysilylpropane-1-thiol Chemical compound CCO[Si](OCC)(OCC)CCCS DCQBZYNUSLHVJC-UHFFFAOYSA-N 0.000 description 1
- 239000004342 Benzoyl peroxide Substances 0.000 description 1
- OMPJBNCRMGITSC-UHFFFAOYSA-N Benzoylperoxide Chemical compound C=1C=CC=CC=1C(=O)OOC(=O)C1=CC=CC=C1 OMPJBNCRMGITSC-UHFFFAOYSA-N 0.000 description 1
- CPELXLSAUQHCOX-UHFFFAOYSA-M Bromide Chemical compound [Br-] CPELXLSAUQHCOX-UHFFFAOYSA-M 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- KNFKIYVQPVDSKE-UHFFFAOYSA-N CCCCO.CCCCO.CCCCO.OB(O)O Chemical compound CCCCO.CCCCO.CCCCO.OB(O)O KNFKIYVQPVDSKE-UHFFFAOYSA-N 0.000 description 1
- GAWIXWVDTYZWAW-UHFFFAOYSA-N C[CH]O Chemical group C[CH]O GAWIXWVDTYZWAW-UHFFFAOYSA-N 0.000 description 1
- 229910052684 Cerium Inorganic materials 0.000 description 1
- 229920001651 Cyanoacrylate Polymers 0.000 description 1
- SNRUBQQJIBEYMU-UHFFFAOYSA-N Dodecane Natural products CCCCCCCCCCCC SNRUBQQJIBEYMU-UHFFFAOYSA-N 0.000 description 1
- JIGUQPWFLRLWPJ-UHFFFAOYSA-N Ethyl acrylate Chemical compound CCOC(=O)C=C JIGUQPWFLRLWPJ-UHFFFAOYSA-N 0.000 description 1
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 1
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 description 1
- RRHGJUQNOFWUDK-UHFFFAOYSA-N Isoprene Chemical group CC(=C)C=C RRHGJUQNOFWUDK-UHFFFAOYSA-N 0.000 description 1
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 1
- MWCLLHOVUTZFKS-UHFFFAOYSA-N Methyl cyanoacrylate Chemical compound COC(=O)C(=C)C#N MWCLLHOVUTZFKS-UHFFFAOYSA-N 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical compound CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical group [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 1
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- HVVWZTWDBSEWIH-UHFFFAOYSA-N [2-(hydroxymethyl)-3-prop-2-enoyloxy-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(CO)(COC(=O)C=C)COC(=O)C=C HVVWZTWDBSEWIH-UHFFFAOYSA-N 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- KXKVLQRXCPHEJC-UHFFFAOYSA-N acetic acid trimethyl ester Natural products COC(C)=O KXKVLQRXCPHEJC-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 239000003377 acid catalyst Substances 0.000 description 1
- 230000006978 adaptation Effects 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 238000007754 air knife coating Methods 0.000 description 1
- 239000005456 alcohol based solvent Substances 0.000 description 1
- 230000001476 alcoholic effect Effects 0.000 description 1
- 125000002723 alicyclic group Chemical group 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- XYLMUPLGERFSHI-UHFFFAOYSA-N alpha-Methylstyrene Chemical compound CC(=C)C1=CC=CC=C1 XYLMUPLGERFSHI-UHFFFAOYSA-N 0.000 description 1
- CSDREXVUYHZDNP-UHFFFAOYSA-N alumanylidynesilicon Chemical compound [Al].[Si] CSDREXVUYHZDNP-UHFFFAOYSA-N 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 239000002519 antifouling agent Substances 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 239000003849 aromatic solvent Substances 0.000 description 1
- 125000002511 behenyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- QRUDEWIWKLJBPS-UHFFFAOYSA-N benzotriazole Chemical compound C1=CC=C2N[N][N]C2=C1 QRUDEWIWKLJBPS-UHFFFAOYSA-N 0.000 description 1
- 239000012964 benzotriazole Substances 0.000 description 1
- 235000019400 benzoyl peroxide Nutrition 0.000 description 1
- MQDJYUACMFCOFT-UHFFFAOYSA-N bis[2-(1-hydroxycyclohexyl)phenyl]methanone Chemical compound C=1C=CC=C(C(=O)C=2C(=CC=CC=2)C2(O)CCCCC2)C=1C1(O)CCCCC1 MQDJYUACMFCOFT-UHFFFAOYSA-N 0.000 description 1
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 1
- 239000004327 boric acid Substances 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229920002301 cellulose acetate Polymers 0.000 description 1
- ZMIGMASIKSOYAM-UHFFFAOYSA-N cerium Chemical compound [Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce] ZMIGMASIKSOYAM-UHFFFAOYSA-N 0.000 description 1
- 229910000420 cerium oxide Inorganic materials 0.000 description 1
- 239000007809 chemical reaction catalyst Substances 0.000 description 1
- 238000004581 coalescence Methods 0.000 description 1
- 239000008199 coating composition Substances 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- GTBGXKPAKVYEKJ-UHFFFAOYSA-N decyl 2-methylprop-2-enoate Chemical compound CCCCCCCCCCOC(=O)C(C)=C GTBGXKPAKVYEKJ-UHFFFAOYSA-N 0.000 description 1
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- LSXWFXONGKSEMY-UHFFFAOYSA-N di-tert-butyl peroxide Chemical compound CC(C)(C)OOC(C)(C)C LSXWFXONGKSEMY-UHFFFAOYSA-N 0.000 description 1
- AYOHIQLKSOJJQH-UHFFFAOYSA-N dibutyltin Chemical compound CCCC[Sn]CCCC AYOHIQLKSOJJQH-UHFFFAOYSA-N 0.000 description 1
- 239000012975 dibutyltin dilaurate Substances 0.000 description 1
- SBZXBUIDTXKZTM-UHFFFAOYSA-N diglyme Chemical compound COCCOCCOC SBZXBUIDTXKZTM-UHFFFAOYSA-N 0.000 description 1
- 239000004205 dimethyl polysiloxane Substances 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- 239000012153 distilled water Substances 0.000 description 1
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- UHESRSKEBRADOO-UHFFFAOYSA-N ethyl carbamate;prop-2-enoic acid Chemical compound OC(=O)C=C.CCOC(N)=O UHESRSKEBRADOO-UHFFFAOYSA-N 0.000 description 1
- 230000001815 facial effect Effects 0.000 description 1
- 210000003811 finger Anatomy 0.000 description 1
- 239000001530 fumaric acid Substances 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 235000011187 glycerol Nutrition 0.000 description 1
- VOZRXNHHFUQHIL-UHFFFAOYSA-N glycidyl methacrylate Chemical compound CC(=C)C(=O)OCC1CO1 VOZRXNHHFUQHIL-UHFFFAOYSA-N 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 238000007756 gravure coating Methods 0.000 description 1
- 125000000623 heterocyclic group Chemical group 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-M hexanoate Chemical compound CCCCCC([O-])=O FUZZWVXGSFPDMH-UHFFFAOYSA-M 0.000 description 1
- 229920001519 homopolymer Polymers 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 1
- 229910000041 hydrogen chloride Inorganic materials 0.000 description 1
- 125000001841 imino group Chemical group [H]N=* 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- RHZWSUVWRRXEJF-UHFFFAOYSA-N indium tin Chemical compound [In].[Sn] RHZWSUVWRRXEJF-UHFFFAOYSA-N 0.000 description 1
- 239000008235 industrial water Substances 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 description 1
- 125000000468 ketone group Chemical group 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 239000011133 lead Substances 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- PAZHGORSDKKUPI-UHFFFAOYSA-N lithium metasilicate Chemical compound [Li+].[Li+].[O-][Si]([O-])=O PAZHGORSDKKUPI-UHFFFAOYSA-N 0.000 description 1
- FUJCRWPEOMXPAD-UHFFFAOYSA-N lithium oxide Chemical compound [Li+].[Li+].[O-2] FUJCRWPEOMXPAD-UHFFFAOYSA-N 0.000 description 1
- 229910052912 lithium silicate Inorganic materials 0.000 description 1
- 239000003550 marker Substances 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 239000011859 microparticle Substances 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- BQJCRHHNABKAKU-KBQPJGBKSA-N morphine Chemical compound O([C@H]1[C@H](C=C[C@H]23)O)C4=C5[C@@]12CCN(C)[C@@H]3CC5=CC=C4O BQJCRHHNABKAKU-KBQPJGBKSA-N 0.000 description 1
- PSHKMPUSSFXUIA-UHFFFAOYSA-N n,n-dimethylpyridin-2-amine Chemical compound CN(C)C1=CC=CC=N1 PSHKMPUSSFXUIA-UHFFFAOYSA-N 0.000 description 1
- YKYONYBAUNKHLG-UHFFFAOYSA-N n-Propyl acetate Natural products CCCOC(C)=O YKYONYBAUNKHLG-UHFFFAOYSA-N 0.000 description 1
- QYZFTMMPKCOTAN-UHFFFAOYSA-N n-[2-(2-hydroxyethylamino)ethyl]-2-[[1-[2-(2-hydroxyethylamino)ethylamino]-2-methyl-1-oxopropan-2-yl]diazenyl]-2-methylpropanamide Chemical compound OCCNCCNC(=O)C(C)(C)N=NC(C)(C)C(=O)NCCNCCO QYZFTMMPKCOTAN-UHFFFAOYSA-N 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 150000001451 organic peroxides Chemical class 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 239000005022 packaging material Substances 0.000 description 1
- FJKROLUGYXJWQN-UHFFFAOYSA-N papa-hydroxy-benzoic acid Natural products OC(=O)C1=CC=C(O)C=C1 FJKROLUGYXJWQN-UHFFFAOYSA-N 0.000 description 1
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 1
- 125000002467 phosphate group Chemical group [H]OP(=O)(O[H])O[*] 0.000 description 1
- WDHYRUBXLGOLKR-UHFFFAOYSA-N phosphoric acid;prop-2-enoic acid Chemical compound OC(=O)C=C.OP(O)(O)=O WDHYRUBXLGOLKR-UHFFFAOYSA-N 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 239000002798 polar solvent Substances 0.000 description 1
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 description 1
- 229920003207 poly(ethylene-2,6-naphthalate) Polymers 0.000 description 1
- 229920001707 polybutylene terephthalate Polymers 0.000 description 1
- 229920006267 polyester film Polymers 0.000 description 1
- 239000011112 polyethylene naphthalate Substances 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- 229920000193 polymethacrylate Polymers 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 229940090181 propyl acetate Drugs 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 230000002940 repellent Effects 0.000 description 1
- 230000001846 repelling effect Effects 0.000 description 1
- 229960004889 salicylic acid Drugs 0.000 description 1
- 230000003678 scratch resistant effect Effects 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- 239000003707 silyl modified polymer Substances 0.000 description 1
- 239000012748 slip agent Substances 0.000 description 1
- 239000008234 soft water Substances 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 125000004079 stearyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 125000004434 sulfur atom Chemical group 0.000 description 1
- 239000002352 surface water Substances 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 125000000383 tetramethylene group Chemical group [H]C([H])([*:1])C([H])([H])C([H])([H])C([H])([H])[*:2] 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 125000005270 trialkylamine group Chemical group 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 239000006097 ultraviolet radiation absorber Substances 0.000 description 1
- NQPDZGIKBAWPEJ-UHFFFAOYSA-N valeric acid Chemical compound CCCCC(O)=O NQPDZGIKBAWPEJ-UHFFFAOYSA-N 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
Landscapes
- Materials Applied To Surfaces To Minimize Adherence Of Mist Or Water (AREA)
- Paints Or Removers (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Macromonomer-Based Addition Polymer (AREA)
Abstract
【解決手段】耐汚染性付与剤から形成された塗膜の鉛筆硬度が5B以上であり、水に対する接触角が80度以上で、オレイン酸、トリオレイン及びスクアレンに対する接触角がいずれも10度以下の耐汚染性付与剤。組成としては、シリコン及びフッ素を含まない撥水性基を有する(メタ)アクリレートを共重合成分として含む(メタ)アクリル系共重合体(A)又はこれと無機酸化物微粒子との複合体を含有する。好ましくは更に活性エネルギー線で硬化可能な(メタ)アクリロイル基を有する有機化合物を含有する。
【効果】卓越した耐指紋汚れ性・耐皮脂汚れ性と同時に、優れた硬度、耐傷つき性、透明性、低カール性等を併せ持つ塗膜を形成することが可能である。耐タッチパネル、デイスプレイ、携帯電話筐体、光デイスクなど幅広い用途に好適に使用することができる。A coating film formed from a stain resistance imparting agent has a pencil hardness of 5B or more, a contact angle with water of 80 ° or more, and a contact angle with oleic acid, triolein and squalene of 10 ° or less. Stain resistance imparting agent. As the composition, it contains a (meth) acrylic copolymer (A) containing a (meth) acrylate having a water-repellent group containing no silicon and fluorine as a copolymerization component or a composite of the (meth) acrylic copolymer and inorganic oxide fine particles. . It preferably further contains an organic compound having a (meth) acryloyl group curable by an active energy ray.
[Effect] It is possible to form a coating film having excellent hardness, scratch resistance, transparency, low curl and the like at the same time as excellent fingerprint stain resistance and sebum stain resistance. It can be suitably used for a wide range of applications such as touch panel resistance, displays, mobile phone housings, and optical disks.
Description
【0001】
【発明の属する技術分野】
本発明は、卓越した耐指紋汚れ性と皮脂汚れ性を有する耐汚染性付与剤及びそれを用いた耐汚染性物品に関する。詳しくは、活性エネルギー線を照射することにより、硬化し、同時に卓越した硬度・耐摩耗性、低カール性、透明性を付与した皮膜を形成する活性エネルギー線硬化性の耐汚染性付与剤及びそれを用いた耐汚染性物品に関する。
【0002】
【従来の技術】
プラスチック製品、例えばポリカーボネート、ポリメチルメタクリレート、ポリエチレンテレフタレート、ポリブチレンテレフタレート、ABS、MS樹脂、AS樹脂などのスチレン系樹脂、塩化ビニル系樹脂、トリアセチルセルロースなどの酢酸セルロース等の樹脂基材は、その軽量性、易加工性、耐衝撃性などが特に優れているので、容器、インストルメントパネル、包装材、各種ハウジング材、光デイスク基板、プラスチックレンズ、液晶デイスプレイやプラズマデイスプレイなどの表示機器の基材等、種々の用途に用いられている。
【0003】
しかしながら、これらプラスチック製品は表面硬度が低いため傷つきやすく、ポリカーボネートやポリエチレンテレフタレートのような透明な樹脂においては、その樹脂が持つ本来の透明性あるいは外観が著しく損なわれるという欠点があり、耐摩耗性を必要とする分野でのプラスチック製品の使用を困難なものとしている。
このため、これらプラスチック製品の表面に耐摩耗性を付与する活性エネルギー線硬化性ハードコート材料(被覆材)が求められている。しかしながら、市販の活性エネルギー線硬化性ハードコート材料の硬化層は表面に指紋や皮脂が付着しやすく、かつその汚れを簡単に除去できない傾向にあり、製品の美観や透明性を損なう原因となる。
【0004】
このような問題点の解決を目指し、表面を低エネルギー性表面にし、指紋や皮脂をはじき、付着しにくくすることで、このような汚れに対する耐性を高める試みは数多くなされている。その技術を大きく分けると、3つの手法に分けられる。
(1)パーフルオロアルキル基を導入し、表面を撥水・撥油化する手法(例えば、特許文献1参照)。
(2)ポリジメチルシロキサン基のような撥水性シリコーン樹脂骨格を導入し、表面を撥水・撥油化する手法(例えば、特許文献2参照)。
(3)表面に微細凹凸をつけ、撥水・撥油性をさらに高めるとともに、接触面積も減らし、より汚れをつきにくくする手法(例えば、特許文献3参照)。
しかしながら、これらの従来の方法では、携帯電話のように顔の皮脂に直接接触する用途、あるいはタッチパネルのように繰り返し指の接触する用途では、依然として付着しやすく、かつ撥水・撥油のため、付着した汚れをはじき、かえって汚れが目立ってしまう、という問題があった。
【0005】
一方、上記の方法とやや異なる発想に基づく技術的流れとしては、以下のような手法が挙げられる。
(4)表面の超親水化により、耐汚れ性を向上させる手法(例えば、特許文献4参照)。
(5)撥水・撥油基とともに特定の親水基を組み合わせ、汚れのふき取り性を改良する方法(例えば、特許文献5〜7参照)。
(6)表面を撥水・親油化することで、指紋・皮脂成分とのなじみを良くし、付着しても目立たなくする手法(例えば、特許文献8参照)。
これらのうち、最後の手法は特に、付着しても目立たなくはなるものの、表面の耐傷つき性が十分に確保できず、ふき取り性の低下(特に繰り返しふき取り性等の耐久性)、や多段コートになることによるコストアップ等の問題をかかえており、抜本的な改良が必要であった。
【特許文献1】特開平10−104403号公報
【特許文献2】特開平10−7986号公報
【特許文献3】特開平10−310455号公報
【特許文献4】特開平9−268280号公報
【特許文献5】特開2000−290535号公報
【特許文献6】特開2001−98190号公報
【特許文献7】特開2001−98188号公報
【特許文献8】特開2001−353808号公報
【0006】
【発明が解決しようとする課題】
本発明の解決すべき課題は、これら従来技術に比べ、特に指紋や皮脂の付着防止性、ふき取り性を大幅に改良しつつ、特に、活性エネルギー線を照射することにより、硬化し、卓越した硬度・耐摩耗性、透明性や低カール性をも併せて実現しうるような、活性エネルギー線硬化性の耐汚染性付与剤及びそれを用いた耐汚染性物品を提供することである。
【0007】
【課題を解決するための手段】
本発明者らは、以前、撥水・撥油基と親水基のバランスが特定の種類の汚れ(例えばホワイトボード用マーカー)の付着性・ふき取り性制御に有効であることを見出している(特開2001−80290号公報)。この際に、汚れの成分となじませつつ、ふき取り性を確保することが可能であることを見出しており、その発想を指紋や皮脂成分の汚れ防止の設計に展開することを考えた。
そこで、通常の汚れをつきにくくするため、撥水性を確保しつつ、指紋や皮脂成分の汚れをなじませて目立たなくすることができないか、種々検討したところ、特定構造の撥水基、場合により、更に親水基を同時に有する耐汚染性付与剤を活性エネルギー線硬化性組成物に配合し、塗布、硬化することで、一段コートで、目的とするような耐汚れ性表面を有する塗膜が得られることを見出した。またこの耐汚染性付与剤(防汚剤)はごく少量の配合で十分な性能を発揮しうるため、例えば活性エネルギー線硬化性組成物として、ハードコート性を有する組成物や低カール性を有する組成物に配合しても、その性能(例えば卓越した耐摩耗性、硬度、透明性、低カール性等)を損なうことなく、耐指紋汚れや皮脂汚れに対して非常に優れた耐汚染性を有する塗膜が得られることを確認し、本発明を完成するに至った。
【0008】
即ち、本発明の要旨は、耐汚染性付与剤から形成された塗膜の鉛筆硬度が5B以上であり、水に対する接触角が80度以上で、オレイン酸、トリオレイン及びスクアレンに対する接触角がいずれも10度以下であることを特徴とする上記耐汚染性付与剤に存する。また、本発明の他の要旨は、耐汚染性付与剤から形成された塗膜の鉛筆硬度が2H以上であり、水に対する接触角が80度以上で、オレイン酸、トリオレイン及びスクアレンに対する接触角がいずれも10度以下であることを特徴とする活性エネルギー線硬化性の耐汚染性付与剤に存する。更に他の要旨は、これら耐汚染性付与剤を用いた耐汚染性物品に存する。
【0009】
【発明の実施の形態】
以下、本発明をさらに詳細に説明する。
【0010】
(A)オルガノ(ポリ)シロキサン基及び有機フッ素化合物基のいずれも含まない撥水基を有する(メタ)アクリレートを共重合成分として含む(メタ)アクリル系共重合体:(A)成分
本発明において、(A)成分を構成する単量体として、(1)撥水性共重合成分、(2)高剛性共重合成分、及び(3)親水性共重合成分が用いられる。このうち(1)撥水性共重合成分として、オルガノ(ポリ)シロキサン基及び有機フッ素化合物基のいずれも含まない撥水基を有する(メタ)アクリレートが必須成分として用いられる。
また、本発明の耐汚染性付与剤中に、(A)成分は(メタ)アクリル系共重合体それ自体の形態で存在してもよいが、該共重合体を(4)無機酸化物微粒子に予め結合させておくこともできる。以下(1)〜(4)の順序で説明する。
【0011】
(1)撥水基を有する共重合成分としては、炭素数10以上、好ましくは炭素数12以上のアルキル基またはポリシクロアルキル基を有する(メタ)アクリレートを例示することができる。具体例をいくつか例示すると、たとえば、デシル(メタ)アクリレート、ドデシル(メタ)アクリレート、ステアリル(メタ)アクリレート、ベヘニル(メタ)アクリレート、トリシクロデセンモノメタノールモノ(メタ)アクリレート等をあげることができる。炭素数10未満のアルキル基やモノシクロアルキル基では、撥水性が十分ではないため好ましくない。炭素数の上限は撥水性の点からは特に限定されないが、実用的には30程度の範囲から選択される。尚、撥水基として通常使われるシリコン(主にポリジメチルシロキサン)やフッ素(主にパーフルオロアルキル基)を用いると、撥水性と共に撥油性も同時に生じてしまうため本発明では、これらシリコン及びフッ素を含まない共重合成分を用いることが重要である。
(2)高剛性共重合成分
上記(1)撥水性共重合成分のみを重合した(メタ)アクリレートの単独重合体では硬度の低下等の問題を起こしやすいため、スチレン、α−メチルスチレン、(メタ)アクリル酸メチル、(メタ)アクリル酸エチル、(メタ)アクリル酸ブチル等比較的硬いポリマーを与えうるラジカル共重合性モノマーを共重合すると好ましい。
(3)親水性共重合成分
さらに親水基を有するラジカル共重合性モノマーを共重合すると、親水性が適度に付与されるため好ましい場合がある。例えば、以下のような親水化手法を例示することができる。
(i)ポリアルキレングリコール基の導入
(ii)OH基またはカルボン酸基、スルホン酸基、燐酸基並びにこれらの塩の導入
【0012】
(i)ポリアルキレングリコール基の導入
上記の導入には、ポリアルキレングリコール基を側鎖に有するラジカル重合性モノマーの共重合が好ましい。このようなモノマーの具体例としては、ポリエチレングリコールモノ(メタ)アクリレート、ポリプロピレングリコールモノ(メタ)アクリレート、ポリ(エチレングリコール/プロピレングリコール)モノ(メタ)アクリレート等を例示することができる。これらは例えば日本油脂株式会社からブレンマーの商品名で入手することができる。
【0013】
(ii)OH基またはカルボン酸基、スルホン酸基、燐酸基及びこれらの塩の導入
上記の導入には、これらの基を有するラジカル重合性モノマーの共重合が好ましい。例えば、OH基を導入しうるモノマーとしては、ヒドロキシエチル(メタ)アクリレート、ヒドロキシプロピル(メタ)アクリレート、ヒドロキシブチル(メタ)アクリレート等を例示することができる。
カルボン酸基を導入しうるモノマーとしては、アクリル酸、メタクリル酸、メタクリロイルオキシエチルフタル酸等を例示することができる。スルホン酸基を導入しうるモノマーとしては、スチレンスルホン酸等を挙げることができる。燐酸基を導入しうるモノマーとしては、燐酸モノ(メタ)アクリレート等を挙げることができる。
また、これらのアルカリ(土類)金属塩、第四級アンモニウム塩なども親水性付与には有効である。
【0014】
(4)無機酸化物微粒子に結合させた成分(A)
さらに硬度、親水性を付与したい場合、無機酸化物微粒子に成分(A)の共重合体を結合させると、より一層好ましい場合がある。
無機酸化物微粒子に結合させる方法はいくつかあるが、以下のような方法がもっとも好ましい。
まず、メルカプトシランを無機酸化物微粒子に結合させ、メルカプト基を有する無機酸化物微粒子を調製する。このような酸化物微粒子の存在下、共重合体(A)を構成する共重合モノマー(1)(2)(3)をラジカル共重合すると、メルカプト基を有する無機酸化物微粒子が重合停止剤(連鎖移動剤)として作用し、結果として共重合体(A)が無機酸化物微粒子の表面に結合した形になる。
【0015】
無機酸化物としては、特に制限されないが、珪素、アルミニウム、ジルコニウム、チタニウム、亜鉛、鉛、ゲルマニウム、インジウム、スズ、アンチモン、セリウム、リチウムの酸化物またはこれらの複合酸化物が好ましく、具体的には、珪素の酸化物(シリカ)、アルミニウムの酸化物(アルミナ)、珪素−アルミニウムの複合酸化物、ジルコニウムの酸化物(ジルコニア)、チタニウムの酸化物(チタニア)、酸化亜鉛、酸化錫、アンチモンドープ酸化錫、インジウム−錫複合酸化物(ITO)、酸化セリウム、シリカ−酸化リチウムの複合酸化物等を挙げることができる。シリカ又はこれを主成分とするものが特に好ましい。
無機酸化物微粒子の形状は、球状、中空状、多孔質状、棒状、繊維状、板状又は不定形状であり、なかでも球状が好ましい。金属酸化物の一次粒子径は1〜100nmが好ましい。一次粒子径が1nm未満であると機械特性の向上効果が小さく、一方100nm以上であると二次凝集を起こしやすく、透明性等が失われるため好ましくない。
これら無機酸化物微粒子は乾燥された粉末状態で、或いは、水、有機溶剤に溶解または分散した状態で入手可能である。これらのうち、優れた分散性を発現するためには、水または有機溶剤に溶解または分散したゾルの利用が好ましい。代表的には、水に溶解させた水性シリカゾル、またはOH基を有する有機溶媒、またはケトン基を有する極性溶媒に溶解または分散したオルガノシリカゾルを主成分として用いることが最も好ましい。水性シリカゾルとしては代表的には、ST−20(塩基性の水性シリカゾル、日産化学工業株式会社製)、ST−O(酸性の水性シリカゾル、日産化学工業株式会社製)、ST−AK(弱酸性の水性シリカ・アルミナゾル、日産化学工業株式会社製)、リチウムシリケート(塩基性のシリカ・酸化リチウムゾル、日産化学工業株式会社製)等を挙げることができる。また、オルガノシリカゾルとしては代表的には、IPA−ST(イソプロパノール(IPA)分散オルガノシリカゾル、日産化学工業株式会社製)、MEK−ST(メチルエチルケトン(MEK)分散オルガノシリカゾル、日産化学工業株式会社製)等、またはこれらを原料に他のOH基を有する有機溶媒に溶媒置換したゾル(例えばPGM分散オルガノシリカゾル等)を挙げることができる。
分散液中の固形分含有量としては、通常5〜50重量%、好ましくは10〜40重量%のものが取り扱い易く、入手も容易である。
【0016】
メルカプトシラン(メルカプト基を有するシランカップリング剤)としては、例えばトリメトキシシリルプロピルメルカプタン(例えば信越化学工業株式会社よりKBM803の商品名で、東レダウコーニングシリコン株式会社よりSH6062の商品名で入手可能)等を例示することができる。その他、トリエトキシシリルプロピルメルカプタン、トリメトキシシリルエチルメルカプタン等のトリアルコキシシリルアルキルメルカプタン、メチルジメトキシシリルプロピルメルカプタン、メチルジエトキシシリルプロピルメルカプタン等のジアルコキシアルキルシリルアルキルメルカプタン等を用いても良い。
【0017】
反応、結合については、この種の化合物生成において一般的に用いられる種々の方法で達成可能である。基本的にはアルコキシシリル基を加水分解し、シラノール基を生成させ、無機酸化物表面のアルコキシ基および/またはヒドロキシル基と縮合反応を行い、結合させる方法が一般的である。
水は、塗膜の性能、コート液の安定性を損なわない範囲で用いられ、その量はアルコキシシリル基に対し通常1〜400モル%、好ましくは30〜200モル%である。1モル%より少ないと加水分解、縮合反応が起こりにくいし、400モル%より多いとゲル化等を起こしやすく好ましくない。また、使用される水は蒸留水、イオン交換水、工業用水、軟水等を挙げることができる。
【0018】
さらに、この加水分解、縮合反応を促進するため、酸またはアルカリ、またはその他の適切な化合物を触媒として添加することも可能である。これらについても塗膜の性能を損なわず、かつコート液の性能を損なわないものであれば種々のものを使用することが可能である。例えば酸触媒としては塩化水素溶液、燐酸溶液、硼酸等の無機酸、クエン酸、マレイン酸、酢酸、パラトルエンスルホン酸等の有機酸、アルカリ触媒としてはアルコール性水酸化カリウム、アンモニア、トリアルキルアミン類、ジメチルアミノピリジン等の複素環含有アミン類等を挙げることができる。その他、アルミニウムトリアセチルアセトナート等の金属アセチルアセトン錯体も有効である。
その使用量はメルカプト基含有シランカップリング剤100重量部に対して、0.1〜5重量部、好ましくは0.5〜5重量部である。
【0019】
無機酸化物微粒子とメルカプトシランの重量比は100/0.1〜100/10、好ましくは100/1〜100/5である。この比が100/0.1より大きい場合、無機酸化物微粒子に導入されるメルカプト基の含量が低く、結果として実質的にメルカプト基の導入されていない無機酸化物微粒子の占める割合が高くなり、好ましくない。一方100/10より小さい場合には、無機酸化物微粒子に含まれるメルカプト基の含量が高すぎ、共重合体の分子量が著しく低下したり、逆に架橋・ゲル化による不溶化が起こる場合があり、好ましくない。
【0020】
成分(A)の(メタ)アクリル系共重合体(A)を調製するに当り、上記した(1)撥水性共重合成分、(2)高剛性共重合成分、(3)親水性共重合成分及び(4)無機酸化物微粒子は、(1)撥水性共重合成分が5〜60重量%、好ましくは10〜50重量%、(2)高剛性共重合成分が5〜80重量%、好ましくは10〜70重量%、(3)親水性共重合成分が0〜40重量%、好ましくは0〜25重量%、(4)無機酸化物微粒子が固形物換算で、0〜40重量%、好ましくは0〜30重量%の範囲で用いられる。
【0021】
共重合は、一般に、均一性を向上させるために溶媒を使用することが好ましい。かかる溶媒としては、メタノール、エタノール、イソプロパノール(IPA)、イソブタノール等アルコール系溶媒、アセトン、メチルエチルケトン(MEK)、メチルイソブチルケトン(MIBK)等のケトン系溶媒、テトラヒドロフラン、ジオキサン、メトキシエタノール、エチレングリコールモノエチルエーテル、エチレングリコールジメチルエーテル、プロピレングリコールモノメチルエーテル等のエーテル系溶媒、酢酸メチル、酢酸エチル、酢酸プロピル、プロピオン酸ブチル、酪酸ブチル等のカルボン酸エステル系溶媒、プロピレングリコールモノメチルエーテルアセテート(PGMAc)、2−エトキシエチルアセタート等のエーテルエステル系溶媒、ベンゼン、トルエン、キシレン等の芳香族炭化水素溶媒、ジメチルホルムアミド、ジメチルアセトアミド等の有機溶媒が使用される。また、水を、反応系の均一性が損なわれない範囲で加えてもよい。
【0022】
共重合成分と溶媒の混合・溶解方法には特に制限はないが、混合後、一定時間以内、好ましくは3時間以内にラジカル重合開始剤を添加し、重合を開始することが肝要である。混合後、ラジカル重合開始剤を含まない状態で放置すると、成分(4)を含む場合は特に、副反応として、メルカプト基のラジカル重合性官能基(二重結合)へのマイケル付加反応が進行し、3時間以上経過後、重合を開始した場合、共重合体の物性が大きく変化し、好ましくない場合がある。
【0023】
ラジカル重合開始剤としては、一般にラジカル重合に用いられる公知の開始剤を用いることができる。代表例を挙げると、ベンゾイルパーオキサイド、ジ−t−ブチルパーオキシド、クメンヒドロパーオキサイド等の有機過酸化物、2,2’−アゾビスブチロニトリル、2,2’−アゾビス(2,4−ジメチルバレロニトリル)(V65)、2,2’−アゾビス(4−メトキシ−2,4−ジメチルバレロニトリル)等のアゾ化合物が特に好適に使用される。重合液中のモノマー類(成分D)も含む)の総和濃度は通常10〜60重量%であり、重合開始剤は通常単量体混合物に対し、0.1〜10重量%、好ましくは0.2〜2重量%の量使用される。
【0024】
好ましい重合温度は用いるラジカル重合開始剤により異なるが、重合温度は20〜150℃、重合時間は1〜72時間である。
【0025】
(メタ)アクリル系共重合体(A)を構成する共重合モノマーの混合物に、メルカプトシランを共存させてラジカル共重合すると、メルカプトシランが連鎖移動剤として作用し、末端にシラン基を有する共重合体(A)が得られる。このシラン末端共重合体(A)を無機酸化物微粒子に結合させてもよい。このような場合の共重合方法、無機酸化物微粒子への結合方法については、先に記載したものと同様の方法を採用することができる。
【0026】
本発明の耐汚染性付与剤を活性エネルギー線で硬化可能とするためには、(B)多官能(メタ)アクリレート化合物が使用される。
【0027】
多官能(メタ)アクリレート化合物としては、1分子中3個以上の(メタ)アクリロイル基を有する化合物であれば特に限定されないが、代表例を挙げると、ペンタエリスリトールトリ(メタ)アクリレート、ペンタエリスリトールテトラ(メタ)アクリレート、ジペンタエリスリトールペンタ(メタ)アクリレート、ジペンタエリスリトールヘキサ(メタ)アクリレート、ジトリメチロールプロパンテトラ(メタ)アクリレート、ポリエステル(メタ)アクリレート類、多官能ウレタン(メタ)アクリレート類等を例示することができる。
【0028】
活性エネルギー線で硬化可能な耐汚染性付与剤において、(B)多官能(メタ)アクリレート化合物の硬化を促進するために、(C)光重合開始剤が配合される。
【0029】
かかる光重合開始剤としては、ベンゾインメチルエーテル、ベンゾインエチルエーテル、ベンゾインイソプロピルエーテル、ベンゾインイソブチルエーテル、ジエトキシアセトフェノン、ベンジルジメチルケタール、2−ヒドロキシ−2−メチルプロピオフェノン、1−ヒドロキシシクロヘキシルフェニルケトン、ベンゾフェノン、2,4,6−トリメチルベンゾインジフェニルホスフィンオキシド、2−メチル−[4−(メチルチオ)フェニル]−2−モルフォリノ−1−プロパノン、2−ベンジル−2−ジメチルアミノ−1−(4−モルフォリノフェニル)−ブタン−1−オン、ミヒラーズケトン、N,N−ジメチルアミノ安息香酸イソアミル、2−クロロチオキサントン、2,4−ジエチルチオキサントン等が挙げられ、これらの光重合開始剤は2種以上を適宜に併用することもできる。
光重合開始剤(C)は、(A)、(B)及び(D)から成る重合性成分の和の10重量%以下、好ましくは1〜5重量%用いられる。
【0030】
(D)無機酸化物微粒子の表面に−O−Si−R−結合を介して(メタ)アクリロイル基が結合している無機酸化物微粒子
なお、ここでいう無機酸化物微粒子としては、先に説明した成分(A)に結合させる無機酸化物微粒子と同様のものが使用できる。
【0031】
(D−1)(メタ)アクリロイル基を有するシランカップリング剤
無機酸化物微粒子表面に、−O−Si−R−結合を介して、(メタ)アクリロイル基を有する基を結合するには、通常(メタ)アクリロイル基を有するシランカップリング剤を用いる。このような化合物の一つは、分子量300以上で、ラジカル重合可能な官能基として(メタ)アクリロイル基を1個以上含むシランカップリング剤である。その数には特に制限はないが、1分子あたり1〜5個の重合可能な官能基を有することが好ましい。その位置は特に制限されないが分子の末端にあることが好ましい。
またこの化合物は同時に式(1)を示す官能基を有する有機化合物であることが好ましい。
(式中、X及びYは、それぞれ独立に、酸素原子、イオウ原子又はイミノ基のいずれかである)。
【0032】
式(1)に示す官能基は、分子間において水素結合による過度の凝集力を発生させ、機械的強度、基材への密着性、耐熱性等を付与させる効果があるとともに、無機酸化物表面とラジカル重合性官能基との間のスペーサーとしても働く。具体的には、下記の式(2)の官能基を挙げることができる。
−OCONH−、−SCONH−、−SCSNH−、−OCSNH−、−NHCONH−、−NHCSNH− ・・・・・(2)
これらの基のうち、熱安定性や合成の容易さの観点から、−OCONH−、−SCONH−が特に好ましい。
また、この化合物は同時にチオエーテル基を有する有機化合物であっても良い。チオエーテル基も、シリカ表面とラジカル重合性官能基または特定の極性官能基との間のスペーサーとして働き、過度の凝集を抑える効果があるものと思われる。
【0033】
無機酸化物と結合しうるシランカップリング剤の官能基としては、シラノール基を生成しうる基であるアルコキシシリル基が特に好ましい。アルコキシシリル基としては、モノアルコキシシリル基、ジアルコキシシリル基、トリアルコキシシリル基を挙げることができるが、中でもトリメトキシシリル基やトリエトキシシリル基などの低級アルコールのトリアルコキシシリル基が反応性を考えると特に好ましい。分子中における、これらの基の位置は、重合性不飽和基と反対側の分子末端にあることが好ましい。また1分子中の基の数は1〜3個であることが好ましく、特に好ましいのは1個である。
【0034】
シラノール基またはシラノール基生成単位は、縮合反応または加水分解に続いて起きる縮合反応によって、無機酸化物微粒子と結合する生成単位である。このような化合物(D−1)の好ましい例をいくつか例示すると、
▲1▼OH基を有する(メタ)アクリレート化合物とNCO基を有するトリアルコキシシランとが−OCONH−結合で接続された化合物、
▲2▼SH基を有するトリアルコキシシラン化合物とジイソシアネートの一方のNCO基を−NHCOS−結合で接続し、残りのNCO基にOH基を有する(メタ)アクリレート化合物を作用させ、−NHCOO−結合で接続した化合物、
▲3▼NCO基を有する(メタ)アクリレート化合物と、SH基を有するトリアルコキシシランとが−NHCOS−結合で接続された化合物、
▲4▼分子内に2個以上の(メタ)アクリロイル基を含有する化合物、とSH基を有するトリアルコキシシランとが、SH基の(メタ)アクリロイル基へのマイケル付加反応により生成するチオエーテル結合で接続された化合物、
▲5▼α、ω−ヒドロキシ末端ポリアルキレングリコールのモノ(メタ)アクリル酸エステルと、NCO基を有するシランカップリング剤とを反応させた化合物、
等を挙げることができるが、これらに限定はされない。
【0035】
OH基を有する(メタ)アクリレートとしては、例えばモノ(メタ)アクリレート(例えば、ヒドロキシエチルアクリレート、ヒドロキシエチルメタクリレート、ヒドロキシプロピルアクリレート、ヒドロキシプロピルメタクリレート等)、ジ(メタ)アクリレート(例えば、グリセリンジ(メタ)アクリレート、トリメチロールプロパンジ(メタ)アクリレート等)、トリ〜ポリ(メタ)アクリレート(例えば、ペンタエリスリトールトリアクリレート、ジペンタエリスリトールトリ〜ペンタアクリレート、ジトリメチロールプロパントリアクリレート等)を例示することができる。
【0036】
NCO基を有するトリアルコキシシラン化合物としては、トリエトキシシリルプロピルイソシアネート(例えば信越化学工業株式会社よりKBE9007の商品名で入手可能)、トリメトキシシリルプロピルイソシアネート、あるいはトリメトキシシリルプロピルメルカプタン(例えば信越化学工業株式会社よりKBM803の商品名で、東レダウコーニングシリコン株式会社よりSH6062の商品名で入手可能)等のトリアルコキシシリルアルキルメルカプタンとジイソシアネート(例えばイソホロンジイソシアネート、ヘキサメチレンジイソシアネート、MDI、TDI等)の一方のNCO基とをチオウレタン結合で接続した化合物等を例示することができる。
【0037】
OH基とNCO基との反応による−OCONH−結合の生成法は、各化合物をNCO基/OH基≦1の割合で配合し、60〜100℃で1時間から20時間混合攪拌することにより得られる。本反応においては、反応中の(メタ)アクロイリル基による重合等を防止するために、例えばハイドロキノン、ハイドロキノンモノメチルエーテル、カテコール、p−t−ブチルカテコール、フェノチアジンなどの重合禁止剤を使用するのが好ましく、その量は反応混合物に対して、0.01〜1重量%、好ましくは0.05〜0.5重量%である。また反応を促進するために、例えばジラウリン酸ジ−n−ブチル錫、ジアザビシクロオクタン(通常DABCOと略す)のような公知の反応触媒を添加しても良い。さらに本反応は例えば、メチルエチルケトン、メチルイソブチルケトン等のケトン系溶媒、エチレングリコールジエチルエーテル、ジエチレングリコールジメチルエーテル等のエーテル系溶媒、酢酸エチル、酢酸ブチル等のカルボン酸エステル系溶媒、キシレン、トルエン等の芳香族炭化水素溶媒等、イソシアネート基を反応しうる基を含まない溶媒中、または、同時に、分子内に3個以上の(メタ)アクリロイル基を有する多官能アクリレートの存在下、行うことができる。
【0038】
NCO基を有する(メタ)アクリレート化合物としては、β−イソシアネートエチル(メタ)アクリレート(メタクリレートはカレンズMOIの商品名で昭和電工株式会社より入手可能)、または、OH基を有する(メタ)アクリレート類と、ジイソシアネート(例えばイソホロンジイソシアネート、ヘキサメチレンジイソシアネート、MDI、TDI等)の一方のNCO基とをウレタン結合で接続した化合物等を例示することができる。
【0039】
SH基を有するトリアルコキシシラン化合物としては、例えばトリメトキシシリルプロピルメルカプタン(例えば信越化学工業株式会社よりKBM803の商品名で、東レダウコーニングシリコン株式会社よりSH6062の商品名で入手可能)等を例示することができる。
【0040】
NCO基とSH基との反応による−NHCOS−結合の生成法は、NCO基とOH基との反応による−NHCOO−結合生成と同様の方法でおこなうことができる。
α、ω−ヒドロキシ末端ポリアルキレングリコールのモノ(メタ)アクリル酸エステル化合物としては、ポリエチレングリコールモノ(メタ)アクリレート、ポリプロピレングリコールモノ(メタ)アクリレート、ポリテトラメチレングリコールモノ(メタ)アクリレート、ポリ(エチレン/プロピレン)グリコールモノ(メタ)アクリレート、ポリ(エチレン/テトラメチレン)グリコールモノ(メタ)アクリレート等を例示することができる。
【0041】
α、ω−ヒドロキシ末端ポリアルキレングリコールのモノ(メタ)アクリル酸エステル化合物とNCO基を有するトリアルコキシシリル化合物の反応はNCO基とOH基との反応による−NHCOO−結合生成と同様の方法でおこなうことができる。
【0042】
(D−1)と無機酸化物微粒子の反応、結合については、先に説明したメルカプトシランと無機酸化物微粒子の場合と同様に行うことができる。水や触媒の使用方法、使用量なども同様である。
【0043】
これとは別に、(D−1)を合成しうる成分のうち、あらかじめ式(1)または(2)に示す結合基を生成しうる官能基を有するアルコキシシリル化合物を先に無機酸化物微粒子に反応させた後、他の化合物を反応させ、重合性不飽和基および、式(1)または(2)に示す結合基を導入する方法もある。式(1)のうち、アルコキシシリル基を有する化合物として、SH基を有するトリアルコキシシラン化合物は、あらかじめ無機酸化物微粒子に反応させることが可能である。
【0044】
例えば、SH基を有するトリアルコキシシランを無機酸化物に反応させ、その後SH基を、ジイソシアネート化合物と反応させ、一方のNCO基を用いて−NHCOS−結合で接続し、残りのNCO基にOH基を有する(メタ)アクリレート化合物を作用させ、−NHCOO−結合で接続させる方法で、先の▲3▼の方法と同様の構造を得ることができる。
【0045】
また、SH基を有するトリアルコキシシランを無機酸化物に反応させ、その後NCO基を有する(メタ)アクリレート化合物および/または(メタ)アクリルアミド化合物と反応させることで、先の▲4▼と同様の構造を得ることができる。
【0046】
無機酸化物微粒子と(D−1)の反応比は、重量比で通常、90/10〜5/95、好ましくは80/20〜10/90である。無機酸化物微粒子/(D−1)>90/10であると、無機酸化物の表面保護が不十分で好ましくなく、一方、無機酸化物微粒子/(D−1)<5/95であると、アルコキシシラン自身の重合、架橋による分散状態の不安定化、著しい粘度上昇等を起こすので好ましくない。また、(D−1)の分子量は300以上であることが望ましい。300以下であると、保護コロイドを生成する効果が小さかったり、シランカップリング剤自身の縮合が起こり、架橋等による凝集、ゲル化を起こしやすいので好ましくない。
【0047】
反応は室温から100℃、1〜100時間、好ましくは室温で4時間以上反応の後、室温〜70℃で1〜10時間加熱し、反応を進行させる。また副反応を抑えるため、溶媒で反応系を希釈しても良い。用いられる溶媒としては加水分解物であるシランアルコキシドや水、触媒との相溶性があるものが好ましく、例えば、メタノール、エタノール、イソプロパノール、イソブタノール等のアルコール類、アセトン、メチルエチルケトン、メチルイソブチルケトン等のケトン類、THF、ジオキサン等のエーテル類、プロピレングリコールモノメチルエーテル等のOH含有エーテル類等を挙げることができる。
【0048】
また、(D−1)の一部(重量で50%未満)を他のシランカップリング剤で置き換えても良い。他のシランカップリング剤としては、公知の各種市販シランカップリング剤の他、ラジカル重合性官能基を有しない、ポリアルキレングリコール構造を有するシランカップリング剤、カルボン酸基またはカルボン酸エステル基を有するシランカップリング剤、脂環構造を有するシランカップリング剤、枝分かれ構造を有するかさ高いアルコールとNCO基を有するアルコキシシリル基との反応により得られるシランカップリング剤等を例示することができる。
【0049】
これらとは別に、(D)の側鎖が、下記(3)式で示されるシリルエーテル基である、重合性官能基を有するポリマーが結合した無機酸化物微粒子を用いることができる。
−O−Si−R−S−Poly ・・・・・(3)
但し、Rは炭素原子数2〜10の分岐を有していてもよいアルキレン基であり、Polyは少なくとも1個の(メタ)アクリロイル基を有するポリマーユニットである。
前記無機酸化物微粒子の製法は特に限定されるものではないが、以下の方法により製造するのが好ましい。
(第1の方法)
まず、メルカプト基含有シランカップリング剤と無機酸化物微粒子を加水分解縮合し、メルカプト基を有する無機酸化物微粒子を合成する(第1−1の工程)。
【0050】
前記無機酸化物微粒子としては、例えば水及び各種の有機溶媒、又はこれらの混合溶媒を分散媒とし、粒子径が1〜100nmの無機酸化物微粒子を、その固形分として10〜40%含有する無機酸化物微粒子が好ましい。有機溶媒や無機酸化物微粒子の具体例は先に述べたものと同様である。
【0051】
メルカプト基含有シランカップリング剤と無機酸化物微粒子との加水分解縮合反応は、この混合物に水を添加することにより行われる。メルカプト基含有シランカップリング剤のアルコキシシリル基が水で加水分解し、シラノール基を生成し、このシラノールと無機酸化物微粒子表面のOH基との間で縮合反応が起こり、メルカプト基を表面に有する無機酸化物微粒子が得られる。水の添加量はメルカプト基含有シランカップリング剤のアルコキシシリル基が理論量として100%加水分解しうる量以上の量であれば良く、100〜300%相当量、好ましくは100〜200%相当量を添加する。
【0052】
この加水分解反応を促進するため、加水分解触媒を反応系に添加することができる。加水分解反応としては、例えば、アセチルアセトンアルミニウム、ホウ酸トリブトキシド、塩酸、酢酸、硝酸、マレイン酸、フマル酸、シュウ酸、ジブチルスズジオクテート、p−トルエンスルホン酸、およびこれらの混合物を使用することができる。その使用量はメルカプト基含有シランカップリング剤100重量部に対して、0.1〜5重量部、好ましくは0.5〜5重量部である。
【0053】
反応は20〜100℃、1〜100時間、好ましくは20〜25℃で4時間以上反応の後、40〜70℃で1〜10時間加熱し、反応を進行させる。また、副反応を抑えるため、溶媒で反応系を希釈しても良い。用いられる溶媒としては用いる水、触媒と相性の良いものが好ましく、例えば、メタノール、エタノール、イソプロパノール、イソブタノール、等のアルコール類、アセトン、メチルエチルケトン、メチルイソブチルケトン等のケトン類、テトラヒドロフラン、ジオキサン等のエーテル類、プロピレングリコールモノメチルエーテル等の水酸基含有エーテル類等を挙げることができる。
反応系におけるメルカプト基含有シランカップリング剤と無機酸化物微粒子(固形分)との重量比は、0.1/99.9〜10/90であることが好ましく、1/99〜5/95であることがより好ましい。メルカプト基含有シランカップリング剤の重量比率が0.1未満であると、無機酸化物微粒子と結合するメルカプト基量が少なくなり、エポキシ基を含有する重合体と結合する部位が少なくなるため、重合体との無機酸化物微粒子が安定に製造出来ない傾向になる。一方メルカプト基含有シランカップリング剤の重量比率が10を越えても、エポキシ基を含有する重合体に対する結合部位の割合はすでに十分であり、これ以上のメルカプト基量含有シランカップリング剤を使用しても実用的でない。
【0054】
次に前記第1の工程で製造されたメルカプト基を有する無機酸化物微粒子の存在下で、エポキシ基と1個のラジカル重合性基とを有する単量体の少なくとも1種をラジカル共重合する(第1−2の工程)。
メルカプト基を有する無機酸化物微粒子の存在下で、単量体のラジカル重合を行うことにより、重合過程で、成長反応の単量体のラジカルと、無機酸化物微粒子に結合したメルカプト基との連鎖移動反応が起こり、スルフィド結合を介して、重合体と無機酸化物微粒子が結合する。なお、この際、単量体中のエポキシ基はそのまま維持される。
第2の工程で使用されるエポキシ基と1個のラジカル重合性基を有する単量体(以下「エポキシ基を有する単量体」と言うことがある)としては、グリシジル(メタ)アクリレート、3,4−エポキシシクロヘキシル(メタ)アクリレート等を挙げることができる。
必要であれば前記エポキシ基を有する単量体を、他の単量体と共にラジカル共重合することができる。他の単量体はエポキシ基と反応しないものであれば、特に制限されない。
【0055】
単量体(エポキシ基を有する単量体及び所望により併用される他の単量体)と無機成分(無機微粒子の固形分)とは、重量比30/70〜95/5で重合反応させるのが好ましく、50/50〜90/10で重合反応させるのがより好ましい。無機成分の重量比率が70を越えると安定な無機酸化物微粒子が得られないし、5未満であると、耐摩耗性が不十分になる傾向がある。
【0056】
このラジカル重合反応は、溶剤中で通常のラジカル重合開始剤を用いて行われる。
溶剤としては、成分(A)の共重合時に使用する有機溶媒はいずれも使用可能であり、また重合開始剤についても同様である。
【0057】
次に、第2の工程で合成した重合体に、カルボキシル基と(メタ)アクリロイル基を有する化合物を付加させる(第1−3の工程)。
第3の工程に用いられるカルボキシル基と(メタ)アクリロイル基を有する化合物(以下、「(メタ)アクリロイル基導入試薬」という)としては、例えば、(メタ)アクリル酸、2−(メタ)アクリロイルオキシエチルコハク酸、2−(メタ)アクリロイルオキシエチルヘキサヒドロフタル酸、ペンタエリスリトールトリ(メタ)アクリレートと無水コハク酸、無水フタル酸、ヘキサヒドロ無水フタル酸等の酸無水物の付加体、ジペンタエリスリトールペンタ(メタ)アクリレートと無水コハク酸、無水フタル酸、ヘキサヒドロ無水フタル酸等の酸無水物の付加体等を挙げることができる。前記第3の工程では、重合体が有するエポキシ基と、(メタ)アクリロイル基導入試薬が有するカルボキシル基が反応する。重合体と(メタ)アクリロイル基導入試薬とは、エポキシ基/カルボキシル基が1以上となる割合で混合するのが好ましく、1〜10になる割合でするのがより好ましい。
【0058】
反応は、50〜110℃で3〜50時間行うのが好ましい。本反応では、反応を促進させるために、例えば、トリエチルアミン、トリブチルアミン、トリエチレンジアミン、N,N−ジメチルベンジルアミン、ベンジルトリメチルアンモニウムクロリド、トリフェニルホスフィン等の公知の触媒を使用することができる。その使用量は反応混合物に対して0.01〜2重量%であるのが好ましく、0.05〜1重量%であるのがより好ましい。
【0059】
また、本反応では(メタ)アクリロイル基によるラジカル重合を防止するために、例えば、ハイドロキノン、ハイドロキノンモノメチルエーテル、カテコール、p−t−ブチルカテコール、フェノチアジン等の重合禁止剤を使用するのが好ましい。重合禁止剤の使用量は、反応混合物に対して0.01〜1重量%であるのが好ましく、0.05〜5重量%であるのがより好ましい。
また、塗工性を向上する目的で溶剤をさらに添加することが望ましい場合がある。
【0060】
用いられる溶剤は、前記無機酸化物微粒子の各製造工程に用いられる種々の反応溶媒であっても良く、例えば、前記第1工程で使用される無機酸化物微粒子の分散媒であっても、また前記第2の工程の反応に用いられる溶媒であっても良い。さらに、前記無機酸化物微粒子を製造した後に、粘度調整のため用いられる溶剤であっても良い。
【0061】
(D)の側鎖が、前記(3)式で示されるシリルエーテル基である、重合性官能基を有するポリマーが結合した無機酸化物微粒子を製造する他の方法として、以下に示す方法(第2の方法)が生成物の純度等が高く、好ましい場合がある。
【0062】
(第2の方法)
メルカプト基を有するアルコキシシランの存在下で、エポキシ基と1個のラジカル重合性基とを有する単量体の少なくとも1種をラジカル共重合する(第2−1の工程)。
メルカプト基を有するアルコキシシランの存在下で、単量体のラジカル重合を行うことにより、重合過程で、成長反応の単量体のラジカルと、メルカプト基との連鎖移動反応が起こり、スルフィド結合を介して、重合体末端にアルコキシシリル基が導入される。なお、この際、単量体中のエポキシ基はそのまま維持される。
第1の工程で使用されるエポキシ基と1個のラジカル重合性基を有する単量体(以下「エポキシ基を有する単量体」と言うことがある)としては、グリシジル(メタ)アクリレート、3,4−エポキシシクロヘキシル(メタ)アクリレート等を挙げることができる。
必要であれば前記エポキシ基を有する単量体を、他の単量体と共にラジカル共重合することができる。このような他の単量体は、ラジカル重合性であれば、特に制限されない。
メルカプト基含有アルコキシシランは、1分子中にメルカプト基とアルコキシシリル基を有するものであれば、成分(A)についての説明と同様であり、特にその構造は制限されない。
【0063】
前記エポキシ基を有する単量体とともに、他の単量体を併用する場合は、前記エポキシ基を有する単量体と他の単量体とは、重量比が100/0〜10/90の割合で用いられるのが好ましく、100/0〜30/70の割合で用いられるのがより好ましい。前記エポキシ基を有する単量体の割合が10重量%未満であると、後述する第3の工程において導入される(メタ)アクリロイル基の導入量が少なくなり、十分な耐摩耗性が得られない場合がある。
【0064】
このラジカル重合反応は、溶剤中で通常のラジカル重合開始剤を用いて行われる。
単量体とメルカプト基を有するアルコキシシランの重量比は99.5/0.5〜90/10、好ましくは99/1〜93/7である。メルカプト基を有するアルコキシシランの重量比が0.5未満では、末端に導入されるアルコキシシリル基の数が少なく、無機酸化物微粒子の表面を修飾するのに十分な官能基が存在しているとは言い難い。一方、10以上では得られる共重合体の分子量が小さすぎ、物性的に好ましくない場合がある。重合用の溶剤としては、成分(A)の調製の場合と同様の有機溶媒が用いられる。
【0065】
重合反応に使用するラジカル重合開始剤も成分(A)の調製の場合と同様である。
【0066】
次に、第1の工程で合成した重合体に、カルボキシル基と(メタ)アクリロイル基を有する化合物を付加させる(第2−2の工程)。
第2の工程に用いられるカルボキシル基と(メタ)アクリロイル基を有する化合物(以下、「(メタ)アクリロイル基導入試薬」という)としては、例えば、(メタ)アクリル酸、2−(メタ)アクリロイルオキシエチルコハク酸、2−(メタ)アクリロイルオキシエチルヘキサヒドロフタル酸、ペンタエリスリトールトリ(メタ)アクリレートと無水コハク酸、無水フタル酸、ヘキサヒドロ無水フタル酸等の酸無水物の付加体、ジペンタエリスリトールペンタ(メタ)アクリレートと無水コハク酸、無水フタル酸、ヘキサヒドロ無水フタル酸等の酸無水物の付加体等を挙げることができる。前記第2の工程では、重合体が有するエポキシ基と、(メタ)アクリロイル基導入試薬が有するカルボキシル基が反応する。重合体と(メタ)アクリロイル基導入試薬とは、エポキシ基/カルボキシル基が1以上となる割合で混合するのが好ましく、1〜10になる割合でするのがより好ましい。
【0067】
反応は、50〜110℃で3〜50時間行うのが好ましい。本反応では、反応を促進させるために、例えば、トリエチルアミン、トリブチルアミン、トリエチレンジアミン、N,N−ジメチルベンジルアミン、ベンジルトリメチルアンモニウムクロリド、トリフェニルホスフィン等の公知の触媒を使用することができる。その使用量は反応混合物に対して0.01〜2重量%であるのが好ましく、0.05〜1重量%であるのがより好ましい。
【0068】
また、本反応では(メタ)アクリロイル基によるラジカル重合を防止するために、例えば、ハイドロキノン、ハイドロキノンモノメチルエーテル、カテコール、p−t−ブチルカテコール、フェノチアジン等の重合禁止剤を使用するのが好ましい。重合禁止剤の使用量は、反応混合物に対して0.01〜1重量%であるのが好ましく、0.05〜5重量%であるのがより好ましい。
また、塗工性を向上する目的で溶剤をさらに添加することが望ましい場合がある。
【0069】
用いられる溶剤は、前記無機酸化物微粒子の各製造工程に用いられる種々の反応溶媒であっても良く、例えば、前記第1工程で使用される溶媒であっても、また前記第2の工程の反応に用いられる溶媒であっても良い。さらに、粘度調整のため用いられる溶剤であっても良い。
【0070】
次に第2の工程で得られた重合体のアルコキシシリル基を、無機酸化物微粒子を加水分解縮合し、所定の構造を有する無機酸化物微粒子を合成する(第2−3の工程)。
【0071】
ここで無機酸化物微粒子としては、成分(A)の調製時と同様のものが使用される。
【0072】
第2−2の工程で得られた重合体と無機酸化物微粒子の反応、結合に際して、水、触媒、有機溶媒等の使用態様、反応様式等は成分(A)の場合と同様である。
【0073】
反応は20〜100℃、1〜100時間、好ましくは20〜25℃で4時間以上反応の後、40〜70℃で1〜10時間加熱し、反応を進行させる。また、副反応を抑えるため、溶媒で反応系を希釈しても良い。用いられる溶媒としては用いる水、触媒と相性の良いものが好ましく、例えば、メタノール、エタノール、イソプロパノール、イソブタノール、等のアルコール類、アセトン、メチルエチルケトン、メチルイソブチルケトン等のケトン類、テトラヒドロフラン、ジオキサン、等のエーテル類、プロピレングリコールモノメチルエーテル等の水酸基含有エーテル類、等を挙げることができる。
反応系におけるアルコキシシリル基含有ポリマーと無機酸化物微粒子(固形分)との重量比は、30/70〜95/5で反応させるのが好ましく、50/50〜90/10で反応させるのがより好ましい。無機成分の重量比率が70を越えると安定な無機酸化物微粒子が得られないし、5未満であると、耐摩耗性が不十分になる傾向がある。
【0074】
本発明の組成物は、そのまま耐汚染性付与剤として使用できるが、必要に応じ塗膜物性を改良する目的で、例えば、紫外線吸収剤(例えばベンゾトリアゾール系、ベンゾフェノン系、サリチル酸系、シアノアクリレート系紫外線吸収剤)、酸化防止剤(例えばヒンダードフェノール系、硫黄系、リン系酸化防止剤)、光安定剤(例えばヒンダードアミン系光安定剤)、ブロッキング防止剤、スリップ剤、レベリング剤などの、この種の組成物中に配合される種々の添加剤を皮膜に形成する組成中に、それぞれ0.01〜2重量%配合することができる。
さらに、耐汚染性付与剤(被覆組成物)の粘度調整のため重合体の製造の際に用いた有機溶剤と同一のものを使用することができる。加えて、必要に応じ、他の重合体、ラジカル重合性モノマー、オリゴマー等を本発明で実現しうるような塗膜の物性を損なわない範囲で添加することができる。
【0075】
本発明にかかる耐汚染性付与剤は、例えば、ポリエチレンテレフタレート、ポリエチレンナフタレート等のポリエステル、PMMA、またはMMA共重合体(例えばMS樹脂)、ポリカーボネート、トリアセチルセルロース、ABS樹脂等のプラスチック基材に、デイップコート、フローコート、スピンコート、スプレーコート、バーコート、グラビアコート、ロールコート、ブレードコート、エアナイフコート等の塗工方法で、溶剤乾燥により塗膜を形成後、活性エネルギー線照射することにより、プラスチック基材表面に1〜50μm、好ましくは2〜20μmのコート層が得られる条件の下、塗工される。
【0076】
活性エネルギー線照射法としては、キセノンランプ、低圧水銀灯、高圧水銀灯、超高圧水銀灯、メタルハライドランプ、カーボンアーク灯、タングステンランプ等の光源から発せられる紫外線、または通常20〜2000kVの粒子加速器から取り出される電子線、α線、β線、γ線、等の活性エネルギー線を照射し、硬化させて被膜を形成させる。このような活性エネルギー線で硬化した被膜は生産性・物性のバランスに優れ、特に好ましい。
【0077】
本発明にかかる耐汚染性付与剤を用い、以上のような方法で作成した塗膜は以下のような物性を有する。
1)鉛筆硬度
耐汚染性付与剤を、100μm厚のPETフィルムに乾燥膜厚5μmで塗布し、硬化させた後の塗膜の鉛筆硬度は5B以上である。更に耐汚染性付与剤が活性エネルギー線硬化性の成分を含む場合には、その鉛筆硬度は2H以上、より好ましくは3H以上である。
2)水に対する接触角
耐汚染性付与剤を塗布、硬化して得られる塗膜の、水に対する接触角は80度以上、好ましく85度以上である。80度未満の場合、撥水性が低いため、特に指紋や皮脂のふき取り性が低下し、好ましくない。
【0078】
3)オレイン酸、トリオレイン(オレイン酸トリグリセリド)、スクアレン(非環式トリテルペンの1つ。イソプレン残基6個からなる鎖状構造の炭化水素。C30H50)に対する接触角
耐汚染性付与剤を塗布、硬化して得られる塗膜の、上記物質に対する接触角はすべて10度以下である。5度以下であれば、さらに好ましい。10度を越える場合、親油性が低いため、特に指紋や皮脂の付着時、非常に目立ち易い。即ち、ヘイズが大幅に悪化し、光沢度も低下する。
このようにして得られた塗膜に指紋を付着させた場合、ほとんど付着しないか、付着しても1回でテイッシュやハンカチ等で容易にふき取れる。また、通常の塗膜や従来の撥水・撥油設計の塗膜で特に問題になっていた皮脂汚れ(特に顔脂や鼻脂の汚れ)に関して、撥水・撥油設計の塗膜では付着時のヘイズ変化が10〜20と大きかったのに対し、本発明の塗膜では2〜5と小さく、付着させても目立ちにくい。一方、ふき取り性に関しては、撥水・撥油設計の塗膜では8回以上と多くの回数を要したのに対し、本発明の塗膜では4回以下と少ない回数で完全にふき取れるようになった(1回〜2回のふき取りで実質的にはほとんど汚れが目立たなくなる)。また、基材の透明性も損なわず、耐傷つき性やカール性にも非常にすぐれた塗膜を得ることも可能である。
【0079】
以下、実施例と比較例、参考例により、本発明を更に詳細に説明するが、本発明はこれら実施例により、限定されるものではない。なお、例中の部および%は、それぞれ重量部および重量%を意味する。
実施例等における塗膜の評価方法を以下に示した。
(1)透明性
ヘイズ値で評価した(JIS K−7105)。
(2)耐摩耗性
摩耗輪(Calibrase社製:CS−10F)を用い、荷重500gで100回転テーバー摩耗試験を行い、テーバー摩耗試験後のヘイズ値と試験前のヘイズ値の差△H(%)で評価した。
(3)鉛筆硬度
JIS準拠鉛筆硬度計系(太佑機材株式会社製)を用い、JIS K−5400の条件に基づき、測定を行い、傷の入らないもっとも硬い鉛筆の番手で示した。
(4)カール性
塗膜を10cm角に塗布し、静置時の4角の浮き上がり量の平均値(mm)で評価した。
(5)塗膜密着性
JIS K5400 記載の碁盤目法(1mm間隔で100個の碁盤目を入れ、セロハンテープ(ニチバン株式会社製、商品名)で試験した。但し評価方法を同じ操作を5回繰り返し(セロハンテープは常に新しいものを用いる)、全く傷やはがれの生じないものを○、10%以下の傷やはがれを生じるものを△、それ以外を×、とする方法に変更し、測定評価した。
(6)水に対する接触角
塗膜に0.002mlの純水を滴下し、1分後の接触角を測定した。なお、接触角の測定には、P型接触角測定器(協和科学株式会社製)を用いた(単位;度)。
(7)オレイン酸、トリオレイン及びスクアレンに対する接触角
純水の代わりに、これらの溶剤を使用する以外は、(6)に記載の方法で、接触角を測定した(単位;度)。
(8)耐指紋汚れ性
付着性:掌で握り、少し湿らせた親指を塗膜に垂直に3秒間押しつけ、塗膜に指紋を付ける。
付着性は指紋付着後のヘイズで評価した。
ふき取り性:市販のテイッシュで表面を軽くふき、目視で指紋汚れが見えなくなるまでの回数で評価した。
(9)耐皮脂汚れ性
付着性:鼻脂を親指につけ、その親指を塗膜に垂直に3秒間押しつけ、塗膜に指紋を付ける。
付着性は鼻脂付着後のヘイズで評価した。
ふき取り性:市販のテイッシュで表面を軽くふき、目視で皮脂汚れが見えなくなるまでの回数で評価した。
【0080】
[参考例1] (耐汚染性付与剤1の合成)
メチルメタクリレート40g、ステアリルメタクリレート20g、メチルエチルケトン(MEK)200gを攪拌混合し、重合開始剤(2,2’−アゾビス(2,4−ジメチルバレロニトリル)、和光純薬工業株式会社製、V−65)を0.5g添加し、65℃に窒素気流下昇温し、その温度で5時間維持した(途中V−65を0.5g追加添加)。その後内温を75〜80℃に上げ、2時間維持し、残存するV−65を完全に分解させた。その後室温に冷却し、固形分24%、数平均分子量18000のポリマーが得られた(耐汚染性付与剤1=AF1)。
【0081】
[参考例2] (耐汚染性付与剤2の合成)
メチルメタクリレート30g、ステアリルメタクリレート20g、ポリエチレングリコールモノアクリレート10g(ブレンマーAE400;日本油脂株式会社製)、MEK200gを攪拌混合し、V−65を0.5g添加し、65℃に窒素気流下昇温し、その温度で5時間維持した(途中V−65を0.5g追加添加)。その後内温を75〜80℃に上げ、2時間維持し、残存するV−65を完全に分解させた。その後室温に冷却し、固形分24%、数平均分子量17000のポリマーが得られた(耐汚染性付与剤2=AF2)。
【0082】
[参考例3] (耐汚染性付与剤3の合成)
メルカプトプロピルトリメトキシシラン(信越化学工業株式会社製、KBM803)を2gと固形分30%のMEK分散オルガノシリカゾル(日産化学工業株式会社製、MEK−ST)70gとから出発して得られたSH基含有シリカゾル、メチルメタクリレート30g、ステアリルメタクリレート20g、ポリエチレングリコールモノアクリレート10g(ブレンマーAE400;日本油脂株式会社製)、MEK200gを攪拌混合し、V−65を0.5g添加し、65℃に窒素気流下昇温し、その温度で5時間維持した(途中V−65を0.5g追加添加)。その後内温を75〜80℃に上げ、2時間維持し、残存するV−65を完全に分解させた。その後室温に冷却し、固形分26%のシリカ含有ポリマーが得られた(耐汚染性付与剤3=AF3)。
【0083】
[参考例4] (耐汚染性付与剤4の合成)
KBM803を2gと固形分20%のイソプロパノール分散オルガノシリカゾル(日産化学工業株式会社製、IPA−STUP)100gとから出発して得られたSH基含有シリカゾル、メチルメタクリレート30g、ステアリルメタクリレート20g、ポリエチレングリコールモノアクリレート10g(ブレンマーAE400;日本油脂株式会社製)、IPA200gを攪拌混合し、V−65を0.5g添加し、65℃に窒素気流下昇温し、その温度で5時間維持した(途中V−65を0.5g追加添加)。その後内温を75〜80℃に上げ、2時間維持し、残存するV−65を完全に分解させた。その後室温に冷却し、固形分25%のシリカ含有ポリマーが得られた(耐汚染性付与剤4=AF4)。
【0084】
[参考例5] (耐汚染性付与剤5の合成)
メチルメタクリレート40g、ステアリルメタクリレート15g、トリシクロデセンモノメタノールメタクリレート5g、アクリル酸2g、MEK200gを攪拌混合し、V−65を0.5g添加し、65℃に窒素気流下昇温し、その温度で5時間維持した(途中V−65を0.5g追加添加)。その後内温を75〜80℃に上げ、2時間維持し、残存するV−65を完全に分解させた。その後室温に冷却し、固形分25%、数平均分子量19000のポリマーが得られた(耐汚染性付与剤5=AF5)。
【0085】
[参考例6] (OH基含有多官能アクリレートとNCO基含有シランカップリング剤の反応による多官能アクリロイル基を有するシランカップリング剤の合成)
ジペンタエリスリトールペンタアクリレートとジペンタエリスリトールヘキサアクリレートの混合物(日本化薬株式会社製、カヤラッドDPHA)1kgとγ−トリエトキシシリルプロピルイソシアネート(信越化学工業株式会社製、KBE9007)50g、ジブチルスズジラウレート0.2g、ハイドロキノンモノメチルエーテル0.5gを攪拌混合の後、空気気流下90℃に昇温し、その温度で1時間維持した。IRでNCO基に対応する吸収が完全に消失していることを確認し、その後室温に戻し、生成物を取り出した。反応は定量的であった。(シランカップリング剤1=SC1)
【0086】
[参考例7] (コロイダルシリカと、多官能アクリロイル基を有するシランカップリング剤との反応)
MEK分散オルガノシリカゾル(日産化学工業株式会社製、MEK−ST、固形分30%)400g、シランカップリング剤1(多官能アクリロイル基含有シランカップリング剤と、未反応多官能アクリレートの混合物)400g、ヒドロキノンモノメチルエーテル0.4g、アセチルアセトンアルミニウム4g、をよく攪拌混合の後、純水8gを加え、室温で3時間以上攪拌を続けた。その後、空気雰囲気下、50〜70℃に昇温し、その温度で2時間以上攪拌継続し、シリカゾルの表面にシランカップリング剤を反応させ保護コロイド化を行った(処理コロイダルシリカ1=SI1)。
【0087】
[参考例8] (シラン末端ポリマーの合成とコロイダルシリカとの反応)
グリシジルメタクリレート95g、メルカプトプロピルトリメトキシシラン(信越化学工業株式会社製、KBM803)3g、プロピレングリコールモノメチルエーテルアセテート(PGMAc)200gを混合した後、内温を窒素気流化約60℃まで昇温した。その後V−65を2回に分け、合計1.5g添加し、65℃で6時間攪拌を続けた。その後、内温を100℃まで上げ、V−65を完全に失活させた後、PGMAc200g、トリフェニルホスフィン1.5gを加え、均一になるまで空気雰囲気下で攪拌を続けた。その後、アクリル酸49g/PGMAc10gの混合物を約20分かけて添加し、その後110℃にまで内温を上げ、8時間以上維持・攪拌し、アクリル酸とエポキシ基の反応を完結させた。内容混合物を室温に戻した後、MEK−ST163g、アルミニウムアセチルアセトナート0.04gを加え、均一になるまで攪拌の後、純水0.99gを加え、室温で3時間、50〜70℃で約4時間反応を行った。その後、内温を室温に戻した。固形分濃度は約30%であった(処理コロイダルシリカ2=SI2)。
【0088】
[参考例9] (特開2001−353808号公報記載のシランカップリング剤の調製)
2−トリクロロシランエチルステアレートをメタノールで分解し、2−トリメトキシシリルエチルステアレートを得た(シランカップリング剤2=SC2)。
【0089】
[参考例10] (本発明の範囲外の耐汚染性付与剤の調製)
メチルメタクリレート40g、ステアリルメタクリレート20g、パーフルオロオクチルエチルメタクリレート5g、MEK200gを攪拌混合し、V−65を0.5g添加し、65℃に窒素気流下昇温し、その温度で5時間維持した(途中V−65を0.5g追加添加)。その後内温を75〜80℃に上げ、2時間維持し、残存するV−65を完全に分解させた。その後室温に冷却し、固形分26%、数平均分子量18000のポリマーが得られた(耐汚染性付与剤6=AF6)。
【0090】
[参考例11] (本発明の範囲外の耐汚染性付与剤の調製)
メチルメタクリレート40g、ステアリルメタクリレート20g、ビスメルカプトポリジメチルシロキサン(信越化学工業株式会社製;X−22−167B)5g、MEK200gを攪拌混合し、V−65を0.5g添加し、65℃に窒素気流下昇温し、その温度で5時間維持した(途中V−65を0.5g追加添加)。その後内温を75〜80℃に上げ、2時間維持し、残存するV−65を完全に分解させた。その後室温に冷却し、固形分26%、数平均分子量17000のポリマーが得られた(耐汚染性付与剤7=AF7)。
【0091】
[参考例12] (本発明の範囲外の耐汚染性付与剤の調製)
メチルメタクリレート40g、n−デシルメタクリレート20g、MEK200gを攪拌混合し、V−65を0.5g添加し、65℃に窒素気流下昇温し、その温度で5時間維持した(途中V−65を0.5g追加添加)。その後内温を75〜80℃に上げ、2時間維持し、残存するV−65を完全に分解させた。その後室温に冷却し、固形分24%、数平均分子量19000のポリマーが得られた(耐汚染性付与剤8=AF8)。
【0092】
[実施例1〜12]及び[比較例1〜7]
表1に示すような配合で、それぞれの組成物を作成した。該組成物を使用して、以下の方法で塗膜を作成し、評価した。塗膜は透明(ヘイズ値1.5%)な100ミクロン厚のポリエチレンテレフタレートフィルム(三菱化学ポリエステルフィルム株式会社製:T600E)にバーコータを用いて、乾燥後の膜塗厚が6μmになるように塗布し、80℃で2分間加熱乾燥して形成した。このものを出力密度120W/cmの高圧水銀灯を用い、その塗膜について透明性、耐摩耗性、鉛筆硬度、塗膜密着性、カール性、接触角(水、スクアレン、オレイン酸、トリオレイン)耐指紋汚れ性・耐皮脂汚れ性を評価した。組成物の配合については表1、評価結果については表2、表3に示す。
結果から明らかなように、本発明の範囲内の物性を示す塗膜は、耐指紋汚れ性・耐皮脂汚れ性に非常に優れているが、本発明の範囲外の物性を示す塗膜は、耐指紋汚れ性・耐皮脂汚れに劣り、特に耐皮脂汚れ性に関しては本発明の範囲内の物性を示す塗膜に比べ、大きく劣ることは明らかであった。
【0093】
【表1】
DPHA:ジペンタエリスリトールヘキサ/ペンタアクリレート(日本化薬株式会社製)
DPHA*:SI1中のDPHA
U15HA:多官能ウレタンアクリレート(新中村化学株式会社製)
SI1/SI2:配合比(固形分で)2/1
I184:イルガキュア184(チバスペシャリテイケミカルズ株式会社製)
注:溶剤はMEK、PGM、PGMAc、IPAの混合溶媒を使用
【0094】
【表2】
【0095】
【表3】
【0096】
[比較例8]
SC2をエタノール/トリアセチルアセトンアルミニウム触媒の存在下、計算量の1.2倍量の水で加水分解し、縮合物を得た。
厚み100μmのPETフィルム(ヘイズ=1.5%)上に、比較例1に記載の塗膜を厚み6μmで作成後、上の縮合物を乾燥後の厚みが0.1μmになるように塗布し、100℃で5分間処理し、防汚塗膜を表面に設けた。
塗膜の物性は、ヘイズ=1.6%、耐摩耗性=5.1%、鉛筆硬度H、カール性2mm、密着性△、接触角=(水)83度、(スクアレン)10度、(オレイン酸)7度、(トリオレイン)10度であり、耐指紋汚れ性は付着時のヘイズ=3.2%/ふき取り性=2回、耐皮脂汚れ性は付着時のヘイズ=6.6%/ふき取り性=6回であり、初期の耐指紋汚れ性・耐皮脂汚れ性は、本発明の範囲内の塗膜と比較するとやや劣るものの、一般的な防汚・耐指紋汚れ性コート剤の塗膜と比べると良好である。しかし、鉛筆硬度が低く、密着性も劣るため、耐指紋汚れ性・耐皮脂汚れ性を繰り返し評価すると、徐々に細かい傷の生成や塗膜の剥がれが起こり、耐汚れ性は低下するため、実用的には大きな問題があることは明らかであった。
【0097】
[実施例13〜15]及び[比較例9〜12]
乾燥後の膜厚が約2μmとなるように、表4に示す成分(A)を単独で使用し塗膜を形成した。塗布基材、塗布方法、乾燥方法等は実施例1と同様に行い塗膜物性を評価した。評価結果を表4に示した。
表4の結果から明らかなように、実施例13〜15の成分は、耐指紋汚れ性に優れているので、硬度をあまり必要としない分野(例えば、柔軟性の求められる製品への耐指紋汚れ性付与)では問題なく用いることができる。
【0098】
【表4】
【0099】
【発明の効果】
本発明の耐汚染性付与剤によれば、非常に高いレベルの耐指紋汚れ性・耐皮脂汚れ性を有する塗膜の作成を実現することができる。また、組成物に多官能アクリレートや、無機酸化物微粒子の表面に、−O−Si−R−結合を介して(メタ)アクリロイル基を有する基が結合している無機酸化物微粒子を含有させることで、同時に卓越した硬度、耐傷つき性、透明性、低カール性等を併せ持つことが可能であり、耐タッチパネル、デイスプレイ、携帯電話筐体、光デイスクなど幅広い用途に好適に使用することができる。
即ち、本発明の耐汚染性付与剤を、例えばPET、TAC、PMMAといった代表的な透明基材に塗布した場合、鉛筆硬度が2H以上と高い硬度を有し、同時に水に対する接触角が80度以上と撥水性を示すことで、親水性汚れの付着が防止され、一方、代表的な皮脂成分のオレイン酸、トリオレイン、スクアレンに対する接触角が10度以下と親油性を示すため、皮脂成分が濡れ、付着時目立たない。一方で水に対する接触角が高いため、指紋や皮脂(同時に水分も存在するため、水より比重が軽い油溶成分が表面に浮き、塗膜と直接接するのは最終的には水分になる)成分の過度のなじみが抑えられ、ふき取り性にも優れる。さらに、撥水基と親水基を組み合わせると、その効果がさらに高くなり、ふき取り性が一層向上するため、従来到達し得なかった高いレベルの耐指紋汚れ性・耐皮脂汚れ性を実現することができる。[0001]
TECHNICAL FIELD OF THE INVENTION
The present invention relates to a stain resistance imparting agent having excellent fingerprint stain resistance and sebum stain resistance, and a stain resistant article using the same. Specifically, an active energy ray-curable stain resistance imparting agent that cures by irradiating with an active energy ray, and at the same time, forms a film with excellent hardness, abrasion resistance, low curl, and transparency, and The present invention relates to a stain-resistant article using the same.
[0002]
[Prior art]
Plastic products, for example, polycarbonate, polymethyl methacrylate, polyethylene terephthalate, polybutylene terephthalate, ABS, MS resin, styrene resin such as AS resin, vinyl chloride resin, resin base material such as cellulose acetate such as triacetyl cellulose, Base material for display devices such as containers, instrument panels, packaging materials, various housing materials, optical disk substrates, plastic lenses, liquid crystal displays, plasma displays, etc., because they are particularly excellent in lightness, ease of processing, impact resistance, etc. And so on.
[0003]
However, these plastic products have low surface hardness and are easily damaged, and transparent resins such as polycarbonate and polyethylene terephthalate have the drawback that the original transparency or appearance of the resin is significantly impaired, and wear resistance is poor. It makes it difficult to use plastic products in the fields that need them.
Therefore, there is a need for an active energy ray-curable hard coat material (coating material) that imparts abrasion resistance to the surface of these plastic products. However, a cured layer of a commercially available active energy ray-curable hard coat material has a tendency that fingerprints and sebum easily adhere to the surface and that stains cannot be easily removed, which impairs the appearance and transparency of the product.
[0004]
To solve such problems, many attempts have been made to increase the resistance to such stains by making the surface a low-energy surface, repelling fingerprints and sebum, and making it less likely to adhere. The techniques can be broadly divided into three approaches.
(1) A method of introducing a perfluoroalkyl group to make the surface water and oil repellent (for example, see Patent Document 1).
(2) A method of introducing a water-repellent silicone resin skeleton such as a polydimethylsiloxane group to make the surface water-repellent and oil-repellent (for example, see Patent Document 2).
(3) A method in which fine irregularities are formed on the surface to further increase water and oil repellency, reduce the contact area, and make the surface more difficult to stain (for example, see Patent Document 3).
However, in these conventional methods, in the application of direct contact with the sebum of the face like a mobile phone, or in the application of repeated contact with a finger like a touch panel, it is still easy to adhere, and because of water and oil repellency, There is a problem that the adhered dirt is repelled and the dirt becomes conspicuous.
[0005]
On the other hand, as a technical flow based on an idea slightly different from the above-mentioned method, the following method can be cited.
(4) A method of improving stain resistance by superhydrophilizing the surface (for example, see Patent Document 4).
(5) A method in which a specific hydrophilic group is combined with a water-repellent / oil-repellent group to improve dirt wiping properties (for example, see Patent Documents 5 to 7).
(6) A method in which the surface is made water-repellent and lipophilic to make it more compatible with fingerprints and sebum components, and to make it less noticeable even when attached (see, for example, Patent Document 8).
Among these, the last method is particularly inconspicuous even when adhered, but the surface cannot be sufficiently scratch-resistant, and the wiping property is reduced (particularly, durability such as repeated wiping properties), and multi-step coating is not performed. However, there is a problem such as an increase in cost due to the above, and drastic improvement is required.
[Patent Document 1] JP-A-10-104403
[Patent Document 2] Japanese Patent Application Laid-Open No. 10-7986
[Patent Document 3] JP-A-10-310455
[Patent Document 4] Japanese Patent Application Laid-Open No. 9-268280
[Patent Document 5] JP-A-2000-290535
[Patent Document 6] JP-A-2001-98190
[Patent Document 7] JP-A-2001-98188
[Patent Document 8] JP-A-2001-353808
[0006]
[Problems to be solved by the invention]
The problem to be solved by the present invention is that, compared to these conventional techniques, in particular, while significantly improving the anti-adhesion property of fingerprints and sebum, and the wiping properties, in particular, by irradiating with active energy rays, the composition is cured and has excellent hardness. An object of the present invention is to provide an active energy ray-curable stain resistance imparting agent and a stain resistant article using the same, which can also realize abrasion resistance, transparency and low curl.
[0007]
[Means for Solving the Problems]
The present inventors have previously found that the balance between the water-repellent / oil-repellent groups and the hydrophilic groups is effective in controlling the adhesion / wiping properties of a specific type of stain (eg, a marker for whiteboard). JP 2001-80290 A). At this time, they have found that it is possible to secure the wiping property while blending with the components of the dirt, and have conceived to apply the idea to a design for preventing dirt of fingerprints and sebum components.
Therefore, in order to make ordinary dirt difficult to attach, while ensuring water repellency, it was possible to make fingerprints and sebum component stains less noticeable by conducting various studies. Further, a stain resistance imparting agent having a hydrophilic group at the same time is added to the active energy ray-curable composition, and applied and cured to obtain a coating film having a desired stain-resistant surface with a single-step coating. Was found to be. In addition, since this stain resistance imparting agent (antifouling agent) can exert sufficient performance even with a very small amount of compounding, for example, it has a composition having a hard coat property and a low curl property as an active energy ray-curable composition. Even when blended into the composition, it has excellent stain resistance against fingerprint stains and sebum stains without impairing its performance (for example, excellent abrasion resistance, hardness, transparency, low curl, etc.). It was confirmed that a coating film having the same was obtained, and the present invention was completed.
[0008]
That is, the gist of the present invention is that a coating formed from a stain resistance imparting agent has a pencil hardness of 5B or more, a contact angle to water of 80 ° or more, and a contact angle to oleic acid, triolein and squalene. Is also 10 degrees or less. Further, another gist of the present invention is that a coating film formed from a stain resistance imparting agent has a pencil hardness of 2H or more, a contact angle with water of 80 ° or more, and a contact angle with oleic acid, triolein and squalene. Are all 10 degrees or less. Still another aspect resides in a stain resistant article using these stain resistant agents.
[0009]
BEST MODE FOR CARRYING OUT THE INVENTION
Hereinafter, the present invention will be described in more detail.
[0010]
(A) (meth) acrylic copolymer containing (meth) acrylate having a water-repellent group containing neither an organo (poly) siloxane group nor an organic fluorine compound group as a copolymer component: (A) component
In the present invention, (1) a water-repellent copolymer component, (2) a high-rigidity copolymer component, and (3) a hydrophilic copolymer component are used as monomers constituting the component (A). Among them, (1) a (meth) acrylate having a water-repellent group containing neither an organo (poly) siloxane group nor an organic fluorine compound group is used as an essential component as the water-repellent copolymer component.
The component (A) may be present in the form of the (meth) acrylic copolymer itself in the stain resistance imparting agent of the present invention. Can be combined in advance. Hereinafter, description will be made in the order of (1) to (4).
[0011]
(1) Examples of the copolymer component having a water-repellent group include (meth) acrylates having an alkyl group or a polycycloalkyl group having 10 or more carbon atoms, preferably 12 or more carbon atoms. Some specific examples include, for example, decyl (meth) acrylate, dodecyl (meth) acrylate, stearyl (meth) acrylate, behenyl (meth) acrylate, tricyclodecene monomethanol mono (meth) acrylate, and the like. . An alkyl group or a monocycloalkyl group having less than 10 carbon atoms is not preferable because water repellency is not sufficient. The upper limit of the number of carbon atoms is not particularly limited from the viewpoint of water repellency, but is practically selected from a range of about 30. If silicon (mainly polydimethylsiloxane) or fluorine (mainly perfluoroalkyl group), which is generally used as a water-repellent group, is used, oil repellency as well as water repellency occur simultaneously. It is important to use a copolymer component containing no.
(2) High rigidity copolymer component
In the case of the homopolymer of (meth) acrylate obtained by polymerizing only the water-repellent copolymer component (1), problems such as a decrease in hardness are likely to occur. Therefore, styrene, α-methylstyrene, methyl (meth) acrylate, (meth) It is preferable to copolymerize a radical copolymerizable monomer capable of giving a relatively hard polymer such as ethyl acrylate and butyl (meth) acrylate.
(3) Hydrophilic copolymer component
Further, copolymerization of a radical copolymerizable monomer having a hydrophilic group may be preferable because hydrophilicity is appropriately imparted. For example, the following hydrophilization technique can be exemplified.
(I) Introduction of polyalkylene glycol group
(Ii) Introduction of OH group or carboxylic acid group, sulfonic acid group, phosphoric acid group and salts thereof
[0012]
(I) Introduction of polyalkylene glycol group
For the above introduction, copolymerization of a radical polymerizable monomer having a polyalkylene glycol group in a side chain is preferable. Specific examples of such a monomer include polyethylene glycol mono (meth) acrylate, polypropylene glycol mono (meth) acrylate, and poly (ethylene glycol / propylene glycol) mono (meth) acrylate. These can be obtained, for example, from NOF Corporation under the trade name of Blemmer.
[0013]
(Ii) Introduction of OH group or carboxylic acid group, sulfonic acid group, phosphoric acid group and salts thereof
For the above introduction, copolymerization of a radical polymerizable monomer having these groups is preferable. For example, as a monomer into which an OH group can be introduced, hydroxyethyl (meth) acrylate, hydroxypropyl (meth) acrylate, hydroxybutyl (meth) acrylate and the like can be exemplified.
Examples of the monomer into which a carboxylic acid group can be introduced include acrylic acid, methacrylic acid, methacryloyloxyethyl phthalic acid, and the like. Examples of the monomer into which a sulfonic acid group can be introduced include styrene sulfonic acid. Monomers capable of introducing a phosphate group include mono (meth) acrylate phosphate.
These alkali (earth) metal salts, quaternary ammonium salts, and the like are also effective for imparting hydrophilicity.
[0014]
(4) Component (A) bonded to inorganic oxide fine particles
When it is desired to further impart hardness and hydrophilicity, it is sometimes more preferable to bond the copolymer of the component (A) to the inorganic oxide fine particles.
Although there are several methods for bonding to the inorganic oxide fine particles, the following method is most preferable.
First, mercaptosilane is bound to inorganic oxide fine particles to prepare inorganic oxide fine particles having a mercapto group. When the copolymerizable monomers (1), (2), and (3) constituting the copolymer (A) are radically copolymerized in the presence of such oxide fine particles, the inorganic oxide fine particles having a mercapto group become a polymerization terminator ( (A chain transfer agent), resulting in a form in which the copolymer (A) is bonded to the surface of the inorganic oxide fine particles.
[0015]
The inorganic oxide is not particularly limited, but is preferably an oxide of silicon, aluminum, zirconium, titanium, zinc, lead, germanium, indium, tin, antimony, cerium, lithium or a composite oxide thereof, and specifically, , Silicon oxide (silica), aluminum oxide (alumina), silicon-aluminum composite oxide, zirconium oxide (zirconia), titanium oxide (titania), zinc oxide, tin oxide, antimony-doped oxide Examples thereof include tin, indium-tin composite oxide (ITO), cerium oxide, and silica-lithium oxide composite oxide. Silica or those containing it as a main component are particularly preferred.
The shape of the inorganic oxide fine particles is spherical, hollow, porous, rod-like, fibrous, plate-like or irregular, and among them, spherical is preferable. The primary particle diameter of the metal oxide is preferably from 1 to 100 nm. If the primary particle size is less than 1 nm, the effect of improving mechanical properties is small, while if it is 100 nm or more, secondary aggregation is likely to occur, and transparency and the like are lost, which is not preferable.
These inorganic oxide fine particles can be obtained in a dried powder state or in a state of being dissolved or dispersed in water or an organic solvent. Among them, in order to exhibit excellent dispersibility, it is preferable to use a sol dissolved or dispersed in water or an organic solvent. Typically, an aqueous silica sol dissolved in water, an organic solvent having an OH group, or an organosilica sol dissolved or dispersed in a polar solvent having a ketone group is most preferably used as a main component. As the aqueous silica sol, ST-20 (basic aqueous silica sol, manufactured by Nissan Chemical Industries, Ltd.), ST-O (acidic aqueous silica sol, manufactured by Nissan Chemical Industries, Ltd.), ST-AK (weakly acidic) Aqueous silica / alumina sol, manufactured by Nissan Chemical Industries, Ltd.) and lithium silicate (basic silica / lithium oxide sol, manufactured by Nissan Chemical Industries, Ltd.). Representative examples of the organosilica sol include IPA-ST (isopropanol (IPA) dispersed organosilica sol, manufactured by Nissan Chemical Industries, Ltd.) and MEK-ST (methyl ethyl ketone (MEK) dispersed organosilica sol, manufactured by Nissan Chemical Industries, Ltd.) Or a sol obtained by using these as a raw material and replacing the solvent with an organic solvent having another OH group (for example, a PGM-dispersed organosilica sol or the like).
The solid content in the dispersion is usually 5 to 50% by weight, preferably 10 to 40% by weight, which is easy to handle and easily available.
[0016]
Examples of the mercaptosilane (silane coupling agent having a mercapto group) include, for example, trimethoxysilylpropyl mercaptan (for example, available from Shin-Etsu Chemical Co., Ltd. under the trade name of KBM803, and from Toray Dow Corning Silicone Co., Ltd. under the trade name of SH6062). And the like. In addition, trialkoxysilylalkyl mercaptans such as triethoxysilylpropylmercaptan and trimethoxysilylethylmercaptan, dialkoxyalkylsilylalkylmercaptans such as methyldimethoxysilylpropylmercaptan and methyldiethoxysilylpropylmercaptan may be used.
[0017]
The reaction and bonding can be achieved by various methods generally used in the production of this type of compound. Basically, a method of hydrolyzing an alkoxysilyl group to generate a silanol group, and performing a condensation reaction with an alkoxy group and / or a hydroxyl group on the surface of the inorganic oxide to bond them is common.
Water is used in a range that does not impair the performance of the coating film and the stability of the coating solution, and the amount is usually 1 to 400 mol%, preferably 30 to 200 mol%, based on the alkoxysilyl group. If the amount is less than 1 mol%, hydrolysis and condensation reaction hardly occur, and if it is more than 400 mol%, gelation or the like is apt to occur, which is not preferable. The water used includes distilled water, ion-exchanged water, industrial water, and soft water.
[0018]
Further, in order to accelerate the hydrolysis and condensation reactions, it is also possible to add an acid or an alkali, or another appropriate compound as a catalyst. Various types of these can be used as long as they do not impair the performance of the coating film and the performance of the coating liquid. For example, acid catalysts include hydrogen chloride solution, phosphoric acid solution, inorganic acids such as boric acid, organic acids such as citric acid, maleic acid, acetic acid, and paratoluenesulfonic acid, and alkali catalysts include alcoholic potassium hydroxide, ammonia, and trialkylamines. And heterocyclic-containing amines such as dimethylaminopyridine. In addition, a metal acetylacetone complex such as aluminum triacetylacetonate is also effective.
The amount is 0.1 to 5 parts by weight, preferably 0.5 to 5 parts by weight, based on 100 parts by weight of the mercapto group-containing silane coupling agent.
[0019]
The weight ratio of the inorganic oxide fine particles to the mercaptosilane is from 100 / 0.1 to 100/10, preferably from 100/1 to 100/5. When this ratio is larger than 100 / 0.1, the content of the mercapto group introduced into the inorganic oxide fine particles is low, and as a result, the proportion of the inorganic oxide fine particles having substantially no mercapto group introduced therein increases, Not preferred. On the other hand, if it is smaller than 100/10, the content of the mercapto group contained in the inorganic oxide fine particles is too high, and the molecular weight of the copolymer may be significantly reduced, or conversely, insolubilization may occur due to crosslinking and gelation, Not preferred.
[0020]
In preparing the (meth) acrylic copolymer (A) of the component (A), the above-mentioned (1) water-repellent copolymer component, (2) high-rigidity copolymer component, and (3) hydrophilic copolymer component And (4) the inorganic oxide fine particles, (1) the water-repellent copolymer component is 5 to 60% by weight, preferably 10 to 50% by weight, and (2) the high-rigidity copolymer component is 5 to 80% by weight, preferably 10 to 70% by weight, (3) the hydrophilic copolymer component is 0 to 40% by weight, preferably 0 to 25% by weight, and (4) the inorganic oxide fine particles are 0 to 40% by weight, preferably, in terms of solid matter. It is used in the range of 0 to 30% by weight.
[0021]
In the copolymerization, it is generally preferable to use a solvent in order to improve the uniformity. Examples of such a solvent include alcohol solvents such as methanol, ethanol, isopropanol (IPA) and isobutanol; ketone solvents such as acetone, methyl ethyl ketone (MEK) and methyl isobutyl ketone (MIBK); tetrahydrofuran, dioxane, methoxyethanol, and ethylene glycol monoester. Ether solvents such as ethyl ether, ethylene glycol dimethyl ether and propylene glycol monomethyl ether; carboxylic acid ester solvents such as methyl acetate, ethyl acetate, propyl acetate, butyl propionate and butyl butyrate; propylene glycol monomethyl ether acetate (PGMAc); -Ether ester solvents such as ethoxyethyl acetate, aromatic hydrocarbon solvents such as benzene, toluene and xylene, dimethylform Bromide, organic solvents such as dimethylacetamide is used. Further, water may be added within a range where the uniformity of the reaction system is not impaired.
[0022]
The method of mixing and dissolving the copolymerization component and the solvent is not particularly limited, but it is important to add a radical polymerization initiator within a certain period of time, preferably within three hours after mixing, to start polymerization. After mixing, if left without a radical polymerization initiator, the Michael addition reaction of a mercapto group to a radical polymerizable functional group (double bond) proceeds as a side reaction, especially when the component (4) is contained. When the polymerization is started after 3 hours or more, the physical properties of the copolymer greatly change, which may be undesirable.
[0023]
As the radical polymerization initiator, a known initiator generally used for radical polymerization can be used. Representative examples include organic peroxides such as benzoyl peroxide, di-t-butyl peroxide, cumene hydroperoxide, 2,2′-azobisbutyronitrile, and 2,2′-azobis (2,4 -Azo compounds such as -dimethylvaleronitrile) (V65) and 2,2'-azobis (4-methoxy-2,4-dimethylvaleronitrile) are particularly preferably used. The total concentration of the monomers (including the component D) in the polymerization liquid is usually 10 to 60% by weight, and the polymerization initiator is usually 0.1 to 10% by weight, preferably 0.1 to 10% by weight, based on the monomer mixture. It is used in an amount of 2 to 2% by weight.
[0024]
The preferred polymerization temperature varies depending on the radical polymerization initiator used, but the polymerization temperature is 20 to 150 ° C and the polymerization time is 1 to 72 hours.
[0025]
When radical polymerization is carried out by allowing mercaptosilane to coexist with a mixture of copolymerized monomers constituting the (meth) acrylic copolymer (A), the mercaptosilane acts as a chain transfer agent, and a copolymer having a silane group at the terminal is obtained. A combination (A) is obtained. The silane-terminated copolymer (A) may be bonded to inorganic oxide fine particles. In such a case, the same method as described above can be employed for the copolymerization method and the method of bonding to the inorganic oxide fine particles.
[0026]
In order to make the stain resistance imparting agent of the present invention curable with an active energy ray, (B) a polyfunctional (meth) acrylate compound is used.
[0027]
The polyfunctional (meth) acrylate compound is not particularly limited as long as it is a compound having three or more (meth) acryloyl groups in one molecule. Typical examples thereof include pentaerythritol tri (meth) acrylate, pentaerythritol tetra Examples include (meth) acrylate, dipentaerythritol penta (meth) acrylate, dipentaerythritol hexa (meth) acrylate, ditrimethylolpropanetetra (meth) acrylate, polyester (meth) acrylates, and polyfunctional urethane (meth) acrylates. can do.
[0028]
In the stain resistance imparting agent curable by an active energy ray, (C) a photopolymerization initiator is blended in order to accelerate the curing of the (B) polyfunctional (meth) acrylate compound.
[0029]
Examples of such a photopolymerization initiator include benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin isobutyl ether, diethoxyacetophenone, benzyldimethyl ketal, 2-hydroxy-2-methylpropiophenone, 1-hydroxycyclohexylphenyl ketone, Benzophenone, 2,4,6-trimethylbenzoindiphenylphosphine oxide, 2-methyl- [4- (methylthio) phenyl] -2-morpholino-1-propanone, 2-benzyl-2-dimethylamino-1- (4-morpho (Linophenyl) -butan-1-one, Michler's ketone, isoamyl N, N-dimethylaminobenzoate, 2-chlorothioxanthone, 2,4-diethylthioxanthone and the like. The initiator may be appropriately used in combination of two or more thereof.
The photopolymerization initiator (C) is used in an amount of 10% by weight or less, preferably 1 to 5% by weight, of the sum of the polymerizable components (A), (B) and (D).
[0030]
(D) Inorganic oxide fine particles having a (meth) acryloyl group bonded to the surface of the inorganic oxide fine particles via a -O-Si-R- bond
In addition, as the inorganic oxide fine particles here, those similar to the inorganic oxide fine particles bonded to the component (A) described above can be used.
[0031]
(D-1) Silane coupling agent having (meth) acryloyl group
In order to bond a group having a (meth) acryloyl group to the surface of the inorganic oxide fine particles via a -O-Si-R- bond, a silane coupling agent having a (meth) acryloyl group is usually used. One such compound is a silane coupling agent having a molecular weight of 300 or more and containing at least one (meth) acryloyl group as a radically polymerizable functional group. The number is not particularly limited, but preferably has 1 to 5 polymerizable functional groups per molecule. The position is not particularly limited, but is preferably at the end of the molecule.
The compound is preferably an organic compound having a functional group represented by the formula (1) at the same time.
(Wherein X and Y are each independently an oxygen atom, a sulfur atom or an imino group).
[0032]
The functional group represented by the formula (1) has an effect of generating excessive cohesive force due to hydrogen bonding between molecules, imparting mechanical strength, adhesion to a substrate, heat resistance, and the like, and has an inorganic oxide surface. Also acts as a spacer between the and the radical polymerizable functional group. Specifically, functional groups of the following formula (2) can be exemplified.
-OCONH-, -SCONH-, -SCSNH-, -OCSNH-, -NHCONH-, -NHCSNH- (2)
Among these groups, -OCONH- and -SCONH- are particularly preferable from the viewpoint of thermal stability and ease of synthesis.
This compound may be an organic compound having a thioether group at the same time. The thioether group also seems to act as a spacer between the silica surface and the radical polymerizable functional group or a specific polar functional group, and has an effect of suppressing excessive aggregation.
[0033]
As the functional group of the silane coupling agent capable of binding to the inorganic oxide, an alkoxysilyl group, which is a group capable of forming a silanol group, is particularly preferable. Examples of the alkoxysilyl group include a monoalkoxysilyl group, a dialkoxysilyl group, and a trialkoxysilyl group, and among them, a trialkoxysilyl group of a lower alcohol such as a trimethoxysilyl group or a triethoxysilyl group has reactivity. It is particularly preferable when considered. The position of these groups in the molecule is preferably at the molecular end opposite to the polymerizable unsaturated group. Further, the number of groups in one molecule is preferably 1 to 3, particularly preferably 1.
[0034]
The silanol group or the silanol group-forming unit is a unit that bonds to the inorganic oxide fine particles by a condensation reaction or a condensation reaction that occurs after hydrolysis. Some preferred examples of such a compound (D-1) are as follows:
(1) a compound in which a (meth) acrylate compound having an OH group and a trialkoxysilane having an NCO group are connected by an -OCONH- bond;
{Circle around (2)} The trialkoxysilane compound having an SH group and one of the NCO groups of the diisocyanate are connected by an -NHCOS- bond, the remaining NCO group is acted on by a (meth) acrylate compound having an OH group, and the -NCOO- bond is used. Connected compounds,
(3) a compound in which a (meth) acrylate compound having an NCO group and a trialkoxysilane having an SH group are connected via an -NHCOS- bond,
{Circle around (4)} A compound containing two or more (meth) acryloyl groups in the molecule and a trialkoxysilane having an SH group form a thioether bond formed by a Michael addition reaction of the SH group to the (meth) acryloyl group. Connected compounds,
(5) a compound obtained by reacting a mono (meth) acrylate of α, ω-hydroxy-terminated polyalkylene glycol with a silane coupling agent having an NCO group;
And the like, but are not limited thereto.
[0035]
Examples of the (meth) acrylate having an OH group include mono (meth) acrylate (for example, hydroxyethyl acrylate, hydroxyethyl methacrylate, hydroxypropyl acrylate, hydroxypropyl methacrylate, etc.), di (meth) acrylate (for example, glycerin di (meth) acrylate). A) acrylate, trimethylolpropane di (meth) acrylate, etc.), and tri-poly (meth) acrylates (eg, pentaerythritol triacrylate, dipentaerythritol tri-pentaacrylate, ditrimethylolpropane triacrylate, etc.). .
[0036]
Examples of the trialkoxysilane compound having an NCO group include triethoxysilylpropyl isocyanate (for example, available under the trade name of KBE9007 from Shin-Etsu Chemical Co., Ltd.), trimethoxysilylpropyl isocyanate, or trimethoxysilylpropyl mercaptan (for example, Shin-Etsu Chemical Co., Ltd.) One of trialkoxysilylalkyl mercaptans such as KBM803 (trade name of Toray Dow Corning Silicon Co., Ltd. under the trade name of SH6062) and diisocyanate (for example, isophorone diisocyanate, hexamethylene diisocyanate, MDI, TDI, etc.). Compounds in which an NCO group is connected by a thiourethane bond can be exemplified.
[0037]
A method for producing an —OCONH— bond by a reaction between an OH group and an NCO group is obtained by blending each compound at a ratio of NCO group / OH group ≦ 1, and mixing and stirring at 60 to 100 ° C. for 1 to 20 hours. Can be In this reaction, it is preferable to use a polymerization inhibitor such as, for example, hydroquinone, hydroquinone monomethyl ether, catechol, pt-butylcatechol, and phenothiazine in order to prevent polymerization due to a (meth) acroylyl group during the reaction. The amount is from 0.01 to 1% by weight, preferably from 0.05 to 0.5% by weight, based on the reaction mixture. In order to accelerate the reaction, a known reaction catalyst such as di-n-butyltin dilaurate or diazabicyclooctane (generally abbreviated as DABCO) may be added. Further, this reaction is carried out, for example, ketone solvents such as methyl ethyl ketone and methyl isobutyl ketone, ether solvents such as ethylene glycol diethyl ether and diethylene glycol dimethyl ether, carboxylic acid ester solvents such as ethyl acetate and butyl acetate, and aromatic solvents such as xylene and toluene. The reaction can be carried out in a solvent containing no group capable of reacting with an isocyanate group, such as a hydrocarbon solvent, or simultaneously, in the presence of a polyfunctional acrylate having three or more (meth) acryloyl groups in the molecule.
[0038]
Examples of the (meth) acrylate compound having an NCO group include β-isocyanatoethyl (meth) acrylate (methacrylate is available from Showa Denko KK under the trade name of Karenz MOI) or (meth) acrylates having an OH group. And a compound in which one of NCO groups of diisocyanate (for example, isophorone diisocyanate, hexamethylene diisocyanate, MDI, TDI and the like) is connected by a urethane bond.
[0039]
Examples of the trialkoxysilane compound having an SH group include, for example, trimethoxysilylpropyl mercaptan (available under the trade name of KBM803 from Shin-Etsu Chemical Co., Ltd. and under the trade name of SH6062 from Toray Dow Corning Silicone Co., Ltd.). be able to.
[0040]
The method for forming an -NHCOS- bond by the reaction between the NCO group and the SH group can be performed in the same manner as the method for forming the -NHCOO- bond by the reaction between the NCO group and the OH group.
Examples of the mono (meth) acrylate compound of α, ω-hydroxy-terminated polyalkylene glycol include polyethylene glycol mono (meth) acrylate, polypropylene glycol mono (meth) acrylate, polytetramethylene glycol mono (meth) acrylate, and poly (ethylene). (Propylene) glycol mono (meth) acrylate, poly (ethylene / tetramethylene) glycol mono (meth) acrylate, and the like.
[0041]
The reaction of a mono (meth) acrylate compound of an α, ω-hydroxy-terminated polyalkylene glycol with a trialkoxysilyl compound having an NCO group is carried out in the same manner as the formation of a -NHCOO- bond by the reaction between an NCO group and an OH group. be able to.
[0042]
The reaction and bonding between (D-1) and the inorganic oxide fine particles can be performed in the same manner as in the case of mercaptosilane and inorganic oxide fine particles described above. The same applies to the use method and amount of water and catalyst.
[0043]
Separately, among components capable of synthesizing (D-1), an alkoxysilyl compound having a functional group capable of generating a bonding group represented by the formula (1) or (2) is first added to the inorganic oxide fine particles. After the reaction, there is a method in which another compound is reacted to introduce a polymerizable unsaturated group and a bonding group represented by the formula (1) or (2). In the formula (1), the trialkoxysilane compound having an SH group as the compound having an alkoxysilyl group can be reacted with the inorganic oxide fine particles in advance.
[0044]
For example, a trialkoxysilane having an SH group is reacted with an inorganic oxide, and then the SH group is reacted with a diisocyanate compound. One of the NCO groups is connected by an -NHCOS- bond, and the other NCO group is connected to an OH group. (Meth) acrylate compound having the formula (1), and connecting by a -NHCOO- bond to obtain a structure similar to that of the above method (3).
[0045]
Further, by reacting a trialkoxysilane having an SH group with an inorganic oxide and then reacting with a (meth) acrylate compound and / or a (meth) acrylamide compound having an NCO group, a structure similar to the above (4) is obtained. Can be obtained.
[0046]
The reaction ratio between the inorganic oxide fine particles and (D-1) is usually 90/10 to 5/95, preferably 80/20 to 10/90 by weight. When inorganic oxide fine particles / (D-1)> 90/10, the surface protection of the inorganic oxide is insufficient, which is not preferable. On the other hand, when inorganic oxide fine particles / (D-1) <5/95. However, it is not preferable because polymerization of the alkoxysilane itself, instability of the dispersion state due to crosslinking, and a significant increase in viscosity are caused. The molecular weight of (D-1) is desirably 300 or more. If it is less than 300, the effect of forming the protective colloid is small, or the silane coupling agent itself is condensed, and aggregation or gelation due to cross-linking or the like is liable to occur.
[0047]
The reaction is carried out at room temperature to 100 ° C. for 1 to 100 hours, preferably at room temperature for 4 hours or more, followed by heating at room temperature to 70 ° C. for 1 to 10 hours to progress the reaction. The reaction system may be diluted with a solvent in order to suppress a side reaction. The solvent used is preferably a silane alkoxide or water which is a hydrolyzate, and those having compatibility with a catalyst, for example, alcohols such as methanol, ethanol, isopropanol and isobutanol, acetone, methyl ethyl ketone, methyl isobutyl ketone and the like. Examples thereof include ketones, ethers such as THF and dioxane, and OH-containing ethers such as propylene glycol monomethyl ether.
[0048]
Further, a part (less than 50% by weight) of (D-1) may be replaced with another silane coupling agent. Other silane coupling agents include, in addition to various known commercially available silane coupling agents, a silane coupling agent having a polyalkylene glycol structure having no radically polymerizable functional group, having a carboxylic acid group or a carboxylic ester group. Examples thereof include a silane coupling agent, a silane coupling agent having an alicyclic structure, and a silane coupling agent obtained by reacting a bulky alcohol having a branched structure with an alkoxysilyl group having an NCO group.
[0049]
Apart from these, inorganic oxide fine particles having a polymer having a polymerizable functional group, in which the side chain of (D) is a silyl ether group represented by the following formula (3), can be used.
-O-Si-RS-Poly (3)
Here, R is an alkylene group having 2 to 10 carbon atoms which may have a branch, and Poly is a polymer unit having at least one (meth) acryloyl group.
The method for producing the inorganic oxide fine particles is not particularly limited, but is preferably produced by the following method.
(First method)
First, a mercapto group-containing silane coupling agent and inorganic oxide fine particles are hydrolyzed and condensed to synthesize inorganic oxide fine particles having a mercapto group (Step 1-1).
[0050]
As the inorganic oxide fine particles, for example, an inorganic material containing inorganic oxide fine particles having a particle diameter of 1 to 100 nm as a solid content of 10 to 40% as a dispersion medium using water and various organic solvents or a mixed solvent thereof. Oxide fine particles are preferred. Specific examples of the organic solvent and the inorganic oxide fine particles are the same as those described above.
[0051]
The hydrolytic condensation reaction between the mercapto group-containing silane coupling agent and the inorganic oxide fine particles is performed by adding water to the mixture. The alkoxysilyl group of the mercapto group-containing silane coupling agent is hydrolyzed with water to generate a silanol group, and a condensation reaction occurs between the silanol and the OH group on the surface of the inorganic oxide fine particles, and has a mercapto group on the surface. Inorganic oxide fine particles are obtained. The amount of water to be added may be an amount at which the alkoxysilyl group of the mercapto group-containing silane coupling agent can be hydrolyzed by 100% as a theoretical amount or more, and is equivalent to 100 to 300%, preferably 100 to 200%. Is added.
[0052]
In order to accelerate this hydrolysis reaction, a hydrolysis catalyst can be added to the reaction system. As the hydrolysis reaction, for example, aluminum acetylacetone, boric acid tributoxide, hydrochloric acid, acetic acid, nitric acid, maleic acid, fumaric acid, oxalic acid, dibutyltin dioctate, p-toluenesulfonic acid, and mixtures thereof are used. Can be. The amount is 0.1 to 5 parts by weight, preferably 0.5 to 5 parts by weight, based on 100 parts by weight of the mercapto group-containing silane coupling agent.
[0053]
The reaction is carried out at 20 to 100 ° C. for 1 to 100 hours, preferably at 20 to 25 ° C. for 4 hours or more, followed by heating at 40 to 70 ° C. for 1 to 10 hours to advance the reaction. Further, the reaction system may be diluted with a solvent in order to suppress a side reaction. The solvent used is preferably water, which has good compatibility with the catalyst.Examples include alcohols such as methanol, ethanol, isopropanol and isobutanol, ketones such as acetone, methyl ethyl ketone and methyl isobutyl ketone, and tetrahydrofuran and dioxane. Examples thereof include ethers and hydroxyl group-containing ethers such as propylene glycol monomethyl ether.
The weight ratio of the mercapto group-containing silane coupling agent to the inorganic oxide fine particles (solid content) in the reaction system is preferably 0.1 / 99.9 to 10/90, and is preferably 1/99 to 5/95. More preferably, there is. When the weight ratio of the mercapto group-containing silane coupling agent is less than 0.1, the amount of mercapto groups bonded to the inorganic oxide fine particles decreases, and the number of sites bonded to the epoxy group-containing polymer decreases. Inorganic oxide microparticles with the coalescence tend to be unable to be produced stably. On the other hand, even if the weight ratio of the mercapto group-containing silane coupling agent exceeds 10, the ratio of the bonding site to the epoxy group-containing polymer is already sufficient, and the use of a mercapto group-containing silane coupling agent with a higher amount is required. It is not practical.
[0054]
Next, in the presence of the inorganic oxide fine particles having a mercapto group produced in the first step, at least one monomer having an epoxy group and one radical polymerizable group is radically copolymerized ( 1-2 step).
By performing radical polymerization of the monomer in the presence of the inorganic oxide fine particles having a mercapto group, a chain of the radical of the monomer of the growth reaction and the mercapto group bonded to the inorganic oxide fine particles during the polymerization process. A transfer reaction occurs, and the polymer and the inorganic oxide fine particles are bonded via a sulfide bond. At this time, the epoxy group in the monomer is maintained as it is.
As a monomer having an epoxy group and one radical polymerizable group (hereinafter sometimes referred to as “monomer having an epoxy group”) used in the second step, glycidyl (meth) acrylate, 3 And 4-epoxycyclohexyl (meth) acrylate.
If necessary, the monomer having an epoxy group can be radically copolymerized with another monomer. Other monomers are not particularly limited as long as they do not react with the epoxy group.
[0055]
The monomer (the monomer having an epoxy group and optionally another monomer used in combination) and the inorganic component (solid content of the inorganic fine particles) are subjected to a polymerization reaction in a weight ratio of 30/70 to 95/5. The polymerization reaction is more preferably performed at 50/50 to 90/10. If the weight ratio of the inorganic component exceeds 70, stable inorganic oxide fine particles cannot be obtained, and if it is less than 5, the abrasion resistance tends to be insufficient.
[0056]
This radical polymerization reaction is carried out in a solvent using a usual radical polymerization initiator.
As the solvent, any organic solvent used at the time of copolymerization of the component (A) can be used, and the same applies to the polymerization initiator.
[0057]
Next, a compound having a carboxyl group and a (meth) acryloyl group is added to the polymer synthesized in the second step (step 1-3).
Examples of the compound having a carboxyl group and a (meth) acryloyl group (hereinafter, referred to as “(meth) acryloyl group-introducing reagent”) used in the third step include (meth) acrylic acid, 2- (meth) acryloyloxy Adducts of ethyl succinic acid, 2- (meth) acryloyloxyethyl hexahydrophthalic acid, pentaerythritol tri (meth) acrylate and acid anhydrides such as succinic anhydride, phthalic anhydride and hexahydrophthalic anhydride; dipentaerythritol pentane Adducts of (meth) acrylate and acid anhydrides such as succinic anhydride, phthalic anhydride and hexahydrophthalic anhydride can be given. In the third step, the epoxy group of the polymer reacts with the carboxyl group of the (meth) acryloyl group introduction reagent. The polymer and the (meth) acryloyl group-introducing reagent are preferably mixed at a ratio where the epoxy group / carboxyl group is 1 or more, more preferably 1 to 10.
[0058]
The reaction is preferably performed at 50 to 110 ° C for 3 to 50 hours. In this reaction, a known catalyst such as triethylamine, tributylamine, triethylenediamine, N, N-dimethylbenzylamine, benzyltrimethylammonium chloride, and triphenylphosphine can be used to promote the reaction. The amount used is preferably from 0.01 to 2% by weight, more preferably from 0.05 to 1% by weight, based on the reaction mixture.
[0059]
In this reaction, it is preferable to use a polymerization inhibitor such as, for example, hydroquinone, hydroquinone monomethyl ether, catechol, pt-butylcatechol, and phenothiazine in order to prevent radical polymerization by (meth) acryloyl group. The use amount of the polymerization inhibitor is preferably from 0.01 to 1% by weight, more preferably from 0.05 to 5% by weight, based on the reaction mixture.
In some cases, it is desirable to further add a solvent for the purpose of improving coatability.
[0060]
The solvent used may be various reaction solvents used in each production step of the inorganic oxide fine particles, for example, a dispersion medium of the inorganic oxide fine particles used in the first step, The solvent used in the reaction of the second step may be used. Further, it may be a solvent used for adjusting the viscosity after producing the inorganic oxide fine particles.
[0061]
As another method for producing inorganic oxide fine particles having a polymer having a polymerizable functional group, wherein the side chain of (D) is a silyl ether group represented by the above formula (3), the following method (No. Method 2) may be preferable because the purity of the product is high.
[0062]
(Second method)
In the presence of an alkoxysilane having a mercapto group, at least one monomer having an epoxy group and one radical polymerizable group is radically copolymerized (Step 2-1).
By performing radical polymerization of the monomer in the presence of an alkoxysilane having a mercapto group, a chain transfer reaction between the radical of the monomer for the growth reaction and the mercapto group occurs in the polymerization process, via a sulfide bond. Thus, an alkoxysilyl group is introduced into the terminal of the polymer. At this time, the epoxy group in the monomer is maintained as it is.
Examples of the monomer having an epoxy group and one radical polymerizable group used in the first step (hereinafter sometimes referred to as “monomer having an epoxy group”) include glycidyl (meth) acrylate, And 4-epoxycyclohexyl (meth) acrylate.
If necessary, the monomer having an epoxy group can be radically copolymerized with another monomer. Such other monomers are not particularly limited as long as they are radically polymerizable.
The mercapto group-containing alkoxysilane is the same as that described for the component (A) as long as it has a mercapto group and an alkoxysilyl group in one molecule, and its structure is not particularly limited.
[0063]
When another monomer is used in combination with the monomer having an epoxy group, the weight ratio of the monomer having the epoxy group and the other monomer is 100/0 to 10/90. It is preferably used in a ratio of 100/0 to 30/70. If the proportion of the monomer having an epoxy group is less than 10% by weight, the amount of the (meth) acryloyl group introduced in the third step described later will be small, and sufficient abrasion resistance cannot be obtained. There are cases.
[0064]
This radical polymerization reaction is carried out in a solvent using a usual radical polymerization initiator.
The weight ratio of the monomer to the alkoxysilane having a mercapto group is 99.5 / 0.5 to 90/10, preferably 99/1 to 93/7. When the weight ratio of the alkoxysilane having a mercapto group is less than 0.5, the number of alkoxysilyl groups introduced into the terminal is small, and sufficient functional groups to modify the surface of the inorganic oxide fine particles are present. Is hard to say. On the other hand, if the molecular weight is 10 or more, the molecular weight of the obtained copolymer is too small, which may be unfavorable in physical properties. As the solvent for polymerization, the same organic solvent as in the case of preparing the component (A) is used.
[0065]
The radical polymerization initiator used in the polymerization reaction is the same as in the case of preparing the component (A).
[0066]
Next, a compound having a carboxyl group and a (meth) acryloyl group is added to the polymer synthesized in the first step (Step 2-2).
Examples of the compound having a carboxyl group and a (meth) acryloyl group (hereinafter referred to as “(meth) acryloyl group-introducing reagent”) used in the second step include, for example, (meth) acrylic acid, 2- (meth) acryloyloxy Adducts of ethyl succinic acid, 2- (meth) acryloyloxyethyl hexahydrophthalic acid, pentaerythritol tri (meth) acrylate and acid anhydrides such as succinic anhydride, phthalic anhydride and hexahydrophthalic anhydride; dipentaerythritol pentane Adducts of (meth) acrylate and acid anhydrides such as succinic anhydride, phthalic anhydride and hexahydrophthalic anhydride can be given. In the second step, the epoxy group of the polymer reacts with the carboxyl group of the (meth) acryloyl group introduction reagent. The polymer and the (meth) acryloyl group-introducing reagent are preferably mixed at a ratio where the epoxy group / carboxyl group is 1 or more, more preferably 1 to 10.
[0067]
The reaction is preferably performed at 50 to 110 ° C for 3 to 50 hours. In this reaction, a known catalyst such as triethylamine, tributylamine, triethylenediamine, N, N-dimethylbenzylamine, benzyltrimethylammonium chloride, and triphenylphosphine can be used to promote the reaction. The amount used is preferably from 0.01 to 2% by weight, more preferably from 0.05 to 1% by weight, based on the reaction mixture.
[0068]
In this reaction, it is preferable to use a polymerization inhibitor such as, for example, hydroquinone, hydroquinone monomethyl ether, catechol, pt-butylcatechol, and phenothiazine in order to prevent radical polymerization by (meth) acryloyl group. The use amount of the polymerization inhibitor is preferably from 0.01 to 1% by weight, more preferably from 0.05 to 5% by weight, based on the reaction mixture.
In some cases, it is desirable to further add a solvent for the purpose of improving coatability.
[0069]
The solvent used may be various reaction solvents used in each of the production steps of the inorganic oxide fine particles, for example, the solvent used in the first step, or the solvent used in the second step. It may be a solvent used for the reaction. Further, it may be a solvent used for adjusting the viscosity.
[0070]
Next, inorganic oxide fine particles are hydrolyzed and condensed with the alkoxysilyl group of the polymer obtained in the second step to synthesize inorganic oxide fine particles having a predetermined structure (step 2-3).
[0071]
Here, as the inorganic oxide fine particles, the same ones as used when preparing the component (A) are used.
[0072]
In the reaction and bonding between the polymer obtained in the step 2-2 and the inorganic oxide fine particles, the mode of use of water, a catalyst, an organic solvent, and the like, the reaction mode, and the like are the same as those of the component (A).
[0073]
The reaction is carried out at 20 to 100 ° C. for 1 to 100 hours, preferably at 20 to 25 ° C. for 4 hours or more, followed by heating at 40 to 70 ° C. for 1 to 10 hours to advance the reaction. Further, the reaction system may be diluted with a solvent in order to suppress a side reaction. As the solvent to be used, water to be used and those having good compatibility with the catalyst are preferable, for example, alcohols such as methanol, ethanol, isopropanol and isobutanol, ketones such as acetone, methyl ethyl ketone and methyl isobutyl ketone, tetrahydrofuran and dioxane. And hydroxyl-containing ethers such as propylene glycol monomethyl ether.
The weight ratio between the alkoxysilyl group-containing polymer and the inorganic oxide fine particles (solid content) in the reaction system is preferably from 30/70 to 95/5, more preferably from 50/50 to 90/10. preferable. If the weight ratio of the inorganic component exceeds 70, stable inorganic oxide fine particles cannot be obtained, and if it is less than 5, the abrasion resistance tends to be insufficient.
[0074]
The composition of the present invention can be used as it is as a stain resistance imparting agent. However, for the purpose of improving the properties of the coating film, if necessary, for example, an ultraviolet absorber (for example, benzotriazole type, benzophenone type, salicylic acid type, cyanoacrylate type) UV absorbers), antioxidants (eg, hindered phenol, sulfur, phosphorus antioxidants), light stabilizers (eg, hindered amine light stabilizers), antiblocking agents, slip agents, leveling agents, etc. The various additives incorporated in the various compositions can be incorporated in the composition for forming the film in an amount of 0.01 to 2% by weight, respectively.
Further, for adjusting the viscosity of the stain resistance imparting agent (coating composition), the same organic solvent used in the production of the polymer can be used. In addition, if necessary, other polymers, radically polymerizable monomers, oligomers, and the like can be added within a range that does not impair the physical properties of the coating film that can be realized in the present invention.
[0075]
The stain resistance-imparting agent according to the present invention can be used, for example, on a plastic substrate such as a polyester such as polyethylene terephthalate and polyethylene naphthalate, a PMMA or MMA copolymer (for example, an MS resin), a polycarbonate, a triacetyl cellulose, and an ABS resin. , Dip coating, flow coating, spin coating, spray coating, bar coating, gravure coating, roll coating, blade coating, air knife coating, etc. The coating is performed under the condition that a coating layer of 1 to 50 μm, preferably 2 to 20 μm is obtained on the surface of the plastic substrate.
[0076]
The active energy ray irradiation method includes ultraviolet rays emitted from a light source such as a xenon lamp, a low-pressure mercury lamp, a high-pressure mercury lamp, an ultra-high-pressure mercury lamp, a metal halide lamp, a carbon arc lamp, and a tungsten lamp, or electrons normally extracted from a 20 to 2000 kV particle accelerator. Irradiation with active energy rays such as X-rays, α-rays, β-rays, γ-rays, etc., and curing to form a film. A film cured by such active energy rays is excellent in balance between productivity and physical properties, and is particularly preferable.
[0077]
The coating film prepared by the above method using the stain resistance imparting agent according to the present invention has the following physical properties.
1) Pencil hardness
The stain resistance imparting agent is applied to a PET film having a thickness of 100 μm at a dry film thickness of 5 μm, and the cured coating has a pencil hardness of 5B or more. Further, when the stain resistance imparting agent contains an active energy ray-curable component, the pencil hardness is 2H or more, more preferably 3H or more.
2) Contact angle with water
The contact angle with water of the coating film obtained by applying and curing the stain resistance imparting agent is 80 degrees or more, preferably 85 degrees or more. If the angle is less than 80 degrees, the water repellency is low, so that the fingerprint and sebum wiping properties are particularly deteriorated, which is not preferable.
[0078]
3) Oleic acid, triolein (oleic acid triglyceride), squalene (one of acyclic triterpenes, a hydrocarbon having a chain structure composed of six isoprene residues. C) 30 H 50 ) Contact angle
The contact angles of the coatings obtained by applying and curing the stain resistance imparting agent to the above substances are all 10 degrees or less. It is more preferable that the angle is 5 degrees or less. If it exceeds 10 degrees, the lipophilicity is low, so that it is very conspicuous especially when a fingerprint or sebum adheres. That is, haze is greatly deteriorated and glossiness is also reduced.
When a fingerprint is adhered to the coating film thus obtained, it hardly adheres, or even if it adheres, it can be easily wiped off with a tissue or handkerchief in one operation. Also, sebum dirt (especially facial oil and nasal dirt), which has been a particular problem with conventional coatings and conventional water- and oil-repellent coatings, adheres to water- and oil-repellent coatings. While the change in haze at that time was as large as 10 to 20, the coating of the present invention was as small as 2 to 5 and was less noticeable even when adhered. On the other hand, with respect to the wiping properties, the water-repellent and oil-repellent coating film required a large number of times of 8 or more, whereas the coating film of the present invention required a small number of times of 4 or less so that it could be completely wiped off. (Slightly less noticeable after one or two wipings). Further, it is also possible to obtain a coating film which does not impair the transparency of the base material and is also excellent in scratch resistance and curling properties.
[0079]
Hereinafter, the present invention will be described in more detail with reference to Examples, Comparative Examples, and Reference Examples, but the present invention is not limited to these Examples. In the examples, parts and% mean parts by weight and% by weight, respectively.
The evaluation method of the coating film in Examples and the like is shown below.
(1) Transparency
The haze value was evaluated (JIS K-7105).
(2) Wear resistance
Using a worn wheel (manufactured by Caliberase: CS-10F), a 100-rotation Taber abrasion test was performed under a load of 500 g and evaluated by the difference ΔH (%) between the haze value after the Taber abrasion test and the haze value before the test.
(3) Pencil hardness
Using a JIS-compliant pencil hardness meter system (manufactured by Taiyo Kiki Co., Ltd.), the measurement was performed based on the conditions of JIS K-5400, and the measurement was indicated by the number of the hardest pencil that does not scratch.
(4) curl properties
The coating film was applied on a 10 cm square, and evaluated by the average value (mm) of the lift amounts of the four corners at the time of standing.
(5) Coating adhesion
The cross-cut method described in JIS K5400 (100 cross-cuts were inserted at 1 mm intervals and tested with cellophane tape (trade name, manufactured by Nichiban Co., Ltd.)) However, the same operation was repeated five times (cellophane tape was always new. The test was evaluated by changing the method to な い when no scratch or peeling occurred at all and to Δ when 10% or less of scratches or peeling occurred, and x for the others.
(6) Contact angle with water
0.002 ml of pure water was dropped on the coating film, and the contact angle after 1 minute was measured. The contact angle was measured using a P-type contact angle measuring device (manufactured by Kyowa Kagaku Co., Ltd.) (unit: degree).
(7) Contact angle for oleic acid, triolein and squalene
The contact angle was measured by the method described in (6) except that these solvents were used instead of pure water (unit: degree).
(8) Fingerprint stain resistance
Adhesion: Hold with palm and press slightly moistened thumb vertically onto coating for 3 seconds to fingerprint the coating.
Adhesion was evaluated by haze after fingerprint attachment.
Wipeability: The surface was lightly wiped with a commercially available tissue and evaluated by the number of times until fingerprint stains were not visually observed.
(9) Sebum stain resistance
Adhesion: Place the nose on your thumb and press the thumb vertically on the coating for 3 seconds to fingerprint the coating.
Adhesion was evaluated by haze after adhesion of nasal fat.
Wipeability: The surface was lightly wiped with a commercially available tissue, and evaluated by the number of times until sebum stains disappeared visually.
[0080]
[Reference Example 1] (Synthesis of stain resistance imparting agent 1)
40 g of methyl methacrylate, 20 g of stearyl methacrylate, and 200 g of methyl ethyl ketone (MEK) were stirred and mixed, and a polymerization initiator (2,2′-azobis (2,4-dimethylvaleronitrile), V-65, manufactured by Wako Pure Chemical Industries, Ltd.) Was added and the temperature was raised to 65 ° C. in a nitrogen stream, and the temperature was maintained for 5 hours (addition of 0.5 g of V-65 during the addition). Thereafter, the internal temperature was raised to 75 to 80 ° C., and maintained for 2 hours to completely decompose the remaining V-65. Thereafter, the mixture was cooled to room temperature to obtain a polymer having a solid content of 24% and a number average molecular weight of 18,000 (stain resistance imparting agent 1 = AF1).
[0081]
[Reference Example 2] (Synthesis of stain resistance imparting agent 2)
30 g of methyl methacrylate, 20 g of stearyl methacrylate, 10 g of polyethylene glycol monoacrylate (Blemmer AE400; manufactured by NOF Corporation) and 200 g of MEK were stirred and mixed, 0.5 g of V-65 was added, and the temperature was raised to 65 ° C. in a nitrogen stream, The temperature was maintained for 5 hours (additionally 0.5 g of V-65 was added on the way). Thereafter, the internal temperature was raised to 75 to 80 ° C., and maintained for 2 hours to completely decompose the remaining V-65. Thereafter, the mixture was cooled to room temperature to obtain a polymer having a solid content of 24% and a number average molecular weight of 17,000 (stain resistance imparting agent 2 = AF2).
[0082]
[Reference Example 3] (Synthesis of stain resistance imparting agent 3)
SH group obtained by starting from 2 g of mercaptopropyltrimethoxysilane (KBM803, manufactured by Shin-Etsu Chemical Co., Ltd.) and 70 g of MEK-dispersed organosilica sol having 30% solid content (MEK-ST, manufactured by Nissan Chemical Industries, Ltd.) Containing silica sol, 30 g of methyl methacrylate, 20 g of stearyl methacrylate, 10 g of polyethylene glycol monoacrylate (Blenmer AE400; manufactured by NOF CORPORATION), and 200 g of MEK are stirred and mixed, 0.5 g of V-65 is added, and the mixture is heated to 65 ° C under a nitrogen stream. The mixture was heated and maintained at that temperature for 5 hours (addition of 0.5 g of V-65 during the addition). Thereafter, the internal temperature was raised to 75 to 80 ° C., and maintained for 2 hours to completely decompose the remaining V-65. Thereafter, the mixture was cooled to room temperature to obtain a silica-containing polymer having a solid content of 26% (stain resistance imparting agent 3 = AF3).
[0083]
[Reference Example 4] (Synthesis of stain resistance imparting agent 4)
SH group-containing silica sol obtained by starting from 2 g of KBM803 and 100 g of an isopropanol-dispersed organosilica sol having a solid content of 20% (IPA-STUP, manufactured by Nissan Chemical Industries, Ltd.), 30 g of methyl methacrylate, 20 g of stearyl methacrylate, polyethylene glycol mono 10 g of acrylate (Blenmer AE400; manufactured by NOF Corporation) and 200 g of IPA were mixed with stirring, 0.5 g of V-65 was added, the temperature was raised to 65 ° C. in a nitrogen stream, and the temperature was maintained for 5 hours (on the way V-). 65 was added in an additional 0.5 g). Thereafter, the internal temperature was raised to 75 to 80 ° C., and maintained for 2 hours to completely decompose the remaining V-65. Thereafter, the mixture was cooled to room temperature, and a silica-containing polymer having a solid content of 25% was obtained (stain resistance imparting agent 4 = AF4).
[0084]
[Reference Example 5] (Synthesis of stain resistance imparting agent 5)
40 g of methyl methacrylate, 15 g of stearyl methacrylate, 5 g of tricyclodecene monomethanol methacrylate, 2 g of acrylic acid, and 200 g of MEK were stirred and mixed, 0.5 g of V-65 was added, and the temperature was raised to 65 ° C. under a nitrogen stream. The time was maintained (0.5 g of V-65 was added during the addition). Thereafter, the internal temperature was raised to 75 to 80 ° C., and maintained for 2 hours to completely decompose the remaining V-65. Thereafter, the mixture was cooled to room temperature to obtain a polymer having a solid content of 25% and a number average molecular weight of 19000 (stain resistance imparting agent 5 = AF5).
[0085]
[Reference Example 6] (Synthesis of silane coupling agent having polyfunctional acryloyl group by reaction of OH group-containing polyfunctional acrylate and NCO group-containing silane coupling agent)
1 kg of a mixture of dipentaerythritol pentaacrylate and dipentaerythritol hexaacrylate (manufactured by Nippon Kayaku Co., Ltd., Kayarad DPHA), 50 g of γ-triethoxysilylpropyl isocyanate (KBE9007, manufactured by Shin-Etsu Chemical Co., Ltd.), 0.2 g of dibutyltin dilaurate After stirring and mixing 0.5 g of hydroquinone monomethyl ether, the temperature was raised to 90 ° C. in an air stream and maintained at that temperature for 1 hour. It was confirmed by IR that the absorption corresponding to the NCO group had completely disappeared. Thereafter, the temperature was returned to room temperature, and the product was taken out. The reaction was quantitative. (Silane coupling agent 1 = SC1)
[0086]
[Reference Example 7] (Reaction of colloidal silica with a silane coupling agent having a polyfunctional acryloyl group)
400 g of MEK-dispersed organosilica sol (manufactured by Nissan Chemical Industries, Ltd., MEK-ST, solid content 30%), 400 g of silane coupling agent 1 (a mixture of a polyfunctional acryloyl group-containing silane coupling agent and an unreacted polyfunctional acrylate), After 0.4 g of hydroquinone monomethyl ether and 4 g of aluminum acetylacetone were mixed well, 8 g of pure water was added, and stirring was continued at room temperature for 3 hours or more. Thereafter, the temperature was raised to 50 to 70 ° C. in an air atmosphere, and stirring was continued for 2 hours or more at that temperature, and the surface of the silica sol was reacted with a silane coupling agent to form a protective colloid (treated colloidal silica 1 = SI1). .
[0087]
[Reference Example 8] (Synthesis of silane-terminated polymer and reaction with colloidal silica)
After 95 g of glycidyl methacrylate, 3 g of mercaptopropyltrimethoxysilane (manufactured by Shin-Etsu Chemical Co., Ltd., KBM803) and 200 g of propylene glycol monomethyl ether acetate (PGMAc) were mixed, the internal temperature was raised to about 60 ° C. under a nitrogen stream. Thereafter, V-65 was divided into two portions, a total of 1.5 g was added, and stirring was continued at 65 ° C for 6 hours. Thereafter, the internal temperature was raised to 100 ° C. to completely inactivate V-65, and then 200 g of PGMAc and 1.5 g of triphenylphosphine were added, and stirring was continued under an air atmosphere until the mixture became uniform. Thereafter, a mixture of 49 g of acrylic acid / 10 g of PGMAc was added over about 20 minutes, and then the internal temperature was raised to 110 ° C., and maintained and stirred for 8 hours or more to complete the reaction between the acrylic acid and the epoxy group. After the content mixture was returned to room temperature, 163 g of MEK-ST and 0.04 g of aluminum acetylacetonate were added. After stirring until the mixture became uniform, 0.99 g of pure water was added. The reaction was performed for 4 hours. Then, the internal temperature was returned to room temperature. The solid concentration was about 30% (treated colloidal silica 2 = SI2).
[0088]
[Reference Example 9] (Preparation of silane coupling agent described in JP-A-2001-353808)
2-Trichlorosilaneethyl stearate was decomposed with methanol to obtain 2-trimethoxysilylethyl stearate (silane coupling agent 2 = SC2).
[0089]
[Reference Example 10] (Preparation of stain resistance imparting agent outside the scope of the present invention)
40 g of methyl methacrylate, 20 g of stearyl methacrylate, 5 g of perfluorooctylethyl methacrylate and 200 g of MEK were stirred and mixed, 0.5 g of V-65 was added, the temperature was raised to 65 ° C. under a nitrogen stream, and the temperature was maintained for 5 hours (on the way). 0.5 g of V-65 was additionally added). Thereafter, the internal temperature was raised to 75 to 80 ° C., and maintained for 2 hours to completely decompose the remaining V-65. Thereafter, the mixture was cooled to room temperature to obtain a polymer having a solid content of 26% and a number average molecular weight of 18,000 (stain resistance imparting agent 6 = AF6).
[0090]
[Reference Example 11] (Preparation of stain resistance imparting agent outside the scope of the present invention)
40 g of methyl methacrylate, 20 g of stearyl methacrylate, 5 g of bismercaptopolydimethylsiloxane (manufactured by Shin-Etsu Chemical Co., Ltd .; X-22-167B), and 200 g of MEK were stirred and mixed, 0.5 g of V-65 was added, and a nitrogen gas flow at 65 ° C. The temperature was lowered and maintained at that temperature for 5 hours (addition of 0.5 g of V-65 during the addition). Thereafter, the internal temperature was raised to 75 to 80 ° C., and maintained for 2 hours to completely decompose the remaining V-65. Thereafter, the mixture was cooled to room temperature to obtain a polymer having a solid content of 26% and a number average molecular weight of 17000 (stain resistance imparting agent 7 = AF7).
[0091]
[Reference Example 12] (Preparation of stain resistance imparting agent outside the scope of the present invention)
40 g of methyl methacrylate, 20 g of n-decyl methacrylate, and 200 g of MEK were mixed with stirring, 0.5 g of V-65 was added, the temperature was raised to 65 ° C. in a nitrogen stream, and the temperature was maintained for 5 hours (the V-65 was reduced to 0%). .5 g). Thereafter, the internal temperature was raised to 75 to 80 ° C., and maintained for 2 hours to completely decompose the remaining V-65. Thereafter, the mixture was cooled to room temperature to obtain a polymer having a solid content of 24% and a number average molecular weight of 19000 (stain resistance imparting agent 8 = AF8).
[0092]
[Examples 1 to 12] and [Comparative Examples 1 to 7]
Each composition was prepared with the composition shown in Table 1. Using the composition, a coating film was formed by the following method and evaluated. The coating film was applied to a transparent (1.5% haze value) 100 micron thick polyethylene terephthalate film (manufactured by Mitsubishi Chemical Polyester Film Co., Ltd .: T600E) using a bar coater so that the film thickness after drying was 6 μm. And dried by heating at 80 ° C. for 2 minutes. Using a high-pressure mercury lamp with an output density of 120 W / cm, this film was tested for its transparency, abrasion resistance, pencil hardness, coating film adhesion, curl properties, and contact angle (water, squalene, oleic acid, triolein) resistance. Fingerprint stain resistance and sebum stain resistance were evaluated. Table 1 shows the composition of the composition, and Tables 2 and 3 show the evaluation results.
As is evident from the results, coating films exhibiting physical properties within the scope of the present invention are extremely excellent in fingerprint stain resistance and sebum stain resistance, but coating films exhibiting physical properties outside the scope of the present invention are: It was clear that the fingerprint stain resistance and sebum stain resistance were inferior, and in particular, the sebum stain resistance was significantly inferior to a coating film showing physical properties within the range of the present invention.
[0093]
[Table 1]
DPHA: dipentaerythritol hexa / pentaacrylate (Nippon Kayaku Co., Ltd.)
DPHA *: DPHA in SI1
U15HA: Polyfunctional urethane acrylate (Shin-Nakamura Chemical Co., Ltd.)
SI1 / SI2: compounding ratio (solid content) 2/1
I184: Irgacure 184 (manufactured by Ciba Specialty Chemicals Co., Ltd.)
Note: Solvent is a mixed solvent of MEK, PGM, PGMAc, IPA
[0094]
[Table 2]
[0095]
[Table 3]
[0096]
[Comparative Example 8]
SC2 was hydrolyzed with 1.2 times the calculated amount of water in the presence of an ethanol / aluminum triacetylacetone catalyst to obtain a condensate.
On a PET film having a thickness of 100 μm (haze = 1.5%), a coating film described in Comparative Example 1 was formed at a thickness of 6 μm, and the above condensate was applied so that the thickness after drying became 0.1 μm. At 100 ° C. for 5 minutes to form an antifouling coating on the surface.
The physical properties of the coating film were as follows: haze = 1.6%, abrasion resistance = 5.1%, pencil hardness H, curl property 2 mm, adhesion △, contact angle = (water) 83 degrees, (squalene) 10 degrees, ( (Oleic acid) 7 °, (triolein) 10 °, fingerprint stain resistance: haze at the time of adhesion = 3.2% / wiping property = 2 times, sebum resistance: haze at the time of adhesion = 6.6% / Wipeability = 6 times, and the initial fingerprint stain resistance and sebum stain resistance are slightly inferior to those of the coating film within the scope of the present invention, but the general antifouling / fingerprint stain resistant coating agent Good compared to coatings. However, since the pencil hardness is low and the adhesiveness is poor, repeated evaluation of fingerprint stain resistance and sebum stain resistance results in the formation of fine scratches and peeling of the coating film, and the stain resistance is reduced. It was clear that there was a major problem.
[0097]
[Examples 13 to 15] and [Comparative Examples 9 to 12]
Component (A) shown in Table 4 was used alone to form a coating film so that the film thickness after drying was about 2 μm. The coating base material, coating method, drying method, etc. were performed in the same manner as in Example 1, and the coating film properties were evaluated. Table 4 shows the evaluation results.
As is clear from the results in Table 4, the components of Examples 13 to 15 are excellent in fingerprint stain resistance, so that the components that do not require much hardness (for example, fingerprint stain resistance on products requiring flexibility) Can be used without any problem.
[0098]
[Table 4]
[0099]
【The invention's effect】
ADVANTAGE OF THE INVENTION According to the stain resistance imparting agent of this invention, preparation of a coating film which has very high levels of fingerprint stain resistance and sebum stain resistance can be realized. Further, the composition contains polyfunctional acrylate or inorganic oxide fine particles having a group having a (meth) acryloyl group bonded to the surface of the inorganic oxide fine particles via an -O-Si-R- bond. At the same time, it can have excellent hardness, scratch resistance, transparency, low curl, etc., and can be suitably used for a wide range of applications such as touch panels, displays, mobile phone housings, and optical disks.
That is, when the stain resistance imparting agent of the present invention is applied to a typical transparent substrate such as PET, TAC, or PMMA, the pencil hardness is as high as 2H or more, and the contact angle with water at the same time is 80 degrees. By exhibiting water repellency as described above, adhesion of hydrophilic stains is prevented, while on the other hand, typical sebum components such as oleic acid, triolein, and squalene have a contact angle of 10 degrees or less and exhibit lipophilicity. Wet, inconspicuous when attached. On the other hand, since the contact angle with water is high, fingerprints and sebum (although water is also present, oil-soluble components with a lower specific gravity than water float on the surface and eventually come into direct contact with the coating film) Excessive adaptation is suppressed, and excellent wiping properties are provided. Furthermore, the combination of a water-repellent group and a hydrophilic group further enhances the effect and further improves the wiping properties, thus realizing a high level of fingerprint stain resistance and sebum stain resistance that could not be achieved conventionally. it can.
Claims (13)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003160411A JP4517590B2 (en) | 2003-06-05 | 2003-06-05 | Antifouling agent and antifouling article using the same |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003160411A JP4517590B2 (en) | 2003-06-05 | 2003-06-05 | Antifouling agent and antifouling article using the same |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2008213499A Division JP2008285686A (en) | 2008-08-22 | 2008-08-22 | Antifouling agent and antifouling article using the same |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2004359834A true JP2004359834A (en) | 2004-12-24 |
JP4517590B2 JP4517590B2 (en) | 2010-08-04 |
Family
ID=34053200
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2003160411A Expired - Fee Related JP4517590B2 (en) | 2003-06-05 | 2003-06-05 | Antifouling agent and antifouling article using the same |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP4517590B2 (en) |
Cited By (32)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2005063899A1 (en) * | 2003-12-25 | 2005-07-14 | Sk Kaken Co., Ltd. | Aqueous coating composition |
JP2006328624A (en) * | 2005-04-28 | 2006-12-07 | Nicca Chemical Co Ltd | Water-repellent agent, water-repellent finishing method and water-repellent textile product |
JP2007058162A (en) * | 2005-07-28 | 2007-03-08 | Nof Corp | Surface material for display and display having the same |
EP1856563A1 (en) * | 2005-02-21 | 2007-11-21 | ESSILOR INTERNATIONAL Compagnie Générale d'Optique | Antifouling diamond type carbon layer |
WO2008108153A1 (en) * | 2007-03-08 | 2008-09-12 | Kimoto Co., Ltd. | Hard coating film and layered product |
US20100035053A1 (en) * | 2008-01-15 | 2010-02-11 | Yukio Kishi | Curable composition, cured product and laminate |
WO2010090116A1 (en) * | 2009-02-04 | 2010-08-12 | 日本化薬株式会社 | Actinic-energy-ray-curable resin composition for hard coat and use thereof |
JP2010215775A (en) * | 2009-03-17 | 2010-09-30 | Aica Kogyo Co Ltd | Curable resin composition and film |
WO2009120475A3 (en) * | 2008-03-24 | 2011-01-13 | Ppg Industries Ohio, Inc. | Oleophilic compositions, coatings employing the same, and devices formed therefrom |
WO2011013497A1 (en) * | 2009-07-30 | 2011-02-03 | ハリマ化成株式会社 | Photocurable hydrophilic coating agent, hydrophilic coating film, and hydrophilically coated article |
WO2011105594A1 (en) * | 2010-02-26 | 2011-09-01 | 帝人デュポンフィルム株式会社 | Hard coat film and process for producing same |
US8017211B2 (en) | 2004-12-03 | 2011-09-13 | Mitsubishi Chemical Corporation | Composition, cured product and article |
JP2011177938A (en) * | 2010-02-26 | 2011-09-15 | Teijin Dupont Films Japan Ltd | Hard coat film |
JP2011212554A (en) * | 2010-03-31 | 2011-10-27 | Teijin Dupont Films Japan Ltd | Method for manufacturing hard coat film |
JP2012020538A (en) * | 2010-07-16 | 2012-02-02 | Teijin Dupont Films Japan Ltd | Laminated body |
JP2012128157A (en) * | 2010-12-15 | 2012-07-05 | Teijin Dupont Films Japan Ltd | Hard coat film and method for manufacturing the same |
JP2012135924A (en) * | 2010-12-27 | 2012-07-19 | Dainichiseika Color & Chem Mfg Co Ltd | Hard coat transfer sheet and method for producing the same |
JP2013068693A (en) * | 2011-09-21 | 2013-04-18 | Panasonic Corp | Optical member |
JP2013159782A (en) * | 2012-02-08 | 2013-08-19 | Sukgyung At Co Ltd | Transparency-excellent hybrid resin comprising silica fine particle and acrylic polymer and active energy ray-curable composition obtained by using the hybrid resin |
WO2013125081A1 (en) * | 2012-02-22 | 2013-08-29 | デクセリアルズ株式会社 | Antifouling layer, antifouling substrate, display device, and input device |
JP2013171287A (en) * | 2012-06-25 | 2013-09-02 | Dexerials Corp | Antifouling layer, antifouling base material, display device and input device |
JP2013216530A (en) * | 2012-04-06 | 2013-10-24 | Kawaken Fine Chem Co Ltd | Composite alumina film |
JP2013256562A (en) * | 2012-06-11 | 2013-12-26 | Sumitomo Osaka Cement Co Ltd | Composition for forming hardcoat film, hardcoat film, and plastic substrate including the hardcoat film |
JP2014205353A (en) * | 2014-06-03 | 2014-10-30 | 大日精化工業株式会社 | Hard coat transfer sheet and manufacturing method |
CN104530302A (en) * | 2014-12-11 | 2015-04-22 | 华南理工大学 | Silica sol/polyacrylic ester emulsion with high silicon content and preparation method of silica sol/polyacrylic ester emulsion |
CN104583354A (en) * | 2012-08-31 | 2015-04-29 | 迪睿合电子材料有限公司 | Antifouling body, display device, input device, electronic equipment and antifouling article |
CN104583814A (en) * | 2012-09-05 | 2015-04-29 | 迪睿合电子材料有限公司 | Antifouling body, display device, input device, and electronic device |
JP2017014466A (en) * | 2015-07-06 | 2017-01-19 | 共栄社化学株式会社 | Surface control agent for coating material |
US9637644B2 (en) | 2011-01-10 | 2017-05-02 | Samsung Electronics Co., Ltd. | Composition for coating film to prevent conspicuous fingerprints, coating film to prevent conspicuous fingerprints using the composition, and article having the coating film |
WO2020137277A1 (en) * | 2018-12-28 | 2020-07-02 | 信越化学工業株式会社 | Surface treated optical member |
CN111748227A (en) * | 2020-05-29 | 2020-10-09 | 华帝股份有限公司 | Hydrophobic coating and cooking equipment with same |
JP2021050175A (en) * | 2019-09-26 | 2021-04-01 | 三菱ケミカル株式会社 | (meth)acrylic acid ester and production method thereof |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008285686A (en) * | 2008-08-22 | 2008-11-27 | Mitsubishi Chemicals Corp | Antifouling agent and antifouling article using the same |
Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6049079A (en) * | 1983-08-30 | 1985-03-18 | Asahi Glass Co Ltd | Anti-sticking agent for fingerprint |
JPH0362867A (en) * | 1989-07-31 | 1991-03-18 | Nippon Oil & Fats Co Ltd | Coating compound composition |
JPH06158019A (en) * | 1992-11-27 | 1994-06-07 | Tosoh Corp | Protective coating agent |
JPH09111185A (en) * | 1995-10-16 | 1997-04-28 | Chisso Corp | Fingerprint stain prevention display and coating liquid for display application |
JPH09255917A (en) * | 1996-03-27 | 1997-09-30 | Nippon Shokubai Co Ltd | Method of formation of herd coat layer on resin molding, and resin molding with herd coat layer formed thereon |
JPH10166495A (en) * | 1996-12-09 | 1998-06-23 | Toto Ltd | Hydrophilic and lipophilic member |
JP2000047005A (en) * | 1998-07-30 | 2000-02-18 | Teijin Ltd | Antireflection article and its preparation |
JP2004143201A (en) * | 2002-10-22 | 2004-05-20 | Toyo Ink Mfg Co Ltd | Active energy ray-curable composition, method for forming cured film using the same, cured product thereof, and antireflective body |
JP2004143202A (en) * | 2002-10-22 | 2004-05-20 | Toyo Ink Mfg Co Ltd | Active energy ray-curable composition, method for forming cured film using the same, cured product thereof, and antireflective body |
-
2003
- 2003-06-05 JP JP2003160411A patent/JP4517590B2/en not_active Expired - Fee Related
Patent Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6049079A (en) * | 1983-08-30 | 1985-03-18 | Asahi Glass Co Ltd | Anti-sticking agent for fingerprint |
JPH0362867A (en) * | 1989-07-31 | 1991-03-18 | Nippon Oil & Fats Co Ltd | Coating compound composition |
JPH06158019A (en) * | 1992-11-27 | 1994-06-07 | Tosoh Corp | Protective coating agent |
JPH09111185A (en) * | 1995-10-16 | 1997-04-28 | Chisso Corp | Fingerprint stain prevention display and coating liquid for display application |
JPH09255917A (en) * | 1996-03-27 | 1997-09-30 | Nippon Shokubai Co Ltd | Method of formation of herd coat layer on resin molding, and resin molding with herd coat layer formed thereon |
JPH10166495A (en) * | 1996-12-09 | 1998-06-23 | Toto Ltd | Hydrophilic and lipophilic member |
JP2000047005A (en) * | 1998-07-30 | 2000-02-18 | Teijin Ltd | Antireflection article and its preparation |
JP2004143201A (en) * | 2002-10-22 | 2004-05-20 | Toyo Ink Mfg Co Ltd | Active energy ray-curable composition, method for forming cured film using the same, cured product thereof, and antireflective body |
JP2004143202A (en) * | 2002-10-22 | 2004-05-20 | Toyo Ink Mfg Co Ltd | Active energy ray-curable composition, method for forming cured film using the same, cured product thereof, and antireflective body |
Cited By (51)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7683123B2 (en) | 2003-12-25 | 2010-03-23 | Sk Kaken Co., Ltd. | Aqueous coating composition |
WO2005063899A1 (en) * | 2003-12-25 | 2005-07-14 | Sk Kaken Co., Ltd. | Aqueous coating composition |
US8017211B2 (en) | 2004-12-03 | 2011-09-13 | Mitsubishi Chemical Corporation | Composition, cured product and article |
EP1856563A1 (en) * | 2005-02-21 | 2007-11-21 | ESSILOR INTERNATIONAL Compagnie Générale d'Optique | Antifouling diamond type carbon layer |
JP2006328624A (en) * | 2005-04-28 | 2006-12-07 | Nicca Chemical Co Ltd | Water-repellent agent, water-repellent finishing method and water-repellent textile product |
JP2007058162A (en) * | 2005-07-28 | 2007-03-08 | Nof Corp | Surface material for display and display having the same |
JPWO2008108153A1 (en) * | 2007-03-08 | 2010-06-10 | 株式会社きもと | Hard coat film and laminate |
WO2008108153A1 (en) * | 2007-03-08 | 2008-09-12 | Kimoto Co., Ltd. | Hard coating film and layered product |
KR101405578B1 (en) | 2007-03-08 | 2014-06-10 | 키모토 컴파니 리미티드 | Hard coating film and layered product |
US9238703B2 (en) * | 2008-01-15 | 2016-01-19 | Kimoto Co., Ltd. | Curable composition, cured product and laminate |
US20100035053A1 (en) * | 2008-01-15 | 2010-02-11 | Yukio Kishi | Curable composition, cured product and laminate |
WO2009120475A3 (en) * | 2008-03-24 | 2011-01-13 | Ppg Industries Ohio, Inc. | Oleophilic compositions, coatings employing the same, and devices formed therefrom |
CN102015932A (en) * | 2008-03-24 | 2011-04-13 | Ppg工业俄亥俄公司 | Oleophilic compositions, coatings employing the same, and devices formed therefrom |
JPWO2010090116A1 (en) * | 2009-02-04 | 2012-08-09 | 日本化薬株式会社 | Active energy ray-curable resin composition for hard coat and its use |
WO2010090116A1 (en) * | 2009-02-04 | 2010-08-12 | 日本化薬株式会社 | Actinic-energy-ray-curable resin composition for hard coat and use thereof |
JP2010215775A (en) * | 2009-03-17 | 2010-09-30 | Aica Kogyo Co Ltd | Curable resin composition and film |
WO2011013497A1 (en) * | 2009-07-30 | 2011-02-03 | ハリマ化成株式会社 | Photocurable hydrophilic coating agent, hydrophilic coating film, and hydrophilically coated article |
JPWO2011013497A1 (en) * | 2009-07-30 | 2013-01-07 | ハリマ化成株式会社 | Photocurable hydrophilic coating, hydrophilic coating, and hydrophilic article |
US20120321882A1 (en) * | 2010-02-26 | 2012-12-20 | Teijin Dupont Films Japan Limited | Hard coat film and production method therefor |
CN102762371A (en) * | 2010-02-26 | 2012-10-31 | 帝人杜邦薄膜日本有限公司 | Hard coat film and process for producing same |
JP2011177938A (en) * | 2010-02-26 | 2011-09-15 | Teijin Dupont Films Japan Ltd | Hard coat film |
WO2011105594A1 (en) * | 2010-02-26 | 2011-09-01 | 帝人デュポンフィルム株式会社 | Hard coat film and process for producing same |
JP2011212554A (en) * | 2010-03-31 | 2011-10-27 | Teijin Dupont Films Japan Ltd | Method for manufacturing hard coat film |
JP2012020538A (en) * | 2010-07-16 | 2012-02-02 | Teijin Dupont Films Japan Ltd | Laminated body |
JP2012128157A (en) * | 2010-12-15 | 2012-07-05 | Teijin Dupont Films Japan Ltd | Hard coat film and method for manufacturing the same |
JP2012135924A (en) * | 2010-12-27 | 2012-07-19 | Dainichiseika Color & Chem Mfg Co Ltd | Hard coat transfer sheet and method for producing the same |
US10809423B2 (en) | 2011-01-10 | 2020-10-20 | Samsung Electronics Co., Ltd. | Composition for coating film to prevent conspicuous fingerprints, coating film to prevent conspicuous fingerprints using the composition, and article having the coating film |
US9637644B2 (en) | 2011-01-10 | 2017-05-02 | Samsung Electronics Co., Ltd. | Composition for coating film to prevent conspicuous fingerprints, coating film to prevent conspicuous fingerprints using the composition, and article having the coating film |
JP2013068693A (en) * | 2011-09-21 | 2013-04-18 | Panasonic Corp | Optical member |
JP2013159782A (en) * | 2012-02-08 | 2013-08-19 | Sukgyung At Co Ltd | Transparency-excellent hybrid resin comprising silica fine particle and acrylic polymer and active energy ray-curable composition obtained by using the hybrid resin |
CN104114366A (en) * | 2012-02-22 | 2014-10-22 | 迪睿合电子材料有限公司 | Antifouling layer, antifouling substrate, display device, and input device |
WO2013125081A1 (en) * | 2012-02-22 | 2013-08-29 | デクセリアルズ株式会社 | Antifouling layer, antifouling substrate, display device, and input device |
CN104114366B (en) * | 2012-02-22 | 2016-07-13 | 迪睿合电子材料有限公司 | Stain-proofing layer, soil resistance base material, display device and input equipment |
JP2013216530A (en) * | 2012-04-06 | 2013-10-24 | Kawaken Fine Chem Co Ltd | Composite alumina film |
JP2013256562A (en) * | 2012-06-11 | 2013-12-26 | Sumitomo Osaka Cement Co Ltd | Composition for forming hardcoat film, hardcoat film, and plastic substrate including the hardcoat film |
JP2013171287A (en) * | 2012-06-25 | 2013-09-02 | Dexerials Corp | Antifouling layer, antifouling base material, display device and input device |
CN104583354A (en) * | 2012-08-31 | 2015-04-29 | 迪睿合电子材料有限公司 | Antifouling body, display device, input device, electronic equipment and antifouling article |
CN104583814A (en) * | 2012-09-05 | 2015-04-29 | 迪睿合电子材料有限公司 | Antifouling body, display device, input device, and electronic device |
JP2014205353A (en) * | 2014-06-03 | 2014-10-30 | 大日精化工業株式会社 | Hard coat transfer sheet and manufacturing method |
CN104530302A (en) * | 2014-12-11 | 2015-04-22 | 华南理工大学 | Silica sol/polyacrylic ester emulsion with high silicon content and preparation method of silica sol/polyacrylic ester emulsion |
JP2017014466A (en) * | 2015-07-06 | 2017-01-19 | 共栄社化学株式会社 | Surface control agent for coating material |
JP7207433B2 (en) | 2018-12-28 | 2023-01-18 | 信越化学工業株式会社 | Surface-treated optical member |
CN113227306A (en) * | 2018-12-28 | 2021-08-06 | 信越化学工业株式会社 | Surface-treated optical member |
JPWO2020137277A1 (en) * | 2018-12-28 | 2021-11-04 | 信越化学工業株式会社 | Surface-treated optical member |
WO2020137277A1 (en) * | 2018-12-28 | 2020-07-02 | 信越化学工業株式会社 | Surface treated optical member |
CN113227306B (en) * | 2018-12-28 | 2025-01-28 | 信越化学工业株式会社 | Surface treated optical components |
JP2021050175A (en) * | 2019-09-26 | 2021-04-01 | 三菱ケミカル株式会社 | (meth)acrylic acid ester and production method thereof |
JP2023129436A (en) * | 2019-09-26 | 2023-09-14 | 三菱ケミカル株式会社 | Polymer and synthetic resin |
JP7375418B2 (en) | 2019-09-26 | 2023-11-08 | 三菱ケミカル株式会社 | Method for producing compounds and methods for producing polymers |
JP7688846B2 (en) | 2019-09-26 | 2025-06-05 | 三菱ケミカル株式会社 | Polymers and synthetic resins |
CN111748227A (en) * | 2020-05-29 | 2020-10-09 | 华帝股份有限公司 | Hydrophobic coating and cooking equipment with same |
Also Published As
Publication number | Publication date |
---|---|
JP4517590B2 (en) | 2010-08-04 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP4517590B2 (en) | Antifouling agent and antifouling article using the same | |
EP1302514B1 (en) | Active energy ray-curable antistatic coating composition | |
JP4872670B2 (en) | Compositions, cured products and articles | |
KR102510268B1 (en) | Fluorine-containing acrylic compound and method for producing the same, curable composition, and article | |
JP2003201444A (en) | Active energy ray-curable antistatic coating composition | |
JP5524572B2 (en) | Active energy ray-curable antistatic coating agent composition | |
JP2003025510A (en) | Multilayer laminate having antireflection properties and scratch resistance | |
JP2010121013A (en) | Active energy ray-curable resin composition, cured film for hard coat, and layered product | |
JP2004307579A (en) | Active energy ray-curable coating composition and molded article having a cured film obtained from the composition | |
JP6237030B2 (en) | Curable resin composition, cured product and laminate | |
CN104080877B (en) | Anti-fingerprint adhesive agent and manufacture method, hard coat compositions, the base material with hard coat and touch screen | |
JP4363077B2 (en) | Active energy ray-curable composition and hard coat film | |
US7514479B2 (en) | Active energy ray curable coating composition and molded product | |
JP5584989B2 (en) | Surface-modified silica particles and active energy ray-curable resin composition using the same | |
JP2009102513A (en) | Polymer, composition, cured product and optical recording medium | |
JP4239030B2 (en) | Photo-curable resin composition and article having cured film thereof | |
JP2010095569A (en) | Active energy ray-curable resin composition, cured material and article | |
JP2015187205A (en) | Curable resin composition, and cured product and laminate obtained using the same | |
TW202111030A (en) | Fluorine-containing curable composition and article | |
JP2009084395A (en) | Polymer, composition, cured product and optical recording medium | |
JP2006160802A (en) | Antifouling agent, cured product and article | |
JP2002194084A (en) | Compound having polysiloxane structural unit, active energy ray-curable coating composition, and material having cured coating of the composition | |
JP2002194250A (en) | Active energy ray-curable coating composition and material having a cured coating of the composition | |
JP4320277B2 (en) | Organic-inorganic hybrid resin composition, and cured product and article using the same | |
JP5142075B2 (en) | Active energy ray curable resin, active energy ray curable resin composition, and article having a hard coat layer obtained using the same |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20060124 |
|
RD03 | Notification of appointment of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7423 Effective date: 20060124 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20100223 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20100408 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20100427 |
|
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20100510 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130528 Year of fee payment: 3 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 4517590 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20140528 Year of fee payment: 4 |
|
S111 | Request for change of ownership or part of ownership |
Free format text: JAPANESE INTERMEDIATE CODE: R313111 |
|
R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
LAPS | Cancellation because of no payment of annual fees |