JP2004228454A - Stage equipment and exposure system - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide stage equipment which has a simple structure and can guide and drive a stage on a platen in X and Y directions, in a noncontact manner, without using electromagnetic force. <P>SOLUTION: A stage member 22 of the stage equipment 10 is shaped into a box, having an inward-directed inner recess 22b. An opening end face 22a facing the platen 21 is provided around the recess 22b. A gas blowing port and a air sucking port are made in the opening end face 22a of the stage member 22. When the balance between the quantity of gas blew from the gas blow port and the quantity of gas sucked from the gas suction port is achieved, the stage member 22 can be moved in the X and Y axis directions, while being supported on the upper surface of the platen 21 in a noncontact manner. <P>COPYRIGHT: (C)2004,JPO&NCIPI

Description

[0001]
TECHNICAL FIELD OF THE INVENTION
The present invention relates to a stage device for guiding a stage in a non-contact manner on a surface plate, and an exposure apparatus having the same. In particular, the present invention relates to a stage device and the like, which can guide and drive a stage in the X and Y directions on a surface plate without using an electromagnetic force and have a simple structure.
[0002]
Problems to be solved by the prior art and the invention
2. Description of the Related Art Conventionally, there has been known a stage device for mounting and moving / positioning an object to be processed. For example, in an exposure apparatus such as a semiconductor device, a reticle (original plate, mask) or a wafer (sensitive substrate) is placed on each stage and moved and positioned. A reduction projection type exposure apparatus irradiates a reticle with an energy beam such as light, ultraviolet light, or an electron beam, and reduces and projects the energy beam that has passed (or reflected) the reticle onto a resist-coated wafer. The upper pattern is exposed and transferred onto a wafer.
[0003]
A stage for this type of exposure apparatus is generally driven by an electromagnetic linear motor. In order to simplify and reduce the size of the structure of the stage device, a device that controls the stage position using an electromagnetic flat motor is under development, but has not been put to practical use.
[0004]
Incidentally, in the case of an electron beam exposure apparatus, it is desirable to drive the stage with a non-electromagnetic force so as not to adversely affect the electron beam to be irradiated. Therefore, for example, an air cylinder type stage including a static pressure gas bearing and a vacuum differential pumping mechanism has been devised. By arranging two sets of such an air cylinder type stage, the stage can be driven in the XY axis directions by a non-electromagnetic force. However, at this time, it is necessary to be able to cope with miniaturization required of the stage device.
[0005]
In general, the stage device has a surface plate having excellent smoothness in the Z-axis direction (XY plane). Therefore, if such a surface plate can be used as a reference for driving the stage in the XY axis directions. , The positional accuracy in the Z-axis direction can be easily improved.
[0006]
SUMMARY OF THE INVENTION The present invention has been made to meet such a demand, and has a simple structure in which a stage can be non-contactly guided and driven on a surface plate in the X and Y directions without using electromagnetic force. It is an object to provide an apparatus and an exposure apparatus having the same.
[0007]
[Means for Solving the Problems]
In order to solve the above-mentioned problem, a stage device of the present invention has a flat surface plate having a guide surface, and an inner concave portion which is guided in a non-contact manner on the guide surface of the surface plate and faces the guide surface of the surface plate. A stage; a plurality of pressure chambers formed in the inner recess, separated by a movable partition; and a pressure control valve for controlling the pressure of the plurality of pressure chambers. The stage is driven on the surface plate by applying a relative pressure difference to the stage.
[0008]
According to this stage device, when a pressure difference is applied between the plurality of pressure chambers, the stage moves in a direction to eliminate the pressure difference. In the stage device of the present invention, the pressure chamber is built in the stage, and no actuator or the like is arranged around the stage. Therefore, a simple and small stage device can be provided.
[0009]
In the stage device of the present invention, it is preferable that a set of an exhaust area and a static pressure gas bearing for guiding the stage in a non-contact manner on the guide surface of the surface plate is provided on the stage. When the stage device is installed in a vacuum environment, gas leakage into the vacuum environment can be reduced by the vacuum exhaust groove around the static pressure gas bearing.
[0010]
In the stage device of the present invention, when used in a vacuum, the stage is provided with a permanent magnet, the platen is made of a magnetic material, and the stage is attracted to the platen by a suction force acting on both. Can be done.
Alternatively, the surface plate may be made of a dielectric material, electrodes may be provided on the stage side, and suction may be performed on the surface plate by electrostatic attraction.
[0011]
In the stage device of the present invention, a fixed guide and a movable guide, which also serve as a partition for partitioning an inner concave portion of the stage, may be provided in the pressure chamber.
In this case, the fixed guide and the movable guide constitute a partition, define an inner concave portion in the stage, and form a pressure chamber. Then, the movable guide forming the pressure chamber moves relative to the fixed guide, and changes the volume of the pressure chamber. Thus, the stage is driven (moved) on the surface plate.
[0012]
In the stage device of the present invention, the fixed guide is fixed to the surface plate, and as the movable guide, an X guide guided non-contact in the X-axis direction by the fixed guide and a non-contact guide in the Y-axis direction. The fixed guide and the X guide constitute the pressure chamber partition wall which divides the inner recess into two in the Y-axis direction, and the fixed guide and the Y guide are the inner recess. The pressure chamber partition wall is divided into two in the X-axis direction.
In this case, a so-called planar stage device in which the stage moves on the surface plate in the XY axis directions can be realized.
[0013]
In the stage device of the present invention, the pressure control valve may be disposed on the fixed guide.
In this case, the pressure in the pressure chamber can be quickly controlled, and the response of stage positioning is good.
[0014]
In the stage device of the present invention, a fine movement stage may be provided on the stage.
In this case, the positioning accuracy of the stage can be improved.
[0015]
In the stage device of the present invention, the surface plate may be supported by a vibration isolator.
In this case, transmission of vibration from the outside of the apparatus to the surface plate can be prevented, and vibration generated inside the apparatus can be effectively attenuated.
[0016]
In the stage device of the present invention, the stage includes: a first stage member that moves in the X-axis direction; and a second stage member that moves in the Y-axis direction along the first stage member. Can be.
Further, two guide portions for guiding the first stage member with both end portions interposed therebetween may be formed on the surface plate in parallel and opposed to each other.
[0017]
An exposure apparatus according to the present invention is an exposure apparatus that selectively irradiates an energy beam onto a sensitive substrate to form a desired pattern on the substrate, and includes the stage device.
The type of energy beam is not limited, and ultraviolet light, soft X-ray, electron beam, ion beam, or the like can be used. The method of exposure is not limited, and projection reduction transfer, 1: 1 proximity transfer, drawing, and the like can be used.
[0018]
BEST MODE FOR CARRYING OUT THE INVENTION
Hereinafter, description will be made with reference to the drawings.
First, a schematic configuration of an exposure apparatus according to the present invention will be described with reference to FIG.
FIG. 1 is a partial longitudinal sectional view showing a schematic configuration of an exposure apparatus according to one embodiment of the present invention.
The exposure apparatus 100 shown in FIG. 1 is a step-and-scan type scanning exposure apparatus (a so-called scanning stepper). The exposure apparatus 100 includes an illumination optical system 101, a reticle stage 102, a projection optical system 103, and a wafer stage 104 from top to bottom in FIG.
[0019]
The illumination optical system 101 emits a laser beam R having uniform illuminance (for example, an ArF excimer laser). The laser beam R emitted from the illumination optical system 101 is reflected by a mirror 107 and travels to a reticle (original such as a circuit pattern) 105. This reticle 105 is arranged on the reticle stage 102 in the optical path of the laser beam R emitted from the illumination optical system 101. The reticle 105 is held and positioned on the reticle stage 102 by vacuum suction or the like.
[0020]
The projection optical system 103 directly below the reticle stage 102 reduces the laser beam R that has passed through the reticle 105 and has been patterned so as to have a projection magnification of, for example, ５, and places it on a wafer (sensitive substrate) 106. Project. The wafer 106 is held and positioned on the wafer stage 104 by vacuum suction or the like.
[0021]
Mirrors 113 and 114 are fixed to the side surfaces of the stages 102 and 104, respectively. The mirrors 113 and 114 reflect the laser beams emitted from the laser interferometers 111 and 112 of the position detecting device. The positions of the stages 102 and 104 are always detected at a resolution of, for example, about 0.5 to 1 nm.
[0022]
In the exposure apparatus 100, the illumination optical system 101 and the stage control system 108 are connected to a main control device 109 and are integrally controlled. The illumination optical system 101 emits a laser beam R synchronized with the position of each of the stages 102 and 104 according to a control signal from the main controller 109. The exposure apparatus 100 forms a desired circuit pattern on the wafer 106 with high precision by reducing and projecting the patterned laser beam R through the reticle 105 onto the wafer 106.
[0023]
Each of stages 102 and 104 in the present embodiment is a coarse movement stage capable of moving reticle 105 or wafer 106 in a relatively long distance in two directions of X axis and Y axis, and a fine movement stage mounted thereon. Are combined. The wafer stage 104 employs the stage device 10 shown in detail in FIGS. 2 to 6 as a coarse phase stage.
[0024]
Hereinafter, the stage device 10 according to the present embodiment will be described mainly with reference to FIGS. In the following description, the optical axis AX direction in the projection optical system 103 is defined as a Z axis (vertical direction in FIG. 1), and a plane direction orthogonal thereto is defined as an X axis (horizontal direction in FIG. 1) and a Y axis (FIG. 1). Perpendicular to the paper). In the example described below, a case where the stage device 10 is applied to the wafer stage 104 will be described.
[0025]
"First Embodiment"
FIG. 2 is a diagram showing a schematic configuration of the stage device according to the first embodiment of the present invention. (A) is a plan view and (B) is a side view.
FIG. 3A is a perspective plan view showing the internal configuration of the stage device, and FIG. 3B is a partial cross-sectional view illustrating the structure of a modification having an exhaust groove.
4 to 6 are perspective plan views showing the operating state of the stage device.
[0026]
As shown in FIG. 2, the stage device 10 has a form in which a square plate-like stage member 22 such as a cushion is mounted on a surface plate 21. The upper surface of the surface plate 21 is smoothed with high precision, and the stage member 22 is mounted on this upper surface.
The surface plate 21 of the stage device 10 is supported on a reference surface 120 such as a floor surface through an air mount 11 for vibration isolation. The transmission of vibration from inside and outside of the exposure apparatus 100 (see FIG. 1) is attenuated by the air mount 11.
[0027]
The fine movement stage 13 is mounted on the stage member 22 of the stage device 10. The fine movement stage 13 can perform precise positioning and attitude control in six directions of the X-axis direction, the Y-axis direction, the Z-axis direction, the θx direction, the θy direction, and the θz direction by driving a piezo element, for example. On fine movement stage 13, table 12 for holding wafer 106 is arranged. The mirror 114 described above is attached to the table 12. With such a fine movement stage 13, the wafer 106 can be positioned with high precision, and a pattern circuit or the like of the reticle 105 can be formed on the wafer 106 with high precision.
[0028]
As shown in FIG. 2, the stage member 22 is a box-like body having an opening (inner recess 22 b) on the surface plate 21 side (downward). An opening end face 22a facing the surface plate 21 is provided around the inner recess 22b. As shown in FIGS. 3 to 6, a gas outlet (illustrated in white in the drawing) 23 and a gas suction port (illustrated in black in the drawing) 24 are formed on an opening end face 22 a of the stage member 22. Are formed alternately at predetermined intervals. In each of the gas outlets in the figure, a white part inside indicates a gas bearing from which gas is blown out, and a black part outside the white part indicates an exhaust port.
[0029]
The gas outlet 23 is connected to a gas supply source (not shown), and gas such as compressed air is blown out. The gas suction port 24 is connected to the outside of the apparatus, and the gas blown out from the gas outlet 23 is sucked. The stage member 22 balances the amount of gas blown out from the gas outlet 23 and the amount of gas sucked from the gas suction port 24, so that the stage member 22 is supported in a non-contact manner on the upper surface of the platen 21, and the It can be moved in any direction. When this stage device is used in a vacuum atmosphere or a special atmosphere, as shown in FIG. 3B, an exhaust groove 22c is formed around the open end face 22a of the stage member 22, and the exhaust groove 22c is formed. Compressed air generated by the stage member 22 is absorbed.
[0030]
As shown in FIGS. 3 to 6, fixed guides 31 to 34 and movable guides 41 to 43 are accommodated in the inner concave portion 22 b of the stage member 22. The fixed guides 31 to 34 are fixed to the upper surface of the surface plate 21. The movable guides 41 to 43 are not fixed to any of the stage member 22 and the surface plate 21. The ceiling surface of the inner concave portion of the stage member 22 has a height close to, but not in contact with, the fixed guides 31 to 34 and the movable guides 41 to 43.
[0031]
First, the fixed guides 31 to 34 will be described in detail.
The fixed guides 31 to 34 are four walls extending in the X-axis direction and erected from each other at substantially the center of the surface plate 21. These fixed guides are arranged apart from each other in the Y-axis direction and parallel, and are arranged apart from each other in the X-axis direction. Each of the fixed guides 31 to 34 has a plurality of gas outlets 35 on an inner surface (opposing surface) adjacent to the movable guides 41 and 42 and an end adjacent to the side surface of the long portion 43 a of the movable guide 43. , 37 are provided. The gas blown out from the gas outlets 35 and 37 serves as a static pressure gas bearing for the movable guides 41 to 43 of the fixed guides 31 to 34.
[0032]
Next, the left and right movable guides 41 and 42 will be described in detail.
The movable guides 41 (left side in the figure) and 42 (right side in the figure) each have a block shape. The movable guide 41 is arranged movably in the X-axis direction between the opposing surfaces of the fixed guides 31 and 32. The movable guide 42 is arranged movably in the X-axis direction between the opposing surfaces of the fixed guides 33 and 34.
[0033]
On the lower surface of each of the movable guides 41 and 42 (the surface facing the upper surface of the surface plate 21), gas outlets 45 are formed at four corners, and a gas suction port 46 is formed at the center. Further, on the side surface of each of the movable guides 41 and 42 (the surface facing the inner side surface of the stage member 22), gas outlets 47 are formed at two positions near the ends, and between the two gas outlets 47. Has a gas suction port 48 formed therein. Each of the gas outlets 45 and 47 is connected to a gas supply source (not shown), and gas such as compressed air is blown out. The gas suction ports 46 and 48 are connected to the outside of the apparatus, and the gas blown out from the gas outlets 45 and 47 is sucked.
[0034]
Each of the movable guides 41 and 42 is supported in a non-contact manner with respect to the upper surface of the platen 21 by balancing the amount of gas blown from the gas outlet 45 on the lower surface and the amount of gas sucked from the gas suction port 46. On the other hand, the movable guides 41 and 42 support the inner surface of the stage member 22 in a non-contact manner by balancing the amount of gas blown from the gas outlet 47 on the side surface and the amount of gas sucked from the gas suction port 48. Is done. That is, the movable guides 41 and 42 are supported in a non-contact manner so as to be movable in the X-axis direction with respect to the surface plate 21 while maintaining a non-contact state with the fixed guides 31 to 34, and are supported with respect to the stage member 22. Are sucked in a non-contact manner and are simultaneously moved in the X-axis direction.
[0035]
Next, the center movable guide 43 will be described in detail.
The movable guide 43 is an I-shaped guide including a long portion 43a and a short portion 43b. The long portion 43a of the movable guide 43 is accommodated in a space between the fixed guides 31 and 32 on the right side in the figure and the fixed guides 33 and 34 on the left side in the figure. The length of the movable guide 43 in the longitudinal direction (Y-axis direction in the drawing) is set slightly shorter than the length between the inner surfaces of the stage member 22 in the Y-axis direction. The movable guide 43 is movable in the Y-axis direction in a state where the long portion 43a is sandwiched between the spaces between the fixed guides 31 and 32 and 33 and 34. The movable guide 43 moves in the Y-axis direction together with the stage member 22. The movable guide 43 is moved by moving the stage.
[0036]
On the lower surface of the long portion 43a of the movable guide 43 (the surface facing the upper surface of the surface plate 21), gas outlets 51 are formed at two positions on both ends, and gas is sucked between the two gas outlets 51. A mouth 52 is formed. Further, on the side surface of the short portion 43 b of the movable guide 43 (the surface facing the inner surface of the stage member 22), gas outlets 53 are formed at two outer positions, and between the two gas outlets 53. A gas suction port 54 is formed.
[0037]
The movable guide 43 is supported in a non-contact manner with respect to the upper surface of the platen 21 by balancing the amount of gas blown out from the gas outlet 51 of the long part 43 a and the amount of gas sucked from the gas suction port 52. On the other hand, the movable guide 43 is also supported in a non-contact manner with respect to the inner surface of the stage member 22 by balancing the amount of gas blown out from the gas outlet 53 of the short portion 43b and the amount of gas sucked from the gas suction port 54. You. That is, the movable guide 43 is supported in a non-contact manner so as to be movable in the Y-axis direction with respect to the surface plate 21 while maintaining a non-contact state with the fixed guides 31 to 34, and is not in contact with the stage member 22. Is moved in the Y-axis direction.
[0038]
That is, in the stage device 10, the above-described gas suction ports 24, 46, 48, 52, and 54 constitute an exhaust area, and the above-described gas outlets 23, 35, 37, 45, 47, 51, 53 constitutes a hydrostatic gas bearing. The fixed guides 31 to 34 guide the movable guides 41 and 42 in a non-contact manner in the X-axis direction, and guide the movable guide 43 in a non-contact manner in the Y-axis direction.
[0039]
The inner recess 22b of the stage member 22 is divided into two in the Y-axis direction by the fixed guides 31 to 34 and the movable guides 41 and 42, and is divided into two in the X-axis direction by the fixed guides 31 to 34 and the movable guide 43. Are divided into four in a cross-shaped shape as a whole. The movable guides 41 and 42 form an X guide, and the movable guide 43 forms a Y guide. In the inner concave portion 22b of the stage member 22, the fixed guides 31 to 34 and the movable guides 41 to 43 play the role of partition walls, and four chambers defined in a cross-shaped cross section form pressure chambers P1 to P4 having variable inner volumes. Become.
[0040]
In the inner concave portion 22b of the stage member 22, an adjustment port 55 is provided on the opposite side of the gas outlet 35 of each of the fixed guides 31 to 34. These adjustment ports 55 introduce gas into each of the pressure chambers P1 to P4 in the stage member 22, and allow gas to flow out of each of the pressure chambers P1 to P4. In addition, a total of four servo valves 56 (see FIG. 2) are provided on each side surface of the surface plate 21 in correspondence with each of the adjustment ports 55.
[0041]
The internal pressure can be adjusted for each of the pressure chambers P1 to P4 by adjusting each of the servo valves 56. The spaces P5 and P6, which are divided by the movable guide 43 between the fixed guides 31 to 34 and the movable guides 41 and 42, communicate with the outside. When the movable guides 41 and 42 move to change the volumes of the spaces P5 and P6, gas corresponding to the change in volume flows in and out of the spaces P5 and P6. Therefore, even if the inner volumes of the spaces P5 and P6 change, the movement of the movable guides 41 and 42 is not hindered.
[0042]
Next, the operation of the stage device 10 having the above configuration will be described.
When a relative difference is generated between the internal pressures of the pressure chambers P1 to P4 defined in the internal recesses 22b of the stage member 22 of the stage device 10, the stage member 22 receives a force to move in a direction to eliminate the differential pressure, and is movable. It moves (drives) on the surface plate 21 together with the guides 41 to 43. At this time, as described above, when the movable guides 41 and 42 move to change the volumes of the spaces P5 and P6, the gas corresponding to the change in volume flows in and out of the spaces P5 and P6.
[0043]
(1) The case where the stage member 22 is arranged at the center on the surface plate 21.
As shown in FIG. 3, when the stage member 22 is disposed at the center on the surface plate 21, the internal pressures of the pressure chambers P1 to P4 are made equal (P1 = P2 = P3 = P4), and the spaces P5 and P6 Are made equal (P5 = P6).
[0044]
(2) When the stage member 22 is moved in the Y direction.
As shown in FIG. 4, when a differential pressure is generated between the internal pressures of the pressure chambers P1 and P2 and the internal pressures of the pressure chambers P3 and P4, the stage member 22 smoothly moves in the Y-axis direction while the stage member 22 is not in contact with the surface plate 21. Can be moved to In the case shown in FIG. 4, the same amount of gas is introduced into the pressure chambers P1 and P2, and the same amount of gas is discharged from the pressure chambers P3 and P4 to adjust the differential pressure (P1 = P2> P3 = P4). ). Then, the stage member 22 can be positioned upward in FIG.
[0045]
(3) When the stage member 22 is moved in the X direction.
As shown in FIG. 5, when a differential pressure is generated between the internal pressures of the pressure chambers P1 and P3 and the internal pressures of the pressure chambers P2 and P4, the stage member 22 is kept in a non-contact state with the surface plate 21 in the X-axis direction. It can be moved smoothly. In the case shown in FIG. 5, the same amount of gas is discharged from the pressure chambers P1 and P3, and the same amount of gas is introduced into the pressure chambers P2 and P4 to adjust the differential pressure (P1 = P3 <P2 = P4). ). Then, the stage member 22 can be positioned to the right in FIG.
[0046]
(4) When the stage member 22 is moved in the X and Y directions.
As shown in FIG. 6, when a difference is made between the internal pressures in the pressure chambers P <b> 1 to P <b> 4, the stage member 22 smoothly moves linearly in the X-axis and Y-axis directions in a non-contact state with the platen 21. Can be moved. In the case shown in FIG. 6, gas is introduced into the pressure chamber P2, and gas is discharged from the pressure chambers P1, P3, and P4 to adjust the differential pressure (P3 <P1, P4 <P2). Then, the stage member 22 can be positioned obliquely right above in FIG.
[0047]
As described above, the stage device 10 of the present embodiment generates a differential pressure in each of the pressure chambers P1 to P4 between the surface plate 21 and the stage member 22, and according to the differential pressure, the fixed guides 31 to 34 and the movable guides The relative positional relationship of 41 to 43 can be changed quickly. By changing the volume of each of the pressure chambers P <b> 1 to P <b> 4 irrespective of the electromagnetic force, the stage member 22 can be moved while being guided in a non-contact manner with the surface plate 21.
[0048]
At this time, since the stage member 22 is directly guided in a non-contact manner on the upper surface of the platen 21, it is possible to position the wafer 106 in the XY axis direction with high accuracy while maintaining the Z axis direction reference of the wafer 106 with high accuracy. Further, since there is no need to dispose an actuator or the like around the stage member 22, the periphery of the stage can be made simple (without protrusion), and the configuration can be made simple and small.
[0049]
Hereinafter, other embodiments of the stage device according to the present invention will be described. The stage device in each of the following embodiments is assumed to be mounted on the above-described exposure apparatus 100 of FIG. 1 in substantially the same manner as in the first embodiment.
[0050]
"Second embodiment"
FIG. 7 is a perspective view showing a schematic configuration of a stage device according to the second embodiment of the present invention. (A) is an assembly drawing, (B) is an exploded view of a stage member.
FIG. 8 is a perspective plan view showing the internal configuration of the stage device.
The stage device 60 shown in FIGS. 7 and 8 includes a first stage member (X stage member) 62 that moves in the X axis direction on a surface plate 61, and a Y axis direction along the X stage member 62. It has a second stage member (Y stage member) 63 that moves. The platen 61 is a rectangular flat plate, and two rib-shaped guide walls 61a are formed on parallel side edges (oblique left and right in FIG. 7: upper and lower edges in FIG. 8) so as to face each other. I have.
[0051]
The X stage member 62 is disposed between the two guide wall portions 61a on the upper surface of the surface plate 61 so as to be movable in the X-axis direction. The length of the X stage member 62 in the longitudinal direction is slightly shorter than the interval between both wall portions 61 a of the surface plate 61. The X stage member 62 is a rectangular box having an inner concave portion on the side of the surface plate 61 (downward). As shown in FIG. 8, a gas outlet (shown in white in the figure) 67 and a gas suction port (shown in black in the figure) 68 are provided on the peripheral edge of the opening end surface 62a of the X stage member 62 at the periphery. Are formed alternately at predetermined intervals. The gas outlet 67 is connected to a gas supply source (not shown), and gas such as compressed air is blown out. The gas suction port 68 is connected to the outside of the apparatus, and the gas blown out from the gas outlet 67 is sucked.
[0052]
A gas outlet 65 for blowing gas is formed on the short side surface 62b of the X stage member 62 (the surface facing the inner surfaces of both guide wall portions 61a of the surface plate 61). The gas blown out from the gas outlet 65 is exhausted from a suction port provided around the gas outlet, and serves as a static pressure gas bearing for the inner surface of the short side surface 62b of the platen wall 61a.
As described above, in each of the gas outlets in the figure, a white part inside shows a gas bearing from which gas is blown out, and a black part outside this white part shows an exhaust port.
[0053]
On the X stage member 62, a Y stage member 63 is arranged in a non-contact manner. The Y stage member 63 is a rectangular box-like body having an inner concave portion on the surface plate 61 side (downward). As shown in FIG. 7, the Y stage member 63 is formed with a notch 63 b that extends over the X stage member 62. The notch 63b guides the Y stage member 63 along the side surface 62e of the X stage member 62 in a non-contact manner. The Y stage member 63 is movable in the Y axis direction along the longitudinal direction of the X stage member 62 while maintaining such a non-contact engagement state.
[0054]
A gas outlet 67 is formed at an end (corner) of the opening end face 63 a on both sides of the Y stage member 63, and a gas suction port 68 is formed between the two gas outlets 67. The Y stage member 63 is directly non-contact supported on the upper surface of the platen 61 by balancing the gas blown out from the gas outlet 67 and the gas sucked from the gas suction port 68. Further, a gas outlet 66 is formed on the end surface of the notch 63b of the Y stage member 63 (the surface facing the upper surface / side surface of the X stage member 62). The gas blown out from the gas outlet 66 of the Y stage member 63 serves as a static pressure gas bearing for the X stage member 62.
[0055]
As shown in FIG. 8, a band-shaped partition plate 71 extending along the Y-axis direction is provided at the center of the upper surface of the surface plate 61. The partition plate 71 is located in the inner recess 62c of the X stage member 62, and divides the inside of the inner recess 62 into two pressure chambers P1 and P2. On the other hand, as shown in FIG. 7B, a U-shaped partition plate 72 is attached to the center of the X stage member 62 so as to straddle the upper surface in the width direction. As shown in FIG. 8, the partition plate 72 is located in the inner concave portions 63c and 63d of the Y stage member 63, divides the inner concave portion 63c into two pressure chambers P3 and P4, and pressurizes the inner concave portion 63d. It is divided into two chambers P3 'and P4'. The pressure chambers P3 and P3 'communicate with each other, and the pressure chambers P4 and P4' communicate with each other, and the introduction and outflow of gas are performed simultaneously.
[0056]
That is, the partition plate 71 divides the inner concave portion of the X stage member 62 and plays the role of a partition that partitions the pressure chambers P1 and P2, and the partition plate 72 forms the inner concave portions 63c and 63d of the Y stage member 63 respectively. It divides and serves as a partition for partitioning the pressure chambers P3 and P4, and P3 'and P4'.
[0057]
In this stage device 60, the same servo valves (not shown) as in the above-described first embodiment are connected to the pressure chambers P1, P2, P3 and P3 ', and P4 and P4'. The pressure chambers P3 and P3 'and P4 and P4' are respectively connected to one servo valve, and compressed gas and the like are simultaneously introduced and discharged. By adjusting and operating such a servo valve, gas is introduced or discharged toward each of the pressure chambers P1, P2, P3 and P3 ', and P4 and P4', thereby adjusting the internal pressure of each chamber. can do.
[0058]
In the stage device 60, when the internal pressure of the pressure chamber P1 is made higher than the internal pressure of the pressure chamber P2 (P1> P2), the X stage member 62 moves to the left in FIG. Conversely, when the internal pressure of the pressure chamber P1 is made lower than the internal pressure of the pressure chamber P2 (P1 <P2), the X stage member 62 moves to the right in FIG.
[0059]
On the other hand, when the internal pressures of the pressure chambers P3 and P3 'are made higher than the internal pressures of the pressure chambers P4 and P4' (P3 = P3 '> P4 = P4'), the Y stage member 63 moves upward in FIG. Conversely, when the internal pressures of the pressure chambers P3 and P3 'are made lower than the internal pressures of the pressure chambers P4 and P4' (P3 = P3 '<P4 = P4'), the Y stage member 63 moves to the lower side in FIG. .
[0060]
The stage device 60 of the second embodiment can also obtain substantially the same operation and effects as those of the stage device 10 of the first embodiment. When the stage device 60 of the second embodiment is used, there is an advantage that the number of parts can be further reduced and the entire device can be simply configured. In particular, the point that the stage device 60 of FIGS. 7 and 8 is superior to the stage device 10 of FIGS. 2 and 3 is that it does not affect the stage movement, but does not require the spaces P5 and P6 related to the inflow and outflow of the fluid. And that the mechanism system is simplified.
[0061]
"Third embodiment"
FIG. 9 is a perspective view showing a schematic configuration of a stage device according to the third embodiment of the present invention.
FIG. 10 is a transparent plan view showing the internal configuration of the stage device.
The stage device 80 shown in FIGS. 9 and 10 differs greatly in the configuration of the X stage member 82 from the stage device 60 of the second embodiment shown in FIGS. 7 and 8. The X stage member 82 of the third embodiment is an I-shaped member having a long part 82a and a short part 82b. The length of the X stage member 82 in the longitudinal direction is slightly shorter than the interval between the two wall portions 61 a of the surface plate 61. As shown in FIG. 10, the short portion 82 b of the X stage member 82 has a surface facing the upper surface of the surface plate 81 and a surface facing the wall portion 81 a of the surface plate 81, and the inner concave portions 82 c and 82 d are formed. Is formed.
[0062]
As shown in FIG. 10, a gas outlet (shown in white in the figure) 87 and a gas suction port (shown in black in the figure) are provided on the lower surface of the X stage member 82 (the surface facing the upper surface of the platen 81). ) 88 are formed. The gas outlets 87 and the gas suction ports 88 are arranged alternately at predetermined intervals in the long portion 82a in the longitudinal direction (Y direction) and in the short portion 82b in the width direction (X direction). ing. The X stage member 82 is directly non-contact supported on the upper surface of the platen 81 by balancing the gas blown out from the gas outlet 87 and the gas sucked from the gas suction port 88.
[0063]
A gas outlet 85 is formed on the end surface of the short portion 82b of the X stage member 82 (the surface facing the wall portion 81a of the surface plate 81). The gas blown out from the gas outlet 85 serves as a static pressure gas bearing for the inner surface of the platen wall 81a of the short portion 82b.
[0064]
The Y stage member 83 has substantially the same configuration as the Y stage member 63 in the second embodiment described above, and maintains the non-contact engagement state on the long portion 82a of the X stage member 82, 82 is movable in the Y-axis direction along the long portion 82a.
[0065]
A partition plate 91 is formed in the center of the inside of both wall portions 81a of the surface plate 81. The partition plate 91 is located in the inner concave portions 82c and 82d of the short portion 82b of the X stage member 82, and divides the inner concave portions 82c and 82d into pressure chambers P1 and P2, and P1 'and P2'. The pressure chambers P1 and P1 'and the gases P2 and P2' are simultaneously and equally introduced and discharged. On the other hand, partition plates 92 similar to those of the second embodiment are attached to both side surfaces of the long portion 82a of the X stage member 82. These partition plates 92 are located in the inner concave portions 83c and 83d of the Y stage member 83, and divide the inside of the inner concave portions 83c and 83d into pressure chambers P3 and P4, and P3 'and P4'. The pressure chambers P3 and P3 'are in communication with each other, and the pressure chambers P4 and P4' are in communication with each other, so that the introduction and the outflow of gas are simultaneously performed equally.
[0066]
That is, the partition plate 91 divides the inner concave portions 82c and 82d of the short portion 82b of the X stage member 82 and plays the role of a partition that partitions the pressure chambers P1 and P2, and P1 'and P2'. , Y recessed portions 63c and 63d of the Y stage member 63 are respectively divided into two to serve as partition walls for partitioning the pressure chambers P3 and P4, and P3 'and P4'. Then, as described above, the internal pressure in each of the pressure chambers P1, P1 ', P2, P2', P3, P3 ', and P4, P4' is adjusted by a servo valve (not shown).
[0067]
In the stage device 80 of the third embodiment, when the internal pressure of the pressure chambers P1 and P1 'is higher than the internal pressures of the pressure chambers P2 and P2' (P1 = P1 '> P2 = P2'), the X stage member 82 moves to the left side of FIG. Conversely, when the internal pressures of the pressure chambers P1 and P1 'are made lower than the internal pressures of the pressure chambers P2 and P2' (P1 = P1 '<P2 = P2'), the X stage member 82 moves to the right in FIG.
The operation of the Y stage member 83 can be performed in the same manner as in the second embodiment.
[0068]
The stage device 80 according to the third embodiment can also obtain substantially the same operation and effect as the above-described second embodiment. In particular, the feature of the stage device 80 shown in FIGS. 9 and 10 is that the size of the X stage has a degree of freedom in design, and a stage having high acceleration with a reduced weight is possible.
[0069]
In the above-described first to third embodiments, the static pressure gas bearing and the exhaust area are formed by the combination of the gas outlet and the gas suction port. By burying a permanent magnet in the gas suction port, a suction force can be applied between the surface plate and the stage member.
[0070]
【The invention's effect】
As is apparent from the above description, according to the present invention, it is possible to provide a non-contact guide and drive of the stage in the XY axis directions on the surface plate without using an electromagnetic force, and to provide a stage device having a simple structure. it can.
[Brief description of the drawings]
FIG. 1 is a partial longitudinal sectional view showing a schematic configuration of an exposure apparatus according to an embodiment of the present invention.
FIG. 2 is a diagram showing a schematic configuration of a stage device according to the first embodiment of the present invention. (A) is a plan view and (B) is a side view.
FIG. 3A is a perspective plan view showing an internal configuration of the stage device, and FIG. 3B is a partial cross-sectional view illustrating a structure of a modification having an exhaust groove.
FIG. 4 is a perspective plan view showing an operation state of the stage device.
FIG. 5 is a perspective plan view showing an operation state of the stage device.
FIG. 6 is a perspective plan view showing an operation state of the stage device.
FIG. 7 is a perspective view illustrating a schematic configuration of a stage device according to a second embodiment of the present invention. (A) is an assembly drawing, (B) is an exploded view of a stage member.
FIG. 8 is a perspective plan view showing the internal configuration of the stage device.
FIG. 9 is a perspective view showing a schematic configuration of a stage device according to a third embodiment of the present invention.
FIG. 10 is a perspective plan view showing the internal configuration of the stage device.
[Explanation of symbols]
10, 60, 80 Stage device
12 tables
13 Fine movement stage
21, 61, 81 surface plate
22, 62, 63, 82, 83, 96 Stage member
23, 45, 47, 51, 53, 67, 87 Gas outlet
24, 46, 48, 52, 54, 68, 88 Gas suction port
31-34, 71, 91 Fixed guide
35, 37, 65, 85 Gas outlet
41-43, 72, 92 Movable guide
55 Adjustment port 56 Servo valve
61a, 81a Wall 97 exhaust groove
100 Exposure apparatus 102 Reticle stage
104 wafer stage 105 reticle
106 wafer P1 to P4 pressure chamber

Claims (12)

A flat surface plate having a guide surface,
A stage having an inner recess which is guided in a non-contact manner on the guide surface of the surface plate and faces the guide surface of the surface plate;
A plurality of pressure chambers formed in the inner recess, separated by a movable partition,
A pressure control valve for controlling the pressure of the plurality of pressure chambers,
With
A stage apparatus, wherein a relative pressure difference is applied to the plurality of pressure chambers to drive the stage on the surface plate. The stage apparatus according to claim 1, wherein a set of an exhaust area and a static pressure gas bearing for guiding the stage in a non-contact manner on a guide surface of the surface plate is provided on the stage. 2. The stage apparatus according to claim 1, wherein a permanent magnet is attached to the stage, the surface plate is made of a magnetic material, and the stage is attracted to the surface plate by an attraction force acting on both of them. 3. . 4. The stage apparatus according to claim 1, wherein the stage has a static pressure gas bearing having a vacuum exhaust groove provided around the stage, and the stage is guided in a non-contact manner on the surface plate. The stage device according to any one of claims 1 to 4, wherein a fixed guide and a movable guide, which also serve as a partition for partitioning an inner concave portion of the stage, are provided in the pressure chamber. The fixed guide is fixed to the surface plate,
As the movable guide, an X guide guided in a non-contact manner in the X-axis direction by the fixed guide and a Y guide guided in a non-contact manner in the Y-axis direction are provided.
The fixed guide and the X guide constitute the pressure chamber partition wall that divides the inner concave portion into two in the Y-axis direction,
The stage device according to claim 5, wherein the fixed guide and the Y guide constitute the pressure chamber partition wall that divides the inner concave portion into two in the X-axis direction. The stage device according to claim 5, wherein the pressure control valve is disposed on the fixed guide. The stage device according to claim 1, wherein a fine movement stage is provided on the stage. Said stage,
A first stage member that moves in the X-axis direction;
A second stage member moving in the Y-axis direction along the first stage member;
The stage device according to claim 1, comprising: 10. The stage device according to claim 9, wherein two guides for guiding the first stage member across both ends thereof are formed on the surface plate in parallel and opposed to each other. The stage device according to any one of claims 1 to 10, wherein the surface plate is supported by vibration isolating means. An exposure apparatus that selectively irradiates an energy beam onto a sensitive substrate to form a desired pattern on the substrate,
An exposure apparatus comprising the stage device according to claim 1.

Images