JP2004169088A - Metal surface treatment agent - Google Patents
Metal surface treatment agent Download PDFInfo
- Publication number
- JP2004169088A JP2004169088A JP2002334947A JP2002334947A JP2004169088A JP 2004169088 A JP2004169088 A JP 2004169088A JP 2002334947 A JP2002334947 A JP 2002334947A JP 2002334947 A JP2002334947 A JP 2002334947A JP 2004169088 A JP2004169088 A JP 2004169088A
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- Prior art keywords
- resin
- group
- surface treatment
- polyfunctional
- treatment agent
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 229910052751 metal Inorganic materials 0.000 title claims abstract description 33
- 239000002184 metal Substances 0.000 title claims abstract description 33
- 239000012756 surface treatment agent Substances 0.000 title claims abstract description 26
- 229920005989 resin Polymers 0.000 claims abstract description 58
- 239000011347 resin Substances 0.000 claims abstract description 58
- 239000011888 foil Substances 0.000 claims abstract description 27
- 239000000758 substrate Substances 0.000 claims abstract description 20
- 239000006087 Silane Coupling Agent Substances 0.000 claims abstract description 19
- 239000004480 active ingredient Substances 0.000 claims description 4
- -1 methacryloyl Chemical group 0.000 abstract description 7
- KOMNUTZXSVSERR-UHFFFAOYSA-N 1,3,5-tris(prop-2-enyl)-1,3,5-triazinane-2,4,6-trione Chemical compound C=CCN1C(=O)N(CC=C)C(=O)N(CC=C)C1=O KOMNUTZXSVSERR-UHFFFAOYSA-N 0.000 abstract description 5
- 239000003822 epoxy resin Substances 0.000 abstract description 4
- 229920000647 polyepoxide Polymers 0.000 abstract description 4
- 229920001955 polyphenylene ether Polymers 0.000 abstract description 4
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical group C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 abstract description 3
- KAESVJOAVNADME-UHFFFAOYSA-N Pyrrole Chemical group C=1C=CNC=1 KAESVJOAVNADME-UHFFFAOYSA-N 0.000 abstract description 3
- 125000003277 amino group Chemical group 0.000 abstract description 3
- 125000001309 chloro group Chemical group Cl* 0.000 abstract description 3
- 125000000524 functional group Chemical group 0.000 abstract description 3
- 125000005641 methacryl group Chemical group 0.000 abstract description 3
- 239000005011 phenolic resin Substances 0.000 abstract description 3
- 125000003396 thiol group Chemical group [H]S* 0.000 abstract description 3
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 abstract description 3
- BJELTSYBAHKXRW-UHFFFAOYSA-N 2,4,6-triallyloxy-1,3,5-triazine Chemical compound C=CCOC1=NC(OCC=C)=NC(OCC=C)=N1 BJELTSYBAHKXRW-UHFFFAOYSA-N 0.000 abstract description 2
- 239000004641 Diallyl-phthalate Substances 0.000 abstract description 2
- 239000004593 Epoxy Substances 0.000 abstract description 2
- PEEHTFAAVSWFBL-UHFFFAOYSA-N Maleimide Chemical compound O=C1NC(=O)C=C1 PEEHTFAAVSWFBL-UHFFFAOYSA-N 0.000 abstract description 2
- 125000003647 acryloyl group Chemical group O=C([*])C([H])=C([H])[H] 0.000 abstract description 2
- QUDWYFHPNIMBFC-UHFFFAOYSA-N bis(prop-2-enyl) benzene-1,2-dicarboxylate Chemical compound C=CCOC(=O)C1=CC=CC=C1C(=O)OCC=C QUDWYFHPNIMBFC-UHFFFAOYSA-N 0.000 abstract description 2
- 239000012948 isocyanate Substances 0.000 abstract description 2
- 150000002513 isocyanates Chemical class 0.000 abstract description 2
- 229920003048 styrene butadiene rubber Polymers 0.000 abstract description 2
- MYRTYDVEIRVNKP-UHFFFAOYSA-N 1,2-Divinylbenzene Chemical compound C=CC1=CC=CC=C1C=C MYRTYDVEIRVNKP-UHFFFAOYSA-N 0.000 abstract 2
- XLJMAIOERFSOGZ-UHFFFAOYSA-N anhydrous cyanic acid Natural products OC#N XLJMAIOERFSOGZ-UHFFFAOYSA-N 0.000 abstract 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 33
- 239000011889 copper foil Substances 0.000 description 29
- 238000000034 method Methods 0.000 description 16
- 239000000243 solution Substances 0.000 description 10
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 9
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 7
- 239000010410 layer Substances 0.000 description 7
- 239000011701 zinc Substances 0.000 description 7
- 229910052725 zinc Inorganic materials 0.000 description 7
- NXXYKOUNUYWIHA-UHFFFAOYSA-N 2,6-Dimethylphenol Chemical compound CC1=CC=CC(C)=C1O NXXYKOUNUYWIHA-UHFFFAOYSA-N 0.000 description 6
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 6
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 6
- 230000001070 adhesive effect Effects 0.000 description 6
- 239000000203 mixture Substances 0.000 description 6
- 239000003795 chemical substances by application Substances 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 5
- 238000004381 surface treatment Methods 0.000 description 5
- GVLZQVREHWQBJN-UHFFFAOYSA-N 3,5-dimethyl-7-oxabicyclo[2.2.1]hepta-1,3,5-triene Chemical compound CC1=C(O2)C(C)=CC2=C1 GVLZQVREHWQBJN-UHFFFAOYSA-N 0.000 description 4
- 229910001369 Brass Inorganic materials 0.000 description 4
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 4
- 239000000853 adhesive Substances 0.000 description 4
- 239000010951 brass Substances 0.000 description 4
- 229910052802 copper Inorganic materials 0.000 description 4
- 239000010949 copper Substances 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 4
- 229920003986 novolac Polymers 0.000 description 4
- 238000007788 roughening Methods 0.000 description 4
- 230000003746 surface roughness Effects 0.000 description 4
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 3
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 3
- AHZMUXQJTGRNHT-UHFFFAOYSA-N [4-[2-(4-cyanatophenyl)propan-2-yl]phenyl] cyanate Chemical compound C=1C=C(OC#N)C=CC=1C(C)(C)C1=CC=C(OC#N)C=C1 AHZMUXQJTGRNHT-UHFFFAOYSA-N 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- ZCDOYSPFYFSLEW-UHFFFAOYSA-N chromate(2-) Chemical compound [O-][Cr]([O-])(=O)=O ZCDOYSPFYFSLEW-UHFFFAOYSA-N 0.000 description 3
- 229910000423 chromium oxide Inorganic materials 0.000 description 3
- TVZPLCNGKSPOJA-UHFFFAOYSA-N copper zinc Chemical compound [Cu].[Zn] TVZPLCNGKSPOJA-UHFFFAOYSA-N 0.000 description 3
- 239000004643 cyanate ester Substances 0.000 description 3
- 239000010408 film Substances 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- QQOMQLYQAXGHSU-UHFFFAOYSA-N 2,3,6-Trimethylphenol Chemical compound CC1=CC=C(C)C(O)=C1C QQOMQLYQAXGHSU-UHFFFAOYSA-N 0.000 description 2
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical group C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- YNQLUTRBYVCPMQ-UHFFFAOYSA-N Ethylbenzene Chemical compound CCC1=CC=CC=C1 YNQLUTRBYVCPMQ-UHFFFAOYSA-N 0.000 description 2
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- HSSJULAPNNGXFW-UHFFFAOYSA-N [Co].[Zn] Chemical compound [Co].[Zn] HSSJULAPNNGXFW-UHFFFAOYSA-N 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- DQIPXGFHRRCVHY-UHFFFAOYSA-N chromium zinc Chemical compound [Cr].[Zn] DQIPXGFHRRCVHY-UHFFFAOYSA-N 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 229920001577 copolymer Polymers 0.000 description 2
- LSXWFXONGKSEMY-UHFFFAOYSA-N di-tert-butyl peroxide Chemical compound CC(C)(C)OOC(C)(C)C LSXWFXONGKSEMY-UHFFFAOYSA-N 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 238000009713 electroplating Methods 0.000 description 2
- 125000003700 epoxy group Chemical group 0.000 description 2
- FWDBOZPQNFPOLF-UHFFFAOYSA-N ethenyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)C=C FWDBOZPQNFPOLF-UHFFFAOYSA-N 0.000 description 2
- 239000003365 glass fiber Substances 0.000 description 2
- 238000007603 infrared drying Methods 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- QELJHCBNGDEXLD-UHFFFAOYSA-N nickel zinc Chemical compound [Ni].[Zn] QELJHCBNGDEXLD-UHFFFAOYSA-N 0.000 description 2
- 230000002265 prevention Effects 0.000 description 2
- 230000003449 preventive effect Effects 0.000 description 2
- 239000011342 resin composition Substances 0.000 description 2
- WSFQLUVWDKCYSW-UHFFFAOYSA-M sodium;2-hydroxy-3-morpholin-4-ylpropane-1-sulfonate Chemical compound [Na+].[O-]S(=O)(=O)CC(O)CN1CCOCC1 WSFQLUVWDKCYSW-UHFFFAOYSA-M 0.000 description 2
- 239000002335 surface treatment layer Substances 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- GZCWPZJOEIAXRU-UHFFFAOYSA-N tin zinc Chemical compound [Zn].[Sn] GZCWPZJOEIAXRU-UHFFFAOYSA-N 0.000 description 2
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 2
- 239000011787 zinc oxide Substances 0.000 description 2
- NDKWCCLKSWNDBG-UHFFFAOYSA-N zinc;dioxido(dioxo)chromium Chemical group [Zn+2].[O-][Cr]([O-])(=O)=O NDKWCCLKSWNDBG-UHFFFAOYSA-N 0.000 description 2
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 description 1
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 description 1
- PGJXFACHLLIKFG-UHFFFAOYSA-N 2-methyl-6-phenylphenol Chemical compound CC1=CC=CC(C=2C=CC=CC=2)=C1O PGJXFACHLLIKFG-UHFFFAOYSA-N 0.000 description 1
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- XSTXAVWGXDQKEL-UHFFFAOYSA-N Trichloroethylene Chemical group ClC=C(Cl)Cl XSTXAVWGXDQKEL-UHFFFAOYSA-N 0.000 description 1
- SNYVZKMCGVGTKN-UHFFFAOYSA-N [4-(4-cyanatophenoxy)phenyl] cyanate Chemical compound C1=CC(OC#N)=CC=C1OC1=CC=C(OC#N)C=C1 SNYVZKMCGVGTKN-UHFFFAOYSA-N 0.000 description 1
- CNUHQZDDTLOZRY-UHFFFAOYSA-N [4-(4-cyanatophenyl)sulfanylphenyl] cyanate Chemical compound C1=CC(OC#N)=CC=C1SC1=CC=C(OC#N)C=C1 CNUHQZDDTLOZRY-UHFFFAOYSA-N 0.000 description 1
- YYKCHLPXFWGIMU-UHFFFAOYSA-N [4-(6-propan-2-ylidenecyclohexa-2,4-dien-1-yl)phenyl] cyanate Chemical compound CC(C)=C1C=CC=CC1C1=CC=C(OC#N)C=C1 YYKCHLPXFWGIMU-UHFFFAOYSA-N 0.000 description 1
- SIZDMAYTWUINIG-UHFFFAOYSA-N [4-[1-(4-cyanatophenyl)ethyl]phenyl] cyanate Chemical compound C=1C=C(OC#N)C=CC=1C(C)C1=CC=C(OC#N)C=C1 SIZDMAYTWUINIG-UHFFFAOYSA-N 0.000 description 1
- QXZUUHYBWMWJHK-UHFFFAOYSA-N [Co].[Ni] Chemical compound [Co].[Ni] QXZUUHYBWMWJHK-UHFFFAOYSA-N 0.000 description 1
- VDGMIGHRDCJLMN-UHFFFAOYSA-N [Cu].[Co].[Ni] Chemical compound [Cu].[Co].[Ni] VDGMIGHRDCJLMN-UHFFFAOYSA-N 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 230000003078 antioxidant effect Effects 0.000 description 1
- 239000002216 antistatic agent Substances 0.000 description 1
- 239000003849 aromatic solvent Substances 0.000 description 1
- 230000001588 bifunctional effect Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 229930003836 cresol Natural products 0.000 description 1
- XLJMAIOERFSOGZ-UHFFFAOYSA-M cyanate Chemical compound [O-]C#N XLJMAIOERFSOGZ-UHFFFAOYSA-M 0.000 description 1
- 150000001913 cyanates Chemical class 0.000 description 1
- 150000004292 cyclic ethers Chemical class 0.000 description 1
- 230000002500 effect on skin Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000004210 ether based solvent Substances 0.000 description 1
- 239000003063 flame retardant Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229920000578 graft copolymer Polymers 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 239000012760 heat stabilizer Substances 0.000 description 1
- 238000007602 hot air drying Methods 0.000 description 1
- 238000007731 hot pressing Methods 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 229920001568 phenolic resin Polymers 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 230000001376 precipitating effect Effects 0.000 description 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- UBOXGVDOUJQMTN-UHFFFAOYSA-N trichloroethylene Natural products ClCC(Cl)Cl UBOXGVDOUJQMTN-UHFFFAOYSA-N 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Landscapes
- Other Surface Treatments For Metallic Materials (AREA)
Abstract
Description
【0001】
【発明の属する技術分野】
本発明は、金属箔の表面処理剤に関する。特に、銅箔と絶縁樹脂との密着性に優れる銅箔の表面処理剤に関する。
【0002】
【従来の技術】
近年、コンピュータや情報通信機器が高性能・高機能化し、そのネットワーク化が進展するに伴い、大容量の情報を高速で伝達処理するために扱う信号は高周波化する傾向にある。
一般にプリント配線板の絶縁材料には接着特性に優れるエポキシ樹脂が広く用いられているが、エポキシ樹脂は一般に比誘電率や誘電正接が高く、高周波特性が十分ではない。したがって、誘電特性の優れた樹脂を用いなければならないが、比誘電率や誘電正接が低い樹脂は接着に寄与する極性の高い官能基が少なく、接着特性は低下する傾向にある。また、高周波対応基板の銅箔は、可能な限り表面粗さを小さくすることが望まれている。このように銅箔のロープロファイル化が望まれているのは、高周波になるに従い銅箔の表面部分に電流が集中して流れるようになり(この現象を表皮効果という)、銅箔の表面粗さが伝送損失に大きく影響すると考えられているためである。
【0003】
以上、高周波対応用基板では、樹脂の変更と銅箔のロープロファイル化により、銅箔と絶縁樹脂との接着強度は低くなり、その接着性を改善させることが強く要望されている。
【0004】
このような銅箔と絶縁樹脂との接着性を改善させる手段としてはシランカップリング剤の表面処理または樹脂への添加の方法がとられるのが一般的である。エポキシ系やアミノ系の市販のシランカップリング剤は効果があり、長年使用されてきていたが、近年の上記高周波対応の流れでは、要求特性を満足できない場合が増えてきている現状にある。
【0005】
また、本発明に類似の従来技術としては、樹脂付金属箔(例えば、特許文献1、2、3参照)がある。これらの技術は、樹脂組成物の厚みが10μm以上(通常20μm以上)あり、その樹脂が接着剤として作用する。用途はビルトアップ法を用いた多層板の製造である。一方、本発明の表面処理剤は、プリプレグや接着剤との濡れ性や密着性を改善させるためのものであり、表面処理層自体で接着剤として使われない。それゆえ、本発明は、それらの樹脂付金属箔とは用途的に完全に異なる分野の技術である。
【0006】
【特許文献1】
特開平9−1728号公報
【特許文献2】
特開平10−178275号公報
【特許文献3】
特開2000−34406号公報
【0007】
【発明が解決しようとする課題】
本発明は、絶縁樹脂との密着性に優れた金属箔の表面処理剤を提供することを目的とする。特に高周波対応基板の絶縁樹脂との密着性に優れるロープロファイル銅箔の表面処理剤を提供することを目的とする。
【0008】
【課題を解決するための手段】
本発明者らは、銅箔と絶縁基板との密着性を向上させるため、鋭意検討した結果、高周波基板用樹脂とシランカップリング剤を有効成分とする金属表面処理剤が高周波対応基板の絶縁樹脂との密着性に優れ、ロープロファイル銅箔においても十分な特性が得られることを確認した。
【0009】
すなわち、本発明は以下のとおりである。
(1)高周波基板用樹脂とシランカップリング剤とを有効成分とする金属表面処理剤。
(2)金属箔の片面又は両面に前記(1)記載の金属表面処理剤で処理した表面処理金属箔。
(3)前記表面処理金属箔の表面処理剤の膜厚が10μm以下であることを特徴とする前記(2)記載の表面処理金属箔。
【0010】
本発明の金属表面処理剤の有効成分の1つである高周波基板用樹脂としては、ポリフェニレンエーテル、トリアリルイソシアヌレート、トリアリルシアヌレート、フェノール樹脂、低誘電率化エポキシ樹脂、ジアリルフタレート樹脂、ジビニルベンゼン樹脂、多官能性アクリロイル樹脂、多官能性メタクリロイル樹脂、多官能性シアン酸エステル樹脂、多官能性マレイミド樹脂、多官能性イソシアネート樹脂、スチレンとブタジエン共重合体のうち少なくとも1種類の樹脂を含有していればよい。
【0011】
ポリフェニレンエーテルの例としては、2,6−ジメチルフェノールの単独重合で得られるポリ(2,6−ジメチル−1,4−フェニレンエーテル)、ポリ(2,6−ジメチル−1,4−フェニレンエーテル)のスチレングラフト重合体、2,6−ジメチルフェノールと2,3,6−トリメチルフェノールの共重合体、2,6−ジメチルフェノールと2−メチル−6−フェニルフェノールの共重合体等が挙げられる。
【0012】
多官能シアン酸エステル樹脂の例としては、2,2−ビス(4−シアナートフェニル)プロパン、1,1−ビス(4−シアナートフェニル)エタン、ビス(4−シアナート−3,5−ジメチルフェニル)メタン、1,3−ビス(4−シアナートフェニル−1−(メチルエチリデン))ベンゼン、ビス(4−シアナートフェニル)チオエーテル、ビス(4−シアナートフェニル)エーテル等の2官能型シアネート樹脂;フェノールノボラック、クレゾールノボラック等から誘導される多官能シアネート樹脂を挙げることができる。
【0013】
樹脂の選定は、接着させるプリプレグ等の樹脂組成と同じ樹脂または反応する樹脂を使用することが好ましく、それぞれのプリプレグ等によって変えることが必要である。
【0014】
本発明の金属表面処理剤の有効成分の1つであるシランカップリング剤は、ビニル基、アミノ基、エポキシ基、クロル基、メタクリル基、アクリル基、メルカプト基、アゾール環、ピリジン環のうち少なくとも1種類の官能基を含有していればよく、市販されているもの、または特開平05−186479、特開平05−039295、特開平06−279458、特開平06−279461、特開平06−279462、特開平06−279456、特開平06−279464、特開平06−293779、特開平09−295990、特開平09−295988、特開平09−296135、特開平09−295989、特開平09−295991、特開平09−295992、特開平11−108246号公報等に記載されているものが好ましい。
シランカップリング剤の選定は、混合する高周波基板用樹脂と反応するかまたは相溶性がよいものが好ましく、それぞれの場合によって変えることが好ましい。
【0015】
高周波基板用樹脂とシランカップリング剤の組成比は、特に限定されるものではないが、シランカップリング剤/高周波基板用樹脂の重量比が0.1以上であることが好ましい。それぞれの成分の役割としては、シランカップリング剤は金属箔と樹脂の両方と反応することにより密着性を向上するものであり、高周波基板用樹脂は絶縁樹脂との濡れ性を向上することにより密着性を向上するものである。それゆえそれぞれの組成比は特に限定されるものではないが、シランカップリング剤が多いものが好ましい。しかしながらシランカップリング剤は高価であるため、シランカップリング剤/高周波基板用樹脂の重量比が0.1〜0.9であることが好ましく、より好ましくは0.3〜0.8である。
【0016】
本発明の表面処理剤は、少なくとも上記高周波基板用樹脂とシランカップリング剤を溶剤に溶解して用いられるものであり、使用される溶剤としては、ベンゼン、エチルベンゼン、トルエン、キシレン等の芳香族系炭化水素、ジクロロメタン、クロロホルム、トリクロロエチレン等のハロゲン系溶剤、さらにはテトラヒドロフラン、ジオキサン等の環状エーテル系溶剤等が挙げられ、これらは単体もしくは混合して使用できる。
また、本発明の表面処理剤は、所望の性能を付与させる目的で本来の性質を損なわない範囲の量の添加剤を含んでいてもよい。添加剤としては、難燃剤、酸化防止剤、熱安定剤、帯電防止剤等が挙げられる。
【0017】
本発明の表面処理剤を用いて金属箔を表面処理するには、金属箔の表面に被膜を形成する方法であればよく、例えば、金属箔を単に表面処理剤に浸漬させる方法、表面処理剤を、シャワー、又はエアードコータ、ブレードコータ、ロッドコータ、ナイフコータ、グラビアコータ、リバースコータ、キャストコータなどの装置を用いて塗布する方法が挙げられる。
【0018】
塗布膜を乾燥する方法としては、熱風乾燥、ロール加熱乾燥、赤外線乾燥、遠赤外線乾燥等の装置を用いる方法が挙げられ、実施にあたってはこれらの装置を単独で、あるいは2種以上を組み合わせて用いてもよい。
【0019】
表面処理層の膜厚は、特に限定されるものではないが、コストの点で10μm以下が好ましい。また、より好ましくは5μm以下である。
【0020】
本発明に用いる金属箔としては、どのようなものも用いることができるが、例えば銅箔、アルミ箔、錫箔、金箔等が挙げられる。容易に入手でき、かつ容易にエッチングできることから、金属箔としては銅箔、アルミ箔が好ましく、銅箔が最も好ましい。用いられる金属箔の厚みは特に限定されないが、扱い易さの点から500μm以下が適当であり、好ましくは200μm以下であり、さらに好ましくは105μm以下である。
【0021】
本発明において使用される銅箔は、電解銅箔あるいは圧延銅箔いずれでもよい。用途に応じて、粗化処理を施していてもよい。粗化処理は、微細銅粒を析出させる工程であり、耐熱処理層を形成する前に行うのが好ましい。特に高密度の配線を行わない場合には、粗化処理を行ってさらに樹脂との接着性を高めることもできる。
一方、高周波対応基板としては、上述のように銅箔の表面粗さがなるべく小さい方が好ましい。銅箔の表面粗さ(Rz)が4.0μm以下、好ましくは3.5μm以下、より好ましくは3.0μm以下の銅箔がよい。
【0022】
本発明に用いられる銅箔は、その両面または片面に耐熱処理、防錆処理、シランカップリング剤処理等が施されていてもよい。耐熱処理としては、亜鉛、亜鉛−錫、亜鉛−ニッケル、亜鉛−コバルト、銅−亜鉛、銅−ニッケル−コバルト、ニッケル−コバルトのうち少なくとも1種類の処理であることが好ましく、このうち、亜鉛が含有されているものがより好ましく、特に銅−亜鉛が好ましい。なお、この耐熱処理層には、多少他の元素、例えば、Mn、Al、Fe、Ni、Co、Sn等を添加してもよい。
この薄膜形成は、公知の電気めっきによる方法を用いて行うことができるが、電気めっきに限定されるものでなく、蒸着、その他の手段を使用しても何ら差し支えない。耐熱処理が亜鉛めっきの場合には、特公昭61−33907号公報、特開平6−81157号公報に開示の方法を用いることができる。亜鉛−ニッケル、亜鉛−コバルトの場合には、特公平7−32307号公報、特開平6−81157号公報に開示の方法を用いることができる。亜鉛−錫による処理をする場合は、特公昭58−56758号公報に開示の方法を用いることができる。銅−亜鉛(真ちゅう、黄銅)めっきは、シアン浴を用いて50〜85重量%銅、15〜50重量%亜鉛組成、例えば70重量%銅−30重量%亜鉛黄銅を電着するものである。耐熱処理層の厚みは、亜鉛の付着量として100〜10000μg/dm2、より好ましくは、1000〜5500μg/dm2である。
【0023】
防錆処理としては、亜鉛−クロメート、またはクロメート処理であることが好ましい。防錆層の形成方法は、公知のものはすべて本発明に適用することができるが、浸漬又は電解クロメート処理によりクロム酸化物、あるいは電解クロム・亜鉛処理によりクロム酸化物と亜鉛もしくは酸化亜鉛との混合物からなる防錆層を形成するのが好ましい。亜鉛−クロメート及びクロメート処理する場合には、特公平7−32307号公報に記載の方法を用いることができる。これらの防錆層の付着量は、クロム量として15μg/dm2以上、亜鉛が含まれている場合には、亜鉛量として30μg/dm2以上が好ましい。
【0024】
また、シランカップリング剤処理に用いるシランカップリング剤としては、ビニル基、アミノ基、エポキシ基、クロル基、メタクリル基、アクリル基、メルカプト基、アゾール環、ピリジン環のうち少なくとも1種類の官能基を有するシランカップリング剤が好ましい。
【0025】
【実施例】
次に本発明を実施例によって説明するが、本発明はこれらの実施例によって限定されるものではない。
実施例1〜2及び比較例1〜6
銅箔の表面処理
電解銅箔(厚さ:18μm)の粗化面を粗化処理し、黄銅層を形成後、亜鉛または酸化亜鉛とクロム酸化物との亜鉛−クロム基混合物をめっき被覆した銅箔(Rz:2.5μm)に以下の▲1▼〜▲4▼に示す表面処理剤をドクターブレードで塗布した。塗布後熱風乾燥機により乾燥した。表面処理剤の膜厚は約3μmであった。
また、表面処理剤▲5▼および▲6▼は、表面処理剤を少量銅箔上に滴下し、SUS製ロールを転がし表面処理剤を塗布した。塗布後熱風乾燥機により乾燥した。
【0026】
▲1▼2%ビニルトリエトキシシラン、2%トリアリルイソシアヌレート、1%ポリ(2,6−ジメチル−1,4−フェニレンエーテル)、0.04%ジターシャリーブチルパーオキサイドのトルエン溶液(実施例溶液)
▲2▼2%3−グリシドキシプロピルトリメトキシシラン、1%2,2−ビス(4−シアナートフェニル)プロパンのプレポリマー、2%フェノールノボラック樹脂、0.001%ナフテン酸亜鉛のDMF(ジメチルホルムアミド)溶液(実施例溶液)
▲3▼3.3%トリアリルイソシアヌレート、1.7%ポリ(2,6−ジメチル−1,4−フェニレンエーテル)、0.04%ジターシャリーブチルパーオキサイドのトルエン溶液(比較例溶液)
▲4▼1.7%2,2−ビス(4−シアナートフェニル)プロパンのプレポリマー、3.3%フェノールノボラック樹脂、0.001%ナフテン酸亜鉛のDMF(ジメチルホルムアミド)溶液(比較例溶液)
▲5▼2%ビニルトリエトキシシランの純水溶液(酢酸でpHを5に調整)(比較例溶液)
▲6▼2%3−グリシドキシプロピルトリメトキシシランの純水溶液(酢酸でpHを5に調整)(比較例溶液)
【0027】
接着性試験1
前記表面処理剤▲1▼、▲3▼、▲5▼で表面処理された銅箔及び表面処理剤を塗布していない銅箔を、ポリフェニレンエーテルとトリアリルイソシアヌレートを主成分とした液に含浸したガラス繊維基材と加熱プレスし、銅張積層板を作製した。JIS C 6481に規定する方法により、この銅張積層板の常態ピール強度を測定した。その結果を表1に示す。
【0028】
【表1】
【0029】
接着性試験2
前記表面処理剤▲2▼、▲4▼、▲6▼で表面処理された銅箔及び表面処理を塗布していない銅箔を、シアン酸エステル樹脂とフェノール樹脂を主成分とした液に含浸したガラス繊維基材と加熱プレスし、銅張積層板を作製した。JIS C 6481に規定する方法により、この銅張積層板の常態ピール強度を測定した。その結果を表2に示す。
【0030】
【表2】
【0031】
【発明の効果】
本発明の表面処理剤を用いて金属箔を表面処理することにより、絶縁樹脂と金属箔との密着性が向上する。特に高周波基板の絶縁樹脂との密着性に優れ、ロープロファイル銅箔の表面処理剤としても十分な特性が得られる。[0001]
TECHNICAL FIELD OF THE INVENTION
The present invention relates to a metal foil surface treatment agent. In particular, the present invention relates to a copper foil surface treating agent having excellent adhesion between a copper foil and an insulating resin.
[0002]
[Prior art]
2. Description of the Related Art In recent years, as computers and information communication devices have become high-performance and high-function, and their networks have been developed, signals handled for transmitting and processing large-capacity information at high speed tend to have higher frequencies.
In general, an epoxy resin having an excellent adhesive property is widely used as an insulating material of a printed wiring board. However, an epoxy resin generally has a high relative dielectric constant and a high dielectric loss tangent, and does not have sufficient high-frequency characteristics. Therefore, a resin having excellent dielectric properties must be used. However, a resin having a low relative dielectric constant or a low dielectric loss tangent has a small number of functional groups having a high polarity contributing to adhesion, and the adhesive properties tend to deteriorate. Further, it is desired that the surface roughness of the copper foil of the high-frequency compatible substrate be as small as possible. As described above, it is desired that the copper foil has a low profile because, as the frequency becomes higher, current concentrates and flows on the surface of the copper foil (this phenomenon is called a skin effect), and the surface roughness of the copper foil is reduced. Is considered to greatly affect the transmission loss.
[0003]
As described above, in the high-frequency compatible substrate, the adhesive strength between the copper foil and the insulating resin is reduced due to the change of the resin and the low profile of the copper foil, and there is a strong demand for improving the adhesiveness.
[0004]
As a means for improving the adhesion between the copper foil and the insulating resin, a method of surface treatment of a silane coupling agent or addition to a resin is generally employed. Epoxy-based or amino-based commercially available silane coupling agents are effective and have been used for many years. However, in recent years, the requirements for high-frequency applications have not been satisfied in the current situation.
[0005]
Further, as a conventional technique similar to the present invention, there is a metal foil with resin (for example, see Patent Documents 1, 2, and 3). In these techniques, the thickness of the resin composition is 10 μm or more (usually 20 μm or more), and the resin functions as an adhesive. The use is in the production of multilayer boards using the built-up method. On the other hand, the surface treatment agent of the present invention is for improving the wettability and adhesion with a prepreg or an adhesive, and is not used as an adhesive in the surface treatment layer itself. Therefore, the present invention is a technology in a field completely different in application from those of the metal foil with resin.
[0006]
[Patent Document 1]
Japanese Patent Application Laid-Open No. 9-1728 [Patent Document 2]
JP-A-10-178275 [Patent Document 3]
JP 2000-34406 A
[Problems to be solved by the invention]
An object of the present invention is to provide a metal foil surface treatment agent having excellent adhesion to an insulating resin. In particular, it is an object of the present invention to provide a surface treatment agent for a low-profile copper foil having excellent adhesion to an insulating resin of a high-frequency compatible substrate.
[0008]
[Means for Solving the Problems]
The present inventors have conducted intensive studies to improve the adhesion between the copper foil and the insulating substrate. As a result, the resin for the high-frequency substrate and the metal surface treatment agent containing a silane coupling agent as an active ingredient are used as the insulating resin of the high-frequency-compatible substrate. It was confirmed that the adhesiveness was excellent, and that sufficient characteristics could be obtained even with a low-profile copper foil.
[0009]
That is, the present invention is as follows.
(1) A metal surface treatment agent comprising a high-frequency substrate resin and a silane coupling agent as active ingredients.
(2) A surface-treated metal foil obtained by treating one or both surfaces of a metal foil with the metal surface treating agent according to (1).
(3) The surface-treated metal foil according to (2), wherein the thickness of the surface-treating agent of the surface-treated metal foil is 10 µm or less.
[0010]
Examples of the resin for a high-frequency substrate which is one of the effective components of the metal surface treating agent of the present invention include polyphenylene ether, triallyl isocyanurate, triallyl cyanurate, phenolic resin, epoxy resin having a low dielectric constant, diallyl phthalate resin, and divinyl resin. Contains at least one resin among benzene resin, polyfunctional acryloyl resin, polyfunctional methacryloyl resin, polyfunctional cyanate ester resin, polyfunctional maleimide resin, polyfunctional isocyanate resin, and styrene-butadiene copolymer Just do it.
[0011]
Examples of polyphenylene ether include poly (2,6-dimethyl-1,4-phenylene ether) and poly (2,6-dimethyl-1,4-phenylene ether) obtained by homopolymerization of 2,6-dimethylphenol. A styrene graft polymer, a copolymer of 2,6-dimethylphenol and 2,3,6-trimethylphenol, a copolymer of 2,6-dimethylphenol and 2-methyl-6-phenylphenol, and the like.
[0012]
Examples of the polyfunctional cyanate ester resin include 2,2-bis (4-cyanatophenyl) propane, 1,1-bis (4-cyanatophenyl) ethane, and bis (4-cyanato-3,5-dimethyl) Bifunctional cyanates such as phenyl) methane, 1,3-bis (4-cyanatophenyl-1- (methylethylidene)) benzene, bis (4-cyanatophenyl) thioether and bis (4-cyanatophenyl) ether Resins: Polyfunctional cyanate resins derived from phenol novolak, cresol novolak and the like can be mentioned.
[0013]
In selecting the resin, it is preferable to use the same resin or a resin that reacts with the resin composition of the prepreg or the like to be bonded, and it is necessary to change the resin depending on each prepreg or the like.
[0014]
The silane coupling agent, which is one of the active ingredients of the metal surface treatment agent of the present invention, is at least one of a vinyl group, an amino group, an epoxy group, a chloro group, a methacryl group, an acryl group, a mercapto group, an azole ring, and a pyridine ring. What is necessary is just to contain one kind of functional group, and those which are commercially available, or those disclosed in JP-A-05-186479, JP-A-05-039295, JP-A-06-279458, JP-A-06-279461, JP-A-06-279462, JP-A-06-279456, JP-A-06-279364, JP-A-06-293779, JP-A-09-295990, JP-A-09-295988, JP-A-09-296135, JP-A-09-295899, JP-A-09-2959991, JP-A-09-2959991, 09-295992, JP-A-11-108246, etc. Preferred.
The selection of the silane coupling agent is preferably one that reacts with or has good compatibility with the resin for the high-frequency substrate to be mixed, and is preferably changed depending on each case.
[0015]
The composition ratio of the high-frequency substrate resin and the silane coupling agent is not particularly limited, but the weight ratio of the silane coupling agent / high-frequency substrate resin is preferably 0.1 or more. The role of each component is that the silane coupling agent improves adhesion by reacting with both the metal foil and the resin, and the high-frequency substrate resin adheres by improving the wettability with the insulating resin. It improves the performance. Therefore, the respective composition ratios are not particularly limited, but those having a large amount of the silane coupling agent are preferable. However, since the silane coupling agent is expensive, the weight ratio of the silane coupling agent / the resin for a high-frequency substrate is preferably 0.1 to 0.9, and more preferably 0.3 to 0.8.
[0016]
The surface treatment agent of the present invention is used by dissolving at least the resin for a high-frequency substrate and a silane coupling agent in a solvent. Examples of the solvent used include aromatic solvents such as benzene, ethylbenzene, toluene, and xylene. Examples include hydrocarbons, halogen-based solvents such as dichloromethane, chloroform, and trichloroethylene, and cyclic ether-based solvents such as tetrahydrofuran and dioxane. These can be used alone or as a mixture.
Further, the surface treating agent of the present invention may contain an additive in an amount that does not impair the original properties for the purpose of imparting desired performance. Examples of the additives include a flame retardant, an antioxidant, a heat stabilizer, and an antistatic agent.
[0017]
The surface treatment of the metal foil using the surface treatment agent of the present invention may be any method that forms a film on the surface of the metal foil. For example, a method in which the metal foil is simply immersed in the surface treatment agent, a surface treatment agent Is applied using a shower or an apparatus such as an aired coater, a blade coater, a rod coater, a knife coater, a gravure coater, a reverse coater, or a cast coater.
[0018]
As a method of drying the coating film, a method using a device such as hot air drying, roll heating drying, infrared drying, far infrared drying, etc., is used, and in practice, these devices are used alone or in combination of two or more. May be.
[0019]
The thickness of the surface treatment layer is not particularly limited, but is preferably 10 μm or less from the viewpoint of cost. Further, it is more preferably 5 μm or less.
[0020]
As the metal foil used in the present invention, any metal foil can be used, and examples thereof include copper foil, aluminum foil, tin foil, and gold foil. Since the metal foil is easily available and can be easily etched, a copper foil or an aluminum foil is preferable as the metal foil, and a copper foil is most preferable. The thickness of the metal foil used is not particularly limited, but is suitably 500 μm or less, preferably 200 μm or less, and more preferably 105 μm or less from the viewpoint of ease of handling.
[0021]
The copper foil used in the present invention may be either an electrolytic copper foil or a rolled copper foil. Depending on the application, a roughening treatment may be performed. The roughening treatment is a step of precipitating fine copper particles, and is preferably performed before forming the heat-resistant treatment layer. In particular, when high-density wiring is not performed, a roughening treatment can be performed to further enhance the adhesiveness to the resin.
On the other hand, for a high-frequency compatible substrate, it is preferable that the surface roughness of the copper foil be as small as possible as described above. A copper foil having a surface roughness (Rz) of 4.0 μm or less, preferably 3.5 μm or less, and more preferably 3.0 μm or less is preferred.
[0022]
The copper foil used in the present invention may be subjected to heat treatment, rust prevention treatment, silane coupling agent treatment, or the like on both surfaces or one surface. The heat treatment is preferably at least one of zinc, zinc-tin, zinc-nickel, zinc-cobalt, copper-zinc, copper-nickel-cobalt, and nickel-cobalt. Those contained are more preferred, and copper-zinc is particularly preferred. It should be noted that some other elements, for example, Mn, Al, Fe, Ni, Co, Sn and the like may be added to this heat-resistant layer.
This thin film formation can be performed using a known method of electroplating, but is not limited to electroplating, and there is no problem using vapor deposition or other means. When the heat treatment is galvanization, the methods disclosed in JP-B-61-33907 and JP-A-6-81157 can be used. In the case of zinc-nickel and zinc-cobalt, the methods disclosed in Japanese Patent Publication No. 7-32307 and Japanese Patent Application Laid-Open No. 6-81157 can be used. In the case of treatment with zinc-tin, the method disclosed in JP-B-58-56758 can be used. The copper-zinc (brass, brass) plating is to deposit 50 to 85% by weight of copper, 15 to 50% by weight of a zinc composition, for example, 70% by weight of copper to 30% by weight of zinc and brass using a cyan bath. The thickness of the heat-resistant layer, 100~10000μg / dm 2 as the coating weight of zinc, more preferably 1000~5500μg / dm 2.
[0023]
The rust prevention treatment is preferably zinc-chromate or chromate treatment. As a method for forming a rust-preventive layer, any known method can be applied to the present invention, but immersion or electrolytic chromate treatment of chromium oxide or electrolytic chromium-zinc treatment of chromium oxide and zinc or zinc oxide It is preferable to form a rust preventive layer composed of a mixture. In the case of performing zinc-chromate and chromate treatment, the method described in Japanese Patent Publication No. 7-32307 can be used. The amount of adhesion of these rust preventive layers is preferably 15 μg / dm 2 or more in terms of the amount of chromium, and 30 μg / dm 2 or more in the case where zinc is contained.
[0024]
The silane coupling agent used in the silane coupling agent treatment includes at least one of a vinyl group, an amino group, an epoxy group, a chloro group, a methacryl group, an acryl group, a mercapto group, an azole ring, and a pyridine ring. Is preferred.
[0025]
【Example】
Next, the present invention will be described with reference to examples, but the present invention is not limited to these examples.
Examples 1 and 2 and Comparative Examples 1 to 6
Surface treatment of copper foil After roughening the roughened surface of electrolytic copper foil (thickness: 18 μm) to form a brass layer, copper plated with zinc or a zinc-chromium-based mixture of zinc oxide and chromium oxide The following surface treatment agents (1) to (4) were applied to a foil (Rz: 2.5 μm) with a doctor blade. After the application, it was dried with a hot air drier. The film thickness of the surface treatment agent was about 3 μm.
As for the surface treatment agents (5) and (6), a small amount of the surface treatment agent was dropped on a copper foil, and a SUS roll was rolled to apply the surface treatment agent. After the application, it was dried with a hot air drier.
[0026]
{Circle around (1)} A toluene solution of 2% vinyltriethoxysilane, 2% triallyl isocyanurate, 1% poly (2,6-dimethyl-1,4-phenylene ether), 0.04% ditertiary butyl peroxide (Example) solution)
(2) 2% 3-glycidoxypropyltrimethoxysilane, 1% 2,2-bis (4-cyanatophenyl) propane prepolymer, 2% phenol novolak resin, 0.001% zinc naphthenate DMF ( Dimethylformamide) solution (example solution)
(3) 3.3% triallyl isocyanurate, 1.7% poly (2,6-dimethyl-1,4-phenylene ether), 0.04% ditertiary butyl peroxide in toluene solution (comparative solution)
(4) 1.7% 2,2-bis (4-cyanatophenyl) propane prepolymer, 3.3% phenol novolak resin, 0.001% zinc naphthenate in DMF (dimethylformamide) solution (comparative solution) )
(5) Pure aqueous solution of 2% vinyltriethoxysilane (pH adjusted to 5 with acetic acid) (comparative solution)
(6) 2% pure aqueous solution of 3-glycidoxypropyltrimethoxysilane (pH adjusted to 5 with acetic acid) (comparative solution)
[0027]
Adhesion test 1
Impregnating the copper foil surface-treated with the surface treatment agents (1), (3), and (5) and the copper foil not coated with the surface treatment agent with a liquid containing polyphenylene ether and triallyl isocyanurate as main components. The resulting glass fiber base was hot-pressed to produce a copper-clad laminate. The normal peel strength of the copper-clad laminate was measured by the method specified in JIS C6481. Table 1 shows the results.
[0028]
[Table 1]
[0029]
Adhesion test 2
The copper foil surface-treated with the surface treatment agents (2), (4), and (6) and the copper foil not coated with the surface treatment were impregnated with a liquid containing a cyanate ester resin and a phenol resin as main components. A glass-clad laminate was prepared by hot pressing with a glass fiber substrate. The normal peel strength of the copper-clad laminate was measured by the method specified in JIS C6481. Table 2 shows the results.
[0030]
[Table 2]
[0031]
【The invention's effect】
The surface treatment of the metal foil using the surface treatment agent of the present invention improves the adhesion between the insulating resin and the metal foil. In particular, the adhesiveness to the insulating resin of the high-frequency substrate is excellent, and sufficient characteristics can be obtained as a surface treatment agent for a low-profile copper foil.
Claims (3)
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JP2002334947A JP2004169088A (en) | 2002-11-19 | 2002-11-19 | Metal surface treatment agent |
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US10751975B2 (en) | 2015-10-28 | 2020-08-25 | Industrial Technology Research Institute | Composite laminate |
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
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US10751975B2 (en) | 2015-10-28 | 2020-08-25 | Industrial Technology Research Institute | Composite laminate |
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