JP2004080025A5

JP2004080025A5 -

Info

Publication number: JP2004080025A5
Application number: JP2003284379A
Authority: JP
Filing date: 2003-07-31
Publication date: 2006-09-07

Claims

A cooling device for cooling an optical member placed in a vacuum atmosphere,
A radiation cooling unit that is disposed in non-contact with the optical member and cools the optical member by radiation with respect to the optical member;
And a control unit that controls the temperature of the radiation cooling unit.

A detector that detects the temperature of the optical member;
The cooling device according to claim 1, wherein the control unit controls the radiation cooling unit based on an output of the detection unit.

The cooling device according to claim 1, wherein the control unit includes a refrigerant supply unit that causes a refrigerant to flow through a flow path formed in the radiation cooling unit.

The cooling device according to claim 3, wherein the temperature of the refrigerant is substantially constant.

Wherein the control unit, so that the temperature of the refrigerant to a temperature substantially the same as the optical member, a cooling device according to claim 3, wherein the controlling the temperature of the radiant cooler.

The cooling device according to claim 1, further comprising a radiation shielding member that prevents the radiation cooling unit from absorbing heat from radiation other than the optical member.

The radiation cooling section is
A radiation plate that forms a temperature difference with respect to the optical member;
A Peltier element that is controlled by the control unit and that is bonded to the radiation plate and cools the radiation plate by a Peltier effect;
Having a flow path for the refrigerant to flow, and having a heat dissipation block for recovering the exhaust heat of the Peltier element,
The controller is
The cooling apparatus according to claim 1, further comprising a refrigerant supply unit configured to flow the refrigerant through the flow path.

The cooling device according to claim 7, wherein the temperature of the refrigerant is substantially constant.

The control unit controls the radiation cooling unit based on the output of the detection unit,
The cooling device according to claim 7, wherein the temperature of the refrigerant is substantially the same as the temperature of the optical member .

The cooling device according to claim 7, further comprising a radiation shielding member that prevents the radiation cooling unit from absorbing heat from radiation other than the optical member.

The cooling apparatus according to claim 7, wherein the refrigerant supply unit circulates the refrigerant along the flow path.

The cooling device according to claim 1, wherein the optical member is a mirror.

A cooling method for cooling an optical member placed in a vacuum atmosphere,
Detecting the temperature of the optical member;
A cooling method, comprising: cooling a radiation plate that is arranged in a non-contact manner at a position facing the optical member and absorbs heat of the optical member , based on a result detected in the detection step.

The cooling step is characterized in that a coolant having a substantially constant temperature is caused to flow through a flow path provided in a heat dissipation block provided on a heat exhaust side of a Peltier element joined to the radiation plate. 14. The cooling method according to 13.

In the cooling step, a refrigerant having a temperature substantially the same as the predetermined value is caused to flow through a flow path provided in a heat dissipation block provided on a heat exhaust surface of a Peltier element joined to the radiation plate. The cooling method according to claim 13.

The cooling device according to any one of claims 1 to 12,
An exposure apparatus comprising: an optical system that exposes an object to be processed with a pattern formed on a mask or a reticle via an optical member cooled by the cooling apparatus.

17. The exposure apparatus according to claim 16, wherein all of the optical elements that are included in the optical system and are arranged in an optical path from the mask or reticle to the object to be processed are mirrors.

The exposure apparatus according to claim 16, wherein the wavelength of light from the mask or reticle to the object to be processed through the optical system is 10 nm to 15 nm.

Projecting and exposing a workpiece using the exposure apparatus according to any one of claims 16 to 18, and
And performing a process other than exposure on the projection-exposed object to be processed.