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JP2003347684A - Ceramic substrate and manufacturing method therefor - Google Patents

Ceramic substrate and manufacturing method therefor

Info

Publication number
JP2003347684A
JP2003347684A JP2002149244A JP2002149244A JP2003347684A JP 2003347684 A JP2003347684 A JP 2003347684A JP 2002149244 A JP2002149244 A JP 2002149244A JP 2002149244 A JP2002149244 A JP 2002149244A JP 2003347684 A JP2003347684 A JP 2003347684A
Authority
JP
Japan
Prior art keywords
hole
ceramic substrate
depth
dividing groove
view
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2002149244A
Other languages
Japanese (ja)
Other versions
JP4018933B2 (en
Inventor
Tetsuo Nakamoto
徹郎 中元
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kyocera Corp
Original Assignee
Kyocera Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kyocera Corp filed Critical Kyocera Corp
Priority to JP2002149244A priority Critical patent/JP4018933B2/en
Publication of JP2003347684A publication Critical patent/JP2003347684A/en
Application granted granted Critical
Publication of JP4018933B2 publication Critical patent/JP4018933B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Perforating, Stamping-Out Or Severing By Means Other Than Cutting (AREA)
  • Printing Elements For Providing Electric Connections Between Printed Circuits (AREA)
  • Structure Of Printed Boards (AREA)

Abstract

(57)【要約】 【課題】分割溝と重なるC面部を有する貫通孔に導体形
成後分割した際、分割バリの発生や貫通孔部の導体剥離
の発生がなく、貫通孔表面周縁にセラミックス成型時に
発生する盛り上がりを低く抑える。 【解決手段】C面部5bに分割溝形成用の刃5cを備え
た穿孔用ポンチ5と分割溝形成用6を備えた金型で成型
し焼成したセラミックス基板1であって、貫通孔2のC
面部2aまで分割溝3が形成され、かつ分割溝3の深さ
D1はC面部2aの深さD2と同一或いは深く形成す
る。
(57) Abstract: When a conductor is divided into a through-hole having a C-face portion overlapping with a dividing groove after forming a conductor, there is no generation of divided burrs and no separation of the conductor in the through-hole portion. The swell that occurs sometimes is kept low. Kind Code: A1 A ceramic substrate 1 molded and fired with a die having a punch 5 having a blade 5c for forming a dividing groove on a C surface portion 5b and a mold 6 for forming a dividing groove, wherein the C of the through hole 2 is formed.
The dividing groove 3 is formed up to the surface portion 2a, and the depth D1 of the dividing groove 3 is formed to be the same as or deeper than the depth D2 of the C surface portion 2a.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、貫通孔に導体形成
したのち貫通孔間で分割する電子部品用セラミックス基
板に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a ceramic substrate for an electronic component, in which a conductor is formed in a through hole and then divided between the through holes.

【0002】[0002]

【従来の技術】図8(a)は複数の分割溝13が貫通孔
12と重なるように形成された一般的な電子部品用セラ
ミックス基板11の平面図である。本形状のセラミック
ス基板11の貫通孔12の主な用途は端面電極であっ
て、シート状のセラミックス基板11の貫通孔12にセ
ラミックス基板11の表裏の導通をとるための導体を形
成後、分割溝13,14を分割することにより、図8
(b)の斜視図に示すような複数の半円状凹部15を有
するセラミックス基板11aが得られる。
2. Description of the Related Art FIG. 8 (a) is a plan view of a general ceramic substrate 11 for an electronic component in which a plurality of divided grooves 13 are formed so as to overlap a through hole 12. FIG. The main use of the through hole 12 of the ceramic substrate 11 of this shape is an end face electrode. After forming a conductor for conducting the front and back of the ceramic substrate 11 in the through hole 12 of the sheet-like ceramic substrate 11, the dividing groove is formed. By dividing 13 and 14, FIG.
A ceramic substrate 11a having a plurality of semicircular concave portions 15 as shown in the perspective view of (b) is obtained.

【0003】上記の半円状凹部15にはセラミックス基
板11aの表裏を電気的に接続するための端面電極16
が形成されていて、図示省略するが回路基板上に上記セ
ラミックス基板11aを搭載し、セラミックス基板11
aの表面に搭載された電子部品回路チップやまたは抵抗
体膜と回路基板ランド間を上記端面電極16により電気
的に接続するためのものである。
The semicircular recess 15 has an end face electrode 16 for electrically connecting the front and back of the ceramic substrate 11a.
Although not shown, the ceramic substrate 11a is mounted on a circuit board (not shown).
This is for electrically connecting the electronic component circuit chip or the resistive film mounted on the surface a to the circuit board land by the end face electrode 16.

【0004】これらの導体形成を目的とした貫通孔12
は、導体となるペーストの吸引がスムーズになされるよ
うに、図8(c)に示すセラミックス基板11の断面図
のように貫通孔12の表面側にC面部17を形成するこ
とが良く行われている。
A through hole 12 for forming these conductors
As shown in FIG. 8C, a C-plane portion 17 is often formed on the surface side of the through-hole 12 so that the paste serving as a conductor is smoothly sucked, as shown in the sectional view of the ceramic substrate 11 shown in FIG. ing.

【0005】この分割溝13がC面部17を有する貫通
孔12と重なる形状のセラミックス基板11を金型で製
造する方法として、図9(a)の断面図に示すように、
C面部18bを有するポンチ18とその左右に分割溝形
成用の刃19を各々金型に装着し、セラミックスグリー
ンシートに押し当てることにより、図9(b)のセラミ
ックス基板11の平面図に示すような貫通孔12と分割
溝13が形成され、所定の温度で焼成することによりセ
ラミックス基板11が得られる。
As a method of manufacturing a ceramic substrate 11 having a shape in which the dividing groove 13 overlaps the through hole 12 having the C-plane portion 17 by a mold, as shown in a sectional view of FIG.
A punch 18 having a C-surface portion 18b and blades 19 for forming a dividing groove on the left and right sides of the punch 18 are mounted on a mold and pressed against a ceramic green sheet, as shown in a plan view of the ceramic substrate 11 in FIG. 9B. The through-hole 12 and the dividing groove 13 are formed, and the ceramic substrate 11 is obtained by firing at a predetermined temperature.

【0006】しかしながら、上記の分割溝13と貫通孔
12は、図9(c)に示すセラミックス基板11の断面
図で解るように分割溝13は貫通孔12の近傍で途切れ
る形状となり、その結果、分割溝13を分割する際に分
割バリが発生するという問題があった。
However, as shown in the cross-sectional view of the ceramic substrate 11 shown in FIG. 9C, the dividing groove 13 and the through hole 12 have a shape in which the dividing groove 13 is interrupted in the vicinity of the through hole 12. As a result, There is a problem that when dividing the dividing groove 13, dividing burrs occur.

【0007】特開平4−206802号公報によると、
図10(a)のセラミックス基板111の平面図に示す
貫通孔112と分割溝113は、この分割バリの問題を
解決するとともに貫通孔112へのペースト吸引時に分
割溝113への流れ込みを防止する目的で、図10
(b)の断面図に示すように、セラミックス基板111
の表面側に径の大きな孔112aと裏面側に径の小さな
孔112bを設け、上記貫通孔112と重なる分割溝1
13は、前述した径の大きな孔112a側に形成すると
ともに、径の大きな孔112aより浅く形成すると記載
されている。
According to Japanese Patent Application Laid-Open No. 4-206802,
The through holes 112 and the dividing grooves 113 shown in the plan view of the ceramic substrate 111 in FIG. 10A are intended to solve the problem of the dividing burrs and to prevent the flowing into the dividing grooves 113 when the paste is sucked into the through holes 112. And FIG.
As shown in the cross-sectional view of FIG.
A large-diameter hole 112a is provided on the front surface side and a small-diameter hole 112b is provided on the rear surface side.
13 is formed on the side of the above-described large-diameter hole 112a and is formed to be shallower than the large-diameter hole 112a.

【0008】その製造方法については、図10(c)に
示すように、刃(成形刃)119で分割溝113を、ポ
ンチ(スルーホール打ち抜きピン)118で貫通孔11
2を、同時にセラミックスグリーンシートに押し当てて
成型し、次の工程で上記分割溝113に直交する分割溝
と外辺切断を行うと記載されているが、径の大きな孔1
12aの成型は図示では刃119と一体である突出部1
19aで行うとなっているがその詳細な構造は記載され
ていない。
As for the manufacturing method, as shown in FIG. 10C, a dividing groove 113 is formed by a blade (forming blade) 119 and a through-hole 11 is formed by a punch (through-hole punching pin) 118.
2 is pressed against the ceramic green sheet at the same time, and is molded. Then, in the next step, the outer periphery is cut with a dividing groove orthogonal to the dividing groove 113.
The molding of the projection 12a is shown in FIG.
19a, but the detailed structure is not described.

【0009】[0009]

【発明が解決しようとする課題】前述した図9(a)に
示すC面部18bを有するポンチ18と刃19で、分割
溝13と重なる貫通孔12を形成すると、図9(c)に
示すように、貫通孔12のC面部17で分割溝13が途
切れ、上記分割溝13を分割すると分割バリが発生する
ということと、端面電極導体にも分割時に大きな応力が
かかり、破断面が突出或いは凹み状になったり、極端な
場合には部分的に導体剥離が発生するという課題があっ
た。
When the through hole 12 overlapping the dividing groove 13 is formed by the punch 18 and the blade 19 having the C-surface portion 18b shown in FIG. 9A, as shown in FIG. 9C. In addition, the dividing groove 13 is interrupted at the C-plane portion 17 of the through hole 12, and when the dividing groove 13 is divided, divided burrs are generated. And in extreme cases, partial conductor peeling occurs.

【0010】また、前述した特開平4−206802号
公報によると、図10(b)に示す貫通孔112の径の
大きな孔112aの深さに対し、分割溝113の深さを
浅くするようになっているが、セラミックスグリーンシ
ートに押し当てて矩形状凹部を形成するとセラミックス
基板表面に応力の逃げによる盛り上がりが発生し、これ
は後で形成する回路印刷に悪影響を及ぼすという問題が
あった。また、この孔周辺の盛り上がりを抑えるため
に、径の大きな孔112aの深さを浅く設定すると、分
割溝113の深さが更に浅くなり、ペーストの分割溝流
れ込みの問題は解決されても、本来の分割溝としての目
的を達せず分割不良が発生し、この場合も前述と同様
に、破断面が突出或いは凹み状になったり、極端な場合
には部分的に導体剥離が発生するという課題があった。
According to the above-mentioned Japanese Patent Application Laid-Open No. 4-206802, the depth of the dividing groove 113 is set to be smaller than the depth of the hole 112a having a large diameter of the through hole 112 shown in FIG. However, when a rectangular recess is formed by pressing against a ceramic green sheet, a bulge occurs due to relief of stress on the surface of the ceramic substrate, which has a problem that circuit printing formed later is adversely affected. Further, if the depth of the large-diameter hole 112a is set to be small in order to suppress the bulging around the hole, the depth of the dividing groove 113 is further reduced, and even if the problem of the paste flowing into the dividing groove is solved, In this case, as in the case described above, the splitting surface becomes protruding or dented, and in extreme cases, conductor peeling occurs partially. there were.

【0011】さらに、貫通孔112の断面は径の大きな
孔112aが矩形状を呈しているために導体形成した場
合、貫通孔112,112aのエッジ部にかかる導体膜
厚みが極端に薄い場所が発生し導体切れ等の信頼性の課
題もあった。
Further, when the conductor is formed because the hole 112a having a large diameter has a rectangular shape in the cross section of the through hole 112, a place where the thickness of the conductor film on the edge portions of the through holes 112 and 112a is extremely thin occurs. There has also been a problem of reliability such as conductor breakage.

【0012】[0012]

【課題を解決するための手段】そこで、本発明は上記課
題に鑑み、表面に複数の分割溝と該分割溝に重なるよう
に複数の貫通孔が形成されたセラミックス基板におい
て、上記貫通孔は表面側開孔部にC面部を有し、上記分
割溝が上記貫通孔のC面部まで連続して形成され、かつ
上記分割溝の深さが上記貫通孔のC面部の深さと同一、
もしくはこれよりも深いことを特徴とし、セラミックス
基板の厚みをt、分割溝の深さをD1、貫通孔のC面部
の深さをD2としたとき、その関係式が、 0.08≦D1/t≦0.40 0.08≦D2/t≦0.20 D1≧D2 であることを特徴とする。
SUMMARY OF THE INVENTION In view of the above-mentioned problems, the present invention provides a ceramic substrate having a plurality of divided grooves and a plurality of through holes formed on the surface so as to overlap the divided grooves. A side opening having a C surface portion, wherein the dividing groove is formed continuously to the C surface portion of the through hole, and the depth of the dividing groove is the same as the depth of the C surface portion of the through hole;
Alternatively, when the thickness of the ceramic substrate is t, the depth of the dividing groove is D1, and the depth of the C surface of the through hole is D2, the relational expression is 0.08 ≦ D1 / t ≦ 0.40 0.08 ≦ D2 / t ≦ 0.20 D1 ≧ D2.

【0013】また、表面に複数の分割溝と該分割溝に重
なるように複数のC面部を有する貫通孔が形成されたセ
ラミックス基板の製造方法は、上記貫通孔の穿孔用のポ
ンチは、先端のストレート部とその途中より該ストレー
ト部径より大きな径のC面部を有し、該C面部若しくは
上記ストレート部にかかる左右一対の刃を備えてなり、
複数本の上記ポンチの刃と刃の間に上記ポンチの刃と同
等の深さとなるように分割溝形成用の刃を装着して金型
を構成し、該金型でセラミックスグリーンシートを打ち
抜く工程と、打ち抜かれたセラミックスグリーンシート
を所定の温度で焼成する工程とからなることを特徴とす
る。
Further, in the method of manufacturing a ceramic substrate having a plurality of divided grooves formed on a surface thereof and a through-hole having a plurality of C-plane portions so as to overlap the divided grooves, the punch for piercing the through-holes may have It has a straight portion and a C surface portion having a diameter larger than the straight portion diameter in the middle thereof, and comprises a pair of left and right blades pertaining to the C surface portion or the straight portion,
A step of mounting a blade for forming a dividing groove so as to have a depth equivalent to the blade of the punch between the plurality of blades of the punch, forming a mold, and punching a ceramic green sheet with the mold. And firing the punched ceramic green sheet at a predetermined temperature.

【0014】[0014]

【発明の実施の形態】以下、本発明の実施形態について
説明する。
Embodiments of the present invention will be described below.

【0015】図1(a)は本発明のセラミックス基板の
一例を示す平面図である。
FIG. 1A is a plan view showing an example of the ceramic substrate of the present invention.

【0016】上記セラミックス基板1は、表面に複数の
分割溝3,4と該分割溝3と重なるように複数の貫通孔
2を有する。上記貫通孔2は表面側開孔部にC面部2a
を有し、上記分割溝2を分割した断面図を図1(b)に
示すように、上記分割溝3が上記貫通孔2のC面部2a
まで連続して形成され、かつ上記分割溝3の深さD1が
上記貫通孔2のC面部2aの深さD2と同一、もしくは
これよりも深く形成していることを特徴とする。
The ceramic substrate 1 has a plurality of divided grooves 3 and 4 on its surface and a plurality of through holes 2 overlapping the divided grooves 3. The through hole 2 has a C-side portion 2a at the front side opening portion.
As shown in FIG. 1B, a sectional view obtained by dividing the dividing groove 2 is provided such that the dividing groove 3 is a C-plane portion 2 a of the through hole 2.
And the depth D1 of the dividing groove 3 is equal to or greater than the depth D2 of the C surface portion 2a of the through hole 2.

【0017】次に、本発明のセラミックス基板1の製造
方法を説明する。
Next, a method for manufacturing the ceramic substrate 1 of the present invention will be described.

【0018】図2(a)に、本発明の一例である貫通孔
2の穿孔用のポンチ5の斜視図を示し、上記穿孔用のポ
ンチ5は、先端のストレート部5aとその途中よりスト
レート部5a径より大きな径のC面部5b有し、該C面
部5b若しくは上記ストレート部5aにかかる左右一対
の刃5cを備えている。
FIG. 2A is a perspective view of a punch 5 for piercing the through hole 2 which is an example of the present invention. The punch 5 for piercing has a straight portion 5a at the tip and a straight portion 5 It has a C-face portion 5b having a diameter larger than the diameter of 5a, and is provided with a pair of left and right blades 5c that are applied to the C-face portion 5b or the straight portion 5a.

【0019】次に図2(b)の断面図に示すように、複
数本の上記ポンチ5の刃5cと刃5cの間に上記ポンチ
5の刃5cと同等の深さとなるように分割溝形成用の刃
6を装着して金型を構成し、該金型でセラミックスグリ
ーンシートを打ち抜き生製品を得る。
Next, as shown in the sectional view of FIG. 2B, a dividing groove is formed between the blades 5c of the plurality of punches 5 so as to have the same depth as the blades 5c of the punch 5. A blade is attached to form a mold, and a ceramic green sheet is punched with the mold to obtain a raw product.

【0020】次に、得られた生製品である上記の打ち抜
かれたセラミックスグリーンシートを所定の温度で焼成
することにより、図2(c)に示すC面部2aを有する
貫通孔2とそのC面部2aまで分割溝3が連続して形成
されたセラミックス基板1が得られる。
Next, the obtained green product, which is a punched ceramic green sheet, is fired at a predetermined temperature to form a through hole 2 having a C surface 2a shown in FIG. The ceramic substrate 1 in which the dividing grooves 3 are continuously formed up to 2a is obtained.

【0021】本発明のセラミックス基板1の材質は特に
限定するものではなく、アルミナ、ジルコニア、ムライ
ト、窒化珪素、窒化アルミニウム等を主成分とするセラ
ミックス焼結体を用いることができる。また本発明のセ
ラミックス基板1の貫通孔2と重なる分割溝3は一方向
のみで説明したが、いずれの方向の分割溝3,4共、そ
の分割溝3,4上に貫通孔2が形成されていても良い。
さらに上記分割溝断面形状はV字状、U字状、多段V字
状を含む略V字状であって、また、貫通孔2の平面形状
は円形で断面形状は表面開孔部をC面としたが、これに
限らず曲面状を含む略C面形状であれば良い。
The material of the ceramic substrate 1 of the present invention is not particularly limited, and a ceramic sintered body containing alumina, zirconia, mullite, silicon nitride, aluminum nitride or the like as a main component can be used. Also, although the dividing groove 3 overlapping with the through hole 2 of the ceramic substrate 1 of the present invention has been described in only one direction, the dividing groove 3 in any direction is formed on the dividing groove 3, 4. May be.
Further, the sectional shape of the divided groove is substantially V-shaped including V-shape, U-shape, and multi-stage V-shape. However, the present invention is not limited to this, and any shape having a substantially C-plane shape including a curved surface shape may be used.

【0022】また、本発明のセラミックス基板1は、前
述した材質を主成分とするセラミックス粉末に、結合
剤、焼結助剤等を添加したものを公知のドクターブレー
ド法またはロールコンパクション法等によりシート状に
成形したセラミックスグリーンシートに前述した穿孔用
のポンチ5並びに分割溝形成用の刃6を金型に備え、セ
ラミックスグリーンシートに押し当てることにより同時
成型するものであり、ポンチ5並びに刃6の材質は強度
上超硬合金が好ましい。
Further, the ceramic substrate 1 of the present invention is prepared by adding a binder, a sintering aid and the like to a ceramic powder mainly composed of the above-mentioned material by a known doctor blade method or roll compaction method. A punch 5 and a blade 6 for forming a dividing groove are provided in a mold on a ceramic green sheet formed into a shape, and are simultaneously molded by pressing the punch 5 and the blade 6 on the ceramic green sheet. The material is preferably a cemented carbide in terms of strength.

【0023】さらに、上記により得られた生製品である
セラミックスグリーンシートを所定の温度で焼成するこ
とにより本発明のセラミックス基板1を製造することが
出来る。
Furthermore, the ceramic substrate 1 of the present invention can be manufactured by firing the ceramic green sheet, which is a raw product obtained as described above, at a predetermined temperature.

【0024】このようにして得られた本発明のセラミッ
クス基板1は、例えば図3の単体のセラミックス基板1
aの斜視図に示すように、前述したシート状のセラミッ
クス基板1の貫通孔2が分割後の単体のセラミックス基
板1aにおいては半円凹部8となり、この半円凹部8は
端面電極7として利用されることが多い。その製造過程
において、貫通孔2にC面部2aが形成されている為
に、ペーストがスムーズに吸引され、また貫通孔2の表
面が極端な矩形をなしていないために、エッジ部での導
体切れ等が発生せず貫通孔2の各部にわたり均一な膜厚
が形成出来る。さらに分割溝3がC面部2a迄達してい
るために分割性が良く、単体に分割したセラミックス基
板1aの端面電極7の箇所にバリ状の突出部或いは凹み
状となったり、また端面電極7が部分的にセラミックス
から剥離するという問題が発生しない。
The ceramic substrate 1 of the present invention thus obtained is, for example, a single ceramic substrate 1 shown in FIG.
As shown in the perspective view of a, the through hole 2 of the above-mentioned sheet-shaped ceramic substrate 1 becomes a semicircular recess 8 in the single ceramic substrate 1a after division, and this semicircular recess 8 is used as an end face electrode 7. Often. In the manufacturing process, the paste is smoothly sucked because the C-plane portion 2a is formed in the through-hole 2, and the conductor is cut off at the edge portion because the surface of the through-hole 2 is not extremely rectangular. A uniform film thickness can be formed over each part of the through-hole 2 without generation of the like. Furthermore, since the dividing groove 3 reaches the C-plane portion 2a, the dividing property is good, and a burr-like protrusion or a dent is formed at the position of the end surface electrode 7 of the ceramic substrate 1a divided into a single body. The problem of partial peeling from ceramics does not occur.

【0025】またこれらの効果を奉するためには、図4
に示す貫通孔2のC面部2aの深さD2はセラミックス
基板1の厚みtに対し、8〜20%が好ましく、分割溝
3の深さD1はC面部2aの深さD2と同一或いは、こ
れよりも深く形成し、その好ましい範囲はセラミックス
基板1の厚みtの8〜40%である。また貫通孔2のC
面部2aの幅Wは導体形成用ペーストの吸引をスムーズ
にするためのものであるが、隣り合う電極間クリランス
等のパターン設計上から決めれば良く少なくともセラミ
ックス基板1の厚みtの5〜20%程度の範囲にあれば
良い。尚、分割溝3の深さD1とは、図1(c)に示
す、貫通孔2間の分割溝3並びに貫通孔2のC面部2a
域の分割溝3aを総称しており、上記のそれぞれの分割
溝3,3aの深さD1は良好な分割性を得るために同一
深さに形成する。
In order to provide these effects, FIG.
Is preferably 8 to 20% of the thickness t of the ceramic substrate 1 with respect to the thickness t of the ceramic substrate 1, and the depth D1 of the dividing groove 3 is equal to or greater than the depth D2 of the C surface portion 2a. The preferred range is 8 to 40% of the thickness t of the ceramic substrate 1. Also, C of the through hole 2
The width W of the surface portion 2a is for smoothing the suction of the paste for forming the conductor, and may be determined from the pattern design such as the clearance between the adjacent electrodes, at least about 5 to 20% of the thickness t of the ceramic substrate 1. It is good if it is in the range of. Note that the depth D1 of the division groove 3 refers to the division groove 3 between the through holes 2 and the C surface portion 2a of the through hole 2 shown in FIG.
The division grooves 3a in the area are collectively referred to, and the depth D1 of each of the division grooves 3 and 3a is formed at the same depth in order to obtain good division performance.

【0026】ここで、貫通孔2間の分割溝3の深さD1
を貫通孔2のC面部2aの深さD2と同一或いは、これ
よりも深くする理由は、貫通孔2のC面部2aはセラミ
ックスグリーンシートへ金型により押圧成型するため
に、貫通孔2のC面部2aの深さD2を深く成型すると
その圧縮応力により貫通孔2の周縁表面に盛り上がりを
呈し、これは後の回路印刷に支障を来たすことになる。
この盛り上がりを少なくともセラミックス基板1の厚み
tの0.8%程度以内に抑えるためには、そのC面部2
aの深さD2は最大で厚みtの20%が実験的に限度で
あることが解っている。
Here, the depth D1 of the dividing groove 3 between the through holes 2
The depth of the C-plane portion 2a of the through-hole 2 is equal to or greater than the depth D2, because the C-plane portion 2a of the through-hole 2 is pressed into a ceramic green sheet by a die. When the depth D2 of the surface portion 2a is deeply formed, a bulge is formed on the peripheral surface of the through hole 2 due to its compressive stress, which hinders later circuit printing.
In order to suppress this swelling at least within about 0.8% of the thickness t of the ceramic substrate 1,
It has been found that the depth D2 of a is experimentally limited to a maximum of 20% of the thickness t.

【0027】また、分割溝3の深さD1は、経験上セラ
ミックス基板1の厚みtに対し8〜40%の範囲内であ
れば分割性並びに分割工程前での割れ防止の両面から適
当であることが解っているが、貫通孔2のC面部2aの
箇所は押圧により密度が高くなっているために、C面部
2aの深さD2より分割溝3aの深さD1が浅いと、C
面部2aの分割溝3aで分割不良が発生する可能性があ
り、良好な分割性を得るためには、D1≧D2の深さに
形成すれば良い。
The depth D1 of the dividing groove 3 is empirically set within the range of 8 to 40% with respect to the thickness t of the ceramic substrate 1 from the viewpoints of both dividability and crack prevention before the dividing step. It is understood that the density of the portion of the C surface portion 2a of the through hole 2 is increased by pressing, and if the depth D1 of the dividing groove 3a is smaller than the depth D2 of the C surface portion 2a, C
There is a possibility that a division failure may occur in the division groove 3a of the surface portion 2a, and in order to obtain a good division property, the division may be performed at a depth of D1 ≧ D2.

【0028】[0028]

【実施例】ここで、図5(a)に示す本発明実施例のセ
ラミックス基板1と、図6(a)に示す比較例1のセラ
ミックス基板21、並びに図7(a)に示す比較例2の
セラミックス基板31を各々20シートずつ製作した。
尚、比較例1の製造方法は前述した図9(a)に示すC
面18bを有するポンチ18と刃19を金型に装着して
セラミックスグリーンシートに押し当てる方法、比較例
2は図10(c)に示した刃(成形刃)119とポンチ
(スルーホール打ち抜きピン)118を金型に装着して
セラミックスグリーンシートに押し当てて成型した。
EXAMPLE Here, a ceramic substrate 1 according to an embodiment of the present invention shown in FIG. 5A, a ceramic substrate 21 of Comparative Example 1 shown in FIG. 6A, and a comparative example 2 shown in FIG. 20 sheets of each of the ceramic substrates 31 were manufactured.
Note that the manufacturing method of Comparative Example 1 is the same as that shown in FIG.
A method in which a punch 18 having a surface 18b and a blade 19 are mounted on a mold and pressed against a ceramic green sheet, and Comparative Example 2 is a blade (forming blade) 119 and a punch (through-hole punching pin) shown in FIG. 118 was mounted on a mold and pressed against a ceramic green sheet to form it.

【0029】尚、セラミックスグリーンシートはアルミ
ナ96%でドクターブレード法により成形したシート状
のものを用い焼成後の厚みtが0.635mmとなるも
のを用いた。
The ceramic green sheet used was a sheet-like sheet made of 96% alumina and formed by a doctor blade method, and had a thickness t after firing of 0.635 mm.

【0030】焼成後におけるセラミックス基板1,2
1,31の各寸法が表1に示す値となるように金型を設
定し上記セラミックスグリーンシートを成型し、その
後、このセラミックスグリーンシートを酸化雰囲気連続
焼成炉にて最高温度約1600℃で焼成し各各のセラミ
ックス基板1,21,31を得た。
Ceramic substrates 1 and 2 after firing
The mold was set so that each of the dimensions 1 and 31 had the values shown in Table 1, and the ceramic green sheet was molded. Thereafter, the ceramic green sheet was fired at a maximum temperature of about 1600 ° C. in a continuous firing furnace in an oxidizing atmosphere. Then, each of the ceramic substrates 1, 21, 31 was obtained.

【0031】尚、セラミックス基板1,21,31の貫
通孔2,22,32は、単体のセラミックス基板1a,
21a,31aの長辺側左右に各4個形成し、図5
(b)、図6(b)、図7(b)に示す、表面側の大き
な孔径φ1は0.6mm、裏面側の小さな孔径φ2は
0.4mmとし、従って、本発明実施例並びに比較例1
のC面部2a,22aの幅W及び比較例2の大きな孔3
2aの矩形状段差部の幅Wはいずれも0.1mm(基板
厚みtの15.7%)で、図5(c)、図6(c)、図
7(c)に示す、本発明並びに比較例1のC面部22a
の深さD2と比較例2の大きな孔32aの深さD2は
0.1mm(基板厚みtの15.7%)で、上記貫通孔
2,22,32と重なる分割溝3.23.33の深さD
1は、いずれも0.1mm(基板厚みtの15.7%)
とした。
The through-holes 2, 22, 32 of the ceramic substrates 1, 21, 31 are formed by the single ceramic substrate 1a,
4 are formed on each of the left and right sides of the long side of 21a and 31a.
6 (b), FIG. 6 (b), and FIG. 7 (b), the large hole diameter φ1 on the front side is 0.6 mm, and the small hole diameter φ2 on the back side is 0.4 mm. 1
The width W of the C surface portions 2a and 22a and the large hole 3 of the comparative example 2
The width W of the rectangular step portion 2a is 0.1 mm (15.7% of the thickness t of the substrate), and the width W of the present invention is as shown in FIGS. 5 (c), 6 (c) and 7 (c). C surface portion 22a of Comparative Example 1
The depth D2 of the large hole 32a of Comparative Example 2 is 0.1 mm (15.7% of the thickness t of the substrate), and the depth D2 of the divided groove 3.23.33 overlapping with the through holes 2, 22, 32 is 0.1 mm. Depth D
1 is 0.1 mm (15.7% of substrate thickness t)
And

【0032】本発明実施例、比較例1,2の上記各寸法
値を表1に示す。
Table 1 shows the above dimensional values of the embodiment of the present invention and Comparative Examples 1 and 2.

【0033】[0033]

【表1】 [Table 1]

【0034】上記の本発明実施例、比較例1,2の各セ
ラミックス基板1,21,31について、貫通孔2,2
2,32が形成されていない縦方向の分割溝4,24,
34を各々先に分割し、次に貫通孔2,22,32と重
なる分割溝3,23,33をハンドブレイクにより分割
し、本発明実施例、比較例1,2各々160枚の製品部
である単体のセラミックス基板1a,21a,31aを
作成した。
With respect to the ceramic substrates 1, 21 and 31 of the above-described embodiment of the present invention and Comparative Examples 1 and 2,
Vertical dividing grooves 4, 24, 24,
34 is divided first, and then the divided grooves 3, 23, 33 overlapping the through holes 2, 22, 32 are divided by hand break. A single ceramic substrate 1a, 21a, 31a was prepared.

【0035】次に図6(b)、図7(b)、図8(b)
の分割後のセラミックス基板1a,21a,31aに示
すように、バリの高さh1或いはその逆の凹みの大きさ
cを各々金属顕微鏡で測定し、いずれの値も0.1mm
以上あるものは不良とし、その不良数を各々の製品部で
あるセラミックス基板単体数の160枚で除し、分割不
良率を算出した。
Next, FIGS. 6 (b), 7 (b) and 8 (b)
As shown in the ceramic substrates 1a, 21a, and 31a after the division, the height h1 of the burrs or the size c of the concavities opposite thereto are each measured with a metallographic microscope.
Any of the above was determined to be defective, and the number of defectives was divided by 160, which is the number of single ceramic substrates as product parts, to calculate a divided defective rate.

【0036】更に、上記セラミックス基板1a,21
a,31aについて、図6(c)、図7(c)、図8
(c)に示す、孔周縁の盛り上がりの高さh2につい
て、金属顕微鏡にて各々5枚測定しその平均値を算出し
た。また盛り上がりの高さh2の良否判定は、厚膜導体
印刷のシビアなレベルである5μm以上を否とする基準
を適用した。
Further, the ceramic substrates 1a, 21
6 (c), 7 (c), 8
With respect to the height h2 of the bulge around the hole periphery shown in (c), five samples were measured with a metallographic microscope, and the average value was calculated. In addition, for the determination of the quality of the height h2 of the swelling, a criterion for rejecting 5 μm or more, which is a severe level of thick film conductor printing, was applied.

【0037】以上の結果を表2に示す。Table 2 shows the above results.

【0038】[0038]

【表2】 [Table 2]

【0039】この結果から解るように、本発明実施例
は、貫通孔2のC面部2aまで分割溝3が形成されてい
るために、分割不良の発生は皆無であった。これに対
し、比較例1は貫通孔22のC面部22aの箇所には分
割溝23が形成されていないために分割不良が3.75
%と多発した。比較例2は、孔周辺の盛り上がりより分
割性を優先し、分割溝33の深さD2を本発明実施例と
同じにしたものであるが、しかしながら分割不良が1.
25%発生した。この原因は推測であるが、貫通孔32
の大きな孔32aが矩形状段差であり、分割溝33の分
割進行方向応力を貫通孔32の大きな孔32の矩形状段
差部で分散させるためと見られる。
As can be seen from the results, in the embodiment of the present invention, since the division groove 3 was formed up to the C-plane portion 2a of the through hole 2, no division failure occurred. On the other hand, in the comparative example 1, since the division groove 23 is not formed at the position of the C surface portion 22a of the through hole 22, the division failure is 3.75.
%. In Comparative Example 2, the dividing property was prioritized over the bulge around the hole, and the depth D2 of the dividing groove 33 was the same as that of the embodiment of the present invention.
25% occurred. Although the cause is speculation, the through hole 32
The large hole 32a is a rectangular step, and it is considered that the stress in the dividing direction in the dividing groove 33 is dispersed at the rectangular step of the large hole 32 of the through hole 32.

【0040】次に、貫通孔2,22,32周縁の盛り上
がりの高さh2については、良否判定値5μmに対し本
発明実施例は平均値2.7μm、比較例1は平均2.5
μmと十分満足している。しかし、比較例2は孔周縁の
盛り上がりの高さh2の平均値は5.7μmと大きく規
格外となった。これは矩形状の大きな孔32aの成型体
積がC面形成に比較し多い分、孔周縁の盛り上がりとな
って表れたたものである。
Next, as for the height h2 of the swelling of the periphery of the through holes 2, 22, 32, the average value is 2.7 μm in the embodiment of the present invention and 2.5 μm in the comparative example 1 for the pass / fail judgment value of 5 μm.
μm is satisfactory. However, in Comparative Example 2, the average value of the height h2 of the bulge at the periphery of the hole was 5.7 μm, which was largely out of the standard. This is due to the fact that the molding volume of the large rectangular hole 32a is larger than that of the C-plane formation, so that the periphery of the hole is raised.

【0041】[0041]

【発明の効果】以上のように、本発明の製造方法により
得られたセラミックス基板は、分割溝が貫通孔のC面部
まで連続して形成され、かつ上記分割溝の深さが上記貫
通孔のC面部の深さと同一、もしくはこれより深く形成
されているために、貫通孔間の分割溝の分割性が良好で
あって、かつ貫通孔周縁への盛り上がりも低く抑えられ
る。
As described above, in the ceramic substrate obtained by the manufacturing method of the present invention, the dividing groove is formed continuously up to the C-plane portion of the through hole, and the depth of the dividing groove is equal to that of the through hole. Since it is formed to be the same as or deeper than the depth of the C-plane portion, the dividing property between the through-holes is good, and the swelling on the periphery of the through-hole can be suppressed low.

【0042】従って、本発明のセラミックス基板を用い
て分割溝と重なる貫通孔に端面電極用導体を形成し分割
したすると、分割時の導体へ及ぼす応力を抑えられ導体
剥離等の不良発生を防止出来る。
Therefore, when the conductor for the end face electrode is formed and divided in the through hole overlapping the dividing groove by using the ceramic substrate of the present invention, the stress applied to the conductor at the time of division can be suppressed, and occurrence of defects such as conductor peeling can be prevented. .

【図面の簡単な説明】[Brief description of the drawings]

【図1】(a)は本発明のセラミックス基板の一例を示
す平面図で、(b)はその断面図である。
FIG. 1A is a plan view showing an example of a ceramic substrate of the present invention, and FIG. 1B is a sectional view thereof.

【図2】(a)は本発明のセラミックス基板の製造方法
に用いる穿孔用ポンチの斜視図で、(b)はこの穿孔用
刃ポンチを用いた金型の断面図、(c)は本発明のセラ
ミックス基板の部分拡大した平面図である。
2A is a perspective view of a punch for use in the method of manufacturing a ceramic substrate according to the present invention, FIG. 2B is a cross-sectional view of a mold using the punch for punching, and FIG. FIG. 4 is a partially enlarged plan view of the ceramic substrate of FIG.

【図3】分割後の本発明のセラミックス基板の一例を示
す斜視図である。
FIG. 3 is a perspective view showing an example of a ceramic substrate of the present invention after division.

【図4】本発明のセラミックス基板における分割溝と貫
通孔の部分的な断面図である。
FIG. 4 is a partial sectional view of a dividing groove and a through hole in the ceramic substrate of the present invention.

【図5】(a)は本発明のセラミックス基板の平面図
で、(b)は分割後のセラミックス基板の平面図、
(c)はその貫通孔の断面図である。
5A is a plan view of a ceramic substrate of the present invention, FIG. 5B is a plan view of the divided ceramic substrate,
(C) is a sectional view of the through hole.

【図6】(a)は従来のセラミックス基板の平面図で、
(b)は分割後のセラミックス基板の平面図、(c)は
その貫通孔の断面図である。
FIG. 6A is a plan view of a conventional ceramic substrate,
(B) is a plan view of the divided ceramic substrate, and (c) is a cross-sectional view of the through hole.

【図7】(a)は他の従来のセラミックス基板の平面図
で、(b)は分割後のセラミックス基板の平面図、
(c)はその貫通孔の断面図である。
FIG. 7A is a plan view of another conventional ceramic substrate, FIG. 7B is a plan view of the divided ceramic substrate,
(C) is a sectional view of the through hole.

【図8】(a)は従来のセラミックス基板の平面図で、
(b)は分割後のセラミックス基板の斜視図、(c)は
貫通孔の断面図である。
FIG. 8A is a plan view of a conventional ceramic substrate,
(B) is a perspective view of the divided ceramic substrate, and (c) is a cross-sectional view of the through hole.

【図9】(a)は従来のセラミックス基板の製造装置の
断面図で、(b)はそれにより形成されたセラミックス
基板の部分平面図、(c)はその断面図である。
9A is a cross-sectional view of a conventional ceramic substrate manufacturing apparatus, FIG. 9B is a partial plan view of a ceramic substrate formed thereby, and FIG. 9C is a cross-sectional view thereof.

【図10】(a)は他の従来例のセラミックス基板の部
分的な平面図で、(b)はその断面図、(c)はその製
造装置の断面図である。
10A is a partial plan view of another conventional ceramic substrate, FIG. 10B is a cross-sectional view thereof, and FIG. 10C is a cross-sectional view of the manufacturing apparatus.

【符号の説明】[Explanation of symbols]

1:セラミックス基板 1a:単体のセラミックス基板 2:貫通孔 2a:C面部 3:分割溝 3a:C面部分割溝 4:分割溝 5:ポンチ 5a:ストレート部 5b:C面部 5c:刃 6:刃 7:端面電極 8:半円凹部 t:厚み D1:深さ D2:深さ W:幅 h1:バリの高さ h2:盛り上がりの高さ c:凹みの大きさ 1: Ceramic substrate 1a: Single ceramic substrate 2: Through hole 2a: C surface 3: Dividing groove 3a: C surface division groove 4: Dividing groove 5: punch 5a: straight section 5b: C surface part 5c: Blade 6: Blade 7: End face electrode 8: Semicircular recess t: thickness D1: Depth D2: Depth W: width h1: height of burr h2: Height of climax c: The size of the dent

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】表面に複数の分割溝と該分割溝に重なるよ
うに複数の貫通孔が形成されたセラミックス基板におい
て、上記貫通孔は表面側開孔部にC面部を有し、上記分
割溝が上記貫通孔のC面部まで連続して形成され、かつ
上記分割溝の深さが上記貫通孔のC面部の深さと同一、
もしくはこれよりも深いことを特徴とするセラミックス
基板。
1. A ceramic substrate having a plurality of divided grooves formed on a surface thereof and a plurality of through-holes formed so as to overlap the divided grooves, the through-holes have a C-plane portion on a front surface side opening, and the divided grooves are provided. Are continuously formed up to the C-plane portion of the through-hole, and the depth of the division groove is the same as the depth of the C-plane portion of the through-hole.
Or a ceramic substrate characterized by being deeper than this.
【請求項2】セラミックス基板の厚みをt、分割溝の深
さをD1、貫通孔のC面部の深さをD2としたとき、そ
の関係式が、 0.08≦D1/t≦0.40 0.08≦D2/t≦0.20 D1≧D2 であることを特徴とする請求項1記載のセラミックス基
板。
2. When the thickness of the ceramic substrate is t, the depth of the dividing groove is D1, and the depth of the C surface of the through hole is D2, the relational expression is as follows: 0.08 ≦ D1 / t ≦ 0.40 2. The ceramic substrate according to claim 1, wherein 0.08 ≦ D2 / t ≦ 0.20 D1 ≧ D2.
【請求項3】表面に複数の分割溝と該分割溝に重なるよ
うに複数のC面部を有する貫通孔が形成されたセラミッ
クス基板の製造方法において、上記貫通孔の穿孔用のポ
ンチは、先端のストレート部とその途中より該ストレー
ト部径より大きな径のC面部を有し、該C面部若しくは
上記ストレート部にかかる左右一対の刃を備えてなり、
複数本の上記ポンチの刃と刃の間に上記ポンチの刃と同
等の深さとなるように分割溝形成用の刃を装着して金型
を構成し、該金型でセラミックスグリーンシートを打ち
抜く工程と、打ち抜かれたセラミックスグリーンシート
を所定の温度で焼成する工程とからなるセラミックス基
板の製造方法。
3. A method of manufacturing a ceramic substrate having a surface formed with a plurality of divided grooves and a through hole having a plurality of C-surface portions so as to overlap the divided grooves. It has a straight portion and a C surface portion having a diameter larger than the straight portion diameter in the middle thereof, and comprises a pair of left and right blades pertaining to the C surface portion or the straight portion,
A step of mounting a blade for forming a dividing groove so as to have a depth equivalent to the blade of the punch between a plurality of blades of the punch and forming a mold, and punching a ceramic green sheet with the mold. And firing the punched ceramic green sheet at a predetermined temperature.
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CN103298252A (en) * 2012-03-02 2013-09-11 Lg伊诺特有限公司 Printed circuit board and method for manufacturing the same
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JP2006128297A (en) * 2004-10-27 2006-05-18 Kyocera Corp Multi-circuit board and electronic device
JP2008254019A (en) * 2007-04-04 2008-10-23 Mitsubishi Electric Corp Sheet punching method
CN103477723A (en) * 2011-04-19 2013-12-25 日本特殊陶业株式会社 Ceramic wiring board, multi-pattern ceramic wiring board, and method for producing same
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