JP2003320321A - Cleaning/drying apparatus for glass plate and cleaning and drying method - Google Patents
Cleaning/drying apparatus for glass plate and cleaning and drying methodInfo
- Publication number
- JP2003320321A JP2003320321A JP2002124682A JP2002124682A JP2003320321A JP 2003320321 A JP2003320321 A JP 2003320321A JP 2002124682 A JP2002124682 A JP 2002124682A JP 2002124682 A JP2002124682 A JP 2002124682A JP 2003320321 A JP2003320321 A JP 2003320321A
- Authority
- JP
- Japan
- Prior art keywords
- cleaning
- glass plate
- drying
- mold
- liquid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000011521 glass Substances 0.000 title claims abstract description 48
- 238000004140 cleaning Methods 0.000 title claims abstract description 34
- 238000001035 drying Methods 0.000 title claims abstract description 16
- 239000007788 liquid Substances 0.000 claims abstract description 19
- 238000000034 method Methods 0.000 claims abstract description 18
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 11
- 238000011144 upstream manufacturing Methods 0.000 claims abstract description 4
- 238000007599 discharging Methods 0.000 abstract description 6
- 239000000428 dust Substances 0.000 abstract description 3
- 239000002994 raw material Substances 0.000 description 14
- 239000011347 resin Substances 0.000 description 13
- 229920005989 resin Polymers 0.000 description 13
- 239000007789 gas Substances 0.000 description 11
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 9
- 238000006116 polymerization reaction Methods 0.000 description 8
- 239000003570 air Substances 0.000 description 7
- 239000004925 Acrylic resin Substances 0.000 description 5
- 229920000178 Acrylic resin Polymers 0.000 description 5
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 238000003825 pressing Methods 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 3
- 229920000642 polymer Polymers 0.000 description 3
- 239000003505 polymerization initiator Substances 0.000 description 3
- PFHOSZAOXCYAGJ-UHFFFAOYSA-N 2-[(2-cyano-4-methoxy-4-methylpentan-2-yl)diazenyl]-4-methoxy-2,4-dimethylpentanenitrile Chemical compound COC(C)(C)CC(C)(C#N)N=NC(C)(C#N)CC(C)(C)OC PFHOSZAOXCYAGJ-UHFFFAOYSA-N 0.000 description 2
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 2
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 239000010419 fine particle Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- BEQKKZICTDFVMG-UHFFFAOYSA-N 1,2,3,4,6-pentaoxepane-5,7-dione Chemical compound O=C1OOOOC(=O)O1 BEQKKZICTDFVMG-UHFFFAOYSA-N 0.000 description 1
- WFUGQJXVXHBTEM-UHFFFAOYSA-N 2-hydroperoxy-2-(2-hydroperoxybutan-2-ylperoxy)butane Chemical compound CCC(C)(OO)OOC(C)(CC)OO WFUGQJXVXHBTEM-UHFFFAOYSA-N 0.000 description 1
- 101100408296 Autographa californica nuclear polyhedrosis virus AC24 gene Proteins 0.000 description 1
- JIGUQPWFLRLWPJ-UHFFFAOYSA-N Ethyl acrylate Chemical compound CCOC(=O)C=C JIGUQPWFLRLWPJ-UHFFFAOYSA-N 0.000 description 1
- YIVJZNGAASQVEM-UHFFFAOYSA-N Lauroyl peroxide Chemical compound CCCCCCCCCCCC(=O)OOC(=O)CCCCCCCCCCC YIVJZNGAASQVEM-UHFFFAOYSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
- 239000004677 Nylon Substances 0.000 description 1
- KYIKRXIYLAGAKQ-UHFFFAOYSA-N abcn Chemical compound C1CCCCC1(C#N)N=NC1(C#N)CCCCC1 KYIKRXIYLAGAKQ-UHFFFAOYSA-N 0.000 description 1
- 125000005396 acrylic acid ester group Chemical group 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 230000003078 antioxidant effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- WVIIMZNLDWSIRH-UHFFFAOYSA-N cyclohexylcyclohexane Chemical compound C1CCCCC1C1CCCCC1 WVIIMZNLDWSIRH-UHFFFAOYSA-N 0.000 description 1
- SUPCQIBBMFXVTL-UHFFFAOYSA-N ethyl 2-methylprop-2-enoate Chemical compound CCOC(=O)C(C)=C SUPCQIBBMFXVTL-UHFFFAOYSA-N 0.000 description 1
- -1 ethyl methacrylate Chemical compound 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 239000005457 ice water Substances 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- 125000005397 methacrylic acid ester group Chemical group 0.000 description 1
- 229920001778 nylon Polymers 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000013307 optical fiber Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 1
- 150000002978 peroxides Chemical class 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- BWJUFXUULUEGMA-UHFFFAOYSA-N propan-2-yl propan-2-yloxycarbonyloxy carbonate Chemical compound CC(C)OC(=O)OOC(=O)OC(C)C BWJUFXUULUEGMA-UHFFFAOYSA-N 0.000 description 1
- APSBXTVYXVQYAB-UHFFFAOYSA-M sodium docusate Chemical compound [Na+].CCCCC(CC)COC(=O)CC(S([O-])(=O)=O)C(=O)OCC(CC)CCCC APSBXTVYXVQYAB-UHFFFAOYSA-M 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- 239000000057 synthetic resin Substances 0.000 description 1
- 239000008399 tap water Substances 0.000 description 1
- 235000020679 tap water Nutrition 0.000 description 1
- 239000006097 ultraviolet radiation absorber Substances 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Landscapes
- Cleaning In General (AREA)
- Cleaning By Liquid Or Steam (AREA)
- Surface Treatment Of Glass (AREA)
Abstract
(57)【要約】
【課題】 鋳型を形成するガラス板を洗浄し、汚れや付
着したごみを除去できる洗浄装置及び洗浄方法を提供す
る。
【解決手段】 搬送される鋳型形成用ガラス板の洗浄乾
燥装置であって、上流側から、ガラス板表面への液体吐
出口、回転ブラシ、及び気体吐出口を順次有するガラス
板洗浄乾燥装置；搬送される鋳型形成用ガラス板の洗浄
乾燥方法であって、ガラス板表面へ液体を吐出し、その
表面を回転ブラシで洗浄し、さらに気体を吐出して乾燥
させるガラス板洗浄乾燥方法；液体は純水が好ましい。(57) [Problem] To provide a cleaning apparatus and a cleaning method capable of cleaning a glass plate forming a mold and removing dirt and attached dust. SOLUTION: The apparatus for cleaning and drying a glass sheet for forming a mold to be conveyed, the apparatus for cleaning and drying a glass sheet sequentially having a liquid discharge port, a rotary brush, and a gas discharge port from the upstream side to the surface of the glass sheet; A glass plate cleaning and drying method for discharging a liquid to the surface of the glass plate, cleaning the surface with a rotating brush, and further discharging and drying a gas; Water is preferred.
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、鋳型形成用ガラス
の洗浄装置及び洗浄方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a mold forming glass cleaning apparatus and cleaning method.
【０００２】[0002]
【従来の技術】アクリル樹脂板等の樹脂板を製造する方
法として、２枚のガラス板とガスケットとからなる鋳型
に重合性原料を注入して、その鋳型を温水等に浸漬する
ことによって重合性原料を重合硬化させて樹脂板を製造
する方法が広く用いられている。2. Description of the Related Art As a method for producing a resin plate such as an acrylic resin plate, a polymerizable raw material is poured into a mold consisting of two glass plates and a gasket, and the mold is immersed in hot water or the like to polymerize it. A method of polymerizing and curing a raw material to produce a resin plate is widely used.
【０００３】[0003]
【発明が解決しようとする課題】しかしながら、その鋳
型を形成するガラス板に汚れやごみが付着していると、
得られた樹脂板に汚れが転写したり、ゴミが混入するこ
とがあった。However, if dirt or dust adheres to the glass plate forming the mold,
In some cases, dirt was transferred to the obtained resin plate or dust was mixed in.
【０００４】本発明の目的は、鋳型を形成するガラス板
の洗浄装置及び洗浄方法を提供することにある。An object of the present invention is to provide a cleaning apparatus and a cleaning method for a glass plate forming a mold.
【０００５】[0005]
【課題を解決するための手段】本発明の要旨は、搬送さ
れる鋳型形成用ガラス板の洗浄乾燥装置であって、上流
側からガラス板表面への液体吐出口、回転ブラシ、及び
気体吐出口を順次有するガラス板洗浄乾燥装置にある。The gist of the present invention is a cleaning / drying apparatus for a glass plate for forming a template to be conveyed, which comprises a liquid discharge port from the upstream side to the glass plate surface, a rotary brush, and a gas discharge port. And a glass plate cleaning / drying apparatus sequentially having
【０００６】また、本発明の要旨は、搬送される鋳型形
成用ガラス板の洗浄乾燥方法であって、ガラス板表面へ
液体を吐出し、その表面を回転ブラシで洗浄し、さらに
気体を吐出して乾燥させるガラス板洗浄乾燥方法にあ
る。吐出される液体は、１００μｍ以上の異物を含ま
ず、１μｍ以上１００μｍ未満の異物が１０ｃｍ３あた
り５，０００個以下であり、抵抗率２０万Ω・ｃｍ以上
の純水であることが好ましい。Further, the gist of the present invention is a method for cleaning and drying a glass plate for forming a mold to be conveyed, which comprises discharging a liquid onto the surface of the glass plate, cleaning the surface with a rotating brush, and further discharging a gas. There is a glass plate washing and drying method for drying by drying. It is preferable that the discharged liquid does not include a foreign substance of 100 μm or more, is 5,000 or less foreign substances of 1 μm or more and less than 100 μm per 10 cm 3 , and has a resistivity of 200,000 Ω · cm or more.
【０００７】[0007]
【発明の実施の形態】本発明の洗浄装置においては、鋳
型形成用ガラス板が搬送される。搬送される方法として
は、回転するロールによって搬送される方法が挙げられ
る。搬送速度は１〜１０ｍ／ｍｉｎの範囲内であること
が好ましい。BEST MODE FOR CARRYING OUT THE INVENTION In a cleaning apparatus of the present invention, a glass plate for forming a mold is conveyed. Examples of the method of transportation include a method of transportation by a rotating roll. The transportation speed is preferably within the range of 1 to 10 m / min.
【０００８】洗浄装置は、上流側にガラス板表面への液
体吐出口を有する。液体を吐出する方法としては、液体
に圧力をかけて吐出する方法が挙げられる。吐出口とし
ては、高圧水噴射ノズルが挙げられる。ノズルの数は、
鋳型形成用ガラス板が搬送される方向をＭＤ方向とした
場合のＴＤ方向において、鋳型形成用ガラス板の全ての
位置に液体がかかる数であればよい。液体の吐出量は、
すべての吐出口の合計で、１０〜３０ｋｇ／ｍｉｎであ
ることが好ましい。The cleaning device has a liquid discharge port to the surface of the glass plate on the upstream side. As a method of ejecting the liquid, a method of applying pressure to the liquid and ejecting it can be mentioned. As the discharge port, a high-pressure water jet nozzle can be used. The number of nozzles is
In the TD direction when the direction in which the mold forming glass plate is conveyed is the MD direction, it is sufficient if the liquid is applied to all positions of the mold forming glass plate. The discharge amount of liquid is
The total of all the discharge ports is preferably 10 to 30 kg / min.
【０００９】吐出される液体としては、水や溶剤等の洗
浄液が挙げられる。それらの中でも１００μｍ以上の異
物を含まず、１μｍ以上１００μｍ未満の異物が１０ｃ
ｍ３あたり５，０００個以下であり、抵抗率２０万Ω・
ｃｍ以上の純水が好ましい。１μｍ以上１００μｍ未満
の異物は１０ｃｍ３あたり３，０００個以下であること
がより好ましい。抵抗率の上限は、１８００万Ω・ｃｍ
程度であることが好ましい。Examples of the liquid to be ejected include cleaning liquids such as water and solvents. Among them, foreign matter of 100 μm or more is not included, and foreign matter of 1 μm or more and less than 100 μm is 10 c
The number is less than 5,000 per m 3 , and the resistivity is 200,000 Ω.
Pure water of cm or more is preferable. It is more preferable that the number of foreign matters having a size of 1 μm or more and less than 100 μm is 3,000 or less per 10 cm 3 . The upper limit of resistivity is 18 million Ω · cm
It is preferably about the same.
【００１０】洗浄装置は、次いで、回転ブラシを有す
る。回転ブラシの材質としては、合成樹脂、動物の体
毛、加工された植物等が挙げられる。回転ブラシの大き
さは、直径５〜５０ｃｍであることが好ましい。その長
さは、鋳型形成用ガラス板が搬送される方向をＭＤ方向
とした場合のＴＤ方向において、ガラスの幅よりも長い
ことが好ましい。また回転ブラシは、ＴＤ方向に対して
平行に設置されることが好ましい。回転速度は、３００
ｒｐｍ〜７００ｒｐｍ、ガラス洗浄面へのブラシ押し付
け量は、例えば、直径５ｃｍの場合は０．２〜０．６ｃ
ｍ、直径２５ｃｍの場合は０．３〜０．７ｃｍ、直径５
０ｃｍの場合は０．５〜１ｃｍの範囲内であることが好
ましい。ここで、ブラシ押し付け量とは、回転ブラシの
回転軸中心からブラシ先端までの長さをＡとし、回転ブ
ラシの回転軸中心からガラス洗浄面までの長さをＢとし
た場合、Ｂ−Ａで表す。The cleaning device then has a rotating brush. Examples of the material of the rotating brush include synthetic resin, animal body hair, processed plants and the like. The size of the rotating brush is preferably 5 to 50 cm in diameter. The length is preferably longer than the width of the glass in the TD direction when the direction in which the glass plate for forming the mold is conveyed is the MD direction. Further, the rotating brush is preferably installed parallel to the TD direction. Rotation speed is 300
rpm-700 rpm, the brush pressing amount on the glass cleaning surface is, for example, 0.2-0.6 c when the diameter is 5 cm.
m, diameter 25 cm 0.3-0.7 cm, diameter 5
When it is 0 cm, it is preferably within the range of 0.5 to 1 cm. Here, the brush pressing amount is BA when the length from the center of the rotating shaft of the rotating brush to the tip of the brush is A and the length from the center of the rotating shaft of the rotating brush to the glass cleaning surface is B-A. Represent
【００１１】ブラシの数は、２〜１０本であることが好
ましい。The number of brushes is preferably 2 to 10.
【００１２】洗浄装置は、下流側にガラス表面への気体
吐出口を有する。気体を吐出する方法としては、送風機
で気体を吐出する方法が挙げられる。吐出口としては、
鋳型形成用ガラス板が搬送される方向をＭＤ方向とした
場合のＴＤ方向において、鋳型形成用ガラス板の全ての
位置に気体がかかる形状及び数であればよい。例えば、
幅はガラスの幅より広く、間隙が０．５〜５ｍｍのスリ
ットが挙げられる。その数は１〜２個であることが好ま
しい。気体の吐出量は、すべてのスリットの合計で１０
〜２００ｍ３／ｍｉｎの範囲内であることが好ましい。The cleaning device has a gas discharge port to the glass surface on the downstream side. As a method of discharging the gas, a method of discharging the gas with a blower can be mentioned. As the discharge port,
In the TD direction when the direction in which the mold forming glass plate is conveyed is the MD direction, the shape and number may be such that gas is applied to all positions of the mold forming glass plate. For example,
The width is wider than the width of the glass, and a slit having a gap of 0.5 to 5 mm can be mentioned. The number is preferably 1 to 2. The total amount of gas discharged is 10 for all slits.
It is preferably in the range of up to 200 m 3 / min.
【００１３】吐出される気体としては、空気、不活性ガ
ス等が挙げられる。乾燥された気体であることが好まし
い。Examples of the discharged gas include air and inert gas. It is preferably a dried gas.
【００１４】本発明の洗浄方法においては、搬送される
鋳型形成用ガラス板の表面へ液体を吐出する。吐出され
る液体の種類や量としては、先の洗浄装置の記載と同じ
ものが好ましい。In the cleaning method of the present invention, the liquid is discharged onto the surface of the glass plate for forming a mold that is conveyed. The type and amount of the liquid to be ejected is preferably the same as that described in the above cleaning device.
【００１５】ついで、ガラス板表面を回転ブラシで洗浄
する。材質や回転条件等は、先の洗浄装置の記載と同じ
ものが好ましい。Then, the surface of the glass plate is washed with a rotating brush. The materials, rotation conditions, etc. are preferably the same as those described in the previous cleaning device.
【００１６】さらに、ガラス板表面に気体を吐出して、
乾燥させる。吐出される気体の種類や量としては、先の
洗浄装置の記載と同じものが挙げられる。Further, gas is discharged onto the surface of the glass plate,
dry. As the kind and amount of the gas to be discharged, the same one as described in the above-mentioned cleaning device can be mentioned.
【００１７】洗浄された鋳型形成用ガラス板は、ガスケ
ットを介して、同様に洗浄された鋳型形成用ガラス板と
積層して、鋳型を形成することが好ましい。It is preferable that the washed glass plate for forming a mold is laminated with a similarly washed glass plate for forming a mold through a gasket to form a mold.
【００１８】その鋳型には、重合性原料を注入すること
ができる。重合性原料としては、メタクリル酸メチル
（以下、適宜「ＭＭＡ」という）を７０質量％以上含有
するものが好ましい。その他の重合性原料としてはアク
リル酸メチル、アクリル酸エチル等のアクリル酸エステ
ルや、メタクリル酸エチル等のＭＭＡ以外のメタクリル
酸エステルや、メタクリル酸等が挙げられる。重合性原
料はＭＭＡ等の重合体とＭＭＡ等とからなるシラップ状
の重合性原料であってもよい。A polymerizable raw material can be injected into the mold. The polymerizable raw material preferably contains 70% by mass or more of methyl methacrylate (hereinafter appropriately referred to as “MMA”). Other polymerizable raw materials include acrylic acid esters such as methyl acrylate and ethyl acrylate, methacrylic acid esters other than MMA such as ethyl methacrylate, and methacrylic acid. The polymerizable raw material may be a syrup-shaped polymerizable raw material composed of a polymer such as MMA and MMA.
【００１９】重合性原料を重合させるためには、重合性
原料に２，２’−アゾビスイソブチロニトリル、２，
２’−アゾビス（２，４−ジメチルバレロニトリル）、
２，２’−アゾビス（４−メトキシ２，４−ジメチルバ
レロニトリル）、１，１’−アゾビス（シクロヘキサン
−１−カルボニトリル）等のアゾ系重合開始剤や、ラウ
ロイルパーオキサイド、メチルエチルケトンパーオキサ
イド、ジイソプロピルパーオキシジカーボネート、ジシ
クロヘキサンパーオキシジカーボネート等の過酸化物系
重合開始剤等を含有させることが好ましい。In order to polymerize the polymerizable raw material, the polymerizable raw material is 2,2'-azobisisobutyronitrile,
2'-azobis (2,4-dimethylvaleronitrile),
Azo-based polymerization initiators such as 2,2′-azobis (4-methoxy2,4-dimethylvaleronitrile) and 1,1′-azobis (cyclohexane-1-carbonitrile), lauroyl peroxide, methyl ethyl ketone peroxide, It is preferable to add a peroxide type polymerization initiator such as diisopropyl peroxydicarbonate or dicyclohexane peroxydicarbonate.
【００２０】また、必要に応じて重合性原料中に紫外線
吸収剤、酸化防止剤、離型剤等の種々の公知の添加剤を
含有させることができる。If desired, the polymerizable raw material may contain various known additives such as an ultraviolet absorber, an antioxidant and a release agent.
【００２１】重合性原料を重合硬化させるには、熱媒と
して水や空気を用いて２０℃〜８０℃、好ましくは３０
℃〜６５℃の温度範囲で重合硬化させることが好まし
い。重合時間は０．５〜２００時間であることが好まし
い。To polymerize and cure the polymerizable raw material, water or air is used as a heat medium at 20 ° C. to 80 ° C., preferably 30 ° C.
It is preferable to polymerize and cure in a temperature range of ℃ to 65 ℃. The polymerization time is preferably 0.5 to 200 hours.
【００２２】この重合の後、熱風炉内において１００℃
〜１４０℃、好ましくは１２０℃〜１３５℃の温度範囲
で、さらに重合させることが好ましい。その重合時間は
１時間以上であることが好ましい。After this polymerization, 100 ° C. in a hot air oven.
It is preferable to further polymerize in the temperature range of 140 ° C to 140 ° C, preferably 120 ° C to 135 ° C. The polymerization time is preferably 1 hour or more.
【００２３】本発明の方法で洗浄されたガラス板から形
成された鋳型を用いて製造された樹脂板は、汚れの転写
や異物が少ないため、ディスプレイ等の前面板等の光学
用途等に適しているThe resin plate manufactured by using the mold formed from the glass plate washed by the method of the present invention is suitable for optical applications such as a front plate of a display or the like because it has less transfer of dirt and less foreign matters. Are
【００２４】[0024]
【実施例】（１）液体中の異物の測定方法
リオン株式会社製：自動式液中微粒子計数器 ＫＳ−６
１にて測定した。水１０ｃｍ３を用いて、レーザー光を
照射した際の微粒子による散乱強度を、予め校正したカ
ウンターによって検出し、１μｍ以上１００μｍ未満の
微粒子として測定した。[Examples] (1) Method for measuring foreign matter in liquid Rion Co., Ltd .: automatic liquid particle counter KS-6
It was measured at 1. The scattering intensity of the fine particles when the laser light was irradiated using 10 cm 3 of water was detected by a counter calibrated in advance, and the fine particles having a size of 1 μm or more and less than 100 μm were measured.
【００２５】（２）異物の評価方法
光源として２５０Ｗメタルハライド光源（モリテックス
（株）製ＭＭＥ−２５０）を使用し、発生する光を光フ
ァイバーライトガイドで線状光源として樹脂板の端面か
ら内部に照射した。この時、樹脂板の内部に１個の異物
がある場合は、照射された光が異物により拡散し、樹脂
板の前面において、１つの輝点として目視により確認す
ることができる。したがって、樹脂板の前面において目
視により確認された輝点の数は、樹脂板の内部にある異
物の数に相当する。この方法によって、輝点の数を測定
して、樹脂板の内部にある異物の数として評価した。(2) Foreign matter evaluation method A 250 W metal halide light source (MME-250 manufactured by Moritex Co., Ltd.) was used as a light source, and the generated light was radiated from the end face of the resin plate as a linear light source by an optical fiber light guide. . At this time, when there is one foreign substance inside the resin plate, the irradiated light is diffused by the foreign substance and can be visually confirmed as one bright spot on the front surface of the resin plate. Therefore, the number of bright spots visually confirmed on the front surface of the resin plate corresponds to the number of foreign matters inside the resin plate. By this method, the number of bright spots was measured and evaluated as the number of foreign matters inside the resin plate.
【００２６】［実施例１］一度製板に使用した大きさ１
４００×１２００×１０ｍｍのガラス板を２ｍ／ｍｉｎ
の速度で搬送しながら、その表面に１６個の高圧水噴射
ノズルによって１００μｍ以上の異物を含まず、１μｍ
以上１００μｍ未満の異物が１０ｃｍ３あたり２，８０
０個で、抵抗率１００万Ω・ｃｍの純水を、全てのノズ
ル合計で２０ｋｇ／ｍｉｎの量、２分間噴射し、７本の
直径１５ｃｍのナイロン製回転ブラシの回転数を４８０
ｒｐｍとし、ブラシ押し付け量４ｍｍでガラス表面を２
分間洗浄して、ついで、送風機によって乾燥空気を１ｍ
ｍの間隙で２４００ｍｍ幅の大きさのスリット２個か
ら、２個のスリット合計で１５０ｍ３／ｍｉｎの量、１
分間噴射して、乾燥させた。[Example 1] Size 1 used for plate making once
Glass plate of 400 × 1200 × 10mm 2m / min
While being transported at a speed of 1 μm, the surface is free of foreign matter of 100 μm or more by 16 high-pressure water jet nozzles.
Foreign matter having a size of 100 μm or more and 10 cm 3 is 280
Pure water with a resistivity of 1 million Ω · cm was sprayed with 0 nozzles at a total amount of 20 kg / min for 2 minutes, and the rotation speed of seven nylon rotating brushes with a diameter of 15 cm was 480.
2 rpm on the glass surface with rpm and brush pressing amount of 4 mm
Rinse for 1 minute, then blow dry air 1m
From 2 slits with a width of 2400 mm at a gap of m, the total amount of the two slits is 150 m 3 / min, 1
Sprayed for a minute to dry.
【００２７】同様に洗浄されたもう１枚のガラス板を、
外径３５ｍｍ、肉厚５ｍｍの塩化ビニル樹脂製ガスケッ
トを介して、洗浄面がともに内部になるように積層し
て、鋳型を形成した。Another glass plate, which was similarly washed,
Through a vinyl chloride resin gasket having an outer diameter of 35 mm and a wall thickness of 5 mm, the cleaning surfaces were laminated inside to form a mold.
【００２８】［比較例１］一度製板に使用した大きさ１
４００×１２００×１０ｍｍのガラス板を、静止状態
で、その表面に水道水を５ｋｇ／ｍｉｎの量、３分間噴
射して洗浄し、ゴム製ワイパーで水切り後、自然乾燥さ
せた。[Comparative Example 1] Size 1 used for plate making once
A glass plate of 400 × 1200 × 10 mm was washed by spraying tap water onto the surface of the glass plate in a static state at a rate of 5 kg / min for 3 minutes, draining with a rubber wiper, and then naturally drying.
【００２９】同様に洗浄されたもう１枚のガラス板を、
外径３５ｍｍ、肉厚５ｍｍの塩化ビニル樹脂製ガスケッ
トを介して、洗浄面がともに内部になるように積層し
て、鋳型を形成した。Another glass plate that was similarly washed was
Through a vinyl chloride resin gasket having an outer diameter of 35 mm and a wall thickness of 5 mm, the cleaning surfaces were laminated inside to form a mold.
【００３０】［実施例２及び比較例２］発生蒸気の冷却
管付きＳＵＳ製重合容器内で、ＭＭＡを加温し、ＭＭＡ
の温度が７５℃に達したとき、ＭＭＡ１００重量部に対
して２，２’−アゾビスイソブチロニトリル０．０００
６重量部を添加し、さらに加温を継続してＭＭＡの温度
が９５℃に達した時点で加温を停止した。加温を停止し
た状態で２０分保持した後、重合容器を氷水に入れて常
温まで冷却した。得られた重合性原料の粘度は０．６Ｐ
ａ・ｓであり、重合率は７質量％であり、重合体の重量
平均分子量は２，４００，０００であった。[Example 2 and Comparative Example 2] The MMA was heated in a SUS polymerization container equipped with a cooling steam generation tube to obtain the MMA.
When the temperature reached 75 ° C, 0.002 of 2,2'-azobisisobutyronitrile was added to 100 parts by weight of MMA.
6 parts by weight was added, and the heating was further continued, and the heating was stopped when the temperature of the MMA reached 95 ° C. After the heating was stopped for 20 minutes, the polymerization container was put in ice water and cooled to room temperature. The viscosity of the obtained polymerizable raw material is 0.6P.
and the polymerization rate was 7 mass%, and the weight average molecular weight of the polymer was 2,400,000.
【００３１】次いで、粘度０．６Ｐａ・ｓの重合性原料
１００質量部に対し、重合開始剤として２，２’−アゾ
ビス（４−メトキシ２,４−ジメチルバレロニトリル）
０．００４２質量部、離型剤としてエアロゾールＯＴ
（アメリカンシアナミド社製）０．０２質量部を添加
し、均一に攪拌した。Next, with respect to 100 parts by mass of the polymerizable raw material having a viscosity of 0.6 Pa · s, 2,2'-azobis (4-methoxy2,4-dimethylvaleronitrile) was used as a polymerization initiator.
0.0042 parts by mass, aerosol OT as a release agent
0.02 parts by mass (manufactured by American Cyanamide Co., Ltd.) was added and uniformly stirred.
【００３２】この重合性原料を、実施例１及び比較例１
で形成された鋳型の中に注入した。重合初期に４０℃の
水浴槽において２０時間重合し、次いで７０℃の空気浴
槽で３時間重合した後、９５℃の空気浴槽において２時
間、その後１３０℃の空気浴槽において３時間重合し、
鋳型から板状重合体を剥離させて、板厚２５ｍｍのアク
リル樹脂板を得た。それぞれのアクリル樹脂板における
汚れの転写と異物とを評価した。This polymerizable raw material was used in Example 1 and Comparative Example 1.
It was poured into the mold formed in. Polymerization was carried out for 20 hours in a 40 ° C. water bath at the initial stage of polymerization, then for 3 hours in a 70 ° C. air bath, then in a 95 ° C. air bath for 2 hours, and then in a 130 ° C. air bath for 3 hours.
The plate polymer was peeled from the mold to obtain an acrylic resin plate having a plate thickness of 25 mm. The transfer of stains and foreign matter on each acrylic resin plate were evaluated.
【００３３】実施例１で形成された鋳型を用いて得られ
たアクリル樹脂板における汚れの転写は、目視では確認
出来ず、異物数は２個であった。比較例１で形成された
鋳型を用いて得られたアクリル樹脂板における汚れの転
写は、大きさ３０ｍｍ２程度のものが１２個あり、異物
数は２９個であった。The transfer of dirt on the acrylic resin plate obtained by using the mold formed in Example 1 could not be visually confirmed, and the number of foreign matters was two. Regarding the transfer of stains on the acrylic resin plate obtained by using the mold formed in Comparative Example 1, 12 pieces having a size of about 30 mm 2 and 29 foreign matters were found.
【００３４】[0034]
【発明の効果】本発明の方法によって洗浄されたガラス
板から形成された鋳型を用いると、汚れの転写や異物の
少ない樹脂板を製造することができる。本発明の洗浄装
置は鋳型形成用ガラス板を容易に洗浄することができ
る。By using the mold formed from the glass plate washed by the method of the present invention, it is possible to manufacture a resin plate with less transfer of dirt and less foreign matter. The cleaning apparatus of the present invention can easily clean the glass plate for mold formation.
───────────────────────────────────────────────────── フロントページの続き Ｆターム(参考） 3B116 AA01 AA47 AB02 BA02 BA12 BB22 BB90 CC03 3B201 AA01 AA47 AB02 BA02 BA12 BB22 BB90 BB93 CC12 4G059 AA01 AA20 AB09 AC24 AC30 ─────────────────────────────────────────────────── ─── Continued front page F term (reference) 3B116 AA01 AA47 AB02 BA02 BA12 BB22 BB90 CC03 3B201 AA01 AA47 AB02 BA02 BA12 BB22 BB90 BB93 CC12 4G059 AA01 AA20 AB09 AC24 AC30
Claims (3)
燥装置であって、上流側から、ガラス板表面への液体吐
出口、回転ブラシ、及び気体吐出口を順次有するガラス
板洗浄乾燥装置。1. A cleaning / drying device for a glass plate for forming a template to be conveyed, which has a liquid discharge port, a rotary brush, and a gas discharge port to the surface of the glass plate from the upstream side in this order.
燥方法であって、ガラス板表面へ液体を吐出し、その表
面を回転ブラシで洗浄し、さらに気体を吐出して乾燥さ
せるガラス板洗浄乾燥方法。2. A method of cleaning and drying a glass plate for forming a template, which is conveyed, in which a liquid is discharged onto the surface of the glass plate, the surface is cleaned with a rotating brush, and further gas is discharged to dry the glass plate. Drying method.
を含まず、１μｍ以上１００μｍ未満の異物が１０ｃｍ
３あたり５，０００個以下であり、抵抗率２０万Ω・ｃ
ｍ以上の純水である請求項２に記載の洗浄方法。3. The discharged liquid does not include a foreign matter of 100 μm or more, and a foreign matter of 1 μm or more and less than 100 μm is 10 cm.
It is less than 5,000 per 3 and the resistivity is 200,000 Ω · c
The cleaning method according to claim 2, which is pure water of m or more.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002124682A JP2003320321A (en) | 2002-04-25 | 2002-04-25 | Cleaning/drying apparatus for glass plate and cleaning and drying method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002124682A JP2003320321A (en) | 2002-04-25 | 2002-04-25 | Cleaning/drying apparatus for glass plate and cleaning and drying method |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JP2003320321A true JP2003320321A (en) | 2003-11-11 |
Family
ID=29539667
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002124682A Pending JP2003320321A (en) | 2002-04-25 | 2002-04-25 | Cleaning/drying apparatus for glass plate and cleaning and drying method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2003320321A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100724614B1 (en) | 2006-01-09 | 2007-06-04 | 주식회사 티엔텍 | Dissimilar Layer Initial Peeling Equipment on Glass Surface |
| US9032759B2 (en) | 2010-02-17 | 2015-05-19 | Corning Incorporated | Fluid applicator and glass cleaning process |
-
2002
- 2002-04-25 JP JP2002124682A patent/JP2003320321A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100724614B1 (en) | 2006-01-09 | 2007-06-04 | 주식회사 티엔텍 | Dissimilar Layer Initial Peeling Equipment on Glass Surface |
| US9032759B2 (en) | 2010-02-17 | 2015-05-19 | Corning Incorporated | Fluid applicator and glass cleaning process |
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