JP2003295778A - Filter for plasma display panel, and display device provided with this filter - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a method for manufacturing an electromagnetic wave shielding plastic plate by which an electromagnetic wave shielding plastic plate having high transparency can be made simply without using adhesive. <P>SOLUTION: This filter for plasma display panel comprising a transparent substrate, a conduction layer for cutting off a electromagnetic wave provided on the transparent substrate, and a transparent protecting film provided on the conduction layer, a hard coat layer is provided on the surface of the transparent protecting film. <P>COPYRIGHT: (C)2004,JPO

Description

Detailed Description of the Invention

[0001]

TECHNICAL FIELD The present invention relates to a filter for a plasma display panel capable of shielding electromagnetic waves and heat rays emitted from a plasma display panel (PDP), and a plasma display.

[0002]

2. Description of the Related Art Conventionally, a cathode ray tube (CRT) display device has been mainly used as a display, but in recent years, a thin display (FP) has been used.
D: Frat Panel Display) has been developed and commercialized. As an FPD, a liquid crystal display device (LCD: L) is used by taking advantage of thin, lightweight and low power consumption functions.
The liquid crystal display (LCD) is widely used and is expanding the market, but it is a thin plasma display (PDP: Plasma) that is advantageous for large screens.
The Display Panel) is also drawing attention.

For example, a DC type plasma display is
It selectively discharges and discharges fluorescent substances in a large number of display cells that are separated between two glass plates. A partition, a display cell, an auxiliary cell, etc. are arranged between the windshield and the rear glass. The inner wall of the cell has a basic structure in which a red phosphor, a green phosphor, and a blue phosphor are provided in a film shape. Then, the fluorescent substance emits light by the discharge by the voltage applied to the cathode, the display anode, and the auxiliary anode, and an image is displayed.

Therefore, from the front surface of the PDP, it is inevitable that electromagnetic waves of several kHz to several GHz are generated due to voltage application, discharge, light emission and the like. There is a concern that the electromagnetic waves generated from the PDP may affect the human body and other electronic devices, and an electromagnetic wave shielding filter is usually attached to the front surface of the PDP. In order to prevent the leakage of electromagnetic waves, an integrated one in which a conductive mesh material such as a wire mesh is interposed between transparent substrates (acrylic plates or the like) is generally used.

JP-A-11-74683 discloses that a conductive mesh is interposed between two transparent substrates to improve the characteristics and workability of such a conventional electromagnetic wave shielding and light transmitting window material. Then, a filter for a plasma display panel, which is an electromagnetic wave-shielding light-transmitting window material integrally joined with a transparent adhesive resin, has been proposed.

With such a filter for a plasma display panel, it has a good electromagnetic wave shielding property, a light transmitting property, and a clear image can be obtained, and when a conductive mesh is interposed, it is not damaged. The scattering of the transparent substrate is also prevented.

Further, in such a plasma display panel filter, near infrared ray cutting performance is an important required characteristic for the purpose of preventing malfunction of the remote controller and the like. In particular, recently, as the brightness of PDP has been improved, the amount of near-infrared rays generated has increased, and therefore, a higher level of near-infrared ray cutting performance is required.

[0008]

The surface of the filter for the plasma display panel (the surface of the transparent film on the exposed side) may be damaged during and after the manufacture of the filter for the plasma display panel. There is a problem that the product value is lowered, and even if the product is not scratched during the manufacturing, it may be scratched after that, and the durability is deteriorated.

Therefore, it is an object of the present invention to provide a filter for a plasma display panel having an electromagnetic wave shielding property and an excellent scratch resistance.

The present invention has an electromagnetic wave shielding property,
An object of the present invention is to provide a filter for a plasma display panel, which is excellent in scratch resistance and is also excellent in near-infrared ray cutting property, electromagnetic wave shielding property or antireflection property.

Further, the present invention has an electromagnetic wave shielding property,
An object of the present invention is to provide a display device including a filter for a plasma display panel, which has excellent scratch resistance.

[0012]

The present invention is a filter for a plasma display panel comprising a transparent substrate, a conductive layer provided on the transparent substrate for blocking electromagnetic waves, and a transparent protective film provided on the conductive layer. And a transparent substrate, a transparent substrate, and a conductive layer and a conductive layer for blocking electromagnetic waves, which are provided on one surface of the transparent substrate, and a hard coat layer provided on the surface of the transparent protective film. A filter for a plasma display panel, comprising a transparent protective film provided on the above, and a near-infrared cut film provided on the other surface of the transparent substrate, wherein a hard coat layer is provided on the surface of the transparent protective film. And a filter for a plasma display panel;

In the above filter, the transparent protective film is a polyethylene terephthalate film,
It is preferable because it is easy to handle and economically advantageous. Further, it is preferable that the hard coat layer contains a dye that absorbs near infrared rays. As a result, the near-infrared ray cutting function can be greatly improved with almost no decrease in transparency. Further, it is preferable that the hard coat layer contains conductive fine particles for blocking electromagnetic waves. As a result, the electromagnetic wave shielding function can be significantly improved with almost no decrease in transparency.

The hard coat layer is preferably provided on the transparent protective film via a low refractive index thin layer having a refractive index lower than that of the hard coat layer. That is, the antireflection layer is formed by the combination of the low refractive index thin layer and the hard coat layer, and the hard coat layer forms a part of the antireflection layer.

The conductive layer is generally a conductive mesh (metal fiber mesh, metal-coated organic fiber mesh), or a mesh pattern metal layer (etching mesh), a metal-containing resin layer (conductive printing mesh) or the metal-containing resin. It is preferably a laminate of a layer and a metal layer, and is preferably a mesh pattern metal layer, a metal-containing resin layer, or a laminate of the metal-containing resin layer and a metal layer.

The present invention also resides in a display device provided with a filter for a plasma display panel.

[0017]

DESCRIPTION OF THE PREFERRED EMBODIMENTS A plasma display panel filter (PDP filter) of the present invention will be described in detail with reference to the drawings. FIG. 1 shows a sectional view of an example of a basic structure of a filter for a plasma display panel of the present invention.

The PDP filter shown in FIG.
2. A conductive layer 13 for blocking electromagnetic waves is provided thereon, a transparent protective film 18 is provided on the conductive layer, and a hard coat layer 19 is provided on the film.
Between the transparent substrate 11 and the conductive layer 12, the transparent protective film 1
Between 8 and the conductive layer 12, an intermediate film for adhesion (adhesive resin layer) is generally attached.

FIG. 2 is a sectional view showing an example of a preferred structure of the filter for plasma display panel of the present invention. The PDP filter shown in FIG. 2 has an upper transparent protective film 2
8, the conductive mesh 23 as a conductive layer, the transparent substrate 22, and the near-infrared cut film 25 of the backmost layer are adhesive intermediate films 24A and 24B and an adhesive (adhesive film) 2
4C is used to be laminated and integrated, and a hard coat layer 29 is further provided on the surface of the transparent protective film 28. In this embodiment, the end face of this laminate and the front and back edges close to it are covered with the conductive adhesive tape 27 (consisting of the adhesive layer 27B and the metal foil 27A).

During and after the manufacture of the filter for the plasma display panel, the surface of the filter for the plasma display panel (the surface of the transparent substrate on the exposed side) may be damaged, which lowers the commercial value of the obtained filter and also the manufacture. Even if it is not scratched in some cases, it may be scratched later, and the durability is deteriorated, but the filter of the present invention has a surface opposite to the side to be attached to the plasma display panel, usually a conductive layer. Since a hard coat layer is provided on the transparent protective film above, such a problem can be avoided (when an antireflection layer is provided on the film, its surface is hard and therefore is usually hard). No need for a coat layer). Further, as the hard coat layer of the present invention, it is possible to use a hard coat layer containing a dye that absorbs near infrared rays, and in this case, it is possible to significantly improve the near infrared ray cut function with almost no decrease in transparency. it can. In addition, the hard coat layer may contain conductive fine particles for blocking electromagnetic waves, whereby the electromagnetic wave shielding function can be significantly improved with almost no decrease in transparency. Further, by providing a hard coat layer on the transparent protective film via a low refractive index transparent thin layer having a lower refractive index than the hard coat layer, an antireflection layer composed of a low refractive index transparent layer and a hard coat layer is formed. Since it is formed, the hard coat layer can also serve as a part of the antireflection layer, which is extremely advantageous.

In the present invention, as the constituent materials of the transparent substrates 12 and 22, glass, polyester, polyethylene terephthalate (PET), polybutylene terephthalate, polymethylmethacrylate (PMMA), acrylic resin, polycarbonate (PC), polystyrene, Cellulose triacetate, polyvinyl alcohol, polyvinyl chloride, polyvinylidene chloride, polyethylene, ethylene-vinyl acetate copolymer, polyvinyl butyral, metal ion-crosslinked ethylene-methacrylic acid copolymer, polyurethane, cellophane, etc. can be mentioned, and glass. ,
PET, PC and PMMA are preferred.

The thickness of the transparent substrates 12 and 22 is generally 0.
It is in the range of 1 to 10 mm, preferably in the range of 1 to 4 mm.

A black frame coating based on acrylic resin or the like may be provided on the peripheral portions of the transparent substrates 12 and 22.

The transparent substrates 12 and 22 may be provided with a heat ray reflective coating such as a metal thin film or a transparent conductive film to enhance the functionality.

As the transparent protective films 18 and 28, P
Films such as ET, PC and PMMA are preferable, and the thickness thereof is generally preferably 10 to 500 μm and 25 to 250 μm.

In the present invention, the transparent protective films 18, 28 are used.
A hard coat layer is provided on the top. At this time, an antireflection film can be formed by forming the following low refractive index transparent film on the transparent protective film and providing a hard coat layer having a higher refractive index. Examples of the laminated film below the hard coat layer include those in which a laminated film having a (laminated) structure as described in (1) to (5) below is formed.

(1) One layer of a transparent film having a lower refractive index than the transparent substrate, (2) One layer of a high refractive index transparent film and one layer of a low refractive index transparent film, a total of two layers (3) ) A high-refractive-index transparent film and a low-refractive-index transparent film, each having two layers alternately laminated in total of four layers, and (4) one layer in the order of medium-refractive-index transparent film / high-refractive-index transparent film / low-refractive-index transparent film. A total of 3 layers each, and (5) a high-refractive-index transparent film / a low-refractive-index transparent film, 3 layers alternately in the order of 6 layers in total. ITO (tin indium oxide) or ZnO, Al-doped ZnO, TiO ₂ , Sn
It is possible to form a thin film of O ₂ or ZrO having a refractive index of 1.6 or more, preferably a transparent conductive thin film. The high refractive index transparent film may be a thin film in which these fine particles are dispersed in an acrylic or polyester binder. Further, as the low refractive index transparent film, a thin film made of a low refractive index material having a refractive index of 1.6 or less such as SiO ₂ , MgF ₂ , Al ₂ O ₃ can be formed. As the low refractive index transparent film, a silicon-based material,
A thin film made of a fluorine-based organic material is also suitable. Since these film thicknesses lower the reflectance in the visible light region due to light interference, they differ depending on the film structure, film type, and center wavelength, but in the case of a four-layer structure, the first layer (high refractive index) on the transparent substrate side is used. 5 to 50 nm for the transparent film) and 5 to 50 n for the second layer (low refractive index transparent film)
m, the third layer (high refractive index transparent film) has a thickness of 50 to 100 nm, and the fourth layer (low refractive index transparent film) has a thickness of about 50 to 150 nm.

In the present invention, a thin film (low refractive index transparent film) made of a silicon-based or fluorine-based organic material is formed on the transparent protective film by coating and the like, and a hard coat layer (preferably ITO (tin) is formed on the thin film. Indium oxide) or Zn
ZnO, TiO ₂ , SnO ₂ , Z doped with O and Al
It is preferable that the hard coat layer forms a part of the antireflection film by forming fine particles such as rO).

The near infrared ray cut film 25 is a film in which a near infrared ray cut layer containing a dye or the like is formed on the surface of a base film, or a film containing the dye or the like. Examples of the dye include cyanine dyes, squarylium dyes, anthraquinone dyes, phthalocyanine dyes, polymethine dyes, and polyazo dyes, and cyanine dyes and squarylium dyes are particularly preferable. These dyes can be used alone or in combination.

Particularly preferred near-infrared cut film 25
Is a near-infrared cut layer formed on the surface of the base film, containing a diimonium compound and a specific copper complex and / or a copper compound. The near-infrared cut layer is a base polymer having a diimonium compound and copper. Complex and /
Alternatively, it can be formed by dispersing a copper compound, diluting with a suitable solvent to adjust the concentration, coating the surface of the transparent substrate film 1, and drying the coating film.

Examples of the diimonium compound used as the near-infrared absorbing agent include those represented by the following general formula (I) or (II).

[0032]

[Chemical 1]

In the above formulas (I) and (II), R ¹ , R ² ,
R ³ and R ⁴ represent hydrogen, a halogen atom, an alkyl group, an aryl group or an aromatic functional group, X ⁻ represents a monovalent negative ion, and Y ^{2 −} represents a divalent negative ion.

X ⁻ is I ⁻ , Cl ⁻ , Br ⁻ , F ^−.
Halogen ions such as NO ₃ ⁻ , BF ₄ ⁻ , PF ₆ ⁻ ,
Inorganic acid ions such as ClO ₄ ⁻ and SbF ₆ ⁻ , CH ₃ CO
Examples thereof include organic carboxylate ions such as O ⁻ , CF ₃ COO ⁻ and benzoate ion, organic sulfonate ions such as CH ₃ SO ₃ ⁻ , CF ₃ SO ₃ ⁻ , benzenesulfonate ion, and naphthalenesulfonate ion. it can. Also,
As Y ^2- , an aromatic disulfonate ion having two sulfonic acid groups is preferable, and for example, naphthalene-1,5-
Disulfonic acid, R acid, G acid, H acid, benzoyl H acid (H
Benzoyl group bonded to amino group of acid), p-chlorobenzoyl H acid, p-toluenesulfonyl H acid, chloro H acid (H acid having amino group substituted with chlorine atom), chloroacetyl H acid, Naphthalenedisulfonic acid derivatives such as methanyl γ acid, 6-sulfonaphthyl-γ acid, C acid, ε acid, p-toluenesulfonyl R acid, naphthalene-1,6-disulfonic acid, 1-naphthol-4,8-disulfonic acid , Carbonyl J acid, 4,4′-diaminostilbene-2,2′-disulfonic acid, di J acid, naphthalic acid,
Naphthalene-2,3-dicarboxylic acid, diphenic acid, stilbene-4,4'-dicarboxylic acid, 6-sulfo-2-oxy-3-naphthoic acid, anthraquinone-1,8-disulfonic acid, 1,6-diaminoanthraquinone -2,7-
Disulfonic acid, 2- (4-sulfophenyl) -6-aminobenzotriazole-5-sulfonic acid, 6- (3-methyl-5-pyrazolonyl) -naphthalene-1,3-disulfonic acid, 1-naphthol-6- An ion such as (4-amino-3-sulfo) anilino-3-sulfonic acid may be mentioned. A more preferable divalent organic anion is a naphthalene disulfonate ion, and a more preferable divalent organic anion is, for example, an ion represented by the following general formula (III).

[0035]

[Chemical 2]

In the above formula (III), R ⁵ and R ⁶ are each a hydrogen atom, a halogen atom, a lower alkyl group, a hydroxyl group, an alkylamino group, an amino group, —NHCOR ⁷ , or —NHSO ₂ R.
^7, (wherein, ^{R 7} represents a substituted or unsubstituted aryl group or a substituted or unsubstituted alkyl group) -OSO ₂ R ⁷ or an acetyl group.

Suitable examples of such diimonium compounds include those represented by the following general formula (IV).

[0038]

[Chemical 3]

In the above formula (IV), R is an alkyl group having 1 to 8 carbon atoms, preferably n-butyl group, and X ⁻ is preferably BF ₄ ⁻ , PF ₆ ⁻ , ClO ₄ ⁻ , SbF ₆ ⁻
Is.

Specific diimonium compounds include:
Examples include those represented by the following structural formula (V).

[0041]

[Chemical 4]

As the copper complex having the structure (A), a 1,2-benzenethiol copper complex compound can be mentioned, and specifically, bis (4) represented by the following structural formula (VI): -T-butyl-1,2-dithiophenolate) copper-tetra-n-butylammonium, the following structural formula (VI
4-morpholinosulfonyl-1,2-benzenedithiol copper complex represented by I) can be mentioned.

[0043]

[Chemical 5]

The copper compound having the structure (B) may be copper dimethyldithiocarbamate represented by the following structural formula (VIII).

[0045]

[Chemical 6]

It is preferable to use commercially available diimonium compounds and copper complexes and / or copper compounds.

In the present invention, if the content of the diimmonium compound in the near-infrared cut layer is too small, the near-infrared cut effect is insufficient, and if it is too large, the visible light transmittance is deteriorated. Polymer 1
It is preferably 0.001 to 100 parts by mass, particularly 0.01 to 50 parts by mass, and especially 0.1 to 10 parts by mass with respect to 00 parts by mass.

Further, the copper complex in the near infrared ray cut layer and /
Or, if the copper compound is too small, the heat resistance, the effect of improving durability such as humidity resistance is insufficient, and if the amount is too large, the near infrared cut layer is colored and the appearance of the near infrared cut film deteriorates.
The copper complex and / or the copper compound is a diimonium compound 10
0.01 to 100 parts by weight, especially 0.1 to 0 parts by weight
˜50 parts by mass, particularly preferably 0.5 to 30 parts by mass.

Examples of the base polymer for the near-infrared cut layer include polyester resins, urethane resins, silicone resins, phenol resins, and homopolymers or copolymers of (meth) acrylic acid esters (that is, acrylic resins). Therefore, it is preferable to use an acrylic resin or a polyester resin.

On the other hand, the base film is not particularly limited, but polyester resin, acrylic resin, cellulose resin, polyolefin resin (polyethylene resin, polypropylene resin, polyvinyl chloride resin),
A film of a polycarbonate resin, a phenol resin, or a urethane resin can be used, and in particular, a polyester resin film is preferably used from the viewpoint of transparency, environment resistance, and the like.

The base film can be formed without excessively increasing the thickness of the resulting electromagnetic wave shielding filter.
10 μm to 1 mm to ensure handleability and durability
It is preferable that the thickness is within the range. Further, the thickness of the near-infrared cut layer formed on this base film is usually from the viewpoint of near-infrared cut property and visible light transmittance,
It is in the range of 0.5 to 50 μm.

In the PDP filter of the present invention, the near-infrared cut film may have a base film provided with two or more near-infrared cut layers, preferably two or more near-infrared absorber layers. Well, in this case, a remarkably good near-infrared cut performance can be obtained in a wide wavelength range of near-infrared, which is advantageous.

The near-infrared cut film having two or more layers can have the following constitution.

A combination of a near-infrared cut film having a near-infrared cut layer formed on a base film and a near-infrared cut film 5B having a near-infrared cut layer formed on a base film; near-infrared cut on one surface of the base film A near-infrared cut film having a layer formed and a near-infrared cut layer formed on the other surface; a near-infrared cut film having a near-infrared cut layer and a near-infrared cut layer laminated on a base film; close to a base film Near infrared ray cut film having an infrared ray cut layer formed thereon; a combination of any two or more of the above items.

In the above-mentioned structures (1) to (3), it is preferable that one of the near-infrared ray cut layers is a layer containing a diimonium compound and a copper complex and / or a copper compound, and the other is a different layer.

In the above construction, it is preferable that the near infrared ray cut layer is a layer containing a diimonium compound and a copper complex and / or a copper compound, and if necessary, further different near infrared ray absorbents are blended.

Of the above-mentioned near-infrared cut films, it is preferable that the number of films is one and the near-infrared cut layer is not exposed to the outer surface.

In the present invention, as the near-infrared ray cut layer other than the layer containing the diimonium compound and the copper complex and / or the copper compound, one or more of the following may be used in combination. , Good near-infrared ray cutting performance (for example, 850 to 125) without impairing transparency.
It is preferable since it is possible to obtain a performance of sufficiently absorbing near infrared rays in a wide wavelength range of near infrared rays such as 0 nm. (A) 100-5000Å ITO coating layer, (b) 100-10,000Å ITO-silver alternating coating layer, (c) Thickness 0.
A coating layer in which a mixed material of nickel complex type and immonium type of 5 to 50 μm is formed by using a suitable transparent base polymer, (d) a copper compound containing divalent copper ions having a thickness of 10 to 10000 μm is suitable. Coating layer formed into film using transparent base polymer, (e) Thickness 0.
5 to 50 μm organic dye-based coating layer.

In the present invention, for example, a transparent conductive film may be further laminated on the near infrared ray cut film. As this transparent conductive film, a resin film in which conductive particles are dispersed or a base film having a transparent conductive layer formed thereon can be used.

Conductive layer (conductive mesh) 13 of the present invention,
23, that is, the transparent substrates 12 and 22 and the transparent protective film 1
The conductive layers 13 and 23 to be interposed between the electrodes 8 and 28 are generally made of metal fibers and / or metal-coated organic fibers. In the present invention, the light transmittance is improved and the moire phenomenon is prevented. Above, for example, wire diameter 1 μm to 1 m
m and an aperture ratio of 40 to 95% are preferable. In this conductive mesh, if the wire diameter exceeds 1 mm, the aperture ratio is lowered, or the electromagnetic wave shielding property is lowered, and it is not possible to satisfy both requirements. If it is less than 1 μm, the strength of the mesh is lowered and the handling becomes very difficult. The aperture ratio is 95
If it exceeds%, it is difficult to maintain the shape as a mesh, and if it is less than 40%, the light transmittance is low and the amount of light rays from the display is reduced. Furthermore, the wire diameter is 10-500μ
m, and the aperture ratio is preferably 50 to 90%.

The aperture ratio of the conductive mesh means the area ratio of the opening portion in the projected area of the conductive mesh.

As the metal of the metal fibers and the metal-coated organic fibers constituting the conductive meshes 13 and 23, generally,
Copper, stainless steel, aluminum, nickel, titanium, tungsten, tin, lead, iron, silver, chromium, carbon or alloys thereof, preferably copper, nickel, stainless steel or aluminum is used.

As the organic material of the metal-coated organic fiber, polyester, nylon, vinylidene chloride, aramid, vinylon, cellulose and the like are generally used.

In the present invention, it is preferable to use a conductive mesh made of a metal-coated organic fiber, which is excellent in maintaining the mesh shape, in order to maintain the above-mentioned aperture ratio and wire diameter.

As the electromagnetic wave shield material, an etching mesh or a conductive printing mesh may be used instead of the above conductive mesh.

As the etching mesh, it is possible to use one obtained by etching a metal film into an arbitrary shape such as a lattice shape or a punching metal shape by a photolithography method. As the metal film, a metal film of copper, aluminum, stainless steel, chromium or the like is formed on a transparent substrate of polyethylene terephthalate (PET), polycarbonate (PC), polymethylmethacrylate (PMMA) or the like.
Those formed by vapor deposition or sputtering, or those obtained by bonding these metal foils to a transparent substrate with an adhesive can be used. The adhesive is preferably epoxy type, urethane type, EVA type or the like.

It is preferable to print black on one side or both sides of these metal films in advance. By using the photolithography method, the shape and wire diameter of the conductive portion can be freely designed, so that the aperture ratio can be increased as compared with the conductive mesh.

As the conductive printing mesh, metal particles of silver, copper, aluminum, nickel or the like or non-metal conductive particles of carbon or the like can be used as a resin of epoxy type, urethane type, EVA type, melanin type, cellulose type, acrylic type or the like. It is possible to use a mixture obtained by printing the mixture of the above binders in a grid pattern or the like on a transparent substrate such as PET, PC, or PMMA by gravure printing, offset printing, screen printing, or the like.

When the printed conductive layer as described above has a lower resistance value to enhance the electromagnetic wave shielding effect, it is preferable to form a plating layer on the conductive layer. In this case, the thickness of the conductive layer can be suppressed to a low value.

As the material used for the plating treatment,
Mention may be made of copper, nickel, chromium, zinc, tin, silver and gold. These may be used alone or as an alloy of two or more. The plating treatment is generally performed by ordinary liquid phase plating (electrolytic plating, electroless plating, etc.).

The thickness of the plating layer is generally 0.1 to 10 μm.
The range of m, 2-5 micrometers is preferable. If the thickness is less than 1 μm, the electromagnetic wave shielding effect is not sufficiently imparted, and if it exceeds 10 μm, the plating layer tends to spread in the width direction and the line width tends to be thick.

Further, a transparent conductive film coated with a transparent conductive film may be used as the electromagnetic wave shielding material.

The conductive particles to be dispersed in the film are not particularly limited as long as they have conductivity, and examples thereof include the following.
(i) carbon particles or powder, (ii) nickel, indium, chromium, gold, vanadium, tin, cadmium,
Particles or powders of metals or alloys of silver, platinum, aluminum, copper, titanium, cobalt, lead or the like or conductive oxides thereof, (iii) on the surface of plastic particles of polystyrene, polyethylene or the like, (i), (ii) ) With a coating layer of conductive material, (iv) alternating laminated body of ITO and silver, if the particle size of these conductive particles is too large, it affects the light transmittance and the thickness of the transparent conductive film. From exerting
It is preferably 0.5 mm or less. The particle size of the conductive particles is preferably in the range of 0.01 to 0.5 mm.

If the mixing ratio of the conductive particles in the transparent conductive film is excessively large, the light transmittance is impaired, and if it is excessively small, the electromagnetic wave shielding property is insufficient. The proportion is preferably 0.1 to 50% by mass, particularly 0.1 to 20% by mass, and particularly preferably 0.5 to 20% by mass.

The color and gloss of the conductive particles are appropriately selected according to the purpose, but dark and non-glossy such as black and brown are preferable from the use as a filter of the display panel. In this case, the conductive particles appropriately adjust the light transmittance of the filter, so that the screen can be easily viewed.

Examples of the base film having the transparent conductive layer formed thereon include those having a transparent conductive layer of tin indium oxide, zinc aluminum oxide or the like formed by vapor deposition, sputtering, ion plating, CVD or the like. . In this case, when the thickness of the transparent conductive layer is less than 0.01 μm, the thickness of the conductive layer for electromagnetic wave shielding is too thin,
If sufficient electromagnetic wave shielding properties cannot be obtained and the thickness exceeds 5 μm, the light transmittance may be impaired.

As the matrix resin of the transparent conductive film or the resin of the base film, polyester, PET, polybutylene terephthalate, PMMA,
Acrylic plate, PC, polystyrene, triacetate film, polyvinyl alcohol, polyvinyl chloride, polyvinylidene chloride, polyethylene, ethylene-vinyl acetate copolymer, polyvinyl butyral, metal ion cross-linked ethylene-methacrylic acid copolymer, polyurethane, cellophane, etc. Preferably, PET, PC, and PMMA can be mentioned.

The thickness of such a transparent conductive film is
Usually, it is in the range of 1 μm to 5 mm.

As for the conductive meshes 13 and 23, the edges of the conductive meshes 13 and 23 protrude from the edges of the transparent substrates 12 and 22, and the transparent substrate 2
A substrate having an area larger than that of the transparent substrates 12 and 22 may be used so that the substrate can be folded back along the edge of the substrate.

As described above, the transparent protective films 18, 2
Hard coat layers 19 and 29, which are characteristic parts of the present invention, are provided on the surface 8.

The curable resin for forming the hard coat layers 19 and 29 of the present invention is generally an ultraviolet curable resin. As this ultraviolet curable resin, known ultraviolet curable resins (polymerizable oligomers, (Including functional monomers, monofunctional monomers, photopolymerization initiators, additives, etc.) can be used.

Such a UV-curable resin contains, as a main component, a polymerizable oligomer such as a urethane oligomer having a plurality of ethylenic double bonds, a polyester oligomer or an epoxy oligomer, a polyfunctional monomer and, if necessary, a monofunctional monomer. Configured as.

Examples of the polyfunctional monomer and the monofunctional monomer include an acryloyl group-containing compound, a methacryloyl group-containing compound and / or an epoxy group-containing compound.

The acryloyl group-containing compound and methacryloyl group-containing compound used are generally acrylic acid or methacrylic acid derivatives, and examples thereof include esters or amides of acrylic acid or methacrylic acid. Examples of the ester residue include linear alkyl groups such as methyl, ethyl, dodecyl, stearyl, and lauryl, cyclohexyl group, tetrahylfurfuryl group, aminoethyl group, 2-hydroxyethyl group, 3-hydroxypropyl group. Group, and 3-chloro-2-hydroxyopyrupyl group. Further, polyhydric alcohols such as ethylene glycol, triethylene glycol, polypropylene glycol, polyethylene glycol, glycerin, trimethylolpropane, and pentaerythritol, and esters of acrylic acid or methacrylic acid (eg,
Pentaerythritol tetramethacrylate, dipentaerythritol hexaacrylate (DPHA) can be mentioned.

Examples of amides include diacetone acrylamide.

Examples of the epoxy-containing compound include triglycidyl tris (2-hydroxyethyl) isocyanurate, neopentyl glycol diglycidyl ether,
1,6-hexanediol diglycidyl ether, allyl glycidyl ether, 2-ethylhexyl glycidyl ether, phenyl glycidyl ether, phenol (ethyleneoxy) ₅ glycidyl ether, pt-butylphenyl glycidyl ether, adipic acid diglycidyl ester, phthalic acid Examples thereof include diglycidyl ester, glycidyl methacrylate, and butyl glycidyl ether.

The resin is generally composed of an oligomer, a reactive diluent (a polyfunctional monomer or a monofunctional monomer) as required, and a photopolymerization initiator as described above. Examples of the photopolymerization initiator include benzoin, benzophenone, benzoylmethyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin isobutyl ether, dibenzyl, 5-nitroacenaphthene, hexachlorocyclopentadiene, p-nitrodiphenyl, p.
-Nitroaniline, 2,4,6-trinitroaniline,
1,2-benzanthraquinone, 3-methyl-1,3-
Diaza-1,9-benzanthrone; acetophenone,
Acetophenone benzyl ketal, anthraquinone, 1
-Hydroxycyclohexyl phenyl ketone, 2,2-
Dimethoxy-2-phenylacetophenone, xanthone compounds, triphenylamine, carbazole, 3-methylacetophenone, 4-chlorobenzophenone, 4,
4'-dimethoxybenzophenone, 4,4'-diaminobenzophenone, 2-hydroxy-2-methyl-1-phenylpropan-1-one, 1- (4-isopropylphenyl) -2-hydroxy-2-methylpropane-1 −
On, carbazole, xanthone, 1,1-dimethoxydeoxybenzoin, 3,3′-dimethyl-4-methoxybenzophenone, thioxanthone compound, diethylthioxanthone, 2-isopropylthioxanthone, 2
-Chlorothioxanthone, 1- (4-dodecylphenyl) -2-hydroxy-2-methylpropan-1-one, 2-methyl-1- [4- (methylthio) phenyl]
-2-morpholino-propan-1-one, triphenylamine, 2,4,6-trimethylbenzoyldiphenylphosphine oxide, bis- (2,6-dimethoxybenzoyl) -2,4,4-trimethylpentylphosphine oxide, Bisacylphosphine oxide, benzyl dimethyl ketal, 1-hydroxycyclohexyl phenyl ketone, 2-hydroxy-2-methyl-1-phenylpropan-1-one, fluorenone, fluorene, benzaldehyde, Michler's ketone, 2-benzyl-2-
Dimethylamino-1- (4-morpholinophenyl)-
Butan-1-one, 3-methylacetophenone, 3,
3 ′, 4,4′-tetra (t-butylperoxycarbonyl) benzophenone (BTTB) and the like, and further BTTB and a dye sensitizer such as xanthene,
Examples thereof include combinations with thioxanthene, coumarin, ketocoumarin and the like. Among these, particularly benzyl dimethyl ketal, 1-hydroxycyclohexyl phenyl ketone, 2,4,6-trimethylbenzoyldiphenylphosphine oxide, bis- (2,6-dimethoxybenzoyl) -2,4,4-trimethylpentylphosphine oxide , 2-benzyl-2-dimethylamino-
1- (4-morpholinophenyl) -butan-1-one is preferred.

These may be used alone or in combination of two or more. The oligomer, the reactive diluent and the initiator may be used alone or in combination of two or more kinds. The content of the reactive diluent is 0.1 to 7 with respect to 100 parts by mass of the ultraviolet curable resin (total).
0 mass part is general, and 0.5 to 50 mass parts is preferable. The content of the photopolymerization initiator is 100
It is preferably 5 parts by mass or less with respect to parts by mass.

The ultraviolet curable resin of the present invention may further contain fine particle silica and / or modified fine particle silica, and may also contain a silicone polymer. A graft copolymer having silicone as a side chain is preferred, and an acrylic graft copolymer having silicone as a side chain is more preferred.

Various additives may be added to the above-mentioned ultraviolet curable resin, if necessary. Examples of these additives include an antioxidant, an ultraviolet absorber, a light stabilizer and a silane coupling agent. Agent, anti-aging agent, thermal polymerization inhibitor, colorant, leveling agent, surfactant, storage stabilizer,
Examples thereof include a plasticizer, a lubricant, a solvent, an inorganic filler, an organic filler, a filler, a wettability improver, and a coating surface improver.

The hard coat layer of the present invention preferably contains a dye that absorbs near infrared rays. As a result, the near-infrared ray cutting function can be greatly improved with almost no decrease in transparency. Further, it is preferable that the hard coat layer contains conductive fine particles for blocking electromagnetic waves. As a result, the electromagnetic wave shielding function can be significantly improved with almost no decrease in transparency.

When a dye is contained, the dye described in the near-infrared cut film can be appropriately used. The content is 100 parts by mass of the curable resin,
0.01 to 3 parts by mass is preferable, and 0.05 to 1 part by mass is particularly preferable.

When the conductive fine particles are contained, the fine particles described as the conductive particles to be dispersed in the film in the conductive mesh can be appropriately used. The content is 0.01 to 100 parts by mass of the curable resin.
3 parts by mass is preferable, and 0.05 to 1 part by mass is particularly preferable.

As described above, when the hard coat layer is used as a part of the antireflection film, it may function as it is, but ITO (tin indium oxide) or ZnO, Al-doped ZnO, TiO ₂ , SnO
₂ , it is preferable to form a hard coat layer containing fine particles such as ZrO.

By providing the near infrared ray cutting function or the electromagnetic wave shielding function and the function as a part of the antireflection layer as described above, the PDP filter is manufactured in the same manner except the hard coat layer, and the hard coat layer is formed. Since the above function can be adjusted during the formation of the layer, the formation of the hard coat layer can be utilized not only for improving the scratch resistance but also for adjusting the characteristics of the manufactured filter, which is extremely advantageous.

As the hard coat layer forming material, a thermosetting resin may be used instead of the ultraviolet curable resin,
In that case, a reactive acrylic resin, a melamine resin, an epoxy resin, or the like can be used. It is also possible to use the ultraviolet curable resin. Further, polyhydroxysilane obtained by thermosetting methylchlorosilane can also be used.

When a hard coat layer is formed by using an ultraviolet curable resin, the ultraviolet curable resin as it is or diluted with an organic solvent to an appropriate concentration and the resulting solution is applied by an appropriate coating machine (coater). UV is applied on a suitable transparent protective film or antireflection film 18, 28, dried if necessary, and then UV is applied directly or through a release sheet (after vacuum deaeration).
The hard coat layer can be formed by irradiating the lamp with ultraviolet rays for several seconds to several minutes. As the UV lamp, a high pressure mercury lamp, a medium pressure mercury lamp, a low pressure mercury lamp, a metal halide lamp or the like can be used.

When the hard coat layer is formed by using a thermosetting resin, a solution of the thermosetting resin in an organic solvent is applied on the above-mentioned film by an appropriate coating machine (coater), and a release sheet is formed if necessary. After installation, degassing with a laminator etc.,
Perform thermosetting and thermocompression bonding. If you do not use a release sheet,
Before heating and pressure bonding, it is preferable to dry for about 60 seconds to evaporate the solvent of the coating layer and dry the surface so that the surface does not stick. Also when a release sheet is used, it is preferable to dry the release sheet a little before providing the release sheet.

The layer thickness of the hard coat layer is 0.
It is preferably from 1 to 20 μm (particularly from 1 to 15 μm), and even in the case of multiple layers, the total amount is preferably within these ranges.

Transparent protective films 18, 28 having a hard coat layer, conductive meshes 13, 23 and transparent substrate 1
The adhesive resin forming the adhesive intermediate films 24A and 24B for adhering the two and 22 together is preferably transparent and elastic, for example, one that is usually used as an adhesive for laminated glass. In particular, it is effective to use elastic films having a high anti-scattering property as the bonding intermediate films 24A and 24B arranged on the front side of the transparent substrates 12 and 22.

As the resin of the film having such elasticity, for example, ethylene-vinyl acetate copolymer, ethylene-methyl acrylate copolymer, ethylene- (meth) acrylic acid copolymer, ethylene- (meth) Ethyl acrylate copolymer, ethylene- (meth) methyl acrylate copolymer, metal ion cross-linked ethylene- (meth) acrylic acid copolymer, partially saponified ethylene-vinyl acetate copolymer, carboxyl ethylene-vinyl acetate copolymer Examples of the copolymer include ethylene-based copolymers such as ethylene- (meth) acrylic-maleic anhydride copolymer and ethylene-vinyl acetate- (meth) acrylate copolymer (note that "(meth) acrylic" is Represents "acrylic or methacrylic"). In addition, polyvinyl butyral (PVB) resin, epoxy resin, acrylic resin, phenol resin, silicon resin, polyester resin, urethane resin, etc. can be used, but ethylene-vinyl acetate is the most balanced and easy to use in terms of performance. It is a copolymer (EVA). PVB resins used in laminated glass for automobiles are also suitable from the viewpoint of impact resistance, penetration resistance, adhesiveness, transparency and the like.

Generally, the thickness of the adhesive interlayer films 24A and 24B is preferably in the range of 10 to 1000 μm. Further, the near infrared ray cut film 25 is preferably laminated on the transparent substrate 2 using the adhesive 24C. This is because the near-infrared cut film 25 is weak against heat and cannot withstand the heat crosslinking temperature (130 to 150 ° C.). Incidentally, a low temperature cross-linking EVA (cross-linking temperature of about 70 to 130 ° C.) can be used for adhering the near infrared ray cut film 25 to the transparent substrates 12 and 22.

The adhesive interlayers 24A, 24B and the adhesive 24C may contain a small amount of ultraviolet absorbers, infrared absorbers, antiaging agents, paint processing aids, and the color of the filter itself. In order to adjust the amount, a proper amount of a colorant such as a dye or a pigment, a filler such as carbon black, hydrophobic silica and calcium carbonate may be added.

Further, as a means for improving the adhesiveness, a means such as corona discharge treatment, low temperature plasma treatment, electron beam irradiation, ultraviolet light irradiation, etc. on the sheeted adhesive interlayer film is also effective.

The adhesive interlayer film is prepared by mixing the adhesive resin with the above-mentioned additives and kneading the mixture with an extruder, a roll or the like, and then forming the mixture into a predetermined shape by a film forming method such as calendering, roll, T-die extrusion or inflation. It is manufactured by forming a sheet. During film formation, embossing is generally applied to prevent blocking and facilitate deaeration during pressure bonding with a transparent substrate.

In addition to such EVA resin, PVB resin can be preferably used as described above. This PVB
The resin preferably has a polyvinyl acetal unit of 70 to 95% by mass, a polyvinyl acetate unit of 1 to 15% by mass, and an average degree of polymerization of 200 to 3000, preferably 300 to 2500, and the PVB resin contains a plasticizer. It is used as a resin composition containing.

As other transparent adhesives, pressure-sensitive adhesives (pressure-sensitive adhesives) are also preferably used, and acrylic, SBS, SE
A thermoplastic elastomer such as BS is preferably used. A tackifier, an ultraviolet absorber, a coloring pigment, a coloring dye, an antiaging agent, an adhesion-imparting agent and the like can be appropriately added to these adhesives. The pressure-sensitive adhesive is applied in advance on the adhesive surface of the antireflection film or the near-infrared cut film by 5 to 10
It can be coated or bonded to a thickness of 0 μm and then bonded to a transparent substrate or another film (because EVA is weak against heat).

When manufacturing the PDP filter of the present invention,
Usually, the conductive adhesive tape 27 is used in a two-ply shape. The outer tape 27 adheres to the entire end face of the laminated body of the transparent substrate 22, the conductive mesh 23 and the near-infrared cut film 25, and wraps around the corners of the front and back of the laminated body to form an antireflection film. It also adheres to both the edge portion of 28 and the edge portion of the near-infrared cut layer film 25. The inner tape 27 is attached to the edge of the conductive mesh 23, the edge of the near-infrared cut film 25, and the peripheral surface of the laminate between them.

As the conductive adhesive tape 27, generally,
As shown in FIG. 2, an adhesive layer 27B in which conductive particles are dispersed is provided on one surface of a metal foil 27A, and the adhesive layer 27B includes an acrylic-based, rubber-based, or silicon-based adhesive. Alternatively, an epoxy-based or phenol-based resin mixed with a curing agent can be used.

The conductive particles dispersed in the adhesive layer 27B may be any electrically conductive conductor, and various particles can be used. For example, a metal powder of copper, silver, nickel or the like, a resin or ceramic powder coated with such a metal, or the like can be used. Further, the shape thereof is not particularly limited, and any shape such as a flaky shape, a dendritic shape, a granular shape, or a pellet shape can be adopted.

The content of the conductive particles is preferably 0.1 to 15% by volume with respect to the polymer constituting the adhesive layer 7B, and the average particle size is 0.1 to 100 μm.
Is preferred. By thus defining the blending amount and the particle size, it is possible to prevent the conductive particles from condensing and obtain good conductivity.

As the metal foil 27A which is the base material of the conductive adhesive tape 27, a foil of copper, silver, nickel, aluminum, stainless steel or the like can be used, and the thickness thereof is generally in the range of 1 to 100 μm. .

The adhesive layer 27B comprises a roll coater, a die coater, a knife coater, a mycover coater, a flow coater, and a spray obtained by uniformly mixing the metal foil 27A with the adhesive and the conductive particles in a predetermined ratio. It can be easily formed by coating with a coater or the like.

The thickness of the adhesive layer 27B is generally 5 to 1
It is in the range of 00 μm.

The PDP filter shown in FIG. 2 can be manufactured, for example, as follows. Transparent protective film 28, conductive mesh 23, transparent substrate 22, near-infrared cut film 25, and adhesive intermediate films 24A, 24
B, adhesive 24C and conductive adhesive tape 27 are prepared,
The transparent protective film 28, the conductive mesh 23, and the transparent substrate 22 are laminated with the adhesive intermediate films 24A and 24B interposed therebetween, and the adhesive intermediate films 24A and 24B are heated under pressure or under irradiation under curing conditions. And integrate. Next, the near-infrared cut film 25 is attached by the adhesive 24C. If necessary, the protruding portion of the peripheral edge of the conductive mesh 23 is folded back, and then the conductive adhesive tape 27 is wrapped around the periphery of the laminated body to be fastened, and heat-pressed according to the curing method of the used conductive adhesive tape 27 and the like. Adhesive fixing by doing.

An adhesive may be used instead of part or all of the adhesive intermediate films 24A and 24B.

When a cross-linking type conductive adhesive tape is used as the conductive adhesive tape 27, the adhesive layer 27B is used to attach it to the laminated body (this temporary fixing may be carried out if necessary). Can be re-attached),
After that, heating or ultraviolet irradiation is performed while applying pressure as needed. You may also heat at the time of this ultraviolet irradiation. It should be noted that by locally performing this heating or light irradiation, only a part of the crosslinkable conductive adhesive tape can be adhered.

The heat-bonding can be easily performed with a general heat sealer, and the pressure-heating method is as follows. After placing the laminate having the crosslinked conductive adhesive tape in a vacuum bag and degassing. A method of heating may be used, and the bonding can be performed very easily.

As the adhesion conditions, in the case of thermal crosslinking,
Depending on the kind of the crosslinking agent (organic peroxide) used, it is usually 70 to 150 ° C., preferably 70 to 130 ° C., and usually 10 seconds to 120 minutes, preferably 20 seconds to 60 minutes.

Further, in the case of photocrosslinking, the light source is from ultraviolet to
Many types that emit light in the visible region can be adopted, and examples thereof include ultrahigh pressure, high pressure, low pressure mercury lamps, chemical lamps, xenon lamps, halogen lamps, Mercury halogen lamps, carbon arc lamps, incandescent lamps, and laser light.
The irradiation time is not generally decided depending on the kind of the lamp and the strength of the light source, but it is usually several tens of seconds to several tens of minutes. In order to accelerate crosslinking, it may be heated to 40 to 120 ° C. in advance and then irradiated with ultraviolet rays.

The pressure applied during adhesion is also appropriately selected and is usually 5 to 50 kg / cm ² , especially 10 to 30 kg.
It is preferable that the applied pressure is / cm ² .

The PDP filter to which the conductive adhesive tape 7 is attached in this manner can be incorporated very simply and easily by simply fitting it in the housing. Further, when the edges of the conductive meshes 13 and 23 are protruded and folded back, good conduction between the conductive meshes 13 and 23 and the casing is evenly provided at the peripheral edges through the conductive adhesive tape 27. Can be taken. Therefore, a good electromagnetic wave shielding effect can be obtained, and in the presence of the near infrared ray cut film 5, a good near infrared ray cut performance can be obtained. Furthermore, since only one transparent substrate 2 is used, it is thin and lightweight. Further, since both sides of the transparent substrate are covered with the films 28 and 25, the transparent substrate is prevented from being cracked, and the transparent substrate is prevented from scattering if it is broken.

The PDP filters shown in FIGS. 1 and 2 are examples of the filter of the present invention, and the present invention is not limited to these. For example, a transparent conductive film may be provided together with the near infrared ray cut film. Further, a transparent conductive film may be directly formed on the plate surfaces of the transparent substrates 12 and 22.

In the production of the PDP filter of the present invention, a step for providing another layer such as an antiglare layer may be further performed if desired. The antiglare layer can be formed by, for example, blackening treatment, that is, oxidation treatment of a metal film, black plating of a chromium alloy or the like, application of black or dark color ink.

In the display device provided with the filter for plasma display panel of the present invention, a partition wall, a display cell, an auxiliary cell and the like are arranged between the windshield and the rear glass, and the red fluorescent substance and the green fluorescent substance are provided on the inner wall of each display cell. It has a basic structure in which an optical body and a blue fluorescent body are provided in a film shape, and the above-mentioned filter is attached to the surface of this windshield. FIG. 3 shows a schematic sectional view of an example thereof. In FIG. 3, the filter 30 of the present invention is arranged on the front surface of the windshield 50 of the plasma display panel 40 and attached by a known means.
It is fixed.

[0126]

EXAMPLES The present invention will be specifically described with reference to the following examples.

Example 1 A 200 μm-thick polycarbonate film having a copper foil formed on its surface was coated with a photoresist on the copper foil, dried, and then exposed through a mask having a mesh pattern to expose the resist layer. , Developed and then etched. Thus, a polycarbonate film (transparent substrate having a conductive layer) having a conductive layer (mesh pattern metal layer: thickness 10 μm, line width 10 μm, line pitch: 300 μm, aperture ratio: 90%) was obtained.

A polyethylene terephthalate film (T60, manufactured by Toray Industries, Inc.) having a thickness of 60 μm was coated with a hard code paint (WBS1, manufactured by Dainippon Ink and Chemicals, Inc.) with a bar coater, dried and then irradiated with ultraviolet rays (1 kW). / Cm
A UV lamp, irradiation distance 20 cm, irradiation time 30 seconds) was applied to form a hard coat (layer thickness 5 μm). A transparent protective film with a hard coat layer was obtained.

As a material for forming the near infrared ray cut layer, N,
0.25 g of N, N ′, N′-tetrakis (p-dibutylaminophenyl) -p-phenylenediimonim hexafluoroantimonate (trade name CIR-1081, manufactured by Nippon Carlit Co., Ltd.), bis ( 4-t-butyl-1,2
-Dithiophenolate) copper-tetra-n-butylammonium (trade name BBT, manufactured by Sumitomo Seika Co., Ltd.) and polyester resin (Terbet 80N, Asahi Kasei Corporation)
7.5 g) was dissolved in a mixed solvent of 18.5 g of dichloromethane, 37 g of tetrahydrofuran and 37 g of toluene to prepare a coating liquid. This coating liquid was coated on a polyethylene terephthalate film having a width of 200 mm and a thickness of 100 μm and dried at room temperature to form a near infrared cut layer having a thickness of 5 μm. Thus, a near infrared cut film was obtained.

A near-infrared cut film obtained above,
A polycarbonate film and a transparent protective film with a hard coat layer are laminated in this order with an adhesive interlayer (ethylene vinyl acetate copolymer) interposed therebetween, and the temperature is set to 100 ° C., 6
After press bonding for 0 minutes, the PDP filter of the present invention was obtained.

[Embodiment 2] In the embodiment 1, as the hard code paint, the hard coat paint of the embodiment 1 is
A PDP filter was produced in the same manner except that the material containing the near-infrared cut layer forming material in an amount of 10 was used.

Example 3 In Example 1, a fluoropolymer-containing coating liquid was applied on the transparent protective film and dried to form a low-refractive-index transparent film having a thickness of 5 μm. A PDP filter was produced in the same manner as in Example 1, except that the hard coat paint containing ITO fine particles (containing 50% by mass relative to the solid content of the paint) was used to form the hard coat layer.

Comparative Example 1 A PDP filter was produced in the same manner as in Example 1 except that the hard code layer was not provided.

<Evaluation of PDP Filter> Examples 1 and 2
The filters for PDPs obtained in Nos. 3 and 3 were excellent in scratch resistance, and no scratches were observed on the surface during production.
On the other hand, the PDP filters obtained in Comparative Example 1 were inferior in scratch resistance to those obtained in Examples 1 and 2, and some scratches were observed on the filter surface during the production. .

Further, the PDP filter obtained in Example 2 was improved in the near infrared ray cut property without lowering the scratch resistance. PDP obtained in Example 3
The filter for use had a markedly improved antireflection property without deterioration in scratch resistance.

[0136]

The plasma display panel filter of the present invention prevents scratches on the surface (exposed transparent substrate surface) of the plasma display panel filter during and after the manufacture of the plasma display panel filter. Therefore, it is possible to improve the commercial value of the obtained filter. Further, it can be said that the PDP filter has excellent durability because it can prevent scratches during manufacturing and prevent damage. Further, as the hard coat layer of the present invention, it is possible to use a hard coat layer containing a dye that absorbs near infrared rays, and in this case, it is possible to significantly improve the near infrared ray cut function with almost no decrease in transparency. it can. In addition, the hard coat layer may contain conductive fine particles for blocking electromagnetic waves, whereby the electromagnetic wave shielding function can be greatly improved with almost no decrease in transparency. A filter for PDP is manufactured in the same manner except for the hard coat layer by imparting the near-infrared ray cutting function and the electromagnetic wave shielding function as described above, or by imparting the function as a part of the antireflection layer as described above. Since the above function can be adjusted when the hard coat layer is formed, the formation of the hard coat layer can be utilized not only for improving scratch resistance but also for adjusting the characteristics of the manufactured filter, which is extremely advantageous.

Therefore, it is clear that the filter of the present invention is suitable as a front filter of a plasma display panel (PDP).

[Brief description of drawings]

FIG. 1 is a schematic view showing a basic structure of a plasma display panel filter of the present invention.

FIG. 2 is a schematic view showing an example of a preferred structure of the plasma display panel filter of the present invention.

FIG. 3 is a schematic cross-sectional view of an example of a display device of a plasma display panel equipped with the filter of the present invention.

[Explanation of sign]

12, 22 Transparent substrate 13, 23 Conductive layer (conductive mesh) for blocking electromagnetic waves 18, 28 Transparent protective films 24A, 24B Adhesive intermediate film 24C Adhesive 25 Near infrared cut film 27 Conductive adhesive tape 19, 29 Hard coat layer 30 PDP filter 40 Plasma display panel 50 Windshield

─────────────────────────────────────────────────── ─── Continuation of front page (51) Int.Cl. ⁷ Identification code FI theme code (reference) G02B 1/11 H04N 5/66 101A 5G435 5/22 H05K 9/00 V H04N 5/66 101 G02B 1/10 A H05K 9/00 Z F-term (reference) 2H048 CA04 CA12 CA24 2K009 AA05 AA06 AA07 AA09 AA15 CC03 CC06 CC09 CC14 CC26 CC34 EE03 4F100 AB01B AB17 AB33 AK01B AK42C AK45 AR00C AT00A BA04 BA05 BA07 BA10A BA10D BA10E CA07D CA13D DC11B DE01D DG04B GB41 JD08B JD08D JD10E JG01B JG01D JK12D JN01A JN01C 5C058 AA11 AB05 BA33 5E321 AA04 BB21 BB25 BB32 BB41 GG05 GH01 5G435 AA07 AA16 BB06 GG33 HH03

Claims (8)

[Claims] 1. A filter for a plasma display panel, comprising a transparent substrate, a conductive layer provided on the transparent substrate for blocking electromagnetic waves, and a transparent protective film provided on the conductive layer, the surface of the transparent protective film. A filter for a plasma display panel, characterized in that a hard coat layer is provided on the. 2. A transparent substrate, a conductive layer provided on one surface of the transparent substrate for blocking electromagnetic waves, a transparent protective film provided on the conductive layer, and a near infrared ray cut provided on the other surface of the transparent substrate. A filter for a plasma display panel comprising a film, wherein a hard coat layer is provided on the surface of the transparent protective film. 3. The filter for a plasma display panel according to claim 1, wherein the hard coat layer contains a dye that absorbs near infrared rays. 4. The filter for a plasma display panel according to claim 1, wherein the hard coat layer contains conductive fine particles for blocking electromagnetic waves. 5. The plasma display panel according to claim 1, wherein the hard coat layer is provided on the transparent protective film via a low refractive index transparent layer having a refractive index lower than that of the hard coat layer. Filter. 6. The filter for a plasma display panel according to claim 1, wherein the transparent protective film is a polyethylene terephthalate film. 7. The conductive layer is a metal fiber mesh, a metal-coated organic fiber mesh, or a mesh-patterned metal layer,
7. The filter for a plasma display panel according to any one of 1 to 6, which is a metal-containing resin layer or a laminate of the metal-containing resin layer and a metal layer. 8. A display device comprising the filter for plasma display panel according to claim 1. Description: