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JP2003229648A - Copper foil for printed wiring board and its producing method - Google Patents

Copper foil for printed wiring board and its producing method

Info

Publication number
JP2003229648A
JP2003229648A JP2002026439A JP2002026439A JP2003229648A JP 2003229648 A JP2003229648 A JP 2003229648A JP 2002026439 A JP2002026439 A JP 2002026439A JP 2002026439 A JP2002026439 A JP 2002026439A JP 2003229648 A JP2003229648 A JP 2003229648A
Authority
JP
Japan
Prior art keywords
copper foil
printed wiring
wiring board
epoxy resin
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2002026439A
Other languages
Japanese (ja)
Other versions
JP4370074B2 (en
Inventor
Toshio Kawasaki
利雄 川崎
Masahiko Yamada
雅彦 山田
Yoshitoshi Kumakura
俊寿 熊倉
Kazuhito Kobayashi
和仁 小林
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Denkai Co Ltd
Resonac Corp
Original Assignee
Nippon Denkai Co Ltd
Hitachi Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Denkai Co Ltd, Hitachi Chemical Co Ltd filed Critical Nippon Denkai Co Ltd
Priority to JP2002026439A priority Critical patent/JP4370074B2/en
Publication of JP2003229648A publication Critical patent/JP2003229648A/en
Application granted granted Critical
Publication of JP4370074B2 publication Critical patent/JP4370074B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Landscapes

  • Laminated Bodies (AREA)
  • Production Of Multi-Layered Print Wiring Board (AREA)
  • Parts Printed On Printed Circuit Boards (AREA)

Abstract

<P>PROBLEM TO BE SOLVED: To provide a copper foil for printed wiring board, and its producing method, exhibiting excellent stripping strength without increasing the surface roughness in order to deal with fine patterning of circuit wiring and high function of a basic material. <P>SOLUTION: The copper foil for printed wiring board comprises a rust prevention processing layer, a coupling agent processing layer, and an adhesive property imparting layer of epoxy resin polymer having weight average molecular weight of 70,000 or above wherein the adhesive property imparting layer has a thickness of 0.5-5 g/m<SP>2</SP>expressed in terms of weight. When an epoxy silane based coupling agent is employed, a copper foil for printed wiring board exhibiting excellent stripping strength is obtained. In the process for producing a copper foil for printed wiring board by forming an adhesive property imparting layer on a copper foil, the copper foil is coated with a solution containing epoxy resin polymer by 1-10%. <P>COPYRIGHT: (C)2003,JPO

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、プリント配線板用銅箔
とその製造方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a copper foil for printed wiring boards and a method for manufacturing the same.

【0002】[0002]

【従来の技術】電子機器に用いられるプリント配線板
は、銅張積層板に対してエッチング加工を行うことで銅
箔の不要部分を除去し、回路配線を形成している。銅張
積層板は、ガラス繊維布にエポキシ樹脂を含浸させた基
材と、銅箔とを、積層成型して製造される。また、無機
フィラーを含有するエポキシ樹脂フィルムを銅箔上に形
成した樹脂付銅箔を用いることも行われている。樹脂付
銅箔に用いられるエポキシ樹脂フィルムの厚さは、回路
配線層間の絶縁を確保するために通常100μm程度で
ある。プリント配線板は製造工程において過酷な処理条
件にさらされ、また、長期に使用されるため、高度な信
頼性が要求され、銅箔と基材間の高い引きはがし強さが
特に要求される。このため、銅箔と基材間の引きはがし
強さを物理的に向上させることを目的として、酸性銅メ
ッキ浴等による粗化処理が銅箔に対して行われている。
また、引きはがし強さを化学的に向上させることを目的
として、シランカップリング剤によるカップリング剤処
理を行なうことが、特開昭57−87324号公報に記
載されている。また、特開平8−193188号公報に
は、粗化処理を行なわない銅箔上に、ゴム変成エポキシ
樹脂組成物からなる接着剤層を形成した、接着剤付銅箔
が記載されている。この接着剤層の厚さは、特に規定さ
れてはいないが、実施例からみて30μm程度である。
2. Description of the Related Art In printed wiring boards used in electronic equipment, unnecessary parts of copper foil are removed by etching a copper clad laminate to form circuit wiring. The copper clad laminate is manufactured by laminating and molding a base material obtained by impregnating a glass fiber cloth with an epoxy resin and a copper foil. Further, it is also practiced to use a resin-coated copper foil in which an epoxy resin film containing an inorganic filler is formed on a copper foil. The thickness of the epoxy resin film used for the resin-coated copper foil is usually about 100 μm in order to ensure insulation between circuit wiring layers. The printed wiring board is exposed to harsh processing conditions in the manufacturing process and is used for a long period of time. Therefore, high reliability is required and high peeling strength between the copper foil and the base material is particularly required. Therefore, for the purpose of physically improving the peeling strength between the copper foil and the base material, a roughening treatment with an acidic copper plating bath or the like is performed on the copper foil.
Further, JP-A-57-87324 discloses that a coupling agent is treated with a silane coupling agent for the purpose of chemically improving the peeling strength. Further, JP-A-8-193188 describes a copper foil with an adhesive in which an adhesive layer made of a rubber-modified epoxy resin composition is formed on a copper foil which is not subjected to a roughening treatment. The thickness of this adhesive layer is not particularly specified, but is about 30 μm as seen from the examples.

【0003】[0003]

【発明が解決しようとする課題】プリント配線板は、電
子技術の高度化に伴って急速な技術的進歩を遂げてお
り、プリント配線板を構成する銅箔に要求される性能も
厳しさを増している。特に電子機器の小型化・高性能化
の進展に伴う回路配線の高密度化とデータ転送の高速化
に対応するため、表面粗さの小さい銅箔が望まれてい
る。表面粗さの小さい銅箔を用いることでエッチング加
工性が向上して微細な回路配線の形成が容易になり、高
密度な回路配線を実現することができるとともに、信号
波形の乱れの原因となる回路配線表面の凹凸が減少する
ことでデータ転送の高速化を実現できるが、基材との物
理的な相互作用が減少して回路配線の引きはがし強さが
低下する。また、基材の高耐熱性、高弾性率、低熱膨張
率化等の高機能化に対応して、基材中の無機フィラが増
加する傾向にある。このため、基材中の樹脂分が減少し
た結果、塑性変形による応力緩和などが小さくなり、引
きはがし強さが低下する傾向にある。引きはがし強さを
高くするために樹脂を変性させると、基材の特性が損な
われる恐れがある。
The printed wiring board has made rapid technological progress with the sophistication of electronic technology, and the performance required for the copper foil constituting the printed wiring board has become more severe. ing. In particular, a copper foil having a small surface roughness is desired in order to cope with high density of circuit wiring and high speed of data transfer accompanying the progress of miniaturization and high performance of electronic devices. By using a copper foil with a small surface roughness, etching processability is improved, fine circuit wiring can be easily formed, high-density circuit wiring can be realized, and it causes signal waveform distortion. Although the speed of data transfer can be increased by reducing the irregularities on the surface of the circuit wiring, the physical interaction with the base material is reduced and the peeling strength of the circuit wiring is reduced. In addition, the inorganic filler in the base material tends to increase in response to high functionality such as high heat resistance, high elastic modulus and low thermal expansion coefficient of the base material. Therefore, as a result of the decrease in the resin content in the base material, stress relaxation due to plastic deformation and the like are reduced, and the peeling strength tends to decrease. If the resin is modified to increase the peel strength, the characteristics of the base material may be impaired.

【0004】本発明は、回路配線の微細化及び基材の高
機能化に対応するため、表面粗さを上げることなく、引
きはがし強さに優れるプリント配線板用銅箔とその製造
方法を提供するものである。
The present invention provides a copper foil for a printed wiring board which is excellent in peeling strength without increasing the surface roughness and a method for producing the same, in order to cope with the miniaturization of circuit wiring and the higher functionality of the base material. To do.

【0005】[0005]

【発明が解決しようとする手段】本発明者らは鋭意検討
の結果、重量平均分子量が70,000以上のエポキシ
樹脂重合体からなる接着性付与層を設けることにより、
表面粗さの小さい平滑な銅箔を用いても実用上十分な引
きはがし強さが得られることを見出し、本発明を完成す
るに至った。すなわち、本発明は、重量平均分子量が7
0,000以上のエポキシ樹脂重合体からなる接着性付
与層を有することを特徴とするプリント配線板用銅箔で
ある。さらに、本発明は、防錆処理層と、カップリング
剤処理層と、重量平均分子量が70,000以上のエポ
キシ樹脂重合体からなる接着性付与層とを有することを
特徴とするプリント配線板用銅箔であり、重量平均分子
量が70,000以上のエポキシ樹脂重合体からなる接
着性付与層の厚さが、重量換算厚さで0.5〜5g/m
であることを特徴とするプリント配線板用銅箔であ
る。カップリング剤としては、エポキシシラン系カップ
リング剤を用いることにより、引きはがし強さに優れた
プリント配線板用銅箔が得られる。
DISCLOSURE OF THE INVENTION As a result of intensive investigations by the present inventors, by providing an adhesion imparting layer made of an epoxy resin polymer having a weight average molecular weight of 70,000 or more,
The inventors have found that practically sufficient peeling strength can be obtained even by using a smooth copper foil having a small surface roughness, and have completed the present invention. That is, the present invention has a weight average molecular weight of 7
A copper foil for a printed wiring board, which has an adhesion imparting layer made of an epoxy resin polymer of 20,000 or more. Further, the present invention is a printed wiring board having a rust preventive treatment layer, a coupling agent treatment layer, and an adhesion imparting layer made of an epoxy resin polymer having a weight average molecular weight of 70,000 or more. The thickness of the adhesion-imparting layer, which is a copper foil and made of an epoxy resin polymer having a weight average molecular weight of 70,000 or more, is 0.5 to 5 g / m 2 in terms of weight.
It is copper foil for printed wiring boards characterized by being 2 . By using an epoxysilane coupling agent as the coupling agent, a copper foil for a printed wiring board having excellent peeling strength can be obtained.

【0006】さらに本発明は、重量平均分子量が70,
000以上のエポキシ樹脂重合体からなる接着性付与層
を形成してプリント配線板用銅箔を製造する工程におい
て、エポキシ樹脂重合体を1〜10%含有する溶液を銅
箔に塗工することを特徴とするプリント配線板用銅箔の
製造方法である。
Further, the present invention has a weight average molecular weight of 70,
000 or more epoxy resin polymer adhesiveness imparting layer is formed to produce a copper foil for printed wiring board, in the step of coating the copper foil with a solution containing 1 to 10% of the epoxy resin polymer. It is a characteristic method for producing a copper foil for a printed wiring board.

【0007】[0007]

【発明の実施の形態】本発明のプリント配線板用銅箔に
用いる銅箔の種類は、電解銅箔、圧延銅箔のいずれでも
よく、厚さについては3〜70μmが好適であり、特に
好ましくは3〜18μmがさらに好適である。銅箔が7
0μmよりも厚いとエッチング加工が困難となり、3μ
mよりも薄いと取扱いが困難となる。電解銅箔には光沢
面と非光沢面の2種類の表面があり、各々表面形状と表
面粗さが異なるが、本発明においては接着性付与層をど
ちらの表面上に設けてもよい。表面粗さは、10点平均
粗さで0.5〜10μmが好適であり、特に好ましくは
0.5〜3μmがさらに好適である。表面粗さが0.5
μmよりも小さいと、銅箔自体の製造が困難になる。一
方、3μmよりも大きいと、基材樹脂に埋没した部分が
増加してエッチング加工が困難となる。さらに、表面粗
さが大きいと高周波信号の波形に乱れが生じやすくなる
ので、高周波回路に用いる場合には、表面粗さが上記の
範囲内で小さいことが好ましい。表面粗さが上記の範囲
であれば、粗化処理が行われていない銅箔も使用するこ
とができる。粗化処理が行われていない銅箔を用いた鋼
張積層板は、基材樹脂に埋没した粗化粒子が存在しない
ため、特にエッチング加工性に優れる。
BEST MODE FOR CARRYING OUT THE INVENTION The type of copper foil used in the copper foil for a printed wiring board of the present invention may be either electrolytic copper foil or rolled copper foil, and the thickness is preferably 3 to 70 μm, and particularly preferably Is more preferably 3 to 18 μm. 7 copper foil
If it is thicker than 0 μm, the etching process becomes difficult, and 3 μm
If it is thinner than m, handling becomes difficult. The electrolytic copper foil has two types of surfaces, that is, a glossy surface and a non-glossy surface, each having a different surface shape and surface roughness. In the present invention, the adhesion imparting layer may be provided on either surface. The surface roughness is preferably from 10 to 10 average roughness of 0.5 to 10 μm, particularly preferably 0.5 to 3 μm. Surface roughness is 0.5
If it is smaller than μm, it becomes difficult to manufacture the copper foil itself. On the other hand, when the thickness is larger than 3 μm, the portion buried in the base resin increases and etching processing becomes difficult. Further, when the surface roughness is large, the waveform of the high-frequency signal is likely to be disturbed, and therefore when used in a high-frequency circuit, it is preferable that the surface roughness be small within the above range. If the surface roughness is within the above range, a copper foil that has not been roughened can also be used. A steel-clad laminate using a copper foil that has not been roughened is particularly excellent in etching processability because there are no roughening particles embedded in the base resin.

【0008】また、本発明において、銅箔の被接着面に
は、防錆処理層、カップリング剤処理層を設ける必要が
ある。防錆処理層としてはクロメート処理層のほか、亜
鉛を含有する亜鉛−クロメート処理層、亜鉛とアルミニ
ウムとからなる複合処理層等があり、これらの防錆処理
層は酸素や水分を遮断して、銅ないし上記の金属処理層
及び合金処理層の経時劣化を防止する。防錆処理層は、
対応する金属イオンまたはその錯イオンを含有する処理
浴中で浸漬または電解処理を行なうことにより形成する
ことができる。シランカップリング剤処理層は、各種の
カップリング剤の水溶液、水分散液、溶液等を防錆処理
層上に塗工、噴霧等の各種の方法により形成することが
できる。カップリング剤としては、各種のシランカップ
リング剤を単独あるいは混合して用いることができ、ビ
ニルトリメトキシシラン、ビニルトリエトキシシラン、
ビニルトリス(β−メトキシエトキシ)シラン、β−
(3,4−エポキシシクロヘキシル)エチルトリメトキ
シシラン、γ−グリシドキシプロピルトリメトキシシラ
ン、γ−グリシドキシプロピルメチルジエトキシシラ
ン、γ−グリシドキシプロピルトリエトキシシラン、γ
−メタクリロキシプロピルメチルジメトキシシラン、γ
−メタクリロキシプロピルトリメトキシシラン、N−β
−(アミノエチル)−γ−アミノプロピルトリエトキシ
シラン、γ−アミノプロピルトリメトキシシラン、N−
フェニル−γ−アミノプロピルトリエトキシシラン、γ
−クロロプロピルトリメトキシシラン、γ−メルカプト
プロピルトリメトキシシラン、γ−メルカプトプロピル
メチルジメトキシシラン等を用いることができる。さら
には、上記したシランカップリング剤1種以上を混合し
て使用する。特に好ましくはエポキシシランがさらに好
適である。また、必要であれば上記のシランカップリン
グ剤とテトラメトキシシラン、テトラエトキシシラン、
テトラプロポキシシラン、テトラブトキシシラン等のテ
トラアルコキシシランあるいは水ガラス、ケイ酸リチウ
ム、ケイ酸カリウム等のポリケイ酸塩と混合して使用し
てもよい。カップリング処理剤層を形成することによ
り、回路配線の引きはがし強さ並びに耐湿性が向上す
る。また、プリント配線板としての要求特性に応じて防
錆処理層の下に金属処理層または合金処理層を形成して
もよい。この金属処理層または合金処理層として用いる
金属としては、亜鉛、ニッケル、コバルト、モリブデ
ン、インジウム、鉄等があり、必要に応じて単独または
合金として用いられ、金属処理層または合金処理層に
は、これらの金属の一部が酸化物または水酸化物として
存在してもよい。
Further, in the present invention, it is necessary to provide an anticorrosion treatment layer and a coupling agent treatment layer on the adhered surface of the copper foil. As the rust-preventive treatment layer, in addition to the chromate treatment layer, there is a zinc-containing chromate treatment layer containing zinc, a composite treatment layer consisting of zinc and aluminum, etc., and these rust-preventive treatment layers block oxygen and moisture, The deterioration of copper or the above-mentioned metal-treated layer and alloy-treated layer with time is prevented. The anticorrosion layer is
It can be formed by immersion or electrolytic treatment in a treatment bath containing the corresponding metal ion or its complex ion. The silane coupling agent-treated layer can be formed by various methods such as coating and spraying an aqueous solution, aqueous dispersion, solution or the like of various coupling agents on the anticorrosion-treated layer. As the coupling agent, various silane coupling agents can be used alone or in combination, and vinyltrimethoxysilane, vinyltriethoxysilane,
Vinyltris (β-methoxyethoxy) silane, β-
(3,4-epoxycyclohexyl) ethyltrimethoxysilane, γ-glycidoxypropyltrimethoxysilane, γ-glycidoxypropylmethyldiethoxysilane, γ-glycidoxypropyltriethoxysilane, γ
-Methacryloxypropylmethyldimethoxysilane, γ
-Methacryloxypropyltrimethoxysilane, N-β
-(Aminoethyl) -γ-aminopropyltriethoxysilane, γ-aminopropyltrimethoxysilane, N-
Phenyl-γ-aminopropyltriethoxysilane, γ
-Chloropropyltrimethoxysilane, γ-mercaptopropyltrimethoxysilane, γ-mercaptopropylmethyldimethoxysilane and the like can be used. Further, one or more of the above-mentioned silane coupling agents are mixed and used. Particularly preferably, epoxy silane is more preferable. If necessary, the above silane coupling agent and tetramethoxysilane, tetraethoxysilane,
It may be used by mixing with tetraalkoxysilane such as tetrapropoxysilane or tetrabutoxysilane or with polysilicate such as water glass, lithium silicate or potassium silicate. By forming the coupling treatment agent layer, the peeling strength of the circuit wiring and the moisture resistance are improved. Further, a metal treatment layer or an alloy treatment layer may be formed under the rustproof treatment layer depending on the required characteristics of the printed wiring board. Examples of the metal used as the metal treatment layer or the alloy treatment layer include zinc, nickel, cobalt, molybdenum, indium, iron, etc., which are used alone or as an alloy as necessary. Some of these metals may be present as oxides or hydroxides.

【0009】接着性付与層の形成に用いるエポキシ樹脂
重合体としては、特開平4−120124号公報,特開
平4−120125号公報、特開平5−93041号公
報、並びに特開平5−93042号公報に記載のビスフ
ェノールAジグリシジルエーテル等の二官能性エポキシ
樹脂、ビスフェノールA等の二官能フェノール類及びメ
ラミン、イソシアヌル酸等のトリアジン環若しくはイソ
シアヌル環を有する化合物との反応によりできるエポキ
シを用いることができる。このエポキシ樹脂重合体は、
フィルム形成性や機械強度に優れることから、溶解度の
許容する範囲で高分子量であることが好ましく、重量平
均分子量で70,000以上、より好ましくは100,
000以上である。上記のエポキシ樹脂重合体を溶剤に
溶解し、濃度が1〜10%のワニスとして用いる。溶剤
としては、ホルムアミド、ジメチルホルムアミド、ジメ
チルアセトアミド、N−メチルピロリドン等のアミド化
合物類、クロロホルム、塩化メチレン等のハロゲン化炭
化水素類、アリルグリシジルエーテル、スチレンオキサ
イド、フェニルグリシジルエーテル等のエポキシ化合物
類、アミド化合物類とベンゼン、ヘキサン、トルエン、
キシレン等の炭化水素類、メタノール、エタノール、1
一プロパノール、2一プロパノール等のアルコール類、
アセトン、2−ブタノン、2−ペンタノン、3−ペンタ
ノン等のケトン類、あるいは、ギ酸メチル、酢酸メチ
ル、酢酸エチル等のエステル類との混合溶剤を用いる。
Epoxy resin polymers used for forming the adhesion imparting layer are disclosed in JP-A-4-120124, JP-A-4-120125, JP-A-5-93041, and JP-A-5-93042. The bifunctional epoxy resin such as bisphenol A diglycidyl ether described in 1., the bifunctional phenol such as bisphenol A and the epoxy obtained by the reaction with the compound having a triazine ring or isocyanuric ring such as melamine and isocyanuric acid can be used. . This epoxy resin polymer is
From the standpoint of excellent film-forming property and mechanical strength, it is preferable that the polymer has a high molecular weight within a range that the solubility allows, and a weight average molecular weight of 70,000 or more, more preferably 100,
It is more than 000. The above epoxy resin polymer is dissolved in a solvent and used as a varnish having a concentration of 1 to 10%. As the solvent, amide compounds such as formamide, dimethylformamide, dimethylacetamide and N-methylpyrrolidone, halogenated hydrocarbons such as chloroform and methylene chloride, epoxy compounds such as allyl glycidyl ether, styrene oxide and phenyl glycidyl ether, Amide compounds and benzene, hexane, toluene,
Hydrocarbons such as xylene, methanol, ethanol, 1
Alcohols such as 1-propanol, 21-propanol,
A mixed solvent of ketones such as acetone, 2-butanone, 2-pentanone and 3-pentanone or esters such as methyl formate, methyl acetate and ethyl acetate is used.

【0010】上記のエポキシ樹脂重合体は熱軟化性であ
り、熱硬化性を付与する硬化剤を配合したエポキシ樹脂
重合体ワニスとして銅箔上に各種の方法で塗工し、乾燥
することにより、接着性付与層を形成する。硬化剤とし
ては各種のブロックイソシアネート類等、エポキシ重合
体の水酸基と反応して架橋三次元化するものを用いるこ
とができる。また、低分子量のエポキシ樹脂とジシアン
ジアミド等の硬化剤を添加し、エポキシ樹脂硬化物とと
もに一体化させてもよい。さらには、各種の熱硬化性樹
脂の硬化システムを適用することができる。また、本発
明のエポキシ樹脂重合体ワニスは難燃剤、レベリング
剤、酸化防止剤などの各種添加剤を添加することがで
き、乾燥後の樹脂組成物層の塗工量は、重量換算厚さで
0.5〜5g/mである。0.5g/m未満では引
きはがし強さが低く、5g/mより厚いと耐湿性が低
下する。接着性付与層は、銅箔の被接着面を完全に被覆
している必要はなく、粗面側であれば凸部の頂点が被覆
されていなくてもよい。
The above-mentioned epoxy resin polymer is heat-softenable, and is coated on a copper foil by various methods as an epoxy resin polymer varnish containing a curing agent imparting thermosetting property, and dried to obtain a varnish. An adhesion imparting layer is formed. As the curing agent, various blocked isocyanates and the like that can react with the hydroxyl groups of the epoxy polymer to form three-dimensional crosslinking can be used. Further, a low molecular weight epoxy resin and a curing agent such as dicyandiamide may be added and integrated with the cured epoxy resin. Furthermore, various thermosetting resin curing systems can be applied. Further, the epoxy resin polymer varnish of the present invention can be added with various additives such as a flame retardant, a leveling agent and an antioxidant, and the coating amount of the resin composition layer after drying is the weight-converted thickness. It is 0.5 to 5 g / m 2 . If it is less than 0.5 g / m 2 , the peeling strength is low, and if it is thicker than 5 g / m 2 , the moisture resistance decreases. The adhesion-imparting layer does not need to completely cover the adhered surface of the copper foil, and the apex of the convex portion may not be covered on the rough surface side.

【0011】接着性付与層を銅箔の被接着面に設ける方
法としては、上記のエポキシ樹脂重合体ワニスを公知の
塗工方式、例えば、転写方式(ローラ、ホイール、ダウ
バー)、触圧方式(ボールポイント)、噴射方式、自重
滴下方式等を用いることができる。これらの中では、噴
射方式あるいは自重滴下方式によって実施することが量
産性、経済性の点で実用上望ましい。エポキシ樹脂重合
体ワニスを塗工した後、加熱乾燥することにより、接着
性付与層を半硬化状態とする。完全に硬化した状態では
ガラス布エポキシ樹脂基材等の積層基材との積層成型に
際して、接着性付与層と基材樹脂との一体化が十分では
なく、信頼性が低下する。一方、硬化が不十分な状態で
は、塗工品をロール状で保管した場合に接着性付与層が
銅箔の他方の面を汚染する。乾燥温度は45〜300
℃、好ましくは70〜200℃、乾燥時間は10秒〜6
0分、好ましくは1〜30分である。
As a method for providing the adhesion-imparting layer on the surface of the copper foil to be adhered, the above-mentioned epoxy resin polymer varnish is applied by a known coating method, for example, a transfer method (roller, wheel, dowbar), or a pressure-sensitive method ( Ball point), injection method, self-weight dropping method and the like can be used. Among these, the injection method or the self-weight dropping method is practically preferable in terms of mass productivity and economical efficiency. After applying the epoxy resin polymer varnish, the adhesiveness imparting layer is semi-cured by heating and drying. In the completely cured state, the integration of the adhesion-imparting layer and the base resin is not sufficient at the time of laminate molding with a laminated base material such as a glass cloth epoxy resin base material, resulting in a decrease in reliability. On the other hand, in the insufficiently cured state, the adhesiveness-imparting layer contaminates the other surface of the copper foil when the coated product is stored in a roll form. Drying temperature is 45-300
℃, preferably 70-200 ℃, drying time is 10 seconds to 6
It is 0 minutes, preferably 1 to 30 minutes.

【0012】[0012]

【実施例】以下、本発明を実施例に基づいて詳細に説明
するが、本発明はこれに限定されるものではない。
EXAMPLES The present invention will now be described in detail based on examples, but the present invention is not limited thereto.

【0013】(実施例1)重量平均分子量が127,0
00のビスフェノールA系エポキシ樹脂重合体を含有す
る溶液(固形分30%、溶剤:ジメチルアセトアミド)
100重量部に、クレゾールノボラック型エポキシ樹脂
(エポキシ当量:198)15重量部、フェノールノボ
ラック(水酸基当量:106)7重量部、2−エチル−
4−メチルイミダゾール1重量部を加え、ジメチルアセ
ドアミド1878重量部を加えて攪拌し、エポキシ樹脂
重合体ワニスを調製した。このエポキシ樹脂重合体ワニ
スを、粗化処理層と、ニッケルとモリブデンとコバルト
からなる合金処理層と、クロメート処理層と、シランカ
ップリング剤処理層の形成された厚さ12μmの電解銅
箔の非光沢面側(10点平均粗さ:Rz=5.5μm)
にスプレー法により5秒間塗布し、直ちに温度70℃で
30分間乾燥してプリント配線板用銅箔とした。接着性
付与層の厚さは、重量換算厚さで4.7g/mであっ
た。プリント配線板用銅箔を、厚さ0.2mmのガラス
布基材エポキシ樹脂プリプレグ(日立化成工業株式会社
製、商品名 GEA−67N及びGEA−679N)8
枚に、樹脂面(即ち、被接着面)がプリプレグに面する
ように積層し、温度168℃、圧力0.3MPa、時間
90分の条件下で加熱加圧処理して銅張積層板を作製し
た。この銅張積層板の特性を表に示した。なお、試験法
は下記に記載したとおりである。ただし、引きはがし強
さ及び耐薬品性劣化率はFR−5グレードのプリプレグ
(GEA−679N)を用いた銅張積層板における値で
あり、耐湿性劣化率はFR−4グレードのプリプレグ
(GEA−67N)を用いた銅張積層板における値であ
る。 (実施例2)表面粗さが10点平均粗さ=2.3で粗化
処理層が形成されていないことを除いては、実施例1と
同様にして評価を行なった。結果を合わせて表に示し
た。
Example 1 The weight average molecular weight is 127,0.
Solution containing 00 bisphenol A epoxy resin polymer (solid content 30%, solvent: dimethylacetamide)
100 parts by weight, cresol novolac type epoxy resin (epoxy equivalent: 198) 15 parts by weight, phenol novolac (hydroxyl group equivalent: 106) 7 parts by weight, 2-ethyl-
1 part by weight of 4-methylimidazole and 1878 parts by weight of dimethylacedamide were added and stirred to prepare an epoxy resin polymer varnish. This epoxy resin polymer varnish was treated with a roughening treatment layer, an alloy treatment layer made of nickel, molybdenum and cobalt, a chromate treatment layer, and a silane coupling agent treatment layer to form a non-electrolytic copper foil having a thickness of 12 μm. Glossy surface side (10-point average roughness: Rz = 5.5 μm)
Was sprayed for 5 seconds and immediately dried at 70 ° C. for 30 minutes to obtain a copper foil for a printed wiring board. The thickness of the adhesion imparting layer was 4.7 g / m 2 in terms of weight. Copper foil for printed wiring board, glass cloth base material epoxy resin prepreg of 0.2 mm thickness (Hitachi Chemical Co., Ltd., trade name GEA-67N and GEA-679N) 8
The sheet is laminated so that the resin surface (that is, the surface to be adhered) faces the prepreg, and heat and pressure treatment is performed under conditions of temperature 168 ° C., pressure 0.3 MPa, and time 90 minutes to produce a copper clad laminate. did. The characteristics of this copper clad laminate are shown in the table. The test method is as described below. However, the peel strength and the chemical resistance deterioration rate are the values in the copper clad laminate using the FR-5 grade prepreg (GEA-679N), and the moisture resistance deterioration rate is the FR-4 grade prepreg (GEA- 67N) for a copper clad laminate. (Example 2) Evaluation was performed in the same manner as in Example 1 except that the surface roughness was 10-point average roughness = 2.3 and no roughening treatment layer was formed. The results are shown together in the table.

【0014】(実施例3)表面粗さが10点平均粗さ=
1.5で粗化処理層が形成されていないことを除いて
は、実施例1と同様にして評価を行なった。結果を合わ
せて表に示した。
(Embodiment 3) Surface roughness is 10 points Average roughness =
Evaluation was carried out in the same manner as in Example 1 except that the roughening treatment layer was not formed at 1.5. The results are shown together in the table.

【0015】(比較例1)カップリング剤処理層が形成
されていないことを除いては、実施例1と同様にして評
価を行なった。結果を合わせて表に示した。
Comparative Example 1 Evaluation was carried out in the same manner as in Example 1 except that the coupling agent treatment layer was not formed. The results are shown together in the table.

【0016】(比較例2)接着性付与層が重量換算厚さ
で0.3g/mであることを除いては、実施例1と同
様にして評価を行なった。結果を合わせて表に示した。
Comparative Example 2 Evaluation was performed in the same manner as in Example 1 except that the adhesion-imparting layer had a weight-converted thickness of 0.3 g / m 2 . The results are shown together in the table.

【0017】(比較例3)接着性付与層が重量換算厚さ
で10g/mであることを除いては、実施例1と同様
にして評価を行なった。結果を合わせて表に示した。
(Comparative Example 3) Evaluation was carried out in the same manner as in Example 1 except that the thickness of the adhesion-imparting layer was 10 g / m 2 in terms of weight. The results are shown together in the table.

【0018】(比較例4)接着性付与層を形成しないこ
とを除いては、実施例1と同様にして評価を行なった。
結果を合わせて表に示した。
Comparative Example 4 Evaluation was carried out in the same manner as in Example 1 except that the adhesion imparting layer was not formed.
The results are shown together in the table.

【0019】(比較例5)接着性付与層を形成しないこ
とを除いては、実施例2と同様にして評価を行なった。
結果を合わせて表に示した。
(Comparative Example 5) Evaluation was carried out in the same manner as in Example 2 except that the adhesion imparting layer was not formed.
The results are shown together in the table.

【0020】(比較例6)接着性付与層を形成しないこ
とを除いては、実施例3と同様にして評価を行なった。
結果を合わせて表に示した。
Comparative Example 6 Evaluation was carried out in the same manner as in Example 3 except that the adhesion imparting layer was not formed.
The results are shown together in the table.

【0021】[0021]

【表1】 [Table 1]

【0022】[0022]

【発明の効果】本発明のプリント配線板用銅箔を用いる
ことにより、銅箔と樹脂基材間の引きはがし強さを高く
保持する高信頼性のプリント配線板を製造できる。
By using the copper foil for a printed wiring board of the present invention, it is possible to manufacture a highly reliable printed wiring board which maintains a high peeling strength between the copper foil and the resin base material.

フロントページの続き (72)発明者 熊倉 俊寿 茨城県下館市下大字小川1500番地 日立化 成工業株式会社下館事業所内 (72)発明者 小林 和仁 茨城県下館市下大字小川1500番地 日立化 成工業株式会社総合研究所内 Fターム(参考) 4E351 AA03 BB01 BB30 BB38 CC18 CC19 CC22 DD04 DD17 DD19 DD21 DD54 GG02 4F100 AB15 AB16 AB17A AB20 AB33A AK52C AK53C AK53D AR00B AR00C BA04 BA07 CB01D EJ17 EJ42 EJ67C EJ69 GB43 JA07D JB02B YY00D 5E346 AA15 CC04 CC09 CC32 CC41 DD02 DD12 GG13 GG28 HH11Continued front page    (72) Inventor Toshiju Kumakura             Hitachi, 1500, Ogawa, Shimodai, Shimodate, Ibaraki Prefecture             Seiko Building Shimodate Office (72) Inventor Kazuhito Kobayashi             Hitachi, 1500, Ogawa, Shimodai, Shimodate, Ibaraki Prefecture             Seisei Co., Ltd. Research Institute F term (reference) 4E351 AA03 BB01 BB30 BB38 CC18                       CC19 CC22 DD04 DD17 DD19                       DD21 DD54 GG02                 4F100 AB15 AB16 AB17A AB20                       AB33A AK52C AK53C AK53D                       AR00B AR00C BA04 BA07                       CB01D EJ17 EJ42 EJ67C                       EJ69 GB43 JA07D JB02B                       YY00D                 5E346 AA15 CC04 CC09 CC32 CC41                       DD02 DD12 GG13 GG28 HH11

Claims (5)

【特許請求の範囲】[Claims] 【請求項1】 重量平均分子量が70,000以上のエ
ポキシ樹脂重合体からなる接着性付与層を有することを
特徴とするプリント配線板用銅箔。
1. A copper foil for a printed wiring board, having an adhesion imparting layer made of an epoxy resin polymer having a weight average molecular weight of 70,000 or more.
【請求項2】 防錆処理層と、カップリング剤処理層
と、重量平均分子量が70,000以上のエポキシ樹脂
重合体からなる接着性付与層とを有することを特徴とす
る請求項1のプリント配線板用銅箔。
2. The print according to claim 1, further comprising an anticorrosion treatment layer, a coupling agent treatment layer, and an adhesion imparting layer made of an epoxy resin polymer having a weight average molecular weight of 70,000 or more. Copper foil for wiring boards.
【請求項3】 接着性付与層の厚さが、重量換算厚さで
0.5〜5g/mであることを特徴とする請求項1な
いし請求項2のプリント配線板用銅箔。
3. The copper foil for a printed wiring board according to claim 1, wherein the thickness of the adhesion imparting layer is 0.5 to 5 g / m 2 in terms of weight.
【請求項4】 カップリング剤がエポキシシランである
ことを特徴とする請求項1ないし請求項3のプリント配
線板用銅箔。
4. The copper foil for a printed wiring board according to claim 1, wherein the coupling agent is epoxysilane.
【請求項5】 銅箔に重量平均分子量が70,000以
上のエポキシ樹脂重合体からなる接着性付与層を形成し
てプリント配線板用銅箔を製造する工程において、エポ
キシ樹脂重合体を1〜10%含有する溶液を銅箔に塗工
することを特徴とする請求項1ないし請求項4のプリン
ト配線板用銅箔の製造方法。
5. In the step of producing a copper foil for a printed wiring board by forming an adhesion imparting layer made of an epoxy resin polymer having a weight average molecular weight of 70,000 or more on the copper foil, the epoxy resin polymer is added to The method for producing a copper foil for a printed wiring board according to claim 1, wherein a solution containing 10% is applied to the copper foil.
JP2002026439A 2002-02-04 2002-02-04 Copper foil for printed wiring board and manufacturing method thereof Expired - Lifetime JP4370074B2 (en)

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