JP2003154754A - Optical recording medium - Google Patents
Optical recording mediumInfo
- Publication number
- JP2003154754A JP2003154754A JP2001358365A JP2001358365A JP2003154754A JP 2003154754 A JP2003154754 A JP 2003154754A JP 2001358365 A JP2001358365 A JP 2001358365A JP 2001358365 A JP2001358365 A JP 2001358365A JP 2003154754 A JP2003154754 A JP 2003154754A
- Authority
- JP
- Japan
- Prior art keywords
- recording
- layer
- phase change
- recording medium
- optical recording
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000003287 optical effect Effects 0.000 title claims abstract description 44
- 239000010410 layer Substances 0.000 claims description 75
- 238000002425 crystallisation Methods 0.000 claims description 34
- 230000008025 crystallization Effects 0.000 claims description 34
- 239000011241 protective layer Substances 0.000 claims description 26
- 239000000203 mixture Substances 0.000 claims description 23
- 239000000463 material Substances 0.000 claims description 17
- 239000000758 substrate Substances 0.000 claims description 12
- 238000002844 melting Methods 0.000 claims description 10
- 230000008018 melting Effects 0.000 claims description 10
- 238000004544 sputter deposition Methods 0.000 claims description 7
- 229910045601 alloy Inorganic materials 0.000 claims description 6
- 239000000956 alloy Substances 0.000 claims description 6
- 230000000630 rising effect Effects 0.000 claims description 4
- 230000002441 reversible effect Effects 0.000 claims description 2
- 238000003860 storage Methods 0.000 abstract description 23
- 230000002349 favourable effect Effects 0.000 abstract 1
- 230000000694 effects Effects 0.000 description 21
- 230000000052 comparative effect Effects 0.000 description 17
- 230000035945 sensitivity Effects 0.000 description 8
- 230000006866 deterioration Effects 0.000 description 7
- 230000003252 repetitive effect Effects 0.000 description 7
- 229910004298 SiO 2 Inorganic materials 0.000 description 6
- 230000031700 light absorption Effects 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- 238000005191 phase separation Methods 0.000 description 5
- 229920000515 polycarbonate Polymers 0.000 description 5
- 239000004417 polycarbonate Substances 0.000 description 5
- 230000005496 eutectics Effects 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 229910000618 GeSbTe Inorganic materials 0.000 description 2
- 238000003848 UV Light-Curing Methods 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 229910002056 binary alloy Inorganic materials 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 230000017525 heat dissipation Effects 0.000 description 2
- 230000001678 irradiating effect Effects 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 238000005204 segregation Methods 0.000 description 2
- 229910000763 AgInSbTe Inorganic materials 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
Landscapes
- Optical Record Carriers And Manufacture Thereof (AREA)
- Thermal Transfer Or Thermal Recording In General (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、相変化型光記録媒
体に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a phase change type optical recording medium.
【0002】[0002]
【従来技術】情報を大容量に記録することが可能で、高
線速での再生及び繰り返し記録が可能な媒体の一つとし
て、相変化型光記録媒体が知られている。この相変化型
光記録媒体は、レーザー光を局所的に照射することによ
り、記録層に可逆的に生じる結晶状態と非晶質状態を記
録に利用したものである。即ち、特定波長の光に対する
反射光量が、結晶状態と非晶質状態で異なることを記録
として利用しており、簡単な光学系で記録・消去が可能
で、既に記録された情報を消去しながら新たな情報を記
録することが容易であるという優れた特徴を有してい
る。一般に、繰り返し記録が可能な相変化型光記録媒体
では、記録層における非晶質状態を記録状態とし、結晶
状態を消去状態としている。情報の記録は、レーザー光
を照射して記録膜を溶融、急冷し、非晶質の記録マーク
を形成する。そして、記録された信号の再生は、非晶質
部分と結晶部分の反射率の違いを利用して、ディスクか
らの反射光量の変化を検出して行う。繰り返し記録が可
能な光記録媒体に必要とされる特性の一つに、高い保存
信頼性が挙げられる。一方、最近では、高線速記録、即
ちDVD−ROMの再生線速の2〜5倍である7〜1
7.5m/sでの記録が求められているが、この線速に
おける良好な消去特性、即ち速い結晶化と、高い保存信
頼性、即ち非晶質マークが長期間安定に存在することの
両立は困難とされていた。2. Description of the Related Art A phase change type optical recording medium is known as one of mediums capable of recording a large amount of information and capable of reproduction and repetitive recording at a high linear velocity. This phase-change type optical recording medium uses a crystalline state and an amorphous state which are reversibly generated in a recording layer by locally irradiating a laser beam for recording. That is, the fact that the amount of reflected light with respect to light of a specific wavelength differs between the crystalline state and the amorphous state is used as recording, and recording / erasing is possible with a simple optical system, while erasing already recorded information. It has an excellent feature that it is easy to record new information. Generally, in a phase change type optical recording medium capable of repetitive recording, an amorphous state in a recording layer is a recorded state and a crystalline state is an erased state. Information is recorded by irradiating a laser beam to melt and rapidly cool the recording film to form an amorphous recording mark. Then, the recorded signal is reproduced by detecting the change in the amount of light reflected from the disk by utilizing the difference in reflectance between the amorphous portion and the crystalline portion. One of the characteristics required for an optical recording medium that can be repeatedly recorded is high storage reliability. On the other hand, recently, high linear velocity recording, that is, 7-1 which is 2 to 5 times the linear velocity of reproduction of DVD-ROM.
Recording at 7.5 m / s is required, but good erasing characteristics at this linear velocity, that is, fast crystallization, and high storage reliability, that is, stable presence of amorphous marks for a long period of time, are compatible. Was considered difficult.
【0003】現在、相変化型光記録媒体の記録材料とし
てGeTeSb、AgInSbTeなどが知られ実用化
されているが、これらの組成では7〜17.5m/sと
いった高線速における良好な消去特性と保存信頼性の両
立には問題がある。特開2000−132864号公報
によれば、記録層にGeSbTeを用いて、NZの界面
層を設けた場合、界面層が記録層の劣化を抑制し、保存
時のジッターの増加を小さくする可能性があるとしてい
る。しかしながら、示されている記録時のディスク線速
度は8.3m/sであり、更に高線速における記録につ
いては問題がある。また、初回記録時のジッターは13
%であり、十分に低い値ではない。At present, GeTeSb, AgInSbTe, etc. are known and put to practical use as recording materials for phase-change type optical recording media, but these compositions have good erasing characteristics at high linear velocity of 7 to 17.5 m / s. There is a problem in compatibility of storage reliability. According to Japanese Unexamined Patent Publication No. 2000-132864, when GeSbTe is used for the recording layer and an NZ interface layer is provided, the interface layer may suppress deterioration of the recording layer and reduce increase in jitter during storage. There is. However, the disk linear velocity at the time of recording shown is 8.3 m / s, and there is a problem in recording at a higher linear velocity. Also, the jitter at the first recording is 13
%, Which is not a sufficiently low value.
【0004】特開2000−313170号公報によれ
ば、記録層にSbTeGe+M(In及び/又はGa)
を用いると、使用可能な記録線速範囲が大きく記録マー
クが長期間安定に存在するとしている。しかしながら、
示されている線速度は1.2〜8.1m/sであり、十
分に高線速記録に対応しているとは言えない。また、保
存寿命試験のデータは示されていない。特開平6−33
3275号公報によれば、光学的情報記録媒体の記録層
(GeSbTe)又は誘電体層をスパッタリングによっ
て形成する際に、KrとXeのうちの少なくとも一種類
のガスを放電ガスとして使用すると、繰り返しオーバー
ライト動作によるサイクル劣化現象が抑制され、媒体の
長寿命化、及び高信頼性が達成されるとしている。しか
しながら、現状では低コストの生産が必須課題となって
おり、Kr、Xeは高価であるため問題がある。また、
記録線速は10m/sであり十分に高線速記録に対応し
ていいるとは言えない。更に保存寿命試験のデータは示
されていない。According to Japanese Patent Laid-Open No. 2000-313170, SbTeGe + M (In and / or Ga) is formed in the recording layer.
Is used, the usable recording linear velocity range is wide and the recording marks are stable for a long period of time. However,
The linear velocity shown is 1.2 to 8.1 m / s, which cannot be said to be sufficiently compatible with high linear velocity recording. Moreover, the data of the shelf life test are not shown. JP-A-6-33
According to Japanese Patent No. 3275, when a recording layer (GeSbTe) or a dielectric layer of an optical information recording medium is formed by sputtering, if at least one kind of gas of Kr and Xe is used as a discharge gas, it is repeatedly overexposed. It is said that the cycle deterioration phenomenon due to the write operation is suppressed, the longevity of the medium and the high reliability are achieved. However, at present, low-cost production is an essential issue, and there is a problem because Kr and Xe are expensive. Also,
Since the recording linear velocity is 10 m / s, it cannot be said that the recording linear velocity is sufficiently high. Furthermore, data for shelf life tests are not shown.
【0005】[0005]
【発明が解決しようとする課題】現在、DVD−ROM
と同等以上の高密度記録が可能であり、DVD−ROM
の再生線速の2〜5倍に当る7〜17.5m/sの高線
速記録に適した相変化型光記録媒体が求められている。
高線速記録を達成するには、光スポットが記録媒体上の
1点を通過する間に記録材料を結晶化する必要があり、
速い結晶化速度が要求される。また、室温においては、
10年以上安定に非晶質マークが存在する必要がある。
しかしながら、これまでに開示された組成の記録層を用
いた相変化型光記録媒体に記録を行った場合、結晶化速
度が適切で高線速記録においても良好な記録マークを形
成できる組成の記録層を用いると保存信頼性に問題があ
り、保存信頼性が良好な組成の記録層を用いると、高線
速で記録した場合に初回記録時のジッターが13%を超
え、また、繰り返し記録時のジッターも低い値を得るこ
とはできなかった。そこで、本発明は、高線速記録にお
いても良好な記録・消去特性を示し、保存寿命が長い優
れた相変化型光記録媒体の提供を目的とする。DISCLOSURE OF THE INVENTION Presently, DVD-ROM
High-density recording equivalent to or higher than that of DVD-ROM
There is a demand for a phase change type optical recording medium suitable for high linear velocity recording of 7 to 17.5 m / s, which is 2 to 5 times higher than the reproducing linear velocity.
To achieve high linear velocity recording, it is necessary to crystallize the recording material while the light spot passes through one point on the recording medium,
A high crystallization rate is required. Also, at room temperature,
Amorphous marks must exist stably for 10 years or more.
However, when recording is performed on a phase-change optical recording medium using a recording layer having the composition disclosed so far, a recording with a composition that has an appropriate crystallization rate and can form a good recording mark even at high linear velocity recording When a layer is used, there is a problem in storage reliability, and when a recording layer having a composition with good storage reliability is used, the jitter at the time of initial recording exceeds 13% when recording at a high linear velocity, and when recording repeatedly. I couldn't get a low jitter value. Therefore, an object of the present invention is to provide an excellent phase change type optical recording medium which exhibits excellent recording / erasing characteristics even in high linear velocity recording and has a long storage life.
【0006】[0006]
【課題を解決するための手段】Sb−Sb2Te3擬二
元系合金はSb70Te30近傍に共晶点を持ち、この
近傍のSb−Teは繰り返し記録を行っても記録膜に相
分離が起き難く、繰り返し記録特性に優れている。本発
明者らはSb−Sb2Te3擬二元系共晶組成をベース
として様々な元素を添加することにより、優れた相変化
型光記録媒体の記録材料を得るために検討を行った。そ
の結果、上記課題は、次の1)〜6)の発明(以下、本
発明1〜6という)によって解決されることを見出し
た。
1) レーザー光の照射により、結晶状態及び非晶質状
態の可逆的な相変化を生じて情報が記録される記録層を
有し、該記録層の主成分が、次の組成式(1)で表され
ることを特徴とする相変化型光記録媒体。
GeαGaβCuγSbδTeε………(1)
ここで、式(1)中の、α、β、γ、δ、εは各元素の
組成比(at%)を表し、以下の範囲にある。
0≦α≦5
1≦β≦5
1≦γ≦10
65≦δ≦81
13≦ε≦24
α+β+γ+δ+ε=100
2) 記録層の、昇温速度10℃/分での結晶化温度が
170〜220℃であることを特徴とする1)記載の相
変化型光記録媒体。
3) 記録層の融点が500〜680℃であることを特
徴とする1)又は2)記載の相変化型光記録媒体。
4) 記録層の厚さが10〜25nmであることを特徴
とする1)〜3)の何れかに記載の相変化型光記録媒
体。
5) 少なくとも基板、下部保護層、記録層、上部保護
層、反射層をこの順に設けた1)〜4)の何れかに記載
の相変化型光記録媒体。
6) 記録層を構成する材料からなる合金ターゲットを
用い、Arガスを用いたスパッタリング法により成膜さ
れた記録層を有することを特徴とする1)〜5)の何れ
かに記載の相変化型光記録媒体。The Sb-Sb 2 Te 3 pseudo-binary alloy has a eutectic point near Sb 70 Te 30 , and Sb-Te in the vicinity has a phase difference in the recording film even if repeated recording is performed. Separation hardly occurs, and excellent repetitive recording characteristics. The present inventors conducted studies to obtain an excellent recording material for a phase-change optical recording medium by adding various elements based on the Sb-Sb 2 Te 3 pseudo-binary eutectic composition. As a result, it has been found that the above problems can be solved by the following inventions 1) to 6) (hereinafter referred to as the inventions 1 to 6). 1) It has a recording layer in which information is recorded by reversible phase change between a crystalline state and an amorphous state upon irradiation with laser light, and the main component of the recording layer is the following composition formula (1) A phase change type optical recording medium characterized by: GeαGaβCuγSbδTeε (1) Here, α, β, γ, δ, and ε in the formula (1) represent the composition ratio (at%) of each element and are in the following ranges. 0 ≦ α ≦ 5 1 ≦ β ≦ 5 1 ≦ γ ≦ 10 65 ≦ δ ≦ 81 13 ≦ ε ≦ 24 α + β + γ + δ + ε = 100 2) The crystallization temperature of the recording layer at a temperature rising rate of 10 ° C./min is 170 to 220. The phase change type optical recording medium as described in 1) above, which is at a temperature of ° C. 3) The phase change type optical recording medium according to 1) or 2), wherein the recording layer has a melting point of 500 to 680 ° C. 4) The phase-change optical recording medium according to any one of 1) to 3), wherein the recording layer has a thickness of 10 to 25 nm. 5) The phase change type optical recording medium according to any one of 1) to 4), in which at least a substrate, a lower protective layer, a recording layer, an upper protective layer, and a reflective layer are provided in this order. 6) The phase-change type according to any one of 1) to 5), which has a recording layer formed by a sputtering method using Ar gas using an alloy target made of a material forming the recording layer. Optical recording medium.
【0007】以下、上記本発明について詳しく説明す
る。本発明1において、記録層は、前記組成式(1)で
表される記録材料を主成分とする必要がある。ここで、
主成分とは、該記録材料を50%以上含有することを意
味するが、100%に近い方が好ましい。前記組成式
(1)を構成する各元素の機能について説明すると、G
eは保存信頼性を改善する効果を有するが、α>5の場
合には結晶化速度が遅くなり、良好な高線速記録が困難
となる。Cuも保存信頼性を改善する効果を有するが、
γ<1の場合には効果が現れず、γ>10の場合には結
晶化速度が遅くなり、高線速記録が達成できない。この
ように、GeとCuは共に保存信頼性を改善する効果を
有するが、Cuは結晶化速度を遅くするマイナス効果も
有する。Geも結晶化速度を遅くするマイナス効果を有
するが、Cuに比べてマイナス効果が小さい。そこで、
CuとGeを同時に添加して調整することにより保存信
頼性と高線速記録を両立した記録材料を提供できる。The present invention will be described in detail below. In the first aspect of the invention, the recording layer needs to contain the recording material represented by the composition formula (1) as a main component. here,
The main component means containing 50% or more of the recording material, but it is preferably close to 100%. Explaining the function of each element constituting the composition formula (1), G
Although e has the effect of improving the storage reliability, when α> 5, the crystallization rate becomes slow, and good high linear velocity recording becomes difficult. Cu also has the effect of improving storage reliability,
In the case of γ <1, no effect appears, and in the case of γ> 10, the crystallization speed becomes slow and high linear velocity recording cannot be achieved. Thus, both Ge and Cu have the effect of improving the storage reliability, but Cu also has the negative effect of slowing the crystallization speed. Ge also has a negative effect of slowing the crystallization rate, but the negative effect is smaller than that of Cu. Therefore,
By adding Cu and Ge at the same time for adjustment, it is possible to provide a recording material having both storage reliability and high linear velocity recording.
【0008】Gaは結晶化速度を上げる効果を有する
が、β<1の場合には効果が現れず、β>5の場合には
相分離が起り易くなり、繰り返し記録に問題がある。S
bは合金の主成分であって、δ<65では結晶化速度が
遅いため高線速記録が達成できず、δ>81では相分離
が起り易い。Teは、ε<13では相分離が起り易く、
ε>24では高線速記録が達成できない。以上のような
諸条件を満足する記録材料を用いた本発明1によれば、
高線速下での記録においても、良好な消去及び記録特性
を備え、繰り返し記録を行っても組成偏析が起き難く、
保存信頼性も満足する相変化型光記録媒体を提供でき
る。Ga has the effect of increasing the crystallization rate, but when β <1, it does not appear, and when β> 5, phase separation easily occurs, which causes a problem in repeated recording. S
b is the main component of the alloy. When δ <65, the crystallization speed is slow, so high linear velocity recording cannot be achieved, and when δ> 81, phase separation easily occurs. Te has a tendency of phase separation when ε <13,
If ε> 24, high linear velocity recording cannot be achieved. According to the present invention 1 using the recording material satisfying the various conditions as described above,
Even in recording under high linear velocity, it has good erasing and recording characteristics, and composition segregation does not easily occur even after repeated recording,
It is possible to provide a phase-change optical recording medium that also satisfies storage reliability.
【0009】本発明2のように、記録層の昇温速度10
℃/分での結晶化温度を170〜220℃にすると、初
期結晶化を容易に均一に行うことができ保存信頼性が良
好な相変化型光記録媒体を提供できる。結晶化温度が1
70℃より低いと保存信頼性に問題を生じることがあ
り、220℃より高いと初期結晶化が困難になる。本発
明3のように、記録層の融点を500〜680℃にする
と、適切な感度と保存信頼性を備えた相変化型光記録媒
体を提供できる。結晶化速度が速い場合、非晶質にする
ためには更に速い冷却速度が必要となるので感度不足に
なり易い。融点が500℃より低いと保存特性及び再生
光安定性が劣化し、融点が680℃より高いと感度が悪
化する。As in the present invention 2, the temperature rising rate of the recording layer is 10
When the crystallization temperature in ° C / min is 170 to 220 ° C, the initial crystallization can be easily and uniformly performed, and the phase change type optical recording medium having good storage reliability can be provided. Crystallization temperature is 1
If it is lower than 70 ° C, storage reliability may be deteriorated, and if it is higher than 220 ° C, initial crystallization becomes difficult. When the melting point of the recording layer is set to 500 to 680 ° C. as in the present invention 3, a phase change type optical recording medium having appropriate sensitivity and storage reliability can be provided. When the crystallization rate is high, a higher cooling rate is required to make the material amorphous, and thus the sensitivity tends to be insufficient. If the melting point is lower than 500 ° C, the storage characteristics and reproduction light stability will deteriorate, and if the melting point is higher than 680 ° C, the sensitivity will deteriorate.
【0010】本発明4のように、記録層の厚さを10〜
25nmにすると安定に記録を行うことができ、感度が
良好な相変化型光記録媒体を提供できる。10nmより
薄いと光吸収能が低下し記録膜の温度が十分に上がらな
いため記録を行うことができない場合があり、25nm
より厚いと透過光が少なくなるため干渉効果を期待し難
くなるので好ましくない。本発明5のように、少なくと
も基板、下部保護層、記録層、上部保護層、反射層をこ
の順に設けることにより、光の干渉や反射効果を利用し
て記録及び消去を行うことが可能な相変化型光記録媒体
を提供できる。保護層は、耐熱保護層としての機能と光
干渉層としての機能を備え、反射層は光を反射する機能
と熱を放出する機能を備えている。本発明6のように、
記録層を構成する材料からなる合金ターゲットを用い、
Arガスを用いたスパッタリング法により記録層を成膜
することにより、コストが低く一定品質の相変化型光記
録媒体を容易に量産できる。As in the fourth aspect of the present invention, the thickness of the recording layer is 10 to 10.
When the thickness is 25 nm, stable recording can be performed, and a phase change type optical recording medium having good sensitivity can be provided. If the thickness is less than 10 nm, the light absorbing ability is lowered and the temperature of the recording film does not rise sufficiently, so that recording may not be performed in some cases.
If the thickness is thicker, the amount of transmitted light decreases, and it is difficult to expect the interference effect, which is not preferable. As in the present invention 5, by providing at least a substrate, a lower protective layer, a recording layer, an upper protective layer, and a reflective layer in this order, it is possible to perform recording and erasing by utilizing light interference and reflection effect. A changeable optical recording medium can be provided. The protective layer has a function as a heat-resistant protective layer and a function as a light interference layer, and the reflective layer has a function of reflecting light and a function of releasing heat. As in the present invention 6,
Using an alloy target made of the material that constitutes the recording layer,
By forming the recording layer by a sputtering method using Ar gas, it is possible to easily mass-produce a phase-change optical recording medium of low cost and constant quality.
【0011】次に本発明の相変化型光記録媒体の各層の
構成及び製法について説明する。本発明の相変化型光記
録媒体は、通常、スパッタリング法により基板上に下部
保護層、記録層、上部保護層、界面層、反射放熱層を順
に設け、更にオーバーコート層を形成した後、その上に
別の基板を貼り合わせて作成する。上記基板としては、
一般に、表面にトラッキング用の案内溝を有し、直径1
2cm、厚さ0.6mmのディスク状で、加工性、光学
特性に優れたポリカーボネート基板が用いられる。下部
保護層としては、基板及び記録層との密着性が良いこ
と、耐熱性が高いことなどが要求される。また、記録層
の効果的な光吸収を可能にする光干渉層としての役割も
担うことから、高線速での繰り返し記録に適した光学特
性を有することが望ましい。好ましい材料としては(Z
nS)80(SiO2)20が挙げられる。膜厚は20
〜300nmが適しており、20nmより薄いと耐熱保
護層としての機能が失われ、300nmより厚いと界面
剥離が生じ易くなる。Next, the constitution and manufacturing method of each layer of the phase change type optical recording medium of the present invention will be explained. The phase change type optical recording medium of the present invention is usually formed by sequentially forming a lower protective layer, a recording layer, an upper protective layer, an interface layer and a reflective heat dissipation layer on a substrate by a sputtering method, and further forming an overcoat layer, Created by pasting another substrate on top. As the substrate,
Generally, there is a guide groove for tracking on the surface, and the diameter is 1
A polycarbonate substrate having a disk shape of 2 cm and a thickness of 0.6 mm and having excellent workability and optical characteristics is used. The lower protective layer is required to have good adhesiveness to the substrate and the recording layer and high heat resistance. Further, since it also plays a role as a light interference layer that enables effective light absorption of the recording layer, it is desirable to have optical characteristics suitable for repeated recording at high linear velocity. The preferred material is (Z
nS) 80 (SiO 2 ) 20 may be mentioned. Film thickness is 20
A thickness of up to 300 nm is suitable. If it is thinner than 20 nm, the function as a heat-resistant protective layer is lost, and if it is thicker than 300 nm, interfacial peeling easily occurs.
【0012】記録層は、上部保護層と下部保護層の間に
設ける。前述のように、Sb−Sb2Te3擬二元系合
金はSb70Te30近傍に共晶点を持ち、この近傍の
組成のSb−Teは繰り返し記録を行っても偏析が生じ
難く、繰り返し記録特性に優れているが、非晶質マーク
を記録した後、80℃の恒温槽に100時間導入したと
ころ、マークは消滅しており保存信頼性に問題があるこ
とが分った。しかし、適切な原子比のGeGaCuSb
Teを主成分とする記録膜を用いることにより、初期結
晶化済みの相変化型光記録媒体に対し、線速7〜17.
5m/sでレーザー光を照射した場合に非晶質マークを
可逆的に記録することが可能となり、10%以下のジッ
ター(ここでは、data to clock jit
ter σを検出窓幅Twで規格化した値をジッターと
呼ぶ)を得ることができた。また、非晶質マークを記録
した後、80℃の恒温槽に導入しても非晶質マークの劣
化は少なく、優れた保存信頼性を示した。The recording layer is provided between the upper protective layer and the lower protective layer. As mentioned above, Sb-Sb 2 Te 3 pseudo-binary alloy has a eutectic point to the Sb 70 Te 30 near, Sb-Te composition of the vicinity hardly occurs segregation even if the repetitive recording, repeated Although it has excellent recording characteristics, when an amorphous mark was recorded and then introduced into a constant temperature bath at 80 ° C. for 100 hours, it was found that the mark disappeared and there was a problem in storage reliability. However, the appropriate atomic ratio of GeGaCuSb
By using a recording film containing Te as a main component, a linear velocity of 7 to 17.
Amorphous marks can be reversibly recorded when a laser beam is irradiated at 5 m / s, and a jitter of 10% or less (here, data to clock jitter) is recorded.
The value obtained by normalizing ter σ with the detection window width Tw is called jitter. Further, even after the amorphous mark was recorded, even if the amorphous mark was introduced into a constant temperature bath at 80 ° C., the amorphous mark did not deteriorate much, showing excellent storage reliability.
【0013】上部保護層としては、記録層及び界面層と
の密着性が良いこと、耐熱性が高いことなどが要求され
る。また、記録層の効果的な光吸収を可能にする光干渉
層としての役割も担うことから、高線速での繰り返し記
録に適した光学特性を有することが望ましい。好ましい
材料としては(ZnS)80(SiO2)20が挙げら
れる。膜厚は10〜50nmが適しており、10nmよ
り薄いと耐熱保護層としての機能が失われ、50nmよ
り厚いと記録感度が低下する。上部保護層と反射層の間
には界面層を設けることが望ましい。この層は上部保護
層に含まれているSと反射層に含まれているAgの反応
によるAg2Sの生成を防ぐ機能を備えている。好まし
い材料としてはSiCが挙げられる。膜厚は2〜10n
mが適しており、2nmより薄いとAg2Sが生成され
易く、10nmより厚いと記録特性が悪くなる。反射層
にはAgを主成分とした材料を用いる。Agは熱伝導率
が高く高線速記録に適している。膜厚は50〜300n
mが適しており、50nmより薄いと繰り返し記録を行
った場合に劣化が問題となり、300nmより厚いと放
熱効率が良すぎて感度が悪くなる。The upper protective layer is required to have good adhesiveness to the recording layer and the interface layer and high heat resistance. Further, since it also plays a role as a light interference layer that enables effective light absorption of the recording layer, it is desirable to have optical characteristics suitable for repeated recording at high linear velocity. A preferable material is (ZnS) 80 (SiO 2 ) 20 . A film thickness of 10 to 50 nm is suitable. If it is thinner than 10 nm, the function as a heat resistant protective layer is lost, and if it is thicker than 50 nm, the recording sensitivity is lowered. It is desirable to provide an interface layer between the upper protective layer and the reflective layer. This layer has a function of preventing generation of Ag 2 S due to a reaction between S contained in the upper protective layer and Ag contained in the reflective layer. SiC is mentioned as a preferable material. Film thickness is 2-10n
m is suitable, and if it is thinner than 2 nm, Ag 2 S is likely to be generated, and if it is thicker than 10 nm, the recording characteristics deteriorate. A material containing Ag as a main component is used for the reflective layer. Ag has a high thermal conductivity and is suitable for high linear velocity recording. Film thickness is 50-300n
If m is less than 50 nm and the thickness is less than 50 nm, deterioration becomes a problem when recording is repeated, and if more than 300 nm, the heat dissipation efficiency is too good and the sensitivity becomes poor.
【0014】[0014]
【実施例】以下、実施例及び比較例により本発明を具体
的に説明するが、本発明はこれらの実施例により限定さ
れるものではない。EXAMPLES The present invention will be specifically described below with reference to Examples and Comparative Examples, but the present invention is not limited to these Examples.
【0015】実施例1〜7、比較例1〜4
実施例及び比較例の各ディスクを次のようにして作成し
た。トラックピッチ0.74μm、直径12cm、厚さ
0.6mmのポリカーボネート基板上に、スパッタリン
グにより下部保護層、記録層、上部保護層、反射層を順
に成膜した。下部保護層は(ZnS)80(SiO2)
20をターゲットに用い、膜厚65nmとした。記録層
は、下記表1に示す記録材料組成に対応する組成比の合
金ターゲットを用い、膜厚18nmとした。上部保護層
は(ZnS)80(SiO2)20をターゲットに用
い、膜厚10nmとした。反射層はAgターゲットを用
い、膜厚140nmとした。更に、反射層上にスピナー
によってアクリル系紫外線硬化樹脂を厚さ5〜10μm
塗布した後、紫外線硬化させ、有機保護膜を形成した。
更にその上に、直径12cm、厚さ0.6μmのポリカ
ーボネート基板を接着シートを用いて貼り合わせた。以
上のようにして作成した各ディスクを、口径1μm×1
00μmのレーザーを用いて、出力680mW、送り3
6μm、線速3m/sで初期結晶化した。記録再生の評
価は、波長660nm、NA0.65のピックアップヘ
ッドを用い、記録密度0.267μm/bit、EFM
+変調方式にて行った。記録パワーは13〜18mW、
バイアスパワーは0.2mW、消去パワーは6〜10m
Wで、記録ストラテジは各ディスクに合わせて最適化し
て行った。再生は全て線速3.5m/s、パワー0.7
mWで行った。Examples 1 to 7 and Comparative Examples 1 to 4 Discs of Examples and Comparative Examples were prepared as follows. A lower protective layer, a recording layer, an upper protective layer, and a reflective layer were sequentially formed by sputtering on a polycarbonate substrate having a track pitch of 0.74 μm, a diameter of 12 cm, and a thickness of 0.6 mm. The lower protective layer is (ZnS) 80 (SiO 2 ).
20 was used as a target and the film thickness was set to 65 nm. For the recording layer, an alloy target having a composition ratio corresponding to the recording material composition shown in Table 1 below was used and the film thickness was set to 18 nm. For the upper protective layer, (ZnS) 80 (SiO 2 ) 20 was used as a target, and the film thickness was set to 10 nm. The reflective layer uses an Ag target and has a film thickness of 140 nm. Further, an acrylic UV curable resin having a thickness of 5 to 10 μm is formed on the reflective layer by a spinner.
After coating, UV curing was performed to form an organic protective film.
Further thereon, a polycarbonate substrate having a diameter of 12 cm and a thickness of 0.6 μm was attached using an adhesive sheet. Each of the discs created as described above has a diameter of 1 μm × 1
Output 680 mW, feed 3 using a laser of 00 μm
Initial crystallization was performed at 6 μm and a linear velocity of 3 m / s. Recording / reproduction was evaluated using a pickup head with a wavelength of 660 nm and an NA of 0.65, recording density of 0.267 μm / bit, and EFM.
+ Modulation method was used. Recording power is 13-18mW,
Bias power is 0.2mW, erase power is 6-10m
In W, the recording strategy was optimized for each disc. All reproduction is linear speed 3.5m / s, power 0.7
It was performed in mW.
【0016】[0016]
【表1】 [Table 1]
【0017】[0017]
【表2】 [Table 2]
【0018】上記実施例1〜7及び比較例1〜4の各デ
ィスクについて、使用した記録層の組成を上記表1に、
記録可能最高線速(m/s)、繰り返し記録後のジッタ
ーの上昇(%)、恒温槽導入後のジッターの上昇
(%)、結晶化温度(℃)、融点(℃)、初期結晶化を
上記表2に示した。記録可能最高線速は、記録パワー、
消去パワー、記録ストラテジを各実施例及び比較例毎に
最適化した場合の、初回記録時のジッターが10%以下
で記録可能な線速度である。繰り返し記録後のジッター
の上昇は、初回記録時を基準にした5000回繰り返し
記録後のジッターの増加分を示す。恒温槽導入後のジッ
ターの上昇は、記録マークを形成した後、80℃の恒温
槽に500時間導入し、導入前を基準にした導入後のジ
ッターの増加分を示す。結晶化温度は、示差走査熱量測
定器により測定した、昇温速度を10℃/分としたとき
の結晶化温度である。融点は、示差熱熱重量同時測定装
置により測定したものである。初期結晶化は、初期結晶
化後の反射率が面内で均一になっている場合を「○」と
し、反射率に分布がある場合を「×」とした。The compositions of the recording layers used for the disks of Examples 1 to 7 and Comparative Examples 1 to 4 are shown in Table 1 above.
Maximum recordable linear velocity (m / s), increase in jitter (%) after repeated recording, increase in jitter (%) after introducing constant temperature bath, crystallization temperature (° C), melting point (° C), initial crystallization The results are shown in Table 2 above. The maximum recordable linear velocity is the recording power,
When the erasing power and the recording strategy are optimized for each of the examples and comparative examples, the linear velocity at which recording is possible with the jitter at the initial recording of 10% or less is possible. The increase in jitter after repetitive recording indicates an increase in jitter after repetitive recording 5000 times based on the initial recording. The increase in jitter after the introduction of the thermostat indicates the amount of increase in the jitter after the introduction after the introduction of the recording mark for 500 hours in the thermostat at 80 ° C. after the introduction. The crystallization temperature is a crystallization temperature measured by a differential scanning calorimeter when the temperature rising rate is 10 ° C / min. The melting point is measured by a differential thermogravimetric simultaneous measurement device. The initial crystallization was evaluated as “◯” when the reflectance after the initial crystallization was uniform in the plane, and as “x” when the reflectance had a distribution.
【0019】実施例1〜7では、記録可能最高線速が1
7〜18m/s、結晶化温度が170〜220℃、融点
550〜680℃になるように記録層組成を設計し、デ
ィスクを作成した。その結果、表2には示していない
が、高線速において初回記録時のジッターを10%以下
に抑えることができた。また、表2に示すように、繰り
返し記録後のジッターの上昇及び恒温槽導入後のジッタ
ーの上昇も低く、良好な保存特性を示した。更に初期結
晶化後の反射率も面内で均一であった。In Examples 1 to 7, the maximum recordable linear velocity is 1
The recording layer composition was designed so that the crystallization temperature was 7 to 18 m / s, the crystallization temperature was 170 to 220 ° C., and the melting point was 550 to 680 ° C., and a disk was prepared. As a result, although not shown in Table 2, the jitter at the time of initial recording could be suppressed to 10% or less at a high linear velocity. Further, as shown in Table 2, the increase in jitter after repeated recording and the increase in jitter after introduction in a constant temperature bath were low, and good storage characteristics were exhibited. Further, the reflectance after the initial crystallization was also uniform in the plane.
【0020】比較例1では、記録膜の組成を本発明の範
囲外であるGe10at%、Cu0at%として評価を
行ったところ、記録可能最高線速が15m/sと遅かっ
た。これは、Geは保存信頼性を改善する効果があるが
同時に結晶化速度を遅くするマイナス効果もあるため、
高線速での記録が行なえなかったと考えられる。比較例
2では、記録膜の組成を本発明の範囲外であるCu11
%として評価したところ、記録可能最高線速が14m/
sと遅かった。これは、Cuは保存信頼性を改善する効
果を有するが、同時に結晶化速度を遅くするマイナス効
果も有するため、高線速での記録が行なえなかったもの
と考えられる。また、Cuを添加することにより融点が
上がるマイナス効果を生じ、融点が700℃に上昇して
感度が悪くなったため、繰り返し記録後のジッターの上
昇が大きかったと考えられる。In Comparative Example 1, when the composition of the recording film was evaluated as Ge10 at% and Cu0 at% which are out of the range of the present invention, the maximum recordable linear velocity was as slow as 15 m / s. This is because Ge has the effect of improving the storage reliability, but at the same time has the negative effect of decreasing the crystallization speed.
It is probable that recording at high linear velocity was not possible. In Comparative Example 2, the composition of the recording film is outside the range of the present invention Cu11.
%, The maximum recordable linear velocity was 14 m /
It was slow as s. It is considered that although Cu has an effect of improving the storage reliability, it also has a negative effect of slowing down the crystallization speed, and therefore recording at a high linear velocity could not be performed. Further, it is considered that the addition of Cu had a negative effect of increasing the melting point, and the melting point was raised to 700 ° C. to deteriorate the sensitivity, so that the increase in jitter after repeated recording was large.
【0021】比較例3では、記録膜の組成を本発明の範
囲外であるGa7at%として評価したところ、繰り返
し記録後のジッターの上昇が8.2%と大きかった。こ
れは、Gaは結晶化速度を上げる効果を有すると同時に
相分離を起こし易くするマイナス効果も有するため繰り
返し記録により劣化が進んだと考えられる。また、Ga
は結晶化温度を上げるマイナス効果も有するため、結晶
化温度が228℃と高くなり初期結晶化を均一に行なう
ことが出来なかったと考えられる。比較例4では、記録
膜の組成を本発明の範囲外であるTe10at%として
評価したところ、繰り返し記録後のジッターの上昇が
7.5%と大きかった。これは、Teが少ないと相分離
が起こり易くなるため、繰り返し記録により劣化が進ん
だと考えられる。In Comparative Example 3, when the composition of the recording film was evaluated as Ga7 at% which is outside the range of the present invention, the increase in jitter after repetitive recording was as large as 8.2%. It is considered that Ga has an effect of increasing the crystallization rate and at the same time has a negative effect of facilitating phase separation, so that deterioration is promoted by repeated recording. Also, Ga
Since it also has a negative effect of increasing the crystallization temperature, it is considered that the crystallization temperature was as high as 228 ° C. and the initial crystallization could not be performed uniformly. In Comparative Example 4, when the composition of the recording film was evaluated as Te10 at% which is out of the range of the present invention, the increase in jitter after repeated recording was as large as 7.5%. It is considered that this is because, when Te is small, phase separation easily occurs, and therefore deterioration is advanced by repeated recording.
【0022】実施例8、9
記録層の膜厚を13nm(実施例8)、22nm(実施
例9)に変えた点以外は実施例1と同様にしてディスク
を作成し評価を行った。下記表3に記録層膜厚(n
m)、線速17m/sで記録したときの初回記録時のジ
ッター(%)、初回記録時を基準にした5000回繰り
返し記録後のジッターの上昇(%)を示す。下記表3か
ら分るように、高線速記録においても初回記録時のジッ
ターが10%以下であり、繰り返し記録後も劣化が少な
く良好な特性が得られた。Examples 8 and 9 Discs were prepared and evaluated in the same manner as in Example 1 except that the thickness of the recording layer was changed to 13 nm (Example 8) and 22 nm (Example 9). The recording layer thickness (n
m), the jitter (%) at the time of the first recording when recording at a linear velocity of 17 m / s, and the increase (%) of the jitter after repeatedly recording 5000 times based on the time of the first recording. As can be seen from Table 3 below, even at high linear velocity recording, the jitter at the time of initial recording was 10% or less, and there was little deterioration even after repeated recording, and good characteristics were obtained.
【0023】[0023]
【表3】 [Table 3]
【0024】比較例5、6
記録層の膜厚を8nm(比較例5)、28nm(比較例
6)に変えた点以外は、実施例1と同様にしてディスク
を作成し評価を行った。上記表3に記録層膜厚(n
m)、線速17m/sで記録したときの初回記録時のジ
ッター(%)、初回記録時を基準にした5000回繰り
返し記録後のジッターの上昇(%)を示す。表3から分
るように、比較例5、6は何れも、記録パワー、消去パ
ワー、記録ストラテジを最適化しても初回記録時のジッ
ターが12%を超え、繰り返し記録後の劣化も大きかっ
た。これは、比較例5では、記録膜が薄いため光吸収能
が低下し、記録膜の温度が十分に上がらず記録を行うこ
とが出来なかったと考えられ、比較例6では、記録膜が
厚いため透過光が少なくなって干渉効果が十分に得られ
ず、記録が行えなかったと考えられる。Comparative Examples 5 and 6 Discs were prepared and evaluated in the same manner as in Example 1 except that the thickness of the recording layer was changed to 8 nm (Comparative Example 5) and 28 nm (Comparative Example 6). The recording layer thickness (n
m), the jitter (%) at the time of the first recording when recording at a linear velocity of 17 m / s, and the increase (%) of the jitter after repeatedly recording 5000 times based on the time of the first recording. As can be seen from Table 3, in Comparative Examples 5 and 6, even when the recording power, the erasing power and the recording strategy were optimized, the jitter at the initial recording exceeded 12% and the deterioration after the repeated recording was large. It is considered that in Comparative Example 5, since the recording film was thin, the light absorption ability was lowered, and the temperature of the recording film did not rise sufficiently to perform recording, whereas in Comparative Example 6, the recording film was thick. It is considered that recording could not be performed because the transmitted light was reduced and the interference effect was not sufficiently obtained.
【0025】[0025]
【発明の効果】本発明1によれば、高線速記録と保存信
頼性の両立した相変化型光記録媒体を提供できる。本発
明2によれば、更に初期結晶化を容易に均一に行うこと
ができる相変化型光記録媒体を提供できる。本発明3に
よれば、更に記録線速7〜17.5m/sに対応した適
度な感度を備えた相変化型光記録媒体を提供できる。本
発明4によれば、更に光吸収及び干渉効果を利用して記
録・消去を行うことが可能な記録膜を備えた相変化型光
記録媒体を提供できる。本発明5によれば、更に光吸収
及び干渉効果を利用して記録・消去を行うことが可能な
層構成を持つ相変化型光記録媒体を提供できる。本発明
6によれば、量産に適した相変化型光記録媒体を安価に
一定品質で供給することができる。According to the first aspect of the present invention, it is possible to provide a phase change type optical recording medium which achieves both high linear velocity recording and storage reliability. According to the second aspect of the present invention, it is possible to provide a phase change type optical recording medium in which initial crystallization can be easily and uniformly performed. According to the third aspect of the present invention, it is possible to provide a phase change type optical recording medium having appropriate sensitivity corresponding to a recording linear velocity of 7 to 17.5 m / s. According to the present invention 4, it is possible to provide a phase change type optical recording medium provided with a recording film capable of recording / erasing by further utilizing the light absorption and interference effects. According to the present invention 5, it is possible to provide a phase change type optical recording medium having a layer structure capable of recording / erasing by further utilizing the light absorption and interference effects. According to the present invention 6, it is possible to inexpensively supply a phase change type optical recording medium suitable for mass production with a constant quality.
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【手続補正書】[Procedure amendment]
【提出日】平成13年11月30日(2001.11.
30)[Submission date] November 30, 2001 (2001.11.
30)
【手続補正1】[Procedure Amendment 1]
【補正対象書類名】明細書[Document name to be amended] Statement
【補正対象項目名】0015[Name of item to be corrected] 0015
【補正方法】変更[Correction method] Change
【補正内容】[Correction content]
【0015】実施例1〜7、比較例1〜4
実施例及び比較例の各ディスクを次のようにして作成し
た。トラックピッチ0.74μm、直径12cm、厚さ
0.6mmのポリカーボネート基板上に、スパッタリン
グにより下部保護層、記録層、上部保護層、反射層を順
に成膜した。下部保護層は(ZnS)80(SiO2)
20をターゲットに用い、膜厚65nmとした。記録層
は、下記表1に示す記録材料組成に対応する組成比の合
金ターゲットを用い、膜厚18nmとした。上部保護層
は(ZnS)80(SiO2)20をターゲットに用
い、膜厚10nmとした。反射層はAgターゲットを用
い、膜厚140nmとした。更に、反射層上にスピナー
によってアクリル系紫外線硬化樹脂を厚さ5〜10μm
塗布した後、紫外線硬化させ、有機保護膜を形成した。
更にその上に、直径12cm、厚さ0.6mmのポリカ
ーボネート基板を接着シートを用いて貼り合わせた。以
上のようにして作成した各ディスクを、口径1μm×1
00μmのレーザーを用いて、出力680mW、送り3
6μm、線速3m/sで初期結晶化した。記録再生の評
価は、波長660nm、NA0.65のピックアップヘ
ッドを用い、記録密度0.267μm/bit、EFM
+変調方式にて行った。記録パワーは13〜18mW、
バイアスパワーは0.2mW、消去パワーは6〜10m
Wで、記録ストラテジは各ディスクに合わせて最適化し
て行った。再生は全て線速3.5m/s、パワー0.7
mWで行った。Examples 1 to 7 and Comparative Examples 1 to 4 Discs of Examples and Comparative Examples were prepared as follows. A lower protective layer, a recording layer, an upper protective layer, and a reflective layer were sequentially formed by sputtering on a polycarbonate substrate having a track pitch of 0.74 μm, a diameter of 12 cm, and a thickness of 0.6 mm. The lower protective layer is (ZnS) 80 (SiO 2 ).
20 was used as a target and the film thickness was set to 65 nm. For the recording layer, an alloy target having a composition ratio corresponding to the recording material composition shown in Table 1 below was used and the film thickness was set to 18 nm. For the upper protective layer, (ZnS) 80 (SiO 2 ) 20 was used as a target, and the film thickness was set to 10 nm. The reflective layer uses an Ag target and has a film thickness of 140 nm. Further, an acrylic UV curable resin having a thickness of 5 to 10 μm is formed on the reflective layer by a spinner.
After coating, UV curing was performed to form an organic protective film.
Further thereon, a polycarbonate substrate having a diameter of 12 cm and a thickness of 0.6 mm was attached using an adhesive sheet. Each of the discs created as described above has a diameter of 1 μm × 1
Output 680 mW, feed 3 using a laser of 00 μm
Initial crystallization was performed at 6 μm and a linear velocity of 3 m / s. Recording / reproduction was evaluated using a pickup head with a wavelength of 660 nm and an NA of 0.65, recording density of 0.267 μm / bit, and EFM.
+ Modulation method was used. Recording power is 13-18mW,
Bias power is 0.2mW, erase power is 6-10m
In W, the recording strategy was optimized for each disc. All reproduction is linear speed 3.5m / s, power 0.7
It was performed in mW.
フロントページの続き (72)発明者 針谷 眞人 東京都大田区中馬込1丁目3番6号 株式 会社リコー内 (72)発明者 譲原 肇 東京都大田区中馬込1丁目3番6号 株式 会社リコー内 (72)発明者 鈴木 栄子 東京都大田区中馬込1丁目3番6号 株式 会社リコー内 (72)発明者 三浦 裕司 東京都大田区中馬込1丁目3番6号 株式 会社リコー内 (72)発明者 田代 浩子 東京都大田区中馬込1丁目3番6号 株式 会社リコー内 (72)発明者 安部 美樹子 東京都大田区中馬込1丁目3番6号 株式 会社リコー内 Fターム(参考) 2H111 EA04 EA23 EA32 EA36 FA01 FA12 FA14 FB05 FB09 FB12 FB17 FB21 FB30 GA03 5D029 JA01 JB35 JC11 JC17 JC18Continued front page (72) Inventor Masato Hariya 1-3-3 Nakamagome, Ota-ku, Tokyo Stocks Company Ricoh (72) Inventor Hajime Jyohara 1-3-3 Nakamagome, Ota-ku, Tokyo Stocks Company Ricoh (72) Inventor Eiko Suzuki 1-3-3 Nakamagome, Ota-ku, Tokyo Stocks Company Ricoh (72) Inventor Yuji Miura 1-3-3 Nakamagome, Ota-ku, Tokyo Stocks Company Ricoh (72) Inventor Hiroko Tashiro 1-3-3 Nakamagome, Ota-ku, Tokyo Stocks Company Ricoh (72) Inventor Mikiko Abe 1-3-3 Nakamagome, Ota-ku, Tokyo Stocks Company Ricoh F-term (reference) 2H111 EA04 EA23 EA32 EA36 FA01 FA12 FA14 FB05 FB09 FB12 FB17 FB21 FB30 GA03 5D029 JA01 JB35 JC11 JC17 JC18
Claims (6)
非晶質状態の可逆的な相変化を生じて情報が記録される
記録層を有し、該記録層の主成分が、次の組成式(1)
で表されることを特徴とする相変化型光記録媒体。 GeαGaβCuγSbδTeε………(1) ここで、式(1)中の、α、β、γ、δ、εは各元素の
組成比(at%)を表し、以下の範囲にある。 0≦α≦5 1≦β≦5 1≦γ≦10 65≦δ≦81 13≦ε≦24 α+β+γ+δ+ε=1001. A recording layer in which information is recorded by causing reversible phase change between a crystalline state and an amorphous state by irradiation with laser light, and the main component of the recording layer is the following composition formula: (1)
A phase change type optical recording medium characterized by: GeαGaβCuγSbδTeε (1) Here, α, β, γ, δ, and ε in the formula (1) represent the composition ratio (at%) of each element and are in the following ranges. 0 ≦ α ≦ 5 1 ≦ β ≦ 5 1 ≦ γ ≦ 10 65 ≦ δ ≦ 81 13 ≦ ε ≦ 24 α + β + γ + δ + ε = 100
化温度が170〜220℃であることを特徴とする請求
項1記載の相変化型光記録媒体。2. The phase change optical recording medium according to claim 1, wherein the crystallization temperature of the recording layer at a temperature rising rate of 10 ° C./min is 170 to 220 ° C.
ことを特徴とする請求項1又は2記載の相変化型光記録
媒体。3. The phase change optical recording medium according to claim 1, wherein the melting point of the recording layer is 500 to 680 ° C.
とを特徴とする請求項1〜3の何れかに記載の相変化型
光記録媒体。4. The phase change optical recording medium according to claim 1, wherein the recording layer has a thickness of 10 to 25 nm.
上部保護層、反射層をこの順に設けた請求項1〜4の何
れかに記載の相変化型光記録媒体。5. A substrate, at least a lower protective layer, a recording layer,
The phase change type optical recording medium according to claim 1, wherein an upper protective layer and a reflective layer are provided in this order.
ゲットを用い、Arガスを用いたスパッタリング法によ
り成膜された記録層を有することを特徴とする請求項1
〜5の何れかに記載の相変化型光記録媒体。6. A recording layer formed by a sputtering method using an Ar gas, using an alloy target made of a material forming the recording layer.
6. The phase change type optical recording medium according to any one of 5 to 10.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001358365A JP2003154754A (en) | 2001-11-22 | 2001-11-22 | Optical recording medium |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001358365A JP2003154754A (en) | 2001-11-22 | 2001-11-22 | Optical recording medium |
Publications (1)
Publication Number | Publication Date |
---|---|
JP2003154754A true JP2003154754A (en) | 2003-05-27 |
Family
ID=19169555
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2001358365A Pending JP2003154754A (en) | 2001-11-22 | 2001-11-22 | Optical recording medium |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2003154754A (en) |
-
2001
- 2001-11-22 JP JP2001358365A patent/JP2003154754A/en active Pending
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