JP2003139505A5 - - Google Patents
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- Publication number
- JP2003139505A5 JP2003139505A5 JP2001339436A JP2001339436A JP2003139505A5 JP 2003139505 A5 JP2003139505 A5 JP 2003139505A5 JP 2001339436 A JP2001339436 A JP 2001339436A JP 2001339436 A JP2001339436 A JP 2001339436A JP 2003139505 A5 JP2003139505 A5 JP 2003139505A5
- Authority
- JP
- Japan
- Prior art keywords
- stainless steel
- film thickness
- quartz
- holder
- quartz plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 239000010453 quartz Substances 0.000 description 10
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 10
- 229910001220 stainless steel Inorganic materials 0.000 description 7
- 239000010935 stainless steel Substances 0.000 description 7
- 239000013078 crystal Substances 0.000 description 6
- 239000011347 resin Substances 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- 238000001816 cooling Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 238000012544 monitoring process Methods 0.000 description 2
- 239000012772 electrical insulation material Substances 0.000 description 1
- 238000012806 monitoring device Methods 0.000 description 1
- 230000010355 oscillation Effects 0.000 description 1
- 239000004810 polytetrafluoroethylene Substances 0.000 description 1
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Description
この場合、低熱伝導材料としてステンレス鋼を用い、電気絶縁材料としてPTFE樹脂を用いるのが好適であり、さらに、冷却機構に水冷式ジャケットを用いることにより装置をコンパクトに構成することが可能となる。そして、回転機構に真空用パルスモータを用いることにより、膜厚モニタ装置全体を成膜室内に配置して、水晶振動子の切換えなどの作動を確実に行うことができる。 In this case, it is preferable to use stainless steel as the low thermal conductivity material and to use PTFE resin as the electrical insulation material, and further, by using a water-cooled jacket as the cooling mechanism, the apparatus can be made compact. . Then, by using a vacuum pulse motor as the rotation mechanism, the entire film thickness monitoring device can be disposed in the film forming chamber, and operations such as switching of the quartz oscillator can be reliably performed.
【0013】
【発明の実施の形態】
図2は、本発明の水晶発振式膜厚モニタ用センサヘッド11の正面断面図であり、この膜厚モニタ用センサヘッド11は、円周上に均等に載置された12枚の水晶板121〜1212(12X)を保持するステンレス鋼製の円板状水晶板ホルダ13と、水晶板121〜1212(12X)のそれぞれに導通する羽型電極141〜1412(14X)を保持し、水晶板ホルダ13に一体的に固定されたPTFE樹脂製のリング状電極ホルダ15と、水晶板ホルダ13と電極ホルダ15とから成る回転可能な円板16の回転中心軸17に駆動軸が軸着するように配置した真空用パルスモータ18と、水晶板ホルダ13と電極ホルダ15と真空用パルスモータ18とを冷却機構として被うステンレス鋼製の水冷式ジャケット19と、水晶板ホルダ13を成膜方向から熱遮蔽カバーとして被うステンレス鋼製のマスク20とを備えて構成されている。マスク20には、水晶板121〜1212のうち使用環境に供する水晶板12Xを覗くことができる窓21が設けられ、膜厚を測定すべき成膜材料は、窓21を介して水晶板12Xの表面上に成膜される(図3参照)。そして、マスク20は、ステンレス鋼製で熱遮蔽効果を有するので、この後に開始する成膜工程で発生する輻射熱が膜厚モニタ用センサヘッド11に伝導するのを防止したり、成膜工程中に真空中を飛来してくる物質から膜厚モニタ用センサヘッド11を保護したりする役割がある。
[0013]
BEST MODE FOR CARRYING OUT THE INVENTION
FIG. 2 is a front sectional view of the crystal oscillation type film thickness monitor sensor head 11 according to the present invention. The film thickness monitor sensor head 11 has 12 crystal plates 12 uniformly mounted on the circumference. 1 to 12 12 (12 X) and stainless steel disc-shaped crystal plate holder 13 for holding a vane-type electrode 14 1-14 12 electrically connected to each of the quartz plate 12 1 ~12 12 (12 X) (14 And a ring-shaped electrode holder 15 made of PT FE resin integrally fixed to the quartz plate holder 13, and a central axis of rotation of the rotatable disc 16 comprising the quartz plate holder 13 and the electrode holder 15. A pulse motor for vacuum 18 arranged so that the drive shaft is pivotally mounted on the surface 17, and a water-cooled stainless steel jacket 19 covering the quartz plate holder 13, the electrode holder 15 and the pulse motor 18 for vacuum as a cooling mechanism; Crystal plate holder 13 It comprises and comprises a stainless steel mask 20 which is covered as a heat shielding cover from the film forming direction. The mask 20 is provided with a window 21 capable of looking at the quartz plate 12 X to be provided to the use environment among the quartz plates 12 1 to 12 12 , and the film forming material whose film thickness is to be measured is quartz via the window 21. A film is formed on the surface of the plate 12 X (see FIG. 3). And since the mask 20 is made of stainless steel and has a heat shielding effect, it prevents the radiation heat generated in the film forming process starting thereafter from being conducted to the film thickness monitoring sensor head 11 or during the film forming process. It plays a role of protecting the film thickness monitoring sensor head 11 from substances coming in under vacuum.
【符号の説明】
11 水晶発振式膜厚モニタ用センサヘッド
12X 水晶板(水晶振動子)
13 ステンレス鋼製水晶板ホルダ
14X 羽型電極
15 PTFE樹脂製電極ホルダ
18 真空用パルスモータ
19 ステンレス鋼製水冷式ジャケット
[Description of the code]
11 Crystal oscillator type film thickness monitor sensor head 12 X quartz plate (crystal oscillator)
13 stainless steel quartz plate holder 14 X winged electrode 15 PT FE resin electrode holder 18 pulse motor for vacuum 19 stainless steel water-cooled jacket
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001339436A JP3953301B2 (en) | 2001-11-05 | 2001-11-05 | Sensor head for crystal oscillation type film thickness monitor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001339436A JP3953301B2 (en) | 2001-11-05 | 2001-11-05 | Sensor head for crystal oscillation type film thickness monitor |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2006265189A Division JP3953505B2 (en) | 2006-09-28 | 2006-09-28 | A film thickness monitoring method using a crystal oscillation type film thickness monitoring sensor head. |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2003139505A JP2003139505A (en) | 2003-05-14 |
JP2003139505A5 true JP2003139505A5 (en) | 2005-05-12 |
JP3953301B2 JP3953301B2 (en) | 2007-08-08 |
Family
ID=19153782
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2001339436A Expired - Fee Related JP3953301B2 (en) | 2001-11-05 | 2001-11-05 | Sensor head for crystal oscillation type film thickness monitor |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP3953301B2 (en) |
Families Citing this family (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4737760B2 (en) * | 2006-03-31 | 2011-08-03 | 株式会社昭和真空 | Vacuum deposition equipment |
KR100762701B1 (en) * | 2006-05-11 | 2007-10-01 | 삼성에스디아이 주식회사 | Crystal sensor and organic light emitting device deposition apparatus having the same. |
JP4818073B2 (en) * | 2006-11-10 | 2011-11-16 | 株式会社アルバック | Film thickness measurement method |
JP2009001885A (en) * | 2007-06-25 | 2009-01-08 | Canon Inc | Film thickness detection device and vapor deposition method |
JP5140678B2 (en) * | 2007-09-21 | 2013-02-06 | 株式会社アルバック | Thin film forming equipment, film thickness measuring method, film thickness sensor |
JP2012169168A (en) * | 2011-02-15 | 2012-09-06 | Hitachi High-Technologies Corp | Crystal oscillation-type film thickness monitoring device and evaporation source device and thin film deposition system of el material using the same |
KR101957467B1 (en) * | 2013-04-24 | 2019-03-12 | 주식회사 선익시스템 | Apparatus for measuring thickness of deposition |
JP6078694B2 (en) | 2014-05-26 | 2017-02-08 | 株式会社アルバック | Film forming apparatus, organic film thickness measuring method, and organic film thickness sensor |
CN104131261B (en) * | 2014-07-08 | 2016-09-14 | 东莞市汇成真空科技有限公司 | A kind of vacuum optical coating system of the dynamically Thickness Monitoring in place with workpiece motion s |
WO2016017108A1 (en) * | 2014-07-31 | 2016-02-04 | 株式会社アルバック | Diagnostic method for film thickness sensor, and film thickness monitor |
CN106574365B (en) * | 2014-08-26 | 2019-01-29 | 株式会社爱发科 | Film thickness monitor and film thickness measuring method |
JP6564745B2 (en) * | 2016-09-06 | 2019-08-21 | 株式会社アルバック | Film thickness sensor |
CN107130214A (en) * | 2017-05-11 | 2017-09-05 | 成都西沃克真空科技有限公司 | A kind of evaporator is with rotatable water cooled electrode device |
CN106990209A (en) * | 2017-05-15 | 2017-07-28 | 成都西沃克真空科技有限公司 | A kind of crystal oscillator probe for being used to detect evaporator evaporation amount |
CN106967959A (en) * | 2017-05-15 | 2017-07-21 | 成都西沃克真空科技有限公司 | A kind of crystal oscillator probe control system |
CN110192081B (en) * | 2017-06-28 | 2021-01-08 | 株式会社爱发科 | Sensor head for quartz crystal oscillating film thickness monitor |
CN108728810A (en) * | 2018-08-16 | 2018-11-02 | 广东振华科技股份有限公司 | A kind of vacuum and low temperature magnetron sputtering coater |
-
2001
- 2001-11-05 JP JP2001339436A patent/JP3953301B2/en not_active Expired - Fee Related
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