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JP2003133819A - Dielectric resonator and method of manufacturing the same - Google Patents

Dielectric resonator and method of manufacturing the same

Info

Publication number
JP2003133819A
JP2003133819A JP2001330399A JP2001330399A JP2003133819A JP 2003133819 A JP2003133819 A JP 2003133819A JP 2001330399 A JP2001330399 A JP 2001330399A JP 2001330399 A JP2001330399 A JP 2001330399A JP 2003133819 A JP2003133819 A JP 2003133819A
Authority
JP
Japan
Prior art keywords
adhesive
dielectric resonator
support base
thickness
support
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2001330399A
Other languages
Japanese (ja)
Inventor
Masahiro Watanabe
昌浩 渡辺
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kyocera Corp
Original Assignee
Kyocera Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kyocera Corp filed Critical Kyocera Corp
Priority to JP2001330399A priority Critical patent/JP2003133819A/en
Publication of JP2003133819A publication Critical patent/JP2003133819A/en
Withdrawn legal-status Critical Current

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Abstract

PROBLEM TO BE SOLVED: To solve the problem of a conventional dielectric resonator such that the quantity of an adhesive adhering to a stage becomes little by the cavitation due to air bank, which incurs the drop of adhesive strength, though there is necessity to apply an adhesive thinly because of the dispersion of the resonance frequency if the quantity of the adhesive is increased. SOLUTION: In a dielectric resonator where a dielectric resonator element is bonded to a stage, the periphery of the bonding face of the above stage is chamfered, and also the thickness of the adhesive existing between the above stage and the dielectric resonator element is made 0.01-0.02 mm.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は、誘電体共振器にお
ける支持台の形状及び誘電体共振子と支持台の接着方法
に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a shape of a support base in a dielectric resonator and a method for adhering the dielectric resonator and the support base.

【0002】[0002]

【従来の技術】誘電体共振器fは、図8(a)(b)に
示す様に支持台1と誘電体共振子2を接着剤3で接着し
ている。支持台1と誘電体共振子2を接着する場合、デ
ィスペンサー等を用いノズルから出る接着剤3を支持台
1または誘電体共振子2へ直接塗布させる方法もある
が、支持台1の接着面大きさに合わせて塗布する必要が
あるため塗布方法が複雑となり支持台1に塗布する接着
剤3の量が多く、且つ不均一になってしまうという問題
があった。
2. Description of the Related Art In a dielectric resonator f, a support 1 and a dielectric resonator 2 are bonded with an adhesive 3 as shown in FIGS. When the support base 1 and the dielectric resonator 2 are bonded to each other, there is also a method of directly applying the adhesive 3 discharged from the nozzle to the support base 1 or the dielectric resonator 2 using a dispenser or the like. Therefore, there is a problem in that the application method is complicated because it is necessary to apply the adhesive 3 in accordance with this, and the amount of the adhesive 3 applied to the support base 1 is large and non-uniform.

【0003】また、支持台1に付着させる接着剤3の量
が多くなることで誘電体共振子2の上に支持台1を載せ
た際、接着剤3の加熱状態などによる硬度や載せた時の
押さえ方によって支持台1が接着剤3へ沈み込む度合い
が異なるため誘電体共振子2に対して傾いたり、支持台
1と接着剤3と誘電体共振子2を一体化させた時の誘電
体共振器fの全体高さが変動するために共振周波数のば
らつきが大きくなる。そのため支持台1への接着剤3は
薄く均一に付着させる必要があった。
When the support base 1 is placed on the dielectric resonator 2 because the amount of the adhesive 3 attached to the support base 1 is increased, the hardness of the adhesive 3 due to the heating state and the like. The degree to which the support base 1 sinks into the adhesive 3 varies depending on the pressing method of the. Since the support base 1 tilts with respect to the dielectric resonator 2, or the support base 1, the adhesive 3 and the dielectric resonator 2 are integrated into a dielectric. Since the overall height of the body resonator f fluctuates, the variation of the resonance frequency becomes large. Therefore, the adhesive 3 on the support base 1 needs to be thinly and uniformly attached.

【0004】そこで、図9(a)(b)で示す従来方法
のように接着剤3を薄く均一に付着させる方法として平
板14の表面にディスペンサーノズル7の先端から加熱
し柔らかくした接着剤3を落としヘラ等で塗布した後ピ
ンセット等で支持台1を掴み、平板14の表面に塗布し
た接着剤3へ押し当て支持台1に接着剤3を付着させた
後、支持台1を誘電体共振子2の上に載せる。その後、
誘電体共振器fをプレートヒーター10で加熱を行い熱
硬化させ接着させていた。
Therefore, as a conventional method shown in FIGS. 9 (a) and 9 (b), as a method of thinly and uniformly adhering the adhesive 3, the adhesive 3 softened by heating from the tip of the dispenser nozzle 7 on the surface of the flat plate 14 is used. After applying with a dropper or the like, the support base 1 is grasped with tweezers or the like, pressed against the adhesive 3 applied on the surface of the flat plate 14 to adhere the adhesive 3 to the support base 1, and then the support base 1 is attached to the dielectric resonator. Place on top of 2. afterwards,
The dielectric resonator f was heated by the plate heater 10 to be thermoset and adhered.

【0005】[0005]

【発明が解決しようとする課題】接着強度の低下を抑え
るためには、支持台1に付着させる接着剤3の量を増せ
ば良いが、前記の様に誘電体共振器fの全体高さが変動
するため共振周波数のばらつきが大きくなる。そのため
接着剤3を薄く均一に塗布する方法として、図9(a)
の平板14に薄く塗布させる方法を用いたが、図10
(a)(b)(c)のように接着剤3の表面の凹凸によ
り支持台1と接着剤3が接触した際に生じる空気溜まり
による空洞3b等によって支持台1へ付着する接着剤3
の量が少なく、且つ不均一となり、支持台1を誘電体共
振子2に載せた際に隙間3cが発生するため接着強度の
低下を招いていた。
In order to suppress the decrease in adhesive strength, it is sufficient to increase the amount of the adhesive 3 attached to the support 1, but as described above, the overall height of the dielectric resonator f is increased. The variation in the resonance frequency increases because of the fluctuation. Therefore, as a method for applying the adhesive 3 thinly and uniformly, as shown in FIG.
The method of applying a thin coating on the flat plate 14 of FIG.
As shown in (a), (b), and (c), the adhesive 3 adheres to the support 1 by the cavity 3b or the like due to air pockets generated when the support 1 and the adhesive 3 come into contact with each other due to the unevenness of the surface of the adhesive 3.
Is small and non-uniform, and when the support base 1 is placed on the dielectric resonator 2, a gap 3c is generated, resulting in a decrease in adhesive strength.

【0006】[0006]

【課題を解決するための手段】そこで、本発明は、誘電
体共振子を支持台に接着してなる誘電体共振器におい
て、上記支持台の接着面の周囲に面取り部を設けるとと
もに、上記支持台と誘電体共振子の間に存在する接着剤
の厚みを0.01〜0.02mmとしたことを特徴とす
る。
In view of the above, the present invention provides a dielectric resonator having a dielectric resonator adhered to a support, and a chamfered portion is provided around the bonding surface of the support and the support is provided. It is characterized in that the thickness of the adhesive existing between the base and the dielectric resonator is 0.01 to 0.02 mm.

【0007】また本発明は、平板上に薄く塗布した接着
剤に上記支持台の接着面を押し当てて円状や前後左右に
動かした後、この接着面に誘電体共振子を接着すること
を特徴とする。即ち、平板へ薄く塗布された接着剤へ支
持台を押し当てた際に円状または、前後左右に動かすこ
とで接着面の空気溜まりをなくし支持台への薄く均一な
付着が可能となり、また支持台の接着面の周囲に面取り
等のR形状またはC面形状を施すことによって接着剤が
液溜まりし支持台への接着剤の付着量を大幅に増やすこ
となく密着性を上げることができる。このことにより、
複雑な装置を用いる必要がなく接着剤の均一な付着、且
つ接着剤の厚み量を増やすことなく接着強度の低下を抑
えられる。
Further, according to the present invention, the adhesive surface of the support is pressed against an adhesive thinly applied on a flat plate to move it in a circular shape or back and forth and left and right, and then the dielectric resonator is adhered to this adhesive surface. Characterize. That is, when the support base is pressed against the adhesive thinly applied to the flat plate, it can be moved circularly or forward / backward and left / right to eliminate air pockets on the adhesive surface and enable thin and uniform attachment to the support base. By providing an R shape or a C surface shape such as chamfering around the bonding surface of the base, the adhesive can be adhered to the support base without significantly increasing the amount of the adhesive adhered to the support base. By this,
It is not necessary to use a complicated device, and the adhesive can be uniformly attached, and the decrease in the adhesive strength can be suppressed without increasing the thickness of the adhesive.

【0008】[0008]

【発明の実施の形態】以下、本発明の実施形態を図によ
って説明する。
BEST MODE FOR CARRYING OUT THE INVENTION Embodiments of the present invention will be described below with reference to the drawings.

【0009】図1(a)(b)に示す、誘電体共振子2
及び支持台9からなる誘電体共振器gはセラミック材料
で形成されており、誘電体共振子2はBa−Nd−Ti
系材料、Nd−Al−Ca−Ti系材料、La−Al−
Sr−Ti系材料、Ba−Ti系材料、Ba−Mg−W
系材料、Mg−Ca−Ti系材料、サファイヤ等を使用
し、支持台9はアルミナセラミックス、コージライトセ
ラミックス、フォルステライトセラミックス等の材料を
使用する。また、接着剤3はエポキシ樹脂系などを使用
する。
Dielectric resonator 2 shown in FIGS. 1 (a) and 1 (b).
The dielectric resonator g including the support 9 and the support 9 is made of a ceramic material, and the dielectric resonator 2 is made of Ba-Nd-Ti.
Based materials, Nd-Al-Ca-Ti based materials, La-Al-
Sr-Ti based materials, Ba-Ti based materials, Ba-Mg-W
A system material, a Mg-Ca-Ti system material, sapphire, or the like is used, and a material for the support base 9 is alumina ceramics, cordierite ceramics, forsterite ceramics, or the like. The adhesive 3 is made of epoxy resin or the like.

【0010】図2(a)(b)に示す様に平板14に薄
く塗布した接着剤3へ支持台9を押し当てた際、円状ま
たは図3(a)(b)(c)に示す様に前後左右へ動か
すことで密着された時に生じる空気の溜まりが移動し追
い出されることで空洞化が生じなくなる。
When the support base 9 is pressed against the adhesive 3 thinly applied to the flat plate 14 as shown in FIGS. 2 (a) and 2 (b), it is circular or as shown in FIGS. 3 (a), 3 (b) and 3 (c). In this way, by moving it forward, backward, leftward and rightward, the air pockets that are generated when they are in close contact move and are expelled, so that cavitation does not occur.

【0011】また、図4(a)(b)に示す様に接着面
9aの外周の面取り部9bにR形状、又はC面形状を施
すことで、支持台9を円状または左右前後に動かした際
に面取り部9bと平板14の隙間に液溜まり3aができ
るため接着面9a全体に増量することなく効果的に付着
させることができる。この方法により支持台9の面取り
部9bに入り込んだ液溜まり3aは図5(a)(b)
(c)で示す様に誘電体共振子2へ載せると液溜まり3
aが垂れ、誘電体共振子2と支持台9の接着面9a及び
面取り部9bを隙間無く密着させることができる。この
ことにより、接着強度の低下を抑えることができる。
Further, as shown in FIGS. 4 (a) and 4 (b), the chamfered portion 9b on the outer periphery of the adhesive surface 9a is provided with an R shape or a C surface shape so that the support base 9 can be moved in a circular shape or in the left / right direction. At this time, since the liquid pool 3a is formed in the gap between the chamfered portion 9b and the flat plate 14, the liquid can be effectively attached to the entire adhesive surface 9a without increasing the amount. The liquid pool 3a that has entered the chamfered portion 9b of the support base 9 by this method is shown in FIGS.
When placed on the dielectric resonator 2 as shown in (c), a liquid pool 3
Therefore, the dielectric resonator 2 and the adhesive surface 9a of the support base 9 and the chamfered portion 9b can be brought into close contact with each other without a gap. This makes it possible to suppress a decrease in adhesive strength.

【0012】図1(b)に示す支持台9と誘電体共振子
2の間にある接着剤の厚み3dが0.01mmばらつく
と誘電体共振器gの全体高さが変わるため共振周波数が
およそ4MHz変動する。支持台9に付着させる接着剤
3の量が多いと誘電体共振子2へ支持台9を載せ接着さ
せた際、支持台9が接着剤3へ沈み込む量のばらつきが
大きなり誘電体共振器gの全体厚みのばらつきが大きく
なるため共振周波数の変動量が大きくなる。これにより
誘電体共振器gの接着剤の厚み3dは、0.01mm以
上、0.02mm以下にすることが良く、接着強度の低
下を抑えられ、且つ共振周波数のばらつきを最小限にす
ることができる。
When the thickness 3d of the adhesive between the support 9 and the dielectric resonator 2 shown in FIG. 1 (b) varies by 0.01 mm, the entire height of the dielectric resonator g changes, so that the resonance frequency is about the same. It varies by 4 MHz. When the amount of the adhesive 3 attached to the support base 9 is large, when the support base 9 is placed on and adhered to the dielectric resonator 2, there is a large variation in the amount of the support base 9 sinking into the adhesive 3 and the dielectric resonator. Since the variation of the total thickness of g is large, the variation amount of the resonance frequency is large. As a result, the thickness 3d of the adhesive of the dielectric resonator g is preferably 0.01 mm or more and 0.02 mm or less so that the decrease in adhesive strength can be suppressed and the variation in resonance frequency can be minimized. it can.

【0013】支持台9の面取り部9bをR形状とする場
合は水と研磨剤を投入した振動または回転によるバレル
機を用いて施し、R形状の大きさは振動または回転の強
さ及び水、研磨剤、支持台9の投入量を変えることで制
御が可能となる。また、支持台9の面取り部9bをC面
形状とする場合は成型時に金型へ同一C面形状を施し、
支持台9と一体に形成しておけば良い。
When the chamfered portion 9b of the support base 9 is formed into an R shape, the chamfered portion 9b is formed by using a barrel machine by vibration or rotation in which water and an abrasive are added, and the size of the R shape is the strength of vibration or rotation and water, The control can be performed by changing the amounts of the polishing agent and the support 9 charged. When the chamfered portion 9b of the support base 9 has a C-plane shape, the mold has the same C-plane shape at the time of molding.
It may be formed integrally with the support base 9.

【0014】接着強度の低下が抑えられる面取り部9b
のR形状、又はC面形状の大きさは0.05mm以上、
好ましくは0.10mm以上が良く、この効果は支持台
9と誘電体共振子2との接着面積が1.5平方センチメ
ートル以下の誘電体共振器gで得られる。これは、図5
に示す様に支持台9における面取り部9bのR形状、又
はC面形状の大きさが大きい方が液溜まり3aに溜まる
接着剤3の量が多くなるためであるが、支持台9と誘電
体共振子2との接着面9aの面積がもともと大きいもの
は、液溜まり3aにある接着剤3の量の比率が小さいた
め本発明の方法を用いなくて十分な効果が得られる。
A chamfered portion 9b capable of suppressing a decrease in adhesive strength.
The size of R shape or C surface shape is 0.05 mm or more,
The thickness is preferably 0.10 mm or more, and this effect can be obtained with the dielectric resonator g in which the bonding area between the support 9 and the dielectric resonator 2 is 1.5 square centimeters or less. This is
This is because the amount of the adhesive 3 that accumulates in the liquid reservoir 3a increases as the size of the R shape or C surface shape of the chamfered portion 9b of the support base 9 increases as shown in FIG. If the area of the adhesive surface 9a with the resonator 2 is originally large, the ratio of the amount of the adhesive 3 in the liquid pool 3a is small, and a sufficient effect can be obtained without using the method of the present invention.

【0015】本発明の誘電体共振器は、衛星放送の受信
用アンテナ部品(LNB:ローノイズブロック)、測定
器などの発振素子(VOC:ボルテージコントロールオ
シレーター)、自動車などの衝突防止やレーダー検知用
センサー等に用いられる。
The dielectric resonator of the present invention is an antenna component for receiving satellite broadcasting (LNB: low noise block), an oscillating element such as a measuring instrument (VOC: voltage control oscillator), a sensor for collision prevention and radar detection of an automobile or the like. Used for etc.

【0016】[0016]

【実施例】本発明の実施例として、支持台9を接着剤3
に押し当てる方法については図6で示す誘電体接着装置
へ組み込んだ。
EXAMPLE As an example of the present invention, the support base 9 is attached to the adhesive 3
As for the method of pressing against, it was incorporated into the dielectric bonding apparatus shown in FIG.

【0017】支持台9と誘電体共振子2は、スプレード
ライにて造粒された原料を粉末プレス機で成型にて金型
を用いて成型した後、大気中約1300℃及び1600
℃で焼成して得た。
The support base 9 and the dielectric resonator 2 are formed by spray-drying a raw material granulated by a powder press machine using a metal mold, and then in the atmosphere at about 1300 ° C. and 1600 ° C.
It was obtained by firing at ℃.

【0018】支持台9は厚み1.5mm、外径4.3m
m、フォルステライト材料とし、誘電体共振子2は厚み
2.0mm、外径5.6mm、材料Nd−Al−Ca−
Ti系材料(比誘電率約43)を使用した。また、接着
剤3はエポキシ樹脂系接着剤を使用した。
The support 9 has a thickness of 1.5 mm and an outer diameter of 4.3 m.
m, forsterite material, the dielectric resonator 2 has a thickness of 2.0 mm, an outer diameter of 5.6 mm, and a material of Nd-Al-Ca-.
A Ti-based material (relative dielectric constant of about 43) was used. As the adhesive 3, an epoxy resin adhesive was used.

【0019】支持台9の面取り部9bのR形状について
は遠心バレル研磨機にて施した。バレル研磨機へは、バ
レル容器10Lの中へ支持台9と研磨剤及び水を投入し
10時間の処理を行うことで面取り部9bはR=0.1
0mmの大きさを得られた。
The R shape of the chamfered portion 9b of the support base 9 was given by a centrifugal barrel polishing machine. To the barrel polishing machine, the support 9 and the polishing agent and water were put into the barrel container 10L, and the chamfered portion 9b was R = 0.1 by performing the treatment for 10 hours.
A size of 0 mm was obtained.

【0020】誘電体接着装置では方向hへ毎分40mmで
動かしている塗布用テープ5(幅40mm)上に接着剤
3をディスペンサーノズル7よりおよそ3分に1滴の割
合で点滴する。接着剤3の塗布厚み3eはスキージ6と
塗布用テープ5の隙間で設定し塗布厚み3eを0.13
mmとした。スカラロボットを用いロボットハンド8で
支持台9を掴み接着テーブル4上の接着剤3へ押し当
て、支持台9の中心が直径3mmの円を描くように1周
させる。その後、接着剤3を付着させた支持台9をプレ
ートヒーター10上に2軸ロボットで供給され位置決め
された誘電体共振子2の上の中心に置き加熱硬化にて接
着した。
In the dielectric bonding apparatus, the adhesive 3 is dropped on the coating tape 5 (width 40 mm) moving in the direction h at a rate of 40 mm per minute from the dispenser nozzle 7 at a rate of about 1 drop every 3 minutes. The coating thickness 3e of the adhesive 3 is set in the gap between the squeegee 6 and the coating tape 5, and the coating thickness 3e is set to 0.13.
mm. The support base 9 is grasped by the robot hand 8 using a SCARA robot and pressed against the adhesive 3 on the adhesion table 4, and the support base 9 is rotated once so that the center of the support base 9 draws a circle having a diameter of 3 mm. Then, the support base 9 to which the adhesive 3 was attached was placed on the plate heater 10 on the center of the dielectric resonator 2 which was supplied by a biaxial robot and positioned, and was adhered by heat curing.

【0021】接着強度は、図7で示す様に接着した誘電
体共振器gを測定テーブル13上に載せ、固定ジグ12
で挟み込み、強度測定器先端11(イマダ製 DPX−
50T)をゆっくりと支持台9の側面に当て接着部の剥
がれた時の強度を測定して得た。
The adhesive strength is determined by placing the dielectric resonator g adhered as shown in FIG.
It is pinched with a strength measuring instrument tip 11 (made by Imada DPX-
50T) was slowly applied to the side surface of the support 9 to measure the strength when the adhesive portion was peeled off.

【0022】従来方法による接着強度と本発明による接
着強度を面取り部9bのR寸法を変え、各サンプル20
個で測定した結果を図11(a)(b)(c)(d)に
示す。尚、面取り部9bのR寸法はバレル研磨機を用い
処理時間を変更して作成した。また、支持台9へ付着さ
せる塗布厚み3eを0.13mmとした。従来方法であ
るR寸法0.01mm以下では最小接着強度が8.5k
gであったものが本発明のR寸法0.05mmでは1
0.5kg、R寸法0.10mm以上では11.5kg
となり、又ばらつきも従来方法6kgに対し本発明によ
る方法では4.5kgと小さくなった。従って本発明に
より、接着強度の低下が抑えられ且つ安定した強度が得
られたことがわかる。
The adhesive strength according to the conventional method and the adhesive strength according to the present invention were changed by changing the R dimension of the chamfered portion 9b, and
Results of individual measurement are shown in FIGS. 11 (a), (b), (c), and (d). The R dimension of the chamfered portion 9b was created by changing the processing time using a barrel grinder. Further, the coating thickness 3e attached to the support base 9 was set to 0.13 mm. If the R dimension is 0.01 mm or less, which is the conventional method, the minimum adhesive strength is 8.5 k.
What was g was 1 when the R dimension of the present invention was 0.05 mm.
0.5 kg, 11.5 kg for R size 0.10 mm or more
Further, the variation was as small as 4.5 kg in the method according to the present invention as compared with 6 kg in the conventional method. Therefore, according to the present invention, it is understood that the decrease of the adhesive strength is suppressed and the stable strength is obtained.

【0023】接着剤3の塗布厚み3eにおける誘電体共
振器gの接着剤の厚み3dと共振周波数のばらつきを表
1に示す。
Table 1 shows the variation of the resonance frequency and the adhesive thickness 3d of the dielectric resonator g in the coating thickness 3e of the adhesive 3.

【0024】塗布用テープ5上に塗布する接着剤3の塗
布厚み3eを変え支持台9への付着厚みを変化させたサ
ンプルを各20個ずつ作成した。誘電体共振器gの接着
剤の厚み3d及び厚みばらつきは、接着前に予め誘電体
共振子2の厚みと支持台9の厚みをマイクロメーターで
測定しておき、接着後の誘電体共振器gの全体厚みから
差し引いて算出して得た。また、支持台9の面取り部9
bのR寸法は0.10mmとした。
Twenty samples were prepared by changing the coating thickness 3e of the adhesive 3 to be coated on the coating tape 5 and changing the thickness of the adhesive 3 on the support base 9. The thickness 3d and thickness variation of the adhesive of the dielectric resonator g are measured in advance by measuring the thickness of the dielectric resonator 2 and the thickness of the support base 9 with a micrometer before the bonding, and the dielectric resonator g after the bonding is measured. Was calculated by subtracting from the total thickness of. In addition, the chamfered portion 9 of the support base 9
The R dimension of b was 0.10 mm.

【0025】[0025]

【表1】 [Table 1]

【0026】表1のように、支持台9へ付着させる接着
剤3の塗布厚み3eを0.13mmとした場合、支持台
9を誘電体共振子2に載せ加熱硬化し接着させた後の接
着剤の厚み3dは0.010mm以上0.017mm以
下、厚みばらつきは0.007mmとなり共振周波数の
ばらつきは3MHzとなった。また塗布厚み3eを0.
21mmにした場合、接着後の接着剤の厚み3dは0.
027mm以上0.098mm以下、厚みばらつきがは
0.071mmとなり、共振周波数のばらつきは28M
Hzとなった。
As shown in Table 1, when the coating thickness 3e of the adhesive 3 to be attached to the support base 9 is 0.13 mm, the support base 9 is placed on the dielectric resonator 2 and heat-cured to bond it. The thickness 3d of the agent was 0.010 mm or more and 0.017 mm or less, the thickness variation was 0.007 mm, and the resonance frequency variation was 3 MHz. Further, the coating thickness 3e is set to 0.
When the thickness is set to 21 mm, the thickness 3d of the adhesive after adhesion is 0.
027 mm or more and 0.098 mm or less, thickness variation is 0.071 mm, and resonance frequency variation is 28 M
Became Hz.

【0027】即ち、誘電体共振器gにおける接着剤の厚
み3dを0.010mm以上、0.020mm以下にす
れば接着剤3へ支持台9が沈み込むばらつきが小さくな
り接着剤の厚み3dのばらつきを抑えることができる。
これにより共振周波数のばらつきを小さくできたことが
わかる。
That is, when the thickness 3d of the adhesive in the dielectric resonator g is set to 0.010 mm or more and 0.020 mm or less, the variation of the support base 9 sinking into the adhesive 3 becomes small, and the variation of the adhesive thickness 3d. Can be suppressed.
As a result, it can be seen that the variation in resonance frequency can be reduced.

【0028】[0028]

【発明の効果】以上に様に本発明によれば、薄くのばし
た接着剤に対し接着剤へ接触させた支持台を円状や前後
左右に動かし接着剤を塗布することで接着剤の付着不足
がなくなり、さらに支持台の接着面の外周にR形状、又
はC面形状をつけることで誘電体共振子への密着性が向
上することで接着強度の低下を抑え、且つ安定化させる
ことができる。また、接着剤の厚みを薄くできるため誘
電体共振器の共振周波数のばらつきを小さくすることが
できる。
As described above, according to the present invention, the adhesive is adhered to the thinned adhesive by moving the supporting base in contact with the adhesive to move it in a circular shape, front and rear, left and right to apply the adhesive. Insufficiency is eliminated, and further, by attaching an R shape or C surface shape to the outer periphery of the adhesive surface of the support base, the adhesiveness to the dielectric resonator is improved, so that a decrease in adhesive strength can be suppressed and stabilized. it can. Further, since the thickness of the adhesive can be reduced, it is possible to reduce variations in the resonance frequency of the dielectric resonator.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の誘電体共振器形状を示しており、
(a)は斜視図、(b)は側面図である。
1 shows a dielectric resonator shape of the present invention,
(A) is a perspective view and (b) is a side view.

【図2】本発明の誘電体共振器の製造方法における接着
方法を示しており、(a)は上面図、(b)は斜視図で
ある。
2A and 2B show a bonding method in a method for manufacturing a dielectric resonator of the present invention, FIG. 2A is a top view and FIG. 2B is a perspective view.

【図3】(a)〜(c)は本発明の誘電体共振器の製造
方法における接着方法の他の例を示す上面図である。
3A to 3C are top views showing another example of the bonding method in the method for manufacturing a dielectric resonator of the present invention.

【図4】(a)(b)は本発明の製造方法における接着
方法を示す側面図である。
4A and 4B are side views showing a bonding method in the manufacturing method of the present invention.

【図5】(a)〜(c)は本発明の製造方法における接
着方法を示す側面図である。
5A to 5C are side views showing a bonding method in the manufacturing method of the present invention.

【図6】本発明の誘電体共振器の製造方法に用いる接着
装置を示す斜視図である。
FIG. 6 is a perspective view showing an adhesive device used in the method for manufacturing a dielectric resonator of the present invention.

【図7】誘電体共振器の接着強度測定器を示す斜視図で
ある。
FIG. 7 is a perspective view showing an adhesive strength measuring device for a dielectric resonator.

【図8】従来の誘電体共振器形状を示しており、(a)
は斜視図、(b)は側面図である。
FIG. 8 shows a conventional dielectric resonator shape, (a)
Is a perspective view and (b) is a side view.

【図9】(a)(b)は従来の誘電体共振器の接着方法
を示す斜視図である。
9A and 9B are perspective views showing a conventional method of bonding a dielectric resonator.

【図10】(a)〜(c)は従来の誘電体共振器の接着
方法を示す側面図である。
10A to 10C are side views showing a conventional method of bonding a dielectric resonator.

【図11】本発明実施例及び従来例による接着強度を比
較したグラフである。
FIG. 11 is a graph comparing the adhesive strengths of the example of the present invention and the conventional example.

【符号の説明】[Explanation of symbols]

1:支持台 2:誘電体共振子 3:接着剤 3a:液溜まり 3b:空気溜まりによる空洞 3c:隙間 3d:接着剤の厚み 3e:塗布厚み 4:接着テーブル 5:塗布用テープ 6:スキージ 7:ディスペンサーノズル 8:ロボットハンド 9:支持台 9a:接着面 9b:面取り部 10:プレートヒーター 11:強度測定器先端 12:固定ジグ 13:測定テーブル 14:平板 15:テープ f:誘電体共振器 g:誘電体共振器 h:方向 1: Support stand 2: Dielectric resonator 3: Adhesive 3a: Liquid pool 3b: Cavity due to air pool 3c: Gap 3d: Thickness of adhesive 3e: coating thickness 4: Adhesive table 5: Coating tape 6: Squeegee 7: Dispenser nozzle 8: Robot hand 9: Support stand 9a: Adhesive surface 9b: Chamfer 10: Plate heater 11: Tip of strength measuring instrument 12: Fixed jig 13: Measurement table 14: Flat plate 15: Tape f: Dielectric resonator g: Dielectric resonator h: direction

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】誘電体共振子を支持台に接着してなる誘電
体共振器において、上記支持台の接着面の周囲に面取り
部を設けるとともに、上記支持台と誘電体共振子の間に
存在する接着剤の厚みを0.01〜0.02mmとした
ことを特徴とする誘電体共振器。
1. A dielectric resonator in which a dielectric resonator is bonded to a support, a chamfer is provided around the bonding surface of the support, and the chamfer is present between the support and the dielectric resonator. A dielectric resonator, wherein the thickness of the adhesive used is 0.01 to 0.02 mm.
【請求項2】誘電体共振子を支持台に接着してなる誘電
体共振器において、上記支持台の接着面の周囲に面取り
部を形成し、平板上に薄く塗布した接着剤に上記支持台
の接着面を押し当てて円状や前後左右に動かした後、こ
の接着面に誘電体共振子を接着する工程からなる誘電体
共振器の製造方法。
2. A dielectric resonator in which a dielectric resonator is adhered to a support base, a chamfered portion is formed around the bonding surface of the support base, and the support base is attached to an adhesive thinly applied on a flat plate. A method for manufacturing a dielectric resonator, which comprises the steps of pressing the adhesive surface of, moving it in a circular shape, and moving it back and forth, right and left, and then bonding a dielectric resonator to this adhesive surface.
JP2001330399A 2001-10-29 2001-10-29 Dielectric resonator and method of manufacturing the same Withdrawn JP2003133819A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2001330399A JP2003133819A (en) 2001-10-29 2001-10-29 Dielectric resonator and method of manufacturing the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001330399A JP2003133819A (en) 2001-10-29 2001-10-29 Dielectric resonator and method of manufacturing the same

Publications (1)

Publication Number Publication Date
JP2003133819A true JP2003133819A (en) 2003-05-09

Family

ID=19146122

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001330399A Withdrawn JP2003133819A (en) 2001-10-29 2001-10-29 Dielectric resonator and method of manufacturing the same

Country Status (1)

Country Link
JP (1) JP2003133819A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10987806B2 (en) 2018-03-27 2021-04-27 Fanuc Corporation Production method and production system that use robot

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10987806B2 (en) 2018-03-27 2021-04-27 Fanuc Corporation Production method and production system that use robot

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