JP2003127052A - Grinding method - Google Patents
Grinding methodInfo
- Publication number
- JP2003127052A JP2003127052A JP2001326051A JP2001326051A JP2003127052A JP 2003127052 A JP2003127052 A JP 2003127052A JP 2001326051 A JP2001326051 A JP 2001326051A JP 2001326051 A JP2001326051 A JP 2001326051A JP 2003127052 A JP2003127052 A JP 2003127052A
- Authority
- JP
- Japan
- Prior art keywords
- tool
- polishing
- polishing tool
- locus
- workpiece
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 title claims description 33
- 238000005498 polishing Methods 0.000 claims description 206
- 238000005520 cutting process Methods 0.000 claims description 7
- 238000003672 processing method Methods 0.000 claims description 4
- 238000003754 machining Methods 0.000 abstract description 11
- 230000007423 decrease Effects 0.000 description 12
- 230000003287 optical effect Effects 0.000 description 4
- 238000000465 moulding Methods 0.000 description 3
- 230000002093 peripheral effect Effects 0.000 description 2
- 238000007517 polishing process Methods 0.000 description 2
- 239000006061 abrasive grain Substances 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 239000013013 elastic material Substances 0.000 description 1
- 238000004898 kneading Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000007493 shaping process Methods 0.000 description 1
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
Landscapes
- Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
- Grinding And Polishing Of Tertiary Curved Surfaces And Surfaces With Complex Shapes (AREA)
- Numerical Control (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、研磨加工方法に関
する。TECHNICAL FIELD The present invention relates to a polishing method.
【0002】[0002]
【従来の技術】従来、光学素子成型用の金型などの被加
工物の研磨加工方法としては、小径の研磨工具を被加工
物の加工面に一定の力で押し付けながらその研磨工具を
往復移動させる方法が用いられている。このような研磨
加工方法によれば、研磨工具の移動速度を変化させるこ
とにより研磨深さを調整することができ、加工面の加工
精度の向上を図り、加工面上のうねりを除去することが
できる。2. Description of the Related Art Conventionally, as a method of polishing a work piece such as a die for molding an optical element, a small-diameter polishing tool is pressed against the work surface of the work piece with a constant force to reciprocate the polishing tool. The method of making is used. According to such a polishing method, it is possible to adjust the polishing depth by changing the moving speed of the polishing tool, improve the processing accuracy of the processed surface, and remove the undulations on the processed surface. it can.
【0003】図12は、光学素子であるレンズを成型す
るための金型101の加工面102を小径の研磨工具1
03で研磨加工する際の一般的作業形態を示したもので
あり、図13はそのときの加工面102上における研磨
工具103の工具軌跡を示す平面図である。この図13
中における長方形状の破線は、その内側部分が光学的有
効領域であり、その外側が光学的不要域であることを示
している。FIG. 12 shows a polishing tool 1 having a small diameter on a processing surface 102 of a mold 101 for molding a lens which is an optical element.
No. 03 shows a general work mode when polishing is performed, and FIG. 13 is a plan view showing a tool locus of the polishing tool 103 on the processing surface 102 at that time. This FIG.
The rectangular broken line in the inside indicates that the inner part is the optically effective region and the outer part is the optically unnecessary region.
【0004】研磨工具103は軸心周りに回転駆動され
るとともに加工面102に対して所定研磨荷重Fで押し
付けられながら所定の工具軌跡上を移動する。この工具
軌跡は、金型101の短手方向(副走査方向)であるY
方向又はその逆方向へ向かう工具軌跡と、Y方向又はそ
の逆方向の端部においてそのY方向と直交する金型10
1の長手方向(主走査方向)であるX方向へ向かう微少
量の工具軌跡とにより形成されている。The polishing tool 103 is driven to rotate about its axis and moves on a predetermined tool locus while being pressed against the processing surface 102 with a predetermined polishing load F. This tool locus is Y which is the lateral direction (sub scanning direction) of the die 101.
Tool path extending in the Y direction or the opposite direction, and the mold 10 orthogonal to the Y direction at the end portion in the Y direction or the opposite direction.
1 along a longitudinal direction (main scanning direction), that is, a tool trace of a small amount.
【0005】ここで、汎用のNC工作機械を駆動させて
研磨を行うと、研磨工具103がY方向へ移動したと
き、その端部では移動速度が次第に低下し、研磨工具1
03の移動方向がY方向からX方向に向けて略90°切
り返される箇所では瞬間的に“0”になる。Here, when a general-purpose NC machine tool is driven to perform polishing, when the polishing tool 103 moves in the Y direction, the moving speed gradually decreases at the end portion thereof, and the polishing tool 1
At the point where the moving direction of 03 is turned back by approximately 90 ° from the Y direction to the X direction, it becomes “0” momentarily.
【0006】図14は、金型101の副走査方向(Y方
向)の加工面102と、その加工面102上を移動する
研磨工具103の移動範囲とを示したものである。金型
101の副走査方向(Y方向)の幅寸法が2.4mm、
弾性を有する部材で形成されている研磨工具103の加
工面102との接触幅寸法が約0.8mmであり、NC
工作機械のNCデータにより制御される研磨工具103
の移動幅寸法は1.6mmとなっている。FIG. 14 shows a working surface 102 of the die 101 in the sub-scanning direction (Y direction) and a moving range of the polishing tool 103 moving on the working surface 102. The width dimension of the die 101 in the sub-scanning direction (Y direction) is 2.4 mm,
The contact width dimension of the polishing tool 103 formed of an elastic member with the processing surface 102 is about 0.8 mm, and NC
Polishing tool 103 controlled by NC data of machine tool
The moving width dimension of is 1.6 mm.
【0007】図15は、研磨工具103を図14に示す
ように金型101の副走査方向(Y方向)へ移動させて
金型101の加工面102を研磨した場合における副走
査方向の研磨深さ(研磨量)を示したものである。副走
査方向の両端部では、研磨工具103の移動速度が低下
することにより研磨深さが著しく増大する過剰研磨部A
が発生する。そして、適正な研磨が行われる安定加工域
は約0.6mmとなる。つまり、金型101の加工面1
02の幅寸法2.4mmに対し、安定加工域が約1/4
と少なくなっている。FIG. 15 shows a polishing depth in the sub-scanning direction when the polishing tool 103 is moved in the sub-scanning direction (Y direction) of the mold 101 to polish the processed surface 102 of the mold 101 as shown in FIG. The amount of polishing (polishing amount) is shown. At both ends in the sub-scanning direction, the polishing depth significantly increases due to a decrease in the moving speed of the polishing tool 103.
Occurs. The stable processing area where proper polishing is performed is about 0.6 mm. That is, the processing surface 1 of the die 101
The width of 2.4 is 2.4 mm, and the stable machining area is about 1/4.
And less.
【0008】[0008]
【発明が解決しようとする課題】このようなことから、
安定加工域の割合を高めるようにした様々な研磨加工方
法が提案されており、その一例としては、特開昭62−
246467号公報や、特開2001−79742公報
に記載されたように、被加工物(例えば、金型)の加工
面の外周にその加工面と連続する案内面を有する擬似形
(ヤトイ)を設け、この擬似形の案内面上で研磨工具の
移動方向の切り返しを行う方法が知られている。DISCLOSURE OF THE INVENTION Problems to be Solved by the Invention
Various polishing methods for increasing the ratio of the stable processing area have been proposed, and one example thereof is Japanese Patent Laid-Open No. 62-
As described in Japanese Laid-Open Patent Application No. 246467 and Japanese Patent Laid-Open No. 2001-79742, a pseudo shape (yatoy) having a guide surface continuous with the machined surface of a workpiece (for example, a die) is provided on the outer periphery of the machined surface. A method is known in which the direction of movement of the polishing tool is turned back on this pseudo-shaped guide surface.
【0009】しかし、この方式は、被加工物の加工面に
対して段差のない案内面を有する擬似形(ヤトイ)を形
成するための新たな作業工程が増える。さらに、被加工
物と擬似形とを超精密切削で仕上げる場合、その分だけ
超精密切削の加工面積が増大し、超精密切削に要する時
間や、超精密切削を行うためのバイトの磨耗量増大によ
る超精密切削の精度低下等の問題が、研磨加工の前工程
で生ずることになる。However, this method increases the number of new work steps for forming a pseudo shape (a toy) having a guide surface having no step with respect to the processed surface of the workpiece. Furthermore, when finishing the workpiece and the pseudo-form by ultra-precision cutting, the processing area of ultra-precision cutting increases by that much, and the time required for ultra-precision cutting and the wear amount of the cutting tool for performing ultra-precision cutting increase. A problem such as a decrease in the precision of ultra-precision cutting due to the above occurs in the pre-process of polishing.
【0010】また、擬似形(ヤトイ)を用いない研磨加
工方法としては、特開2001−138196公報に記
載されたように、研磨工具の移動方向の切り返しによる
欠陥の領域を被加工物における光学的不要域に収める方
法が知られている。Further, as a polishing method not using a pseudo pattern (yaito), as described in Japanese Patent Laid-Open No. 2001-138196, a defect area due to turning back in the moving direction of the polishing tool is used as an optical method in a workpiece. It is known how to put it in the unnecessary area.
【0011】しかし、この研磨加工方法によれば、被加
工物を必要以上の大きさに形成しなければならず、擬似
形を用いる場合と同じような問題がある。However, according to this polishing method, the workpiece has to be formed in an unnecessarily large size, which has the same problem as in the case of using the pseudo pattern.
【0012】また、特開2001−170852公報に
記載されたように、研磨工具の移動方向の切り返しと研
磨工具の周速とを同期制御することにより研磨工具の移
動方向の切り返し領域における研磨量を減らすようにし
た研磨加工方法も知られている。Further, as described in Japanese Patent Laid-Open No. 2001-170852, by synchronously controlling the turning back in the moving direction of the polishing tool and the peripheral speed of the polishing tool, the polishing amount in the turning back region in the moving direction of the polishing tool is controlled. Polishing processing methods for reducing the number are also known.
【0013】しかし、この研磨加工方法では、1秒以下
の極めて短い時間内に研磨工具の回転数を制御しなけれ
ばならず、その制御は困難である。However, in this polishing method, the rotation speed of the polishing tool must be controlled within an extremely short time of 1 second or less, which is difficult to control.
【0014】本発明の目的は、被加工物の加工面の研磨
加工を、簡単に精度良く行うことができる研磨加工方法
を提供することである。An object of the present invention is to provide a polishing method capable of simply and accurately polishing a work surface of a workpiece.
【0015】本発明の目的は、研磨加工におる安定加工
域の割合を高めることである。An object of the present invention is to increase the percentage of stable working area in polishing.
【0016】[0016]
【課題を解決するための手段】請求項1記載の発明は、
回転する小径の研磨工具を被加工物の加工面に所定荷重
で押し付けて相対的に第1方向又はその逆方向へ移動さ
せ、第1方向又はその逆方向の所定位置まで移動させた
後にその移動方向と略直交する第2方向へ相対的に微少
量移動させる切り返しを繰り返すことで前記加工面を研
磨加工する研磨加工方法において、前記研磨工具の相対
的な移動方向が第1方向又はその逆方向から第2方向へ
切り返される領域、及び、第2方向から第1方向又はそ
の逆方向へ切り返される領域で、前記研磨工具を第1方
向又はその逆方向と第2方向との2方向へ同時に向かう
工具軌跡上を移動させるようにしたことを特徴とする。The invention according to claim 1 is
A rotating small-diameter polishing tool is pressed against the work surface of the work piece with a predetermined load to move it relatively in the first direction or the opposite direction, and after moving to a predetermined position in the first direction or the opposite direction, the movement In a polishing method for polishing the machined surface by repeating a turning operation in which a relatively small amount is moved in a second direction substantially orthogonal to the direction, the relative movement direction of the polishing tool is the first direction or the opposite direction. From the second direction to the second direction and from the second direction to the first direction or the opposite direction thereof, the polishing tool is simultaneously directed to the first direction or two directions of the opposite direction and the second direction. The feature is that the tool is moved on the tool path.
【0017】したがって、研磨工具の移動方向が第1方
向又はその逆方向から第2方向へ、又は、第2方向から
第1方向又はその逆方向へ切り返される領域では、研磨
工具が第1方向又はその逆方向と第2方向との2方向へ
同時に向かう工具軌跡上を移動することにより、研磨工
具の移動速度の低下を抑制でき、さらに、工具軌跡の密
度を低くすることができ、それによって、研磨工具の移
動方向が切り返される領域における過剰研磨を防止する
ことができる。Therefore, in a region where the movement direction of the polishing tool is turned back from the first direction or the opposite direction to the second direction, or from the second direction to the first direction or the opposite direction, the polishing tool is moved in the first direction or the opposite direction. By moving on the tool locus that simultaneously moves in two directions, the opposite direction and the second direction, it is possible to suppress a decrease in the moving speed of the polishing tool, and further to reduce the density of the tool locus. It is possible to prevent excessive polishing in a region where the moving direction of the polishing tool is switched back.
【0018】請求項2記載の発明は、請求項1記載の研
磨加工方法において、前記工具軌跡はNC工作機械のN
Cデータの座標指令点で形成され、第1方向又はその逆
方向と第2方向との2方向へ同時に移動する区間の前記
工具軌跡は直線又は円弧で形成されていることを特徴と
する。According to a second aspect of the present invention, in the polishing method according to the first aspect, the tool locus is N of an NC machine tool.
The tool locus of the section formed by the coordinate command point of the C data and moving simultaneously in the first direction or the opposite direction and the second direction is formed by a straight line or an arc.
【0019】したがって、このような工具軌跡の設定
を、NC工作機械の通常のGコードコマンドにより容易
に行うことができる。Therefore, such a tool locus can be easily set by the normal G code command of the NC machine tool.
【0020】請求項3記載の発明は、請求項1記載の研
磨加工方法において、前記工具軌跡はNC工作機械の応
答速度を調整することで形成され、第1方向又はその逆
方向と第2方向との2方向へ同時に移動する区間の前記
工具軌跡は第1方向又はその逆方向と第2方向との内側
を近回りするように形成されていることを特徴とする。According to a third aspect of the present invention, in the polishing method according to the first aspect, the tool locus is formed by adjusting the response speed of the NC machine tool, and the first direction or the opposite direction and the second direction. It is characterized in that the tool locus in a section that moves in the two directions simultaneously and is formed so as to make a short circuit within the first direction or the opposite direction and the second direction.
【0021】したがって、このような工具軌跡の設定
を、NCデータを修正することなく、NC工作機械の位
置決めサーボのチューニング又はパラメータ設定のみで
容易に行うことができる。Therefore, such a tool locus can be easily set without tuning NC data only by tuning the positioning servo of the NC machine tool or setting parameters.
【0022】請求項4記載の発明は、回転する小径の研
磨工具を被加工物の加工面に所定荷重で押し付けて相対
的に第1方向又はその逆方向へ移動させ、第1方向又は
その逆方向の所定位置まで移動させた後にその移動方向
と略直交する第2方向へ相対的に微少量移動させる切り
返しを繰り返すことで前記加工面を研磨加工する研磨加
工方法において、前記研磨工具の第1方向又はその逆方
向への最大移動位置を、前記研磨工具の一部が前記被加
工物の前記加工面から離脱して他の一部が前記加工面に
接触した位置としたことを特徴とする。According to a fourth aspect of the present invention, the rotating small-diameter polishing tool is pressed against the work surface of the work piece with a predetermined load to relatively move in the first direction or the opposite direction, and the first direction or the opposite direction. A polishing tool for polishing the machined surface by repeating a turning operation in which a relatively small amount is moved in a second direction that is substantially orthogonal to the moving direction after moving to a predetermined position in the direction. The maximum movement position in the direction or the opposite direction is a position where a part of the polishing tool is separated from the processing surface of the workpiece and another part is in contact with the processing surface. .
【0023】したがって、研磨工具を第1方向又はその
逆方向へ移動させる場合における研磨工具の移動幅を増
大させることができ、これにより、被加工物の加工面に
おける第1方向の両端側の研磨残し領域が少なくなり、
安定加工域の割合が高くなる。Therefore, it is possible to increase the movement width of the polishing tool when the polishing tool is moved in the first direction or in the opposite direction, whereby polishing on both sides of the work surface of the workpiece in the first direction is performed. The remaining area is reduced,
The ratio of stable processing area is high.
【0024】請求項5記載の発明は、請求項4記載の研
磨加工方法において、前記被加工物における前記研磨工
具の第1方向又はその逆方向への移動方向の縁部に面取
り処理が施されていることを特徴とする。According to a fifth aspect of the present invention, in the polishing method according to the fourth aspect, a chamfering treatment is applied to an edge portion of the workpiece in the moving direction of the polishing tool in the first direction or the opposite direction. It is characterized by
【0025】したがって、弾性を有する部材で形成され
た研磨工具を用いて研磨加工を行った場合において、被
加工物の縁部が面取り処理されていることにより、研磨
工具の一部が被加工物の加工面から離脱して他の一部が
加工面に接触した状態となっても研磨工具と被加工物の
縁部との当接部分における研磨工具の変形状態が緩やか
になり、急峻な変形による研磨工具の破損が防止され
る。また、面取り処理により被加工物の縁部にはバリが
なくなるため、被加工物の縁部に残っていたバリが研磨
工具に巻き込まれて被加工物の加工面に接触し、その加
工面にスクラッチを発生させるということが防止され
る。Therefore, when polishing is performed using a polishing tool formed of an elastic member, the edge of the workpiece is chamfered, so that part of the polishing tool is processed. Even if the polishing tool separates from the machining surface and the other part comes into contact with the machining surface, the deformation state of the polishing tool at the contact part between the polishing tool and the edge of the workpiece becomes gentle, resulting in a sharp deformation. The polishing tool is prevented from being damaged by. Also, since the chamfering process eliminates burrs on the edges of the workpiece, the burrs remaining on the edges of the workpiece are caught in the polishing tool and come into contact with the machining surface of the workpiece. The occurrence of scratches is prevented.
【0026】請求項6記載の発明は、回転する小径の研
磨工具を被加工物の加工面に所定荷重で押し付け、工具
軌跡が平面投影でジグザグ状に切り返されるように前記
研磨工具を移動させて前記加工面を研磨加工する研磨加
工方法において、ジグザグ状に切り返される前記工具軌
跡の先端部分を弧状又は台形状に丸めるようにしたこと
を特徴とする。According to a sixth aspect of the present invention, a rotating small-diameter polishing tool is pressed against the processing surface of the workpiece with a predetermined load, and the polishing tool is moved so that the tool path is cut back in a zigzag shape in a plane projection. In the polishing method for polishing the machined surface, the tip portion of the tool locus that is cut back in a zigzag shape is rounded into an arc shape or a trapezoid shape.
【0027】したがって、研磨工具の工具軌跡がジグザ
グ状に切り返される領域では、研磨工具の移動速度の低
下を抑制でき、さらに、工具軌跡の密度を低くすること
ができ、それによって、研磨工具の移動方向が切り返さ
れる領域での過剰研磨を防止することができる。Therefore, in a region where the tool locus of the polishing tool is cut back in a zigzag manner, it is possible to suppress a decrease in the moving speed of the polishing tool and further reduce the density of the tool locus, whereby the movement of the polishing tool is moved. It is possible to prevent excessive polishing in the region where the direction is turned back.
【0028】[0028]
【発明の実施の形態】本発明の第1の実施の形態を図1
ないし図5に基づいて説明する。図1は、光学素子であ
るレンズを成型するための被加工物である金型1の加工
面2を小径の研磨工具3で研磨加工する際の作業形態を
示したものであり、図2はそのときの加工面2上におけ
る研磨工具3の工具軌跡を示す平面図である。この図2
中における長方形状の破線は、その内側部分が光学的有
効領域であり、その外側が光学的不要域であることを示
している。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS FIG. 1 shows a first embodiment of the present invention.
Or, it demonstrates based on FIG. FIG. 1 shows a working mode in which a processing surface 2 of a mold 1 which is a workpiece for molding a lens which is an optical element is polished by a polishing tool 3 having a small diameter. It is a top view which shows the tool locus | trajectory of the polishing tool 3 on the process surface 2 at that time. This Figure 2
The rectangular broken line in the inside indicates that the inner part is the optically effective region and the outer part is the optically unnecessary region.
【0029】研磨工具3は、ウレタン樹脂と木材とを混
練した圧縮部材を整形することにより形成され、外周部
分には砥粒として1/4μm粒径のダイヤモンドペース
トが用いられている。The polishing tool 3 is formed by shaping a compression member obtained by kneading urethane resin and wood, and diamond paste having a particle size of ¼ μm is used as abrasive grains on the outer peripheral portion.
【0030】また、研磨工具3はNC工作機械(図示せ
ず)に連結されて軸心周りに回転駆動されるように設け
られており、加工面2に対しては所定研磨荷重Fで押し
付けられている。さらに、研磨工具3は、加工面2の法
線方向と研磨荷重の方向とが常に一致する傾き調整が行
われるようにNC工作機械に連結されている。The polishing tool 3 is connected to an NC machine tool (not shown) so as to be driven to rotate about its axis, and is pressed against the machined surface 2 with a predetermined polishing load F. ing. Further, the polishing tool 3 is connected to the NC machine tool so that the inclination adjustment in which the normal direction of the processing surface 2 and the direction of the polishing load always match each other is performed.
【0031】研磨工具3による加工面2の研磨加工が行
われるときの研磨工具3の工具軌跡は、図2及び図3
(a)に示したように、金型1の短手方向(副走査方
向)である第1方向(Y方向)又はその逆方向(Y方
向)へ向かう工具軌跡と、第1方向又はその逆方向の端
部においてそのY方向と直交する金型1の長手方向(主
走査方向)である第2方向(X方向)へ向かう微少量の
工具軌跡と、研磨工具3の移動方向が第1方向又はその
逆方向から第2方向へ切り返される領域、及び、第2方
向(X方向)から第1方向(Y方向)又はその逆方向
(Y方向)へ切り返される領域におけるY方向とX方向
との2方向へ同時に向かう工具軌跡とにより形成されて
いる。The tool locus of the polishing tool 3 when the polishing surface 3 is polished by the polishing tool 3 is shown in FIGS.
As shown in (a), the tool path toward the first direction (Y direction), which is the lateral direction (sub-scanning direction) of the mold 1, or the opposite direction (Y direction), and the first direction or the opposite direction. At the end of the direction, a small amount of tool locus toward the second direction (X direction), which is the longitudinal direction (main scanning direction) of the mold 1 orthogonal to the Y direction, and the movement direction of the polishing tool 3 are the first direction. Or, the Y direction and the X direction in the region switched back from the opposite direction to the second direction and the region switched back from the second direction (X direction) to the first direction (Y direction) or the opposite direction (Y direction). It is formed by a tool locus that simultaneously moves in two directions.
【0032】図3(a)は本実施の形態の工具軌跡の一
部を拡大して示したもので、図3(b)は図13に示し
た従来例における工具軌跡の一部を拡大して示したもの
である。図3(a)に示した本実施の形態の工具軌跡、
及び、図3(b)に示した従来例の工具軌跡は、とも
に、NCデータの座標指令点(白丸点)により形成され
ており、本実施の形態では、図3(b)における“P
0”と“P1”とを、図3(a)における“P0S”と
“P1S”とへ移動させることで、X方向とY方向とへ
同時に向かう直線状の工具軌跡が形成されている。な
お、図3(a)、(b)において、“W1”は0.1m
m、“C1”は0.2mm、“C1S”は0.1mmで
ある。FIG. 3A is an enlarged view of a part of the tool locus of the present embodiment, and FIG. 3B is an enlarged view of a part of the tool locus of the conventional example shown in FIG. Is shown. The tool locus of the present embodiment shown in FIG.
Further, both the tool trajectories of the conventional example shown in FIG. 3B are formed by the coordinate command points (white circle points) of the NC data, and in this embodiment, “P” in FIG.
By moving "0" and "P1" to "P0S" and "P1S" in FIG. 3 (a), a linear tool locus heading in the X direction and the Y direction at the same time is formed. , (A), (b), "W1" is 0.1m
m, "C1" is 0.2 mm, and "C1S" is 0.1 mm.
【0033】このような工具軌跡の変更により、図3
(b)に示した従来例では、研磨工具103が“A”点
から“B”点に至るまでの時間が1.0秒であったもの
を、図3(a)に示した本実施の形態では、研磨工具3
が“A”点から“B”点に至るまでの時間を0.4秒に
短縮することができた。これは、Y方向の両端部におけ
る研磨工具3の移動速度の低下を抑制できることを意味
し、移動速度の低下に伴う過剰研磨を防止できることを
意味する。By changing the tool path as described above, FIG.
In the conventional example shown in (b), the time from the point "A" to the point "B" of the polishing tool 103 was 1.0 second. In the form, the polishing tool 3
It was possible to shorten the time from "A" point to "B" point to 0.4 seconds. This means that a decrease in the moving speed of the polishing tool 3 at both ends in the Y direction can be suppressed, and excessive polishing due to the decrease in the moving speed can be prevented.
【0034】さらに、図3(a)と図3(b)とにおい
て示した同面積の長方形領域“S”に含まれる工具軌跡
の長さが、本実施の形態である図3(a)のほうが図3
(b)に示した従来例よりも短くなっている。これは、
Y方向の両端部における同一面積内の工具軌跡の密度が
本実施の形態では従来例に比べて低くなることを意味
し、このことも、Y方向の両端部において過剰研磨を防
止できる一因となる。Further, the length of the tool locus included in the rectangular area "S" having the same area shown in FIGS. 3A and 3B corresponds to that of FIG. Figure 3 is better
It is shorter than the conventional example shown in (b). this is,
This means that the density of tool trajectories in the same area at both ends in the Y direction is lower than that in the conventional example in the present embodiment. This also contributes to preventing excessive polishing at both ends in the Y direction. Become.
【0035】図4は、金型1の副走査方向(Y方向)の
加工面2と、その加工面2上を移動する研磨工具3の移
動範囲とを示したものである。金型1の副走査方向(Y
方向)の幅寸法が2.4mm、弾性を有する研磨工具3
の加工面2との接触幅寸法が約0.8mmであり、NC
工作機械のNCデータにより制御される研磨工具3の移
動幅寸法は1.6mmとなっている。FIG. 4 shows the working surface 2 of the die 1 in the sub-scanning direction (Y direction) and the moving range of the polishing tool 3 moving on the working surface 2. Sub-scanning direction of mold 1 (Y
Direction) width dimension is 2.4 mm, and the polishing tool 3 has elasticity
Has a contact width with the machined surface 2 of about 0.8 mm,
The moving width dimension of the polishing tool 3 controlled by the NC data of the machine tool is 1.6 mm.
【0036】図4のみを見ると、従来例として説明した
図14と同じであるが、本実施の形態により金型1の加
工面2を研磨した場合における副走査方向(Y方向)の
研磨深さは、図5に示すようになっている。即ち、金型
1の副走査方向(Y方向)の両端部には不完全加工域が
0.6mmずつ発生するものの、Y方向の両端側での過
剰研磨部の発生が防止されるので、適正な研磨が行われ
る安定加工域は約1.2mmと広くなり、安定加工域の
割合が大きくなる。Looking only at FIG. 4, which is the same as FIG. 14 described as a conventional example, the polishing depth in the sub-scanning direction (Y direction) when the processed surface 2 of the mold 1 is polished according to the present embodiment. The size is as shown in FIG. That is, the mold
Although incomplete machining areas of 0.6 mm are generated at both ends in the sub-scanning direction (Y direction) of 1, the occurrence of excessive polishing portions at both ends in the Y direction is prevented, so that proper polishing is performed. The stable processing area is about 1.2 mm, which is wide, and the ratio of the stable processing area is large.
【0037】なお、本実施の形態では、副走査方向(Y
方向)の両端側における研磨工具3のY方向とX方向と
への同時に向かう工具軌跡を直線状に形成した場合を例
に挙げて説明したが、座標指令点の数を増やして円弧状
に配列することにより円弧状に形成してもよい。In this embodiment, the sub-scanning direction (Y
The description has been given by taking as an example the case where the tool trajectories of the polishing tool 3 on both ends of the (direction) are formed linearly in the Y direction and the X direction at the same time, but the number of coordinate command points is increased and arranged in an arc shape. You may form in an arc shape by doing.
【0038】また、本実施の形態では、金型1を位置固
定として研磨工具3を移動させる場合を例に挙げて説明
したが、研磨工具3を位置固定として金型1を移動させ
るようにしてもよい。In this embodiment, the case where the mold 1 is fixed and the polishing tool 3 is moved has been described as an example. However, the mold 1 is moved while the position of the polishing tool 3 is fixed. Good.
【0039】つぎに、本発明の第2の実施の形態を図6
に基づいて説明する。なお、第1の実施の形態(図1な
いし図5)において説明した部分と同じ部分は同じ符号
で示し、説明も省略する(以下の実施の形態でも同
じ)。Next, a second embodiment of the present invention will be described with reference to FIG.
It will be described based on. The same parts as those described in the first embodiment (FIGS. 1 to 5) are designated by the same reference numerals, and the description thereof will be omitted (the same applies to the following embodiments).
【0040】本実施の形態も第1の実施の形態と同じよ
うに、副走査方向(Y方向)の両端側において研磨工具
(図示せず)の移動速度の低下を抑制し、及び、副走査
方向(Y方向)の両端側において研磨工具の工具軌跡の
密度を低くすることにより、副走査方向の両端側(研磨
工具の移動方向が切り返される領域)での過剰研磨を防
止するようにしたものである。In the present embodiment, as in the first embodiment, the decrease in the moving speed of the polishing tool (not shown) is suppressed at both ends in the sub-scanning direction (Y direction), and the sub-scanning is performed. By lowering the density of the tool path of the polishing tool at both ends in the direction (Y direction), excessive polishing is prevented at both ends in the sub-scanning direction (the region where the movement direction of the polishing tool is switched back). Is.
【0041】そのために本実施の形態では、NCデータ
の座標指令点は図3(b)に示した従来例と同じにして
おき、位置決めサーボのチューニング又はパラメータの
変更によりNC工作機械の応答速度を調整し、工具軌跡
を、Y方向とX方向との内側を近回りさせるようにした
ものである。Therefore, in this embodiment, the coordinate command point of the NC data is the same as that of the conventional example shown in FIG. 3B, and the response speed of the NC machine tool is adjusted by tuning the positioning servo or changing the parameters. The tool path is adjusted so that the inside of the Y-direction and the X-direction is moved closer to the inside.
【0042】つぎに、本発明の第3の実施の形態を図7
ないし図9に基づいて説明する。本実施の形態では、研
磨工具3の副走査方向(Y方向)への最大移動位置が、
図7に示すように、研磨工具3の一部が金型1の加工面
2から離脱して他の一部が加工面2に接触した位置とな
り、研磨工具3の副走査方向の移動幅寸法は2.4mm
となっている。Next, a third embodiment of the present invention will be described with reference to FIG.
Or, it demonstrates based on FIG. In the present embodiment, the maximum movement position of the polishing tool 3 in the sub-scanning direction (Y direction) is
As shown in FIG. 7, a part of the polishing tool 3 is separated from the processing surface 2 of the mold 1 and the other part comes into contact with the processing surface 2, and the moving width dimension of the polishing tool 3 in the sub-scanning direction is reached. Is 2.4 mm
Has become.
【0043】さらに、金型1における副走査方向の縁部
に面取部4が形成されている。この面取部4は、曲率半
径が0.1mm以上に形成されている。Further, a chamfered portion 4 is formed on the edge of the die 1 in the sub-scanning direction. The chamfered portion 4 has a radius of curvature of 0.1 mm or more.
【0044】このような構成において、研磨工具3を副
走査方向(Y方向)へ移動させる場合において、研磨工
具3の移動幅を、金型1の副走査方向幅と略同じにする
ことができる。これにより、金型1の加工面2における
副走査方向の両端側の研磨残し領域が少なくなり、図9
に示すように、安定加工域が約2.0mmと広くなり、
安定加工域の割合が大きくなる。In such a structure, when the polishing tool 3 is moved in the sub-scanning direction (Y direction), the moving width of the polishing tool 3 can be made substantially the same as the width of the mold 1 in the sub-scanning direction. . As a result, the unpolished regions on both ends of the processed surface 2 of the die 1 in the sub-scanning direction are reduced, and FIG.
As shown in, the stable machining area is widened to about 2.0 mm,
The ratio of stable processing area increases.
【0045】さらに本実施の形態では、金型1における
副走査方向の両端の縁部に面取部4が形成されているの
で、図8(a)に示すように、研磨工具3の一部が金型
1の加工面2から離脱して他の一部が加工面2に接触し
た状態となっても研磨工具3と金型1の縁部との当接部
分における研磨工具3の変形状態が緩やかになり、研磨
工具3の破損が防止される。また、面取部4の形成によ
り、金型1の縁部からはバリが確実に除去されることに
なるので、金型1の縁部に残っていたバリが研磨加工に
伴って研磨工具3に巻き込まれ、巻き込まれたバリが金
型1の加工面2に接触して加工面2にスクラッチを発生
させるということを防止できる。Further, in this embodiment, since the chamfered portions 4 are formed at the edges of the mold 1 at both ends in the sub-scanning direction, as shown in FIG. Even if the tool is separated from the processing surface 2 of the mold 1 and a part of the tool 1 contacts the processing surface 2, the polishing tool 3 is deformed at the contact portion between the polishing tool 3 and the edge of the mold 1. Becomes gentle and damage to the polishing tool 3 is prevented. In addition, since the burr is reliably removed from the edge of the mold 1 by forming the chamfered portion 4, the burr remaining on the edge of the mold 1 is polished by the polishing tool 3 along with the polishing process. It is possible to prevent the burrs that are caught in the work surface 2 from contacting the work surface 2 of the mold 1 and causing scratches on the work surface 2.
【0046】一方、図8(b)は金型1の縁部に面取り
を行わない場合を示している。金型1の縁部に面取りを
行わない場合には、研磨工具3の一部が金型1の加工面
2から離脱して他の一部が加工面2に接触した状態とな
ったときに、研磨工具3における金型1の縁部との接触
部分に急峻な変形が生じ、その変形により研磨工具3が
破損しやすくなる。さらに、金型1の縁部にバリが残っ
ているという事態も発生しやすく、そのバリが研磨工具
3に巻き込まれた後に加工面2に接触して加工面2にス
クラッチを発生させることがある。On the other hand, FIG. 8B shows a case where the edge of the mold 1 is not chamfered. When chamfering is not performed on the edge of the mold 1, when a part of the polishing tool 3 is separated from the working surface 2 of the mold 1 and another part is in contact with the working surface 2. A sharp deformation occurs in the contact portion of the polishing tool 3 with the edge of the die 1, and the deformation easily damages the polishing tool 3. Furthermore, a situation in which burrs remain on the edge of the mold 1 is likely to occur, and the burrs may come into contact with the machining surface 2 after being caught by the polishing tool 3 to cause scratches on the machining surface 2. .
【0047】なお、本実施の形態では、面取部4を弧状
に形成した場合を例に挙げて説明したが、直角二等辺三
角形状に面取りしてもよい。その場合には、面取部の1
辺を0.1mm以上とすることにより、研磨工具3がそ
の面取部に接触したときにおける急峻な変形の発生を防
止でき、そのような変形による研磨工具3の破損を防止
できる。In the present embodiment, the case where the chamfered portion 4 is formed in an arc shape has been described as an example, but the chamfered portion may be chamfered in the shape of an isosceles right triangle. In that case, 1 of the chamfer
By setting the side to 0.1 mm or more, it is possible to prevent the occurrence of sharp deformation when the polishing tool 3 comes into contact with the chamfered portion, and it is possible to prevent damage to the polishing tool 3 due to such deformation.
【0048】また、本実施の形態では、金型1の縁部に
面取部4を形成し、弾性を有する研磨工具3の一部が金
型1の加工面2から離脱して他の一部が加工面2に接触
した状態となったときに、研磨工具3と金型1の縁部と
の当接部分における研磨工具3の急峻な変形を防止する
ようにした場合について説明している。しかし、研磨工
具の硬度を高くし、その研磨工具の一部が金型1の加工
面2から離脱して他の一部が加工面2に接触した状態と
なった場合でも研磨工具の変形量を僅かにすることによ
り、金型1の縁部における面取りは必ずしも必要とはな
らない。Further, in the present embodiment, the chamfered portion 4 is formed at the edge of the die 1, and a part of the polishing tool 3 having elasticity is separated from the working surface 2 of the die 1 and the other surface is removed. Described below is a case in which the sharp deformation of the polishing tool 3 at the contact portion between the polishing tool 3 and the edge of the mold 1 is prevented when the portion comes into contact with the processing surface 2. . However, even when the hardness of the polishing tool is increased and a part of the polishing tool is separated from the processing surface 2 of the die 1 and another part is in contact with the processing surface 2, the amount of deformation of the polishing tool The chamfering at the edge of the mold 1 is not always necessary by making the number of the two small.
【0049】つぎに、本発明の第4の実施の形態を図1
0に基づいて説明する。本実施の形態は、図10(b)
に示すように、工具軌跡が平面投影でジグザグ状(N字
状)になるように切り返されて研磨が行われる場合にお
いて、その工具軌跡の先端部分を図10(a)に示すよ
うに台形状に丸めたものである。Next, a fourth embodiment of the present invention will be described with reference to FIG.
A description will be given based on 0. This embodiment is shown in FIG.
As shown in Fig. 10, when the tool locus is cut back so as to have a zigzag shape (N-shaped) in a plane projection and polishing is performed, the tip end portion of the tool locus is trapezoidal as shown in Fig. 10A. It is a rounded one.
【0050】工具軌跡の先端部を台形状に丸める方式と
しては、第1の実施の形態(図5)で説明したように、
NCデータの座標指令点を変更する方式が採用されてい
る。As a method of rounding the tip of the tool path into a trapezoidal shape, as described in the first embodiment (FIG. 5),
A method of changing the coordinate command point of NC data is adopted.
【0051】このように、ジグザグ状の工具軌跡の先端
部分を台形状に丸めることにより、その工具軌跡が切り
返される領域において、研磨工具の移動速度の低下を抑
制でき、さらに、工具軌跡の密度を低くすることがで
き、それによって、研磨工具の移動方向が切り返される
領域での過剰研磨を防止することができ、金型の加工面
における安定加工域の割合を大きくすることができる。By thus rounding the tip of the zigzag tool locus into a trapezoidal shape, it is possible to suppress a decrease in the moving speed of the polishing tool in the region where the tool locus is cut back, and to further reduce the density of the tool loci. It can be made low, whereby excessive polishing in the region where the moving direction of the polishing tool is turned back can be prevented, and the ratio of the stable processing area on the processing surface of the die can be increased.
【0052】つぎに、本発明の第5の実施の形態を図1
1に基づいて説明する。本実施の形態は、図11(b)
に示すように、工具軌跡が平面投影でジグザグ状(三角
波状)になるように切り返されて研磨が行われる場合に
おいて、その工具軌跡の先端部分を図11(a)に示す
ように弧状に丸めたものである。Next, a fifth embodiment of the present invention will be described with reference to FIG.
It will be described based on 1. This embodiment is shown in FIG.
As shown in Fig. 11, when the tool locus is cut back so as to have a zigzag shape (triangular wave shape) in plane projection and polishing is performed, the tip end portion of the tool locus is rounded into an arc shape as shown in Fig. 11 (a). It is a thing.
【0053】工具軌跡の先端部を弧状に丸める方式とし
ては、第2の実施の形態(図6)で説明したように、N
Cデータの座標指令点は変更せず、位置決めサーボのチ
ューニング又はパラメータの変更によりNC工作機械の
応答速度を調整し、工具軌跡の先端側においてその内側
を近回りさせる方式が採用されている。As a method of rounding the tip of the tool path in an arc shape, as described in the second embodiment (FIG. 6), N is used.
A method is adopted in which the response speed of the NC machine tool is adjusted by tuning the positioning servo or changing the parameters without changing the coordinate command point of the C data, and the inner side of the tool path is moved closer to the tip side.
【0054】このように、ジグザグ状の工具軌跡の先端
部分を弧状に丸めることにより、その工具軌跡が切り返
される領域において、研磨工具の移動速度の低下を抑制
でき、さらに、工具軌跡の密度を低くすることができ、
それによって、研磨工具の移動方向が切り返される領域
での過剰研磨を防止することができ、金型の加工面にお
ける安定加工域の割合を大きくすることができる。As described above, by rounding the tip end portion of the zigzag tool locus in an arc shape, it is possible to suppress the decrease in the moving speed of the polishing tool in the region where the tool locus is cut back, and further to reduce the density of the tool locus. You can
As a result, it is possible to prevent excessive polishing in the region where the movement direction of the polishing tool is switched back, and it is possible to increase the ratio of the stable processing region on the processing surface of the die.
【0055】[0055]
【発明の効果】請求項1記載の発明の研磨加工方法によ
れば、研磨工具の相対的な移動方向が第1方向又はその
逆方向から第2方向へ切り返される領域、及び、第2方
向から第1方向又はその逆方向へ切り返される領域で、
研磨工具を第1方向又はその逆方向と第2方向との2方
向へ同時に向かう工具軌跡上を移動させるようにしたの
で、研磨工具の移動方向が第1方向又はその逆方向から
第2方向へ、及び、第2方向から第1方向又はその逆方
向へ切り返される領域においては、研磨工具の移動速度
の低下を抑制でき、さらに、工具軌跡の密度を低くする
ことができ、それによって、研磨工具の移動方向が切り
返される領域での過剰研磨を防止することができ、精度
の良い研磨加工を行うことができる。According to the polishing method of the present invention, the relative movement direction of the polishing tool is changed from the first direction or the opposite direction to the second direction, and from the second direction. In the area that is cut back in the first direction or the opposite direction,
Since the polishing tool is moved on the tool locus that simultaneously moves in the first direction or the opposite direction and the second direction, the movement direction of the polishing tool changes from the first direction or the opposite direction to the second direction. And, in the region where the second direction is switched back to the first direction or the opposite direction, it is possible to suppress a decrease in the moving speed of the polishing tool, and further it is possible to reduce the density of the tool locus, whereby the polishing tool It is possible to prevent excessive polishing in a region where the movement direction of the is cut back, and it is possible to perform accurate polishing processing.
【0056】請求項2記載の発明によれば、請求項1記
載の研磨加工方法において、前記工具軌跡はNC工作機
械のNCデータの座標指令点で形成され、第1方向又は
その逆方向と第2方向との2方向へ同時に移動する区間
の前記工具軌跡は直線又は円弧で形成されているので、
このような工具軌跡の設定を、NC工作機械の通常のG
コードコマンドにより容易に行うことができる。According to the second aspect of the present invention, in the polishing method according to the first aspect, the tool locus is formed by the coordinate command points of the NC data of the NC machine tool, and the first direction or the reverse direction thereof is used. Since the tool locus in the section that moves in two directions simultaneously with two directions is formed by a straight line or an arc,
This kind of tool locus setting is used for normal NC machine tool G
It can be easily done by a code command.
【0057】請求項3記載の発明によれば、請求項1記
載の研磨加工方法において、前記工具軌跡はNC工作機
械の応答速度を調整することで形成され、第1方向又は
その逆方向と第2方向との2方向へ同時に移動する区間
の前記工具軌跡は第1方向又はその逆方向と第2方向と
の内側を近回りするように形成されているので、このよ
うな工具軌跡の設定を、NCデータを修正することな
く、NC工作機械の位置決めサーボのチューニング又は
パラメータ設定のみで容易に行うことができる。According to the third aspect of the present invention, in the polishing method according to the first aspect, the tool locus is formed by adjusting the response speed of the NC machine tool. Since the tool locus in the section that moves in two directions at the same time as the two directions is formed so as to make a short cut inside the first direction or the opposite direction and the second direction, setting of such a tool locus is performed. , NC data can be easily adjusted only by tuning the positioning servo of the NC machine tool or setting parameters without modifying the NC data.
【0058】請求項4記載の発明の研磨加工方法によれ
ば、研磨工具の第1方向又はその逆方向への最大移動位
置を、前記研磨工具の一部が被加工物の加工面から離脱
して他の一部が前記加工面に接触した位置としたので、
研磨工具を第1方向又はその逆方向へ移動させる場合に
おける研磨工具の移動幅を増大させることができ、これ
により、被加工物の加工面における第1方向の両端側の
研磨残し領域が少なくなり、安定加工域の割合を高くす
ることができる。According to the polishing method of the invention described in claim 4, a part of the polishing tool is separated from the processing surface of the workpiece at the maximum movement position of the polishing tool in the first direction or the opposite direction. Since the other part is in a position where it contacts the processed surface,
It is possible to increase the movement width of the polishing tool when the polishing tool is moved in the first direction or the opposite direction, and this reduces the remaining polishing area on both sides of the processed surface of the workpiece in the first direction. The ratio of the stable processing area can be increased.
【0059】請求項5記載の発明によれば、請求項4記
載の研磨加工方法において、前記被加工物における前記
研磨工具の第1方向又はその逆方向への移動方向の縁部
に面取り処理が施されているので、弾性を有する部材で
形成された研磨工具を用いて研磨加工を行った場合にお
いて、被加工物の縁部が面取り処理されていることによ
り、研磨工具の一部が被加工物の加工面から離脱して他
の一部が加工面に接触した状態となっても研磨工具と被
加工物の縁部との当接部分における研磨工具の変形状態
が緩やかになり、急峻な変形による研磨工具の破損を防
止することができ、さらに、面取り処理により被加工物
の縁部にはバリがなくなるため、被加工物の縁部に残っ
ていたバリが研磨工具に巻き込まれることが原因となる
被加工物の加工面のスクラッチ発生を防止できる。According to the invention of claim 5, in the polishing method of claim 4, chamfering treatment is applied to the edge of the workpiece in the moving direction of the polishing tool in the first direction or the opposite direction. Therefore, when polishing is performed using a polishing tool formed of an elastic material, the edge of the workpiece is chamfered, so that part of the polishing tool is processed. Even if the polishing tool is detached from the machined surface and some other part is in contact with the machined surface, the deformed state of the polishing tool at the contact portion between the polishing tool and the edge of the workpiece becomes gentle and sharp. It is possible to prevent damage to the polishing tool due to deformation, and since chamfering eliminates burrs on the edge of the workpiece, the burrs remaining on the edge of the workpiece may be caught in the polishing tool. Machining surface of the work piece causing the problem A scratch occurrence can be prevented.
【0060】請求項6記載の発明の研磨加工方法によれ
ば、工具軌跡が平面投影でジグザグ状に切り返されるよ
うに前記研磨工具を移動させて被加工物の加工面を研磨
加工する場合において、ジグザグ状に切り返される工具
軌跡の先端部分を弧状又は台形状に丸めるようにしたこ
とにより、その先端部分において、研磨工具の移動速度
の低下を抑制でき、さらに、工具軌跡の密度を低くする
ことができ、それによって、研磨工具の移動方向が切り
返される領域での過剰研磨を防止することができ、精度
の良い研磨加工を行うことができる。According to the polishing method of the invention described in claim 6, when the polishing tool is moved so that the tool path is cut back in a zigzag shape by plane projection, the surface to be processed of the workpiece is polished. By rounding the tip part of the tool path cut back in a zigzag shape into an arc shape or a trapezoidal shape, it is possible to suppress a decrease in the moving speed of the polishing tool at the tip part and further reduce the density of the tool path. This makes it possible to prevent excessive polishing in a region where the moving direction of the polishing tool is switched back, and it is possible to perform accurate polishing processing.
【図1】本発明の第1の実施の形態における研磨加工の
作業形態を示した斜視図である。FIG. 1 is a perspective view showing a work mode of polishing processing according to a first embodiment of the present invention.
【図2】加工面上における研磨工具の工具軌跡を示す平
面図である。FIG. 2 is a plan view showing a tool locus of a polishing tool on a processing surface.
【図3】(a)は研磨工具の工具軌跡の一部を拡大して
示した平面図、(b)は従来例における研磨工具の工具
軌跡の一部を拡大して示した平面図である。FIG. 3A is an enlarged plan view showing a part of a tool locus of a polishing tool, and FIG. 3B is an enlarged plan view showing a part of a tool locus of a polishing tool in a conventional example. .
【図4】金型の副走査方向(Y方向)の加工面上を移動
する研磨工具の移動範囲を示した断面図である。FIG. 4 is a cross-sectional view showing a movement range of a polishing tool that moves on a processing surface of a die in a sub-scanning direction (Y direction).
【図5】金型の加工面を研磨した場合における副走査方
向(Y方向)の研磨深さを示すグラフである。FIG. 5 is a graph showing the polishing depth in the sub-scanning direction (Y direction) when the processed surface of the die is polished.
【図6】本発明の第2の実施の形態における研磨工具の
工具軌跡の一部を拡大して示した平面図である。FIG. 6 is an enlarged plan view showing a part of a tool locus of a polishing tool according to a second embodiment of the present invention.
【図7】本発明の第3の実施の形態における、金型の副
走査方向(Y方向)の加工面上を移動する研磨工具の移
動範囲を示した断面図である。FIG. 7 is a cross-sectional view showing a movement range of a polishing tool that moves on a machining surface of a die in a sub-scanning direction (Y direction) according to a third embodiment of the present invention.
【図8】金型の副走査方向の縁部に面取部を形成した場
合(a)と、面取部を形成しない場合(b)とにおける
研磨工具の変形状態を示す断面図である。FIG. 8 is a cross-sectional view showing a deformed state of the polishing tool in a case where a chamfered portion is formed on an edge of the mold in the sub-scanning direction (a) and a case where the chamfered portion is not formed (b).
【図9】金型の加工面を研磨した場合における副走査方
向(Y方向)の研磨深さを示すグラフである。FIG. 9 is a graph showing the polishing depth in the sub-scanning direction (Y direction) when the processed surface of the die is polished.
【図10】本発明の第4の実施の形態における研磨工具
の工具軌跡(a)を、従来例の工具軌跡(b)と比較し
て示した平面図である。FIG. 10 is a plan view showing a tool locus (a) of a polishing tool according to a fourth embodiment of the present invention in comparison with a tool locus (b) of a conventional example.
【図11】本発明の第5の実施の形態における研磨工具
の工具軌跡(a)を、従来例の工具軌跡(b)と比較し
て示した平面図である。FIG. 11 is a plan view showing a tool locus (a) of a polishing tool according to a fifth embodiment of the present invention in comparison with a tool locus (b) of a conventional example.
【図12】従来例における研磨加工の作業形態を示した
斜視図である。FIG. 12 is a perspective view showing a working mode of polishing in a conventional example.
【図13】加工面上における研磨工具の工具軌跡を示す
平面図である。FIG. 13 is a plan view showing a tool locus of a polishing tool on a processing surface.
【図14】金型の副走査方向(Y方向)の加工面上を移
動する研磨工具の移動範囲を示した断面図である。FIG. 14 is a cross-sectional view showing a movement range of a polishing tool that moves on a processing surface of a die in a sub-scanning direction (Y direction).
【図15】金型の加工面を研磨した場合における副走査
方向(Y方向)の研磨深さを示すグラフである。FIG. 15 is a graph showing the polishing depth in the sub-scanning direction (Y direction) when the processed surface of the die is polished.
1 被加工物 2 加工面 3 研磨工具 1 Workpiece 2 Processing surface 3 polishing tools
Claims (6)
工面に所定荷重で押し付けて相対的に第1方向又はその
逆方向へ移動させ、第1方向又はその逆方向の所定位置
まで移動させた後にその移動方向と略直交する第2方向
へ相対的に微少量移動させる切り返しを繰り返すことで
前記加工面を研磨加工する研磨加工方法において、 前記研磨工具の相対的な移動方向が第1方向又はその逆
方向から第2方向へ切り返される領域、及び、第2方向
から第1方向又はその逆方向へ切り返される領域で、前
記研磨工具を第1方向又はその逆方向と第2方向との2
方向へ同時に向かう工具軌跡上を移動させるようにした
ことを特徴とする研磨加工方法。1. A rotating small-diameter polishing tool is pressed against a work surface of a workpiece with a predetermined load to relatively move in a first direction or a reverse direction thereof, and moves to a predetermined position in the first direction or a reverse direction thereof. In the polishing processing method of polishing the processed surface by repeating the cutting back in which a relatively small amount is moved in a second direction substantially orthogonal to the moving direction, the relative movement direction of the polishing tool is the first. Of the polishing tool in the first direction or in the opposite direction and in the second direction, and in the area that is cut back in the second direction from the direction or the opposite direction, and in the area that is turned back in the first direction or the opposite direction from the second direction. Two
A polishing method characterized in that the polishing tool is moved on tool trajectories that simultaneously move in the same direction.
タの座標指令点で形成され、第1方向又はその逆方向と
第2方向との2方向へ同時に移動する区間の前記工具軌
跡は直線又は円弧で形成されていることを特徴とする請
求項1記載の研磨加工方法。2. The tool locus is formed by coordinate command points of NC data of an NC machine tool, and the tool locus in a section that moves simultaneously in the first direction or in the opposite direction and in the second direction is a straight line or The polishing processing method according to claim 1, wherein the polishing processing is formed by an arc.
を調整することで形成され、第1方向又はその逆方向と
第2方向との2方向へ同時に移動する区間の前記工具軌
跡は第1方向又はその逆方向と第2方向との内側を近回
りするように形成されていることを特徴とする請求項1
記載の研磨加工方法。3. The tool locus is formed by adjusting a response speed of an NC machine tool, and the tool locus in a section that moves simultaneously in a first direction or two directions of an opposite direction and a second direction has a first direction. It is formed so as to go around the inner side of the second direction and the opposite direction or the opposite direction.
The polishing method described.
工面に所定荷重で押し付けて相対的に第1方向又はその
逆方向へ移動させ、第1方向又はその逆方向の所定位置
まで移動させた後にその移動方向と略直交する第2方向
へ相対的に微少量移動させる切り返しを繰り返すことで
前記加工面を研磨加工する研磨加工方法において、 前記研磨工具の第1方向又はその逆方向への最大移動位
置を、前記研磨工具の一部が前記被加工物の前記加工面
から離脱して他の一部が前記加工面に接触した位置とし
たことを特徴とする研磨加工方法。4. A rotating small-diameter polishing tool is pressed against a work surface of a workpiece with a predetermined load to relatively move in a first direction or a reverse direction thereof, and moves to a predetermined position in the first direction or a reverse direction thereof. In the polishing processing method of polishing the processed surface by repeating the turning back and forth, in which a relatively small amount is moved in a second direction substantially orthogonal to the moving direction, in the first direction of the polishing tool or in the opposite direction. The maximum movement position of the polishing tool is a position where a part of the polishing tool is separated from the processing surface of the workpiece and another part is in contact with the processing surface.
1方向又はその逆方向への移動方向の縁部に面取り処理
が施されていることを特徴とする請求項4記載の研磨加
工方法。5. The polishing method according to claim 4, wherein a chamfering treatment is applied to an edge portion of the workpiece in the moving direction of the polishing tool in the first direction or the opposite direction.
工面に所定荷重で押し付け、工具軌跡が平面投影でジグ
ザグ状に切り返されるように前記研磨工具を移動させて
前記加工面を研磨加工する研磨加工方法において、 ジグザグ状に切り返される前記工具軌跡の先端部分を弧
状又は台形状に丸めるようにしたことを特徴とする研磨
加工方法。6. A polishing tool is applied to a rotating small-diameter polishing tool against a work surface of a workpiece with a predetermined load, and the polishing tool is moved so that the tool path is cut back in a zigzag shape by plane projection. In the polishing method described above, the tip portion of the tool locus that is cut back in a zigzag shape is rounded into an arc shape or a trapezoid shape.
Priority Applications (1)
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JP2001326051A JP3885993B2 (en) | 2001-10-24 | 2001-10-24 | Polishing method |
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Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2013220510A (en) * | 2012-04-17 | 2013-10-28 | Xebec Technology Co Ltd | Method and device for polishing curved surface |
KR102027934B1 (en) * | 2018-06-14 | 2019-10-02 | 홍기수 | Grinding Apparatus Of Pallet Steel Plate For Brick Manufacturing |
-
2001
- 2001-10-24 JP JP2001326051A patent/JP3885993B2/en not_active Expired - Fee Related
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2013220510A (en) * | 2012-04-17 | 2013-10-28 | Xebec Technology Co Ltd | Method and device for polishing curved surface |
KR102027934B1 (en) * | 2018-06-14 | 2019-10-02 | 홍기수 | Grinding Apparatus Of Pallet Steel Plate For Brick Manufacturing |
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