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JP2003112103A - Coating apparatus, coating method, and apparatus and method for producing color filter - Google Patents

Coating apparatus, coating method, and apparatus and method for producing color filter

Info

Publication number
JP2003112103A
JP2003112103A JP2001305177A JP2001305177A JP2003112103A JP 2003112103 A JP2003112103 A JP 2003112103A JP 2001305177 A JP2001305177 A JP 2001305177A JP 2001305177 A JP2001305177 A JP 2001305177A JP 2003112103 A JP2003112103 A JP 2003112103A
Authority
JP
Japan
Prior art keywords
coating
discharge port
longitudinal direction
slit die
tip
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2001305177A
Other languages
Japanese (ja)
Other versions
JP2003112103A5 (en
Inventor
Kiyoshi Minoura
潔 箕浦
Yoshiyuki Kitamura
義之 北村
Kei Kamiya
径 神谷
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toray Industries Inc
Original Assignee
Toray Industries Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toray Industries Inc filed Critical Toray Industries Inc
Priority to JP2001305177A priority Critical patent/JP2003112103A/en
Publication of JP2003112103A publication Critical patent/JP2003112103A/en
Publication of JP2003112103A5 publication Critical patent/JP2003112103A5/ja
Pending legal-status Critical Current

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  • Application Of Or Painting With Fluid Materials (AREA)
  • Coating Apparatus (AREA)
  • Optical Filters (AREA)
  • Liquid Crystal (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a coating apparatus, a coating method, a color filter production apparatus, and a color filter production method capable of providing a high film thickness precision in a coating width direction, causing no solidification and accumulation of a coating liquid in slopes of cut and rising parts and in edges of step parts, preventing stripe-like defects of a coating film even if a large number of substrates are coated one by one. SOLUTION: The coating apparatus has a spraying port extending in one direction for spraying a coating liquid to a substrate positioned oppositely and has a length of the edge face in the longitudinal direction in which the spraying port is formed made longer than the length of the spraying port in the longitudinal direction by 0 to 2 mm in each end side and also has inclined faces continuous to the edge face at 5 to 90 degree to the edge face in both ends sides in the longitudinal direction of the edge face.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】この発明は、液晶ディスプレ
イ用カラーフィルター、光学フィルター、コーティング
フィルムなどの製造分野において好ましく使用されるも
ので、詳しくは、ガラス、フィルム等の被塗布基材に、
塗布幅方向での濡れ拡がりによる膜厚精度低下を防止で
きる塗布器および塗布方法、ならびにこれらを用いたカ
ラーフィルター製造装置および製造方法に関するもので
ある。
TECHNICAL FIELD The present invention is preferably used in the field of manufacturing color filters for liquid crystal displays, optical filters, coating films and the like.
The present invention relates to an applicator and a coating method capable of preventing deterioration in film thickness accuracy due to wetting and spreading in the coating width direction, and a color filter manufacturing apparatus and manufacturing method using the same.

【0002】[0002]

【従来の技術】幅方向に均一に塗布液を塗布する手段と
して、スリット状の吐出口を持つ塗布器から塗布液を一
定間隔離れた基材に吐出して塗布を行うダイコータがあ
り、フィルム等の連続基材、ガラス等の枚葉状基材への
塗布に適用されている。ところで、ダイコータで低粘度
の塗布液を塗布すると、塗布器の吐出口から吐出された
塗布液が塗布されながら、基材と塗布器の間の狭い隙間
を毛細管現象で濡れ拡がり、実際の吐出口よりも広い範
囲で塗布されてしまう。この場合、塗布幅方向端部の塗
膜は、この濡れ拡がりのために、膜厚が極端に低下し
て、所定の膜厚精度が得られない。この塗布幅方向の濡
れ拡がりを防止する塗布器として、特開平6−1703
06号公報、特開平9−131560号公報に記載され
たものがある。これらによると、吐出口を含む塗布器先
端面の端部に切り欠き、又は、段差を設けて、基材と塗
布器の間の濡れ拡がりを一定の場所で止まるようにし
て、基材裏面への塗布液の廻り込みを防止する。
2. Description of the Related Art As a means for uniformly applying a coating liquid in the width direction, there is a die coater for discharging the coating liquid from a coating device having a slit-shaped discharge port to a base material at a constant distance, for coating a film or the like. It is applied to the continuous base material of (1) and the single-wafer base material such as glass. By the way, when a low-viscosity coating liquid is applied using a die coater, the coating liquid discharged from the discharge port of the applicator spreads through the narrow gap between the base material and the applicator due to the capillary phenomenon, and the actual discharge port is applied. It will be applied in a wider range than. In this case, the coating film at the end portion in the coating width direction has a film thickness extremely reduced due to the wetting and spreading, and a predetermined film thickness accuracy cannot be obtained. As an applicator for preventing this wetting and spreading in the application width direction, Japanese Patent Application Laid-Open No. 6-1703.
06 and Japanese Patent Application Laid-Open No. 9-131560. According to these, a notch or a step is provided at the end of the applicator tip surface including the discharge port, so that the wetting and spreading between the base material and the applicator is stopped at a certain place, and To prevent the coating liquid from wrapping around.

【0003】[0003]

【発明が解決しようとする課題】ところが、上記の発明
の塗布器は、基材裏面への塗布液の廻り込みを防止する
程度には十分であるが、切り欠き、又は、段差部の最適
な形状が明確に規定されていないために、塗布液の濡れ
拡がりを狭い範囲内で完全に抑制することができず、塗
布幅方向端部で高い膜厚精度を得るまでには至っていな
い。また、枚葉状の基材の塗布では、一枚毎の塗布の前
または後で、吐出口に付着した塗布液を除去して清掃す
る工程が必要であるが、この濡れ拡がりを防止するため
に端部に切り欠き、段差を有する塗布器では、清掃を行
い難いため、切り欠き、又は、段差部に塗布液が残存
し、塗布枚数を重ねるうちに、残存した塗布液が固化、
蓄積して、これが塗布中に塗膜と接触することにより、
塗膜へのスジ欠点を発生させる。
However, the applicator of the invention described above is sufficient to prevent the coating liquid from wrapping around the back surface of the base material, but it is most suitable for notches or stepped portions. Since the shape is not clearly defined, wetting and spreading of the coating liquid cannot be completely suppressed within a narrow range, and high film thickness accuracy cannot be obtained at the end portion in the coating width direction. Further, in the application of a sheet-shaped base material, before or after the application of each sheet, a step of removing and cleaning the application liquid adhering to the discharge port is necessary, but in order to prevent this wetting and spreading, In the applicator having a notch at the end and a step, it is difficult to perform cleaning.Therefore, the notch, or the coating solution remains at the step, and the coating liquid that remains remains solidifies as the number of coatings is accumulated,
By accumulating and contacting the coating during application,
Causes streak defects on the coating film.

【0004】この発明は上述の問題点を解決するために
なされたものであり、その目的とするところは、塗布器
端部の切り欠き部の最適な形状を規定して、短い区間で
濡れ拡がりを阻止して、塗布幅方向端部で高い膜厚精度
を得るとともに、枚葉状の基板を多数枚塗布しても、切
り欠き部、又は、段差部のエッジで塗布液の固化・蓄積
を発生させず、塗膜へのスジ欠点を防止できる塗布器お
よび塗布方法、ならびにカラーフィルター製造装置およ
び製造方法を提供することにある。
The present invention has been made in order to solve the above-mentioned problems, and an object thereof is to define an optimum shape of a cutout portion at the end of an applicator so as to spread wet in a short section. To achieve high film thickness accuracy at the edges in the coating width direction, and even when a large number of single-wafer substrates are coated, solidification / accumulation of coating liquid occurs at the edges of the cutouts or steps. It is an object of the present invention to provide an applicator and a coating method capable of preventing streak defects on a coating film, and a color filter manufacturing apparatus and a manufacturing method without performing the above process.

【0005】[0005]

【課題を解決するための手段】上記の目的は以下の発明
によって達成される。本発明に係る塗布器は、塗布液を
対向して位置する基材に吐出するための一方向に延びる
吐出口を有する塗布器であって、該吐出口が形成された
先端面の長手方向の長さが、該吐出口の長手方向の長さ
より片端あたり0〜2mm長く、さらに、前記先端面の
長手方向の両端部には前記先端面に対して5〜90度の
角度をなす斜面が連なっていることを特徴とする。
The above objects can be achieved by the following inventions. An applicator according to the present invention is an applicator having a discharge port extending in one direction for discharging a coating liquid to a substrate located opposite to the base, and the discharge port is formed in a longitudinal direction of a front end surface. The length is 0 to 2 mm longer at one end than the length in the longitudinal direction of the discharge port, and further, both end portions in the longitudinal direction of the tip end face are connected with slopes forming an angle of 5 to 90 degrees with respect to the tip end face. It is characterized by

【0006】ここで、本塗布器は、下記a及びbの要件
を満たすことを特徴とする塗布器 a.前記先端面における吐出口長手方向に垂直な断面と
前記斜面における吐出口長手方向に垂直な断面におい
て、各々塗布方向の長さが略同一 b.前記先端面における吐出口長手方向に垂直な断面と
前記斜面における吐出口長手方向に垂直な断面におい
て、各々塗布方向に隣接する面となす角度が略同一 であることが好ましい。
Here, the present applicator is characterized by satisfying the following requirements a and b. The cross section of the tip surface perpendicular to the discharge port longitudinal direction and the cross section of the inclined surface perpendicular to the discharge port longitudinal direction have substantially the same length in the coating direction. B. It is preferable that the cross section of the tip surface perpendicular to the longitudinal direction of the ejection port and the cross section of the inclined surface perpendicular to the longitudinal direction of the ejection port have substantially the same angle with respect to adjacent surfaces in the coating direction.

【0007】本発明のカラーフィルター製造装置は、請
求項1あるいは2に記載の塗布器を用いて、カラーフィ
ルターを製造することを特徴とする。本発明の塗布方法
は、請求項1あるいは2に記載の塗布器と、前記吐出口
に対向して位置する基材とを相対的に移動させながら、
前記吐出口から塗布液を吐出して、前記基材の表面に塗
膜を形成することを特徴とする。ここで、前記基材の表
面に塗膜を形成する前、または、後に、前記先端面より
吐出口長手方向に離れた位置から清掃手段を吐出口長手
方向に移動開始して、前記先端面に付着した塗布液を前
記塗布器から除去することが好ましい。
The color filter manufacturing apparatus of the present invention is characterized by manufacturing a color filter by using the applicator according to the first or second aspect. The coating method of the present invention, while relatively moving the applicator according to claim 1 and the base material located facing the discharge port,
The coating liquid is discharged from the discharge port to form a coating film on the surface of the base material. Here, before or after forming the coating film on the surface of the base material, the cleaning means is started to move in the ejection port longitudinal direction from a position distant from the tip surface in the ejection port longitudinal direction, It is preferable to remove the applied coating liquid from the applicator.

【0008】本発明のカラーフィルター製造方法は、請
求項4あるいは5に記載の塗布方法を用いて、カラーフ
ィルターを製造することを特徴とする。上記発明に係る
塗布器、および、塗布方法によれば、吐出口を含む塗布
器先端面端部から斜面に連なる位置、形状を適正に規定
したので、塗布幅方向への濡れ拡がりを短い区間で確実
に防止でき、塗布幅端部で高い膜厚精度を得ることがで
きる。また、枚葉状基材の塗布においても、塗布器の吐
出口を含む先端面と上記の切り欠き、又は、段差部に相
当する斜面の形状を適正に規定したので、これらの部分
に残存した塗布液を清掃により完全に除去することが可
能となり、その結果、先端面端部のエッジでの塗布液の
固化、蓄積を防止して、塗膜へのスジ欠点を防止でき
る。さらに上記発明のカラーフィルター製造装置、製造
方法によれば、上記発明の塗布器および塗布方法を用い
て、高い膜厚精度でスジのない塗膜面を作成できるので
品質の高いカラーフィルターを製造できる。
The color filter manufacturing method of the present invention is characterized in that a color filter is manufactured by using the coating method according to the fourth or fifth aspect. According to the applicator and the coating method according to the above invention, the position from the end of the applicator tip surface including the discharge port to the slope, the shape is properly defined, so that the wetting spread in the coating width direction is short. It can be reliably prevented, and high film thickness accuracy can be obtained at the end of the coating width. Further, even in the case of coating a sheet-shaped substrate, since the shape of the tip surface including the discharge port of the applicator and the above-mentioned notch, or the sloped surface corresponding to the step portion is properly defined, the coating remaining on these portions It is possible to completely remove the liquid by cleaning, and as a result, it is possible to prevent the coating liquid from solidifying and accumulating at the edge of the end face, and to prevent streak defects on the coating film. Furthermore, according to the color filter manufacturing apparatus and manufacturing method of the above invention, a coating film surface without streaks can be formed with high film thickness accuracy by using the coating device and coating method of the above invention, and thus a high quality color filter can be manufactured. .

【0009】[0009]

【発明の実施の形態】以下、この発明の好ましい実施形
態を、図面を参照しながら説明する。図1は、この発明
の塗布器の一例であるスリットダイ10を、吐出口20
を上向きにして示した概略斜視図である。
BEST MODE FOR CARRYING OUT THE INVENTION Preferred embodiments of the present invention will be described below with reference to the drawings. FIG. 1 shows a slit die 10 which is an example of an applicator of the present invention, and a discharge port 20
FIG. 4 is a schematic perspective view showing the above.

【0010】図1に示すように、スリットダイ10は、
基材搬送方向上流側にバックアップリップ11、基材搬
送方向下流側にドクターリップ12を配し、これらの間
にスペーサ13を挟みこみ、ボルト15で結合すること
によって構成される。吐出口20はバックアップリップ
11とドクターリップ12に囲まれてなるランド部18
(斜線部)の先端に形成される。なお、このランド部1
8の領域(斜線部)は、スペーサ13が切り欠かれてい
るので、ランド部18の間隙幅はスペーサ13の厚みと
等しい。
As shown in FIG. 1, the slit die 10 is
The backup lip 11 is arranged on the upstream side in the base material conveying direction, the doctor lip 12 is arranged on the downstream side in the base material conveying direction, the spacer 13 is sandwiched between them, and they are connected by bolts 15. The discharge port 20 is a land portion 18 surrounded by the backup lip 11 and the doctor lip 12.
It is formed at the tip of (hatched portion). In addition, this land part 1
Since the spacer 13 is cut out in the region 8 (hatched portion), the gap width of the land portion 18 is equal to the thickness of the spacer 13.

【0011】また、このスリットダイ10を使って塗布
する場合は、塗布液がバックアップリップ11側に設け
られた塗布液流入口16より流入された後、内部の液溜
め部17(2点鎖線内)に一旦入り、塗布幅方向に拡げ
られた後、ランド部18を経て、吐出口20から流出す
る。
When the slit die 10 is used for coating, the coating liquid is introduced from the coating liquid inlet 16 provided on the backup lip 11 side, and then the internal liquid reservoir 17 (indicated by the two-dot chain line). ), Is spread in the coating width direction, and then flows out from the discharge port 20 via the land portion 18.

【0012】次に、このスリットダイ10のダイコータ
への適用例を説明する。図2は、スリットダイ10をダ
イコータ100に装着したときの概略正面図、図3はダ
イコータ100の概略側面図である。ダイコータ100
は、スリットダイ10と、スリットダイ10を塗布の前
または後で清掃するダイ清掃装置120と、塗布する基
板1を保持する基板保持台130と、基板保持台130
が載せられた基台140と、スリットダイ10を支持し
て昇降させる支柱150と、スリットダイ10に塗布液
を供給する送液ユニット160から構成される。
Next, an example of application of this slit die 10 to a die coater will be described. FIG. 2 is a schematic front view when the slit die 10 is attached to the die coater 100, and FIG. 3 is a schematic side view of the die coater 100. Die coater 100
Is a slit die 10, a die cleaning device 120 for cleaning the slit die 10 before or after coating, a substrate holder 130 for holding the substrate 1 to be coated, and a substrate holder 130.
It is composed of a base 140 on which is mounted, a support 150 for supporting and raising and lowering the slit die 10, and a liquid feeding unit 160 for supplying the coating liquid to the slit die 10.

【0013】ここで、スリットダイ10は昇降できるよ
うに門型の支柱150に図示しない昇降運動機構を介し
て取り付けられている。また、基板保持台130はスリ
ットダイ10の下部を基板移動方向131A、131B
に直進運動できるように図示しない往復運動機構を介し
て基台140に取り付けられている。なお、塗布時に
は、基板1は基板保持台130に真空吸着により保持さ
れて、塗布液が送液ユニット160によってスリットダ
イ10に供給される。
Here, the slit die 10 is attached to a gate-shaped support 150 through a raising / lowering movement mechanism (not shown) so that it can be raised and lowered. In addition, the substrate holding table 130 is disposed below the slit die 10 in the substrate moving directions 131A and 131B.
It is attached to the base 140 through a reciprocating mechanism (not shown) so that it can move straight. During coating, the substrate 1 is held on the substrate holder 130 by vacuum suction, and the coating liquid is supplied to the slit die 10 by the liquid feeding unit 160.

【0014】また、ダイ清掃装置120は、スリットダ
イ10の先端面21を清掃する清掃具121と、清掃具
保持部材122から構成されて、清掃具保持部材122
は塗布幅方向123A、123B方向に直進運動できる
ように図示しない往復運動機構を介して、支柱150に
取り付けられている。
The die cleaning device 120 is composed of a cleaning tool 121 for cleaning the front end surface 21 of the slit die 10 and a cleaning tool holding member 122.
Is attached to the column 150 through a reciprocating mechanism (not shown) so that it can move linearly in the coating width directions 123A and 123B.

【0015】この清掃具121を先端面21に接触させ
ながら、清掃具保持部材122を123A方向に移動さ
せることにより、先端面21に付着した余分な塗布液が
掻き取られて除去される。なお、除去された塗布液は図
示しない真空ポンプなどの吸引排液装置により、吸引、
排除され、さらに図示しない廃液タンク等に送液され
る。
By moving the cleaning tool holding member 122 in the direction 123A while bringing the cleaning tool 121 into contact with the tip surface 21, the excess coating liquid adhering to the tip surface 21 is scraped off and removed. The removed coating liquid is sucked by a suction / drainage device such as a vacuum pump (not shown).
The liquid is removed and further sent to a waste liquid tank or the like (not shown).

【0016】再度、図1のスリットダイ10を見ると、
この吐出口20を有する先端面21において、吐出口両
端部20R、20Lから吐出口長手方向外側に吐出口〜
切り上げ離間距離dだけ離間した位置を起点として、吐
出口長手方向XR、XLとθR、θL(以下、切り上げ角
度)の角度をなして、深さhとなるまで切り上げ斜面部
30R、30Lが形成されている。この、吐出口〜切り
上げ離間距離dは0〜2mm、より好ましくは0〜1m
m、深さhは0.1mm以上、より好ましくは0.3m
m以上、さらに、切り上げ角度θR、θLは5〜90度、
より好ましくは10〜90度の範囲にすることが好まし
く、これにより、塗布中に先端面21と基材との狭い隙
間(以下、クリアランス)で吐出口外側に塗布液が濡れ
拡がるのを防止する。なお、切り上げ角度θR、θLを9
0度以上にすることはスリットダイの構成上、困難であ
る。
Looking again at the slit die 10 of FIG.
In the front end surface 21 having the discharge port 20, the discharge ports are extended outward in the discharge port longitudinal direction from the discharge port both ends 20R and 20L.
Starting from a position separated by the round-up spacing distance d, the discharge-portion longitudinal directions X R , X L and θ R , θ L (hereinafter, round-up angle) are angled up to the depth h, and the rounded-up slope 30R, 30L is formed. The discharge port-rounded up separation distance d is 0 to 2 mm, more preferably 0 to 1 m.
m, depth h is 0.1 mm or more, more preferably 0.3 m
m or more, and the rounding angles θ R and θ L are 5 to 90 degrees,
It is more preferable to set it in the range of 10 to 90 degrees, which prevents the coating liquid from spreading to the outside of the discharge port in a narrow gap (hereinafter referred to as a clearance) between the tip surface 21 and the base material during coating. . Note that the rounding-up angles θ R and θ L are 9
It is difficult to set it to 0 ° or more because of the structure of the slit die.

【0017】以上の切り上げ斜面部30R、30Lの寸
法形状の塗布膜厚分布への影響を図4〜図7を用いて説
明する。図4は、上記に説明したスリットダイ10を用
いて塗布しているときの塗布幅方向断面図、図5は、吐
出口〜切り上げ離間距離dが2mm以上で、切り上げ角
度θR、θLが5〜90度のスリットダイ43を用いて塗
布しているときの塗布幅方向断面図、図6は、吐出口〜
切り上げ離間距離dは2mm以下であるが、切り上げ角
度θR、θLが5度以下のスリットダイ45を用いて塗布
しているときの塗布幅方向断面図であり、図7は塗布幅
方向の膜厚分布を模式的に示す膜厚分布図である。
The influence of the dimensions of the rounded-up slope portions 30R and 30L on the coating film thickness distribution will be described with reference to FIGS. FIG. 4 is a cross-sectional view in the coating width direction when coating is performed using the slit die 10 described above, and FIG. 5 shows that the discharge port to the round-up separation distance d is 2 mm or more, and the round-up angles θ R and θ L are Cross-sectional view in the coating width direction when coating is performed using the slit die 43 of 5 to 90 degrees, FIG.
The round-up separation distance d is 2 mm or less, but the round-up angles θ R and θ L are coating cross-sectional views in the coating width direction when coating is performed using the slit die 45, and FIG. It is a film thickness distribution diagram which shows film thickness distribution typically.

【0018】図4を見ると、長さLの吐出口から出た塗
布液はクリアランスCの間で塗布液の溜まり(以下、ビ
ード)19を形成するが、両端の切り上げ斜面部30
R、30LでクリアランスCが大きくなるために、塗布
幅方向で濡れ拡がることがない。スリットダイ10は、
吐出口から吐出される塗布液の量が長さLにわたって均
一であるように設計されているので、基材1上の塗布幅
Wが吐出口長さLと等しくなることにより、図7中の実
線(70)に示すように幅方向で非製品部となる端部か
ら5〜10mmの範囲L0を除けば、高精度な膜厚分布
を得ることができる。
As shown in FIG. 4, the coating liquid discharged from the discharge port having the length L forms a pool (hereinafter, bead) 19 of the coating liquid between the clearances C.
Since the clearance C becomes large at R and 30L, it does not spread in the application width direction. The slit die 10 is
Since the amount of the coating liquid discharged from the discharge port is designed to be uniform over the length L, the coating width W on the base material 1 becomes equal to the discharge port length L, so that As shown by the solid line (70), a highly accurate film thickness distribution can be obtained except for the range L 0 of 5 to 10 mm from the end which becomes the non-product portion in the width direction.

【0019】次に、図5を見ると、このスリットダイ4
3から吐出された塗布液は、吐出口〜切り上げ離間距離
dが2mm以上あるので、吐出口の塗布幅方向外側に続
く吐出口端部44R、44Lで、狭いクリアランスCが
維持され、毛細管現象により濡れ拡がる。この結果、実
際の塗布幅Wが吐出口長さLよりも広くなり、図7の波
線(71)に示すように、塗布幅端部では濡れ拡がりの
ために塗布幅中央部よりも膜厚が極端に低下する傾向に
ある。
Next, referring to FIG. 5, this slit die 4
Since the coating liquid discharged from No. 3 has a discharge port-rounded up separation distance d of 2 mm or more, a narrow clearance C is maintained at the discharge port end portions 44R and 44L continuing to the outside in the coating width direction of the discharge port, and due to the capillary phenomenon. Wet and spread. As a result, the actual coating width W becomes wider than the discharge port length L, and as shown by the wavy line (71) in FIG. 7, the coating width end portion has a film thickness smaller than that of the coating width central portion due to wetting and spreading. It tends to be extremely low.

【0020】また、図6を見ると、スリットダイ45で
は、切り上げ角度θR、θLが5度以下であるために、吐
出口よりも塗布幅方向外側である切り上げ斜面部46
R、46Lでクリアランスが吐出口直下よりもあまり大
きくならず、毛細管現象により塗布液が切り上げ斜面部
46R、46Lの領域にも濡れ拡がる。この結果、実際
の塗布幅Wが吐出口長さLよりも広幅となり、図7中の
波線(71)に示すように、端部では濡れ拡がりのため
に塗布幅中央部よりも膜厚が極端に低下する傾向にあ
る。
Further, as shown in FIG. 6, in the slit die 45, since the rounding-up angles θ R and θ L are 5 degrees or less, the rounding-up slope portion 46 which is outside the ejection port in the coating width direction is shown.
In R and 46L, the clearance does not become much larger than immediately below the discharge port, and the coating liquid wets and spreads in the regions of the rounded up slope portions 46R and 46L due to the capillary phenomenon. As a result, the actual coating width W becomes wider than the discharge port length L, and as shown by the wavy line (71) in FIG. Tends to decline.

【0021】なお、図示しないが、図1に示すスリット
ダイ10の切り上げ深さhを0.1mm以下にした場合
でも、切り上げ斜面部30R、30Lの外側で吐出口直
下に対して十分大きなクリアランスを確保できないため
に、毛細管現象により塗布液が切り上げ斜面部の領域へ
濡れ拡がり、図7中の波線(71)に示すように塗布幅
端部では塗布幅中央部よりも膜厚が極端に低下する。
Although not shown, even when the rounding-up depth h of the slit die 10 shown in FIG. 1 is set to 0.1 mm or less, a sufficiently large clearance is provided outside the rounding-up slope portions 30R and 30L with respect to immediately below the discharge port. Since it cannot be ensured, the coating liquid wets and spreads in the region of the sloped-up portion due to the capillary phenomenon, and as shown by the wavy line (71) in FIG. .

【0022】したがって、スリットダイ10の吐出口〜
切り欠き離間距離を2mm以下、より好ましくは1mm
以下、切り欠き角度を5度以上、より好ましくは10度
以上、切り上げ深さhを0.1mm以上、より好ましく
は0.3mm以上にすることにより、塗布中の塗布幅方
向濡れ拡がりを確実に0〜2mmの範囲に抑制して、塗
布幅方向端部の濡れ拡がりによる膜厚の低下を防止する
ことができ、高い膜厚精度を達成できる。
Therefore, the discharge port of the slit die 10
Notch separation distance is 2 mm or less, more preferably 1 mm
Hereafter, by setting the notch angle to 5 degrees or more, more preferably 10 degrees or more, and the cut-up depth h to 0.1 mm or more, more preferably 0.3 mm or more, it is possible to ensure wet spreading in the coating width direction during coating. The thickness can be suppressed to a range of 0 to 2 mm to prevent the film thickness from decreasing due to the wetting and spreading of the end portion in the coating width direction, and high film thickness accuracy can be achieved.

【0023】次に、本発明の別の実施形態の塗布器であ
るスリットダイ50のダイコータ100への適用例を図
2、図3、図8〜図11を用いて説明する。図8はこの
スリットダイ50の一端の切り上げ斜面部を拡大した概
略斜視図、図9〜図11は、スリットダイ50と清掃具
121との位置関係を示す塗布方向の断面図である。
Next, an application example of the slit die 50, which is the applicator of another embodiment of the present invention, to the die coater 100 will be described with reference to FIGS. 2, 3, and 8 to 11. FIG. 8 is an enlarged schematic perspective view of a rounded-up slope portion at one end of the slit die 50, and FIGS. 9 to 11 are sectional views in the coating direction showing the positional relationship between the slit die 50 and the cleaning tool 121.

【0024】最初に、スリットダイ50の構成を図8を
用いて説明する。スリットダイ50は上記のスリットダ
イ10と同じく基板搬送方向上流側にバックアップリッ
プ55、基板搬送方向下流側にドクターリップ56を配
して、その間にスペーサ57を挟んで結合し、吐出口5
1を形成している。上記説明した図1のスリットダイ1
0と異なる点は、先端面53と切り欠き斜面部60R
で、先端部の塗布方向長さY(以下、先端幅)と、先端
部と塗布方向隣接面とのなす角度θa、θb(以下、隣接
面角度)が、同一という点である。なお、図示していな
いが、切り上げ斜面部60Lについても、切り上げ斜面
部60Rと同様の形状が塗布幅方向の逆側端部に対称に
形成されている。
First, the structure of the slit die 50 will be described with reference to FIG. Similar to the slit die 10, the slit die 50 has a backup lip 55 on the upstream side in the substrate transport direction and a doctor lip 56 on the downstream side in the substrate transport direction.
1 is formed. The slit die 1 of FIG. 1 described above
The difference from 0 is that the tip surface 53 and the notched slope portion 60R
That is, the length Y of the tip portion in the coating direction (hereinafter referred to as the tip width) and the angles θ a and θ b (hereinafter, the adjacent surface angle) formed by the tip portion and the adjacent surface in the coating direction are the same. Although not shown, the rounded-up slope portion 60L has a shape similar to that of the rounded-up slope portion 60R, which is symmetrically formed at the opposite end in the coating width direction.

【0025】次に、このスリットダイ50の先端面53
に付着した塗布液を除去する清掃具121について詳し
く説明する。図9を見ると、スリットダイ50の先端面
53を清掃する清掃具121は、先端幅Yとほぼ同じで
ある長さaの底辺124と、スリットダイの隣接面角度
θa、θbとほぼ同じ角度で連なった斜辺125a、12
5bを有した断面形状を有しており、先端面53周辺に
密着できる形状となっている。
Next, the front end surface 53 of this slit die 50.
The cleaning tool 121 for removing the coating liquid attached to the will be described in detail. As shown in FIG. 9, the cleaning tool 121 for cleaning the tip surface 53 of the slit die 50 has a bottom 124 having a length a which is substantially the same as the tip width Y, and the adjacent surface angles θ a and θ b of the slit die. The hypotenuses 125a and 12 that are connected at the same angle
It has a cross-sectional shape having 5b, and has a shape capable of closely adhering to the vicinity of the front end surface 53.

【0026】さらに好ましくは、塗布液の除去能力を高
めるために、図3に示す清掃具121の接触部Pは、塗
布幅方向123A、Bで先端面53とほぼ線接触で当接
するようにして、塗布液を掻き取る。さらに、図9に示
すように、塗布液の斜面のせり上がりを防止するため
に、斜辺125a、125bの接触高さZは2mm以上
有する。さらにまた、図示しないが、清掃具に連結され
た潤滑液供給装置により、それぞれの塗布液に最適な有
機溶剤などの潤滑液を、先端部から塗布方向に連なる隣
接面に供給しながら、清掃具121をスリットダイ50
に摺接させれば、隣接面に塗布液が残存、固化すること
防止できる。
More preferably, in order to enhance the ability of removing the coating liquid, the contact portion P of the cleaning tool 121 shown in FIG. 3 is made to contact the tip surface 53 in a substantially linear contact in the coating width directions 123A, B. , Scrape off the coating liquid. Furthermore, as shown in FIG. 9, the contact height Z of the oblique sides 125a and 125b is 2 mm or more in order to prevent the slope of the coating liquid from rising. Furthermore, although not shown, a cleaning liquid is connected to the cleaning tool by supplying a lubricating liquid, such as an organic solvent, which is most suitable for each coating liquid, to the adjacent surface that is continuous from the tip to the coating direction. 121 slit die 50
If it is slidably contacted with, the coating liquid can be prevented from remaining and solidifying on the adjacent surface.

【0027】ここで、図3を見ると、清掃具121を先
端面53に接触させながら塗布幅方向123A方向に移
動させるときに、切り上げ斜面部60R、60Lと先端
面53との間の高さ変化があるので、その高さ変化に清
掃具121が追従しながら昇降移動できるように、清掃
具121と清掃具保持部材122はバネ、ゴムなどの弾
性部材を介して連結されるのが好ましい。
Here, referring to FIG. 3, when the cleaning tool 121 is moved in the coating width direction 123A while being in contact with the tip surface 53, the height between the rounded up slope portions 60R, 60L and the tip surface 53 is increased. Since there is a change, the cleaning tool 121 and the cleaning tool holding member 122 are preferably connected via an elastic member such as a spring or rubber so that the cleaning tool 121 can move up and down while following the height change.

【0028】この清掃具121の材質は、スリットダイ
50を傷つけないように高分子樹脂が好ましく、さらに
好ましくは先端面53および切り上げ斜面部60R、6
0Lに密着できるようにシリコンゴム、エチレンプロピ
レンゴム、フッ素ゴム等の弾性体樹脂が好ましい。
The material of the cleaning tool 121 is preferably a polymer resin so as not to damage the slit die 50, and more preferably the front end surface 53 and the rounded-up slope portions 60R, 6R.
An elastic resin such as silicon rubber, ethylene propylene rubber, or fluororubber is preferable so that it can be adhered to 0 L.

【0029】そして、清掃具121をスリットダイ50
の先端面53に接触移動させて、塗布液を掻き取って除
去する工程において、清掃具121の移動開始位置を切
り上げ斜面部60R、又は、切り上げ斜面部60Rより
塗布幅方向外側にすれば、清掃具121と切り上げ斜面
部60Rの先端部63の形状が同一であるために、図9
で示すように常に清掃具121が切り欠き斜面部60R
から先端面53へと密着した状態で移動でき、エッジ部
61R、61Lでの拭き残りを防止して、塗膜面にスジ
欠点を発生させることがない。
Then, the cleaning tool 121 is attached to the slit die 50.
In the step of contacting and moving the tip end surface 53 of the cleaning tool 121 to scrape and remove the coating liquid, cleaning is performed by setting the movement start position of the cleaning tool 121 to the rounded up slope portion 60R or to the outside of the rounded up slope portion 60R in the coating width direction. Since the tool 121 and the tip end portion 63 of the rounded-up slope portion 60R have the same shape, FIG.
As shown in, the cleaning tool 121 is always cut out on the sloped surface 60R.
To the tip surface 53, it can be moved in a close contact with the edge portions 61R and 61L, and the residual wiping can be prevented, so that a stripe defect does not occur on the coating surface.

【0030】なお、この清掃具121にゴム等の弾性体
を用いる場合は、移動時に清掃具が弾性変形して密着性
が高まるので、先端面53と切り上げ斜面部60R、6
0Lにおける先端幅Y、および、塗布方向隣接面の角度
θa、θbのとの相違は±20%の範囲で許容できる。
When an elastic body such as rubber is used for the cleaning tool 121, the cleaning tool is elastically deformed during movement and the adhesion is improved, so that the tip surface 53 and the rounded-up slope portions 60R, 6R, 6R.
The difference between the tip width Y at 0L and the angles θ a and θ b of the adjoining surfaces in the coating direction can be allowed within a range of ± 20%.

【0031】一方、図1に示すダイ10のように、切り
上げ斜面部30R、30Lの先端部の塗布方向の長さy
(先端幅)が、吐出口を含む先端面の先端幅y0より大
きくなる場合を図10に示す。ここでは、清掃開始位置
となる切り上げ斜面部30Rでは、清掃具の底辺の長さ
aが切り上げ斜面部30Rの先端幅yより小さくなるた
めに、清掃具121と切り上げ斜面部30Rの先端部と
の間で隙間が生じる。この状態で清掃具121を移動さ
せて、先端面21を清掃すれば、切り上げ斜面部30R
と先端面21との境界となるエッジ部において、付着し
た塗布液を完全に除去することができない。この結果、
塗布枚数を重ねると切り上げ斜面部30Rと先端面21
との境界となるエッジ部付近で塗布液が掻き取られずに
残存して、この残存した塗布液の固化、堆積が起こり、
この堆積物が塗布中に基板と接触して、塗膜にスジ欠点
を発生させる。
On the other hand, like the die 10 shown in FIG. 1, the length y in the coating direction of the tips of the rounded-up slopes 30R and 30L.
FIG. 10 shows the case where (the tip width) is larger than the tip width y 0 of the tip surface including the ejection port. Here, since the length a of the bottom side of the cleaning tool is smaller than the tip width y of the rounded up slope section 30R in the rounded up slope section 30R at the cleaning start position, the cleaning tool 121 and the tip end of the rounded up slope section 30R are separated. There is a gap between them. In this state, the cleaning tool 121 is moved to clean the front end surface 21.
It is impossible to completely remove the applied coating liquid at the edge portion that is the boundary between the tip surface 21 and the tip surface 21. As a result,
If the number of applied sheets is increased, the rounded-up slope portion 30R and the tip end surface 21
The coating liquid remains without being scraped off in the vicinity of the edge portion which is the boundary with, and solidification and deposition of the remaining coating liquid occur,
This deposit contacts the substrate during coating, causing streak defects in the coating.

【0032】また、図11に切り上げ斜面部の隣接面角
度θa、θbが、吐出口を含む先端面より小さくなる場合
を示すが、切り上げ斜面部で清掃具121の底辺12
4、斜辺125a、125bがスリットダイの切り上げ
斜面部の先端部63aに接触しなくなる。この結果、上
記説明した図10の場合と同様に、清掃時に切り上げ斜
面部と吐出口を含む先端面との境界のエッジ部付近で塗
布液が掻き取られずに残存して、この残存した塗布液が
固化、堆積し、この堆積物が塗布中に基板と接触して、
塗膜にスジ欠点を発生させる。
Further, FIG. 11 shows a case where the adjacent surface angles θ a and θ b of the rounded-up slope portion are smaller than that of the tip surface including the discharge port.
4. The oblique sides 125a and 125b do not come into contact with the tip end portion 63a of the rounded-up slope portion of the slit die. As a result, as in the case of FIG. 10 described above, the coating liquid remains in the vicinity of the edge portion of the boundary between the rounded-up slope portion and the tip end face including the discharge port during cleaning and is not scraped off. Solidifies and deposits, and this deposit contacts the substrate during application,
Causes streak defects in the coating film.

【0033】以上、説明した塗布器の切り上げ斜面部の
加工精度については、特に限定しないが、清掃具を用い
た清掃性、および、清掃具の耐摩耗性を考慮して、最大
表面粗さを2μm以下とすることが好ましい。また、切
り上げ斜面部のエッジ部61R、61Lについても、特
に限定しないが、清掃具の耐摩耗性を考慮して10μm
以上のRを設けるのが好ましい。
The processing accuracy of the rounded-up slope portion of the applicator described above is not particularly limited, but the maximum surface roughness is taken into consideration in consideration of the cleaning property using the cleaning tool and the wear resistance of the cleaning tool. It is preferably 2 μm or less. The edge portions 61R and 61L of the rounded-up slope portion are not particularly limited, but are 10 μm in consideration of the wear resistance of the cleaning tool.
It is preferable to provide the above R.

【0034】以上の説明ではスリットダイでの適用例に
ついて述べたが、一方向に吐出口が延びた塗布器であれ
ばいかなるものにも適用できる。さらに、吐出口は1個
に限らず、複数有した塗布器でも良い。
In the above description, the application example with the slit die has been described, but the present invention can be applied to any applicator as long as the discharge port extends in one direction. Further, the number of ejection ports is not limited to one, and an applicator having a plurality of ejection ports may be used.

【0035】次に、上記のスリットダイ50を用いて塗
布する動作の実施形態を図2、図3を用いて説明するま
ず、ダイコータ100における各作動部の原点復帰と、
送液ユニット160を駆動することにより、スリットダ
イ50の内部の残留エアーを排出して、塗布液をスリッ
トダイ50に充填するいわゆるエアー抜き作業を終了し
てから、以下の塗布動作を行う。
Next, an embodiment of the coating operation using the slit die 50 will be described with reference to FIGS. 2 and 3. First, the origin return of each operating portion in the die coater 100,
By driving the liquid feeding unit 160, residual air inside the slit die 50 is discharged, and after the so-called air venting operation for filling the slit die 50 with the coating liquid is completed, the following coating operation is performed.

【0036】(1)塗布開始の指令が図示しない制御装
置に入ると、基板保持台130上に基板1を図示しない
ローダ装置によりセットして吸着保持する。また、これ
と並行して、送液ユニット160を駆動して、スリット
ダイ50の先端面53を塗布液で濡らす程度に吐出し、
その間に、ダイ清掃装置120を駆動して、清掃具12
1を、スリットダイ50の下方で塗布幅方向123Bの
方向に移動させて、切り上げ斜面部60Rの下方(以
下、清掃開始位置)で停止させる。次に、清掃具121
が切り上げ斜面部60Rに密着するようにスリットダイ
50を下降させてから、清掃具121を塗布幅方向12
3A方向に移動させて、吐出口51とその周辺部に付着
した塗布液を掻き取る。なお、清掃具121は切り上げ
斜面部60Lを越えて、スリットダイ50の端部に来る
まで接触移動させる。
(1) When a coating start command enters a controller (not shown), the substrate 1 is set on the substrate holder 130 by a loader device (not shown) and suction-held. Further, in parallel with this, the liquid feeding unit 160 is driven to discharge the tip die 53 of the slit die 50 to such an extent that it is wet with the coating liquid,
Meanwhile, the die cleaning device 120 is driven to drive the cleaning tool 12
1 is moved in the coating width direction 123B below the slit die 50 and stopped below the rounded-up slope portion 60R (hereinafter, the cleaning start position). Next, the cleaning tool 121
The slit die 50 is lowered so that the slit die 50 comes into close contact with the raised slope portion 60R, and then the cleaning tool 121 is applied in the coating width direction 12
By moving in the 3A direction, the coating liquid adhering to the ejection port 51 and its peripheral portion is scraped off. In addition, the cleaning tool 121 is moved beyond the rounded-up slope portion 60L until it reaches the end of the slit die 50.

【0037】(2)上記の基板セット工程とスリットダ
イ50の清掃工程が終了すれば、基板1の塗布開始位置
がスリットダイ50の下方に位置するように、基板保持
台130を移動させた後、基板を所定の塗布速度で基板
移動方向131Aの方向に直進移動させる。この直進移
動の開始とほぼ同時に送液ユニット160を駆動して、
所定の膜厚になるように塗布液をスリットダイ50から
基板上に吐出する。そして、基板1の塗布終了部がほぼ
スリットダイ50の下方に位置したら、送液ユニット1
60を駆動して、スリットダイ50からの塗布液の吐出
を停止するとともに、これとほぼ同時にスリットダイ5
0を上方に待避させる。
(2) After the substrate setting step and the slit die 50 cleaning step are completed, after the substrate holding table 130 is moved so that the coating start position of the substrate 1 is located below the slit die 50. , The substrate is moved linearly in the substrate moving direction 131A at a predetermined coating speed. Almost simultaneously with the start of this straight movement, the liquid feeding unit 160 is driven,
The coating liquid is discharged from the slit die 50 onto the substrate so as to have a predetermined film thickness. Then, when the coating end portion of the substrate 1 is located substantially below the slit die 50, the liquid feeding unit 1
60 is driven to stop the discharge of the coating liquid from the slit die 50, and at the same time as this, the slit die 5
Retract 0 upwards.

【0038】(3)上記の塗布工程が終了すれば、基板
保持台130を基板移動方向131A方向に移動させ
て、終点位置に達すると、図示しないアンローダ装置に
よって基板1を取り出し、下流側の装置に受け渡す。ま
た、この基板取り出し工程と同時に、ダイ清掃装置12
0を駆動して、清掃具121をスリットダイの下方を1
23B方向に移動させて、清掃開始位置で停止させてお
く。さらに、次の塗布のために送液ユニット160に塗
布液を吸引した後、塗布液をわずかに吐出しておき、先
端面53を塗布液で濡らしておく。
(3) When the above coating process is completed, the substrate holder 130 is moved in the substrate moving direction 131A, and when the end point is reached, the substrate 1 is taken out by an unloader device (not shown), and a downstream device is provided. Hand over to. Further, at the same time as the substrate taking out step, the die cleaning device 12
0 to drive the cleaning tool 121 down the slit die to 1
23B, and stop at the cleaning start position. Further, after sucking the coating liquid into the liquid feeding unit 160 for the next coating, the coating liquid is slightly discharged and the tip surface 53 is wetted with the coating liquid.

【0039】(4)上記の基板取り出し工程が終了すれ
ば、基板保持台130を基板移動方向131B方向に、
最初の基板受け取り位置まで高速で移動させて、上記
(1)の基板セット工程を開始する。この基板セット工
程と同時に、スリットダイ50を清掃具121に接触す
るように下降させた後、清掃具121を塗布幅方向12
3A方向に移動させて、吐出口51とその周辺部に付着
した塗布液を掻き取って除去する。なお、清掃具121
は切り上げ斜面部60Lを越えて、スリットダイ50の
端部に来るまで接触移動させる。以上の(2)〜(4)
の工程を繰り返すことにより、順次、基板上に塗膜を形
成する。
(4) When the above substrate taking-out step is completed, the substrate holder 130 is moved in the substrate moving direction 131B.
The substrate is moved to the first substrate receiving position at high speed, and the substrate setting step (1) is started. Simultaneously with this substrate setting step, the slit die 50 is lowered so as to come into contact with the cleaning tool 121, and then the cleaning tool 121 is applied in the coating width direction 12.
By moving in the 3A direction, the coating liquid adhering to the ejection port 51 and its peripheral portion is scraped off and removed. The cleaning tool 121
Touches and moves over the rounded-up slope portion 60L until it reaches the end of the slit die 50. Above (2)-(4)
By repeating the above process, the coating film is sequentially formed on the substrate.

【0040】上記の説明した塗布方法によれば、用いる
スリットダイ50は先端面53の吐出口長手方向端部
で、先端面に連なる斜面の切り上げ角度θR、θLが5〜
90度、吐出口〜切り上げ離間距離dが2mm以下とし
ているので、吐出された塗布液が切り上げ斜面部60R
および、60Lの直前で、毛細管現象による濡れ拡がり
が抑止されて、塗布幅方向端部の膜厚低下を防止でき
る。
According to the coating method described above, the slit die 50 to be used is the end portion of the tip surface 53 in the discharge port longitudinal direction, and the round-up angles θ R and θ L of the slopes connected to the tip surface are 5 to 5.
Since the discharge port-rounded up separation distance d is 90 mm or less, and the discharged coating liquid is rounded up sloped portion 60R.
Further, immediately before 60 L, the wetting and spreading due to the capillary phenomenon is suppressed, and the reduction in the film thickness at the end portion in the coating width direction can be prevented.

【0041】さらに、先端面53と切り上げ斜面部60
R、60Lの先端部63で、先端幅Yと、隣接面角度θ
a、θbが略同一であるスリットダイ50に対して、塗布
の前後で、塗布液で濡れる部分より手前から清掃具12
1がスリットダイ50に密着するように接触移動を開始
して、塗布液を掻き取って除去するので、多数枚の塗布
を行っても、切り上げ斜面部60R、60Lのエッジ部
61R、61Lでの、拭き残りを防止し、かつ、塗布液
の固化、堆積もなくなるために、塗膜へのスジ欠点も発
生することがない。
Further, the front end surface 53 and the rounded-up slope portion 60
At the tip 63 of R and 60L, the tip width Y and the adjacent surface angle θ
With respect to the slit die 50 having substantially the same a and θ b , the cleaning tool 12 is applied before and after the application and before the portion wetted by the application liquid.
1 starts contact movement so as to be in close contact with the slit die 50, and scrapes and removes the coating liquid. Therefore, even when a large number of coatings are performed, the edge portions 61R and 61L of the rounded-up slope portions 60R and 60L are In addition, since wiping residue is prevented and solidification and accumulation of the coating liquid are eliminated, streak defects on the coating film do not occur.

【0042】なお、以上説明した塗布方法は、枚葉状の
ガラス基板に対して塗布するものであるが、フィルム等
のような塗布中に吐出口の清掃動作のない連続基材の塗
布に対しても、図1、または、図8に示した形態の塗布
器を用いて塗布液を連続的に吐出すれば、スリットダイ
先端部の形状が適正に構成されているので、塗布器と連
続基材との間で毛細管現象による濡れ拡がりが抑制さ
れ、端部でも高い膜厚精度を得ることができる。
The coating method described above is for coating a single glass substrate, but for coating a continuous base material such as a film which has no discharge port cleaning operation during coating. Also, if the coating solution is continuously discharged using the applicator of the form shown in FIG. 1 or FIG. 8, the shape of the tip of the slit die is properly configured. The spread of wetting due to the capillary phenomenon is suppressed between and, and high film thickness accuracy can be obtained even at the end portion.

【0043】本発明が好適に用いられる塗布液として
は、粘度が50[mPa・s]以下、さらに好ましくは
20[mPa・s]以下、表面張力が70[mN/m]
以下、さらに好ましくは50[mN/m]以下の低粘
度、低表面張力の塗液である。また、本発明は、カラー
フィルターの製造工程で使用するブラックマトリック
ス、RED、GREEN、BLUEの各画素用塗布液、
および、レジスト液、オーバーコート剤、特に、各画素
用の感光性アクリル系塗布液に対して高い効果を得るこ
とができる。さらに、塗布厚さが1〜500μm、より
好ましくは5μm〜100μm、塗布速度が0.1m/
分〜10m/分、より好ましくは1m/分〜6m/分、
基材と塗布器の隙間(クリアランス)が40〜300μ
m、より好ましくは60〜200μmの範囲に適してい
る。
The coating liquid preferably used in the present invention has a viscosity of 50 [mPa · s] or less, more preferably 20 [mPa · s] or less, and a surface tension of 70 [mN / m].
The coating liquid having a low viscosity and a surface tension of 50 [mN / m] or less is more preferable. The present invention also provides a coating liquid for each pixel of black matrix, RED, GREEN, and BLUE used in the manufacturing process of a color filter,
In addition, a high effect can be obtained for the resist liquid and the overcoating agent, especially for the photosensitive acrylic coating liquid for each pixel. Further, the coating thickness is 1 to 500 μm, more preferably 5 μm to 100 μm, and the coating speed is 0.1 m /
Min-10 m / min, more preferably 1 m / min-6 m / min,
The clearance between the base material and the applicator is 40-300μ
m, more preferably in the range of 60 to 200 μm.

【0044】[0044]

【実施例】実施例1 360×465mmで厚さ0.7mmの無アルカリガラス基
板上に、基板の幅方向にピッチが254μm、基板の長
手方向にピッチが85μm、線幅が20μm、RGB画
素数が4800(基板長手方向)×1200(基板幅方
向)、対角の長さが20インチ(基板幅方向に305m
m、基板長手方向に406mm)となる格子形状で、厚さ
が1μmとなるブラックマトリックス膜を作成した。ブ
ラックマトリックス膜は、チタン酸窒化物を遮光材、ポ
リアミック酸をバインダーとして用いたものであった。
Example 1 On a 360 × 465 mm, 0.7 mm thick non-alkali glass substrate, the pitch is 254 μm in the width direction of the substrate, the pitch is 85 μm in the longitudinal direction of the substrate, the line width is 20 μm, and the number of RGB pixels is Is 4800 (longitudinal direction of substrate) x 1200 (width direction of substrate), diagonal length is 20 inches (305m in width direction of substrate)
A black matrix film having a lattice shape of m and 406 mm in the longitudinal direction of the substrate and a thickness of 1 μm was formed. The black matrix film used titanium oxynitride as a light shielding material and polyamic acid as a binder.

【0045】続いてウェット洗浄によって基板上のパー
ティクルを除去後、プロピレングリコールモノメチルエ
ーテルアセテート(PGMEA)、3−エトキシプロピ
オン酸エチル(EEP)を溶媒にして、固形分濃度20
%で混合し、さらに粘度を4.4mPa・sに調整した
カラーフィルター用感光性アクリル系REDの塗布液
を、図2、図3に示すダイコータ100で、ダイと基板
との距離(クリアランス)を100μm、塗布速度を3
m/分の塗布条件で、10μmの厚みで塗布した。
Subsequently, the particles on the substrate were removed by wet cleaning, and propylene glycol monomethyl ether acetate (PGMEA) and ethyl 3-ethoxypropionate (EEP) were used as solvents to obtain a solid content concentration of 20.
%, And the viscosity of the photosensitive acrylic RED coating solution for color filters adjusted to a viscosity of 4.4 mPa · s was measured with a die coater 100 shown in FIGS. 2 and 3 to measure the distance (clearance) between the die and the substrate. 100 μm, coating speed 3
It was applied with a thickness of 10 μm under the application conditions of m / min.

【0046】ここで、用いたスリットダイ50(図8参
照)は、長さが330mm、間隙が100μmの1個の
吐出口を有し、さらに、吐出口を含む先端面の幅(Y)
は1mmであった。また、スリットダイの塗布幅方向両
端部において、吐出口〜切り上げ離間距離(d)が1m
m、切り上げ角度(θR、θL)が10度、先端面の幅
(Y)が1mm、先端面および切り上げ斜面部の塗布方
向の隣接面角度(θa、θb)は45度である。
The slit die 50 (see FIG. 8) used here has one discharge port having a length of 330 mm and a gap of 100 μm, and further has a width (Y) of the tip surface including the discharge port.
Was 1 mm. In addition, at both ends of the slit die in the coating width direction, the discharge port-rounded up separation distance (d) is 1 m.
m, rounded up angle (θ R , θ L ) is 10 degrees, width of the tip surface (Y) is 1 mm, adjacent surface angle (θ a , θ b ) in the coating direction of the tip surface and the rounded up slope is 45 degrees. .

【0047】ダイ吐出口清掃装置にはシリコンゴム製の
清掃具を1個備えたものを用いた。この清掃具のスリッ
トダイとの接触部は、図9に示すようにスリットダイの
先端形状に合致するように、底辺の長さ(a)が1mm
で、その両端に45度の角度で高さ3mmの斜辺(12
5a、125b)が連なる断面形状を有して、この清掃
具と先端面との吐出口長手方向の接触長さは1mmとし
た。
As the die discharge port cleaning device, one equipped with one cleaning tool made of silicon rubber was used. The contact portion of the cleaning tool with the slit die has a bottom length (a) of 1 mm so as to match the tip shape of the slit die as shown in FIG.
Then, at both ends, the hypotenuse (12 mm
5a, 125b) has a continuous cross-sectional shape, and the contact length between the cleaning tool and the tip surface in the discharge port longitudinal direction is 1 mm.

【0048】以上の形状のスリットダイを使用して塗布
した後、90度で30秒真空乾燥した後に、露光・現像
を行って、RED画素部にのみ色塗膜を残した。同様の
色塗膜の形成をGREEN、BLUEについても、上記
と全く同じダイコータと塗布条件を用いてそれぞれの色
塗膜を形成した。ここで、GREENの塗布液は、固形
分濃度を17%、粘度を3.5mPa・s、に調整した
もの、BLUEの塗布液は固形分濃度を18%、粘度を
3.8mPa・s、に調整したものを用いた。
After coating using a slit die having the above shape, it was vacuum dried at 90 ° for 30 seconds and then exposed and developed to leave a color coating film only on the RED pixel portion. The same color coating film was formed for GREEN and BLUE by using the same die coater and coating conditions as above. Here, the green coating solution had a solid content concentration of 17% and a viscosity adjusted to 3.5 mPa · s, and the BLUE coating solution had a solid content concentration of 18% and a viscosity of 3.8 mPa · s. The adjusted one was used.

【0049】RED、GREEN、BLUEの画素膜形
成後に260度のホットプレートで30分加熱して、キ
ュアを行った。そして最後にITOをスパッタリングで
付着させた。以上の工程により、100枚連続してカラ
ーフィルターを作成した。全ての塗布において、端部で
の濡れ拡がりは1mmとなった結果、塗布幅は332m
mとなり、、乾燥後の膜厚むらも製品外となる端部10
mmを除いて0.05μmである均一な膜厚分布を得
た。なお、100枚塗布した後に、スリットダイの吐出
口を含む先端面を観察したところ、塗布液の固化、蓄積
はまったく見られなかった。さらに、得られたカラーフ
ィルターは、色度も基板全面にわたって均一で、品質的
に申し分ないものであった。
After forming the RED, GREEN, and BLUE pixel films, heating was performed for 30 minutes on a hot plate at 260 ° C. to perform curing. Finally, ITO was deposited by sputtering. Through the above steps, 100 color filters were continuously formed. In all coatings, wetting spread at the edge was 1mm, resulting in a coating width of 332m.
m, and the film thickness unevenness after drying is outside the product 10
A uniform film thickness distribution of 0.05 μm was obtained except for mm. After coating 100 sheets, the tip surface including the discharge port of the slit die was observed, and no solidification or accumulation of the coating liquid was observed. Further, the obtained color filter had a uniform chromaticity over the entire surface of the substrate and was satisfactory in terms of quality.

【0050】実施例2 図1のスリットダイ10を用いて、その吐出口端部の切
り上げ角度(θR、θL)が10度、先端面の幅が、吐出
口部では1mm(y0)、切り上げ斜面部では最終的に
3mm(y)まで徐々に拡げられている以外は、実施例
1とまったく同じダイコータ100、塗布液、および塗
布条件、清掃具を適用して、100枚のカラーフィルタ
ーを作成した。
Example 2 Using the slit die 10 of FIG. 1, the round-up angle (θ R , θ L ) of the end of the discharge port is 10 degrees, and the width of the tip surface is 1 mm (y 0 ) at the discharge port. In the rounded-up slope portion, the die coater 100, the coating liquid, the coating conditions, and the cleaning tool, which are exactly the same as those in the first embodiment, are used except that they are gradually expanded to 3 mm (y). It was created.

【0051】全ての塗布において、端部での濡れ拡がり
は1mm以下に抑制されたものの、50〜60枚を超え
てから、スリットダイの吐出口を含む先端面と切り上げ
斜面部との境界のエッジ部に堆積した塗布液の固化物が
基板上の塗膜と接触して、スジ欠点を引き起こした。得
られたカラーフィルターも塗布幅方向端部において、上
記のスジ欠点による色むらが発生して、品質的に不良で
あった。
In all of the coatings, the spread of wetting at the end was suppressed to 1 mm or less, but after the number of sheets exceeded 50 to 60, the edge of the boundary between the tip surface including the discharge port of the slit die and the rounded-up slope portion was exceeded. The solidified material of the coating liquid deposited on the part contacted the coating film on the substrate, causing streak defects. The obtained color filter was also inferior in quality due to color unevenness caused by the above-mentioned streak defects at the end portions in the coating width direction.

【0052】比較例1 図1のスリットダイ10の吐出口〜切り上げ離間距離
(d)が3mmの位置から切り上げ斜面部が形成されて
いる以外は、実施例2とまったく同じ条件にて、100
枚カラーフィルターを作成した。全ての塗布において、
端部で片側3mmの濡れ拡がりが見られ、これにより塗
布幅方向の端部で膜厚の低下が発生し、製品外となる端
部10mmを除いても膜厚むらが0.3μmあった。ま
た、50〜60枚を超えてから、スリットダイの吐出口
を含む先端面と切り上げ斜面部との境界のエッジ部に堆
積した塗布液の固化物が基板と接触して、スジ欠点を引
き起こした。得られたカラーフィルターも塗布幅方向端
部において膜厚の低下、スジにより色むらが発生し、品
質的に不良であった。
Comparative Example 1 100% under the same conditions as in Example 2 except that a rounded-up slope portion is formed from a position where the slit die 10 shown in FIG.
I made a sheet of color filter. In all applications,
Wetting spread of 3 mm on one side was observed at one end, and this caused a decrease in film thickness at the end in the coating width direction, and unevenness of film thickness was 0.3 μm even if the end 10 mm outside the product was excluded. Further, after exceeding 50 to 60 sheets, the solidified material of the coating liquid deposited on the edge portion of the boundary between the front end surface including the discharge port of the slit die and the rounded-up slope portion was brought into contact with the substrate to cause streak defects. . The obtained color filter was also inferior in quality due to a decrease in film thickness at the end portion in the coating width direction and uneven color due to streaks.

【0053】[0053]

【発明の効果】以上説明したように本発明の塗布器およ
びこれを用いた塗布方法では、塗布器先端面の吐出口長
手方向での、先端面に対する斜面の位置、形状を適正に
規定したので、基材と塗布器との間での毛細管現象によ
る塗布液の濡れ拡がりを抑制して、塗布幅方向端部でも
高い膜厚精度を達成できる。
As described above, in the applicator of the present invention and the coating method using the same, the position and shape of the slope in the longitudinal direction of the discharge port of the applicator with respect to the tip surface are properly defined. Further, the wetting and spreading of the coating liquid due to the capillary phenomenon between the base material and the coating device can be suppressed, and high film thickness accuracy can be achieved even at the end portion in the coating width direction.

【0054】また、枚葉状基材の塗布においても、塗布
器の吐出口を含む先端面と上記の切り欠き、又は、段差
部に相当する斜面の形状を適正に規定したので、塗布を
行うごとに塗布器先端面に残存した塗布液を清掃により
完全除去することが可能となり、エッジ部で塗布液が残
存することがなくなるので、塗布液の固化、蓄積による
塗膜へのスジ欠点を防止できる。
Also in the coating of the single-wafer substrate, since the shape of the tip surface including the discharge port of the applicator and the above-mentioned notch, or the sloped surface corresponding to the step portion is properly defined, it is possible to perform coating every time. Since it is possible to completely remove the coating liquid remaining on the tip surface of the applicator by cleaning and the coating liquid does not remain at the edge portion, streak defects on the coating film due to solidification and accumulation of the coating liquid can be prevented. .

【0055】さらにまた、本発明のカラーフィルター製
造装置および製造方法によれば、本発明の塗布器、塗布
方法を用いて、塗布幅方向端部でも高精度な膜厚で、ス
ジのない塗膜を得ることができるので、高い品質のカラ
ーフィルターを製造できる。
Furthermore, according to the color filter manufacturing apparatus and manufacturing method of the present invention, the coating device and the coating method of the present invention are used to form a coating film having a highly accurate film thickness and no streaks even at the ends in the coating width direction. Therefore, a high quality color filter can be manufactured.

【図面の簡単な説明】[Brief description of drawings]

【図1】この発明の塗布器の一例であるスリットダイの
概略斜視図である。
FIG. 1 is a schematic perspective view of a slit die which is an example of an applicator of the present invention.

【図2】この発明の塗布器をダイコータに適用したとき
の概略正面図である。
FIG. 2 is a schematic front view when the applicator of the present invention is applied to a die coater.

【図3】この発明の塗布器をダイコータに適用したとき
の概略側面図である。
FIG. 3 is a schematic side view when the applicator of the present invention is applied to a die coater.

【図4】一実施例のスリットダイで塗布する状態を示す
塗布幅方向の断面である。
FIG. 4 is a cross section in a coating width direction showing a state of coating with a slit die according to an embodiment.

【図5】別の実施例のスリットダイで塗布する状態を示
す塗布幅方向の断面図である。
FIG. 5 is a sectional view in a coating width direction showing a state of coating with a slit die according to another embodiment.

【図6】さらに別の実施例のスリットダイで塗布する状
態を示す塗布幅方向の断面図である。
FIG. 6 is a sectional view in a coating width direction showing a state of coating with a slit die according to still another embodiment.

【図7】スリットダイで塗布したときの塗布幅方向の膜
厚分布の模式図である。
FIG. 7 is a schematic diagram of a film thickness distribution in a coating width direction when coating with a slit die.

【図8】この発明の別のスリットダイの概略斜視図であ
る。
FIG. 8 is a schematic perspective view of another slit die of the present invention.

【図9】一実施例のスリットダイと清掃具の位置関係を
示す塗布方向の断面図である。
FIG. 9 is a sectional view in a coating direction showing a positional relationship between a slit die and a cleaning tool according to an embodiment.

【図10】別の実施例のスリットダイと清掃具の位置関
係を示す塗布方向の断面図である。
FIG. 10 is a sectional view in a coating direction showing a positional relationship between a slit die and a cleaning tool according to another embodiment.

【図11】さらに別の実施例のスリットダイと清掃具の
位置関係を示す塗布方向の断面図である。
FIG. 11 is a sectional view in a coating direction showing a positional relationship between a slit die and a cleaning tool according to still another embodiment.

【符号の説明】[Explanation of symbols]

1:基板 10:スリットダイ 11:バックアップリップ 12:ドクターリップ 13:スペーサ 15:ボルト 16:塗布液流入口 17:液溜め部 18:ランド部 19:ビード 20:吐出口 21:先端面 20R、20L:吐出口両端部 30R、30L:切り上げ斜面部 31R、31L:切り上げ方向 43:スリットダイ 44R、41L:吐出口端部 45:スリットダイ 46R、46L:切り上げ斜面部 50:スリットダイ 51:吐出口 53:先端面 55:バックアップリップ 56:ドクターリップ 57:スペーサ 60R、60L:切り上げ斜面部 61R、61L:エッジ部 63、63a:先端部 70、71:膜厚分布 100:ダイコータ 120:ダイ清掃装置 121:清掃具 122:清掃具保持部材 123A、123B:塗布幅方向 124:底辺 124a:底辺の長さ 125a、125b:斜辺 130:基板保持台 131A、131B:基板移動方向 140:基台 150:支柱 160:送液ユニット θa、θb:斜面角度 θR、θL:切り上げ角度 a:底辺の長さ d:吐出口〜切り上げ離間距離 C:クリアランス h:切り上げ高さ L:吐出口長さ L0:塗布幅方向端部非製品部 XR、XL:吐出口長手方向 Y、y、y0:先端幅 W:塗布幅 P:清掃具の接触部 Z:清掃具の接触高さ1: Substrate 10: Slit die 11: Backup lip 12: Doctor lip 13: Spacer 15: Bolt 16: Coating liquid inlet 17: Liquid reservoir 18: Land 19: Bead 20: Discharge port 21: Tip surface 20R, 20L : Discharge port both end portions 30R, 30L: Round-up slope portions 31R, 31L: Round-up direction 43: Slit die 44R, 41L: Discharge port end portion 45: Slit dies 46R, 46L: Round-up slope portion 50: Slit die 51: Discharge port 53 : Tip surface 55: Backup lip 56: Doctor lip 57: Spacers 60R, 60L: Rounded up slope portions 61R, 61L: Edge portions 63, 63a: Tip portions 70, 71: Film thickness distribution 100: Die coater 120: Die cleaning device 121: Cleaning tool 122: cleaning tool holding members 123A and 123B: application width direction 124: bottom side 24a: bottom length 125a, 125b: hypotenuse 130: substrate holder 131A, 131B: a substrate moving direction 140: base 150: support column 160: liquid-feeding unit θ a, θ b: slope angle θ R, θ L: revaluation Angle a: Bottom length d: Discharge port to round-up separation distance C: Clearance h: Round-up height L: Discharge port length L 0 : Application width direction end non-product part X R , XL : Discharge port longitudinal direction Y, y, y 0 : tip width W: application width P: contact portion of cleaning tool Z: contact height of cleaning tool

───────────────────────────────────────────────────── フロントページの続き Fターム(参考) 2H048 AA09 2H091 FA02Y FC29 LA12 4D075 AC02 AC09 CA47 CB06 DA06 DB13 DB31 DC24 EA07 EA10 EA19 EB11 EB52 4F041 AA02 AA05 AB01 BA05 BA12 BA17 BA51 BA60 CA02    ─────────────────────────────────────────────────── ─── Continued front page    F-term (reference) 2H048 AA09                 2H091 FA02Y FC29 LA12                 4D075 AC02 AC09 CA47 CB06 DA06                       DB13 DB31 DC24 EA07 EA10                       EA19 EB11 EB52                 4F041 AA02 AA05 AB01 BA05 BA12                       BA17 BA51 BA60 CA02

Claims (6)

【特許請求の範囲】[Claims] 【請求項1】 塗布液を対向して位置する基材に吐出す
るための一方向に延びる吐出口を有する塗布器であっ
て、該吐出口が形成された先端面の長手方向の長さが、
該吐出口の長手方向の長さより片端あたり0〜2mm長
く、さらに、前記先端面の長手方向の両端部には前記先
端面に対して5〜90度の角度をなす斜面が連なってい
ることを特徴とする塗布器。
1. An applicator having a discharge port extending in one direction for discharging a coating liquid to a base material located opposite to the substrate, wherein the length of the tip end surface in which the discharge port is formed is long in the longitudinal direction. ,
Each end is 0 to 2 mm longer than the length of the discharge port in the longitudinal direction, and slopes forming an angle of 5 to 90 degrees with respect to the tip face are connected to both ends of the tip face in the length direction. Characteristic applicator.
【請求項2】 請求項1に記載の塗布器であって、下記
a及びbの要件を満たすことを特徴とする塗布器。 a.前記先端面における吐出口長手方向に垂直な断面と
前記斜面における吐出口長手方向に垂直な断面におい
て、各々塗布方向の長さが略同一 b.前記先端面における吐出口長手方向に垂直な断面と
前記斜面における吐出口長手方向に垂直な断面におい
て、各々塗布方向に隣接する面となす角度が略同一
2. The applicator according to claim 1, which satisfies the following requirements a and b. a. The cross section of the tip surface perpendicular to the discharge port longitudinal direction and the cross section of the inclined surface perpendicular to the discharge port longitudinal direction have substantially the same length in the coating direction. B. In the cross section of the tip surface perpendicular to the discharge port longitudinal direction and the cross section of the inclined surface perpendicular to the discharge port longitudinal direction, the angles formed by the surfaces adjacent to each other in the coating direction are substantially the same.
【請求項3】 前記請求項1あるいは2に記載の塗布器
を用いて、カラーフィルターを製造することを特徴とす
るカラーフィルター製造装置。
3. A color filter manufacturing apparatus, which manufactures a color filter by using the applicator according to claim 1 or 2.
【請求項4】 前記請求項1あるいは2に記載の塗布器
と、前記吐出口に対向して位置する基材とを相対的に移
動させながら、前記吐出口から塗布液を吐出して、前記
基材の表面に塗膜を形成することを特徴とする塗布方
法。
4. The coating liquid is discharged from the discharge port while relatively moving the applicator according to claim 1 or 2 and a base material located opposite to the discharge port, A coating method, which comprises forming a coating film on the surface of a substrate.
【請求項5】 前記請求項4に記載の塗布方法であっ
て、前記基材の表面に塗膜を形成する前、または、後
に、前記先端面より吐出口長手方向に離れた位置から清
掃手段を吐出口長手方向に移動開始して、前記先端面に
付着した塗布液を前記塗布器から除去することを特徴と
する塗布方法。
5. The coating method according to claim 4, wherein before or after forming a coating film on the surface of the base material, a cleaning unit is provided from a position distant from the tip surface in the discharge port longitudinal direction. Is started to move in the longitudinal direction of the discharge port, and the coating liquid adhering to the tip surface is removed from the applicator.
【請求項6】 前記請求項4あるいは5に記載の塗布方
法を用いて、カラーフィルターを製造することを特徴と
するカラーフィルター製造方法。
6. A color filter manufacturing method, characterized in that a color filter is manufactured by using the coating method according to claim 4 or 5.
JP2001305177A 2001-10-01 2001-10-01 Coating apparatus, coating method, and apparatus and method for producing color filter Pending JP2003112103A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2001305177A JP2003112103A (en) 2001-10-01 2001-10-01 Coating apparatus, coating method, and apparatus and method for producing color filter

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001305177A JP2003112103A (en) 2001-10-01 2001-10-01 Coating apparatus, coating method, and apparatus and method for producing color filter

Publications (2)

Publication Number Publication Date
JP2003112103A true JP2003112103A (en) 2003-04-15
JP2003112103A5 JP2003112103A5 (en) 2005-06-23

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
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Country Status (1)

Country Link
JP (1) JP2003112103A (en)

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