JP2003077335A - Surface treated conductive particles, treating method for conductive particles, adhesive for circuit connection using the conductive particles, and circuit connection structure - Google Patents
Surface treated conductive particles, treating method for conductive particles, adhesive for circuit connection using the conductive particles, and circuit connection structureInfo
- Publication number
- JP2003077335A JP2003077335A JP2001261674A JP2001261674A JP2003077335A JP 2003077335 A JP2003077335 A JP 2003077335A JP 2001261674 A JP2001261674 A JP 2001261674A JP 2001261674 A JP2001261674 A JP 2001261674A JP 2003077335 A JP2003077335 A JP 2003077335A
- Authority
- JP
- Japan
- Prior art keywords
- conductive particles
- adhesive
- circuit
- circuit connection
- resin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000002245 particle Substances 0.000 title claims abstract description 84
- 230000001070 adhesive effect Effects 0.000 title claims abstract description 51
- 239000000853 adhesive Substances 0.000 title claims abstract description 50
- 238000000034 method Methods 0.000 title claims abstract description 9
- 150000001875 compounds Chemical class 0.000 claims abstract description 22
- 150000007513 acids Chemical class 0.000 claims abstract description 14
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 14
- 238000004381 surface treatment Methods 0.000 claims abstract description 13
- 239000007788 liquid Substances 0.000 claims abstract description 7
- 238000003825 pressing Methods 0.000 claims abstract description 5
- 239000000758 substrate Substances 0.000 claims description 16
- 229910052759 nickel Inorganic materials 0.000 claims description 8
- 229910052802 copper Inorganic materials 0.000 claims description 4
- 229910052725 zinc Inorganic materials 0.000 claims description 3
- 229920005989 resin Polymers 0.000 abstract description 30
- 239000011347 resin Substances 0.000 abstract description 30
- 239000011248 coating agent Substances 0.000 abstract description 11
- 238000000576 coating method Methods 0.000 abstract description 11
- 238000009413 insulation Methods 0.000 abstract description 4
- 230000007547 defect Effects 0.000 abstract description 2
- 238000004321 preservation Methods 0.000 abstract 1
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- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 6
- 229920003192 poly(bis maleimide) Polymers 0.000 description 6
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- 239000007983 Tris buffer Substances 0.000 description 4
- JUIBLDFFVYKUAC-UHFFFAOYSA-N [5-(2-ethylhexanoylperoxy)-2,5-dimethylhexan-2-yl] 2-ethylhexaneperoxoate Chemical compound CCCCC(CC)C(=O)OOC(C)(C)CCC(C)(C)OOC(=O)C(CC)CCCC JUIBLDFFVYKUAC-UHFFFAOYSA-N 0.000 description 4
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- 238000002360 preparation method Methods 0.000 description 4
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- 239000000243 solution Substances 0.000 description 4
- ZLPORNPZJNRGCO-UHFFFAOYSA-N 3-methylpyrrole-2,5-dione Chemical compound CC1=CC(=O)NC1=O ZLPORNPZJNRGCO-UHFFFAOYSA-N 0.000 description 3
- 229920000178 Acrylic resin Polymers 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
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- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- 229910019142 PO4 Inorganic materials 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 3
- 239000003094 microcapsule Substances 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 229910000510 noble metal Inorganic materials 0.000 description 3
- 235000005985 organic acids Nutrition 0.000 description 3
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 3
- 239000010452 phosphate Substances 0.000 description 3
- 150000003014 phosphoric acid esters Chemical group 0.000 description 3
- 229920000642 polymer Polymers 0.000 description 3
- 239000003505 polymerization initiator Substances 0.000 description 3
- 229920005749 polyurethane resin Polymers 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
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- 239000002335 surface treatment layer Substances 0.000 description 3
- 239000011701 zinc Substances 0.000 description 3
- NSGXIBWMJZWTPY-UHFFFAOYSA-N 1,1,1,3,3,3-hexafluoropropane Chemical compound FC(F)(F)CC(F)(F)F NSGXIBWMJZWTPY-UHFFFAOYSA-N 0.000 description 2
- SEILKFZTLVMHRR-UHFFFAOYSA-N 2-phosphonooxyethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCOP(O)(O)=O SEILKFZTLVMHRR-UHFFFAOYSA-N 0.000 description 2
- XWUNIDGEMNBBAQ-UHFFFAOYSA-N Bisphenol A ethoxylate diacrylate Chemical compound C=1C=C(OCCOC(=O)C=C)C=CC=1C(C)(C)C1=CC=C(OCCOC(=O)C=C)C=C1 XWUNIDGEMNBBAQ-UHFFFAOYSA-N 0.000 description 2
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
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- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 2
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- UHESRSKEBRADOO-UHFFFAOYSA-N ethyl carbamate;prop-2-enoic acid Chemical compound OC(=O)C=C.CCOC(N)=O UHESRSKEBRADOO-UHFFFAOYSA-N 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
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- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 1
- BQARUDWASOOSRH-UHFFFAOYSA-N 2-tert-butylperoxypropan-2-yl hydrogen carbonate Chemical compound CC(C)(C)OOC(C)(C)OC(O)=O BQARUDWASOOSRH-UHFFFAOYSA-N 0.000 description 1
- BIISIZOQPWZPPS-UHFFFAOYSA-N 2-tert-butylperoxypropan-2-ylbenzene Chemical compound CC(C)(C)OOC(C)(C)C1=CC=CC=C1 BIISIZOQPWZPPS-UHFFFAOYSA-N 0.000 description 1
- MYUUUCVOWNDYCV-UHFFFAOYSA-N 3,3-dicyclohexyl-2-methylprop-2-enoic acid Chemical compound C1CCCCC1C(=C(C(O)=O)C)C1CCCCC1 MYUUUCVOWNDYCV-UHFFFAOYSA-N 0.000 description 1
- XTALUNJXILSOQT-UHFFFAOYSA-N 3,3-dimethyl-2h-biphenylene Chemical group C1=CC=C2C3=CCC(C)(C)C=C3C2=C1 XTALUNJXILSOQT-UHFFFAOYSA-N 0.000 description 1
- KFGFVPMRLOQXNB-UHFFFAOYSA-N 3,5,5-trimethylhexanoyl 3,5,5-trimethylhexaneperoxoate Chemical compound CC(C)(C)CC(C)CC(=O)OOC(=O)CC(C)CC(C)(C)C KFGFVPMRLOQXNB-UHFFFAOYSA-N 0.000 description 1
- FRIBMENBGGCKPD-UHFFFAOYSA-N 3-(2,3-dimethoxyphenyl)prop-2-enal Chemical compound COC1=CC=CC(C=CC=O)=C1OC FRIBMENBGGCKPD-UHFFFAOYSA-N 0.000 description 1
- SEZLVNATVKZSQO-UHFFFAOYSA-N 3-methyl-1-[3-(3-methyl-2,5-dioxopyrrol-1-yl)phenyl]pyrrole-2,5-dione Chemical compound O=C1C(C)=CC(=O)N1C1=CC=CC(N2C(C(C)=CC2=O)=O)=C1 SEZLVNATVKZSQO-UHFFFAOYSA-N 0.000 description 1
- ZYFIFFPWXKYFRR-UHFFFAOYSA-N 3-methyl-1-[4-[4-[1-[4-[4-(3-methyl-2,5-dioxopyrrol-1-yl)phenoxy]phenyl]decyl]phenoxy]phenyl]pyrrole-2,5-dione Chemical compound C=1C=C(OC=2C=CC(=CC=2)N2C(C(C)=CC2=O)=O)C=CC=1C(CCCCCCCCC)C(C=C1)=CC=C1OC(C=C1)=CC=C1N1C(=O)C=C(C)C1=O ZYFIFFPWXKYFRR-UHFFFAOYSA-N 0.000 description 1
- UMIADIZYYGHJBZ-UHFFFAOYSA-N 3-methyl-1-[4-[4-[2-[4-[4-(3-methyl-2,5-dioxopyrrol-1-yl)phenoxy]phenyl]propan-2-yl]phenoxy]phenyl]pyrrole-2,5-dione Chemical compound O=C1C(C)=CC(=O)N1C(C=C1)=CC=C1OC1=CC=C(C(C)(C)C=2C=CC(OC=3C=CC(=CC=3)N3C(C(C)=CC3=O)=O)=CC=2)C=C1 UMIADIZYYGHJBZ-UHFFFAOYSA-N 0.000 description 1
- IYMZEPRSPLASMS-UHFFFAOYSA-N 3-phenylpyrrole-2,5-dione Chemical compound O=C1NC(=O)C(C=2C=CC=CC=2)=C1 IYMZEPRSPLASMS-UHFFFAOYSA-N 0.000 description 1
- VPWNQTHUCYMVMZ-UHFFFAOYSA-N 4,4'-sulfonyldiphenol Chemical compound C1=CC(O)=CC=C1S(=O)(=O)C1=CC=C(O)C=C1 VPWNQTHUCYMVMZ-UHFFFAOYSA-N 0.000 description 1
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
- 101100325793 Arabidopsis thaliana BCA2 gene Proteins 0.000 description 1
- 239000004342 Benzoyl peroxide Substances 0.000 description 1
- OMPJBNCRMGITSC-UHFFFAOYSA-N Benzoylperoxide Chemical compound C=1C=CC=CC=1C(=O)OOC(=O)C1=CC=CC=C1 OMPJBNCRMGITSC-UHFFFAOYSA-N 0.000 description 1
- 229920002799 BoPET Polymers 0.000 description 1
- FVSKBQVTQRMJAJ-UHFFFAOYSA-N C(C)(C)(C)C=C[Si](C=C)(C=C)OO[Si](C=C)(C=C)C=CC(C)(C)C Chemical compound C(C)(C)(C)C=C[Si](C=C)(C=C)OO[Si](C=C)(C=C)C=CC(C)(C)C FVSKBQVTQRMJAJ-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical class S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- 101000777301 Homo sapiens Uteroglobin Proteins 0.000 description 1
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 1
- YIVJZNGAASQVEM-UHFFFAOYSA-N Lauroyl peroxide Chemical compound CCCCCCCCCCCC(=O)OOC(=O)CCCCCCCCCCC YIVJZNGAASQVEM-UHFFFAOYSA-N 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 1
- 239000004902 Softening Agent Substances 0.000 description 1
- 229920001807 Urea-formaldehyde Polymers 0.000 description 1
- 102100031083 Uteroglobin Human genes 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- UNKQAWPNGDCPTE-UHFFFAOYSA-N [2,5-dimethyl-5-(3-methylbenzoyl)peroxyhexan-2-yl] 3-methylbenzenecarboperoxoate Chemical compound CC1=CC=CC(C(=O)OOC(C)(C)CCC(C)(C)OOC(=O)C=2C=C(C)C=CC=2)=C1 UNKQAWPNGDCPTE-UHFFFAOYSA-N 0.000 description 1
- 235000011054 acetic acid Nutrition 0.000 description 1
- 150000008065 acid anhydrides Chemical class 0.000 description 1
- 125000003647 acryloyl group Chemical group O=C([*])C([H])=C([H])[H] 0.000 description 1
- 125000002723 alicyclic group Chemical group 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 230000003712 anti-aging effect Effects 0.000 description 1
- KGQLBLGDIQNGSB-UHFFFAOYSA-N benzene-1,4-diol;methoxymethane Chemical compound COC.OC1=CC=C(O)C=C1 KGQLBLGDIQNGSB-UHFFFAOYSA-N 0.000 description 1
- 229960003328 benzoyl peroxide Drugs 0.000 description 1
- 235000019400 benzoyl peroxide Nutrition 0.000 description 1
- JAHGTMJOPOCQIY-UHFFFAOYSA-N benzyl benzenecarboperoxoate Chemical compound C=1C=CC=CC=1C(=O)OOCC1=CC=CC=C1 JAHGTMJOPOCQIY-UHFFFAOYSA-N 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- FACXGONDLDSNOE-UHFFFAOYSA-N buta-1,3-diene;styrene Chemical compound C=CC=C.C=CC1=CC=CC=C1.C=CC1=CC=CC=C1 FACXGONDLDSNOE-UHFFFAOYSA-N 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- UPDZRIPMRHNKPZ-UHFFFAOYSA-N carboxyoxy 4,4-dimethoxybutyl carbonate Chemical compound COC(OC)CCCOC(=O)OOC(O)=O UPDZRIPMRHNKPZ-UHFFFAOYSA-N 0.000 description 1
- 238000010538 cationic polymerization reaction Methods 0.000 description 1
- 238000005119 centrifugation Methods 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 238000013329 compounding Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 239000007822 coupling agent Substances 0.000 description 1
- 229930003836 cresol Natural products 0.000 description 1
- SPTHWAJJMLCAQF-UHFFFAOYSA-M ctk4f8481 Chemical compound [O-]O.CC(C)C1=CC=CC=C1C(C)C SPTHWAJJMLCAQF-UHFFFAOYSA-M 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- QGBSISYHAICWAH-UHFFFAOYSA-N dicyandiamide Chemical compound NC(N)=NC#N QGBSISYHAICWAH-UHFFFAOYSA-N 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 239000003063 flame retardant Substances 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 230000009477 glass transition Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- WJRBRSLFGCUECM-UHFFFAOYSA-N hydantoin Chemical compound O=C1CNC(=O)N1 WJRBRSLFGCUECM-UHFFFAOYSA-N 0.000 description 1
- 229940091173 hydantoin Drugs 0.000 description 1
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical class I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 150000002460 imidazoles Chemical class 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 239000003999 initiator Substances 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 239000012948 isocyanate Substances 0.000 description 1
- 150000002513 isocyanates Chemical class 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- 125000005439 maleimidyl group Chemical group C1(C=CC(N1*)=O)=O 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- XNTUJOTWIMFEQS-UHFFFAOYSA-N octadecanoyl octadecaneperoxoate Chemical compound CCCCCCCCCCCCCCCCCC(=O)OOC(=O)CCCCCCCCCCCCCCCCC XNTUJOTWIMFEQS-UHFFFAOYSA-N 0.000 description 1
- SRSFOMHQIATOFV-UHFFFAOYSA-N octanoyl octaneperoxoate Chemical compound CCCCCCCC(=O)OOC(=O)CCCCCCC SRSFOMHQIATOFV-UHFFFAOYSA-N 0.000 description 1
- 150000002903 organophosphorus compounds Chemical class 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- AFEQENGXSMURHA-UHFFFAOYSA-N oxiran-2-ylmethanamine Chemical compound NCC1CO1 AFEQENGXSMURHA-UHFFFAOYSA-N 0.000 description 1
- 125000005634 peroxydicarbonate group Chemical group 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 1
- 229920006122 polyamide resin Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 239000002861 polymer material Substances 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 238000011417 postcuring Methods 0.000 description 1
- BWJUFXUULUEGMA-UHFFFAOYSA-N propan-2-yl propan-2-yloxycarbonyloxy carbonate Chemical compound CC(C)OC(=O)OOC(=O)OC(C)C BWJUFXUULUEGMA-UHFFFAOYSA-N 0.000 description 1
- YPVDWEHVCUBACK-UHFFFAOYSA-N propoxycarbonyloxy propyl carbonate Chemical compound CCCOC(=O)OOC(=O)OCCC YPVDWEHVCUBACK-UHFFFAOYSA-N 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 229920000468 styrene butadiene styrene block copolymer Polymers 0.000 description 1
- OPQYOFWUFGEMRZ-UHFFFAOYSA-N tert-butyl 2,2-dimethylpropaneperoxoate Chemical compound CC(C)(C)OOC(=O)C(C)(C)C OPQYOFWUFGEMRZ-UHFFFAOYSA-N 0.000 description 1
- SWAXTRYEYUTSAP-UHFFFAOYSA-N tert-butyl ethaneperoxoate Chemical compound CC(=O)OOC(C)(C)C SWAXTRYEYUTSAP-UHFFFAOYSA-N 0.000 description 1
- XTXFUQOLBKQKJU-UHFFFAOYSA-N tert-butylperoxy(trimethyl)silane Chemical compound CC(C)(C)OO[Si](C)(C)C XTXFUQOLBKQKJU-UHFFFAOYSA-N 0.000 description 1
- CPLLCUVYRHGZJW-UHFFFAOYSA-N tert-butylperoxycyclododecane Chemical compound CC(C)(C)OOC1CCCCCCCCCCC1 CPLLCUVYRHGZJW-UHFFFAOYSA-N 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
- 229910052723 transition metal Inorganic materials 0.000 description 1
- 150000003624 transition metals Chemical class 0.000 description 1
Landscapes
- Pigments, Carbon Blacks, Or Wood Stains (AREA)
- Adhesives Or Adhesive Processes (AREA)
- Combinations Of Printed Boards (AREA)
- Wire Bonding (AREA)
- Conductive Materials (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、表面処理を施した
表面処理導電性粒子、導電性粒子の処理方法及びそれを
用いた回路接続用接着剤、回路接続構造体に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to surface-treated conductive particles which have been surface-treated, a method for treating conductive particles, an adhesive for circuit connection using the same, and a circuit connection structure.
【0002】[0002]
【従来の技術】従来、液晶ディスプレイとTCP又はF
PCとTCPとの接続、FPCとプリント配線板との接
続には接着剤中に導電性粒子を分散させた異方導電性接
着剤が使用されている。また、最近では、半導体シリコ
ンチップを基板に実装する場合でも、従来のワイヤーボ
ンドではなく、半導体シリコンチップをフェイスダウン
で基板に直接実装するいわゆるフリップチップ実装が行
われており、ここでも異方導電性接着剤の適用が開始さ
れている(特開昭59−120436号、特開昭60−
191228号、特開平1−251787号、特開平7
−90237号公報)。2. Description of the Related Art Conventionally, a liquid crystal display and TCP or F
An anisotropic conductive adhesive in which conductive particles are dispersed in an adhesive is used for connection between PC and TCP and connection between FPC and printed wiring board. In addition, recently, even when a semiconductor silicon chip is mounted on a substrate, so-called flip-chip mounting in which the semiconductor silicon chip is directly mounted face down on the substrate is performed instead of the conventional wire bond. Application of a hydrophilic adhesive has been started (JP-A-59-120436, JP-A-60-
191228, JP-A-1-251787, JP-A-7
-90237).
【0003】[0003]
【発明が解決しようとする課題】近年、電子機器の小型
化、薄型化に伴い、回路の高密度化が進んでおり、電極
の間隔や電極幅が非常に狭くなっている。また、半導体
チップの接続に関しては接続に用いられるバンプが小さ
くなりバンプ間も非常に狭くなってきている。一般に導
電性粒子を含む接着剤を使用して、相対向する回路を接
続する場合、接続抵抗を小さくするためには、回路また
はバンプ上には導電性粒子が3個以上好ましくは5個以
上あることが必要である。しかしながら、回路間の幅や
バンプ間の間隔が狭くなった場合でも回路上に必要とさ
れる数の導電性粒子を配置するためには、接着剤中に含
まれる導電性粒子数を増加させる必要があるが、こうす
ると回路間に存在する導電性粒子数も増えてしまうため
に、絶縁性が低下する問題がある。このような問題を解
決するために、導電性粒子の周りを絶縁性樹脂で被覆し
て粒子同士が回路間で接触しても絶縁性が保たれるよう
な工夫がなされている(特開昭62-40183号公
報)。 しかしながら、これらの導電性粒子を絶縁樹脂
で被覆する方法では完全に被覆することが困難で、導電
性部分が露出しているため回路スペース間が狭くなった
ときに絶縁性の確保が困難になっている。また、完全に
被覆した場合には、接続後にその絶縁物が電極と粒子と
の接触を阻害することで接続抵抗が高くなってしまうこ
ともある。さらに、導電性粒子の表面が活性であると使
用前の保管中に異方導電性接着剤の硬化反応が進行し、
基板間の回路電極を接続する際に接着剤による接続が行
えなくなり保存安定性が低下するという問題があった。
本発明は、絶縁樹脂被覆導電性樹脂の被覆欠陥がなく、
また、保存安定性に優れた表面処理した導電性粒子とそ
の導電性粒子の処理方法を提供し、また、それを用いた
回路接続用接着剤、回路接続構造体を提供するものであ
る。In recent years, with the miniaturization and thinning of electronic equipment, the density of circuits has been increasing, and the spacing between electrodes and the width of electrodes have become extremely narrow. Also, regarding the connection of semiconductor chips, the bumps used for the connection are becoming smaller and the distance between the bumps is becoming very narrow. Generally, when connecting circuits facing each other using an adhesive containing conductive particles, in order to reduce the connection resistance, there are three or more, preferably five or more, conductive particles on the circuit or bump. It is necessary. However, it is necessary to increase the number of conductive particles contained in the adhesive in order to arrange the required number of conductive particles on the circuit even when the width between the circuits and the distance between the bumps are narrowed. However, in this case, the number of conductive particles existing between the circuits also increases, so that there is a problem that the insulating property deteriorates. In order to solve such a problem, measures have been taken so that the conductive particles are coated with an insulating resin so that the insulating property is maintained even when the particles come into contact with each other between circuits (Japanese Patent Laid-Open Publication No. Sho. 62-40183). However, it is difficult to completely cover these conductive particles with an insulating resin, and it becomes difficult to secure the insulating property when the circuit space becomes narrow because the conductive portion is exposed. ing. Further, in the case of complete coating, the insulating material may hinder the contact between the electrode and the particle after the connection, which may increase the connection resistance. Furthermore, if the surface of the conductive particles is active, the curing reaction of the anisotropic conductive adhesive proceeds during storage before use,
When connecting the circuit electrodes between the substrates, there is a problem that the connection cannot be made with an adhesive and the storage stability decreases.
The present invention has no coating defects of the insulating resin coated conductive resin,
Further, the present invention provides a surface-treated conductive particle having excellent storage stability, a method for treating the conductive particle, and a circuit connecting adhesive and a circuit connecting structure using the same.
【0004】[0004]
【課題を解決するための手段】以上のような状況で導電
性粒子の表面を効率よく被覆する方法を検討した結果、
Co(コバルト)、Ni(ニッケル)、Zn(亜鉛)、C
u(銅)などの金属を表面に含む導電性粒子とラジカル
重合性化合物、酸性化合物を水(水分)の存在下で攪拌
すると導電性粒子の表面に均一に樹脂皮膜を作製できる
ことを見出し本発明にいたった。即ち、本発明の第1の
形態は、(1)ラジカル重合性化合物、(2)酸性化合
物、(3)水を含む処理液で表面処理を施した表面処理
導電性粒子である。また、本発明の第2の形態は、
(1)ラジカル重合性化合物、(2)酸性化合物、
(3)水を含む処理液で表面処理を行うことを特徴とす
る表面処理導電性粒子の表面処理方法である。本発明の
第3の形態は、回路接続用接着剤を相対向する回路電極
を有する基板間に介在させ、相対向する回路電極を有す
る基板を加圧して加圧方向の電極間を電気的に接続する
回路接続用接着剤であって、前記回路接続用接着剤が上
記に記載の表面処理した表面処理導電性粒子を使用する
ことを特徴とする回路接続用接着剤である。本発明の第
4の形態は、回路接続用接着剤を相対向する回路電極を
有する基板間に介在させ、相対向する回路電極を有する
基板を加圧して加圧方向の電極間を電気的に接続した接
続構造体であって、前記回路接続用接着剤が上記に記載
の表面処理した導電性粒子を使用した接着剤である回路
接続構造体である。[Means for Solving the Problems] As a result of studying a method for efficiently coating the surface of conductive particles in the above situation,
Co (cobalt), Ni (nickel), Zn (zinc), C
It was found that a conductive resin particle containing a metal such as u (copper) on the surface, a radically polymerizable compound, and an acidic compound can be uniformly formed on the surface of the conductive particle by stirring in the presence of water (water). Came to That is, the first aspect of the present invention is surface-treated conductive particles that have been surface-treated with a treatment liquid containing (1) a radically polymerizable compound, (2) an acidic compound, and (3) water. A second aspect of the present invention is
(1) radically polymerizable compound, (2) acidic compound,
(3) A surface treatment method for surface-treating conductive particles, which comprises performing a surface treatment with a treatment liquid containing water. According to a third aspect of the present invention, an adhesive for circuit connection is interposed between substrates having circuit electrodes facing each other, and a substrate having circuit electrodes facing each other is pressed to electrically connect the electrodes in the pressing direction. A circuit connecting adhesive for connecting, wherein the circuit connecting adhesive uses the surface-treated conductive particles subjected to the surface treatment described above. According to a fourth aspect of the present invention, an adhesive for circuit connection is interposed between substrates having circuit electrodes facing each other, and a substrate having circuit electrodes facing each other is pressed to electrically connect the electrodes in the pressing direction. A connected connection structure, wherein the circuit connection adhesive is an adhesive using the surface-treated conductive particles described above.
【0005】[0005]
【発明の実施の形態】本発明で使用する導電性粒子は、
電気的接続を得ることができる導電性を有していればと
くに制限はないが、Co,Ni,Zn,Cuを含む導電性
粒子であり、セラミックス、プラスチックなどを前記導
電性物質で被覆したものも使用できる。さらにその導電
性物質を被覆した粒子をAu,Agで被覆したものも使
用できる。このとき、被覆する金属層の厚さは十分な導
電性を得るためには100Å以上が好ましい。Co,Z
n,Cu、Ni等の遷移金属の上に貴金属類の層を設け
る場合では、貴金属類層の欠損や導電粒子の混合分散時
に生じる貴金属類層の欠損等により生じる酸化還元作用
で遊離ラジカルが発生しポットライフ低下引き起こすた
め、導電性粒子を表面処理する。導電性粒子は、接着剤
成分に対して、0.1〜30体積%の範囲で使用し、好
ましくは0.1〜20体積%の範囲で使用することがで
きる。BEST MODE FOR CARRYING OUT THE INVENTION The conductive particles used in the present invention are
There is no particular limitation as long as it has electrical conductivity capable of obtaining electrical connection, but it is a conductive particle containing Co, Ni, Zn, Cu, and ceramics, plastics, etc. coated with the above-mentioned conductive substance. Can also be used. Further, particles in which the conductive material is coated with Au or Ag can be used. At this time, the thickness of the metal layer to be coated is preferably 100 Å or more in order to obtain sufficient conductivity. Co, Z
When a noble metal layer is provided on a transition metal such as n, Cu, or Ni, free radicals are generated by the redox action caused by the loss of the noble metal layer or the loss of the noble metal layer that occurs when the conductive particles are mixed and dispersed. The surface treatment of the conductive particles is performed because the pot life is shortened. The conductive particles can be used in the range of 0.1 to 30% by volume, preferably 0.1 to 20% by volume with respect to the adhesive component.
【0006】本発明で使用するラジカル重合性化合物
は、ラジカルにより重合する官能基を有する化合物で、
(メタ)アクリレート樹脂、マレイミド樹脂、シトラコ
ンイミド樹脂、ナジイミド樹脂などがあり、2種類以上
を混合して使用してもよい。またラジカル重合性化合物
は、モノマー、オリゴマーいずれの状態でも使用するこ
とができ、モノマーとオリゴマーを混合して用いてもよ
い。(メタ)アクリレート樹脂としては、(メタ)アク
リレートをラジカル重合させることで得られるもので、
(メタ)アクリレートとしてはメチル(メタ)アクリレ
ート、エチル(メタ)アクリレート、イソプロピル(メ
タ)アクリレート、イソブチル(メタ)アクリレート、
エチレングリコールジ(メタ)アクリレート、ジエチレ
ングリコールジ(メタ)アクリレート、トリメチロール
プロパントリ(メタ)アクリレート、テトラメチレング
リコールテトラ(メタ)アクリレート、2−ヒドロキシ
−1,3−ジアクリロキシプロパン、2,2−ビス[4
−(アクリロキシメトキシ)フェニル]プロパン、2,
2−ビス[4−(アクリロキシエトキシ)フェニル]プロ
パン、ジシクロヘキシル(メタ)アクリレート、ジシク
ロペンテニル(メタ)アクリレート、トリシクロデカニ
ル(メタ)アクリレート、トリス(アクリロキシエチ
ル)イソシアヌレート、ウレタン(メタ)アクリレー
ト、イソシアヌール酸エチレンオキシド変性ジアクリレ
ート、モノ(2−メタクリロイルオキシエチル)アシッ
ドホスフェート、ジ(2−メタクリロイルオキシエチ
ル)アシッドホスフェートなどが挙げられ、単独または
2種類以上を混合して用いても良い。また、必要によっ
ては、ハイドロキノン、メチルエーテルハイドロキノン
等のラジカル重合禁止剤を硬化性が損なわれない範囲で
使用しても良い。The radically polymerizable compound used in the present invention is a compound having a functional group which is polymerized by radicals,
There are (meth) acrylate resins, maleimide resins, citracone imide resins, nadiimide resins and the like, and two or more kinds may be mixed and used. The radical polymerizable compound can be used in any state of monomer and oligomer, and the monomer and oligomer may be mixed and used. The (meth) acrylate resin is obtained by radically polymerizing (meth) acrylate,
As (meth) acrylate, methyl (meth) acrylate, ethyl (meth) acrylate, isopropyl (meth) acrylate, isobutyl (meth) acrylate,
Ethylene glycol di (meth) acrylate, diethylene glycol di (meth) acrylate, trimethylolpropane tri (meth) acrylate, tetramethylene glycol tetra (meth) acrylate, 2-hydroxy-1,3-diacryloxypropane, 2,2- Screw [4
-(Acryloxymethoxy) phenyl] propane, 2,
2-bis [4- (acryloxyethoxy) phenyl] propane, dicyclohexyl (meth) acrylate, dicyclopentenyl (meth) acrylate, tricyclodecanyl (meth) acrylate, tris (acryloxyethyl) isocyanurate, urethane (meth ) Acrylate, isocyanuric acid ethylene oxide-modified diacrylate, mono (2-methacryloyloxyethyl) acid phosphate, di (2-methacryloyloxyethyl) acid phosphate, and the like, and may be used alone or in combination of two or more. . Further, if necessary, a radical polymerization inhibitor such as hydroquinone or methyl ether hydroquinone may be used within a range that does not impair the curability.
【0007】マレイミド樹脂としては、分子中にマレイ
ミド基を少なくとも1個有しているもので、例えば、フ
ェニルマレイミド、1−メチル−2,4−ビスマレイミ
ドベンゼン、N,N'−m−フェニレンビスマレイミド、N,
N'−p−フェニレンビスマレイミド、N,N'−4,4−ビ
フェニレンビスマレイミド、N,N'−4,4−(3,3−
ジメチルビフェニレン)ビスマレイミド、N,N'−4,4
−(3,3−ジメチルジフェニルメタン)ビスマレイミ
ド、N,N'−4,4−(3,3−ジエチルジフェニルメタ
ン)ビスマレイミド、N,N'−4,4−ジフェニルメタン
ビスマレイミド、N,N'−4,4−ジフェニルプロパンビ
スマレイミド、N,N'−4,4−ジフェニルエーテルビス
マレイミド、N,N'−4,4−ジフェニルスルホンビスマ
レイミド、2,2−ビス(4−(4−マレイミドフェノ
キシ)フェニル)プロパン、2,2−ビス(3−s−ブ
チル−3,4−(4−マレイミドフェノキシ)フェニ
ル)プロパン、1,1−ビス(4−(4−マレイミドフ
ェノキシ)フェニル)デカン、4,4'−シクロヘキシ
リデン−ビス(1−(4−マレイミドフェノキシ)フェ
ノキシ)−2−シクロヘキシルベンゼン、2,2−ビス
(4−(4−マレイミドフェノキシ)フェニル)ヘキサ
フルオロプロパンなどが有り、単独でも2種類以上を混
合して使用しても良い。The maleimide resin has at least one maleimide group in the molecule, and examples thereof include phenylmaleimide, 1-methyl-2,4-bismaleimidebenzene, and N, N'-m-phenylenebis. Maleimide, N,
N'-p-phenylene bismaleimide, N, N'-4,4-biphenylene bismaleimide, N, N'-4,4- (3,3-
Dimethylbiphenylene) bismaleimide, N, N'-4,4
-(3,3-Dimethyldiphenylmethane) bismaleimide, N, N'-4,4- (3,3-diethyldiphenylmethane) bismaleimide, N, N'-4,4-diphenylmethane bismaleimide, N, N'- 4,4-diphenylpropane bismaleimide, N, N'-4,4-diphenylether bismaleimide, N, N'-4,4-diphenylsulfone bismaleimide, 2,2-bis (4- (4-maleimidophenoxy) Phenyl) propane, 2,2-bis (3-s-butyl-3,4- (4-maleimidophenoxy) phenyl) propane, 1,1-bis (4- (4-maleimidophenoxy) phenyl) decane, 4, 4'-cyclohexylidene-bis (1- (4-maleimidophenoxy) phenoxy) -2-cyclohexylbenzene, 2,2-bis (4- (4-maleimidophene) ) Phenyl) hexafluoropropane there may be used a mixture of two or more in combination.
【0008】シトラコンイミド樹脂としては、分子中に
シトラコンイミド基を少なくとも1個有しているシトラ
コンイミド化合物を重合させたもので、シトラコンイミ
ド化合物としては、例えば、フェニルシトラコンイミ
ド、1−メチル−2,4−ビスシトラコンイミドベンゼ
ン、N,N'−m−フェニレンビスシトラコンイミド、N,N'
−p−フェニレンビスシトラコンイミド、N,N'−4,4
−ビフェニレンビスシトラコンイミド、N,N'−4,4−
(3,3−ジメチルビフェニレン)ビスシトラコンイミ
ド、N,N'−4,4−(3,3−ジメチルジフェニルメタ
ン)ビスシトラコンイミド、N,N'−4,4−(3,3−
ジエチルジフェニルメタン)ビスシトラコンイミド、N,
N'−4,4−ジフェニルメタンビスシトラコンイミド、
N,N'−4,4−ジフェニルプロパンビスシトラコンイミ
ド、N,N'−4,4−ジフェニルエーテルビスシトラコン
イミド、N,N'−4,4−ジフェニルスルホンビスシトラ
コンイミド、2,2−ビス(4−(4−シトラコンイミ
ドフェノキシ)フェニル)プロパン、2,2−ビス(3
−s−ブチル−3,4−(4−シトラコンイミドフェノ
キシ)フェニル)プロパン、1,1−ビス(4−(4−
シトラコンイミドフェノキシ)フェニル)デカン、4,
4'−シクロヘキシリデン−ビス(1−(4−シトラコ
ンイミドフェノキシ)フェノキシ)−2−シクロヘキシ
ルベンゼン、2,2−ビス(4−(4−シトラコンイミ
ドフェノキシ)フェニル)ヘキサフルオロプロパンなど
が有り、単独でも2種類以上を混合して使用しても良
い。The citraconimide resin is obtained by polymerizing a citraconimide compound having at least one citraconimide group in the molecule. Examples of the citraconimide compound include phenyl citraconimide and 1-methyl-2. , 4-biscitraconimide benzene, N, N'-m-phenylene biscitraconimide, N, N '
-P-phenylene bis citraconimide, N, N'-4,4
-Biphenylene biscitraconimide, N, N'-4,4-
(3,3-Dimethylbiphenylene) biscitraconimide, N, N'-4,4- (3,3-dimethyldiphenylmethane) biscitraconimide, N, N'-4,4- (3,3-
Diethyldiphenylmethane) biscitraconimide, N,
N'-4,4-diphenylmethanebiscitraconimide,
N, N'-4,4-diphenylpropanebiscitraconimide, N, N'-4,4-diphenyletherbiscitraconimide, N, N'-4,4-diphenylsulfonebiscitraconimide, 2,2-bis ( 4- (4-citraconimidophenoxy) phenyl) propane, 2,2-bis (3
-S-Butyl-3,4- (4-citraconimidophenoxy) phenyl) propane, 1,1-bis (4- (4-
Citraconimidophenoxy) phenyl) decane, 4,
4'-cyclohexylidene-bis (1- (4-citraconimidophenoxy) phenoxy) -2-cyclohexylbenzene, 2,2-bis (4- (4-citraconimidophenoxy) phenyl) hexafluoropropane, etc., You may use individually or in mixture of 2 or more types.
【0009】ナジイミド樹脂としては、分子中にナジイ
ミド基を少なくとも1個有しているナジイミド化合物を
重合したもので、ナジイミド化合物としては、例えば、
フェニルナジイミド、1−メチル−2,4−ビスナジイ
ミドベンゼン、N,N'−m−フェニレンビスナジイミド、
N,N'−p−フェニレンビスナジイミド、N,N'−4,4−
ビフェニレンビスナジイミド、N,N'−4,4−(3,3
−ジメチルビフェニレン)ビスナジイミド、N,N'−4,
4−(3,3−ジメチルジフェニルメタン)ビスナジイ
ミド、N,N'−4,4−(3,3−ジエチルジフェニルメ
タン)ビスナジイミド、N,N'−4,4−ジフェニルメタ
ンビスナジイミド、N,N'−4,4−ジフェニルプロパン
ビスナジイミド、N,N'−4,4−ジフェニルエーテルビ
スナジイミド、N,N'−4,4−ジフェニルスルホンビス
ナジイミド、2,2−ビス(4−(4−ナジイミドフェ
ノキシ)フェニル)プロパン、2,2−ビス(3−s−
ブチル−3,4−(4−ナジイミドフェノキシ)フェニ
ル)プロパン、1,1−ビス(4−(4−ナジイミドフ
ェノキシ)フェニル)デカン、4,4'−シクロヘキシ
リデン−ビス(1−(4−ナジイミドフェノキシ)フェ
ノキシ)−2−シクロヘキシルベンゼン、2,2−ビス
(4−(4−ナジイミドフェノキシ)フェニル)ヘキサ
フルオロプロパンなどが有り、単独でも2種類以上を混
合して使用しても良い。The nadimide resin is obtained by polymerizing a nadimide compound having at least one nadimide group in the molecule. Examples of the nadimide compound include:
Phenylnadiimide, 1-methyl-2,4-bisnadiimidebenzene, N, N'-m-phenylenebisnadiimide,
N, N'-p-phenylenebisnadiimide, N, N'-4,4-
Biphenylene bis nadiimide, N, N'-4,4- (3,3
-Dimethylbiphenylene) bisnadiimide, N, N'-4,
4- (3,3-dimethyldiphenylmethane) bisnadiimide, N, N'-4,4- (3,3-diethyldiphenylmethane) bisnadiimide, N, N'-4,4-diphenylmethanebisnadiimide, N, N'-4 , 4-diphenylpropane bisnadimide, N, N'-4,4-diphenyl ether bisnadimide, N, N'-4,4-diphenylsulfone bisnadimide, 2,2-bis (4- (4-nadimide phenoxy) Phenyl) propane, 2,2-bis (3-s-
Butyl-3,4- (4-nadiimidophenoxy) phenyl) propane, 1,1-bis (4- (4-nadiimidophenoxy) phenyl) decane, 4,4′-cyclohexylidene-bis (1- ( 4-nadiimidophenoxy) phenoxy) -2-cyclohexylbenzene, 2,2-bis (4- (4-nadiimidophenoxy) phenyl) hexafluoropropane, and the like, which may be used alone or in combination of two or more. Is also good.
【0010】本発明で使用する酸性化合物としては特に
制限はなく、一般に酸性を示す化合物を使用することが
できる。具体的には、塩酸、硫酸、りん酸、硝酸、フッ
酸などの無機酸、酢酸、蓚酸、蟻酸、マレイン酸、フタ
ル酸、イソフタル酸、テレフタル酸などの有機酸を使用
することができる。上記の酸性化合物は、ラジカル重合
性化合物100に対して、0.01〜30重量%で使用
する。0.01重量%未満では、表面処理が不完全にな
り、粒子全体を処理することが困難になり、30重量%
を超えて多い場合には表面処理層の厚さが厚くなり導電
性が低下する。また、水の使用量は、ラジカル重合性化
合物に対して、0.01〜50重量%であることが好ま
しい。0.01重量%未満では、表面処理が不完全にな
り、粒子全体を処理することが困難になり、50重量%
を超えて多い場合には表面処理層の厚さが厚くなり導電
性が低下する。The acidic compound used in the present invention is not particularly limited, and generally acidic compounds can be used. Specifically, inorganic acids such as hydrochloric acid, sulfuric acid, phosphoric acid, nitric acid and hydrofluoric acid, and organic acids such as acetic acid, oxalic acid, formic acid, maleic acid, phthalic acid, isophthalic acid and terephthalic acid can be used. The above acidic compound is used in an amount of 0.01 to 30% by weight based on 100 of the radically polymerizable compound. If it is less than 0.01% by weight, the surface treatment will be incomplete, and it will be difficult to treat the whole particle,
When it is more than the above range, the thickness of the surface treatment layer becomes large and the conductivity decreases. The amount of water used is preferably 0.01 to 50% by weight based on the radically polymerizable compound. If it is less than 0.01% by weight, the surface treatment will be incomplete, and it will be difficult to treat the whole particle,
When it is more than the above range, the thickness of the surface treatment layer becomes large and the conductivity decreases.
【0011】本発明で行う表面処理は有機溶剤中で行う
ことが好ましい。有機溶剤としては、ラジカル重合性化
合物を溶解すれば特に制限はないが、水とも均一に混合
できるものであればより好ましい。本発明で使用する有
機溶剤としては、メタノール、エタノール、イソプロピ
ルアルコール、アセトン、酢酸エチル、ジメチルホルム
アミド、ジメチルアセトアミド、N−メチルピロリドン
などが用いることができる。また、メチルエチルケト
ン、トルエン、キシレン、シクロヘキサンなど、水と混
合できないものであっても溶解性を損なわない範囲で使
用可能である。なかでも、メタノール、エタノール、ア
セトン、酢酸エチルが処理後の乾燥を容易にできる点で
好ましい。有機溶剤中に含まれるラジカル重合性化合物
は、有機溶剤100に対し、0.05〜10重量%が好
ましい。0.05重量%未満の場合には、表面処理が不
完全になり、粒子全体を処理することが困難になり、1
0重量%を超えて多い場合には表面処理層の厚さが厚く
なり導電性が低下する。表面処理する場合の処理条件と
しては特に制限はないが、温度20℃から100℃、時
間0.5分から10時間の間で行うことができ、温度は
使用する有機溶剤の沸点などにより適宜選択することが
できる。処理を行った導電性粒子は、ろ過、遠心分離な
どにより、処理液と分離し乾燥して使用する。乾燥条件
としては、特に制限はないが、処理液に使用する有機溶
剤が完全に乾燥できる温度を選択することが好ましく、
おおむね20℃〜150℃である。乾燥時間も特に制限
はなく1分〜2時間の間で選択される。The surface treatment of the present invention is preferably performed in an organic solvent. The organic solvent is not particularly limited as long as it can dissolve the radically polymerizable compound, but it is more preferable as long as it can be uniformly mixed with water. As the organic solvent used in the present invention, methanol, ethanol, isopropyl alcohol, acetone, ethyl acetate, dimethylformamide, dimethylacetamide, N-methylpyrrolidone and the like can be used. Further, even those which are immiscible with water, such as methyl ethyl ketone, toluene, xylene, and cyclohexane, can be used within a range that does not impair the solubility. Of these, methanol, ethanol, acetone, and ethyl acetate are preferable because they can be easily dried after the treatment. The radically polymerizable compound contained in the organic solvent is preferably 0.05 to 10% by weight with respect to 100 of the organic solvent. If the amount is less than 0.05% by weight, the surface treatment becomes incomplete and it becomes difficult to treat the whole particles,
If the amount is more than 0% by weight, the thickness of the surface treatment layer becomes thick and the conductivity is lowered. The treatment conditions for the surface treatment are not particularly limited, but the temperature may be 20 ° C. to 100 ° C. and the time may be 0.5 minutes to 10 hours, and the temperature is appropriately selected depending on the boiling point of the organic solvent used. be able to. The treated conductive particles are separated from the treatment liquid by filtration, centrifugation, etc. and dried before use. The drying conditions are not particularly limited, but it is preferable to select a temperature at which the organic solvent used in the treatment liquid can be completely dried,
The temperature is generally 20 ° C to 150 ° C. The drying time is not particularly limited and is selected from 1 minute to 2 hours.
【0012】前記表面処理導電性粒子を接着剤中に分散
させることで回路接続用接着剤とすることができる。こ
の際、絶縁性を低下させない範囲で、表面処理をしてい
ない導電性粒子を混合してもよい。本発明で用いる接着
剤としては、スチレン-ブタジエン-スチレン共重合体、
スチレン-イソプレン-スチレン共重合体などの熱可塑性
樹脂や、エポキシ樹脂、(メタ)アクリル樹脂、マレイ
ミド樹脂、シトラコンイミド樹脂、ナジイミド樹脂、フ
ェノール樹脂などの熱硬化性樹脂が使用されるが、耐熱
性や信頼性の点で熱硬化性樹脂を使用することが好まし
く、特に(メタ)アクリル樹脂、マレイミド樹脂、シト
ラコンイミド樹脂、ナジイミド樹脂を用いたラジカル重
合系を使用した場合には低温短時間で接続することがで
きる。An adhesive for circuit connection can be obtained by dispersing the surface-treated conductive particles in the adhesive. At this time, conductive particles that have not been surface-treated may be mixed within a range that does not deteriorate the insulating property. The adhesive used in the present invention, styrene-butadiene-styrene copolymer,
Thermoplastic resins such as styrene-isoprene-styrene copolymer and thermosetting resins such as epoxy resin, (meth) acrylic resin, maleimide resin, citracone imide resin, nadiimide resin and phenol resin are used, but heat resistance It is preferable to use a thermosetting resin from the viewpoint of reliability and reliability, especially when using a radical polymerization system using a (meth) acrylic resin, a maleimide resin, a citracone imide resin, a nadimide resin can do.
【0013】(メタ)アクリル樹脂としては、(メタ)
アクリレートをラジカル重合させることで得られるもの
で、(メタ)アクリレートとしては、メチル(メタ)ア
クリレート、エチル(メタ)アクリレート、イソプロピ
ル(メタ)アクリレート、イソブチル(メタ)アクリレ
ート、エテレングリコールジ(メタ)アクリレート、ジ
エチレングリコールジ(メタ)アクリレート、トリメチ
ロールプロパントリ(メタ)アクリレート、テトラメチ
レングリコールテトラ(メタ)アクリレート、2−ヒド
ロキシ−1,3−ジアクリロキシプロパン、2,2−ビ
ス[4−(アクリロキシメトキシ)フェニル]プロパン、
2,2−ビス[4−(アクリロキシエトキシ)フェニル]
プロパン、ジシクロペンテニル(メタ)アクリレートト
リシクロデカニル(メタ)アクリレート、トリス(アク
リロキシエチル)イソシアヌレート、ウレタン(メタ)
アクリレートなどが挙げられ、単独または2種類以上を
混合して用いても良い。 さらに、接着剤成分中にリン
酸エステル構造を有するラジカル重合性物質を使用した
場合、金属等無機物に対する接着力を向上することがで
きる。リン酸エステル構造を有するラジカル重合性物質
の使用量は、0.1〜10重量部であり、好ましくは
0.5〜5重量部である。リン酸エステル構造を有する
ラジカル重合性物質は、無水リン酸と2−ヒドロキシエ
チル(メタ)アクリレートの反応生成物として得られ
る。具体的には、モノ(2−メタクリロイルオキシエチ
ル)アシッドホスフェート、ジ(2−メタクリロイルオ
キシエチル)アシッドホスフェート等が有り、単独でも
混合して使用しても良い。マレイミド樹脂、シトラコン
イミド樹脂、ナジイミド樹脂は、前記のラジカル重合性
化合物と同じものが使用できる。接着剤中に上記のラジ
カル重合性化合物を使用した場合には、重合開始剤を使
用する。重合開始剤としては、熱または光によってラジ
カルを発生する化合物であれば特に制限はなく、過酸化
物、アゾ化合物などがあり、目的とする接続温度、接続
時間、保存安定性等を考慮し適宜選択されるが、高反応
性と保存安定性の点から、半減期10時間の温度が、4
0℃以上かつ、半減期1分の温度が180℃以下の有機
過酸化物が好ましく、半減期10時間の温度が、50℃
以上かつ、半減期1分の温度が170℃以下の有機過酸
化物が特に好ましい。重合開始剤の配合量は、1〜20
重量%が好ましく、2〜15重量%が特に好ましい。本
発明で使用される有機過酸化物の具体的な化合物として
は、ジアシルパーオキサイド、パーオキシジカーボネー
ト、パーオキシエステル、パーオキシケタール、ジアル
キルパーオキサイド、ハイドロパーオキサイド、シリル
パーオキサイドなどから選定できるが、パーオキシエス
テル、ジアルキルパーオキサイド、ハイドロパーオキサ
イド、シリルパーオキサイドは、開始剤中の塩素イオン
や有機酸が5000ppm以下であり、加熱分解後に発
生する有機酸が少なく、回路部材の接続端子の腐食を抑
えることができるため特に好ましい。The (meth) acrylic resin includes (meth)
It is obtained by radically polymerizing an acrylate, and examples of the (meth) acrylate include methyl (meth) acrylate, ethyl (meth) acrylate, isopropyl (meth) acrylate, isobutyl (meth) acrylate, and ethene glycol di (meth) acrylate. Acrylate, diethylene glycol di (meth) acrylate, trimethylolpropane tri (meth) acrylate, tetramethylene glycol tetra (meth) acrylate, 2-hydroxy-1,3-diacryloxypropane, 2,2-bis [4- (acryloyl) Roxymethoxy) phenyl] propane,
2,2-bis [4- (acryloxyethoxy) phenyl]
Propane, dicyclopentenyl (meth) acrylate tricyclodecanyl (meth) acrylate, tris (acryloxyethyl) isocyanurate, urethane (meth)
Examples thereof include acrylates, which may be used alone or in combination of two or more. Furthermore, when a radical polymerizable substance having a phosphoric acid ester structure is used in the adhesive component, it is possible to improve the adhesive force to an inorganic substance such as a metal. The amount of the radically polymerizable substance having a phosphoric acid ester structure used is 0.1 to 10 parts by weight, preferably 0.5 to 5 parts by weight. The radical polymerizable substance having a phosphoric acid ester structure is obtained as a reaction product of phosphoric anhydride and 2-hydroxyethyl (meth) acrylate. Specifically, there are mono (2-methacryloyloxyethyl) acid phosphate, di (2-methacryloyloxyethyl) acid phosphate and the like, which may be used alone or in combination. As the maleimide resin, citraconic imide resin and nadimide resin, the same radical polymerizable compounds as described above can be used. When the above radical polymerizable compound is used in the adhesive, a polymerization initiator is used. The polymerization initiator is not particularly limited as long as it is a compound that generates a radical by heat or light, and may be a peroxide, an azo compound, or the like, and may be appropriately selected in consideration of the desired connection temperature, connection time, storage stability, and the like. Although selected, a temperature with a half-life of 10 hours is 4 from the viewpoint of high reactivity and storage stability.
An organic peroxide having a temperature of 0 ° C or higher and a half-life of 1 minute of 180 ° C or lower is preferable, and a temperature of a half-life of 10 hours is 50 ° C.
Above all, an organic peroxide having a half-life of 1 minute at 170 ° C. or lower is particularly preferable. The compounding amount of the polymerization initiator is 1 to 20.
% By weight is preferred and 2 to 15% by weight is particularly preferred. Specific examples of the organic peroxide used in the present invention can be selected from diacyl peroxide, peroxydicarbonate, peroxyester, peroxyketal, dialkyl peroxide, hydroperoxide, silyl peroxide, and the like. However, peroxyesters, dialkyl peroxides, hydroperoxides, and silyl peroxides have less than 5000 ppm of chlorine ions and organic acids in the initiator, and the organic acids generated after thermal decomposition are small, and the It is particularly preferable because it can suppress corrosion.
【0014】ジアシルパーオキサイド類としては、イソ
ブチルパーオキサイド、2,4−ジクロロベンゾイルパ
ーオキサイド、3,5,5−トリメチルヘキサノイルパ
ーオキサイド、オクタノイルパーオキサイド、ラウロイ
ルパーオキサイド、ステアロイルパーオキサイド、スク
シニックパーオキサイド、ベンゾイルパーオキシトルエ
ン、ベンゾイルパーオキサイド等が挙げられる。Examples of diacyl peroxides include isobutyl peroxide, 2,4-dichlorobenzoyl peroxide, 3,5,5-trimethylhexanoyl peroxide, octanoyl peroxide, lauroyl peroxide, stearoyl peroxide and succinic. Examples thereof include peroxide, benzoylperoxytoluene, and benzoylperoxide.
【0015】パーオキシジカーボネート類としては、ジ
−n−プロピルパーオキシジカーボネート、ジイソプロ
ピルパーオキシジカーボネート、ビス(4−t−ブチル
シクロヘキシル)パーオキシジカーボネート、ジ−2−
エトキシメトキシパーオキシジカーボネート、ジ(2−
エチルヘキシルパーオキシ)ジカーボネート、ジメトキ
シブチルパーオキシジカーボネート、ジ(3−メチル−
3−メトキシブチルパーオキシ)ジカーボネート等が挙
げられる。Examples of peroxydicarbonates include di-n-propylperoxydicarbonate, diisopropylperoxydicarbonate, bis (4-t-butylcyclohexyl) peroxydicarbonate and di-2-
Ethoxymethoxyperoxydicarbonate, di (2-
Ethylhexyl peroxy) dicarbonate, dimethoxybutyl peroxydicarbonate, di (3-methyl-
3-methoxybutyl peroxy) dicarbonate and the like can be mentioned.
【0016】パーオキシエステル類としては、クミルパ
ーオキシネオデカノエート、1,1,3,3−テトラメ
チルブチルパーオキシネオデカノエート、1−シクロヘ
キシル−1−メチルエチルパーオキシノエデカノエー
ト、t−ヘキシルパーオキシネオデカノエート、t−ブ
チルパーオキシピバレート、1,1,3,3−テトラメ
チルブチルパーオキシ−2−エチルヘキサノネート、
2,5−ジメチル−2,5−ジ(2−エチルヘキサノイ
ルパーオキシ)ヘキサン、1−シクロヘキシル−1−メ
チルエチルパーオキシ−2−エチルヘキサノネート、t
−ヘキシルパーオキシ−2−エチルヘキサノネート、t
−ブチルパーオキシ−2−エチルヘキサノネート、t−
ブチルパーオキシイソブチレート、1,1−ビス(t−
ブチルパーオキシ)シクロヘキサン、t−ヘキシルパー
オキシイソプロピルモノカーボネート、t−ブチルパー
オキシ−3,5,5−トリメチルヘキサノネート、t−
ブチルパーオキシラウレート、2,5−ジメチル−2,
5−ジ(m−トルオイルパーオキシ)ヘキサン、t−ブ
チルパーオキシイソプロピルモノカーボネート、t−ブ
チルパーオキシ−2−エチルヘキシルモノカーボネー
ト、t−ヘキシルパーオキシベンゾエート、t−ブチル
パーオキシアセテート等を挙げることができる。Peroxyesters include cumyl peroxy neodecanoate, 1,1,3,3-tetramethylbutyl peroxy neodecanoate, 1-cyclohexyl-1-methylethyl peroxynoedecanoate. , T-hexyl peroxy neodecanoate, t-butyl peroxypivalate, 1,1,3,3-tetramethylbutyl peroxy-2-ethyl hexanonate,
2,5-Dimethyl-2,5-di (2-ethylhexanoylperoxy) hexane, 1-cyclohexyl-1-methylethylperoxy-2-ethylhexanonate, t
-Hexylperoxy-2-ethylhexanonate, t
-Butyl peroxy-2-ethyl hexanonate, t-
Butyl peroxyisobutyrate, 1,1-bis (t-
Butyl peroxy) cyclohexane, t-hexyl peroxy isopropyl monocarbonate, t-butyl peroxy-3,5,5-trimethylhexanonate, t-
Butyl peroxylaurate, 2,5-dimethyl-2,
5-di (m-toluoylperoxy) hexane, t-butylperoxyisopropyl monocarbonate, t-butylperoxy-2-ethylhexylmonocarbonate, t-hexylperoxybenzoate, t-butylperoxyacetate and the like. be able to.
【0017】パーオキシケタール類では、1,1−ビス
(t−ヘキシルパーオキシ)−3,3,5−トリメチル
シクロヘキサン、1,1−ビス(t−ヘキシルパーオキ
シ)シクロヘキサン、1,1−ビス(t−ブチルパーオ
キシ)−3,3,5−トリメチルシクロヘキサン、1,
1−(t−ブチルパーオキシ)シクロドデカン、2,2
−ビス(t−ブチルパーオキシ)デカン等が挙げられ
る。Among the peroxyketals, 1,1-bis (t-hexylperoxy) -3,3,5-trimethylcyclohexane, 1,1-bis (t-hexylperoxy) cyclohexane, 1,1-bis (T-butylperoxy) -3,3,5-trimethylcyclohexane, 1,
1- (t-butylperoxy) cyclododecane, 2,2
-Bis (t-butylperoxy) decane and the like.
【0018】ジアルキルパーオキサイド類では、α,
α’−ビス(t−ブチルパーオキシ)ジイソプロピルベ
ンゼン、ジクミルパーオキサイド、2,5−ジメチル−
2,5−ジ(t−ブチルパーオキシ)ヘキサン、t−ブ
チルクミルパーオキサイド等が挙げられる。In the dialkyl peroxides, α,
α'-bis (t-butylperoxy) diisopropylbenzene, dicumyl peroxide, 2,5-dimethyl-
2,5-di (t-butylperoxy) hexane, t-butylcumyl peroxide and the like can be mentioned.
【0019】ハイドロパーオキサイド類では、ジイソプ
ロピルベンゼンハイドロパーオキサイド、クメンハイド
ロパーオキサイド等が挙げられる。Examples of hydroperoxides include diisopropylbenzene hydroperoxide and cumene hydroperoxide.
【0020】シリルパーオキサイド類としては、t−ブ
チルトリメチルシリルパーオキサイド、ビス(t−ブチ
ル)ジメチルシリルパーオキサイド、t−ブチルトリビ
ニルシリルパーオキサイド、ビス(t−ブチル)ジビニ
ルシリルパーオキサイド、トリス(t−ブチル)ビニル
シリルパーオキサイド、t−ブチルトリアリルシリルパ
ーオキサイド、ビス(t−ブチル)ジアリルシリルパー
オキサイド、トリス(t−ブチル)アリルシリルパーオ
キサイド等が挙げられる。Examples of the silyl peroxides are t-butyltrimethylsilyl peroxide, bis (t-butyl) dimethylsilyl peroxide, t-butyltrivinylsilyl peroxide, bis (t-butyl) divinylsilyl peroxide and tris ( Examples thereof include t-butyl) vinyl silyl peroxide, t-butyl triallyl silyl peroxide, bis (t-butyl) diallyl silyl peroxide, and tris (t-butyl) allyl silyl peroxide.
【0021】また、回路部材の接続端子の腐食を抑える
ために、有機過酸化物中に含有される塩素イオンや有機
酸は5000ppm以下であることが好ましく、さら
に、加熱分解後に発生する有機酸が少ないものがより好
ましい。また、作製した回路接続構成体の安定性が向上
することから室温(25℃)、常圧下で24時間の開放
放置後に20重量%以上の重量保持率を有することが好
ましい。これらは適宜混合して用いることができる。こ
れらの有機過酸化物は単独または混合して使用すること
ができ、分解促進剤、抑制剤等を混合して用いても良
い。また、これらの有機過酸化物をポリウレタン系、ポ
リエステル系の高分子物質等で被覆してマイクロカプセ
ル化したものは、可使時間が延長されるために好まし
い。Further, in order to suppress the corrosion of the connection terminals of the circuit member, it is preferable that the chlorine ion and the organic acid contained in the organic peroxide be 5000 ppm or less, and further, the organic acid generated after thermal decomposition is Less is more preferable. Further, since the stability of the produced circuit connecting structure is improved, it is preferable to have a weight retention rate of 20% by weight or more after leaving it open at room temperature (25 ° C.) and normal pressure for 24 hours. These can be appropriately mixed and used. These organic peroxides can be used alone or in a mixture, and may be used in a mixture with a decomposition accelerator, a suppressor and the like. Microcapsules obtained by coating these organic peroxides with a polyurethane-based or polyester-based polymer material are preferable because the pot life is extended.
【0022】接着剤として使用するエポキシ樹脂として
は、ビスフェノールA型エポキシ樹脂、ビスフェノール
F型エポキシ樹脂、ビスフェノールS型エポキシ樹脂、
フェノールノボラック型エポキシ樹脂、クレゾールノボ
ラック型エポキシ樹脂、ビスフェノールAノボラック型
エポキシ樹脂、ビスフェノールFノボラック型エポキシ
樹脂、脂環式エポキシ樹脂、グリシジルエステル型エポ
キシ樹脂、グリシジルアミン型エポキシ樹脂、ヒダント
イン型エポキシ樹脂、イソシアヌレート型エポキシ樹
脂、脂肪族鎖状エポキシ樹脂等があり、これらのエポキ
シ樹脂は、ハロゲン化されていてもよく、水素添加され
ていてもよい。これらのエポキシ樹脂は、2種以上を併
用してもよい。As the epoxy resin used as the adhesive, bisphenol A type epoxy resin, bisphenol F type epoxy resin, bisphenol S type epoxy resin,
Phenol novolac type epoxy resin, cresol novolac type epoxy resin, bisphenol A novolac type epoxy resin, bisphenol F novolac type epoxy resin, alicyclic epoxy resin, glycidyl ester type epoxy resin, glycidyl amine type epoxy resin, hydantoin type epoxy resin, isocyanate There are nurate type epoxy resins, aliphatic chain epoxy resins, and the like, and these epoxy resins may be halogenated or hydrogenated. Two or more of these epoxy resins may be used in combination.
【0023】前記エポキシ樹脂は、硬化剤と併用したほ
うが好ましく、それにはアミン類、フェノール類、酸無
水物類、イミダゾール類、ジシアンジアミド等通常のエ
ポキシ樹脂の硬化剤として使用されているものが挙げら
れる。さらには、硬化促進剤として通常使用されている
3級アミン類、有機リン系化合物を適宜使用しても良
い。また、エポキシ樹脂を反応させる方法として、前記
硬化剤を使用する以外に、スルホニウム塩、ヨードニウ
ム塩等を使用して、カチオン重合させても良い。また、
本発明の回路接続用接着剤には、フィルム形成性、接着
性、硬化時の応力緩和性を付与するため、ポリビニルブ
チラール樹脂、ポリビニルホルマール樹脂、ポリエステ
ル樹脂、ポリアミド樹脂、ポリイミド樹脂、キシレン樹
脂、フェノキシ樹脂、ポリウレタン樹脂、尿素樹脂等高
分子成分を使用しても良い。これら高分子成分は、分子
量が10000〜10,000,000のものが好まし
い。また、これら樹脂は、ラジカル重合性の官能基やエ
ポキシ基,カルボキシル基などで変成されていても良
く、この場合耐熱性が向上する。高分子成分の配合量
は、2〜80重量%であり、5〜70重量%が好まし
く、10〜60重量%が特に好ましい。2重量%未満で
は、応力緩和や接着力が十分でなく、80重量%を超え
ると流動性が低下する。本発明の回路接続用接着剤に
は、適宜充填剤、軟化剤、促進剤、老化防止剤、着色
剤、難燃剤、カップリング剤を添加しても良い。また、
本発明の回路接続用接着剤を硬化物としたときのTg
(ガラス転移温度)が異なる2種類以上の層からなる多
層構成としても良い。また、多層構成にした場合、前記
導電性粒子は、少なくとも1層に含まれていればよい。
本発明の回路接続用接着剤を使用して接着する基板とし
ては、電気的接続を必要とする電極が形成されているも
のであれば特に制限はないが、液晶ディスプレイに用い
られているITO等で電極が形成されているガラスまた
はプラスチック基板、プリント配線板、セラミック配線
板、フレキシブル配線板、半導体シリコンチップなどが
有り、必要に応じて組み合わせて使用される。接続する
場合の条件としては特に制限はないが、接続温度90〜
250℃、接続時間1秒〜10分であり、使用する用
途、接着剤、基板によって適宜選択され、必要に応じ
て、後硬化を行っても良い。また、接続時は加熱加圧に
より行われるが、必要に応じて熱以外のエネルギーたと
えば光、超音波、電磁波等を使用しても良い。The above epoxy resin is preferably used in combination with a curing agent, and examples thereof include amines, phenols, acid anhydrides, imidazoles, dicyandiamide and the like which are used as a curing agent for ordinary epoxy resins. . Furthermore, tertiary amines and organic phosphorus compounds that are usually used as a curing accelerator may be used as appropriate. Further, as a method of reacting the epoxy resin, cation polymerization may be performed using a sulfonium salt, an iodonium salt, or the like, other than using the curing agent. Also,
The circuit connecting adhesive of the present invention has a film forming property, an adhesive property, and a polyvinyl butyral resin, a polyvinyl formal resin, a polyester resin, a polyamide resin, a polyimide resin, a xylene resin, and a phenoxy resin in order to impart stress relaxation properties during curing. Polymer components such as resin, polyurethane resin, urea resin may be used. These polymer components preferably have a molecular weight of 10,000 to 10,000,000. Further, these resins may be modified with a radically polymerizable functional group, an epoxy group, a carboxyl group or the like, in which case the heat resistance is improved. The blending amount of the polymer component is 2 to 80% by weight, preferably 5 to 70% by weight, and particularly preferably 10 to 60% by weight. If it is less than 2% by weight, stress relaxation and adhesive force are not sufficient, and if it exceeds 80% by weight, fluidity is lowered. A filler, a softening agent, an accelerator, an antiaging agent, a coloring agent, a flame retardant, and a coupling agent may be added to the adhesive for circuit connection of the present invention as appropriate. Also,
Tg when the adhesive for circuit connection of the present invention is a cured product
A multi-layered structure composed of two or more layers having different (glass transition temperatures) may be used. In the case of a multi-layered structure, the conductive particles may be contained in at least one layer.
The substrate to be adhered using the adhesive for circuit connection of the present invention is not particularly limited as long as it has electrodes that require electrical connection, but ITO or the like used in liquid crystal displays. There are glass or plastic substrates on which electrodes are formed, printed wiring boards, ceramic wiring boards, flexible wiring boards, semiconductor silicon chips, etc., and they are used in combination as necessary. The conditions for connecting are not particularly limited, but the connection temperature is 90 to
The temperature is 250 ° C., the connection time is 1 second to 10 minutes, and it may be appropriately selected depending on the intended use, the adhesive, and the substrate, and post-curing may be performed if necessary. The connection is performed by heating and pressurizing, but energy other than heat, such as light, ultrasonic waves, electromagnetic waves, etc., may be used if necessary.
【0024】[0024]
【実施例】以下、本発明を実施例にて具体的に説明する
が、本発明の範囲はこの実施例に限定されるものではな
い。
(表面処理導電性粒子Aの作製)ラジカル重合性化合物
としてジシクロヘキシルメタアクリレート0.5g、酸
性化合物としてりん酸 0.01g、水 0.5g、メ
タノール 50gの溶液に、ポリスチレンを核とする粒
子の表面に、厚み0.2μmのニッケル層を設け、この
ニッケル層の外側に、厚み0.04μmの金層を設けた
平均粒子径4μmの導電性粒子をいれ、40℃で30分
間攪拌した。導電性粒子をろ別後、50℃で15分間乾
燥し、表面処理導電性粒子Aを得た。
(表面処理導電性粒子Bの作製)ラジカル重合性化合物
としてウレタンアクリレート0.03gとりん酸エステ
ルアクリレート 0.1g、酸性化合物として酢酸
0.02g、水 0.5g、メチルエチルケトン50g
の溶液に、ポリスチレンを核とする粒子の表面に、厚み
0.2μmのニッケル層を設け、このニッケル層の外側
に、厚み0.04μmの金層を設けた平均粒子径5μm
の導電性粒子をいれ、50℃で5分間攪拌した。導電性
粒子をろ別後、80℃で5分間乾燥し、表面処理導電性
粒子Bを得た。
(表面処理導電性粒子Cの作製)ラジカル重合性化合物
としてウレタンアクリレート0.03gとりん酸エステ
ルアクリレート 0.1g、酸性化合物として酢酸
0.02g、水 0.5g、メチルエチルケトン50g
の溶液に、平均粒子径5μmのニッケル金属をいれ、3
0℃で5分間攪拌した。導電性粒子をろ別後、80℃で
5分間乾燥し、表面処理導電性粒子Cを得た。
(表面処理粒子Dの作製)ラジカル重合性化合物として
イソシアヌレート変性アクリレート0.01g、酸性化
合物として塩酸 0.02g、水 0.5g、エタノー
ル50gの溶液に、平均粒子径5μmのコバルト金属を
いれ、30℃で1時間攪拌した。導電性粒子をろ別後、
100℃で5分間乾燥し、表面処理導電性粒子Dを得
た。これら導電粒子A,B,C,Dを用いて、以下に示
す配合でそれぞれ配合し、簡易塗工機(テスター産業株
式会社製)を用いて、厚み50μmの片面を表面処理し
たPET(ポリエチレンテレフテレート)フィルムに塗
布し、70℃、10分間の熱風乾燥により回路接続用接
着剤を作製した。EXAMPLES The present invention will be specifically described below with reference to examples, but the scope of the present invention is not limited to these examples. (Preparation of Surface Treated Conductive Particles A) A solution of 0.5 g of dicyclohexylmethacrylate as a radically polymerizable compound, 0.01 g of phosphoric acid as an acidic compound, 0.5 g of water, and 50 g of methanol was added to the surface of particles having polystyrene as a nucleus. A nickel layer having a thickness of 0.2 μm was provided on the above, and conductive particles having an average particle diameter of 4 μm, in which a gold layer having a thickness of 0.04 μm was provided outside the nickel layer, were stirred at 40 ° C. for 30 minutes. After filtering the conductive particles, the particles were dried at 50 ° C. for 15 minutes to obtain surface-treated conductive particles A. (Preparation of surface-treated conductive particles B) 0.03 g of urethane acrylate and 0.1 g of phosphoric acid ester acrylate as radically polymerizable compounds, acetic acid as acidic compound
0.02g, water 0.5g, methyl ethyl ketone 50g
In the above solution, a nickel layer having a thickness of 0.2 μm was provided on the surface of particles having polystyrene as a nucleus, and a gold layer having a thickness of 0.04 μm was provided on the outside of the nickel layer.
The conductive particles of (1) were added and stirred at 50 ° C. for 5 minutes. After separating the conductive particles by filtration, the particles were dried at 80 ° C. for 5 minutes to obtain surface-treated conductive particles B. (Preparation of surface-treated conductive particles C) 0.03 g of urethane acrylate and 0.1 g of phosphoric acid ester acrylate as radically polymerizable compounds, acetic acid as acidic compound
0.02g, water 0.5g, methyl ethyl ketone 50g
Add nickel metal having an average particle size of 5 μm to the solution of 3
The mixture was stirred at 0 ° C for 5 minutes. After filtering the conductive particles, it was dried at 80 ° C. for 5 minutes to obtain surface-treated conductive particles C. (Preparation of Surface-treated Particles D) A solution of 0.01 g of isocyanurate-modified acrylate as a radically polymerizable compound, 0.02 g of hydrochloric acid as an acidic compound, 0.5 g of water, and 50 g of ethanol is charged with cobalt metal having an average particle diameter of 5 μm, The mixture was stirred at 30 ° C for 1 hour. After filtering the conductive particles,
It was dried at 100 ° C. for 5 minutes to obtain surface-treated conductive particles D. Each of these conductive particles A, B, C, and D was blended in the following formulation, and a simple coating machine (manufactured by Tester Sangyo Co., Ltd.) was used to surface-treat one side having a thickness of 50 μm. It was applied to a fterate film and dried with hot air at 70 ° C. for 10 minutes to prepare an adhesive for circuit connection.
【0025】(実施例1)フェノキシ樹脂(PKHC、
ユニオンカーバイド株式会社製商品名、平均分子量4
5,000) 20g、エポキシ樹脂 (YD−12
7、東都化成株式会社製商品名、ビスフェノールA型エ
ポキシ樹脂)50g、マイクロカプセル型イミダゾール
(HX−37722、旭チバ株式会社製商品名)30g
をトルエンを溶媒として溶解配合し、さらに表面処理粒
子Aを3体積%配合分散した。厚さ50μmの片面を表
面処理したポリエチレンテレフタレートフィルムに簡易
塗工機を用いて塗布し、70℃、10分間乾燥させ、厚
み30μmの回路接続用接着剤を得た。(Example 1) Phenoxy resin (PKHC,
Union Carbide Co., Ltd. trade name, average molecular weight 4
5,000) 20 g, epoxy resin (YD-12
7, Toto Kasei Co., Ltd. product name, bisphenol A type epoxy resin) 50 g, microcapsule type imidazole (HX-37722, Asahi Chiba Co., Ltd. product name) 30 g
Was dissolved and mixed using toluene as a solvent, and further 3% by volume of the surface-treated particles A were mixed and dispersed. A polyethylene terephthalate film having a thickness of 50 μm, one surface of which was surface-treated, was applied using a simple coating machine and dried at 70 ° C. for 10 minutes to obtain a circuit connecting adhesive having a thickness of 30 μm.
【0026】(実施例2)フェノキシ樹脂(PKHC、
ユニオンカーバイド株式会社製商品名、平均分子量4
5,000) 20g、エポキシ樹脂(YD−127、
東都化成株式会社製商品名、ビスフェノールA型エポキ
シ樹脂) 50g、マイクロカプセル型イミダゾール
(HX−37722、旭チバ株式会社製商品名) 30
gをトルエンを溶媒として溶解配合し、さらに表面処理
粒子Cを3体積%配合分散した。厚さ50μmの片面を
表面処理したポリエチレンテレフタレートフィルムに簡
易塗工機を用いて塗布し、70℃、10分間乾燥させ、
厚み30μmの回路接続用接着剤を得た。(Example 2) Phenoxy resin (PKHC,
Union Carbide Co., Ltd. trade name, average molecular weight 4
5,000) 20 g, epoxy resin (YD-127,
Toto Kasei Co., Ltd. product name, bisphenol A type epoxy resin) 50 g, microcapsule type imidazole (HX-37722, Asahi Ciba Co., Ltd. product name) 30
g was dissolved and blended with toluene as a solvent, and further 3% by volume of the surface-treated particles C were blended and dispersed. It is applied to a polyethylene terephthalate film having a thickness of 50 μm, which has been surface-treated on one side, using a simple coating machine and dried at 70 ° C. for 10 minutes,
An adhesive for circuit connection having a thickness of 30 μm was obtained.
【0027】(実施例3)フェノキシ樹脂(PKHC、
ユニオンカーバイド株式会社製商品名、平均分子量4
5,000) 50g、ジシクロヘキシルメタアクリレ
ート 48g、りん酸エステルアクリレート 2g、
2,5−ジメチル−2,5−ビス(2−エチルヘキサノ
イルパーオキシ)ヘキサン 3gをメチルエチルケトン
を溶媒として溶解配合し、さらに表面処理粒子Aを3体
積%配合分散した。厚さ50μmの片面を表面処理した
ポリエチレンテレフタレートフィルムに簡易塗工機を用
いて塗布し、70℃、10分間乾燥させ、厚み30μm
の回路接続用接着剤を得た。(Example 3) Phenoxy resin (PKHC,
Union Carbide Co., Ltd. trade name, average molecular weight 4
5,000) 50 g, dicyclohexyl methacrylate 48 g, phosphoric acid ester acrylate 2 g,
3 g of 2,5-dimethyl-2,5-bis (2-ethylhexanoylperoxy) hexane was dissolved and mixed with methyl ethyl ketone as a solvent, and further 3% by volume of the surface-treated particles A was mixed and dispersed. A polyethylene terephthalate film having a thickness of 50 μm, which has been surface-treated on one side, is applied using a simple coater, dried at 70 ° C. for 10 minutes, and has a thickness of 30 μm.
An adhesive for circuit connection was obtained.
【0028】(実施例4)フェノキシ樹脂(PKHC、
ユニオンカーバイド株式会社製商品名、平均分子量4
5,000) 50g、イソシアヌール酸エチレンオキ
シド変性ジアクリレート 46g、りん酸エステルアク
リレート 4g、2,5−ジメチル−2,5−ビス(2
−エチルヘキサノイルパーオキシ)ヘキサン 3gをメ
チルエチルケトンを溶媒として溶解配合し、さらに表面
処理粒子Bを3体積%配合分散した。厚さ50μmの片
面を表面処理したポリエチレンテレフタレートフィルム
に簡易塗工機を用いて塗布し、70℃、10分間乾燥さ
せ、厚み30μmの回路接続用接着剤を得た。(Example 4) Phenoxy resin (PKHC,
Union Carbide Co., Ltd. trade name, average molecular weight 4
5,000) 50 g, isocyanuric acid ethylene oxide modified diacrylate 46 g, phosphate ester acrylate 4 g, 2,5-dimethyl-2,5-bis (2
3 g of -ethylhexanoylperoxy) hexane was dissolved and compounded using methyl ethyl ketone as a solvent, and 3% by volume of surface-treated particles B was compounded and dispersed. A polyethylene terephthalate film having a thickness of 50 μm, one surface of which was surface-treated, was applied using a simple coating machine and dried at 70 ° C. for 10 minutes to obtain a circuit connecting adhesive having a thickness of 30 μm.
【0029】(実施例5)フェノキシ樹脂(PKHC、
ユニオンカーバイド株式会社製商品名、平均分子量4
5,000) 25g、ポリウレタン樹脂 25g、ジ
シクロヘキシルメタアクリレート 48g、りん酸エス
テルアクリレート 2g、2,5−ジメチル−2,5−
ビス(2−エチルヘキサノイルパーオキシ)ヘキサン
3gをメチルエチルケトンを溶媒として溶解配合し、さ
らに表面処理粒子Cを3体積%配合分散した。厚さ50
μmの片面を表面処理したポリエチレンテレフタレート
フィルムに簡易塗工機を用いて塗布し、70℃、10分
間乾燥させ、厚み30μmの回路接続用接着剤を得た。(Example 5) Phenoxy resin (PKHC,
Union Carbide Co., Ltd. trade name, average molecular weight 4
5,000) 25 g, polyurethane resin 25 g, dicyclohexyl methacrylate 48 g, phosphoric acid ester acrylate 2 g, 2,5-dimethyl-2,5-
Bis (2-ethylhexanoylperoxy) hexane
3 g was dissolved and blended using methyl ethyl ketone as a solvent, and further 3% by volume of surface-treated particles C were blended and dispersed. Thickness 50
A polyethylene terephthalate film having a surface treated with a thickness of μm was applied using a simple coater and dried at 70 ° C. for 10 minutes to obtain a circuit connecting adhesive having a thickness of 30 μm.
【0030】(実施例6)フェノキシ樹脂(PKHC、
ユニオンカーバイド株式会社製商品名、平均分子量4
5,000) 25g、ポリウレタン樹脂 25g、ジ
シクロヘキシルメタアクリレート 48g、りん酸エス
テルアクリレート 2g、2,5−ジメチル−2,5−
ビス(2−エチルヘキサノイルパーオキシ)ヘキサン
3gをメチルエチルケトンを溶媒として溶解配合し、さ
らに表面処理粒子Dを3体積%配合分散した。厚さ50
μmの片面を表面処理したポリエチレンテレフタレート
フィルムに簡易塗工機を用いて塗布し、70℃、10分
間乾燥させ、厚み30μmの回路接続用接着剤を得た。(Example 6) Phenoxy resin (PKHC,
Union Carbide Co., Ltd. trade name, average molecular weight 4
5,000) 25 g, polyurethane resin 25 g, dicyclohexyl methacrylate 48 g, phosphoric acid ester acrylate 2 g, 2,5-dimethyl-2,5-
Bis (2-ethylhexanoylperoxy) hexane
3 g of methyl ethyl ketone was dissolved and mixed in a solvent, and further 3% by volume of surface-treated particles D were mixed and dispersed. Thickness 50
A polyethylene terephthalate film having a surface treated with a thickness of μm was applied using a simple coater and dried at 70 ° C. for 10 minutes to obtain a circuit connecting adhesive having a thickness of 30 μm.
【0031】(比較例1〜6)実施例1〜6の回路接続
用接着剤を未処理粒子を用いて厚み30μmの回路接続
用接着剤を得た。Comparative Examples 1 to 6 The circuit connecting adhesives of Examples 1 to 6 were obtained by using untreated particles to obtain circuit connecting adhesives having a thickness of 30 μm.
【0032】(比較例7)実施例1の回路接続用接着剤
中の導電性粒子を平均粒子径4μmの市販の表面被覆粒
子用いた以外は実施例1と同様にして回路接続用接着剤
を得た。被覆厚みは、走査型電子顕微鏡を用いて測定し
たところ約0.1μmであった。同様に実施例1〜6の
被覆処理厚みは約0.01μmであった。Comparative Example 7 An adhesive for circuit connection was prepared in the same manner as in Example 1 except that the conductive particles in the adhesive for circuit connection of Example 1 were used as commercially available surface-coated particles having an average particle diameter of 4 μm. Obtained. The coating thickness was about 0.1 μm as measured with a scanning electron microscope. Similarly, the coating thickness of Examples 1 to 6 was about 0.01 μm.
【0033】(回路接続構造体の作製)高さ15μmの
金バンプを有するシリコンチップ(回路バンプ間スペー
ス 10μm、バンプ面積1500μm2)と、ガラス
基板上に高さ1μmのITO回路を形成した回路板(ピ
ッチ40μm)を用いて接続を行った。まず、ITO付
ガラス基板上に、70℃、5秒の条件で仮接続した。そ
の後PETフィルムを剥離し、チップを上下の回路の位
置合わせを行いながら、配置し、170℃、10秒間の
条件で回路接続構造体を作製した。
(特性評価方法)この回路接続構造体を使用して、上下回
路間の接続抵抗(4端子法)を測定した。初期接続抵抗
と85℃、85%RHで500時間高温高湿槽で処理し
た後の接続抵抗も測定した。次に水平回路間の絶縁抵抗
(回路間距離10μm、20℃、50%RH、通電時間
60s、印加電圧50V)を50ヶ所測定し、ショート
発生率を求めた。これらの測定結果を表1に纏めて示し
た。(Production of Circuit Connection Structure) Silicon chip having gold bumps with a height of 15 μm (space between circuit bumps: 10 μm, bump area: 1500 μm 2 ), and a circuit board on which an ITO circuit with a height of 1 μm is formed on a glass substrate. (Pitch 40 μm) was used for connection. First, temporary connection was performed on a glass substrate with ITO at 70 ° C. for 5 seconds. After that, the PET film was peeled off, the chips were arranged while aligning the upper and lower circuits, and a circuit connection structure was prepared under the conditions of 170 ° C. and 10 seconds. (Characteristic Evaluation Method) Using this circuit connection structure, the connection resistance between the upper and lower circuits (4-terminal method) was measured. The initial connection resistance and the connection resistance after treatment in a high temperature and high humidity tank at 85 ° C. and 85% RH for 500 hours were also measured. Next, the insulation resistance between the horizontal circuits (distance between the circuits: 10 μm, 20 ° C., 50% RH, energization time: 60 s, applied voltage: 50 V) was measured at 50 locations to determine the short circuit occurrence rate. The results of these measurements are summarized in Table 1.
【0034】[0034]
【表1】 [Table 1]
【0035】本発明の実施例1〜6では、接続抵抗が低
くまたショートの発生もなく良好であるが、表面処理導
電性粒子を使用していない比較例1〜6はショート発生
があり絶縁信頼性が低下している。また、市販の表面被
覆粒子を用いた比較例7では、初期の接続抵抗が高くな
る。In Examples 1 to 6 of the present invention, the connection resistance is low and no short circuit occurs, which is good. In Comparative Examples 1 to 6 in which the surface-treated conductive particles are not used, however, a short circuit occurs and the insulation reliability is high. The sex is declining. In Comparative Example 7 using the commercially available surface-coated particles, the initial connection resistance is high.
【0036】[0036]
【発明の効果】本発明によれば、接続抵抗が低くまた絶
縁信頼性も良好な接続構造体を得ることができる。According to the present invention, a connection structure having a low connection resistance and good insulation reliability can be obtained.
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 FI テーマコート゛(参考) H01B 1/22 H01B 1/22 D H01L 21/60 311 H01L 21/60 311S H05K 3/36 H05K 3/36 A (72)発明者 小野 裕 茨城県つくば市和台48 日立化成工業株式 会社総合研究所内 Fターム(参考) 4J037 AA04 CA05 CA18 CA20 CA22 CB09 CB12 CC16 CC17 CC30 EE02 EE12 EE43 EE47 FF11 FF23 4J040 DF041 DF051 DG001 DK001 DM011 EB051 EC001 FA181 HA066 JB03 JB10 KA03 KA07 KA32 LA09 NA20 5E344 AA01 AA22 BB02 BB06 CD02 DD06 EE06 EE21 5F044 LL09 RR17 5G301 DA02 DA06 DA10 DA15 DA29 DA42 DA51 DD03 ─────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. 7 Identification code FI theme code (reference) H01B 1/22 H01B 1/22 D H01L 21/60 311 H01L 21/60 311S H05K 3/36 H05K 3/36 A (72) Inventor Hiroshi Ono 48 Wadai, Tsukuba-shi, Ibaraki Hitachi Chemical Co., Ltd. Research Institute F-term (reference) 4J037 AA04 CA05 CA18 CA20 CA22 CB09 CB12 CC16 CC17 CC30 EE02 EE12 EE43 EE47 FF11 FF23 4J040 DF041 DF051 DG001 DM011 EB051 EC001 FA181 HA066 JB03 JB10 KA03 KA07 KA32 LA09 NA20 5E344 AA01 AA22 BB02 BB06 CD02 DD06 EE06 EE21 5F044 LL09 RR17 5G301 DA02 DA06 DA10 DA15 DA29 DA42 DA51 DD03
Claims (5)
性化合物、(3)水を含む処理液で表面処理を施した表
面処理導電性粒子。1. Surface-treated conductive particles which have been surface-treated with a treatment liquid containing (1) a radically polymerizable compound, (2) an acidic compound, and (3) water.
含む導電性粒子である請求項1に記載の表面処理導電性
粒子。2. The surface-treated conductive particles according to claim 1, wherein the conductive particles are conductive particles containing Co, Ni, Zn, and Cu.
性化合物、(3)水を含む処理液で表面処理を行うこと
を特徴とする表面処理導電性粒子の表面処理方法。3. A surface treatment method for surface-treated conductive particles, which comprises performing a surface treatment with a treatment liquid containing (1) a radically polymerizable compound, (2) an acidic compound, and (3) water.
を有する基板間に介在させ、相対向する回路電極を有す
る基板を加圧して加圧方向の電極間を電気的に接続する
回路接続用接着剤であって、前記回路接続用接着剤が請
求項1または請求項2に記載の表面処理導電性粒子を含
有することを特徴とする回路接続用接着剤。4. A circuit connection in which an adhesive for circuit connection is interposed between substrates having circuit electrodes facing each other, and a substrate having circuit electrodes facing each other is pressed to electrically connect the electrodes in the pressing direction. An adhesive for circuit connection, wherein the adhesive for circuit connection contains the surface-treated conductive particles according to claim 1 or 2.
を有する基板間に介在させ、相対向する回路電極を有す
る基板を加圧して加圧方向の電極間を電気的に接続した
接続構造体であって、前記回路接続用接着剤が請求項1
または請求項2に記載の表面処理導電粒子を含有した接
着剤である回路接続構造体。5. A connection structure in which an adhesive for circuit connection is interposed between substrates having circuit electrodes facing each other, and the substrates having circuit electrodes facing each other are pressed to electrically connect the electrodes in the pressing direction. A body, wherein the circuit connecting adhesive is the body.
Alternatively, a circuit connecting structure which is an adhesive containing the surface-treated conductive particles according to claim 2.
Priority Applications (1)
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JP2001261674A JP2003077335A (en) | 2001-08-30 | 2001-08-30 | Surface treated conductive particles, treating method for conductive particles, adhesive for circuit connection using the conductive particles, and circuit connection structure |
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Application Number | Priority Date | Filing Date | Title |
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JP2001261674A JP2003077335A (en) | 2001-08-30 | 2001-08-30 | Surface treated conductive particles, treating method for conductive particles, adhesive for circuit connection using the conductive particles, and circuit connection structure |
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Family
ID=19088684
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Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007197558A (en) * | 2006-01-26 | 2007-08-09 | Toyo Ink Mfg Co Ltd | Conductive ink, conductive circuit and non-contact medium |
US8698394B2 (en) | 2010-03-31 | 2014-04-15 | 3M Innovative Properties Company | Electronic articles for displays and methods of making same |
KR20230011946A (en) | 2020-05-20 | 2023-01-25 | 니폰 가가쿠 고교 가부시키가이샤 | Conductive particle, conductive material and connection structure using the same |
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JPH02190402A (en) * | 1989-01-19 | 1990-07-26 | Dowa Mining Co Ltd | Metal powder having high oxidation resistance and production thereof |
JPH0346774A (en) * | 1989-07-12 | 1991-02-28 | Catalysts & Chem Ind Co Ltd | Anisotropic conductive adhesive, method of electrical connection between electrodes using such adhesive, and electric circuit base formed in such method |
JPH08227611A (en) * | 1994-11-30 | 1996-09-03 | Japan Energy Corp | Conductive powder capsule, method for producing the same, and conductive resin composition |
JP2001156430A (en) * | 1999-11-26 | 2001-06-08 | Hitachi Chem Co Ltd | Method of manufacturing circuit board and circuit connection material |
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JPS4978733A (en) * | 1972-12-04 | 1974-07-30 | ||
JPS62176139A (en) * | 1986-01-29 | 1987-08-01 | Fuji Xerox Co Ltd | Anisotropic conducting material and packaging method for semiconductor device using said material |
JPH02190402A (en) * | 1989-01-19 | 1990-07-26 | Dowa Mining Co Ltd | Metal powder having high oxidation resistance and production thereof |
JPH0346774A (en) * | 1989-07-12 | 1991-02-28 | Catalysts & Chem Ind Co Ltd | Anisotropic conductive adhesive, method of electrical connection between electrodes using such adhesive, and electric circuit base formed in such method |
JPH08227611A (en) * | 1994-11-30 | 1996-09-03 | Japan Energy Corp | Conductive powder capsule, method for producing the same, and conductive resin composition |
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Publication number | Priority date | Publication date | Assignee | Title |
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JP2007197558A (en) * | 2006-01-26 | 2007-08-09 | Toyo Ink Mfg Co Ltd | Conductive ink, conductive circuit and non-contact medium |
US8698394B2 (en) | 2010-03-31 | 2014-04-15 | 3M Innovative Properties Company | Electronic articles for displays and methods of making same |
KR20230011946A (en) | 2020-05-20 | 2023-01-25 | 니폰 가가쿠 고교 가부시키가이샤 | Conductive particle, conductive material and connection structure using the same |
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