JP2003055457A - Sulfonic acid-containing ion conductive polybenzimidazole - Google Patents
Sulfonic acid-containing ion conductive polybenzimidazoleInfo
- Publication number
- JP2003055457A JP2003055457A JP2001251964A JP2001251964A JP2003055457A JP 2003055457 A JP2003055457 A JP 2003055457A JP 2001251964 A JP2001251964 A JP 2001251964A JP 2001251964 A JP2001251964 A JP 2001251964A JP 2003055457 A JP2003055457 A JP 2003055457A
- Authority
- JP
- Japan
- Prior art keywords
- sulfonic acid
- aromatic
- group
- aliphatic
- acid group
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004693 Polybenzimidazole Substances 0.000 title claims abstract description 41
- 229920002480 polybenzimidazole Polymers 0.000 title claims abstract description 41
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 title description 10
- 150000002500 ions Chemical class 0.000 title description 3
- 125000000542 sulfonic acid group Chemical group 0.000 claims abstract description 64
- 229920000642 polymer Polymers 0.000 claims abstract description 56
- 125000003118 aryl group Chemical group 0.000 claims abstract description 32
- 125000001931 aliphatic group Chemical group 0.000 claims abstract description 20
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims abstract description 17
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 17
- 150000001875 compounds Chemical class 0.000 claims abstract description 15
- 229910052739 hydrogen Inorganic materials 0.000 claims abstract description 14
- 239000001257 hydrogen Substances 0.000 claims abstract description 14
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims abstract description 6
- -1 aliphatic sulfonic acids Chemical class 0.000 claims description 21
- 125000004432 carbon atom Chemical group C* 0.000 claims description 9
- 238000000034 method Methods 0.000 claims description 9
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 4
- 239000000126 substance Substances 0.000 claims description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 2
- 229910052799 carbon Inorganic materials 0.000 claims description 2
- 239000012528 membrane Substances 0.000 abstract description 23
- 239000003792 electrolyte Substances 0.000 abstract description 7
- 239000000463 material Substances 0.000 abstract description 6
- 239000002904 solvent Substances 0.000 description 22
- 239000002253 acid Substances 0.000 description 16
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 15
- 238000006116 polymerization reaction Methods 0.000 description 12
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 10
- 239000000446 fuel Substances 0.000 description 10
- 239000005518 polymer electrolyte Substances 0.000 description 10
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 9
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical group CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 description 7
- 238000005259 measurement Methods 0.000 description 7
- 239000000523 sample Substances 0.000 description 7
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 6
- 150000001991 dicarboxylic acids Chemical class 0.000 description 6
- 150000002431 hydrogen Chemical class 0.000 description 6
- 125000002883 imidazolyl group Chemical group 0.000 description 6
- 125000001424 substituent group Chemical group 0.000 description 6
- 238000005266 casting Methods 0.000 description 5
- 238000006243 chemical reaction Methods 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 5
- 229910052757 nitrogen Inorganic materials 0.000 description 5
- 229920000137 polyphosphoric acid Polymers 0.000 description 5
- 150000003839 salts Chemical class 0.000 description 5
- DLYUQMMRRRQYAE-UHFFFAOYSA-N tetraphosphorus decaoxide Chemical compound O1P(O2)(=O)OP3(=O)OP1(=O)OP2(=O)O3 DLYUQMMRRRQYAE-UHFFFAOYSA-N 0.000 description 5
- 238000005160 1H NMR spectroscopy Methods 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- 238000002329 infrared spectrum Methods 0.000 description 4
- 239000000178 monomer Substances 0.000 description 4
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 4
- 238000006467 substitution reaction Methods 0.000 description 4
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 3
- 125000000217 alkyl group Chemical group 0.000 description 3
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 229940098779 methanesulfonic acid Drugs 0.000 description 3
- 239000003960 organic solvent Substances 0.000 description 3
- QZVPBBKGFDYOJB-UHFFFAOYSA-N 4,6-disulfobenzene-1,3-dicarboxylic acid Chemical compound OC(=O)C1=CC(C(O)=O)=C(S(O)(=O)=O)C=C1S(O)(=O)=O QZVPBBKGFDYOJB-UHFFFAOYSA-N 0.000 description 2
- JKETWUADWJKEKN-UHFFFAOYSA-N 4-(3,4-diaminophenyl)sulfonylbenzene-1,2-diamine Chemical compound C1=C(N)C(N)=CC=C1S(=O)(=O)C1=CC=C(N)C(N)=C1 JKETWUADWJKEKN-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 2
- DTQVDTLACAAQTR-UHFFFAOYSA-N Trifluoroacetic acid Chemical compound OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 description 2
- 150000007513 acids Chemical class 0.000 description 2
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 description 2
- USIUVYZYUHIAEV-UHFFFAOYSA-N diphenyl ether Chemical compound C=1C=CC=CC=1OC1=CC=CC=C1 USIUVYZYUHIAEV-UHFFFAOYSA-N 0.000 description 2
- KZTYYGOKRVBIMI-UHFFFAOYSA-N diphenyl sulfone Chemical compound C=1C=CC=CC=1S(=O)(=O)C1=CC=CC=C1 KZTYYGOKRVBIMI-UHFFFAOYSA-N 0.000 description 2
- 239000000835 fiber Substances 0.000 description 2
- 239000003014 ion exchange membrane Substances 0.000 description 2
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 2
- QQVIHTHCMHWDBS-UHFFFAOYSA-N isophthalic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=C1 QQVIHTHCMHWDBS-UHFFFAOYSA-N 0.000 description 2
- AMXOYNBUYSYVKV-UHFFFAOYSA-M lithium bromide Chemical compound [Li+].[Br-] AMXOYNBUYSYVKV-UHFFFAOYSA-M 0.000 description 2
- KWGKDLIKAYFUFQ-UHFFFAOYSA-M lithium chloride Chemical compound [Li+].[Cl-] KWGKDLIKAYFUFQ-UHFFFAOYSA-M 0.000 description 2
- SIAPCJWMELPYOE-UHFFFAOYSA-N lithium hydride Chemical compound [LiH] SIAPCJWMELPYOE-UHFFFAOYSA-N 0.000 description 2
- 229910000103 lithium hydride Inorganic materials 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 239000002861 polymer material Substances 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- KCXFHTAICRTXLI-UHFFFAOYSA-N propane-1-sulfonic acid Chemical group CCCS(O)(=O)=O KCXFHTAICRTXLI-UHFFFAOYSA-N 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 229910052708 sodium Inorganic materials 0.000 description 2
- 239000011734 sodium Substances 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- NWUYHJFMYQTDRP-UHFFFAOYSA-N 1,2-bis(ethenyl)benzene;1-ethenyl-2-ethylbenzene;styrene Chemical compound C=CC1=CC=CC=C1.CCC1=CC=CC=C1C=C.C=CC1=CC=CC=C1C=C NWUYHJFMYQTDRP-UHFFFAOYSA-N 0.000 description 1
- FSSPGSAQUIYDCN-UHFFFAOYSA-N 1,3-Propane sultone Chemical compound O=S1(=O)CCCO1 FSSPGSAQUIYDCN-UHFFFAOYSA-N 0.000 description 1
- CYNYIHKIEHGYOZ-UHFFFAOYSA-N 1-bromopropane Chemical compound CCCBr CYNYIHKIEHGYOZ-UHFFFAOYSA-N 0.000 description 1
- KVGOXGQSTGQXDD-UHFFFAOYSA-N 1-decane-sulfonic-acid Chemical group CCCCCCCCCCS(O)(=O)=O KVGOXGQSTGQXDD-UHFFFAOYSA-N 0.000 description 1
- LDMOEFOXLIZJOW-UHFFFAOYSA-N 1-dodecanesulfonic acid Chemical group CCCCCCCCCCCCS(O)(=O)=O LDMOEFOXLIZJOW-UHFFFAOYSA-N 0.000 description 1
- YLYNKCXTUZRNJZ-UHFFFAOYSA-N 2,5-disulfoterephthalic acid Chemical compound OC(=O)C1=CC(S(O)(=O)=O)=C(C(O)=O)C=C1S(O)(=O)=O YLYNKCXTUZRNJZ-UHFFFAOYSA-N 0.000 description 1
- 125000005916 2-methylpentyl group Chemical group 0.000 description 1
- ZMPRRFPMMJQXPP-UHFFFAOYSA-N 2-sulfobenzoic acid Chemical compound OC(=O)C1=CC=CC=C1S(O)(=O)=O ZMPRRFPMMJQXPP-UHFFFAOYSA-N 0.000 description 1
- RAADBCJYJHQQBI-UHFFFAOYSA-N 2-sulfoterephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C(S(O)(=O)=O)=C1 RAADBCJYJHQQBI-UHFFFAOYSA-N 0.000 description 1
- HSTOKWSFWGCZMH-UHFFFAOYSA-N 3,3'-diaminobenzidine Chemical compound C1=C(N)C(N)=CC=C1C1=CC=C(N)C(N)=C1 HSTOKWSFWGCZMH-UHFFFAOYSA-N 0.000 description 1
- DAWHTISAONTGQE-UHFFFAOYSA-N 3-(2-phenylphenyl)phthalic acid Chemical compound OC(=O)C1=CC=CC(C=2C(=CC=CC=2)C=2C=CC=CC=2)=C1C(O)=O DAWHTISAONTGQE-UHFFFAOYSA-N 0.000 description 1
- HSSYVKMJJLDTKZ-UHFFFAOYSA-N 3-phenylphthalic acid Chemical compound OC(=O)C1=CC=CC(C=2C=CC=CC=2)=C1C(O)=O HSSYVKMJJLDTKZ-UHFFFAOYSA-N 0.000 description 1
- RQBIGPMJQUKYAH-UHFFFAOYSA-N 4-(3,4-diaminophenoxy)benzene-1,2-diamine Chemical compound C1=C(N)C(N)=CC=C1OC1=CC=C(N)C(N)=C1 RQBIGPMJQUKYAH-UHFFFAOYSA-N 0.000 description 1
- MXLNEUAAMYZJDP-UHFFFAOYSA-N 4-(4-carboxy-2-sulfophenyl)-3-sulfobenzoic acid Chemical compound OS(=O)(=O)C1=CC(C(=O)O)=CC=C1C1=CC=C(C(O)=O)C=C1S(O)(=O)=O MXLNEUAAMYZJDP-UHFFFAOYSA-N 0.000 description 1
- CPFKVVLZVUUQGV-UHFFFAOYSA-N 4-[2-(3,4-diaminophenyl)-1,1,1,3,3,3-hexafluoropropan-2-yl]benzene-1,2-diamine Chemical compound C1=C(N)C(N)=CC=C1C(C(F)(F)F)(C(F)(F)F)C1=CC=C(N)C(N)=C1 CPFKVVLZVUUQGV-UHFFFAOYSA-N 0.000 description 1
- BCHSTYJVRPEVKP-UHFFFAOYSA-N 4-[2-(3,4-diaminophenyl)propan-2-yl]benzene-1,2-diamine Chemical compound C=1C=C(N)C(N)=CC=1C(C)(C)C1=CC=C(N)C(N)=C1 BCHSTYJVRPEVKP-UHFFFAOYSA-N 0.000 description 1
- PHQYMDAUTAXXFZ-UHFFFAOYSA-N 4-[2-(4-carboxyphenyl)-1,1,1,3,3,3-hexafluoropropan-2-yl]benzoic acid Chemical compound C1=CC(C(=O)O)=CC=C1C(C(F)(F)F)(C(F)(F)F)C1=CC=C(C(O)=O)C=C1 PHQYMDAUTAXXFZ-UHFFFAOYSA-N 0.000 description 1
- CARJPEPCULYFFP-UHFFFAOYSA-N 5-Sulfo-1,3-benzenedicarboxylic acid Chemical compound OC(=O)C1=CC(C(O)=O)=CC(S(O)(=O)=O)=C1 CARJPEPCULYFFP-UHFFFAOYSA-N 0.000 description 1
- KSSJBGNOJJETTC-UHFFFAOYSA-N COC1=C(C=CC=C1)N(C1=CC=2C3(C4=CC(=CC=C4C=2C=C1)N(C1=CC=C(C=C1)OC)C1=C(C=CC=C1)OC)C1=CC(=CC=C1C=1C=CC(=CC=13)N(C1=CC=C(C=C1)OC)C1=C(C=CC=C1)OC)N(C1=CC=C(C=C1)OC)C1=C(C=CC=C1)OC)C1=CC=C(C=C1)OC Chemical compound COC1=C(C=CC=C1)N(C1=CC=2C3(C4=CC(=CC=C4C=2C=C1)N(C1=CC=C(C=C1)OC)C1=C(C=CC=C1)OC)C1=CC(=CC=C1C=1C=CC(=CC=13)N(C1=CC=C(C=C1)OC)C1=C(C=CC=C1)OC)N(C1=CC=C(C=C1)OC)C1=C(C=CC=C1)OC)C1=CC=C(C=C1)OC KSSJBGNOJJETTC-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- 239000002841 Lewis acid Substances 0.000 description 1
- 238000005481 NMR spectroscopy Methods 0.000 description 1
- 229920000557 Nafion® Polymers 0.000 description 1
- ABLZXFCXXLZCGV-UHFFFAOYSA-N Phosphorous acid Chemical group OP(O)=O ABLZXFCXXLZCGV-UHFFFAOYSA-N 0.000 description 1
- 239000004696 Poly ether ether ketone Substances 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- 101000689654 Rattus norvegicus Alpha-1D adrenergic receptor Proteins 0.000 description 1
- 239000004809 Teflon Substances 0.000 description 1
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- 229910021626 Tin(II) chloride Inorganic materials 0.000 description 1
- SXEHKFHPFVVDIR-UHFFFAOYSA-N [4-(4-hydrazinylphenyl)phenyl]hydrazine Chemical compound C1=CC(NN)=CC=C1C1=CC=C(NN)C=C1 SXEHKFHPFVVDIR-UHFFFAOYSA-N 0.000 description 1
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- 150000001347 alkyl bromides Chemical class 0.000 description 1
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- 150000001491 aromatic compounds Chemical class 0.000 description 1
- ANUAIBBBDSEVKN-UHFFFAOYSA-N benzene-1,2,4,5-tetramine Chemical compound NC1=CC(N)=C(N)C=C1N ANUAIBBBDSEVKN-UHFFFAOYSA-N 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
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- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- NIXKBAZVOQAHGC-UHFFFAOYSA-N phenylmethanesulfonic acid Chemical group OS(=O)(=O)CC1=CC=CC=C1 NIXKBAZVOQAHGC-UHFFFAOYSA-N 0.000 description 1
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- 239000002243 precursor Substances 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- HNJBEVLQSNELDL-UHFFFAOYSA-N pyrrolidin-2-one Chemical compound O=C1CCCN1 HNJBEVLQSNELDL-UHFFFAOYSA-N 0.000 description 1
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- JARIJYUQOKFVAJ-UHFFFAOYSA-M sodium;4-carboxy-2-sulfobenzoate Chemical compound [Na+].OC(=O)C1=CC=C(C([O-])=O)C(S(O)(=O)=O)=C1 JARIJYUQOKFVAJ-UHFFFAOYSA-M 0.000 description 1
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- 235000011150 stannous chloride Nutrition 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 150000008053 sultones Chemical class 0.000 description 1
- TXEYQDLBPFQVAA-UHFFFAOYSA-N tetrafluoromethane Chemical compound FC(F)(F)F TXEYQDLBPFQVAA-UHFFFAOYSA-N 0.000 description 1
- AGGKEGLBGGJEBZ-UHFFFAOYSA-N tetramethylenedisulfotetramine Chemical compound C1N(S2(=O)=O)CN3S(=O)(=O)N1CN2C3 AGGKEGLBGGJEBZ-UHFFFAOYSA-N 0.000 description 1
- AXZWODMDQAVCJE-UHFFFAOYSA-L tin(II) chloride (anhydrous) Chemical compound [Cl-].[Cl-].[Sn+2] AXZWODMDQAVCJE-UHFFFAOYSA-L 0.000 description 1
- 125000005425 toluyl group Chemical group 0.000 description 1
- SJEYEFOHSMBQIX-UHFFFAOYSA-N undecane-1-sulfonic acid Chemical group CCCCCCCCCCCS(O)(=O)=O SJEYEFOHSMBQIX-UHFFFAOYSA-N 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
- Y02E60/30—Hydrogen technology
- Y02E60/50—Fuel cells
Landscapes
- Manufacture Of Macromolecular Shaped Articles (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
- Conductive Materials (AREA)
- Fuel Cell (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、高分子電解質膜と
して有用なスルホン酸基含有ポリベンズイミダゾール系
樹脂に関するものである。TECHNICAL FIELD The present invention relates to a sulfonic acid group-containing polybenzimidazole resin useful as a polymer electrolyte membrane.
【0002】[0002]
【従来の技術】液体電解質のかわりに高分子固体電解質
をイオン伝導体として用いる電気化学的装置の例とし
て、水電解槽や燃料電池を上げることができる。これら
に用いられる高分子膜は、カチオン交換膜としてプロト
ン導電率とともに化学的、熱的、電気化学的および力学
的に十分安定なものでなくてはならない。このため、長
期にわたり使用できるものとしては、主に米デュポン社
製の「ナフィオン(登録商標)」を代表例とするパーフ
ルオロカーボンスルホン酸膜が使用されてきた。しかし
ながら、100℃を越える条件で運転しようとすると、
膜の含水率が急激に落ちるほか、膜の軟化も顕著とな
る。このため、将来が期待されるメタノールを燃料とす
る燃料電池においては、膜内のメタノール透過による性
能低下がおこり、十分な性能を発揮することはできな
い。また、現在主に検討されている水素を燃料として8
0℃付近で運転する燃料電池においても、膜のコストが
高すぎることが燃料電池技術の確立の障害として指摘さ
れている。2. Description of the Related Art As an example of an electrochemical device using a solid polymer electrolyte as an ion conductor instead of a liquid electrolyte, a water electrolysis cell or a fuel cell can be used. The polymer membranes used for these must be sufficiently stable chemically, thermally, electrochemically and mechanically as a cation exchange membrane together with proton conductivity. Therefore, as a material that can be used for a long period of time, a perfluorocarbon sulfonic acid membrane typified by "Nafion (registered trademark)" manufactured by DuPont, USA has been mainly used. However, if you try to operate at a temperature above 100 ° C,
The water content of the membrane drops sharply and the membrane softens significantly. Therefore, in a fuel cell that uses methanol as a fuel, which is expected in the future, the performance of the fuel cell deteriorates due to the permeation of methanol in the membrane, and it is not possible to exhibit sufficient performance. In addition, hydrogen, which is currently being studied, is used as fuel.
It has been pointed out that even in a fuel cell operating near 0 ° C., the cost of the membrane is too high as an obstacle to establishing the fuel cell technology.
【0003】このような欠点を克服するため、芳香族環
含有ポリマーにスルホン酸基を導入した高分子電解質膜
が種々検討されている。例えば、ポリアリールエーテル
スルホンをスルホン化したもの(Journal of Membrane
Science, 83, 211(1993))、ポリエーテルエーテルケト
ンをスルホン化したもの(特開平6−93114号)、ス
ルホン化ポリスチレン等である。しかしながら、ポリマ
ーを原料として芳香環上に導入されたスルホン酸基は酸
または熱により脱スルホン酸反応が起こりやすく、燃料
電池用電解質膜として使用するには耐久性が十分である
とは言えない。In order to overcome such drawbacks, various studies have been made on polymer electrolyte membranes in which a sulfonic acid group is introduced into an aromatic ring-containing polymer. For example, sulfonated polyaryl ether sulfone (Journal of Membrane
Science, 83 , 211 (1993)), sulfonated polyetheretherketone (JP-A-6-93114), sulfonated polystyrene and the like. However, a sulfonic acid group introduced on an aromatic ring from a polymer as a raw material is apt to undergo a desulfonic acid reaction due to an acid or heat, and cannot be said to have sufficient durability for use as an electrolyte membrane for a fuel cell.
【0004】高耐熱、高耐久性のポリマーとしてはポリ
ベンズイミダゾールなどの芳香族ポリアゾール系のポリ
マーが知られており、これらのポリマーにスルホン酸基
を導入して上記目的に利用することが考えられる。この
ようなポリマー構造として、スルホン酸を含有したポリ
ベンズイミダゾールについては、UnoらのJ. Polym. Sc
i., Polym. Chem., 15, 1309(1977)における3,3‘−
ジアミノベンジジンと3,5−ジカルボキシベンゼンス
ルホン酸または4,6−ジカルボキシ−1,3−ベンゼ
ンジスルホン酸から合成するものが、USP−5312
895では1,2,4,5−ベンゼンテトラミンと2,
5−ジカルボキシベンゼンスルホン酸を主成分として合
成するものが報告されている。しかし、これらの報告で
は、電解質膜用途などスルホン酸基が持つ電気化学的特
性について顧みられることはなかった。そのため、耐熱
性、耐溶剤性、機械的特性とイオン伝導特性を両立させ
るとともに、さらに加工性をも考慮した分子設計は行わ
れておらず、高分子電解質膜などには使用するには少な
くともいずれかの特性に劣るものであった。As a polymer having high heat resistance and high durability, aromatic polyazole-based polymers such as polybenzimidazole are known, and it is conceivable to introduce a sulfonic acid group into these polymers and utilize them for the above purpose. . As such a polymer structure, polybenzimidazole containing sulfonic acid is described in Uno et al., J. Polym. Sc.
i., Polym. Chem., 15 , 1309 (1977) 3,3'-
What is synthesized from diaminobenzidine and 3,5-dicarboxybenzenesulfonic acid or 4,6-dicarboxy-1,3-benzenedisulfonic acid is USP 5312.
In 895, 1,2,4,5-benzenetetramine and 2,
It has been reported to synthesize 5-dicarboxybenzenesulfonic acid as a main component. However, in these reports, the electrochemical characteristics of the sulfonic acid group such as those for use in electrolyte membranes were not considered. Therefore, the heat resistance, the solvent resistance, the mechanical properties and the ionic conduction properties are made compatible, and the molecular design considering the processability has not been made, and at least any one of them should be used for the polymer electrolyte membrane. It was inferior to that characteristic.
【0005】一方、ポリベンズイミダゾールが本来持つ
耐熱性、耐溶剤性、機械的特性等に注目して、高分子電
解質膜に応用することは、例えばポリベンズイミダゾー
ルに硫酸やリン酸を含浸することで高温でのプロトン伝
導性に優れる高分子電解質膜が得られることがUSP
5,525,436号において報告されている。また、
ポリベンズイミダゾールにスルホン酸基を導入すること
で高分子電解質とするものは、ポリベンズイミダゾール
にN−アルキルスルホン酸を導入するものが特開平9−
73908号やUSP4814399号等で報告されて
いる。また、高分子討論会要旨集、49,P.3217
(2000)においては、N−アルキルスルホン酸含有
ポリベンズイミダゾールの機械強度を改善する目的でN
−アルキル鎖も同時に含有する構造のポリマーが示され
ている。このように、ポリベンズイミダゾールにスルホ
ン酸基を導入することで高分子電解質膜を得ようとする
試みは、N−アルキルスルホン酸とする方法がこれまで
検討されてきており、ポリベンズイミダゾールの芳香族
環上に直接スルホン酸基を導入したものでの検討は報告
されてきていない。N−アルキルスルホン酸構造を持つ
ポリベンズイミダゾールの芳香環上にスルホン酸基が導
入されているポリマーについては、USP5,312,
876に報告されているが、ポリマー自体が水溶性であ
るために水分存在下で使用されるプロトン伝導性高分子
電解質膜としてはもともと使用できるものではないの
で、この系においても高分子電解質膜としての特性は評
価されていない。On the other hand, applying polybenzimidazole to sulfuric acid or phosphoric acid, for example, is to apply polybenzimidazole to sulfuric acid or phosphoric acid by paying attention to the heat resistance, solvent resistance, mechanical properties and the like of polybenzimidazole. USP that a polymer electrolyte membrane with excellent proton conductivity at high temperature can be obtained at
5,525,436. Also,
A polymer electrolyte prepared by introducing a sulfonic acid group into polybenzimidazole is a polymer electrolyte prepared by introducing an N-alkylsulfonic acid into polybenzimidazole.
73908 and USP 4814399. In addition, Abstracts of Polymer Symposium, 49, p. 3217
(2000), N-alkylsulfonic acid-containing polybenzimidazole was used for the purpose of improving the mechanical strength of N.
-A polymer is shown which has a structure which also contains an alkyl chain. As described above, in an attempt to obtain a polymer electrolyte membrane by introducing a sulfonic acid group into polybenzimidazole, a method using N-alkylsulfonic acid has been studied so far, and an aromatic compound of polybenzimidazole has been studied. No studies have been reported on those in which a sulfonic acid group is directly introduced onto the group ring. Regarding a polymer in which a sulfonic acid group is introduced on the aromatic ring of polybenzimidazole having an N-alkylsulfonic acid structure, USP 5,312,
However, since the polymer itself is water-soluble, it cannot be originally used as a proton-conducting polymer electrolyte membrane used in the presence of water. Has not been evaluated.
【0006】以上のように、ポリベンズイミダゾールの
芳香環上に導入されたスルホン酸はJ. Polym. Sci., Po
lym. Chem., 15, 1309(1977)に示されているように、他
のスルホン化ポリアリーレンエーテルなどより遙かに高
い熱安定性に優れていることが期待されるにもかかわら
ず、高分子電解質膜として詳しく検討されることはなか
った。この理由は、主には芳香環上のスルホン酸基と塩
基性基としての特徴を持つイミダゾール環が分子内ある
いは分子間で塩形成をするために、電界内におかれても
プロトンの伝導性が制限されてしまうことによると考え
られる。As described above, the sulfonic acid introduced on the aromatic ring of polybenzimidazole is J. Polym. Sci., Po.
lym. Chem., 15 , 1309 (1977), even though it is expected to have much higher thermal stability than other sulfonated polyarylene ethers, it has high thermal stability. It was not examined in detail as a molecular electrolyte membrane. This is mainly because the imidazole ring, which has the characteristics of a sulfonic acid group and a basic group on the aromatic ring, forms a salt in the molecule or between the molecules, so that the conductivity of the proton is maintained even in the electric field. Is considered to be limited.
【0007】[0007]
【発明が解決しようとする課題】本発明の目的は、耐熱
性、機械特性など優れた性質を持つ芳香環上にスルホン
酸基を持つポリベンズイミダゾール系ポリマーのプロト
ン伝導性を高めるとともに、同時に高分子電解質膜とし
て使用する際に十分な耐水性をもつ高分子材料を得るこ
とにある。The object of the present invention is to increase the proton conductivity of a polybenzimidazole-based polymer having a sulfonic acid group on an aromatic ring, which has excellent properties such as heat resistance and mechanical properties, and at the same time, to improve the proton conductivity. The purpose is to obtain a polymer material having sufficient water resistance when used as a molecular electrolyte membrane.
【0008】[0008]
【課題を解決するための手段】本発明者らは、上記目的
を達成するために鋭意研究を重ねた結果、特定のスルホ
ン酸基を含むポリベンズイミダゾール系ポリマーのイミ
ダゾール環上水素を炭素系置換基に変換することで耐水
性を維持しながらプロトン伝導特性を改良することがで
き、燃料電池などに使用する高分子電解質膜として有用
な高分子材料を得るに至った。Means for Solving the Problems As a result of intensive studies to achieve the above object, the inventors of the present invention have conducted carbon-based substitution of hydrogen on the imidazole ring of a polybenzimidazole-based polymer containing a specific sulfonic acid group. By converting it into a group, it is possible to improve the proton conduction property while maintaining water resistance, and it has become possible to obtain a polymer material useful as a polymer electrolyte membrane used in fuel cells and the like.
【0009】すなわち本発明は、下記(1)〜(5)に
より達成される。
(1)下記一般式(1)で表される繰り返し単位からな
る重合体を主成分とし、硫酸中で測定した対数粘度が
0.1以上であるとともに実質的に水に溶解しないこと
を特徴とするスルホン酸基含有ポリベンズイミダゾール
化合物。That is, the present invention is achieved by the following (1) to (5). (1) A polymer having a repeating unit represented by the following general formula (1) as a main component, having a logarithmic viscosity of 0.1 or more as measured in sulfuric acid and being substantially insoluble in water. A polybenzimidazole compound containing a sulfonic acid group.
【化2】
(式中、Xは−O−,−SO2−,−C(CH3)2−,
−C(CF3)2−,−OPhO−、直接結合から選ばれ
る。Arはスルホン酸基を0〜2個含む芳香族基から選
ばれ、平均値としてスルホン酸基はArあたり0.5個
以上含まれる。Rは水素、炭素数2〜12個の脂肪族、
芳香族、脂肪族/芳香族置換基および炭素数2〜12個
の脂肪族スルホン酸、芳香族スルホン酸、脂肪族/芳香
族スルホン酸置換基から選ばれる。)[Chemical 2] (In the formula, X is —O—, —SO 2 —, —C (CH 3 ) 2 —,
-C (CF 3) 2 -, - OPhO-, selected from a direct bond. Ar is selected from aromatic groups containing 0 to 2 sulfonic acid groups, and the average value of sulfonic acid groups is 0.5 or more per Ar. R is hydrogen, aliphatic having 2 to 12 carbon atoms,
It is selected from aromatic, aliphatic / aromatic substituents and aliphatic sulfonic acids having 2 to 12 carbon atoms, aromatic sulfonic acids, and aliphatic / aromatic sulfonic acid substituents. )
【0010】(2)前記(1)中の一般式(1)におい
てRが水素、炭素数2〜12個の脂肪族、芳香族、脂肪
族/芳香族置換基から選ばれることを特徴とするスルホ
ン酸基含有ポリベンズイミダゾール化合物。(2) In the general formula (1) in the above (1), R is selected from hydrogen, an aliphatic group having 2 to 12 carbon atoms, an aromatic group, and an aliphatic / aromatic substituent group. Sulfonic acid group-containing polybenzimidazole compound.
【0011】(3)前記(1)中の一般式(1)におい
てRが水素、炭素数2〜12個の脂肪族スルホン酸、芳
香族スルホン酸、脂肪族/芳香族スルホン酸置換基から
選ばれることを特徴とするスルホン酸基含有ポリベンズ
イミダゾール化合物。(3) In the general formula (1) in the above (1), R is selected from hydrogen, an aliphatic sulfonic acid having 2 to 12 carbon atoms, an aromatic sulfonic acid, and an aliphatic / aromatic sulfonic acid substituent. A benzimidazole compound containing a sulfonic acid group.
【0012】(4)前記(1)乃至(3)におけるスル
ホン酸基含有ポリベンズイミダゾール化合物を主成分と
することを特徴とする成形物。(4) A molded product comprising the sulfonic acid group-containing polybenzimidazole compound as described in (1) to (3) above as a main component.
【0013】(5)前記(1)乃至(4)におけるスル
ホン酸基含有ポリベンズイミダゾール化合物を主成分と
することを特徴とする膜。(5) A membrane comprising the sulfonic acid group-containing polybenzimidazole compound according to the above (1) to (4) as a main component.
【0014】[0014]
【発明の実施の形態】以下本発明について詳細に説明す
る。本発明は、下記一般式(1)で表される繰り返し単
位からなる重合体を主成分とすることを特徴とするスル
ホン酸基含有ポリベンズイミダゾール化合物、およびそ
れを主成分とする成形物、膜により、耐熱性、機械特性
に優れるとともに、十分高いプロトン伝導性を合わせ持
つ高分子固体電解質となる材料を提供するものである。
この樹脂組成物は、高分子電解質材料として使用するた
め、硫酸中で測定したその対数粘度は0.1以上である
とともに実質的に水に溶解しないことが必要となる。対
数粘度がこれより低い場合、取り扱いが困難になるなど
の問題が生じる。BEST MODE FOR CARRYING OUT THE INVENTION The present invention will be described in detail below. The present invention comprises, as a main component, a polymer comprising a repeating unit represented by the following general formula (1), and a sulfonic acid group-containing polybenzimidazole compound, and a molded article and a film containing the same as a main component. Thus, a material which is a polymer solid electrolyte having excellent heat resistance and mechanical properties and also having sufficiently high proton conductivity is provided.
Since this resin composition is used as a polymer electrolyte material, its logarithmic viscosity measured in sulfuric acid must be 0.1 or more and it must be substantially insoluble in water. When the logarithmic viscosity is lower than this, problems such as difficulty in handling occur.
【0015】[0015]
【化3】
(式中、Xは−O−,−SO2−,−C(CH3)2−,
−C(CF3)2−,−OPhO−、直接結合から選ばれ
る。Arはスルホン酸基を0〜2個含む芳香族基から選
ばれ、平均値としてスルホン酸基はArあたり0.5個
以上含まれる。Rは水素、炭素数2〜12個の脂肪族、
芳香族、脂肪族/芳香族置換基および炭素数2〜12個
の脂肪族スルホン酸、芳香族スルホン酸、脂肪族/芳香
族スルホン酸置換基から選ばれる。)[Chemical 3] (In the formula, X is —O—, —SO 2 —, —C (CH 3 ) 2 —,
-C (CF 3) 2 -, - OPhO-, selected from a direct bond. Ar is selected from aromatic groups containing 0 to 2 sulfonic acid groups, and the average value of sulfonic acid groups is 0.5 or more per Ar. R is hydrogen, aliphatic having 2 to 12 carbon atoms,
It is selected from aromatic, aliphatic / aromatic substituents and aliphatic sulfonic acids having 2 to 12 carbon atoms, aromatic sulfonic acids, and aliphatic / aromatic sulfonic acid substituents. )
【0016】上記一般式(1)で示されるスルホン酸基
含有ポリベンズイミダゾール化合物は、芳香環上にスル
ホン酸基を持つポリベンズイミダゾールに対して、特開
平9−73908号やUSP4814399号に記載さ
れているような方法で、イミダゾール環窒素上水素をN
a,Li等に置き換えたのち、アルキルブロミドやサル
トン類などと反応させることで得ることができる。上記
式(1)中のRとしては、具体的にはメチル基、エチル
基、n−プロピル基、n−ブチル基、n−ペンチル基、
n−ヘキシル基、n−ヘプチル基、n−オクチル基、n
−ノニル基、n−デシル基、n−ウンデシル基、n−ド
デシル基等の直鎖アルキル基、イソプロピル基、イソブ
チル基、2−メチルプロピル基、sec−ブチル基、t
ert−ブチル基、イソペンチル基、イソヘキシル基、
2−メチルペンチル基をはじめとする分岐型アルキル
基、フェニル基、ナフチル基、トルイル基等の芳香族
基、ベンジル基等の脂肪族/芳香族置換基等があげられ
るがこれらに限定されるものではない。また、これらの
置換基上の一部の水素原子がが、水酸基、ハロゲン基な
ど他の置換基、元素で置き換わっていても良い。また、
Rとしての具体例としては、メチルスルホン酸基、2−
エチルスルホン酸基、3−プロピルスルホン酸基、4−
ブチルスルホン酸基基、5−ペンチルスルホン酸基、6
−ヘキシルスルホン酸基、7−ヘプチルスルホン酸基、
8−オクチルスルホン酸基、9−ノニルスルホン酸基、
10−デシルスルホン酸基、11−ウンデシルスルホン
酸基、12−ドデシルスルホン酸基等のアルキルスルホ
ン酸基、4−フェニルスルホン酸基、3−フェニルスル
ホン酸基、ナフチルスルホン酸基、トルイルスルホン酸
基等の芳香族スルホン酸基、ベンジルスルホン酸基等の
スルホン酸基含有脂肪族/芳香族置換基等もあげられる
が、これらに限定されるものではない。これらの置換基
は、1種だけでなく複数の置換基を混合して存在させる
こともできる。これらの置換基はイミダゾール環窒素上
の水素のうちの30%以上を置換していることが好まし
い。これよりも少ない場合、プロトン伝導性において優
れた性能を発揮することが難しくなる。The sulfonic acid group-containing polybenzimidazole compound represented by the above general formula (1) is described in JP-A-9-73908 and USP4814399, in contrast to polybenzimidazole having a sulfonic acid group on the aromatic ring. The hydrogen on the imidazole ring nitrogen to N
It can be obtained by substituting with a, Li or the like and then reacting with alkyl bromide or sultones. As R in the above formula (1), specifically, a methyl group, an ethyl group, an n-propyl group, an n-butyl group, an n-pentyl group,
n-hexyl group, n-heptyl group, n-octyl group, n
-Nonyl group, n-decyl group, n-undecyl group, linear alkyl group such as n-dodecyl group, isopropyl group, isobutyl group, 2-methylpropyl group, sec-butyl group, t
ert-butyl group, isopentyl group, isohexyl group,
Examples include branched alkyl groups including 2-methylpentyl group, aromatic groups such as phenyl group, naphthyl group, toluyl group, and aliphatic / aromatic substituents such as benzyl group, but are not limited thereto. is not. Further, some hydrogen atoms on these substituents may be replaced with other substituents such as a hydroxyl group and a halogen group, or an element. Also,
Specific examples of R include a methylsulfonic acid group and 2-
Ethylsulfonic acid group, 3-propylsulfonic acid group, 4-
Butyl sulfonic acid group, 5-pentyl sulfonic acid group, 6
-Hexyl sulfonic acid group, 7-heptyl sulfonic acid group,
8-octyl sulfonic acid group, 9-nonyl sulfonic acid group,
Alkylsulfonic acid groups such as 10-decylsulfonic acid group, 11-undecylsulfonic acid group and 12-dodecylsulfonic acid group, 4-phenylsulfonic acid group, 3-phenylsulfonic acid group, naphthylsulfonic acid group, toluylsulfonic acid Examples thereof include aromatic sulfonic acid groups such as groups, and sulfonic acid group-containing aliphatic / aromatic substituents such as benzylsulfonic acid groups, but are not limited thereto. These substituents may be present not only as one type but also as a mixture of a plurality of substituents. These substituents preferably substitute 30% or more of the hydrogen atoms on the imidazole ring nitrogen. If it is less than this, it becomes difficult to exhibit excellent performance in proton conductivity.
【0017】上記N−置換基を導入した本発明のスルホ
ン酸基含有ポリベンズイミダゾール化合物中のスルホン
酸基は、一般にはLiやNa等の塩の形で得られる。こ
の塩をはずすには、一般に行われる酸処理を使用するこ
とができる。ポリマー粉末、フィルム等の固体状態で酸
溶液と接触させても良いし、ポリマーを酸溶媒に溶解し
た後非溶媒中に投入してフリーのスルホン酸型ポリマー
として回収しても良い。イオン交換樹脂を用いたマイル
ドな中和により、フリースルホン酸とすることも有用で
ある。The sulfonic acid group in the sulfonic acid group-containing polybenzimidazole compound of the present invention having the N-substituent introduced therein is generally obtained in the form of a salt such as Li or Na. To remove the salt, a commonly used acid treatment can be used. It may be brought into contact with an acid solution in a solid state such as a polymer powder or a film, or may be dissolved in an acid solvent and then put into a non-solvent to be recovered as a free sulfonic acid type polymer. It is also useful to make free sulfonic acid by mild neutralization using an ion exchange resin.
【0018】上述のN−置換反応を行う芳香環上にスル
ホン酸基を持つポリベンズイミダゾールは、3,3‘−
ジアミノベンジジン、3,3’,4,4‘−テトラアミ
ノジフェニルスルホン、2,2−ビス(3,4−ジアミ
ノフェニル)プロパン、2,2−ビス(3,4−ジアミ
ノフェニル)ヘキサフルオロプロパン、3,3’,4,
4‘−テトラアミノジフェニルエーテル、ビス(3,
4,−ジアミノフェノキシ)ベンゼンから選ばれる芳香
族テトラミンまたはその誘導体とスルホン酸基を含む芳
香族ジカルボン酸およびスルホン酸基を含まない芳香族
ジカルボン酸を組み合わせた重合により得ることができ
る。上記芳香族テトラミンの誘導体の例としては、塩
酸、硫酸、リン酸などの酸との塩などをあげることがで
きる。テトラミン化合物は、1種のみだけでなく同時に
複数使用することもできる。これらの芳香族テトラミン
は、必要に応じて塩化すず(II)や亜リン酸化合物な
ど公知の酸化防止剤を含んでいてもよい。Polybenzimidazole having a sulfonic acid group on the aromatic ring which undergoes the above N-substitution reaction is 3,3'-
Diaminobenzidine, 3,3 ′, 4,4′-tetraaminodiphenyl sulfone, 2,2-bis (3,4-diaminophenyl) propane, 2,2-bis (3,4-diaminophenyl) hexafluoropropane, 3, 3 ', 4,
4'-tetraaminodiphenyl ether, bis (3,
It can be obtained by a polymerization in which an aromatic tetramine selected from 4, -diaminophenoxy) benzene or a derivative thereof and an aromatic dicarboxylic acid containing a sulfonic acid group and an aromatic dicarboxylic acid containing no sulfonic acid group are combined. Examples of the aromatic tetramine derivative include salts with acids such as hydrochloric acid, sulfuric acid and phosphoric acid. The tetramine compound may be used not only in one kind but also in plural kinds at the same time. These aromatic tetramines may contain a known antioxidant such as tin (II) chloride or a phosphorous acid compound, if necessary.
【0019】上述のスルホン酸基含有ジカルボン酸は、
芳香族系ジカルボン酸中に1個または2個のスルホン酸
基を含有するものを選択することができるが、具体例と
しては、例えば、2,5−ジカルボキシベンゼンスルホ
ン酸、3,5−ジカルボキシベンゼンスルホン酸、4,
6−ジカルボキシ−1,3−ベンゼンジスルホン酸、
2,5−ジカルボキシ−1,4−ベンゼンジスルホン
酸、4,4’−ジカルボキシ−2,2’−ビフェニルジ
スルホン酸などのスルホン酸含有ジカルボン酸及びこれ
らの誘導体を挙げることができる。誘導体としては、ナ
トリウム、カリウムなどのアルカリ金属塩や、アンモニ
ウム塩などをあげることができる。スルホン酸基含有ジ
カルボン酸の構造は特にこれらに限定されることはな
い。スルホン酸基含有ジカルボン酸はそれら単独だけで
なく、スルホン酸基を含有しないジカルボン酸とともに
共重合の形で導入することができる。スルホン酸基を含
有するジカルボン酸の純度は特に制限されるものではな
いが、98%以上が好ましく、99%以上がより好まし
い。スルホン酸基を含有するジカルボン酸を原料として
重合されたポリベンズイミダゾールは、スルホン酸基を
含有しないジカルボン酸を用いた場合に比べて、重合度
が低くなる傾向が見られるため、スルホン酸基を含有す
るジカルボン酸はできるだけ純度が高いものを用いるこ
とが好ましい。The above-mentioned carboxylic acid group-containing dicarboxylic acid is
An aromatic dicarboxylic acid containing one or two sulfonic acid groups can be selected, and specific examples thereof include 2,5-dicarboxybenzenesulfonic acid and 3,5-dicarboxylic acid. Carboxybenzene sulfonic acid, 4,
6-dicarboxy-1,3-benzenedisulfonic acid,
Examples thereof include sulfonic acid-containing dicarboxylic acids such as 2,5-dicarboxy-1,4-benzenedisulfonic acid and 4,4′-dicarboxy-2,2′-biphenyldisulfonic acid, and derivatives thereof. Examples of the derivative include alkali metal salts such as sodium and potassium, ammonium salts and the like. The structure of the sulfonic acid group-containing dicarboxylic acid is not particularly limited to these. The sulfonic acid group-containing dicarboxylic acids can be introduced not only by themselves but also in the form of copolymerization with dicarboxylic acids not containing sulfonic acid groups. The purity of the dicarboxylic acid containing a sulfonic acid group is not particularly limited, but is preferably 98% or more, more preferably 99% or more. Polybenzimidazole polymerized using a dicarboxylic acid containing a sulfonic acid group as a raw material, as compared with the case of using a dicarboxylic acid not containing a sulfonic acid group, the degree of polymerization tends to be low, the sulfonic acid group It is preferable to use a dicarboxylic acid contained as high purity as possible.
【0020】上記スルホン酸基含有ジカルボン酸ととも
に使用できるジカルボン酸例としては、テレフタル酸、
イソフタル酸、ナフタレンジカルボン酸、ジフェニルエ
ーテルジカルボン酸、ジフェニルスルホンジカルボン
酸、ビフェニルジカルボン酸、ターフェニルジカルボン
酸、2,2−ビス(4−カルボキシフェニル)ヘキサフ
ルオロプロパン等ポリエステル原料として報告されてい
る一般的なジカルボン酸を使用することができ、ここで
例示したものに限定されるものではない。スルホン酸基
含有しないジカルボン酸をスルホン酸基を含有するジカ
ルボン酸とともに使用する場合、平均値としてスルホン
酸基は上記式(1)におけるArあたり0.5個以上含
まれることが必要である。Examples of dicarboxylic acids that can be used with the sulfonic acid group-containing dicarboxylic acids include terephthalic acid,
Isophthalic acid, naphthalene dicarboxylic acid, diphenyl ether dicarboxylic acid, diphenyl sulfone dicarboxylic acid, biphenyl dicarboxylic acid, terphenyl dicarboxylic acid, 2,2-bis (4-carboxyphenyl) hexafluoropropane, etc. Dicarboxylic acids can be used and are not limited to those exemplified here. When a dicarboxylic acid containing no sulfonic acid group is used together with a dicarboxylic acid containing a sulfonic acid group, it is necessary that the average number of sulfonic acid groups is 0.5 or more per Ar in the above formula (1).
【0021】上述のN−置換反応を行う芳香環上にスル
ホン酸基を持つポリベンズイミダゾールは、例えば、テ
トラアミンモノマーとジカルボン酸モノマーをJ.F.Wolf
e, Encyclopedia of Polymer Science and Engineerin
g, 2nd Ed., Vol.11, P.601(1988)に記載されるような
ポリリン酸を溶媒とする脱水、環化重合により合成する
ことができる。また、ポリリン酸のかわりにメタンスル
ホン酸/五酸化リン混合溶媒系を用いた同様の機構によ
る重合を適用することもできる。他に、適当な有機溶媒
中や混合モノマー融体の反応でポリアミド構造などの前
駆体ポリマーとしておき、その後の適当な熱処理などに
よる環化反応で目的のポリベンズイミダゾール構造に変
換する方法なども使用することができる。熱安定性の高
いポリマーを合成するには、一般によく使用されるポリ
リン酸を用いた重合が好ましい。しかしながら、本発明
のようにスルホン酸基を含むジカルボン酸を用いた重合
においては従来報告されているような長時間をかけた重
合では、得られたポリマーの熱安定性が低下してしまう
恐れがある。このため、本発明では、重合時間は個々の
モノマーの組み合わせにより最適な時間があるので一概
には規定できないが、重合時間を効果的に短くすること
が好ましい。このことにより、スルホン酸基量が多いポ
リマーも熱安定性の高い状態で得ることができる。The polybenzimidazole having a sulfonic acid group on the aromatic ring which undergoes the above N-substitution reaction is, for example, a tetraamine monomer and a dicarboxylic acid monomer as JFWolf.
e, Encyclopedia of Polymer Science and Engineerin
g, 2nd Ed., Vol. 11, P. 601 (1988), and can be synthesized by dehydration and cyclopolymerization using polyphosphoric acid as a solvent. It is also possible to apply polymerization by a similar mechanism using a methanesulfonic acid / phosphorus pentoxide mixed solvent system instead of polyphosphoric acid. In addition, a method such as using a precursor polymer such as a polyamide structure in a reaction with an appropriate organic solvent or a mixed monomer melt, and then converting it to the desired polybenzimidazole structure by a cyclization reaction by an appropriate heat treatment is also used. can do. In order to synthesize a polymer having high heat stability, polymerization using polyphosphoric acid, which is commonly used, is preferable. However, in the polymerization using a dicarboxylic acid containing a sulfonic acid group as in the present invention, in the polymerization that takes a long time as conventionally reported, the thermal stability of the obtained polymer may decrease. is there. Therefore, in the present invention, the polymerization time cannot be unconditionally specified because there is an optimum time depending on the combination of individual monomers, but it is preferable to effectively shorten the polymerization time. As a result, a polymer having a large amount of sulfonic acid groups can also be obtained with high thermal stability.
【0022】本発明のスルホン酸基含有ポリアゾール化
合物は、重合溶液又は単離したポリマーから押し出し、
紡糸、圧延、キャストなど任意の方法で繊維やフィルム
に成形することができる。中でも適当な溶媒に溶解した
溶液から成形することが好ましい。溶解する溶媒として
は、N,N−ジメチルアセトアミド、N,N−ジメチル
ホルムアミド、ジメチルスルホキシド、N−メチル−2
−ピロリドン、ヘキサメチルホスホンアミドなど非プロ
トン極性溶媒や、ポリリン酸、メタンスルホン酸、硫
酸、トリフルオロ酢酸などの強酸から適切なものを選ぶ
ことができるがこれらに限定されるものではない。これ
らの溶媒は、可能な範囲で複数を混合して使用してもよ
い。また、溶解性を向上させる手段として、臭化リチウ
ム、塩化リチウム、塩化アルミニウムなどのルイス酸を
有機溶媒に添加したものを溶媒としてもよい。溶液中の
ポリマー濃度は0.1〜30重量%の範囲であることが
好ましい。低すぎると成形性が悪化し、高すぎると加工
性が悪化する。The sulfonic acid group-containing polyazole compound of the present invention is extruded from a polymerization solution or an isolated polymer,
Fibers and films can be formed by any method such as spinning, rolling, and casting. Above all, it is preferable to mold from a solution dissolved in a suitable solvent. As a solvent to be dissolved, N, N-dimethylacetamide, N, N-dimethylformamide, dimethyl sulfoxide, N-methyl-2
-Aprotic polar solvents such as pyrrolidone and hexamethylphosphonamide, and strong acids such as polyphosphoric acid, methanesulfonic acid, sulfuric acid, and trifluoroacetic acid can be appropriately selected, but are not limited thereto. A plurality of these solvents may be mixed and used within a possible range. Further, as a means for improving the solubility, a solvent obtained by adding a Lewis acid such as lithium bromide, lithium chloride or aluminum chloride to an organic solvent may be used. The polymer concentration in the solution is preferably in the range of 0.1 to 30% by weight. If it is too low, moldability deteriorates, and if it is too high, workability deteriorates.
【0023】溶液から成形体を得る方法は公知の方法を
用いることができる。例えば加熱、減圧乾燥、ポリマー
を溶解する溶媒と混和できるポリマー非溶媒への浸漬な
どによって、溶媒を除去しスルホン酸基含有ポリベンズ
イミダゾールの成形体を得ることができる。溶媒が有機
溶媒の場合は、加熱又は減圧乾燥で溶媒を留去させるこ
とが好ましい。溶媒が強酸の場合には、水、メタノー
ル、アセトンなどに浸漬することが好ましい。この際、
必要に応じて他のポリマーと複合された形で繊維やフィ
ルムに成形することもできる。溶解性挙動が類似するポ
リベンズアゾール系ポリマーと組み合わせると、良好な
成形をするのに都合がよい。As a method for obtaining a molded product from a solution, a known method can be used. For example, the solvent can be removed by heating, drying under reduced pressure, dipping in a polymer non-solvent that is miscible with a solvent that dissolves the polymer, and a molded product of sulfonic acid group-containing polybenzimidazole can be obtained. When the solvent is an organic solvent, it is preferable to distill off the solvent by heating or drying under reduced pressure. When the solvent is a strong acid, it is preferably immersed in water, methanol, acetone or the like. On this occasion,
If necessary, it can be formed into a fiber or a film by being combined with another polymer. When combined with a polybenzazole-based polymer having a similar solubility behavior, it is convenient for good molding.
【0024】本発明のスルホン酸基含有ポリベンズイミ
ダゾール化合物を主成分とする膜を成形する好ましい方
法は、溶液からのキャストである。キャストした溶液か
ら前記のように溶媒を除去してスルホン酸基含有ポリベ
ンズイミダゾールの膜を得ることができる。溶媒の除去
は、乾燥により行うことが膜の均一性からは好ましい。
また、ポリマーや溶媒の分解や変質をさけるため、減圧
下でできるだけ低い温度で乾燥することが好ましい。キ
ャストする基板には、ガラス板やテフロン(登録商標)
板などを用いることができる。溶液の粘度が高い場合に
は、基板や溶液を加熱して高温でキャストすると溶液の
粘度が低下して容易にキャストすることができる。キャ
ストする際の溶液の厚みは特に制限されないが、10〜
1000μmであることが好ましい。薄すぎると膜とし
ての形態を保てなくなり、厚すぎると不均一な膜ができ
やすくなる。より好ましくは100〜500μmであ
る。溶液のキャスト厚を制御する方法は公知の方法を用
いることができる。例えば、アプリケーター、ドクター
ブレードなどを用いて一定の厚みにしたり、ガラスシャ
ーレなどを用いてキャスト面積を一定にして溶液の量や
濃度で厚みを制御することができる。キャストした溶液
は、溶媒の除去速度を調整することでより均一な膜を得
ることができる。例えば、加熱する場合には最初の段階
では低温にして蒸発速度を下げたりすることができる。
また、水などの非溶媒に浸漬する場合には、溶液を空気
中や不活性ガス中に適当な時間放置しておくなどしてポ
リマーの凝固速度を調整することができる。本発明の膜
は目的に応じて任意の膜厚にすることができるが、イオ
ン伝導性の面からはできるだけ薄いことが好ましい。具
体的には200μm以下であることが好ましく、50μ
m以下であることがさらに好ましく、20μm以下であ
ることが最も好ましい。The preferred method of forming a membrane based on the sulfonic acid group-containing polybenzimidazole compound of the present invention is casting from solution. The solvent can be removed from the cast solution as described above to obtain a sulfonic acid group-containing polybenzimidazole film. It is preferable to remove the solvent by drying in terms of uniformity of the film.
Further, in order to prevent decomposition and deterioration of the polymer and solvent, it is preferable to dry under reduced pressure at the lowest temperature possible. The substrate to cast is a glass plate or Teflon (registered trademark)
A plate or the like can be used. When the viscosity of the solution is high, heating the substrate or the solution and casting at a high temperature lowers the viscosity of the solution, so that the solution can be easily cast. The thickness of the solution at the time of casting is not particularly limited, but 10 to
It is preferably 1000 μm. If it is too thin, the form of the film cannot be maintained, and if it is too thick, a non-uniform film is likely to be formed. More preferably, it is 100 to 500 μm. A known method can be used for controlling the cast thickness of the solution. For example, an applicator, a doctor blade, or the like may be used to make the thickness constant, or a glass petri dish or the like may be used to make the casting area constant to control the thickness by the amount or concentration of the solution. A more uniform film can be obtained from the cast solution by adjusting the removal rate of the solvent. For example, when heating, the evaporation rate can be lowered by lowering the temperature in the first step.
When immersed in a non-solvent such as water, the coagulation rate of the polymer can be adjusted by leaving the solution in air or an inert gas for an appropriate time. The film of the present invention can have any film thickness depending on the purpose, but it is preferably as thin as possible from the viewpoint of ion conductivity. Specifically, it is preferably 200 μm or less, and 50 μm
It is more preferably m or less, and most preferably 20 μm or less.
【0025】本発明のホスホン酸基またはスルホン酸基
含有ポリベンズイミダゾールポリマーはイオン伝導性に
優れているため、フィルム、膜状にして燃料電池などの
イオン交換膜として使用するのにも適している。さら
に、本発明のポリマー構造を主成分にすることにより、
本発明のイオン交換膜と電極との接合体を作製するとき
のバインダー樹脂等の塗料として利用することもでき
る。The phosphonic acid group- or sulfonic acid group-containing polybenzimidazole polymer of the present invention has excellent ionic conductivity, and is suitable for use as an ion exchange membrane in a fuel cell or the like after being formed into a film or a membrane. . Furthermore, by using the polymer structure of the present invention as a main component,
It can also be used as a coating material for a binder resin or the like when producing a bonded body of the ion exchange membrane of the present invention and an electrode.
【0026】[0026]
【実施例】以下本発明を実施例を用いて具体的に説明す
るが、本発明はこれらの実施例に限定されることはな
い。なお、各種測定は次のように行った。
対数粘度:ポリマー粉末を0.5g/dlの濃度で濃硫
酸に溶解し、30℃の恒温槽中でオストワルド粘度計を
用いて粘度測定を行い、対数粘度[ln(ta/tb)]
/cで評価した(taは試料溶液の落下秒数、tbは溶
媒のみの落下秒数、cはポリマー濃度)。
イオン伝導性測定:自作測定用プローブ(ポリテトラフ
ルオロエチレン製)上で短冊状膜試料の表面に白金線
(直径:0.2mm)を押しあて、80℃95%RHの
恒温・恒湿オーブン(株式会社ナガノ科学機械製作所、
LH−20−01)中に試料を保持し、白金線間の交流
インピーダンスをSOLARTRON社1250FRE
QUENCY RESPONSE ANALYSERに
より測定した。極間距離を変化させて測定し、極間距離
とCole−Coleプロットより求めた抵抗測定値を
プロットした勾配から以下の式により膜と白金線間の接
触抵抗をキャンセルした導電率を算出した。
導電率[S/cm]=1/膜幅[cm]x膜厚[cm]x抵抗極
間勾配[Ω/cm]
IR測定:分光器にBiorad社FTS-40、顕微鏡にBiorad社UM
A-300Aを用いた顕微透過法により測定した。
NMR測定:分光器にVarian社Unity-500を用い、溶媒にDM
SO-d6、測定温度80℃で、H-NMRを測定した。EXAMPLES The present invention will be specifically described below with reference to examples, but the present invention is not limited to these examples. Various measurements were performed as follows. Logarithmic viscosity: Polymer powder was dissolved in concentrated sulfuric acid at a concentration of 0.5 g / dl, and the viscosity was measured using an Ostwald viscometer in a constant temperature bath at 30 ° C. to obtain logarithmic viscosity [ln (ta / tb)].
/ C was evaluated (ta is the number of seconds of dropping the sample solution, tb is the number of seconds of dropping only the solvent, and c is the polymer concentration). Ion conductivity measurement: A platinum wire (diameter: 0.2 mm) was pressed against the surface of a strip-shaped membrane sample on a probe for self-made measurement (made of polytetrafluoroethylene), and a constant temperature and constant humidity oven at 80 ° C and 95% RH ( Nagano Scientific Machinery Works Co., Ltd.
LH-20-01) holds the sample and sets the AC impedance between the platinum wires to SOLARTRON 1250FRE.
It was measured by QUENCY RESPONSE ANALYSER. Measurement was performed by changing the distance between the electrodes, and the electrical conductivity in which the contact resistance between the film and the platinum wire was canceled was calculated by the following formula from the gradient in which the distance between the electrodes and the measured resistance value obtained from the Cole-Cole plot were plotted. Conductivity [S / cm] = 1 / film width [cm] x film thickness [cm] x resistance gap between electrodes [Ω / cm] IR measurement: FTS-40 spectroscope for Biorad and UM for Biorad for microscope
It was measured by a microscopic transmission method using A-300A. NMR measurement: Varian Unity-500 was used for the spectroscope, and DM was used as the solvent.
H-NMR was measured at SO-d6 and a measurement temperature of 80 ° C.
【0027】実施例1
3,3’,4,4‘−テトラアミノジフェニルスルホン
1.500g(5.389×10-3mole)、2,5−ジカルボキシベ
ンゼンスルホン酸モノナトリウム(純度99%)1.445g
(5.389×10-3mole)、ポリリン酸(五酸化リン含量7
5%)20.48g、五酸化リン16.41gを重合容器に量り取
り、窒素を流し、オイルバス上ゆっくり撹拌しながら1
00℃まで昇温 した。100℃で1時間保持した後、
150℃に昇温 して1時間、200℃に昇温 して3時
間重合した。重合終了後放冷し、水を加えて重合物を取
り出し、家庭用ミキサーを用いてpH試験紙中性になるま
で水洗を繰り返した。得られたポリマーは80℃で終夜
減圧乾燥した。ポリマーの対数粘度は、1.52を示し
た。得られたポリマー500mg(1.11×10-3mole)をガラ
ス製反応容器に入れ、100℃オイルバス上で真空乾燥し
た(約3時間)。ここへ、ジメチルアセトアミド(DMA
c)10mlを加え、150℃で溶解させた。系を70℃に下げ
た後、水素化リチウム41mg(5.16×10-3mole)を加えて
90分撹拌後、臭素化プロピル4.66ml(=6.3g)(5.12×10
-2mole)を加え、反応温度を80度にして3時間反応を続
けた。放冷後、N―メチルピロリドン(NMP)で希釈
した後、150mlのTHF中に白色ポリマーを再沈殿させた。
生成物のスルホン酸はLi塩となっているため、フリー酸
とするために生成ポリマーをメタンスルホン酸に再溶解
し、水中に再沈殿させた。得られたポリマーの対数粘度
は0.97を示した。得られたポリマーのIRスペクト
ルを図1に示す。H−NMRより、ポリマー中イミダゾ
ール環窒素上水素の75%がプロピル基に置換されてい
ることがわかった(図2)。N−プロピル化ポリマー
は、NMP溶液からガラス板上にキャストしてフィルム
を作製した。乾燥フィルムを80℃の熱水で1時間処理し
てもフィルムの形態に変化はなく、これを測定試料とし
たところ、80℃95%RHにおけるイオン伝導度は
0.00051S/cmを示した。Example 1 3,3 ', 4,4'-tetraaminodiphenyl sulfone
1.500g (5.389 × 10 -3 mole), Monosodium 2,5-dicarboxybenzenesulfonate (Purity 99%) 1.445g
(5.389 × 10 -3 mole), polyphosphoric acid (phosphorus pentoxide content 7
5%) 20.48 g, phosphorous pentoxide 16.41 g are weighed into a polymerization vessel, flushed with nitrogen, and slowly stirred on an oil bath 1
The temperature was raised to 00 ° C. After holding at 100 ℃ for 1 hour,
The temperature was raised to 150 ° C. for 1 hour, and the temperature was raised to 200 ° C. for 3 hours for polymerization. After completion of the polymerization, the mixture was allowed to cool, water was added to take out the polymer, and washing with water was repeated using a household mixer until the pH test paper became neutral. The obtained polymer was dried under reduced pressure at 80 ° C. overnight. The inherent viscosity of the polymer was 1.52. 500 mg (1.11 × 10 −3 mole) of the obtained polymer was placed in a glass reaction container and vacuum dried on a 100 ° C. oil bath (about 3 hours). Dimethylacetamide (DMA
c) 10 ml was added and dissolved at 150 ° C. After lowering the system to 70 ℃, add 41 mg (5.16 × 10 -3 mole) of lithium hydride.
After stirring for 90 minutes, 4.66 ml (= 6.3 g) of propyl bromide (5.12 x 10
-2 mole) was added, the reaction temperature was set to 80 ° C., and the reaction was continued for 3 hours. After allowing to cool, it was diluted with N-methylpyrrolidone (NMP), and then the white polymer was reprecipitated in 150 ml of THF.
Since the sulfonic acid of the product is a Li salt, the produced polymer was redissolved in methanesulfonic acid and reprecipitated in water to obtain a free acid. The logarithmic viscosity of the obtained polymer was 0.97. The IR spectrum of the obtained polymer is shown in FIG. From 1 H-NMR, it was found that 75% of hydrogen on the imidazole ring nitrogen in the polymer was replaced with a propyl group (Fig. 2). The N-propylated polymer was cast from an NMP solution on a glass plate to make a film. Even if the dried film was treated with hot water at 80 ° C. for 1 hour, the morphology of the film did not change, and when this was used as a measurement sample, the ionic conductivity at 80 ° C. and 95% RH was 0.00051 S / cm.
【0028】実施例2
実施例1において、ポリマー 300mg(6.63×10-4mol
e)、水素化リチウム21mg(2.64×10-3mole)、DMAc10m
l、プロパンサルトン3.23g(2.64×10-2mole)を用い、
N−プロピルスルホン酸化合物を得た。得られたポリマ
ーの対数粘度は0.57を示した。得られたポリマーの
IRスペクトルを図3に示す。H−NMRより、ポリマ
ー中イミダゾール環窒素上水素の90%がプロピルスル
ホン酸基に置換されていることがわかった。実施例1と
同様にして熱水処理してもフィルムの形態に変化はな
く、測定したイオン伝導度は0.06S/cmを示し
た。Example 2 In Example 1, 300 mg of polymer (6.63 × 10 −4 mol)
e), lithium hydride 21mg (2.64 × 10 -3 mole), DMAc10m
l, using propane sultone 3.23g (2.64 × 10 -2 mole),
An N-propyl sulfonic acid compound was obtained. The polymer obtained had an inherent viscosity of 0.57. The IR spectrum of the obtained polymer is shown in FIG. From 1 H-NMR, it was found that 90% of the hydrogen on the imidazole ring nitrogen in the polymer was replaced with a propyl sulfonic acid group. The film morphology did not change even when treated with hot water in the same manner as in Example 1, and the measured ionic conductivity was 0.06 S / cm.
【0029】比較例1
実施例1で重合したポリマーについて、N−置換反応を
せずにフィルムを作製し、実施例1と同様にイオン伝導
度を測定したところ、0.00019S/cmを示し
た。Comparative Example 1 With respect to the polymer polymerized in Example 1, a film was prepared without the N-substitution reaction, and the ionic conductivity was measured in the same manner as in Example 1. The result was 0.00019 S / cm. .
【0030】[0030]
【発明の効果】本発明により、耐熱性、機械特性など優
れた性質を持つ芳香環上にスルホン酸基を持つポリベン
ズイミダゾール系ポリマーのプロトン伝導性を高めるこ
とに成功し、燃料電池などの高分子電解質としてもきわ
だった性能を示す材料を提供することができる。Industrial Applicability According to the present invention, it has been possible to enhance the proton conductivity of a polybenzimidazole-based polymer having a sulfonic acid group on an aromatic ring, which has excellent properties such as heat resistance and mechanical properties. It is possible to provide a material exhibiting outstanding performance as a molecular electrolyte.
【図1】スルホン酸基含有ポリベンズイミダゾールポリ
マーをN−プロピル化した試料のIRスペクトル。FIG. 1 is an IR spectrum of a N-propylated sample of a polybenzimidazole polymer containing a sulfonic acid group.
【図2】スルホン酸基含有ポリベンズイミダゾールポリ
マーをN−プロピル化した試料のH−NMRスペクト
ル。FIG. 2 is an H-NMR spectrum of a sample obtained by N-propylating a sulfonic acid group-containing polybenzimidazole polymer.
【図3】スルホン酸基含有ポリベンズイミダゾールポリ
マーをN−プロピルスルホン酸化した試料のIRスペク
トル。FIG. 3 is an IR spectrum of a sample obtained by N-propylsulfonic acid oxidation of a polybenzimidazole polymer containing a sulfonic acid group.
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 FI テーマコート゛(参考) // C08L 79:04 C08L 79:04 A (72)発明者 陸川 政弘 横浜市神奈川区幸ケ谷9−11 Fターム(参考) 4F071 AA58 AA60 AA88 AF42 AH15 BC01 4J043 PA02 QB15 QB21 QB41 RA42 SA08 SB01 TA12 TA17 TA71 TA75 UA041 UA042 UA122 UA131 UB021 UB061 UB121 UB301 XA03 XA08 XB13 ZB14 ZB50 5G301 CA19 CD01 CE01 5H026 AA06 EE05 EE17 ─────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. 7 Identification code FI theme code (reference) // C08L 79:04 C08L 79:04 A (72) Inventor Masahiro Rikukawa 9-11 F, Kougatani, Kanagawa-ku, Yokohama Terms (reference) 4F071 AA58 AA60 AA88 AF42 AH15 BC01 4J043 PA02 QB15 QB21 QB41 RA42 SA08 SB01 TA12 TA17 TA71 TA75 UA041 UA042 UA122 UA131 UB021 UB061 UB121 UB301 XA03 XA08 XB13 A30115B01 Z0114B01 ZB14 ZB14 ZB14 ZB14 ZB14 ZB14 ZB14
Claims (5)
位からなる重合体を主成分とし、硫酸中で測定した対数
粘度が0.1以上であるとともに実質的に水に溶解しな
いことを特徴とするスルホン酸基含有ポリベンズイミダ
ゾール化合物。 【化1】 (式中、Xは−O−,−SO2−,−C(CH3)2−,
−C(CF3)2−,−OPhO−、直接結合から選ばれ
る。Arはスルホン酸基を0〜2個含む芳香族基から選
ばれ、平均値としてスルホン酸基はArあたり0.5個
以上含まれる。Rは水素、炭素数2〜12個の脂肪族、
芳香族、脂肪族/芳香族置換基および炭素数2〜12個
の脂肪族スルホン酸、芳香族スルホン酸、脂肪族/芳香
族スルホン酸置換基から選ばれる。)1. A polymer comprising a repeating unit represented by the following general formula (1) as a main component, having a logarithmic viscosity of 0.1 or more as measured in sulfuric acid and being substantially insoluble in water. A characteristic polybenzimidazole compound containing a sulfonic acid group. [Chemical 1] (In the formula, X is —O—, —SO 2 —, —C (CH 3 ) 2 —,
-C (CF 3) 2 -, - OPhO-, selected from a direct bond. Ar is selected from aromatic groups containing 0 to 2 sulfonic acid groups, and the average value of sulfonic acid groups is 0.5 or more per Ar. R is hydrogen, aliphatic having 2 to 12 carbon atoms,
It is selected from aromatic, aliphatic / aromatic substituents and aliphatic sulfonic acids having 2 to 12 carbon atoms, aromatic sulfonic acids, and aliphatic / aromatic sulfonic acid substituents. )
12個の脂肪族、芳香族、脂肪族/芳香族置換基から選
ばれることを特徴とするスルホン酸基含有ポリベンズイ
ミダゾール化合物。2. The method according to claim 1, wherein R is hydrogen and has 2 to 2 carbon atoms.
A polybenzimidazole compound containing a sulfonic acid group, which is selected from 12 aliphatic, aromatic and aliphatic / aromatic substituents.
12個の脂肪族スルホン酸、芳香族スルホン酸、脂肪族
/芳香族スルホン酸置換基から選ばれることを特徴とす
るスルホン酸基含有ポリベンズイミダゾール化合物。3. The hydrogen according to claim 1, wherein R is hydrogen and the carbon number is 2 to 2.
A polybenzimidazole compound containing a sulfonic acid group, which is selected from 12 aliphatic sulfonic acids, aromatic sulfonic acids, and aliphatic / aromatic sulfonic acid substituents.
物を主成分とすることを特徴とする成形物。4. A molded article comprising the compound according to any one of claims 1 to 3 as a main component.
物を主成分とすることを特徴とする膜。5. A film comprising the compound according to any one of claims 1 to 4 as a main component.
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