JP2003031465A - Light source apparatus and exposure system having the same - Google Patents

Abstract

PROBLEM TO BE SOLVED: To obtain a long-life and stable light source apparatus and an exposure system having the same by solving a problem of damage or control anomaly by the contamination in the shutter device of a light source unit in the light source apparatus integrated in the exposure system. SOLUTION: A driving motor for shutter blades of the shutter device in the light source unit and peripheries of the driving motor are isolated and are enclosed, and contaminants existing in the enclosed part are exhausted by using a cooling medium for cooling the motor, in the light source apparatus integrated in the exposure system.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a light source device and an exposure apparatus having the same, and more particularly to an exposure used when manufacturing semiconductor elements such as IC and LSI, liquid crystal display elements, thin film magnetic heads and the like in a photolithography process. In the device,
The present invention relates to a light source device using an exposure shutter suitable for controlling the light blocking / projecting state of light from a light source that emits radiated light in the ultraviolet region, and an exposure apparatus having the same.

[0002]

2. Description of the Related Art A semiconductor device, a liquid crystal display device, a thin film magnetic head, and the like are manufactured by utilizing a lithography technique. In a lithographic process, a pattern formed on the surface of an original plate called a mask or reticle (hereinafter, typically called a mask) is used as a photosensitive substrate such as a silicon wafer or a glass substrate (hereinafter, referred to as a resist) coated with a photosensitive material called a resist. (Typically called a wafer) by using a projection exposure apparatus. In the projection exposure apparatus, the original plate is irradiated with illumination light for exposing the resist, and the pattern on the original plate is exposed and transferred to the resist on the photosensitive substrate.

The projection exposure apparatus exposes the original plate and the photosensitive substrate by scanning them with a proximity exposure apparatus for exposing the original plate and the photosensitive substrate in close contact or close proximity with each other and a mirror reflection optical system. Mirror projection exposure device, step-and-repeat reduction projection exposure device (stepper) that sequentially exposes the reduced image of the original plate while sequentially moving each exposure region on the photosensitive substrate to the exposure region of the reduction projection optical system And so on. Furthermore, in recent years, a slit scan exposure method or a step-and-scan method (hereinafter referred to as a representative method) in which an exposure area having a rectangular shape, an arc shape, or a slit shape is used to perform scanning movement while synchronizing the mask and the wafer (Also called slit scan method) is also used.

In the exposure apparatus, the mask and the wafer are irradiated with illumination light from a light source such as a laser or a mercury lamp (hereinafter, referred to as a lamp) that generates a wavelength in the ultraviolet region to transfer the pattern. When no exposure is performed, the illumination light emitted from the light source is blocked by the shutter device to be in a light blocking state, and a state in which no extra exposure is performed is performed. Particularly, in an exposure apparatus such as a stepper, since the time during which the illumination light is not blocked by the shutter device, that is, the projection time is the exposure time of the mask and the wafer, the opening / closing time control of the shutter device is the exposure time or the exposure amount. It is an important component for control accuracy. Hitherto, in order to control the exposure time or the exposure amount more precisely, it has been required to increase the opening / closing speed of the shutter and reduce the cross-sectional area of the illumination light shielded by the shutter. Among them, the reliability of drive control of the motor that drives the shutter is the most important issue that affects the exposure amount accuracy.

In recent years, in order to improve the number of wafers that can be processed in an exposure apparatus per unit time (hereinafter referred to as throughput), the irradiation energy per unit exposure time tends to increase, and the output of a laser or a lamp that is a light source. Is getting bigger. If the output of the light source increases, the shutter device having a structure that blocks the light emitted from the light source is exposed to high energy irradiation, and high energy resistance is required.

Therefore, the shutter device drives the shutter blades at a high speed, so that it is required to reduce the weight and thickness of the material and to reduce the outer dimensions.

The downsizing of the shutter inevitably increases the concentration of the illumination light emitted to the surface of the shutter blade. Further, since the energy emitted from the light source is also high, the degree of energy concentration per unit area of the shutter is high, and the shutter material is also required to have high yield strength.

FIG. 9 shows the structure of a shutter device used in the exposure apparatus disclosed in Japanese Patent Laid-Open No. 9-27446. In the figure, the light source 1 is arranged near the first focus of the elliptical focusing mirror 2. The illumination light emitted from the light source 1 is reflected by the elliptical focusing mirror 2, once condensed near the second focus of the elliptical focusing mirror 2, and then diverged again to be transmitted to an illumination optical system (not shown). Has become.

FIG. 7 shows a shutter device. The shutter blades 4 are formed by polishing the surface of a metal plate having a thickness of 1 mm or less and polishing it so that a high reflectance is selected, and are rotated by a motor 5. The shutter blade 4 has a light-shielding portion and a light-projecting portion 2 to 4 in the rotation direction.
The shape is divided and arranged. When the shutter blade 4 is inserted in the vicinity of the second focus of the elliptical focusing mirror 2 and rotated by the power of the motor 5, the illumination light is repeatedly projected and blocked in conjunction with the rotation angle.

[0010]

However, according to the experiments conducted by the present inventors, it was confirmed that in the conventional shutter device, the motor 5 for driving the shutter blades has a control abnormality due to environmental factors. It is an object of the present invention to provide a light source device that copes with a newly discovered abnormality due to the environmental factor and an exposure apparatus using the same.

In order to clarify the problem of the present invention, a motor for driving the shutter blade will be described. FIG. 3 is an explanatory diagram of a mechanism of motor control abnormality. According to the analysis of the inventor, the control abnormality causes the contaminant 96 such as a silicon compound existing around the motor or inside the motor to be deposited on the surface of the commutator 95 inside the motor, thereby causing a contact failure between the commutator 95 and the brush 93. , It was found that the control signal of the motor is abnormal.

On the other hand, as described above, it is important that the shutter blade 4 is lightweight. The shutter blade is made of, for example, an aluminum plate having a thickness of 1 mm or less. The aluminum plate is polished to increase the reflectance of the surface, and a protective film is applied for the purpose of increasing reflectance and preventing oxidation. . However, since the surface reflectance does not reach 100%, a part of the energy on the light source side is converted into heat and the shutter blades 4
Stored in. Conventionally, the shutter blade 4 is deformed due to an increase in energy on the side of the light source 1 or the degree of converging illumination light on the shutter blade 4, and finally a part of the shutter blade is melted or damaged, There is a drawback that an accident occurs that the function as the shutter device is not fulfilled.

According to the analysis by the present inventors, the following contents are confirmed as a typical process (hereinafter referred to as a damage process) in which the shutter blades 4 are damaged in the conventional shutter device as described above. ing. The description will be given according to the solid line in FIG. Absorption of light energy on the shutter surface.

B. Absorption of heat energy of the shutter by heat transfer from the environment around the shutter (gas in the peripheral area, motor for driving the shutter, shutter holding parts, etc.).

C. Thermal energy absorption of the shutter by direct and indirect radiation from the light source lamp.

Second stage d. Above a. ~ C. Temperature rise on the shutter surface due to.

Third stage e. Above a. ~ D. Deterioration of the shutter surface due to (deposition of impurities from inside the shutter, oxidation due to reaction with outside air, etc.).

Fourth stage f. The above e. As a result, the reflectance of the shutter surface (light irradiation side: mirror surface) decreases.

Fifth stage g. The above f. Increased absorption of light energy on the shutter surface.

Sixth stage h. Above g. The temperature rises locally and suddenly on the shutter surface.

Seventh stage i. Above h. Deformation / melting of the shutter temperature rise part due to
Corruption. Is going through the process.

Of course, conventionally, various measures have been taken to prevent the heat generation and damage of the motor 5 and the shutter blade 4 described above. For example, in the shutter device for the exposure device according to Japanese Patent Laid-Open No. 9-27446 described above, the d. In order to suppress the temperature rise of the shutter surface described in (1), a configuration is shown in which a gas whose temperature is controlled by the blower 64 is blown to cool. Further, the above f. In order to suppress the decrease in reflectance described in ( ¹ ), the blowing gas is arranged to supply air filtered by a chemical filter (not shown), and ammonium ions (NH ₄ ⁺ ) and sulfuric acid present in the air are added. The structure is such that ions (SO ₄ ²⁻ ) and the like (hereinafter, referred to as pollutants) are removed and sprayed on the shutter surface, which cause the generation of cloud.

However, in the case of Japanese Unexamined Patent Publication No. 9-27446, the cooling air is merely kept in a chemically clean state, and for example, contaminants discharged from the shutter blade drive motor 5 and the drive mechanism portion. The effect of pollution prevention cannot be expected.

The present invention has been made in view of the disadvantages associated with the related art. First, a first invention is a light source device capable of removing contaminants from the periphery of the motor 5 by a cooling medium for cooling the drive motor 5 of the shutter blades 4 to prevent malfunction of the motor, and an exposure apparatus including the same. The purpose is to provide the device.

Further, the second invention is a light source capable of preventing contaminants generated from the motor 5 and the drive mechanism from diffusing to the shutter blade 4 side, extending the life of the shutter blade 4 and enduring long-term use. An object of the present invention is to provide an apparatus and an exposure apparatus having the apparatus.

[0026]

In order to solve the above-mentioned problems, the first invention according to the present application, as shown in FIG. 1, includes a motor 5 for driving a shutter and a drive shaft 85, a motor light shielding cover and a motor light shielding cover, respectively. 83 and the motor shaft cover 84 isolates the motor 5 from the surrounding environment and prevents the illumination light emitted from the light source 1 from irradiating the motor 5 with respect to the motor light-shielding cover 83 and the motor shaft cover 84. Then, the introduction pipe 81 and the connection pipe 82 are connected from the outside of the cover to provide a chemically clean cooling air 1.
02 is introduced into the cover to insert the motor 5 and the motor shaft 8
It is characterized in that the periphery of the motor 5 is always kept in a chemically clean state. The cooling air 102 not only cools the motor 5, but also pollutants existing around the motor and the drive of the motor 5 and the motor shaft 85. It is possible to obtain the effect of pushing out the generated pollutant to the outside of the cover and the effect of preventing the contaminant from entering from the outside of the cover.

Therefore, the periphery of the motor 5 can always be kept in a chemically clean state, and it is possible to prevent contaminants from depositing inside the motor 5 and causing a control abnormality. On the other hand, in the first aspect of the invention, as shown in FIG. 1, the cooling air 102 supplied to the periphery of the motor shaft 85 is discharged to the periphery of the shutter blades 4 through the gap between the motor shaft 85 and the motor shaft cover 84. However, in the second invention according to the present application, the cooling air 102 around the motor 5 and around the motor shaft 85 is formed with a path through which the exhaust pipe 106 and the connecting pipe 82 discharge the air to the outside. Since the exhaust gas from the periphery of the motor 5 is discharged to the outside without being discharged to the periphery of the shutter blade 4, the shutter blade 4 is secondarily contaminated by the pollutants contained in the exhaust gas. It is possible to prevent the occurrence of so-called "cloudy weather".

[0028]

BEST MODE FOR CARRYING OUT THE INVENTION Embodiment 1 of the present invention will be described below with reference to the drawings.

FIG. 5 shows the configuration of a slit scan type projection exposure apparatus equipped with an exposure shutter section and a light source device including the shutter section according to the present invention. In the figure, illumination light (exposure light) diffused radially from a lamp 1 which is a light source is applied to a condenser mirror 2 having a reflecting surface whose inner surface is a part of an elliptical surface. Light emitted radially from the first focal point of the elliptical mirror 2 has a characteristic of being condensed at the second focal point when reflected on the inner surface. Therefore, lamp 1
When the bright spots (light emitting points) are arranged so as to coincide with the first focal point of the condenser mirror 2, the illumination light radially diffused from the lamp 1 is condensed at the second focal point.

The lamp 1 is fixed on a lamp stage (not shown) and can move relative to the condenser mirror 2. A lamp identification means (not shown) installed in the lamp stage identifies the type of the lamp, and the exposure amount control system 44 adjusts the power supplied from the power supply 43 to the lamp 1 according to the identified type.

For the illumination light condensed by the condenser mirror 2 at the second focal position of the mirror, the shutter blade 4 which is opened and closed by the shutter drive mechanism 5 is arranged in the vicinity of the condensing point. Control the passage of. When the shutter blades 4 are open, the illumination light is converted into a substantially parallel light flux via the optical path changing mirror 3 and the collimator lens 6. Only the exposure wavelength of the converted light is selectively transmitted by the bandpass filter 48, passes through the field stop 7, and then enters the optical integrator 9 through the first relay lens 8. Optical integrator 9
The illumination light emitted from the light source passes through the light amount diaphragm 10, the second relay lens 12, the optical integrators 14a and 14b, the illumination system aperture diaphragm 16, and the half mirror 3.
The optical path is branched at 7.

The half mirror 37 is coated with a semi-transmissive film having a transmittance of 95% or more. Most of the illumination light is transmitted, but some light is reflected and the lens 4
Through 0, the light is condensed on the projection amount detection sensor 41, and the output state of the light source 1 is measured. The output of the light source 1 detected by the sensor 41 is transmitted to the exposure amount control system 44, and the output of the power supply 43 that supplies power to the light source 1 is controlled to adjust the intensity of the illumination light to a desired value. Is done.

The illumination light transmitted through the half mirror 37 is the third
After passing through the relay lens 42, the shape of the illumination area is adjusted by the masking blind 34 arranged on the Fourier transform plane of the optical integrator 14. Also,
An exposure unevenness adjusting blind 32 arranged near the masking blind 34 adjusts the illuminance unevenness of the illumination light and projects the illumination light onto the mask 23 via the fourth relay lens 35, the collimator lens 36 and the reflection mirror 11. . The illumination light transmitted through the mask 23 passes through the projection lens 22 and reaches the wafer 25. According to the above procedure, the mask 23
The pattern formed by chrome on the wafer 25
The image is transferred onto the image.

Since the wafer 25 is placed on the stage 26, it can be moved within the image plane of the mask 23. An image illuminance meter 27 is installed on the same plane as the wafer 25, and the intensity distribution of the illumination light within the exposure range of the projection lens 22 can be measured.

In the above structure, the light amount of the exposure light supplied onto the wafer 25, that is, the mask 23 is determined by the opening / closing time of the shutter blade 4, so that the photosensitive state of the photosensitive agent applied on the wafer 25 is The drive control accuracy of the shutter blades 4 is greatly influenced.

FIG. 4 shows the drive control state of the shutter blades 4. The opening / closing control of the shutter blades is described in detail, for example, in Japanese Patent Laid-Open No. 06-120103. Although detailed description is omitted, FIG. 4- (A) shows changes in the opening area of the shutter blades 4 with respect to time on the horizontal axis. The exposure amount on the wafer 25 is the area of the shaded area in the figure. expressed. The energization state of the motor 5 that drives the shutter blades 4 at this time is shown by a waveform 91 in FIG. However, as shown in FIG. 3, when the deposit 96 found in the present invention is deposited on the surface of the commutator 95 inside the motor, a time period during which the commutator 95 and the brush 93 cannot be energized occurs. Fig. 4-
As shown in (C), since the waveform 91 is read while including the valley 92, an error occurs between the rotation state of the motor and the output signal, and correct shutter control becomes impossible.

As a result of analysis by the inventor, the commutator 95
A commutator 95 and a brush 93 are included in the components of the upper deposit 96.
It was found that, in addition to the compositional substances described in 1 above, there are substances mainly containing silicon compounds. That is, the environment around the shutter and
The silicon compound existing in the environment around the motor is deposited on the commutator 95 inside the motor. Since the silicon compound is a substance that normally exists as a material such as a sealing agent and a lubricant in the periphery of the exposure apparatus and inside the motor, it is necessary to remove the silicon compound from the periphery of the motor 5 by a forced exhaust means. The fact that the motor itself and the periphery of the motor are pollution sources is a new finding according to the present invention.

As shown in FIG. 1, the light source device according to the present invention covers the periphery of the motor with a motor light-shielding cover 83 having a light-shielding property, and introduces the introduction pipe 81 from the outside of the motor light-shielding cover 83.
It is characterized in that the motor cooling air 102 is taken in by. Further, in the present invention, as the motor cooling air 102,
For example, clean dry air or an inert gas such as N ₂ gas is pressurized and blown as a chemically clean cooling medium, and the inside of the motor light-shielding cover 83 is made to have a positive pressure and a positive pressure so that contaminants existing around the motor 5 are present. It is characterized by pushing out.

Further, in FIG. 1, the periphery of the motor shaft 85 connecting the motor 5 and the shutter blades 4 is also covered with the motor shaft cover 8.
4 and the connection pipe 82 introduces a chemically clean cooling medium from the outside similarly to the above-mentioned motor portion, so that contaminants around the motor shaft 85 are also discharged to the outside. Also, similarly, the motor shaft cover 8
It is also possible to push out the contaminants existing around the shutter blades 4 by making the inside of 4 a positive pressure.

Since the cooling medium originally has the purpose of cooling the heat generating portion of the motor 5, the temperature control is performed regardless of the type of the cooling medium, and the cooling medium has a sufficient cooling capacity according to the output of the motor. It goes without saying that the flow rate is set.

Further, generally, the shutter blades 4 and the motor 5 are arranged in the optical path as shown in the conventional example of FIG. Therefore, when the shutter blades 4 are closed, the scattered light of the illumination light reflected by the shutter blades 4 is transferred to the motor 5
When it hits the motor shaft 85 or the radiant heat, the temperature of the motor 5 further rises. In the light source device according to the present invention, since the periphery of the motor 5 is covered with the motor light shielding cover 83 having a light shielding property, it is possible to avoid a direct temperature rise of the motor 5 due to the scattered light. Further, since a heat insulating layer by the cooling air 102 is also formed between the motor 5 and the motor light shielding cover 83, even if the temperature of the motor light shielding cover 83 rises due to radiation, the heat conducted to the motor 5 is suppressed to a small level. be able to.

As described above, in the first embodiment, the outer portion adjacent to the motor 5 for driving the shutter is covered by the motor light-shielding cover 83, and the covered portion is introduced from the outside with the introduction pipe 8
1, the cooling air 102 is drawn in to push out contaminants around the motor 5 to the outside of the motor light-shielding cover 83, and prevent contaminants from being deposited inside the motor 5. Further, in the first embodiment, the motor shaft 8 that drives the shutter
5 is also included in the motor shaft cover 84 having a light-shielding property to be isolated from the surrounding environment, and the connecting pipe 82 is connected to the motor shaft cover 84 from outside the cover to introduce the chemically clean cooling air 102 into the cover. Motor shaft 85
The feature is that the periphery is always kept in a chemically clean state.

The cooling air 102 not only cools the motor 5, but also has the effect of pushing out the contaminants existing around the motor and the contaminants generated by the driving of the motor 5 and the motor shaft 85 to the outside of the cover and the contamination from the outside of the cover. It also has the effect of preventing the entry of substances. Therefore,
It is possible to keep the area around the motor 5 in a chemical clean state at all times, and it is possible to prevent the occurrence of control abnormality that occurs when contaminants are deposited inside the motor 5.

FIG. 2 shows a second embodiment of the present invention, in which not only the introduction path to the cooling air but also the exhaust path 10 is provided.
5 is provided.

In the first embodiment, the deposition of the pollutants inside the motor was focused on and its prevention was explained, but in reality, so-called "cloudy weather" occurs not only on the motor 5 but also on the surface of the shutter blades 4, and finally There is also an accident in which the shutter blade 4 is melted and destroyed. The second embodiment is characterized in that the cooling air 102 around the motor 5 and the motor shaft 85 is provided with an exhaust pipe 106 and a connecting pipe 82 to form a path for being discharged to the outside, and forcibly exhausted.

Various proposals have already been made regarding the melting and destruction accident of the shutter blades, and Japanese Patent Application Laid-Open No. 09-02744 discloses the same.
The prior art can be found in Japanese Patent Laid-Open No. 6 and Japanese Patent Laid-Open No. 11-197343.

In Japanese Unexamined Patent Publication No. 09-027446, the shutter blades 4 and the motor 5 are collectively included in a chemically clean cooling medium. However, the drive unit and the drive transmission unit of the motor 5 often include a contaminant source such as a lubricant, and dust is also generated from the drive unit itself. Therefore, taking the shutter unit into consideration, it is desirable that both the shutter blades 4 and the motor 5 are arranged to be isolated from contaminants in the light source device used in the exposure apparatus. By further separating the shutter blades 4 and the motor 5 into separate spaces by the motor shaft cover 84 and ensuring a suction / exhaust path for the cooling medium in each space so as not to contaminate each other, A good light source device can be realized.

In the first embodiment, as shown in FIG. 1, the cooling air 102 supplied to the periphery of the motor shaft 85 is also discharged to the periphery of the shutter blades 4 through the gap between the motor shaft 85 and the motor shaft cover 84. There is. On the other hand, the second embodiment
Is the cooling air 102 around the motor 5 and around the motor shaft 85.
Is characterized in that an exhaust pipe 106 and a connection pipe 82 are provided respectively, and a path for discharging to the outside is formed. Since the exhaust gas from the peripheral part of the motor 5 is discharged to the outside without being discharged to the periphery of the shutter blade 4, the shutter blade 4 is secondarily contaminated by contaminants contained in the exhaust gas, so-called "cloudy". Can be prevented. Further, in order to prevent the temperature of the motor 5 from rising, the cover is made to have a light shielding property as in the first embodiment.

FIG. 8 shows the third embodiment of the present invention, in which the shutter blades and the driving means for the shutter blades are spatially separated by a partition wall, and the driving means is forcibly cooled. FIG. 5 is a diagram showing a configuration in which the motor 5 is individually cooled after the shutter 5 is arranged outside the space where the shutter blades 4 exist. In the figure, a motor 5 and a shutter blade 4
The regions are completely separated by a partition wall, and both are individually cooled by a chemically clean cooling medium. Further, in the configuration shown in FIG. 8, the shutter blade 4 can be directly cooled from the light incident side, and the occurrence of clouding can be suppressed more effectively. It is also the same as the previous embodiment that the temperature rise of the motor can be suppressed by making the partition wall light-shielding against the exposure light.

In the above description and illustration, the cooling air 102 is blown to the outer surface of the motor 5, but generally the motor 5 is isolated around the commutator 95 and the brush 93 shown in FIG. There is a cover member (not shown) that serves as a wall. The motor light-shielding cover 83 according to the present invention can be replaced by the cover member, and a special cover is not necessarily used.

In the description of the exposure apparatus of the present invention, the slit scan method is taken as an example, but the present invention can be applied to other exposure methods such as a stepper and a mirror projection method. is there.

[0052]

As described above, in the light source device of the present invention, the cooling for cooling the drive motor 5 of the shutter blades 4 is carried out in order to solve the damage or the control abnormality problem due to the contamination of the shutter device portion in the light source device. It is possible to prevent malfunction of the motor by removing contaminants from the periphery of the motor 5 by using the medium. Further, the reliability can be significantly improved by adopting a configuration in which contaminants from the drive section of the motor itself or the transmission section of the motor drive do not reach the motor and the shutter blade section.

Further, according to the present invention, the shutter blade 4 is spatially independently separated from the motor 5 to perform clean cooling, so that the contaminants generated from the motor 5 and the drive mechanism portion are diffused to the shutter blade 4 side. Can be prevented,
The service life of the shutter blades 4 is extended, and it is possible to supply a light source device that can withstand long-term use.

By applying the light source device of the present invention to an exposure apparatus, it is possible to provide a highly reliable and stable exposure apparatus, and it is possible to improve productivity.

[Brief description of drawings]

FIG. 1 is an explanatory diagram of a shutter portion structure of a light source device according to a first embodiment of the present invention,

FIG. 2 is an explanatory diagram of a shutter portion structure of the light source device according to the second embodiment of the invention,

FIG. 3 is an explanatory diagram of a structure of a shutter drive motor,

FIG. 4 is an explanatory diagram of a motor control signal,

FIG. 5 is an explanatory diagram of a structure of an exposure apparatus to which an embodiment of the present invention is applied,

FIG. 6 is an explanatory diagram of changes over time of shutter blades,

FIG. 7 is an explanatory diagram of a shutter blade shape,

FIG. 8 is an explanatory diagram of a light source device according to a third embodiment of the present invention,

FIG. 9 is an explanatory diagram of a configuration of a conventional exposure shutter.

[Explanation of symbols]

1 light source 2 elliptical mirror 4 shutter blades 5 Shutter drive motor 81 Introduction tube 82 Connection pipe 83 Motor light shield cover 84 Motor shaft cover 85 motor shaft 93 brush 95 commutator 96 precipitate 101 shutter blade cooling air 102 cooling air 105 exhaust 106 Exhaust pipe

Claims (4)

[Claims] 1. An optical path of illumination light emitted from a light source,
A light source device for controlling illumination light blocking / projecting by inserting / retracting shutter blades, wherein the shutter blade driving means is surrounded by a light blocking means, and the illumination light is applied to the driving means. To prevent
The light source device further comprising introduction means for introducing a chemically clean refrigerant into the space formed by the light shielding means. 2. The light source device according to claim 1, further comprising exhaust means for collecting exhaust gas discharged from the inside of the isolation wall. 3. The light source device according to claim 1, wherein the inside of the space in which the light shielding means is formed has a positive pressure more than the surroundings. 4. An exposure apparatus using the light source device according to claim 1.