JP2002356337A - Method for producing aluminum and / or yttrium-containing composite quartz glass by plasma melting and use thereof - Google Patents

Abstract

(57) [Summary] (Modifications required) [PROBLEMS] Not only do there be few chemical reactions due to little impurities, but also excellent in impact resistance and strength even under high density plasma, no corrosion even during repeated use, and high temperature. The present invention provides a method for producing quartz glass having excellent viscosity in the above, and a component for an apparatus utilizing a halide gas made of quartz glass and its plasma. The angle and position of a plasma anode torch 24 and a plasma cathode torch 26 are adjusted while rotating a melting vessel 18 at a predetermined speed, and a silica powder containing aluminum and / or yttrium is provided at the center of the furnace bottom. The raw material is dropped via the plasma arc coupling zone,
Create a small fused aluminum and / or yttrium-containing composite quartz glass. Thereafter, by continuously performing melt lamination while expanding the melt area, an aluminum and / or yttrium-containing composite quartz glass ingot in which aluminum and / or yttrium is uniformly dispersed is manufactured.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for producing a composite quartz glass and its use, and more particularly, a method in which a fine powder containing aluminum and / or yttrium is added to a siliceous raw material powder such as quartz powder in order to impart various functions. The present invention relates to a manufacturing method for melting, and a plasma-resistant component used in a semiconductor manufacturing apparatus, a liquid crystal manufacturing apparatus, and the like manufactured using a composite quartz glass obtained by the method.

[0002]

2. Description of the Related Art Semiconductor devices such as LSIs are cleaned,
It is manufactured by repeatedly using respective devices such as heat treatment, lithography, dry etching, ion implantation, CVD, and sputtering. In such semiconductor manufacturing equipment,
Quartz glass has been used more widely than before because it has such excellent properties as high purity, heat resistance, and easy processability.
Particularly in recent years, CVs in semiconductor manufacturing equipment, liquid crystal manufacturing equipment, etc.
In the D processing step, the etching processing step, the resist processing step, etc., apparatuses using plasma such as a halide gas have come to be used frequently, and are excellent in high-frequency transmission, vacuum tightness, and low dielectric constant. Quartz glass, which is also excellent in impact resistance at high heat, is used as a member for an apparatus. However, as the frequency of use of plasma increases, resistance to corrosion by plasma gas has been required more. Especially for fluorine-based plasma, fluorine radicals cause Si in quartz glass to become Si
It has been known that it is consumed in the form of F4, and in particular, in the oxide film etching step, the consumption of quartz glass particularly in high-density plasma etching is conspicuous, leading to an increase in manufacturing cost.

Further, high-purity opaque quartz glass is used for heat-producing device members such as a flange of a semiconductor manufacturing device because of its heat-insulating properties. Opaque quartz glass is made of high-purity transparent quartz glass. A method of forming fine bubbles by adding a foaming agent or the like to make the glass opaque is generally used. However, since the quartz glass has bubbles, there is a problem in the surface state after processing. Therefore, there is a problem in properties such as sealing properties, viscosity, and impact resistance of plasma etching gas at the time of high heat, and transparent quartz glass is used as such a material.

[0004]

In the semiconductor manufacturing process, the movement to high-speed production using high-density plasma has been activated in order to improve productivity. In this high-density plasma environment, in addition to the conventional properties of quartz glass, which has few impurities and does not chemically react, it also has excellent impact resistance and strength even under high-density plasma, and may cause corrosion even during repeated use. There is a demand for a quartz glass that is free from defects and has excellent viscosity at high temperatures.

The present application provides a method for producing quartz glass having these various functions, and also provides a halide gas produced from the quartz glass produced by the production method and a component for an apparatus utilizing the plasma thereof. The purpose is to do.

[0006]

Means for Solving the Problems As a result of intensive studies, the present inventors have found that a substance containing aluminum and / or yttrium is added to a siliceous raw material powder, and at least two or more mixed powders containing aluminum and / or yttrium are added. The electrodes are of opposite polarity and pass through or near the plasma arc coupling zone where at least two plasma arcs are coupled, and by melting, aluminum and / or yttrium segregation and fine bubbles and The present inventors have found an efficient method for producing an aluminum and / or yttrium-containing composite quartz glass which does not contain impurities or the like and therefore does not need to eliminate such defective portions, and has completed the present invention.

That is, silica powder containing aluminum and / or yttrium is dropped and laminated on the center or end of a rotatable target or container which can be raised and lowered, and is melted by arc plasma to uniformly disperse aluminum and / or yttrium. It is possible to produce a composite quartz glass ingot containing aluminum and / or yttrium.

The addition amount of the aluminum and / or yttrium-containing powder is 0.01 to 2% by weight, preferably 0.03 to 1.93% by weight, and the average particle size of the aluminum and / or yttrium-containing powder Is 0.1
It has been found that it is effective to set the thickness to 300 μm, preferably 1 to 80 μm.

If the addition amount of the aluminum and / or yttrium-containing powder is less than 0.01% by weight, there is no significant difference in plasma durability from the conventional product, and if it exceeds 2% by weight, the composite quartz glass product becomes opaque. In addition, the surface properties deteriorate, causing problems in impact resistance and strength. In order to improve the durability against plasma and obtain a material having excellent impact resistance and strength without losing the mechanical properties of quartz glass, 0.03 to 1.93 weight of aluminum and / or yttrium-containing powder is used. % Is more desirable.

The average particle size of metallic aluminum or yttrium powder, or alumina or yttria powder is 10 to 300 μm, which is slightly finer than the optimal particle size of 70 to 500 μm in plasma melting of siliceous raw material powder.
m, preferably 30 to 80 μm, uniformly mixed with a pot mill or the like, and / or granulated with a spray drier or the like and mixed with silica powder, or by using these methods together, It is more desirable to uniformly disperse and melt into quartz glass in the plasma coupling zone.

[0011] In addition to adding and mixing powder such as aluminum and / or yttrium to the siliceous raw material powder,
The siliceous raw material powder is immersed in a solution of aluminum and / or yttrium compound, such as aluminum and / or yttrium chloride, nitrate and sulfate, to spread aluminum and / or yttrium sufficiently around the silica particles. Then, it may be used as an aluminum and / or yttrium-added mixed powder that is heated and dried to dryness.

As the siliceous raw material powder, silica sand powder, quartz powder,
One of a high-purity silicon oxide source such as α-quartz or cristobalite or a mixture thereof can be used. The optimal particle size of such silica-based particles is 70 to
Preferably it is 500 μm.

[0013] The present inventors also disclose that at least two plasma electrodes are symmetrically arranged, and the two plasma electrodes are inclined with respect to the vertical such that the tips of the two plasma electrodes are narrowed. And / or the distance from the plasma coupling zone to the location where the molten product is collected can be controlled to control the transparent or opaque light transmission performance.

That is, by adjusting the distance between the plasma anode torch and the plasma cathode torch, or the distance between the adjusted torch position and the molten aluminum and / or yttrium-containing composite quartz glass, aluminum and torch are adjusted. And / or the production of yttrium-containing composite opaque quartz glass was made possible.

At least two plasma electrodes of opposite polarity arranged symmetrically, one electrode acting as a cathode and the other electrode acting as an anode, both electrodes being vertically In contrast, the electrodes are inclined at an angle of 45 to 65 degrees, and the distance between the tip ends of both the inclined electrodes is 1
Obtaining an opaque deposited molten product can be achieved by keeping the distance within 100 mm and / or by keeping the distance from the beginning of the plasma coupling zone to the location where the molten product is collected within 100 mm. it can.
The opaque aluminum and / or yttrium-containing composite quartz glass thus produced is not made opaque by foaming with a foaming agent unlike conventional opaque quartz glass, and therefore has excellent surface properties and is used as a flange material. Even if it does, the homogeneity of the surface state after processing is maintained to improve the sealing property, and the plasma durability is also excellent, so that it is suitable as a material for plasma even in places where use was conventionally refrained.

The solid or vaporous substance melted and produced by the plasma arc is collected on a target which is rotatable about a vertical axis and / or movable in a vertical direction, thereby forming a shell-shaped, elongated aluminum and / or aluminum. Yttrium-containing composite quartz glass ingots can be manufactured.

The solid or vaporous substance melted and produced by the plasma arc is collected and laminated at the center of the rotating melting vessel, and is further heated and melted and extended in the outer peripheral direction of the vessel to form a large vessel. It is possible to produce aluminum and / or yttrium-containing composite quartz glass ingots of any suitable shape.

Then, using the aluminum and / or yttrium-containing composite quartz glass member produced as described above, it is manufactured as various parts of a required plasma reaction process, for example, for a high-density halide gas and an apparatus utilizing the plasma. It can be used as a highly durable part.

[0019]

DESCRIPTION OF THE PREFERRED EMBODIMENTS <Embodiment 1> In FIG. 1, a hopper 1 is provided so that metal aluminum and / or yttrium particles having an average particle size of 5 μm are contained in a quartz powder having an average particle size of 100 μm at 1.93% by weight. Filled with added and mixed silica powder raw material containing aluminum and / or yttrium. The hopper 1 is connected by a supply device 2 whereby the feed material passes through the supply device to the funnel. Next, the feed material was a quartz glass tube 3
And 4 downwardly via or near the plasma arc coupling zone 5.

The plasma arc is generated by a plasma anode torch 6 and a plasma cathode torch 7. The plasma anode torch 6 comprises an electrode terminating with a non-consumable rounded end, conditioned from copper or other non-consumable metal. Below zone 5, the silica powder feed containing aluminum and / or yttrium is melted by the heat generated by the plasma arc. Disposed below the plasma arc zone 5 is a target 8, which is rotatable by a drive 9 about a vertical axis. The target 8 is connected to a spindle 10 which is in turn connected to a lifting mechanism 11 so that the target 8 can be raised and lowered as desired.

The support legs are provided for stabilizing the target raising and lowering mechanism. Typically, the target will be located about 1 to 20 cm below the plasma arc coupling zone. The angle between anode torch 6 and cathode torch 7 is generally in the range of 80 ° to 130 °, and the anode and cathode torches are aligned with each other. These torches can be positioned by raising them or lowering them or by changing their angular position.

The anode torch 6 and the cathode torch 7 are arranged symmetrically and are usually inclined at the above-mentioned angle with respect to the vertical, but depending on the angle of inclination and / or from the plasma coupling zone, the molten product is removed. The transparent or opaque light transmission performance can be controlled by the distance to the collecting position.

At least two plasma electrodes of opposite polarity arranged symmetrically, one electrode acting as a cathode and the other electrode acting as an anode, both electrodes being vertically 45 to 65 degrees or between both electrodes at an angle of 80 to 130 degrees, and maintaining the distance between the tips of the two inclined electrodes within 100 mm, and / or plasma coupling. By keeping the distance from the beginning of the zone to the location where the molten product is collected within 100 mm, it is possible to obtain an opaque deposited molten product. Therefore, it is positioned at a predetermined position according to a transparent object, a translucent object, an opaque object, or the like and other manufacturing purposes, and is arranged.

The position of the supply tube can also be changed left and right and up and down. Growing aluminum and / or
Alternatively, the target 8 is rotated with respect to the yttrium-containing composite quartz glass ingot at a speed of 1 to 60 rotations / minute. As shown in FIG.
The material flowing out of the quartz glass tube supply means 4 shown in FIG. 1 enters the area or passes near the area, but is generated by the plasma arc 14 generated by the plasma torch 6 and the plasma torch 7. The plasma arc 15 couples. The silica material containing aluminum and / or fine yttrium powder then continues to move downward and hits the rotating target 8. A composite quartz glass ingot 16 containing aluminum and / or yttrium is formed on the target 8 as shown in the sketch form of FIG.

When the composite quartz glass ingot 16 containing aluminum and / or yttrium is grown, plasma arcs 14 and 15 are constantly generated in the zone.
Or couple to the top surface of the yttrium-containing composite quartz glass ingot. The target 8 is moved downward by a mechanism as shown in FIG. 1 so as to maintain the coupling distance because it is continuously supplied. The moving speed of the target 8 is 0.1 to 5 cm / min.

The current to the plasma arc torches 6 and 7 ranges from 100 to 600 amps at 50 to 250 volts. The argon gas flowing through both the anode plasma torch 6 and the cathode plasm torch 7 is desirably in the range of 10 to 60 l / min.
The supply rate of the raw material containing the aluminum and / or yttrium fine powder is suitably in the range of 0.5 to 20 kg / hour.

Referring to FIG. 3, a plasma anode torch for use in the present invention is shown enlarged. The anode torch has an electrode 20 terminating with a non-consumable rounded end, which is conditioned from copper or a non-consumable metal. Electrode 20 has a concentric tube 21 formed therein. End of tube 21 and arrow 22
The cooling water passes downwardly through the space between the tip of the electrode 20 and the inner surface in the direction as indicated by. The plasma gas flows around the tip of the electrode in the direction of arrow 23, and a plasma arc is generated at 24 which then emanates from a nozzle 25 of the plasma arc torch. The nozzle assembly 27 is water-cooled and thus functions to confine the plasma gas around the electrode 20. Nozzle 25 is electrically isolated from electrode assembly 28 by insulator 29. The rounded ends provide a widely built arc route, high current carrying capacity, and very long component life, and very little wear, and thus the product stream or product aluminum and And / or a structure that suppresses minute contamination of the yttrium-containing composite quartz glass ingot.

FIG. 4 is an enlarged view of the plasma cathode torch. The plasma cathode torch has an inner passage 3 formed so as to surround the cathode electrode 34.
Argon gas is caused to flow from the torch nozzle by flowing an argon gas from the torch nozzle 6a, and a small hole 38 which is radially arranged at the tip of the torch nozzle and communicates with the outer passage 36b and has an angle converged at the nozzle center is supplied to the argon gas. A nitrogen gas of about 50% was ejected, and the nitrogen gas was ionized by an argon arc to generate an argon-nitrogen plasma. With this method, a high-efficiency plasma arc is obtained, and at the same time, the tungsten of the electrode material generates an argon arc without directly contacting nitrogen gas, so that a chemical reaction with nitrogen does not occur and the life of the cathode electrode is extended. Further, a water injection port 42a and a drain port 40b for cooling the outside of the nozzle and a water injection port 42a and a drain port 42b for cooling the inside of the electrode are provided, and radiant heat from the plasma arc is cut off by circulating cooling water.

By making full use of these plasma arc torches,
By using arc plasma with stable directionality, it is possible to maximize the high energy of the plasma to increase the productivity efficiency, and to prevent the contamination of the plasma electrode material etc. with high-purity aluminum and / or Alternatively, it has become possible to produce a yttrium-containing composite quartz glass ingot.

From the two kinds of transparent and opaque aluminum and / or yttrium-containing quartz glass ingots produced in this way, 50 mm square plates were cut out and mirror-polished to obtain test pieces. This was subjected to plasma etching in a mixed gas of CF ₄ / O ₂ in a parallel plate type plasma etching apparatus. Observation of changes in the surface condition of the test piece before and after plasma etching showed no wear such as surface steps caused by etching, which had occurred in the past, and all showed improved durability against plasma compared to conventional products It was recognized that it was. In terms of strength, the opaque product was not inferior to the transparent product, and no decrease in strength was observed after plasma etching. <Embodiment 1> Another embodiment will be described with reference to FIG. As shown in FIG. 5, a silica powder material containing aluminum and / or yttrium is dropped and laminated at the center of the rotating furnace bottom (or the melting vessel bottom) via the plasma arc coupling zone, and the furnace (or the melting vessel 1).
By extending in the outer circumferential direction of 8), it became possible to produce an aluminum and / or yttrium-containing composite quartz glass ingot in which aluminum and / or yttrium was uniformly dispersed.

FIG. 5 is a schematic diagram showing an apparatus for producing an aluminum and / or yttrium-containing composite quartz glass ingot according to another embodiment of the present invention. In FIG. 5, reference numeral 10 denotes an aluminum and / or yttrium-containing composite quartz glass. The hopper is filled with a raw material of silica powder containing aluminum and / or yttrium, which is a raw material of the present invention. A connecting pipe 14 and a raw material supply pipe 16 are connected to a bottom of the hopper 10 and reach a furnace body 20 via a supply material quantitative supply device 12, and a melting vessel 18 in the furnace body 20 is connected.
Are arranged via or near the plasma arc coupling zone 22 and can be adjusted vertically and horizontally. From above the furnace body 20, a twin plasma torch comprising a plasma anode torch 24 and a plasma cathode torch 26 is symmetrically arranged in the plasma arc coupling zone 22 of the melting vessel 18, and the torch angle and the furnace body 2
It is inserted so that the insertion depth to zero can be adjusted. The plasma anode torch 24 and the plasma cathode torch 26 are preferably each at an angle of 45 ° to 65 ° with respect to the vertical axis and have a horizontal distance of 50 mm to the vertical axis of the furnace center of each plasma torch.
Set to be 100 mm. The plasma anode torch 24 used here has the structure described in detail in Embodiment 1 as FIG. 3 and has the same function.
Similarly, the plasma cathode torch 26 has the structure described in detail in Embodiment 1 as FIG. 4 and has the same function. The melting container 18 in FIG. 5 is formed of a water-cooled container made of metal such as stainless steel, and the center of the bottom of the container is supported by the rotating shaft 44. The rotating shaft 44 is mounted so as to be able to rotate and move up and down via a rotating motor 50 installed on the furnace body base 46. In addition, the lower end of the rotating shaft 44 has a cooling water inlet 52a and a drain 52b. A rotary joint 54 having the following structure is assembled so as to circulate cooling water in the melting vessel 18. On the other hand, the ceiling portion of the furnace body 20 has a flat shape, and the cooling water is circulated and cooled, and the silica vapor rising from the melting surface of the melting vessel 18 is discharged from the exhaust port 56 provided on the furnace body side wall. More exhausted. The operation will be described based on these structures. First, 1 cm of granular silica having a large particle size is placed on the bottom of the melting vessel 18 before the melting operation.
The melting operation is spread to a thickness of about 20 cm, and the vicinity where the plasma arc generated from the plasma anode torch 24 and the plasma cathode torch 26 of the twin plasma torch symmetrically arranged is coupled to the top of the melting portion. It is done in the form of doing.

At first, while rotating the melting vessel 18 at a predetermined speed, the angles and positions of the plasma anode torch 24 and the plasma cathode torch 26 are adjusted, and the center and the center of the surface of the granular silica spread on the furnace bottom are adjusted. A silica powder raw material containing aluminum and / or yttrium is dropped through a plasma arc coupling zone to produce a small fused aluminum and / or yttrium-containing composite quartz glass.

Thereafter, the plasma anode / torch 2
The melting area is expanded while adjusting the angle and position of the plasma cathode torch 4 and the plasma cathode torch 26. This operation is repeated to continuously perform melt lamination with the vicinity of the coupling of the plasma arc as the top of the fusion zone. Further, in order to maintain the plasma coupling zone of the twin plasma arc on the molten surface, the container 18 is lowered in accordance with the generation rate at which the melt plasma is continuously laminated. In other words, since aluminum and / or yttrium-containing composite quartz glass has a very high viscosity, the melting portion has a peak in a portion where the silica powder raw material containing aluminum and / or yttrium is melted and a portion which spreads by flowing to the side wall of the container. Since the glass has a mountain shape, it is necessary to maintain a sufficiently high temperature over the side wall of the container 18 in order to sufficiently flow the glass from the top of the mountain to the bottom.

For this reason, the plasma flow from the twin plasma torches 24 and 26 extending from the plasma coupling zone covers the surface of the aluminum and / or yttrium-containing composite quartz glass from the top to the bottom of the mountain, so that the rotation of the vessel 18 and Synergistically, it is possible to maintain the high temperature required for the flow of the aluminum and / or yttrium-containing composite quartz glass over the side wall of the melting vessel 18, and to extend the aluminum and / or yttrium-containing composite quartz glass in the outer circumferential direction of the furnace. Can be

According to this production method, an aluminum and / or yttrium-containing composite quartz glass ingot in which aluminum and / or yttrium is uniformly dispersed can be produced.

[Brief description of the drawings]

FIG. 1 is a schematic view of an apparatus for manufacturing aluminum and / or yttrium-containing composite quartz glass by plasma melting (manufacturing method 1 according to embodiment 1).

FIG. 2 is a sketch diagram showing the growth of a composite quartz glass containing aluminum and / or yttrium.

FIG. 3 is a sectional view of a plasma anode torch for use in the present invention.

FIG. 4 is a sectional view of a plasma cathode torch for use in the present invention.

FIG. 5 is a schematic diagram of an apparatus for manufacturing a composite quartz glass containing aluminum and / or yttrium by plasma melting (manufacturing method 2 according to the second embodiment).

[Explanation of symbols]

1: hopper 2: raw material supply device 3: quartz glass tube 4: quartz glass tube 5: plasma arc coupling band 6: plasma anode torch 7: plasma cathode torch 8: target 9: rotating device 10: elevating device 14: Plasma arc 15: Plasma arc 16: Composite quartz glass ingot containing aluminum and / or yttrium 20: Anode electrode 25: Nozzle 27: Nozzle assembly 34: Cathode electrode 38: Nitrogen gas outlet

 ──────────────────────────────────────────────────続 き Continuing on the front page (72) Inventor Yoshinori Harada 7-37-17-301, Sagami-Ono, Sagamihara-shi, Kanagawa (72) Inventor Shuzo Mizutani 519 Shimo-tanabe, Fujisawa-shi, Kanagawa F term (reference) 4G014 AH02 4G062 AA01 BB02 CC01 CC04 DA08 DB02 DB03 DC01 DD01 DE01 DF01 EA01 EA10 EB01 EC01 ED01 EE01 EF01 EG01 FA01 FB01 FC01 FD01 FE01 FF01 FG01 FH01 FJ02 FJ03 FK01 FL01 GA01 GA10 GB01 GC01 GD01 GE01 HHH HH HH HH HH HH HH HH HH KK01 KK03 KK05 KK07 KK10 MM35 NN34 NN35

Claims (12)

[Claims] 1. A mixed powder obtained by adding an aluminum and / or yttrium-containing substance to a siliceous raw material powder, wherein at least two or more electrodes have opposite polarities and at least two
Plasma arcs where multiple plasma arcs are coupled
A method for producing a composite quartz glass containing aluminum and / or yttrium, wherein the quartz glass is passed through or near a coupling zone and melted. 2. The method according to claim 1, wherein the aluminum and / or yttrium-containing substance is at least one selected from the group consisting of aluminum metal, yttrium powder, aluminum compound, yttrium compound, alumina powder and yttria powder. A method for producing the aluminum and / or yttrium-containing composite quartz glass according to the above. 3. An aluminum and / or yttrium-containing composite according to claim 1, wherein the amount of the aluminum and / or yttrium-containing substance in the mixed powder is 0.01 to 2% by weight. A method for producing quartz glass. 4. The composite quartz glass containing aluminum and / or yttrium according to claim 1, wherein the average particle diameter of the aluminum and / or yttrium-containing substance is 0.1 to 300 μm. Manufacturing method. 5. The method for producing a composite quartz glass containing aluminum and / or yttrium according to claim 1, wherein the siliceous raw material powder is a high-purity silicon oxide source. 6. The high-purity silicon oxide source is silica sand powder, quartz powder, α
The method for producing a composite quartz glass containing aluminum and / or yttrium according to claim 5, wherein the mixture is one or a mixture of two or more kinds selected from the group consisting of quartz and cristobalite. 7. The at least two plasma electrodes are symmetrically arranged, and the two plasma electrodes are inclined with respect to the vertical so that the tips of the two plasma electrodes are narrowed, and depending on the angle of the inclination and / or the plasma The transparent quartz or opaque light transmission performance is controlled by the distance from the coupling zone to the position at which the molten product is collected, and the aluminum and / or yttrium-containing composite quartz glass according to claim 1 to 6, is controlled. Production method. 8. At least two symmetrically arranged plasma electrodes of opposite polarity, one electrode acting as a cathode and the other electrode acting as an anode. By inclining at an angle of 45-65 ° to the vertical or between 80-130 ° between the electrodes and maintaining the distance between the tips of the two inclined electrodes within 100 mm, and / or plasma coupling The distance from the zone to the location where the molten product is collected is 100
The method for producing an aluminum and / or yttrium-containing composite quartz glass according to any one of claims 1 to 7, wherein an opaque deposited molten product is obtained by keeping the distance within mm. 9. The method according to claim 1, wherein the solid or vaporous substance melted and produced by the plasma arc is collected on a target rotatable about a vertical axis and / or movable in a vertical direction. Aluminum and / or
Alternatively, a method for producing yttrium-containing composite quartz glass. 10. A solid or vaporous substance melted and produced by a plasma arc is collected and laminated at a central portion of a rotating melting vessel, and is further heated and melted and extended in the outer peripheral direction of the vessel. 10. The method for producing a composite quartz glass containing aluminum and / or yttrium according to item 9. 11. An aluminum and / or yttrium-containing composite quartz glass member comprising the aluminum and / or yttrium-containing composite quartz glass obtained by the production method according to any one of claims 1 to 10. 12. A halide gas comprising the aluminum and / or yttrium-containing composite quartz glass member according to claim 11, and a component for an apparatus utilizing the plasma thereof.