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JP2002261210A5 - - Google Patents

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Publication number
JP2002261210A5
JP2002261210A5 JP2001054935A JP2001054935A JP2002261210A5 JP 2002261210 A5 JP2002261210 A5 JP 2002261210A5 JP 2001054935 A JP2001054935 A JP 2001054935A JP 2001054935 A JP2001054935 A JP 2001054935A JP 2002261210 A5 JP2002261210 A5 JP 2002261210A5
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JP
Japan
Prior art keywords
semiconductor device
electrode body
support electrode
heat sink
copper
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Pending
Application number
JP2001054935A
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Japanese (ja)
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JP2002261210A (en
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Publication date
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Priority to JP2001054935A priority Critical patent/JP2002261210A/en
Priority claimed from JP2001054935A external-priority patent/JP2002261210A/en
Publication of JP2002261210A publication Critical patent/JP2002261210A/en
Publication of JP2002261210A5 publication Critical patent/JP2002261210A5/ja
Pending legal-status Critical Current

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Description

熱膨張緩和体を中間に介して半導体チップの一方の面を高温半田を用いて接合支持する支持電極体と、前記支持電極体を圧入する穴部を有する放熱板とを備え、前記半導体チップに発生した熱を前記放熱板を介して放熱する半導体装置において、前記支持電極体が、ジルコニウムを含有する銅合金製であって、前記支持電極体の硬度が前記放熱板の硬度よりも大きく、前記支持電極体が前記半導体チップを前記熱膨張緩和体を介して収容する凹部を有する柱状体であって、該支持電極体の凹部の底面が前記放熱板の上面と下面との間に位置する。   The semiconductor chip includes: a support electrode body for joining and supporting one surface of the semiconductor chip using high temperature solder with the thermal expansion relaxation body interposed therebetween, and a heat sink having a hole for press-fitting the support electrode body; In the semiconductor device which radiates the generated heat through the heat sink, the support electrode is made of a copper alloy containing zirconium, and the hardness of the support electrode is larger than the hardness of the heat sink, The support electrode body is a columnar body having a recess that accommodates the semiconductor chip via the thermal expansion relaxation body, and the bottom surface of the recess of the support electrode body is located between the upper surface and the lower surface of the heat sink.

Claims (9)

熱膨張緩和体を中間に介して半導体チップの一方の面を高温半田を用いて接合支持する支持電極体と、
前記支持電極体を圧入する穴部を有する放熱板とを備え、前記半導体チップに発生した熱を前記放熱板を介して放熱する半導体装置において、
前記支持電極体が、ジルコニウムを含有する銅合金製であって、前記支持電極体の硬度が前記放熱板の硬度よりも大きく、前記支持電極体が前記半導体チップを前記熱膨張緩和体を介して収容する凹部を有する柱状体であって、該支持電極体の凹部の底面が前記放熱板の上面と下面との間に位置していることを特徴とする半導体装置。
A supporting electrode body for joining and supporting one surface of the semiconductor chip with high temperature solder with the thermal expansion relaxation body interposed therebetween;
And a heat sink having a hole into which the support electrode body is press-fitted, wherein the heat generated in the semiconductor chip is dissipated through the heat sink.
The support electrode body, which is made of copper alloy containing zirconium, the hardness of the support electrode body much larger than the hardness of the heat radiating plate, the support electrode body said semiconductor chip through the thermal expansion buffer member 2. A semiconductor device according to claim 1, wherein the bottom surface of the recess of the support electrode body is located between the upper surface and the lower surface of the heat sink .
請求項1に記載の半導体装置において、前記支持電極が、ジルコニウムを0.1wt%から0.2wt%含有する銅合金製であることを特徴とする半導体装置。 The semiconductor device according to claim 1 , wherein the support electrode is made of a copper alloy containing 0.1 wt% to 0.2 wt% of zirconium. 請求項1あるいは請求項2の何れかに記載の半導体装置において、前記熱膨張緩和体が銅−インバー−銅クラッド材であることを特徴とする半導体装置。  The semiconductor device according to claim 1, wherein the thermal expansion relaxation body is a copper-invar-copper clad material. 請求項1から請求項3の何れかに記載の半導体装置において、前記放熱板が銅製であることを特徴とする半導体装置。  The semiconductor device according to any one of claims 1 to 3, wherein the heat dissipation plate is made of copper. 請求項1から請求項3の何れかに記載の半導体装置において、前記放熱板がアルミニウム製であることを特徴とする半導体装置。  The semiconductor device according to any one of claims 1 to 3, wherein the heat dissipation plate is made of aluminum. 請求項1から請求項3の何れかに記載の半導体装置において、前記半導体チップの他方の面にリード電極体を接続していることを特徴とする半導体装置。  The semiconductor device according to any one of claims 1 to 3, wherein a lead electrode body is connected to the other surface of the semiconductor chip. 請求項1から請求碩3の何れかに記載の半導体装置において、前記支持電極体のジルコニウムを含有する銅合金が、温度250℃から500℃の間の温度で1時間焼きなました後のビッカース硬度が120より大きいことを特徴とする半導体装置。  The semiconductor device according to any one of claims 1 to 3, wherein the Vickers hardness after the copper alloy containing zirconium of the support electrode body has been annealed at a temperature between 250 ° C and 500 ° C for 1 hour A semiconductor device characterized by having a size larger than 120. 請求項1から請求項3の何れかに記載の半導体装置において、前記放熱板の穴部に前記支持電極体を圧入したことを特徴とする半導体装置。  The semiconductor device according to any one of claims 1 to 3, wherein the support electrode body is press-fitted into the hole of the heat sink. 請求項8に記載の半導体装置において、前記支持電極体の外径が12.75mmであって、該支持電極体の外経と、前記放熱板の穴部の直径との差が0.1mmから0.3mmの間であることを特徴とする半導体装置。  9. The semiconductor device according to claim 8, wherein the outer diameter of the support electrode body is 12.75 mm, and the difference between the outer diameter of the support electrode body and the diameter of the hole of the heat sink is 0.1 mm. A semiconductor device characterized by being between 0.3 mm.
JP2001054935A 2001-02-28 2001-02-28 Semiconductor device Pending JP2002261210A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2001054935A JP2002261210A (en) 2001-02-28 2001-02-28 Semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001054935A JP2002261210A (en) 2001-02-28 2001-02-28 Semiconductor device

Publications (2)

Publication Number Publication Date
JP2002261210A JP2002261210A (en) 2002-09-13
JP2002261210A5 true JP2002261210A5 (en) 2005-05-19

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Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001054935A Pending JP2002261210A (en) 2001-02-28 2001-02-28 Semiconductor device

Country Status (1)

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JP (1) JP2002261210A (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4479577B2 (en) 2005-04-28 2010-06-09 株式会社日立製作所 Semiconductor device
JP2007042765A (en) * 2005-08-02 2007-02-15 Cmk Corp Multilayer printed wiring board and manufacturing method thereof
JP2009043925A (en) * 2007-08-08 2009-02-26 Sanken Electric Co Ltd Semiconductor device and fitting method thereof
JP5331322B2 (en) 2007-09-20 2013-10-30 株式会社日立製作所 Semiconductor device
US10201872B2 (en) 2011-12-20 2019-02-12 Esab Ab Contact tip for use in gas metal-arc welding
JP5992485B2 (en) * 2014-10-24 2016-09-14 三菱電機株式会社 In-vehicle DCDC converter
JP6377783B2 (en) * 2017-01-18 2018-08-22 エサブ・アーベー Contact tips for gas metal arc welding

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