JP2002241348A - New compound and method for producing the same - Google Patents
New compound and method for producing the sameInfo
- Publication number
- JP2002241348A JP2002241348A JP2001036356A JP2001036356A JP2002241348A JP 2002241348 A JP2002241348 A JP 2002241348A JP 2001036356 A JP2001036356 A JP 2001036356A JP 2001036356 A JP2001036356 A JP 2001036356A JP 2002241348 A JP2002241348 A JP 2002241348A
- Authority
- JP
- Japan
- Prior art keywords
- producing
- compound
- acid
- reaction
- ethylenically unsaturated
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 150000001875 compounds Chemical class 0.000 title claims abstract description 19
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 8
- VHRYZQNGTZXDNX-UHFFFAOYSA-N methacryloyl chloride Chemical compound CC(=C)C(Cl)=O VHRYZQNGTZXDNX-UHFFFAOYSA-N 0.000 claims abstract description 6
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims abstract description 4
- 239000000126 substance Substances 0.000 claims abstract description 4
- HFBMWMNUJJDEQZ-UHFFFAOYSA-N acryloyl chloride Chemical compound ClC(=O)C=C HFBMWMNUJJDEQZ-UHFFFAOYSA-N 0.000 claims abstract description 3
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims abstract description 3
- 239000003963 antioxidant agent Substances 0.000 abstract description 5
- 230000003078 antioxidant effect Effects 0.000 abstract description 4
- 238000006243 chemical reaction Methods 0.000 description 14
- 239000002253 acid Substances 0.000 description 12
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 9
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 6
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 6
- 150000004820 halides Chemical class 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 3
- 239000000178 monomer Substances 0.000 description 3
- 239000003960 organic solvent Substances 0.000 description 3
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 2
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 2
- 150000007513 acids Chemical class 0.000 description 2
- 150000001805 chlorine compounds Chemical class 0.000 description 2
- 239000003112 inhibitor Substances 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 2
- 238000000655 nuclear magnetic resonance spectrum Methods 0.000 description 2
- 238000006116 polymerization reaction Methods 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 239000013076 target substance Substances 0.000 description 2
- UTOVMEACOLCUCK-SNAWJCMRSA-N (e)-4-butoxy-4-oxobut-2-enoic acid Chemical compound CCCCOC(=O)\C=C\C(O)=O UTOVMEACOLCUCK-SNAWJCMRSA-N 0.000 description 1
- ZKXXLNRGNAUYHP-IHWYPQMZSA-N (z)-4-(2-hydroxypropoxy)-4-oxobut-2-enoic acid Chemical compound CC(O)COC(=O)\C=C/C(O)=O ZKXXLNRGNAUYHP-IHWYPQMZSA-N 0.000 description 1
- NGNBDVOYPDDBFK-UHFFFAOYSA-N 2-[2,4-di(pentan-2-yl)phenoxy]acetyl chloride Chemical compound CCCC(C)C1=CC=C(OCC(Cl)=O)C(C(C)CCC)=C1 NGNBDVOYPDDBFK-UHFFFAOYSA-N 0.000 description 1
- 238000012644 addition polymerization Methods 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 150000001649 bromium compounds Chemical class 0.000 description 1
- UTOVMEACOLCUCK-PLNGDYQASA-N butyl maleate Chemical compound CCCCOC(=O)\C=C/C(O)=O UTOVMEACOLCUCK-PLNGDYQASA-N 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 239000012024 dehydrating agents Substances 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 239000001530 fumaric acid Substances 0.000 description 1
- 239000012433 hydrogen halide Substances 0.000 description 1
- 229910000039 hydrogen halide Inorganic materials 0.000 description 1
- 239000012442 inert solvent Substances 0.000 description 1
- 150000004694 iodide salts Chemical class 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 150000002762 monocarboxylic acid derivatives Chemical class 0.000 description 1
- 150000002763 monocarboxylic acids Chemical class 0.000 description 1
- 239000012044 organic layer Substances 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 239000011342 resin composition Substances 0.000 description 1
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 1
- 235000017557 sodium bicarbonate Nutrition 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Landscapes
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は新規な化合物及びそ
の製造方法に関する。[0001] The present invention relates to a novel compound and a method for producing the same.
【0002】[0002]
【従来の技術】多くのスピロインダン類が公知であり、
いくつかは酸化防止剤として使用されている。BACKGROUND OF THE INVENTION Many spiroindanes are known,
Some have been used as antioxidants.
【0003】[0003]
【発明が解決しようとする課題】本発明は新規な化合物
を提供せんとするものであり、特に酸化防止剤残基を含
む新規なエチレン性不飽和化合物及びその製造方法を提
供することである。SUMMARY OF THE INVENTION An object of the present invention is to provide a novel compound, and in particular, to provide a novel ethylenically unsaturated compound containing an antioxidant residue and a method for producing the same.
【0004】[0004]
【課題を解決するための手段】本発明は新規な化合物を
提供するものであり、その化学構造式は下記の通りであ
る。DISCLOSURE OF THE INVENTION The present invention provides a novel compound, and its chemical structural formula is as follows.
【化2】 式中、Rは水素原子またはメチル基を表す。また、その
製造方法は、5,6,5’,6’−テトラヒドロキシ−
3,3,3’,3’−テトラメチル−1,1’−スピロ
インダンに塩基の存在下でアクリル酸クロライド又はメ
タクリル酸クロライドを反応させることを特徴とする上
記の化合物の製造方法である。Embedded image In the formula, R represents a hydrogen atom or a methyl group. In addition, the production method is based on 5,6,5 ′, 6′-tetrahydroxy-
A process for producing the above compound, which comprises reacting 3,3,3 ′, 3′-tetramethyl-1,1′-spiroindane with acrylic acid chloride or methacrylic acid chloride in the presence of a base.
【0005】[0005]
【発明の実施の形態】本発明の新規化合物及びその類縁
体は、5,6,5’,6’−テトラヒドロキシ−3,
3,3’,3’−テトラメチル−1,1’−スピロイン
ダンにエチレン性不飽和カルボン酸又はその活性誘導
体、例えば酸ハロゲン化物を反応させることにより合成
される。エチレン性不飽和カルボン酸を反応させる場合
には、脱水剤を共存させる方が好ましい。酸ハロゲン化
物を反応させるときはアミン類等の塩基を共存させる方
が好ましい。BEST MODE FOR CARRYING OUT THE INVENTION The novel compounds of the present invention and their analogs are 5,6,5 ', 6'-tetrahydroxy-3,
It is synthesized by reacting 3,3 ′, 3′-tetramethyl-1,1′-spiroindane with an ethylenically unsaturated carboxylic acid or an active derivative thereof, for example, an acid halide. When reacting an ethylenically unsaturated carboxylic acid, it is preferable to coexist a dehydrating agent. When reacting an acid halide, it is preferable to coexist a base such as an amine.
【0006】本発明の化合物の製造に使用できるエチレ
ン性不飽和カルボン酸は、特に限定されず、例えば、ア
クリル酸、メタクリル酸等のエチレン性不飽和モノカル
ボン酸単量体;イタコン酸、マレイン酸、フマル酸、ブ
テントリカルボン酸等のエチレン性不飽和多価カルボン
酸単量体;フマル酸モノブチル、マレイン酸モノブチ
ル、マレイン酸モノ-2-ヒドロキシプロピル等のエチレ
ン性不飽和多価カルボン酸の部分エステル単量体;など
を挙げることができる。酸ハロゲン化物としては、上記
のエチレン性不飽和酸の酸塩化物、酸臭化物及び酸沃化
物を挙げることができる。酸塩化物が適度の反応性を有
するので好ましく使用できる。(メタ)アクリル酸等の
エチレン性不飽和モノカルボン酸が好ましく、メタアク
リル酸又はアクリル酸がより好ましく、これらの酸塩化
物が特に好ましい。The ethylenically unsaturated carboxylic acid which can be used in the production of the compound of the present invention is not particularly limited. For example, ethylenically unsaturated monocarboxylic acid monomers such as acrylic acid and methacrylic acid; And ethylenically unsaturated polycarboxylic acid monomers such as fumaric acid and butenetricarboxylic acid; partial esters of ethylenically unsaturated polycarboxylic acids such as monobutyl fumarate, monobutyl maleate and mono-2-hydroxypropyl maleate Monomers; and the like. Examples of the acid halide include acid chlorides, acid bromides and acid iodides of the above-mentioned ethylenically unsaturated acids. The acid chloride can be preferably used because it has an appropriate reactivity. Ethylenically unsaturated monocarboxylic acids such as (meth) acrylic acid are preferred, methacrylic acid or acrylic acid is more preferred, and their acid chlorides are particularly preferred.
【0007】本発明の化合物は下記の反応により合成さ
れる。メタクリル酸クロライドを使用する反応式を以下
に示す。The compound of the present invention is synthesized by the following reaction. The reaction formula using methacrylic chloride is shown below.
【化3】 Embedded image
【0008】エチレン性不飽和カルボン酸又はその酸ハ
ロゲン化物の使用量は、ヒドロキシスピロインダンに対
して、化学量論ないしその数十モル%過剰量を使用する
ことができる。反応時には、カルボン酸成分は、反応系
に滴々添加する方が好ましい。塩基を共存させる場合に
は、反応により生じるハロゲン化水素を捕捉するのに化
学量論よりも過剰に使用することが好ましい。塩基とし
ては、ピリジン、トリエチルアミン等の三級アミン類が
好ましく使用される。The amount of the ethylenically unsaturated carboxylic acid or its acid halide to be used can be stoichiometric or an excess of several tens of mol% based on hydroxyspiroindane. During the reaction, the carboxylic acid component is preferably added dropwise to the reaction system. When a base is allowed to coexist, it is preferable to use an excess of the stoichiometric amount to capture the hydrogen halide generated by the reaction. Tertiary amines such as pyridine and triethylamine are preferably used as the base.
【0009】反応に際して、不活性溶媒を使用すること
が好ましく、エチルエーテル、THF等のエーテル類が
好ましく使用できる。その使用量は特に制限されない
が、原料のヒドロキシスピロインダン1モル当たり、
0.2〜2Kgである。また反応中のエチレン性不飽和
カルボン酸又はその活性誘導体の好ましくない付加重合
を防止するために、ヒドロキノン等の重合禁止剤を併用
することが好ましい。In the reaction, an inert solvent is preferably used, and ethers such as ethyl ether and THF can be preferably used. The amount used is not particularly limited, but per mole of hydroxyspiroindane as a raw material,
0.2 to 2 kg. In order to prevent undesirable addition polymerization of the ethylenically unsaturated carboxylic acid or its active derivative during the reaction, it is preferable to use a polymerization inhibitor such as hydroquinone in combination.
【0010】本発明の化合物を製造する際の反応温度は
0℃〜80℃の範囲内の温度を任意に選択することがで
きる。25℃〜70℃の温度が適当な反応速度が得られ
るので好ましい。反応時間はメタクリル酸クロリド等の
添加速度等に依存するので一概に言えないが、0.5〜
10時間が一般的である。The reaction temperature for producing the compound of the present invention can be arbitrarily selected from the range of 0 ° C. to 80 ° C. A temperature of 25 ° C to 70 ° C is preferred because a suitable reaction rate is obtained. Since the reaction time depends on the rate of addition of methacrylic acid chloride and the like, it cannot be said unconditionally.
Ten hours are common.
【0011】反応後の後処理としては、水に不溶の有機
溶剤と水との混合物を反応混合物に加えて、目的物を前
記有機溶媒に抽出した後、有機溶媒を留去する。残留物
から常法に従い目的物を晶析することができる。As a post-treatment after the reaction, a mixture of water and an organic solvent insoluble in water is added to the reaction mixture, and the target substance is extracted into the organic solvent. Then, the organic solvent is distilled off. The target substance can be crystallized from the residue according to a conventional method.
【0012】本発明の化合物は、酸化防止剤として使用
できるほか、エチレン性不飽和化合物を含む組成物に併
用して、酸化防止機能を有する樹脂組成物を製造するこ
とができる。The compound of the present invention can be used as an antioxidant, and can be used in combination with a composition containing an ethylenically unsaturated compound to produce a resin composition having an antioxidant function.
【0013】[0013]
【実施例】(実施例1)原料の5,6,5’,6’−テ
トラヒドロキシ−3,3,3’,3’−テトラメチル−
1,1’−スピロインダン 192.7g(0.556
モル)、THF1156.2g、重合禁止剤38.5m
g、トリエチルアミン343.7gを反応容器に仕込ん
だ。これにメタクリル酸クロライド295.9gを内温
30〜63℃に制御しながら約2時間かけて滴下し、そ
の後2時間反応を行った。この反応液にトルエン10
0.7gと水302.4gを加え抽出・水洗を行い水層
を廃棄した。更に重曹水100g、その後水100gで
有機層を水洗した。その後トルエンを減圧で濃縮し抽出
物を得た。この抽出物をトルエン/n−ヘキサンの混合
液に溶解し冷却・晶析し濾過・乾燥して化3で示す反応
式中の目的化合物を190g(収率54.8%)得た。
以下に特性値を示す。 融点:194℃ NMRスペクトルのピーク値(CDCl3中):1.3
0ppm(6H,s)、1.35ppm(6H,s)、
1.95ppm(6H,s)、2.00ppm(6H,
s)、2.30ppm(4H,m)、5.65ppm
(2H,s)、5.70ppm(2H,s)、6.20
ppm(2H,s)、6.25ppm(2H,s)、
6.70ppm(2H,s)、7.05ppm(2H,
s)。 NMRスペクトルを図1に示す。EXAMPLES (Example 1) Raw material 5,6,5 ', 6'-tetrahydroxy-3,3,3', 3'-tetramethyl-
192.7 g of 1,1'-spiroindane (0.556
Mol), THF 1156.2 g, polymerization inhibitor 38.5 m
g and triethylamine 343.7 g were charged into a reaction vessel. 295.9 g of methacrylic acid chloride was added dropwise thereto over about 2 hours while controlling the internal temperature at 30 to 63 ° C., and the reaction was carried out for 2 hours. To this reaction solution was added toluene 10
0.7 g and 302.4 g of water were added, extraction and washing were performed, and the aqueous layer was discarded. Further, the organic layer was washed with 100 g of aqueous sodium bicarbonate and then with 100 g of water. Thereafter, the toluene was concentrated under reduced pressure to obtain an extract. This extract was dissolved in a mixed solution of toluene / n-hexane, cooled, crystallized, filtered and dried to obtain 190 g (yield: 54.8%) of the target compound in the reaction formula shown in Chemical formula 3.
The characteristic values are shown below. Melting point: 194 ° C. Peak value of NMR spectrum (in CDCl 3 ): 1.3
0 ppm (6H, s), 1.35 ppm (6H, s),
1.95 ppm (6H, s), 2.00 ppm (6H, s)
s), 2.30 ppm (4H, m), 5.65 ppm
(2H, s), 5.70 ppm (2H, s), 6.20
ppm (2H, s), 6.25 ppm (2H, s),
6.70 ppm (2H, s), 7.05 ppm (2H, s)
s). The NMR spectrum is shown in FIG.
【図1】本発明の新規化合物(R=メチル基)のNMR
スペクトルを示す。FIG. 1 shows NMR of a novel compound (R = methyl group) of the present invention.
The spectrum is shown.
Claims (2)
3,3,3’,3’−テトラメチル−1,1’−スピロ
インダンに塩基の存在下でアクリル酸クロライド又はメ
タクリル酸クロライドを反応させることを特徴とする請
求項1記載の化合物の製造方法。(2) 5,6,5 ', 6'-tetrahydroxy-
The method for producing a compound according to claim 1, wherein 3,3,3 ', 3'-tetramethyl-1,1'-spiroindane is reacted with acrylic acid chloride or methacrylic acid chloride in the presence of a base.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001036356A JP2002241348A (en) | 2001-02-14 | 2001-02-14 | New compound and method for producing the same |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001036356A JP2002241348A (en) | 2001-02-14 | 2001-02-14 | New compound and method for producing the same |
Publications (1)
Publication Number | Publication Date |
---|---|
JP2002241348A true JP2002241348A (en) | 2002-08-28 |
Family
ID=18899636
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2001036356A Pending JP2002241348A (en) | 2001-02-14 | 2001-02-14 | New compound and method for producing the same |
Country Status (1)
Country | Link |
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JP (1) | JP2002241348A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010100609A (en) * | 2008-09-25 | 2010-05-06 | Chisso Corp | Polymerizable liquid crystal compound, liquid crystal composition and polymer |
CN105229055A (en) * | 2013-05-14 | 2016-01-06 | 3M创新有限公司 | Based on free redical polymerization spirobiindene monomer containing sulfonyl polymers |
-
2001
- 2001-02-14 JP JP2001036356A patent/JP2002241348A/en active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010100609A (en) * | 2008-09-25 | 2010-05-06 | Chisso Corp | Polymerizable liquid crystal compound, liquid crystal composition and polymer |
US8048496B2 (en) | 2008-09-25 | 2011-11-01 | Jnc Corporation | Polymerizable liquid crystal compound, liquid crystal composition and polymer |
CN105229055A (en) * | 2013-05-14 | 2016-01-06 | 3M创新有限公司 | Based on free redical polymerization spirobiindene monomer containing sulfonyl polymers |
US9919304B2 (en) | 2013-05-14 | 2018-03-20 | 3M Innovative Properties Company | Sulfonyl-containing polymers based on free-radically polymerizable spirobisindane monomers |
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