JP2002226616A - Hydrophilizing method for surface of hydrophobic resin film - Google Patents
Hydrophilizing method for surface of hydrophobic resin filmInfo
- Publication number
- JP2002226616A JP2002226616A JP2001029828A JP2001029828A JP2002226616A JP 2002226616 A JP2002226616 A JP 2002226616A JP 2001029828 A JP2001029828 A JP 2001029828A JP 2001029828 A JP2001029828 A JP 2001029828A JP 2002226616 A JP2002226616 A JP 2002226616A
- Authority
- JP
- Japan
- Prior art keywords
- resin film
- hydrophobic resin
- hydrophilizing
- film
- voltage
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 229920005989 resin Polymers 0.000 claims abstract description 59
- 239000011347 resin Substances 0.000 claims abstract description 59
- 230000002209 hydrophobic effect Effects 0.000 claims abstract description 32
- 239000007787 solid Substances 0.000 claims abstract description 26
- 238000000034 method Methods 0.000 claims abstract description 24
- 239000012298 atmosphere Substances 0.000 claims abstract description 11
- 230000001681 protective effect Effects 0.000 claims abstract description 8
- 239000003989 dielectric material Substances 0.000 claims abstract description 7
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 claims description 13
- 229910001882 dioxygen Inorganic materials 0.000 claims description 13
- 150000001925 cycloalkenes Chemical class 0.000 claims description 6
- JFNLZVQOOSMTJK-KNVOCYPGSA-N norbornene Chemical compound C1[C@@H]2CC[C@H]1C=C2 JFNLZVQOOSMTJK-KNVOCYPGSA-N 0.000 abstract description 20
- 239000004973 liquid crystal related substance Substances 0.000 abstract description 9
- 208000028659 discharge Diseases 0.000 description 22
- 239000007789 gas Substances 0.000 description 15
- 230000000052 comparative effect Effects 0.000 description 10
- 238000002834 transmittance Methods 0.000 description 10
- 230000001070 adhesive effect Effects 0.000 description 8
- 230000010287 polarization Effects 0.000 description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 8
- 239000000853 adhesive Substances 0.000 description 7
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 6
- 238000003851 corona treatment Methods 0.000 description 6
- 239000001301 oxygen Substances 0.000 description 6
- 229910052760 oxygen Inorganic materials 0.000 description 6
- NLKNQRATVPKPDG-UHFFFAOYSA-M potassium iodide Chemical compound [K+].[I-] NLKNQRATVPKPDG-UHFFFAOYSA-M 0.000 description 6
- 229920002284 Cellulose triacetate Polymers 0.000 description 5
- 239000004372 Polyvinyl alcohol Substances 0.000 description 5
- NNLVGZFZQQXQNW-ADJNRHBOSA-N [(2r,3r,4s,5r,6s)-4,5-diacetyloxy-3-[(2s,3r,4s,5r,6r)-3,4,5-triacetyloxy-6-(acetyloxymethyl)oxan-2-yl]oxy-6-[(2r,3r,4s,5r,6s)-4,5,6-triacetyloxy-2-(acetyloxymethyl)oxan-3-yl]oxyoxan-2-yl]methyl acetate Chemical compound O([C@@H]1O[C@@H]([C@H]([C@H](OC(C)=O)[C@H]1OC(C)=O)O[C@H]1[C@@H]([C@@H](OC(C)=O)[C@H](OC(C)=O)[C@@H](COC(C)=O)O1)OC(C)=O)COC(=O)C)[C@@H]1[C@@H](COC(C)=O)O[C@@H](OC(C)=O)[C@H](OC(C)=O)[C@H]1OC(C)=O NNLVGZFZQQXQNW-ADJNRHBOSA-N 0.000 description 5
- 238000010891 electric arc Methods 0.000 description 5
- 239000000178 monomer Substances 0.000 description 5
- 229920002451 polyvinyl alcohol Polymers 0.000 description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 4
- 238000010521 absorption reaction Methods 0.000 description 4
- 229920001577 copolymer Polymers 0.000 description 4
- 230000005684 electric field Effects 0.000 description 4
- 229910044991 metal oxide Inorganic materials 0.000 description 4
- 150000004706 metal oxides Chemical class 0.000 description 4
- -1 polytetrafluoroethylene Polymers 0.000 description 4
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 229910001220 stainless steel Inorganic materials 0.000 description 3
- 239000010935 stainless steel Substances 0.000 description 3
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 2
- 239000004925 Acrylic resin Substances 0.000 description 2
- 229920000178 Acrylic resin Polymers 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 150000001336 alkenes Chemical class 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- LPIQUOYDBNQMRZ-UHFFFAOYSA-N cyclopentene Chemical compound C1CC=CC1 LPIQUOYDBNQMRZ-UHFFFAOYSA-N 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 229910001873 dinitrogen Inorganic materials 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 229910052740 iodine Inorganic materials 0.000 description 2
- 239000011630 iodine Substances 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 2
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 2
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 2
- 229920005672 polyolefin resin Polymers 0.000 description 2
- 239000004810 polytetrafluoroethylene Substances 0.000 description 2
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 2
- 238000007127 saponification reaction Methods 0.000 description 2
- HECLRDQVFMWTQS-RGOKHQFPSA-N 1755-01-7 Chemical compound C1[C@H]2[C@@H]3CC=C[C@@H]3[C@@H]1C=C2 HECLRDQVFMWTQS-RGOKHQFPSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- 229910001369 Brass Inorganic materials 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229920000089 Cyclic olefin copolymer Polymers 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 1
- MCMNRKCIXSYSNV-UHFFFAOYSA-N ZrO2 Inorganic materials O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 1
- 125000005396 acrylic acid ester group Chemical group 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 101150059062 apln gene Proteins 0.000 description 1
- JRPBQTZRNDNNOP-UHFFFAOYSA-N barium titanate Chemical compound [Ba+2].[Ba+2].[O-][Ti]([O-])([O-])[O-] JRPBQTZRNDNNOP-UHFFFAOYSA-N 0.000 description 1
- 229910002113 barium titanate Inorganic materials 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 1
- 239000004327 boric acid Substances 0.000 description 1
- 239000010951 brass Substances 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 210000002858 crystal cell Anatomy 0.000 description 1
- URYYVOIYTNXXBN-UPHRSURJSA-N cyclooctene Chemical compound C1CCC\C=C/CC1 URYYVOIYTNXXBN-UPHRSURJSA-N 0.000 description 1
- 239000004913 cyclooctene Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- HANKSFAYJLDDKP-UHFFFAOYSA-N dihydrodicyclopentadiene Chemical compound C12CC=CC2C2CCC1C2 HANKSFAYJLDDKP-UHFFFAOYSA-N 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 229920006351 engineering plastic Polymers 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005562 fading Methods 0.000 description 1
- 230000002045 lasting effect Effects 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 150000002736 metal compounds Chemical class 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- UMRZSTCPUPJPOJ-KNVOCYPGSA-N norbornane Chemical group C1C[C@H]2CC[C@@H]1C2 UMRZSTCPUPJPOJ-KNVOCYPGSA-N 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- RGSFGYAAUTVSQA-UHFFFAOYSA-N pentamethylene Natural products C1CCCC1 RGSFGYAAUTVSQA-UHFFFAOYSA-N 0.000 description 1
- 238000009832 plasma treatment Methods 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000002985 plastic film Substances 0.000 description 1
- 229920006255 plastic film Polymers 0.000 description 1
- 229920002492 poly(sulfone) Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 229920006289 polycarbonate film Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 239000004408 titanium dioxide Substances 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 238000009816 wet lamination Methods 0.000 description 1
- 230000037303 wrinkles Effects 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
- 239000004711 α-olefin Substances 0.000 description 1
Landscapes
- Polarising Elements (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Treatments Of Macromolecular Shaped Articles (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、疎水性樹脂フィル
ム、特に液晶ディスプレイの偏光板用保護フィルムとし
て用いられるノルボルネン系樹脂フィルムの表面をプラ
ズマ放電処理により親水化する方法に関する。The present invention relates to a method for hydrophilizing the surface of a hydrophobic resin film, particularly a norbornene resin film used as a protective film for a polarizing plate of a liquid crystal display by a plasma discharge treatment.
【0002】[0002]
【従来の技術】近年、液晶ディスプレイ(LCD)は車
載用や携帯電話用として用いられることが多くなり、L
CDの高温あるいは高温多湿の環境下における信頼性が
強く要望されている。2. Description of the Related Art In recent years, liquid crystal displays (LCDs) are often used for vehicles and mobile phones.
There is a strong demand for the reliability of a CD in a high-temperature or high-temperature and high-humidity environment.
【0003】従来、LCDに用いる偏光板は、透明電極
を形成した二枚の電極基板間に液晶を封入した液晶セル
の片側もしくは両側に貼り付けて用いられる。この種の
偏光板としては、ポリビニルアルコール(PVA)にヨ
ウ素もしくは二色性染料を吸着させこれを延伸配向させ
て作製した偏光子の両面に、トリアセチルセルロース
(TAC)が保護フィルムとして接着されたものが一般
的に使用されている。Conventionally, a polarizing plate used in an LCD is used by attaching it to one or both sides of a liquid crystal cell in which liquid crystal is sealed between two electrode substrates on which a transparent electrode is formed. As a polarizing plate of this type, triacetyl cellulose (TAC) was adhered as a protective film to both surfaces of a polarizer produced by adsorbing iodine or a dichroic dye on polyvinyl alcohol (PVA) and stretching the same. Things are commonly used.
【0004】上記TACは、そのままでは偏光子との接
着性が悪いため、アルカリ処理したTAC(鹸化TA
C)が用いられている。しかし、鹸化TACは、吸水
性が高すぎるため、高温多湿環境下で偏光度の低下、退
色による透過率の上昇を起こすこと、高温環境下でP
VA偏光子の配向緩和しようとする力により、鹸化TA
Cに複屈折が発生し、偏光度が低下してしまうこと、な
どが問題として顕在化している。Since the above TAC has poor adhesiveness to a polarizer as it is, alkali-treated TAC (saponified TA) is used.
C) is used. However, since the saponified TAC has too high water absorption, the degree of polarization decreases in a high-temperature and high-humidity environment, and the transmittance increases due to fading.
The saponification TA is caused by the force of the VA polarizer to relax the orientation.
Birefringence occurs in C and the degree of polarization is reduced, and the like has become apparent as a problem.
【0005】上記、の問題点を解決するために、上
記保護フィルムとして種々の樹脂フィルムが提案されて
いる。しかしながら、今までに提案されている樹脂フィ
ルムは、そのほとんどが疎水性であり、偏光子を構成す
るPVAとは極性の違いにより、偏光子との接着が極め
て困難である。In order to solve the above problems, various resin films have been proposed as the protective film. However, most of the resin films proposed so far are hydrophobic, and it is extremely difficult to adhere to the polarizer due to a difference in polarity from PVA constituting the polarizer.
【0006】疎水性樹脂フィルムの表面を親水化するこ
とにより接着性が改善される。疎水性樹脂フィルムの表
面を親水化する方法として、コロナ放電処理による親水
化方法が広く行われている。例えば、特開平4−347
802号公報には、ポリカーボネート延伸フィルムのよ
うな疎水性プラスチックフィルムの一面にコロナ放電処
理を施し、このコロナ放電処理フィルムを用いた液晶デ
ィスプレイ用位相差板が提案されている。The adhesion is improved by making the surface of the hydrophobic resin film hydrophilic. As a method for hydrophilizing the surface of a hydrophobic resin film, a hydrophilization method by corona discharge treatment is widely used. For example, JP-A-4-347
Japanese Patent Publication No. 802 proposes a retardation plate for a liquid crystal display using a corona discharge treatment on one surface of a hydrophobic plastic film such as a stretched polycarbonate film.
【0007】[0007]
【発明が解決しようとする課題】しかしながら、疎水性
樹脂フィルムの表面をコロナ放電処理により親水化する
方法は、親水化処理効果の程度および寿命が短く、少し
でも親水化処理効果の程度および寿命を延ばすために処
理強度を上げると、疎水性樹脂フィルムにピンホールや
温度上昇等に起因してしわなどが発生し、疎水性樹脂フ
ィルムを傷めてしまうという問題がある。However, in the method of hydrophilizing the surface of the hydrophobic resin film by corona discharge treatment, the degree and the life of the hydrophilization treatment are short, and the degree and the life of the hydrophilization treatment are reduced to a small extent. When the processing strength is increased to extend the film, there is a problem that wrinkles and the like are generated in the hydrophobic resin film due to pinholes, temperature rise, and the like, and the hydrophobic resin film is damaged.
【0008】本発明は、上記のような従来技術の問題点
に鑑みてなされたもので、フィルムの表面が高度に親水
化されかつフィルムを傷めない、疎水性樹脂フィルム表
面の親水化処理方法を提供することを目的とする。The present invention has been made in view of the above-mentioned problems of the prior art, and provides a method for hydrophilizing a hydrophobic resin film surface in which the surface of the film is highly hydrophilized and does not damage the film. The purpose is to provide.
【0009】[0009]
【課題を解決するための手段】本発明者は、上記の問題
点を解決するために鋭意検討した結果、常圧プラズマ放
電処理において、少なくとも酸素ガスを含む雰囲気中で
プラズマ処理を行うことにより、疎水性樹脂フィルムの
表面が高度に親水化されかつフィルムを傷めない親水化
処理が可能になることを見出した。Means for Solving the Problems As a result of intensive studies to solve the above-mentioned problems, the present inventor has found that in a normal-pressure plasma discharge process, a plasma process is performed in an atmosphere containing at least oxygen gas. It has been found that the surface of the hydrophobic resin film is highly hydrophilized and that a hydrophilization treatment that does not damage the film can be performed.
【0010】すなわち、本発明は、大気圧近傍の圧力雰
囲気下において、対向電極の少なくとも一方の対向面に
固体誘電体を設置し、上記対向電極と固体誘電体の間又
は固体誘電体同士の間に疎水性樹脂フィルムを配置し、
当該対向電極間に電圧を印加することによりプラズマ放
電を発生して上記疎水性樹脂フィルム表面を親水化処理
する方法において、少なくとも酸素ガスを含む雰囲気中
でプラズマ放電を行うことを特徴とする疎水性樹脂フィ
ルム表面の親水化処理方法である。That is, according to the present invention, a solid dielectric is provided on at least one opposing surface of a counter electrode under a pressure atmosphere near atmospheric pressure, and a solid dielectric is provided between the counter electrode and the solid dielectric or between the solid dielectrics. Place a hydrophobic resin film on the
The method of generating a plasma discharge by applying a voltage between the opposed electrodes to hydrophilize the hydrophobic resin film surface, wherein the plasma discharge is performed in an atmosphere containing at least oxygen gas. This is a method for hydrophilizing the surface of a resin film.
【0011】ここで、上記大気圧近傍の圧力とは100
〜800Torr(約1.33×104 〜10.6×1
04 Pa)の圧力を意味する。特に、圧力調整が容易
で、装置が簡便になる700〜780Torr(約9.
31×104 〜10.4×10 4 Pa)の範囲が好まし
い。Here, the pressure near the atmospheric pressure is 100
~ 800 Torr (about 1.33 × 10Four~ 10.6 × 1
0FourPa). Especially easy pressure adjustment
700 to 780 Torr (approximately 9.
31 × 10Four~ 10.4 × 10 FourPa) range is preferred
No.
【0012】本発明の処理方法は、一対の対向電極を有
し、当該電極の対向面の少なくとも一方に固体誘電体が
設置されている装置において行われる。プラズマが発生
する部位は、上記電極の一方に固体誘電体を設置した場
合は、固体誘電体と電極の間、上記電極の双方に固体誘
電体を設置した場合は、固体誘電体同士の間の空間であ
る。この固体誘電体と電極の間又は固体誘電体同士の間
に親水化処理の対象物体である疎水性樹脂フィルムを配
置して処理を行う。The treatment method of the present invention is performed in an apparatus having a pair of opposed electrodes, and a solid dielectric placed on at least one of the opposed surfaces of the electrodes. The portion where plasma is generated is between the solid dielectric and the electrode when a solid dielectric is installed on one of the electrodes, and between the solid dielectrics when the solid dielectric is installed on both of the electrodes. Space. The treatment is performed by disposing a hydrophobic resin film which is a target object of the hydrophilic treatment between the solid dielectric and the electrode or between the solid dielectrics.
【0013】上記電極としては、銅、アルミニウム等の
金属単体、ステンレス、真鍮等の合金、金属化合物等か
らなるものが挙げられる。Examples of the electrode include those made of a simple metal such as copper and aluminum, alloys such as stainless steel and brass, and metal compounds.
【0014】上記対向電極は、電界集中によるアーク放
電の発生を避けるために、対向電極間の距離が略一定と
なる構造であることが好ましい。この条件を満たす電極
構造としては、平行平板型、円筒対向平板型、球対向平
板型、双曲面、対向平板型、同軸円筒型構造等が挙げら
れる。It is preferable that the counter electrode has a structure in which the distance between the counter electrodes is substantially constant in order to avoid occurrence of arc discharge due to electric field concentration. Examples of the electrode structure satisfying this condition include a parallel plate type, a cylindrical opposed plate type, a spherical opposed plate type, a hyperboloid, an opposed plate type, and a coaxial cylindrical type structure.
【0015】上記固体誘電体は、上記電極の対向面の一
方又は双方に設置する。この際、固体誘電体と設置され
る側の電極が密着し、かつ、接する電極の対向面を完全
に覆うようにする。固体誘電体によって覆われずに電極
同士が直接対向する部位があると、そこからアーク放電
が生じるためである.The solid dielectric is provided on one or both of the opposing surfaces of the electrode. At this time, the electrode on the side on which the solid dielectric is placed is in close contact with the electrode, and the opposing surface of the contacting electrode is completely covered. This is because if there is a part where the electrodes directly oppose each other without being covered by the solid dielectric, an arc discharge will occur from there.
【0016】上記固体誘電体の形状は、シート状でもフ
ィルム状でもよいが、厚みが0.01〜4mmであるこ
とが好ましい。厚すぎると放電プラズマを発生するのに
高電圧を要し、薄すぎると電圧印加時に絶縁破壊が起こ
りアーク放電が発生するためである。The shape of the solid dielectric may be a sheet or a film, but preferably has a thickness of 0.01 to 4 mm. If the thickness is too large, a high voltage is required to generate discharge plasma. If the thickness is too small, dielectric breakdown occurs when a voltage is applied, and arc discharge occurs.
【0017】上記固体誘電体の材質としては、ポリテト
ラフルオロエチレン、ポリエチレンテレフタレート等の
プラスチック、ガラス、二酸化珪素、酸化アルミニウ
ム、二酸化ジルコニウム、二酸化チタン等の金属酸化
物、チタン酸バリウム等の複酸化物等が挙げられる。Examples of the material of the solid dielectric include plastics such as polytetrafluoroethylene and polyethylene terephthalate, glass, metal oxides such as silicon dioxide, aluminum oxide, zirconium dioxide and titanium dioxide, and double oxides such as barium titanate. And the like.
【0018】また、上記固体誘電体は、比誘電率が25
℃環境下で2以上であることが好ましい。比誘電率が2
以上の誘電体の具体例としては、ポリテトラフルオロエ
チレン、ガラス、金属酸化膜等を挙げることができる。
さらに、高密度の放電プラズマを安定して発生させるた
めには、比誘電率が10以上の固体誘電体を用いること
が好ましい。The solid dielectric has a relative dielectric constant of 25.
It is preferably 2 or more in an environment of ° C. Dielectric constant is 2
Specific examples of the above dielectric include polytetrafluoroethylene, glass, and a metal oxide film.
Further, in order to stably generate high-density discharge plasma, it is preferable to use a solid dielectric having a relative dielectric constant of 10 or more.
【0019】比誘電率の上限は特に限定されるものでは
ないが、現実の材料では18500程度のものが知られ
ている。比誘電率が10以上の固体誘電体としては、酸
化チタン5〜50重量%、酸化アルミニウム50〜95
重量%で混合された金属酸化物被膜、または、酸化ジル
コニウムを含有する金属酸化物被膜からなり、その被膜
の厚みが10〜1000μmであるものを用いることが
好ましい。The upper limit of the relative dielectric constant is not particularly limited, but about 18500 is known as a real material. As a solid dielectric having a relative dielectric constant of 10 or more, titanium oxide is 5 to 50% by weight, and aluminum oxide is 50 to 95%.
It is preferable to use a metal oxide film mixed at a weight% or a metal oxide film containing zirconium oxide and having a thickness of 10 to 1000 μm.
【0020】上記電極間の距離は、雰囲気ガスの圧力、
酸素濃度、固体誘電体の厚さ、印加電圧の大きさ、プラ
ズマ放電処理されたフィルムを利用する目的等を考慮し
て決定される。電極間距離が小さいほど安定した放電プ
ラズマが得られる傾向にあるが、0.5〜50mmであ
ることが好ましい。0.5mm未満では、電極間におけ
る雰囲気ガス中の酸素濃度の変動が大きく、親水化処理
が不均一になり易い。また、電極間に設置する被処理物
の厚さが限定されてしまう。一方、50mmを超える
と、均一な放電プラズマを発生させることが困難であ
る。The distance between the electrodes is determined by the pressure of the atmospheric gas,
It is determined in consideration of the oxygen concentration, the thickness of the solid dielectric, the magnitude of the applied voltage, the purpose of using the film subjected to the plasma discharge treatment, and the like. The smaller the distance between the electrodes is, the more stable discharge plasma tends to be obtained, but it is preferably 0.5 to 50 mm. If it is less than 0.5 mm, the variation in oxygen concentration in the atmosphere gas between the electrodes is large, and the hydrophilic treatment tends to be uneven. In addition, the thickness of the object to be processed provided between the electrodes is limited. On the other hand, if it exceeds 50 mm, it is difficult to generate uniform discharge plasma.
【0021】また、印加する電圧はパルス電圧が好まし
い。パルス波形はインパルス型、方形波型、変調型の波
形のいずれでもよく、さらに印加電圧が正負の繰り返し
であっても、正又は負のいずれかの極性側に電圧が印加
される片波状の波形でもよい。The voltage to be applied is preferably a pulse voltage. The pulse waveform may be any of an impulse waveform, a square waveform waveform, and a modulation waveform, and even if the applied voltage is a positive / negative repetition, a one-sided waveform in which a voltage is applied to either the positive or negative polarity side. May be.
【0022】パルス電圧の電圧立ち上がり時間は100
μs以下であることが好ましい。このような高速のパル
ス電圧を印加することは高密度のプラズマの発生につな
がり、処理を高速連続化するうえで重要である。ここ
で、パルス電圧の電圧立ち上がり時間とは、電圧変化が
連続して正である時間を意味する。The voltage rise time of the pulse voltage is 100
μs or less is preferable. Application of such a high-speed pulse voltage leads to generation of high-density plasma, and is important for achieving high-speed continuous processing. Here, the voltage rise time of the pulse voltage means a time during which the voltage change is continuously positive.
【0023】パルス電圧の電圧立ち上がり時間が短いほ
どプラズマ発生の際のガスの電離が効率よく行われ、パ
ルス電圧の電圧の立ち上がり時間が100μsを超える
と放電状態がアークに移行しやすく不安定なものとな
り、パルス電圧による高密度プラズマ状態を期待できな
くなる。また、パルス電圧の電圧立ち上がり時間は早い
ほうがよいが、常圧でプラズマが発生する程度の大きさ
の電界強度を有し、かつパルス電圧の電圧立ち上がり時
間が早い電界を発生させる装置には制約があり、現実的
には40ns未満の電圧立ち上がり時間のパルス電圧を
実現することは困難である。より好ましくは、パルス電
圧の電圧立ち上がり時間は50ns〜5μsである。The shorter the rise time of the pulse voltage is, the more efficiently the gas is ionized at the time of plasma generation, and if the rise time of the pulse voltage exceeds 100 μs, the discharge state is likely to shift to an arc and is unstable. Therefore, a high-density plasma state due to the pulse voltage cannot be expected. Also, it is better that the pulse voltage rise time is short, but there are restrictions on the device that has an electric field strength enough to generate plasma at normal pressure and generates an electric field with a fast pulse voltage rise time. In practice, it is difficult to realize a pulse voltage having a voltage rise time of less than 40 ns. More preferably, the voltage rise time of the pulse voltage is 50 ns to 5 μs.
【0024】また、パルス電圧の電圧立ち下がり時間も
急峻であることが好ましく、パルス電圧の電圧立ち上が
り時間と同様の100μs以下のタイムスケールである
ことが好ましい。パルス電界発生技術によっても異なる
が、例えば、本発明の実施例で使用した電源装置では、
パルス電圧の電圧立ち上がり時間と電圧立ち下がり時間
を同じ時間に設定できる。Further, the voltage fall time of the pulse voltage is preferably steep, and the time scale is preferably 100 μs or less, which is the same as the voltage rise time of the pulse voltage. Although it differs depending on the pulse electric field generation technology, for example, in the power supply device used in the embodiment of the present invention,
The voltage rise time and the voltage fall time of the pulse voltage can be set to the same time.
【0025】パルス電圧の周波数は、0.5〜100k
Hzであることが好ましい。0.5kHz未満であると
プラズマ密度が低いため処理に時間がかかりすぎ、10
0kHzを超えるとアーク放電が発生しやすくなる。よ
り好ましくは、1kHz以上であり、このような高周波
数のパルス電圧を印加することにより、処理速度を大き
く向上させることができる。The frequency of the pulse voltage is 0.5 to 100 k
Hz is preferable. If the frequency is less than 0.5 kHz, the processing takes too much time due to the low plasma density.
If it exceeds 0 kHz, arc discharge is likely to occur. More preferably, the frequency is 1 kHz or more. By applying such a high-frequency pulse voltage, the processing speed can be greatly improved.
【0026】また、上記パルス電圧におけるパルス継続
時間は1〜1000μsであることが好ましい。1μs
未満であると放電が不安定なものとなり、1000μs
を超えるとアーク放電に移行しやすくなる。より好まし
くは、3〜200μsである。ここで、パルス継続時間
とは、ON、OFFの繰り返しからなるパルス電圧にお
ける、パルスが連続する時間を意味する。The pulse duration of the pulse voltage is preferably 1 to 1000 μs. 1 μs
When the discharge time is less than 1,000 μs, the discharge becomes unstable.
When it exceeds, it is easy to shift to arc discharge. More preferably, it is 3 to 200 μs. Here, the pulse continuation time means the time during which a pulse is continuous in a pulse voltage consisting of repetition of ON and OFF.
【0027】さらに、放電を安定させるためには、放電
時間1ms内に、少なくとも1μs継続するOFF時間
を有することが好ましい。また、パルス電圧の印加にお
いて、直流を重畳してもよい。Further, in order to stabilize the discharge, it is preferable to have an OFF time lasting at least 1 μs within a discharge time of 1 ms. In applying the pulse voltage, a direct current may be superimposed.
【0028】プラズマ放電を発生する雰囲気ガスは、少
なくとも酸素ガスを含むガスである。酸素ガス以外の混
合ガスとしては、窒素ガス、アルゴンガスなどが挙げら
れ、酸素ガスと酸素以外のガスの体積比率は1:99〜
99:1の範囲でほぼ任意の比率で混合することができ
るが、混合ガス中の酸素ガス濃度が1体積%未満では親
水化処理の処理速度が低下するため不適である。The atmosphere gas generating the plasma discharge is a gas containing at least oxygen gas. Examples of the mixed gas other than the oxygen gas include a nitrogen gas and an argon gas, and the volume ratio of the oxygen gas to the gas other than oxygen is 1:99 to
The mixture can be mixed at an almost arbitrary ratio in the range of 99: 1. However, if the oxygen gas concentration in the mixed gas is less than 1% by volume, the treatment speed of the hydrophilization treatment is lowered, which is not suitable.
【0029】また、プラズマ放電は雰囲気ガスが酸素単
独であっても可能であるが、酸素単独とすると被処理体
である疎水性樹脂フィルムへのダメージ(引火の恐れな
ど)が大きくなる傾向にあるため、混合ガス中の酸素ガ
ス濃度は80体積%以下であることが好ましく、さらに
は、50体積%以下であることが好ましい。酸素の混合
による親水化処理速度の向上は、酸素濃度を10体積%
以上にしても大きな向上はなく、混合比が50体積%以
上とすると基材へのダメージが大きくなる傾向にある。The plasma discharge can be performed even when the atmospheric gas is oxygen alone. However, when the oxygen gas is used alone, the hydrophobic resin film, which is the object to be processed, is liable to be damaged (for example, there is a risk of ignition). Therefore, the oxygen gas concentration in the mixed gas is preferably 80% by volume or less, and more preferably 50% by volume or less. The improvement of the hydrophilization treatment speed by mixing oxygen is achieved by increasing the oxygen concentration to 10% by volume
Even with the above, there is no significant improvement, and when the mixing ratio is 50% by volume or more, damage to the base material tends to increase.
【0030】本発明における疎水性樹脂フィルムとは、
その表面の水による接触角が50度以上を示す樹脂フィ
ルムを意味する。このうち、液晶ディスプレイ用途の各
種フィルム(例えば、偏光板用保護フィルムなど)につ
いては、高い透明性が必要となり、このような樹脂とし
ては、特に限定されるものでないが、例えば、オレフィ
ン系樹脂、アクリル系樹脂、ポリカーボネートやポリサ
ルホンなどのエンジニアリングプラスチックなどが挙げ
られる。The hydrophobic resin film in the present invention is:
It means a resin film whose surface has a contact angle of 50 degrees or more with water. Among them, various films for liquid crystal display applications (for example, protective films for polarizing plates, etc.) require high transparency, and such resins are not particularly limited. For example, olefin resins, Examples include acrylic resins, engineering plastics such as polycarbonate and polysulfone.
【0031】上記オレフィン系樹脂としては、ノルボル
ネン系樹脂などのシクロオレフィンの重合体や、オレフ
ィン類に無水マレイン酸やN−アルキルマレイミドなど
を共重合したものなどが挙げられる。また、上記アクリ
ル系樹脂としては、メチルメタクリレートの重合体やそ
の共重合体およびノルボルナン骨格を有するアルコール
成分とアクリル酸をエステル化して得られるアクリル酸
エステルを単独重合もしくは共重合したものなどが挙げ
られる。Examples of the olefin resin include cycloolefin polymers such as norbornene resins, and copolymers of olefins with maleic anhydride or N-alkylmaleimide. Examples of the acrylic resin include those obtained by homopolymerizing or copolymerizing an acrylic acid ester obtained by esterifying acrylic acid with an alcohol component having a norbornane skeleton and a polymer of methyl methacrylate or a copolymer thereof. .
【0032】特に、シクロオレフィン系樹脂フィルム
は、透明性等の光学特性に優れ、耐熱性や耐久性にも優
れており、液晶ディスプレイの偏光板用保護フィルムに
適している。In particular, a cycloolefin resin film is excellent in optical properties such as transparency, heat resistance and durability, and is suitable for a protective film for a polarizing plate of a liquid crystal display.
【0033】シクロオレフィン系樹脂とは、例えば、ノ
ルボルネン系樹脂やジシクロペンタジエン系樹脂などで
あり、好ましくは不飽和結合が水素添加されたものであ
り、例えば、ノルボルネン系モノマーの開環重合体の水
素添加物、2種類以上のノルボルネン系モノマーの共重
合体の水素添加物、ノルボルネン系モノマーとオレフィ
ン系モノマー(エチレン、α−オレフィンなど)の共重
合体の水素添加物、ノルボルネン系モノマーと環状オレ
フィン系モノマー(シクロペンテン、シクロオクテン、
5,6−ジヒドロジシクロペンタジエンなど)との共重
合体の水素添加物、これ等の変性物などがあり、具体的
には、日本ゼオン社製の商品名:ZEONEX、ZEO
NOR、JSR(ジェイエスアール)社製の商品名:A
RTON、日立化成社製の商品名:OPTOREZ、三
井化学社製の商品名:APELなどが市販されている。The cycloolefin-based resin is, for example, a norbornene-based resin or a dicyclopentadiene-based resin, preferably a hydrogenated unsaturated bond. Hydrogenated product, hydrogenated product of a copolymer of two or more norbornene-based monomers, hydrogenated product of a copolymer of norbornene-based monomer and olefin-based monomer (ethylene, α-olefin, etc.), norbornene-based monomer and cyclic olefin System monomers (cyclopentene, cyclooctene,
5,6-dihydrodicyclopentadiene) and modified products thereof. Specific examples are trade names of ZEONEX and ZEO manufactured by Zeon Corporation.
NOR, Product name: A made by JSR (JSR) Ltd.
RTON, trade name: OPTOREZ manufactured by Hitachi Chemical Co., Ltd., APEL manufactured by Mitsui Chemicals, Inc. are commercially available.
【0034】(作用)本発明のような常圧プラズマ放電
処理において、少なくとも酸素ガスを含む雰囲気中でプ
ラズマ処理を行うことにより、疎水性樹脂フィルムの表
面が高度に親水化され、かつフィルムを傷ることもな
く、接着性を改善することが可能となる。(Function) In the normal-pressure plasma discharge treatment of the present invention, by performing the plasma treatment in an atmosphere containing at least oxygen gas, the surface of the hydrophobic resin film becomes highly hydrophilic and the film is damaged. Without this, it is possible to improve the adhesiveness.
【0035】[0035]
【発明の実施の形態】以下に、本発明の実施例および比
較例を示すが、本発明はこれ等の実施例に限定されるも
のではない。DESCRIPTION OF THE PREFERRED EMBODIMENTS Examples of the present invention and comparative examples are shown below, but the present invention is not limited to these examples.
【0036】(実施例1)シクロオレフィン樹脂フィル
ムとして、JSR社のノルボルネン系樹脂(ARTON
Gグレード)を溶液キャストして得た50μmのフィ
ルムを用いた。この未処理のノルボルネン系樹脂フィル
ムについて、その表面の水による接触角を、接触角測定
装置(FACE社製の接触角計 CA−X150型)に
より測定したところ、その接触角は79度であった。(Example 1) As a cycloolefin resin film, a norbornene resin (ARTON) manufactured by JSR Corporation was used.
G grade) obtained by solution casting was used. The contact angle of this untreated norbornene-based resin film with water was measured by a contact angle measuring device (contact angle meter CA-X150, manufactured by FACE), and the contact angle was 79 degrees. .
【0037】図1はプラズマ放電処理装置を示す。金属
製チャンバー1内に、上部電極2(ステンレス(SUS
304)製、大きさ:150mm×100mm)と、下
部電極3(ステンレス(SUS304)製、大きさ:1
50mm×100mm)が金属チャンバー1と絶縁され
た状態で配置されている。電極間距離は2mmである。
上部電極2及び下部電極3の電極対向面は、1.5mm
厚のAl2 O3 の溶射膜4によって被覆されている。FIG. 1 shows a plasma discharge processing apparatus. An upper electrode 2 (stainless steel (SUS
304), size: 150 mm × 100 mm) and lower electrode 3 (stainless steel (SUS304), size: 1)
(50 mm × 100 mm) are arranged in a state insulated from the metal chamber 1. The distance between the electrodes is 2 mm.
The electrode facing surfaces of the upper electrode 2 and the lower electrode 3 are 1.5 mm
It is covered with a thick Al 2 O 3 spray coating 4.
【0038】上記ノルボルネン系樹脂フィルム7を上部
電極2と下部電極3の中間に配置した後、装置内が1T
orr(約133Pa)になるまで油回転ポンプで排気
を行った。排気後、アルゴンガス:酸素ガスを70:3
0の体積比で混合したガスを、ガス導入管5から装置内
が760Torr(約1.01×105 Pa)になるま
で導入した。After the norbornene-based resin film 7 is disposed between the upper electrode 2 and the lower electrode 3, the inside of the apparatus is reduced to 1T.
The pump was evacuated with an oil rotary pump until the pressure reached orr (about 133 Pa). After evacuation, argon gas: oxygen gas 70: 3
A gas mixed at a volume ratio of 0 was introduced from the gas introduction pipe 5 until the inside of the apparatus reached 760 Torr (about 1.01 × 10 5 Pa).
【0039】パルス電源6より電極間に立ち上がり時間
5μs、パルス幅100μs、周波数10kHz、電圧
±5kVの交流パルス電圧を前記電極間に印加してプラ
ズマ放電を行い、ノルボルネン系樹脂フィルム7の両面
にプラズマ放電処理を行った。なお、ノルボルネン系樹
脂フィルム7は、上部電極2と下部電極3との間を4m
/分の速度で移動させながらプラズマ放電処理を行っ
た。An AC pulse voltage having a rise time of 5 μs, a pulse width of 100 μs, a frequency of 10 kHz, and a voltage of ± 5 kV is applied between the electrodes from the pulse power source 6 to generate plasma discharge, and the plasma is applied to both sides of the norbornene resin film 7. Discharge treatment was performed. The norbornene-based resin film 7 has a distance of 4 m between the upper electrode 2 and the lower electrode 3.
The plasma discharge treatment was performed while moving at a speed of / min.
【0040】(実施例2)窒素ガス:酸素ガスの体積比
を70:30としたこと以外は、実施例1同様にしてノ
ルボルネン系樹脂フィルム7にプラズマ放電処理を行っ
た。Example 2 A plasma discharge treatment was performed on a norbornene-based resin film 7 in the same manner as in Example 1 except that the volume ratio of nitrogen gas: oxygen gas was 70:30.
【0041】(比較例1)処理強度0.4kW、速度
3.0m/分でノルボルネン系樹脂フィルム7の両面に
コロナ放電処理を行った。コロナ放電処理は、春日電機
社製のコロナ放電処理装置(高周波電源装置AGI−0
20)を使用した。(Comparative Example 1) Corona discharge treatment was performed on both surfaces of the norbornene resin film 7 at a treatment intensity of 0.4 kW and a speed of 3.0 m / min. The corona discharge treatment is performed using a corona discharge treatment device (high-frequency power supply AGI-0) manufactured by Kasuga Electric Co., Ltd.
20) was used.
【0042】上記実施例1、2および比較例1により親
水化処理したノルボルネン系樹脂フィルムについて、そ
の外観を目視にて評価した。また、この親水化処理した
ノルボルネン系樹脂フィルムについて、その表面の水に
よる接触角を、接触角測定装置により測定した。その結
果を表1に示す。The appearance of the norbornene-based resin film subjected to the hydrophilization treatment in Examples 1 and 2 and Comparative Example 1 was visually evaluated. The contact angle of the surface of the norbornene-based resin film with water was measured by a contact angle measuring device. Table 1 shows the results.
【0043】[0043]
【表1】 [Table 1]
【0044】さらに、上記実施例1、2および比較例1
により親水化処理したノルボルネン系樹脂フィルムを用
いて、下記の方法で作製した偏光板について、下記の方
法で耐久性試験を行い、その透過率変化および偏光度変
化を評価した。その結果を表2に示す。Further, the above Examples 1 and 2 and Comparative Example 1
Using a norbornene-based resin film hydrophilized by the above method, a polarizing plate produced by the following method was subjected to a durability test by the following method to evaluate a change in transmittance and a change in degree of polarization. Table 2 shows the results.
【0045】(偏光板の作製)厚み75μmで、鹸化度
99%のポリビニルアルコール(PVA)未延伸フィル
ムを室温の水で洗浄した後、縦一軸の5倍延伸を行っ
た。この延伸フィルムを、緊張状態を保持したまま、ヨ
ウ素0.5重量%とヨウ化カリウム5重量%とからなる
水溶液に浸漬し二色性染料を吸着させた。さらに、ホウ
酸10重量%とヨウ化カリウム10重量%とからなる5
0℃の水溶液で5分間架橋処理を行い、3種類(実施例
1、2および比較例1)の偏光子を得た。(Preparation of Polarizing Plate) An unstretched polyvinyl alcohol (PVA) film having a thickness of 75 μm and a saponification degree of 99% was washed with water at room temperature, and then stretched 5 times in the longitudinal uniaxial direction. The stretched film was immersed in an aqueous solution containing 0.5% by weight of iodine and 5% by weight of potassium iodide while maintaining the tension state to adsorb the dichroic dye. Furthermore, 5% of boric acid and 10% by weight of potassium iodide are used.
Cross-linking treatment was performed for 5 minutes with an aqueous solution at 0 ° C. to obtain three types of polarizers (Examples 1 and 2 and Comparative Example 1).
【0046】得られた偏光子(実施例1、2および比較
例1)の両面に、水性ウレタン接着剤を用いてウエット
ラミネート法により、上記実施例および比較例により親
水化処理したノルボルネン系樹脂フィルムを保護フィル
ムとして貼り付けた。これを45℃のギアーオーブンへ
60時間投入して乾燥と接着剤の養生を行って、3種類
(実施例1、2および比較例1)の偏光板を作製した。A norbornene-based resin film hydrophilized on the both sides of the obtained polarizer (Examples 1 and 2 and Comparative Example 1) by wet lamination using an aqueous urethane adhesive according to the above Examples and Comparative Examples As a protective film. This was put into a 45 ° C. gear oven for 60 hours to perform drying and curing of the adhesive, thereby producing three types of polarizing plates (Examples 1, 2 and Comparative Example 1).
【0047】なお、上記水性ウレタン接着剤は、水性ウ
レタン接着剤の主剤(東洋モートン社製の品番:EL−
436A)10重量部と硬化剤(東洋モートン社製の品
番:EL−436B)3重量部とを混合し、これをイオ
ン交換水で100重量%に希釈して得られた2液型の水
性ウレタン接着剤を使用した。いる。The water-based urethane adhesive is a main component of the water-based urethane adhesive (product number: EL- manufactured by Toyo Morton Co., Ltd.).
436A) 10 parts by weight and 3 parts by weight of a curing agent (product number: EL-436B manufactured by Toyo Morton Co., Ltd.) are mixed and diluted to 100% by weight with ion-exchanged water to obtain a two-part aqueous urethane. An adhesive was used. I have.
【0048】(耐久性試験)上記3種類(実施例1、2
及び比較例1)の偏光板から、50mm×50mmの正
方形の試験片を一辺が偏光子の吸収軸と平行になるよう
に打ち抜いて、3種類(実施例1、2及び比較例1)の
試験片を作製し、各試験片について透過率変化および偏
光度変化を測定した。測定条件は、各試験片を90℃で
dryおよび60℃で90%RHの雰囲気において50
0時間放置し、試験前および500時間放置後の透過率
変化および偏光度変化を測定した。(Durability test) The above three types (Examples 1 and 2)
From the polarizing plate of Comparative Example 1), a square test piece of 50 mm × 50 mm was punched out so that one side thereof was parallel to the absorption axis of the polarizer, and three types of tests (Examples 1, 2 and Comparative Example 1) were performed. A test piece was prepared, and a change in transmittance and a change in polarization degree were measured for each test piece. The measurement conditions were as follows: each test piece was dried at 90 ° C. in an atmosphere of
After leaving for 0 hours, the change in transmittance and the change in polarization degree before the test and after leaving for 500 hours were measured.
【0049】なお、透過率変化の測定には分光測色計
(東京電色社製のTC−1800)を使用し、Y値で測
定した。The transmittance change was measured by a Y-value using a spectrophotometer (TC-1800 manufactured by Tokyo Denshoku Co., Ltd.).
【0050】また、偏光度変化は、2枚の偏光板を用い
て、平行および直交の透過率を測定し、偏光度=〔(H
1−H2)/(H1+H2)〕1/2 なる式を用いて測定
した。ここで、H1は平行透過率であって、偏光子の吸
収軸が平行になるように2枚重ねて測定した透過率であ
る。また、H2は直交透過率であって、偏光子の吸収軸
が直角になるように2枚重ねて測定した透過率である。The change in the degree of polarization was measured by measuring the parallel and orthogonal transmittance using two polarizing plates, and the degree of polarization = [(H
Was measured using a 1-H2) / (H1 + H2) ] 1/2 becomes equation. Here, H1 is a parallel transmittance, which is a transmittance measured by overlapping two polarizers so that their absorption axes are parallel. H2 is the orthogonal transmittance, which is the transmittance measured by stacking two polarizers so that the absorption axes of the polarizers are at right angles.
【0051】[0051]
【表2】 [Table 2]
【0052】[0052]
【発明の効果】上述のように、本発明の疎水性樹脂フィ
ルム表面の親水化処理方法によれば、疎水性樹脂フィル
ムの表面が高度に親水化されかつフィルムを傷ることも
なく、接着性を改善することができるAs described above, according to the method for hydrophilizing the surface of a hydrophobic resin film of the present invention, the surface of the hydrophobic resin film is highly hydrophilized and the surface of the hydrophobic resin film is not damaged, and the adhesive property is improved. Can be improved
【0053】特に、本発明の親水化処理方法により表面
が親水化されたシクロオレフィン系樹脂フィルム、とり
わけノルボルネン系樹脂フィルムは、接着剤との親和性
が高く、特に液晶ディスプレイ用途の偏光板用保護フィ
ルムとして用いると、偏光子との接着強度が高く、高温
あるいは高温多湿環境下においても偏光度の低下がなく
好適に使用できる。In particular, a cycloolefin-based resin film, particularly a norbornene-based resin film, whose surface has been hydrophilized by the hydrophilization treatment method of the present invention has a high affinity with an adhesive, and is particularly useful for protecting a polarizing plate for a liquid crystal display. When used as a film, the adhesive strength to a polarizer is high, and the film can be suitably used without a decrease in the degree of polarization even in a high temperature or high temperature and high humidity environment.
【図1】本発明の一実施態様を示す説明図である。FIG. 1 is an explanatory diagram showing one embodiment of the present invention.
【符号の説明】 1 金属製チャンバー 2 上部電極 3 下部電極 4 溶射膜 5 ガス導入管 6 パルス電源 7 疎水性樹脂フィルム(ノルボルネン樹脂フィルム)[Description of Signs] 1 Metal chamber 2 Upper electrode 3 Lower electrode 4 Thermal spray film 5 Gas introduction tube 6 Pulse power supply 7 Hydrophobic resin film (norbornene resin film)
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 FI テーマコート゛(参考) // C08L 65:00 G02B 1/10 Z Fターム(参考) 2H049 BA02 BA27 BB22 BB43 BB51 BC01 BC03 BC22 2K009 BB12 DD17 EE00 4F073 AA01 BA06 BB01 DA01 HA01 HA12 ──────────────────────────────────────────────────続 き Continued on the front page (51) Int.Cl. 7 Identification symbol FI theme coat ゛ (reference) // C08L 65:00 G02B 1/10 Z F term (reference) 2H049 BA02 BA27 BB22 BB43 BB51 BC01 BC03 BC22 2K009 BB12 DD17 EE00 4F073 AA01 BA06 BB01 DA01 HA01 HA12
Claims (6)
向電極の少なくとも一方の対向面に固体誘電体を設置
し、上記対向電極と固体誘電体の間又は固体誘電体同士
の間に疎水性樹脂フィルムを配置し、当該対向電極間に
電圧を印加することによりプラズマ放電を発生して上記
疎水性樹脂フィルム表面を親水化処理する方法におい
て、少なくとも酸素ガスを含む雰囲気中でプラズマ放電
を行うことを特徴とする疎水性樹脂フィルム表面の親水
化処理方法。A solid dielectric is provided on at least one opposing surface of a counter electrode under a pressure atmosphere near atmospheric pressure, and a hydrophobic resin is provided between the counter electrode and the solid dielectric or between the solid dielectrics. In the method of arranging a film and generating a plasma discharge by applying a voltage between the opposed electrodes to hydrophilize the hydrophobic resin film surface, the plasma discharge is performed in an atmosphere containing at least oxygen gas. A method for hydrophilizing the surface of a hydrophobic resin film.
%であることを特徴とする請求項1に記載の疎水性樹脂
フィルム表面の親水化処理方法。2. The oxygen gas in the atmosphere has a volume fraction of 1 to 99.
%. The method for hydrophilizing the surface of a hydrophobic resin film according to claim 1, wherein
圧であることを特徴とする請求項1または2に記載の疎
水性樹脂フィルム表面の親水化処理方法。3. The method for hydrophilizing the surface of a hydrophobic resin film according to claim 1, wherein the voltage applied between the opposed electrodes is a pulse voltage.
0μs以下、周波数0.5〜100kHzであることを
特徴とする請求項3に記載の疎水性樹脂フィルム表面の
親水化処理方法。4. A pulse voltage having a voltage rise time of 10
The method for hydrophilizing the surface of a hydrophobic resin film according to claim 3, wherein the frequency is 0.5 μs or less and the frequency is 0.5 to 100 kHz.
系樹脂フィルムであることを特徴とする請求項1〜4の
いずれか1項に記載の疎水性樹脂フィルム表面の親水化
処理方法。5. The method according to claim 1, wherein the hydrophobic resin film is a cycloolefin-based resin film.
系樹脂フィルムよりなる偏光板用保護フィルムであるこ
とを特徴とする請求項5に記載の疎水性樹脂フィルム表
面の親水化処理方法。6. The method for hydrophilizing the surface of a hydrophobic resin film according to claim 5, wherein the hydrophobic resin film is a protective film for a polarizing plate comprising a cycloolefin resin film.
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JP2001029828A JP2002226616A (en) | 2001-02-06 | 2001-02-06 | Hydrophilizing method for surface of hydrophobic resin film |
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Application Number | Priority Date | Filing Date | Title |
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JP2001029828A JP2002226616A (en) | 2001-02-06 | 2001-02-06 | Hydrophilizing method for surface of hydrophobic resin film |
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JP2002226616A true JP2002226616A (en) | 2002-08-14 |
Family
ID=18894130
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Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2006129656A1 (en) * | 2005-05-31 | 2006-12-07 | Sekisui Chemical Co., Ltd. | Multilayer optical compensation film |
JP2008088319A (en) * | 2006-10-03 | 2008-04-17 | Nagaoka Univ Of Technology | Bonding method of resin material |
-
2001
- 2001-02-06 JP JP2001029828A patent/JP2002226616A/en not_active Withdrawn
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2006129656A1 (en) * | 2005-05-31 | 2006-12-07 | Sekisui Chemical Co., Ltd. | Multilayer optical compensation film |
JP2008088319A (en) * | 2006-10-03 | 2008-04-17 | Nagaoka Univ Of Technology | Bonding method of resin material |
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