JP2002223069A - Method for manufacturing printed board - Google Patents
Method for manufacturing printed boardInfo
- Publication number
- JP2002223069A JP2002223069A JP2001016674A JP2001016674A JP2002223069A JP 2002223069 A JP2002223069 A JP 2002223069A JP 2001016674 A JP2001016674 A JP 2001016674A JP 2001016674 A JP2001016674 A JP 2001016674A JP 2002223069 A JP2002223069 A JP 2002223069A
- Authority
- JP
- Japan
- Prior art keywords
- terminal
- copper foil
- printed circuit
- via hole
- circuit board
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 238000000034 method Methods 0.000 title claims abstract description 26
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 15
- 239000004020 conductor Substances 0.000 claims abstract description 39
- 239000000758 substrate Substances 0.000 claims abstract description 29
- 238000007747 plating Methods 0.000 claims abstract description 26
- 238000009713 electroplating Methods 0.000 claims description 21
- 239000000853 adhesive Substances 0.000 claims description 19
- 230000001070 adhesive effect Effects 0.000 claims description 19
- 230000015572 biosynthetic process Effects 0.000 claims description 5
- 238000009413 insulation Methods 0.000 claims description 4
- 230000000149 penetrating effect Effects 0.000 claims description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 abstract description 41
- 239000011889 copper foil Substances 0.000 abstract description 41
- 230000003014 reinforcing effect Effects 0.000 abstract description 15
- 239000007788 liquid Substances 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 30
- 239000004088 foaming agent Substances 0.000 description 8
- 239000012790 adhesive layer Substances 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- 238000010438 heat treatment Methods 0.000 description 5
- 239000004744 fabric Substances 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- -1 polyethylene terephthalate Polymers 0.000 description 4
- 239000003822 epoxy resin Substances 0.000 description 3
- 239000006260 foam Substances 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 229920000647 polyepoxide Polymers 0.000 description 3
- 229920000139 polyethylene terephthalate Polymers 0.000 description 3
- 239000005020 polyethylene terephthalate Substances 0.000 description 3
- 230000001681 protective effect Effects 0.000 description 3
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 2
- ATRRKUHOCOJYRX-UHFFFAOYSA-N Ammonium bicarbonate Chemical compound [NH4+].OC([O-])=O ATRRKUHOCOJYRX-UHFFFAOYSA-N 0.000 description 2
- 229920002799 BoPET Polymers 0.000 description 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- 239000001099 ammonium carbonate Substances 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 230000002787 reinforcement Effects 0.000 description 2
- XXANGWUMCMNLJD-UHFFFAOYSA-N 1-(benzenesulfonamido)-3-(benzenesulfonamidocarbamoylamino)oxyurea Chemical compound C=1C=CC=CC=1S(=O)(=O)NNC(=O)NONC(=O)NNS(=O)(=O)C1=CC=CC=C1 XXANGWUMCMNLJD-UHFFFAOYSA-N 0.000 description 1
- CQSQUYVFNGIECQ-UHFFFAOYSA-N 1-n,4-n-dimethyl-1-n,4-n-dinitrosobenzene-1,4-dicarboxamide Chemical compound O=NN(C)C(=O)C1=CC=C(C(=O)N(C)N=O)C=C1 CQSQUYVFNGIECQ-UHFFFAOYSA-N 0.000 description 1
- NBOCQTNZUPTTEI-UHFFFAOYSA-N 4-[4-(hydrazinesulfonyl)phenoxy]benzenesulfonohydrazide Chemical compound C1=CC(S(=O)(=O)NN)=CC=C1OC1=CC=C(S(=O)(=O)NN)C=C1 NBOCQTNZUPTTEI-UHFFFAOYSA-N 0.000 description 1
- 229910000013 Ammonium bicarbonate Inorganic materials 0.000 description 1
- 239000004156 Azodicarbonamide Substances 0.000 description 1
- MWRWFPQBGSZWNV-UHFFFAOYSA-N Dinitrosopentamethylenetetramine Chemical compound C1N2CN(N=O)CN1CN(N=O)C2 MWRWFPQBGSZWNV-UHFFFAOYSA-N 0.000 description 1
- 239000003522 acrylic cement Substances 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 150000001335 aliphatic alkanes Chemical class 0.000 description 1
- 235000012538 ammonium bicarbonate Nutrition 0.000 description 1
- 235000012501 ammonium carbonate Nutrition 0.000 description 1
- CAMXVZOXBADHNJ-UHFFFAOYSA-N ammonium nitrite Chemical compound [NH4+].[O-]N=O CAMXVZOXBADHNJ-UHFFFAOYSA-N 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 230000003078 antioxidant effect Effects 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 150000001540 azides Chemical class 0.000 description 1
- XOZUGNYVDXMRKW-AATRIKPKSA-N azodicarbonamide Chemical compound NC(=O)\N=N\C(N)=O XOZUGNYVDXMRKW-AATRIKPKSA-N 0.000 description 1
- 235000019399 azodicarbonamide Nutrition 0.000 description 1
- 229910052788 barium Inorganic materials 0.000 description 1
- 229920001400 block copolymer Polymers 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000003851 corona treatment Methods 0.000 description 1
- 239000003431 cross linking reagent Substances 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- UMNKXPULIDJLSU-UHFFFAOYSA-N dichlorofluoromethane Chemical compound FC(Cl)Cl UMNKXPULIDJLSU-UHFFFAOYSA-N 0.000 description 1
- 229940099364 dichlorofluoromethane Drugs 0.000 description 1
- 150000001993 dienes Chemical class 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 150000002429 hydrazines Chemical class 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 239000004745 nonwoven fabric Substances 0.000 description 1
- 230000010355 oscillation Effects 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 239000000123 paper Substances 0.000 description 1
- 238000009832 plasma treatment Methods 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229920006267 polyester film Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000012286 potassium permanganate Substances 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- DUIOPKIIICUYRZ-UHFFFAOYSA-N semicarbazide Chemical compound NNC(N)=O DUIOPKIIICUYRZ-UHFFFAOYSA-N 0.000 description 1
- 150000003349 semicarbazides Chemical class 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000013464 silicone adhesive Substances 0.000 description 1
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 1
- 235000017557 sodium bicarbonate Nutrition 0.000 description 1
- 239000012279 sodium borohydride Substances 0.000 description 1
- 229910000033 sodium borohydride Inorganic materials 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 238000005476 soldering Methods 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- CYRMSUTZVYGINF-UHFFFAOYSA-N trichlorofluoromethane Chemical compound FC(Cl)(Cl)Cl CYRMSUTZVYGINF-UHFFFAOYSA-N 0.000 description 1
- 229940029284 trichlorofluoromethane Drugs 0.000 description 1
Landscapes
- Production Of Multi-Layered Print Wiring Board (AREA)
- Printing Elements For Providing Electric Connections Between Printed Circuits (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、プリント基板の製
造方法に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a printed circuit board.
【0002】[0002]
【従来の技術】多層回路基板を製造するための基礎技術
として、プリント基板の絶縁層に貫通形成したビアホー
ルに導電性材料を充填して、プリント基板の両側の回路
を電気的に接続する方法が知られている。この際、ビア
ホールに導電性材料を充填する方法として、例えば電気
メッキ法を使用することができる。これは、例えば図5
に示すように、ビアホール102を形成させた片面銅張
積層板101をメッキ液103に浸漬し、銅箔104を
一方の電極として使用してビアホール102内にメッキ
金属105を析出させることにより、ビアホール102
の充填を行うものである。2. Description of the Related Art As a basic technique for manufacturing a multilayer circuit board, a method of filling a via hole formed through an insulating layer of a printed board with a conductive material and electrically connecting circuits on both sides of the printed board is known. Are known. At this time, as a method of filling the via hole with a conductive material, for example, an electroplating method can be used. This is, for example, FIG.
As shown in FIG. 1, the single-sided copper-clad laminate 101 having the via hole 102 formed therein is immersed in a plating solution 103, and a plating metal 105 is deposited in the via hole 102 by using the copper foil 104 as one electrode. 102
Is to be filled.
【0003】ところで、上述のように電気メッキを行う
際には、銅箔104にメッキ液103が付着するのを防
止する必要がある。このため、銅箔104の表面に全面
に例えばPET(ポリエチレンテレフタラート)フィル
ム106を貼り付けて保護していた。By the way, when performing the electroplating as described above, it is necessary to prevent the plating solution 103 from adhering to the copper foil 104. For this reason, for example, a PET (polyethylene terephthalate) film 106 is attached to the entire surface of the copper foil 104 to protect it.
【0004】[0004]
【発明が解決しようとする課題】ところが、電気メッキ
において銅箔104を一方の電極として使用するために
は、電源107との接続のための導線108を銅箔10
4に接続しなければならない。そこで、導線108を銅
箔104の表面にはんだ付けにより接着し、PETフィ
ルム106と銅箔104との隙間から外部に延出してい
た。しかし、このような方法では、導線108の延出部
分109において銅箔104とPETフィルム106と
の隙間からメッキ液103が浸入して、銅箔104に付
着するおそれがあった。However, in order to use the copper foil 104 as one electrode in electroplating, a conductor 108 for connection to a power source 107 must be connected to the copper foil 10.
4 must be connected. Therefore, the conductor 108 is bonded to the surface of the copper foil 104 by soldering, and extends outside from the gap between the PET film 106 and the copper foil 104. However, in such a method, there is a possibility that the plating solution 103 may intrude from the gap between the copper foil 104 and the PET film 106 in the extending portion 109 of the conductive wire 108 and adhere to the copper foil 104.
【0005】また、近年、電子機器の小型軽量化の要請
に伴って、プリント基板の薄型化が進んでいるために、
メッキ工程中にプリント基板の変形を生じるおそれがあ
り、取り扱いが困難となっていた。In recent years, with the demand for smaller and lighter electronic devices, printed circuit boards have been made thinner.
The printed circuit board may be deformed during the plating step, and handling is difficult.
【0006】本発明は、上記した事情に鑑みてなされた
ものであり、その目的は、ビアホール充填の際に導体層
を確実に保護することができ、メッキ工程中の変形を防
止できるプリント基板の製造方法を提供することにあ
る。The present invention has been made in view of the above circumstances, and an object of the present invention is to provide a printed circuit board capable of reliably protecting a conductor layer when filling a via hole and preventing deformation during a plating process. It is to provide a manufacturing method.
【0007】[0007]
【課題を解決するための手段】上記の課題を解決するた
めに請求項1の発明に係るプリント基板の製造方法は、
絶縁層の表裏両面のうち一面側に導体層を形成させたプ
リント基板の前記絶縁層を貫通して前記導体層に達する
ビアホール内に、導体層を一方の電極として使用した電
気メッキによりメッキ導体を充填するプリント基板の製
造方法であって、前記導体層の全面を覆うように接着部
材を介して他の基板を重ね合わせるとともに、前記絶縁
層側の表面から前記絶縁層に導電性の端子を貫通させて
前記導体層に接触させることを特徴とする。According to a first aspect of the present invention, there is provided a method for manufacturing a printed circuit board.
A plated conductor is formed by electroplating using a conductor layer as one electrode in a via hole reaching the conductor layer through the insulation layer of a printed circuit board having a conductor layer formed on one of the front and back surfaces of the insulation layer. A method of manufacturing a printed board to be filled, wherein another board is overlapped with an adhesive member so as to cover the entire surface of the conductor layer, and a conductive terminal is penetrated from the surface on the insulating layer side to the insulating layer. And contact the conductor layer.
【0008】ここで、他の基板の材質としては絶縁性の
基板であれば特に制限はなく、例えばプリント基板の絶
縁性基板として通常使用されるガラス布基材エポキシ樹
脂基板等が好ましく使用できる。また、他の基板として
他のプリント基板を使用し、互いに導体層側を内側に向
けた状態で重ね合わせてもよい。Here, the material of the other substrate is not particularly limited as long as it is an insulating substrate. For example, a glass cloth base epoxy resin substrate or the like usually used as an insulating substrate of a printed circuit board can be preferably used. Alternatively, another printed circuit board may be used as another board, and the printed circuit boards may be overlapped with the conductor layers facing inward.
【0009】また、接着部材としては、例えば基材の両
面に接着層を形成させたものを使用できる。この接着部
材に用いられる基材の材質としては特に制限はなく、例
えば紙、布または不織布等の繊維加工物、プラスチック
またはゴム等のポリマー、あるいはそれらの積層体を使
用することができる。また、基材の形状は、両面にプリ
ント基板および他の基板を重ね合わせることが可能であ
れば特に制限はなく、例えば板状、シート状、ネット状
に形成したものを使用することができる。As the adhesive member, for example, a member having an adhesive layer formed on both surfaces of a substrate can be used. The material of the base material used for the adhesive member is not particularly limited, and for example, a fibrous product such as paper, cloth or nonwoven fabric, a polymer such as plastic or rubber, or a laminate thereof can be used. The shape of the substrate is not particularly limited as long as a printed substrate and another substrate can be overlapped on both surfaces, and for example, a substrate formed in a plate shape, a sheet shape, or a net shape can be used.
【0010】また、接着部材の接着層に使用する接着剤
としては特に制限はなく、例えばゴム系接着剤、アクリ
ル系接着剤、スチレン・共役ジエンブロック共重合体系
接着剤、シリコーン系接着剤などを用いることができ
る。なお、接着剤には、必要に応じて架橋剤、粘着性付
与剤、可塑剤、充填剤、老化防止剤などの適宜な添加剤
が配合されていてもよい。The adhesive used for the adhesive layer of the adhesive member is not particularly limited, and examples thereof include a rubber adhesive, an acrylic adhesive, a styrene / conjugated diene block copolymer adhesive, and a silicone adhesive. Can be used. The adhesive may be blended with an appropriate additive such as a crosslinking agent, a tackifier, a plasticizer, a filler, an antioxidant, and the like, if necessary.
【0011】請求項2の発明は、請求項1に記載のプリ
ント基板の製造方法であって、前記絶縁層にビアホール
を形成させる工程において、ビアホールの形成と同一の
方法で、前記絶縁層に前記端子を貫通させるための端子
貫通孔を形成させることを特徴とする。According to a second aspect of the present invention, there is provided the method of manufacturing a printed circuit board according to the first aspect, wherein the step of forming a via hole in the insulating layer includes the step of forming the via hole in the insulating layer in the same manner as the formation of the via hole. It is characterized in that a terminal through hole for penetrating the terminal is formed.
【0012】ここで、ビアホールおよび端子貫通孔の形
成方法としては特に制限はなく、例えばレーザ、ドリル
等が使用できる。Here, the method of forming the via hole and the terminal through-hole is not particularly limited, and for example, a laser, a drill or the like can be used.
【0013】請求項3の発明は、請求項1または請求項
2に記載のプリント基板の製造方法であって、前記接着
部材は、電気メッキ時の温度よりも高温に加熱すること
により接着性を失うことを特徴とする。According to a third aspect of the present invention, there is provided the method for manufacturing a printed circuit board according to the first or second aspect, wherein the adhesive member is heated to a temperature higher than the temperature at the time of electroplating to improve the adhesiveness. Characterized by losing.
【0014】ここで、電気メッキ時の温度よりも高温に
加熱することにより接着性を失わせるためには、例えば
接着部材において、電気メッキ時の温度よりも高温で発
泡する発泡剤を混入した接着剤を用いることができる。
かかる場合に発泡剤としては、例えば炭酸アンモニウ
ム、炭酸水素アンモニウム、炭酸水素ナトリウム、亜硝
酸アンモニウム、水素化ホウ素ナトリウム、アジド類な
どの分解型の無機系発泡剤、またはトリクロロモノフル
オロメタンやジクロロモノフルオロメタンなどのフッ化
アルカン、アゾビスイソブチロニトリルやアゾジカルボ
ンアミド、バリウムアゾジカルボキシレートなどのアゾ
系化合物、パラトルエンスルホニルヒドラジドやジフェ
ニルスルホン−3,3'−ジスルホニルヒドラジド、
4,4'−オキシビス(ベンゼンスルホニルヒドラジ
ド)、アリルビス(スルホニルヒドラジド)などのヒド
ラジン系化合物、ρ−トルイレンスルホニルセミカルバ
ジドや4,4'−オキシビス(ベンゼンスルホニルセミ
カルバジド)のなどのセミカルバジド系化合物、5−モ
ルホリル−1,2,3,4−チアトリアゾールなどのト
リアゾール系化合物、N,N'−ジニトロソペンタメチ
レンテトラミンやN,N'−ジメチル−N,N'−ジニト
ロソテレフタルアミドなどのN−ニトロソ系化合物のよ
うな有機系発泡剤等が使用できる。Here, in order to lose the adhesiveness by heating to a temperature higher than the temperature at the time of electroplating, for example, the bonding member is mixed with a foaming agent which foams at a temperature higher than the temperature at the time of electroplating. Agents can be used.
In such a case, examples of the foaming agent include decomposition type inorganic foaming agents such as ammonium carbonate, ammonium hydrogen carbonate, sodium hydrogen carbonate, ammonium nitrite, sodium borohydride, and azides; and trichloromonofluoromethane and dichloromonofluoromethane. Fluorinated alkanes, azo compounds such as azobisisobutyronitrile, azodicarbonamide, barium azodicarboxylate, paratoluenesulfonyl hydrazide and diphenylsulfon-3,3′-disulfonyl hydrazide;
Hydrazine compounds such as 4,4'-oxybis (benzenesulfonylhydrazide) and allylbis (sulfonylhydrazide); semicarbazide compounds such as ρ-toluylenesulfonyl semicarbazide and 4,4'-oxybis (benzenesulfonyl semicarbazide); Triazole compounds such as morpholyl-1,2,3,4-thiatriazole, N-nitroso such as N, N'-dinitrosopentamethylenetetramine and N, N'-dimethyl-N, N'-dinitrosoterephthalamide An organic foaming agent such as a compound can be used.
【0015】[0015]
【発明の作用、および発明の効果】請求項1の発明によ
れば、ビアホールにメッキ導体を充填する際には、導体
層の全面を覆うように接着部材を介して他の基板を重ね
合わせるとともに、絶縁層側の表面から絶縁層に導電性
の端子を貫通させて前記導体層に接触させる。このよう
に、端子を絶縁層側から導体層に接触させるから、導体
層側の表面を他の基板により完全に封止することができ
る。これにより、導体層がメッキ液により汚染されるこ
とを防止できる。According to the first aspect of the present invention, when filling a via hole with a plated conductor, another substrate is overlapped via an adhesive member so as to cover the entire surface of the conductor layer. Then, a conductive terminal is passed through the insulating layer from the surface on the side of the insulating layer to make contact with the conductor layer. Thus, since the terminal is brought into contact with the conductor layer from the insulating layer side, the surface on the conductor layer side can be completely sealed with another substrate. This can prevent the conductive layer from being contaminated by the plating solution.
【0016】また、他の基板を重ね合わせることによ
り、プリント基板を補強できる。このため、メッキ工程
中のプリント基板の変形を防止することができ、さら
に、端子の先端が導体層を突き破ることを防止できる。
これにより、メッキ工程中におけるプリント基板の取り
扱いを容易とすることができ、作業性を向上できる。Further, the printed board can be reinforced by overlapping another board. Therefore, it is possible to prevent the printed circuit board from being deformed during the plating process, and to prevent the tip of the terminal from breaking through the conductor layer.
Thereby, the handling of the printed circuit board during the plating process can be facilitated, and the workability can be improved.
【0017】請求項2の発明によれば、絶縁層にビアホ
ールを形成させる工程において、ビアホールの形成と同
一の方法で端子貫通孔を形成させる。このようにすれ
ば、ビアホールの形成と端子貫通孔の形成を同時にでき
るから、工程を簡略化できる。また、あらかじめ端子貫
通孔を形成させておくことにより、端子を絶縁層に容易
に貫通させることができ、端子と導体層との接触性を確
保できる。According to the second aspect of the present invention, in the step of forming a via hole in the insulating layer, the terminal through-hole is formed by the same method as the formation of the via hole. With this configuration, the formation of the via hole and the formation of the terminal through-hole can be performed at the same time, so that the process can be simplified. In addition, by forming the terminal through-hole in advance, the terminal can be easily penetrated through the insulating layer, and the contact between the terminal and the conductor layer can be secured.
【0018】請求項3の発明によれば、接着部材は、電
気メッキ時の温度よりも高温に加熱することにより接着
性を失う。これにより、電気メッキ時においては、接着
部材の接着性が保持される。一方、プリント基板と他の
基板とを剥離したい場合には、電気メッキ時よりも高温
に加熱することによって接着部材の接着性を失わせ、容
易に剥離を行うことができる。According to the third aspect of the present invention, the adhesive member loses adhesiveness when heated to a temperature higher than the temperature at the time of electroplating. Thereby, at the time of electroplating, the adhesiveness of the adhesive member is maintained. On the other hand, when it is desired to peel the printed board from another board, the adhesive is lost by heating to a higher temperature than during the electroplating, and the peeling can be easily performed.
【0019】[0019]
【発明の実施の形態】<第1実施形態>次に、本発明の
第1実施形態について、図1〜図3を参照しつつ、詳細
に説明する。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS First Embodiment Next, a first embodiment of the present invention will be described in detail with reference to FIGS.
【0020】本実施形態のプリント基板1の出発材料は
片面銅張積層板2である。片面銅張積層板2は、例えば
板状のガラス布エポキシ樹脂により形成される絶縁性基
板3(本発明の絶縁層に該当する)の一方の面(図1お
いて下面側)に、全面に銅箔4(本発明の導体層に該当
する)が貼りつけられた周知の構造である(図1A)。The starting material of the printed circuit board 1 of this embodiment is a single-sided copper-clad laminate 2. The single-sided copper-clad laminate 2 is formed on one surface (the lower surface side in FIG. 1) of an insulating substrate 3 (corresponding to the insulating layer of the present invention) formed of, for example, a plate-like glass cloth epoxy resin. This is a known structure to which a copper foil 4 (corresponding to the conductor layer of the present invention) is attached (FIG. 1A).
【0021】この片面銅張積層板2において銅箔4が形
成された面側に、補強板10(本発明の他の基板に該当
する)を、熱剥離シート11(本発明の接着部材に該当
する)を挟んで重ね合わせる(図1B)。補強板10
は、例えばガラス布エポキシ樹脂を厚さ1000μmの
板状に形成させたものであり、その大きさは片面銅張積
層板2よりもやや大きくされて、銅箔4の全面を完全に
覆うことが可能とされている。また、熱剥離シート11
は、例えばポリエステル製のフィルムの両面に、発泡剤
を含有する接着層が形成された構造とされている。On the surface of the single-sided copper-clad laminate 2 on which the copper foil 4 is formed, a reinforcing plate 10 (corresponding to another substrate of the present invention) is attached to a heat-peelable sheet 11 (corresponding to an adhesive member of the present invention). Are overlapped (FIG. 1B). Reinforcement plate 10
Is made of, for example, a glass cloth epoxy resin in the form of a plate having a thickness of 1000 μm, and is slightly larger than the single-sided copper-clad laminate 2 so that the entire surface of the copper foil 4 can be completely covered. It is possible. In addition, the heat release sheet 11
Has a structure in which, for example, an adhesive layer containing a foaming agent is formed on both surfaces of a polyester film.
【0022】この片面銅張積層板2において絶縁性基板
3の銅箔4とは反対側の面(図1において上面側)に、
例えばポリエチレンテレフタラート製の保護フィルム1
2を貼り付けておく(図1C)。そして、絶縁性基板3
の所定の位置にレーザ照射を行って、絶縁性基板3の厚
さ方向に貫通して銅箔4に達するビアホール5を形成さ
せる。このとき、片面銅張積層板2の端部付近に、後述
する端子13を貫通するための端子貫通孔6を同時に形
成しておく(図1D)。レーザ加工は、例えばパルス発
振型炭酸ガスレーザ加工装置によって行うことが可能で
あり、その場合には、パルスエネルギ−が2.0mJ〜
10.0mJ、パルス幅が1μs〜100μs、パルス
間隔が0.5ms以上、ショット数が3〜50という条
件で形成することが望ましい。また、端子貫通孔6の内
径は、端子13の径とほぼ同一か僅かに小さくされるこ
とが好ましい。端子13と端子貫通孔6の開口縁6Aの
隙間から、メッキ液22が孔内に浸入するのを防止する
ためである。In the single-sided copper-clad laminate 2, the surface of the insulating substrate 3 opposite to the copper foil 4 (the upper surface in FIG. 1)
For example, protective film 1 made of polyethylene terephthalate
2 is pasted (FIG. 1C). And the insulating substrate 3
Is irradiated to a predetermined position to form a via hole 5 that penetrates in the thickness direction of the insulating substrate 3 and reaches the copper foil 4. At this time, a terminal through hole 6 for penetrating a terminal 13 to be described later is simultaneously formed near the end of the single-sided copper-clad laminate 2 (FIG. 1D). Laser processing can be performed by, for example, a pulse oscillation type carbon dioxide laser processing apparatus. In this case, the pulse energy is 2.0 mJ or more.
It is desirable to form under conditions of 10.0 mJ, pulse width of 1 μs to 100 μs, pulse interval of 0.5 ms or more, and shot number of 3 to 50. Further, it is preferable that the inner diameter of the terminal through hole 6 be substantially the same as or slightly smaller than the diameter of the terminal 13. This is to prevent the plating solution 22 from entering the hole from the gap between the terminal 13 and the opening edge 6A of the terminal through hole 6.
【0023】その後、保護フィルム12を除去し、形成
されたビアホール5の内部に残留する樹脂を取り除くた
めのデスミア処理を行う。デスミア処理は、例えば過マ
ンガン酸カリウム処理、酸素プラズマ処理、コロナ放電
処理等によって行うことができる。Thereafter, the protective film 12 is removed, and a desmear process is performed to remove the resin remaining inside the formed via hole 5. The desmear treatment can be performed by, for example, potassium permanganate treatment, oxygen plasma treatment, corona discharge treatment, or the like.
【0024】次いで、端子貫通孔6に、導電性金属によ
り形成された端子13を貫通させて、端子13の先端1
3Aを銅箔4に接触させる(図1E)。この端子13は
断面が円形の略棒状に形成されており、その一端部(図
1において下端部)は、端子貫通孔6の開口縁6Aに対
応する位置より下側がテーパ状とされている。また、端
子13において、絶縁性基板3から露出している部分
(図1において開口縁6Aに対応する位置より上側)
は、メッキ液22の付着を防止して電流の管理を容易と
するために、絶縁性のフィルム14により覆われてい
る。Next, a terminal 13 made of a conductive metal is passed through the terminal through hole 6 so that
3A is brought into contact with the copper foil 4 (FIG. 1E). The terminal 13 is formed in a substantially bar shape with a circular cross section, and one end (the lower end in FIG. 1) is tapered below a position corresponding to the opening edge 6A of the terminal through hole 6. In the terminal 13, a portion exposed from the insulating substrate 3 (above a position corresponding to the opening edge 6A in FIG. 1).
Is covered with an insulating film 14 in order to prevent the plating solution 22 from adhering and to facilitate current management.
【0025】次に、銅箔4を一方の電極として使用した
電気メッキ法により、メッキ導体7を形成させる。電気
メッキ装置20の概略を図3に示した。電気メッキ装置
20の作業台23の両端に取り付けられた金属製のクリ
ップ24により、補強板10が貼り付けられた片面銅張
積層板2を挟み付ける。このとき、クリップ24の一端
部24Aは、端子13において端子貫通孔6に差し込ま
れている側と逆側の端部13B(図3において左端)を
押圧して、端子13を銅箔4に確実に接触させるととも
に、銅箔4、端子13、クリップ24間に導通が図られ
るようにされている。そして、クリップ24からは直流
電源25に接続するための導線26が延出されている。
また、補強板10は作業台23にネジ28により固定さ
れる。Next, a plated conductor 7 is formed by an electroplating method using the copper foil 4 as one electrode. FIG. 3 schematically shows the electroplating apparatus 20. The single-sided copper-clad laminate 2 to which the reinforcing plate 10 is attached is sandwiched between metal clips 24 attached to both ends of a work table 23 of the electroplating apparatus 20. At this time, the one end 24A of the clip 24 presses the end 13B (the left end in FIG. 3) of the terminal 13 on the opposite side to the side inserted into the terminal through hole 6 to securely connect the terminal 13 to the copper foil 4. , And electrical continuity is established between the copper foil 4, the terminal 13, and the clip 24. A conducting wire 26 for connecting to a DC power supply 25 extends from the clip 24.
Further, the reinforcing plate 10 is fixed to the worktable 23 with screws 28.
【0026】このように片面銅張積層板2が固定された
作業台23とメッキ電極27とを、メッキ液22を満た
した容器21中に浸漬し、直流電源25により銅箔4と
メッキ電極27との間に直流電圧を印加する。すると、
ビアホール5の底部に露出している銅箔4上にメッキ金
属が析出して、メッキ導体7が形成される(図2F)。The worktable 23 to which the single-sided copper-clad laminate 2 is fixed and the plating electrode 27 are immersed in a container 21 filled with a plating solution 22, and the copper foil 4 and the plating electrode 27 are And a DC voltage is applied. Then
A plating metal is deposited on the copper foil 4 exposed at the bottom of the via hole 5 to form a plating conductor 7 (FIG. 2F).
【0027】次いで、ビアホール5内のメッキ導体7に
重ねるようにして、バンプメッキにより例えばはんだ等
の低融点材料からなる導電性バンプ8を形成させる。導
電性バンプ8は、絶縁性基板3の上面から僅かに突出さ
れるように充填される(図2G)。Next, a conductive bump 8 made of a material having a low melting point such as solder is formed by bump plating so as to overlap the plated conductor 7 in the via hole 5. The conductive bumps 8 are filled so as to slightly protrude from the upper surface of the insulating substrate 3 (FIG. 2G).
【0028】この後、熱剥離シート11を加熱処理する
ことにより、接着層に含まれる発泡剤を発泡させて、片
面銅張積層板2と補強板10とを剥離させる(図2
H)。Thereafter, the heat release sheet 11 is subjected to a heat treatment to foam the foaming agent contained in the adhesive layer, thereby separating the single-sided copper-clad laminate 2 and the reinforcing plate 10 (FIG. 2).
H).
【0029】最後に、銅箔4をエッチングして所定の導
体回路9を形成することにより、プリント基板1が完成
する。Finally, the printed circuit board 1 is completed by etching the copper foil 4 to form a predetermined conductor circuit 9.
【0030】以上のように本実施形態によれば、ビアホ
ール5にメッキ導体7を充填する際には、銅箔4の全面
を覆うように熱剥離シート11を介して補強板10を重
ね合わせるとともに、端子13を絶縁性基板3側から銅
箔4に接触させる。これにより、銅箔4側の表面を補強
板10により完全に封止することができるから、銅箔4
がメッキ液22により汚染されることを防止できる。ま
た、補強板10を重ね合わせることにより、片面銅張積
層板2を補強でき、作業中に片面銅張積層板2が変形す
ることを防止できる。さらに、端子13を押圧して銅箔
4に接触させる際に、端子13の先端が銅箔4を突き破
ることを防止できる。これにより、メッキ工程中におけ
るプリント基板1の取り扱いを容易とすることができ、
作業性を向上できる。As described above, according to the present embodiment, when filling the via hole 5 with the plated conductor 7, the reinforcing plate 10 is overlapped with the heat release sheet 11 so as to cover the entire surface of the copper foil 4. Then, the terminal 13 is brought into contact with the copper foil 4 from the insulating substrate 3 side. Thereby, the surface on the copper foil 4 side can be completely sealed by the reinforcing plate 10, so that the copper foil 4
Can be prevented from being contaminated by the plating solution 22. Moreover, the single-sided copper-clad laminate 2 can be reinforced by stacking the reinforcing plates 10, and the single-sided copper-clad laminate 2 can be prevented from being deformed during operation. Further, when the terminal 13 is pressed and brought into contact with the copper foil 4, the tip of the terminal 13 can be prevented from breaking through the copper foil 4. This makes it easier to handle the printed circuit board 1 during the plating process,
Workability can be improved.
【0031】また、ビアホール5の形成時に端子貫通孔
6の形成を同時に行うことにより、工程を簡略化でき
る。また、あらかじめ端子貫通孔6を形成させておくこ
とにより、端子13を絶縁性基板3に容易に貫通させる
ことができ、端子13と銅箔4との接触性を確保でき
る。Further, by simultaneously forming the terminal through holes 6 when forming the via holes 5, the process can be simplified. In addition, by forming the terminal through holes 6 in advance, the terminals 13 can be easily penetrated through the insulating substrate 3 and the contact between the terminals 13 and the copper foil 4 can be secured.
【0032】さらに、熱剥離シート11の接着層には、
電気メッキ時よりも高温に加熱することで発泡する発泡
剤が含有されている。これにより、電気メッキ時におい
ては接着性が保持される一方、片面銅張積層板2と補強
板10とを剥離する際には、電気メッキ時よりも高温に
加熱することによって容易に剥離を行うことができる。Further, the adhesive layer of the heat release sheet 11
It contains a foaming agent that foams when heated to a higher temperature than during electroplating. Thereby, while the adhesiveness is maintained during the electroplating, when the single-sided copper-clad laminate 2 and the reinforcing plate 10 are separated, the separation is easily performed by heating to a higher temperature than during the electroplating. be able to.
【0033】<第2実施形態>次に、本発明の第2実施
形態について、図4を参照しつつ説明する。<Second Embodiment> Next, a second embodiment of the present invention will be described with reference to FIG.
【0034】本実施形態においては、ビアホール5を形
成させた片面銅張積層板2と他の片面銅張積層板32
(本発明の他の基板に該当する)とを、互いに銅箔4、
34側を内側に向けた状態で、熱剥離シート11を挟ん
で重ね合わせる。これにより、2枚の片面銅張積層板
2、32が互いに補強し合い、変形を防止することがで
きる。このとき、互いの銅箔4、34を完全に封止する
ために、2枚の片面銅張積層板2、32を同一の大きさ
とすることが好ましい。In this embodiment, the single-sided copper-clad laminate 2 having the via holes 5 formed therein and the other single-sided copper-clad laminate 32
(Corresponding to another substrate of the present invention) and copper foil 4,
The heat release sheets 11 are sandwiched with the 34 side facing inward. Thereby, the two single-sided copper-clad laminates 2 and 32 reinforce each other, and can prevent deformation. At this time, in order to completely seal the copper foils 4 and 34 with each other, it is preferable that the two single-sided copper-clad laminates 2 and 32 have the same size.
【0035】そして、片面銅張積層板2、32の絶縁性
基板3、33に、端子13を貫通させて、銅箔4、34
に接触させる。本実施形態においては、あらかじめ端子
貫通孔を形成させていないが、端子13の先端を尖らせ
ておくことにより、絶縁性基板3を容易に貫通すること
ができる。また、絶縁性基板3が端子13と密着してい
るため、孔内にメッキ液が浸入するおそれがない。Then, the terminals 13 are passed through the insulating substrates 3 and 33 of the single-sided copper-clad laminates 2 and 32 to form copper foils 4 and 34.
Contact. In the present embodiment, the terminal through-hole is not formed in advance, but the terminal 13 can be easily penetrated through the insulating substrate 3 by sharpening the tip of the terminal 13. In addition, since the insulating substrate 3 is in close contact with the terminals 13, there is no possibility that the plating solution will enter the holes.
【0036】この片面銅張積層板2、32を、第1実施
形態と同様にメッキ液22を満たした容器21中に浸漬
し、電気メッキ法によりメッキ導体7、37を形成させ
る。次いで、ビアホール5、35内のメッキ導体7、3
7に重ねるようにして、バンプメッキにより導電性バン
プ8、38を形成させる。The single-sided copper-clad laminates 2 and 32 are immersed in a vessel 21 filled with a plating solution 22 as in the first embodiment, and plated conductors 7 and 37 are formed by electroplating. Next, the plated conductors 7, 3 in the via holes 5, 35
7, conductive bumps 8 and 38 are formed by bump plating.
【0037】この後、熱剥離シート11を加熱処理する
ことにより、接着層に含まれる発泡剤を発泡させて、2
枚の片面銅張積層板2、32を剥離させる。最後に、銅
箔4、34をエッチングして所定の導体回路を形成する
ことにより、プリント基板が完成する。Thereafter, the heat release sheet 11 is subjected to a heat treatment so that the foaming agent contained in the adhesive layer is foamed.
The single-sided copper-clad laminates 2 and 32 are peeled off. Finally, the printed circuit board is completed by etching the copper foils 4 and 34 to form predetermined conductor circuits.
【0038】以上のように本実施形態においても、第1
実施形態と同様の作用効果を奏することができる。As described above, also in the present embodiment, the first
The same operation and effect as the embodiment can be obtained.
【0039】なお、本発明の技術的範囲は、上記した実
施形態によって限定されるものではなく、例えば、次に
記載するようなものも本発明の技術的範囲に含まれる。
その他、本発明の技術的範囲は、均等の範囲にまで及ぶ
ものである。 (1)第1実施形態においては、端子13の先端はテー
パ状とされているが、本発明によれば端子の形状は本実
施形態の限りではなく、例えば棒状であってもよい。 (2)第2実施形態においては、端子13の先端はテー
パ状とされているが、本発明によれば端子の形状は本実
施形態の限りではなく、例えばネジ状であってもよい。It should be noted that the technical scope of the present invention is not limited by the above-described embodiment, and, for example, those described below are also included in the technical scope of the present invention.
In addition, the technical scope of the present invention extends to an equivalent range. (1) In the first embodiment, the tip of the terminal 13 is tapered, but according to the present invention, the shape of the terminal is not limited to this embodiment, and may be, for example, a rod. (2) In the second embodiment, the tip of the terminal 13 is tapered, but according to the present invention, the shape of the terminal is not limited to this embodiment, and may be, for example, a screw shape.
【0040】(3)上記各実施形態によれば、接着部剤
として熱剥離シート11を使用しているが、本発明によ
れば接着部剤の材質は上記各実施形態の限りではなく、
電気メッキ時において接着性を保持し、その後に剥離可
能なものであればよい。 (4)第1実施形態によれば、絶縁性基板3にあらかじ
め端子貫通孔6を形成させて、この端子貫通孔に端子1
3を貫通させているが、本発明によれば必ずしも端子貫
通孔を形成させる必要はない。また、第2実施形態にお
いては、端子貫通孔を形成させていないが、あらかじめ
端子貫通孔を形成させておいても構わない。 (5)第1実施形態によれば、補強板10は片面銅張積
層板2よりもやや大きくされているが、本発明によれ
ば、補強板は片面銅張積層板と同じ大きさであってもよ
く、要するに銅箔を完全に覆うことのできる大きさであ
ればよい。(3) According to each of the above embodiments, the heat release sheet 11 is used as the adhesive. However, according to the present invention, the material of the adhesive is not limited to the above embodiments.
Any material can be used as long as it retains adhesiveness during electroplating and can be peeled off thereafter. (4) According to the first embodiment, the terminal through-hole 6 is formed in the insulating substrate 3 in advance, and the terminal 1 is inserted into the terminal through-hole.
3, but it is not always necessary to form the terminal through-hole according to the present invention. In the second embodiment, the terminal through-hole is not formed, but the terminal through-hole may be formed in advance. (5) According to the first embodiment, the reinforcing plate 10 is slightly larger than the single-sided copper-clad laminate 2, but according to the present invention, the reinforcing plate has the same size as the single-sided copper-clad laminate. In short, any size may be used as long as the copper foil can be completely covered.
【図1】第1実施形態におけるプリント基板の製造工程
を示す断面図−1 (A)片面銅張積層板の断面図 (B)片面銅張積層板の銅箔側に補強板を貼り付けた断
面図 (C)片面銅張積層板の絶縁性基板に保護フィルムを貼
りつけた断面図 (D)片面銅張積層板にビアホールおよび端子貫通孔を
形成させた断面図 (E)端子貫通項に端子を貫通させた断面図FIG. 1 is a cross-sectional view showing a manufacturing process of a printed circuit board according to a first embodiment-1 (A) A cross-sectional view of a single-sided copper-clad laminate (B) A reinforcing plate is attached to the copper foil side of a single-sided copper-clad laminate Sectional view (C) Sectional view of a single-sided copper-clad laminate with a protective film attached to an insulating substrate. (D) Sectional view of via-holes and terminal through-holes formed in a single-sided copper-clad laminate. Cross section through terminal
【図2】第1実施形態におけるプリント基板の製造工程
を示す断面図−2 (F)ビアホールにメッキ導体を形成させた断面図 (G)メッキ導体上に導電性バンプを形成させた断面図 (H)片面銅張積層板から補強板を剥離させた断面図 (I)第1実施形態のプリント基板の断面図FIG. 2 is a cross-sectional view showing a printed circuit board manufacturing process according to the first embodiment; FIG. 2 (F) is a cross-sectional view in which a plated conductor is formed in a via hole; and (G) is a cross-sectional view in which a conductive bump is formed on the plated conductor. H) Cross-sectional view of peeling of reinforcing plate from single-sided copper-clad laminate (I) Cross-sectional view of printed circuit board of first embodiment
【図3】第1実施形態の電気メッキ装置の断面図FIG. 3 is a cross-sectional view of the electroplating apparatus according to the first embodiment.
【図4】第2実施形態の片面銅張積層板に他の片面銅張
積層板を貼りつけた断面図FIG. 4 is a cross-sectional view of another single-sided copper-clad laminate adhered to the single-sided copper-clad laminate of the second embodiment.
【図5】従来の電気メッキ法を示す断面図FIG. 5 is a sectional view showing a conventional electroplating method.
1…プリント基板 3、33…絶縁性基板(絶縁層) 4、34…銅箔(導体層) 5、35…ビアホール 6…端子貫通孔 7、37…メッキ導体 10…補強板(他の基板) 11…熱剥離シート(接着部材) 13…端子 32…他の片面銅張積層板(他の基板) DESCRIPTION OF SYMBOLS 1 ... Printed board 3, 33 ... Insulated board (insulating layer) 4, 34 ... Copper foil (conductor layer) 5, 35 ... Via hole 6 ... Terminal through hole 7, 37 ... Plated conductor 10 ... Reinforcement board (other board) 11: Thermal release sheet (adhesive member) 13: Terminal 32: Other single-sided copper-clad laminate (other substrate)
Claims (3)
を形成させたプリント基板の前記絶縁層を貫通して前記
導体層に達するビアホール内に、導体層を一方の電極と
して使用した電気メッキによりメッキ導体を充填するプ
リント基板の製造方法であって、 前記導体層の全面を覆うように接着部材を介して他の基
板を重ね合わせるとともに、前記絶縁層側の表面から前
記絶縁層に導電性の端子を貫通させて前記導体層に接触
させることを特徴とするプリント基板の製造方法。1. An electric device using a conductor layer as one electrode in a via hole reaching the conductor layer through the insulation layer of a printed circuit board having a conductor layer formed on one of the front and back surfaces of the insulation layer. A method of manufacturing a printed circuit board in which a plated conductor is filled by plating, wherein another substrate is overlapped with an adhesive member so as to cover the entire surface of the conductor layer, and a conductive film is formed from the surface on the insulating layer side to the insulating layer. A method for manufacturing a printed circuit board, comprising: contacting the conductive layer by penetrating a conductive terminal.
程において、ビアホールの形成と同一の方法で、前記絶
縁層に前記端子を貫通させるための端子貫通孔を形成さ
せることを特徴とする請求項1に記載のプリント基板の
製造方法。2. The method according to claim 1, wherein, in the step of forming a via hole in the insulating layer, a terminal through hole for penetrating the terminal is formed in the insulating layer in the same manner as the formation of the via hole. 3. The method for manufacturing a printed circuit board according to claim 1.
りも高温に加熱することにより接着性を失うことを特徴
とする請求項1または請求項2に記載のプリント基板の
製造方法。3. The method for manufacturing a printed circuit board according to claim 1, wherein the adhesive member loses adhesiveness when heated to a temperature higher than a temperature at the time of electroplating.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001016674A JP2002223069A (en) | 2001-01-25 | 2001-01-25 | Method for manufacturing printed board |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001016674A JP2002223069A (en) | 2001-01-25 | 2001-01-25 | Method for manufacturing printed board |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JP2002223069A true JP2002223069A (en) | 2002-08-09 |
Family
ID=18882995
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001016674A Withdrawn JP2002223069A (en) | 2001-01-25 | 2001-01-25 | Method for manufacturing printed board |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2002223069A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003060343A (en) * | 2001-08-17 | 2003-02-28 | Advantest Corp | Manufacturing method of wiring board |
| JP2006086358A (en) * | 2004-09-16 | 2006-03-30 | Sumitomo Electric Printed Circuit Inc | Manufacturing method of double-sided printed wiring board |
-
2001
- 2001-01-25 JP JP2001016674A patent/JP2002223069A/en not_active Withdrawn
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003060343A (en) * | 2001-08-17 | 2003-02-28 | Advantest Corp | Manufacturing method of wiring board |
| JP2006086358A (en) * | 2004-09-16 | 2006-03-30 | Sumitomo Electric Printed Circuit Inc | Manufacturing method of double-sided printed wiring board |
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