JP2002220259A5 - Glass substrate for magnetic recording medium, method for manufacturing glass substrate for magnetic recording medium, and method for manufacturing recording medium - Google Patents
Glass substrate for magnetic recording medium, method for manufacturing glass substrate for magnetic recording medium, and method for manufacturing recording medium Download PDFInfo
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- 239000011521 glass Substances 0.000 title description 147
- 239000000758 substrate Substances 0.000 title description 109
- 238000000034 method Methods 0.000 title description 24
- 238000004519 manufacturing process Methods 0.000 title description 20
- 238000010828 elution Methods 0.000 description 44
- 239000007864 aqueous solution Substances 0.000 description 27
- 238000003426 chemical strengthening reaction Methods 0.000 description 25
- 239000003513 alkali Substances 0.000 description 20
- 239000000463 material Substances 0.000 description 20
- 230000001629 suppression Effects 0.000 description 17
- 150000002500 ions Chemical class 0.000 description 15
- 229910003002 lithium salt Inorganic materials 0.000 description 13
- 159000000002 lithium salts Chemical class 0.000 description 13
- 238000012545 processing Methods 0.000 description 12
- 238000005342 ion exchange Methods 0.000 description 11
- 239000007788 liquid Substances 0.000 description 11
- IIPYXGDZVMZOAP-UHFFFAOYSA-N lithium nitrate Chemical compound [Li+].[O-][N+]([O-])=O IIPYXGDZVMZOAP-UHFFFAOYSA-N 0.000 description 10
- 239000010410 layer Substances 0.000 description 9
- 238000000465 moulding Methods 0.000 description 9
- 239000011734 sodium Substances 0.000 description 9
- 230000006866 deterioration Effects 0.000 description 8
- 238000005498 polishing Methods 0.000 description 8
- 150000003839 salts Chemical class 0.000 description 8
- 239000000243 solution Substances 0.000 description 7
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 6
- 238000007654 immersion Methods 0.000 description 6
- 230000000694 effects Effects 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- WMFOQBRAJBCJND-UHFFFAOYSA-M Lithium hydroxide Chemical compound [Li+].[OH-] WMFOQBRAJBCJND-UHFFFAOYSA-M 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 239000003599 detergent Substances 0.000 description 3
- 230000009477 glass transition Effects 0.000 description 3
- 230000007935 neutral effect Effects 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 229910001414 potassium ion Inorganic materials 0.000 description 3
- 229910001415 sodium ion Inorganic materials 0.000 description 3
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- HBBGRARXTFLTSG-UHFFFAOYSA-N Lithium ion Chemical compound [Li+] HBBGRARXTFLTSG-UHFFFAOYSA-N 0.000 description 2
- 229910052783 alkali metal Inorganic materials 0.000 description 2
- 150000001340 alkali metals Chemical class 0.000 description 2
- 239000005354 aluminosilicate glass Substances 0.000 description 2
- 238000009835 boiling Methods 0.000 description 2
- 238000005336 cracking Methods 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 238000004090 dissolution Methods 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 229910001416 lithium ion Inorganic materials 0.000 description 2
- 229910021645 metal ion Inorganic materials 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- FGIUAXJPYTZDNR-UHFFFAOYSA-N potassium nitrate Chemical compound [K+].[O-][N+]([O-])=O FGIUAXJPYTZDNR-UHFFFAOYSA-N 0.000 description 2
- 238000003825 pressing Methods 0.000 description 2
- VWDWKYIASSYTQR-UHFFFAOYSA-N sodium nitrate Chemical compound [Na+].[O-][N+]([O-])=O VWDWKYIASSYTQR-UHFFFAOYSA-N 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 229910021642 ultra pure water Inorganic materials 0.000 description 2
- 239000012498 ultrapure water Substances 0.000 description 2
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- 229910013553 LiNO Inorganic materials 0.000 description 1
- 229910018104 Ni-P Inorganic materials 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 229910018536 Ni—P Inorganic materials 0.000 description 1
- 229910001260 Pt alloy Inorganic materials 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 238000004833 X-ray photoelectron spectroscopy Methods 0.000 description 1
- 238000010306 acid treatment Methods 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 239000005407 aluminoborosilicate glass Substances 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 239000005388 borosilicate glass Substances 0.000 description 1
- 239000004566 building material Substances 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 1
- 229910000420 cerium oxide Inorganic materials 0.000 description 1
- 239000005345 chemically strengthened glass Substances 0.000 description 1
- 150000003841 chloride salts Chemical class 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000008119 colloidal silica Substances 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 230000002401 inhibitory effect Effects 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 239000010687 lubricating oil Substances 0.000 description 1
- 230000005389 magnetism Effects 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 150000002823 nitrates Chemical class 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 1
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Substances [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 1
- 239000004323 potassium nitrate Substances 0.000 description 1
- 235000010333 potassium nitrate Nutrition 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 239000005368 silicate glass Substances 0.000 description 1
- 239000005361 soda-lime glass Substances 0.000 description 1
- 239000004317 sodium nitrate Substances 0.000 description 1
- 235000010344 sodium nitrate Nutrition 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 238000005728 strengthening Methods 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- UONOETXJSWQNOL-UHFFFAOYSA-N tungsten carbide Chemical compound [W+]#[C-] UONOETXJSWQNOL-UHFFFAOYSA-N 0.000 description 1
- 238000004017 vitrification Methods 0.000 description 1
Description
【特許請求の範囲】
【請求項1】 ガラス成分の溶出を抑制する処理が施されてなる磁気記録媒体用ガラス基板であって、
前記処理が、リチウム塩を含有する水溶液に接触させる処理であることを特徴とする磁気記録媒体用ガラス基板。
【請求項2】 ガラス材料からなる基板を、リチウム塩を含有する水溶液に接触させてガラス成分の溶出を抑制する処理を施すことを特徴とする磁気記録媒体用ガラス基板の製造方法。
【請求項3】 前記処理が、ガラス材料からなる前記基板を100℃以上200℃以下の硝酸リチウム水溶液に浸漬させる処理である請求項2に記載の磁気記録媒体用ガラス基板の製造方法。
【請求項4】 前記処理が、ガラス材料からなる前記基板をリチウム塩を含有するpH5〜pH9の水溶液に接触させる処理である請求項2または3に記載の磁気記録媒体用ガラス基板の製造方法。
【請求項5】 ガラス材料からなる前記基板に化学強化処理を施し、化学強化処理後の前記基板にガラス成分の溶出を抑制する前記処理を施す請求項2〜4のいずれかに記載の磁気記録媒体用ガラス基板の製造方法。
【請求項6】 溶出を抑制する前記ガラス成分が、アルカリイオンである請求項2〜5のいずれかに記載の磁気記録媒体用ガラス基板の製造方法。
【請求項7】 請求項2〜6のいずれかに記載の磁気記録媒体用ガラス基板の製造方法によって製造された磁気記録媒体用ガラス基板に、少なくとも記録層を形成することを特徴とする記録媒体の製造方法。
[Claims]
1. A glass substrate for a magnetic recording medium, which is subjected to a treatment for suppressing elution of a glass component,
A glass substrate for a magnetic recording medium , wherein the treatment is a treatment in which the treatment is brought into contact with an aqueous solution containing a lithium salt.
2. A method for producing a glass substrate for a magnetic recording medium, comprising: bringing a substrate made of a glass material into contact with an aqueous solution containing a lithium salt to perform a treatment for suppressing elution of glass components.
3. The method for producing a glass substrate for a magnetic recording medium according to claim 2, wherein the treatment is a treatment in which the substrate made of a glass material is immersed in an aqueous solution of lithium nitrate at 100 ° C. or more and 200 ° C. or less.
4. The method for producing a glass substrate for a magnetic recording medium according to claim 2, wherein the treatment is a treatment of bringing the substrate made of a glass material into contact with an aqueous solution containing a lithium salt and having a pH of 5 to 9.
5. subjected to chemical strengthening treatment on the substrate made of a glass material, a magnetic recording according to any one of claims 2-4 is subjected to suppress the process the elution of the glass component on the substrate after the chemical strengthening treatment A method for manufacturing a glass substrate for a medium .
Wherein said glass component suppressing elution method of producing a glass substrate for a magnetic recording medium according to any one of claims 2-5 is an alkali ion.
7. The glass substrate for a magnetic recording medium manufactured by the manufacturing method of the magnetic recording medium glass substrate according to any one of claims 2-6, recording medium and forming at least a recording layer Manufacturing method.
【0001】
【発明の属する技術分野】
本発明は、磁気記録媒体用ガラス基板、磁気記録媒体用ガラス基板の製造方法およびそれを用いた記録媒体の製造方法に関する。
[0001]
TECHNICAL FIELD OF THE INVENTION
The present invention is a glass substrate for a magnetic recording medium, a method of manufacturing a recording medium using the same manufacturing method and a glass substrate for a magnetic recording medium.
磁気ディスクの基板材料は、従来、Ni−Pめっきを施したアルミニウム基板が主流であったが、磁気ディスクの小型化、薄型化や磁気ディスクの低浮上化等の要請から高剛性で高速回転させても変形しづらく、表面の平滑性の高い磁気記録媒体用ガラス基板が使われる割合が増加している。 Conventionally, aluminum substrates plated with Ni-P have been mainly used as the substrate material for magnetic disks. However, due to demands for smaller, thinner magnetic disks and lower flying heights of magnetic disks, high rigidity and high-speed rotation are required. However, the rate of use of glass substrates for magnetic recording media that are difficult to deform and have high surface smoothness is increasing.
かかる磁気記録媒体用ガラス基板に用いられるガラス材料には、溶融点を下げてガラス化や成形性を良くする為に、アルカリ金属が数%〜十数%添加されている。ところが、これらアルカリ金属は、原子半径が小さくてマイグレーションし易いので、徐々に表面に析出して大気中の二酸化炭素やハロゲンと結合して炭酸塩や塩化物として析出する。このアルカリ成分の溶出現象は、高温高湿下で顕著であり、記録再生ができなくなって直接エラーとなったり、磁気ヘッドに移着してその浮上を妨げたり腐食させたりして信頼性を悪くする原因となる。 The glass material used for such a glass substrate for a magnetic recording medium contains an alkali metal in an amount of several percent to several tens percent in order to lower the melting point and improve vitrification and moldability. However, since these alkali metals have a small atomic radius and easily migrate, they gradually precipitate on the surface and combine with carbon dioxide and halogen in the atmosphere to precipitate as carbonates and chlorides. This phenomenon of alkali component elution is remarkable under high temperature and high humidity, and recording and reproduction cannot be performed directly, resulting in an error, or transfer to a magnetic head to hinder or corrode the floating, resulting in poor reliability. Cause you to
アルカリ溶出の抑制効果を高めようとすると、酸処理を行う特開平10−226539号では、ガラスの骨格自身も破壊されて却ってアルカリイオン溶出量が増大し、また、溶融塩による処理を行う特開2000−82211号では、処理が高温であるために、化学強化処理を施した磁気記録用ガラス基板では、表面の圧縮応力を形成しているイオンの拡散および熱による歪の緩和がおこり、強度の低下が生じやすいという課題がある。 In order to enhance the effect of suppressing alkali elution, in Japanese Patent Application Laid-Open No. Hei 10-226439 in which an acid treatment is performed, the glass skeleton itself is also destroyed and the amount of alkali ions eluted increases, and the treatment with a molten salt is also performed. According to 2000-82211, since the treatment is performed at a high temperature, in a glass substrate for magnetic recording that has been subjected to a chemical strengthening treatment, diffusion of ions forming a compressive stress on the surface and relaxation of strain due to heat occur, and strength of the glass substrate is reduced. There is a problem that deterioration is likely to occur.
本発明は、上述の点に鑑みて為されたものであって、高温高湿下での長期間の使用、保存においても、強度劣化がなく、アルカリ成分等の溶出を高いレベルで抑制できる磁気記録媒体用ガラス基板、その製造方法およびそれを用いた記録媒体の製造方法を提供することを目的とする。 The present invention was made in view of the above, long-term use at high temperature and high humidity, in storage, no strength deterioration, magnetism can be suppressed dissolution such as an alkali component at a high level It is an object to provide a glass substrate for a recording medium, a method for manufacturing the same, and a method for manufacturing a recording medium using the same.
すなわち、本発明の磁気記録媒体用ガラス基板は、ガラス成分の溶出を抑制する処理が施されてなる磁気記録媒体用ガラス基板であって、前記処理が、リチウム塩を含有する水溶液に接触させる処理である。 That is, a glass substrate for a magnetic recording medium of the present invention is a glass substrate for a magnetic recording medium processing of suppressing elution of the glass component is being subjected, wherein the process is contacted with an aqueous solution containing a lithium salt treatment It is.
【0012】
【発明の実施の形態】
本発明の請求項1に記載の磁気記録媒体用ガラス基板は、ガラス成分の溶出を抑制する処理が施されてなる磁気記録媒体用ガラス基板であって、前記処理が、リチウム塩を含有する水溶液に接触させる処理であり、Na+,K+に比べてイオン半径の小さい水溶液中のLi+が、ガラス表面のNa+やK+とイオン交換を行ってガラス中の非架橋酸素と強く結びついてガラス成分の溶出を効果的に抑制することができ、また、溶融塩用いて高温処理をする従来例のような強度の劣化もない。
[0012]
BEST MODE FOR CARRYING OUT THE INVENTION
Aqueous glass substrate for a magnetic recording medium according to claim 1 of the present invention is a glass substrate for a magnetic recording medium processing of suppressing elution of the glass component is being subjected, the process, containing a lithium salt Li + in an aqueous solution having an ionic radius smaller than that of Na + and K + is ion-exchanged with Na + and K + on the glass surface to strongly bind to non-crosslinked oxygen in the glass. Elution of glass components can be effectively suppressed, and there is no deterioration in strength as in the conventional example in which a high-temperature treatment is performed using a molten salt.
本発明の請求項2に記載の磁気記録媒体用ガラス基板の製造方法は、ガラス材料からなる基板を、リチウム塩を含有する水溶液に接触させてガラス成分の溶出抑制処理を施すものであり、Na+,K+に比べてイオン半径の小さい水溶液中のLi+が、ガラス表面のNa+やK+とイオン交換を行ってガラス中の非架橋酸素と強く結びついてガラス成分の溶出を効果的に抑制することができ、また、溶融塩用いて高温処理をする従来例のような強度の劣化もない。 The method for producing a glass substrate for a magnetic recording medium according to claim 2 of the present invention comprises subjecting a substrate made of a glass material to an aqueous solution containing a lithium salt to perform a treatment for suppressing elution of glass components. Li + in an aqueous solution with a smaller ionic radius than that of + and K + ion-exchanges with Na + and K + on the glass surface and binds strongly to non-crosslinked oxygen in the glass, effectively dissolving the glass components. It can be suppressed, and there is no deterioration in strength as in the conventional example in which high-temperature treatment is performed using a molten salt.
請求項3に記載の発明は、請求項2に記載の磁気記録媒体用ガラス基板の製造方法であって、前記処理が、ガラス材料からなる前記基板を100℃以上200℃以下の硝酸リチウム水溶液に浸漬させる処理であり、硝酸リチウムは溶解度が高く、また、水溶液の沸点も上昇するので、高濃度で高温の効率的な溶出抑制のための処理が可能となる。また、200℃以下の温度で処理するので、化学強化処理を施した磁気記録媒体用ガラス基板に対しても、表面の圧縮応力層に対する影響がほとんどなく、強度の低下がほとんど起こらない。 The invention according to claim 3 is the method for manufacturing a glass substrate for a magnetic recording medium according to claim 2, wherein the treatment is performed by subjecting the substrate made of a glass material to an aqueous solution of lithium nitrate at 100 ° C. or more and 200 ° C. or less. This is a treatment for immersion. Since the solubility of lithium nitrate is high and the boiling point of the aqueous solution is also increased, it is possible to perform a treatment for efficiently suppressing elution at a high concentration and at a high temperature. In addition, since the treatment is performed at a temperature of 200 ° C. or less, even for a glass substrate for a magnetic recording medium that has been subjected to a chemical strengthening treatment, there is almost no influence on the compressive stress layer on the surface, and the strength hardly decreases.
請求項4に記載の発明は、請求項2または3に記載の磁気記録媒体用ガラス基板の製造方法であって、前記処理が、ガラス材料からなる前記基板をリチウム塩を含有するpH5〜pH9の水溶液に接触させる処理であり、ほぼ中性の水溶液を用いることによって、ガラス骨格を破壊するといったこともない。 The invention according to claim 4 is the method for producing a glass substrate for a magnetic recording medium according to claim 2 or 3, wherein the treatment is performed by adjusting the substrate made of a glass material to a pH of 5 to 9 containing a lithium salt. This treatment is to bring the glass skeleton into contact with an aqueous solution, and by using an almost neutral aqueous solution, the glass skeleton is not broken.
請求項5に記載の発明は、請求項2〜4のいずれかに記載の磁気記録媒体用ガラス基板の製造方法であって、ガラス材料からなる前記基板に化学強化処理を施し、化学強化処理後の前記基板にガラス成分の溶出を抑制する前記処理を施すものであり、ガラス成分の溶出を抑制することができるとともに、ガラス表面を強化することができる。 The invention according to claim 5 is the method for producing a glass substrate for a magnetic recording medium according to any one of claims 2 to 4 , wherein the substrate made of a glass material is subjected to a chemical strengthening process, The above-mentioned substrate is subjected to the treatment for suppressing the elution of the glass component, whereby the elution of the glass component can be suppressed and the glass surface can be strengthened.
請求項6に記載の発明は、請求項2〜5のいずれかに記載の磁気記録媒体用ガラス基板の製造方法であって、溶出を抑制する前記ガラス成分が、アルカリイオンであり、Na+やK+の溶出を抑制することができる。 The invention of claim 6 is a manufacturing method of a glass substrate for a magnetic recording medium according to any one of claims 2-5, wherein the glass component suppressing elution, an alkali ion, Na + Ya Elution of K + can be suppressed.
請求項7に記載の記録媒体の製造方法は、請求項2〜6のいずれかに記載の磁気記録媒体用ガラス基板の製造方法によって製造された磁気記録媒体用ガラス基板に少なくとも記録層を形成するものであり、ガラス成分の溶出を効果的に抑制した強度劣化のない磁気記録媒体用ガラス基板を用いて記録媒体を製造するので、高い信頼性の記録媒体を得ることができる。 According to a seventh aspect of the present invention, there is provided a method of manufacturing a recording medium, comprising forming at least a recording layer on a glass substrate for a magnetic recording medium manufactured by the method of manufacturing a glass substrate for a magnetic recording medium according to any one of the second to sixth aspects. Since the recording medium is manufactured using a glass substrate for a magnetic recording medium that does not deteriorate in strength and effectively suppresses elution of glass components, a highly reliable recording medium can be obtained.
本発明は、磁気記録媒体用ガラス基板をリチウム塩を含有する水溶液に接触させて、ガラス成分の溶出を抑制する処理(以下「溶出抑制処理」ともいう)を施すことを特徴としている。 The present invention is characterized in that a glass substrate for a magnetic recording medium is brought into contact with an aqueous solution containing a lithium salt to perform a treatment for suppressing the elution of glass components (hereinafter also referred to as “elution suppression treatment”).
ここで、接触させるとは、水溶液に浸漬する場合の他、磁気記録媒体用ガラス基板の一方の面だけを接触させる場合も含むものである。 Here, the term “contact” includes not only immersion in an aqueous solution but also contact with only one surface of a glass substrate for a magnetic recording medium .
磁気記録媒体用ガラス基板を、リチウム塩を含有する水溶液に接触させることにより、水溶液中のLi+がガラス表面のNa+,K+とイオン交換を行う。Li+は、イオン半径がNa+やK+と比較して小さく、ガラス中の非架橋酸素と強く結びつき、他のアルカリイオンと比較して溶出が少なく、これによって、アルカリイオンの溶出を効果的に抑制できる。しかも、水溶液による溶出抑制処理であるので、溶融塩用いて高温処理をする従来例のような強度の劣化もない。 By bringing the glass substrate for a magnetic recording medium into contact with an aqueous solution containing a lithium salt, Li + in the aqueous solution performs ion exchange with Na + and K + on the glass surface. Li + has a smaller ionic radius than Na + and K +, is strongly associated with non-crosslinked oxygen in glass, and has less elution than other alkali ions, thereby effectively dissolving alkali ions. Can be suppressed. In addition, since the elution is suppressed by an aqueous solution, there is no deterioration in strength as in the conventional example in which a high temperature treatment is performed using a molten salt.
このLi塩を含有した水溶液による溶出抑制処理を施した一実施例の磁気記録媒体用ガラス基板表面のガラス組成を、X線光電子分光分析により分析した結果、磁気記録媒体用ガラス基板表面のK及びNaの組成は、0.5%(原子比)以下であることが確認された。 The glass composition of the magnetic recording medium glass substrate surface of an embodiment example that a dissolution inhibiting treatment with an aqueous solution containing the Li salt, was analyzed by X-ray photoelectron spectroscopy, K glass substrate surface for a magnetic recording medium and It was confirmed that the composition of Na was 0.5% (atomic ratio) or less.
図1は、この一実施例の磁気記録媒体用ガラス基板における表面部分の深さと金属イオン濃度との関係を示す図であり、溶出抑制処理によって、リチウムイオンが、ガラス表面のナトリウムイオン、カリウムイオンとイオン交換を行い、ガラスの最表面にリチウムイオンの多い層が形成されていることがわかる。 FIG. 1 is a diagram showing the relationship between the depth of the surface portion and the metal ion concentration in the glass substrate for a magnetic recording medium of this embodiment. Lithium ions are converted to sodium ions and potassium ions on the glass surface by the elution suppression treatment. It can be seen that a layer rich in lithium ions is formed on the outermost surface of the glass.
これらの水溶液に、磁気記録媒体用ガラス基板を浸漬して行うことが好ましい。これらリチウム塩の中では、硝酸塩が水に対する溶解度が高く好ましい。リチウム塩が高濃度に存在することにより、水溶液の沸点は上昇し、水溶液でありながら100℃以上での処理が可能である。硝酸リチウムの場合、1000gの水に対し2600gの硝酸リチウムを加えることにより、180℃の処理が可能である。 It is preferable that the glass substrate for a magnetic recording medium is immersed in these aqueous solutions. Among these lithium salts, nitrates are preferred because of their high solubility in water. When the lithium salt is present at a high concentration, the boiling point of the aqueous solution is increased, and the treatment at 100 ° C. or more can be performed while being an aqueous solution. In the case of lithium nitrate, treatment at 180 ° C. is possible by adding 2600 g of lithium nitrate to 1000 g of water.
アルカリイオン溶出の抑制効果は、処理温度が高い方が有効であるが、処理温度が高すぎると、化学強化処理を施した磁気記録媒体用ガラス基板では、表面の圧縮応力を形成しているイオンの拡散および熱による歪の緩和が生じ、強度の低下が生じる。このため、処理温度は、100℃〜200℃、さらには130℃〜180℃が好ましい。 The effect of suppressing alkali ion elution is more effective when the processing temperature is higher. However, when the processing temperature is too high , the glass substrate for a magnetic recording medium that has been subjected to a chemical strengthening treatment has an ion forming a surface compressive stress. Diffusion and relaxation of strain due to heat occur, resulting in a decrease in strength. For this reason, the processing temperature is preferably 100 ° C to 200 ° C, more preferably 130 ° C to 180 ° C.
本発明では、磁気記録媒体用ガラス基板を、加熱したLi塩水溶液で処理する前に、磁気記録媒体用ガラス基板の割れを防止するため、磁気記録媒体用ガラス基板を100℃〜150℃に予熱しておくことが好ましい。 In the present invention, before treating the glass substrate for a magnetic recording medium with a heated Li salt aqueous solution, the glass substrate for a magnetic recording medium is preheated to 100 ° C. to 150 ° C. in order to prevent the glass substrate for the magnetic recording medium from cracking. It is preferable to keep it.
溶出抑制処理の水溶液、すなわち、処理液に浸漬中、磁気記録媒体用ガラス基板の表面全体が均一にイオン交換できるようにするために、磁気記録媒体用ガラス基板を端面で保持、即ち、基板の厚さ方向の面を複数箇所で支持して実質的に鉛直方向に沿って立てた状態で、主表面において処理液と接触しない部分ができるだけ存在しないようにすることが望ましい。 During the immersion in the aqueous solution of the elution suppression treatment, i.e., the treatment liquid, the magnetic recording medium glass substrate is held at the end face so that the entire surface of the magnetic recording medium glass substrate can be uniformly ion-exchanged, i.e., In a state where the surface in the thickness direction is supported at a plurality of locations and is substantially vertically set, it is desirable that a portion of the main surface that does not come into contact with the processing liquid is minimized.
本発明に使用する磁気記録媒体用ガラス基板のガラス材料としては、例えば、ソーダライムガラス、アルミノシリケートガラス、アルミノボロシリケートガラス、ボロシリケートガラスなどが挙げられる。アルミノシリケートガラスは、化学強化処理による効果が大きく、高強度基板が得られる点から好ましい。 Examples of the glass material of the glass substrate for a magnetic recording medium used in the present invention include soda lime glass, aluminosilicate glass, aluminoborosilicate glass, and borosilicate glass. Aluminosilicate glass is preferable because the effect of the chemical strengthening treatment is large and a high-strength substrate can be obtained.
本発明のガラス成分の溶出抑制処理は、研磨工法により作製した磁気記録媒体用ガラス基板に対しても有効であるが、加圧成形した磁気記録媒体用ガラス基板においてより有効である。すなわち、加圧成形により作製した磁気記録媒体用ガラス基板は、表面のアルカリ成分が通常の研磨による磁気記録媒体用ガラス基板と比較して、アルカリ成分濃度が高い、これは加圧成形時にガラス中のナトリウムイオンやカリウムイオンなどのアルカリイオンがガラス表面に拡散するからである。したがって、溶出抑制処理のLi+とイオン交換可能なナトリウムイオンおよびカリウムイオンが、表面に多く存在し、イオン交換能が高く有効である。 The elution suppression treatment of the glass component of the present invention is effective for a magnetic recording medium glass substrate produced by a polishing method, but is more effective for a pressure-formed magnetic recording medium glass substrate. That is, the glass substrate for a magnetic recording medium manufactured by pressure molding has a higher alkali component concentration than that of a glass substrate for a magnetic recording medium obtained by normal polishing, because the alkali component on the surface is higher than that of the glass substrate during pressure molding. This is because alkali ions, such as sodium ions and potassium ions, diffuse into the glass surface. Therefore, a large amount of sodium ions and potassium ions that can be exchanged with Li + in the elution suppression treatment are present on the surface, and the ion exchange ability is high and effective.
必要に応じて化学強化処理を施した磁気記録媒体用ガラス基板に対しても本発明は有効である。化学強化処理は、加熱により溶融した化学強化処理液に磁気記録媒体用ガラス基板を浸漬し、磁気記録媒体用ガラス基板表面層のイオンを化学強化処理液中のイオンでイオン交換させる方法、即ち、イオン交換法によって行う。イオン交換法としては、低温型イオン交換法および高温型イオン交換法がある。エネルギー効率の観点およびガラス表面へのダメージを考慮すれば、低温型イオン交換法を採用することが好ましい。低温型イオン交換法では、ガラス転移温度(Tg)以下の温度領域にある化学強化処理液に浸漬し、磁気記録媒体用ガラス基板表面付近のアルカリイオン、例えばLi+またはNa+をそれよりもイオン半径の大きいアルカリイオン、例えばNa+またはK+と置換し、イオン交換した部分の容積増加によってガラス表面に強い圧縮応力を発生させてガラス表面を強化する。 The present invention is also effective for a glass substrate for a magnetic recording medium that has been subjected to a chemical strengthening treatment as required. Chemical strengthening treatment is a method of immersing a glass substrate for a magnetic recording medium in a chemical strengthening treatment liquid that has been melted by heating, and ion-exchanging ions of the magnetic recording medium glass substrate surface layer with ions in the chemical strengthening treatment liquid, that is, This is performed by an ion exchange method. As the ion exchange method, there are a low-temperature ion exchange method and a high-temperature ion exchange method. Considering energy efficiency and damage to the glass surface, it is preferable to employ a low-temperature ion exchange method. In the low-temperature ion exchange method, an alkali ion, for example, Li + or Na + near the surface of a glass substrate for a magnetic recording medium , is immersed in a chemical strengthening treatment solution in a temperature range of a glass transition temperature (Tg) or lower. It substitutes for alkali ions having a large radius, for example, Na + or K +, and generates a strong compressive stress on the glass surface by increasing the volume of the ion-exchanged portion, thereby strengthening the glass surface.
化学強化処理液の温度は、イオン交換を促進するためには高温であることが好ましいが、磁気記録媒体用ガラス基板の変形を防止するため、ガラス転移温度以下が好ましい。例えば、ガラス転移点が450℃〜800℃であるガラス材料からなる磁気記録媒体用ガラス基板を処理する場合、化学強化処理液の温度は、350℃〜700℃、特に350℃〜450℃であることが好ましい。 The temperature of the chemical strengthening treatment liquid is preferably high in order to promote ion exchange, but is preferably equal to or lower than the glass transition temperature in order to prevent deformation of the glass substrate for a magnetic recording medium . For example, when processing a glass substrate for a magnetic recording medium made of a glass material having a glass transition point of 450 ° C. to 800 ° C., the temperature of the chemical strengthening treatment solution is 350 ° C. to 700 ° C., particularly 350 ° C. to 450 ° C. Is preferred.
化学強化する際には、磁気記録媒体用ガラス基板の割れやヒビを防止するため、また化学強化処理液中の溶融塩が磁気記録媒体用ガラス基板表面において結晶化することを防止するため、磁気記録媒体用ガラス基板を化学強化処理液に浸漬する前に、磁気記録媒体用ガラス基板を200℃〜350℃に予熱することが望ましい。 When chemical strengthening, in order to prevent cracking and cracks the glass substrate for a magnetic recording medium, and to prevent the molten salt of the chemical strengthening treatment solution to crystallize the glass substrate surface for a magnetic recording medium, a magnetic It is desirable to preheat the glass substrate for a magnetic recording medium to 200 ° C. to 350 ° C. before immersing the glass substrate for a recording medium in the chemical strengthening treatment liquid.
化学強化処理液に浸漬中、磁気記録媒体用ガラス基板の表面全体が均一に化学強化するため、磁気記録媒体用ガラス基板を端面で保持、即ち、基板の厚さ方向の面を複数箇所で支持して実質的に鉛直方向に沿って立てた状態で、主表面において処理液と接触しない部分ができるだけ存在しないようにすることが望ましい。 During immersion in the chemical strengthening treatment liquid, the entire surface of the magnetic recording medium glass substrate is chemically strengthened uniformly, so that the magnetic recording medium glass substrate is held at the end face, that is, the surface in the thickness direction of the substrate is supported at a plurality of locations. Then, it is desirable that a portion that does not come into contact with the processing liquid on the main surface is as small as possible in a state where the processing solution stands substantially vertically.
本発明の記録媒体としての磁気記録媒体は、上述のようにして溶出抑制処理を施した磁気記録媒体用ガラス基板上に、少なくとも記録層としての磁気記録層を形成したことを特徴とする。ここで、磁気記録層やその他の層としては公知のものを使用できる。 The magnetic recording medium as the recording medium of the present invention is characterized in that at least a magnetic recording layer as a recording layer is formed on a glass substrate for a magnetic recording medium that has been subjected to the elution suppression process as described above. Here, known magnetic recording layers and other layers can be used.
本発明の磁気記録媒体は、アルカリイオンの溶出を著しく抑制した磁気記録媒体用ガラス基板を使用しているので、耐候性及び寿命に優れ、高い信頼性を示す。 Since the magnetic recording medium of the present invention uses a glass substrate for a magnetic recording medium in which elution of alkali ions is significantly suppressed, the magnetic recording medium is excellent in weather resistance and life, and exhibits high reliability.
また、本発明によって得られる磁気記録媒体用ガラス基板は、光学材料、建築材料および機械部品等にも適用することができる。 Further, the glass substrate for a magnetic recording medium obtained by the present invention can be applied to optical materials, building materials, mechanical parts, and the like.
【0047】
【実施例】
以下、本発明の具体例を説明する。
(実施例1)
本実施例における磁気記録媒体用ガラス基板を、以下の成形工程およぴ溶出抑制処理工程によって製造し、さらに、成膜工程を経て磁気記録媒体を製造した。
(1)成形工程
基板材料として、軟化点690℃のアルミナシリケイト系ガラスからなる円柱形状のガラス材料を用意した。また、加圧成形用の金型として、タングステンカーバイト系の超硬合金からなる金型を一対用意した。この金型のプレス面は平坦であり、研磨により鏡面加工された面に、保護膜として白金合金が1μmとなるようにスパッタリングし、中心線平均粗さが1nmの表面を得た。加圧成形は、金型のプレス面にガラス材料を挟み、690℃まで加熱した後、350kg/cm2の圧力を加え、ガラス材料が所定の厚さとなるまで行った。加圧時間は約1分であった。加圧成形後、冷却し、厚さ0.64mm、直径84mmのディスク用のガラス基板を得た。
(2)溶出抑制処理工程
上記加圧成形工程を終えた磁気記録媒体用ガラス基板を、Li塩を含有する水溶液で処理を行なった。処理液として、1000gの純水にLiNO3を2600g加えた水溶液を130℃に加熱したものを用意した。上記磁気記録媒体用ガラス基板を100℃に予熱した後、1時間浸漬して行った。浸漬の際には、磁気記録媒体用ガラス基板表面が均一に処理されるよう磁気記録媒体用ガラス基板の端面で保持した。上記溶出抑制処理を終えた磁気記録媒体用ガラス基板を、中性洗剤とPVAスポンジを用いたスクラブ洗浄、アルカリ洗剤洗浄(2%セミクリーン(商品名)、pH=12、横浜油脂製)、18MΩ以上の超純水を用いて十分に濯ぎ、イソプロピルアルコール蒸気乾燥を行なった。
(3)成膜工程
上記処理を行った磁気記録媒体用ガラス基板に、スパッタ法を用いてCr下地層、Co-Cr-Pt系磁性層、C保護層を順次形成し、ディップコート法を用いてフッ素系液体潤滑剤を塗布して、磁気記録媒体とした。
[0047]
【Example】
Hereinafter, specific examples of the present invention will be described.
(Example 1)
The glass substrate for a magnetic recording medium in this example was manufactured by the following forming step and elution suppression processing step, and further, a magnetic recording medium was manufactured through a film forming step.
(1) Forming Step A cylindrical glass material made of alumina silicate glass having a softening point of 690 ° C. was prepared as a substrate material. In addition, a pair of molds made of a tungsten carbide cemented carbide was prepared as a mold for pressure molding. The press surface of this mold was flat, and a surface having a center line average roughness of 1 nm was obtained by sputtering a platinum alloy as a protective film on the surface mirror-finished by polishing so as to have a thickness of 1 μm. The pressure molding was performed by sandwiching a glass material on the pressing surface of a mold, heating the material to 690 ° C., and applying a pressure of 350 kg / cm 2 until the glass material had a predetermined thickness. Pressing time was about 1 minute. After pressure molding, the substrate was cooled to obtain a disk glass substrate having a thickness of 0.64 mm and a diameter of 84 mm.
(2) Elution Suppression Treatment Step The glass substrate for a magnetic recording medium after the above-mentioned pressure molding step was treated with an aqueous solution containing a Li salt. A treatment solution prepared by heating an aqueous solution obtained by adding 2600 g of LiNO 3 to 1000 g of pure water and heating to 130 ° C. was prepared. The glass substrate for a magnetic recording medium was preheated to 100 ° C. and then immersed for 1 hour. During immersion, it was held at the end surface of the glass substrate for a magnetic recording medium so that the magnetic recording medium glass substrate surface is uniformly processed. The glass substrate for a magnetic recording medium after the above-mentioned elution suppression treatment is scrub-washed with a neutral detergent and PVA sponge, washed with an alkaline detergent (2% semi-clean (trade name), pH = 12, manufactured by Yokohama Yushi), 18 MΩ The above-mentioned ultrapure water was sufficiently rinsed, and isopropyl alcohol vapor drying was performed.
(3) Film-forming step A Cr underlayer, a Co-Cr-Pt-based magnetic layer, and a C protective layer are sequentially formed on the glass substrate for a magnetic recording medium that has been subjected to the above processing by a sputtering method, and a dip coating method is used. Then, a fluorine-based liquid lubricant was applied to obtain a magnetic recording medium.
以上のようにして製造された磁気記録媒体用ガラス基板および磁気記録媒体の評価を以下のようにして行った。すなわち、磁気記録媒体用ガラス基板における抗折強度、アルカリ溶出量、表面粗さ及び磁気記録媒体におけるエラー数測定で行った。各評価法を表1に示す The glass substrate for a magnetic recording medium and the magnetic recording medium manufactured as described above were evaluated as follows. That is, the measurement was performed by measuring the bending strength, the alkali elution amount, the surface roughness and the number of errors in the magnetic recording medium on the glass substrate for the magnetic recording medium . Table 1 shows the evaluation methods.
実施例2は、溶出抑制処理において、処理液の温度を170℃とし、処理時間を10分とした以外は実施例1と同じ条件で製造し、評価した。
(実施例3,4)
実施例3,4は、成形工程を研磨工程で行った以外はそれぞれ実施例1、2と同じ条件で製造し、評価した。研磨による磁気記録媒体用ガラス基板は、実施例1で使用したものと同じガラス材料からなる厚さ1mmのガラス板をφ65mmに切り出した後、酸化セリウムを用いて厚みが0.64mmとなるまで研磨した後、コロイダルシリカを用い中心線平均粗さが1nm以下となるように研磨することにより得た。
(実施例5)
実施例5は、成形工程と溶出抑制処理工程との間に、化学強化処理を施した以外は実施例1と同じである。すなわち、成形工程を終えた磁気記録媒体用ガラス基板を洗浄後、化学強化処理を施したものである。化学強化処理は、硝酸カリウム(60%)硝酸ナトリウム(40%)を混合した化学強化処理液を用意し、この化学強化処理液を400℃に加熱し、350℃で予熱した上記磁気記録媒体用ガラス基板を2時間浸漬して行った。浸漬の際には、ガラス表面が均一に処理されるように磁気記録媒体用ガラス基板の端面で保持した。上記化学強化処理を終えた磁気記録媒体用ガラス基板を200℃まで徐冷し、20℃の水槽に浸漬して急冷し約20分間放置した。その後、中性洗剤とPVAスポンジを用いたスクラブ洗浄,18MΩ以上の超純水を用いて十分に濯ぎ、イソプロピルアルコール蒸気乾燥を行なった。
(実施例6)
実施例6は、成形工程を研磨工程で行ったこと以外は実施例5と同じ条件で製造し、評価を行った。研磨による磁気記録媒体用ガラス基板は、実施例2と同じものを用意した。
(比較例)
溶出抑制処理工程における処理以外は実施例1と同じである。比較例として行った溶出抑制処理条件を表2に示す。比較例1は、溶出抑制処理を行なっていない以外は、実施例1と同じである。比較例2は、溶出抑制処理の処理温度を100℃以下の80℃としたこと以外は実施例1と同じである。比較例3は、実施例1の処理液に硝酸を添加しpHを5以下の2に調整したもの以外は実施例1と同じである。比較例4は、実施例1の処理液に水酸化リチウムを添加しpHを9以上の12に調整したもの以外は実施例1と同じである。
Example 2 was manufactured and evaluated under the same conditions as in Example 1 except that the temperature of the treatment liquid was set to 170 ° C. and the treatment time was set to 10 minutes in the elution suppression treatment.
(Examples 3, 4)
Examples 3 and 4 were manufactured and evaluated under the same conditions as Examples 1 and 2, respectively, except that the forming step was performed by a polishing step. A glass substrate for a magnetic recording medium was polished by cutting a 1 mm thick glass plate made of the same glass material as that used in Example 1 into φ65 mm, and then polishing it to a thickness of 0.64 mm using cerium oxide. Then, it was obtained by polishing using colloidal silica so that the center line average roughness was 1 nm or less.
(Example 5)
Example 5 is the same as Example 1 except that a chemical strengthening treatment was performed between the molding step and the elution suppression processing step. That is, the glass substrate for a magnetic recording medium after the molding step is washed and then subjected to a chemical strengthening treatment. For the chemical strengthening treatment, a glass for the magnetic recording medium pre-heated at 350 ° C. by heating the chemical strengthening solution to 400 ° C. by preparing a chemical strengthening treatment solution in which potassium nitrate (60%) and sodium nitrate (40%) are mixed. This was performed by immersing the substrate for 2 hours. During the immersion, the glass surface was held on the end surface of the glass substrate for a magnetic recording medium so that the glass surface was uniformly treated. The glass substrate for a magnetic recording medium after the chemical strengthening treatment was gradually cooled to 200 ° C., immersed in a water bath at 20 ° C., rapidly cooled, and left for about 20 minutes. Then, scrub cleaning using a neutral detergent and PVA sponge, sufficiently rinsed using the above ultrapure water 18 M [Omega, becomes the row of isopropyl alcohol vapor drying.
(Example 6)
Example 6 was manufactured and evaluated under the same conditions as Example 5 except that the forming step was performed by a polishing step. The same glass substrate as in Example 2 was prepared by polishing the magnetic recording medium glass substrate.
(Comparative example)
It is the same as Example 1 except for the process in the elution suppression process. Table 2 shows elution suppression treatment conditions performed as comparative examples. Comparative Example 1 is the same as Example 1 except that the elution suppression treatment was not performed. Comparative Example 2 is the same as Example 1 except that the treatment temperature of the elution suppression treatment was set to 80 ° C. which was 100 ° C. or less. Comparative Example 3 is the same as Example 1 except that nitric acid was added to the treatment liquid of Example 1 to adjust the pH to 2 of 5 or less. Comparative Example 4 is the same as Example 1 except that the pH was adjusted to 9 or more to 12 by adding lithium hydroxide to the treatment liquid of Example 1.
以上のように、磁気記録媒体用ガラス基板をリチウム塩を含有する水溶液に接触させることにより、ガラスの表面性の悪化や強度の劣化がなく、ガラス成分、特にアルカリイオン成分の溶出を防ぐことができる。さらに、加熱軟化したガラス材料を、加圧成形することにより得られる磁気記録媒体用ガラス基板はこの効果が高いことを確認した。また、化学強化を施した磁気記録媒体用ガラス基板に対しても本処理は有効である。さらに本処理を施した磁気記録媒体用ガラス基板、すなわち、ガラス成分の溶出を効果的に抑制した強度劣化のない磁気記録媒体用ガラス基板を用いて磁気記録媒体を製造するので、高い信頼性の磁気記録媒体を得ることができる。 As described above, by bringing the glass substrate for a magnetic recording medium into contact with an aqueous solution containing a lithium salt, there is no deterioration in the surface properties or strength of the glass, and it is possible to prevent the elution of glass components, particularly alkali ion components. it can. Further, it was confirmed that a glass substrate for a magnetic recording medium obtained by press-molding a heat-softened glass material had a high effect. This process is also effective for chemically strengthened glass substrates for magnetic recording media . Further glass substrate for a magnetic recording medium subjected to the present process, i.e., since the production of magnetic recording medium using a magnetic recording medium glass substrate without eluting effectively suppress the deterioration of strength of glass component, high reliability A magnetic recording medium can be obtained.
【0057】
【発明の効果】
以上のように本発明によれば、磁気記録媒体用ガラス基板をリチウム塩を含有する水溶液に接触させることにより、ガラス成分の溶出を効果的に抑制することができるとともに、強度の劣化もほとんどない。さらに、ガラス成分の溶出抑制処理を施した磁気記録媒体用ガラス基板を用いることによって、信頼性の高い記録媒体を得ることができる。
[0057]
【The invention's effect】
As described above, according to the present invention, by bringing the glass substrate for a magnetic recording medium into contact with an aqueous solution containing a lithium salt, elution of glass components can be effectively suppressed, and there is almost no deterioration in strength. . Furthermore, a highly reliable recording medium can be obtained by using a glass substrate for a magnetic recording medium that has been subjected to a glass component elution suppression treatment.
【図面の簡単な説明】
【図1】
本発明の一実施例の磁気記録媒体用ガラス基板における表面部分の深さと金属イオン濃度との関係を示す図である。
[Brief description of the drawings]
FIG.
FIG. 3 is a diagram showing the relationship between the depth of the surface portion and the metal ion concentration in the glass substrate for a magnetic recording medium according to one embodiment of the present invention.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
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| JP2001012991A JP2002220259A (en) | 2001-01-22 | 2001-01-22 | Glass substrate, method for manufacturing glass substrate, and method for manufacturing recording medium |
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| JP2001012991A JP2002220259A (en) | 2001-01-22 | 2001-01-22 | Glass substrate, method for manufacturing glass substrate, and method for manufacturing recording medium |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| JPWO2005093720A1 (en) * | 2004-03-25 | 2008-02-14 | Hoya株式会社 | Glass substrate for magnetic disk |
| JP4539282B2 (en) | 2004-04-16 | 2010-09-08 | 富士電機デバイステクノロジー株式会社 | Disk substrate for perpendicular magnetic recording medium and perpendicular magnetic recording medium using the same |
| JP4479528B2 (en) | 2004-07-27 | 2010-06-09 | 富士電機デバイステクノロジー株式会社 | Method of plating on glass substrate, method of manufacturing disk substrate for magnetic recording medium using the plating method, and method of manufacturing perpendicular magnetic recording medium |
| US8499583B2 (en) * | 2005-03-31 | 2013-08-06 | Hoya Corporation | Method of manufacturing magnetic-disk glass substrate and method of manufacturing magnetic disk |
| JP5046103B2 (en) | 2007-09-06 | 2012-10-10 | 富士電機株式会社 | Manufacturing method of glass substrate |
| JP2010080015A (en) * | 2008-09-27 | 2010-04-08 | Hoya Corp | Glass material for manufacturing glass substrate for magnetic disk, method of manufacturing glass substrate for magnetic disk, and method of manufacturing magnetic disk |
| JP2012216251A (en) * | 2011-03-31 | 2012-11-08 | Konica Minolta Advanced Layers Inc | Method for manufacturing glass substrate for magnetic information recording medium |
| US9045364B2 (en) * | 2012-11-30 | 2015-06-02 | Owens-Brockway Glass Container Inc | Surface treatment process for glass containers |
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