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JP2002176021A - Method and equipment for ultrasonic cleaning - Google Patents

Method and equipment for ultrasonic cleaning

Info

Publication number
JP2002176021A
JP2002176021A JP2000369490A JP2000369490A JP2002176021A JP 2002176021 A JP2002176021 A JP 2002176021A JP 2000369490 A JP2000369490 A JP 2000369490A JP 2000369490 A JP2000369490 A JP 2000369490A JP 2002176021 A JP2002176021 A JP 2002176021A
Authority
JP
Japan
Prior art keywords
ultrasonic
cleaning
cleaning liquid
cleaned
vibrator
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2000369490A
Other languages
Japanese (ja)
Inventor
Toshiaki Miyamoto
年昭 宮本
Yuichi Maita
雄一 舞田
Tomomi Hikita
智美 疋田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Honda Electronics Co Ltd
Original Assignee
Honda Electronics Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Honda Electronics Co Ltd filed Critical Honda Electronics Co Ltd
Priority to JP2000369490A priority Critical patent/JP2002176021A/en
Publication of JP2002176021A publication Critical patent/JP2002176021A/en
Pending legal-status Critical Current

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  • Cleaning By Liquid Or Steam (AREA)
  • Cleaning Or Drying Semiconductors (AREA)

Abstract

PROBLEM TO BE SOLVED: To solve the problem raised by cleaning equipment using a cleaning tank that contaminants deposited on an object to be cleaned redeposit on the object, because the object is dipped in a cleaning liquid, and another problem raised by another cleaning equipment using a nozzle 1 that the used quantity of a cleaning liquid 4 becomes larger. SOLUTION: An ultrasonic vibrator 7 is fitted to the bottom face of an ultrasonic wave generating section 6 and the vibrator 7 is electrically connected to a connector 9 fitted to the top face of the section 6 through an electrode lead wire 8. The oscillated output of an ultrasonic oscillator 11 is supplied to the connector 9 through a lead wire 10. In addition, the object 12 to be cleaned, such as the wafer, etc., is held in a state where the object 12 is faced to the ultrasonic vibrator 7 of the ultrasonic wave generating section 6 at a very short interval and nozzles 14 which supply the cleaning liquid fed from a cleaning liquid supplying device 13 are fitted to both sides of the generating section 6.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明が属する技術分野】本発明は、超音波振動子と被
洗浄物の間の微小間隙に洗浄液を供給して洗浄する超音
波洗浄装置に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an ultrasonic cleaning apparatus for cleaning by supplying a cleaning liquid to a minute gap between an ultrasonic vibrator and an object to be cleaned.

【0002】[0002]

【従来の技術】従来の超音波洗浄装置は、洗浄槽の底部
の振動板に超音波振動子を装着し、この超音波振動子に
電源から発振出力を印加すると、超音波振動子は固有の
周波数の超音波を発生するので、この超音波は洗浄槽内
の洗浄液に照射されることにより、洗浄液内にキャビテ
ーションを発生し、このキャビテーションによって洗浄
液内の被洗浄物を洗浄するように構成されるか、又、図
6に示すように、ノズル1に装着した洗浄液供給管2か
らノズル1の内部に洗浄液を供給し、超音波発振器から
リード線3を介してノズル1内の超音波振動子に発振出
力を供給することにより、移動する半導体ウエハのよう
な被洗浄物5の上にノズル1から洗浄液4が供給される
とともに、この洗浄液4に超音波振動子からの超音波を
乗せて被洗浄物3に照射して洗浄するようにした洗浄装
置が提案されている。
2. Description of the Related Art In a conventional ultrasonic cleaning apparatus, an ultrasonic vibrator is mounted on a vibration plate at the bottom of a cleaning tank, and when an oscillation output is applied from a power source to the ultrasonic vibrator, the ultrasonic vibrator has a unique ultrasonic vibrator. Since the ultrasonic waves of the frequency are generated, the ultrasonic waves are irradiated to the cleaning liquid in the cleaning tank, thereby generating cavitation in the cleaning liquid, and the cavitation is used to wash the object to be cleaned in the cleaning liquid. Alternatively, as shown in FIG. 6, the cleaning liquid is supplied into the nozzle 1 from the cleaning liquid supply pipe 2 attached to the nozzle 1, and the cleaning liquid is supplied from the ultrasonic oscillator to the ultrasonic vibrator in the nozzle 1 via the lead wire 3. By supplying the oscillation output, the cleaning liquid 4 is supplied from the nozzle 1 onto the cleaning object 5 such as a moving semiconductor wafer, and the ultrasonic wave from the ultrasonic vibrator is put on the cleaning liquid 4 to be cleaned. Thing 3 Cleaning apparatus has been proposed which is adapted to wash irradiating the.

【0003】[0003]

【発明が解決しようとする課題】しかしながら、このよ
うな超音波洗浄装置において、洗浄槽を使用するもので
は、被洗浄物が洗浄液に浸漬されているために、汚れが
再付着するという欠点があり、又、ノズル1を使用した
洗浄装置では、洗浄液4の量が多くなるという問題がっ
た。
However, in such an ultrasonic cleaning apparatus using a cleaning tank, there is a disadvantage that the object to be cleaned is immersed in the cleaning liquid, so that the dirt adheres again. Further, in the cleaning apparatus using the nozzle 1, there is a problem that the amount of the cleaning liquid 4 is increased.

【0004】[0004]

【課題を解決しようとする手段】本発明は、超音波振動
子と被洗浄物との間に微小間隙を設けて支持し、該微小
間隙に洗浄液を供給して前記超音波振動子から超音波を
前記被洗浄物に照射して洗浄する超音波洗浄方法であ
り、又、超音波振動子を一面に装着した超音波発生部
と、該超音波発生部の前記超音波振動子を設けた面と微
小間隙を設けて対向する被洗浄物と、該被洗浄物と前記
超音波振動子の間に洗浄液を供給するノズルを前記超音
波発生部の少なくとも片側に設けた超音波洗浄装置であ
り、さらに、前記ノズルは前記超音波発生部の両側に装
着してもよいし、前記ノズルの流出口は前記超音波発生
部の側部に沿って幅広く設けてもよいし、前記ノズルは
前記超音波振動子の長さだけ幅の広い供給口がもうけら
れて前記超音波発生部の少なくとも片側の超音波振動子
の近傍に装着されてもよい。
SUMMARY OF THE INVENTION According to the present invention, there is provided a micro gap provided between an ultrasonic vibrator and an object to be cleaned, and a cleaning liquid is supplied to the micro gap so that an ultrasonic wave is generated from the ultrasonic vibrator. Is an ultrasonic cleaning method of irradiating the object to be cleaned with an ultrasonic generator, and an ultrasonic generator mounted on one side of the ultrasonic generator, and a surface of the ultrasonic generator that is provided with the ultrasonic vibrator. An object to be cleaned provided with a minute gap, and an ultrasonic cleaning apparatus provided with a nozzle for supplying a cleaning liquid between the object to be cleaned and the ultrasonic vibrator on at least one side of the ultrasonic generator, Further, the nozzle may be mounted on both sides of the ultrasonic generator, the outlet of the nozzle may be provided widely along the side of the ultrasonic generator, or the nozzle may be provided with the ultrasonic generator. A supply port wide by the length of the vibrator is provided and the ultrasonic generator It may be mounted in the vicinity of at least one side of the ultrasonic vibrator.

【0005】[0005]

【発明の実施の形態】本発明では、超音波発生部の超音
波振動子と被洗浄物の間に微小間隙を設けて支持し、こ
の微小間隙に洗浄液を供給し、被洗浄物を移動しながら
超音波振動子から被洗浄物に超音波を照射すると、微小
間隙に保持された洗浄液を介して超音波が被洗浄物に照
射されるので、被洗浄物の表面を少ない洗浄液で、又、
超音波出力が小さくても洗浄することができる。
DESCRIPTION OF THE PREFERRED EMBODIMENTS In the present invention, a minute gap is provided between an ultrasonic oscillator of an ultrasonic generator and an object to be cleaned and supported, and a cleaning liquid is supplied to the minute gap to move the object to be cleaned. While irradiating the object to be cleaned with ultrasonic waves from the ultrasonic vibrator while applying ultrasonic waves to the object to be cleaned through the cleaning liquid held in the minute gap, the surface of the object to be cleaned is cleaned with a small amount of cleaning liquid,
Cleaning can be performed even if the ultrasonic output is small.

【0006】[0006]

【実施例】図1は本発明の1実施例の超音波洗浄槽の構
成図、図2は図1の超音波発生部の斜視図、図3は図1
の超音波発生部の断面図で、超音波発生部6の下面に超
音波振動子7が装着され、超音波振動子7は超音波発生
部6の上部に装着したコネクタ9に電極リード線8で電
気的に接続され、このコネクタ9にケーブル10を介し
て超音波発振器11から発振出力が供給され、さらに、
超音波発生部6の超音波振動子7と対向して半導体ウエ
ハのような被洗浄物12が微小間隙を設けて保持され、
超音波発生部6の両側に洗浄液供給装置13から洗浄液
を供給するノズル14が装着されている。
FIG. 1 is a structural view of an ultrasonic cleaning tank according to one embodiment of the present invention, FIG. 2 is a perspective view of an ultrasonic generator of FIG. 1, and FIG.
The ultrasonic vibrator 7 is mounted on the lower surface of the ultrasonic generator 6, and the ultrasonic vibrator 7 is connected to a connector 9 mounted on the upper part of the ultrasonic generator 6 by an electrode lead wire 8. The connector 9 is electrically connected, and an oscillating output is supplied from the ultrasonic oscillator 11 to the connector 9 via the cable 10.
An object to be cleaned 12, such as a semiconductor wafer, is held with a minute gap in opposition to the ultrasonic transducer 7 of the ultrasonic generator 6,
Nozzles 14 for supplying a cleaning liquid from a cleaning liquid supply device 13 are mounted on both sides of the ultrasonic generator 6.

【0007】このように構成した本実施例の超音波洗浄
装置では、超音波発生部6の超音波振動子7と微小間隙
を介して保持された被洗浄物12の間にノズル14から
洗浄液を供給すると、表面張力により超音波振動子7の
下面の全面に洗浄液が供給され、そして、被洗浄物12
を移動しながら超音波発振器11から超音波振動子7に
発振出力を印加すると、超音波振動子7から照射された
超音波は超音波振動子7と被洗浄物12の間の微小間隙
に保持された洗浄液を介して被洗浄物12の表面に照射
されるので、被洗浄物12の表面を超音波と洗浄液によ
り洗浄することができる。
In the ultrasonic cleaning apparatus according to the present embodiment, the cleaning liquid is supplied from the nozzle 14 between the ultrasonic vibrator 7 of the ultrasonic generator 6 and the object 12 to be cleaned held through a small gap. When the cleaning liquid is supplied, the cleaning liquid is supplied to the entire lower surface of the ultrasonic vibrator 7 by the surface tension.
When an oscillation output is applied from the ultrasonic oscillator 11 to the ultrasonic vibrator 7 while moving the ultrasonic wave, the ultrasonic waves emitted from the ultrasonic vibrator 7 are held in the minute gap between the ultrasonic vibrator 7 and the object 12 to be cleaned. Since the surface of the object to be cleaned 12 is irradiated through the cleaning liquid thus applied, the surface of the object to be cleaned 12 can be cleaned with ultrasonic waves and the cleaning liquid.

【0008】このように、本実施例の超音波洗浄装置で
は、超音波発生部6と被洗浄物12の間の微小間隙に洗
浄液を供給すればよいので、洗浄液が従来例より非常に
少量で済み、又、超音波振動子7と被洗浄物12との間
隙が微小であるので、低いパワーの超音波で十分に洗浄
することができ、さらに、超音波発生部6のサイズを被
洗浄物12のサイズに合うように設計することにより、
被洗浄物12の移動距離が少なくて済み、従って、洗浄
時間が従来例に比べて短くなるという利点がある。
As described above, in the ultrasonic cleaning apparatus according to the present embodiment, the cleaning liquid may be supplied to the minute gap between the ultrasonic generator 6 and the object 12 to be cleaned. In addition, since the gap between the ultrasonic vibrator 7 and the object to be cleaned 12 is very small, cleaning can be sufficiently performed with low-power ultrasonic waves. By designing to fit the size of 12,
There is an advantage that the moving distance of the object to be cleaned 12 can be reduced, and the cleaning time is shorter than in the conventional example.

【0009】なお、上記実施例では、長さのある超音波
発生部6の超音波振動子7の下に洗浄液を供給するため
に、ノズル14を超音波発生部6の側部1カ所に設けた
が、それ以上の数のノズルを設けても良いし、又、図4
に示すように、ノズル14の供給口14aを超音波発生
部6の長さだけ長くすしても良い。
In the above embodiment, the nozzle 14 is provided at one side of the ultrasonic generator 6 in order to supply the cleaning liquid under the ultrasonic vibrator 7 of the ultrasonic generator 6 having a long length. However, more nozzles may be provided, and FIG.
As shown in (2), the supply port 14a of the nozzle 14 may be made longer by the length of the ultrasonic wave generator 6.

【0010】図5は本発明の他の実施例の超音波洗浄装
置の断面図で、6は超音波発生部、7は超音波振動子、
8は電極リード線、9はコネクタ、10はケーブル、1
2は被洗浄物であり、これらの構成は上記実施例と同じ
であるので、説明は省略するが、本実施例では、ノズル
15を超音波発生部1の超音波振動子2の両側に設け
る。
FIG. 5 is a sectional view of an ultrasonic cleaning apparatus according to another embodiment of the present invention, 6 is an ultrasonic generator, 7 is an ultrasonic oscillator,
8 is an electrode lead wire, 9 is a connector, 10 is a cable, 1
Reference numeral 2 denotes an object to be cleaned, and since the configuration thereof is the same as that of the above-described embodiment, the description thereof will be omitted. .

【0011】このように構成した本実施例では、ノズル
15が超音波発生部6に装着されているので、上記実施
例のようにノズルを支持する必要がなく、被洗浄物12
と超音波発生部6のどちらか片方を移動しても良い。
In this embodiment constructed as described above, since the nozzle 15 is mounted on the ultrasonic wave generator 6, there is no need to support the nozzle as in the above-described embodiment.
Or one of the ultrasonic generator 6 may be moved.

【0012】[0012]

【発明の効果】以上説明したように、本発明の超音波洗
浄装置では、超音波発生部の超音波振動子と被洗浄物の
間に微小間隙で保持し、この微小間隙にノズルより洗浄
液を供給することにより、微小間隙で保持された洗浄液
を介して超音波振動子から発生した超音波が照射されて
被洗浄物が洗浄されるので、洗浄液が少量で済み、又、
超音波振動子に供給するパワーが少なくて済み、さら
に、洗浄時間が短くて済むという利点がある。
As described above, in the ultrasonic cleaning apparatus of the present invention, the cleaning liquid is held between the ultrasonic vibrator of the ultrasonic generator and the object to be cleaned in the minute gap, and the cleaning liquid is supplied from the nozzle to the minute gap. By supplying, the object to be cleaned is cleaned by irradiating the ultrasonic waves generated from the ultrasonic vibrator through the cleaning liquid held in the minute gap, so that only a small amount of the cleaning liquid is required,
There is an advantage that less power is required to be supplied to the ultrasonic vibrator and that the cleaning time is shorter.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の実施例の超音波洗浄装置の構成図であ
る。
FIG. 1 is a configuration diagram of an ultrasonic cleaning apparatus according to an embodiment of the present invention.

【図2】図1の超音波発生部の斜視図である。FIG. 2 is a perspective view of the ultrasonic generator of FIG. 1;

【図3】図1の超音波発生部の断面図である。FIG. 3 is a cross-sectional view of the ultrasonic generator of FIG.

【図4】本発明の実施例の超音波洗浄装置の他の構成図
である。
FIG. 4 is another configuration diagram of the ultrasonic cleaning apparatus according to the embodiment of the present invention.

【図5】本発明の他の実施例の超音波洗浄装置の構成図
である。
FIG. 5 is a configuration diagram of an ultrasonic cleaning apparatus according to another embodiment of the present invention.

【図6】従来例の超音波洗浄装置の構成図である。FIG. 6 is a configuration diagram of a conventional ultrasonic cleaning apparatus.

【符号の説明】[Explanation of symbols]

6 超音波発生部 7 超音波振動子 8 電極リード線 9 コネクタ 10 ケーブル 11 超音波発振器 12 被洗浄物 13 洗浄液供給装置 14,15 ノズル 6 Ultrasonic generator 7 Ultrasonic transducer 8 Electrode lead wire 9 Connector 10 Cable 11 Ultrasonic oscillator 12 Object to be cleaned 13 Cleaning liquid supply device 14, 15 Nozzle

フロントページの続き (72)発明者 疋田 智美 愛知県豊橋市大岩町字小山塚20番地 本多 電子株式会社内 Fターム(参考) 3B201 AA03 AB01 AB37 BB22 BB85 BB92 CB01 Continued on the front page (72) Inventor Tomomi Hikita 20 Koyamazuka, Oiwa-cho, Toyohashi-shi, Aichi F-term in Honda Electronics Co., Ltd. (reference) 3B201 AA03 AB01 AB37 BB22 BB85 BB92 CB01

Claims (5)

【特許請求の範囲】[Claims] 【請求項1】 超音波振動子と被洗浄物との間に微小間
隙を設けて支持し、該微小間隙に洗浄液を供給して前記
超音波振動子から超音波を前記被洗浄物に照射して洗浄
することを特徴とする超音波洗浄方法。
An ultrasonic transducer and an object to be cleaned are provided with a minute gap between them and supported. A cleaning liquid is supplied to the minute gap to irradiate the ultrasonic wave from the ultrasonic transducer to the object to be cleaned. Ultrasonic cleaning method characterized by cleaning by washing.
【請求項2】 超音波振動子を一面に装着した超音波発
生部と、該超音波発生部の前記超音波振動子を設けた面
と微小間隙を設けて対向する被洗浄物と、該被洗浄物と
前記超音波振動子の間に洗浄液を供給するノズルを前記
超音波発生部の少なくとも片側に設けたことを特徴とす
る超音波洗浄装置。
2. An ultrasonic generator having an ultrasonic vibrator mounted on one surface thereof, an object to be cleaned facing the surface of the ultrasonic generator on which the ultrasonic vibrator is provided with a small gap, An ultrasonic cleaning apparatus, wherein a nozzle for supplying a cleaning liquid between a cleaning object and the ultrasonic vibrator is provided on at least one side of the ultrasonic generator.
【請求項3】 前記ノズルは前記超音波発生部の両側に
装着されることを特徴とする請求項2記載の超音波洗浄
装置。
3. The ultrasonic cleaning apparatus according to claim 2, wherein the nozzle is mounted on both sides of the ultrasonic generator.
【請求項4】 前記ノズルの流出口は前記超音波発生部
の側部に沿って幅広く設けられたことを特徴とする請求
項2記載の超音波洗浄装置。
4. The ultrasonic cleaning apparatus according to claim 2, wherein the outlet of the nozzle is provided widely along a side portion of the ultrasonic generator.
【請求項5】 前記ノズルは前記超音波振動子の長さだ
け幅の広い供給口がもうけられて前記超音波発生部の少
なくとも片側の超音波振動子の近傍に装着されることを
特徴とする請求項2記載の超音波洗浄装置。
5. The apparatus according to claim 1, wherein the nozzle is provided with a supply port having a width corresponding to the length of the ultrasonic vibrator, and mounted near at least one side of the ultrasonic vibrator on the ultrasonic generator. The ultrasonic cleaning device according to claim 2.
JP2000369490A 2000-12-05 2000-12-05 Method and equipment for ultrasonic cleaning Pending JP2002176021A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000369490A JP2002176021A (en) 2000-12-05 2000-12-05 Method and equipment for ultrasonic cleaning

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000369490A JP2002176021A (en) 2000-12-05 2000-12-05 Method and equipment for ultrasonic cleaning

Publications (1)

Publication Number Publication Date
JP2002176021A true JP2002176021A (en) 2002-06-21

Family

ID=18839517

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000369490A Pending JP2002176021A (en) 2000-12-05 2000-12-05 Method and equipment for ultrasonic cleaning

Country Status (1)

Country Link
JP (1) JP2002176021A (en)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS551114A (en) * 1978-06-19 1980-01-07 Hitachi Ltd Method and device for washing wafer
JPH1133506A (en) * 1997-07-24 1999-02-09 Tadahiro Omi Fluid treatment device and cleaning treatment system
JP2000254606A (en) * 1999-03-10 2000-09-19 Kaijo Corp Ultrasonic cleaning device and wet-process nozzle fitted with the same

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS551114A (en) * 1978-06-19 1980-01-07 Hitachi Ltd Method and device for washing wafer
JPH1133506A (en) * 1997-07-24 1999-02-09 Tadahiro Omi Fluid treatment device and cleaning treatment system
JP2000254606A (en) * 1999-03-10 2000-09-19 Kaijo Corp Ultrasonic cleaning device and wet-process nozzle fitted with the same

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