JP2002161261A - Thermosetting heat-resistant adhesive film - Google Patents
Thermosetting heat-resistant adhesive filmInfo
- Publication number
- JP2002161261A JP2002161261A JP2000361408A JP2000361408A JP2002161261A JP 2002161261 A JP2002161261 A JP 2002161261A JP 2000361408 A JP2000361408 A JP 2000361408A JP 2000361408 A JP2000361408 A JP 2000361408A JP 2002161261 A JP2002161261 A JP 2002161261A
- Authority
- JP
- Japan
- Prior art keywords
- adhesive film
- heat
- cured
- parts
- resistant adhesive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000002313 adhesive film Substances 0.000 title claims abstract description 39
- 229920001187 thermosetting polymer Polymers 0.000 title claims abstract description 14
- 239000000853 adhesive Substances 0.000 claims abstract description 19
- 230000001070 adhesive effect Effects 0.000 claims abstract description 19
- 229920001971 elastomer Polymers 0.000 claims abstract description 14
- 239000005060 rubber Substances 0.000 claims abstract description 14
- 239000003822 epoxy resin Substances 0.000 claims abstract description 11
- 229920000647 polyepoxide Polymers 0.000 claims abstract description 11
- 239000003795 chemical substances by application Substances 0.000 claims abstract description 8
- 239000000203 mixture Substances 0.000 claims abstract description 5
- 239000000758 substrate Substances 0.000 claims abstract description 4
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 claims description 12
- 229920005989 resin Polymers 0.000 claims description 7
- 239000011347 resin Substances 0.000 claims description 7
- 238000010438 heat treatment Methods 0.000 claims description 3
- ZDZHLLPJVUALBC-UHFFFAOYSA-N phthalic acid prop-2-enenitrile Chemical class C(C=C)#N.C(C=1C(C(=O)O)=CC=CC1)(=O)O ZDZHLLPJVUALBC-UHFFFAOYSA-N 0.000 claims description 3
- 239000007787 solid Substances 0.000 claims description 3
- 239000002184 metal Substances 0.000 abstract description 6
- 229910052751 metal Inorganic materials 0.000 abstract description 6
- 229920001721 polyimide Polymers 0.000 abstract description 6
- 239000000919 ceramic Substances 0.000 abstract description 5
- 239000010703 silicon Substances 0.000 abstract description 5
- 229910052710 silicon Inorganic materials 0.000 abstract description 5
- 239000011248 coating agent Substances 0.000 abstract 2
- 238000000576 coating method Methods 0.000 abstract 2
- 239000004962 Polyamide-imide Substances 0.000 abstract 1
- 239000004642 Polyimide Substances 0.000 abstract 1
- 150000002739 metals Chemical class 0.000 abstract 1
- 229920002312 polyamide-imide Polymers 0.000 abstract 1
- -1 silicon metals Chemical class 0.000 abstract 1
- 230000000052 comparative effect Effects 0.000 description 14
- 239000000463 material Substances 0.000 description 11
- 238000005520 cutting process Methods 0.000 description 8
- 238000001035 drying Methods 0.000 description 7
- 239000004593 Epoxy Substances 0.000 description 6
- 238000011156 evaluation Methods 0.000 description 6
- 239000000843 powder Substances 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 3
- 239000006087 Silane Coupling Agent Substances 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 239000011889 copper foil Substances 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 229920003986 novolac Polymers 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 239000012298 atmosphere Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- CEIPQQODRKXDSB-UHFFFAOYSA-N ethyl 3-(6-hydroxynaphthalen-2-yl)-1H-indazole-5-carboximidate dihydrochloride Chemical compound Cl.Cl.C1=C(O)C=CC2=CC(C3=NNC4=CC=C(C=C43)C(=N)OCC)=CC=C21 CEIPQQODRKXDSB-UHFFFAOYSA-N 0.000 description 2
- 238000010030 laminating Methods 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- LXBGSDVWAMZHDD-UHFFFAOYSA-N 2-methyl-1h-imidazole Chemical compound CC1=NC=CN1 LXBGSDVWAMZHDD-UHFFFAOYSA-N 0.000 description 1
- BVYPJEBKDLFIDL-UHFFFAOYSA-N 3-(2-phenylimidazol-1-yl)propanenitrile Chemical compound N#CCCN1C=CN=C1C1=CC=CC=C1 BVYPJEBKDLFIDL-UHFFFAOYSA-N 0.000 description 1
- ULKLGIFJWFIQFF-UHFFFAOYSA-N 5K8XI641G3 Chemical compound CCC1=NC=C(C)N1 ULKLGIFJWFIQFF-UHFFFAOYSA-N 0.000 description 1
- 229920002799 BoPET Polymers 0.000 description 1
- GSNUFIFRDBKVIE-UHFFFAOYSA-N DMF Natural products CC1=CC=C(C)O1 GSNUFIFRDBKVIE-UHFFFAOYSA-N 0.000 description 1
- MHABMANUFPZXEB-UHFFFAOYSA-N O-demethyl-aloesaponarin I Natural products O=C1C2=CC=CC(O)=C2C(=O)C2=C1C=C(O)C(C(O)=O)=C2C MHABMANUFPZXEB-UHFFFAOYSA-N 0.000 description 1
- 102000004179 Plasminogen Activator Inhibitor 2 Human genes 0.000 description 1
- 108090000614 Plasminogen Activator Inhibitor 2 Proteins 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000012790 adhesive layer Substances 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 230000000740 bleeding effect Effects 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 238000002788 crimping Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 238000007731 hot pressing Methods 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 150000002460 imidazoles Chemical class 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 238000004080 punching Methods 0.000 description 1
- 239000011342 resin composition Substances 0.000 description 1
Landscapes
- Adhesive Tapes (AREA)
- Adhesives Or Adhesive Processes (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、電子部品、半導体
部品接着材料として、熱ロールラミネート、熱フ゜レス等により、従
来より低温低圧で熱圧着、硬化でき、半硬化時の加工性
に優れ、かつホ゜リイミト゛等のフィルム材料、金属、シリコン、エホ゜キシ、セラ
ミック等に対する接着性が硬化時、半硬化時共に優れ、更
に硬化時には優れた耐熱性を併せ持つ熱硬化性耐熱接着
フィルムに関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an adhesive material for electronic parts and semiconductor parts, which can be thermocompression-bonded and cured at a lower temperature and lower pressure than ever before, by using a hot roll laminating, a hot press, etc., and has excellent workability during semi-curing. The present invention relates to a thermosetting heat-resistant adhesive film having excellent adhesiveness to film materials such as polyimid, metal, silicon, epoxy, ceramic, etc., both when cured and semi-cured, and also having excellent heat resistance when cured.
【0002】[0002]
【従来の技術】従来、電子部品、半導体部品用の接着剤
としては、カ゛ラスエホ゜キシフ゜リフ゜レク゛やエホ゜キシ樹脂に各種ゴム成
分を添加した接着シート材料や、液状の接着剤を塗布して
接着する方法が用いられている。ここでカ゛ラスエホ゜キシフ゜リフ゜
レク゛を使用した場合には接着層の薄膜化が困難、吸湿後
の密着性の確保が困難、加工時に切断粉が発生する等の
問題があった。またエホ゜キシ樹脂に各種ゴムを添加した接
着シート材料ではカ゛ラスエホ゜キシフ゜リフ゜レク゛は加工性や密着性の改
善は図られているが、接着シート自身の凝集破壊が起こり
やすい、硬化後においても接着剤の耐熱性に乏しい等の
欠点があった。また耐熱性を向上させるためにホ゜リイミト
゛、ホ゜リアミト゛イミト゛等の高Tg材を主成分とする接着剤を用
いると、高温長時間高圧力での接着及び硬化が必要とな
り、接着及び硬化に用いる設備が限定されたり、さらに
液状の接着剤では、作業工数が多い、塗布時のにじみ、
ずれ等による作業性の悪さなどの問題点があった。2. Description of the Related Art Conventionally, as an adhesive for electronic parts and semiconductor parts, there has been used an adhesive sheet material obtained by adding various rubber components to glass epoxy resin or epoxy resin, or a method of applying and bonding a liquid adhesive. Have been. Here, when a glass epoxy reflector is used, there are problems that it is difficult to reduce the thickness of the adhesive layer, it is difficult to ensure adhesion after absorbing moisture, and cutting powder is generated during processing. In the case of adhesive sheet materials in which various rubbers are added to epoxy resin, glass epoxy reflectors have improved workability and adhesion, but the adhesive sheet itself tends to undergo cohesive failure, and the adhesive has heat resistance even after curing. There were drawbacks such as poor. In addition, if an adhesive containing a high Tg material such as polyimito or polyimito as a main component is used to improve heat resistance, bonding and curing at high temperature for a long time under high pressure are required, and the equipment used for bonding and curing is limited. Or with a liquid adhesive, the number of work steps is large, bleeding during application,
There were problems such as poor workability due to misalignment.
【0003】[0003]
【発明が解決しようとする課題】本発明はかかる状況に
鑑みなされたもので、電子部品、半導体部品接着材料と
して、従来より低温短時間で接着硬化でき、半硬化時の
加工性に優れ、かつホ゜リイミト゛等のフィルム材料、金属、シリコン、エホ
゜キシ、セラミック等に対する接着性が硬化時、半硬化時共に優
れ、更に硬化時には優れた耐熱性を併せ持つ熱硬化性耐
熱接着フィルムを提供することを目的とする。SUMMARY OF THE INVENTION The present invention has been made in view of such circumstances, and as an adhesive material for electronic parts and semiconductor parts, can be adhesively cured at a lower temperature and in a shorter time than before, has excellent workability at the time of semi-curing, and It is an object of the present invention to provide a thermosetting heat-resistant adhesive film having excellent adhesiveness to film materials such as polyimid, metal, silicon, epoxy, ceramic, etc., both when hardened and semi-hardened, and also having excellent heat resistance when hardened. .
【0004】[0004]
【課題を解決するための手段】本発明は次のものに関す
る。 (1) エホ゜キシ樹脂及び硬化剤の総量25重量部に対
し、シロキサン変性ホ゜リアミト゛イミト゛成分50〜70重量部、並び
に分子量5万以上のゴム成分10〜30重量部を含有す
る接着剤組成物を基材フィルムに塗布し、半硬化状態に熱処
理してなる熱硬化性耐熱接着フィルム。 (2) エホ゜キシ樹脂成分がエホ゜キシ当量350以上で有り、
かつ23℃以下の室温で固形である請求項1記載の熱硬
化性耐熱接着フィルム。 (3) 分子量5万以上のゴム成分が末端基エホ゜キシ変性ア
クリルニトリル-フ゛タシ゛エンコ゛ムである請求項1又は2に記載の熱硬
化性耐熱接着フィルム。 (4) 基材フィルムに塗布した後の熱処理による半硬化状
態での硬化率が30〜60%である請求項1〜3のいず
れかに記載の熱硬化性耐熱接着フィルム。The present invention relates to the following. (1) An adhesive composition containing 50 to 70 parts by weight of a siloxane-modified polyamitoimito component and 10 to 30 parts by weight of a rubber component having a molecular weight of 50,000 or more based on a total of 25 parts by weight of an epoxy resin and a curing agent. A thermosetting heat-resistant adhesive film that is applied to a film and heat-treated to a semi-cured state. (2) the ethoxy resin component has an ethoxy equivalent of 350 or more;
The thermosetting heat-resistant adhesive film according to claim 1, which is solid at room temperature of 23 ° C or lower. (3) The thermosetting heat-resistant adhesive film according to (1) or (2), wherein the rubber component having a molecular weight of 50,000 or more is an end group ethoxy-modified acrylonitrile-phthalic acid engine. (4) The thermosetting heat-resistant adhesive film according to any one of claims 1 to 3, wherein a curing rate in a semi-cured state by heat treatment after being applied to the base film is 30 to 60%.
【0005】[0005]
【発明の実施の形態】本発明に用いられるエホ゜キシ樹脂と
しては、特に制限するものではないが、好ましくはエホ゜キ
シ当量500以上、23℃以下の室温で固形の物が好ま
しく、エホ゜キシ当量500以上のエホ゜キシ樹脂を使用すること
により、10℃の雰囲気下においても切断加工時に切断
粉が発生しない。この様なエホ゜キシ樹脂としてはエヒ゜コート1
001、1003(油化シェル(株)製)、エヒ゜クロン900、
1050(大日本インキ化学(株)製)等がある。BEST MODE FOR CARRYING OUT THE INVENTION The ethoxy resin used in the present invention is not particularly limited, but is preferably an ethoxy equivalent of 500 or more and a solid at room temperature of 23 ° C. or less, and an ethoxy resin having an ethoxy equivalent of 500 or more. By using a resin, no cutting powder is generated at the time of cutting even in an atmosphere of 10 ° C. As such an epoxy resin, E.coat 1
001, 1003 (manufactured by Yuka Shell Co., Ltd.), Edicron 900,
1050 (manufactured by Dainippon Ink and Chemicals, Inc.).
【0006】硬化剤は特に制限されるものではなく、ノホ
゛ラックフェーノール、アミン等があるが、半硬化時の加工性からノホ゛
ラックフェノールがより好ましく、エホ゜キシ樹脂のエホ゜キシ基とそれと
反応性の官能基(水酸基)が1:1〜1:1.2の当量
比になるように添加することが望ましい。このようなフェ
ノールノホ゛ラック硬化剤としては、LF−2882(大日本インキ
化学(株)製)、VP−6371(日立化成工業(株)
製)等がある。The curing agent is not particularly limited, and includes, for example, novolac phenol and amine. However, novolac phenol is more preferable in view of workability at the time of semi-curing, and an ethoxy group of an ethoxy resin and a functional group reactive therewith are preferred. It is desirable to add the (hydroxyl group) so as to have an equivalent ratio of 1: 1 to 1: 1.2. Examples of such a phenol novolac curing agent include LF-2882 (manufactured by Dainippon Ink and Chemicals, Inc.) and VP-6371 (manufactured by Hitachi Chemical Co., Ltd.).
Manufactured).
【0007】シロキサン変性ホ゜リアミト゛イミト゛成分の添加は、従来
と比較し低温低圧短時間での接着硬化を可能とし、更に
は硬化物とした場合の耐熱性の向上を目的とする。シロキサ
ン変性ホ゜リアミト゛イミト゛成分の一般式を以下に示す。The addition of the siloxane-modified polyamitoimid component enables the adhesive to be cured at a lower temperature and a lower pressure in a shorter time as compared with the conventional ones, and aims at improving the heat resistance of the cured product. The general formula of the siloxane-modified polymer imidate component is shown below.
【0008】[0008]
【化1】 Embedded image
【0009】ここでシロキサン変性ホ゜リアミト゛イミト゛成分の添加量
は、エホ゜キシ樹脂及び硬化剤の総量25重量部に対し、5
0重量部未満では十分な耐熱性向上の効果が得られな
い、また70重量部を越えると接着に要する温度圧力が
上昇し、低温短時間での接着硬化が困難となるため、添
加部数は50〜70重量部が望ましい。この様なシロキサン
変性ホ゜リアミト゛イミト゛としてはPAI-28、PAI-37、PAI-55(日
立化成工業(株)製)などがある。Here, the addition amount of the siloxane-modified polyamide imidate component is 5 parts by weight based on the total amount of 25 parts by weight of the epoxy resin and the curing agent.
If the amount is less than 0 parts by weight, a sufficient effect of improving heat resistance cannot be obtained. If the amount exceeds 70 parts by weight, the temperature and pressure required for bonding increase, making it difficult to cure the adhesive in a short time at low temperature. It is desirably about 70 parts by weight. Examples of such siloxane-modified polymer imito include PAI-28, PAI-37, and PAI-55 (manufactured by Hitachi Chemical Co., Ltd.).
【0010】更に硬化促進剤としては、各種イミタ゛ソ゛ール類
を使用することが好ましい。イミタ゛ソ゛ールとしては、2-メチルイ
ミタ゛ソ゛ール、2-エチル-4メチルイミタ゛ソ゛ール、1-シアノエチル-2-フェニルイミタ゛ソ゛
ール等が挙げられ、2E4MZ、2PZ、2PZ-CN、2PZ-CNS(四国
化成工業(株))等がある。硬化促進剤は、エホ゜キシ樹脂
及び硬化剤の総量25重量部に対し、0.02〜5重量
部の範囲内で使用することが好ましい。Further, as the curing accelerator, it is preferable to use various imidazoles. Examples of the imidasole include 2-methylimidazole, 2-ethyl-4-methylimidazole, 1-cyanoethyl-2-phenylimidazole, and the like, such as 2E4MZ, 2PZ, 2PZ-CN, and 2PZ-CNS (Shikoku Chemicals Co., Ltd.) There is. The curing accelerator is preferably used in a range of 0.02 to 5 parts by weight based on 25 parts by weight of the total amount of the epoxy resin and the curing agent.
【0011】分子量5万以上のゴム成分の添加は硬化物
の密着性、耐湿性の向上させるためであり、更には、エホ
゜キシ樹脂、硬化成分の組み合わせだけでは、半硬化状態で
の膜特性(加工性)の確保が困難となる。ここで、添加
量10重量部未満では、半硬化時に基材フィルムから剥離す
るとき割れの現象が発生してしまう。更に30重量部を
超えると硬化物の耐熱性が急激に低下するという問題が
あり、添加量は10〜30重量部が望ましい。また、ゴ
ム成分はエホ゜キシ基含有アクリロニトリル-フ゛タシ゛エンコ゛ムがエホ゜キシ樹脂
相溶性の面から好ましく、HTR860P-3(帝国化学産業
(株)製)などがある。The addition of a rubber component having a molecular weight of 50,000 or more is intended to improve the adhesion and moisture resistance of the cured product. Further, the film properties in a semi-cured state (processing Is difficult to secure. Here, if the addition amount is less than 10 parts by weight, a phenomenon of cracking occurs when peeled from the base film during semi-curing. Further, when the amount exceeds 30 parts by weight, there is a problem that the heat resistance of the cured product is rapidly lowered, and the addition amount is desirably 10 to 30 parts by weight. Further, as the rubber component, acrylonitrile-phthalic acid containing ethoxy group is preferable from the viewpoint of compatibility with ethoxy resin, and examples thereof include HTR860P-3 (manufactured by Teikoku Chemical Industry Co., Ltd.).
【0012】また、密着性向上成分として、目的に応じ
たシランカッフ゜リンク゛剤等を添加しても良い。シランカッフ゜リンク゛剤と
しては、NCUA-187、189、1100、1160(日本ユニカー
(株))等が挙げられる。Further, as an adhesion improving component, a silane coupling agent or the like depending on the purpose may be added. Examples of silane coupling agents include NCUA-187, 189, 1100, 1160 (Nihon Unicar Co., Ltd.) and the like.
【0013】熱硬化性耐熱接着フィルムは、前期の接着剤組
成をMEK、トルエン、DMF、DMAC等の有機溶剤により溶解し、
基材に塗布し乾燥することで得られる。この時基材はPE
T、ホ゜リイミト゛、銅箔等が挙げられ、乾燥温度に耐えること
ができるものであれば、特に限定されるものではない。[0013] The thermosetting heat-resistant adhesive film is prepared by dissolving the above adhesive composition with an organic solvent such as MEK, toluene, DMF, and DMAC.
It is obtained by applying to a substrate and drying. At this time, the base material is PE
T, polyimid, copper foil, and the like are not particularly limited as long as they can withstand the drying temperature.
【0014】乾燥条件としては特に限定されないが、接
着フィルムの硬化率を30〜60%に乾燥条件により調整す
る必要がある。Although the drying conditions are not particularly limited, it is necessary to adjust the curing rate of the adhesive film to 30 to 60% depending on the drying conditions.
【0015】この時、硬化率が30%未満であると、4
0℃以上の温度で粘着性を発生しまい、ブロッキングの
発生や作業性の悪化等の弊害が発生する。また、硬化率
を60%以上にすると、圧着条件が190℃以上、かつ
圧力条件が3MPa以上と低温低圧での接着が困難にな
る。したがって、硬化率は30〜60%が望ましい。At this time, if the curing rate is less than 30%, 4%
At a temperature of 0 ° C. or higher, tackiness occurs, and adverse effects such as occurrence of blocking and deterioration of workability occur. Further, when the curing rate is 60% or more, the pressure bonding condition is 190 ° C. or more and the pressure condition is 3 MPa or more, so that it is difficult to bond at low temperature and low pressure. Therefore, the curing rate is desirably 30 to 60%.
【0016】ここで硬化率は以下の様に定義する。 未硬化状態の樹脂組成物のDSC発熱量=A(J/g) 熱乾燥して半硬化させた接着フィルムのDSC発熱量=B
(J/g) 硬化率(%)=(A−B)/A×100 これにより、 圧着温度:180℃ 圧着圧力:2MPa 硬化温度:180℃(60分) の低温低圧で短時間圧着が可能である。ホ゜リイミト゛等のフィル
ム材料、金属、シリコン、エホ゜キシ、セラミック等に対する接着性が硬化
時、半硬化時共に優れ、更に硬化時には優れた耐熱性を
併せ持つ熱硬化性耐熱接着フィルムを得ることができた。Here, the curing rate is defined as follows. DSC calorific value of resin composition in uncured state = A (J / g) DSC calorific value of adhesive film cured by heating and semi-cured = B
(J / g) Curing rate (%) = (AB) / A × 100 This enables short-time pressure bonding at a low temperature and low pressure of 180 ° C (60 minutes) at 180 ° C. It is. It was possible to obtain a thermosetting heat-resistant adhesive film having excellent adhesiveness to film materials such as polyimid, metal, silicon, epoxy, ceramics, etc., both when cured and semi-cured, and also having excellent heat resistance when cured.
【0017】[0017]
【実施例】以下、本発明を、実施例に基ずきさらに具体
的に説明する。以下、「部」は「重量部」を意味する。EXAMPLES The present invention will be described below more specifically based on examples. Hereinafter, “parts” means “parts by weight”.
【0018】実施例1 エポキシ樹脂エピコート1001を15部、硬化剤LF
−2882を10部、シロキサン変性ホ゜リアミト゛イミト゛PAI−2
8を50部、ゴム成分HTR860P3を30部、硬化
促進剤2PZ−CNを0.2部、シランカップリング剤
A−187を3部を混合し、1時間攪拌したあと、厚み
50μmの離型処理を施したPETフィルム上に塗布し、180
℃15分乾燥し膜厚25μm、硬化率30%の接着フィルム
を作製した。Example 1 15 parts of epoxy resin epicoat 1001 and curing agent LF
-2882, 10 parts of siloxane-modified polyamitoimito PAI-2
8, 50 parts of the rubber component HTR860P3, 0.2 parts of the curing accelerator 2PZ-CN, and 3 parts of the silane coupling agent A-187, and the mixture was stirred for 1 hour. 180 on PET film
After drying at 15 ° C. for 15 minutes, an adhesive film having a thickness of 25 μm and a curing rate of 30% was prepared.
【0019】評価方法としては、半硬化状態の基材付き
接着フィルムの40℃雰囲気における粘着性の有無、1
0℃切断加工時の切断粉の発生の有無、割れの発生の有
無について確認した。The evaluation method is to determine whether the semi-cured adhesive film with a substrate has tackiness in a 40 ° C. atmosphere,
The presence or absence of cutting powder and the occurrence of cracks during 0 ° C. cutting were confirmed.
【0020】更に、接着品の評価については、作成した
接着フィルムでポリイリドフィルム(宇部興産製ユーヒ゜レッ
クス50Sマット処理品)と電解銅箔(日本電解製SLP18μm
銅箔)の粗化面を180℃、2MPaの圧力で1時間圧
着、硬化して試験片を作成し評価した。その結果、本実
施例1による供試品は耐熱性接着フィルムとして実用上
使用できることが判った。これらの結果を表−1にまと
めて示す。Further, regarding the evaluation of the adhesive product, the adhesive film was prepared using a polyirid film (Ubelex 50S matted product manufactured by Ube Industries) and an electrolytic copper foil (Nippon Electrolytic SLP 18 μm).
The roughened surface of the (copper foil) was pressed and cured at 180 ° C. under a pressure of 2 MPa for 1 hour to prepare a test piece, which was evaluated. As a result, it was found that the test sample according to Example 1 can be practically used as a heat-resistant adhesive film. These results are summarized in Table 1.
【0021】実施例2シロキサン 変性ホ゜リアミト゛イミト゛PAI−28を60部、ゴム成分
HTR860P3を20部に変更する以外は実施例1と
同様の方法にて膜厚25μm、硬化率45%の接着フィルム
を作成し評価した。その結果、本実施例2による供試品
も耐熱性接着フィルムとして実用上使用できることが判
った。これらの結果実施例1と同様にを表−1にまとめ
て示す。Example 2 An adhesive film having a film thickness of 25 μm and a curing rate of 45% was prepared in the same manner as in Example 1, except that the siloxane-modified polyamitoimito PAI-28 was changed to 60 parts and the rubber component HTR860P3 was changed to 20 parts. And evaluated. As a result, it was found that the test sample according to Example 2 can be practically used as a heat-resistant adhesive film. Table 1 summarizes the results as in Example 1.
【0022】実施例3シロキサン 変性ホ゜リアミト゛イミト゛PAI−28を70部、ゴム成分
HTR860P3を10部に変更する以外は実施例1と
同様の方法にて膜厚25μm、硬化率60%の接着フィルム
を作成し評価した。その結果、本実施例3による供試品
も耐熱性接着フィルムとして実用上使用できることが判
った。これらの結果実施例1と同様にを表−1にまとめ
て示す。Example 3 An adhesive film having a film thickness of 25 μm and a curing rate of 60% was prepared in the same manner as in Example 1 except that the siloxane-modified polyamitoimito PAI-28 was changed to 70 parts and the rubber component HTR860P3 was changed to 10 parts. And evaluated. As a result, it was found that the test sample according to Example 3 can be used practically as a heat-resistant adhesive film. Table 1 summarizes the results as in Example 1.
【0023】[0023]
【表1】 [Table 1]
【0024】比較例1 接着フィルムの乾燥温度を170℃に変更する以外は実
施例1と同様の方法にて硬化率20%の接着フィルムを
作成した。本比較例1による供試品は接着フィルムの評
価において、30℃での粘着性が発生し、作業性が悪
く、 耐熱性接着フィルムとして実用性がないと判断し
た。これらの結果を表−2にまとめて示す。Comparative Example 1 An adhesive film having a curing rate of 20% was prepared in the same manner as in Example 1 except that the drying temperature of the adhesive film was changed to 170 ° C. In the evaluation of the adhesive film, the test sample according to Comparative Example 1 was found to have tackiness at 30 ° C., poor workability, and was not practical as a heat-resistant adhesive film. These results are summarized in Table-2.
【0025】比較例2 接着フィルムの乾燥温度を190℃に変更する以外は実
施例1と同様の方法にて硬化率70%の接着フィルムを
作成した。本比較例2による供試品は接着フィルムの評
価において、10℃での接着フィルム切断時に切断粉が
発生及び、端部に割れが発生し、また、接着品において
も通常の圧着条件(2MPa、180℃)では部分的に
つかない部分があり、耐熱性接着フィルムとして実用性
がないと判断した。これらの結果を比較例1と同様に表
−2にまとめて示す。Comparative Example 2 An adhesive film having a curing rate of 70% was prepared in the same manner as in Example 1 except that the drying temperature of the adhesive film was changed to 190 ° C. In the test sample according to Comparative Example 2, in the evaluation of the adhesive film, cutting powder was generated at the time of cutting the adhesive film at 10 ° C., cracks were generated at the ends, and the normal pressure conditions (2 MPa, (180 ° C.), there was a part that did not stick, and it was judged that it was not practical as a heat-resistant adhesive film. These results are summarized in Table 2 as in Comparative Example 1.
【0026】比較例3シロキサン 変性ホ゜リアミト゛イミト゛PAI−28を40部、ゴム成分
HTR860P3を40部に変更する以外は実施例1と
同様の方法にて膜厚25μm、硬化率45%の接着フィルム
を作成し評価した。その結果、本比較例3による供試品
は接着品の評価において、300℃はんだ耐熱試験30
秒にてふくれが発生し、耐熱性接着フィルムとして実用
性がないと判断した。これらの結果を比較例1と同様に
表−2にまとめて示す。Comparative Example 3 An adhesive film having a film thickness of 25 μm and a curing rate of 45% was prepared in the same manner as in Example 1 except that the siloxane-modified polyamitoimito PAI-28 was changed to 40 parts and the rubber component HTR860P3 was changed to 40 parts. And evaluated. As a result, in the evaluation of the adhesive product, the test sample according to Comparative Example 3 had a 300 ° C.
Blistering occurred in seconds, and it was judged that it was not practical as a heat-resistant adhesive film. These results are summarized in Table 2 as in Comparative Example 1.
【0027】比較例4シロキサン 変性ホ゜リアミト゛イミト゛PAI−28を80部、ゴム成分
HTR860P3を0部に変更する以外は実施例1と同
様の方法にて膜厚25μm、硬化率45%の接着フィルムを
作成し評価した。その結果、本比較例4による供試品は
接着品の評価において、通常の圧着条件(2MPa、1
80℃)では全く接着しないことが判った。これらの結
果を比較例1と同様に表−2にまとめて示す。Comparative Example 4 An adhesive film having a thickness of 25 μm and a curing rate of 45% was prepared in the same manner as in Example 1 except that the siloxane-modified polyamitoimito PAI-28 was changed to 80 parts and the rubber component HTR860P3 was changed to 0 parts. And evaluated. As a result, in the evaluation of the adhesive product, the test sample according to Comparative Example 4 was subjected to the normal crimping conditions (2 MPa, 1 MPa
80 ° C.), no adhesion was found. These results are summarized in Table 2 as in Comparative Example 1.
【0028】比較例5 比較例4にて作成した接着フィルムを用い接着するため
の条件を検討した、その結果、接着品の特性を確保する
ためには210℃、4MPaの高温高圧力が必要とな
り、低温低圧接着の目的が達せられないことが判った。
これらの結果を比較例1と同様に表−2にまとめて示
す。Comparative Example 5 The conditions for bonding using the adhesive film prepared in Comparative Example 4 were examined. As a result, high temperature and high pressure of 210 ° C. and 4 MPa were required to secure the characteristics of the bonded product. It was found that the purpose of low temperature and low pressure bonding could not be achieved.
These results are summarized in Table 2 as in Comparative Example 1.
【0029】[0029]
【表2】 [Table 2]
【0030】[0030]
【発明の効果】本発明により、電子部品、半導体部品接着
材料として、熱ロールラミネート、熱フ゜レス等により、従来より低温
低圧で熱圧着、硬化でき、半硬化時の加工性(打ち抜
き、切断)に優れ、かつホ゜リイミト゛等のフィルム材料、金属、シリコ
ン、エホ゜キシ、セラミック等に対する接着性が硬化時、半硬化時共
に優れ、更に硬化時には優れた耐熱性を併せ持つ熱硬化
性耐熱接着フィルムの提供が可能となった。According to the present invention, as a bonding material for electronic parts and semiconductor parts, it is possible to perform thermocompression bonding and hardening at a lower temperature and lower pressure than ever before by hot roll laminating, hot pressing, etc., and to improve workability (punching and cutting) at the time of semi-hardening. It is possible to provide a thermosetting heat-resistant adhesive film that is excellent and has excellent adhesiveness to film materials such as polyimid, metal, silicon, epoxy, ceramic, etc., both when cured and semi-cured, and also has excellent heat resistance when cured. became.
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 FI テーマコート゛(参考) C09J 163/08 C09J 163/08 Fターム(参考) 4J004 AA02 AA05 AA11 AA13 AB05 BA02 CA06 CA08 CC02 FA05 FA08 4J040 EB032 EC002 EC212 EH031 EK111 HC01 JA09 JB02 KA16 LA01 LA08 MA01 MA02 MA04 MA10 NA19 NA20 PA18──────────────────────────────────────────────────続 き Continued on the front page (51) Int.Cl. 7 Identification code FI Theme coat ゛ (Reference) C09J 163/08 C09J 163/08 F term (Reference) 4J004 AA02 AA05 AA11 AA13 AB05 BA02 CA06 CA08 CC02 FA05 FA08 4J040 EB032 EC002 EC212 EH031 EK111 HC01 JA09 JB02 KA16 LA01 LA08 MA01 MA02 MA04 MA10 NA19 NA20 PA18
Claims (4)
に対し,シロキサン変性ホ゜リアミト゛イミト゛成分50〜70重量部、
並びに分子量5万以上のゴム成分10〜30重量部を含
有する接着剤組成物を基材フィルムに塗布し、半硬化状態に
熱処理してなる熱硬化性耐熱接着フィルム。1. A siloxane-modified polyamitoimide component of 50 to 70 parts by weight based on a total of 25 parts by weight of an epoxy resin and a curing agent.
A thermosetting heat-resistant adhesive film obtained by applying an adhesive composition containing 10 to 30 parts by weight of a rubber component having a molecular weight of 50,000 or more to a base film and heat-treating it to a semi-cured state.
有り、かつ23℃以下の室温で固形である請求項1記載
の熱硬化性耐熱接着フィルム。2. The heat-curable heat-resistant adhesive film according to claim 1, wherein the ethoxy resin component has an ethoxy equivalent of 350 or more and is solid at room temperature of 23 ° C. or less.
シ変性アクリルニトリル-フ゛タシ゛エンコ゛ムである請求項1又は2に記載
の熱硬化性耐熱接着フィルム。3. The heat-curable heat-resistant adhesive film according to claim 1, wherein the rubber component having a molecular weight of 50,000 or more is an end group ethoxy-modified acrylonitrile-phthalic acid engine.
硬化状態での硬化率が30〜60%である請求項1〜3
のいずれかに記載の熱硬化性耐熱接着フィルム。4. A curing rate in a semi-cured state by heat treatment after being applied to a substrate film is 30 to 60%.
The thermosetting heat-resistant adhesive film according to any one of the above.
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2011102374A (en) * | 2009-11-12 | 2011-05-26 | Jsr Corp | Adhesive composition, circuit connecting member and circuit member connecting structure |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02247273A (en) * | 1989-03-20 | 1990-10-03 | Hitachi Chem Co Ltd | Heat resistant adhesive composition |
JPH05179220A (en) * | 1991-12-26 | 1993-07-20 | Ube Ind Ltd | Heat-resistant adhesive |
JPH09194566A (en) * | 1996-01-16 | 1997-07-29 | Hitachi Chem Co Ltd | Production of modified epoxy resin and adhesive and adhesive film using modified epoxy resin obtained by the same production |
JPH11140392A (en) * | 1997-11-06 | 1999-05-25 | Hitachi Chem Co Ltd | Thermosetting adhesive sheet |
JP2000345035A (en) * | 1999-06-08 | 2000-12-12 | Hitachi Chem Co Ltd | Heat-resistant resin composition, adhesive film using the same, and polyimide film having adhesive layer |
-
2000
- 2000-11-28 JP JP2000361408A patent/JP4671083B2/en not_active Expired - Lifetime
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02247273A (en) * | 1989-03-20 | 1990-10-03 | Hitachi Chem Co Ltd | Heat resistant adhesive composition |
JPH05179220A (en) * | 1991-12-26 | 1993-07-20 | Ube Ind Ltd | Heat-resistant adhesive |
JPH09194566A (en) * | 1996-01-16 | 1997-07-29 | Hitachi Chem Co Ltd | Production of modified epoxy resin and adhesive and adhesive film using modified epoxy resin obtained by the same production |
JPH11140392A (en) * | 1997-11-06 | 1999-05-25 | Hitachi Chem Co Ltd | Thermosetting adhesive sheet |
JP2000345035A (en) * | 1999-06-08 | 2000-12-12 | Hitachi Chem Co Ltd | Heat-resistant resin composition, adhesive film using the same, and polyimide film having adhesive layer |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2011102374A (en) * | 2009-11-12 | 2011-05-26 | Jsr Corp | Adhesive composition, circuit connecting member and circuit member connecting structure |
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