JP2002114855A - Method for producing prepreg, lamination plate and metal-clad lamination plate - Google Patents
Method for producing prepreg, lamination plate and metal-clad lamination plateInfo
- Publication number
- JP2002114855A JP2002114855A JP2000307714A JP2000307714A JP2002114855A JP 2002114855 A JP2002114855 A JP 2002114855A JP 2000307714 A JP2000307714 A JP 2000307714A JP 2000307714 A JP2000307714 A JP 2000307714A JP 2002114855 A JP2002114855 A JP 2002114855A
- Authority
- JP
- Japan
- Prior art keywords
- weight
- prepreg
- epoxy resin
- molecular weight
- resin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title abstract description 7
- 238000003475 lamination Methods 0.000 title abstract description 4
- 239000003822 epoxy resin Substances 0.000 claims abstract description 36
- 229920000647 polyepoxide Polymers 0.000 claims abstract description 36
- 239000004593 Epoxy Substances 0.000 claims abstract description 13
- 239000002966 varnish Substances 0.000 claims abstract description 13
- 239000007787 solid Substances 0.000 claims abstract description 5
- 229910052751 metal Inorganic materials 0.000 claims description 16
- 239000002184 metal Substances 0.000 claims description 16
- 239000011888 foil Substances 0.000 claims description 13
- 239000000463 material Substances 0.000 claims description 6
- 238000010030 laminating Methods 0.000 claims description 2
- 229920005989 resin Polymers 0.000 abstract description 24
- 239000011347 resin Substances 0.000 abstract description 24
- 238000000465 moulding Methods 0.000 abstract description 9
- 239000003795 chemical substances by application Substances 0.000 abstract description 6
- 239000011521 glass Substances 0.000 abstract description 6
- 238000002156 mixing Methods 0.000 abstract description 6
- 125000003700 epoxy group Chemical group 0.000 abstract description 4
- 239000002759 woven fabric Substances 0.000 abstract description 3
- 239000004744 fabric Substances 0.000 abstract description 2
- 239000004745 nonwoven fabric Substances 0.000 abstract description 2
- 239000004615 ingredient Substances 0.000 abstract 1
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 15
- -1 diglycidyl ether compound Chemical class 0.000 description 12
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 10
- 239000000203 mixture Substances 0.000 description 9
- 230000000052 comparative effect Effects 0.000 description 7
- QGBSISYHAICWAH-UHFFFAOYSA-N dicyandiamide Chemical compound NC(N)=NC#N QGBSISYHAICWAH-UHFFFAOYSA-N 0.000 description 7
- 239000000758 substrate Substances 0.000 description 7
- 238000001035 drying Methods 0.000 description 6
- 238000000034 method Methods 0.000 description 5
- 229920000642 polymer Polymers 0.000 description 5
- ULKLGIFJWFIQFF-UHFFFAOYSA-N 5K8XI641G3 Chemical compound CCC1=NC=C(C)N1 ULKLGIFJWFIQFF-UHFFFAOYSA-N 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 4
- 229940106691 bisphenol a Drugs 0.000 description 4
- 239000011889 copper foil Substances 0.000 description 4
- 230000007423 decrease Effects 0.000 description 4
- 229920003986 novolac Polymers 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- LGRFSURHDFAFJT-UHFFFAOYSA-N Phthalic anhydride Natural products C1=CC=C2C(=O)OC(=O)C2=C1 LGRFSURHDFAFJT-UHFFFAOYSA-N 0.000 description 3
- 150000008065 acid anhydrides Chemical class 0.000 description 3
- JHIWVOJDXOSYLW-UHFFFAOYSA-N butyl 2,2-difluorocyclopropane-1-carboxylate Chemical compound CCCCOC(=O)C1CC1(F)F JHIWVOJDXOSYLW-UHFFFAOYSA-N 0.000 description 3
- 238000005530 etching Methods 0.000 description 3
- 239000000945 filler Substances 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- LTVUCOSIZFEASK-MPXCPUAZSA-N (3ar,4s,7r,7as)-3a-methyl-3a,4,7,7a-tetrahydro-4,7-methano-2-benzofuran-1,3-dione Chemical compound C([C@H]1C=C2)[C@H]2[C@H]2[C@]1(C)C(=O)OC2=O LTVUCOSIZFEASK-MPXCPUAZSA-N 0.000 description 2
- KMOUUZVZFBCRAM-OLQVQODUSA-N (3as,7ar)-3a,4,7,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1C=CC[C@@H]2C(=O)OC(=O)[C@@H]21 KMOUUZVZFBCRAM-OLQVQODUSA-N 0.000 description 2
- LLPKQRMDOFYSGZ-UHFFFAOYSA-N 2,5-dimethyl-1h-imidazole Chemical compound CC1=CN=C(C)N1 LLPKQRMDOFYSGZ-UHFFFAOYSA-N 0.000 description 2
- VWSLLSXLURJCDF-UHFFFAOYSA-N 2-methyl-4,5-dihydro-1h-imidazole Chemical compound CC1=NCCN1 VWSLLSXLURJCDF-UHFFFAOYSA-N 0.000 description 2
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 2
- AERZMMNNWVZSNB-UHFFFAOYSA-N 3-dodec-1-ynyloxolane-2,5-dione Chemical compound CCCCCCCCCCC#CC1CC(=O)OC1=O AERZMMNNWVZSNB-UHFFFAOYSA-N 0.000 description 2
- XLSZMDLNRCVEIJ-UHFFFAOYSA-N 4-methylimidazole Chemical compound CC1=CNC=N1 XLSZMDLNRCVEIJ-UHFFFAOYSA-N 0.000 description 2
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 2
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 2
- 239000004793 Polystyrene Substances 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 2
- 238000011088 calibration curve Methods 0.000 description 2
- 238000013329 compounding Methods 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 229930003836 cresol Natural products 0.000 description 2
- 150000002009 diols Chemical class 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 229920001971 elastomer Polymers 0.000 description 2
- 239000000835 fiber Substances 0.000 description 2
- ANSXAPJVJOKRDJ-UHFFFAOYSA-N furo[3,4-f][2]benzofuran-1,3,5,7-tetrone Chemical compound C1=C2C(=O)OC(=O)C2=CC2=C1C(=O)OC2=O ANSXAPJVJOKRDJ-UHFFFAOYSA-N 0.000 description 2
- 238000005227 gel permeation chromatography Methods 0.000 description 2
- 150000004820 halides Chemical class 0.000 description 2
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 2
- FLBJFXNAEMSXGL-UHFFFAOYSA-N het anhydride Chemical compound O=C1OC(=O)C2C1C1(Cl)C(Cl)=C(Cl)C2(Cl)C1(Cl)Cl FLBJFXNAEMSXGL-UHFFFAOYSA-N 0.000 description 2
- 238000005470 impregnation Methods 0.000 description 2
- 239000010410 layer Substances 0.000 description 2
- VYKXQOYUCMREIS-UHFFFAOYSA-N methylhexahydrophthalic anhydride Chemical compound C1CCCC2C(=O)OC(=O)C21C VYKXQOYUCMREIS-UHFFFAOYSA-N 0.000 description 2
- 239000013034 phenoxy resin Substances 0.000 description 2
- 229920006287 phenoxy resin Polymers 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 229920002223 polystyrene Polymers 0.000 description 2
- 238000004080 punching Methods 0.000 description 2
- 239000011342 resin composition Substances 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- 229920001187 thermosetting polymer Polymers 0.000 description 2
- MUTGBJKUEZFXGO-OLQVQODUSA-N (3as,7ar)-3a,4,5,6,7,7a-hexahydro-2-benzofuran-1,3-dione Chemical compound C1CCC[C@@H]2C(=O)OC(=O)[C@@H]21 MUTGBJKUEZFXGO-OLQVQODUSA-N 0.000 description 1
- MTZUIIAIAKMWLI-UHFFFAOYSA-N 1,2-diisocyanatobenzene Chemical compound O=C=NC1=CC=CC=C1N=C=O MTZUIIAIAKMWLI-UHFFFAOYSA-N 0.000 description 1
- ZXHZWRZAWJVPIC-UHFFFAOYSA-N 1,2-diisocyanatonaphthalene Chemical compound C1=CC=CC2=C(N=C=O)C(N=C=O)=CC=C21 ZXHZWRZAWJVPIC-UHFFFAOYSA-N 0.000 description 1
- WZCQRUWWHSTZEM-UHFFFAOYSA-N 1,3-phenylenediamine Chemical compound NC1=CC=CC(N)=C1 WZCQRUWWHSTZEM-UHFFFAOYSA-N 0.000 description 1
- FBHPRUXJQNWTEW-UHFFFAOYSA-N 1-benzyl-2-methylimidazole Chemical compound CC1=NC=CN1CC1=CC=CC=C1 FBHPRUXJQNWTEW-UHFFFAOYSA-N 0.000 description 1
- VILCJCGEZXAXTO-UHFFFAOYSA-N 2,2,2-tetramine Chemical compound NCCNCCNCCN VILCJCGEZXAXTO-UHFFFAOYSA-N 0.000 description 1
- SHYARJUKNREDGB-UHFFFAOYSA-N 2-ethyl-5-methyl-4,5-dihydro-1h-imidazole Chemical compound CCC1=NCC(C)N1 SHYARJUKNREDGB-UHFFFAOYSA-N 0.000 description 1
- YTWBFUCJVWKCCK-UHFFFAOYSA-N 2-heptadecyl-1h-imidazole Chemical compound CCCCCCCCCCCCCCCCCC1=NC=CN1 YTWBFUCJVWKCCK-UHFFFAOYSA-N 0.000 description 1
- NCVGSSQICKMAIA-UHFFFAOYSA-N 2-heptadecyl-4,5-dihydro-1h-imidazole Chemical compound CCCCCCCCCCCCCCCCCC1=NCCN1 NCVGSSQICKMAIA-UHFFFAOYSA-N 0.000 description 1
- LXBGSDVWAMZHDD-UHFFFAOYSA-N 2-methyl-1h-imidazole Chemical compound CC1=NC=CN1 LXBGSDVWAMZHDD-UHFFFAOYSA-N 0.000 description 1
- ZCUJYXPAKHMBAZ-UHFFFAOYSA-N 2-phenyl-1h-imidazole Chemical compound C1=CNC(C=2C=CC=CC=2)=N1 ZCUJYXPAKHMBAZ-UHFFFAOYSA-N 0.000 description 1
- BKCCAYLNRIRKDJ-UHFFFAOYSA-N 2-phenyl-4,5-dihydro-1h-imidazole Chemical compound N1CCN=C1C1=CC=CC=C1 BKCCAYLNRIRKDJ-UHFFFAOYSA-N 0.000 description 1
- FUOZJYASZOSONT-UHFFFAOYSA-N 2-propan-2-yl-1h-imidazole Chemical compound CC(C)C1=NC=CN1 FUOZJYASZOSONT-UHFFFAOYSA-N 0.000 description 1
- BTYIFQSAIPDZQW-UHFFFAOYSA-N 2-propan-2-yl-4,5-dihydro-1h-imidazole Chemical compound CC(C)C1=NCCN1 BTYIFQSAIPDZQW-UHFFFAOYSA-N 0.000 description 1
- LLEASVZEQBICSN-UHFFFAOYSA-N 2-undecyl-1h-imidazole Chemical compound CCCCCCCCCCCC1=NC=CN1 LLEASVZEQBICSN-UHFFFAOYSA-N 0.000 description 1
- FQHUDZKKDCTQET-UHFFFAOYSA-N 2-undecyl-4,5-dihydro-1h-imidazole Chemical compound CCCCCCCCCCCC1=NCCN1 FQHUDZKKDCTQET-UHFFFAOYSA-N 0.000 description 1
- UPMLOUAZCHDJJD-UHFFFAOYSA-N 4,4'-Diphenylmethane Diisocyanate Chemical compound C1=CC(N=C=O)=CC=C1CC1=CC=C(N=C=O)C=C1 UPMLOUAZCHDJJD-UHFFFAOYSA-N 0.000 description 1
- YBRVSVVVWCFQMG-UHFFFAOYSA-N 4,4'-diaminodiphenylmethane Chemical compound C1=CC(N)=CC=C1CC1=CC=C(N)C=C1 YBRVSVVVWCFQMG-UHFFFAOYSA-N 0.000 description 1
- CPHGOBGXZQKCKI-UHFFFAOYSA-N 4,5-diphenyl-1h-imidazole Chemical compound N1C=NC(C=2C=CC=CC=2)=C1C1=CC=CC=C1 CPHGOBGXZQKCKI-UHFFFAOYSA-N 0.000 description 1
- TYOXIFXYEIILLY-UHFFFAOYSA-N 5-methyl-2-phenyl-1h-imidazole Chemical compound N1C(C)=CN=C1C1=CC=CC=C1 TYOXIFXYEIILLY-UHFFFAOYSA-N 0.000 description 1
- JJUVAPMVTXLLFR-UHFFFAOYSA-N 5-methyl-2-phenyl-4,5-dihydro-1h-imidazole Chemical compound N1C(C)CN=C1C1=CC=CC=C1 JJUVAPMVTXLLFR-UHFFFAOYSA-N 0.000 description 1
- KNDQHSIWLOJIGP-UHFFFAOYSA-N 826-62-0 Chemical compound C1C2C3C(=O)OC(=O)C3C1C=C2 KNDQHSIWLOJIGP-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 1
- 229930185605 Bisphenol Natural products 0.000 description 1
- LCFVJGUPQDGYKZ-UHFFFAOYSA-N Bisphenol A diglycidyl ether Chemical compound C=1C=C(OCC2OC2)C=CC=1C(C)(C)C(C=C1)=CC=C1OCC1CO1 LCFVJGUPQDGYKZ-UHFFFAOYSA-N 0.000 description 1
- 239000004970 Chain extender Substances 0.000 description 1
- MQJKPEGWNLWLTK-UHFFFAOYSA-N Dapsone Chemical compound C1=CC(N)=CC=C1S(=O)(=O)C1=CC=C(N)C=C1 MQJKPEGWNLWLTK-UHFFFAOYSA-N 0.000 description 1
- RPNUMPOLZDHAAY-UHFFFAOYSA-N Diethylenetriamine Chemical compound NCCNCCN RPNUMPOLZDHAAY-UHFFFAOYSA-N 0.000 description 1
- 239000005057 Hexamethylene diisocyanate Substances 0.000 description 1
- 101001024616 Homo sapiens Neuroblastoma breakpoint family member 9 Proteins 0.000 description 1
- 229920000877 Melamine resin Polymers 0.000 description 1
- 102100037013 Neuroblastoma breakpoint family member 9 Human genes 0.000 description 1
- FDLQZKYLHJJBHD-UHFFFAOYSA-N [3-(aminomethyl)phenyl]methanamine Chemical compound NCC1=CC=CC(CN)=C1 FDLQZKYLHJJBHD-UHFFFAOYSA-N 0.000 description 1
- 230000005856 abnormality Effects 0.000 description 1
- 125000002723 alicyclic group Chemical group 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- IMUDHTPIFIBORV-UHFFFAOYSA-N aminoethylpiperazine Chemical compound NCCN1CCNCC1 IMUDHTPIFIBORV-UHFFFAOYSA-N 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 230000003078 antioxidant effect Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 239000003638 chemical reducing agent Substances 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- BQQUFAMSJAKLNB-UHFFFAOYSA-N dicyclopentadiene diepoxide Chemical compound C12C(C3OC33)CC3C2CC2C1O2 BQQUFAMSJAKLNB-UHFFFAOYSA-N 0.000 description 1
- HPNMFZURTQLUMO-UHFFFAOYSA-N diethylamine Chemical compound CCNCC HPNMFZURTQLUMO-UHFFFAOYSA-N 0.000 description 1
- ZZTCPWRAHWXWCH-UHFFFAOYSA-N diphenylmethanediamine Chemical compound C=1C=CC=CC=1C(N)(N)C1=CC=CC=C1 ZZTCPWRAHWXWCH-UHFFFAOYSA-N 0.000 description 1
- 238000005553 drilling Methods 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- RRAMGCGOFNQTLD-UHFFFAOYSA-N hexamethylene diisocyanate Chemical compound O=C=NCCCCCCN=C=O RRAMGCGOFNQTLD-UHFFFAOYSA-N 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 239000012784 inorganic fiber Substances 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- 239000012948 isocyanate Substances 0.000 description 1
- 150000002513 isocyanates Chemical class 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- 230000000873 masking effect Effects 0.000 description 1
- JDSHMPZPIAZGSV-UHFFFAOYSA-N melamine Chemical compound NC1=NC(N)=NC(N)=N1 JDSHMPZPIAZGSV-UHFFFAOYSA-N 0.000 description 1
- QOHMWDJIBGVPIF-UHFFFAOYSA-N n',n'-diethylpropane-1,3-diamine Chemical compound CCN(CC)CCCN QOHMWDJIBGVPIF-UHFFFAOYSA-N 0.000 description 1
- NXPPAOGUKPJVDI-UHFFFAOYSA-N naphthalene-1,2-diol Chemical compound C1=CC=CC2=C(O)C(O)=CC=C21 NXPPAOGUKPJVDI-UHFFFAOYSA-N 0.000 description 1
- 150000002903 organophosphorus compounds Chemical class 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- QCTJRYGLPAFRMS-UHFFFAOYSA-N prop-2-enoic acid;1,3,5-triazine-2,4,6-triamine Chemical compound OC(=O)C=C.NC1=NC(N)=NC(N)=N1 QCTJRYGLPAFRMS-UHFFFAOYSA-N 0.000 description 1
- 125000000467 secondary amino group Chemical group [H]N([*:1])[*:2] 0.000 description 1
- 150000003865 secondary ammonium salts Chemical class 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- DVKJHBMWWAPEIU-UHFFFAOYSA-N toluene 2,4-diisocyanate Chemical compound CC1=CC=C(N=C=O)C=C1N=C=O DVKJHBMWWAPEIU-UHFFFAOYSA-N 0.000 description 1
- DIHAURBCYGTGCV-UHFFFAOYSA-N xi-4,5-Dihydro-2,4(5)-dimethyl-1H-imidazole Chemical compound CC1CN=C(C)N1 DIHAURBCYGTGCV-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Reinforced Plastic Materials (AREA)
- Laminated Bodies (AREA)
- Organic Insulating Materials (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、プリント配線板を
はじめとする電気絶縁材料に使用するプリプレグの製造
方法および積層板の製造方法に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a prepreg used for an electrical insulating material such as a printed wiring board and a method for manufacturing a laminate.
【0002】[0002]
【従来の技術】電気・電子機器等に使用される金属箔張
り積層板は、例えば、ガラスクロス等の基材にエポキシ
樹脂組成物等の熱硬化性樹脂ワニスを含浸した後、加熱
して半硬化させることによってプリプレグを作製し、こ
のプリプレグを所要枚数重ねると共に、銅箔等の金属箔
をその片側又は両側に配して積層し、加熱加圧して成形
を行うことによって製造されている。また、多層の金属
箔張り積層板は一般に、上記の方法で得られた金属箔張
り積層板の表面の金属箔をエッチングして導体回路を形
成した後、その導体回路を形成した積層板の表裏に、上
記と同様のプリプレグを所要枚数重ねるとともに、金属
箔をその片側又は両側に配して積層し、加熱加圧して成
形を行うことによって製造されている。また、熱硬化性
樹脂ワニスの主成分としてエポキシ樹脂組成物を用いて
なるプリプレグにおいては、エポキシ当量が100〜1
000程度のエポキシ樹脂とアミン系硬化剤および硬化
促進剤からなるエポキシ樹脂組成物が一般的に使用され
ている。2. Description of the Related Art For example, a metal foil-clad laminate used for electric and electronic equipment is impregnated with a thermosetting resin varnish such as an epoxy resin composition on a substrate such as a glass cloth and then heated to a half. A prepreg is manufactured by curing, a required number of prepregs are stacked, and a metal foil such as a copper foil is arranged and laminated on one or both sides of the prepreg, and heated and pressed to perform molding. In general, a multilayer metal foil-clad laminate is generally formed by etching a metal foil on the surface of the metal foil-clad laminate obtained by the above-described method to form a conductor circuit, and then forming the conductor circuit on the front and back of the laminate. In addition, a required number of the same prepregs as described above are stacked, and a metal foil is arranged on one side or both sides thereof, laminated, and heated and pressed to perform molding. Further, in a prepreg using an epoxy resin composition as a main component of a thermosetting resin varnish, the epoxy equivalent is 100 to 1.
An epoxy resin composition comprising about 000 epoxy resins, an amine-based curing agent and a curing accelerator is generally used.
【0003】近年、プリント配線板の高密度化、薄型
化、高速伝送性に伴い、プリント配線板材料には絶縁信
頼性や高耐熱性およびインピーダンス特性を制御するた
めの板厚精度や層間厚み精度の向上が要求されている。In recent years, as printed wiring boards have become denser, thinner, and have higher transmission speeds, printed wiring board materials are required to have a thickness accuracy and an interlayer thickness accuracy for controlling insulation reliability, high heat resistance, and impedance characteristics. Is required to be improved.
【0004】[0004]
【発明が解決しようとする課題】板厚精度の向上には加
熱成形時の成形圧力や加熱条件および副資材の変更によ
り成形時の樹脂流れを抑制することが有効な手段となっ
ており、とくに加熱条件によるプリプレグの樹脂流れや
ゲルタイムの最適化により板厚精度の向上が図られてい
る。しかし、低分子量エポキシ樹脂を用いた樹脂ワニス
では樹脂流れやゲルタイムの最適化を図ることによって
も、成形時の樹脂流れの抑制は困難であり、十分な板厚
精度が得られない。そこで、直鎖状の高分子成分、ゴム
成分及びその他充填剤などを樹脂ワニスに配合すること
がプリプレグの樹脂流れ抑制に有効な手段となってい
る。しかし、充填剤の配合ではプリント配線板加工時の
打ち抜き特性やドリル加工性や耐熱性などが低下する傾
向にあり、フェノキシ樹脂に例示される高分子エポキシ
樹脂などの直鎖状の高分子成分、あるいはNBRなどの
ゴム成分を添加した場合にはTgや耐熱性を低下させ、
接続信頼性が低下する。In order to improve the thickness accuracy, it is effective to suppress the resin flow during molding by changing the molding pressure, heating conditions and auxiliary materials at the time of thermal molding. The thickness precision is improved by optimizing the resin flow and gel time of the prepreg depending on the heating conditions. However, in a resin varnish using a low molecular weight epoxy resin, it is difficult to suppress the resin flow during molding by optimizing the resin flow and the gel time, and it is not possible to obtain sufficient thickness accuracy. Therefore, blending a linear polymer component, a rubber component, and other fillers with the resin varnish is an effective means for suppressing resin flow of the prepreg. However, the blending of the filler tends to decrease the punching properties and drilling properties and heat resistance during the processing of the printed wiring board, and a straight-chain polymer component such as a polymer epoxy resin exemplified by a phenoxy resin, Alternatively, when a rubber component such as NBR is added, Tg and heat resistance are reduced,
Connection reliability decreases.
【0005】本発明の目的は、Tgや耐熱性および加工
性を低下させることなく成形時の樹脂流れを向上させた
プリント配線板用プリプレグとこれを用いて成形された
高板厚精度の積層板を提供することにある。An object of the present invention is to provide a prepreg for a printed wiring board in which the resin flow during molding is improved without lowering the Tg, heat resistance and workability, and a high-precision laminated board formed using the same. Is to provide.
【0006】[0006]
【課題を解決するための手段】本発明は、以下に記載の
各事項に関する。 (1) (a)エポキシ当量が200〜1000で重量
平均分子量が10000以上の直鎖状の高分子量エポキ
シ樹脂、(b)エポキシ当量が100〜1000で重量
平均分子量が5000以下の低分子量エポキシ樹脂を必
須成分として配合したワニスを基材に含浸してなること
を特徴とするプリプレグ。 (2) ワニス中の全固形分100重量部に対して高分
子量エポキシ樹脂を1〜15重量部配合することを特徴
とする(1)記載のプリプレグ。 (3) (1)または(2)のいずれかに記載のプリプ
レグを用いてなることを特徴とする積層板。 (4) (1)または(2)のいずれかに記載のプリプ
レグと金属箔とを積層してなることを特徴とする金属張
り積層板。Means for Solving the Problems The present invention relates to the following items. (1) (a) a linear high molecular weight epoxy resin having an epoxy equivalent of 200 to 1000 and a weight average molecular weight of 10,000 or more, and (b) a low molecular weight epoxy resin having an epoxy equivalent of 100 to 1000 and a weight average molecular weight of 5000 or less. A prepreg characterized by impregnating a base material with a varnish blended as an essential component. (2) The prepreg according to (1), wherein 1 to 15 parts by weight of a high molecular weight epoxy resin is blended with respect to 100 parts by weight of the total solid content in the varnish. (3) A laminate comprising the prepreg according to any one of (1) and (2). (4) A metal-clad laminate obtained by laminating the prepreg according to any one of (1) and (2) and a metal foil.
【0007】本発明で用いる高分子量エポキシ樹脂
(a)は、反応末端にエポキシ基を有しておりエポキシ
当量が200〜1000で重量平均分子量が10000
以上のもであれば良い。例えば、ビスフェノールAジグ
リシジルエーテル等のジグリシジルエーテル化合物と、
酸無水物、フェノール化合物、アミン化合物などの鎖伸
張剤とを反応させ高分子化したものなどが好ましく用い
られる。なお、本発明において、重量平均分子量はゲル
パーミエーションクロマトグラフィーによって、標準ポ
リスチレンの検量線を用いて測定したものである。ま
た、樹脂単体でのTgが105〜150℃のエポキシ樹
脂を用いることが耐熱性に優れる点で特に好ましい。The high-molecular-weight epoxy resin (a) used in the present invention has an epoxy group at a reaction terminal, has an epoxy equivalent of 200 to 1,000 and a weight-average molecular weight of 10,000.
All that is required is the above. For example, a diglycidyl ether compound such as bisphenol A diglycidyl ether,
A polymer obtained by reacting with a chain extender such as an acid anhydride, a phenol compound or an amine compound to form a polymer is preferably used. In the present invention, the weight average molecular weight is measured by gel permeation chromatography using a standard polystyrene calibration curve. In addition, it is particularly preferable to use an epoxy resin having a Tg of 105 to 150 ° C. in terms of heat resistance.
【0008】高分子量エポキシ樹脂(a)の配合量とし
てはエポキシ樹脂の全固形分100重量部に対して1〜
15重量部が好ましく、3〜10重量部配合することが
特に好ましい。1重量部未満の場合は高分子量エポキシ
樹脂を配合したことによる効果が小さくなる傾向があ
り、樹脂流れを十分に抑制することが難しくなる。ま
た、15重量部を越える場合は、樹脂流れが小さくなり
すぎることから、埋め込み性が悪くなりやすいなど、成
形が困難になる傾向がある。The amount of the high molecular weight epoxy resin (a) is 1 to 100 parts by weight of the total solid content of the epoxy resin.
It is preferably 15 parts by weight, and particularly preferably 3 to 10 parts by weight. If the amount is less than 1 part by weight, the effect of blending the high molecular weight epoxy resin tends to be small, and it is difficult to sufficiently suppress the resin flow. On the other hand, when the amount exceeds 15 parts by weight, the resin flow tends to be too small, so that molding tends to be difficult, for example, the embedding property tends to deteriorate.
【0009】本発明で使用する低分子量エポキシ樹脂
(b)の種類としては、分子内に二つ以上のエポキシ基
を有するものであればどのようなものでも良く、例え
ば、ビスフェノールA型エポキシ樹脂、ビスフェノール
F型エポキシ樹脂、ビスフェノールS型エポキシ樹脂等
のビスフェノール型エポキシ樹脂、フェノールノボラッ
ク型エポキシ樹脂、クレゾールノボラック型エポキシ樹
脂、ビスフェノールAノボラック型エポキシ樹脂等のノ
ボラック型エポキシ樹脂、ジシクロペンタジエンジオキ
シド等の脂環式エポキシ化合物からなるエポキシ樹脂、
ナフタレンジオール等各種ジオールのジグリシジルエー
テル化物からなるエポキシ樹脂、及びこれらのアルキル
置換体、ハロゲン化物などを利用することができる。こ
れらは併用しても良い。The type of the low molecular weight epoxy resin (b) used in the present invention may be any type as long as it has two or more epoxy groups in the molecule. For example, bisphenol A type epoxy resin, Bisphenol-type epoxy resin, bisphenol-type epoxy resin such as bisphenol S-type epoxy resin, phenol novolak-type epoxy resin, cresol novolak-type epoxy resin, novolak-type epoxy resin such as bisphenol-A novolak-type epoxy resin, dicyclopentadiene dioxide, etc. Epoxy resin comprising an alicyclic epoxy compound,
Epoxy resins composed of diglycidyl etherified diols of various diols such as naphthalene diol, and alkyl-substituted products and halides thereof can be used. These may be used in combination.
【0010】エポキシ樹脂の硬化剤としては、通常用い
られているものであれば特に制限はなく、アミン化合
物、フェノール化合物、酸無水物等が好ましく用いられ
る。アミン化合物としては、ジエチルアミン、ジエチレ
ントリアミン、トリエチレンテトラミン、ジエチルアミ
ノプロピルアミン、アミノエチルピペラジン、メンセン
ジアミン、メタキシリレンジアミン、ジシアンジアミ
ド、ジアミノジフェニルメタン、ジアミノジフェニルス
ルフォン、メチレンジアニリン、メタフェニレンジアミ
ン等があげられる。フェノール化合物としては、ビスフ
ェノールA、ビスフェノールF等のビスフェノール化合
物、フェノールノボラック、クレゾールノボラック、ビ
スフェノールAノボラック等のノボラック型化合物、お
よびこれらのハロゲン化物、アルキル基置換体等があ
る。酸無水物としては、無水ヘキサヒドロフタル酸(H
PA)、無水テトラヒドロフタル酸(THPA)、無水
ピロメリット酸(PMDA)、無水クロレンド酸(HE
T)、無水ナディック酸(NA)、無水メチルナディッ
ク酸(MNA)、無水ドデシニルコハク酸(DDS
A)、無水フタル酸(PA)、メチルヘキサヒドロ無水
フタル酸(MeHPA)、無水マレイン酸等がある。こ
れらの硬化剤は何種類かを併用してもよい。配合量は、
エポキシ基に対して0.5〜1.5当量の範囲であるこ
とが好ましい。The curing agent for the epoxy resin is not particularly limited as long as it is generally used, and amine compounds, phenol compounds, acid anhydrides and the like are preferably used. Examples of the amine compound include diethylamine, diethylenetriamine, triethylenetetramine, diethylaminopropylamine, aminoethylpiperazine, mensendiamine, metaxylylenediamine, dicyandiamide, diaminodiphenylmethane, diaminodiphenylsulfone, methylenedianiline, and metaphenylenediamine. . Examples of the phenol compound include bisphenol compounds such as bisphenol A and bisphenol F, novolak compounds such as phenol novolak, cresol novolak, and bisphenol A novolak, and halides and alkyl group-substituted products thereof. As the acid anhydride, hexahydrophthalic anhydride (H
PA), tetrahydrophthalic anhydride (THPA), pyromellitic anhydride (PMDA), chlorendic anhydride (HE)
T), nadic anhydride (NA), methylnadic anhydride (MNA), dodecynylsuccinic anhydride (DDS)
A), phthalic anhydride (PA), methylhexahydrophthalic anhydride (MeHPA), maleic anhydride and the like. Some of these curing agents may be used in combination. The compounding amount is
It is preferably in the range of 0.5 to 1.5 equivalents to the epoxy group.
【0011】必要に応じて硬化促進剤を用いることもで
きる。硬化促進剤としては、エポキシ樹脂の硬化促進剤
として用いられているものであればよく、例えば、イミ
ダゾール化合物、有機リン化合物、第3級アミン、第4
級アンモニウム塩等が挙げられる。第2級アミノ基をア
クリロニトリル、イソシアネート、メラミン、アクリレ
ート等でマスク化したイミダゾール化合物を用いること
は、プリプレグの可使期間が通常の2倍以上となり、保
存安定性に優れる点で好ましい。イミダゾール化合物と
しては、イミダゾール、2−メチルイミダゾール、2−
エチル−4−メチルイミダゾール、2−フェニルイミダ
ゾール、2−ウンデシルイミダゾール、1−ベンジル−
2−メチルイミダゾール、2−ヘプタデシルイミダゾー
ル、4、5−ジフェニルイミダゾール、2−メチルイミ
ダゾリン、2−エチル−4−メチルイミダゾリン、2−
フェニルイミダゾリン、2−ウンデシルイミダゾリン、
2−ヘプタデシルイミダゾリン、2−イソプロピルイミ
ダゾール、2、4−ジメチルイミダゾール、2−フェニ
ル−4−メチルイミダゾール、2−メチルイミダゾリ
ン、2−イソプロピルイミダゾリン、2、4−ジメチル
イミダゾリン、2−フェニル−4−メチルイミダゾリン
等が挙げられ、マスク化剤としてはアクリロニトリル、
フェニレンジイソシアネート、トルエンジイソシアネー
ト、ナフタレンジイソシアネート、ヘキサメチレンジイ
ソシアネート、メチレンビスフェニルイソシアネート、
メラミンアクリレート等を用いることができる。これら
の硬化促進剤は何種類かを併用してもよく、配合量はエ
ポキシ樹脂100重量部に対して0.01〜5重量部が
好ましい。0.01重量部未満では促進効果が低下する
傾向があり、5重量部を超えると保存安定性が悪くなる
傾向がある。[0011] If necessary, a curing accelerator can be used. As the curing accelerator, any one may be used as long as it is used as a curing accelerator for an epoxy resin, and examples thereof include an imidazole compound, an organic phosphorus compound, a tertiary amine, and a quaternary amine.
Secondary ammonium salts and the like. It is preferable to use an imidazole compound in which the secondary amino group is masked with acrylonitrile, isocyanate, melamine, acrylate, or the like, since the prepreg has a pot life of twice or more and has excellent storage stability. Examples of the imidazole compound include imidazole, 2-methylimidazole,
Ethyl-4-methylimidazole, 2-phenylimidazole, 2-undecylimidazole, 1-benzyl-
2-methylimidazole, 2-heptadecylimidazole, 4,5-diphenylimidazole, 2-methylimidazoline, 2-ethyl-4-methylimidazoline, 2-
Phenylimidazoline, 2-undecylimidazoline,
2-heptadecylimidazoline, 2-isopropylimidazole, 2,4-dimethylimidazole, 2-phenyl-4-methylimidazole, 2-methylimidazoline, 2-isopropylimidazoline, 2,4-dimethylimidazoline, 2-phenyl-4- Methyl imidazoline and the like, as a masking agent acrylonitrile,
Phenylene diisocyanate, toluene diisocyanate, naphthalene diisocyanate, hexamethylene diisocyanate, methylene bisphenyl isocyanate,
Melamine acrylate or the like can be used. These curing accelerators may be used in combination of several kinds, and the compounding amount is preferably 0.01 to 5 parts by weight based on 100 parts by weight of the epoxy resin. If the amount is less than 0.01 part by weight, the accelerating effect tends to decrease, and if it exceeds 5 parts by weight, the storage stability tends to deteriorate.
【0012】その他に必要に応じて着色剤、酸化防止
剤、還元剤、紫外線不透過剤等の添加剤を、本発明のプ
リプレグに用いるワニス中の樹脂組成物の特性を阻害し
ない程度の量範囲で加えてもよい。また、打抜き加工性
やドリル加工性を低下させない程度に充填剤を加えても
良い。In addition, if necessary, additives such as a coloring agent, an antioxidant, a reducing agent, and an ultraviolet ray opaque agent may be added in such an amount range that the properties of the resin composition in the varnish used in the prepreg of the present invention are not impaired. May be added. In addition, a filler may be added to such an extent that punching workability and drill workability are not reduced.
【0013】上記樹脂組成物を溶剤中で配合して得たワ
ニスを基材に含浸させて、乾燥することによりプリプレ
グを得ることができる。基材としては無機繊維基材、化
学繊維基材、紙基材などを用いることができ、ガラス織
布やガラス不織布が好ましく用いられる。基材の厚さ
は、特に限定されるものではないが、通常は0.02〜
0.4mm程度のものが目的のプリプレグまたは積層板
の厚さに合わせて使用されており、本発明においてもこ
れを用いることができる。含浸方法はプリプレグの作製
に通常用いられる方法をそのまま適用でき、例えば、基
材を供給する供給ロールから、送り装置によって基材を
巻き出しながら、ワニスを貯めた槽に浸して設けた含浸
ロールの下をくぐらせて繊維基材に液状樹脂を接触させ
て樹脂を含浸することができ、ついでスクイズロールや
コンマコータなどで目的に応じた樹脂の塗布量にコント
ロールすることができる。樹脂の含浸量は通常、目的の
プリプレグの性能や積層後の絶縁層の厚さに合わせて決
められ、特に限定されるものではないが、乾燥工程後の
樹脂分が30〜90重量%であることが好ましく、40
〜80重量%であることが特に好ましい。なお、ここで
の樹脂分とはプリプレグの全重量に対する、有機樹脂固
形分と必要に応じて用いられる添加剤との合計重量の割
合である。プリプレグを製造する時の乾燥工程での乾燥
条件は通常、乾燥温度60〜200℃、乾燥時間1〜3
0分間の間で行われ、目的のプリプレグ特性に合わせて
自由に選択することができる。A prepreg can be obtained by impregnating a substrate with a varnish obtained by blending the above resin composition in a solvent and drying. As the substrate, an inorganic fiber substrate, a chemical fiber substrate, a paper substrate, and the like can be used, and a glass woven fabric or a glass nonwoven fabric is preferably used. The thickness of the substrate is not particularly limited, but is usually 0.02 to
The one having a thickness of about 0.4 mm is used in accordance with the thickness of the target prepreg or laminate, and can be used in the present invention. The impregnation method can be applied as it is to a method usually used for the production of a prepreg. The resin can be impregnated by passing the liquid resin to the fiber base material by passing it under, and the amount of the resin applied can be controlled according to the purpose by a squeeze roll or a comma coater. The resin impregnation amount is usually determined according to the performance of the target prepreg and the thickness of the insulating layer after lamination, and is not particularly limited, but the resin content after the drying step is 30 to 90% by weight. Preferably 40
It is particularly preferred that the amount is from 80 to 80% by weight. Here, the resin content is a ratio of the total weight of the organic resin solid content and the additives used as required to the total weight of the prepreg. The drying conditions in the drying step when producing the prepreg are usually a drying temperature of 60 to 200 ° C. and a drying time of 1 to 3
It is performed for 0 minutes and can be freely selected according to the desired prepreg characteristics.
【0014】目的とする積層板の厚みに合わせて得られ
たプリプレグを適宜任意枚数用いて内層材などと積層
し、積層板を製造することができる。また、プリプレグ
を積層し、その片側または両側に金属箔を重ね、加熱加
圧して金属張り積層板を製造することができる。金属箔
としては一般に銅箔やアルミ箔を用いるが、限定するも
のではなく、他の金属や合金による金属箔を用いてもよ
い。金属箔の厚みは通常5〜200μmのものが用いら
れており、本発明においてもこれを利用することができ
る。The prepreg obtained according to the desired thickness of the laminated plate is laminated with an inner layer material or the like by using an appropriate number of prepregs to produce a laminated plate. Alternatively, a prepreg is laminated, a metal foil is laminated on one side or both sides, and heated and pressed to produce a metal-clad laminate. A copper foil or an aluminum foil is generally used as the metal foil, but is not limited thereto, and a metal foil made of another metal or alloy may be used. The thickness of the metal foil is usually 5 to 200 μm, and this can be used in the present invention.
【0015】金属張り積層板製造時の加熱温度は好まし
くは130〜200℃、より好ましくは160〜180
℃で、圧力は好ましくは0.5〜10Mpa、より好ま
しくは1〜4Mpaであり、通常はプリプレグ特性や、
プレス機の能力、目的の積層板の厚み等により決定され
る。The heating temperature during production of the metal-clad laminate is preferably 130 to 200 ° C., more preferably 160 to 180.
C., the pressure is preferably 0.5 to 10 Mpa, more preferably 1 to 4 Mpa, usually prepreg properties,
It is determined by the capacity of the press machine, the thickness of the target laminate, and the like.
【0016】金属張り積層板の金属箔に対して回路加工
を施すことにより印刷配線板とすることができる。回路
加工は、例えば、金属箔表面にレジストパターンを形成
後、エッチングにより不要部分の箔を除去し、レジスト
パターンを剥離後、ドリルにより必要なスルーホールを
形成し、再度レジストパターンを形成後、スルホールに
導通させるためのメッキを施し、最後にレジストパター
ンを剥離することにより行うことができる。このように
して得られた印刷配線板の表面にさらに上記の金属箔張
り積層板を前記したのと同様の条件で積層し、さらに、
上記と同様にして回路加工して多層印刷配線板とするこ
とができる。この場合、必ずしもスルホールを形成する
必要はなく、バイアホールを形成してもよく、両方を形
成してもよい。このような多層化は必要枚数行われる。By performing circuit processing on the metal foil of the metal-clad laminate, a printed wiring board can be obtained. For circuit processing, for example, after forming a resist pattern on the metal foil surface, unnecessary portions of the foil are removed by etching, the resist pattern is peeled off, necessary through holes are formed by a drill, and a resist pattern is formed again, and a through hole is formed. The plating can be carried out by applying plating for electrical conduction and finally removing the resist pattern. On the surface of the printed wiring board thus obtained, the above metal foil-clad laminate is further laminated under the same conditions as described above, and further,
Circuit processing can be performed in the same manner as described above to obtain a multilayer printed wiring board. In this case, it is not necessary to form a through hole, and a via hole may be formed, or both may be formed. Such multilayering is performed for a required number of sheets.
【0017】[0017]
【実施例】以下に本発明における実施例と比較例を示
す。 (実施例1) ・高分子量エポキシ樹脂(a):XZ−92505(ダウケミカル製商品名、エ ポキシ当量800、重量平均分子量10000、Tgは110℃) 5重量部 ・低分子量エポキシ樹脂(b):エピコート5046(油化シェルエポキシ株式 会社製商品名、エポキシ当量480、重量平均分子量1900) 95重量部 ・ジシアンジアミド 2.6重量部 ・2−エチル−4−メチルイミダゾール 0.2重量部 重量平均分子量はゲル パーミエーション クロマトグ
ラフィーにより標準ポリスチレン検量線を用いて決定し
た。上記組成物をメチルエチルケトンに溶解し、不揮発
分65%のワニスを作製した。このワニスをガラス織布
(厚み0.2mm、坪量210g/m2)に含浸、乾燥
し、樹脂分が45%のプリプレグを得た。このプリプレ
グを4枚構成し、その両面に18μmの銅はくを配設
し、170℃、90分、4MPaの条件でプレス成形し
て厚さ0.8mmのFR−4積層板を得た。EXAMPLES Examples and comparative examples of the present invention will be described below. (Example 1)-High molecular weight epoxy resin (a): 5 parts by weight of XZ-92505 (trade name of Dow Chemical, epoxy equivalent: 800, weight average molecular weight: 10,000, Tg: 110 ° C)-Low molecular weight epoxy resin (b) : Epicoat 5046 (trade name, manufactured by Yuka Shell Epoxy Co., Ltd., epoxy equivalent: 480, weight average molecular weight: 1900) 95 parts by weight ・ Dicyandiamide 2.6 parts by weight ・ 2-ethyl-4-methylimidazole 0.2 part by weight Weight average molecular weight Was determined by gel permeation chromatography using a standard polystyrene calibration curve. The above composition was dissolved in methyl ethyl ketone to prepare a varnish having a nonvolatile content of 65%. This varnish was impregnated into a glass woven fabric (thickness 0.2 mm, basis weight 210 g / m 2 ) and dried to obtain a prepreg having a resin content of 45%. Four prepregs were formed, copper foils of 18 μm were provided on both surfaces thereof, and pressed at 170 ° C. for 90 minutes at 4 MPa to obtain a 0.8 mm thick FR-4 laminate.
【0018】 (実施例2) ・XZ−92505(ダウケミカル製) 10部重量 ・エピコート5046(油化シェルエポキシ株式会社製) 90重量部 ・ジシアンジアミド 2.5部重量 ・2−エチル−4−メチルイミダゾール 0.2部重量 上記組成物を使用し、実施例1と同様のゲルタイムにな
るようなプリプレグを作製し、厚さ0.8mmのFR−
4積層板を得た。Example 2 XZ-92505 (manufactured by Dow Chemical) 10 parts by weight Epicoat 5046 (manufactured by Yuka Shell Epoxy Co.) 90 parts by weight Dicyandiamide 2.5 parts by weight 2-Ethyl-4-methyl 0.2 parts by weight of imidazole Using the above composition, a prepreg having the same gel time as in Example 1 was prepared, and FR-
Four laminates were obtained.
【0019】 (実施例3) ・XZ−92505(ダウケミカル製) 15重量部 ・エピコート5046(油化シェルエポキシ株式会社製) 85重量部 ・ジシアンジアミド 2.4重量部 ・2−エチル−4−メチルイミダゾール 0.2重量部 上記組成物を使用し、実施例1と同様のゲルタイムにな
るようなプリプレグを作製し、厚さ0.8mmのFR−
4積層板を得た。(Example 3) XZ-92505 (manufactured by Dow Chemical) 15 parts by weight Epicoat 5046 (manufactured by Yuka Shell Epoxy Co., Ltd.) 85 parts by weight Dicyandiamide 2.4 parts by weight 2-ethyl-4-methyl 0.2 parts by weight of imidazole Using the above composition, a prepreg having a gel time similar to that of Example 1 was prepared, and FR-
Four laminates were obtained.
【0020】 (比較例1) ・ジシアンジアミド 2.6重量部 ・エピコート5046(油化シェルエポキシ株式会社製) 100重量部 ・2−エチル−4−メチルイミダゾール 0.2重量部 上記組成物を使用し、実施例1と同様のゲルタイムにな
るようなプリプレグを作製し、厚さ0.8mmのFR−
4積層板を得た。(Comparative Example 1) 2.6 parts by weight of dicyandiamide 100 parts by weight of Epicoat 5046 (manufactured by Yuka Shell Epoxy Co., Ltd.) 0.2 parts by weight of 2-ethyl-4-methylimidazole The above composition was used. A prepreg having a gel time similar to that of Example 1 was prepared, and the FR-
Four laminates were obtained.
【0021】 (比較例2) ・エピコート5046(油化シェルエポキシ株式会社製) 95重量部 ・フェノキシ樹脂:フェノトートYP50(都化成株式会社製商品名、エポキシ 当量13000、重量平均分子量29000、Tgは100℃) 5重量部 ・ジシアンジアミド 2.5重量部 ・2−エチル−4−メチルイミダゾール 0.2重量部 上記組成物を使用し、実施例1と同様のゲルタイムにな
るようなプリプレグを作製し、厚さ0.8mmのFR−
4積層板を得た。(Comparative Example 2) 95 parts by weight of Epicoat 5046 (manufactured by Yuka Shell Epoxy Co., Ltd.) Phenoxy resin: Phenotote YP50 (trade name, manufactured by Tokasei Co., Ltd., epoxy equivalent 13,000, weight average molecular weight 29,000, Tg is 100 ° C.) 5 parts by weight ・ Dicyandiamide 2.5 parts by weight ・ 2-ethyl-4-methylimidazole 0.2 part by weight Using the above composition, a prepreg having the same gel time as in Example 1 was prepared. 0.8mm thick FR-
Four laminates were obtained.
【0022】 (比較例3) ・エピコート5046(油化シェルエポキシ株式会社製) 90重量部 ・フェノトートYP50(都化成株式会社製商品名) 10重量部 ・ジシアンジアミド 2.4重量部 ・2−エチル−4−メチルイミダゾール 0.2重量部 上記組成物を使用し、実施例1と同様のゲルタイムにな
るようなプリプレグを作製し、厚さ0.8mmのFR−
4積層板を得た。(Comparative Example 3) 90 parts by weight of Epicoat 5046 (manufactured by Yuka Shell Epoxy) 10 parts by weight of phenotote YP50 (trade name of Tokasei Co., Ltd.) 2.4 parts by weight of dicyandiamide 2.4 parts by weight 2-ethyl 0.2 parts by weight of 4-methylimidazole Using the above composition, a prepreg having a gel time similar to that of Example 1 was prepared, and FR- having a thickness of 0.8 mm was used.
Four laminates were obtained.
【0023】実施例1〜3および比較例1〜3で得られ
たプリプレグについて樹脂流れを測定し、このプリプレ
グを用いた積層板について板厚精度、Tg、耐熱性を測
定した。プリプレグの樹脂流れについてはJIS−C−
6521に準拠し測定した。板厚精度についてはJIS
−C−6481に準拠し板厚を測定し標準偏差を算出し
た。TgについてもTMAを用いてJIS−C−648
1に準拠し測定した。耐熱性については表面の銅はくを
エッチングで除去し、280℃のはんだ槽に20秒間浸
漬させ、ミーズリングやフクレの有無について目視にて
評価した。評価基準は○は異常なし、△はミーズリング
発生あり、×はフクレ発生ありとした。The resin flow of the prepregs obtained in Examples 1 to 3 and Comparative Examples 1 to 3 was measured, and the thickness accuracy, Tg, and heat resistance of the laminate using the prepreg were measured. JIS-C-
It was measured according to 6521. JIS for thickness accuracy
The thickness was measured and the standard deviation was calculated according to -C-6481. Tg is also measured using TMA according to JIS-C-648.
1 was measured. Regarding heat resistance, the copper foil on the surface was removed by etching, immersed in a solder bath at 280 ° C. for 20 seconds, and the presence or absence of measling and blisters was visually evaluated. The evaluation criteria were as follows: は: no abnormality, Δ: occurrence of measling, ×: occurrence of blister.
【0024】表1の結果より明らかなように実施例1〜
3は比較例1と比べ、プリプレグの樹脂流れが小さく、
板厚精度が向上しており、比較例2、3のようにTgや
耐熱性の低下がない。As is clear from the results in Table 1, Examples 1 to
3 has a smaller resin flow of the prepreg than Comparative Example 1,
The plate thickness accuracy is improved, and there is no decrease in Tg or heat resistance as in Comparative Examples 2 and 3.
【0025】[0025]
【表1】 [Table 1]
【0026】[0026]
【発明の効果】本発明によれば、耐熱性やTg等の積層
板特性の低下無しに、樹脂流れを抑制できるプリプレグ
を製造することができ、またこのプリプレグを使用する
ことで高板厚精度の積層板を提供することができる。According to the present invention, it is possible to manufacture a prepreg capable of suppressing the resin flow without deteriorating the laminate properties such as heat resistance and Tg. Can be provided.
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 FI テーマコート゛(参考) C08L 63:00 C08L 63:00 Fターム(参考) 4F072 AB09 AB28 AD23 AD26 AD28 AD32 AE01 AE02 AF26 AF27 AF28 AF30 AF31 AG02 AG03 AG16 AG19 AH02 AL09 AL12 AL13 AL14 4F100 AB01B AB33B AK53A AK53K BA02 DH01A GB41 JA05 JA06 JJ03 YY00A 5G305 AA06 AA14 BA21 BA25 BA26 CA15 ──────────────────────────────────────────────────続 き Continued on the front page (51) Int.Cl. 7 Identification symbol FI Theme coat ゛ (Reference) C08L 63:00 C08L 63:00 F term (Reference) 4F072 AB09 AB28 AD23 AD26 AD28 AD32 AE01 AE02 AF26 AF27 AF28 AF30 AF31 AG02 AG03 AG16 AG19 AH02 AL09 AL12 AL13 AL14 4F100 AB01B AB33B AK53A AK53K BA02 DH01A GB41 JA05 JA06 JJ03 YY00A 5G305 AA06 AA14 BA21 BA25 BA26 CA15
Claims (4)
で重量平均分子量が10000以上の高分子量エポキシ
樹脂、(b)エポキシ当量が100〜1000で重量平
均分子量が5000以下の低分子量エポキシ樹脂を必須
成分として配合したワニスを基材に含浸してなることを
特徴とするプリプレグ。(1) An epoxy equivalent of 200 to 1000
The base material is impregnated with a varnish in which a high molecular weight epoxy resin having a weight average molecular weight of 10,000 or more and (b) a low molecular weight epoxy resin having an epoxy equivalent of 100 to 1,000 and a weight average molecular weight of 5,000 or less are essential components. A prepreg characterized by the following.
て高分子量エポキシ樹脂を1〜15重量部配合すること
を特徴とする請求項1記載のプリプレグ。2. The prepreg according to claim 1, wherein 1 to 15 parts by weight of a high molecular weight epoxy resin is blended with respect to 100 parts by weight of the total solid content in the varnish.
載のプリプレグを用いてなることを特徴とする積層板。3. A laminate comprising the prepreg according to claim 1 or 2.
載のプリプレグと金属箔とを積層してなることを特徴と
する金属張り積層板。4. A metal-clad laminate obtained by laminating the prepreg according to claim 1 and a metal foil.
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JP2000307714A JP2002114855A (en) | 2000-10-06 | 2000-10-06 | Method for producing prepreg, lamination plate and metal-clad lamination plate |
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JP2000307714A JP2002114855A (en) | 2000-10-06 | 2000-10-06 | Method for producing prepreg, lamination plate and metal-clad lamination plate |
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007318071A (en) * | 2006-04-28 | 2007-12-06 | Hitachi Chem Co Ltd | Insulating base board, base board with metal foil, and printed circuit board |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61209234A (en) * | 1985-03-14 | 1986-09-17 | Matsushita Electric Works Ltd | Epoxy resin laminate |
JPH09143247A (en) * | 1995-11-22 | 1997-06-03 | Matsushita Electric Works Ltd | Resin composition for laminate, prepreg and laminate |
JPH09255802A (en) * | 1996-03-25 | 1997-09-30 | Sumitomo Bakelite Co Ltd | Frefreg for laminated board |
-
2000
- 2000-10-06 JP JP2000307714A patent/JP2002114855A/en active Pending
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61209234A (en) * | 1985-03-14 | 1986-09-17 | Matsushita Electric Works Ltd | Epoxy resin laminate |
JPH09143247A (en) * | 1995-11-22 | 1997-06-03 | Matsushita Electric Works Ltd | Resin composition for laminate, prepreg and laminate |
JPH09255802A (en) * | 1996-03-25 | 1997-09-30 | Sumitomo Bakelite Co Ltd | Frefreg for laminated board |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007318071A (en) * | 2006-04-28 | 2007-12-06 | Hitachi Chem Co Ltd | Insulating base board, base board with metal foil, and printed circuit board |
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