JP2002092938A - Optical recording medium - Google Patents
Optical recording mediumInfo
- Publication number
- JP2002092938A JP2002092938A JP2000275438A JP2000275438A JP2002092938A JP 2002092938 A JP2002092938 A JP 2002092938A JP 2000275438 A JP2000275438 A JP 2000275438A JP 2000275438 A JP2000275438 A JP 2000275438A JP 2002092938 A JP2002092938 A JP 2002092938A
- Authority
- JP
- Japan
- Prior art keywords
- kcalmol
- recording medium
- optical recording
- dissociation energy
- covalent bond
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000003287 optical effect Effects 0.000 title claims abstract description 47
- 238000010494 dissociation reaction Methods 0.000 claims abstract description 38
- 230000005593 dissociations Effects 0.000 claims abstract description 38
- 239000000463 material Substances 0.000 claims abstract description 29
- 229910052787 antimony Inorganic materials 0.000 claims abstract description 26
- 229910052714 tellurium Inorganic materials 0.000 claims abstract description 26
- 229910052771 Terbium Inorganic materials 0.000 claims description 16
- 229910052688 Gadolinium Inorganic materials 0.000 claims description 14
- 239000000203 mixture Substances 0.000 claims description 13
- 229910052757 nitrogen Inorganic materials 0.000 claims description 8
- 229910052684 Cerium Inorganic materials 0.000 claims description 7
- 229910052732 germanium Inorganic materials 0.000 claims description 7
- 229910052740 iodine Inorganic materials 0.000 claims description 7
- 238000000034 method Methods 0.000 claims description 7
- 229910052710 silicon Inorganic materials 0.000 claims description 7
- 229910052796 boron Inorganic materials 0.000 claims description 6
- 229910052794 bromium Inorganic materials 0.000 claims description 6
- 229910052746 lanthanum Inorganic materials 0.000 claims description 6
- 229910052717 sulfur Inorganic materials 0.000 claims description 6
- 229910052727 yttrium Inorganic materials 0.000 claims description 6
- 229910052692 Dysprosium Inorganic materials 0.000 claims description 5
- 229910052772 Samarium Inorganic materials 0.000 claims description 5
- 229910052782 aluminium Inorganic materials 0.000 claims description 5
- 229910052731 fluorine Inorganic materials 0.000 claims description 5
- 229910052733 gallium Inorganic materials 0.000 claims description 5
- 229910052739 hydrogen Inorganic materials 0.000 claims description 5
- 229910052738 indium Inorganic materials 0.000 claims description 5
- 229910052698 phosphorus Inorganic materials 0.000 claims description 5
- 229910052726 zirconium Inorganic materials 0.000 claims description 5
- 229910052785 arsenic Inorganic materials 0.000 claims description 4
- 229910052737 gold Inorganic materials 0.000 claims description 4
- 229910052712 strontium Inorganic materials 0.000 claims description 4
- 229910052765 Lutetium Inorganic materials 0.000 claims description 3
- 229910052709 silver Inorganic materials 0.000 claims description 3
- 229910052799 carbon Inorganic materials 0.000 claims 2
- 229940035385 calmol Drugs 0.000 claims 1
- 230000003252 repetitive effect Effects 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 45
- 238000002425 crystallisation Methods 0.000 description 22
- 230000008025 crystallization Effects 0.000 description 22
- 238000003860 storage Methods 0.000 description 15
- 239000011241 protective layer Substances 0.000 description 13
- 230000035945 sensitivity Effects 0.000 description 7
- 229910052777 Praseodymium Inorganic materials 0.000 description 6
- 239000000758 substrate Substances 0.000 description 6
- 229910001215 Te alloy Inorganic materials 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 229910052769 Ytterbium Inorganic materials 0.000 description 4
- 239000000654 additive Substances 0.000 description 4
- 230000000996 additive effect Effects 0.000 description 4
- 229910052791 calcium Inorganic materials 0.000 description 4
- 229910052801 chlorine Inorganic materials 0.000 description 4
- 229910052802 copper Inorganic materials 0.000 description 4
- 229920005989 resin Polymers 0.000 description 4
- 239000011347 resin Substances 0.000 description 4
- 230000001678 irradiating effect Effects 0.000 description 3
- 230000031700 light absorption Effects 0.000 description 3
- 229910052708 sodium Inorganic materials 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- 229910000838 Al alloy Inorganic materials 0.000 description 2
- 239000000370 acceptor Substances 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- 238000010894 electron beam technology Methods 0.000 description 2
- 239000012071 phase Substances 0.000 description 2
- -1 polypropylene Polymers 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000001771 vacuum deposition Methods 0.000 description 2
- 229920000178 Acrylic resin Polymers 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229910001316 Ag alloy Inorganic materials 0.000 description 1
- 229910000763 AgInSbTe Inorganic materials 0.000 description 1
- 229910018131 Al-Mn Inorganic materials 0.000 description 1
- 229910018125 Al-Si Inorganic materials 0.000 description 1
- 229910018461 Al—Mn Inorganic materials 0.000 description 1
- 229910018507 Al—Ni Inorganic materials 0.000 description 1
- 229910018520 Al—Si Inorganic materials 0.000 description 1
- 229910018575 Al—Ti Inorganic materials 0.000 description 1
- 229910018580 Al—Zr Inorganic materials 0.000 description 1
- 229910005872 GeSb Inorganic materials 0.000 description 1
- 229910005865 GeSbTeSe Inorganic materials 0.000 description 1
- 229910005900 GeTe Inorganic materials 0.000 description 1
- 229910005918 GeTeSe Inorganic materials 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 229920000122 acrylonitrile butadiene styrene Polymers 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- QQHSIRTYSFLSRM-UHFFFAOYSA-N alumanylidynechromium Chemical compound [Al].[Cr] QQHSIRTYSFLSRM-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000009529 body temperature measurement Methods 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 230000008094 contradictory effect Effects 0.000 description 1
- 230000010485 coping Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229910052735 hafnium Inorganic materials 0.000 description 1
- 230000017525 heat dissipation Effects 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- 229910052745 lead Inorganic materials 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 229920005668 polycarbonate resin Polymers 0.000 description 1
- 239000004431 polycarbonate resin Substances 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920013716 polyethylene resin Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920005990 polystyrene resin Polymers 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- 230000008023 solidification Effects 0.000 description 1
- 238000007711 solidification Methods 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 238000000927 vapour-phase epitaxy Methods 0.000 description 1
- 238000001947 vapour-phase growth Methods 0.000 description 1
Landscapes
- Thermal Transfer Or Thermal Recording In General (AREA)
- Optical Record Carriers And Manufacture Thereof (AREA)
Abstract
Description
【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION
【0001】[0001]
【発明の属する技術分野】本発明は、電磁波、特に半導
体レーザー光を照射することにより記録材料の光学定数
を変化させ情報の記録・再生を行う相変化型光記録媒体
に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a phase change type optical recording medium for recording / reproducing information by changing the optical constant of a recording material by irradiating an electromagnetic wave, particularly a semiconductor laser beam.
【0002】[0002]
【従来の技術】レーザービームの照射により情報の記録
再生および消去可能な光記録媒体の一つとして相変化型
光記録媒体がある。この相変化型光記録媒体における記
録層材料としては、GeTe、GeTeSe、GeSb
Te、GeSbTeSe等がよく知られている。また、
高感度で消去特性の良好なAgInSbTeが新しい記
録層材料として提案されている(特開平2−37466
号公報、特開平2−171325号公報、特開平2−4
15581号公報、特開平4−141485号公報参
照)。さらに、SbとTeを主成分とした記録層材料と
しては、これにAg、Ge、In、Pd、Siなどを添
加し、記録膜の安定性や初期結晶化の容易性を向上した
もの(特開平1−303643号公報、特開平9−16
1316号公報)も提案されている。2. Description of the Related Art A phase-change optical recording medium is one of optical recording media capable of recording, reproducing and erasing information by irradiating a laser beam. GeTe, GeTeSe, GeSb may be used as a recording layer material in this phase change type optical recording medium.
Te, GeSbTeSe and the like are well known. Also,
AgInSbTe with high sensitivity and good erasing characteristics has been proposed as a new recording layer material (JP-A-2-37466).
JP, JP-A-2-171325, JP-A-2-4
No. 15581, JP-A-4-141485). Further, as a recording layer material containing Sb and Te as main components, Ag, Ge, In, Pd, Si, and the like are added thereto to improve the stability of the recording film and the easiness of initial crystallization. Japanese Unexamined Patent Publication No. Hei.
No. 1316) has also been proposed.
【0003】かかる相変化型光記録媒体はヒートモード
で記録されるため、一般に多数回の記録・消去の繰り返
しによる劣化が認められており、この繰り返し特性の向
上が大きな課題とされている。このような課題に対し
て、特開平4−61383号公報や特開平8−2875
15号公報では、記録層に窒素等を添加することが提案
されている。また、特開平8−287515号公報で
は、記録層の上下に耐熱保護層を設け、さらに上部耐熱
保護層の上に第三の耐熱保護層を配し、この第三の耐熱
保護層の熱膨張率を他の二つの耐熱保護層の熱膨張率よ
りも小さくすることにより、変形を防止して物質移動を
低減し、繰り返し特性の向上を図ることが提案されてい
る。DVD用光記録媒体においては、大容量のため高線
速化が必須であり、そのために結晶化速度を増大すると
同時に、副作用として現れる可能性がある記録マークの
結晶化による劣化を防止する必要がある。Since such a phase-change type optical recording medium is recorded in a heat mode, deterioration due to repeated recording / erasing is generally recognized many times, and improvement of the repetition characteristics is a major problem. In order to solve such a problem, Japanese Patent Application Laid-Open Nos. 4-61383 and 8-2875.
Japanese Patent Publication No. 15 proposes to add nitrogen or the like to the recording layer. In JP-A-8-287515, a heat-resistant protective layer is provided above and below a recording layer, and a third heat-resistant protective layer is provided on an upper heat-resistant protective layer. It has been proposed to reduce the thermal expansion coefficient of the other two heat-resistant protective layers to prevent deformation, reduce mass transfer, and improve the repetition characteristics. In an optical recording medium for DVD, a high linear velocity is indispensable due to a large capacity. Therefore, it is necessary to increase a crystallization speed and to prevent deterioration due to crystallization of a recording mark which may appear as a side effect. is there.
【0004】[0004]
【発明が解決しようとする課題】しかしながら上述の窒
素の様な元素の添加は、くり返し特性の向上には効果が
あるが、結晶化速度は低下するために、高線速対応でな
い。本発明の目的はこの様な状況に鑑みてなされたもの
で、多数回のくり返しに対しても劣化がなく、又、高線
速化にも対応でき、かつまた記録マーク保存性も良好な
相変化型光記録媒体を提供することである。However, the addition of an element such as nitrogen described above is effective in improving the repetition characteristics, but is not suitable for high linear velocities because the crystallization speed is reduced. The object of the present invention has been made in view of such a situation, and is not degraded even after a large number of repetitions, is compatible with high linear velocities, and has good recording mark preservability. An object of the present invention is to provide a changeable optical recording medium.
【0005】[0005]
【課題を解決するための手段】本発明によれば、第一
に、SbとTeを主成分とした記録層を有する光記録媒
体であって、該記録層はさらに共有結合半径が1.5Å
から1.7Åの間にあり、かつSb又はTeに対する解
離エネルギーが70kcalmol-1から95kcal
mol-1の間にある元素を少なくとも一種類添加してい
ることを特徴とする光記録媒体が提供される。According to the present invention, first, there is provided an optical recording medium having a recording layer containing Sb and Te as main components, wherein the recording layer further has a covalent bond radius of 1.5 °.
And 1.7 ° and the dissociation energy for Sb or Te is 70 kcalmol -1 to 95 kcal.
An optical recording medium characterized by adding at least one element present between mol −1 and 1 is provided.
【0006】第二に、上記第一に記載の光記録媒体にお
いて、添加元素がLa、Ce、Pr、Gd、Tb、Lu
から選ばれる少なくとも一種類の元素であることを特徴
とする光記録媒体が提供される。Second, in the optical recording medium according to the first aspect, the additive element is La, Ce, Pr, Gd, Tb, or Lu.
An optical recording medium characterized by being at least one element selected from the group consisting of:
【0007】第三に、上記第一または第二に光記録媒体
において、添加記載の元素をAとするとき、記録層材料
の組成を表すSbαTeβAγの式において、その組成
(atm%)が 60≦α≦80、20≦β≦35、0<γ≦15 (但しα+β+γ=100)であることを特徴とする光
記録媒体が提供される。Third, when the element described in the first or second optical recording medium is A, the composition (atm%) in the formula of SbαTeβAγ representing the composition of the recording layer material is 60 ≦ An optical recording medium is provided, wherein α ≦ 80, 20 ≦ β ≦ 35, and 0 <γ ≦ 15 (where α + β + γ = 100).
【0008】第四に、SbとTeを主成分とした記録層
を有する光記録媒体であって、該記録層はさらに共有結
合半径が1.4Åから2.0Åの間にある少なくとも一
種類の元素と、Sb又はTeに対する解離エネルギーが
45kcalmol-1から110kcalmol-1の間
にある少なくとも一種類の元素を添加していることを特
徴とする光記録媒体が提供される。Fourth, an optical recording medium having a recording layer containing Sb and Te as main components, wherein the recording layer further has at least one kind of covalent bond radius between 1.4 ° and 2.0 °. An optical recording medium is provided, wherein an element and at least one element having a dissociation energy for Sb or Te between 45 kcalmol -1 and 110 kcalmol -1 are added.
【0009】第五に、上記第四に記載の光記録媒体にお
いて、共有結合半径が1.4Åから2.0Åの間にある
少なくとも一つの元素がCa、Sr、Y、In、Ba、
Hf、Dy、Sm、Zr、Ho、Pb、Eu、Bi、G
d、Tb、Sc、Sn、Yb、Naから選択され、Sb
又はTeに対する解離エネルギーが45kcalmol
-1から110kcalmol-1の間にある少なくとも一
つの元素がAg、Au、Cu、Ga、Al、Ge、S
i、B、N、P、As、Cl、F、Br、I、Ti、S
e、S、H、Tb、Gdから選択されることを特徴とす
る光記録媒体が提供される。Fifthly, in the optical recording medium according to the fourth aspect, at least one element having a covalent bond radius between 1.4 ° and 2.0 ° is Ca, Sr, Y, In, Ba,
Hf, Dy, Sm, Zr, Ho, Pb, Eu, Bi, G
selected from d, Tb, Sc, Sn, Yb and Na;
Or the dissociation energy for Te is 45 kcalmol
At least one element between -1 and 110 kcalmol -1 is Ag, Au, Cu, Ga, Al, Ge, S
i, B, N, P, As, Cl, F, Br, I, Ti, S
An optical recording medium is provided, which is selected from e, S, H, Tb, and Gd.
【0010】第六に、上記第四または第五に記載の光記
録媒体において、共有結合半径が1.4Åから2.0Å
の間にある少なくとも一つの元素をX、Sb又はTeに
対する解離エネルギーが45kcalmol-1から11
0kcalmol-1の間にある少なくとも一つの元素を
Yとするとき、記録層材料の組成を表す。SbαTeβ
XγYδ、の式においてその組成(atm%)が、55
≦α≦80、20≦β≦35、0<γ<10、0<δ≦
10(ただしα+β+γ+δ=100)であることを特
徴とする光記録媒体が提供される。Sixth, in the optical recording medium according to the fourth or fifth aspect, the covalent radius is from 1.4 ° to 2.0 °.
Has a dissociation energy with respect to X, Sb or Te of 45 kcalmol -1 to 11
When at least one element between 0 kcalmol -1 is Y, it represents the composition of the recording layer material. SbαTeβ
In the formula of XγYδ, the composition (atm%) is 55
≦ α ≦ 80, 20 ≦ β ≦ 35, 0 <γ <10, 0 <δ ≦
10 (where α + β + γ + δ = 100) is provided.
【0011】[0011]
【発明の実施の形態】以下に本発明を詳細に説明する。
上述の如く本発明の光記録媒体の1つは、その記録層材
料がSbとTeを主成分とし、これに共有結合半径が
1.5Åから1.7Åの間にあり、かつ解離エネルギー
が70kcalmol-1から95kcalmol-1の間
にある元素、好ましくはLa、Ce、Pr、Gd、T
b、Luの中から選ばれた少なくとも一つの元素を添加
して得られる。DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be described below in detail.
As described above, in one of the optical recording media of the present invention, the recording layer material is mainly composed of Sb and Te, the covalent radius of which is between 1.5 ° and 1.7 °, and the dissociation energy is 70 kcalmol. -1 to 95 kcalmol -1 , preferably La, Ce, Pr, Gd, T
It is obtained by adding at least one element selected from b and Lu.
【0012】結晶化速度は添加元素の共有結合半径が大
きい程、大きくなる傾向がある。このため、添加元素の
共有結合半径の大きさを選択することにより結晶化速度
を制御できる。但し、結晶化速度が速くなると添加元素
によっては、極めて結晶化が進行しやすくなり、長期間
の保存や高温高湿下では記録マークが消失する場合があ
る。これを防止するためには、共有結合半径が大きくて
結晶化速度が速いにもかかわらず、高温高湿下でも結晶
化しにくい元素の添加が必要である。このためには、添
加元素の主成分のSb又はTeに対する解離エネルギー
の大きいものが効果的と考えられる。The crystallization rate tends to increase as the covalent radius of the additional element increases. Therefore, the crystallization speed can be controlled by selecting the size of the covalent radius of the additional element. However, when the crystallization speed is increased, crystallization is extremely apt to proceed depending on the added element, and the recording mark may be lost during long-term storage or under high temperature and high humidity. In order to prevent this, it is necessary to add an element which is difficult to crystallize even under high temperature and high humidity, despite the large covalent bond radius and high crystallization speed. For this purpose, an element having a large dissociation energy with respect to Sb or Te as a main component of the additive element is considered to be effective.
【0013】従って、本発明では高線速対応に必要な高
速結晶化と、保存特性の向上との一見相反する特性を同
時に満足するものとして、La、Ce、Pr、Gd、T
b、Luの中から選ばれた少なくとも一つの元素を添加
している。これらの元素は、共有結合半径が1.5Åか
ら1.7Åの間にあるため、この元素の添加により、結
晶核の形成を促進し高速結晶化が可能となる。又、Sb
又はTeに対する解離エネルギーが70kcalmol
-1から95kcalmol-1の間にあるため、結晶化温
度を高くするので、高温高湿下の保存においても記録マ
ークの消失はない。Therefore, in the present invention, La, Ce, Pr, Gd, Td are considered to simultaneously satisfy the seemingly contradictory characteristics of high-speed crystallization necessary for high linear velocity and improvement of storage characteristics.
b, at least one element selected from Lu is added. Since these elements have a covalent bond radius between 1.5 ° and 1.7 °, the addition of these elements promotes the formation of crystal nuclei and enables high-speed crystallization. Also, Sb
Or the dissociation energy for Te is 70 kcalmol
Since it is between -1 and 95 kcalmol -1 , the crystallization temperature is increased, so that the recording marks do not disappear even when stored under high temperature and high humidity.
【0014】下記表1に各元素の共有結合半径(Å)と
解離エネルギーを示す。Table 1 below shows the covalent bond radius (Å) and dissociation energy of each element.
【表1】 ここで、共有結合半径は、ゲ・ヴェ・サムソノフ監修の
日・ソ通信社発行のデータブック「元素の物理的性質」
の第一章P−33のポーリングによるデータを引用し
た。解離エネルギーは「CRC Hand book of Chemistr
y and Physics」9-86のデータを引用した。[Table 1] Here, the covalent radius is the data book "Physical Properties of Elements" published by Japan-Soviet News Agency, supervised by Ge We Samsonov.
The data by polling in Chapter 1, P-33, was cited. The dissociation energy is calculated using the CRC Hand book of Chemistr
y and Physics ”9-86.
【0015】即ち、La、Ce、Pr、Gd、Tb、L
uは、この中から選ばれた少なくとも一つの元素をSb
−Te合金に添加することにより、高線速対応が可能な
高速結晶化と同時に保存特性を向上させる結晶化温度を
高くすることができる。この時の具体的な線速は6m/
sから9m/sの間にあり、結晶化温度は165℃から
185℃の間を、上記元素及びその添加量により制御す
ることができる。That is, La, Ce, Pr, Gd, Tb, L
u represents at least one element selected from these elements as Sb
By adding to the -Te alloy, it is possible to raise the crystallization temperature for improving the storage characteristics at the same time as high-speed crystallization capable of supporting a high linear velocity. The specific linear velocity at this time is 6 m /
s to 9 m / s, and the crystallization temperature can be controlled between 165 ° C. and 185 ° C. by the above-mentioned elements and the added amount thereof.
【0016】一方、本発明ではさらなる特性の向上をは
かるために、機能分離の着想に基づいて検討した結果、
SbとTe主成分とする記録層材料に、共有結合半径が
1.4Åから2.0Åの間にある少なくとも一種類の元
素と、Sb又はTeに対する解離エネルギーが45kc
almol-1から110kcalmol-1の間にある少
なくとも一種類の元素とを添加することにより、さらな
る高速化対応と保存特性の向上及びくり返し特性や記録
感度の向上を実現することが可能となった。即ち、元素
の持つ機能を分離して、Sb−Te合金に添加するため
に添加元素群が拡大するために、共有結合半径の大きな
元素の添加及び解離エネルギーの幅を広げることが可能
となる。On the other hand, in order to further improve the characteristics of the present invention, as a result of study based on the idea of function separation,
A recording layer material containing Sb and Te as main components has at least one kind of element having a covalent bond radius of 1.4 ° to 2.0 ° and a dissociation energy for Sb or Te of 45 kc.
By adding at least one kind of element between almol -1 and 110 kcalmol -1 , it has become possible to realize a further increase in speed, an improvement in storage characteristics, and an improvement in repetition characteristics and recording sensitivity. That is, since the functions of the elements are separated and the group of added elements is expanded to be added to the Sb-Te alloy, it is possible to add an element having a large covalent bond radius and to increase the range of dissociation energy.
【0017】ここでは共有結合半径は1.4Åから2.
0Åの間の拡がり、選択された元素としては、Ca、S
r、Y、In、Ba、Hf、Dy、Zr、Ho、Pb、
Eu、Bi、Gd、Tb、Sm、Sc、Sn、Yb、N
aが用いられ、これにより対応する線速は4.5m/s
から12.0m/sまで拡大することが可能となる。下
記表2および表3にこれらの元素の共有結合半径を示
す。Here, the covalent bond radius ranges from 1.4 ° to 2.
0 °, and the selected elements are Ca, S
r, Y, In, Ba, Hf, Dy, Zr, Ho, Pb,
Eu, Bi, Gd, Tb, Sm, Sc, Sn, Yb, N
a, whereby the corresponding linear velocity is 4.5 m / s
From 12.0 m / s to 12.0 m / s. Tables 2 and 3 below show the covalent bond radii of these elements.
【0018】[0018]
【表2】 [Table 2]
【0019】[0019]
【表3】 [Table 3]
【0020】解離エネルギーに関しては、Sb又はTe
に対する添加元素の解離エネルギーを、45kcalm
ol-1から110kcalmol-1の範囲のものに広げ
ることができる。この中にある元素としては、Ag、A
u、Cu、Ga、Al、Ge、Si、B、N、P、A
s、Cl、F、Br、I、Ti、S、H、Tb、Gdが
あげられ、この中の少なくとも一種類の元素が、上述し
た共有結合半径が1.4Åから2.0Åの間にある少な
くとも一種類元素と共にSb−Te合金中に添加され、
これにより対応する線速は、上述の如く4.5m/sか
ら12.0m/sの間に、又、保存特性を向上させる結
晶化温度は150℃から220℃の範囲に広げることが
できる。ここで用いられる元素の解離エネルギーを下に
示す。Regarding the dissociation energy, Sb or Te
Is 45 kcalm.
ol -1 to 110 kcalmol -1 . The elements contained therein are Ag, A
u, Cu, Ga, Al, Ge, Si, B, N, P, A
s, Cl, F, Br, I, Ti, S, H, Tb, and Gd. At least one of the elements has a covalent radius between 1.4 ° and 2.0 °. Added to the Sb-Te alloy together with at least one element,
As a result, the corresponding linear velocity can be widened from 4.5 m / s to 12.0 m / s as described above, and the crystallization temperature for improving the storage characteristics can be widened from 150 ° C. to 220 ° C. The dissociation energies of the elements used here are shown below.
【0021】[0021]
【表4】 [Table 4]
【0022】[0022]
【表5】 [Table 5]
【0023】これらの添加元素は解離エネルギーの大き
さによっては、その結合強度を変化させるものであるこ
とから、そのエネルギーが70kcalmol-1をこえ
る場合は、くり返し特性が向上する。この原因は不明で
あるが、元素間の結合強度が大きいために、記録別にレ
ーザー光を照射しての溶融と凝固のくり返しにおいても
組成変化や構造変化が少ないためと考えられる。Since these additional elements change the bonding strength depending on the magnitude of the dissociation energy, when the energy exceeds 70 kcalmol -1 , the repetition characteristics are improved. Although the cause is unknown, it is considered that since the bonding strength between the elements is large, the composition change and the structural change are small even in the repetition of melting and solidification by irradiating a laser beam for each recording.
【0024】又、Sb−Te合金に対して、Ge、S
i、O、S、Ci、F、Br、I等は、アクセプタ及び
ドナーとして働くために光の吸収効率が向上し、記録感
度が良くなると考えられる。Further, Ge, S, and Sb-Te alloys
It is considered that i, O, S, Ci, F, Br, I, etc. function as acceptors and donors, so that the light absorption efficiency is improved and the recording sensitivity is improved.
【0025】なお、添加元素のうちTb、Gdは共有結
合半径を拡げる元素としても解離エネルギーの範囲を拡
げる元素としても有用であるが、この添加元素のいずれ
が用いられる場合には、別の前記列記した元素から選ば
れる元素と組合わせることが望ましい。Of the additional elements, Tb and Gd are useful both as an element for expanding the covalent bond radius and as an element for expanding the range of the dissociation energy. It is desirable to combine with elements selected from the listed elements.
【0026】添加元素の量は、本発明の1つでのLa、
Ce、Pr、Gd、Tb、Luの場合は、これらの元素
をAとしたときの組成式を SbαTeβAγ とすると、各元素の組成(atm%)は、 60≦α≦80、20≦β≦35、0<γ≦15 (但しα+β+γ=100)の場合に高線速対応可能で
かつ保存特性をくり返し特性が向上する。特に好ましい
範囲は、 68≦α≦75、25≦β≦30、 2≦γ≦7 (但しα+β+γ=100)である。The amount of the additional element is determined by La,
In the case of Ce, Pr, Gd, Tb, and Lu, when the composition formula when these elements are A is SbαTeβAγ, the composition (atm%) of each element is 60 ≦ α ≦ 80 and 20 ≦ β ≦ 35. , 0 <γ ≦ 15 (where α + β + γ = 100), it is possible to cope with a high linear velocity, and the storage characteristics are repeatedly improved. Particularly preferred ranges are 68 ≦ α ≦ 75, 25 ≦ β ≦ 30, 2 ≦ γ ≦ 7 (where α + β + γ = 100).
【0027】また、添加元素の量は、本発明の他の例
(機能分離型の場合)においては、共有結合半径が1.
4Åから2.0Åの間にあるCa、Sr、Y、In、B
a、Hf、Dy、Zr、He、Pb、Eu、Bi、G
d、Tb、Sm、Sc、Sn、Yb、Naの元素から選
ばれた少なくとも一種類の元素をX、解離エネルギーが
45kcalmol-1から110kcalmol-1の間
にある。Ag、Au、Cu、Ga、Al、Ge、Si、
B、N、P、As、Cl、F、Br、I、Ti、S、
H、Tb、Gdの元素から選ばれた少なくとも一種類の
元素をYとしたときの組成式を SbαTeβXγYδ とすると、各元素の組成(atm%)は 55≦α≦80、20≦β≦35、 0<γ≦10、0<δ≦10 (但しα+β+γ=100)の場合に高速対応が可能で
かつ保存特性、くり返し特性、そして記録感度が向上す
る。特に好ましい範囲は 65≦α≦72、25≦β≦30、 1≦γ≦6、1<δ≦7 である。特に上記Yの場合は、2種類の元素を添加する
とより効果的である。この場合は、実質的に添加元素は
3種類となる。In another example of the present invention (in the case of a function-separated type), the amount of the added element is such that the covalent bond radius is 1.
Ca, Sr, Y, In, B between 4% and 2.0%
a, Hf, Dy, Zr, He, Pb, Eu, Bi, G
At least one element selected from d, Tb, Sm, Sc, Sn, Yb, and Na is X, and the dissociation energy is between 45 kcalmol -1 and 110 kcalmol -1 . Ag, Au, Cu, Ga, Al, Ge, Si,
B, N, P, As, Cl, F, Br, I, Ti, S,
Assuming that the composition formula when at least one element selected from the elements of H, Tb, and Gd is Y is SbαTeβXγYδ, the composition (atm%) of each element is 55 ≦ α ≦ 80, 20 ≦ β ≦ 35, When 0 <γ ≦ 10, 0 <δ ≦ 10 (where α + β + γ = 100), high-speed operation is possible, and storage characteristics, repetition characteristics, and recording sensitivity are improved. Particularly preferred ranges are 65 ≦ α ≦ 72, 25 ≦ β ≦ 30, 1 ≦ γ ≦ 6, and 1 <δ ≦ 7. Particularly in the case of the above Y, it is more effective to add two kinds of elements. In this case, there are substantially three types of additive elements.
【0028】続いて、本発明の構成を図面を参照して具
体的に説明する。図1は本発明の相変化型光記録媒体の
一例の構成を示すもので、案内溝を有する基板1の上に
下部耐熱保護層2、記録層3、上部耐熱保護層4、反射
放熱層5が順次設けられている。Next, the configuration of the present invention will be specifically described with reference to the drawings. FIG. 1 shows an example of the structure of a phase-change optical recording medium according to the present invention. A lower heat-resistant protective layer 2, a recording layer 3, an upper heat-resistant protective layer 4, and a reflective heat radiation layer 5 are formed on a substrate 1 having a guide groove. Are sequentially provided.
【0029】基板1の材料は通常、ガラス、セラミック
ス、あるいは樹脂が用いられ、樹脂基板が成形性の点で
好ましい。代表例としてはポリカーボネート樹脂、アク
リル樹脂、エポキシ樹脂、ポリスチレン樹脂、ポリエチ
レン樹脂、ポリプロピレン樹脂、シリコーン樹脂、フッ
素系樹脂、ABS樹脂、ウレタン樹脂等が挙げられる
が、加工性、光学特性などの点からポリカーボネート樹
脂が好ましい。また、基板の形状はディスク状、カード
状あるいはシート状であってもよい。The material of the substrate 1 is usually glass, ceramics, or resin, and a resin substrate is preferable in terms of moldability. Representative examples include polycarbonate resin, acrylic resin, epoxy resin, polystyrene resin, polyethylene resin, polypropylene resin, silicone resin, fluororesin, ABS resin, urethane resin, and the like. Resins are preferred. Further, the shape of the substrate may be a disk shape, a card shape or a sheet shape.
【0030】耐熱保護層2および4は、各種気相成長
法、例えば真空蒸着法、スパッタリング法、電子ビーム
法等により形成できる。また、その膜厚はその機能、即
ち、耐熱層、多重干渉層としての機能によっても異なる
が、下部耐熱保護層は500〜3000Å、好ましくは
800〜2000Åとするのがよい。また、上部耐熱保
護層は100〜1000Å、好ましくは150〜350
Åとするのがよい。The heat-resistant protective layers 2 and 4 can be formed by various vapor phase growth methods, for example, a vacuum evaporation method, a sputtering method, an electron beam method, and the like. Further, the thickness of the lower heat-resistant protective layer is preferably 500 to 3000, preferably 800 to 2000, although it depends on its function, that is, the function as a heat-resistant layer and a multiple interference layer. Further, the upper heat-resistant protective layer has a thickness of 100 to 1000 °, preferably 150 to 350 °.
Å is good.
【0031】記録層3は上記耐熱保護層と同様、各種気
相成長法を利用することができる。記録層の膜厚は多重
干渉を効果的に利用するため、その記録層材料のバンド
ギャップによっても異なるがバンドギャップが1.0e
V以上のものは50〜500Å、好ましくは100〜2
50Åがよい。即ち、バンドギャップが1.0eV以下
の場合は吸収が大きくなるため膜厚を薄くして透過光を
増大する必要がある。For the recording layer 3, various vapor phase epitaxy methods can be used as in the case of the heat-resistant protective layer. Although the thickness of the recording layer varies depending on the band gap of the recording layer material in order to effectively use the multiple interference, the band gap is 1.0 e.
50 to 500 °, preferably 100 to 2
50 ° is good. That is, when the band gap is 1.0 eV or less, the absorption increases, so that it is necessary to reduce the film thickness to increase the transmitted light.
【0032】反射放熱層5は各種金属、合金が使用可能
であるが、特にAl−Ti、Al−Ni、Al−Mn、
Al−Cr、Al−Zr、Al−Si等のAl合金やA
g−Pd等のAg合金が望ましい。これらの層は真空蒸
着法、スパッタリング法、電子ビーム法等により形成さ
れ、その膜厚は200〜3000Å、好ましくは500
〜2000Åがよい。Various metals and alloys can be used for the reflective heat radiation layer 5, and in particular, Al-Ti, Al-Ni, Al-Mn,
Al alloys such as Al-Cr, Al-Zr, Al-Si and A
An Ag alloy such as g-Pd is desirable. These layers are formed by a vacuum deposition method, a sputtering method, an electron beam method, or the like, and have a thickness of 200 to 3000 °, preferably 500
~ 2000Å is good.
【0033】[0033]
【実施例】以下実施例により本発明をさらに具体的に説
明する。The present invention will be described more specifically with reference to the following examples.
【0034】(実施例1)ピッチ0.72μm、深さ4
00Åの溝付き厚さ0.6mm、直径120mmφのポ
リカーボネート基板上に下記表6に示す構成により、そ
れぞれ下部耐熱保護層、記録層、上部耐熱保護層および
反射放熱層を順次スパッタ法により積層して光記録媒体
を作成した。ここで、耐熱保護層にはZnS、SiO2
を用い、記録層材料としてはSb68Te25La7を用
い、そして反射層材料にはAl合金を用いた。(Example 1) Pitch: 0.72 μm, depth: 4
A lower heat-resistant protective layer, a recording layer, an upper heat-resistant protective layer, and a reflective heat-dissipating layer were sequentially laminated by a sputtering method on a polycarbonate substrate having a groove thickness of 0.6 mm, a thickness of 0.6 mm, and a diameter of 120 mmφ according to the configuration shown in Table 6 below. An optical recording medium was created. Here, ZnS, SiO 2 was used for the heat-resistant protective layer.
Sb 68 Te 25 La 7 was used as a recording layer material, and an Al alloy was used as a reflective layer material.
【0035】[0035]
【表6】 このようにして得られた光記録媒体を、高出力半導体レ
ーザーにより初期化した後にディスク特性を評価した。[Table 6] The optical recording medium thus obtained was initialized with a high-power semiconductor laser, and the disk characteristics were evaluated.
【0036】評価項目は、高線速対応をみるために記録
線速を4.0m/s、6.0m/s、8.0m/s、1
0.0m/s、12.0m/sとした。この時の記録信
号は、EFMランダムパターンであり、記録再生線速は
3.5m/sである。測定したマークのジッタ値は3T
信号であり、%表示に換算している。くり返し特性は記
録線速8.0m/sのジッタ値で評価している。保存特
性は80℃、85%RHの高温高湿下で300時間保存
後の記録特性を、記録線速80m/sのジッタ値で評価
した。又、記録パワーは10mwに固定している。さら
に記録膜を成膜する時に、結晶化温度測定用資料を作成
し、示差走査熱量計で結晶化温度を測定した。The evaluation items were as follows: recording linear velocities of 4.0 m / s, 6.0 m / s, 8.0 m / s, 1
0.0 m / s and 12.0 m / s. The recording signal at this time is an EFM random pattern, and the recording / reproducing linear velocity is 3.5 m / s. The measured mark jitter value is 3T
It is a signal and is converted to% display. The repetition characteristic is evaluated by a jitter value at a recording linear velocity of 8.0 m / s. As for the storage characteristics, the recording characteristics after storage at high temperature and high humidity of 80 ° C. and 85% RH for 300 hours were evaluated by a jitter value at a recording linear velocity of 80 m / s. The recording power is fixed at 10 mw. Further, when forming a recording film, crystallization temperature measurement data was prepared, and the crystallization temperature was measured with a differential scanning calorimeter.
【0037】(実施例2)記録層材料にSb68Te25G
d7を用いた以外は実施例1と全く同様にして光記録媒
体を作成した。Example 2 Sb 68 Te 25 G was used as a recording layer material.
The optical-recording medium except for using the d 7 is in the same manner as in Example 1.
【0038】(実施例3)記録層材料にSb68Te25L
u7を用いた以外は実施例1と全く同様にして光記録媒
体を作成した。Example 3 Sb 68 Te 25 L was used for the recording layer material.
The optical-recording medium except for using the u 7 is in the same manner as in Example 1.
【0039】(実施例4)記録層材料にSb68Te24B
a3Si5を用いた以外は実施例1と全く同様にして光記
録媒体を作成した。Example 4 Sb 68 Te 24 B was used for the recording layer material.
An optical recording medium was prepared in exactly the same manner as in Example 1 except that a 3 Si 5 was used.
【0040】(実施例5)記録層材料にSb68Te24G
e4Gd4を用いた以外は実施例1と全く同様にして光記
録媒体を作成した。Example 5 Sb 68 Te 24 G was used as a recording layer material.
An optical recording medium was prepared in exactly the same manner as in Example 1 except that e 4 Gd 4 was used.
【0041】(実施例6)記録層材料にSb68Te24I
n4B4を用いた以外は実施例1と全く同様にして光記録
媒体を作成した。Example 6 Sb 68 Te 24 I was used as a recording layer material.
An optical recording medium was prepared in exactly the same manner as in Example 1 except that n 4 B 4 was used.
【0042】(実施例7)記録層材料にSb68Te24T
b2In3Ge3を用いた以外は実施例1と全く同様にし
て光記録媒体を作成した。Example 7 Sb 68 Te 24 T was used for the recording layer material.
An optical recording medium was prepared in exactly the same manner as in Example 1 except that b 2 In 3 Ge 3 was used.
【0043】(実施例8)記録層材料にSb68Te24P
b3Ge3Gd2を用いた以外は実施例1と全く同様にし
て光記録媒体を作成した。Example 8 Sb 68 Te 24 P was used as a recording layer material.
An optical recording medium was prepared in exactly the same manner as in Example 1 except that b 3 Ge 3 Gd 2 was used.
【0044】(実施例9)記録層材料にSb68Te24B
i3P2Ag3を用いた以外は実施例1と全く同様にして
光記録媒体を作成した。Example 9 Sb 68 Te 24 B was used as a recording layer material.
An optical recording medium was prepared in exactly the same manner as in Example 1 except that i 3 P 2 Ag 3 was used.
【0045】(実施例10)記録層材料にSb68Te24
Ca3Cl3Au2を用いた以外は実施例1と全く同様に
して光記録媒体を作成した。Example 10 Sb 68 Te 24 was used as a recording layer material.
An optical recording medium was prepared in exactly the same manner as in Example 1 except that Ca 3 Cl 3 Au 2 was used.
【0046】(比較例1)記録層材料にSb75Te25を
用いた以外は実施例1と全く同様にして光記録媒体を作
成した。Comparative Example 1 An optical recording medium was prepared in exactly the same manner as in Example 1 except that Sb 75 Te 25 was used as a recording layer material.
【0047】(比較例2)記録層材料にSb68Te27G
e5を用いた以外は実施例と全く同様にして光記録媒体
を作成した。(Comparative Example 2) Sb 68 Te 27 G was used for the recording layer material.
except for using the e 5 is to produce an optical recording medium in the same manner as in Example.
【0048】実施例1〜10の光記録媒体における結晶
化温度を表7に示し、ディスク特性を表8〜17に示
し、また比較例1及び2のディスク特性を表18〜19
に示す。The crystallization temperatures of the optical recording media of Examples 1 to 10 are shown in Table 7, the disk characteristics are shown in Tables 8 to 17, and the disk characteristics of Comparative Examples 1 and 2 are shown in Tables 18 to 19.
Shown in
【0049】[0049]
【表7】 [Table 7]
【0050】[0050]
【表8】 [Table 8]
【0051】[0051]
【表9】 [Table 9]
【0052】[0052]
【表10】 [Table 10]
【0053】[0053]
【表11】 [Table 11]
【0054】[0054]
【表12】 [Table 12]
【0055】[0055]
【表13】 [Table 13]
【0056】[0056]
【表14】 [Table 14]
【0057】[0057]
【表15】 [Table 15]
【0058】[0058]
【表16】 [Table 16]
【0059】[0059]
【表17】 [Table 17]
【0060】[0060]
【表18】 [Table 18]
【0061】[0061]
【表19】 [Table 19]
【0062】以上の実施例の結果から本発明のSbとT
eを主成分とし、これに共有結合半径が1.69Åで解
離エネルギーが91kcalmol-1のLaや、同じく
共有結合半径が1.62Åで解離エネルギーが82kc
almol-1のGd、そして共有結合半径が1.56Å
で解離エネルギーが78kcalmol-1のLuを添加
した記録層材料を有する光記録媒体は、解離エネルギー
の大きいほど結晶化温度は高くなり、保存特性も良好で
あると同時に高線速にも対応できていることがわかる。From the results of the above examples, it was found that Sb and T
e as the main component, to which La has a covalent bond radius of 1.69 ° and a dissociation energy of 91 kcalmol −1 , and also has a covalent bond radius of 1.62 ° and a dissociation energy of 82 kc
Gd of almol -1 and covalent radius of 1.561.5
In the optical recording medium having a recording layer material to which Lu having a dissociation energy of 78 kcalmol -1 is added, the crystallization temperature becomes higher as the dissociation energy becomes larger, the storage characteristics are good, and it can cope with a high linear velocity. You can see that
【0063】一方、比較例1をみるとSb75Te25の
場合、これは高線速対応であるが、保存テストによりマ
ークが消失している。これは結晶化温度が極めて低いた
めである。又、比較例2のSb68Te27Ge5は保存特
性は良好であるが、高線速対応が困難であることがわか
る。これは、添加元素のGeがその共有結合半径が1.
22Åと小さいために結晶核として働かないものと考え
られる。On the other hand, according to Comparative Example 1, in the case of Sb 75 Te 25 , this corresponds to a high linear velocity, but the mark has disappeared by the storage test. This is because the crystallization temperature is extremely low. Also, it can be seen that Sb 68 Te 27 Ge 5 of Comparative Example 2 has good storage characteristics, but is difficult to cope with a high linear velocity. This is because the additive element Ge has a covalent bond radius of 1.
It is considered that it does not work as a crystal nucleus because it is as small as 22 °.
【0064】一方、SbとTeを主成分とし、これに共
有結合半径が1.98ÅのBaと解離エネルギーが10
8kcalmol-1のSiとを添加した実施例4、そし
て共有結合半径が1.62ÅのGdと、解離エネルギー
が109kcalmol-1のGeを添加した実施例5、
共有結合半径が1.50ÅのInと解離エネルギーが、
84.7kcalmol-1のBを添加した実施例6の場
合においても、2つの添加元素の協力のために高線速対
応が可能でかつ保存特性も良好である。又、SiとGe
を添加した場合はBより記録感度が良好である。これ
は、Ge、Siが、Sb−Te合金中でアクセプターと
しての順位を形成し、これによる光の吸収効率を向上さ
せているものと考えられる。On the other hand, Sb and Te are the main components, and Ba having a covalent bond radius of 1.98 ° and a dissociation energy of 10
Example 4 in which 8 kcalmol -1 of Si was added, and Example 5 in which Gd having a covalent bond radius of 1.62 ° and Ge having a dissociation energy of 109 kcalmol -1 were added.
In with a covalent bond radius of 1.50 ° and dissociation energy,
Also in the case of Example 6 in which 84.7 kcalmol -1 of B was added, high linear velocity was possible and the storage characteristics were good due to the cooperation of the two added elements. Also, Si and Ge
When B is added, the recording sensitivity is better than B. This is presumably because Ge and Si form a rank as an acceptor in the Sb-Te alloy, thereby improving light absorption efficiency.
【0065】又、SbとTeを主成分とし、これに共有
結合半径が1.50ÅのInと共有結合半径が1.61
ÅのTbと、解離エネルギーが109kcalmol-1
のGeとを添加した実施例7、共有結合半径が1.54
ÅのPdと共有結合半径が1.62ÅのGdと、解離エ
ネルギーが109kcalmol-1のGeとを添加した
実施例8も、高線速対応が可能でかつ保存特性も良好で
ある。In addition, Sb and Te are the main components, and In has a covalent bond radius of 1.50 ° and a covalent bond radius of 1.61.
T Tb and dissociation energy is 109 kcalmol -1
Example 7 wherein Ge was added and the covalent bond radius was 1.54.
Example 8 in which Pd of Å, Gd having a covalent bond radius of 1.62Å, and Ge having a dissociation energy of 109 kcalmol −1 was also added, capable of coping with high linear velocities and having good storage characteristics.
【0066】さらにSbとTeを主成分とし、これに共
有結合半径が1.50ÅのBiと、解離エネルギーが4
6.8kcalmol-1のAgと、解離エネルギーが1
03.8kcalmol-1のPを添加した実施例9、共
有結合半径が1.74ÅのCaと解離エネルギーが7
5.9kcalmol-1のAuと同じく解離エネルギー
が86kcalmol-1のClを添加した実施例10も
良好な特性を示す。特にAgは解離エネルギーが他の元
素に比較して小さいためか、結晶化温度は165℃と少
し低めであるが、特に問題はない。又、実施例10は、
記録感度が良好であるが、これはClがドナーとして働
いて光吸収率を向上させているためと思われる。又、以
上のすべての実施例は、くり返し特性も良好である。Further, Bi containing Sb and Te as main components, a covalent bond radius of 1.50 °, and a dissociation energy of 4
Ag of 6.8 kcalmol -1 and dissociation energy of 1
Example 9 in which P of 33.8 kcalmol -1 was added, Ca having a covalent bond radius of 1.74 ° and a dissociation energy of 7
Example 10 in which Cl having a dissociation energy of 86 kcalmol -1 was added similarly to Au of 5.9 kcalmol -1 also showed good characteristics. In particular, Ag has a slightly lower crystallization temperature of 165 ° C., probably because the dissociation energy is smaller than other elements, but there is no particular problem. Example 10
The recording sensitivity was good, probably because Cl worked as a donor to improve the light absorption. Further, all of the above embodiments have good repetition characteristics.
【0067】[0067]
【発明の効果】(1)以上の説明から明らかなように、
請求項1、2、3記載の光記録媒体は、記録層材料とし
てSbとTeを主成分とし、これに共有結合半径が1.
5Åから1.7Åの間にあり、かつ、解離エネルギーが
76kcalmol-1から95kcalmol-1の間に
あるLa、Ce、Pr、Gd、Tb、Luから選ばれる
少なくとも一種類の元素を所定の量添加することによ
り、高線速対応の保存特性及びくり返し特性が良好な記
録媒体を提供することができる。 (2)請求項4、5、6記載の光記録媒体は、記録層材
料としてSbとTeを主成分とし、これに共有結合半径
が1.4Åから2.0Åの間にあるCa、Sr、Y、I
n、Ba、Hf、Dy、Sm、Zr、Ho、Pb、E
u、Bi、Gd、Tb、Sc、Sn、Yb、Naから選
ばれる少なくとも一種の元素と、解離エネルギーが45
kcalmol-1から110kcalmol-1の間のA
g、Au、Cu、Ga、Al、Ge、Si、B、N、
P、As、Cl、F、Br、I、Ti、Se、S、H、
Tb、Gdから選ばれる少なくとも一種の元素を添加す
ることにより、高線速化対応の保護特性とくり返し特性
が良好で、かつ記録感度を向上させる記録媒体が提供で
きる。(1) As is clear from the above description,
The optical recording medium according to any one of claims 1, 2 and 3 comprises Sb and Te as main components of the recording layer material, and has a covalent bond radius of 1.
There from 5Å between 1.7 Å, and the dissociation energy is La, Ce, Pr, Gd, Tb, a predetermined amount adding at least one kind of element selected from Lu, which is between 76Kcalmol -1 of 95Kcalmol -1 By doing so, it is possible to provide a recording medium having good storage characteristics and high repetition characteristics for high linear velocity. (2) The optical recording medium according to any one of claims 4, 5 and 6, wherein Sb and Te are the main components of the recording layer material, and Ca, Sr, whose covalent bond radius is between 1.4 ° and 2.0 °. Y, I
n, Ba, Hf, Dy, Sm, Zr, Ho, Pb, E
at least one element selected from u, Bi, Gd, Tb, Sc, Sn, Yb, and Na;
A between kcalmol -1 and 110 kcalmol -1
g, Au, Cu, Ga, Al, Ge, Si, B, N,
P, As, Cl, F, Br, I, Ti, Se, S, H,
By adding at least one element selected from Tb and Gd, it is possible to provide a recording medium having good protection characteristics and repetition characteristics corresponding to a high linear velocity and improved recording sensitivity.
【図1】本発明の光記録媒体の一例の層構成を示す図で
ある。FIG. 1 is a diagram showing a layer configuration of an example of an optical recording medium of the present invention.
1 基板 2 下部耐熱保護層 3 記録層 4 上部耐熱保護層 5 反射放熱層 DESCRIPTION OF SYMBOLS 1 Substrate 2 Lower heat protection layer 3 Recording layer 4 Upper heat protection layer 5 Reflection heat dissipation layer
───────────────────────────────────────────────────── フロントページの続き (72)発明者 芝口 孝 東京都大田区中馬込1丁目3番6号 株式 会社リコー内 (72)発明者 鈴木 栄子 東京都大田区中馬込1丁目3番6号 株式 会社リコー内 Fターム(参考) 2H111 EA04 EA23 FB04 FB05 FB06 FB07 FB09 FB10 FB12 FB17 FB18 FB20 FB21 FB24 5D029 JA01 ──────────────────────────────────────────────────続 き Continuing on the front page (72) Takashi Shibaguchi, 1-3-6 Nakamagome, Ota-ku, Tokyo Inside Ricoh Co., Ltd. (72) Eiko Suzuki 1-3-6, Nakamagome, Ota-ku, Tokyo F-term in Ricoh Co., Ltd. (reference) 2H111 EA04 EA23 FB04 FB05 FB06 FB07 FB09 FB10 FB12 FB17 FB18 FB20 FB21 FB24 5D029 JA01
Claims (6)
る光記録媒体であって、該記録層はさらに共有結合半径
が1.5Åから1.7Åの間にあり、かつSb又はTe
に対する解離エネルギーが70kcalmol-1から9
5kcalmol-1の間にある元素の少なくとも一種類
を添加してなることを特徴とする光記録媒体。1. An optical recording medium having a recording layer containing Sb and Te as main components, wherein the recording layer further has a covalent bond radius between 1.5 ° and 1.7 °, and Sb or Te.
Dissociation energy from 70 kcalmol -1 to 9
An optical recording medium characterized by adding at least one kind of element between 5 kcalmol -1 .
間にあり、かつSb又はTeに対する解離エネルギーが
70kcalmol-1から95kcalmol-1の間に
ある元素の少なくとも一種類がLa、Ce、Pr、G
d、Tb、Luから選ばれることを特徴とする請求項1
記載の光記録媒体。2. At least one of the elements whose covalent radius is between 1.5 ° and 1.7 ° and whose dissociation energy for Sb or Te is between 70 kcalmol −1 and 95 kcalmol −1 is La, Ce, or Pr, G
2. The method according to claim 1, wherein the element is selected from d, Tb, and Lu.
The optical recording medium according to the above.
間にあり、かつSb又はTeに対する解離エネルギーが
70kcalmol-1の間にある少なくとも一つの元素
をAとするとき、記録層材料の組成を表すSbαTeβ
Aγ、の式においてその組成(atm%)が 60≦α≦80、20≦β≦35、0<γ≦15 (但しα+β+γ=100)であることを特徴とする請
求項1また2記載の光記録媒体。3. When the at least one element whose covalent bond radius is between 1.5 ° and 1.7 ° and whose dissociation energy for Sb or Te is between 70 kcalmol −1 is A, the recording layer material is SbαTeβ representing composition
3. The light according to claim 1, wherein the composition (atm%) in the formula of Aγ is 60 ≦ α ≦ 80, 20 ≦ β ≦ 35, and 0 <γ ≦ 15 (where α + β + γ = 100). recoding media.
る光記録媒体であって、該記録層はさらに共有結合半径
が1.4Åから2.0Åの間にある元素の少なくとも一
種類と、Sb又はTeに対する解離エネルギーが45k
calmol -1から110kcalmol-1の間にある
元素の少なくとも一種類を添加してなることを特徴とす
る光記録媒体。4. It has a recording layer containing Sb and Te as main components.
Optical recording medium, wherein the recording layer further comprises a covalent bond radius.
Is at least one of the elements between 1.4% and 2.0%
Kind and dissociation energy for Sb or Te is 45k
calmol -1From 110 kcalmol-1Between
Characterized by the addition of at least one of the elements
Optical recording medium.
から2.0Åの間にある元素の少なくとも一種類がC
a、Sr、Y、In、Ba、Hf、Dy、Sm、Zr、
Ho、Pb、Eu、Bi、Gd、Tb、Sc、Sn、Y
b、Naから選ばれ、Sb又はTeに対する解離エネル
ギーが45kcalmol-1から110kcalmol
-1の間にある元素の少なくとも一種類がAg、Au、C
u、Ga、Al、Ge、Si、B、N、P、As、C
l、F、Br、I、Ti、Se、S、H、Tb、Gdか
ら選ばれることを特徴とする請求項4記載の光記録媒
体。5. The covalent bond radius according to claim 4, wherein the radius is 1.4 °.
At least one of the elements between
a, Sr, Y, In, Ba, Hf, Dy, Sm, Zr,
Ho, Pb, Eu, Bi, Gd, Tb, Sc, Sn, Y
b, selected from Na and having a dissociation energy for Sb or Te of 45 kcalmol -1 to 110 kcalmol
At least one of the elements between -1 is Ag, Au, C
u, Ga, Al, Ge, Si, B, N, P, As, C
The optical recording medium according to claim 4, wherein the optical recording medium is selected from the group consisting of 1, F, Br, I, Ti, Se, S, H, Tb, and Gd.
間にある少なくとも一つの元素をX、Sb又はTeに対
する解離エネルギーが45kcalmol-1から110
kcalmol-1の間にある少なくとも一つの元素をY
とするとき、記録層材料の組成を表すSbαTeβXγ
Yδ、の式においてその組成(atm%)が、 55≦α≦80、20≦β≦35、0<γ<10、0<
δ≦10 (但しα+β+γ+δ=100)であることを特徴とす
る請求項4または5記載の光記録媒体。6. The method according to claim 1, wherein at least one element having a covalent bond radius of between 1.4 ° and 2.0 ° has a dissociation energy for X, Sb or Te of 45 kcalmol −1 to 110 kcal.
at least one element between kcalmol -1
SbαTeβXγ representing the composition of the recording layer material
In the formula of Yδ, the composition (atm%) is 55 ≦ α ≦ 80, 20 ≦ β ≦ 35, 0 <γ <10, 0 <
6. The optical recording medium according to claim 4, wherein δ ≦ 10 (where α + β + γ + δ = 100).
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2000275438A JP2002092938A (en) | 2000-09-11 | 2000-09-11 | Optical recording medium |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2000275438A JP2002092938A (en) | 2000-09-11 | 2000-09-11 | Optical recording medium |
Publications (1)
Publication Number | Publication Date |
---|---|
JP2002092938A true JP2002092938A (en) | 2002-03-29 |
Family
ID=18761059
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2000275438A Pending JP2002092938A (en) | 2000-09-11 | 2000-09-11 | Optical recording medium |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2002092938A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2004085168A1 (en) * | 2003-03-24 | 2004-10-07 | Mitsubishi Chemical Corporation | Phase variation recording material and information recording medium |
-
2000
- 2000-09-11 JP JP2000275438A patent/JP2002092938A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2004085168A1 (en) * | 2003-03-24 | 2004-10-07 | Mitsubishi Chemical Corporation | Phase variation recording material and information recording medium |
US7081289B2 (en) | 2003-03-24 | 2006-07-25 | Mitsubishi Kagaku Media Co., Ltd. | Phase-change recording material and information recording medium |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP3525197B2 (en) | Phase change optical recording medium | |
EP0919997A1 (en) | Phase-change optical recording medium | |
JPH01277338A (en) | optical recording medium | |
US5935672A (en) | Reversible optical information medium | |
JP2002092938A (en) | Optical recording medium | |
JP4093846B2 (en) | Phase change optical recording medium | |
JPH08249725A (en) | Optical information recording medium and material for heat resistant protective layer used in its production | |
JP2002133718A (en) | Optical recording medium | |
US7532555B2 (en) | Phase-change recording layer optical recording method | |
JP4070497B2 (en) | Optical recording medium, recording method and recording apparatus | |
JP2003335065A (en) | Optical recording medium | |
JP3885051B2 (en) | Phase change optical recording medium | |
JP2967949B2 (en) | Optical information recording medium | |
JP2000103168A (en) | Optical recording medium | |
JP3763563B2 (en) | Recording material for optical recording media | |
JP2001331970A (en) | Optical information recording medium | |
JP2004181742A (en) | Phase changing optical recording medium | |
JP2002002116A (en) | Optical information recording medium and manufacturing method therefor | |
JPH1170738A (en) | Optical recording medium | |
JPH11235873A (en) | Optical recording medium | |
JP2005161730A (en) | Phase change type optical recording medium | |
JPH0471895A (en) | Data recording medium | |
JP2005119194A (en) | Phase change-type optical recording medium | |
JP2006341470A (en) | Phase change type optical recording medium | |
JP2004249603A (en) | Phase transition type optical recording medium |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20041221 |
|
RD02 | Notification of acceptance of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7422 Effective date: 20041224 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20060417 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20060427 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20060626 |
|
A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20060724 |