JP2002091017A - Method for producing planographic printing plate - Google Patents
Method for producing planographic printing plateInfo
- Publication number
- JP2002091017A JP2002091017A JP2000279892A JP2000279892A JP2002091017A JP 2002091017 A JP2002091017 A JP 2002091017A JP 2000279892 A JP2000279892 A JP 2000279892A JP 2000279892 A JP2000279892 A JP 2000279892A JP 2002091017 A JP2002091017 A JP 2002091017A
- Authority
- JP
- Japan
- Prior art keywords
- printing plate
- acid
- developer
- group
- lithographic printing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000007639 printing Methods 0.000 title claims abstract description 78
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 13
- 239000000203 mixture Substances 0.000 claims abstract description 33
- 229910052782 aluminium Inorganic materials 0.000 claims abstract description 24
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims abstract description 24
- 150000001875 compounds Chemical class 0.000 claims abstract description 24
- 239000003513 alkali Substances 0.000 claims abstract description 19
- 239000002280 amphoteric surfactant Substances 0.000 claims abstract description 18
- 239000003795 chemical substances by application Substances 0.000 claims abstract description 17
- 239000002736 nonionic surfactant Substances 0.000 claims abstract description 9
- 239000003999 initiator Substances 0.000 claims abstract description 8
- 125000001033 ether group Chemical group 0.000 claims abstract description 7
- 229920005596 polymer binder Polymers 0.000 claims abstract description 7
- 239000002491 polymer binding agent Substances 0.000 claims abstract description 7
- 238000000034 method Methods 0.000 claims description 25
- 239000000758 substrate Substances 0.000 abstract description 3
- 230000002349 favourable effect Effects 0.000 abstract description 2
- 239000010410 layer Substances 0.000 description 41
- -1 amine compounds Chemical class 0.000 description 39
- 239000000243 solution Substances 0.000 description 27
- 230000018109 developmental process Effects 0.000 description 22
- 238000011282 treatment Methods 0.000 description 20
- 239000000975 dye Substances 0.000 description 16
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 15
- 229920001577 copolymer Polymers 0.000 description 13
- 239000011248 coating agent Substances 0.000 description 12
- 238000000576 coating method Methods 0.000 description 12
- FBPFZTCFMRRESA-FSIIMWSLSA-N D-Glucitol Natural products OC[C@H](O)[C@H](O)[C@@H](O)[C@H](O)CO FBPFZTCFMRRESA-FSIIMWSLSA-N 0.000 description 11
- FBPFZTCFMRRESA-JGWLITMVSA-N D-glucitol Chemical compound OC[C@H](O)[C@@H](O)[C@H](O)[C@H](O)CO FBPFZTCFMRRESA-JGWLITMVSA-N 0.000 description 11
- 239000002253 acid Substances 0.000 description 11
- 125000004432 carbon atom Chemical group C* 0.000 description 11
- 239000000600 sorbitol Substances 0.000 description 11
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 10
- 239000007864 aqueous solution Substances 0.000 description 10
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- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 9
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- 230000000694 effects Effects 0.000 description 9
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- 239000007788 liquid Substances 0.000 description 8
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- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 6
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 6
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- 229910052910 alkali metal silicate Inorganic materials 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 6
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- 238000007743 anodising Methods 0.000 description 5
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- 125000001424 substituent group Chemical group 0.000 description 5
- 238000012719 thermal polymerization Methods 0.000 description 5
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- 239000002699 waste material Substances 0.000 description 5
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- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical group CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 4
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 4
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 4
- 239000004372 Polyvinyl alcohol Substances 0.000 description 4
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 4
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 4
- 238000012644 addition polymerization Methods 0.000 description 4
- 125000001931 aliphatic group Chemical group 0.000 description 4
- SWXVUIWOUIDPGS-UHFFFAOYSA-N diacetone alcohol Chemical compound CC(=O)CC(C)(C)O SWXVUIWOUIDPGS-UHFFFAOYSA-N 0.000 description 4
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- 238000006116 polymerization reaction Methods 0.000 description 4
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- 239000011241 protective layer Substances 0.000 description 4
- 150000003254 radicals Chemical class 0.000 description 4
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 4
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 4
- AZQWKYJCGOJGHM-UHFFFAOYSA-N 1,4-benzoquinone Chemical compound O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 description 3
- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- WMFOQBRAJBCJND-UHFFFAOYSA-M Lithium hydroxide Chemical compound [Li+].[OH-] WMFOQBRAJBCJND-UHFFFAOYSA-M 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 235000010724 Wisteria floribunda Nutrition 0.000 description 3
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 3
- 239000000654 additive Substances 0.000 description 3
- 125000000217 alkyl group Chemical group 0.000 description 3
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 3
- 125000003277 amino group Chemical group 0.000 description 3
- 239000003945 anionic surfactant Substances 0.000 description 3
- 125000002029 aromatic hydrocarbon group Chemical group 0.000 description 3
- 150000001735 carboxylic acids Chemical class 0.000 description 3
- 239000003086 colorant Substances 0.000 description 3
- UAOMVDZJSHZZME-UHFFFAOYSA-N diisopropylamine Chemical compound CC(C)NC(C)C UAOMVDZJSHZZME-UHFFFAOYSA-N 0.000 description 3
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 3
- 238000007654 immersion Methods 0.000 description 3
- 239000003112 inhibitor Substances 0.000 description 3
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- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 3
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- 235000011121 sodium hydroxide Nutrition 0.000 description 3
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- VBICKXHEKHSIBG-UHFFFAOYSA-N 1-monostearoylglycerol Chemical compound CCCCCCCCCCCCCCCCCC(=O)OCC(O)CO VBICKXHEKHSIBG-UHFFFAOYSA-N 0.000 description 2
- INQDDHNZXOAFFD-UHFFFAOYSA-N 2-[2-(2-prop-2-enoyloxyethoxy)ethoxy]ethyl prop-2-enoate Chemical compound C=CC(=O)OCCOCCOCCOC(=O)C=C INQDDHNZXOAFFD-UHFFFAOYSA-N 0.000 description 2
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- KUDUQBURMYMBIJ-UHFFFAOYSA-N 2-prop-2-enoyloxyethyl prop-2-enoate Chemical compound C=CC(=O)OCCOC(=O)C=C KUDUQBURMYMBIJ-UHFFFAOYSA-N 0.000 description 2
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 2
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 2
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- CUNWUEBNSZSNRX-RKGWDQTMSA-N (2r,3r,4r,5s)-hexane-1,2,3,4,5,6-hexol;(z)-octadec-9-enoic acid Chemical compound OC[C@H](O)[C@@H](O)[C@H](O)[C@H](O)CO.OC[C@H](O)[C@@H](O)[C@H](O)[C@H](O)CO.CCCCCCCC\C=C/CCCCCCCC(O)=O.CCCCCCCC\C=C/CCCCCCCC(O)=O.CCCCCCCC\C=C/CCCCCCCC(O)=O CUNWUEBNSZSNRX-RKGWDQTMSA-N 0.000 description 1
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- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 150000003573 thiols Chemical class 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 1
- RKBCYCFRFCNLTO-UHFFFAOYSA-N triisopropylamine Chemical compound CC(C)N(C(C)C)C(C)C RKBCYCFRFCNLTO-UHFFFAOYSA-N 0.000 description 1
- 239000013638 trimer Substances 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- JOYRKODLDBILNP-UHFFFAOYSA-N urethane group Chemical group NC(=O)OCC JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 1
- 239000001018 xanthene dye Substances 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Landscapes
- Photosensitive Polymer And Photoresist Processing (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、平版印刷版の製版
方法に関するものである。より詳しくは、印刷汚れがな
く、かつ耐刷性の優れた印刷版の作製が可能であり、ま
た現像液の安全性、現像特性に対する経時的安定性およ
び廃液が環境へおよぼす影響を改善する平版印刷版の製
版方法に関する。さらに詳しくは、現像液の感光層成分
に対する分散性が高く、現像カスが低減可能な平版印刷
版の製版方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for making a lithographic printing plate. More specifically, a lithographic plate capable of producing a printing plate free from printing stains and having excellent printing durability, improving the safety of a developing solution, stability over time on developing characteristics, and improving the effect of a waste solution on the environment. The present invention relates to a printing plate making method. More specifically, the present invention relates to a method of making a lithographic printing plate having a high dispersibility of a developer in a photosensitive layer component and capable of reducing development scum.
【0002】[0002]
【従来の技術】従来より広く用いられているネガ型感光
性平版印刷版は、親水処理されたアルミニウム板上にジ
アゾ樹脂が設けられたものであったので、現像液には有
機溶剤を使用せざるを得ず、現像廃液の処理やその環境
への影響が懸念されている。またポジ型感光性平版印刷
版の感光層には、オルソキノンジアジド化合物がノボラ
ック樹脂と併用されており、現像液にはノボラック樹脂
を溶解可能なアルカリ性の珪酸塩水溶液が用いられてい
る。しかし、ノボラック樹脂を溶解可能なpHは13程
度で、このような高pH現像液は、皮膚や粘膜に付着し
た場合の刺激性が強く、取り扱いには十分な注意を必要
とした。2. Description of the Related Art Negative-working photosensitive lithographic printing plates, which have been widely used in the past, have a diazo resin provided on a hydrophilically treated aluminum plate. Inevitably, there is a concern about the treatment of the development waste liquid and its effect on the environment. In the photosensitive layer of the positive photosensitive lithographic printing plate, an orthoquinonediazide compound is used in combination with a novolak resin, and an alkaline silicate aqueous solution capable of dissolving the novolak resin is used as a developer. However, the pH at which the novolak resin can be dissolved is about 13, and such a high pH developer is highly irritating when it adheres to skin and mucous membranes, and requires sufficient care in handling.
【0003】一方、従来より、アルミニウム板支持体上
に光重合型感光性平版印刷版の感光層を有する平版印刷
版の現像液としては、アルカリ金属の珪酸塩、燐酸塩、
炭酸塩、水酸化物等、および有機アミン化合物等の水溶
液が提案されている。例えば、特開平8−248643
号公報では12以上の高pHで珪酸アルカリ塩と両性界
面活性剤を含む現像液が、特開平11−65129号公
報ではSiO 2/M2O(Mはアルカリ金属)が規定され
たpH12以下の珪酸アルカリ珪酸塩を含む現像液が開
示されている。前者は取り扱い上の問題の他に、画像部
が現像液の高pHのため現像によりダメージを受けやす
い等、後者は使用中の僅かな現像液のpH低下により、
珪酸塩がゲル化、不溶化してしまう問題があった。On the other hand, conventionally, on an aluminum plate support,
Printing with a photosensitive layer of a photopolymerizable photosensitive lithographic printing plate on the surface
Examples of the plate developer include alkali metal silicates, phosphates,
Aqueous solutions such as carbonates, hydroxides, and organic amine compounds
Liquids have been proposed. For example, Japanese Unexamined Patent Application Publication No.
In the official gazette, at a high pH of 12 or more, alkali silicate and amphoteric
A developer containing a surfactant is disclosed in JP-A-11-65129.
According to the report, SiO Two/ MTwoO (M is an alkali metal) is specified
Developer containing alkaline silicate with a pH of 12 or less
It is shown. The former is not only a matter of handling, but also
Is easily damaged by development due to the high pH of the developer
In the latter case, the pH of the developer slightly decreases during use,
There was a problem that the silicate gelled and became insoluble.
【0004】珪酸アルカリ塩を用いない現像液として
は、特開昭61−109052号公報に、アルカリ試
薬、錯化剤、アニオン界面活性剤、乳化剤、n−アルカ
ン酸等からなる現像液、西ドイツ特許第1984605
号にアルカリ剤、錯化剤、アニオン界面活性剤、アミル
アルコール、N−アルコキシアミン類を含んだ現像液が
開示されているが、高pHまたは有機溶剤含有のため、
画像部のダメージが大きく、十分な、耐刷等の印刷性能
を得るのに問題があった。比較的低pH(pH12以
下)で珪酸アルカリを含まない現像液としては、特開2
000−81711号公報にアニオン界面活性剤を含む
水酸化カリウム水溶液、特開平11−65126号公報
にpH8.5〜11.5のアルカリ金属の炭酸塩水溶液
が開示されている。Japanese Patent Application Laid-Open No. 61-109052 discloses a developer containing no alkali silicate, a developer comprising an alkali reagent, a complexing agent, an anionic surfactant, an emulsifier, an n-alkanoic acid, and the like. No. 1984605
No. 4,878,098 discloses a developer containing an alkali agent, a complexing agent, an anionic surfactant, amyl alcohol, and N-alkoxyamines.
There was a problem in that the image portion was greatly damaged and sufficient printing performance such as printing durability was obtained. As a developer having a relatively low pH (pH 12 or less) and containing no alkali silicate, JP-A-2
000-81711 discloses an aqueous potassium hydroxide solution containing an anionic surfactant, and JP-A-11-65126 discloses an aqueous alkali metal carbonate solution having a pH of 8.5 to 11.5.
【0005】このような比較的低pHでの現像の問題と
しては、基本的に光重合型感光層の溶解力が乏しいた
め、例えば、経時した版材で、十分に現像が進まないた
め残膜が生じる等の問題があった。これらの問題を解決
するためには、版材感光層中の高分子結合剤の酸価を高
くして現像性を稼ぐ、または酸基を有するモノマーの併
用等の工夫が必要であり、この様な高酸価バインダーを
使用した場合には、印刷の途中でインキが着かなくなる
問題(ブラインディング)等、印刷上の問題が発生しや
すかった。また、これらの現像液への感光層成分の溶解
力が小さいため、現像液中にこれらの成分がスラッジと
なって発生し槽中の洗浄等に時間がかかるなどの問題が
指摘され、現像カスの発生しない現像液の開発が望まれ
ていた。The problem of the development at a relatively low pH is that the photopolymerizable photosensitive layer basically has a low dissolving power. There were problems such as the occurrence of. In order to solve these problems, it is necessary to increase the acid value of the polymer binder in the plate photosensitive layer to increase developability, or to use a combination of monomers having an acid group. When a high acid value binder was used, printing problems such as a problem that ink did not adhere during printing (blinding) were likely to occur. Also, since the dissolving power of the components of the photosensitive layer in these developing solutions is small, it has been pointed out that such components are generated as sludge in the developing solution and it takes a long time to wash the tank. There has been a demand for the development of a developing solution which does not cause the generation of the developer.
【0006】[0006]
【発明が解決しようとする課題】従って、本発明の目的
は、上記従来における諸問題を解決することであり、す
なわち、環境、安全上好ましい比較的低pHのアルカリ
現像液を用い、安定的に、非画像部は良好な現像性を有
し、印刷での汚れがなく、かつ画像部に対して現像での
ダメージが少なく強固な画像強度が得られる平版印刷版
の製版方法を提供することにある。さらに詳しくは、現
像液の感光層成分に対する分散性が高く、現像カスが低
減可能な平版印刷版の製版方法を提供することにある。SUMMARY OF THE INVENTION Accordingly, an object of the present invention is to solve the above-mentioned conventional problems, that is, to use a relatively low pH alkaline developing solution which is preferable from the viewpoint of environment and safety, and to stably use the developing solution. In order to provide a method of making a lithographic printing plate, in which the non-image portion has good developability, is free from stains during printing, and has a strong image strength with little damage to the image portion during development. is there. More specifically, it is an object of the present invention to provide a method of making a lithographic printing plate in which a developer has a high dispersibility with respect to a photosensitive layer component and can reduce development scum.
【0007】[0007]
【課題を解決するための手段】本発明者は、上記の目的
を達成すべく、鋭意研究した結果、比較的pHが低いア
ルカリ水溶液に、特定の構造のノニオン系界面活性剤を
含有させ、現像液中の塩濃度を調整することで、光重合
型感光層の未露光部の溶解速度が上がり、逆に露光部の
光重合による架橋した部分は現像液の浸透が抑制される
ことを見出した。また現像液の感光層成分の溶解度もし
くは分散度が不足した場合に生じる現像カス低減に、両
性界面活性剤を現像液に添加することが有効であること
を見出し、本発明に到達した。Means for Solving the Problems The present inventors have conducted intensive studies in order to achieve the above-mentioned object, and as a result, a nonionic surfactant having a specific structure has been added to an aqueous alkaline solution having a relatively low pH, and developed. By adjusting the salt concentration in the solution, the dissolution rate of the unexposed portion of the photopolymerizable photosensitive layer was increased, and conversely, the crosslinked portion of the exposed portion by photopolymerization was found to suppress the penetration of the developer. . In addition, they have found that it is effective to add an amphoteric surfactant to a developer to reduce development residue generated when the solubility or dispersity of a photosensitive layer component in the developer is insufficient, and have reached the present invention.
【0008】すなわち、本発明は以下の通りである。 (1)アルミニウム支持体上に、エチレン性不飽和二重
結合を有する化合物と、光重合開始剤と、高分子結合剤
とを含有する光重合型感光性組成物からなる感光層を有
する感光性平版印刷版を、画像露光した後、(1)無機
のアルカリ剤と、(2)ポリオキシアルキレンエーテル
基を有するノニオン系界面活性剤と、(3)両性界面活
性剤とを含有する現像液で現像することを特徴とする平
版印刷版の製版方法。 (2)前記現像液がpH10.0〜12.5の範囲であ
り、かつ導電率3〜30mS/cmの範囲であることを
特徴とする前記(1)に記載の平版印刷版の製版方法。That is, the present invention is as follows. (1) Photosensitivity having a photosensitive layer comprising a photopolymerizable photosensitive composition containing a compound having an ethylenically unsaturated double bond, a photopolymerization initiator, and a polymer binder on an aluminum support After imagewise exposing the lithographic printing plate, a developing solution containing (1) an inorganic alkali agent, (2) a nonionic surfactant having a polyoxyalkylene ether group, and (3) an amphoteric surfactant is used. A method of making a lithographic printing plate, characterized by developing. (2) The method of making a lithographic printing plate as described in (1) above, wherein the developer has a pH of 10.0 to 12.5 and a conductivity of 3 to 30 mS / cm.
【0009】本発明の平版印刷版の製版方法によれば、
現像液の経時や繰り返しの使用による現像特性の低下が
抑えられると共に、非画像部に対し良好な現像性を有し
印刷での汚れがなく、かつ画像部に対して現像でのダメ
ージが少なく強固な画像強度が得られ、現像液の感光層
成分に対する分散性が高く、現像カスのフリー化または
低減を達成できる。さらに、本発明の平版印刷版の製版
方法により、印刷汚れがなく、かつ耐刷性の優れた平版
印刷版の作製が可能であり、また現像液のpHが比較的
低いため、安全上好ましく、現像液の廃液が環境へおよ
ぼす影響を改善することが可能である。According to the method of making a lithographic printing plate of the present invention,
Deterioration of the developing characteristics due to the aging or repeated use of the developer is suppressed, and good developability for non-image areas is obtained, there is no stain in printing, and image areas are less damaged in development and are strong. A high image strength is obtained, the dispersibility of the developer in the photosensitive layer components is high, and the development waste can be made free or reduced. Furthermore, according to the method of making a lithographic printing plate of the present invention, it is possible to produce a lithographic printing plate free from printing stains and excellent in printing durability, and the pH of a developer is relatively low, which is preferable for safety. It is possible to improve the effect of the waste liquid of the developer on the environment.
【0010】[0010]
【発明の実施の形態】以下本発明の平版印刷版の製版方
法について詳細に説明する。先ず、本発明の平版印刷版
の製版方法の特徴であり、本発明の製版方法に用いられ
るに新規な現像液について説明する。本発明の現像液は
少なくとも(1)無機のアルカリ剤と、(2)ポリオキ
シアルキレンエーテル基を有するノニオン系界面活性剤
と、(3)両性界面活性剤とを含有するアルカリ水溶液
である。BEST MODE FOR CARRYING OUT THE INVENTION The method of making a lithographic printing plate according to the present invention will be described in detail below. First, the features of the method for making a lithographic printing plate of the present invention will be described, and a novel developing solution used in the plate making method of the present invention will be described. The developer of the present invention is an aqueous alkaline solution containing at least (1) an inorganic alkali agent, (2) a nonionic surfactant having a polyoxyalkylene ether group, and (3) an amphoteric surfactant.
【0011】本発明の(1)無機のアルカリ剤として
は、例えば、第3リン酸ナトリウム、同カリウム、同ア
ンモニウム、炭酸ナトリウム、同カリウム、同アンモニ
ウム、炭酸水素ナトリウム、同カリウム、同アンモニウ
ム、硼酸ナトリウム、同カリウム、同アンモニウム、水
酸化ナトリウム、同カリウム、同アンモニウム、および
同リチウムなどが挙げられる。またアルカリ濃度の微少
な調整、感光層の溶解性の補助の目的で、補足的に有機
アルカリ剤を併用してもよい。有機アルカリ剤として
は、モノメチルアミン、ジメチルアミン、トリメチルア
ミン、モノエチルアミン、ジエチルアミン、トリエチル
アミン、モノイソプロピルアミン、ジイソプロピルアミ
ン、トリイソプロピルアミン、n−ブチルアミン、モノ
エタノールアミン、ジエタノールアミン、トリエタノー
ルアミン、モノイソプロパノールアミン、ジイソプロパ
ノールアミン、エチレンイミン、エチレンジアミン、ピ
リジン、テトラメチルアンモニウムヒドロキシドなどを
挙げることができる。The (1) inorganic alkali agent of the present invention includes, for example, sodium phosphate, potassium, ammonium, sodium carbonate, potassium, ammonium, sodium hydrogencarbonate, potassium, ammonium, boric acid Sodium, potassium, ammonium, sodium hydroxide, potassium, ammonium, lithium and the like. Further, an organic alkali agent may be supplementarily used for the purpose of finely adjusting the alkali concentration and assisting the solubility of the photosensitive layer. Examples of the organic alkali agent include monomethylamine, dimethylamine, trimethylamine, monoethylamine, diethylamine, triethylamine, monoisopropylamine, diisopropylamine, triisopropylamine, n-butylamine, monoethanolamine, diethanolamine, triethanolamine, monoisopropanolamine, Examples thereof include diisopropanolamine, ethyleneimine, ethylenediamine, pyridine, and tetramethylammonium hydroxide.
【0012】これらのアルカリ剤は単独もしくは2種以
上を組み合わせて用いられる。アルカリ剤の量として
は、現像液のpHが9〜13.5の範囲、導電率が2〜
40mS/cmの範囲になるように使用され、好ましい
範囲としてはpH10.0〜12.5、導電率3〜30
mS/cmの範囲、更に好ましくは5〜20mS/cm
の範囲である。現像液のpHが前記範囲を下回ると、画
像形成ができなくなり、上回ると過現像になったり、露
光部の現像でのダメージが強くなる。導電率が前記範囲
を下回ると、通常、アルミニウム板支持体表面の感光性
組成物の溶出が困難となり、印刷で汚れをともなってし
まう。また前期範囲を上回ると、塩濃度が高いため、感
光層の溶出速度が極端に遅くなり、未露光部に残膜が生
じる。These alkali agents are used alone or in combination of two or more. As the amount of the alkali agent, the pH of the developer is in the range of 9 to 13.5, and the conductivity is 2 to 2.
It is used so as to be in a range of 40 mS / cm, and preferable ranges are pH 10.0 to 12.5 and conductivity 3 to 30.
mS / cm range, more preferably 5-20 mS / cm
Range. If the pH of the developing solution falls below the above range, image formation becomes impossible, and if the pH exceeds the above range, over-development occurs or damage in the development of the exposed portion increases. When the electric conductivity is lower than the above range, the elution of the photosensitive composition on the surface of the aluminum plate support is usually difficult, and the printing is contaminated. If the concentration exceeds the above range, the salt concentration is high, so that the elution rate of the photosensitive layer becomes extremely slow, and a residual film is formed in an unexposed portion.
【0013】また本発明の現像液には、(2)ポリオキ
シアルキレンエーテル基を有するノニオン界面活性剤を
含有することが必須であり、この界面活性剤添加によ
り、未露光部の感光層の溶解促進、露光部への現像液の
浸透性の低減が可能となった。ポリオキシアルキレンエ
ーテル基を含有する界面活性剤としては、下記一般式
(I)の構造を有する物が好適に使用される。It is essential that the developer of the present invention contains (2) a nonionic surfactant having a polyoxyalkylene ether group, and the addition of the surfactant dissolves the unexposed portion of the photosensitive layer. This makes it possible to reduce the permeability of the developer to the exposed portion. As the surfactant containing a polyoxyalkylene ether group, those having the structure of the following general formula (I) are preferably used.
【0014】R1−O−(R2−O)nH (I)R 1 -O- (R 2 -O) n H (I)
【0015】(I)式中、R1は置換基を有しても良い
炭素数3〜15のアルキル基、置換基を有しても良い炭
素数6〜15の芳香族炭化水素基、または置換基を有し
ても良い炭素数4〜15の複素芳香族環基(該置換基と
しては炭素数1〜20のアルキル基、Br、Cl、I等
のハロゲン原子、炭素数6〜15の芳香族炭化水素基、
炭素数7〜17のアラルキル基、炭素数1〜20のアル
コキシ基、炭素数2〜20のアルコキシ−カルボニル
基、炭素数2〜15のアシル基が挙げられる。)を示
し、R2は置換基を有しても良い炭素数1〜100のア
ルキレン基(該置換基としては、炭素数1〜20のアル
キル基、炭素数6〜15の芳香族炭化水素基が挙げられ
る)を示し、nは1〜100の整数を表す。In the formula (I), R 1 represents an alkyl group having 3 to 15 carbon atoms which may have a substituent, an aromatic hydrocarbon group having 6 to 15 carbon atoms which may have a substituent, or A heteroaromatic ring group having 4 to 15 carbon atoms which may have a substituent (an alkyl group having 1 to 20 carbon atoms, a halogen atom such as Br, Cl, I, etc .; Aromatic hydrocarbon group,
Examples thereof include an aralkyl group having 7 to 17 carbon atoms, an alkoxy group having 1 to 20 carbon atoms, an alkoxy-carbonyl group having 2 to 20 carbon atoms, and an acyl group having 2 to 15 carbon atoms. And R 2 is an alkylene group having 1 to 100 carbon atoms which may have a substituent (as the substituent, an alkyl group having 1 to 20 carbon atoms, an aromatic hydrocarbon group having 6 to 15 carbon atoms) And n represents an integer of 1 to 100.
【0016】また(I)式の(R2−O)nの部分は、上
記範囲であれば、2種、または3種の基であっても良
い。具体的にはエチレンオキシ基とプロピレンオキシ
基、エチレンオキシ基とイソプロピルオキシ基、エチレ
ンオキシ基とブチレンオキシ基、エチレンオキシ基とイ
ソブチレン基等の組み合わせのランダムまたはブロック
状に連なったものが挙げられる。本発明において、ポリ
オキシアルキレンエーテル基を有する界面活性剤は、単
独または複合系で使用され、現像液中、1〜30重量
%、好ましくは2〜20重量%添加することが効果的で
ある。添加量が少ないと現像性の低下が、逆に多すぎる
と現像のダメージが強くなり、印刷版の耐刷性を低下さ
せてしまう。The (R 2 —O) n part of the formula (I) may be two or three groups within the above range. Specific examples include a random or block-like combination of an ethyleneoxy group and a propyleneoxy group, a combination of an ethyleneoxy group and an isopropyloxy group, a combination of an ethyleneoxy group and a butyleneoxy group, and a combination of an ethyleneoxy group and an isobutylene group. In the present invention, the surfactant having a polyoxyalkylene ether group is used alone or in a complex system, and it is effective to add 1 to 30% by weight, preferably 2 to 20% by weight in a developer. If the addition amount is small, the developing property is reduced, while if it is too large, the damage of development is increased, and the printing durability of the printing plate is reduced.
【0017】本発明の現像液成分、(3)両性界面活性
剤は、現像液中の感光層成分の分散性を向上させること
により、カスの発生を抑制する効果がある。特に感光層
の成分として、チタノセン光重合開始剤を用いた場合に
は、この成分が現像液中で析出し、カスを生じ易く、そ
の抑制に大きな効果を発揮する。両性界面活性剤として
は、ベタイン型両性界面活性剤、グリシン型両性界面活
性剤、アラニン型両性界面活性剤、スルホベタイン型両
性界面活性剤のいずれを用いてもよく、また2種以上を
組み合わせて用いることもできる。ベタイン型両性界面
活性剤は一般的に下記式(II)で示される構造を分子中
に有している。The developer component of the present invention, (3) an amphoteric surfactant, has the effect of suppressing the generation of scum by improving the dispersibility of the photosensitive layer component in the developer. In particular, when a titanocene photopolymerization initiator is used as a component of the photosensitive layer, this component precipitates in the developer, easily forms scum, and exerts a great effect in suppressing such scum. As the amphoteric surfactant, any of a betaine-type amphoteric surfactant, a glycine-type amphoteric surfactant, an alanine-type amphoteric surfactant, and a sulfobetaine-type amphoteric surfactant may be used, or two or more kinds may be used in combination. It can also be used. Betaine-type amphoteric surfactants generally have a structure represented by the following formula (II) in the molecule.
【0018】[0018]
【化1】 Embedded image
【0019】具体例としては、下記のものが挙げられ
る。The following are specific examples.
【0020】[0020]
【化2】 Embedded image
【0021】グリシン型両性界面活性剤は一般的に下記
式(III)で示される構造を分子中に有している。The glycine-type amphoteric surfactant generally has a structure represented by the following formula (III) in the molecule.
【0022】−NH-CH2-COOH (III)--NH--CH 2 --COOH (III)
【0023】具体的には、例えば下記のような一般的に
TEGOと呼ばれる1群の両性石鹸が挙げられる。Specifically, for example, a group of amphoteric soaps generally referred to as TEGO as described below can be mentioned.
【0024】[0024]
【化3】 Embedded image
【0025】アラニン型両性界面活性剤は一般的に下記
式(IV)で示される構造を分子中に有しており、アルキ
ルアミンとアクリル酸エステルの付加反応物を加水分解
して生成したアルキルアラニンもしくはその塩が一般的
である。The alanine-type amphoteric surfactant generally has a structure represented by the following formula (IV) in the molecule, and is formed by hydrolysis of an addition reaction product of an alkylamine and an acrylate. Or its salt is common.
【0026】−NH−CH2-CH2-COOH (I
V)--NH--CH 2 --CH 2 --COOH (I
V)
【0027】これらの両性界面活性剤の中で最も好まし
く用いられるのはアラニン型両性界面活性剤の1群であ
り、具体例としては、N−オクトデシル−β−アラニン
(ナトリウム塩)、N−ミスチリル−β−アラニン(ナ
トリウム塩)、ラウリルアミノプロピオン酸(ナトリウ
ム塩)、リポミンLA(ライオン(株)製)が挙げられ
る。Among these amphoteric surfactants, the most preferably used is a group of alanine-type amphoteric surfactants, and specific examples thereof include N-octodecyl-β-alanine (sodium salt) and N-mystyryl. -Β-alanine (sodium salt), laurylaminopropionic acid (sodium salt), and lipomin LA (manufactured by Lion Corporation).
【0028】本発明において、両性界面活性剤は現像液
中、0.2〜10重量%、好ましくは0.5〜5重量%
添加することが効果的である。上記範囲より少ないと、
現像カスの抑制効果が小さく、多いと発泡性等の問題が
発生する。In the present invention, the amphoteric surfactant is contained in the developer in an amount of 0.2 to 10% by weight, preferably 0.5 to 5% by weight.
It is effective to add. If less than the above range,
If the effect of suppressing development scum is small and too large, problems such as foaming properties occur.
【0029】またさらに以下に記す、その他の界面活性
剤を加えてもよい。その他の界面活性剤としては、例え
ば、ポリオキシエチレンラウリルエーテル、ポリオキシ
エチレンセチルエーテル、ポリオキシエチレンステアリ
ルエーテル等のポリオキシエチレンアルキルエーテル
類、ポリオキシエチレンオクチルフェニルエーテル、ポ
リオキシエチレンノニルフェニルエーテル等のポリオキ
シエチレンアルキルアリルエーテル類、ポリオキシエチ
レンステアレート等のポリオキシエチレンアルキルエス
テル類、ソルビタンモノラウレート、ソルビタンモノス
テアレート、ソルビタンジステアレート、ソルビタンモ
ノオレエート、ソルビタンセスキオレエート、ソルビタ
ントリオレエート等のソルビタンアルキルエステル類、
グリセロールモノステアレート、グリセロールモノオレ
ート等のモノグリセリドアルキルエステル類等のノニオ
ン界面活性剤:ドデシルベンゼンスルホン酸ナトリウム
等のアルキルベンゼンスルホン酸塩類、ブチルナフタレ
ンスルホン酸ナトリウム、ペンチルナフタレンスルホン
酸ナトリウム、ヘキシルナフタレンスルホン酸ナトリウ
ム、オクチルナフタレンスルホン酸ナトリウム等のアル
キルナフタレンスルホン酸塩類、ラウリル硫酸ナトリウ
ム等のアルキル硫酸塩類、ドデシルスルホン酸ソーダ等
のアルキルスルホン酸塩類、ジラウリルスルホコハク酸
ナトリウム等のスルホコハク酸エステル塩類等のアニオ
ン界面活性剤が使用可能である。これら界面活性剤は単
独、もしくは組み合わせて使用することが出来る。ま
た、これら界面活性剤の現像液中における含有量は有効
成分換算で0.1〜20重量%が好ましい。Further, other surfactants described below may be added. As other surfactants, for example, polyoxyethylene alkyl ethers such as polyoxyethylene lauryl ether, polyoxyethylene cetyl ether, polyoxyethylene stearyl ether, polyoxyethylene octyl phenyl ether, polyoxyethylene nonyl phenyl ether and the like Polyoxyethylene alkyl allyl ethers, polyoxyethylene alkyl esters such as polyoxyethylene stearate, sorbitan monolaurate, sorbitan monostearate, sorbitan distearate, sorbitan monooleate, sorbitan sesquioleate, sorbitan triole Sorbitan alkyl esters such as ate,
Nonionic surfactants such as monoglyceride alkyl esters such as glycerol monostearate and glycerol monooleate: alkylbenzene sulfonates such as sodium dodecylbenzenesulfonate, sodium butylnaphthalenesulfonate, sodium pentylnaphthalenesulfonate, sodium hexylnaphthalenesulfonate Anionic surface activity such as alkyl naphthalene sulfonates such as sodium octyl naphthalene sulfonate, alkyl sulfates such as sodium lauryl sulfate, alkyl sulfonates such as sodium dodecyl sulfonate, sulfosuccinate salts such as sodium dilauryl sulfosuccinate; Agents can be used. These surfactants can be used alone or in combination. Further, the content of these surfactants in the developer is preferably 0.1 to 20% by weight in terms of active ingredient.
【0030】本発明の現像液には上記の成分の他に、必
要に応じて以下の様な成分を併用することができる。例
えば安息香酸、フタル酸、p−エチル安息香酸、p−n
−プロピル安息香酸、p−イソプロピル安息香酸、p−
n−ブチル安息香酸、p−t−ブチル安息香酸、p−t
−ブチル安息香酸、p−2−ヒドロキシエチル安息香
酸、デカン酸、サリチル酸、3−ヒドロキシ−2−ナフ
トエ酸等の有機カルボン酸;イソプロピルアルコール、
ヘンジルアルコール、エチルセロソルブ、ブチルセロソ
ルブ、フェニルセロソルブ、プロピレングリコール、ジ
アセトンアルコール等の有機溶剤;この他、キレート
剤、還元剤、染料、顔料、硬水軟化剤、防腐剤、消泡剤
等が挙げられる。In the developer of the present invention, the following components may be used in combination with the above components, if necessary. For example, benzoic acid, phthalic acid, p-ethylbenzoic acid, pn
-Propylbenzoic acid, p-isopropylbenzoic acid, p-
n-butylbenzoic acid, pt-butylbenzoic acid, pt
Organic carboxylic acids such as -butylbenzoic acid, p-2-hydroxyethylbenzoic acid, decanoic acid, salicylic acid, 3-hydroxy-2-naphthoic acid; isopropyl alcohol;
Organic solvents such as henzyl alcohol, ethyl cellosolve, butyl cellosolve, phenyl cellosolve, propylene glycol, diacetone alcohol; and other examples include chelating agents, reducing agents, dyes, pigments, water softeners, preservatives, and defoamers. .
【0031】次に、本発明に用いる感光性平版印刷版に
ついて説明する。本発明に用いる感光性平版印刷版の感
光層を構成する光重合型感光性組成物は、付加重合可能
なエチレン性不飽和化合物、光開始剤、高分子結合剤を
必須成分とし、必要に応じ、着色剤、可塑剤、熱重合禁
止剤等の種々の化合物を併用することができる。Next, the photosensitive lithographic printing plate used in the present invention will be described. The photopolymerizable photosensitive composition constituting the photosensitive layer of the photosensitive lithographic printing plate used in the present invention contains, as essential components, an ethylenically unsaturated compound capable of addition polymerization, a photoinitiator, and a polymer binder. Various compounds such as a colorant, a plasticizer, and a thermal polymerization inhibitor can be used in combination.
【0032】エチレン性不飽和化合物とは、光重合型感
光性組成物が活性光線の照射を受けた時、光重合開始剤
の作用により付加重合し、架橋、硬化するようなエチレ
ン性不飽和結合を有する化合物である。付加重合可能な
エチレン性二重結合を含む化合物は、末端エチレン性不
飽和結合を少なくとも1個、好ましくは2個以上有する
化合物の中から任意に選択することができる。例えばモ
ノマー、プレポリマー、すなわち2量体、3量体および
オリゴマー、またはそれらの混合物ならびにそれらの共
重合体などの化学的形態をもつものである。An ethylenically unsaturated compound is an ethylenically unsaturated bond which undergoes addition polymerization by the action of a photopolymerization initiator and causes crosslinking and curing when the photopolymerizable photosensitive composition is irradiated with actinic rays. Is a compound having The compound containing an addition-polymerizable ethylenic double bond can be arbitrarily selected from compounds having at least one, and preferably two or more, terminal ethylenically unsaturated bonds. For example, those having chemical forms such as monomers, prepolymers, that is, dimers, trimers and oligomers, or mixtures thereof and copolymers thereof.
【0033】モノマーおよびその共重合体の例として
は、不飽和カルボン酸(例えば、アクリル酸、メタクリ
ル酸、イタコン酸、クロトン酸、イソクロトン酸、マレ
イン酸など)と脂肪族多価アルコール化合物とのエステ
ル、不飽和カルボン酸と脂肪族多価アミン化合物とのア
ミド等があげられる。脂肪族多価アルコール化合物と不
飽和カルボン酸とのエステルのモノマーの具体例として
は、アクリル酸エステルとして、エチレングリコールジ
アクリレート、トリエチレングリコールジアクリレー
ト、1,3−ブタンジオールジアクリレート、テトラメ
チレングリコールジアクリレート、プロピレングリコー
ルジアクリレート、ネオペンチルグリコールジアクリレ
ート、トリメチロールプロパントリアクリレート、トリ
メチロールプロパントリ(アクリロイルオキシプロピ
ル)エーテル、トリメチロールエタントリアクリレー
ト、ヘキサンジオールジアクリレート、1,4−シクロ
ヘキサンジオールジアクリレート、テトラエチレングリ
コールジアクリレート、ペンタエリスリトールジアクリ
レート、ペンタエリスリトールトリアクリレート、ペン
タエリスリトールテトラアクリレート、ジペンタエリス
リトールジアクリレート、ジペンタエリスリトールペン
タアクリレート、ジペンタエリスリトールヘキサアクリ
レート、ソルビトールトリアクリレート、ソルビトール
テトラアクリレート、ソルビトールペンタアクリレー
ト、ソルビトールヘキサアクリレート、トリ(アクリロ
イルオキシエチル)イソシアヌレート、ポリエステルア
クリレートオリゴマー等がある。Examples of monomers and copolymers thereof include esters of unsaturated carboxylic acids (eg, acrylic acid, methacrylic acid, itaconic acid, crotonic acid, isocrotonic acid, maleic acid, etc.) with aliphatic polyhydric alcohol compounds. And amides of unsaturated carboxylic acids and aliphatic polyamine compounds. Specific examples of the ester monomer of the aliphatic polyhydric alcohol compound and the unsaturated carboxylic acid include acrylic acid esters such as ethylene glycol diacrylate, triethylene glycol diacrylate, 1,3-butanediol diacrylate, and tetramethylene glycol. Diacrylate, propylene glycol diacrylate, neopentyl glycol diacrylate, trimethylolpropane triacrylate, trimethylolpropane tri (acryloyloxypropyl) ether, trimethylolethane triacrylate, hexanediol diacrylate, 1,4-cyclohexanediol diacrylate , Tetraethylene glycol diacrylate, pentaerythritol diacrylate, pentaerythritol triacrylate Pentaerythritol tetraacrylate, dipentaerythritol diacrylate, dipentaerythritol pentaacrylate, dipentaerythritol hexaacrylate, sorbitol triacrylate, sorbitol tetraacrylate, sorbitol pentaacrylate, sorbitol hexaacrylate, tri (acryloyloxyethyl) isocyanurate, polyester There are acrylate oligomers and the like.
【0034】メタクリル酸エステルとしては、テトラメ
チレングリコールジメタクリレート、トリエチレングリ
コールジメタクリレート、ネオペンチルグリコールジメ
タクリレート、トリメチロールプロパントリメタクリレ
ート、トリメチロールエタントリメタクリレート、エチ
レングリコールジメタクリレート、1,3−ブタンジオ
ールジメタクリレート、ヘキサンジオールジメタクリレ
ート、ペンタエリスリトールジメタクリレート、ペンタ
エリスリトールトリメタクリレート、ペンタエリスリト
ールテトラメタクリレート、ジペンタエリスリトールジ
メタクリレート、ジペンタエリスリトールヘキサメタク
リレート、ジペンタエリスリトールペンタメタアクリレ
ート、ソルビトールトリメタクリレート、ソルビトール
テトラメタクリレート、ビス〔p−(3−メタクリルオ
キシ−2−ヒドロキシプロポキシ)フェニル〕ジメチル
メタン、ビス−〔p−(メタクリルオキシエトキシ)フ
ェニル〕ジメチルメタン等がある。Examples of the methacrylate include tetramethylene glycol dimethacrylate, triethylene glycol dimethacrylate, neopentyl glycol dimethacrylate, trimethylolpropane trimethacrylate, trimethylolethane trimethacrylate, ethylene glycol dimethacrylate, and 1,3-butanediol. Dimethacrylate, hexanediol dimethacrylate, pentaerythritol dimethacrylate, pentaerythritol trimethacrylate, pentaerythritol tetramethacrylate, dipentaerythritol dimethacrylate, dipentaerythritol hexamethacrylate, dipentaerythritol pentamethacrylate, sorbitol trimethacrylate, sorbitol tetramethacrylate , Bis [p- (3--methacryloxy-2-hydroxypropoxy) phenyl] dimethyl methane, bis - [p- (methacryloxyethoxy) phenyl] dimethyl methane.
【0035】イタコン酸エステルとしては、エチレング
リコールジイタコネート、プロピレングリコールジイタ
コネート、1,3−ブタンジオールジイタコネート、
1,4−ブタンジオールジイタコネート、テトラメチレ
ングリコールジイタコネート、ペンタエリスリトールジ
イタコネート、ソルビトールテトライタコネート等があ
る。クロトン酸エステルとしては、エチレングリコール
ジクロトネート、テトラメチレングリコールジクロトネ
ート、ペンタエリスリトールジクロトネート、ソルビト
ールテトラジクロトネート等がある。Examples of itaconic acid esters include ethylene glycol diitaconate, propylene glycol diitaconate, 1,3-butanediol diitaconate,
There are 1,4-butanediol diitaconate, tetramethylene glycol diitaconate, pentaerythritol diitaconate, sorbitol tetritaconate and the like. The crotonic acid ester includes ethylene glycol dicrotonate, tetramethylene glycol dicrotonate, pentaerythritol dicrotonate, sorbitol tetradicrotonate and the like.
【0036】イソクロトン酸エステルとしては、エチレ
ングリコールジイソクロトネート、ペンタエリスリトー
ルジイソクロトネート、ソルビトールテトライソクロト
ネート等がある。マレイン酸エステルとしては、エチレ
ングリコールジマレート、トリエチレングリコールジマ
レート、ペンタエリスリトールジマレート、ソルビトー
ルテトラマレート等がある。さらに、前述のエステルモ
ノマーの混合物もあげることができる。また、脂肪族多
価アミン化合物と不飽和カルボン酸とのアミドのモノマ
ーの具体例としては、メチレンビス−アクリルアミド、
メチレンビス−メタクリルアミド、1,6−ヘキサメチ
レンビス−アクリルアミド、1,6−ヘキサメチレンビ
ス−メタクリルアミド、ジエチレントリアミントリスア
クリルアミド、キシリレンビスアクリルアミド、キシリ
レンビスメタクリルアミド等がある。Examples of the isocrotonic acid ester include ethylene glycol diisocrotonate, pentaerythritol diisocrotonate, and sorbitol tetraisocrotonate. The maleic acid ester includes ethylene glycol dimaleate, triethylene glycol dimaleate, pentaerythritol dimaleate, sorbitol tetramaleate and the like. Furthermore, a mixture of the above-mentioned ester monomers can also be mentioned. Specific examples of the amide monomer of the aliphatic polyamine compound and the unsaturated carboxylic acid include methylene bis-acrylamide,
Examples include methylenebis-methacrylamide, 1,6-hexamethylenebis-acrylamide, 1,6-hexamethylenebis-methacrylamide, diethylenetriaminetrisacrylamide, xylylenebisacrylamide, and xylylenebismethacrylamide.
【0037】その他の例としては、特公昭48−417
08号公報中に記載されている1分子中に2個以上のイ
ソシアネート基を有するポリイソシアネート化合物に、
下記の一般式(A)で示される水酸基を含有するビニル
モノマーを付加せしめた1分子中に2個以上の重合性ビ
ニル基を含有するビニルウレタン化合物等があげられ
る。 CH2=C(R5)COOCH2CH(R6)OH (A) (ただし、R5およびR6はHあるいはCH3を示す。)As another example, see JP-B-48-417.
08 polyisocyanate compound having two or more isocyanate groups in one molecule described in
A vinyl urethane compound containing two or more polymerizable vinyl groups in one molecule to which a hydroxyl group-containing vinyl monomer represented by the following general formula (A) is added is exemplified. CH 2 CC (R 5 ) COOCH 2 CH (R 6 ) OH (A) (where R 5 and R 6 represent H or CH 3 )
【0038】また、特開昭51−37193号、特公平
2−32293号に記載されているようなウレタンアク
リレート類、特開昭48−64183号、特公昭49−
43191号、特公昭52−30490号各公報に記載
されているようなポリエステルアクリレート類、エポキ
シ樹脂と(メタ)アクリル酸を反応させたエポキシアク
リレート類等の多官能のアクリレートやメタクリレート
をあげることができる。さらに日本接着協会誌Vol.2
0、No.7、300〜308ぺージ(1984年)に光
硬化性モノマーおよびオリゴマーとして紹介されている
ものも使用することができる。なお、これらエチレン性
不飽和化合物の使用量は、感光層全成分の5〜80重量
%、好ましくは30〜70重量%の範囲で使用される。Urethane acrylates described in JP-A-51-37193 and JP-B-2-32293; JP-A-48-64183;
And polyfunctional acrylates and methacrylates such as polyester acrylates and epoxy acrylates obtained by reacting an epoxy resin with (meth) acrylic acid as described in JP-A-43191 and JP-B-52-30490. . In addition, Journal of the Japan Adhesion Association, Vol. 2
0, No. 7, 300-308 (1984) as photocurable monomers and oligomers can also be used. These ethylenically unsaturated compounds are used in an amount of 5 to 80% by weight, preferably 30 to 70% by weight, based on all components of the photosensitive layer.
【0039】また本発明の感光性平版印刷版の感光層に
含有させる光重合開始剤としては、使用する光源の波長
により、特許、文献等で公知である種々の光開始剤、あ
るいは2種以上の光開始剤の併用系(光開始系)を適宜
選択して用いることができる。以下に具体例を列挙する
がこれらに制限されるものではない。400nm以上の
可視光線、Arレーザー、半導体レーザーの第2高調
波、SHG−YAGレーザーを光源とする場合にも、種
々の光開始系が提案されており、例えば、米国特許第
2,850,445号に記載のある種の光還元性染料、
例えばローズベンガル、エオシン、エリスロシンなど、
あるいは、染料と開始剤との組み合わせによる系、例え
ば、染料とアミンの複合開始系(特公昭44−2018
9号)、ヘキサアリールビイミダゾールとラジカル発生
剤と染料との併用系(特公昭45−37377号)、ヘ
キサアリールビイミダゾールとp−ジアルキルアミノベ
ンジリデンケトンの系(特公昭47−2528号、特開
昭54−155292号)、環状シス−α−ジカルボニ
ル化合物と染料の系(特開昭48−84183号)、環
状トリアジンとメロシアニン色素の系(特開昭54−1
51024号)、3−ケトクマリンと活性剤の系(特開
昭52−112681号、特開昭58−15503
号)、ビイミダゾール、スチレン誘導体、チオールの系
(特開昭59−140203号)、有機過酸化物と色素
の系(特開昭59−1504号、特開昭59−1402
03号、特開昭59−189340号、特開昭62−1
74203号、特公昭62−1641号、米国特許第4
766055号)、染料と活性ハロゲン化合物の系(特
開昭63−258903号、特開平2−63054号な
ど)染料とボレート化合物の系(特開昭62−1430
44号、特開昭62−150242号、特開昭64−1
3140号、特開昭64−13141号、特開昭64−
13142号、特開昭64−13143号、特開昭64
−13144号、特開昭64−17048号、特開平1
−229003号、特開平1−298348号、特開平
1−138204号など)ローダニン環を有する色素と
ラジカル発生剤の系(特開平2−179643号、特開
平2−244050号)、チタノセンと3−ケトクマリ
ン色素の系(特開昭63−221110号)、チタノセ
ンとキサンテン色素さらにアミノ基あるいはウレタン基
を含む付加重合可能なエチレン性不飽和化合物を組み合
わせた系(特開平4−221958号、特開平4−21
9756号)、チタノセンと特定のメロシアニン色素の
系(特開平6−295061号)、チタノセンとベンゾ
ピラン環を有する色素の系(特開平8−334897
号)等をあげることができる。As the photopolymerization initiator to be contained in the photosensitive layer of the photosensitive lithographic printing plate of the present invention, various photoinitiators known in patents and literatures, or two or more photoinitiators may be used depending on the wavelength of the light source used. The photoinitiator combination system (photoinitiation system) can be appropriately selected and used. Specific examples are listed below, but the present invention is not limited thereto. Various light-initiating systems have also been proposed when using visible light of 400 nm or more, an Ar laser, the second harmonic of a semiconductor laser, or an SHG-YAG laser as a light source. For example, US Pat. No. 2,850,445. Certain photoreducing dyes described in
For example, Rose Bengal, Eosin, Erythrosin, etc.
Alternatively, a system based on a combination of a dye and an initiator, for example, a complex initiation system of a dye and an amine (JP-B-44-2018)
No. 9), a combination system of hexaarylbiimidazole, a radical generator and a dye (Japanese Patent Publication No. 45-37377), and a system of hexaarylbiimidazole and p-dialkylaminobenzylidene ketone (Japanese Patent Publication No. 47-2528; 54-155292), a system of a cyclic cis-α-dicarbonyl compound and a dye (JP-A-48-84183), a system of a cyclic triazine and a merocyanine dye (JP-A-54-1).
No. 51024), a system of 3-ketocoumarin and an activator (JP-A-52-112681, JP-A-58-15503).
No.), a system of biimidazole, a styrene derivative, and a thiol (JP-A-59-140203), and a system of an organic peroxide and a dye (JP-A-59-1504, JP-A-59-1402).
03, JP-A-59-189340, JP-A-62-1
No. 74203, JP-B-62-1641, U.S. Pat.
No. 766055), a system of a dye and an active halogen compound (JP-A-63-258903, JP-A-2-63054, etc.) A system of a dye and a borate compound (JP-A-62-1430)
No. 44, JP-A-62-150242, JP-A-64-1
No. 3140, JP-A-64-13141, JP-A-64-141
No. 13142, JP-A-64-13143, JP-A-64
-13144, JP-A-64-17048, JP-A-1
JP-A-229003, JP-A-1-298348, JP-A-1-138204, etc.) A system of a dye having a rhodanine ring and a radical generator (JP-A-2-179643, JP-A-2-244050), titanocene and 3- Ketocoumarin dye systems (JP-A-63-221110), systems combining titanocene and xanthene dyes and addition-polymerizable ethylenically unsaturated compounds containing an amino group or a urethane group (JP-A-4-221958, JP-A-4-221958) -21
No. 9756), a system of titanocene and a specific merocyanine dye (JP-A-6-295061), and a system of titanocene and a dye having a benzopyran ring (JP-A-8-334897).
No.) and the like.
【0040】また、最近400〜410nmの波長のレ
ーザー(バイオレットレーザー)が開発され、それに感
応する450nm以下の波長に高感度を示す光開始系が
開発されており、これらの光開始系も使用される。例え
ば、カチオン色素/ボレート系(特開平11−8464
7)、メロシアニン色素/チタノセン系(特開2000
−147763)、カルバゾール型色素/チタノセン系
(特願平11−221480)等を挙げることができ
る。本発明においては特にチタノセン化合物を用いた系
が、感度の点で優れており好ましい。Recently, a laser (violet laser) having a wavelength of 400 to 410 nm has been developed, and a photoinitiating system exhibiting high sensitivity to a wavelength of 450 nm or less corresponding thereto has been developed, and these photoinitiating systems are also used. You. For example, a cationic dye / borate system (JP-A-11-8864)
7), merocyanine dye / titanocene system (JP-A-2000
-147763), carbazole type dye / titanocene (Japanese Patent Application No. 11-22480), and the like. In the present invention, a system using a titanocene compound is particularly preferable because of its excellent sensitivity.
【0041】チタノセン化合物としては、種々のものを
用いることができるが、例えば、特開昭59−1523
96号、特開昭61−151197号各公報に記載され
ている各種チタノセン化合物から適宜選んで用いること
ができる。さらに具体的には、ジ−シクロペンタジエニ
ル−Ti−ジ−クロライド、ジ−シクロペンタジエニル
−Ti−ビス−フェニル、ジ−シクロペンタジエニル−
Ti−ビス−2,3,4,5,6−ペンタフルオロフェ
ニ−1−イル、ジ−シクロペンタジエニル−Ti−ビス
−2,3,5,6−テトラフルオロフェニ−1−イル、
ジ−シクロペンタジエニル−Ti−ビス−2,4,6−
トリフルオロフェニ−1−イル、ジ−シクロペンタジエ
ニル−Ti−ビス−2,6−ジ−フルオロフェニ−1−
イル、ジ−シクロペンタジエニル−Ti−ビス−2,4
−ジ−フルオロフェニ−1−イル、ジ−メチルシクロペ
ンタジエニル−Ti−ビス−2,3,4,5,6−テト
ラフルオロフェニ−1−イル、ジ−メチルシクロペンタ
ジエニル−Ti−ビス−2,6−ジフルオロフェニ−1
−イル、ジ−シクロペンタジエニル−Ti−ビス−2,
6−ジフルオロ−3−(ピル−1−イル)−フェニ−1
−イル等を挙げることができる。As the titanocene compound, various compounds can be used. For example, JP-A-59-1523
No. 96, and various titanocene compounds described in JP-A-61-151197 can be appropriately selected and used. More specifically, di-cyclopentadienyl-Ti-di-chloride, di-cyclopentadienyl-Ti-bis-phenyl, di-cyclopentadienyl-
Ti-bis-2,3,4,5,6-pentafluorophenyl-1-yl, di-cyclopentadienyl-Ti-bis-2,3,5,6-tetrafluorophenyl-1-yl,
Di-cyclopentadienyl-Ti-bis-2,4,6-
Trifluorophenyl-1-yl, di-cyclopentadienyl-Ti-bis-2,6-di-fluorophenyl-1-
Yl, di-cyclopentadienyl-Ti-bis-2,4
-Di-fluorophenyl-1-yl, di-methylcyclopentadienyl-Ti-bis-2,3,4,5,6-tetrafluorophenyl-1-yl, di-methylcyclopentadienyl-Ti- Bis-2,6-difluorophenyl-1
-Yl, di-cyclopentadienyl-Ti-bis-2,
6-difluoro-3- (pyr-1-yl) -phenyl-1
-Yl and the like.
【0042】更に上記光開始剤に必要に応じ、2−メル
カプトベンズチアゾール、2−メルカプトベンズイミダ
ゾール、2−メルカプトベンズオキサゾール等のチオー
ル化合物、N−フェニルグリシン、N,N−ジアルキル
アミノ芳香族アルキルエステル等のアミン化合物等の水
素供与性化合物を加えることにより更に光開始能力が高
められることが知られている。これらの光重合開始剤
(系)の使用量はエチレン性不飽和化合物100重量部
に対し、0.05〜100重量部、好ましくは0.1〜
70重量部、更に好ましくは0.2〜50重量部の範囲
で用いられる。If necessary, the photoinitiator may be a thiol compound such as 2-mercaptobenzthiazole, 2-mercaptobenzimidazole or 2-mercaptobenzoxazole, N-phenylglycine, or N, N-dialkylamino aromatic alkyl ester. It is known that the photoinitiating ability can be further enhanced by adding a hydrogen-donating compound such as an amine compound. The amount of the photopolymerization initiator (system) used is 0.05 to 100 parts by weight, preferably 0.1 to 100 parts by weight, based on 100 parts by weight of the ethylenically unsaturated compound.
It is used in an amount of 70 parts by weight, more preferably 0.2 to 50 parts by weight.
【0043】本発明の感光性平版印刷版の感光層に用い
られる高分子結合剤としては、該組成物の皮膜形成剤と
してだけでなく、アルカリ現像液に溶解する必要がある
ため、アルカリ水に可溶性または膨潤性である有機高分
子重合体が使用される。該有機高分子重合体は、例え
ば、水可溶性有機高分子重合体を用いると水現像が可能
になる。この様な有機高分子重合体としては、側鎖にカ
ルボン酸基を有する付加重合体、例えば特開昭59−4
4615号、特公昭54−34327号、特公昭58−
12577号、特公昭54−25957号、特開昭54
−92723号、特開昭59−53836号、特開昭5
9−71048号に記載されているもの、すなわち、メ
タクリル酸共重合体、アクリル酸共重合体、イタコン酸
共重合体、クロトン酸共重合体、マレイン酸共重合体、
部分エステル化マレイン酸共重合体等がある。The polymer binder used in the photosensitive layer of the photosensitive lithographic printing plate of the present invention is not only a film-forming agent of the composition, but also needs to be dissolved in an alkali developing solution. Organic polymers that are soluble or swellable are used. As the organic polymer, for example, when a water-soluble organic polymer is used, water development becomes possible. Examples of such organic high-molecular polymers include addition polymers having a carboxylic acid group in a side chain, for example, JP-A-59-4
4615, JP-B-54-34327, JP-B-58-
12577, JP-B-54-25957, JP-A-54
-92723, JP-A-59-53836 and JP-A-5-53836.
No. 9-71048, namely, methacrylic acid copolymer, acrylic acid copolymer, itaconic acid copolymer, crotonic acid copolymer, maleic acid copolymer,
There are partially esterified maleic acid copolymers and the like.
【0044】また同様に側鎖にカルボン酸基を有する酸
性セルロース誘導体がある。この外に水酸基を有する付
加重合体に環状酸無水物を付加させたものなどが有用で
ある。特にこれらの中で〔ベンジル(メタ)アクリレー
ト/(メタ)アクリル酸/必要に応じてその他の付加重
合性ビニルモノマー〕共重合体及び〔アリル(メタ)ア
クリレート(メタ)アクリル酸/必要に応じてその他の
付加重合性ビニルモノマー〕共重合体が好適である。こ
の他に水溶性有機高分子として、ポリビニルピロリドン
やポリエチレンオキサイド等が有用である。また硬化皮
膜の強度を上げるためにアルコール可溶性ポリアミドや
2,2−ビス−(4−ヒドロキシフェニル)−プロパン
とエピクロロヒドリンのポリエーテル等も有用である。
また特公平7−120040号、特公平7−12004
1号、特公平7−120042号、特公平8−1242
4号、特開昭63−287944号、特開昭63−28
7947号、特開平1−271741号、特開平11−
352691に記載のポリウレタン樹脂も本発明の用途
には有用である。Similarly, there are acidic cellulose derivatives having a carboxylic acid group in the side chain. In addition, those obtained by adding a cyclic acid anhydride to an addition polymer having a hydroxyl group are useful. In particular, among these, [benzyl (meth) acrylate / (meth) acrylic acid / optionally other addition-polymerizable vinyl monomers] copolymer and [allyl (meth) acrylate (meth) acrylic acid / optionally Other addition-polymerizable vinyl monomers] copolymers are preferred. In addition, polyvinyl pyrrolidone and polyethylene oxide are useful as the water-soluble organic polymer. In order to increase the strength of the cured film, alcohol-soluble polyamides and polyethers of 2,2-bis- (4-hydroxyphenyl) -propane and epichlorohydrin are also useful.
In addition, Japanese Patent Publication No. 7-120040, Japanese Patent Publication No. 7-12004
No. 1, Tokiko 7-120042, Tokiko 8-1242
4, JP-A-63-287944, JP-A-63-28944
No. 7947, JP-A-1-271741, JP-A-11-
The polyurethane resin described in 352691 is also useful for the use of the present invention.
【0045】これら高分子重合体は側鎖にラジカル反応
性基を導入することにより硬化皮膜の強度を向上させる
ことができる。付加重合反応し得る官能基としてエチレ
ン性不飽和結合基、アミノ基、エポキシ基等が、又光照
射によりラジカルになり得る官能基としてはメルカプト
基、チオール基、ハロゲン原子、トリアジン構造、オニ
ウム塩構造等が、又極性基としてカルボキシル基、イミ
ド基等が挙げられる。上記付加重合反応し得る官能基と
しては、アクリル基、メタクリル基、アリル基、スチリ
ル基などエチレン性不飽和結合基が特に好ましいが、又
アミノ基、ヒドロキシ基、ホスホン酸基、燐酸基、カル
バモイル基、イソシアネート基、ウレイド基、ウレイレ
ン基、スルフォン酸基、アンモニオ基から選ばれる官能
基も有用である。These high polymers can improve the strength of the cured film by introducing a radical reactive group into the side chain. Functional groups capable of undergoing an addition polymerization reaction include an ethylenically unsaturated bond group, an amino group, an epoxy group, and the like, and functional groups capable of forming a radical upon irradiation with light include a mercapto group, a thiol group, a halogen atom, a triazine structure, and an onium salt structure. And a polar group such as a carboxyl group or an imide group. As the functional group capable of undergoing the addition polymerization reaction, an ethylenically unsaturated bond group such as an acryl group, a methacryl group, an allyl group, and a styryl group is particularly preferable, and an amino group, a hydroxy group, a phosphonic group, a phosphate group, and a carbamoyl group are also preferable. And a functional group selected from an isocyanate group, a ureido group, a ureylene group, a sulfonic acid group, and an ammonium group are also useful.
【0046】組成物の現像性を維持するためには、本発
明の高分子結合剤は適当な分子量、酸価を有することが
好ましく、重量平均分子量で5000〜30万、酸価2
0〜200の高分子重合体が有効に使用される。これら
の有機高分子重合体は全組成中に任意な量を混和させる
ことができる。しかし90重量%を超える場合には形成
される画像強度等の点で好ましい結果を与えない。好ま
しくは10〜90%、より好ましくは30〜80%であ
る。また光重合可能なエチレン性不飽和化合物と有機高
分子重合体は、重量比で1/9〜9/1の範囲とするの
が好ましい。より好ましい範囲は2/8〜8/2てあ
り、更に好ましくは3/7〜7/3である。In order to maintain the developability of the composition, the polymer binder of the present invention preferably has an appropriate molecular weight and acid value, and has a weight average molecular weight of 5,000 to 300,000 and an acid value of 2,000.
A high polymer of 0 to 200 is effectively used. These organic high-molecular polymers can be mixed in an arbitrary amount in the entire composition. However, if it exceeds 90% by weight, no favorable result is obtained in view of the strength of the formed image and the like. Preferably it is 10-90%, more preferably 30-80%. Further, the weight ratio of the photopolymerizable ethylenically unsaturated compound and the organic polymer is preferably in the range of 1/9 to 9/1. A more preferred range is 2/8 to 8/2, and a still more preferred range is 3/7 to 7/3.
【0047】また、本発明においては以上の基本成分の
他に感光性組成物の製造中あるいは保存中において重合
可能なエチレン性不飽和化合物の不要な熱重合を阻止す
るために少量の熱重合禁止剤を添加することが望まし
い。適当な熱重合禁止剤としてはハロイドキノン、p−
メトキシフェノール、ジ−t−ブチル−p−クレゾー
ル、ピロガロール、t−ブチルカテコール、ベンゾキノ
ン、4,4′−チオビス(3−メチル−6−t−ブチル
フェノール)、2,2′−メチレンビス(4−メチル−
6−t−ブチルフェノール)、N−ニトロソフェニルヒ
ドロキシルアミン第一セリウム塩、N−ニトロソフェニ
ルヒドロキシルアミンアルミニウム塩等があげられる。
熱重合禁止剤の添加量は、全組成物の重量に対して約
0.01%〜約5%が好ましい。また必要に応じて、酸
素による重合阻害を防止するためにベヘン酸やベヘン酸
アミドのような高級脂肪酸誘導体等を添加して、塗布後
の乾燥の過程で感光層の表面に偏在させてもよい。高級
脂肪酸誘導体の添加量は、全組成物の約0.5%〜約1
0%が好ましい。In the present invention, in addition to the above basic components, a small amount of thermal polymerization is prohibited in order to prevent unnecessary thermal polymerization of a polymerizable ethylenically unsaturated compound during the production or storage of the photosensitive composition. It is desirable to add an agent. Suitable thermal polymerization inhibitors include haloid quinone, p-
Methoxyphenol, di-t-butyl-p-cresol, pyrogallol, t-butylcatechol, benzoquinone, 4,4'-thiobis (3-methyl-6-t-butylphenol), 2,2'-methylenebis (4-methyl −
6-t-butylphenol), cerium N-nitrosophenylhydroxylamine, aluminum aluminum N-nitrosophenylhydroxylamine and the like.
The addition amount of the thermal polymerization inhibitor is preferably from about 0.01% to about 5% based on the weight of the whole composition. If necessary, a higher fatty acid derivative such as behenic acid or behenic acid amide may be added to prevent polymerization inhibition by oxygen, and may be unevenly distributed on the surface of the photosensitive layer in a drying process after coating. . The amount of the higher fatty acid derivative added is about 0.5% to about 1% of the total composition.
0% is preferred.
【0048】更に感光層の着色を目的として、着色剤を
添加してもよい。着色剤としては、例えば、フタロシア
ニン系顔料(C.I.Pigment Blue 1
5:3、15:4、15:6など)、アゾ系顔料、カー
ボンブラック、酸化チタンなどの顔料、エチルバイオレ
ット、クリスタルバイオレット、アゾ染料、アントラキ
ノン系染料、シアニン系染料がある。染料および顔料の
添加量は全組成物の約0.5%〜約20%が好ましい。
加えて、硬化皮膜の物性を改良するために、無機充填剤
やジオクチルフタレート、ジメチルフタレート、トリク
レジルホスフェート等の可塑剤等の添加剤を加えてもよ
い。これらの添加量は全組成物の10%以下が好まし
い。Further, a coloring agent may be added for the purpose of coloring the photosensitive layer. Examples of the colorant include phthalocyanine pigments (CI Pigment Blue 1).
5: 3, 15: 4, 15: 6), azo pigments, pigments such as carbon black and titanium oxide, ethyl violet, crystal violet, azo dyes, anthraquinone dyes, and cyanine dyes. The amount of dye and pigment added is preferably about 0.5% to about 20% of the total composition.
In addition, additives such as inorganic fillers and plasticizers such as dioctyl phthalate, dimethyl phthalate and tricresyl phosphate may be added to improve the physical properties of the cured film. The amount of these additives is preferably 10% or less of the total composition.
【0049】本発明の感光性平版印刷版の感光層組成物
を後述の支持体上に塗布する際には種々の有機溶剤に溶
かして使用に供される。ここで使用する溶媒としては、
アセトン、メチルエチルケトン、シクロヘキサン、酢酸
エチル、エチレンジクロライド、テトラヒドロフラン、
トルエン、エチレングリコールモノメチルエーテル、エ
チレングリコールモノエチルエーテル、エチレングリコ
ールジメチルエーテル、プロピレングリコールモノメチ
ルエーテル、プロピレングリコールモノエチルエーテ
ル、アセチルアセトン、シクロヘキサノン、ジアセトン
アルコール、エチレングリコールモノメチルエーテルア
セテート、エチレングリコールエチルエーテルアセテー
ト、エチレングリコールモノイソプロピルエーテル、エ
チレングリコールモノブチルエーテルアセテート、3−
メトキシプロパノール、メトキシメトキシエタノール、
ジエチレングリコールモノメチルエーテル、ジエチレン
グリコールモノエチルエーテル、ジエチレングリコール
ジメチルエーテル、ジエチレングリコールジエチルエー
テル、プロピレングリコールモノメチルエーテルアセテ
ート、プロピレングリコールモノエチルエーテルアセテ
ート−3−メトキシプロピルアセテート、N,N−ジメ
チルホルムアミド、ジメチルスルホキシド、γ−ブチロ
ラクトン、乳酸メチル、乳酸エチルなどがある。これら
の溶媒は、単独あるいは混合して使用することができ
る。そして、塗布溶液中の固形分の濃度は1〜50重量
%が適当である。When the photosensitive layer composition of the photosensitive lithographic printing plate of the present invention is coated on a support described below, it is used after dissolving it in various organic solvents. As the solvent used here,
Acetone, methyl ethyl ketone, cyclohexane, ethyl acetate, ethylene dichloride, tetrahydrofuran,
Toluene, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol dimethyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, acetylacetone, cyclohexanone, diacetone alcohol, ethylene glycol monomethyl ether acetate, ethylene glycol ethyl ether acetate, ethylene glycol Monoisopropyl ether, ethylene glycol monobutyl ether acetate, 3-
Methoxypropanol, methoxymethoxyethanol,
Diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol dimethyl ether, diethylene glycol diethyl ether, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate-3-methoxypropyl acetate, N, N-dimethylformamide, dimethyl sulfoxide, γ-butyrolactone, lactic acid Examples include methyl and ethyl lactate. These solvents can be used alone or as a mixture. The concentration of the solid content in the coating solution is suitably from 1 to 50% by weight.
【0050】本発明の感光性平版印刷版の感光層におけ
る光重合性組成物には、塗布面質を向上するために界面
活性剤を添加することができる。その被覆量は乾燥後の
重量で約0.1g/m2〜約10g/m2の範囲が適当で
ある。より好ましくは0.3〜5g/m2である。更に
好ましくは0.5〜3g/m2である。A surfactant can be added to the photopolymerizable composition in the photosensitive layer of the photosensitive lithographic printing plate of the present invention in order to improve the coated surface quality. The coating amount is suitably ranges from about 0.1 g / m 2 ~ about 10 g / m 2 in weight after drying. More preferably, it is 0.3 to 5 g / m 2 . More preferably, it is 0.5 to 3 g / m 2 .
【0051】また、通常、前記感光層の上には、酸素の
重合禁止作用を防止するために酸素遮断性の保護層が設
けられる。酸素遮断性保護層に含まれる水溶性ビニル重
合体としては、ポリビニルアルコール、およびその部分
エステル、エーテル、およびアセタール、またはそれら
に必要な水溶性を有せしめるような実質的量の未置換ビ
ニルアルコール単位を含有するその共重合体があげられ
る。ポリビニルアルコールとしては、71〜100%加
水分解され、重合度が300〜2400の範囲のものが
あげられる。具体的には株式会社クラレ製PVA−10
5、PVA−110、PVA−117、PVA−117
H、PVA−120、PVA−124、PVA−124
H、PVA−CS、PVA−CST、PVA−HC、P
VA−203、PVA−204、PVA−205、PV
A−210、PVA−217、PVA−220、PVA
−224、PVA−217EE、PVA−220、PV
A−224、PVA−217EE、PVA−217E、
PVA−220E、PVA−224E、PVA−40
5、PVA−420、PVA−613、L−8等があげ
られる。上記の共重合体としては、88〜100%加水
分解されたポリビニルアセテートクロロアセテートまた
はプロピオネート、ポリビニルホルマールおよびポリビ
ニルアセタールおよびそれらの共重合体があげられる。
その他有用な重合体としてはポリビニルピロリドン、ゼ
ラチンおよびアラビアゴムがあげられ、これらは単独ま
たは、併用して用いても良い。Usually, an oxygen-blocking protective layer is provided on the photosensitive layer in order to prevent the polymerization of oxygen. Examples of the water-soluble vinyl polymer contained in the oxygen-barrier protective layer include polyvinyl alcohol, and its partial esters, ethers, and acetal, or a substantial amount of an unsubstituted vinyl alcohol unit having water solubility required for them. And copolymers thereof. Examples of the polyvinyl alcohol include those having a hydrolysis degree of 71 to 100% and a polymerization degree in the range of 300 to 2400. Specifically, Kuraray's PVA-10
5, PVA-110, PVA-117, PVA-117
H, PVA-120, PVA-124, PVA-124
H, PVA-CS, PVA-CST, PVA-HC, P
VA-203, PVA-204, PVA-205, PV
A-210, PVA-217, PVA-220, PVA
-224, PVA-217EE, PVA-220, PV
A-224, PVA-217EE, PVA-217E,
PVA-220E, PVA-224E, PVA-40
5, PVA-420, PVA-613, L-8 and the like. Examples of the copolymer include 88-100% hydrolyzed polyvinyl acetate chloroacetate or propionate, polyvinyl formal and polyvinyl acetal, and copolymers thereof.
Other useful polymers include polyvinylpyrrolidone, gelatin and gum arabic, which may be used alone or in combination.
【0052】本発明の感光性平版印刷版において酸素遮
断性保護層を塗布する際用いる溶媒としては、純水が好
ましいが、メタノール、エタノールなどのアルコール
類、アセトン、メチルエチルケトンなどのケトン類を純
水と混合しても良い。そして塗布溶液中の固形分の濃度
は1〜20重量%が適当である。本発明の上記酸素遮断
性保護層にはさらに塗布性を向上させるための界面活性
剤、皮膜の物性を改良するための水溶性の可塑剤等の公
知の添加剤を加えても良い。水溶性の可塑剤としては、
たとえばプロピオンアミド、シクロヘキサンジオール、
グリセリン、ソルビトール等がある。また、水溶性の
(メタ)アクリル系ポリマーなどを添加しても良い。そ
の被服量は乾燥後の重量で約0.1g/m2〜約15g
/m2の範囲が適当である。より好ましくは1.0g/
m2〜約5.0g/m2である。In the photosensitive lithographic printing plate of the present invention, the solvent used for coating the oxygen-barrier protective layer is preferably pure water, but alcohols such as methanol and ethanol, and ketones such as acetone and methyl ethyl ketone can be purified with pure water. May be mixed. The concentration of the solid content in the coating solution is suitably from 1 to 20% by weight. Known additives such as a surfactant for improving coating properties and a water-soluble plasticizer for improving physical properties of the film may be added to the oxygen-barrier protective layer of the present invention. As a water-soluble plasticizer,
For example, propionamide, cyclohexanediol,
Glycerin, sorbitol and the like. Further, a water-soluble (meth) acrylic polymer or the like may be added. The amount of the coating is about 0.1 g / m 2 to about 15 g in weight after drying.
/ M 2 is appropriate. More preferably, 1.0 g /
m 2 to about 5.0 g / m 2 .
【0053】次に、本発明の感光性平版印刷版の支持体
について説明する。本発明にて用いられるアルミニウム
支持体は、寸度的に安定なアルミニウムまたはその合金
(例えば珪素、銅、マンガン、マグネシウム、クロム、
亜鉛、鉛、ビスマス、ニッケルとの合金)、またはアル
ミニウム、アルミニウム合金がラミネートもしくは蒸着
されたプラスチックフィルムまたは紙を意味し、通常そ
の厚さは0.05mm〜1mm程度である。また特開昭
48−18327号に記載の複合シートも使用すること
ができる。Next, the support of the photosensitive lithographic printing plate of the present invention will be described. The aluminum support used in the present invention is a dimensionally stable aluminum or an alloy thereof (eg, silicon, copper, manganese, magnesium, chromium,
Alloy with zinc, lead, bismuth, nickel), or a plastic film or paper on which aluminum or an aluminum alloy is laminated or vapor-deposited, and usually has a thickness of about 0.05 mm to 1 mm. Also, a composite sheet described in JP-A-48-18327 can be used.
【0054】本発明のアルミ支持体は適宜、後述の基板
表面処理が施される。 (砂目立て処理)砂目立て処理方法は、特開昭56−2
8893号に開示されているような機械的砂目立て、化
学的エッチング、電解グレインなどがある。さらに塩酸
または硝酸電解液中で電気化学的に砂目立てする電気化
学的砂目立て方法、及びアルミニウム表面を金属ワイヤ
ーでひっかくワイヤーブラシグレイン法、研磨球と研磨
剤でアルミニウム表面を砂目立てするボールグレイン
法、ナイロンブラシと研磨剤で表面を砂目立てするブラ
シグレイン法のような機械的砂目立て法を用いることが
でき、上記砂目立て方法を単独あるいは組み合わせて用
いることもできる。その中でも本発明に有用に使用され
る表面粗さを作る方法は、塩酸または硝酸電解液中で化
学的に砂目たてする電気化学的方法であり、適する電流
密度は100C/dm2〜400C/dm2の範囲であ
る。さらに具体的には、0.1〜50%の塩酸または硝
酸を含む電解液中、温度20〜100℃、時間1秒〜3
0分、電流密度100C/dm2〜400C/dm2の条
件で電解を行うことが好ましい。The aluminum support of the present invention is appropriately subjected to a substrate surface treatment described later. (Graining treatment) Japanese Patent Application Laid-Open No. Sho 56-2
No. 8893, such as mechanical graining, chemical etching, and electrolytic graining. Furthermore, an electrochemical graining method in which the aluminum surface is electrochemically grained in a hydrochloric acid or nitric acid electrolyte, a wire brush graining method in which the aluminum surface is scratched with a metal wire, and a ball graining method in which the aluminum surface is grained with a polishing ball and an abrasive. Alternatively, a mechanical graining method such as a brush grain method for graining the surface with a nylon brush and an abrasive can be used, and the above graining methods can be used alone or in combination. Among them, a method of producing a surface roughness usefully used in the present invention is an electrochemical method of chemically sanding in a hydrochloric acid or nitric acid electrolyte, and a suitable current density is 100 C / dm 2 to 400 C. / Dm 2 . More specifically, in an electrolyte containing 0.1 to 50% hydrochloric acid or nitric acid, the temperature is 20 to 100 ° C., and the time is 1 second to 3 hours.
0 minutes, it is preferable to perform the electrolysis at a current density of 100C / dm 2 ~400C / dm 2 .
【0055】このように砂目立て処理したアルミニウム
支持体は、酸またはアルカリにより化学的にエッチング
される。酸をエッチング剤として用いる場合は、微細構
造を破壊するのに時間がかかり、工業的に本発明を適用
するに際しては不利であるが、アルカリをエッチング剤
として用いることにより改善できる。本発明において好
適に用いられるアルカリ剤は、苛性ソーダ、炭酸ソー
ダ、アルミン酸ソーダ、メタケイ酸ソーダ、リン酸ソー
ダ、水酸化カリウム、水酸化リチウム等を用い、濃度と
温度の好ましい範囲はそれぞれ1〜50%、20〜10
0℃であり、Alの溶解量が5〜20g/m3となるよ
うな条件が好ましい。The aluminum support thus grained is chemically etched with an acid or an alkali. When an acid is used as an etching agent, it takes time to destroy a fine structure, which is disadvantageous in industrially applying the present invention. However, it can be improved by using an alkali as an etching agent. Alkali agents suitably used in the present invention include caustic soda, sodium carbonate, sodium aluminate, sodium metasilicate, sodium phosphate, potassium hydroxide, lithium hydroxide, and the like. The preferred ranges of concentration and temperature are 1 to 50, respectively. %, 20 to 10
It is preferable that the temperature is 0 ° C. and the amount of Al dissolved is 5 to 20 g / m 3 .
【0056】エッチングのあと表面に残留する汚れ(ス
マット)を除去するために酸洗いが行われる。用いられ
る酸は硝酸、硫酸、リン酸、クロム酸、フッ酸、ホウフ
ッ化水素酸等が用いられる。特に電気化学的粗面化処理
後のスマット除去処理方法としては、好ましくは特開昭
53−12739号公報に記載されているような50〜
90℃の温度の15〜65重量%の硫酸と接触させる方
法及び特公昭48−28123号公報に記載されている
アルカリエッチングする方法が挙げられる。なお、本発
明で有効に用いられるAl支持体の表面粗さ(Ra)は
0.3〜0.7μmである。After the etching, pickling is performed to remove dirt (smut) remaining on the surface. As the acid used, nitric acid, sulfuric acid, phosphoric acid, chromic acid, hydrofluoric acid, borofluoric acid and the like are used. In particular, as a method for removing the smut after the electrochemical surface-roughening treatment, it is preferable to use a method of removing 50 to 50 as described in JP-A-53-12739.
A method of contacting with sulfuric acid of 15 to 65% by weight at a temperature of 90 ° C. and a method of alkali etching described in Japanese Patent Publication No. 48-28123 are exemplified. The surface roughness (Ra) of the Al support effectively used in the present invention is 0.3 to 0.7 μm.
【0057】(陽極酸化処理)以上のようにして処理さ
れたアルミニウム支持体は、さらに陽極酸化処理が施さ
れる。陽極酸化処理はこの分野で従来より行われている
方法で行うことができる。具体的には、硫酸、リン酸、
クロム酸、シュウ酸、スルファミン酸、ベンゼンスルフ
ォン酸等あるいはこれらの二種以上を組み合わせて水溶
液または非水溶液中でアルミニウムに直流または交流を
流すとアルミニウム支持体表面に陽極酸化皮膜を形成す
ることができる。陽極酸化処理の条件は使用される電解
液によって種々変化するので一概に決定され得ないが、
一般的には電解液の濃度が1〜80%、液温5〜70
℃、電流密度0.5〜60アンペア/dm2、電圧1〜
100V、電解時間10〜100秒の範囲が適当であ
る。(Anodic Oxidation Treatment) The aluminum support thus treated is further subjected to an anodic oxidation treatment. The anodizing treatment can be performed by a method conventionally performed in this field. Specifically, sulfuric acid, phosphoric acid,
Chromic acid, oxalic acid, sulfamic acid, benzenesulfonic acid or the like or a combination of two or more of them can form an anodized film on the surface of an aluminum support by flowing a direct current or an alternating current to aluminum in an aqueous solution or a non-aqueous solution. . Since the conditions of the anodizing treatment vary depending on the electrolytic solution used, they cannot be unconditionally determined,
Generally, the concentration of the electrolyte is 1 to 80%, and the temperature of the electrolyte is 5 to 70%.
° C, current density 0.5-60 amps / dm 2 , voltage 1 ~
A range of 100 V and an electrolysis time of 10 to 100 seconds is appropriate.
【0058】これらの陽極酸化処理のうちでも特に英国
特許第1,412,768号明細書に記載されている、
硫酸中で高電流密度で陽極酸化する方法及び米国特許第
3,511,661号明細書に記載されているリン酸を
電解浴として陽極酸化する方法が好ましい。本発明にお
いては、陽極酸化皮膜は1〜10g/m2であることが
好ましく、1g/m2以下であると版に傷が入りやす
く、10g/m2以上は製造に多大な電力が必要とな
り、経済的に不利である。好ましくは、1.5〜7g/
m2である。更に好ましくは、2〜5g/m2である。Among these anodizing treatments, those described in GB 1,412,768 are particularly useful.
The method of anodizing at a high current density in sulfuric acid and the method of anodizing phosphoric acid as an electrolytic bath described in US Pat. No. 3,511,661 are preferred. In the present invention, the anodized film is preferably from 1~10g / m 2, 1g / m 2 plate to easily enter the wound is not more than, 10 g / m 2 or more is great power is required for the production Is economically disadvantageous. Preferably, 1.5 to 7 g /
m 2 . More preferably, it is 2 to 5 g / m 2 .
【0059】更に、本発明においては、砂目立て処理及
び陽極酸化後、アルミニウム支持体に封孔処理を施して
もかまわない。かかる封孔処理は、熱水及び無機塩また
は有機塩を含む熱水溶液への基板の浸漬ならびに水蒸気
浴などによって行われる。また本発明のアルミニウム支
持体にはアルカリ金属珪酸塩によるシリケート処理以外
の処理、たとえば弗化ジルコニウム酸カリウム、燐酸塩
等の水溶液への浸漬処理などの表面処理がなされてもか
まわない。Further, in the present invention, after the graining treatment and the anodic oxidation, the aluminum support may be subjected to a sealing treatment. Such a sealing treatment is performed by immersing the substrate in hot water and a hot aqueous solution containing an inorganic salt or an organic salt, a steam bath, or the like. The aluminum support of the present invention may be subjected to a surface treatment such as a treatment other than silicate treatment with an alkali metal silicate, for example, immersion treatment in an aqueous solution of potassium fluorozirconate, phosphate or the like.
【0060】上記の如く表面処理を施されたアルミニウ
ム支持体上に、前記の光重合性組成物からなる感光層を
形成することで、本発明の感光性平版印刷版を作製する
が、感光層を塗設する前に必要に応じて有機または無機
の下塗り層が設けられてもかまわない。The photosensitive lithographic printing plate of the present invention is produced by forming a photosensitive layer comprising the above-mentioned photopolymerizable composition on the aluminum support having been subjected to the surface treatment as described above. Before coating, an organic or inorganic undercoat layer may be provided as necessary.
【0061】本発明の感光性平版印刷版における前記感
光層を、例えば、カーボンアーク灯、高圧水銀灯、キセ
ノンランプ、メタルハライドランプ、蛍光ランプ、タン
グステンランプ、ハロゲンランプ、ヘリウムカドミニウ
ムレーザー、アルゴンイオンレーザー、FD・YAGレ
ーザー、ヘリウムネオンレーザー、半導体レーザー(3
50nm〜600nm)等の従来公知の活性光線で画像
露光した後、現像処理することにより、アルミニウム板
支持体表面に画像を形成することができる。画像露光
後、現像までの間に、光重合型感光層の硬化率を高める
目的で50℃〜150℃の温度で1秒、5分の時間の加
熱プロセスを設けることを行っても良い。The photosensitive layer in the photosensitive lithographic printing plate of the present invention may be formed, for example, by using a carbon arc lamp, a high-pressure mercury lamp, a xenon lamp, a metal halide lamp, a fluorescent lamp, a tungsten lamp, a halogen lamp, a helium cadmium laser, an argon ion laser, or an FD.・ YAG laser, helium neon laser, semiconductor laser (3
An image can be formed on the surface of the aluminum plate support by performing image development with a conventionally known actinic ray (e.g., 50 nm to 600 nm), followed by development. After the image exposure and before the development, a heating process at a temperature of 50 ° C. to 150 ° C. for 1 second and 5 minutes may be provided for the purpose of increasing the curing rate of the photopolymerizable photosensitive layer.
【0062】また、本発明の感光性平版印刷版の感光層
の上には、前述したように、通常、酸素遮断性を有する
オーバーコート層が設けてあり、本発明の現像液を用い
て、オーバーコート層の除去と感光層未露光部の除去を
同時に行う方法、または、水、温水でオーバーコート層
を先に除外し、その後未露光部の感光層を現像で除去す
る方法が知られている。これらの水または温水には特開
平10−10754号に記載の防腐剤等、特開平8−2
78636号記載の有機溶剤等を含有させることができ
る。On the photosensitive layer of the photosensitive lithographic printing plate of the present invention, as described above, an overcoat layer having an oxygen-blocking property is usually provided. It is known to remove the overcoat layer and remove the unexposed portion of the photosensitive layer at the same time, or to remove the overcoat layer with water or hot water first, and then remove the unexposed portion of the photosensitive layer by development. I have. These waters or warm waters include preservatives described in JP-A No. 10-10754 and JP-A No. 8-2.
An organic solvent described in No. 78636 can be contained.
【0063】本発明における感光性平版印刷版の前記現
像液による現像は、常法に従って、0〜60℃、好まし
くは15〜40℃程度の温度で、例えば、露光処理した
感光性平版印刷版を現像液に浸漬してブラシで擦る等に
より行う。さらに自動現像機を用いて現像処理を行う場
合、処理量に応じて現像液が疲労してくるので、補充液
または新鮮な現像液を用いて処理能力を回復させても良
い。このようにして現像処理された感光性平版印刷版は
特開昭54−8002号、同55−115045号、同
59−58431号等の各公報に記載されているよう
に、水洗水、界面活性剤等を含有するリンス液、アラビ
アガムや澱粉誘導体等を含む不感脂化液で後処理され
る。本発明の感光性平版印刷版の後処理にはこれらの処
理を種々組み合わせて用いることができる。上記の様な
処理により得られた印刷版は特開2000−89478
号に記載の方法による後露光処理やバーニングなどの加
熱処理により、耐刷性を向上させることができる。この
ような処理によって得られた平版印刷版はオフセット印
刷機に掛けられ、多数枚の印刷に用いられる。The development of the photosensitive lithographic printing plate of the present invention with the above-mentioned developer is carried out at a temperature of 0 to 60 ° C., preferably about 15 to 40 ° C., for example, by subjecting the photosensitive lithographic printing plate to an exposure treatment. This is performed by immersing in a developer and rubbing with a brush. Further, when the developing process is performed using an automatic developing machine, the developing solution becomes fatigued in accordance with the processing amount. Therefore, the processing capability may be restored by using a replenisher or a fresh developing solution. As described in JP-A-54-8002, JP-A-55-115045, JP-A-59-58431, etc., the photosensitive lithographic printing plate thus developed is washed with water, Post-treatment with a rinsing solution containing an agent or the like, or a desensitizing solution containing gum arabic or a starch derivative. For the post-processing of the photosensitive lithographic printing plate of the present invention, these processings can be used in various combinations. The printing plate obtained by the above processing is described in JP-A-2000-89478.
The printing durability can be improved by a post-exposure treatment or a heating treatment such as burning by the method described in (1). The lithographic printing plate obtained by such a process is set on an offset printing machine and used for printing a large number of sheets.
【0064】[0064]
【実施例】以下に本発明を実施例によって更に具体的に
説明するが、勿論本発明の範囲はこれらによって限定さ
れるものではない。 〔実施例1〕厚さ0.30mmの材質1Sのアルミニウ
ム板を8号ナイロンブラシと800メッシュのパミスト
ンの水懸濁液を用い、その表面を砂目立てした後、よく
水で洗浄した。10%水酸化ナトリウムに70℃で60
秒間浸漬してエッチングした後、流水で水洗後、20%
HNO3で中和洗浄、水洗した。これをVA=12.7V
の条件下で正弦波の交番波形電流を用いて1%硝酸水溶
液中で300クーロン/dm2の陽極時電気量で電解粗
面化処理を行った。その表面粗さを測定したところ0.
45μm(Ra表示)であった。ひきつづいて30%の
H2SO4水溶液中に浸漬し、55℃で2分間デスマット
した後、33℃、20%H2SO4水溶液中で、砂目立て
した面に陰極を配置して、電流密度5A/dm2におい
て50秒間陽極酸化したところ厚さが2.7g/m2で
あった。このように処理されたアルミニウム板上に、下
記組成の高感度光重合性組成物1を乾燥塗布重量が1.
5g/m2となるように塗布し、100℃で1分間乾燥
させ、感光層を形成した。EXAMPLES The present invention will be described in more detail with reference to the following Examples, which, of course, are not intended to limit the scope of the present invention. [Example 1] An aluminum plate of material 1S having a thickness of 0.30 mm was grained with a No. 8 nylon brush and an aqueous suspension of 800 mesh pumistone, and the surface was grained, followed by thorough washing with water. 60% at 70 ° C in 10% sodium hydroxide
After dipping for 2 seconds and etching, washing with running water, 20%
The resultant was neutralized and washed with HNO 3 and washed with water. V A = 12.7V
The electrolytic surface roughening treatment was performed in a 1% nitric acid aqueous solution at an anode electricity of 300 coulomb / dm 2 using a sinusoidal alternating current under the conditions described in (1). The surface roughness was measured.
It was 45 μm (Ra indication). After immersion in a 30% H 2 SO 4 aqueous solution and desmutting at 55 ° C. for 2 minutes, a cathode was placed on a grained surface in a 20% H 2 SO 4 aqueous solution at 33 ° C. When anodized at 5 A / dm 2 for 50 seconds, the thickness was 2.7 g / m 2 . On the thus treated aluminum plate, a high-sensitivity photopolymerizable composition 1 having the following composition having a dry coating weight of 1.
The composition was applied so as to be 5 g / m 2 and dried at 100 ° C. for 1 minute to form a photosensitive layer.
【0065】 (光重合性組成物1) エチレン性不飽和結合含有化合物(A1) 1.5重量部 線状有機高分子重合体(B1) 2.0重量部 増感剤(C1) 0.15重量部 光開始剤(D1) 0.2重量部 ε−フタロシアニン(F1)分散物 0.02重量部 フッ素系ノニオン界面活性剤メガファックF177 0.03重量部 (大日本インキ化学工業(株)製) メチルエチルケトン 9.0重量部 プロピレングリコールモノメチルエーテルアセテート 7.5重量部 トルエン 11.0重量部(Photopolymerizable Composition 1) Ethylenic unsaturated bond-containing compound (A1) 1.5 parts by weight Linear organic high molecular polymer (B1) 2.0 parts by weight Sensitizer (C1) 0.15 Parts by weight Photoinitiator (D1) 0.2 parts by weight ε-phthalocyanine (F1) dispersion 0.02 parts by weight Fluorine nonionic surfactant Megafac F177 0.03 parts by weight (manufactured by Dainippon Ink and Chemicals, Inc.) ) Methyl ethyl ketone 9.0 parts by weight Propylene glycol monomethyl ether acetate 7.5 parts by weight Toluene 11.0 parts by weight
【0066】[0066]
【化4】 Embedded image
【0067】この感光層上にポリビニルアルコール(ケ
ン化度98モル%、重合度500)の3重量%の水溶液
を乾燥塗布重量が2.5g/m2となるように塗布し、
120℃で3分間乾燥させ、感光性平版印刷版を得た。On the photosensitive layer, a 3% by weight aqueous solution of polyvinyl alcohol (98 mol% of saponification degree, polymerization degree of 500) was applied so as to have a dry coating weight of 2.5 g / m 2 .
After drying at 120 ° C. for 3 minutes, a photosensitive lithographic printing plate was obtained.
【0068】この感光性平版印刷版をFD・YAGレー
ザー(CSI社製プレートジェット4)で100μJ/
cm2の露光量で、4000dpiにて175線/イン
チの条件で、ベタ画像と1〜99%の網点画像(1%刻
み)を走査露光した後、現像液1およびフイニッシング
ガム液FP−2W(富士写真フイルム製)を仕込んだ自
動現像機(富士写真フイルム製LP−850P2)で標
準処理を行った。プレヒートの条件は版面到達温度が1
00℃、現像液温は30℃、現像液への浸漬時間は約1
5秒であった。現像液1は下記組成よりなり、pHは2
5℃で11.5、伝導度は5mS/cmであった。The photosensitive lithographic printing plate was subjected to FD / YAG laser (plate jet 4 manufactured by CSI) at 100 μJ /
After scanning and exposing a solid image and a 1-99% halftone dot image (in 1% increments) at 4,000 lines / inch and 4000 dpi at an exposure dose of cm 2 , developer 1 and finishing gum solution FP Standard processing was performed using an automatic developing machine (LP-850P2 manufactured by Fuji Photo Film) charged with -2W (manufactured by Fuji Photo Film). The preheating condition is that the plate surface temperature is 1
00 ° C, developer temperature is 30 ° C, and immersion time in the developer is about 1
5 seconds. The developer 1 has the following composition and the pH is 2
It was 11.5 at 5 ° C and the conductivity was 5 mS / cm.
【0069】 (現像液1の組成) 水酸化カリウム 0.15g ポリオキシエチレンフェニルエーテル(n=13) 5.0g キレスト400(キレート剤) 0.1g (C10H21-NHCH2CH2)2NHCH2COOH 0.05g 水 94.7g(Composition of Developer 1) Potassium hydroxide 0.15 g Polyoxyethylene phenyl ether (n = 13) 5.0 g Cherest 400 (chelating agent) 0.1 g (C 10 H 21 —NHCH 2 CH 2 ) 2 NHCH 2 COOH 0.05g Water 94.7g
【0070】〔実施例2〜5〕実施例1の現像液を表1
に示した現像液に変更し、それ以外は全て実施例1と同
じ方法で平版印刷版を製版した。[Examples 2 to 5] The developer of Example 1 was used as shown in Table 1.
The lithographic printing plate was made in the same manner as in Example 1 except that the developing solution was changed to that shown in Example 1.
【0071】[0071]
【表1】 [Table 1]
【0072】〔実施例6、7〕実施例1の光重合性組成
物1中の線状有機高分子重合体をB1から下記B2(実
施例6)、またB1から下記B3(実施例7)に変更
し、それ以外は全て実施例1と同じ方法で平版印刷版を
製版した。Examples 6 and 7 The linear organic high molecular polymer in the photopolymerizable composition 1 of Example 1 was changed from B1 to B2 (Example 6), and from B1 to B3 (Example 7). The planographic printing plate was made in the same manner as in Example 1 except for the above.
【0073】B2(実施例6):アリルメタクリレート
/メタクリル酸(70/30モル%)共重合体、分子量
5万。 B3(実施例7):メチルメタクリレート/イソブチル
メタクリレート/メタクリル酸(60/20/20モル
%)共重合体、分子量10万B2 (Example 6): Allyl methacrylate / methacrylic acid (70/30 mol%) copolymer, molecular weight 50,000. B3 (Example 7): Methyl methacrylate / isobutyl methacrylate / methacrylic acid (60/20/20 mol%) copolymer, molecular weight 100,000
【0074】〔実施例8〕実施例1の光重合性組成物の
エチレン性不飽和化合物をA1から下記構造A2に変更
し、それ以外は全て実施例1と同じ方法で平版印刷版を
製版した。Example 8 A lithographic printing plate was prepared in the same manner as in Example 1 except that the ethylenically unsaturated compound of the photopolymerizable composition of Example 1 was changed from A1 to the following structure A2. .
【0075】[0075]
【化5】 Embedded image
【0076】〔実施例9〕下記下塗り用液状組成物を混
合し撹拌した。約5分後に発熱が見られ、60分間反応
させた後、内容物を別の容器に移し、メタノールを更に
3万重量部加えることで液状塗布液を調製した。Example 9 The following undercoating liquid composition was mixed and stirred. After about 5 minutes, heat generation was observed. After reacting for 60 minutes, the content was transferred to another container, and 30,000 parts by weight of methanol was further added to prepare a liquid coating solution.
【0077】 (下塗り用液状組成物) ユニケミカル(株)製ホスマーPE 20重量部 メタノール 130重量部 水 20重量部 パラトルエンスルホン酸 5重量部 テトラエトキシシラン 50重量部 3−メタクリロキシプロピルトリエトキシシラン 50重量部(Liquid composition for undercoat) Phosmer PE manufactured by Unichemical Co., Ltd. 20 parts by weight Methanol 130 parts by weight Water 20 parts by weight Paratoluenesulfonic acid 5 parts by weight Tetraethoxysilane 50 parts by weight 3-methacryloxypropyltriethoxysilane 50 parts by weight
【0078】この液状塗布液を、実施例1の陽極酸化さ
れたアルミニウム支持体上に、Si量が約0.001g
/m2となるように塗布し、100℃で1分間乾燥させ
た後、実施例1と同様の方法で感光層、水溶性樹脂層を
設け、露光、現像し平版印刷版を製版した。The liquid coating solution was applied onto the anodized aluminum support of Example 1 with a Si content of about 0.001 g.
/ M 2, and dried at 100 ° C. for 1 minute. Then, a photosensitive layer and a water-soluble resin layer were provided in the same manner as in Example 1, and exposed and developed to form a lithographic printing plate.
【0079】〔比較例1〕実施例1の現像液1に対し、
ポリオキシエチレンフェニルエーテルを除いた組成物を
現像液として用いた。この現像液のpHは11.5であ
り、導電率は5mS/cmであった。他は実施例1と同
様の方法で平版印刷版を作製した。[Comparative Example 1] With respect to the developer 1 of Example 1,
A composition excluding polyoxyethylene phenyl ether was used as a developer. The pH of this developer was 11.5 and the conductivity was 5 mS / cm. Otherwise, a lithographic printing plate was prepared in the same manner as in Example 1.
【0080】〔比較例2〕実施例1の現像液1に対し、
(C10H21-NHCH2CH2)2NHCH2COOHを除いた組成物を現像液
として用い、他は実施例1と同様の方法で平版印刷版を
作製した。[Comparative Example 2] With respect to the developer 1 of Example 1,
A lithographic printing plate was prepared in the same manner as in Example 1 except that the composition excluding (C 10 H 21 -NHCH 2 CH 2 ) 2 NHCH 2 COOH was used as a developer.
【0081】〔比較例3〕実施例1の現像液1に対し、
水酸化カリウム添加量を2gに変更し、現像液を調製し
た。この現像液のpHは12.8であり、伝導度は25
mS/cmであった。他は実施例1と同様な方法で平版
印刷版を作製した。[Comparative Example 3] With respect to the developing solution 1 of Example 1,
The amount of potassium hydroxide added was changed to 2 g to prepare a developer. The pH of this developer is 12.8 and the conductivity is 25
mS / cm. Otherwise, a lithographic printing plate was produced in the same manner as in Example 1.
【0082】〔比較例4〕実施例1の現像液1に代え
て、アルカリ金属珪酸塩を含む現像液として富士写真フ
イルム(株)製LP−D現像液を水で10倍に希釈した
溶液を現像液として用い、他は実施例1と同様の方法で
平版印刷版を作製した。このときの現像液のpHは1
2.8で伝導度は32mS/cmであった。Comparative Example 4 A solution obtained by diluting a LP-D developer manufactured by Fuji Photo Film Co., Ltd. 10 times with water as a developer containing an alkali metal silicate instead of the developer 1 of Example 1 was used. A lithographic printing plate was prepared in the same manner as in Example 1 except for using it as a developer. At this time, the pH of the developer is 1
At 2.8, the conductivity was 32 mS / cm.
【0083】上記の実施例1〜9、比較例1〜4の製版
方法で得られた平版印刷版について現像性、耐刷性、印
刷汚れについて評価した。現像性は現像処理後の版面を
目視で観察し感光層残膜の有無および残膜の程度により
判断した。耐刷性はマン・ローランド社製R201型印
刷機で、大日本インキ社製GEOS G墨(N)を使用
して印刷し、3%の網点が版飛びを起こした印刷枚数を
評価した。印刷汚れ性は三菱重工製ダイヤIF2型印刷
機で、大日本インキ社製GEOS G紅(S)を使用し
て印刷し、非画像部のインキ汚れを目視で評価した。ま
た、現像カスの発生については、補充液の少量投入方式
で現像液の活性を一定に保ち、実施例1の版材を100
0m2処理し、その時発生したカスの程度を目視で判断
した。これらの結果を表2に示す。The planographic printing plates obtained by the plate making methods of Examples 1 to 9 and Comparative Examples 1 to 4 were evaluated for developability, printing durability, and printing smear. Developability was determined by visually observing the plate surface after the development processing and by determining the presence or absence of the remaining photosensitive layer and the degree of the remaining film. The printing durability was evaluated using a R201 type printing machine manufactured by Man Roland Co., Ltd. using GEOS G black (N) manufactured by Dainippon Ink Co., Ltd., and the number of printed sheets in which 3% of halftone dots caused plate skipping was evaluated. The print stain was printed on a diamond IF2 type printer manufactured by Mitsubishi Heavy Industries using GEOS G Beni (S) manufactured by Dainippon Ink and the ink stain on the non-image area was visually evaluated. Regarding the generation of developing scum, the activity of the developing solution was kept constant by a small amount of replenishing solution, and the plate material of Example 1 was kept at 100%.
0 m 2 treatment was performed, and the degree of scum generated at that time was visually determined. Table 2 shows the results.
【0084】[0084]
【表2】 [Table 2]
【0085】表2から明らかなように、本発明に係る各
実施例の平版印刷版は、それぞれ満足すべき結果を得た
が、各比較例の平版印刷版は何らかの評価結果において
不満足なものであった。As is clear from Table 2, the planographic printing plates of the examples according to the present invention each obtained satisfactory results, but the planographic printing plates of Comparative Examples were not satisfactory in any evaluation results. there were.
【0086】[0086]
【発明の効果】以上説明したように、本発明の平版印刷
版の製版方法は光重合型組成物からなる感光層を有する
感光性平版印刷版と、比較的pHが低いアルカリ水溶液
に、特定の構造のノニオン系界面活性剤および両性界面
活性剤を含有させた現像液を使用することにより、現像
性が良好で印刷汚れがなく、かつ耐刷性の優れた平版印
刷版の作製が可能である。また現像液の経時安定性が優
れ現像カスの発生が抑制され、現像液のpHが比較的低
いため、安全上好ましく、現像廃液の環境への影響も改
善できる効果を奏する。As described above, the method for making a lithographic printing plate according to the present invention is a method for preparing a lithographic printing plate having a photosensitive layer comprising a photopolymerizable composition, and an aqueous alkali solution having a relatively low pH. By using a developer containing a nonionic surfactant and an amphoteric surfactant having a structure, it is possible to produce a lithographic printing plate having good developability, no printing stains, and excellent printing durability. . In addition, since the developer has excellent stability over time, the generation of development scum is suppressed, and the pH of the developer is relatively low. Therefore, it is preferable from the viewpoint of safety, and the effect of the development waste liquid on the environment can be improved.
Claims (2)
飽和二重結合を有する化合物と、光重合開始剤と、高分
子結合剤とを含有する光重合型感光性組成物からなる感
光層を有する感光性平版印刷版を、画像露光した後、
(1)無機のアルカリ剤と、(2)ポリオキシアルキレ
ンエーテル基を有するノニオン系界面活性剤と、(3)
両性界面活性剤とを含有する現像液で現像することを特
徴とする平版印刷版の製版方法。1. A photosensitive layer comprising a photopolymerizable photosensitive composition containing a compound having an ethylenically unsaturated double bond, a photopolymerization initiator, and a polymer binder on an aluminum support. After imagewise exposing the photosensitive lithographic printing plate,
(1) an inorganic alkali agent, (2) a nonionic surfactant having a polyoxyalkylene ether group, and (3)
A method of making a lithographic printing plate, comprising developing with a developer containing an amphoteric surfactant.
範囲であり、かつ導電率3〜30mS/cmの範囲であ
ることを特徴とする請求項1に記載の平版印刷版の製版
方法。2. The method according to claim 1, wherein the developer has a pH of 10.0 to 12.5 and a conductivity of 3 to 30 mS / cm. .
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000279892A JP2002091017A (en) | 2000-09-14 | 2000-09-14 | Method for producing planographic printing plate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000279892A JP2002091017A (en) | 2000-09-14 | 2000-09-14 | Method for producing planographic printing plate |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JP2002091017A true JP2002091017A (en) | 2002-03-27 |
Family
ID=18764827
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000279892A Pending JP2002091017A (en) | 2000-09-14 | 2000-09-14 | Method for producing planographic printing plate |
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| Country | Link |
|---|---|
| JP (1) | JP2002091017A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008249874A (en) * | 2007-03-29 | 2008-10-16 | Mitsubishi Paper Mills Ltd | Lithographic printing plate development processing solution and development processing method |
| JP2010503016A (en) * | 2006-08-31 | 2010-01-28 | イーストマン コダック カンパニー | Method for imaging and developing negative-working elements |
-
2000
- 2000-09-14 JP JP2000279892A patent/JP2002091017A/en active Pending
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010503016A (en) * | 2006-08-31 | 2010-01-28 | イーストマン コダック カンパニー | Method for imaging and developing negative-working elements |
| JP2012194572A (en) * | 2006-08-31 | 2012-10-11 | Eastman Kodak Co | Method of imaging and developing negative type element |
| JP2012194571A (en) * | 2006-08-31 | 2012-10-11 | Eastman Kodak Co | Method of imaging and developing negative type element |
| JP2008249874A (en) * | 2007-03-29 | 2008-10-16 | Mitsubishi Paper Mills Ltd | Lithographic printing plate development processing solution and development processing method |
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