JP2002023649A - Transparent impact relaxation laminated body and display device using the same - Google Patents
Transparent impact relaxation laminated body and display device using the sameInfo
- Publication number
- JP2002023649A JP2002023649A JP2001072633A JP2001072633A JP2002023649A JP 2002023649 A JP2002023649 A JP 2002023649A JP 2001072633 A JP2001072633 A JP 2001072633A JP 2001072633 A JP2001072633 A JP 2001072633A JP 2002023649 A JP2002023649 A JP 2002023649A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- transparent
- laminate
- adhesive layer
- impact
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000010410 layer Substances 0.000 claims abstract description 412
- 239000011521 glass Substances 0.000 claims abstract description 123
- 239000000758 substrate Substances 0.000 claims abstract description 93
- 239000004820 Pressure-sensitive adhesive Substances 0.000 claims abstract description 62
- 229910000831 Steel Inorganic materials 0.000 claims abstract description 43
- 239000010959 steel Substances 0.000 claims abstract description 43
- 230000002265 prevention Effects 0.000 claims description 144
- 239000012790 adhesive layer Substances 0.000 claims description 49
- 238000005336 cracking Methods 0.000 claims description 43
- 238000002834 transmittance Methods 0.000 claims description 36
- 239000000463 material Substances 0.000 claims description 32
- 230000035939 shock Effects 0.000 claims description 27
- 239000000203 mixture Substances 0.000 claims description 10
- 238000003475 lamination Methods 0.000 claims description 6
- 230000003405 preventing effect Effects 0.000 abstract description 32
- 238000010030 laminating Methods 0.000 abstract description 3
- 230000003449 preventive effect Effects 0.000 abstract 2
- 239000010409 thin film Substances 0.000 description 50
- 229910052751 metal Inorganic materials 0.000 description 39
- 239000002184 metal Substances 0.000 description 39
- 239000010408 film Substances 0.000 description 37
- 238000000034 method Methods 0.000 description 35
- 229920000139 polyethylene terephthalate Polymers 0.000 description 29
- 239000005020 polyethylene terephthalate Substances 0.000 description 29
- 229910052709 silver Inorganic materials 0.000 description 24
- 239000004332 silver Substances 0.000 description 24
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 23
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 18
- 229910004298 SiO 2 Inorganic materials 0.000 description 17
- 229920005989 resin Polymers 0.000 description 17
- 239000011347 resin Substances 0.000 description 17
- 230000000694 effects Effects 0.000 description 16
- 239000004743 Polypropylene Substances 0.000 description 15
- 238000012360 testing method Methods 0.000 description 15
- 239000003795 chemical substances by application Substances 0.000 description 9
- 238000002438 flame photometric detection Methods 0.000 description 9
- 239000000178 monomer Substances 0.000 description 9
- -1 polyethylene terephthalate Polymers 0.000 description 9
- 229920000098 polyolefin Polymers 0.000 description 9
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 8
- 239000004698 Polyethylene Substances 0.000 description 8
- 230000015572 biosynthetic process Effects 0.000 description 8
- 230000001070 adhesive effect Effects 0.000 description 7
- 238000000576 coating method Methods 0.000 description 7
- 230000000052 comparative effect Effects 0.000 description 7
- 238000013461 design Methods 0.000 description 7
- 230000006866 deterioration Effects 0.000 description 7
- 239000000975 dye Substances 0.000 description 7
- 239000005038 ethylene vinyl acetate Substances 0.000 description 7
- 238000000059 patterning Methods 0.000 description 7
- 229920001200 poly(ethylene-vinyl acetate) Polymers 0.000 description 7
- 238000006116 polymerization reaction Methods 0.000 description 7
- 239000011241 protective layer Substances 0.000 description 7
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 6
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 6
- 238000004132 cross linking Methods 0.000 description 6
- 238000001723 curing Methods 0.000 description 6
- 238000010586 diagram Methods 0.000 description 6
- 229910052737 gold Inorganic materials 0.000 description 6
- 239000010931 gold Substances 0.000 description 6
- 230000003287 optical effect Effects 0.000 description 6
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 6
- 229920000642 polymer Polymers 0.000 description 6
- 230000008569 process Effects 0.000 description 6
- 229920002725 thermoplastic elastomer Polymers 0.000 description 6
- 239000000853 adhesive Substances 0.000 description 5
- 239000011248 coating agent Substances 0.000 description 5
- 239000004020 conductor Substances 0.000 description 5
- 229910052802 copper Inorganic materials 0.000 description 5
- 239000010949 copper Substances 0.000 description 5
- 238000001035 drying Methods 0.000 description 5
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 5
- 238000005259 measurement Methods 0.000 description 5
- 230000001681 protective effect Effects 0.000 description 5
- 238000004544 sputter deposition Methods 0.000 description 5
- 238000001771 vacuum deposition Methods 0.000 description 5
- 229920000178 Acrylic resin Polymers 0.000 description 4
- 239000004925 Acrylic resin Substances 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 4
- 239000004593 Epoxy Substances 0.000 description 4
- 239000004793 Polystyrene Substances 0.000 description 4
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 4
- 239000000956 alloy Substances 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 4
- 238000011109 contamination Methods 0.000 description 4
- 229920001577 copolymer Polymers 0.000 description 4
- 230000007423 decrease Effects 0.000 description 4
- 238000010894 electron beam technology Methods 0.000 description 4
- 239000010419 fine particle Substances 0.000 description 4
- 229920000728 polyester Polymers 0.000 description 4
- 229920001296 polysiloxane Polymers 0.000 description 4
- 229920002223 polystyrene Polymers 0.000 description 4
- 229920002635 polyurethane Polymers 0.000 description 4
- 239000004814 polyurethane Substances 0.000 description 4
- 229920001187 thermosetting polymer Polymers 0.000 description 4
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 4
- 229910001887 tin oxide Inorganic materials 0.000 description 4
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 3
- 229920000877 Melamine resin Polymers 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 238000003848 UV Light-Curing Methods 0.000 description 3
- 238000009825 accumulation Methods 0.000 description 3
- 239000000654 additive Substances 0.000 description 3
- 229910045601 alloy Inorganic materials 0.000 description 3
- 230000005540 biological transmission Effects 0.000 description 3
- 229910000420 cerium oxide Inorganic materials 0.000 description 3
- 230000006378 damage Effects 0.000 description 3
- 239000000428 dust Substances 0.000 description 3
- 229920001971 elastomer Polymers 0.000 description 3
- 238000001227 electron beam curing Methods 0.000 description 3
- 229910003437 indium oxide Inorganic materials 0.000 description 3
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 3
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 3
- 239000011368 organic material Substances 0.000 description 3
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 3
- 229910052763 palladium Inorganic materials 0.000 description 3
- 239000000049 pigment Substances 0.000 description 3
- 229910052697 platinum Inorganic materials 0.000 description 3
- 229920006122 polyamide resin Polymers 0.000 description 3
- 229920001155 polypropylene Polymers 0.000 description 3
- 239000004800 polyvinyl chloride Substances 0.000 description 3
- 229920000915 polyvinyl chloride Polymers 0.000 description 3
- 239000005060 rubber Substances 0.000 description 3
- 239000004408 titanium dioxide Substances 0.000 description 3
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 2
- 229920002284 Cellulose triacetate Polymers 0.000 description 2
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- 229910010413 TiO 2 Inorganic materials 0.000 description 2
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- NNLVGZFZQQXQNW-ADJNRHBOSA-N [(2r,3r,4s,5r,6s)-4,5-diacetyloxy-3-[(2s,3r,4s,5r,6r)-3,4,5-triacetyloxy-6-(acetyloxymethyl)oxan-2-yl]oxy-6-[(2r,3r,4s,5r,6s)-4,5,6-triacetyloxy-2-(acetyloxymethyl)oxan-3-yl]oxyoxan-2-yl]methyl acetate Chemical compound O([C@@H]1O[C@@H]([C@H]([C@H](OC(C)=O)[C@H]1OC(C)=O)O[C@H]1[C@@H]([C@@H](OC(C)=O)[C@H](OC(C)=O)[C@@H](COC(C)=O)O1)OC(C)=O)COC(=O)C)[C@@H]1[C@@H](COC(C)=O)O[C@@H](OC(C)=O)[C@H](OC(C)=O)[C@H]1OC(C)=O NNLVGZFZQQXQNW-ADJNRHBOSA-N 0.000 description 2
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 2
- 229920006243 acrylic copolymer Polymers 0.000 description 2
- 125000000217 alkyl group Chemical group 0.000 description 2
- 238000012662 bulk polymerization Methods 0.000 description 2
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 description 2
- 239000002131 composite material Substances 0.000 description 2
- 238000003851 corona treatment Methods 0.000 description 2
- 238000005520 cutting process Methods 0.000 description 2
- 230000001066 destructive effect Effects 0.000 description 2
- 230000005684 electric field Effects 0.000 description 2
- 238000010556 emulsion polymerization method Methods 0.000 description 2
- 239000003822 epoxy resin Substances 0.000 description 2
- 239000011737 fluorine Substances 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- 238000010528 free radical solution polymerization reaction Methods 0.000 description 2
- 125000000524 functional group Chemical group 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 239000003292 glue Substances 0.000 description 2
- 229910010272 inorganic material Inorganic materials 0.000 description 2
- 239000011147 inorganic material Substances 0.000 description 2
- 229920003049 isoprene rubber Polymers 0.000 description 2
- 239000000395 magnesium oxide Substances 0.000 description 2
- 230000007257 malfunction Effects 0.000 description 2
- JDSHMPZPIAZGSV-UHFFFAOYSA-N melamine Chemical compound NC1=NC(N)=NC(N)=N1 JDSHMPZPIAZGSV-UHFFFAOYSA-N 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 230000000116 mitigating effect Effects 0.000 description 2
- 150000002894 organic compounds Chemical class 0.000 description 2
- 230000035515 penetration Effects 0.000 description 2
- 125000005010 perfluoroalkyl group Chemical group 0.000 description 2
- 125000002467 phosphate group Chemical group [H]OP(=O)(O[H])O[*] 0.000 description 2
- 238000009832 plasma treatment Methods 0.000 description 2
- 229920000058 polyacrylate Polymers 0.000 description 2
- 229920000647 polyepoxide Polymers 0.000 description 2
- 229920001225 polyester resin Polymers 0.000 description 2
- 239000004645 polyester resin Substances 0.000 description 2
- 239000002685 polymerization catalyst Substances 0.000 description 2
- 239000003505 polymerization initiator Substances 0.000 description 2
- 239000006104 solid solution Substances 0.000 description 2
- 238000001228 spectrum Methods 0.000 description 2
- 238000010186 staining Methods 0.000 description 2
- 229920001059 synthetic polymer Polymers 0.000 description 2
- 239000013077 target material Substances 0.000 description 2
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 2
- 229920005992 thermoplastic resin Polymers 0.000 description 2
- 238000012546 transfer Methods 0.000 description 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 2
- 229920002554 vinyl polymer Polymers 0.000 description 2
- 230000000007 visual effect Effects 0.000 description 2
- 238000004383 yellowing Methods 0.000 description 2
- 239000011787 zinc oxide Substances 0.000 description 2
- BQCIDUSAKPWEOX-UHFFFAOYSA-N 1,1-Difluoroethene Chemical compound FC(F)=C BQCIDUSAKPWEOX-UHFFFAOYSA-N 0.000 description 1
- QBFXBDUCRNGHSA-UHFFFAOYSA-N 1-(4-fluorophenyl)-2-(methylamino)pentan-1-one Chemical compound FC1=CC=C(C=C1)C(C(CCC)NC)=O QBFXBDUCRNGHSA-UHFFFAOYSA-N 0.000 description 1
- CCJVHHBXARCZQQ-UHFFFAOYSA-N 2-methylhexa-1,3,5-triene styrene Chemical compound C(=C)C=CC(C)=C.C=CC1=CC=CC=C1 CCJVHHBXARCZQQ-UHFFFAOYSA-N 0.000 description 1
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- 229920002799 BoPET Polymers 0.000 description 1
- 229910004261 CaF 2 Inorganic materials 0.000 description 1
- 239000004709 Chlorinated polyethylene Substances 0.000 description 1
- 229910017813 Cu—Cr Inorganic materials 0.000 description 1
- 208000016169 Fish-eye disease Diseases 0.000 description 1
- 206010052128 Glare Diseases 0.000 description 1
- 239000004640 Melamine resin Substances 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000004695 Polyether sulfone Substances 0.000 description 1
- 239000004697 Polyetherimide Substances 0.000 description 1
- 239000004721 Polyphenylene oxide Substances 0.000 description 1
- 239000004734 Polyphenylene sulfide Substances 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- 229920002472 Starch Polymers 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Chemical compound NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 125000003647 acryloyl group Chemical group O=C([*])C([H])=C([H])[H] 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 125000005907 alkyl ester group Chemical group 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 230000003373 anti-fouling effect Effects 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 1
- 239000002216 antistatic agent Substances 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 230000033228 biological regulation Effects 0.000 description 1
- DQXBYHZEEUGOBF-UHFFFAOYSA-N but-3-enoic acid;ethene Chemical compound C=C.OC(=O)CC=C DQXBYHZEEUGOBF-UHFFFAOYSA-N 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 1
- 238000011088 calibration curve Methods 0.000 description 1
- 239000004202 carbamide Substances 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 229920002301 cellulose acetate Polymers 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 235000019504 cigarettes Nutrition 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000004040 coloring Methods 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 230000000536 complexating effect Effects 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 239000003431 cross linking reagent Substances 0.000 description 1
- PZPGRFITIJYNEJ-UHFFFAOYSA-N disilane Chemical class [SiH3][SiH3] PZPGRFITIJYNEJ-UHFFFAOYSA-N 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 229920006228 ethylene acrylate copolymer Polymers 0.000 description 1
- 229920005648 ethylene methacrylic acid copolymer Polymers 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- XUCNUKMRBVNAPB-UHFFFAOYSA-N fluoroethene Chemical group FC=C XUCNUKMRBVNAPB-UHFFFAOYSA-N 0.000 description 1
- 239000012634 fragment Substances 0.000 description 1
- 238000013007 heat curing Methods 0.000 description 1
- 238000005338 heat storage Methods 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 238000009863 impact test Methods 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 239000003999 initiator Substances 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 229920000554 ionomer Polymers 0.000 description 1
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 description 1
- 229910001635 magnesium fluoride Inorganic materials 0.000 description 1
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 229910001092 metal group alloy Inorganic materials 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 238000013508 migration Methods 0.000 description 1
- 230000005012 migration Effects 0.000 description 1
- 229920005615 natural polymer Polymers 0.000 description 1
- 229910052754 neon Inorganic materials 0.000 description 1
- GKAOGPIIYCISHV-UHFFFAOYSA-N neon atom Chemical compound [Ne] GKAOGPIIYCISHV-UHFFFAOYSA-N 0.000 description 1
- ZKATWMILCYLAPD-UHFFFAOYSA-N niobium pentoxide Inorganic materials O=[Nb](=O)O[Nb](=O)=O ZKATWMILCYLAPD-UHFFFAOYSA-N 0.000 description 1
- URLJKFSTXLNXLG-UHFFFAOYSA-N niobium(5+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Nb+5].[Nb+5] URLJKFSTXLNXLG-UHFFFAOYSA-N 0.000 description 1
- JFNLZVQOOSMTJK-KNVOCYPGSA-N norbornene Chemical compound C1[C@@H]2CC[C@H]1C=C2 JFNLZVQOOSMTJK-KNVOCYPGSA-N 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 239000010702 perfluoropolyether Substances 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 239000002985 plastic film Substances 0.000 description 1
- 229920006255 plastic film Polymers 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 229920001084 poly(chloroprene) Polymers 0.000 description 1
- 229920002492 poly(sulfone) Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 229920006267 polyester film Polymers 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 229920006393 polyether sulfone Polymers 0.000 description 1
- 229920001601 polyetherimide Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 239000011112 polyethylene naphthalate Substances 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 229920001195 polyisoprene Polymers 0.000 description 1
- 229920000069 polyphenylene sulfide Polymers 0.000 description 1
- 229920005990 polystyrene resin Polymers 0.000 description 1
- 229920002689 polyvinyl acetate Polymers 0.000 description 1
- 239000011118 polyvinyl acetate Substances 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000004080 punching Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- 150000003378 silver Chemical class 0.000 description 1
- 125000003808 silyl group Chemical group [H][Si]([H])([H])[*] 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000008107 starch Substances 0.000 description 1
- 235000019698 starch Nutrition 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- 238000010558 suspension polymerization method Methods 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- 239000000057 synthetic resin Substances 0.000 description 1
- 229910001936 tantalum oxide Inorganic materials 0.000 description 1
- BFKJFAAPBSQJPD-UHFFFAOYSA-N tetrafluoroethene Chemical group FC(F)=C(F)F BFKJFAAPBSQJPD-UHFFFAOYSA-N 0.000 description 1
- 229920001169 thermoplastic Polymers 0.000 description 1
- 229920002397 thermoplastic olefin Polymers 0.000 description 1
- 239000004416 thermosoftening plastic Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 239000006097 ultraviolet radiation absorber Substances 0.000 description 1
- 229920006305 unsaturated polyester Polymers 0.000 description 1
- 238000001291 vacuum drying Methods 0.000 description 1
- KAKZBPTYRLMSJV-UHFFFAOYSA-N vinyl-ethylene Natural products C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 1
- 239000011800 void material Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 239000013585 weight reducing agent Substances 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
Landscapes
- Transforming Electric Information Into Light Information (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
- Optical Filters (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Laminated Bodies (AREA)
- Vessels, Lead-In Wires, Accessory Apparatuses For Cathode-Ray Tubes (AREA)
- Gas-Filled Discharge Tubes (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、フラットパネルデ
ィスプレイ(以下FPDと略す)としてはFED、PAL
C、LCD、PDP等があり、特に大型ディスプレイと
して注目されているパネル自体のガラス基板厚みが薄
く、かつ割れやすいPDP(プラズマディスプレイパネ
ル)のガラス基板に透明な粘着剤層を介して、透明な衝
撃緩和積層体を貼り合せ、79000Nに相当する鋼球落下
による衝撃力を緩和し、飛散防止、ならびに割れ防止性
を兼ね備えた衝撃緩和積層体ならびにPDPから発生す
る電磁波と近赤外線特に800−1200nmを遮蔽するフィ
ルターならびにそれを貼り合わせたPDPパネルディス
プレイ装置に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to flat panel displays (hereinafter abbreviated as FPDs), such as FEDs and PALs.
C, LCD, PDP, and the like. In particular, a glass substrate of a panel itself, which is attracting attention as a large display, has a thin glass substrate and is easily broken. Laminate the shock-mitigating laminate to reduce the impact force caused by falling of a steel ball equivalent to 79000N, and to prevent the scattering and cracking of the shock-mitigating laminate and the electromagnetic wave and near-infrared rays, especially 800-1200nm, generated from PDP. The present invention relates to a filter for shielding and a PDP panel display device having the filter attached thereto.
【0002】[0002]
【従来の技術】ガラス製ブラウン管(陰極線管)はテレ
ビ用、ディスプレイ用として安全規格(UL規格、電波
取り締まり法など)で鋼球落下による耐衝撃試験により
飛散防止性や貫通しないこと(指穴以上の大きさで感電
しないこと)が決められており、パネルガラス厚みを厚
く設計する必要があった。このようなCRTガラスパネ
ルに関して、ガラスパネルを厚くすることなく、軽量化
の手段として自己修復性を有する合成樹脂保護フィルム
(熱硬化型ウレタン樹脂とポリエステルフィルムPE
T)を積層するガラス製ブラウン管として、特開平06-3
33515号公報、特開平06-333517号公報が提案されてい
る。この提案は、飛散防止性を特徴としているが、ガラ
スパネル基板の割れ防止機能は兼ね備えていない。2. Description of the Related Art Glass cathode-ray tubes (cathode ray tubes) are used for televisions and displays according to safety standards (UL standards, the Radio Control Law, etc.). The size of the panel glass should not cause electric shock), and it was necessary to design the panel glass thicker. With respect to such a CRT glass panel, a synthetic resin protective film (thermosetting urethane resin and polyester film PE) having self-healing properties as a means of weight reduction without increasing the thickness of the glass panel.
T) is laminated as a glass cathode ray tube.
No. 33515 and Japanese Patent Application Laid-Open No. 06-333517 have been proposed. This proposal is characterized by anti-scattering properties, but does not have a function of preventing breakage of the glass panel substrate.
【0003】また、保護フィルターとして、特開平11-1
74206号公報にフッラトパネルディスプレイ(各種液晶
ディスプレイ(LCD)、PDP)の内部ガラス基板を
保護するために透明樹脂シートをディスプレイの10m
m以内に設置する前面保護基板によりパネル自体のガラ
スを保護することが提案されているが、この構成では、
ガラスパネルと保護基板の間に空気層が入るため、外光
の2重写り込みや、反射率の増加ならびに視差による画
質の鮮明さが低下するなどの多くの課題がある。 更に
前記の提案は、空気層があるため、空隙にほこりや、た
ばこのヤニ等が蓄積され、掃除が困難でもある。As a protective filter, Japanese Patent Application Laid-Open No. 11-1
Japanese Patent Application Laid-Open No. 74206 discloses a transparent resin sheet for protecting a glass substrate inside a flat panel display (various liquid crystal displays (LCDs), PDPs).
It has been proposed to protect the glass of the panel itself with a front protection substrate installed within m.
Since an air layer enters between the glass panel and the protective substrate, there are many problems such as double reflection of external light, an increase in reflectance, and a decrease in image quality due to parallax. Further, in the above proposal, since there is an air layer, dust, cigarette tar and the like accumulate in the voids, and cleaning is also difficult.
【0004】更に、大型化ならびに軽量化が重要である
PDPではパネルの薄さ自体を薄くする傾向があり、パ
ネルから離れたところに保護フィルターを設置すること
は逆効果である。すなわち、PDP大型ディスプレイな
どにおいて、薄くて軽量でかつパネルの割れ防止のため
の保護フィルターは、いまだ実現されていない。[0004] Furthermore, in PDPs where it is important to increase the size and weight, there is a tendency for the panel itself to be thinner, and installing a protective filter away from the panel has an adverse effect. That is, in a large PDP display or the like, a protective filter that is thin and lightweight and that prevents the panel from cracking has not been realized yet.
【0005】またPDPはパネル内部に封入された希ガ
ス、特にネオンを主体としたガス中で放電を発生させ、
その際に発生する真空紫外線により、パネル内部のセル
に設けられたR、G、Bの蛍光体を発光させる。この発
光過程において、PDPの作動には不必要な電磁波およ
び近赤外線が同時に放出される。特に電磁波は、VCC
IやFCC等により放射電磁波が規制されており、また
近年電磁波の人体へ悪影響が懸念されていることから、
PDPから放出される電磁波も遮蔽する必要がある。[0005] Further, the PDP generates electric discharge in a rare gas enclosed in the panel, especially a gas mainly composed of neon.
The R, G, and B phosphors provided in the cells inside the panel are caused to emit light by the vacuum ultraviolet rays generated at that time. In this light emission process, electromagnetic waves and near infrared rays unnecessary for the operation of the PDP are simultaneously emitted. Especially the electromagnetic wave is VCC
Since radiated electromagnetic waves are regulated by I and FCC, etc., and there is a concern in recent years that electromagnetic waves have a negative effect on the human body,
It is necessary to shield the electromagnetic waves emitted from the PDP.
【0006】近赤外線に関しては、放出される近赤外線
の波長範囲はおよそ800〜1200nmである。一
方、家庭用電化製品、カラオケ用器材、音響映像機器等
のリモートコントロール装置に使用されている赤外線セ
ンサーの受光素子はおよそ700〜1300nmに受光
感度のピークを持つものが多い事から、PDPから放出
された近赤外線がリモートコントローラを誤動作させて
しまうという問題が生じているため、PDPから発生す
る近赤外線をカットする必要がある。[0006] With respect to the near infrared, the wavelength range of the emitted near infrared is approximately 800-1200 nm. On the other hand, the light-receiving elements of infrared sensors used in remote control devices such as household appliances, karaoke equipment, and audio-visual equipment often have peaks of light-receiving sensitivity at about 700 to 1300 nm, and thus are emitted from PDPs. Since there is a problem that the received near-infrared rays cause the remote controller to malfunction, it is necessary to cut off near-infrared rays generated from the PDP.
【0007】このような背景から、PDPから発生する
電磁波および近赤外線をカットするフィルターが要請さ
れており、たとえば、金属メッシュを埋め込んだものま
たはエッチングによるパターニングメッシュ加工を行っ
たアクリル板と、アクリル板に近赤外線を吸収する色素
を添加した電磁波・近赤外線カット成形板などならびに
金属薄膜層を透明薄膜層で挟んだ構成の透明多層薄膜積
層体が検討されている。[0007] From such a background, there is a demand for a filter for cutting electromagnetic waves and near-infrared rays generated from a PDP. For example, an acrylic plate in which a metal mesh is embedded or a patterned mesh is processed by etching; A transparent multi-layer thin film laminate having a structure in which a metal thin film layer is sandwiched between transparent thin film layers and the like, as well as an electromagnetic wave / near infrared cut molded plate in which a dye that absorbs near infrared light is added.
【0008】このような金属メッシュやパターニングメ
ッシュならびに透明多層薄膜積層体をPDPフィルター
に応用する検討もなされている。一般にPDPのような
表示装置に使用されるフィルターには、PDPから10
mm以内の離れたガラス基板またはアクリル等の前面板
構成で形成されており、PDPパネルに直接透明粘着剤
層を介して貼られたものでなく、かつPDPに直接貼ら
れた場合、PDPパネルのガラス基板が割れる課題があ
った。[0008] Application of such a metal mesh, a patterning mesh and a transparent multilayer thin film laminate to a PDP filter has been studied. In general, filters used in display devices such as PDPs include PDPs having 10
It is formed of a glass substrate or a front plate structure such as acrylic, which is separated from the PDP panel by a distance of less than 1 mm, and is not directly adhered to the PDP panel via the transparent adhesive layer. There was a problem that the glass substrate was broken.
【0009】[0009]
【発明が解決しようとする課題】本発明はこのような従
来技術の問題点を鑑み、PDPパネルに直接透明な粘着
剤層を介して、飛散防止層と割れ防止層からなる2層以
上の透明衝撃緩和積層体とそれを用いたディスプレイ表
示装置を提供することを第1の目的とする。SUMMARY OF THE INVENTION In view of the above problems of the prior art, the present invention has two or more transparent layers composed of a scattering prevention layer and a crack prevention layer directly on a PDP panel via a transparent pressure-sensitive adhesive layer. A first object is to provide a shock absorbing laminate and a display device using the same.
【0010】本発明の第2の目的は、さらに電磁波シー
ルド層および/または近赤外線遮蔽層を含むフィルター
を貼り合せることで、ガラスの飛散防止、割れ防止性を
向上させ、かつ電磁波と近赤外線遮蔽を行い、ガラスパ
ネル自体に直接貼り合せることで、画像の鮮明性を向上
させ、更にパネルと衝撃緩和シートの間に空気層がな
く、外光の2重映りがなくホコリやヤニなどの汚れが着
かない透明衝撃緩和積層体とそれを用いたディスプレイ
表示装置を提供する。A second object of the present invention is to improve the prevention of scattering and breakage of glass, and to prevent electromagnetic waves and near-infrared rays by laminating a filter containing an electromagnetic wave shielding layer and / or a near-infrared ray shielding layer. And directly adheres to the glass panel itself to improve the sharpness of the image. Furthermore, there is no air layer between the panel and the shock-absorbing sheet, and there is no double reflection of external light, and dirt such as dust and dirt is removed. Provided are a transparent shock-mitigating laminate that does not reach and a display device using the same.
【0011】[0011]
【課題を解決するための手段】前記目的を達成するため
本発明の透明衝撃緩和積層体は、鋼球の落下による79,0
00N(高さ1.5m×重量510g)に相当する衝撃力によ
り、破壊されるディスプレイ表示装置のガラスパネル基
板上に形成される透明衝撃緩和積層体であって、前記積
層体が、せん断弾性率が2×108Pa以上である飛散防
止層と、せん断弾性率が1×104〜2×108Paの範
囲で且つ2種類以上のせん断弾性率の異なる割れ防止層
と、透明な粘着剤層とを含むことを特徴とする。In order to achieve the above-mentioned object, the transparent shock absorbing laminate of the present invention is provided with a 79,0
A transparent shock absorbing laminate formed on a glass panel substrate of a display device that is destroyed by an impact force equivalent to 00N (height: 1.5 m × weight: 510 g), wherein the laminate has a shear modulus of elasticity. A scattering prevention layer having a shear modulus of 2 × 10 8 Pa or more, a crack prevention layer having a shear modulus in a range of 1 × 10 4 to 2 × 10 8 Pa and two or more different shear modulus, and a transparent pressure-sensitive adhesive layer And characterized in that:
【0012】本発明の透明衝撃緩和積層体は、さらに透
明電磁波シールド層および/または800〜1200nmの範囲
の透過率が20%以下の近赤外線遮蔽層を含むことが好ま
しい。It is preferable that the transparent shock absorbing laminate of the present invention further comprises a transparent electromagnetic wave shielding layer and / or a near-infrared shielding layer having a transmittance in the range of 800 to 1200 nm of 20% or less.
【0013】また本発明の透明衝撃緩和積層体は、透明
な粘着剤層と割れ防止ならびに飛散防止層からなる透明
衝撃緩和積層体ならびに電磁波シールド層および/また
は近赤外線遮蔽層の総厚みが5mm以下であり、かつそ
の可視光透過率が40%以上であることが好ましい。[0013] The transparent shock absorbing laminate of the present invention has a total thickness of a transparent shock absorbing laminate comprising a transparent pressure-sensitive adhesive layer, a crack preventing and scattering preventing layer, and an electromagnetic wave shielding layer and / or a near infrared ray shielding layer of 5 mm or less. And its visible light transmittance is preferably 40% or more.
【0014】また本発明の透明衝撃緩和積層体は、7900
0Nの衝撃力に相当する鋼球落下衝撃力を50%以下に
緩和することが好ましい。[0014] Further, the transparent impact-relieving laminate of the present invention comprises 7900
It is preferable to reduce the steel ball drop impact force corresponding to the impact force of 0 N to 50% or less.
【0015】また本発明の透明衝撃緩和積層体は、前記
のいずれかに記載の飛散防止層と割れ防止層が3層以上
からなり、下記の(A)に示す透明衝撃緩和積層体にお
いて、飛散防止層、割れ防止層、粘着剤層の構成順から
なり、各割れ防止層の積層順番は下記の(B)の式に示す
割れ防止層の各界面に接する上下層材料のせん断弾性率
比の対数の絶対値の総和が最も大きくなり、飛散防止性
ならびに割れ防止性を有することが好ましい。 (A)透明衝撃緩和積層体: 飛散防止層(1)/割れ防止層(2),割れ防止層
(3)・・・割れ防止層(n)/ 粘着剤層 (B)せん断弾性率(G)比の対数の絶対値 の総和 : |Log G1/G2|+|Log G2/G3|+・・・・+|Log Gn-1/Gn|+
|Log Gn/G粘着剤層| また本発明の透明衝撃緩和積層体は、粘着剤層/割れ防
止層/飛散防止層/反射防止または写り込み防止保護層
を基本構成として、電磁波シールドおよび/または近赤
外線遮蔽層を前記基本構成内に含むことが好ましい。Further, the transparent impact-relieving laminate of the present invention comprises at least three of the anti-scattering layer and the anti-cracking layer described in any of the above. The order of lamination of each crack prevention layer is the ratio of the shear elastic modulus of the upper and lower layer materials in contact with each interface of the crack prevention layer shown in the following formula (B). It is preferable that the sum of the absolute values of the logarithms is the largest, and that it has scattering prevention and crack prevention. (A) Transparent impact-mitigating laminate: anti-scattering layer (1) / anti-cracking layer (2), anti-cracking layer (3) ... anti-cracking layer (n) / adhesive layer (B) Shear modulus (G) ) Sum of absolute values of logarithm of ratio: | Log G1 / G2 | + | Log G2 / G3 | + ... + | Log Gn-1 / Gn | +
| Log Gn / G pressure-sensitive adhesive layer | The transparent shock-mitigating laminate of the present invention has an electromagnetic wave shield and / or an anti-reflection or anti-reflection protection layer based on a pressure-sensitive adhesive layer / break prevention layer / scatter prevention layer / anti-reflection or reflection prevention protection layer. Preferably, a near-infrared shielding layer is included in the basic structure.
【0016】また本発明の透明衝撃緩和積層体はプラズ
マディスプレイ用フィルターであることが好ましい。Further, the transparent impact-reducing laminate of the present invention is preferably a filter for a plasma display.
【0017】次に本発明のプラズマディスプレイ表示装
置は、前記のいずれかに記載の透明衝撃緩和積層体を貼
り合せたことを特徴とする。Next, a plasma display device according to the present invention is characterized in that the transparent shock absorbing laminate according to any one of the above is laminated.
【0018】また本発明のフラットディスプレイ表示装
置は、前記のいずれかに記載の透明衝撃緩和積層体を貼
り合せたことを特徴とする。According to a second aspect of the present invention, there is provided a flat display device comprising the transparent shock-absorbing laminate according to any one of the above.
【0019】[0019]
【発明の実施の形態】本発明者らは鋭意検討した結果、
本発明の飛散防止性ならびに割れ防止性の透明衝撃緩和
積層体は、鋼球の落下による79,000N(高さ1.5m×重
量510g)に相当する衝撃力により、破壊されるディス
プレイ表示装置のガラスパネル基板上に形成される透明
衝撃緩和積層体であって、前記積層体が、せん断弾性率
が2×108Pa以上である飛散防止層と、せん断弾性率
が1×104〜2×108Paの範囲で且つ2種類以上の
せん断弾性率の異なる割れ防止層と、透明な粘着剤層と
からなる透明な衝撃緩和積層体を形成することを見出し
た。さらに好ましくは、透明電磁波シールド層および/
または800〜1200nmの範囲の透過率が20%以下の近赤外
線遮蔽層を含むプラズマディスプレイフィルターならび
にそれを透明な粘着剤層を介して貼り合せたプラズマデ
ィスプレイ表示装置とすることを見出した。BEST MODE FOR CARRYING OUT THE INVENTION As a result of intensive studies, the present inventors have found that
The anti-scattering and anti-crack transparent shock absorbing laminate of the present invention is a glass panel of a display device which is broken by an impact force equivalent to 79,000 N (height: 1.5 m × weight: 510 g) due to falling of a steel ball. A transparent shock-mitigating laminate formed on a substrate, wherein the laminate comprises a scattering prevention layer having a shear modulus of 2 × 10 8 Pa or more, and a shear modulus of 1 × 10 4 to 2 × 10 8. It has been found that a transparent impact-reducing laminate comprising a crack-preventing layer in the range of Pa and having two or more kinds of different shear modulus and a transparent pressure-sensitive adhesive layer is formed. More preferably, a transparent electromagnetic wave shielding layer and / or
Alternatively, it has been found that a plasma display filter including a near-infrared shielding layer having a transmittance in the range of 800 to 1200 nm of 20% or less and a plasma display device in which the filter is bonded via a transparent adhesive layer.
【0020】本発明者らは、実際に安全規格を参考に
し、約510gの鋼球を1.5m高さから自由落下さ
せ、力センサーを用いてその衝撃力79000Nを実測
した。更にFPD用ガラス基板に鋼球落下による破壊試
験を行ない、ガラス基板が割れる限界衝撃力(または割
れない衝撃力)を測定した。その割れが発生する限界衝
撃力に対してどの程度衝撃緩和積層体で衝撃力を緩和す
ればよいか、その衝撃力緩和率を求めた。The present inventors actually dropped a steel ball of about 510 g from a height of 1.5 m from a height of 1.5 m and actually measured the impact force of 79000 N using a force sensor with reference to safety standards. Further, a destructive test was performed on the glass substrate for FPD by dropping a steel ball, and a limit impact force (or an impact force that does not break) at which the glass substrate was broken was measured. The impact relaxation rate was determined as to the extent to which the impact force should be relaxed by the impact relaxation laminate with respect to the limit impact force at which the crack occurs.
【0021】すなわち、衝撃緩和積層体の構成として飛
散防止層/割れ防止層/透明粘着剤層の基本構成からな
り、特に3層以上の場合、飛散防止層1/割れ防止層2
/割れ防止層3・・・・・・割れ防止層n/粘着剤層の構成
順では、各割れ防止層の形成順は、各割れ防止層界面に
接する上下層のせん断弾性率の比の対数の絶対値の総和
が大きくなる構成順番である。これは、鋼球落下による
衝撃力を多層構成で緩和する際、各界面に関して、せん
断弾性率の比の対数値が大きい方が、せん断応力が大き
くなることにより衝撃力が大きく緩和される。That is, the shock absorbing laminate has a basic structure of a scattering prevention layer / a crack prevention layer / a transparent pressure-sensitive adhesive layer. In particular, when there are three or more layers, the scattering prevention layer 1 / the crack prevention layer 2
In the order of the composition of the crack preventing layer n / the pressure-sensitive adhesive layer, the order of forming each crack preventing layer is the logarithm of the ratio of the shear modulus of the upper and lower layers in contact with each crack preventing layer interface. In the order in which the sum of the absolute values of This is because, when the impact force due to the steel ball falling is relieved in a multilayer structure, the greater the logarithmic value of the ratio of the shear elastic moduli at each interface, the greater the shear stress becomes, and the greater the impact force is, the more the impact force is relieved.
【0022】さらに飛散防止層を割れ防止層より前面
(表面側)に形成し、かつせん断弾性率(G)が2×1
08Pa以上にすることで、衝撃緩和積層体自体の破損
を無くし、ガラスの飛散防止機能を持たせ、かつ割れ防
止層として、せん断弾性率(G)が1×104〜2×1
08Paとすることでガラス基板の割れ防止機能を持た
せた。Further, a scattering prevention layer is formed on the front side (front side) of the crack prevention layer, and the shear modulus (G) is 2 × 1.
0 By the above 8 Pa, without damage to the shock-absorbing laminate itself, to have a scattering preventing function of the glass, and as cracking preventing layer, the shear modulus (G) is 1 × 10 4 ~2 × 1
By setting the pressure to 0 8 Pa, a function of preventing the glass substrate from cracking was provided.
【0023】さらに、上記衝撃緩和積層体としては51
0g鋼球を1.5m高さから落下させた衝撃力7900
0Nを100%として、その衝撃力を50%以下に緩和
させるに相当する衝撃緩和積層体をガラス基板上に形成
すれば、飛散防止が良好で、かつガラス基板が割れない
衝撃緩和積層体を見出した。Further, as the impact relaxation laminate, 51
Impact force 7900 dropped 0g steel ball from 1.5m height
By forming an impact-mitigating laminate on a glass substrate corresponding to reducing the impact force to 50% or less with 0N as 100%, an impact-mitigating laminate having good scattering prevention and not breaking the glass substrate is found. Was.
【0024】更に電磁波シールド性と近赤外線遮蔽性に
関しては、飛散防止層または割れ防止層の透明積層体の
いずれかの面に導電性金属メッシュまたはパターニン
グ金属メッシュを形成しさらに近赤外線を吸収する色素
を含有する層を設けた電磁波および近赤外線遮蔽層か、
または透明薄膜層/金属薄膜層の透明多層積層体すな
わち、銀系透明導電体膜と高屈折率透明薄膜を積層した
透明多層薄膜を前記透明衝撃緩和積層体と複合化するこ
とにより、又は金属メッシュ又はパターニング金属メッ
シュと近赤外線を吸収する色素と更に透明多層積層体又
は金属メッシュ又はパターニング金属メッシュと近赤外
線を反射する透明薄膜層/金属薄膜層の透明多層積層体
とを複合化することにより、可視光線透過率が40%以
上、可視光線反射率が5%以下、800nmから120
0nmの領域の近赤外線透過率が20%以下にすること
ができ、すなわち、飛散防止性、割れ防止性を備えた電
磁波および/または近赤外線を遮蔽するPDPフィルタ
ーを完成するに至った。Further, with respect to the electromagnetic wave shielding property and the near infrared ray shielding property, a conductive metal mesh or a patterned metal mesh is formed on either surface of the transparent laminate of the scattering prevention layer or the crack prevention layer, and a dye that absorbs near infrared rays. Or an electromagnetic wave and near-infrared shielding layer provided with a layer containing
Or a transparent multilayer laminate of a transparent thin film layer / a metal thin film layer, that is, a transparent multilayer thin film obtained by laminating a silver-based transparent conductor film and a high-refractive-index transparent thin film with the transparent shock absorbing laminate, or a metal mesh. Or by complexing a transparent metal layer and a dye that absorbs near-infrared light and a transparent multi-layer laminate or a metal mesh or patterned metal mesh and a transparent thin-film layer that reflects near-infrared light / a metal thin film layer. Visible light transmittance is 40% or more, visible light reflectance is 5% or less, from 800 nm to 120
The near-infrared transmittance in the region of 0 nm can be reduced to 20% or less, that is, a PDP filter that shields electromagnetic waves and / or near-infrared rays with scattering prevention and crack prevention has been completed.
【0025】すなわち本発明の好ましい例は、 PDP
のガラスパネル基板上に透明衝撃緩和積層体を形成し、
かつ510g鋼球の1.5m高さから自由落下する衝撃力
79000Nを50%以下に低減する飛散防止ならびに
割れ防止ならびに電磁波シールド効果と近赤外線を遮蔽
すること特徴とするPDP用フィルターならびにそれを
用いたPDPディスプレイ装置を提供するものである。That is, a preferred example of the present invention is a PDP
Forming a transparent shock-mitigating laminate on a glass panel substrate,
And a PDP filter characterized in that the impact force of free fall from a height of 1.5m of a 510g steel ball to 79000N is reduced to 50% or less, and that the scatter prevention and crack prevention, the electromagnetic wave shielding effect and the shielding of near-infrared rays are prevented and the use thereof. The present invention provides a PDP display device.
【0026】以下本発明の具体的な構成を説明する。図
1に本発明の一実施例の衝撃緩和積層体の模式的断面図
を示す。図1において、本発明の衝撃緩和積層体は、飛
散防止層5/割れ防止層1/割れ防止層2/粘着剤層3
から構成され、FPDパネルガラス基板4に貼り付けて
使用される。Hereinafter, a specific configuration of the present invention will be described. FIG. 1 is a schematic cross-sectional view of an impact relaxation laminate according to one embodiment of the present invention. In FIG. 1, the impact relaxation laminate of the present invention comprises a scattering prevention layer 5 / a crack prevention layer 1 / a crack prevention layer 2 / an adhesive layer 3
And used by sticking to the FPD panel glass substrate 4.
【0027】次に図2A、B1、B2、Cに本発明の衝
撃緩和積層体の具体例を示す。上から反射防止(AR)ま
たは写り込み防止層(AG)による保護層/飛散防止層/
割れ防止層1/割れ防止層2/粘着剤層を基本とした構
成であり、PDPガラス基板に貼り合わせて使用され
る。なお電磁波シールド層および/または近赤外線遮蔽
層は、任意の層の間に挿入することができる。Next, FIGS. 2A, B1, B2, and C show specific examples of the impact relaxation laminate of the present invention. Protective layer with anti-reflection (AR) or anti-reflection layer (AG) from above / shatterproof layer /
It has a structure based on a crack preventing layer 1 / a crack preventing layer 2 / an adhesive layer, and is used by being bonded to a PDP glass substrate. The electromagnetic wave shielding layer and / or the near infrared ray shielding layer can be inserted between any layers.
【0028】電磁波シールド材としては、電磁波シール
ド効果は10dB以上好ましくは20dB以上である。
例えば42インチのPDP単体からの放射電界強度が4
0〜50dBμV/mである場合、10dB以上好ましく
は20dB以上のシールド効果を有する電磁波シールド
材が必要である。すなわち、30〜1000MHz範囲の
特に30〜230MHzにおいてVCCI規制値(10m法)
では、クラスAでは40dBμV/m以下であり、マージ
ン6〜7dBを考えるとPDP単体の放射電界強度が4
0−50dBに対して、シールド効果は10以上、好ま
しくは20dBであることがわかる。なお相対値として
シールド効果10dB以上に必要な表面抵抗率は10Ω
/□以下であり、好ましくは3Ω/□以下である。The electromagnetic wave shielding material has an electromagnetic wave shielding effect of 10 dB or more, preferably 20 dB or more.
For example, the radiated electric field intensity from a 42-inch PDP alone is 4
In the case of 0 to 50 dBV / m, an electromagnetic wave shielding material having a shielding effect of 10 dB or more, preferably 20 dB or more is required. That is, the VCCI regulation value (10 m method) especially in the range of 30 to 230 MHz in the range of 30 to 1000 MHz.
In the class A, it is 40 dBμV / m or less. Considering the margin of 6 to 7 dB, the radiated electric field strength of the PDP alone is 4 dB.
It can be seen that the shielding effect is 10 or more, preferably 20 dB with respect to 0-50 dB. The surface resistivity required for a shield effect of 10 dB or more as a relative value is 10Ω.
/ □ or less, preferably 3Ω / □ or less.
【0029】またNIR遮蔽性としては、家電ならびに
光通信の誤動作防止として、800―1200nmが2
0%以下好ましくは10%以下が好ましい。As for the NIR shielding property, 800-1200 nm is 2 to prevent malfunction of home appliances and optical communication.
0% or less, preferably 10% or less.
【0030】このような電磁波遮蔽性10dB以上のシ
ールド効果を示しさらに近赤外線800−1200nm
を20%以下まで遮蔽する材料であれば特に限定はな
い。The shielding effect of the electromagnetic wave shielding property of 10 dB or more is exhibited, and the near-infrared ray is 800-1200 nm.
Is not particularly limited as long as it is a material that shields up to 20% or less.
【0031】具体的には、電磁波シールド材および/ま
たは近赤外線遮蔽層として、電磁波シールド層は金属メ
ッシュならびにパターニング金属メッシュからなる場
合、近赤外線遮蔽としては近赤外線800−12000
nmの広範囲の透過率を20%以下にするには染料、顔
料等の色素を複数用いる必要がある。さらにこれとは別
に赤外線域を反射するITO、ATOなどの導電性微粒子を熱
可塑、熱硬化、UVまたはEB硬化樹脂中に分散させた赤外
線反射材に前記近赤外線吸収染料、顔料等の色素を複合
化させたもの、更に近赤外線を反射する透明薄膜層/金
属薄膜層からなる透明多層積層体なども用いられる。More specifically, when the electromagnetic wave shielding layer is made of a metal mesh and a patterned metal mesh as the electromagnetic wave shielding material and / or the near infrared ray shielding layer, the near infrared ray is shielded from the near infrared ray 800-12000.
In order to reduce the transmittance over a wide range of nm to 20% or less, it is necessary to use a plurality of dyes such as dyes and pigments. Further, apart from this, the near-infrared absorbing dye, a pigment or the like is added to an infrared reflecting material obtained by dispersing conductive fine particles such as ITO and ATO that reflect the infrared region in a thermoplastic, thermosetting, UV or EB curing resin. A composite, a transparent multi-layer laminate composed of a transparent thin film layer / metal thin film layer that reflects near infrared rays and the like are also used.
【0032】さらに別の電磁波シールド材および/また
は近赤外線遮蔽層としては、透明薄膜層と銀系透明導電
体層からなる金属層とを1単位としてn単位(2≦n≦
5)が積層した透明多層薄膜であり、具体的には構成と
しては、金属層/透明薄膜層または透明薄膜層/金属層
/透明薄膜層あるいは金属層/透明薄膜層/金属層の構
成を基本として、これらを2回以上繰り返した構成から
なる。すなわち、金属層が1層の透明薄膜2層の構成で
は電磁波シールド効果が悪く、かつ近赤外線遮蔽性は広
範囲において20%以下にならない。なお金属層厚みを
厚くして、シールド効果を満足しても、可視光反射率が
増加し、透過率が低下する課題があり、近赤外線の遮蔽
が不充分である。As another electromagnetic wave shielding material and / or near-infrared shielding layer, n units (2 ≦ n ≦ n) of a transparent thin film layer and a metal layer composed of a silver-based transparent conductor layer as one unit.
5) is a laminated transparent multi-layered thin film, and more specifically, the structure is basically a metal layer / transparent thin film layer or a transparent thin film layer / metal layer / transparent thin film layer or a metal layer / transparent thin film layer / metal layer. And a configuration in which these are repeated two or more times. In other words, in the case of a structure having two transparent thin films with one metal layer, the electromagnetic wave shielding effect is poor, and the near-infrared shielding property does not become 20% or less in a wide range. Even if the shielding effect is satisfied by increasing the thickness of the metal layer, there is a problem that the visible light reflectance increases and the transmittance decreases, and the shielding of near-infrared rays is insufficient.
【0033】このような、透明積層体としては、まず透
明薄膜層の材料としては、光学的な透明性を有するもの
であれば使用できる。膜の屈折率は光学設計において所
望の光学特性を達成しやすいものに選べばよく、各層の
材料や屈折率がそれぞれ異なっていてもよい。また単一
の材料でも複数材料を焼結した材料を用いてもよい。さ
らに、金属薄膜層のマイグレーション防止効果や水、酸
素のバリア効果がある材料ならさらによい。好適な材料
としては、酸化インジウム、酸化錫、二酸化チタン、酸
化セリウム、酸化ジルコニウム、酸化亜鉛、酸化タンタ
ル、5酸化ニオブ、二酸化珪素、窒化珪素、酸化アルミ
ニウム、フッ化マグネシウム、酸化マグネシウムよりな
る群から選ばれる1又は2以上の化合物からなる薄膜で
あれば好適に使用できる。特に酸化インジウムを主成分
とし二酸化チタンや、酸化錫、酸化セリウムを少量含有
させたものは金属薄膜層の劣化防止効果があるばかり
か、電気導電性を有するため、金属薄膜層との間の電気
的導通が取り易いという観点から特に好ましい。これら
の透明薄膜層は、スパッタリング法、真空蒸着法、イオ
ンプレーティング法等の真空ドライプロセスや湿式法な
どを用いて設けることができるが、膜厚の制御性、均一
性の観点から特にスパッタリング法が好ましい。このよ
うな透明薄膜層の厚みは10nmから100nmの範囲が
好ましい。As such a transparent laminate, any material having optical transparency can be used as the material of the transparent thin film layer. The refractive index of the film may be selected so as to easily achieve desired optical characteristics in the optical design, and the materials and the refractive indexes of the respective layers may be different. A single material or a material obtained by sintering a plurality of materials may be used. Further, a material having a migration preventing effect of the metal thin film layer and a barrier effect of water and oxygen is more preferable. Suitable materials include those from the group consisting of indium oxide, tin oxide, titanium dioxide, cerium oxide, zirconium oxide, zinc oxide, tantalum oxide, niobium pentoxide, silicon dioxide, silicon nitride, aluminum oxide, magnesium fluoride, magnesium oxide. Any thin film composed of one or more selected compounds can be suitably used. In particular, those containing indium oxide as a main component and a small amount of titanium dioxide, tin oxide, or cerium oxide not only have an effect of preventing the deterioration of the metal thin film layer, but also have electrical conductivity, and thus have an electric conductivity between the metal thin film layer and the metal thin film layer. It is particularly preferable from the viewpoint of easy electrical conduction. These transparent thin film layers can be provided by using a vacuum drying process such as a sputtering method, a vacuum evaporation method, or an ion plating method, or a wet method. Is preferred. The thickness of such a transparent thin film layer is preferably in the range of 10 nm to 100 nm.
【0034】また金属薄膜層は、銀単体又は銀を主成分
とする合金からなり、80重量%以上の銀と、金、銅、
パラジウム、白金、マンガン、カドミウムから選択され
た1つまたは2つ以上の元素により構成されるが、80〜
99重量%の銀と上記金属1〜20重量%を固溶させた材
料であるのが好ましい。特に銀中に1〜20重量%の金を
固溶させたものは、銀の劣化防止の観点から好ましい。
例えば金を20重量%以上混入すると着色のため透明性
が損なわれやすく、また1重量%以下では銀の劣化が起
こりやすい。銀系透明導電体膜を形成する手段として
は、スパッタリング法などの真空ドライプロセスが用い
られる。銀系透明導電体膜の厚さは、1〜30nmが適
当であるが、さらに好ましくは5〜20nmである。The metal thin film layer is made of silver alone or an alloy containing silver as a main component, and contains 80% by weight or more of silver, gold, copper,
Palladium, platinum, manganese, composed of one or more elements selected from cadmium,
The material is preferably a solid solution of 99% by weight of silver and 1 to 20% by weight of the above metal. In particular, a solid solution of 1 to 20% by weight of gold in silver is preferable from the viewpoint of prevention of silver deterioration.
For example, when 20% by weight or more of gold is mixed, transparency is easily lost due to coloring, and when 1% by weight or less, silver is easily deteriorated. As a means for forming the silver-based transparent conductor film, a vacuum dry process such as a sputtering method is used. The thickness of the silver-based transparent conductor film is suitably from 1 to 30 nm, more preferably from 5 to 20 nm.
【0035】このような基本的に透明薄膜層と銀系金属
層からなる透明多層薄膜層を設けることで、電磁波シー
ルド効果10dB以上と近赤外線遮蔽性特に800〜1200n
m範囲の透過率が20%以下が両立できる。なおこのよ
うな構成の可視光透過率は40%以上でかつ近赤外線透
過率は20%以下好ましくは10%以下である。By providing such a transparent multilayer thin film layer consisting essentially of a transparent thin film layer and a silver-based metal layer, an electromagnetic wave shielding effect of 10 dB or more and a near-infrared shielding property, particularly 800 to 1200 n
The transmittance in the m range can be both 20% or less. The visible light transmittance of such a configuration is 40% or more and the near infrared transmittance is 20% or less, preferably 10% or less.
【0036】なお、透明多層薄膜層を飛散防止層ならび
に割れ防止層のいずれかの面に形成する際、密着性を上
るために、透明性を低減させない程度の金属層10nm
以下を形成したり、飛散防止層、割れ防止層の表面をコ
ロナ処理、プラズマ処理ならびに公知技術である易接着
処理などを実施しても良い。When the transparent multilayer thin film layer is formed on any one of the scattering prevention layer and the crack prevention layer, the metal layer has a thickness of 10 nm which does not decrease the transparency in order to increase the adhesion.
The following may be formed, or the surfaces of the scattering prevention layer and the crack prevention layer may be subjected to a corona treatment, a plasma treatment, and a well-known easy adhesion treatment.
【0037】また最終構成フィルターの反射率を増加さ
せないために、透明多層薄膜層を形成する、飛散防止層
あるいは割れ防止層の上に屈折率が1.50以下の低屈
折率層をλ/4n±15%の光学厚みで形成しても良
い。In order not to increase the reflectivity of the filter of the final constitution, a low refractive index layer having a refractive index of 1.50 or less is formed on a scattering prevention layer or a crack prevention layer to form a transparent multilayer thin film layer. It may be formed with an optical thickness of ± 15%.
【0038】本発明のPDPフィルターに電磁波シール
ド効果が必要な場合は、上記の金属層と透明薄膜層から
なる透明多層薄膜、または金属メッシュおよびパターニ
ング金属メッシュの四辺ならびに側面に設ける電極に用
いる材料としては、導電性があり、かつ耐腐食性、耐湿
熱保存性が良好であり、透明多層薄膜に対する密着性が
良いものであれば特に制限はないが、具体例としては、
銀ペーストや、金、銀、銅、白金、パラジウム等の1つ
または2つ以上の金属よりなる合金、有機系コート剤に
金、銀、銅、白金、パラジウム等の1つまたは2つ以上
の金属の合金を混合したもの、銅メッシュに粘着剤を塗
布、含浸する等の方法により作製される導電両面テー
プ、等が挙げられる。電極形成の方法としては、例えば
導電両面テープの場合であれば透明多層薄膜の四辺に直
接貼り合せ、銀ペーストや各種合金材料、合金混合材料
等の場合はスクリーン印刷やマイクログラビア塗工法な
どで形成するウエットプロセス法、真空蒸着法、スパッ
タリング法等のドライプロセス法、メッキ法等、従来公
知の方法を用いる事が出来る。電極の厚さは特に限定さ
れないが、図2A〜Cに示すように飛散防止層の下側に
なる場合は、割れ防止層+透明粘着剤層の厚さと同じ
か、それよりやや薄いほうが望ましい。また飛散防止層
の上側にくる場合は、AR,AG保護層厚みまたはA
R,AGフィルム+粘着剤層厚みの厚さと同じかそれよ
りやや薄いほうが望ましい。When the PDP filter of the present invention requires an electromagnetic wave shielding effect, it may be used as a material for the transparent multilayer thin film composed of the above-mentioned metal layer and the transparent thin film layer, or for the electrodes provided on the four sides and side surfaces of the metal mesh and the patterned metal mesh. Is conductive, and corrosion resistance, moisture and heat storage stability is good, there is no particular limitation as long as it has good adhesion to the transparent multilayer thin film, but as specific examples,
Silver paste, alloys composed of one or more metals such as gold, silver, copper, platinum and palladium, and one or more metals such as gold, silver, copper, platinum and palladium applied to organic coating agents Examples thereof include a mixture of a metal alloy and a conductive double-sided tape produced by a method such as applying and impregnating a copper mesh with an adhesive. As a method of forming an electrode, for example, in the case of a conductive double-sided tape, it is directly bonded to four sides of a transparent multilayer thin film, and in the case of a silver paste, various alloy materials, alloy mixed materials, etc., it is formed by screen printing or microgravure coating method. A conventionally known method such as a wet process method, a vacuum deposition method, a dry process method such as a sputtering method, and a plating method can be used. Although the thickness of the electrode is not particularly limited, when it is below the scattering prevention layer as shown in FIGS. 2A to 2C, it is preferable that the thickness is equal to or slightly smaller than the thickness of the crack prevention layer + the transparent pressure-sensitive adhesive layer. When it is above the scattering prevention layer, the thickness of the AR or AG protective layer or A
It is desirable that the thickness be equal to or slightly smaller than the thickness of the R, AG film + adhesive layer.
【0039】なお、PDPフィルターとして、電磁波効
果が不要で近赤外線遮蔽のみ必要な場合は、電極を形成
する必要がない。When the PDP filter does not require the electromagnetic wave effect and only needs to block near infrared rays, it is not necessary to form an electrode.
【0040】ただ、電磁波シールド層機能がPDPフィ
ルターとして要求される場合は、電磁波シールド層とし
ての透明薄膜層/金属薄膜層からなる透明多層積層体上
に電極を設け、PDP筐体へ電気的に接続する必要があ
る。However, when the function of an electromagnetic wave shielding layer is required as a PDP filter, electrodes are provided on a transparent multilayer laminate composed of a transparent thin film layer / metal thin film layer as an electromagnetic wave shielding layer, and electrically connected to a PDP housing. Need to connect.
【0041】たとえば、図2A〜Cに示す電磁波シールト
゛層が飛散防止層の上にある時はARまたはAG保護層
は 電極部以外に形成される必要がある。また電磁波
シールド層が飛散防止層の下にある時は、割れ防止層ま
たは粘着剤層は電極部以外に形成する必要がある。For example, when the electromagnetic wave shield layer shown in FIGS. 2A to 2C is on the scattering prevention layer, the AR or AG protective layer needs to be formed other than the electrode portion. When the electromagnetic wave shielding layer is under the scattering prevention layer, it is necessary to form the crack prevention layer or the pressure-sensitive adhesive layer other than the electrode portion.
【0042】ちなみに、PDPに電磁波シールド機能が
いらない場合は、近赤外線遮蔽層として上記透明薄膜/
金属薄膜の透明多層積層体に電極は不要なため、形成層
の場所は特に限定はない。Incidentally, when the PDP does not need an electromagnetic wave shielding function, the transparent thin film /
Since no electrode is necessary for the transparent multilayer laminate of metal thin films, the location of the formation layer is not particularly limited.
【0043】まず飛散防止層としては、透過率70%以
上と透明性に優れ、機械的強度に優れ、耐熱性の良好な
プラスチックフィルム、たとえばポリエチレンナフタレ
ート(PEN)樹脂、ポリエチレンテレフタレート(P
ET)樹脂などのポリエステル樹脂、(メタ)アクリル
樹脂、ポリカーボネート(PC)樹脂、トリアセチルセ
ルロース(TAC)、ノルボルネン系樹脂、エポキシ樹
脂、ポリイミド樹脂、ポリエーテルイミド樹脂、ポリア
ミド樹脂、ポリスルフォン、ポリフェニレンサルファイ
ド、ポリエーテルスルフォン、などからなるフィルムが
用いられる。この透明フィルム基材は、単層であっても
2層以上の複合層であってもよい。また特に下記材料物
性を満たせば、材料限定は特にない。First, as the scattering prevention layer, a plastic film excellent in transparency and excellent in mechanical strength and heat resistance, such as polyethylene naphthalate (PEN) resin, polyethylene terephthalate (P)
Polyester resin such as ET) resin, (meth) acrylic resin, polycarbonate (PC) resin, triacetyl cellulose (TAC), norbornene-based resin, epoxy resin, polyimide resin, polyetherimide resin, polyamide resin, polysulfone, polyphenylene sulfide , Polyethersulfone, etc. are used. This transparent film substrate may be a single layer or a composite layer of two or more layers. The material is not particularly limited as long as the following material properties are satisfied.
【0044】特に79000Nに相当する衝撃力による鋼球
落下により、飛散防止性すなわち破損しない(貫通しな
い)ことに重要な機械特性として、動的粘弾性測定にお
ける、せん断弾性率Gが2×108Pa以上であることが
必要である。これ以下ではPDPパネルガラス基板上に
透明粘着剤層を介して、飛散防止層を形成した場合、51
0gの鋼球による1.5m高さからの自由落下により破
壊が発生、すなわち貫通し、穴があき飛散防止性が不十
分であり、更に穴発生による感電の課題がある。上記せ
ん断弾性率については、(セイコーインスツルメンツ社
製)動的粘弾性測定装置DMS120を用い、 周波数1
Hzにおける25℃± 3℃でのせん断弾性率Gの測定
値である。なお一般的には引っ張り弾性率E=3G(せ
ん断弾性率)の関係があり、引っ張り弾性率Eは、上記
せん断弾性率Gの約3倍程度である。In particular, as a mechanical property important for preventing scattering, that is, not breaking (not penetrating) due to falling of a steel ball by an impact force equivalent to 79,000 N, the shear modulus G in dynamic viscoelasticity measurement is 2 × 10 8. It must be Pa or more. Below this, when a scattering prevention layer is formed on a PDP panel glass substrate via a transparent adhesive layer, 51
Destruction occurs due to free fall from a height of 1.5 m by a 0 g steel ball, that is, penetration occurs, holes are not formed, scattering prevention is insufficient, and there is a problem of electric shock due to generation of holes. The shear modulus was measured using a dynamic viscoelasticity measuring device DMS120 (manufactured by Seiko Instruments Inc.)
It is a measured value of the shear modulus G at 25 ° C. ± 3 ° C. in Hz. In general, there is a relationship of tensile elastic modulus E = 3G (shear elastic modulus), and the tensile elastic modulus E is about three times the shear elastic modulus G.
【0045】なお、本飛散防止層は構成的にPDPの表
面側になるため、PDPの画像表示の劣化を抑制するた
め、公知技術である反射防止層 として可視光反射率が
5%以下、好ましくは3%以下の処理をしても良く、ま
たは外光の写り込み防止としてヘイズが5%以下の防眩
処理をしても良い。また表面保護機能として、表面(鉛
筆)硬度がH以上が好ましく、公知のハードコート材な
ど使用しても良い。なおハードコート(HC)層は飛散
防止層の片面または両面に設けても良い。用いるハード
コート材は、UV,EB硬化タイプでも熱硬化タイプで
も良い。UV硬化タイプとしては、例えばエステル系、
アクリル系、ウレタン系、アミド系、シリコーン系やエ
ポキシ系などのモノマーやオリゴマーに光重合開始剤を
配合したもの、あるいはアクリル・ウレタン系やアクリ
ル・エポキシ系のように前記モノマーやオリゴマーに光
重合開始剤を配合したもの等があげられる。EB硬化に
は重合開始剤は一般に使用しない。熱硬化タイプとして
は、例えばフェノール系、尿素系、メラミン系、不飽和
ポリエステル系、ポリウレタン系、エポキシ系等の樹脂
に、必要に応じて架橋剤、重合開始剤、重合促進剤、溶
剤、粘度調整剤等を配合したもの等があげられる。Since this scattering prevention layer is constitutively located on the surface side of the PDP, in order to suppress deterioration of the image display of the PDP, a visible light reflectance of 5% or less is preferable as an antireflection layer which is a known technique. May be subjected to a treatment of 3% or less, or may be subjected to an anti-glare treatment with a haze of 5% or less to prevent reflection of external light. As the surface protection function, the surface (pencil) hardness is preferably H or more, and a known hard coat material or the like may be used. The hard coat (HC) layer may be provided on one side or both sides of the scattering prevention layer. The hard coat material to be used may be a UV or EB curing type or a thermosetting type. As the UV curing type, for example, ester type,
Acrylic, urethane, amide, silicone and epoxy monomers and oligomers mixed with a photopolymerization initiator, or acrylic / urethane and acrylic / epoxy monomers start photopolymerization And the like. No polymerization initiator is generally used for EB curing. As the thermosetting type, for example, phenol-based, urea-based, melamine-based, unsaturated polyester-based, polyurethane-based, epoxy-based resins, etc., if necessary, a crosslinking agent, a polymerization initiator, a polymerization accelerator, a solvent, a viscosity adjustment And the like.
【0046】またシリコーン系をアクリル樹脂と化学結
合化させた無機・有機ハイブイッド樹脂ならびに透明性
を損なわない酸化珪素、酸化ジルコニア、ITO、酸化
錫などの無機物微粒子を分散させた上記樹脂なども使用
できる。なお、HC層には、レベリング剤、帯電防止
剤、紫外線吸収剤、などを添加しても良い。基本的には
飛散防止層の上か下の片面または両面に構成するので密
着性をあげるために、HC層中にカルボキシル基、りん
酸基、ヒドロキシル基、アミノ基、イソシアネート基な
ど含有する添加剤を使用しても良い。Inorganic / organic hybrid resins in which a silicone resin is chemically bonded to an acrylic resin, and the above resins in which inorganic fine particles such as silicon oxide, zirconia, ITO and tin oxide which do not impair the transparency are dispersed. . Note that a leveling agent, an antistatic agent, an ultraviolet absorber, and the like may be added to the HC layer. Basically, it is formed on one or both surfaces under or above the shatterproof layer. To improve adhesion, an additive containing a carboxyl group, phosphate group, hydroxyl group, amino group, isocyanate group, etc. in the HC layer May be used.
【0047】HC層の厚さは0.1〜20μmが適当であ
り、1〜10μmであることがより好ましい。The thickness of the HC layer is suitably from 0.1 to 20 μm, and more preferably from 1 to 10 μm.
【0048】更にAG,AR処理表面には指紋付着等の
汚れ防止として防汚染処理をしても良い。なお、上記反
射防止または写り込み防止などの機能を有するフィルム
を透明な粘着剤層を介して形成しても良い。Further, the AG and AR treated surfaces may be subjected to anti-staining treatment to prevent stains such as adhesion of fingerprints. Note that a film having a function of preventing reflection or reflection may be formed via a transparent pressure-sensitive adhesive layer.
【0049】反射防止層の低屈折率層に関しては、例え
ばマイクログラビア塗工法などで形成するウエットプロ
セスで形成しても、真空蒸着法、スパッタリング法等の
ドライプロセスで形成してもよく、可視光透過性と耐久
性、密着性に優れているものであれば、無機系、有機系
にかかわらず好適に使用でき、特に限定されるものでは
ない。屈折率は1.50以下であり、1.45以下であ
る事が好ましい。低屈折率の有機系材料の具体例として
は、モノマーとして、フルオロエチレン、ビニリデンフ
ルオライド、テトラフルオロエチレン等を使用し重合し
た含フッ素ポリマー、(メタ)アクリル酸の部分または
完全フッ素化アルキルエステル類、含フッ素シリコー
ン、等があげられるがこれらに限定されるものではな
い。また低屈折率の無機系材料の具体例としては、Mg
F2、CaF2、SiO2等が挙げられるがこれらに限定
されるものではない。低屈折率層の厚さは1μm以下で
ある事が好ましく、0.5μm以下である事がさらに好
ましい。The low refractive index layer of the antireflection layer may be formed by a wet process formed by, for example, a microgravure coating method, or by a dry process such as a vacuum deposition method or a sputtering method. As long as it is excellent in permeability, durability and adhesion, it can be suitably used irrespective of inorganic or organic type, and is not particularly limited. The refractive index is 1.50 or less, and preferably 1.45 or less. Specific examples of the organic material having a low refractive index include a fluorine-containing polymer polymerized using fluoroethylene, vinylidene fluoride, tetrafluoroethylene, or the like as a monomer, a partially or completely fluorinated alkyl ester of (meth) acrylic acid. , Fluorinated silicones, etc., but are not limited thereto. Further, as a specific example of the low refractive index inorganic material, Mg
Examples include, but are not limited to, F 2 , CaF 2 , and SiO 2 . The thickness of the low refractive index layer is preferably 1 μm or less, more preferably 0.5 μm or less.
【0050】また低屈折率層の上に汚染防止層を形成し
てもよい。汚染防止層の材料としては、有機ポリシロキ
サン系重合体またはパーフルオロアルキル含有重合体か
らなる硬化物、パーフルオロアルキル基を有するアルコ
キシシラン化合物、パーフロポリエーテル基と反応性の
シリル基を有する化合物、ポリフルオロアルキル基を含
むモノ及びジシラン化合物などが挙げられる。汚染防止
層の厚さは0.001〜0.5μmが好ましく、0.0
02〜0.1μmであることがより好ましい。Further, a contamination prevention layer may be formed on the low refractive index layer. As the material of the stain prevention layer, a cured product composed of an organic polysiloxane-based polymer or a perfluoroalkyl-containing polymer, an alkoxysilane compound having a perfluoroalkyl group, a compound having a silyl group reactive with a perfluoropolyether group, Mono- and disilane compounds containing a polyfluoroalkyl group are exemplified. The thickness of the contamination prevention layer is preferably 0.001 to 0.5 μm,
It is more preferable that the thickness be from 02 to 0.1 μm.
【0051】反射防止層の高屈折率層および高屈折率防
眩層は、例えばマイクログラビア塗工法などで形成する
ウエットプロセスで形成しても、真空蒸着法、スパッタ
リング法等のドライプロセスで形成してもよく、可視光
透過性と耐久性、密着性に優れているものであれば、無
機系、有機系にかかわらず好適に使用でき、特に限定さ
れるものではない。The high-refractive-index layer and the high-refractive-index antiglare layer of the antireflection layer may be formed by a wet process formed by, for example, a microgravure coating method, or by a dry process such as a vacuum evaporation method or a sputtering method. As long as it has excellent visible light transmission, durability and adhesion, it can be suitably used regardless of inorganic or organic type, and is not particularly limited.
【0052】屈折率は1.5以上であり、1.60以上
である事が好ましい。高屈折率の有機系材料の具体例と
しては、ウレタン(メタ)アクリレート、ポリエステル
(メタ)アクリレート、ポリエーテル(メタ)アクリレ
ート等のアクリロイル基、メタクリロイル基を2個以上
含んだ多官能重合性化合物を紫外線、電子線等の活性エ
ネルギー線によって重合硬化させたものや、シリコン
系、メラミン系、エポキシ系の架橋性樹脂原料を熱によ
って架橋硬化させたものなどが挙げられるが、これも特
に限定されるものではない。また、無機系材料の具体例
としては、主に酸化インジウムを主成分とし、二酸化チ
タン、酸化錫、酸化セリウムを少量含有させたものやC
eF3、Al2O3、MgO、TiO2、ZnO等があげら
れる。さらに、無機微粒子を有機化合物中に分散させた
ものでも良い。有機化合物としては上記有機系材料が使
用でき、無機微粒子の例としてはアルミニウム、チタ
ン、ジルコニウム、アンチモン等の金属の酸化物粒子が
好ましく用いられる。高屈折率層の厚みは50μm以下
である事が好ましく、10μm以下である事がさらに好
ましい。The refractive index is 1.5 or more, preferably 1.60 or more. Specific examples of the organic material having a high refractive index include polyfunctional polymerizable compounds containing two or more acryloyl groups and methacryloyl groups such as urethane (meth) acrylate, polyester (meth) acrylate, and polyether (meth) acrylate. Examples thereof include those obtained by polymerization and curing with active energy rays such as ultraviolet rays and electron beams, and those obtained by crosslinking and curing silicone-based, melamine-based, and epoxy-based crosslinkable resin raw materials by heat, but these are also particularly limited. Not something. Specific examples of the inorganic material include a material mainly containing indium oxide and a small amount of titanium dioxide, tin oxide, and cerium oxide.
eF 3 , Al 2 O 3 , MgO, TiO 2 , ZnO and the like can be mentioned. Further, inorganic fine particles may be dispersed in an organic compound. As the organic compound, the above-mentioned organic materials can be used. As examples of the inorganic fine particles, metal oxide particles such as aluminum, titanium, zirconium, and antimony are preferably used. The thickness of the high refractive index layer is preferably 50 μm or less, more preferably 10 μm or less.
【0053】また飛散防止層は視角方向の表面側に形成
されかつPDPの画像特性や表面機能に関与するため、
表面硬度処理、低反射防止処理、写り込み防止処理、電
磁波シールド処理、帯電防止処理、汚染防止処理などの
公知技術による塗工ならびに真空薄膜形成処理が必要に
なるため、耐熱性80℃以上が好ましい。Since the scattering prevention layer is formed on the surface side in the viewing angle direction and is involved in the image characteristics and surface functions of the PDP,
Heat resistance of 80 ° C. or higher is preferred because coating and vacuum thin film formation by known techniques such as surface hardness treatment, low reflection prevention treatment, reflection prevention treatment, electromagnetic wave shielding treatment, antistatic treatment, and contamination prevention treatment are required. .
【0054】なお、図2B1、B2に示すように、飛散
防止層上にシールド層および/または近赤外線遮蔽層を
形成する場合、飛散防止層上にHC層を設けてシールド
層を形成するか飛散防止層/シールド層/HC層の順に
形成しても良い。更に最表面のAR又はAG層をシール
ド層上に設ける場合、密着性を上るために、リン酸基を
含む材料をAR又はAG材に添加しても良い。As shown in FIGS. 2B1 and 2B, when a shield layer and / or a near-infrared shielding layer is formed on the shatterproof layer, an HC layer is provided on the shatterproof layer to form the shield layer or the shatter layer. It may be formed in the order of prevention layer / shield layer / HC layer. Further, when the outermost AR or AG layer is provided on the shield layer, a material containing a phosphate group may be added to the AR or AG material in order to improve the adhesion.
【0055】次に、割れ防止層としては、透過率が60
%以上と透明性に優れ、かつ動的粘弾性によるせん断弾
性率Gが1×104Pa〜2×108Paの範囲であることが
好ましい。Next, as the crack prevention layer, the transmittance is 60%.
% Or more, and the shear modulus G by dynamic viscoelasticity is preferably in the range of 1 × 10 4 Pa to 2 × 10 8 Pa.
【0056】すなわち、1×104Pa未満のせん断弾性
率では、柔らすぎてシート化などの打ち抜きならびに裁
断の際に加工しにくく、エッジ部のはみ出しなどの課題
がある。That is, if the shear modulus is less than 1 × 10 4 Pa, it is too soft to be easily processed at the time of punching or cutting such as sheeting, and there is a problem that the edge portion protrudes.
【0057】一方、2×108Paを越えると、逆に79000
Nの衝撃力を緩和する能力がなく、PDPのガラス基板
が割れてしまう。なお割れない厚みとしては衝撃緩和層
のみで2mm以上と厚くなってしまい画像劣化の課題が
ある。On the other hand, when it exceeds 2 × 10 8 Pa,
There is no ability to reduce the impact force of N, and the glass substrate of PDP is broken. In addition, the thickness which does not crack becomes as thick as 2 mm or more only by the impact relaxation layer, and there is a problem of image deterioration.
【0058】なお、割れ防止層としては、上記特性範囲
に入るものであれば、特に材料を限定するものでない。The material of the crack preventing layer is not particularly limited as long as it falls within the above-mentioned characteristic range.
【0059】このような透明割れ防止層としては、エチ
レンーメタクリル酸コポリマーの分子間を金属イオン
(Na+、Zn2+等)で架橋したアイオノマ−樹脂、や
EVA(エチレンー酢ビコポリマ)、PVC塩ビ、EE
A(エチレンアクリレートコポリマ)、PE,PP、ポ
リアミド樹脂、ポリブチラール樹脂、ポリスチレン樹脂
などの熱可塑樹脂ならびにポリスチレン系、ポリオレフ
ィン系、ポリジエン系、塩ビ系、ポリウレタン系、ポリ
エステル系、ポリアミド系、フッ素系、塩素化ポリエチ
レン系、ポリスチレン・ポリオレフィン系共重合体、
(水添)ポリスチレン・ブタジエン系共重合体、ポリス
チレン・ビニルポリイソプレン系共重合体、などのゴム
弾性を示す熱可塑エラストマ、 またはポリエチレン、
ポリプロピレンなどのポリオレフィンに熱可塑エラスト
マーをブレンドしたものなども用いることができる。Examples of such a transparent crack-preventing layer include an ionomer resin obtained by crosslinking the molecules of an ethylene-methacrylic acid copolymer with metal ions (Na + , Zn 2+, etc.), EVA (ethylene-vinyl acetate polymer), and PVC. , EE
A (ethylene acrylate copolymer), PE, PP, thermoplastic resin such as polyamide resin, polybutyral resin, polystyrene resin, and polystyrene, polyolefin, polydiene, vinyl chloride, polyurethane, polyester, polyamide, fluorine, Chlorinated polyethylene, polystyrene / polyolefin copolymer,
(Hydrogenated) Thermoplastic elastomer exhibiting rubber elasticity such as polystyrene / butadiene copolymer, polystyrene / vinyl polyisoprene copolymer, or polyethylene,
A blend of a thermoplastic elastomer with a polyolefin such as polypropylene can also be used.
【0060】さらに ポリオレフィン(PPまたはPE
等)/熱可塑樹脂(EVA)/ポリオレフィン、 ポリ
オレフィン(PPまたはPE)/ポリオレフィン+熱可
塑エラストマ/ポリオレフィン(PPまたはPE)など
の積層体や ポリオレフィン+熱可塑エラストマのブレ
ンド比を変えた複層系等の積層体ならびにポリオレフィ
ンに熱可塑エラストマーをブレンドした積層体、PP/
PE/PPなども使用できる。Further, polyolefin (PP or PE)
Etc.) / Thermoplastic resin (EVA) / polyolefin, polyolefin (PP or PE) / polyolefin + thermoplastic elastomer / polyolefin (PP or PE) laminate or multi-layer system with different blend ratio of polyolefin + thermoplastic elastomer And PP / polyolefin blended thermoplastic elastomer, PP /
PE / PP and the like can also be used.
【0061】さらに、熱可塑エラストマーのコアとアク
リル樹脂のシェル構造からなるコア/シェル型樹脂など
も使用できる。Further, a core / shell type resin having a thermoplastic elastomer core and an acrylic resin shell structure can also be used.
【0062】更に割れ防止層として、透明な粘着剤層も
使用できる。例えばアクリル系、ゴム系、ポリエステル
系などがあり、とくに透明性の高いアクリル系粘着剤層
を用いるのが好ましい。アクリル系粘着剤層はアクリル
系ポリマー、つまり粘着剤層に主としての適度な濡れ
性、柔軟性を付与するための主単量体として、ポリマー
のガラス点移転(Tg)が60℃以下であるような(メ
タ)アクリル酸アルキルエステルを1種、あるいは2種
以上と、必要により、官能基含有単量体およびその他の
共重合性単量体とを、適宜の重合触媒をもちい、溶液重
合法、乳化重合法、塊状重合法(とくに紫外線照射によ
る重合法)、懸濁重合法などの方法で重合させて得られ
る、アクリル系共重合体を用い、これに適宜公知の各種
添加剤を含ませたものが用いられる。熱架橋タイプ、光
(紫外線、電子線)架橋タイプなどをであってもよい。Further, a transparent pressure-sensitive adhesive layer can be used as a crack preventing layer. For example, there are acrylic type, rubber type and polyester type, and it is particularly preferable to use an acrylic pressure-sensitive adhesive layer having high transparency. The acrylic pressure-sensitive adhesive layer is an acrylic polymer, that is, as a main monomer for mainly imparting appropriate wettability and flexibility to the pressure-sensitive adhesive layer, the glass point transfer (Tg) of the polymer is 60 ° C. or less. One or more alkyl (meth) acrylates and, if necessary, a functional group-containing monomer and another copolymerizable monomer, using an appropriate polymerization catalyst, by a solution polymerization method, An acrylic copolymer obtained by polymerization by a method such as an emulsion polymerization method, a bulk polymerization method (in particular, a polymerization method using ultraviolet irradiation), or a suspension polymerization method was used, and various known additives were appropriately added thereto. Things are used. A thermal crosslinking type, a light (ultraviolet ray, electron beam) crosslinking type, or the like may be used.
【0063】また上記粘着剤以外の接着成分として、天
然高分子系のニカワ、デンプン、半合成高分子系の酢酸
セルロース、合成高分子系のポリ酢酸ビニル、ポリ塩化
ビニル、エポキシ樹脂、ウレタン樹脂、ポリクロロプレ
ン、アクリロニトリル−ブタジエン共重合体(NB
R),メラミン樹脂、アクリル樹脂、エチレン−酢酸ビ
ニル共重合体、ポリエステル樹脂、ポリアミド樹脂、な
どを用いたものがある。またこれらは、常温硬化、加熱
硬化、紫外線、電子線、レーザー照射硬化タイプなどの
各種硬化タイプの接着剤として使用することもできる。As adhesive components other than the above-mentioned adhesive, natural polymer glue, starch, semi-synthetic polymer cellulose acetate, synthetic polymer polyvinyl acetate, polyvinyl chloride, epoxy resin, urethane resin, Polychloroprene, acrylonitrile-butadiene copolymer (NB
R), melamine resin, acrylic resin, ethylene-vinyl acetate copolymer, polyester resin, polyamide resin and the like. These can also be used as adhesives of various curing types such as room temperature curing, heat curing, ultraviolet ray, electron beam, and laser irradiation curing types.
【0064】また、上記割れ防止層は、飛散防止層の片
面に直接熱ラミなどによる貼り合せや、溶解した樹脂を
塗工して形成することもできるし、割れ防止層同志の積
層に関しても、直接熱ラミや溶解した樹脂の塗工もでき
る。なお密着性が不十分な場合は、各種密着付与剤の添
加や割れ防止層または飛散防止層の表面処理(コロナ処
理、プラズマ処理など)により、密着性を向上すること
もできる。なお、粘着剤層ならびに接着成分が割れ防止
層の場合は、飛散防止層ならびに割れ防止層同志の貼り
合せも公知技術として飛散防止層に塗工により形成する
か、別の剥離性フィルムに塗工形成したものを転写貼り
合せなどしても良い。The crack-preventing layer can be formed by directly bonding one surface of the scattering-preventing layer by heat lamination or the like, or by coating a dissolved resin. Direct heat lamination and application of dissolved resin are also possible. If the adhesion is insufficient, the adhesion can be improved by adding various adhesion-imparting agents or by surface treatment (corona treatment, plasma treatment, etc.) of the crack prevention layer or the scattering prevention layer. When the pressure-sensitive adhesive layer and the adhesive component are crack-preventing layers, the scattering-preventing layer and the crack-preventing layer may be bonded to each other by coating the scattering-preventing layer as a known technique, or by coating a separate peelable film. The formed product may be transferred and bonded.
【0065】次にPDPパネルに直接密着する透明な粘
着剤層には、アクリル系、ゴム系、ポリエステル系など
があり、とくに透明性の高いアクリル系粘着剤層を用い
るのが好ましい。アクリル系粘着剤層はアクリル系ポリ
マー、つまり粘着剤層に主としての適度な濡れ性、柔軟
性を付与するための主単量体として、ポリマーのガラス
点移転(Tg)が60℃以下であるような(メタ)アク
リル酸アルキルエステルを1種、あるいは2種以上と、
必要により、官能基含有単量体およびその他の共重合性
単量体とを、適宜の重合触媒をもちい、溶液重合法、乳
化重合法、塊状重合法(とくに紫外線照射による重合
法)、懸濁重合法などの方法で重合させて得られる、ア
クリル系共重合体を用い、これに適宜公知の各種添加剤
を含ませたものが用いられる。熱架橋タイプ、光(紫外
線、電子線)架橋タイプなどであってもよい。Next, as the transparent pressure-sensitive adhesive layer which is directly in contact with the PDP panel, there are acrylic type, rubber type and polyester type, and it is particularly preferable to use a highly transparent acrylic type pressure-sensitive adhesive layer. The acrylic pressure-sensitive adhesive layer is an acrylic polymer, that is, as a main monomer for mainly imparting appropriate wettability and flexibility to the pressure-sensitive adhesive layer, the glass point transfer (Tg) of the polymer is 60 ° C. or less. One or two or more alkyl (meth) acrylates,
If necessary, the functional group-containing monomer and other copolymerizable monomer may be mixed with a suitable polymerization catalyst to form a solution polymerization method, an emulsion polymerization method, a bulk polymerization method (particularly, a polymerization method using ultraviolet irradiation), a suspension method, or the like. An acrylic copolymer obtained by polymerization by a polymerization method or the like is used, and a mixture containing various known additives as appropriate is used. A thermal crosslinking type, a light (ultraviolet ray, electron beam) crosslinking type, or the like may be used.
【0066】上記透明粘着剤層は、PDPガラス基板に
直接貼り合せるため、粘着強度とリワーク性の両者を兼
ね備える必要があり、せん断弾性率的には1×104P
a〜1×107Paが好ましい。更に粘着剤層の厚み
は、粘着特性とリワーク性の点から10μmから500
μmが良い。薄すぎると粘着特性が満足せず、かつ厚す
ぎるとシート化の際にエッジ部から糊はみ出しなどの課
題が発生する。Since the transparent pressure-sensitive adhesive layer is directly bonded to a PDP glass substrate, it must have both pressure-sensitive adhesive strength and reworkability, and the shear modulus is 1 × 10 4 P
a to 1 × 10 7 Pa is preferable. Further, the thickness of the pressure-sensitive adhesive layer is from 10 μm to 500 μm in view of the adhesive property and the reworkability.
μm is good. If it is too thin, the adhesive properties will not be satisfactory, and if it is too thick, there will be problems such as glue sticking out of the edge portion when forming the sheet.
【0067】飛散防止層の厚みとしては、破損防止の点
から10μmから600μmの範囲が好ましい。10μm
以下では79000Nの衝撃力で破損する課題があり、600μ
m以上では割れ防止層ならびに粘着剤層の厚みが薄くな
り割れ防止性が満足できない。The thickness of the scattering prevention layer is preferably in the range of 10 μm to 600 μm from the viewpoint of preventing damage. 10 μm
In the following, there is a problem to be damaged by the impact force of 79000N, 600μ
If it is more than m, the thicknesses of the crack prevention layer and the pressure-sensitive adhesive layer become too thin, and the crack prevention properties cannot be satisfied.
【0068】なお、割れ防止厚みは、20μm〜170
0μmが良く、好ましくは20〜1000μmである。 薄い
と割れ防止性が低下し、逆に厚いと価格が高くなった
り、透明性が低下する。The crack prevention thickness is 20 μm to 170 μm.
0 μm is good, and preferably 20 to 1000 μm. If the thickness is thin, the crack-preventing property is reduced. On the other hand, if the thickness is large, the price is increased and the transparency is reduced.
【0069】以上述べた飛散防止層+割れ防止層1種以
上+透明粘着剤層+電磁波シールド層、および/又は近
赤外線遮蔽層の総厚みとしては、PDPの画質劣化の点
から5mm以下好ましくは3mm以下であることが望ま
しい。さらに上記PDPフィルターの光線透過率はコン
トラストや画質低下防止の点から40%以上が必要であ
り、好ましくは50%以上が必要である。The total thickness of the above-described scattering prevention layer + one or more crack prevention layers + the transparent pressure-sensitive adhesive layer + the electromagnetic wave shielding layer and / or the near-infrared shielding layer is preferably 5 mm or less from the viewpoint of deterioration of the image quality of the PDP. Desirably, it is 3 mm or less. Further, the light transmittance of the PDP filter is required to be 40% or more, and preferably 50% or more, from the viewpoint of preventing a decrease in contrast and image quality.
【0070】なお、PDPフィルターとして、画像の色
調整が必要な際は、公知の可視光域に吸収のある染料、
顔料などを添加しても良い。When a color adjustment of an image is required as a PDP filter, a dye having a known absorption in the visible light region,
A pigment or the like may be added.
【0071】次に鋼球自由落下による衝撃力測定につい
て装置(図3)を用いて、直径50mmの約510gの鋼
球を高さ1.5mから落下させた時の常温(23±3℃)
での衝撃力F0(N)を測定した。その衝撃力F0は、
図4の横軸の落球高さ1.5mの衝撃力に示すように約
79000Nであった。Next, about the impact force measurement by the free fall of the steel ball, a normal temperature (23 ± 3 ° C.) when a steel ball of about 510 g having a diameter of 50 mm was dropped from a height of 1.5 m using an apparatus (FIG. 3).
The impact force F0 (N) at was measured. The impact force F0 is
As shown by the impact force at a falling ball height of 1.5 m on the horizontal axis in FIG. 4, it was about 79000 N.
【0072】なお、図3に示す衝撃力測定装置の力セン
サー上に、粘着剤層を介して、割れ防止層1種以上と飛
散防止層を形成し、直径50mm重量約510gの鋼球を
1.5m高さから衝撃緩和積層体の中心部に落下させ、
その時の衝撃力F1<N>を測定し、どの程度衝撃力が減
少しているかを測定した。On the force sensor of the impact force measuring device shown in FIG. 3, one or more crack prevention layers and a scattering prevention layer were formed via an adhesive layer, and a steel ball having a diameter of 50 mm and a weight of about 510 g was added to each of the steel balls. Drop from the height of 5m to the center of the shock absorbing laminate,
The impact force F1 <N> at that time was measured to determine how much the impact force was reduced.
【0073】なおその衝撃緩和率として、衝撃緩和率R
1(%)=[F1/F0(79000N)]×100 で
算出した。As the impact relaxation rate, the impact relaxation rate R
1 (%) = [F1 / F0 (79000N)] × 100
【0074】次に、FPDパネルの中で特に衝撃に弱い
とされているプラズマディスプレイ(PDP)用のガラ
ス基板として、高歪み点ガラス(PD200、弾性率7.
6×1010Pa)を選択し、厚み2.8mmの30cm×
30cmサイズのガラス基板を試験用ガラス基板とし
た。Next, as a glass substrate for a plasma display (PDP), which is considered to be particularly vulnerable to impact among the FPD panels, a high strain point glass (PD200, elastic modulus 7.
6 × 10 10 Pa) and select 2.8mm thick 30cm ×
A glass substrate having a size of 30 cm was used as a test glass substrate.
【0075】ガラス基板の割れ試験について、図5に示
す割れ試験構成としてAL板(300×300mm、t=2mm)
上にガラス基板PD200(t=2.8mm,300mm×300m
m)を1枚または2枚を置き、かつ上下に窓枠加工したA
L板(厚み2mmの板)で挟み4辺を固定し、ガラス基
板の中心に約510g鋼球を高さ1.5mから落下させガラス
基板の割れ試験を行った。結果を表1に示す。As for the crack test of the glass substrate, an AL plate (300 × 300 mm, t = 2 mm) was used as a crack test configuration shown in FIG.
A glass substrate PD200 (t = 2.8mm, 300mm × 300m)
m) Place one or two sheets, and process the window frame up and down A
A glass plate was cracked by dropping about 510 g of steel balls from a height of 1.5 m at the center of the glass substrate and fixing the four sides with an L plate (plate having a thickness of 2 mm). Table 1 shows the results.
【0076】[0076]
【表1】 [Table 1]
【0077】表1のガラス基板割れ試験から、ガラス板
が割れる衝撃力は鋼球重量510g±20gを一定とした場
合、ガラス1枚構成では、60cm以上すなわち衝撃力
約36000N以上でガラス基板は割れる。ついでガラ
ス基板2枚構成の場合、高さ30cm以上すなわち衝撃
力21000N以上でガラス基板は割れる。ガラス板を
割れない設計にするためには、上記衝撃緩和積層体をガ
ラス基板上に形成した時、割れない衝撃力は、510g
鋼球重量を一定とした場合、36000N以下好ましく
は21000N以下にすることが好ましい。言い換えれ
ば、ガラス基板の割れない衝撃緩和率R0(%)は、表
1より36000N/79000N×100で約50%
以下好ましくは27%(21000/79000×100)
以下に設計すればよいことがわかる。From the glass substrate cracking test shown in Table 1, when the impact force at which the glass plate is broken is set at a constant steel ball weight of 510 g ± 20 g, the glass substrate is broken at 60 cm or more, that is, at an impact force of about 36000 N or more in a single glass structure. . Then, in the case of a two glass substrate structure, the glass substrate is broken at a height of 30 cm or more, that is, an impact force of 21000 N or more. In order to design the glass plate so as not to break, when the above-mentioned shock-mitigating laminate is formed on a glass substrate, the shock force that does not break is 510 g.
When the weight of the steel ball is fixed, it is preferably 36000 N or less, preferably 21000 N or less. In other words, the shock relaxation rate R0 (%) at which the glass substrate does not crack is about 50% at 36000N / 79,000N × 100 from Table 1.
Less than or equal to 27% (21000/79000 × 100)
It is understood that the following design is sufficient.
【0078】以上の鋼球落下試験に関して、UL1418
(約540g×高さ1.3mの振子落下)、UL1930(約50
0g×高さ1.3mの振子落下)、電気取り締まり法(500g
×1.5m)等の安全規格では、鋼球落下試験後の飛散防止
性の評価は破片の数、サイズ、距離を規定しており、ま
た感電しないことなどから指サイズの穴が開かない(貫
通しない)ことなどであるが、これとは別に実際高価な
FPDパネルが割れては問題である。Regarding the above steel ball drop test, UL 1418
(Approx. 540g x 1.3m height pendulum drop), UL1930 (approx. 50
0g x 1.3m height pendulum drop), Electricity Control Law (500g
X1.5m) and other safety standards, the evaluation of the anti-scattering property after a steel ball drop test specifies the number, size, and distance of fragments, and finger-sized holes are not opened because there is no electric shock (penetration) However, there is a problem if the expensive FPD panel is actually broken.
【0079】それゆえ、実際510g鋼球の高さ1.5m
からの落下によりガラス基板が割れる衝撃力を測定し、
かつ衝撃緩和積層体形成により割れない構成を設計する
ことで、飛散防止、安全性(感電しない)以外にパネル
の割れない衝撃緩和積層体の設計が明確になった。Therefore, the actual height of a 510 g steel ball is 1.5 m.
Measure the impact force at which the glass substrate is broken by falling from
In addition, by designing a structure that does not crack due to the formation of the shock-mitigating laminate, the design of the shock-mitigating laminate that does not crack the panel in addition to the prevention of scattering and the safety (no electric shock) has been clarified.
【0080】すなわち、 本発明における1.5m高
さ、約500g鋼球を落下させた衝撃力79000Nを
50%以下好ましくは27%以下に低減させるに相当す
るに衝撃緩和力を有する衝撃力緩和積層体を構成するこ
とにより、ガラス基板が割れないことを明らかにした。 (1)ガラス基板が割れない衝撃緩和積層体の設計 (a) F2(ガラス割れ衝撃力)>F1(N)(衝撃緩和積層
体による衝撃力) (b) R0(ガラス割れ衝撃緩和率)>R1(%)(衝撃緩和
積層体による衝撃緩和率) (2)鋼球落下によるガラス基板割れ試験 図5に示す構成としてガラス基板(高歪み点ガラス:旭
硝子社製PD200、サイズ(300mm×300m
m、t=2.8mm) 上に衝撃緩和積層体(飛散防止層
+割れ防止層+粘着剤層)を形成し、その中心部へ鋼球
500gを高さ1.5mから落下させ、 飛散防止性
(破損防止性)、ならびにガラス基板の割れ性を目視に
て評価した。That is, an impact-relaxing laminate having an impact-mitigating force equivalent to reducing the impact force of 75,000 N dropped from a steel ball having a height of 1.5 m and about 500 g in the present invention to 50% or less, preferably 27% or less. By structuring the body, it was clarified that the glass substrate did not break. (1) Design of a shock-mitigating laminate that does not break the glass substrate (a) F2 (glass-breaking impact force)> F1 (N) (impact force by the shock-releasing laminate) (b) R0 (glass-breaking impact relaxation rate)> R1 (%) (Impact relaxation rate by impact relaxation laminate) (2) Glass substrate cracking test due to steel ball falling Glass substrate (high strain point glass: PD200 manufactured by Asahi Glass Co., Ltd., size (300 mm × 300 m) as shown in FIG.
m, t = 2.8 mm) A shock-absorbing laminate (scatter prevention layer + crack prevention layer + adhesive layer) is formed on top of this, and 500 g of steel balls are dropped from a height of 1.5 m to the center to prevent scattering. The properties (prevention of breakage) and the cracking of the glass substrate were visually evaluated.
【0081】衝撃緩和力F1(N)は、前述したように衝撃
緩和積層体を力センサー上に形成し、FFTアナライザ
ーで測定した(図3参照)。The impact relaxation force F1 (N) was measured by forming an impact relaxation laminate on a force sensor as described above and using an FFT analyzer (see FIG. 3).
【0082】なお鋼球落下によるそれ自体の衝撃力F0
(N)に対して、図5のガラス割れ試験で実際割れた衝
撃力F2(N)ならびに透明緩和積層体形成による衝撃緩和
力F1を各々ガラス割れ防止緩和率R0,R1として求めた。The impact force F0 of the steel ball itself due to the fall
With respect to (N), the impact force F2 (N) actually cracked in the glass cracking test in FIG. 5 and the impact relaxation force F1 due to the formation of the transparent relaxation laminate were determined as glass fracture prevention relaxation rates R0 and R1, respectively.
【0083】 R0(%) =(F2/F0)×100、R1(%)=(F1/
F0) ×100 R0>R1でガラス基板が割れないことを意味する。R0 (%) = (F2 / F0) × 100, R1 (%) = (F1 /
F 0 ) × 100 R 0> R 1 means that the glass substrate is not broken.
【0084】次に上記透明衝撃緩和積層体の積層構成に
ついては、鋼球落下による飛散防止性すなわち、破損
(穴発生)を防止するためには、PDPガラス基板に対
して、表面側に飛散防止層を形成することが望ましい。
なお構成は飛散防止層,割れ防止層、粘着剤層であり、
割れ防止層が飛散防止層の上にあると、割れ防止層が破
損するため、割れ防止層は飛散防止層の下側に形成され
たほうが、飛散防止の点から好ましい。ただ、フィルタ
ー全体でみると、飛散防止層で穴は防げるため、割れ防
止層が上に形成されても良い。なお飛散防止層は表面側
に少なくとも1層以上が形成され、その他に割れ防止層
とガラス基板上の粘着剤層との間に形成されても良い。
すなわち、飛散防止層/割れ防止層/飛散防止層の構成
であっても良い。Next, with regard to the laminated structure of the transparent shock absorbing laminated body, in order to prevent scattering (falling of holes) due to falling of steel balls, in order to prevent breakage (occurrence of holes), scattering is prevented on the surface side of the PDP glass substrate. It is desirable to form a layer.
The composition is a scattering prevention layer, a crack prevention layer, and an adhesive layer.
If the crack prevention layer is on the scattering prevention layer, the crack prevention layer will be damaged. Therefore, it is preferable that the crack prevention layer is formed below the scattering prevention layer from the viewpoint of prevention of scattering. However, when looking at the entire filter, holes can be prevented by the scattering prevention layer, so that a crack prevention layer may be formed thereon. In addition, at least one layer of the scattering prevention layer is formed on the surface side, and alternatively, it may be formed between the crack prevention layer and the pressure-sensitive adhesive layer on the glass substrate.
That is, a configuration of a scattering prevention layer / a crack prevention layer / a scattering prevention layer may be employed.
【0085】更に上記衝撃緩和積層体は、粘着剤層/割
れ防止層2種以上/飛散防止層で構成される場合、飛散
防止層と各割れ防止層と粘着剤層の各界面に接する上下
層材料のせん断弾性率の比の対数の絶対値の総和が最も
大きくなる積層順になることが好ましい。Further, when the above-mentioned impact relaxation laminate is composed of an adhesive layer / two or more types of anti-cracking layers / an anti-scattering layer, the upper and lower layers in contact with each interface of the anti-scattering layer, each anti-cracking layer and the adhesive layer. It is preferable that the order of lamination is such that the sum of the absolute values of the logarithms of the ratios of the shear modulus of the materials is the largest.
【0086】すなわち、下記に示す構成において、鋼
球落下による79000Nに相当する衝撃力を緩和する
のに、に示すせん断弾性率の比の対数の絶対値の総和
が大きい構成をとったほうが、せん断応力が大きく、鋼
球落下による衝撃力の緩和性も大きくなる傾向がある。 飛散防止層1/割れ防止層2,割れ防止層3・・・割
れ防止層n/ 粘着剤層 せん断弾性率比対数絶対値の総和: |Log G1/G2|+|Log G2/G3|+・・・・+|Log Gn-1/Gn|+
|Log Gn/G粘着剤層| たとえば、飛散防止層1と割れ防止層2、割れ防止層3
と粘着剤層4の構成からなる透明衝撃緩和積層体におい
て、飛散防止層1(厚み:188μm、せん断弾性率:
1.4×109Pa)/ 割れ防止層2(厚み:25μm、
せん断弾性率:7.7×104Pa)/ 割れ防止層3(厚
み:400μm、せん断弾性率:6.9×107Pa)
/粘着剤層4(厚み:25μm、せん断弾性率:7.7×
104Pa) 鋼球落下510g×1.5mの79000Nの衝撃力に対
して、図3に示す衝撃力測定により、衝撃緩和率R1
(%)=[(前記積層体形成による衝撃力)/積層体な
しでの衝撃力]×100 を求め、割れ防止層の積層順番を選定すると、衝撃緩和
率は、R1(%)は 1/2/3/4 < 1/3/2/
4 となり、前者構成の方が、界面に接する上下層のせ
ん断弾性率比の対数の絶対値の総和が大きく、7900
0Nに対する衝撃力の緩和が大きいことを意味する。That is, in the configuration shown below, in order to alleviate the impact force equivalent to 79000 N due to the steel ball drop, the configuration in which the total sum of the absolute values of the logarithms of the ratios of the shear elastic moduli shown in FIG. There is a tendency that the stress is large and the resilience of the impact force due to the steel ball falling is also increased. Anti-scattering layer 1 / anti-cracking layer 2, anti-cracking layer 3 ... anti-cracking layer n / adhesive layer Sum of absolute values of logarithm of shear modulus ratio: | Log G1 / G2 | + | Log G2 / G3 | +.・ ・ ・ + | Log Gn-1 / Gn | +
| Log Gn / G pressure-sensitive adhesive layer | For example, the scattering prevention layer 1, the crack prevention layer 2, and the crack prevention layer 3
And the pressure-sensitive adhesive layer 4, the anti-scattering layer 1 (thickness: 188 μm, shear modulus:
1.4 × 10 9 Pa) / crack prevention layer 2 (thickness: 25 μm,
Shear modulus: 7.7 × 10 4 Pa) / Crack prevention layer 3 (thickness: 400 μm, shear modulus: 6.9 × 10 7 Pa)
/ Adhesive layer 4 (thickness: 25 μm, shear modulus: 7.7 ×
10 4 Pa) In response to an impact force of 79000 N with a steel ball falling of 510 g × 1.5 m, the impact relaxation rate R1 was determined by the impact force measurement shown in FIG.
(%) = [(Impact force due to the formation of the laminate) / impact force without the laminate] × 100, and when the order of lamination of the crack prevention layer is selected, R1 (%) is 1 / 2/3/4 <1/3/2 /
4, the former configuration has a larger total sum of the absolute values of the logarithms of the shear modulus ratios of the upper and lower layers in contact with the interface, and
It means that the relaxation of the impact force to 0N is large.
【0087】具体例の結果を表2に示す。Table 2 shows the results of the specific examples.
【0088】[0088]
【表2】 [Table 2]
【0089】飛散防止層1(1.4×109Pa)/ 割れ
防止層2(7.7×104Pa)/割れ防止層3(6.9
×107Pa)/粘着剤層4(7.7×104Pa)からな
る構成の場合、飛散防止層の構成順を最も前にし、割れ
防止層2、3と粘着剤層の順番を変え、力センサー上に
形成、その中心部に1.5m高さから510gの鋼球を
落下させた時の衝撃緩和率を示す。Anti-scattering layer 1 (1.4 × 10 9 Pa) / anti-cracking layer 2 (7.7 × 10 4 Pa) / anti-cracking layer 3 (6.9)
× 10 7 Pa) / pressure-sensitive adhesive layer 4 (7.7 × 10 4 Pa), the scattering prevention layer is arranged first, and the order of the crack prevention layers 2 and 3 and the pressure-sensitive adhesive layer is changed. The figure shows the impact relaxation rate when a 510 g steel ball was dropped from a height of 1.5 m onto the center of a force sensor.
【0090】すなわち、表2から割れ防止層の各界面の
せん断弾性率比の対数の絶対値の総和が大きいNo.1が、
衝撃緩和率が24%ともっとも小さく、すなわち衝撃緩和性
が大きくなり、FPDのガラス基板が1枚ならびに2枚
構成でも割れにくいことを意味している。That is, from Table 2, No. 1 in which the total sum of the absolute values of the logarithms of the shear modulus ratios at each interface of the crack prevention layer is large,
The impact relaxation rate is the smallest at 24%, that is, the impact relaxation is large, which means that the FPD glass substrate is hardly broken even with one or two glass substrates.
【0091】ゆえに割れ防止層の構成としては、その各
界面のせん断弾性率比の対数の絶対値の総和が大きいほ
うが、せん断応力緩和により、衝撃緩和率が小さくな
り、ガラス割れ防止において好ましい。Therefore, as for the structure of the crack prevention layer, it is preferable in terms of prevention of glass breakage that the total sum of the absolute values of the logarithms of the shear elastic modulus ratios at the respective interfaces is large because the relaxation of the shear stress reduces the impact relaxation rate.
【0092】[0092]
【実施例】以下、実施例により本発明を更に具体的に説
明する。 (1)ガラス基板が割れない衝撃緩和積層体の設計 ガラス割れ衝撃力(F2)≧衝撃緩和積層体による衝撃力
(F1)<N> ガラス割れ衝撃緩和率(R0)≧衝撃緩和積層体による衝
撃緩和率(R1)<%> (2)鋼球による落球衝撃試験 図4に示す構成としてガラス基板(高歪み点ガラス:旭
硝子社製PD200、サイズ(300mm×300m
m,t=2.8mm)上に衝撃緩和積層体(飛散防止層
+割れ防止層+粘着剤層)を形成し、その中心部へ鋼球
約510gを高さ1.5mから落下させ、飛散防止性
(破損防止性)、ならびにガラス基板の割れ性を目視に
て評価した。EXAMPLES The present invention will be described more specifically with reference to the following examples. (1) Design of an impact-mitigating laminate in which the glass substrate is not broken Glass impact strength (F2) ≧ impact by the impact-mitigating laminate
(F1) <N> Glass crack impact relaxation rate (R0) ≧ impact relaxation rate by impact relaxation laminate (R1) <%> (2) Falling ball impact test using steel balls A glass substrate (high strain point Glass: PD200 manufactured by Asahi Glass Company, size (300 mm x 300 m
(m, t = 2.8 mm) to form an impact-mitigating laminate (scattering prevention layer + anti-cracking layer + adhesive layer), drop about 510 g of steel balls from the height of 1.5 m to the center, and scatter The prevention (breakage prevention) and the cracking of the glass substrate were visually evaluated.
【0093】衝撃緩和力F1(N)は、前記したように
衝撃緩和積層体を力センサー上に形成し、FFTアナラ
イザーで測定した(図3参照)。なお鋼球落下によるそ
れ自体の衝撃力F0(N)に対して、図5のガラス割れ
試験で実際割れた衝撃力F2(N)ならびに透明緩和積
層体形成による衝撃緩和力Flを各々ガラス割れ防止緩
和率R0,R1として求めた。The impact relaxation force F1 (N) was measured by forming an impact relaxation laminate on a force sensor as described above and using an FFT analyzer (see FIG. 3). In addition, the impact force F2 (N) actually broken in the glass cracking test of FIG. 5 and the impact relaxation force F1 due to the formation of the transparent relaxation laminated body are respectively prevented from glass fracture against the impact force F0 (N) of the steel ball itself. The relaxation rates were obtained as R0 and R1.
【0094】 R0(%)=(F2/F0)×100、R1(%)=(F1/F
0)×100 R0>R1でガラス基板が割れないことを意味する。 (3)動的粘弾性装置によるせん断弾性率測定 セイコー−インスツルメンツ社製動的粘弾性装置DMS
120を用い、温度分散による周波数1Hz固定条件に
より、サンプル5mm×10mmサイズとして、25℃
±3℃でのせん断弾性率Gを測定した。 (4)可視光線の透過率と反射率 可視光線の透過率と反射率は、大塚電子社製瞬間マルチ
測光器MCPD−3000により0°入射透過および反
射スペクトルを測定し、得られた透過および反射スペク
トルからJIS R−3016に準じ、可視光線透過率
および可視光線反射率を算出した。近赤外線のカット率
は日立製作所社製U−3410(分光光度計)を用いて
測定し、波長800〜1200nmにおけるカット率を
測定した。R0 (%) = (F2 / F0) × 100, R1 (%) = (F1 / F
0) × 100 R0> R1 means that the glass substrate is not broken. (3) Measurement of shear modulus by dynamic viscoelasticity device Dynamic viscoelasticity device DMS manufactured by Seiko Instruments Inc.
120, using a fixed condition of a frequency of 1 Hz by temperature dispersion, a sample of 5 mm × 10 mm size was obtained at 25 ° C.
The shear modulus G at ± 3 ° C. was measured. (4) Transmittance and reflectance of visible light The transmittance and reflectance of visible light were obtained by measuring the 0 ° incident transmission and reflection spectrum with an instantaneous multiphotometer MCPD-3000 manufactured by Otsuka Electronics Co., Ltd. The visible light transmittance and the visible light reflectance were calculated from the spectrum according to JIS R-3016. The near-infrared cut ratio was measured using Hitachi Ltd. U-3410 (spectrophotometer), and the cut ratio at a wavelength of 800 to 1200 nm was measured.
【0095】(実施例1)飛散防止用フィルムとして、
ポリエチレンテレフタレート(PET)(三菱化学社製
OX69K、厚み175μm、G 1.4×109 P
a)フイルムに、割れ防止層1として、ブチルアクリレ
ートとアクル酸の共重合体からからなる重量平均分子量
が約150万で、Tgが約−20℃のアクリル系粘着剤
層(G 7.7×104 Pa)厚さ25μmを形成し、
ついで割れ防止層2としてPP/EVA/PP(アキレ
ス社製POVlC−T、400μm、G 6.9×107
Pa)積層フィルムを貼り合わせた。ついでこの積層
フィルム面に上記アクリル系粘着剤を厚さ25μmとな
るように形成した。このように作製した衝撃緩和積層体
を高歪み点ガラス基板(PD200,1枚厚み2.8m
m、300×300mm)に上記粘着剤層を介して貼り
合わせた。(Example 1) As a film for preventing scattering,
Polyethylene terephthalate (PET) (OX69K manufactured by Mitsubishi Chemical Corporation, thickness 175 μm, G 1.4 × 10 9 P
a) An acrylic pressure-sensitive adhesive layer (G 7.7 ×) having a weight average molecular weight of about 1.5 million and a Tg of about −20 ° C., made of a copolymer of butyl acrylate and acrylic acid, was used as a crack preventing layer 1 for the film. 10 4 Pa) to form a thickness of 25 μm,
Next, PP / EVA / PP (POVIC-T, 400 μm, G 6.9 × 10 7 manufactured by Achilles) was used as the crack prevention layer 2.
Pa) The laminated film was laminated. Next, the acrylic pressure-sensitive adhesive was formed on the surface of the laminated film so as to have a thickness of 25 μm. The thus-prepared impact relaxation laminate was applied to a high strain point glass substrate (PD200, 2.8 m thick).
m, 300 × 300 mm) via the above-mentioned pressure-sensitive adhesive layer.
【0096】ついで、図5に示したガラス板割れ試験構
成とし、衝撃緩和積層体付きガラス基板1枚ならびに2
枚タイプでの鋼球落下試験を実施した。鋼球落下条件と
して直径50mmの510gを用い、1.5m高さから
ガラス基板中心部に落下させた。Next, the glass plate cracking test configuration shown in FIG.
A steel ball drop test was performed on a single piece type. As a steel ball drop condition, 510 g having a diameter of 50 mm was used and dropped from a height of 1.5 m to the center of the glass substrate.
【0097】なお、上記粘着剤層/割れ防止層2/割れ
防止層1/飛散防止層構成での、鋼球落下による衝撃緩
和力は、図3に示す力センサー装置を用いて、その衝撃
力を測定し、緩和率を求めた。The impact mitigation force due to the steel ball falling in the pressure-sensitive adhesive layer / crack preventing layer 2 / crack preventing layer 1 / scattering preventing layer configuration was measured by using the force sensor device shown in FIG. Was measured, and the relaxation rate was determined.
【0098】この衝撃緩和積層体つきガラス基板の透過
率は82%である。さらに衝撃緩和積層体の総厚みは6
25μmであった。この厚みでは、FPDパネルに直接
貼り付けても目視による画質の劣化は認められなかっ
た。The transmittance of the glass substrate provided with the shock absorbing laminate is 82%. In addition, the total thickness of the shock absorbing laminate is 6
It was 25 μm. With this thickness, even when directly attached to the FPD panel, deterioration of image quality by visual observation was not recognized.
【0099】(実施例2)実施例1の割れ防止層2のP
P/EVA/PP(アキレス社製POVlC−T)積層
フィルムを600μmとしたこと以外は実施例1に準じ
た。(Example 2) P of the crack preventing layer 2 of Example 1
Example 1 was followed except that the P / EVA / PP (POVIC-T manufactured by Achilles) laminated film was 600 μm.
【0100】この衝撃緩和積層体つきガラス基板の透過
率は80%であり、総厚みは825μmであった。構
成:PET/粘着剤層/POVIC−T/粘着剤層とし
た。The transmittance of the glass substrate provided with the shock absorbing laminate was 80%, and the total thickness was 825 μm. Structure: PET / pressure-sensitive adhesive layer / POVIC-T / pressure-sensitive adhesive layer.
【0101】(実施例3)割れ防止層2としてポリウレ
タン500μm(シーダム社製DUS605無黄変タイ
プ、G 4.6×107Pa)フィルムにしたこと以外は
実施例1に準じた。(Example 3) The procedure was the same as that of Example 1 except that a film of polyurethane 500 µm (DUS605, non-yellowing type, G 4.6 x 10 7 Pa) made of polyurethane was used as the crack preventing layer 2.
【0102】この衝撃緩和積層体つきガラス基板の透過
率は78%であり、総厚みは625μmであった。構
成:PET/粘着剤層/ウレタン/粘着剤層とした。The transmittance of the glass substrate provided with the shock absorbing laminate was 78%, and the total thickness was 625 μm. Structure: PET / pressure-sensitive adhesive layer / urethane / pressure-sensitive adhesive layer.
【0103】(実施例4)割れ防止層2として、クリア
テックH400μm(クラレトレディング社製ポリプロ
ピレンにスチレン・ビニル・イソプレンエラストマーを
添加、G 3.1×107 Pa)フイルムにしたこと以
外は実施例1に準じた。この衝撃緩和積層体つきガラス
基板の透過率は72%であり、総厚みは625μmであ
った。構成:PET/粘着剤層/クリアテックH/粘着
剤層とした。(Example 4) [0103] Except that the film was made a cleartech H 400 µm (a styrene-vinyl-isoprene elastomer was added to polypropylene manufactured by Kuraray Trading Co., Ltd., G 3.1 x 10 7 Pa) as the crack-preventing layer 2, and the film was formed. According to Example 1. The transmittance of the glass substrate provided with the impact relaxation laminate was 72%, and the total thickness was 625 μm. Configuration: PET / pressure-sensitive adhesive layer / Cleartech H / pressure-sensitive adhesive layer.
【0104】(実施例5)割れ防止層2として軟質塩化
ビニル(アキレス社製ビニラス、600μm、G1.4
×107 Pa)フィルムにしたこと以外は実施例1に準
じた。(Example 5) As a crack preventing layer 2, soft vinyl chloride (Vinirus manufactured by Achilles, 600 μm, G1.4)
× 10 7 Pa) Example 1 was followed except that a film was used.
【0105】この衝撃緩和積層体つきガラス基板の透過
率は81%であり、総厚みは825μmであった。構
成:PET/粘着剤層/軟質塩ビ/粘着剤層とした。The transmittance of the glass substrate provided with the shock absorbing laminate was 81%, and the total thickness was 825 μm. Structure: PET / pressure-sensitive adhesive layer / soft PVC / pressure-sensitive adhesive layer.
【0106】(実施例6)実施例2の割れ防止1と2が
逆になったことを除いて実施例2に準じた。構成:PE
T−粘着剤層/POVIC−T/粘着剤層とした。Example 6 Example 2 was followed except that crack prevention 1 and 2 in Example 2 were reversed. Composition: PE
T-adhesive layer / POVIC-T / adhesive layer.
【0107】(比較例1)実施例1の割れ防止層2をP
ET400μmに代えた以外は実施例1に準じた。構
成:PET/粘着剤層/PET(400)/粘着剤層 (比較例2)実施例1の割れ防止層1と2を除去した以
外は実施例1に準じた。 構成:PET/粘着剤層とした。(Comparative Example 1) The crack preventing layer 2 of Example 1 was replaced with P
Example 1 was repeated except that the ET was changed to 400 μm. Structure: PET / pressure-sensitive adhesive layer / PET (400) / pressure-sensitive adhesive layer (Comparative Example 2) The same procedure as in Example 1 was carried out except that the crack prevention layers 1 and 2 of Example 1 were removed. Configuration: PET / adhesive layer.
【0108】(比較例3)実施例3の飛散防止PETフ
ィルムと割れ防止層1の粘着剤層を除きウレタンフィル
ムと粘着剤層のみを高歪み点ガラス(PD200)に直
接貼り合わせたこと以外は実施例3に準じた。(Comparative Example 3) Except that the urethane film and the adhesive layer were directly bonded to the high strain point glass (PD200) except for the shatterproof PET film of Example 3 and the adhesive layer of the crack prevention layer 1, except that According to Example 3.
【0109】以上の結果を表3及び表4に示す。The above results are shown in Tables 3 and 4.
【0110】[0110]
【表3】 [Table 3]
【0111】[0111]
【表4】 [Table 4]
【0112】以上の実施例から明らかなとおり、510
g鋼球を高さ1.5mから落下させた衝撃力を7900
0Nにより、破壊されるPDPガラスパネル基板に対し
て、透明粘着剤層を介して、せん断弾性率の異なる2種
類以上の割れ防止層(1種類以上)+飛散防止層を順に
形成することで、衝撃力を50%以下好ましくは25%
以下に緩和し、飛散防止ならびに割れ防止性を兼ね備え
た衝撃緩和積層体を実現できる。As is evident from the above embodiment, 510
g The impact force of a steel ball dropped from a height of 1.5 m is 7900.
By forming two or more types of crack-preventing layers (one or more types) having different shear elastic moduli and one or more anti-scattering layers in order through a transparent pressure-sensitive adhesive layer on a PDP glass panel substrate that is broken by 0N, 50% or less of impact force, preferably 25%
It is possible to realize a shock-relaxed laminate which is relaxed below and has both scattering prevention and crack prevention.
【0113】なお、飛散防止層と2種類以上の割れ防止
層の構成については、同材料、同厚み比較すると、最表
面は飛散防止層ならびにガラス板直上は粘着剤層が必須
であり、その間の構成は各界面に接する上下層材料のせ
ん断弾性率の比の対数値の絶対値の大きい方が、衝撃力
も低減できる。As for the composition of the anti-scattering layer and the two or more types of anti-cracking layers, when the same material and the same thickness are compared, the anti-scattering layer on the outermost surface and the pressure-sensitive adhesive layer immediately above the glass plate are indispensable. In the configuration, the greater the absolute value of the logarithmic value of the ratio of the shear modulus of the upper and lower layer materials in contact with each interface, the more the impact force can be reduced.
【0114】更にガラス基板に直接上記積層体を形成す
るため、空隙がなく外光の2重写りや汚れの蓄積がなく
なる。更に本発明の前記衝撃緩和積層体の透過率が60
%以上、好ましくは70%であり、かつ総厚みがlmm
以下であり、FPDパネルの画像特性を損なうことがな
い衝撃緩和積層体ならびにこれを含むフラットパネルデ
ィスプレイ、とくにプラズマディスプレイを提供するも
のである。Further, since the above-mentioned laminate is formed directly on the glass substrate, there is no gap and double reflection of external light and accumulation of dirt are eliminated. Further, the transmittance of the impact relaxation laminate of the present invention is 60%.
% Or more, preferably 70%, and the total thickness is 1 mm
An object of the present invention is to provide an impact relaxation laminate which does not impair the image characteristics of the FPD panel, and a flat panel display including the same, particularly a plasma display.
【0115】(実施例7)飛散防止層としてのポリエチ
レンテレフタレートPET(東洋紡社製 A4100、片面
易接着処理厚み 188μm、G1.4×109Pa)の易
接着層面に 屈折率1.65の紫外線硬化型のアクリル
ウレタン系樹脂をメチルイソブチルケトンで所定の濃度
に希釈して、ワイヤーバーで塗工し、60℃で乾燥した
後、超高圧水銀ランプにより、400mJ/cm2の紫外線照射
量で硬化させることにより、乾燥後厚み5μmのハード
コード層を形成した。(Example 7) Polyethylene terephthalate PET (A4100 manufactured by Toyobo Co., Ltd., single-sided easy-adhesion treatment thickness: 188 μm, G1.4 × 10 9 Pa) as a scattering prevention layer was cured by ultraviolet rays with a refractive index of 1.65. Acrylic urethane-based resin is diluted with methyl isobutyl ketone to a predetermined concentration, coated with a wire bar, dried at 60 ° C, and then cured with an ultra-high pressure mercury lamp at an irradiation of 400 mJ / cm 2 of ultraviolet light. As a result, a hard cord layer having a thickness of 5 μm was formed after drying.
【0116】次に、上記HC層上に、屈折率1.36の
アルコキシシラン系ゾル液を、ワイヤーバーで塗工し、
120℃で10分硬化処理して、厚さが0.1μmの低
屈折率層を形成し反射防止層とした。Next, an alkoxysilane-based sol having a refractive index of 1.36 was applied on the HC layer with a wire bar.
After curing at 120 ° C. for 10 minutes, a low-refractive-index layer having a thickness of 0.1 μm was formed to form an antireflection layer.
【0117】次に飛散防止層の反射防止層形成との逆の
面に、SiO2(95nm)を真空蒸着法にて室温で製膜し
た。ついでDCマグネトロンスパッタ法により高屈折薄
膜、銀系透明導電体膜、高屈折率誘電体膜の順序を繰り
返して薄膜を形成する手法により、透明多層薄膜を作成
した。高屈折率誘電体膜を形成するターゲット材料に
は、In2O3-12.6重量%TiO2を使用し、銀系透
明導電体膜を形成するターゲット材料には、Ag-5重
量%Auを使用した。Next, a film of SiO 2 (95 nm) was formed at room temperature by a vacuum evaporation method on the surface of the anti-scattering layer opposite to the formation of the anti-reflection layer. Next, a transparent multilayer thin film was formed by a technique of forming a thin film by repeating the order of a high-refractive thin film, a silver-based transparent conductive film, and a high-refractive-index dielectric film by DC magnetron sputtering. In 2 O 3 -12.6 wt% TiO 2 is used as a target material for forming a high refractive index dielectric film, and Ag-5 wt% Au is used for a target material for forming a silver-based transparent conductor film. It was used.
【0118】膜厚の測定は、厚膜に付けた膜の表面粗さ
計(DEKTAK3)による製膜速度の検量線と透過型
電子顕微鏡による精密測定により行なった。The film thickness was measured by a calibration curve of the film formation rate by a surface roughness meter (DEKTAK3) of the film attached to the thick film, and a precise measurement by a transmission electron microscope.
【0119】 AR/HC/PET/SiO2(95)/IT32.5/Ag13/IT65/Ag13/IT65/Ag
13/IT32.5(nm) このようにして得られた反射防止保護層つき飛散防止積
層膜の表面抵抗は、1.6Ω/ □であり、透過率は70
%であった。AR / HC / PET / SiO 2 (95) /IT32.5/Ag13/IT65/Ag13/IT65/Ag
13 / IT32.5 (nm) The thus-obtained anti-scattering laminated film with an anti-reflection protective layer has a surface resistance of 1.6 Ω / □ and a transmittance of 70.
%Met.
【0120】次に、割れ防止層1として、ブチルアクリ
レートとアクリル酸の共重合体からからなる重量平均分
子量が約150万で、Tgが約−20℃のアクリル系粘
着剤層(G 7.7×104 Pa)厚さ25μmを形成
し、ついで割れ防止層2としてPP/EVA/PP(ア
キレス社製POVlC−T、400μm、G 6.9×
107 Pa)積層フィルムを貼り合わせた。ついでこの
積層フィルム面に上記アクリル系粘着剤を厚さ25μm
となるように形成した。Next, as an anti-cracking layer 1, an acrylic pressure-sensitive adhesive layer (G 7.7) composed of a copolymer of butyl acrylate and acrylic acid and having a weight average molecular weight of about 1.5 million and a Tg of about -20 ° C. × 10 4 Pa) with a thickness of 25 μm, and then as a crack prevention layer 2 PP / EVA / PP (POVIC-T, 400 μm, G 6.9 × by Achilles)
10 7 Pa) The laminated film was laminated. Then, the acrylic pressure-sensitive adhesive was applied to the surface of the laminated film with a thickness of 25 μm.
It formed so that it might become.
【0121】上記粘着剤層/POVIC/粘着剤層積層体を
飛散防止層のAg/IT積層体からなる透明積層体面に
貼り合せ、更にこのように作製した透明粘着剤層付きP
DP用フィルターを高歪点ガラス基板(PD200、1
枚厚み2.8mm、300×300mm)に貼り合わせた。The above pressure-sensitive adhesive layer / POVIC / pressure-sensitive adhesive layer laminate was bonded to the surface of the transparent laminate composed of the Ag / IT laminate of the scattering prevention layer.
The DP filter is connected to a high strain point glass substrate (PD200, 1
(Thickness: 2.8 mm, 300 × 300 mm).
【0122】ついで、図5に示したPDPガラス基板割
れ試験構成とし、上記PDPフィルターつきガラス基板
1枚ならびに2枚タイプでの鋼球落下試験を実施した。
鋼球落下条件として直径50mmの510gを用い、
1.5m高さからガラス基板中心部に落下させた。Then, using the PDP glass substrate cracking test configuration shown in FIG. 5, a steel ball drop test was performed on one and two glass substrates with a PDP filter.
Using 510 g of diameter 50 mm as steel ball drop condition,
The glass substrate was dropped from a height of 1.5 m to the center of the glass substrate.
【0123】なお、上記粘着剤層/割れ防止層2/割れ
防止層1/電磁波シールド+NIR遮蔽/飛散防止層/H
C/AR構成での、鋼球落下による衝撃緩和力は、図3
に示す力センサー装置を用いて、その衝撃力を測定し,
緩和率を求めた。Incidentally, the above-mentioned pressure-sensitive adhesive layer / crack prevention layer 2 / break prevention layer 1 / electromagnetic wave shield + NIR shield / scattering prevention layer / H
Fig. 3 shows the impact mitigation force due to the steel ball falling in the C / AR configuration.
Measure the impact force using the force sensor device shown in
The relaxation rate was determined.
【0124】このPDP用フィルターつきガラス基板の
透過率は63%であった。さらに粘着剤層を含む衝撃緩
和積層体の総厚みは約 643μmであった。この厚み
では、PDPパネルに直接貼り付けても目視による画質
の劣化は認められなかった。The transmittance of this glass substrate with a filter for PDP was 63%. Further, the total thickness of the impact relaxation laminate including the pressure-sensitive adhesive layer was about 643 μm. With this thickness, even when directly attached to the PDP panel, deterioration of image quality by visual observation was not recognized.
【0125】構成:AR/HC層/飛散防止層PET/
SiO2/(IT/Ag)3/IT/割れ防止層1粘着剤層/割
れ防止層2POVIC-T/粘着剤層/PDPガラス基板 ここで(IT/Ag)3とは、IT/Ag層が上述したように
3層存在するという意味である。以下同様である。Structure: AR / HC layer / scattering prevention layer PET /
SiO 2 / (IT / Ag) 3 / IT / anti-cracking layer 1 adhesive layer / anti-cracking layer 2 POVIC-T / adhesive layer / PDP glass substrate Here, (IT / Ag) 3 means IT / Ag layer This means that there are three layers as described above. The same applies hereinafter.
【0126】このようにして得られた本発明の透明衝撃
緩和積層体をガラス基板に貼り合わせた模式的断面構成
説明図を図6に示す。FIG. 6 is a schematic cross-sectional configuration explanatory diagram in which the thus obtained transparent impact relaxation laminate of the present invention is bonded to a glass substrate.
【0127】(実施例8)実施例7の透明飛散防止層の
上に実施例1のHC層を設けた。さらにその上にSiO
2(λ/4n、95nm)を形成し、さらに金属層/透明
薄膜層を形成し、保護層としてSiO2(λ/2n、19
0nm)を形成し、更に汚染防止剤としてパーフルオロ
アルキルシラン系材料(信越化学社製、KP801M)
を塗工処理して、厚さが0.01μmの汚染防止層を形
成したこと以外は、実施例1に準じた。Example 8 The HC layer of Example 1 was provided on the transparent shatterproof layer of Example 7. In addition, SiO
2 (λ / 4n, 95 nm), a metal layer / a transparent thin film layer is further formed, and SiO 2 (λ / 2n, 19
0 nm), and a perfluoroalkylsilane-based material (KP801M, manufactured by Shin-Etsu Chemical Co., Ltd.) as a pollution inhibitor.
Was applied to form a contamination preventing layer having a thickness of 0.01 μm.
【0128】このPDP用フィルターつきガラス基板の
透過率は65%であり、総厚みは約638μmであっ
た。 構成:防汚染層処理SiO2/(IT/Ag)3/ IT/SiO
2 /HC層/飛散防止層PET/ 割れ防止層1粘着剤
層/割れ防止層2/POVIC-T/粘着剤層/PDP
ガラス基板 このようにして得られた本発明の透明衝撃緩和積層体を
ガラス基板に貼り合わせた模式的断面構成説明図を図7
に示す。The transmittance of the glass substrate with a filter for PDP was 65%, and the total thickness was about 638 μm. Configuration: anti-fouling layer processing SiO 2 / (IT / Ag) 3 / IT / SiO
2 / HC layer / scattering prevention layer PET / cracking prevention layer 1 adhesive layer / cracking prevention layer 2 / POVIC-T / adhesive layer / PDP
Glass Substrate FIG. 7 is a schematic cross-sectional configuration explanatory view in which the thus obtained transparent shock absorbing laminate of the present invention is bonded to a glass substrate.
Shown in
【0129】(実施例9)実施例8の防汚染層処理SiO2
保護層の代わりに市販ARPET(日本油脂社製リアル
ック、約105μm)フィルムを実施例7記載の透明粘着剤
層(25μm)を介して電磁波シールド+NIR遮蔽層上に貼
り合わせ、HC層を除いたこと以外は実施例8に準じ
た。Example 9 SiO 2 treated with an anti-staining layer of Example 8
Instead of the protective layer, a commercially available ARPET (Realok, manufactured by NOF CORPORATION, about 105 μm) film was laminated on the electromagnetic wave shield + NIR shielding layer via the transparent adhesive layer (25 μm) described in Example 7 to remove the HC layer. Except for this, the procedure was the same as in Example 8.
【0130】このPDP用フィルターつきガラス基板の
透過率は63%であり、総厚みは約768μmであった。 構成:反射防止PET/粘着剤層/(IT/Ag)3/IT/Si
O2/飛散防止層PET/割れ防止層1粘着剤層/割れ
防止層2POVIC-T/粘着剤層/PDPガラス基板 このようにして得られた本発明の透明衝撃緩和積層体を
ガラス基板に貼り合わせた模式的断面構成説明図を図8
に示す。The transmittance of this glass substrate with a filter for PDP was 63%, and the total thickness was about 768 μm. Composition: Anti-reflection PET / Adhesive layer / (IT / Ag) 3 / IT / Si
O 2 / scattering prevention layer PET / breaking prevention layer 1 pressure-sensitive adhesive layer / breaking prevention layer 2POVIC-T / pressure-sensitive adhesive layer / PDP glass substrate The thus obtained transparent shock-releasing laminate of the present invention is attached to a glass substrate. FIG. 8 is an explanatory diagram of the combined schematic cross-sectional configuration.
Shown in
【0131】(実施例10)割れ防止層2として、ウレ
タン500μm( シーダム社製 DUS605無黄変タイ
プ、G 4.6×107Pa)フィルムにしたこと以外は実
施例7に準じた。Example 10 The procedure of Example 7 was followed except that a film of urethane 500 μm (DUS605, non-yellowing type, G 4.6 × 10 7 Pa, manufactured by Seedam Company) was used as the crack preventing layer 2.
【0132】このPDP用フィルターつきガラス基板の
透過率は65%であり、総厚みは643μmであった。 構成:AR/HC/飛散防止層PET/SiO2/(IT/A
g)3/IT/割れ防止層1粘着剤層/割れ防止層2DUS 60
5/粘着剤層/PDPガラス基板 (実施例11)割れ防止層2として、クリアテックH4
00μm( クラレトレディング製 ポリプロピレンにス
チレン・ビニル・イソプレンエラストマーを添加、G
3.1×107Pa)フィルムにしたこと以外は実施例7に準
じた。The transmittance of the glass substrate with a filter for PDP was 65%, and the total thickness was 643 μm. Configuration: AR / HC / shatterproof layer PET / SiO 2 / (IT / A
g) 3 / IT / anti-cracking layer 1 adhesive layer / anti-cracking layer 2 DUS 60
5 / Adhesive layer / PDP glass substrate (Example 11) As a crack prevention layer 2, Cleartec H4
00μm (Kuraray Trading polypropylene with styrene / vinyl / isoprene elastomer added, G
3.1 × 10 7 Pa) According to Example 7, except that the film was used.
【0133】このPDP用フィルターつきガラス基板の
透過率は58%であり、総厚みは643μmであった。 構成:AR/HC/飛散防止層PET/SiO2/(IT/
Ag)3/IT/割れ防止層1粘着剤層/割れ防止層2クリア
テックH/粘着剤層/PDPガラス基板 (実施例12)実施例7の割れ防止層1と2が逆になっ
たこと以外は実施例7に準じた。 構成:AR/HC/飛散防止層PET/SiO2/(IT/
Ag)3/IT/割れ防止層1POVIC―T/割れ防止層2粘着
剤層/粘着剤層/PDPガラス基板 (比較例4)実施例7の 割れ防止層2をPET400
μmに代えた以外は、実施例1に準じた。 構成:AR/HC/飛散防止層PET/SiO2/(IT/
Ag)3/IT/割れ防止層1粘着剤層/割れ防止層2PE
T/粘着剤層/PDPガラス基板 このPDP用フィルターつきガラス基板の透過率は63
%であり、総厚みは643μmであった。The transmittance of the glass substrate with a filter for PDP was 58%, and the total thickness was 643 μm. Structure: AR / HC / scattering prevention layer PET / SiO 2 / (IT /
Ag) 3 / IT / anti-cracking layer 1 adhesive layer / anti-cracking layer 2 Cleartech H / adhesive layer / PDP glass substrate (Example 12) The anti-cracking layers 1 and 2 of Example 7 were reversed. Except for the above, it was the same as Example 7. Structure: AR / HC / scattering prevention layer PET / SiO 2 / (IT /
Ag) 3 / IT / anti-cracking layer 1 POVIC-T / anti-cracking layer 2 adhesive layer / adhesive layer / PDP glass substrate (Comparative Example 4) The anti-cracking layer 2 of Example 7 was replaced with PET400.
Example 1 was repeated except that μm was used. Structure: AR / HC / scattering prevention layer PET / SiO 2 / (IT /
Ag) 3 / IT / anti-cracking layer 1 adhesive layer / anti-cracking layer 2PE
T / adhesive layer / PDP glass substrate The transmittance of this glass substrate with a filter for PDP is 63
%, And the total thickness was 643 μm.
【0134】(比較例5)実施例7の割れ防止層1と2
を除去した以外は実施例7に準じた。 構成:AR/HC/飛散防止層PET/SiO2/(IT/
Ag)3/IT/粘着剤層/PDPガラス基板 このPDP用フィルターつきガラス基板の透過率は65
%であり、総厚み218μmであった。(Comparative Example 5) The crack preventing layers 1 and 2 of Example 7
Example 7 was repeated except that was removed. Structure: AR / HC / scattering prevention layer PET / SiO 2 / (IT /
Ag) 3 / IT / adhesive layer / PDP glass substrate The transmittance of this glass substrate with a filter for PDP is 65
%, And the total thickness was 218 μm.
【0135】(比較例6)実施例10の飛散防止PET
フィルムと割れ防止層1の粘着剤層を除きウレタンフィ
ルムと粘着剤層のみを高歪み点ガラス(PD200)に
直接貼り合わせたこと以外は実施例7に準じた。 構成:AR/HC/SiO2/(IT/Ag)3/IT/割れ防
止層2DUS 605/粘着剤層/PDPガラス基板 このPDP用フィルターつきガラス基板の透過率は65
%であり、総厚みは430μmであった。(Comparative Example 6) The scattering prevention PET of Example 10
Example 7 was repeated except that the urethane film and the pressure-sensitive adhesive layer were directly bonded to the high strain point glass (PD200) except for the film and the pressure-sensitive adhesive layer of the crack prevention layer 1. Structure: AR / HC / SiO 2 / (IT / Ag) 3 / IT / breakage prevention layer 2DUS 605 / adhesive layer / PDP glass substrate The transmittance of this glass substrate with a filter for PDP is 65.
%, And the total thickness was 430 μm.
【0136】(比較例7)金属層/透明薄膜層がIT65/A
g13/IT65(nm)の3層構成からなること以外は実施例
7に準じた。このPDP用フィルターつきガラス基板の
透過率は66%であり、総厚みは643μmであった。
なお、シールド層の表面抵抗は5.5Ω/cm2であっ
た。(Comparative Example 7) The metal layer / transparent thin film layer was IT65 / A
Example 7 was followed except that it had a three-layer structure of g13 / IT65 (nm). The transmittance of this glass substrate with a filter for PDP was 66%, and the total thickness was 643 μm.
The surface resistance of the shield layer was 5.5Ω / cm 2 .
【0137】(実施例13)実施例9のうち、反射防止
PET/粘着剤層/(IT/Ag)3/IT/SiO2/飛散
防止PETのSiO2を除き、導電薄膜積層体を飛散防
止PET裏面に形成し、逆表面側にCuとCrからなる
導電性パターニングメッシュとして線径30μm、線間
ピッチ200μmで形成した。そのパターニングメッシ
ュの開口率は約74%である、更にその上に粘着剤層を
形成して開口部を埋め、さらにその上に反射防止PET
を貼り合せたこと以外は実施例9に準じる。[0137] (Example 13) of Example 9, the anti-reflection PET / adhesive layer / the exception of (IT / Ag) 3 / IT / SiO 2 of SiO 2 / shatterproof PET, shatterproof conductive thin film stack A conductive patterning mesh made of Cu and Cr was formed on the reverse side of the PET and formed on the reverse side with a wire diameter of 30 μm and a line pitch of 200 μm. The aperture ratio of the patterning mesh is about 74%. Further, an adhesive layer is formed thereon to fill the opening, and the antireflection PET is further placed thereon.
Example 9 is adhered except that is bonded.
【0138】構成としては、ARPET/粘着剤層/パ
ターニングメッシュCu−Cr/PET/(IT/Ag)3+
IT/割れ防止1粘着剤層/割れ防止2POVIC−T
/粘着剤層/PDPガラス基板である。この透過率は約
50%で反射率は約2%であった。The structure is as follows: ARPET / adhesive layer / patterned mesh Cu-Cr / PET / (IT / Ag) 3+
IT / break prevention 1 adhesive layer / break prevention 2POVIC-T
/ Pressure-sensitive adhesive layer / PDP glass substrate. The transmittance was about 50% and the reflectance was about 2%.
【0139】このようにして得られた本発明の透明衝撃
緩和積層体をガラス基板に貼り合わせた模式的断面構成
説明図を図9に示す。なお、図9中、10は銀ペース
ト、11は粘着剤層、12は導電性パターニングメッシ
ュを示している。FIG. 9 is a schematic cross-sectional configuration explanatory view in which the thus obtained transparent impact relaxation laminate of the present invention is bonded to a glass substrate. In FIG. 9, 10 indicates a silver paste, 11 indicates an adhesive layer, and 12 indicates a conductive patterning mesh.
【0140】本構成では、電磁波シールド層がパターニ
ングメッシュ層と導電薄膜積層体であり、かつ近赤外線
遮蔽層が導電薄膜積層体である。In this configuration, the electromagnetic wave shielding layer is a patterning mesh layer and a conductive thin film laminate, and the near-infrared shielding layer is a conductive thin film laminate.
【0141】なお、前記全て7−13の実施例におい
て、電磁波シールド層のアース処理をするために、透明
導電膜積層体ならびに金属パターニングメッシュ上に銀
ペースト(藤倉化成社製 ドータイトFA−301 C
A)を幅約10mm、厚み約20μm程度の4辺枠印刷
をスクリーン印刷機で形成する。すなわち、シールド面
に保護層を設ける際は、保護層は銀ペースト4辺枠以外
の内部に形成し、シールド面が飛散防止PETの裏面に
なる場合は、割れ防止層1、割れ防止層2、粘着剤層を
銀ペースト4辺枠以外の内部に形成する。In the above Examples 7-13, a silver paste (Dotite FA-301C manufactured by Fujikura Kasei Co., Ltd.) was applied on the transparent conductive film laminate and the metal patterning mesh to ground the electromagnetic wave shielding layer.
A) is printed on a screen printer to form a four-sided frame print having a width of about 10 mm and a thickness of about 20 μm. That is, when a protective layer is provided on the shield surface, the protective layer is formed inside the silver paste other than the four-sided frame, and when the shield surface is the back surface of the scattering prevention PET, the crack prevention layer 1, the crack prevention layer 2,. An adhesive layer is formed inside the silver paste other than the four-sided frame.
【0142】以上の結果を表5及び表6に示す。The above results are shown in Tables 5 and 6.
【0143】[0143]
【表5】 [Table 5]
【0144】[0144]
【表6】 [Table 6]
【0145】以上の結果から明らかなとおり、本発明の
実施例は、衝撃緩和率、飛散防止性、割れ防止性が高い
とともに、光学特性に優れかつ高い光線透過率を兼ね備
えた衝撃緩和積層体を実現できた。更にガラス基板に直
接上記積層体を形成するため、 空隙がなく外光の2重
写りや汚れの蓄積がなくなる。また電磁波シールド層と
近赤外線(NIR)遮蔽層を銀系透明層/高屈薄膜層の
多層構成にすることでシールド効果10dB以上ならび
にNIR800―1200nm領域の透過率を20%以下にする
ことができ、PDPフィルターとして有用であった。As is evident from the above results, the embodiment of the present invention provides a shock-relaxed laminate having both high impact relaxation rate, scattering prevention property and crack prevention property, excellent optical properties and high light transmittance. I realized it. Furthermore, since the above-mentioned laminate is formed directly on the glass substrate, there is no void, and double reflection of external light and accumulation of dirt are eliminated. Further, by forming the electromagnetic wave shielding layer and the near infrared (NIR) shielding layer into a multilayer structure of a silver-based transparent layer / a highly bent thin film layer, the shielding effect can be reduced to 10 dB or more and the transmittance in the NIR 800 to 1200 nm region can be reduced to 20% or less. And was useful as a PDP filter.
【0146】[0146]
【発明の効果】本発明は、ガラスパネルに直接透明な飛
散防止層、割れ防止層、粘着剤層からなる衝撃緩和積層
体を貼り合せることで、ガラスの飛散防止、割れ防止性
を向止させ、かつガラスパネル自体に直接貼り合せるこ
とで、画像の鮮明性を向上させ、更にパネルと衝撃緩和
シートの間に空気層がなく、外光の2重写りがなくホコ
リやヤニなどの汚れが着かないFPD用衝撃緩和積層体
を提供できる。According to the present invention, a glass panel is directly laminated with a transparent shock-absorbing layer composed of a scattering-preventing layer, a crack-preventing layer, and an adhesive layer to prevent the glass from scattering and breaking. And directly adheres to the glass panel itself to improve the clarity of the image. Furthermore, there is no air layer between the panel and the shock absorbing sheet, there is no double reflection of external light, and dirt such as dust and dirt is deposited. It is possible to provide a shock-absorbing laminate for FPD that does not exist.
【0147】また電磁波シールド層と近赤外線(NI
R)遮蔽層を設けたものは、電磁波シールド性と近赤外
線(NIR)遮蔽性にも優れていた。更にガラス基板に
透明粘着剤層を介して直接上記積層体を形成するため、
空隙がなく外光の2重写りや汚れの蓄積がなくなる。An electromagnetic wave shielding layer and a near infrared ray (NI
R) The one provided with a shielding layer was also excellent in electromagnetic wave shielding properties and near infrared (NIR) shielding properties. Furthermore, in order to form the laminate directly on the glass substrate via the transparent adhesive layer,
There is no air gap, and double exposure of external light and accumulation of dirt are eliminated.
【図1】本発明の一実施例の衝撃緩和積層体をガラス基
板に貼り合わせた模式的断面図。FIG. 1 is a schematic cross-sectional view in which an impact relaxation laminate according to one embodiment of the present invention is bonded to a glass substrate.
【図2】本発明の一実施例の電磁波シールド層と近赤外
線(NIR)遮蔽層を設けた衝撃緩和積層体をガラス基
板に貼り合わせた模式的断面図。FIG. 2 is a schematic cross-sectional view showing an example of the present invention, in which an impact relaxation laminate provided with an electromagnetic wave shielding layer and a near infrared (NIR) shielding layer is bonded to a glass substrate.
【図3】本発明の一実施例の鋼球自由落下の衝撃力測定
方法を示す説明図。FIG. 3 is an explanatory view showing a method for measuring the impact force of a steel ball free fall according to one embodiment of the present invention.
【図4】本発明の一実施例の鋼球自由落下の衝撃力測定
結果を示すグラフ。FIG. 4 is a graph showing the results of measuring the impact force of a steel ball free fall according to one embodiment of the present invention.
【図5】本発明の一実施例の破壊試験の測定方法を示す
説明図。FIG. 5 is an explanatory view showing a measuring method of a destructive test according to one embodiment of the present invention.
【図6】本発明の実施例7の模式的断面構成の説明図。FIG. 6 is an explanatory diagram of a schematic sectional configuration of a seventh embodiment of the present invention.
【図7】本発明の実施例8の模式的断面構成の説明図。FIG. 7 is an explanatory diagram of a schematic sectional configuration of an eighth embodiment of the present invention.
【図8】本発明の実施例9の模式的断面構成の説明図。FIG. 8 is an explanatory diagram of a schematic sectional configuration of a ninth embodiment of the present invention.
【図9】本発明の実施例13の模式的断面構成の説明
図。FIG. 9 is an explanatory diagram of a schematic sectional configuration of a thirteenth embodiment of the present invention.
1 割れ防止層 2 割れ防止層 3 粘着剤層 4 FPDパネルガラス基板 5 飛散防止層 10 銀ペースト 11 粘着剤層 12 導電性パターニングメッシュ DESCRIPTION OF SYMBOLS 1 Crack prevention layer 2 Crack prevention layer 3 Adhesive layer 4 FPD panel glass substrate 5 Shatterproof layer 10 Silver paste 11 Adhesive layer 12 Conductive patterning mesh
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 FI テーマコート゛(参考) G02B 1/11 H01J 11/02 E 5/22 29/87 H01J 11/02 H04N 5/66 101A 29/87 G02B 1/10 Z H04N 5/66 101 A (72)発明者 中村 年孝 大阪府茨木市下穂積1丁目1番2号 日東 電工株式会社内 (72)発明者 安積 由起子 大阪府茨木市下穂積1丁目1番2号 日東 電工株式会社内──────────────────────────────────────────────────続 き Continued on the front page (51) Int.Cl. 7 Identification symbol FI Theme coat ゛ (Reference) G02B 1/11 H01J 11/02 E 5/22 29/87 H01J 11/02 H04N 5/66 101A 29/87 G02B 1/10 Z H04N 5/66 101 A (72) Inventor Toshitaka Nakamura 1-1-2 Shimohozumi, Ibaraki City, Osaka Prefecture Inside Nitto Denko Corporation (72) Inventor Yukiko Azumi 1, Shimohozumi Ibaraki City, Osaka Prefecture 1-2, Nitto Denko Corporation
Claims (9)
重量510g)に相当する衝撃力により、破壊されるディ
スプレイ表示装置のガラスパネル基板上に形成される透
明衝撃緩和積層体であって、前記積層体が、せん断弾性
率が2×108Pa以上である飛散防止層と、せん断弾性
率が1×104〜2×108Paの範囲で且つ2種類以上
のせん断弾性率の異なる割れ防止層と、透明な粘着剤層
とを含むことを特徴とする透明衝撃緩和積層体。(1) 79,000 N (1.5 mx height)
A transparent shock-mitigating laminate formed on a glass panel substrate of a display device that is destroyed by an impact force corresponding to a weight of 510 g), wherein the laminate has a shear modulus of 2 × 10 8 Pa or more. A scattering prevention layer, a crack prevention layer having a shear modulus in the range of 1 × 10 4 to 2 × 10 8 Pa and two or more different shear moduli, and a transparent pressure-sensitive adhesive layer. Transparent shock absorbing laminate.
は800〜1200nmの範囲の透過率が20%以下の近赤外線遮
蔽層を含む請求項1に記載の透明衝撃緩和積層体。2. The transparent shock absorbing laminate according to claim 1, further comprising a transparent electromagnetic wave shielding layer and / or a near-infrared shielding layer having a transmittance in the range of 800 to 1200 nm of 20% or less.
止層からなる透明衝撃緩和積層体ならびに電磁波シール
ド層および/または近赤外線遮蔽層の総厚みが5mm以
下であり、かつその可視光透過率が40%以上である請
求項1または2に記載の透明衝撃緩和積層体。3. The transparent shock-absorbing laminate comprising a transparent pressure-sensitive adhesive layer and a crack-preventing and scattering-preventing layer, and a total thickness of an electromagnetic wave shielding layer and / or a near-infrared shielding layer is 5 mm or less, and the visible light transmittance thereof. Is 40% or more.
力を50%以下に緩和する請求項1〜3のいずれかに記
載の透明衝撃緩和積層体。4. The transparent impact-relieving laminate according to claim 1, wherein the impact strength of a steel ball falling corresponding to an impact of 79,000 N is reduced to 50% or less.
層と割れ防止層が3層以上からなり、下記の(A)に示
す透明衝撃緩和積層体において、 飛散防止層、割れ防止層、粘着剤層の構成順からなり、
各割れ防止層の積層順番は下記の(B)の式に示す割れ防
止層の各界面に接する上下層材料のせん断弾性率比の対
数の絶対値の総和が最も大きくなることを特徴とする透
明衝撃緩和積層体。 (A)透明衝撃緩和積層体: 飛散防止層(1)/割れ防止層(2),割れ防止層
(3)・・・割れ防止層(n)/ 粘着剤層 (B)せん断弾性率(G)比の対数の絶対値 の総和 : |Log G1/G2|+|Log G2/G3|+・・・・+|Log Gn-1/Gn
|+|Log Gn/G粘着剤層|5. The transparent shock-absorbing laminate shown in (A) below, wherein the scattering prevention layer and the crack prevention layer according to any one of claims 1 to 4 are composed of three or more layers. Layer, the order of the composition of the adhesive layer,
The order of lamination of each crack prevention layer is such that the sum of the absolute values of the logarithms of the shear modulus ratios of the upper and lower layer materials in contact with each interface of the crack prevention layer shown in the following equation (B) is the largest. Shock absorbing laminate. (A) Transparent impact-mitigating laminate: anti-scattering layer (1) / anti-cracking layer (2), anti-cracking layer (3) ... anti-cracking layer (n) / adhesive layer (B) Shear modulus (G) ) Sum of absolute values of logarithm of ratio: | Log G1 / G2 | + | Log G2 / G3 | +... + | Log Gn-1 / Gn
| + | Log Gn / G adhesive layer |
防止または写り込み防止保護層を基本構成として、電磁
波シールドおよび/または近赤外線遮蔽層を前記基本構
成内に含む請求項1〜5のいずれかに記載の透明衝撃緩
和積層体。6. An electromagnetic wave shield and / or a near-infrared shield layer is included in the basic structure based on a pressure-sensitive adhesive layer / a crack prevention layer / a scattering prevention layer / an anti-reflection or anti-reflection protection layer. 5. The transparent impact-reducing laminate according to any one of 5.
イ用フィルターである請求項1〜6のいずれかに記載の
透明衝撃緩和積層体。7. The transparent impact relaxation laminate according to claim 1, wherein the transparent impact relaxation laminate is a filter for a plasma display.
撃緩和積層体を貼り合せたことを特徴とするプラズマデ
ィスプレイ表示装置。8. A plasma display device, comprising the transparent shock-absorbing laminate according to claim 1.
緩和積層体を貼り合せたことを特徴とするフラットパネ
ルディスプレイ表示装置。9. A flat panel display device, wherein the transparent shock absorbing laminate according to claim 1 is bonded.
Priority Applications (1)
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JP2001072633A JP2002023649A (en) | 2000-03-15 | 2001-03-14 | Transparent impact relaxation laminated body and display device using the same |
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
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JP2000072223 | 2000-03-15 | ||
JP2000-132799 | 2000-05-01 | ||
JP2000132799 | 2000-05-01 | ||
JP2000-72223 | 2000-05-01 | ||
JP2001072633A JP2002023649A (en) | 2000-03-15 | 2001-03-14 | Transparent impact relaxation laminated body and display device using the same |
Publications (1)
Publication Number | Publication Date |
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JP2002023649A true JP2002023649A (en) | 2002-01-23 |
Family
ID=27342676
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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JP2001072633A Pending JP2002023649A (en) | 2000-03-15 | 2001-03-14 | Transparent impact relaxation laminated body and display device using the same |
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JP (1) | JP2002023649A (en) |
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