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JP2002018998A - Protection film and conductor foil laminate - Google Patents

Protection film and conductor foil laminate

Info

Publication number
JP2002018998A
JP2002018998A JP2000201797A JP2000201797A JP2002018998A JP 2002018998 A JP2002018998 A JP 2002018998A JP 2000201797 A JP2000201797 A JP 2000201797A JP 2000201797 A JP2000201797 A JP 2000201797A JP 2002018998 A JP2002018998 A JP 2002018998A
Authority
JP
Japan
Prior art keywords
adhesive layer
protective film
conductor foil
circuit
foil
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2000201797A
Other languages
Japanese (ja)
Other versions
JP4454805B2 (en
Inventor
Takeomi Miyako
強臣 宮古
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Zacros Corp
Original Assignee
Fujimori Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujimori Kogyo Co Ltd filed Critical Fujimori Kogyo Co Ltd
Priority to JP2000201797A priority Critical patent/JP4454805B2/en
Publication of JP2002018998A publication Critical patent/JP2002018998A/en
Application granted granted Critical
Publication of JP4454805B2 publication Critical patent/JP4454805B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Landscapes

  • Laminated Bodies (AREA)
  • Adhesive Tapes (AREA)
  • Adhesives Or Adhesive Processes (AREA)

Abstract

(57)【要約】 【課題】 導体箔の保護性に優れ、埃などの混入がな
く、シワや折れあとなどが入り難く、且つ、取り扱い性
が良好な導体箔貼着用保護フィルム及びそれを用いた導
体箔積層体を提供する。 【解決手段】 支持体の一方の面に接着剤を部分的に形
成した、導体箔貼着用保護フィルム10であって、該接
着剤層14が導体箔に回路を形成するための回路形成予
定領域12の周縁部に形成されることを特徴とする。こ
の回路形成予定領域12が離型処理されていることが好
ましい。
PROBLEM TO BE SOLVED: To provide a protective film for sticking a conductive foil, which is excellent in protecting property of a conductive foil, is free from dust and the like, hardly causes wrinkles and breaks, and has good handleability. The present invention provides a laminated conductor foil. SOLUTION: This is a conductor foil sticking protection film 10 in which an adhesive is partially formed on one surface of a support, and the adhesive layer 14 is a circuit formation scheduled area for forming a circuit on the conductor foil. 12 is formed on the periphery. It is preferable that the circuit forming region 12 is subjected to a mold release treatment.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、電子機器などに広
範に使用される積層配線基板として用いられる導体箔積
層体用の保護フィルム及びそれを用いた導体箔積層体に
関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a protective film for a conductor foil laminate used as a laminated wiring board widely used in electronic equipment and the like, and a conductor foil laminate using the same.

【0002】[0002]

【従来の技術】従来、積層配線基板に用いられる導体箔
はその取り扱い性向上の観点から、なんらかの支持体に
積層された積層体の構成をとることが一般的である。例
えば、特開平9−214137号公報には導体箔と離型
フィルムを積層した離型フィルム付き導体箔を用いた積
層板の製造方法が記載されている。特開平8−1859
号公報には導電性材料から形成される支持体上に加熱に
より接着力が低下する接着剤を介して金属箔を積層した
金属離型シートが記載されている。
2. Description of the Related Art Conventionally, a conductor foil used for a laminated wiring board generally has a structure of a laminated body laminated on some kind of support from the viewpoint of improving the handleability. For example, Japanese Patent Application Laid-Open No. 9-214137 describes a method for manufacturing a laminate using a conductor foil with a release film in which a conductor foil and a release film are laminated. JP-A-8-1859
Japanese Patent Application Laid-Open Publication No. H11-146,086 discloses a metal release sheet in which a metal foil is laminated on a support formed of a conductive material via an adhesive whose adhesive strength is reduced by heating.

【0003】これらの支持体は導体箔の保護フィルムと
しての機能を果たしており、導体箔に剥離可能に貼着さ
れている。導体箔と保護フィルムとは通常、加熱などの
手段により剥離可能となる接着剤層を介して貼着されて
おり、接着剤層は支持体全面に設けられていることが多
い。しかしながら、剥離の容易性やプリプレグの表面に
プリプレグの繊維屑や樹脂溜りなどの異物が存在した場
合に接着剤層の弾性が低いとそれらの異物がくい込み導
体箔に裂けが生じるなどの影響を考慮すれば、部分的に
設けることも考えられ、例えば、前記特開平8−185
9号公報には接着剤が支持体上に点在するように設けら
れてもよいし、長手方向両端縁に所定幅をもって帯状に
設けられてもよいと記載されている。
[0003] These supports function as a protective film for the conductor foil and are releasably attached to the conductor foil. The conductive foil and the protective film are usually adhered via an adhesive layer which can be peeled off by means such as heating, and the adhesive layer is often provided on the entire surface of the support. However, in consideration of the ease of peeling and the influence of foreign matter such as fiber dust and resin pool of the prepreg on the surface of the prepreg, if the elasticity of the adhesive layer is low, such foreign matter will penetrate and cause the conductor foil to tear. In such a case, it is conceivable to provide a part thereof.
No. 9 describes that the adhesive may be provided so as to be scattered on the support, or may be provided in a band shape with a predetermined width at both ends in the longitudinal direction.

【0004】近年、形成される回路の高密度化にともな
い導体箔の薄肉化が求められているが、そのような薄い
導体箔の取り扱い性を向上させる要請により支持体との
積層体として取り扱うことが一般的となっている。しか
し、導体箔の厚みが極めて薄いため、接着剤層を部分的
に設けた場合や接着剤層を全面にわたり点在させた場
合、接着剤層の厚みの段差の影響や接着剤層の低弾性率
の影響の観点から、解決すべき問題も多く、また、長手
方向の両端部に設けた接着剤の場合、横断方向に大きな
空隙が存在することになり、プリプレグの繊維屑などの
ごみや埃が回路形成部に進入しやすい。しかも成形時に
シワになりやすいという問題がある。回路形成部に埃な
どが存在する場合、後述する積層回路形成の際に導体箔
の凹凸や亀裂に起因する回路の欠陥を引き起こす原因と
なる。
[0004] In recent years, there has been a demand for thinner conductive foils with the increase in the density of circuits to be formed. However, due to the demand for improving the handleability of such thin conductive foils, they have been required to be handled as a laminate with a support. Has become commonplace. However, since the thickness of the conductive foil is extremely thin, when the adhesive layer is partially provided or when the adhesive layer is scattered over the entire surface, the influence of the step of the adhesive layer thickness and the low elasticity of the adhesive layer There are many problems to be solved from the viewpoint of the influence of the rate, and in the case of the adhesive provided at both ends in the longitudinal direction, there are large voids in the transverse direction, so that garbage and dust such as fiber waste of the prepreg are present. Can easily enter the circuit forming portion. In addition, there is a problem that wrinkles easily occur during molding. If dust or the like is present in the circuit forming portion, it may cause circuit defects due to irregularities or cracks in the conductive foil when forming a laminated circuit described later.

【0005】[0005]

【発明が解決しようとする課題】上記の問題を解決する
ため本発明はなされたものであり、本発明の目的は、導
体箔の保護性に優れ、埃などの混入がなく、シワや押さ
れあとが入り難く、且つ、取り扱い性が良好な導体箔貼
着用保護フィルム及びそれを用いた導体箔積層体を提供
することにある。
DISCLOSURE OF THE INVENTION The present invention has been made to solve the above-mentioned problems, and an object of the present invention is to provide a conductor foil having excellent protection properties, no dust and the like, and no wrinkles or pushes. It is an object of the present invention to provide a conductor foil sticking protection film which is hard to leave behind and has good handleability, and a conductor foil laminate using the same.

【0006】[0006]

【課題を解決するための手段】本発明者らは、検討の結
果、支持体となる保護フィルムの所定領域のみに接着剤
層を設けることにより前記問題点を解決することを見出
し、本発明を完成した。即ち、本発明の保護フィルム
は、支持体の一方の面に接着剤を部分的に形成した、導
体箔貼着用保護フィルムであって、該接着剤層が導体箔
に回路を形成するための回路形成予定領域の周囲部に形
成されることを特徴とする。この接着剤層は、通気可能
な空隙部を有して、例えば、破線状に形成されることが
好ましく、厚みは0.1μm以上10μm未満であるこ
とが好ましく、0.1μm〜5μmであることがより好
ましい。また、接着剤層を有しない回路形成予定領域は
離型処理されていることが好ましい。本発明の支持体と
して合成樹脂フィルムを用いる場合には、前記接着剤層
が形成される面の反対側面に離型層を形成することが好
ましい態様である。また、請求項6に係る本発明の導体
箔積層体は、前記本発明の保護フィルムの接着剤層に導
体箔が貼着されてなることを特徴とする。
As a result of the study, the present inventors have found that the above problem can be solved by providing an adhesive layer only in a predetermined region of a protective film serving as a support. completed. That is, the protective film of the present invention is a conductive foil sticking protective film in which an adhesive is partially formed on one surface of a support, wherein the adhesive layer forms a circuit on the conductive foil. It is characterized in that it is formed around the formation scheduled area. This adhesive layer has a void portion that can be ventilated, and is preferably formed, for example, in the form of a broken line, and has a thickness of preferably 0.1 μm or more and less than 10 μm, and 0.1 μm to 5 μm. Is more preferred. Further, it is preferable that a region where a circuit is to be formed having no adhesive layer is subjected to a mold release treatment. In a case where a synthetic resin film is used as the support of the present invention, it is a preferred embodiment that a release layer is formed on the side opposite to the side on which the adhesive layer is formed. The conductor foil laminate of the present invention according to claim 6 is characterized in that a conductor foil is attached to the adhesive layer of the protective film of the present invention.

【0007】[0007]

【発明の実施の形態】以下、本発明を詳細に説明する。
本発明において保護フィルムの支持体基材として用いら
れる材料には特に制限はなく、アルミニウム箔の如き金
属箔でもよく、また、合成樹脂フィルムであってもよ
い。保護フィルム用の支持体基材として合成樹脂フィル
ムを用いる場合は、ポリエチレンテレフタレート(PE
T)フィルムやポリエチレンナフタレート(PEN)フ
ィルムのようなポリエステル樹脂フィルム、ポリフェニ
ルサルファイド(PPS)フィルム、ポリイミド(P
I)フィルム、二軸延伸ポリプロピレン(OPP)フィ
ルム、メチルペンテンコポリマー(PTX)フィルム、
フッ化エチレン(1F)、3フッ化エチレン(3F)、
4フッ化エチレン(4F)等のフッ素樹脂フィルムな
ど、及びこれらの2種以上のラミネートフィルムを挙げ
ることができる。これらのなかでも、表面が平滑で、耐
熱性に優れ、入手が比較的容易であるポリフェニルサル
ファイド(PPS)フィルムが好ましい。
BEST MODE FOR CARRYING OUT THE INVENTION Hereinafter, the present invention will be described in detail.
In the present invention, the material used as the support substrate of the protective film is not particularly limited, and may be a metal foil such as an aluminum foil or a synthetic resin film. When a synthetic resin film is used as a support substrate for a protective film, polyethylene terephthalate (PE)
T) film, polyester resin film such as polyethylene naphthalate (PEN) film, polyphenyl sulfide (PPS) film, polyimide (P
I) film, biaxially oriented polypropylene (OPP) film, methylpentene copolymer (PTX) film,
Ethylene fluoride (1F), ethylene trifluoride (3F),
Examples thereof include a fluororesin film such as tetrafluoroethylene (4F) and a laminate film of two or more of these. Among these, a polyphenylsulfide (PPS) film having a smooth surface, excellent heat resistance, and relatively easy to obtain is preferable.

【0008】支持体基材として合成樹脂フィルムを用い
る場合には、取り扱い性の観点から、その厚みは12〜
50μm程度であることが好ましく、アルミ箔の如き金
属箔を用いた場合には、12〜100μm程度であるこ
とが好ましい。フィルムが厚すぎると配線基板の製造時
にプリプレグを積層する場合、補強用のガラス繊維の凹
凸に押されて導体箔が接着剤層に食い込み、傷つく原因
ともなり、さらには、コスト的にも不利となる。また、
薄すぎると作業性、保護性が低下するため、いずれも好
ましくない。
[0008] When a synthetic resin film is used as the support substrate, the thickness is 12 to 10 from the viewpoint of handleability.
The thickness is preferably about 50 μm, and when a metal foil such as an aluminum foil is used, it is preferably about 12 to 100 μm. If the film is too thick, when prepregs are laminated during the production of wiring boards, the conductor foil will be pushed into the adhesive layer by the unevenness of the reinforcing glass fiber, causing damage to the adhesive layer, and furthermore, disadvantageous in terms of cost Become. Also,
If the thickness is too small, the workability and the protection are reduced, and neither is preferred.

【0009】これらのうち、合成樹脂からなるフィルム
を支持体として用いる場合には、後述される積層板の製
造方法において加圧加熱後の治具の取外しを容易にする
ために、導体箔が設けられる側とは反対側の面が離型処
理されていることが好ましい。離型処理は、加熱時にも
樹脂が治具に溶着しないように耐熱性、硬度及び離型性
を有する材料からなる薄層の離型層を設ける処理であ
り、この層を形成する材料としては、具体的には、エポ
キシ樹脂、シアナート樹脂などの熱硬化性樹脂、シリコ
ン系化合物やシリコン、アルミなどを含有するガラス系
無機化合物等が挙げられ、これらのうち、帯電防止機能
に優れ、耐熱性や硬度にも優れる水酸基を含有するシリ
コン系化合物(シロキサン系化合物)等が好ましい。シ
ロキサン系化合物はシロキサン(Si−O−Si)鎖を
有する鎖状又は網状の化合物であり、例えば、帯電防止
塗料「コルコート」(商品名:コルコート社製)等の市
販品としても入手可能である。
In the case where a film made of a synthetic resin is used as the support, a conductive foil is provided to facilitate removal of the jig after pressurizing and heating in a method of manufacturing a laminate described later. It is preferable that the surface on the side opposite to the side to be subjected to the mold release treatment. The release treatment is a process of providing a thin release layer made of a material having heat resistance, hardness and release properties so that the resin does not weld to the jig even when heated. As a material for forming this layer, Specific examples thereof include thermosetting resins such as epoxy resins and cyanate resins, and silicon-based compounds and glass-based inorganic compounds containing silicon, aluminum, and the like. Hydroxyl-containing silicon-based compounds (siloxane-based compounds) which are also excellent in hardness and hardness are preferred. The siloxane compound is a chain or network compound having a siloxane (Si-O-Si) chain, and is also available as a commercial product such as an antistatic paint "Colcoat" (trade name: manufactured by Colcoat). .

【0010】本発明の保護フィルムでは前記支持体の片
面のうち、導体箔に回路を形成するための回路形成予定
領域の周縁部に接着剤層が形成される。この支持体の接
着剤層を介して導体箔を積層、貼着し、導体箔積層体を
形成する。
In the protective film of the present invention, an adhesive layer is formed on one side of the support at a peripheral portion of a region where a circuit is to be formed for forming a circuit on the conductive foil. A conductor foil is laminated and adhered through the adhesive layer of the support to form a conductor foil laminate.

【0011】図1は、本発明の保護フィルムの接着剤形
成面の一態様を示す平面図である。保護フィルム10の
片面(以下、接着剤層形成面と称する)には、回路形成
予定領域12の周囲部に接着剤層14が形成される。回
路形成予定領域は、通常、配線基板の設計時に確定して
いる。接着剤層は、図1のように周縁部全面にわたって
形成されていてもよく、また、図2(A)、(C)の平
面図に例示されるように、通気可能な空隙部を有する態
様、図2(B)に示されるように均等に配置された点状
の態様等、図2(D)に示されるように破線状の態様等
のように不連続的に形成されていてもよい。接着剤層に
通気可能な空隙部を設けることは、導体箔表面の亀裂防
止の観点から好ましい。また、通気可能な空隙部の大き
さにも特に制限はないが、回路形成領域へのごみや埃の
侵入を効果的に防止する観点からは、できるだけ狭いこ
とが好ましい。
FIG. 1 is a plan view showing one embodiment of the adhesive forming surface of the protective film of the present invention. On one surface of the protective film 10 (hereinafter, referred to as an adhesive layer forming surface), an adhesive layer 14 is formed around the circuit forming area 12. The area where the circuit is to be formed is usually determined at the time of designing the wiring board. The adhesive layer may be formed over the entire peripheral portion as shown in FIG. 1, and as shown in the plan views of FIGS. 2 (B), and may be formed discontinuously, such as a dotted form as shown in FIG. 2 (D), and a dotted form as shown in FIG. 2 (B). . Providing the adhesive layer with air-permeable voids is preferable from the viewpoint of preventing cracks on the conductor foil surface. The size of the air-permeable space is not particularly limited, but is preferably as narrow as possible from the viewpoint of effectively preventing dust and dirt from entering the circuit formation region.

【0012】接着剤層に用いられるベースポリマーとし
ては、加熱により剥離可能となる接着特性を有するもの
が好ましく、物性としては、耐熱性があるもので、高弾
性ポリマーにより構成されるものが好ましい。この接着
剤層に熱剥離特性、即ち、加熱によりその接着力が低下
する特性を付与するため、母材となる接着剤層のベース
ポリマー中に発泡剤や熱硬化性樹脂を配合してもよい。
本発明に用いうる接着剤用の高弾性ポリマーは、常温か
ら150℃における動的弾性率の変化率が小さいものが
好ましい。その変化程度は5倍以内、さらに3倍以内が
好ましい。ベースポリマーを形成するモノマー成分等に
ついては特に限定はない。アクリル系感圧接着剤、ゴム
系感圧接着剤、スチレン・共役ジエンブロック共重合体
系感圧接着剤など、公知の感圧接着剤の調製に用いられ
るモノマー成分のいずれも用いることができる。
The base polymer used for the adhesive layer is preferably a polymer having an adhesive property capable of being peeled off by heating, and a physical property is preferably a material having heat resistance and made of a highly elastic polymer. A foaming agent or a thermosetting resin may be blended in the base polymer of the adhesive layer serving as a base material in order to give the adhesive layer heat release properties, that is, a property that its adhesive strength is reduced by heating. .
The highly elastic polymer for an adhesive which can be used in the present invention preferably has a small dynamic elastic modulus change rate from normal temperature to 150 ° C. The degree of the change is preferably within 5 times, more preferably within 3 times. There is no particular limitation on the monomer components forming the base polymer. Any of the monomer components used in the preparation of known pressure-sensitive adhesives such as an acrylic pressure-sensitive adhesive, a rubber-based pressure-sensitive adhesive, and a styrene / conjugated diene block copolymer-based pressure-sensitive adhesive can be used.

【0013】その具体例としては、メチル基、エチル
基、プロピル基、ブチル基、2−エチルヘキシル基、イ
ソオクチル基、イソノニル基、イソデシル基、ドデシル
基、ラウリル基、トリデシル基、ペンタデシル基、ヘキ
サデシル基、ヘプタデシル基、オクタデシル基、ノナデ
シル基、エイコシル基の如き通例、炭素数が20以下の
アルキル基を有するアクリル酸ないしメタクリル酸の如
きアクリル酸系アルキルエステル、アクリル酸、メタク
リル酸、イタコン酸、アクリル酸ヒドロキシエチル、メ
タクリル酸ヒドロキシエチル、アクリル酸ヒドロキシプ
ロピル、メタクリル酸ヒドロキシプロピル、N−メチロ
ールアクリルアミド、アクリロニトリル、メタクリロニ
トリル、アクリル酸グリシジル、メタクリル酸グリシジ
ル、酢酸ビニル、スチレン、イソプレン、ブタジエン、
イソブチレン、ビニルエーテルなどの重合体或いは共重
合体が挙げられる。また、上記した高弾性ポリマーの条
件を満足する天然ゴムや再生ゴムなども用いることがで
きる。接着剤層の厚さは0.1μm以上10μm未満の
範囲にあることが好ましく、0.1μm〜5μmである
ことがより好ましい。厚さが0.1μm未満であると接
着性が不充分となり、10μm以上であると、ゴミが混
入しやすくなり、プリプレグを積層する場合、接着剤層
の柔軟性に起因して押圧されたプリプレグ由来の粉末物
や他の異物が導体箔を伴って接着剤層にめり込み、この
ため、導体箔が裂ける原因となるおそれがあり、いずれ
も好ましくない。
Specific examples thereof include methyl, ethyl, propyl, butyl, 2-ethylhexyl, isooctyl, isononyl, isodecyl, dodecyl, lauryl, tridecyl, pentadecyl, hexadecyl, Acrylic acid-based alkyl esters such as acrylic acid or methacrylic acid having an alkyl group having 20 or less carbon atoms, such as heptadecyl group, octadecyl group, nonadecyl group, and eicosyl group, acrylic acid, methacrylic acid, itaconic acid, hydroxy acrylate Ethyl, hydroxyethyl methacrylate, hydroxypropyl acrylate, hydroxypropyl methacrylate, N-methylolacrylamide, acrylonitrile, methacrylonitrile, glycidyl acrylate, glycidyl methacrylate, vinyl acetate, vinyl acetate Ren, isoprene, butadiene,
Polymers or copolymers such as isobutylene and vinyl ether are exemplified. In addition, natural rubber, recycled rubber, or the like that satisfies the above-described requirements for the high elasticity polymer can also be used. The thickness of the adhesive layer is preferably in the range of 0.1 μm or more and less than 10 μm, and more preferably 0.1 μm to 5 μm. When the thickness is less than 0.1 μm, the adhesiveness is insufficient, and when the thickness is 10 μm or more, dust tends to be mixed in. When prepregs are laminated, the prepreg pressed due to the flexibility of the adhesive layer. Originated powders and other foreign substances may sink into the adhesive layer together with the conductor foil, and this may cause the conductor foil to tear, which is not preferable.

【0014】また、この支持体の接着剤層形成面の、回
路形成予定領域には接着剤層が形成されていないが、こ
の領域が離型処理されていることが、作業性の観点から
好ましい。離型処理は、前記支持体の接着剤層形成面の
反対側の面に行った離型処理と同様の手段で行うことが
できる。
Although the adhesive layer is not formed in the area of the support on which the adhesive layer is to be formed on the area where the circuit is to be formed, it is preferable from the viewpoint of workability that this area is subjected to mold release treatment. . The release treatment can be performed by the same means as the release treatment performed on the surface of the support opposite to the surface on which the adhesive layer is formed.

【0015】本発明における導体箔は配線基板の製造に
用いるため、銅や銅合金からなる導電性に優れた箔を選
択すればよい。また、導体箔の厚みは、作成する配線基
板の要望に応じて、数十μm程度の厚いものから数μm
程度の極薄箔まで、適宜選択可能である。更に、導体箔
には、導電性を損なわない範囲で、耐薬品性や耐酸化性
等を付与するために種々の表面処理を施してもよい。本
発明において、銅箔等の金属箔の厚みは18μm以下、
特に12μm程度のものが好ましく、作業性の観点か
ら、厚みの下限値は通常5μm程度である。本発明の導
体箔積層体は、前記本発明の保護フィルムの所定位置に
接着剤層を塗布等により形成し、その上に導体箔を積層
して加圧することにより得られる。
Since the conductor foil of the present invention is used for manufacturing a wiring board, a foil having excellent conductivity made of copper or a copper alloy may be selected. The thickness of the conductor foil may be as large as several tens of μm to several μm, depending on the requirements of the wiring board to be produced.
It can be appropriately selected up to an extremely thin foil. Further, the conductor foil may be subjected to various surface treatments in order to impart chemical resistance, oxidation resistance and the like as long as the conductivity is not impaired. In the present invention, the thickness of a metal foil such as a copper foil is 18 μm or less,
Particularly, the thickness is preferably about 12 μm, and from the viewpoint of workability, the lower limit of the thickness is usually about 5 μm. The conductor foil laminate of the present invention is obtained by forming an adhesive layer at a predetermined position on the protective film of the present invention by coating or the like, laminating a conductor foil thereon, and pressing the laminate.

【0016】本発明の導体箔積層体を用いて多層配線基
板を作成する際には、配線を形成する基板上に回路を形
成する工程で保護フィルムとしての合成樹脂フィルムを
剥離するため、本発明に係る接着剤層は条件に応じて容
易に剥離可能な特性を有することが好ましい。例えば、
加熱によって剥離可能となる接着剤としては、特開平8
−1859号公報に記載の熱剥離粘着剤等が好ましく挙
げられ、そのほか、粘着力の低い粘着剤を用いて積層す
るなど公知の方法も採用可能である。
When a multilayer wiring board is formed using the conductor foil laminate of the present invention, the synthetic resin film as a protective film is peeled off in the step of forming a circuit on the board on which the wiring is formed. It is preferable that the adhesive layer according to (1) has a property that can be easily peeled off according to conditions. For example,
An adhesive which can be peeled off by heating is disclosed in
Preferable examples include a heat-peelable pressure-sensitive adhesive described in JP-A-1859, and a known method such as lamination using a low-pressure-sensitive adhesive is also applicable.

【0017】本発明の構成によれば、プレスセット時に
プリプレグ繊維のゴミなどの回路形成予定部への混入を
効果的に防止することができ、また、回路形成予定部に
接着剤層が形成されていないことから、プリプレグを積
層する場合、プリプレグ表面にガラス繊維屑や樹脂溜り
等の異物が存在した場合であっても、それらの異物が接
着剤層にくい込むこともなく、回路形成予定部の周囲部
より、ガラス繊維屑等のゴミや埃が侵入することもない
ので、導体箔にシワが発生したり、裂けるといった事態
を防止することもできる。
According to the configuration of the present invention, it is possible to effectively prevent the prepreg fiber from entering into the portion where a circuit is to be formed at the time of press setting, and to form an adhesive layer on the portion where the circuit is to be formed. Therefore, when prepregs are laminated, even if foreign substances such as glass fiber dust and resin pools are present on the prepreg surface, these foreign substances do not enter the adhesive layer, and the Since there is no intrusion of dust or dust such as glass fiber waste from the surrounding portion, it is possible to prevent the conductor foil from being wrinkled or torn.

【0018】[0018]

【実施例】(実施例1)厚み38μmのPPSフィルム
表面に、アクリル系接着剤(2−エチルヘキシルアクリ
レート/ブチルアクリレート共重合体)を接着層形成後
の厚み1μmとなるように塗布し、図2(A)に記載の
接着剤層パターンに従って回路形成予定領域の周囲部に
接着剤層を形成し、それを介して導体箔として厚さ12
μmの銅箔を積層し、導体箔積層体を得た。接着剤パタ
ーンの幅は10mmであった。
Example 1 An acrylic adhesive (2-ethylhexyl acrylate / butyl acrylate copolymer) was applied to the surface of a 38 μm thick PPS film so as to have a thickness of 1 μm after forming an adhesive layer. According to the adhesive layer pattern described in (A), an adhesive layer is formed around the area where a circuit is to be formed, and a conductive foil having a thickness of 12
A copper foil of μm was laminated to obtain a conductor foil laminate. The width of the adhesive pattern was 10 mm.

【0019】この導体箔積層体を用いて多層配線基板を
作成し、平滑性と取り扱い性とを以下の基準にて評価し
た。結果を下記表1に示す。 [作業性]熱プレス(180℃、30kg/cm2、9
0分)後、鏡面板(sus)から剥離する際の接着力を
剥離試験機により、2.54cm(1inch)巾のサ
ンプルを剥離角度180°剥離速度300mm/分で剥
離試験を行って測定した。接着力の小さいほうが作業性
が良好である。なお、剥離性については接着力が1in
ch(2.54cm)巾のサンプルにおいて50g以下
を良好なレベルであると評価した。 [平滑性]上記熱プレス(180℃、30kg/c
2、90分)後の回路形成予定部における上層導体箔
表面の状態を目視で観察し、シワ、裂けやゴミの侵入に
起因する凹凸による押されあとの生じていないものを良
好であると評価した。結果を下記表1に示す。
A multilayer wiring board was prepared using this conductor foil laminate, and its smoothness and handleability were evaluated according to the following criteria. The results are shown in Table 1 below. [Workability] Hot press (180 ° C, 30 kg / cm 2 , 9
After 0 min), the adhesive strength at the time of peeling from the mirror surface plate (sus) was measured by a peeling tester using a peeling tester at a peeling angle of 180 ° and a peeling speed of 300 mm / min for a sample having a width of 2.54 cm (1 inch). . The smaller the adhesive strength, the better the workability. In addition, as for the releasability, the adhesive force is 1 in
In a sample of ch (2.54 cm) width, 50 g or less was evaluated as a good level. [Smoothness] The above hot press (180 ° C, 30 kg / c
(m 2 , 90 minutes) After visually observing the state of the surface of the upper conductive foil in the portion where the circuit is to be formed, the wrinkle, tearing, and the occurrence of unevenness due to the intrusion of dust, which was not generated after being pushed, were regarded as good. evaluated. The results are shown in Table 1 below.

【0020】(実施例2)接着剤層のパターンを図2
(D)のように代えて接着層を設けた他は、実施例と同
様にして導体箔積層体を得た。これを実施例と同様の方
法で評価した。結果を表1に示す。
Example 2 FIG. 2 shows the pattern of the adhesive layer.
A conductor foil laminate was obtained in the same manner as in Example except that an adhesive layer was provided instead of (D). This was evaluated in the same manner as in the examples. Table 1 shows the results.

【0021】(比較例1)接着剤層のパターンを図3の
ように変え、回路形成予定領域の周囲部ではなく、両側
部のみに接着層を設けた他は、実施例1と同様にして導
体箔積層体を得た。これを実施例と同様の方法で評価し
た。結果を表1に示す。
Comparative Example 1 The same procedure as in Example 1 was carried out except that the pattern of the adhesive layer was changed as shown in FIG. A conductor foil laminate was obtained. This was evaluated in the same manner as in the examples. Table 1 shows the results.

【0022】(比較例2)接着剤層のパターンを図4の
ように変え、全面にわたり点在させるように厚み10μ
mの接着層を設けた他は、実施例1と同様にして導体箔
積層体を得た。これを実施例と同様の方法で評価した。
結果を表1に示す。
(Comparative Example 2) The pattern of the adhesive layer was changed as shown in FIG.
A conductive foil laminate was obtained in the same manner as in Example 1, except that an m-th adhesive layer was provided. This was evaluated in the same manner as in the examples.
Table 1 shows the results.

【0023】[0023]

【表1】 [Table 1]

【0024】表1より明らかなように、本発明の導体箔
積層体は平滑性、取り扱い性が良好であり、ゴミの侵入
による押されあとやシワの発生も観察されなかった。一
方、比較例1にはゴミの侵入による強い押されあとが見
られ、回路形成予定部を含む全面に接着剤層を設けた比
較例2では押されあとに加えてシワの発生もみられ、い
ずれも平滑性が不充分であった。また、比較例2は、剥
離に対する抵抗力が強く、取り外しにくいことから、取
り扱い性に問題があることがわかった。
As is evident from Table 1, the conductor foil laminate of the present invention was excellent in smoothness and handleability, and neither pushing nor wrinkling due to invasion of dust was observed. On the other hand, in Comparative Example 1, a strong push due to intrusion of dust is seen, and in Comparative Example 2, in which an adhesive layer is provided on the entire surface including a portion where a circuit is to be formed, wrinkles are observed in addition to the push. Was also insufficient in smoothness. Further, Comparative Example 2 was found to have a problem in handleability because it has a strong resistance to peeling and is difficult to remove.

【発明の効果】本発明によれば、導体箔の保護性に優
れ、埃などの混入がなく、シワや折れあとが入り難く、
且つ、取り扱い性が良好な導体箔貼着用保護フィルムを
得ることができ、また、それを用いた導体箔積層体は、
埃の付着による欠陥がなく、薄層の導体箔を用いた際で
もその取り扱い性が良好であるという効果を奏する。
According to the present invention, the conductor foil has excellent protection properties, is free from dust and the like, and is resistant to wrinkles and breaks.
In addition, it is possible to obtain a conductor foil sticking protection film having good handleability, and a conductor foil laminate using the same,
There is no defect due to adhesion of dust, and even when a thin conductive foil is used, the handleability is good.

【図面の簡単な説明】[Brief description of the drawings]

【図1】 本発明の保護フィルムの一態様を示す平面図
である。
FIG. 1 is a plan view showing one embodiment of a protective film of the present invention.

【図2】 (A)、(B)、(C)、(D)接着剤層が
回路形成予定領域に不連続的に形成された本発明の保護
フィルムの態様を示す平面図である。
FIGS. 2A, 2B, 2C, and 2D are plan views showing embodiments of the protective film of the present invention in which an adhesive layer is discontinuously formed in a region where a circuit is to be formed.

【図3】 接着剤層が回路形成予定領域の両側端に形成
された比較例1の保護フィルムの態様を示す平面図であ
る。
FIG. 3 is a plan view showing an embodiment of a protective film of Comparative Example 1 in which an adhesive layer is formed on both side edges of a region where a circuit is to be formed.

【図4】 接着剤層を回路形成予定領域を含む全面にわ
たり点在させて形成した比較例2の保護フィルムの態様
を示す平面図である。
FIG. 4 is a plan view showing an embodiment of a protective film of Comparative Example 2 in which an adhesive layer is formed by being scattered over the entire surface including a region where a circuit is to be formed.

【符号の説明】[Explanation of symbols]

10 保護フィルム 12 回路形成予定領域 14 接着剤層 DESCRIPTION OF SYMBOLS 10 Protective film 12 Circuit formation planned area 14 Adhesive layer

フロントページの続き Fターム(参考) 4F100 AB17 AK01A AK25G AT00A BA02 BA03 BA04 BA07 BA10B BA10C BA10D CB00B DC21B EH46 EH462 GB43 JD02B JG01D JL04 JL05 JL14C 4J004 AA05 AA06 AA10 CA03 CA04 CA06 CC02 CE03 DA04 FA04 FA05 Continued on front page F-term (reference) 4F100 AB17 AK01A AK25G AT00A BA02 BA03 BA04 BA07 BA10B BA10C BA10D CB00B DC21B EH46 EH462 GB43 JD02B JG01D JL04 JL05 JL14C 4J004 AA05 AA06 AA10 CA03 CA04 FA04

Claims (6)

【特許請求の範囲】[Claims] 【請求項1】 支持体の一方の面に接着剤を部分的に形
成した、導体箔貼着用保護フィルムであって、該接着剤
層が導体箔に回路を形成するための回路形成予定領域の
周囲部に形成されることを特徴とする保護フィルム。
1. A conductive film sticking protective film in which an adhesive is partially formed on one surface of a support, wherein the adhesive layer is provided in a region where a circuit is to be formed for forming a circuit on the conductive foil. A protective film formed on a peripheral portion.
【請求項2】 前記接着剤層が通気可能な空隙部を有し
て形成されることを特徴とする請求項1に記載の保護フ
ィルム。
2. The protective film according to claim 1, wherein the adhesive layer is formed to have air-permeable voids.
【請求項3】 前記保護フィルムにおける回路形成予定
領域が離型処理されていることを特徴とする請求項1又
は請求項2に記載の保護フィルム。
3. The protective film according to claim 1, wherein a region where a circuit is to be formed on the protective film is subjected to a release treatment.
【請求項4】 前記支持体が合成樹脂フィルムであり、
前記接着剤層が形成される面の反対側面に離型層が形成
されることを特徴とする請求項1乃至請求項3のいずれ
か1項に記載の保護フィルム。
4. The support is a synthetic resin film,
The protective film according to any one of claims 1 to 3, wherein a release layer is formed on a side opposite to a side on which the adhesive layer is formed.
【請求項5】 前記接着剤層の厚みが0.1μm以上1
0μm未満の範囲にあることを特徴とする請求項1乃至
請求項4のいずれか1項に記載の保護フィルム。
5. The thickness of the adhesive layer is 0.1 μm or more and 1
The protective film according to claim 1, wherein the thickness is less than 0 μm.
【請求項6】 請求項1乃至請求項5のいずれか1項に
記載の保護フィルムの接着剤層に導体箔が貼着されてな
る導体箔積層体。
6. A conductor foil laminate comprising the protective film according to claim 1 and a conductor foil adhered to the adhesive layer of the protective film.
JP2000201797A 2000-07-04 2000-07-04 Protective film and conductive foil laminate Expired - Fee Related JP4454805B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
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Application Number Priority Date Filing Date Title
JP2000201797A JP4454805B2 (en) 2000-07-04 2000-07-04 Protective film and conductive foil laminate

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JP2002018998A true JP2002018998A (en) 2002-01-22
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ID=18699418

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Country Link
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Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004080006A (en) * 2002-06-18 2004-03-11 Sanyo Electric Co Ltd Method for manufacturing semiconductor device
JP2010120348A (en) * 2008-11-21 2010-06-03 Mitsubishi Rayon Co Ltd Protection film, and molding with the protection film
KR101287359B1 (en) 2007-12-13 2013-07-18 코오롱인더스트리 주식회사 Protecting Film
KR101334997B1 (en) 2007-12-13 2013-12-02 코오롱인더스트리 주식회사 Protecting Film
WO2014054812A1 (en) * 2012-10-04 2014-04-10 Jx日鉱日石金属株式会社 Carrier-attached metal foil
JP2022172584A (en) * 2021-05-06 2022-11-17 株式会社平和 game machine

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004080006A (en) * 2002-06-18 2004-03-11 Sanyo Electric Co Ltd Method for manufacturing semiconductor device
KR101287359B1 (en) 2007-12-13 2013-07-18 코오롱인더스트리 주식회사 Protecting Film
KR101334997B1 (en) 2007-12-13 2013-12-02 코오롱인더스트리 주식회사 Protecting Film
JP2010120348A (en) * 2008-11-21 2010-06-03 Mitsubishi Rayon Co Ltd Protection film, and molding with the protection film
WO2014054812A1 (en) * 2012-10-04 2014-04-10 Jx日鉱日石金属株式会社 Carrier-attached metal foil
JPWO2014054812A1 (en) * 2012-10-04 2016-08-25 Jx金属株式会社 Metal foil with carrier
TWI569953B (en) * 2012-10-04 2017-02-11 Jx Nippon Mining & Metals Corp Attached metal foil
JP2022172584A (en) * 2021-05-06 2022-11-17 株式会社平和 game machine

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