JP2001353683A - Pneumatic retaining device - Google Patents
Pneumatic retaining deviceInfo
- Publication number
- JP2001353683A JP2001353683A JP2001103055A JP2001103055A JP2001353683A JP 2001353683 A JP2001353683 A JP 2001353683A JP 2001103055 A JP2001103055 A JP 2001103055A JP 2001103055 A JP2001103055 A JP 2001103055A JP 2001353683 A JP2001353683 A JP 2001353683A
- Authority
- JP
- Japan
- Prior art keywords
- work
- cushion chamber
- holding device
- air
- air holding
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000002093 peripheral effect Effects 0.000 claims description 9
- 230000000694 effects Effects 0.000 description 22
- 238000010586 diagram Methods 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- 239000011521 glass Substances 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 230000035699 permeability Effects 0.000 description 2
- 238000007664 blowing Methods 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000005192 partition Methods 0.000 description 1
- 230000001502 supplementing effect Effects 0.000 description 1
Landscapes
- Manipulator (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明はロボットなどの移送具の
ハンドで、半導体ウエハやガラス基板などの板状体ワー
クを空気を噴出することにより無接触状態にて懸垂保持
し搬送する空気保持装置に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an air holding apparatus for suspending and transporting a plate-shaped work such as a semiconductor wafer or a glass substrate in a non-contact state by blowing air with a hand of a transfer tool such as a robot. It is about.
【0002】[0002]
【従来の技術】従来、半導体ウエハやガラス基板等を搬
送する場合には、それぞれのワークに対する所定の処理
が終了した後に、1枚づつ懸垂把持し搬送する工程があ
る。2. Description of the Related Art Conventionally, when a semiconductor wafer, a glass substrate, or the like is transported, there is a step of suspending and transporting the workpieces one by one after predetermined processing for each work is completed.
【0003】この多くの場合、吸着パッドにより真空吸
着による方式が採られている。[0003] In many cases, a vacuum suction method using a suction pad is employed.
【0004】このためワーク表面にパッド跡が残ること
がある。For this reason, pad marks may remain on the work surface.
【0005】[0005]
【発明が解決しようとする課題】従来ワークの表面が直
接ハンドに接触しない無接触式のハンドが提案されてい
る。Conventionally, a non-contact type hand in which the surface of a work does not directly contact the hand has been proposed.
【0006】例えば特開昭62−105831号があ
る。For example, there is JP-A-62-158831.
【0007】このハンドは、エゼクタ効果とベルヌーイ
効果を利用したものであるが、流路よりクッション室に
噴出した直後の高速空気流のエネルギーが十分に利用さ
れてないため、その分エネルギーの損失があり、十分効
果が達成されていなかった。This hand utilizes the ejector effect and the Bernoulli effect. However, since the energy of the high-speed air flow immediately after jetting from the flow passage into the cushion chamber is not sufficiently utilized, the energy loss is correspondingly reduced. Yes, the effect was not sufficiently achieved.
【0008】本発明の目的は、ワークにパッド跡を発生
させず、ワークを確実に効率よく懸垂把持し、搬送する
ことにある。SUMMARY OF THE INVENTION It is an object of the present invention to reliably and efficiently suspend and hold a work without causing pad marks on the work.
【0009】本発明の前記ならびにその他の目的と新規
な特徴は、本明細書の記述および添付図面から明らかに
なるであろう。The above and other objects and novel features of the present invention will become apparent from the description of the present specification and the accompanying drawings.
【0010】[0010]
【課題を解決するための手段】本願に置いて開示される
発明のうち、代表的なものの概要を簡単に説明すれば、
以下のとおりである。Means for Solving the Problems Of the inventions disclosed in the present application, the outline of a representative one will be briefly described.
It is as follows.
【0011】すなわち、腕状の基体の周壁の下端に板状
のワークに対向する作動面と、前記腕状の基体の中央部
に高圧空気を導入する流路を備えた突部を設け、該突部
先端に空気を噴出する開口面を形成し、前記周壁との内
部空間をクッション室となし、前記作動面に近づくワー
クとの距離が大なるに際して、高速空気流が開口面より
噴出し装置外へ排出する際に、ワークと開口面との間
隙、クッション室および作動面との間隙はそれぞれエゼ
クタのノズル、真空室およびディフューザの機能を果た
す。That is, an operating surface facing the plate-like work is provided at the lower end of the peripheral wall of the arm-shaped base, and a projection having a flow path for introducing high-pressure air is provided at the center of the arm-shaped base. An opening surface for ejecting air is formed at the tip of the protruding portion, an internal space with the peripheral wall is formed as a cushion chamber, and a high-speed air flow is ejected from the opening surface when the distance to the work approaching the working surface increases. Upon discharge to the outside, the gap between the workpiece and the opening surface, and the gap between the cushion chamber and the working surface serve as a nozzle, a vacuum chamber, and a diffuser of the ejector, respectively.
【0012】そのためクッション室は負圧を発生しワー
クを吸引するとともに、前記距離が小なるに際して、前
記高速空気流による圧力室型エアクッション効果により
クッション室は急激に昇圧し、前記ワークを離間させる
ことを特徴とする。Therefore, the cushion chamber generates a negative pressure and sucks the work, and when the distance becomes small, the pressure in the cushion chamber is rapidly increased by the pressure chamber type air cushion effect by the high-speed air flow to separate the work. It is characterized by the following.
【0013】本発明にあっては、開口面より噴出した直
後の高速空気流が、開口面とワークとの狭い間隙を通過
する際に、高速気流となりベルヌーイ効果により大きな
負圧を発生するため、開口面より噴出後の高速空気流の
エネルギー損失がなく、効率良くワークを懸垂保持が可
能である。According to the present invention, the high-speed air flow immediately after being jetted from the opening surface becomes a high-speed air flow when passing through a narrow gap between the opening surface and the work, and generates a large negative pressure due to the Bernoulli effect. There is no energy loss of the high-speed air flow after jetting from the opening surface, and the work can be efficiently suspended and held.
【0014】[0014]
【実施例1】以下、本発明の実施例の形態を図面に基づ
いて詳細に説明する。Embodiment 1 Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings.
【0015】図1は本発明の一実施形態である空気保持
装置Aを示す側面断面図であり、図2はその下平面図を
示す。FIG. 1 is a side sectional view showing an air holding device A according to an embodiment of the present invention, and FIG. 2 is a plan view showing a lower portion thereof.
【0016】図1に示すように、腕状の基体Eの周壁1
の下端にワークGと対抗する作動面5を形成し、腕状の
基体Eの中央部に先端の開口面6に開口する流路2を備
えた突部3を設け、周壁1の内側の空間をクッション室
4となし、空気保持装置Aを形成する。As shown in FIG. 1, a peripheral wall 1 of an arm-shaped base E is provided.
An operating surface 5 opposing the work G is formed at the lower end of the arm, and a projection 3 having a flow path 2 opening to the opening surface 6 at the tip is provided at the center of the arm-shaped base E, and the space inside the peripheral wall 1 is provided. And the cushion chamber 4 to form the air holding device A.
【0017】作動面5と開口面6は面一に形成されてお
り、また流路2には高圧空気C発生源(図示せず)に接
続している。The working surface 5 and the opening surface 6 are formed flush with each other, and the flow path 2 is connected to a high-pressure air C generating source (not shown).
【0018】作動面5に対向するワークGが作動面5と
の距離hが大なるに際して、流路2より噴出する高速空
気流CがワークGと開口面6との間隙を通過し、クッシ
ョン室4に流入し、作動面5とワークGとの間隙を通過
し外部へ排出する。When the distance h between the work G facing the working surface 5 and the working surface 5 is increased, the high-speed airflow C ejected from the flow path 2 passes through the gap between the work G and the opening surface 6 and the cushion chamber. 4 and passes through the gap between the working surface 5 and the work G and is discharged to the outside.
【0019】その間、開口面6とワークGとの間隙を通
過する際に、高速気流Cによるベルヌーイ効果のため負
圧を生じ、またクッション室4においても高速空気流C
がクッション室4に流入し作動面5とワークGとの間隙
を通過する際に、クッション室4および作動面5とワー
クGとの空間が、それぞれエゼクタの真空室およびデフ
ュウーザの機能を果たし、そのためクッション室4はエ
ゼクタ効果のため負圧を生じ、さらに作動面5とワーク
Gとの間隙を通過する際にベルヌーイ効果のため負圧を
生じる。Meanwhile, when passing through the gap between the opening surface 6 and the work G, a negative pressure is generated due to the Bernoulli effect by the high-speed air flow C, and the high-speed air flow C
When the air flows into the cushion chamber 4 and passes through the gap between the operation surface 5 and the work G, the space between the cushion chamber 4 and the operation surface 5 and the work G performs the functions of the vacuum chamber and the diffuser of the ejector, respectively. The cushion chamber 4 generates a negative pressure due to the ejector effect, and generates a negative pressure due to the Bernoulli effect when passing through the gap between the working surface 5 and the work G.
【0020】前記の負圧発生作用によりワークを吸引す
るとともに、前記距離hが小なるに際して、クッション
室4における圧力室型エアクッション効果によるクッシ
ョン室4内の圧力の上昇、開口面6とワークGとの間隙
および作動面5とワークGとの間隙に生じる高速空気流
のクッション効果による圧力の上昇を生じる。When the work is sucked by the negative pressure generating action and the distance h is reduced, the pressure in the cushion chamber 4 rises due to the pressure chamber type air cushion effect in the cushion chamber 4, and the opening surface 6 and the work G And the gap between the working surface 5 and the work G causes an increase in pressure due to the cushion effect of the high-speed air flow.
【0021】この高速空気流Cによる昇圧作用によりワ
ークGを離間させる。The work G is separated by the pressurizing action of the high-speed air flow C.
【0022】このようにして、内部に生じる負圧あるい
は昇圧およびワークGの重量とがバランスした距離hに
て、ワークGは空気保持装置Aに空中に浮遊した無接触
状態にて懸垂保持される。In this way, the work G is suspended and held in the air holding device A in a non-contact state at the distance h in which the negative pressure or pressure generated inside and the weight of the work G are balanced. .
【0023】図6に本発明の空気保持装置Aに懸垂保持
されたワークG表面に生じる圧力を、図7には従来の空
気保持装置Fの場合の圧力線図をしめす。FIG. 6 shows a pressure generated on the surface of the work G suspended and held by the air holding device A of the present invention, and FIG. 7 shows a pressure diagram in the case of the conventional air holding device F.
【0024】本発明では図6に示すようにb〜d間に於
いて、流路2より噴出直後の高速空気流によるベルヌー
イ効果により高い負圧を生じ、さらにd〜f間では効率
良いエゼクタ効果による負圧が生じていることが解る。In the present invention, as shown in FIG. 6, a high negative pressure is generated between b and d due to the Bernoulli effect due to the high-speed air flow immediately after jetting from the flow path 2, and an efficient ejector effect between d and f. It can be seen that a negative pressure is generated due to.
【0025】これに対して従来型に場合は図7に示すよ
うに、b〜f間では、エゼクタ効果による負圧の発生し
か生ぜず、そのため負圧の発生は低いことがわかる。On the other hand, in the case of the conventional type, as shown in FIG. 7, only the negative pressure is generated due to the ejector effect between b and f, so that the negative pressure is low.
【0026】従って本発明は流路2から噴出した直後の
高速空気流を有効に活用し、従来型に比較して負圧の発
生量は格段に増加しており、吸引効率が上昇しているこ
とが解る。Therefore, the present invention makes effective use of the high-speed air flow immediately after the gas is ejected from the flow passage 2, and the amount of negative pressure generated is remarkably increased as compared with the conventional type, and the suction efficiency is increased. I understand.
【0027】[0027]
【実施例2】図8には突部3の先端の開口面6が作動面
5より上方に形成された空気保持装置Lを示す。Embodiment 2 FIG. 8 shows an air holding device L in which an opening surface 6 at the tip of a projection 3 is formed above an operating surface 5.
【0028】ワークGと開口面6との間隙を広くとるこ
とにより、流路2より噴出する高速気流のクッション室
4の流入抵抗を減じ、ワークGの吸引時のクッション室
4に生じる圧力室型エアクッション効果による反発力の
発生速度を高め、ワークGの吸引開始時に慣性力による
作動面5への接触防止効果を高めたものである。By making the gap between the work G and the opening surface 6 wide, the inflow resistance of the high-speed airflow spouting from the flow path 2 into the cushion chamber 4 is reduced, and the pressure chamber type generated in the cushion chamber 4 when the work G is sucked. The speed at which the repulsive force is generated by the air cushion effect is increased, and the effect of preventing contact with the working surface 5 by the inertial force at the start of suction of the work G is enhanced.
【0029】[0029]
【実施例3】図3には、本発明の別の実施の形態の空気
保持装置Bの側面断面図を示し、図4にはその下平面図
を示す。Third Embodiment FIG. 3 is a side sectional view of an air holding device B according to another embodiment of the present invention, and FIG.
【0030】図面により説明すると、クッション室4の
中央部の突部3の下面に形成される開口面6の下方に間
隙を設けて偏向板7を配し、周壁1の内側にブラケット
8により取り付けて空気保持装置Bを構成する。Referring to the drawings, a deflecting plate 7 is provided with a gap provided below an opening surface 6 formed on the lower surface of the projection 3 at the center of the cushion chamber 4, and is attached to the inside of the peripheral wall 1 by a bracket 8. To constitute the air holding device B.
【0031】かような構成により、流路2より噴出した
高速空気流Cは、偏向板7により流方向を水平方向に偏
向され、開口面6と偏向板7とで形成される噴出部より
ワークGと平行方向にクッション室4に噴出するので、
直接ワークGに垂直に衝突することがなく高速空気流C
の衝突による局所応力を生じない。With such a configuration, the high-speed airflow C ejected from the flow path 2 is deflected in the horizontal direction by the deflecting plate 7, and the workpiece is ejected from the ejection portion formed by the opening surface 6 and the deflecting plate 7. Since it gushes into the cushion chamber 4 in the direction parallel to G,
High-speed airflow C without directly colliding directly with workpiece G
No local stress due to collision of
【0032】また偏向板7と開口面6との空隙より噴出
した高速空気流Cは、水平方向に作動面5の下面に沿っ
て流れるため、作動面5とワークGとの距離hの大の場
合でも、クッション室4にはエゼクタ効果により負圧を
生じるためワークを吸引する。The high-speed airflow C ejected from the gap between the deflecting plate 7 and the opening surface 6 flows along the lower surface of the working surface 5 in the horizontal direction, so that the distance h between the working surface 5 and the work G is large. Even in this case, the work is sucked because a negative pressure is generated in the cushion chamber 4 by the ejector effect.
【0033】そのためワークGが柔軟なもの、通気性の
あるものでも懸垂保持が可能であるし、脆いワークでも
損傷させることもなく、またワーク7との距離hが大き
すぎても常にクッション室4には負圧を生じているの
で、ワークGを吹き飛ばすことはない。Therefore, even if the work G is flexible or breathable, it can be suspended and held, and even if the work G is fragile, it is not damaged. Even if the distance h to the work 7 is too large, the cushion chamber 4 is always kept. , A negative pressure is generated, so that the work G is not blown off.
【0034】偏向板7はブラケット8により周壁1に取
り付けているが、直接ネジ等により開口面6に取り付け
ても良い。Although the deflecting plate 7 is attached to the peripheral wall 1 by the bracket 8, it may be attached directly to the opening surface 6 by screws or the like.
【0035】また開口面6と偏向板7との間隙で形成さ
れる全周クッション室4に開口する噴出部は多数の小孔
にて形成してもよい。Further, the ejection portion opening to the entire peripheral cushion chamber 4 formed by the gap between the opening surface 6 and the deflection plate 7 may be formed by a number of small holes.
【0036】噴出部の位置は、作動面5よりも上方ある
いはやや下方でもよい。The position of the ejection portion may be above or slightly below the working surface 5.
【0037】[0037]
【実施例3】図9には本発明の空気保持装置Mの側面断
面図を、図10にはそのした平面図を示す。Embodiment 3 FIG. 9 is a side sectional view of an air holding device M of the present invention, and FIG. 10 is a plan view thereof.
【0038】クッション室4の中央に形成される突部3
の先端が閉塞された流路12より複数の小孔13がクッ
ション室4に開口して空気保持装置Mを形成している。Projection 3 formed at the center of cushion chamber 4
A plurality of small holes 13 are opened in the cushion chamber 4 from the flow path 12 whose front end is closed to form an air holding device M.
【0039】高速空気流Cは、流路12より小孔13を
通り、クッション室4に噴出する。The high-speed air flow C is ejected from the flow passage 12 through the small holes 13 into the cushion chamber 4.
【0040】噴出する高速気流Cがクッション室4、作
動面5とワークGとの間隙を通る間に、エゼクタ効果お
よびベルヌーイ効果による負圧を生じワークGを吸引す
る。While the ejected high-speed airflow C passes through the gap between the cushion chamber 4 and the working surface 5 and the work G, a negative pressure is generated by the ejector effect and the Bernoulli effect to suck the work G.
【0041】図11に示すように、小孔13より噴出す
る高速気流Cは角度を持ってクッション室4に噴出する
ため、垂直にワークGに衝突することがなく高速気流C
は流路抵抗が少なくクッション室4および作動面5およ
びワークGと作動面5との間隙を通過する。As shown in FIG. 11, the high-speed airflow C jetted from the small holes 13 is jetted into the cushion chamber 4 at an angle, so that the high-speed airflow C does not collide with the workpiece G vertically.
Have a small flow path resistance and pass through the cushion chamber 4, the working surface 5, and the gap between the work G and the working surface 5.
【0042】そのためエゼクタ効果による負圧の発生効
果が高く、前記の従来技術に比較し、吸引力が従来技術
に比べ格段に上昇し、またワークGに及ぼす高速空気流
Cの衝突による衝撃力を緩和しワークGを損傷から守
る。Therefore, the effect of generating a negative pressure due to the ejector effect is high, the suction force is significantly increased as compared with the prior art, and the impact force due to the collision of the high-speed air flow C on the work G is reduced. Relax and protect work G from damage.
【0043】本例では、小孔13より高速空気流Cを噴
出する角度は下向きであるが、小孔13のクッション室
4内の噴出する位置、あるいはワークの性状により下向
き、水平、上向きの適切な角度にするのも好例である。In this embodiment, the angle at which the high-speed air flow C is jetted from the small hole 13 is downward, but depending on the position at which the small hole 13 is jetted in the cushion chamber 4 or the nature of the work, it may be appropriately downward, horizontal, or upward. A good angle is also a good example.
【0044】。また複数個の小孔12ではなく、全周に
わたり噴出する噴出口でもよい。[0044] Further, instead of the plurality of small holes 12, a spout that spouts over the entire circumference may be used.
【0045】またクッション室4を仕切り板14にて仕
切り、小孔13噴出箇所毎にクッション室4を分割する
のも好例である。It is also a good example that the cushion chamber 4 is partitioned by the partition plate 14 and the cushion chamber 4 is divided for each small hole 13 ejection position.
【0046】[0046]
【実施例4】図5には本発明の他の実施形態の空気保持
装置Hの側面断面図を示す。Embodiment 4 FIG. 5 is a side sectional view of an air holding device H according to another embodiment of the present invention.
【0047】図面により説明すると、前記の空気保持装
置A、B、M、Lの周囲に、空気保持装置A、B、lお
よびMより排出した排気空気を補足する排気吸引口10
を設けたフード9を装着して空気保持装置Hを構成す
る。Referring to the drawings, an exhaust suction port 10 for supplementing exhaust air discharged from the air holding devices A, B, 1 and M is provided around the air holding devices A, B, M and L.
The air holding device H is configured by mounting the hood 9 provided with the hood 9.
【0048】流路2より噴出した高速空気流Cは、作動
面5とワークGとの間隙を通過し外部へ排出される。The high-speed airflow C ejected from the flow path 2 passes through the gap between the working surface 5 and the work G and is discharged to the outside.
【0049】この外部へ排出される高速空気流Cを、前
記の空気保持装置A,Bの周囲に装着されたフード9に
より補足し、排気吸引口10から吸引し所定の場所に排
出する。The high-speed air flow C discharged to the outside is supplemented by the hood 9 mounted around the air holding devices A and B, and is sucked from the exhaust suction port 10 and discharged to a predetermined place.
【0050】このため排出空気が外部のクリーンルーム
に漏れ出すことがなく、クリールームを汚染することが
ない。Therefore, the discharged air does not leak to the external clean room, and the clean room is not contaminated.
【0051】以上、本発明者によってなされた発明を実
施の形態に基づき具体的に説明したが、本発明は前記の
形態に限定されるものではなく、その要旨を逸脱しない
範囲で種々変更可能であることはいうまでもない。Although the invention made by the inventor has been specifically described based on the embodiment, the invention is not limited to the above-described embodiment and can be variously modified without departing from the gist of the invention. Needless to say, there is.
【0052】例えばワークの凹凸、柔軟性、通気性ある
いは穴の密度等により突部の先端のの位置を調節し、負
圧発生量の調節することも可能である。For example, it is also possible to adjust the position of the tip of the projection by adjusting the unevenness of the work, the flexibility, the air permeability, the density of the holes, and the like, thereby adjusting the amount of negative pressure generated.
【0053】また作動面に接触部材を設けることによ
り、接触部材にワークを接触させた状態でワークを保持
し搬送することができ、ワークのずれを防止することが
できる。Further, by providing the contact member on the operating surface, the work can be held and transported in a state where the work is in contact with the contact member, and the displacement of the work can be prevented.
【0054】クッション室の上面および側面の形状は、
それぞれ水平および垂直であるに限らず、高速空気流に
よりエゼクタ効果が効果的に生じる形状にするのも好例
である。The shapes of the top and side surfaces of the cushion chamber are as follows:
It is also a good example that the shape is not limited to horizontal and vertical, and the ejector effect is effectively generated by the high-speed air flow.
【0055】[0055]
【発明の効果】本願に於いて開示される発明のうち、代
表的なものによって得られる効果を簡単に説明すれば、
以下の通りである。The effects obtained by the representative inventions among the inventions disclosed in the present application will be briefly described.
It is as follows.
【0056】(1)クッション室の中央部に流路を設け
た開口面をワークに近接して設けたことにより、効率よ
くワークを空中に浮遊した無接触状態にて懸垂保持する
ことができる。(1) By providing an opening surface provided with a flow path in the center of the cushion chamber close to the work, the work can be efficiently suspended and suspended in the air without contact.
【0057】(2)突部側面の小孔よりクッション室に
高速気流を噴出することにより、効率よくワークを空中
に浮遊した無接触状態にて懸垂保持することができる。(2) By jetting a high-speed airflow into the cushion chamber from the small hole on the side surface of the projection, the work can be efficiently suspended and suspended in the air without contact.
【0058】(3)これにより半導体ウエハ、液晶ガラ
ス基板等の板状のワーク表面に傷、汚れ、パッド跡を付
着させない。(3) As a result, scratches, dirt, and traces of pads do not adhere to the surface of a plate-like work such as a semiconductor wafer or a liquid crystal glass substrate.
【0059】(4)排気を回収するフードを設けている
ので、クリーンルームにおいても使用可能である。(4) Since a hood for collecting exhaust gas is provided, it can be used in a clean room.
【0060】(5)柔軟性、通気性、あるいは孔が形成
されていたり、もろいワークを損傷することなく保持可
能である。(5) Flexibility, air permeability, or holes can be formed, and a fragile work can be held without being damaged.
【図1】本発明の実施の形態の側面断面図である。FIG. 1 is a side sectional view of an embodiment of the present invention.
【図2】本発明の実施の形態の下平面図である。FIG. 2 is a bottom plan view of the embodiment of the present invention.
【図3】本発明の別の実施の形態の側面断面図である。FIG. 3 is a side sectional view of another embodiment of the present invention.
【図4】本発明の別の実施の形態の下平面図である。FIG. 4 is a bottom plan view of another embodiment of the present invention.
【図5】本発明の他の別の実施の形態の側面断面図であ
る。FIG. 5 is a side sectional view of another embodiment of the present invention.
【図6】本発明の空気保持装置Aの形態の発生負圧線図
である。FIG. 6 is a generated negative pressure diagram of an embodiment of the air holding device A of the present invention.
【図7】従来型の実施の形態の発生負圧線図である。FIG. 7 is a generated negative pressure diagram of the conventional embodiment.
【図8】本発明のもう一の実施の形態の側面断面図であ
る。FIG. 8 is a side sectional view of another embodiment of the present invention.
【図9】本発明のその他実施の形態の側面断面図であ
る。FIG. 9 is a side sectional view of another embodiment of the present invention.
【図10】本発明のその他実施の形態の下平面図であ
る。FIG. 10 is a bottom plan view of another embodiment of the present invention.
【図11】その他実施の形態の発生負圧線図である。FIG. 11 is a generated negative pressure diagram according to another embodiment.
1 周壁 2、12 流路 3 突部 4 クッション室 5 作動面 6 開口面 7 偏向板 8 ブラケット 9 フード 10 排気吸引口 13 小孔 A、B、H、L、M 空気保持装置 C 高速空気流 E 基体 F 従来型の空気保持装置 G ワーク P 高圧空気 DESCRIPTION OF SYMBOLS 1 Peripheral wall 2, 12 Flow path 3 Projection part 4 Cushion room 5 Working surface 6 Opening surface 7 Deflection plate 8 Bracket 9 Hood 10 Exhaust suction port 13 Small hole A, B, H, L, M Air holding device C High-speed air flow E Substrate F Conventional air holding device G Work P High pressure air
Claims (6)
に対向する作動面と、前記腕状の基体内部空間にクッシ
ョン室とを形成し、クッション室上面より下面またはク
ッション室に開口する流路を備えた突部を設けたことを
特徴とする空気保持装置。1. An operating surface facing a plate-shaped work and a cushion chamber in an inner space of the arm-shaped base are formed at a lower end of a peripheral wall of the arm-shaped base, and a lower surface or a cushion chamber is formed from an upper surface of the cushion chamber. An air holding device provided with a projection having a flow path that opens.
が作動面と面一であることを特徴とする空気保持装置。2. The air holding device according to claim 1, wherein the flow passage opening surface at the tip of the projection is flush with the operating surface.
が作動面より上方にあることを特徴とする空気保持装
置。3. The air holding device according to claim 1, wherein the flow path opening surface at the tip of the projection is above the operating surface.
の下方に偏向板を設け、全周にクッション室に開口する
開口部を設けたことを特徴とする空気保持装置。4. An air holding device according to claim 3, wherein a deflection plate is provided below the flow path opening surface at the tip of the projection, and an opening which opens to the cushion chamber is provided all around.
孔が、突部側面よりクッション室に開口することを特徴
とする空気保持装置。5. The air holding device according to claim 1, wherein the plurality of small holes communicating with the flow path according to claim 1 are opened to the cushion chamber from the side surfaces of the projection.
に、排気吸引口を備えたフードを装着したことを特徴と
する空気保持装置。6. An air holding device, wherein a hood provided with an exhaust suction port is mounted around the air holding device according to claim.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001103055A JP3994372B2 (en) | 2000-04-13 | 2001-04-02 | Air holding device |
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2000112605 | 2000-04-13 | ||
JP2000-112605 | 2000-04-13 | ||
JP2001103055A JP3994372B2 (en) | 2000-04-13 | 2001-04-02 | Air holding device |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2001353683A true JP2001353683A (en) | 2001-12-25 |
JP2001353683A5 JP2001353683A5 (en) | 2005-08-11 |
JP3994372B2 JP3994372B2 (en) | 2007-10-17 |
Family
ID=26590086
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---|---|---|---|
JP2001103055A Expired - Fee Related JP3994372B2 (en) | 2000-04-13 | 2001-04-02 | Air holding device |
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JP (1) | JP3994372B2 (en) |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006339234A (en) * | 2005-05-31 | 2006-12-14 | Murata Mach Ltd | Non-contact holding device |
JP2006346783A (en) * | 2005-06-14 | 2006-12-28 | Myotoku Ltd | Non-contact hand |
US7260959B2 (en) | 2004-08-27 | 2007-08-28 | Corning Incorporated | Glass handling system and method for using same |
JP2008177238A (en) * | 2007-01-16 | 2008-07-31 | Tokyo Electron Ltd | Substrate transfer device and vertical heat treatment device |
JP2008284671A (en) * | 2007-05-15 | 2008-11-27 | Keizo Otani | Non-contact carrying pad |
KR100986396B1 (en) * | 2007-04-24 | 2010-10-08 | 도쿄엘렉트론가부시키가이샤 | Substrate Suction Device and Substrate Transfer Device |
WO2011047997A1 (en) * | 2009-10-22 | 2011-04-28 | Schmid Technology Systems Gmbh | Bernoulli nozzle, gripper device comprising a bernoulli nozzle, and production method |
JP2020044603A (en) * | 2018-09-18 | 2020-03-26 | 東洋自動機株式会社 | Article transfer method and article transfer device |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103277644B (en) * | 2013-05-20 | 2015-11-18 | 哈尔滨工业大学 | Multi-shaft support air floatation platform |
-
2001
- 2001-04-02 JP JP2001103055A patent/JP3994372B2/en not_active Expired - Fee Related
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7260959B2 (en) | 2004-08-27 | 2007-08-28 | Corning Incorporated | Glass handling system and method for using same |
JP2006339234A (en) * | 2005-05-31 | 2006-12-14 | Murata Mach Ltd | Non-contact holding device |
JP2006346783A (en) * | 2005-06-14 | 2006-12-28 | Myotoku Ltd | Non-contact hand |
JP2008177238A (en) * | 2007-01-16 | 2008-07-31 | Tokyo Electron Ltd | Substrate transfer device and vertical heat treatment device |
KR100986396B1 (en) * | 2007-04-24 | 2010-10-08 | 도쿄엘렉트론가부시키가이샤 | Substrate Suction Device and Substrate Transfer Device |
US8196983B2 (en) | 2007-04-24 | 2012-06-12 | Tokyo Electron Limited | Substrate attracting device and substrate transfer apparatus |
JP2008284671A (en) * | 2007-05-15 | 2008-11-27 | Keizo Otani | Non-contact carrying pad |
WO2011047997A1 (en) * | 2009-10-22 | 2011-04-28 | Schmid Technology Systems Gmbh | Bernoulli nozzle, gripper device comprising a bernoulli nozzle, and production method |
JP2020044603A (en) * | 2018-09-18 | 2020-03-26 | 東洋自動機株式会社 | Article transfer method and article transfer device |
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