JP2001348360A - Method for inhibiting polymerization of (meth)acrylic cid and ester and method for producing them - Google Patents
Method for inhibiting polymerization of (meth)acrylic cid and ester and method for producing themInfo
- Publication number
- JP2001348360A JP2001348360A JP2000168726A JP2000168726A JP2001348360A JP 2001348360 A JP2001348360 A JP 2001348360A JP 2000168726 A JP2000168726 A JP 2000168726A JP 2000168726 A JP2000168726 A JP 2000168726A JP 2001348360 A JP2001348360 A JP 2001348360A
- Authority
- JP
- Japan
- Prior art keywords
- acrylic acid
- meth
- compound
- ester
- polymerization
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000006116 polymerization reaction Methods 0.000 title claims abstract description 105
- 150000002148 esters Chemical class 0.000 title claims abstract description 54
- 238000000034 method Methods 0.000 title claims abstract description 48
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 24
- 230000002401 inhibitory effect Effects 0.000 title abstract description 8
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 title description 36
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 claims abstract description 66
- 150000001875 compounds Chemical class 0.000 claims abstract description 48
- 150000002832 nitroso derivatives Chemical class 0.000 claims abstract description 43
- 238000000746 purification Methods 0.000 claims description 72
- 230000003405 preventing effect Effects 0.000 claims description 36
- 239000002904 solvent Substances 0.000 claims description 30
- -1 N-hydroxy-2,2,6,6-tetramethylpiperidine compound Chemical class 0.000 claims description 28
- DAHPIMYBWVSMKQ-UHFFFAOYSA-N n-hydroxy-n-phenylnitrous amide Chemical compound O=NN(O)C1=CC=CC=C1 DAHPIMYBWVSMKQ-UHFFFAOYSA-N 0.000 claims description 21
- RKMGAJGJIURJSJ-UHFFFAOYSA-N 2,2,6,6-Tetramethylpiperidine Substances CC1(C)CCCC(C)(C)N1 RKMGAJGJIURJSJ-UHFFFAOYSA-N 0.000 claims description 14
- 150000003863 ammonium salts Chemical class 0.000 claims description 13
- 239000002994 raw material Substances 0.000 claims description 11
- 150000003839 salts Chemical class 0.000 claims description 8
- 239000000126 substance Substances 0.000 abstract description 17
- 239000007791 liquid phase Substances 0.000 abstract description 13
- 238000007670 refining Methods 0.000 abstract description 4
- 239000012808 vapor phase Substances 0.000 abstract 2
- 239000003112 inhibitor Substances 0.000 description 35
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 33
- 238000004821 distillation Methods 0.000 description 30
- 238000000926 separation method Methods 0.000 description 28
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 24
- 239000007789 gas Substances 0.000 description 24
- 239000000243 solution Substances 0.000 description 22
- 238000009835 boiling Methods 0.000 description 18
- 239000007788 liquid Substances 0.000 description 18
- 239000012071 phase Substances 0.000 description 18
- HGINCPLSRVDWNT-UHFFFAOYSA-N Acrolein Chemical compound C=CC=O HGINCPLSRVDWNT-UHFFFAOYSA-N 0.000 description 16
- 239000007864 aqueous solution Substances 0.000 description 16
- 229920000642 polymer Polymers 0.000 description 15
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 14
- 150000001879 copper Chemical class 0.000 description 12
- 239000000203 mixture Substances 0.000 description 12
- 239000000047 product Substances 0.000 description 11
- 230000000694 effects Effects 0.000 description 10
- 150000002696 manganese Chemical class 0.000 description 9
- 238000010992 reflux Methods 0.000 description 9
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 8
- 238000000354 decomposition reaction Methods 0.000 description 8
- 230000003197 catalytic effect Effects 0.000 description 7
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 238000010533 azeotropic distillation Methods 0.000 description 6
- 229910052802 copper Inorganic materials 0.000 description 6
- 239000010949 copper Substances 0.000 description 6
- IXPUJMULXNNEHS-UHFFFAOYSA-L copper;n,n-dibutylcarbamodithioate Chemical compound [Cu+2].CCCCN(C([S-])=S)CCCC.CCCCN(C([S-])=S)CCCC IXPUJMULXNNEHS-UHFFFAOYSA-L 0.000 description 6
- 230000018044 dehydration Effects 0.000 description 6
- 238000006297 dehydration reaction Methods 0.000 description 6
- 239000000178 monomer Substances 0.000 description 6
- 238000007254 oxidation reaction Methods 0.000 description 6
- 229950000688 phenothiazine Drugs 0.000 description 6
- CSGAUKGQUCHWDP-UHFFFAOYSA-N 1-hydroxy-2,2,6,6-tetramethylpiperidin-4-ol Chemical compound CC1(C)CC(O)CC(C)(C)N1O CSGAUKGQUCHWDP-UHFFFAOYSA-N 0.000 description 5
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 5
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 5
- 229910001882 dioxygen Inorganic materials 0.000 description 5
- 230000002265 prevention Effects 0.000 description 5
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 5
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 5
- WJFKNYWRSNBZNX-UHFFFAOYSA-N 10H-phenothiazine Chemical compound C1=CC=C2NC3=CC=CC=C3SC2=C1 WJFKNYWRSNBZNX-UHFFFAOYSA-N 0.000 description 4
- 239000006185 dispersion Substances 0.000 description 4
- HYBBIBNJHNGZAN-UHFFFAOYSA-N furfural Chemical compound O=CC1=CC=CO1 HYBBIBNJHNGZAN-UHFFFAOYSA-N 0.000 description 4
- 239000010409 thin film Substances 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- UZFMOKQJFYMBGY-UHFFFAOYSA-N 4-hydroxy-TEMPO Chemical group CC1(C)CC(O)CC(C)(C)N1[O] UZFMOKQJFYMBGY-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 3
- VQTUBCCKSQIDNK-UHFFFAOYSA-N Isobutene Chemical group CC(C)=C VQTUBCCKSQIDNK-UHFFFAOYSA-N 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 239000012535 impurity Substances 0.000 description 3
- 238000002347 injection Methods 0.000 description 3
- 239000007924 injection Substances 0.000 description 3
- UOGMEBQRZBEZQT-UHFFFAOYSA-L manganese(2+);diacetate Chemical compound [Mn+2].CC([O-])=O.CC([O-])=O UOGMEBQRZBEZQT-UHFFFAOYSA-L 0.000 description 3
- 239000003960 organic solvent Substances 0.000 description 3
- 230000003647 oxidation Effects 0.000 description 3
- 239000012495 reaction gas Substances 0.000 description 3
- 229920002554 vinyl polymer Polymers 0.000 description 3
- VDVUCLWJZJHFAV-UHFFFAOYSA-N 2,2,6,6-tetramethylpiperidin-4-ol Chemical compound CC1(C)CC(O)CC(C)(C)N1 VDVUCLWJZJHFAV-UHFFFAOYSA-N 0.000 description 2
- SOGAXMICEFXMKE-UHFFFAOYSA-N Butylmethacrylate Chemical compound CCCCOC(=O)C(C)=C SOGAXMICEFXMKE-UHFFFAOYSA-N 0.000 description 2
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 description 2
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 2
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
- DKGAVHZHDRPRBM-UHFFFAOYSA-N Tert-Butanol Chemical compound CC(C)(C)O DKGAVHZHDRPRBM-UHFFFAOYSA-N 0.000 description 2
- 150000001299 aldehydes Chemical class 0.000 description 2
- HUMNYLRZRPPJDN-UHFFFAOYSA-N benzaldehyde Chemical compound O=CC1=CC=CC=C1 HUMNYLRZRPPJDN-UHFFFAOYSA-N 0.000 description 2
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 2
- 230000005587 bubbling Effects 0.000 description 2
- 239000006227 byproduct Substances 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- KGGZTXSNARMULX-UHFFFAOYSA-L copper;dicarbamodithioate Chemical compound [Cu+2].NC([S-])=S.NC([S-])=S KGGZTXSNARMULX-UHFFFAOYSA-L 0.000 description 2
- OBBCYCYCTJQCCK-UHFFFAOYSA-L copper;n,n-diethylcarbamodithioate Chemical compound [Cu+2].CCN(CC)C([S-])=S.CCN(CC)C([S-])=S OBBCYCYCTJQCCK-UHFFFAOYSA-L 0.000 description 2
- ZOUQIAGHKFLHIA-UHFFFAOYSA-L copper;n,n-dimethylcarbamodithioate Chemical compound [Cu+2].CN(C)C([S-])=S.CN(C)C([S-])=S ZOUQIAGHKFLHIA-UHFFFAOYSA-L 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 2
- 239000011572 manganese Substances 0.000 description 2
- 229910052748 manganese Inorganic materials 0.000 description 2
- 229940071125 manganese acetate Drugs 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 238000012856 packing Methods 0.000 description 2
- 230000001737 promoting effect Effects 0.000 description 2
- 239000003381 stabilizer Substances 0.000 description 2
- PJYUCLOYEILMHQ-UHFFFAOYSA-N 1,2-bis(1-phenylethyl)-10h-phenothiazine Chemical compound C=1C=C2SC3=CC=CC=C3NC2=C(C(C)C=2C=CC=CC=2)C=1C(C)C1=CC=CC=C1 PJYUCLOYEILMHQ-UHFFFAOYSA-N 0.000 description 1
- VUZNLSBZRVZGIK-UHFFFAOYSA-N 2,2,6,6-Tetramethyl-1-piperidinol Chemical compound CC1(C)CCCC(C)(C)N1O VUZNLSBZRVZGIK-UHFFFAOYSA-N 0.000 description 1
- GVNVAWHJIKLAGL-UHFFFAOYSA-N 2-(cyclohexen-1-yl)cyclohexan-1-one Chemical compound O=C1CCCCC1C1=CCCCC1 GVNVAWHJIKLAGL-UHFFFAOYSA-N 0.000 description 1
- GOXQRTZXKQZDDN-UHFFFAOYSA-N 2-Ethylhexyl acrylate Chemical compound CCCCC(CC)COC(=O)C=C GOXQRTZXKQZDDN-UHFFFAOYSA-N 0.000 description 1
- OMIGHNLMNHATMP-UHFFFAOYSA-N 2-hydroxyethyl prop-2-enoate Chemical compound OCCOC(=O)C=C OMIGHNLMNHATMP-UHFFFAOYSA-N 0.000 description 1
- VHSHLMUCYSAUQU-UHFFFAOYSA-N 2-hydroxypropyl methacrylate Chemical compound CC(O)COC(=O)C(C)=C VHSHLMUCYSAUQU-UHFFFAOYSA-N 0.000 description 1
- GWZMWHWAWHPNHN-UHFFFAOYSA-N 2-hydroxypropyl prop-2-enoate Chemical compound CC(O)COC(=O)C=C GWZMWHWAWHPNHN-UHFFFAOYSA-N 0.000 description 1
- STGFANHLXUILNY-UHFFFAOYSA-N 3,7-dioctyl-10h-phenothiazine Chemical compound C1=C(CCCCCCCC)C=C2SC3=CC(CCCCCCCC)=CC=C3NC2=C1 STGFANHLXUILNY-UHFFFAOYSA-N 0.000 description 1
- CYUZOYPRAQASLN-UHFFFAOYSA-N 3-prop-2-enoyloxypropanoic acid Chemical compound OC(=O)CCOC(=O)C=C CYUZOYPRAQASLN-UHFFFAOYSA-N 0.000 description 1
- UWDMKTDPDJCJOP-UHFFFAOYSA-N 4-hydroxy-2,2,6,6-tetramethylpiperidin-1-ium-4-carboxylate Chemical compound CC1(C)CC(O)(C(O)=O)CC(C)(C)N1 UWDMKTDPDJCJOP-UHFFFAOYSA-N 0.000 description 1
- JSTCPNFNKICNNO-UHFFFAOYSA-N 4-nitrosophenol Chemical compound OC1=CC=C(N=O)C=C1 JSTCPNFNKICNNO-UHFFFAOYSA-N 0.000 description 1
- 239000005711 Benzoic acid Substances 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- 101150065749 Churc1 gene Proteins 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- KCXVZYZYPLLWCC-UHFFFAOYSA-N EDTA Chemical class OC(=O)CN(CC(O)=O)CCN(CC(O)=O)CC(O)=O KCXVZYZYPLLWCC-UHFFFAOYSA-N 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- JIGUQPWFLRLWPJ-UHFFFAOYSA-N Ethyl acrylate Chemical compound CCOC(=O)C=C JIGUQPWFLRLWPJ-UHFFFAOYSA-N 0.000 description 1
- STNJBCKSHOAVAJ-UHFFFAOYSA-N Methacrolein Chemical compound CC(=C)C=O STNJBCKSHOAVAJ-UHFFFAOYSA-N 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 1
- BZLVMXJERCGZMT-UHFFFAOYSA-N Methyl tert-butyl ether Chemical compound COC(C)(C)C BZLVMXJERCGZMT-UHFFFAOYSA-N 0.000 description 1
- UBUCNCOMADRQHX-UHFFFAOYSA-N N-Nitrosodiphenylamine Chemical compound C=1C=CC=CC=1N(N=O)C1=CC=CC=C1 UBUCNCOMADRQHX-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 102100038239 Protein Churchill Human genes 0.000 description 1
- QYTDEUPAUMOIOP-UHFFFAOYSA-N TEMPO Chemical group CC1(C)CCCC(C)(C)N1[O] QYTDEUPAUMOIOP-UHFFFAOYSA-N 0.000 description 1
- 125000005396 acrylic acid ester group Chemical group 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 239000003125 aqueous solvent Substances 0.000 description 1
- 235000010233 benzoic acid Nutrition 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229940120693 copper naphthenate Drugs 0.000 description 1
- 229910000365 copper sulfate Inorganic materials 0.000 description 1
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 description 1
- XTVVROIMIGLXTD-UHFFFAOYSA-N copper(II) nitrate Chemical compound [Cu+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O XTVVROIMIGLXTD-UHFFFAOYSA-N 0.000 description 1
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 description 1
- OPQARKPSCNTWTJ-UHFFFAOYSA-L copper(ii) acetate Chemical compound [Cu+2].CC([O-])=O.CC([O-])=O OPQARKPSCNTWTJ-UHFFFAOYSA-L 0.000 description 1
- SEVNKWFHTNVOLD-UHFFFAOYSA-L copper;3-(4-ethylcyclohexyl)propanoate;3-(3-ethylcyclopentyl)propanoate Chemical compound [Cu+2].CCC1CCC(CCC([O-])=O)C1.CCC1CCC(CCC([O-])=O)CC1 SEVNKWFHTNVOLD-UHFFFAOYSA-L 0.000 description 1
- WIIJVOHQGQETTP-UHFFFAOYSA-L copper;n,n-dihexylcarbamodithioate Chemical compound [Cu+2].CCCCCCN(C([S-])=S)CCCCCC.CCCCCCN(C([S-])=S)CCCCCC WIIJVOHQGQETTP-UHFFFAOYSA-L 0.000 description 1
- BTSJZPQOSLORGE-UHFFFAOYSA-L copper;n,n-dipentylcarbamodithioate Chemical compound [Cu+2].CCCCCN(C([S-])=S)CCCCC.CCCCCN(C([S-])=S)CCCCC BTSJZPQOSLORGE-UHFFFAOYSA-L 0.000 description 1
- OTVBXFQXYAYGEX-UHFFFAOYSA-L copper;n,n-diphenylcarbamodithioate Chemical compound [Cu+2].C=1C=CC=CC=1N(C(=S)[S-])C1=CC=CC=C1.C=1C=CC=CC=1N(C(=S)[S-])C1=CC=CC=C1 OTVBXFQXYAYGEX-UHFFFAOYSA-L 0.000 description 1
- UQMKZLGQBFCRSN-UHFFFAOYSA-L copper;n,n-dipropylcarbamodithioate Chemical compound [Cu+2].CCCN(C([S-])=S)CCC.CCCN(C([S-])=S)CCC UQMKZLGQBFCRSN-UHFFFAOYSA-L 0.000 description 1
- QNLDJGYWFHOXOK-UHFFFAOYSA-L copper;n-butyl-n-ethylcarbamodithioate Chemical compound [Cu+2].CCCCN(CC)C([S-])=S.CCCCN(CC)C([S-])=S QNLDJGYWFHOXOK-UHFFFAOYSA-L 0.000 description 1
- WTBRSERGLKIACY-UHFFFAOYSA-L copper;n-butyl-n-hexylcarbamodithioate Chemical compound [Cu+2].CCCCCCN(C([S-])=S)CCCC.CCCCCCN(C([S-])=S)CCCC WTBRSERGLKIACY-UHFFFAOYSA-L 0.000 description 1
- XZNRKCTYUWUQSR-UHFFFAOYSA-L copper;n-butyl-n-methylcarbamodithioate Chemical compound [Cu+2].CCCCN(C)C([S-])=S.CCCCN(C)C([S-])=S XZNRKCTYUWUQSR-UHFFFAOYSA-L 0.000 description 1
- YXGGLBLEYDQHRR-UHFFFAOYSA-L copper;n-butyl-n-pentylcarbamodithioate Chemical compound [Cu+2].CCCCCN(C([S-])=S)CCCC.CCCCCN(C([S-])=S)CCCC YXGGLBLEYDQHRR-UHFFFAOYSA-L 0.000 description 1
- GMGSDIPTNOEOIE-UHFFFAOYSA-L copper;n-butyl-n-phenylcarbamodithioate Chemical compound [Cu+2].CCCCN(C([S-])=S)C1=CC=CC=C1.CCCCN(C([S-])=S)C1=CC=CC=C1 GMGSDIPTNOEOIE-UHFFFAOYSA-L 0.000 description 1
- HOBWWMFINPBQMT-UHFFFAOYSA-L copper;n-butyl-n-propylcarbamodithioate Chemical compound [Cu+2].CCCCN(C([S-])=S)CCC.CCCCN(C([S-])=S)CCC HOBWWMFINPBQMT-UHFFFAOYSA-L 0.000 description 1
- PPGZPMBIGPGTQF-UHFFFAOYSA-L copper;n-ethyl-n-hexylcarbamodithioate Chemical compound [Cu+2].CCCCCCN(CC)C([S-])=S.CCCCCCN(CC)C([S-])=S PPGZPMBIGPGTQF-UHFFFAOYSA-L 0.000 description 1
- CDWYCTVNTQKXGA-UHFFFAOYSA-L copper;n-ethyl-n-pentylcarbamodithioate Chemical compound [Cu+2].CCCCCN(CC)C([S-])=S.CCCCCN(CC)C([S-])=S CDWYCTVNTQKXGA-UHFFFAOYSA-L 0.000 description 1
- JYIYUJBHEGUHRO-UHFFFAOYSA-L copper;n-ethyl-n-propylcarbamodithioate Chemical compound [Cu+2].CCCN(CC)C([S-])=S.CCCN(CC)C([S-])=S JYIYUJBHEGUHRO-UHFFFAOYSA-L 0.000 description 1
- OFVIMKSVEOVZHG-UHFFFAOYSA-L copper;n-hexyl-n-methylcarbamodithioate Chemical compound [Cu+2].CCCCCCN(C)C([S-])=S.CCCCCCN(C)C([S-])=S OFVIMKSVEOVZHG-UHFFFAOYSA-L 0.000 description 1
- XJWCVMTWXKXGIJ-UHFFFAOYSA-L copper;n-hexyl-n-pentylcarbamodithioate Chemical compound [Cu+2].CCCCCCN(C([S-])=S)CCCCC.CCCCCCN(C([S-])=S)CCCCC XJWCVMTWXKXGIJ-UHFFFAOYSA-L 0.000 description 1
- GDXBPDCQYJYKOO-UHFFFAOYSA-L copper;n-hexyl-n-propylcarbamodithioate Chemical compound [Cu+2].CCCCCCN(C([S-])=S)CCC.CCCCCCN(C([S-])=S)CCC GDXBPDCQYJYKOO-UHFFFAOYSA-L 0.000 description 1
- IMWDPWPXXFUSPE-UHFFFAOYSA-L copper;n-methyl-n-pentylcarbamodithioate Chemical compound [Cu+2].CCCCCN(C)C([S-])=S.CCCCCN(C)C([S-])=S IMWDPWPXXFUSPE-UHFFFAOYSA-L 0.000 description 1
- JATUHITVIFHTDZ-UHFFFAOYSA-L copper;n-methyl-n-phenylcarbamodithioate Chemical compound [Cu+2].[S-]C(=S)N(C)C1=CC=CC=C1.[S-]C(=S)N(C)C1=CC=CC=C1 JATUHITVIFHTDZ-UHFFFAOYSA-L 0.000 description 1
- CYSXAJXJMFDNMS-UHFFFAOYSA-L copper;n-methyl-n-propylcarbamodithioate Chemical compound [Cu+2].CCCN(C)C([S-])=S.CCCN(C)C([S-])=S CYSXAJXJMFDNMS-UHFFFAOYSA-L 0.000 description 1
- RBMYUTZCGSUXOL-UHFFFAOYSA-L copper;n-pentyl-n-phenylcarbamodithioate Chemical compound [Cu+2].CCCCCN(C([S-])=S)C1=CC=CC=C1.CCCCCN(C([S-])=S)C1=CC=CC=C1 RBMYUTZCGSUXOL-UHFFFAOYSA-L 0.000 description 1
- AJUQYYZUDMPNEE-UHFFFAOYSA-L copper;n-pentyl-n-propylcarbamodithioate Chemical compound [Cu+2].CCCCCN(C([S-])=S)CCC.CCCCCN(C([S-])=S)CCC AJUQYYZUDMPNEE-UHFFFAOYSA-L 0.000 description 1
- JAUHRSQWPREBLY-UHFFFAOYSA-L copper;n-phenyl-n-propylcarbamodithioate Chemical compound [Cu+2].CCCN(C([S-])=S)C1=CC=CC=C1.CCCN(C([S-])=S)C1=CC=CC=C1 JAUHRSQWPREBLY-UHFFFAOYSA-L 0.000 description 1
- XPLSDXJBKRIVFZ-UHFFFAOYSA-L copper;prop-2-enoate Chemical compound [Cu+2].[O-]C(=O)C=C.[O-]C(=O)C=C XPLSDXJBKRIVFZ-UHFFFAOYSA-L 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- UKRVECBFDMVBPU-UHFFFAOYSA-N ethyl 3-oxoheptanoate Chemical compound CCCCC(=O)CC(=O)OCC UKRVECBFDMVBPU-UHFFFAOYSA-N 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 229910017053 inorganic salt Inorganic materials 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- BHVPEUGTPDJECS-UHFFFAOYSA-L manganese(2+);diformate Chemical compound [Mn+2].[O-]C=O.[O-]C=O BHVPEUGTPDJECS-UHFFFAOYSA-L 0.000 description 1
- SGGOJYZMTYGPCH-UHFFFAOYSA-L manganese(2+);naphthalene-2-carboxylate Chemical compound [Mn+2].C1=CC=CC2=CC(C(=O)[O-])=CC=C21.C1=CC=CC2=CC(C(=O)[O-])=CC=C21 SGGOJYZMTYGPCH-UHFFFAOYSA-L 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 150000002734 metacrylic acid derivatives Chemical class 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- BHWVXPZCVBYKCR-UHFFFAOYSA-L n,n-diphenylcarbamodithioate;manganese(2+) Chemical compound [Mn+2].C=1C=CC=CC=1N(C(=S)[S-])C1=CC=CC=C1.C=1C=CC=CC=1N(C(=S)[S-])C1=CC=CC=C1 BHWVXPZCVBYKCR-UHFFFAOYSA-L 0.000 description 1
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- NWVVVBRKAWDGAB-UHFFFAOYSA-N p-methoxyphenol Chemical compound COC1=CC=C(O)C=C1 NWVVVBRKAWDGAB-UHFFFAOYSA-N 0.000 description 1
- QNGNSVIICDLXHT-UHFFFAOYSA-N para-ethylbenzaldehyde Natural products CCC1=CC=C(C=O)C=C1 QNGNSVIICDLXHT-UHFFFAOYSA-N 0.000 description 1
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- 150000002990 phenothiazines Chemical class 0.000 description 1
- AQSJGOWTSHOLKH-UHFFFAOYSA-N phosphite(3-) Chemical class [O-]P([O-])[O-] AQSJGOWTSHOLKH-UHFFFAOYSA-N 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000004321 preservation Methods 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 238000011403 purification operation Methods 0.000 description 1
- 238000009790 rate-determining step (RDS) Methods 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 238000007086 side reaction Methods 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
- 230000008016 vaporization Effects 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Landscapes
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、(メタ)アクリル
酸およびそのエステルの重合防止方法ならびにこれらの
製造方法に関し、より詳細には、ニトロソ化合物を重合
防止剤として使用し、該重合防止剤を塔底側から供給し
て蒸留することを特徴とする(メタ)アクリル酸および
そのエステルの重合防止方法、ならびに該重合防止方法
を製造工程に含む(メタ)アクリル酸およびそのエステ
ルの製造方法に関する。[0001] The present invention relates to a method for preventing polymerization of (meth) acrylic acid and its ester and a method for producing the same. More specifically, the present invention relates to a method for using a nitroso compound as a polymerization inhibitor. The present invention relates to a method for preventing (meth) acrylic acid and its ester from being polymerized, which is fed from the bottom of the column and distillation, and a method for producing (meth) acrylic acid and its ester, which includes the method for preventing polymerization in its production step.
【0002】[0002]
【従来の技術】アクリル酸やメタクリル酸等の易重合性
化合物は、工業的な製造原料であり大規模なプラントで
大量に生産される化学物質である。例えば、(メタ)ア
クリル酸を例に取れば、該易重合性化合物は、プロピレ
ン、イソブチレン、イソブチレン、t−ブタノール、メ
チル−t−ブチルエーテル、アクロレインなどの接触気
相酸化反応によって製造されるが、該接触気相酸化反応
によって得られた反応ガス中には、目的物たる(メタ)
アクリル酸の他の副生物等が混在する。例えば、該反応
によって主として非凝縮性の気体すなわち未変換プロピ
レン、イソブチレン、アクロレインや沸点がアクリル酸
の沸点よりも低い水蒸気、未変換アクロレインなどの低
沸点有機化合物、副反応で生じるホルムアルデヒド、酢
酸等の不純物、沸点がアクリル酸の沸点よりも高い無水
マレイン酸、フルフラール、ベンズアルデヒド、安息香
酸、アクリル酸二量体等の高沸点化合物が発生する。こ
のため、この反応ガスを精製して目的物を製造するに
は、上記反応ガスを水または重質溶媒で向流洗浄して吸
収し、次いでこれを蒸留塔に供給して精製することが一
般的である。2. Description of the Related Art An easily polymerizable compound such as acrylic acid or methacrylic acid is an industrial raw material and a chemical substance produced in large quantities in a large-scale plant. For example, taking (meth) acrylic acid as an example, the easily polymerizable compound is produced by a catalytic gas phase oxidation reaction of propylene, isobutylene, isobutylene, t-butanol, methyl-t-butyl ether, acrolein, etc. The target gas (meta) is contained in the reaction gas obtained by the catalytic gas phase oxidation reaction.
Other by-products of acrylic acid are mixed. For example, mainly non-condensable gases, i.e., unconverted propylene, isobutylene, acrolein and water vapor having a boiling point lower than the boiling point of acrylic acid, low-boiling organic compounds such as unconverted acrolein, and formaldehyde and acetic acid produced by side reactions. Impurities and high-boiling compounds such as maleic anhydride, furfural, benzaldehyde, benzoic acid, and acrylic acid dimer having a boiling point higher than that of acrylic acid are generated. For this reason, in order to purify the reaction gas to produce the target product, it is common to absorb the reaction gas by countercurrent washing with water or a heavy solvent and then supply it to a distillation column for purification. It is a target.
【0003】一方、(メタ)アクリル酸およびそのエス
テルはその構造から、極めて重合し易い性質を持つ化合
物である。しかも、(メタ)アクリル酸の蒸留工程など
は、気相部と液相部とが混在する系を構成するため、蒸
留塔内の液相部と気相部との双方に対してその重合を効
果的に抑制し、長時間の安定な連続運転を可能とする必
要がある。一般にはこのような重合の発生を防止するた
めに、種々の重合防止剤が単独あるいは数種組み合わさ
れてモノマー中に添加され、該製造工程での重合物の発
生を防止している。[0003] On the other hand, (meth) acrylic acid and its ester are compounds which are very easily polymerized due to their structures. In addition, since the (meth) acrylic acid distillation step and the like constitute a system in which the gas phase and the liquid phase are mixed, the polymerization is performed on both the liquid phase and the gas phase in the distillation column. It is necessary to suppress the pressure effectively and enable stable continuous operation for a long time. Generally, in order to prevent such polymerization from occurring, various polymerization inhibitors are added to the monomer alone or in combination of several kinds to prevent the generation of a polymer in the production process.
【0004】例えば、特開平9−95465号公報に
は、ニトロソ化合物の1種であるN−ニトロソフェニル
ヒドロキシルアミンまたはその塩を用いてビニル化合物
の重合を防止するに当たり、N−ニトロソフェニルヒド
ロキシルアミンまたはその塩と共に、銅塩を存在させる
ことを特徴とするビニル化合物の重合防止方法が開示さ
れている。該方法によれば、両化合物を同時にまたは別
個に蒸留工程に導入することで、アクリル酸やメタクリ
ル酸の重合を効果的に防止し、その製造プロセスを長時
間にわたり安定して運転することができるとしている。
実施例では、アクリル酸にジブチルジチオカルバミン酸
銅とN−ニトロソフェニルヒドロキシルアミンとを溶解
させた後に還流操作を行い、重合物の発生を観察してい
る。[0004] For example, Japanese Patent Application Laid-Open No. 9-95465 discloses that, when using N-nitrosophenylhydroxylamine or a salt thereof as a kind of nitroso compound to prevent polymerization of a vinyl compound, N-nitrosophenylhydroxylamine or N-nitrosophenylhydroxylamine is used. There is disclosed a method for preventing polymerization of a vinyl compound, characterized in that a copper salt is present together with the salt. According to the method, by introducing both compounds simultaneously or separately to the distillation step, polymerization of acrylic acid or methacrylic acid can be effectively prevented, and the production process can be stably operated for a long time. And
In the examples, refluxing operation is performed after dissolving copper dibutyldithiocarbamate and N-nitrosophenylhydroxylamine in acrylic acid, and generation of a polymer is observed.
【0005】[0005]
【発明が解決しようとする課題】しかしながら、特開平
9−95465号公報に記載される方法は、銅塩を必須
の成分として使用するため、銅塩を含む使用水等が環境
中に放出されるため、これを処理する手段が新たに必要
となり不利である。However, the method described in Japanese Patent Application Laid-Open No. 9-95465 uses a copper salt as an essential component, so that water or the like containing the copper salt is discharged into the environment. Therefore, a means for processing this is newly required, which is disadvantageous.
【0006】また、(メタ)アクリル酸などの重合を効
果的に防止しようとすれば、重合防止剤の使用量を増加
すればよいが、これではこれら(メタ)アクリル酸等の
重合操作の段階で重合防止剤を除去する工程が必要とな
り、不利である。In order to effectively prevent polymerization of (meth) acrylic acid and the like, the amount of the polymerization inhibitor to be used may be increased. This requires a step of removing the polymerization inhibitor, which is disadvantageous.
【0007】また、プロピレン等の接触気相酸化によっ
て合成された(メタ)アクリル酸に含まれる酢酸、低級
アルデヒドなどの低沸点物質と、フルフラール、無水マ
レイン酸等の高沸点物質が副生成物を精製分離するため
に、(メタ)アクリル酸含有溶液を、蒸留、放散、抽
出、晶析等の方法を行っているが、より一層の製造工程
の簡略化が求められる。例えば、酢酸分離塔数を減少し
たり蒸留工程を減少しようとすれば、蒸留条件を厳しく
する必要が生ずる。製造工程の簡略化は、社会的な要請
であるが、このためには各精製工程で現在よりも過酷な
蒸留条件を必要とすることになり、精製分離条件が過酷
になれば各精製工程で重合物がより発生しやすくなる。
一方、重合物が発生すれば連続運転が不可能となり、ま
た精製塔における重合物の除去作業をより困難なものと
する。Also, low-boiling substances such as acetic acid and lower aldehyde contained in (meth) acrylic acid synthesized by catalytic gas-phase oxidation of propylene and the like and high-boiling substances such as furfural and maleic anhydride form by-products. In order to purify and separate, a (meth) acrylic acid-containing solution is subjected to methods such as distillation, stripping, extraction, and crystallization, but further simplification of the manufacturing process is required. For example, if the number of acetic acid separation columns is reduced or the number of distillation steps is reduced, it is necessary to make the distillation conditions stricter. The simplification of the manufacturing process is a social request, but for this purpose, each purification step requires more severe distillation conditions than at present. A polymer is more easily generated.
On the other hand, if a polymer is generated, continuous operation becomes impossible, and it becomes more difficult to remove the polymer in the purification tower.
【0008】このような現状から、(メタ)アクリル酸
などの易重合性物質の製造方法において、精製塔におい
て気相、液相の双方における重合物の発生を効果的に防
止し、本来必要とされる連続運転を達成できる(メタ)
アクリル酸やそのエステルの重合防止方法やこれらの製
造方法が望まれる。[0008] Under such circumstances, in a method for producing an easily polymerizable substance such as (meth) acrylic acid, generation of a polymer in both a gas phase and a liquid phase in a refining tower is effectively prevented. Continuous operation can be achieved (meta)
A method for preventing polymerization of acrylic acid or its ester and a method for producing these are desired.
【0009】[0009]
【課題を解決するための手段】本発明者は、ニトロソ化
合物の重合防止機能について詳細に検討した結果、例え
ばN−ニトロソフェニルヒドロキシルアミンまたはその
塩が蒸留工程に添加された後に少なくとも一部が分解す
ること、該分解産物には重合抑制作用を有するものと重
合促進作用を有するものとが混在すること、および該化
合物を蒸留塔へ導入する際に特定個所から供給すること
で、該気相での重合防止効果を促進でき、かつ重合促進
物質の効果を抑制できること見出し本発明を完成させ
た。すなわち、上記目的は、下記(1)〜(8)によっ
て達成される。The present inventors have studied in detail the polymerization preventing function of a nitroso compound and found that, for example, N-nitrosophenylhydroxylamine or a salt thereof is at least partially decomposed after being added to a distillation step. That the decomposition product has a polymerization inhibiting action and a polymerization promoting action, and that the compound is supplied from a specific location when introduced into the distillation column, so that It has been found that the effect of preventing polymerization can be promoted and the effect of the polymerization promoting substance can be suppressed, thereby completing the present invention. That is, the above object is achieved by the following (1) to (8).
【0010】(1) ニトロソ化合物を用いて(メタ)
アクリル酸およびそのエステルを精製塔で精製する際
に、該ニトロソ化合物を精製塔の塔底側を基点として総
理論段数の70%の位置以下から供給することを特徴と
する、(メタ)アクリル酸およびそのエステルの重合防
止方法。(1) Using a nitroso compound (meth)
(A) when purifying acrylic acid and its ester in a purifying column, supplying the nitroso compound from 70% or less of the total number of theoretical plates based on the column bottom of the purifying column; And a method for preventing polymerization of the ester thereof.
【0011】(2) 該ニトロソ化合物が、溶媒に溶解
したものである、上記(1)記載の(メタ)アクリル酸
およびそのエステルの重合防止方法。(2) The method for preventing polymerization of (meth) acrylic acid and its ester as described in (1) above, wherein the nitroso compound is dissolved in a solvent.
【0012】(3) 該ニトロソ化合物が、N−ニトロ
ソフェニルヒドロキシルアミンまたはその塩である、上
記(1)または(2)記載の(メタ)アクリル酸および
そのエステルの重合防止方法。(3) The method for preventing polymerization of (meth) acrylic acid and its ester as described in (1) or (2) above, wherein the nitroso compound is N-nitrosophenylhydroxylamine or a salt thereof.
【0013】(4) 該N−ニトロソフェニルヒドロキ
シルアミンの塩が、N−ニトロソフェニルヒドロキシル
アミンのアンモニウム塩である、上記(3)記載の(メ
タ)アクリル酸およびそのエステルの重合防止方法。(4) The method for preventing polymerization of (meth) acrylic acid and its ester as described in (3) above, wherein the salt of N-nitrosophenylhydroxylamine is an ammonium salt of N-nitrosophenylhydroxylamine.
【0014】(5) 更に、N−オキシル化合物を精製
塔に導入することを特徴とする、上記(1)〜(4)の
いずれかに記載の(メタ)アクリル酸およびそのエステ
ルの重合防止方法。(5) The method for preventing polymerization of (meth) acrylic acid and its ester according to any one of the above (1) to (4), further comprising introducing an N-oxyl compound into a purification tower. .
【0015】(6) N−オキシル化合物に、N−ヒド
ロキシ−2,2,6,6−テトラメチルピペリジン化合
物と、2,2,6,6−テトラメチルピペリジン化合物
とを共存させることを特徴とする、上記(5)記載の
(メタ)アクリル酸およびそのエステルの重合防止方
法。(6) An N-oxyl compound is characterized by coexisting an N-hydroxy-2,2,6,6-tetramethylpiperidine compound and a 2,2,6,6-tetramethylpiperidine compound. (5) The method for preventing polymerization of (meth) acrylic acid and its ester according to (5).
【0016】(7) N−オキシル化合物を精製塔の原
料供給段より上部から導入することを特徴とする、上記
(5)または(6)記載の(メタ)アクリル酸およびそ
のエステルの重合防止方法。(7) The method for preventing polymerization of (meth) acrylic acid and its ester as described in (5) or (6) above, wherein the N-oxyl compound is introduced from above the raw material supply stage of the purification tower. .
【0017】(8) 上記(1)〜(7)のいずれかに
記載の(メタ)アクリル酸およびそのエステルの重合防
止方法を製造工程に含むことを特徴とする、(メタ)ア
クリル酸またはそのエステルの製造方法。(8) A method for preventing the polymerization of (meth) acrylic acid or an ester thereof according to any one of the above (1) to (7), wherein the method comprises the steps of: Method for producing ester.
【0018】[0018]
【発明の実施の形態】本発明の第一は、ニトロソ化合物
を用いて(メタ)アクリル酸およびそのエステルを精製
塔で精製する際に、該ニトロソ化合物を精製塔の塔底側
を基点として総理論段数の70%の位置以下から供給す
ることを特徴とする、(メタ)アクリル酸およびそのエ
ステルの重合防止方法である。BEST MODE FOR CARRYING OUT THE INVENTION The first aspect of the present invention is that when (meth) acrylic acid and its ester are purified by a purification tower using a nitroso compound, the nitroso compound is converted into a total starting from the bottom of the purification tower. A method for preventing polymerization of (meth) acrylic acid and its ester, characterized in that it is supplied from a position of 70% or less of the theoretical plate number.
【0019】上記のごとく、本発明者らは、ニトロソ化
合物が(メタ)アクリル酸などの蒸留工程で分解するこ
とを見出したが、精製塔の塔底側から該化合物を導入す
ると精製塔内の環境中で分解産物の内のガス成分が気相
の(メタ)アクリル酸およびそのエステルの重合を防止
する作用を発揮することがわかった。特に、精製塔の塔
底側から該ニトロソ化合物を供給すると、精製塔の環境
中で分解して得られた該ガス成分が、精製塔内を上昇し
つつガス状で存在する(メタ)アクリル酸と容易に混合
することができ、これによってより効果的にこれら化合
物の重合を防止することができる。As described above, the present inventors have found that the nitroso compound is decomposed in the distillation step of (meth) acrylic acid or the like, but when the compound is introduced from the bottom side of the purification tower, the inside of the purification tower will be decomposed. It has been found that the gas components of the decomposition products in the environment exert an action of preventing polymerization of gas-phase (meth) acrylic acid and its esters. In particular, when the nitroso compound is supplied from the bottom side of the purification tower, the gas component obtained by decomposition in the environment of the purification tower is present in a gaseous state while rising in the purification tower. Can be easily mixed with each other, whereby the polymerization of these compounds can be more effectively prevented.
【0020】なお、本発明においては、「精製」には、
蒸留、放散が含まれる。ここに、「蒸留」とは、溶液を
その沸点まで加熱し含まれる揮発性成分を分離する方法
であり、「放散」とは、放散ガスを供給して溶液中に溶
解する気体または蒸気を気相に移す方法をいうものとす
る。以下、本発明を詳細に説明する。In the present invention, “purification” includes:
Includes distillation and emission. Here, "distillation" is a method of heating a solution to its boiling point to separate volatile components contained therein, and "dissipating" is a method of supplying a dissipated gas and evaporating a gas or vapor dissolved in a solution. It refers to the method of phase transfer. Hereinafter, the present invention will be described in detail.
【0021】本発明の(メタ)アクリル酸およびそのエ
ステルの重合防止方法は、(メタ)アクリル酸およびそ
のエステルを精製する際に、精製塔内で発生する重合を
防止するものである。従って、精製塔としてはその名称
にかかわらず、(メタ)アクリル酸およびそのエステル
の製造工程で使用され、(メタ)アクリル酸およびその
エステルを精製し、または製造する目的で使用される装
置を広く含み、蒸留塔、放散塔、共沸分離塔、脱水塔、
酢酸分離塔、軽沸物分離塔、高沸物分離塔などが含まれ
る。The method for preventing polymerization of (meth) acrylic acid and its ester according to the present invention prevents polymerization occurring in a purification column when purifying (meth) acrylic acid and its ester. Therefore, regardless of the name of the purification tower, the equipment used for the production of (meth) acrylic acid and its esters and for purifying or producing (meth) acrylic acid and its esters is widely used regardless of its name. Including, distillation tower, stripping tower, azeotropic separation tower, dehydration tower,
An acetic acid separation tower, a light-boiling matter separation tower, a high-boiling matter separation tower, and the like are included.
【0022】これらの精製塔における(メタ)アクリル
酸およびそのエステル精製条件は、(メタ)アクリル酸
およびエステル体を精製し、または製造する従来公知の
条件に適用できる。ただし、本発明はこれに限られるも
のではない。The conditions for purifying (meth) acrylic acid and its ester in these purification towers can be applied to conventionally known conditions for purifying or producing (meth) acrylic acid and its ester. However, the present invention is not limited to this.
【0023】本発明で使用するニトロソ化合物としては
特に制限はなく、N−ニトロソフェニルヒドロキシルア
ミン、p−ニトロソフェノール、N−ニトロソジフェニ
ルアミンおよびこれらのアンモニウム塩が挙げられる。
これらは1種を単独で併用するほか、2種以上を用いて
もよい。特に、N−ニトロソフェニルヒドロキシルアミ
ンおよびそのアンモニウム塩が好ましい。精製塔内の条
件で該化合物が分解した後に、ガス成分の易重合性物質
に対する重合抑制効果に特に優れるからである。The nitroso compound used in the present invention is not particularly limited, and includes N-nitrosophenylhydroxylamine, p-nitrosophenol, N-nitrosodiphenylamine and ammonium salts thereof.
These may be used alone or in combination of two or more. Particularly, N-nitrosophenylhydroxylamine and its ammonium salt are preferred. This is because, after the compound is decomposed under the conditions in the purification tower, the gas component is particularly excellent in suppressing the polymerization of the easily polymerizable substance.
【0024】本発明では、これを精製塔の塔底側から供
給する。ここに本明細書における「精製塔の塔底側を基
点として総理論段数の70%の位置以下」とは、精製塔
における総理論段数の70%以下の位置の精製塔内およ
びこれに付属する配管、付属機器の全てを意味する。従
って、総理論段数の70%以下の位置であれば、精製塔
内の気相部、塔底液を含み、更に精製塔に付属するリボ
イラや該リボイラに導入しまたはリボイラから導出する
ための配管も含むものとする。従って、精製塔の塔底部
に薄膜蒸発器が付属する場合は、該薄膜蒸発器や該薄膜
蒸発器に導入しまたは薄膜蒸発器から導出するための配
管も本願におけるニトロソ化合物の供給位置に含まれ
る。より好ましくは総理論段数の30%以下、より好ま
しくは10%以下の位置である。なお、特に、ニトロソ
化合物と後記するN−オキシル化合物とを併用する場合
には、精製塔の塔底側を基点として総理論段数の50〜
70%の位置から投与すると、液相および気相における
重合防止効果に優れる。In the present invention, this is supplied from the bottom of the purification column. As used herein, the phrase "at most 70% of the total number of theoretical plates based on the bottom side of the purification column as a base point" in the present specification refers to the inside of the purification column at a position of 70% or less of the total number of theoretical plates in the purification column and attached thereto. It means all of piping and attached equipment. Therefore, if the position is 70% or less of the total theoretical plate number, the gas phase portion in the purification tower, the bottom liquid, the reboiler attached to the purification tower, and the piping for introducing into or retrieving from the reboiler are included. Shall be included. Therefore, when a thin-film evaporator is attached to the bottom of the purification tower, the thin-film evaporator and the piping for introducing the thin-film evaporator to the thin-film evaporator are also included in the supply position of the nitroso compound in the present application. . The position is more preferably 30% or less, more preferably 10% or less of the total theoretical plate number. In particular, when a nitroso compound and an N-oxyl compound described later are used in combination, the total theoretical plate number is 50 to 50% based on the bottom side of the purification column.
When administered from the 70% position, the polymerization prevention effect in the liquid phase and gas phase is excellent.
【0025】本発明において精製塔の塔底側を基点とし
て総理論段数の70%の位置以下からニトロソ化合物を
供給することとしたのは、上記のごとくガス状の分解産
物が気相中で易重合性物質の重合防止作用を奏する一
方、不揮発性の分解産物の中には重合を促進する作用を
有するものも存在することを見出したからである。精製
塔内には、トレー、充填物、液分散板、フラッシュ・フ
ィ−ド液分散板、1次液分散板、コレクタ−、蒸気分散
板、パッキング・サポ−ト、充填層抑板などの蒸留塔内
装物が存在するため、ニトロソ化合物の分解産物であっ
て不揮発性の成分がこれら内装物に付着すると、該内装
物表面における(メタ)アクリル酸などの重合を促進す
るおそれがある。この点、精製塔の塔底側を基点として
総理論段数の70%の位置以下であれば、気相中で有効
に易重合性ガスの重合を防止できると共に、内装物表面
で発生する重合促進の副作用も許容できる範囲となる。In the present invention, the nitroso compound is supplied from a position of 70% or less of the total number of theoretical plates from the bottom of the purification column as a base point, as described above, because gaseous decomposition products are easily produced in the gas phase. This is because it has been found that some of the non-volatile decomposition products have an action of accelerating the polymerization while exhibiting the action of preventing the polymerization of the polymerizable substance. In the purification tower, distillation of trays, packings, liquid dispersion plates, flash feed liquid dispersion plates, primary liquid dispersion plates, collectors, vapor dispersion plates, packing supports, packed bed suppression plates, etc. Due to the presence of the column interior, if a non-volatile component, which is a decomposition product of a nitroso compound and adheres to these interiors, there is a possibility that polymerization of (meth) acrylic acid and the like on the surface of the interior will be accelerated. In this regard, if the position is 70% or less of the total number of theoretical plates with respect to the bottom of the purification tower as the base point, polymerization of the easily polymerizable gas can be effectively prevented in the gas phase and polymerization promotion generated on the surface of the interior material Side effects are also in an acceptable range.
【0026】このような該ニトロソ化合物は、これを溶
媒に溶解したものを精製塔に投与することが好ましい。
具体的には、適当な溶剤、好ましくは反応系に仕込む溶
剤や、水などの原料供給液中に含まれる成分と同種の溶
剤に該ニトロソ化合物を溶かして液状にしたものを精製
塔の塔底側を基点として総理論段数の70%の位置以下
から供給する。該ニトロソ化合物を溶解するために使用
する溶媒は、精製塔内条件やニトロソ化合物の溶媒に対
する溶解性や分解性などの化学的、物理的性質によって
適宜選択すればよい。溶媒の例としては,水、アルコー
ル、炭化水素、ケトン、エステル、酸等が挙げられる。
ニトロソ化合物がN−ニトロソフェニルヒドロシルアミ
ンのアンモニウム塩の場合は、溶媒中での安定性を考慮
すると水が最も好ましく、酸は好ましくない。なお、こ
の位置内に原料供給段が含まれる場合には、原料供給溶
液中に該ニトロソ化合物含有溶液を混合し、または原料
供給溶液にニトロソ化合物を溶解させて精製塔に導入し
てもよい。また、精製塔に貫通させたニトロソ化合物供
給口から該ニトロソ化合物含有溶液を流入、滴下または
噴霧して導入してもよい。It is preferable that such a nitroso compound is dissolved in a solvent and administered to a purification tower.
Specifically, a solution obtained by dissolving the nitroso compound in a suitable solvent, preferably a solvent to be charged into the reaction system, or a solvent of the same kind as the components contained in the raw material supply liquid such as water, and converting the solution into a liquid at the bottom of the purification tower Supplied from the position below 70% of the total theoretical plate number with the side as the base point. The solvent used for dissolving the nitroso compound may be appropriately selected depending on the conditions in the purification column and the chemical and physical properties such as solubility and decomposability of the nitroso compound in the solvent. Examples of the solvent include water, alcohol, hydrocarbon, ketone, ester, acid and the like.
In the case where the nitroso compound is an ammonium salt of N-nitrosophenylhydrosylamine, water is most preferable and an acid is not preferable in consideration of stability in a solvent. When a raw material supply stage is included in this position, the nitroso compound-containing solution may be mixed in the raw material supply solution, or the nitroso compound may be dissolved in the raw material supply solution and introduced into the purification tower. Alternatively, the nitroso compound-containing solution may be introduced, dropped, or sprayed from the nitroso compound supply port penetrated through the purification tower.
【0027】本発明で精製塔に添加されるニトロソ化合
物の供給量としては特に制限されるものではないが、該
化合物は精製塔内で分解するため、分解前の物質で換算
すれば、塔底液中の該ニトロソ化合物濃度が0.000
5〜0.05質量%、好ましくは0.001〜0.01
質量%の範囲である。0.0005質量%を下回ると重
合防止効果が十分でないからである。なお、該ニトロソ
化合物は精製塔の条件で少なくともその一部が分解し、
分解産物の種類によっては(メタ)アクリル酸などの重
合を促進する場合がある。従って、該塔底液中のニトロ
ソ化合物濃度を0.05質量%以下とすることで、該重
合を抑制することができる。Although the supply amount of the nitroso compound to be added to the purification column in the present invention is not particularly limited, the compound is decomposed in the purification column. The concentration of the nitroso compound in the solution is 0.000
5 to 0.05% by mass, preferably 0.001 to 0.01
% By mass. If the amount is less than 0.0005% by mass, the effect of preventing polymerization is not sufficient. Incidentally, at least a part of the nitroso compound is decomposed under the conditions of the purification tower,
Depending on the type of the decomposition product, polymerization of (meth) acrylic acid or the like may be promoted. Therefore, the polymerization can be suppressed by setting the concentration of the nitroso compound in the bottom liquid to 0.05% by mass or less.
【0028】なお、本発明では、ニトロソ化合物に加
え、N−オキシル化合物、2,2,6,6−テトラメチ
ルピペリジン化合物、N−ヒドロキシ−2,2,6,6
−テトラメチルピペリジン化合物、フェノール化合物、
銅塩、マンガン塩等の公知の重合防止剤を併用すること
ができる。上記のごとく、ニトロソ化合物の分解産物に
よっては重合を促進する場合があるため、他の重合防止
剤を併用することで特に液相における(メタ)アクリル
酸などの重合を防止することができる。In the present invention, in addition to the nitroso compound, an N-oxyl compound, a 2,2,6,6-tetramethylpiperidine compound, an N-hydroxy-2,2,6,6
A tetramethylpiperidine compound, a phenol compound,
Known polymerization inhibitors such as copper salts and manganese salts can be used in combination. As described above, the polymerization may be accelerated depending on the decomposition product of the nitroso compound. Therefore, the polymerization of (meth) acrylic acid or the like particularly in the liquid phase can be prevented by using another polymerization inhibitor in combination.
【0029】本発明で用いられるN−オキシル化合物に
ついては特に制限はなく、一般にビニル化合物に重合防
止剤として知られているN−オキシル化合物であればい
ずれも用いることができる。これらのなかでも、下記式
(1)で表される2,2,6,6−テトラメチルピペリ
ジノオキシル類:The N-oxyl compound used in the present invention is not particularly limited, and any N-oxyl compound generally known as a polymerization inhibitor for a vinyl compound can be used. Among them, 2,2,6,6-tetramethylpiperidinooxyls represented by the following formula (1):
【0030】[0030]
【化1】 Embedded image
【0031】(ただし、式中、R1はCHOH、CHC
H2OH、CHCH2CH2OH、CHOCH2OH、CH
OCH2CH2OH、CHCOOH、またはC=Oを示
し、R2はHまたはCH2OHを示す)が好適に用いられ
る。N−オキシル化合物であれば特に限定されずに用い
ることができるが、良好な重合防止効果を与え得る2,
2,6,6−テトラメチルピペリジノオキシル、4−ヒ
ドロキシ−2,2,6,6−テトラメチルピペリジノオ
キシル、4,4’,4”−トリス−(2,2,6,6−
テトラメチルピペリジノオキシル)フォスファイトのう
ち1種または2種以上を用いることが好ましい。特に、
N−オキシル化合物として2,2,6,6−テトラメチ
ルピペリジノオキシル、または4−ヒドロキシ−2,
2,6,6−テトラメチルピペリジノオキシルを用いた
場合には、成分中に金属を含まなくても安定剤系となる
ため、安定剤による設備の金属腐食の恐れがなくなり、
廃液の処理も容易になる。(Where R 1 is CHOH, CHC
H 2 OH, CHCH 2 CH 2 OH, CHOCH 2 OH, CH
OCH 2 CH 2 OH, CHCOOH, or C = O, and R 2 represents H or CH 2 OH) is preferably used. Any N-oxyl compound can be used without particular limitation, but it can provide a good polymerization preventing effect.
2,6,6-tetramethylpiperidinooxyl, 4-hydroxy-2,2,6,6-tetramethylpiperidinooxyl, 4,4 ′, 4 ″ -tris- (2,2,6,6 −
It is preferable to use one or more of tetramethylpiperidinooxyl) phosphites. In particular,
As the N-oxyl compound, 2,2,6,6-tetramethylpiperidinooxyl or 4-hydroxy-2,
In the case of using 2,6,6-tetramethylpiperidinooxyl, since there is no danger of metal corrosion of equipment due to the stabilizer, since it becomes a stabilizer system even if no metal is contained in the component,
Waste liquid treatment is also facilitated.
【0032】本発明で使用されるN−ヒドロキシ−2,
2,6,6−テトラメチルピペリジン化合物の代表例と
しては、1,4−ジヒドロキシ−2,2,6,6−テト
ラメチルピペリジン、1−ヒドロキシ−2,2,6,6
−テトラメチルピペリジンなどを挙げることができる。
これらN−ヒドロキシ−2,2,6,6−テトラメチル
ピペリジン化合物は単独でも、あるいは2種以上混合し
ても用いることができる。The N-hydroxy-2,2 used in the present invention
Representative examples of 2,6,6-tetramethylpiperidine compounds include 1,4-dihydroxy-2,2,6,6-tetramethylpiperidine, 1-hydroxy-2,2,6,6
-Tetramethylpiperidine and the like.
These N-hydroxy-2,2,6,6-tetramethylpiperidine compounds can be used alone or in combination of two or more.
【0033】本発明で使用される2,2,6,6−テト
ラメチルピペリジン化合物の具体例としては、2,2,
6,6−テトラメチルピペリジン、4−ヒドロキシ−
2,2,6,6−テトラメチルピペリジン等が挙げら
れ、これらの1種以上を用いることができる。なお、N
−ヒドロキシ−2,2,6,6−テトラメチルピペリジ
ン化合物や2,2,6,6−テトラメチルピペリジン化
合物は、市販されるN−オキシル化合物製品中に不純物
として含有される場合があるが、このような場合には市
販のN−オキシル化合物の使用によって、併せてN−ヒ
ドロキシ−2,2,6,6−テトラメチルピペリジン化
合物や2,2,6,6−テトラメチルピペリジン化合物
を併用したことになる。Specific examples of the 2,2,6,6-tetramethylpiperidine compound used in the present invention include 2,2,6,6-tetramethylpiperidine.
6,6-tetramethylpiperidine, 4-hydroxy-
2,2,6,6-tetramethylpiperidine and the like, and one or more of these can be used. Note that N
-Hydroxy-2,2,6,6-tetramethylpiperidine compound and 2,2,6,6-tetramethylpiperidine compound may be contained as impurities in commercially available N-oxyl compound products, In such a case, N-hydroxy-2,2,6,6-tetramethylpiperidine compound and 2,2,6,6-tetramethylpiperidine compound were used together with the use of a commercially available N-oxyl compound. Will be.
【0034】本発明では、特にニトロソ化合物と共にN
−オキシル化合物、更に加えてN−ヒドロキシ−2,
2,6,6−テトラメチルピペリジン化合物や2,2,
6,6−テトラメチルピペリジン化合物を併用すること
が好ましい。これらの化合物は、特に液相において(メ
タ)アクリル酸やこれらのエステルの重合抑制効果に優
れるため、全体として精製塔内の気液両相の重合を相乗
的に抑制することができるからである。In the present invention, in particular, together with the nitroso compound, N
-Oxyl compounds, and additionally N-hydroxy-2,
2,6,6-tetramethylpiperidine compounds and 2,2,2
It is preferable to use a 6,6-tetramethylpiperidine compound in combination. This is because these compounds are particularly excellent in the effect of suppressing polymerization of (meth) acrylic acid and their esters in the liquid phase, so that the polymerization of both gas and liquid phases in the purification tower can be synergistically suppressed as a whole. .
【0035】このようなニトロソ化合物にN−オキシル
化合物を併用する場合において、特にN−オキシル化合
物を精製塔の原料供給段より上部から導入することが好
ましい。本発明において「供給段より上部」には、精製
塔に付属させたコンデンサーや留出液が油水相に分離す
る際に使用される貯槽等から供給する場合も含まれ、特
に好ましくは塔頂部、コンデンサー内、貯槽またはコン
デンサーや貯槽の還流液中から供給することである。こ
れらの重合防止剤を精製塔に供給した際に、最も効果的
に重合防止作用を発揮させるには、(1)重合防止剤が
液相中で十分な溶解性を示す必要があり、(2)しかも
塔内位置によって組成が異なる精製塔の中で、該組成を
維持しつつ重合防止剤を供給するには塔内組成に最も類
似した液組成で添加すること、(3)および重合防止を
目的とする液相に最も効果的に混合できる重合防止剤位
置であることなどが求められる。When an N-oxyl compound is used in combination with such a nitroso compound, it is particularly preferable to introduce the N-oxyl compound from above the raw material supply stage of the purification tower. In the present invention, `` upper than the supply stage '' includes the case where a condenser or a distillate attached to the purification column is supplied from a storage tank or the like used when separating into an oil-water phase, and particularly preferably a column top, It is supplied from the inside of the condenser, the storage tank or the reflux liquid of the condenser or the storage tank. When these polymerization inhibitors are supplied to the purification tower, the polymerization inhibitor must exhibit sufficient solubility in the liquid phase in order to exhibit the polymerization prevention effect most effectively. In addition, in a refining tower having a different composition depending on the position in the tower, in order to supply the polymerization inhibitor while maintaining the composition, it is necessary to add a liquid composition most similar to the composition in the tower. It is required that the position of the polymerization inhibitor can be mixed most effectively with the target liquid phase.
【0036】N−オキシル化合物は粉末であるため、こ
れを精製塔内に供給するには溶剤に溶解した後に投入す
ることが好ましく、例えば、精製塔内に供給する溶媒の
一部を用いて該化合物を含有する溶液を調製することが
好ましい。このような重合防止剤含有溶液の投入位置と
しては、該溶液中の溶媒濃度と精製塔内の該溶媒濃度と
が類似する範囲を選択すれば、塔内組成を変化させずに
済む点で好ましい。精製塔内における蒸留条件、放散条
件等によってこの条件は一義的に適宜できるものでない
が、N−オキシル化合物の場合には、原料供給段より上
部であれば重合防止効果に優れる。Since the N-oxyl compound is a powder, it is preferable to supply the N-oxyl compound into the purification tower after dissolving it in a solvent. For example, the N-oxyl compound may be used by using a part of the solvent supplied into the purification tower. It is preferred to prepare a solution containing the compound. It is preferable to select a range in which the concentration of the solvent in the solution and the concentration of the solvent in the purification tower are similar to each other as a charging position of the solution containing the polymerization inhibitor, since the composition in the tower does not need to be changed. . Although these conditions cannot be uniquely determined depending on the distillation conditions, the stripping conditions, and the like in the purification column, in the case of the N-oxyl compound, the polymerization prevention effect is excellent if it is located above the raw material supply stage.
【0037】なお、N−オキシル化合物は溶媒に溶解さ
せて供給するほか、固化した状態で、または気化した状
態で精製塔に供給してもよい。The N-oxyl compound may be supplied after being dissolved in a solvent, or may be supplied to the purification column in a solidified state or a vaporized state.
【0038】例えば、溶解した状態で作用させる方法と
しては、適当な溶剤に重合禁止剤を溶かして液状にした
ものを、精製塔の塔頂部から供給するほか、精製塔に付
属するコンデンサーや貯槽に供給してもよい。コンデン
サーのタイプ等によっては、重合禁止剤を含む溶液をコ
ンデンサー内部に仕込んでおいて、これにガス状の留出
物を吹き込むあるいは液化した留出物を流し込むように
して溶解させるようにしてもよい。このようにすれば、
コンデンサー内の重合も有効に防止することができる。For example, as a method of acting in a dissolved state, a solution prepared by dissolving a polymerization inhibitor in a suitable solvent is supplied from the top of the purification tower and supplied to a condenser or a storage tank attached to the purification tower. May be supplied. Depending on the type of the condenser or the like, a solution containing a polymerization inhibitor may be charged inside the condenser and dissolved by blowing a gaseous distillate or pouring a liquefied distillate into the solution. . If you do this,
Polymerization in the condenser can also be effectively prevented.
【0039】また、固化した状態で作用させる方法とし
ては、粉末状の重合禁止剤を、精製塔の塔頂部やコンデ
ンサー内部から散布して降らせる。As a method of acting in a solidified state, a powdery polymerization inhibitor is sprayed and dropped from the top of the purification tower or the inside of the condenser.
【0040】更に、気化した状態で作用させる方法とし
ては、重合禁止剤を気化または昇華したものを、精製塔
とコンデンサーとを連通する配管経路内に供給して混合
させてもよい。Further, as a method of causing the polymerization inhibitor to act in a vaporized state, a substance obtained by vaporizing or sublimating a polymerization inhibitor may be supplied to and mixed in a piping path communicating the purification tower and the condenser.
【0041】なお、上記重合禁止剤を溶解することので
きる溶剤としては、上記のように生成等内に供給される
溶媒や付属したコンデンサーからの還流液であることが
好ましく、例えば、精製塔に供給する溶媒として、ベン
ゼン、トルエン、キシレン、シクロヘキサン、アセト
ン、メチルエチルケトン、メチルイソブチルケトン、n
−ヘキサン、ヘプタン等、これらの混合物が挙げられ
る。これらの溶媒は精製塔内の条件で異なるため、実際
に使用する溶媒に基づいて最も好ましい重合防止剤溶解
溶媒を選択する。なお、精製塔で使用する溶媒を用いれ
ば、易重合性物質と重合防止剤との混合に優れ、かつ塔
内組成を維持できる点でも好ましい。なお、異なる溶媒
を使用するとこれらを別途回収する必要があり、また、
反応系への還流によって分離する場合には反応系の制御
管理が複雑化するため、不利となる。The solvent capable of dissolving the above-mentioned polymerization inhibitor is preferably a solvent supplied in the production or the like or a reflux liquid from an attached condenser as described above. As the solvent to be supplied, benzene, toluene, xylene, cyclohexane, acetone, methyl ethyl ketone, methyl isobutyl ketone, n
-Hexane, heptane and the like, and mixtures thereof. Since these solvents vary depending on the conditions in the purification column, the most preferable solvent for dissolving the polymerization inhibitor is selected based on the solvent actually used. The use of the solvent used in the purification tower is also preferable in that the mixture of the easily polymerizable substance and the polymerization inhibitor is excellent and the composition in the tower can be maintained. If different solvents are used, it is necessary to collect them separately.
In the case of separation by reflux to the reaction system, control and management of the reaction system become complicated, which is disadvantageous.
【0042】本発明で更に併用可能なフェノール化合物
としては、ハイドロキノン、メトキノン(p−メトキシ
フェノール)を挙げることができる。メトキノンは、特
にN−オキシル化合物およびフェノチアジン化合物と組
合せて使用した際の重合防止効果がハイドロキノンより
優れているため好ましい。また、これらのフェノール化
合物は2種を併用してもよい。Examples of the phenol compound which can be further used in the present invention include hydroquinone and methoquinone (p-methoxyphenol). Methoquinone is preferred because it has a superior polymerization inhibitory effect to hydroquinone, particularly when used in combination with an N-oxyl compound and a phenothiazine compound. These phenol compounds may be used in combination of two kinds.
【0043】フェノチアジン化合物としては、フェノチ
アジン、ビス−(α−メチルベンジル)フェノチアジ
ン、3,7−ジオクチルフェノチアジン、ビス−(α−
ジメチルベンジル)フェノチアジン等を挙げることがで
き、これらの中でも特にフェノチアジンが好適に使用さ
れる。これらのフェノチアジン化合物は2種以上を併用
してもよい。Examples of the phenothiazine compound include phenothiazine, bis- (α-methylbenzyl) phenothiazine, 3,7-dioctylphenothiazine, and bis- (α-
(Dimethylbenzyl) phenothiazine and the like, and among them, phenothiazine is particularly preferably used. Two or more of these phenothiazine compounds may be used in combination.
【0044】一方、金属化合物塩は腐食作用があるこ
と、および使用後に環境中に放出する際に分離するなど
して、環境の保全を確保する必要があるが、本発明にお
いて併用してもよい。On the other hand, it is necessary to ensure the preservation of the environment by the metal compound salt having a corrosive action and being separated when released into the environment after use, but may be used together in the present invention. .
【0045】例えば、銅塩としては特に制限されず、無
機塩、有機塩のいずれであってもよく、様々なものを用
いることができる。例えばジアルキルジチオカルバミン
酸銅、酢酸銅、ナフテン酸銅、アクリル酸銅、硫酸銅、
硝酸銅、塩化銅などが挙げられる。これらの銅塩は一
価、二価のいずれのものも用いることができる。上記銅
塩の中では、効果などの点からジアルキルジチオカルバ
ミン酸銅が好ましい。For example, the copper salt is not particularly limited, and may be any of an inorganic salt and an organic salt, and various ones can be used. For example, copper dialkyldithiocarbamate, copper acetate, copper naphthenate, copper acrylate, copper sulfate,
Examples thereof include copper nitrate and copper chloride. These copper salts may be monovalent or divalent. Among the above copper salts, copper dialkyldithiocarbamate is preferred from the viewpoint of effects and the like.
【0046】ジアルキルジチオカルバミン酸銅として
は、例えば、ジメチルジチオカルバミン酸銅、ジエチル
ジチオカルバミン酸銅、ジプロピルジチオカルバミン酸
銅、ジブチルジチオカルバミン酸銅、ジペンチルジチオ
カルバミン酸銅、ジヘキシルジチオカルバミン酸銅、ジ
フェニルジチオカルバミン酸銅、メチルエチルジチオカ
ルバミン酸銅、メチルプロピルジチオカルバミン酸銅、
メチルブチルジチオカルバミン酸銅、メチルペンチルジ
チオカルバミン酸銅、メチルヘキシルジチオカルバミン
酸銅、メチルフェニルジチオカルバミン酸銅、エチルプ
ロピルジチオカルバミン酸銅、エチルブチルジチオカル
バミン酸銅、エチルペンチルジチオカルバミン酸銅、エ
チルヘキシルジチオカルバミン酸銅、エチルフェニルジ
チオカルバミン酸銅、プロピルブチルジチオカルバミン
酸銅、プロピルペンチルジチオカルバミン酸銅、プロピ
ルヘキシルジチオカルバミン酸銅、プロピルフェニルジ
チオカルバミン酸銅、ブチルペンチルジチオカルバミン
酸銅、ブチルヘキシルジチオカルバミン酸銅、ブチルフ
ェニルジチオカルバミン酸銅、ペンチルヘキシルジチオ
カルバミン酸銅、ペンチルフェニルジチオカルバミン酸
銅、ヘキシルフェニルジチオカルバミン酸銅などが挙げ
られる。これらのジアルキルジチオカルバミン酸銅は、
一価の銅塩であってもよく、二価の銅塩であってもよ
い。これらの中で、効果及び入手しやすいなどの点から
ジメチルジチオカルバミン酸銅、ジエチルジチオカルバ
ミン酸銅及びジブチルジチオカルバミン酸銅が好まし
く、特にジブチルジチオカルバミン酸銅が好適である。The copper dialkyldithiocarbamate includes, for example, copper dimethyldithiocarbamate, copper diethyldithiocarbamate, copper dipropyldithiocarbamate, copper dibutyldithiocarbamate, copper dipentyldithiocarbamate, copper dihexyldithiocarbamate, copper diphenyldithiocarbamate, copper methylethyl, Copper dithiocarbamate, copper methylpropyldithiocarbamate,
Copper methylbutyldithiocarbamate, copper methylpentyldithiocarbamate, copper methylhexyldithiocarbamate, copper methylphenyldithiocarbamate, copper ethylpropyldithiocarbamate, copper ethylbutyldithiocarbamate, copper ethylpentyldithiocarbamate, copper ethylhexyldithiocarbamate, ethylphenyldithiocarbamine Copper acid, copper propylbutyldithiocarbamate, copper propylpentyldithiocarbamate, copper propylhexyldithiocarbamate, copper propylphenyldithiocarbamate, copper butylpentyldithiocarbamate, copper butylhexyldithiocarbamate, copper butylphenyldithiocarbamate, copper pentylhexyldithiocarbamate , Copper pentylphenyldithiocarbamate, hexylfe Such as Le copper dithiocarbamate and the like. These copper dialkyldithiocarbamates are:
It may be a monovalent copper salt or a divalent copper salt. Among these, copper dimethyldithiocarbamate, copper diethyldithiocarbamate and copper dibutyldithiocarbamate are preferred from the viewpoints of effect and availability, and copper dibutyldithiocarbamate is particularly preferred.
【0047】マンガン塩化合物としては、ジアルキルジ
チオカルバミン酸マンガン(アルキル基はメチル、エチ
ル、プロピル、ブチルのいずれかで、同一であっても異
なっていても良い)、ジフェニルジチオカルバミン酸マ
ンガン、蟻酸マンガン、酢酸マンガン、オクタン酸マン
ガン、ナフテン酸マンガン、過マンガン酸マンガン、エ
チレンジアミン四酢酸のマンガン塩等が挙げられ、これ
らの1種以上を用いることができる。なお、マンガン塩
化合物は単独では重合防止効果が比較的低いが、本発明
においてN−オキシル化合物またはN−オキシル化合物
とさらに他の重合防止剤と併用することによって、著し
い重合防止効果を発現することが明らかとなった。ま
た、銅塩は腐食作用があるが、マンガン塩を添加すると
該腐食作用を抑制することができる点でも好ましい。Examples of the manganese salt compound include manganese dialkyldithiocarbamate (the alkyl group is any of methyl, ethyl, propyl and butyl, which may be the same or different), manganese diphenyldithiocarbamate, manganese formate, acetate Manganese, manganese octoate, manganese naphthenate, manganese permanganate, manganese salts of ethylenediaminetetraacetic acid and the like can be mentioned, and one or more of these can be used. Although the manganese salt compound alone has a relatively low polymerization inhibitory effect, the manganese salt compound exhibits a remarkable polymerization inhibitory effect by using the N-oxyl compound or the N-oxyl compound together with another polymerization inhibitor in the present invention. Became clear. Further, copper salts have a corrosive action, and the addition of a manganese salt is also preferable in that the corrosive action can be suppressed.
【0048】なお、本発明では、フェノール化合物、銅
塩、マンガン塩を精製塔に供給するには、N−オキシル
化合物と同様に、精製塔の原料供給段より上部から導入
することが好ましい。該化合物の溶媒中への溶解性の観
点から、N−オキシル化合物を添加する場合と同様に、
易重合性化合物との混合が容易で精製塔内の組成を変化
させずに精製操作を継続することができるからである。
これらは、併用する重合防止剤を全て同一の供給場所か
ら投入してもよいし、それぞれ異なる供給場所から投入
してもよい。更に、供給時期についても特に制限される
ものではない。従って、例えば、N−オキシル化合物を
塔頂から供給する一方、マンガン塩を精製塔の中段から
供給することもできる。有機溶媒に難溶なマンガン塩を
使用する場合に、精製塔の塔頂側の有機溶媒濃度が高い
場合には、塔中段付近から供給することで塔内組成を変
化させることが少ないからである。従って、マンガン塩
が有機溶媒に易溶であり水に難溶である場合には、精製
塔の塔頂部から供給すれば、効率的な重合防止効果を得
ることができる。いずれにしても、添加する重合防止剤
の溶媒への溶解性、精製塔内環境特に塔内組成等を勘案
して最も最適な供給場所選択する。In the present invention, in order to supply the phenol compound, the copper salt and the manganese salt to the purification tower, it is preferable to introduce the phenol compound, the copper salt and the manganese salt from above the raw material supply stage of the purification tower, similarly to the N-oxyl compound. From the viewpoint of solubility of the compound in a solvent, as in the case of adding an N-oxyl compound,
This is because the mixing with the easily polymerizable compound is easy and the purification operation can be continued without changing the composition in the purification tower.
These may all be charged from the same supply location for the polymerization inhibitor used in combination, or may be charged from different supply locations. Further, the supply time is not particularly limited. Therefore, for example, the N-oxyl compound can be supplied from the top of the column, while the manganese salt can be supplied from the middle stage of the purification column. This is because, when a manganese salt that is hardly soluble in an organic solvent is used, if the concentration of the organic solvent on the top side of the purification tower is high, the composition in the tower is rarely changed by supplying from the middle of the tower. . Therefore, when the manganese salt is easily soluble in an organic solvent and hardly soluble in water, an efficient polymerization preventing effect can be obtained by supplying the manganese salt from the top of the purification tower. In any case, the most suitable supply place is selected in consideration of the solubility of the polymerization inhibitor to be added to the solvent, the environment in the purification column, particularly the composition in the column, and the like.
【0049】なお、本発明で使用する重合防止剤がそれ
自体で液体である場合には、塔内組成と相互溶解性が十
分でない場合においても、塔内構造物を経由して移動す
るのに粘度や反応性などの点で障害がなければ、塔頂か
らの供給が可能である。When the polymerization inhibitor used in the present invention is a liquid by itself, even if the composition and the mutual solubility in the column are not sufficient, the polymerization inhibitor can move through the structure in the column. If there is no obstacle in terms of viscosity, reactivity, etc., supply from the top of the column is possible.
【0050】本発明の重合防止方法は、ビニル化合物の
中でも特に重合しやすい(メタ)アクリル酸およびその
エステルに好適に用いることができる。アクリル酸エス
テルとしては、アクリル酸メチル、アクリル酸エチル、
アクリル酸ブチル、アクリル酸2−エチルヘキシル、ア
クリル酸2−ヒドロキシエチル、アクリル酸2−ヒドロ
キシプロピル等が適用対象として挙げられ、メタクリル
酸エステルとしては、メタクリル酸メチル、メタクリル
酸ブチル、メタクリル酸2−ヒドロキシエチル、メタク
リル酸2−ヒドロキシプロピル等が適用対象として挙げ
られる。The polymerization preventing method of the present invention can be suitably used for (meth) acrylic acid and its ester which are particularly easily polymerized among vinyl compounds. As acrylic acid esters, methyl acrylate, ethyl acrylate,
Examples of the application include butyl acrylate, 2-ethylhexyl acrylate, 2-hydroxyethyl acrylate, 2-hydroxypropyl acrylate, and the like. Examples of methacrylates include methyl methacrylate, butyl methacrylate, and 2-hydroxy methacrylate. Ethyl, 2-hydroxypropyl methacrylate and the like can be mentioned as applicable objects.
【0051】重合防止方法としては、例えば、接触気相
酸化反応で(メタ)アクリル酸を製造する場合に関して
説明すれば、(メタ)アクリル酸の精留塔、(メタ)ア
クリル酸と溶剤の分離塔、(メタ)アクリル酸と酢酸等
の軽沸分との分離塔等の諸蒸留工程、アクロレインやメ
タクロレイン等の軽沸分のストリッパー等の蒸留操作を
含む諸工程において、上記重合防止剤を(メタ)アクリ
ル酸と共存させれば良い。As a method for preventing polymerization, for example, the case of producing (meth) acrylic acid by a catalytic gas phase oxidation reaction will be described. A rectification column for (meth) acrylic acid, separation of (meth) acrylic acid and a solvent The above polymerization inhibitor is used in various distillation steps such as a column, a separation tower of (meth) acrylic acid and light boiling components such as acetic acid and the like, and various processes including a distillation operation such as strippers of light boiling components such as acrolein and methacrolein. What is necessary is just to make it coexist with (meth) acrylic acid.
【0052】ニトロソ化合物以外の重合防止剤の量は操
作条件に応じて適宜調整され、特に限定はされないが、
用いられる重合防止剤の総量を(メタ)アクリル酸およ
びそのエステルの蒸発蒸気量に対して3〜1500pp
m(重量基準)とするのが好ましい。個々の重合防止剤
の好ましい使用量は、N−オキシル化合物はモノマーの
蒸発蒸気量に対し1〜500ppm、マンガン塩化合
物、あるいは銅塩化合物はモノマーの蒸発蒸気量に対し
1〜200ppm、2,2,6,6−テトラメチルピペ
リジン化合物、あるいはニトロソ化合物の場合は1〜5
00ppmである。The amount of the polymerization inhibitor other than the nitroso compound is appropriately adjusted according to the operating conditions, and is not particularly limited.
The total amount of the polymerization inhibitor to be used is 3 to 1500 pp with respect to the evaporation vapor amount of (meth) acrylic acid and its ester.
m (weight basis). The preferred amount of each polymerization inhibitor used is 1 to 500 ppm of the N-oxyl compound with respect to the amount of evaporated vapor of the monomer, and 1 to 200 ppm of the manganese salt compound or the copper salt compound with respect to the amount of evaporated vapor of the monomer. , 6,6-tetramethylpiperidine compound or 1-5 in the case of nitroso compound
00 ppm.
【0053】ここでいう蒸発蒸気量とは、蒸留塔のリボ
イラーに加えられた熱量に応じて、リボイラーで発生す
るモノマーの蒸気の総量を意味する。モノマー蒸気の総
量は計算で容易に算出することができる。重合防止剤の
投入基準を決定する上で重要な因子となる数字である。The term “evaporated vapor amount” as used herein means the total amount of monomer vapor generated in the reboiler according to the amount of heat applied to the reboiler of the distillation column. The total amount of monomer vapor can be easily calculated. It is a number that is an important factor in determining the criteria for adding the polymerization inhibitor.
【0054】なお、本発明では、重合防止剤として分子
状酸素を精製塔内に供給してもよく、この分子状酸素の
供給方法としてはエアーバブリング等により、(メタ)
アクリル酸およびそのエステルに直接混入させてもよい
し、あるいは、他の溶媒に溶け込んだ状態で(メタ)ア
クリル酸およびそのエステルに間接的に混入させてもよ
い。なお、精製塔やストリッパーの塔底および/または
リボイラーからガス状で送り込めばエアーバブリングが
簡単に製造工程に組み込める。分子状酸素は、(メタ)
アクリル酸またはそのエステルの蒸発蒸気量に対して
0.1〜1.0容量%程度投入することが望ましい。In the present invention, molecular oxygen may be supplied into the purification tower as a polymerization inhibitor, and the supply of molecular oxygen may be performed by air bubbling or the like.
It may be directly mixed with acrylic acid and its ester, or may be indirectly mixed with (meth) acrylic acid and its ester while being dissolved in another solvent. The air bubbling can be easily incorporated into the manufacturing process if the gas is sent from the bottom of the purification tower or the stripper and / or from the reboiler. Molecular oxygen is (meta)
It is desirable to add about 0.1 to 1.0% by volume based on the amount of evaporated vapor of acrylic acid or its ester.
【0055】本発明の第二は、上記記載の(メタ)アク
リル酸およびそのエステルの重合防止方法を製造工程に
含むことを特徴とする、(メタ)アクリル酸またはその
エステルの製造方法である。The second aspect of the present invention is a method for producing (meth) acrylic acid or an ester thereof, which comprises the above-mentioned method for preventing polymerization of (meth) acrylic acid or an ester thereof.
【0056】(メタ)アクリル酸およびそのエステルは
連続して製造され、一般には接触気相酸化反応器に続
く、捕集塔、脱水塔、軽沸物分離塔、高沸物分離塔、酢
酸分離塔、エステル反応器、脱水塔などと称される各種
の精製工程を経て製造される。(Meth) acrylic acid and its ester are produced continuously, and are generally followed by a catalytic gas-phase oxidation reactor, a collecting tower, a dehydrating tower, a light-boiling substance separating tower, a high-boiling substance separating tower and an acetic acid separating tower. It is manufactured through various purification steps called towers, ester reactors, dehydration towers and the like.
【0057】これらの工程で使用される精製塔の条件
は、その前後に連続する精製塔の条件によってもことな
り、一義的に定義することはできない。しかしながら、
本発明では特に(メタ)アクリル酸を水系溶媒で捕集し
た(メタ)アクリル酸含有溶液から水を除去する共沸脱
水塔、またはこれに加えてアルデヒドや酢酸などの低沸
点物質を分離する低沸分離塔において本発明の重合防止
方法を行うことが好ましい。これらは、一般に最も(メ
タ)アクリル酸等の重合が発生しやすいため、該化合物
製造工程で律速となる工程であり、特に本発明が有効で
ある。The conditions of the purification tower used in these steps differ depending on the conditions of the purification towers before and after the purification tower, and cannot be uniquely defined. However,
In the present invention, in particular, an azeotropic dehydration tower for removing water from a (meth) acrylic acid-containing solution in which (meth) acrylic acid has been collected by an aqueous solvent, or a low-pressure column for separating low-boiling substances such as aldehydes and acetic acid in addition thereto. It is preferable to carry out the polymerization prevention method of the present invention in a boiling separation column. Since these are generally the most likely to cause polymerization of (meth) acrylic acid and the like, these are the rate-limiting steps in the compound production step, and the present invention is particularly effective.
【0058】本発明の重合防止方法を少なくとも一部に
含む(メタ)アクリル酸の製造方法では、精製塔におけ
る重合物の発生を防止して長期連続運転を可能とできる
ばかりでなく、製品の収率を向上させることができる。
この点で、本発明の(メタ)アクリル酸およびそのエス
テルの製造方法においては、製造工程で使用される各精
製塔においてそれぞれ上記本発明の重合防止方法が適用
されることが好ましい。In the method for producing (meth) acrylic acid at least partially including the method for preventing polymerization of the present invention, it is possible to prevent long-term continuous operation by preventing the generation of a polymer in the purification tower, and also to reduce the yield of the product. Rate can be improved.
In this regard, in the method for producing (meth) acrylic acid and esters thereof of the present invention, it is preferable that the above-described polymerization prevention method of the present invention be applied to each purification column used in the production step.
【0059】[0059]
【実施例】以下、本発明の実施例により具体的に説明す
る。The present invention will be described more specifically below with reference to examples.
【0060】(実施例1)プロピレンと分子状酸素含有
ガスとを接触気相反応器10に供給して接触気相酸化し
て得たアクリル酸含有ガスを、アクリル酸捕集塔20に
導入し、水と接触させてアクリル酸を水溶液中に捕集し
た。このアクリル酸含有溶液には不純物としてアクロレ
インが含まれていた。該アクリル酸含有溶液をアクロレ
イン放散塔30に導入し、アクロレインを放散させ、水
30質量%、酢酸3.0質量%を含むアクリル酸水溶液
を得た。Example 1 Acrylic acid-containing gas obtained by supplying propylene and a molecular oxygen-containing gas to a catalytic gas-phase reactor 10 and subjecting it to catalytic gas-phase oxidation was introduced into an acrylic acid collecting tower 20. Acrylic acid was collected in an aqueous solution by contact with water. This acrylic acid-containing solution contained acrolein as an impurity. The acrylic acid-containing solution was introduced into the acrolein stripping tower 30 to evaporate acrolein to obtain an acrylic acid aqueous solution containing 30% by mass of water and 3.0% by mass of acetic acid.
【0061】このアクリル酸水溶液を段数50段、段間
隔147mmのステンレス製シーブトレーを備え、塔頂
部に留出管および還流液供給管、中央部段に原料供給管
および重合防止剤投入管、塔底部に塔底液抜き出し管お
よび重合防止剤投入管を備えた内径105mmの共沸分
離塔40に導入し、共沸溶剤としてトルエンを用いてア
クリル酸溶液の蒸留を行った。The acrylic acid aqueous solution was provided with a stainless steel sieve tray having 50 stages and a step interval of 147 mm, a distilling tube and a reflux liquid supply tube at the top of the column, a raw material supply tube and a polymerization inhibitor introducing tube at the center, and a bottom of the column. Was introduced into an azeotropic separation tower 40 having an inner diameter of 105 mm and provided with a bottom liquid discharge pipe and a polymerization inhibitor inlet pipe, and an acrylic acid solution was distilled using toluene as an azeotropic solvent.
【0062】使用した重合防止剤の量は、アクリル酸蒸
発蒸気量に対して、4−ヒドロキシ−2,2,6,6−
テトラメチルピペリジノオキシル100ppm、1,4
−ジヒドロキシ−2,2,6,6−テトラメチルピペリ
ジン20ppm、4−ヒドロキシ−2,2,6,6−テ
トラメチルピペリジン20ppm、N−ニトロソフェニ
ルヒドロキシルアミンのアンモニウム塩10ppmであ
った。N−ニトロソフェニルヒドロキシルアミンのアン
モニウム塩は、水に溶解させた後に共沸脱水塔40の塔
底から供給した。その他の重合防止剤は、いずれも還流
液に溶解させた後に塔頂から供給した。また、アクリル
酸蒸発蒸気量に対して0.3容量%の分子状酸素を塔底
部に供給した。なお、ここにいうアクリル酸蒸発蒸気量
とは、共沸脱水塔40のリボイラー42から加えられた
熱量に相当して塔底から蒸発するモノマーの蒸気の総量
を意味する。The amount of the polymerization inhibitor used was 4-hydroxy-2,2,6,6-
Tetramethylpiperidinooxyl 100 ppm, 1,4
-Dihydroxy-2,2,6,6-tetramethylpiperidine, 20 ppm of 4-hydroxy-2,2,6,6-tetramethylpiperidine, and 10 ppm of ammonium salt of N-nitrosophenylhydroxylamine. The ammonium salt of N-nitrosophenylhydroxylamine was supplied from the bottom of the azeotropic dehydration tower 40 after being dissolved in water. All other polymerization inhibitors were supplied from the top of the tower after being dissolved in the reflux liquid. Further, 0.3% by volume of molecular oxygen with respect to the amount of vaporized acrylic acid was supplied to the bottom of the column. Here, the amount of vaporized acrylic acid vapor refers to the total amount of monomer vapor vaporized from the bottom of the azeotropic dehydration tower 40 corresponding to the amount of heat added from the reboiler 42.
【0063】定常運転時における運転状態は、共沸分離
塔40の塔頂温度50℃、塔底温度105℃、塔頂圧力
170hPa、還流比(単位時間当たりの還流液の全モ
ル数/単位時間当たりの留出液の全モル数)1.20、
アクリル酸水溶液供給量9.0リットル/時であった。
塔底より抜き出される液は、アクリル酸97質量%、水
0.02質量%、その他2.98質量%を含んでいた。The operating conditions during steady-state operation are as follows: the top temperature of the azeotropic separation column 40 is 50 ° C., the bottom temperature is 105 ° C., the top pressure is 170 hPa, and the reflux ratio (total moles of reflux liquid per unit time / unit time) Total number of moles of distillate per 1.20)
The supply amount of the acrylic acid aqueous solution was 9.0 liter / hour.
The liquid withdrawn from the bottom of the column contained 97% by mass of acrylic acid, 0.02% by mass of water, and 2.98% by mass of others.
【0064】上記の条件で共沸分離塔40を30日間連
続運転したところ、常に安定した状態が得られ、運転停
止後、蒸留塔内の点検を行った結果においても、塔内に
少量の重合物が認められたのみであり、更に運転の継続
が可能であった。When the azeotropic separation column 40 was operated continuously for 30 days under the above conditions, a stable state was always obtained. After the operation was stopped, the distillation column was inspected. Only the thing was recognized, and further continuation of the operation was possible.
【0065】(実施例2)実施例1において、N−ニト
ロソフェニルヒドロキシルアミンのアンモニウム塩の水
溶液の投入位置を塔底から,塔底側を基点として総理論
段数の25%の位置に変更した以外は、実施例1と同様
にしてアクリル酸水溶液の共沸蒸留運転を行った。Example 2 Example 2 was repeated except that the injection position of the aqueous solution of the ammonium salt of N-nitrosophenylhydroxylamine was changed from the bottom of the column to 25% of the total theoretical plate number from the bottom of the column as a base point. In the same manner as in Example 1, an azeotropic distillation operation of the acrylic acid aqueous solution was performed.
【0066】この条件で共沸分離塔40を30日間連続
運転したところ、実施例1と同様の分離状態が得られ、
運転停止後、蒸留塔内の点検を行った結果においても重
合物の発生は殆ど認められなかった。When the azeotropic separation tower 40 was continuously operated under these conditions for 30 days, the same separation state as in Example 1 was obtained.
After the operation was stopped, the inside of the distillation column was inspected, and almost no generation of a polymer was observed.
【0067】(実施例3)実施例1において、N−ニト
ロソフェニルヒドロキシルアミンのアンモニウム塩の水
溶液の投入位置を塔底から,塔底側を基点として総理論
段数の60%の位置に変更した以外は、実施例1と同様
にしてアクリル酸水溶液の共沸蒸留運転を行った。Example 3 Example 1 was repeated except that the charging position of the aqueous solution of the ammonium salt of N-nitrosophenylhydroxylamine was changed from the bottom of the column to 60% of the total theoretical plate number from the bottom of the column as a base point. In the same manner as in Example 1, an azeotropic distillation operation of the acrylic acid aqueous solution was performed.
【0068】この条件で共沸分離塔40を30日間連続
運転したところ、実施例1と同様の分離状態が得られ、
運転停止後、蒸留塔内の点検を行った結果においても重
合物の発生は全く認められなかった。When the azeotropic separation column 40 was continuously operated under these conditions for 30 days, the same separation state as in Example 1 was obtained.
After the operation was stopped, the inside of the distillation column was inspected. As a result, no polymer was generated.
【0069】(実施例4)実施例1において、4−ヒド
ロキシ−2,2,6,6−テトラメチルピペリジノオキ
シル、1,4−ジヒドロキシ−2,2,6,6−テトラ
メチルピペリジンおよび4−ヒドロキシ−2,2,6,
6−テトラメチルピペリジンを使用しない代わりに、ジ
ブチルジチオカルバミン酸銅30ppm、酢酸マンガン
30ppm、ハイドロキノン100ppm、フェノチア
ジン100ppmを使用し、ジブチルジチオカルバミン
酸銅およびフェノチアジンは還流液で溶解させて塔頂か
ら、酢酸マンガンおよびハイドロキノンは水に溶解させ
て20段から塔内に供給した以外は、実施例1と同様に
してアクリル酸水溶液の共沸蒸留運転を行った。(Example 4) In Example 1, 4-hydroxy-2,2,6,6-tetramethylpiperidinooxyl, 1,4-dihydroxy-2,2,6,6-tetramethylpiperidine and 4-hydroxy-2,2,6,
Instead of using 6-tetramethylpiperidine, instead of using 30 ppm of copper dibutyldithiocarbamate, 30 ppm of manganese acetate, 100 ppm of hydroquinone, and 100 ppm of phenothiazine, copper dibutyldithiocarbamate and phenothiazine are dissolved in a reflux solution, and manganese acetate and An azeotropic distillation operation of an aqueous acrylic acid solution was performed in the same manner as in Example 1, except that hydroquinone was dissolved in water and supplied into the tower from the 20th stage.
【0070】この条件で共沸分離塔40を30日間連続
運転したところ、実施例1と同様の分離状態が得られ、
運転停止後、蒸留塔内の点検を行った結果においても重
合物の発生は全く認められなかった。When the azeotropic separation column 40 was continuously operated under these conditions for 30 days, the same separation state as in Example 1 was obtained.
After the operation was stopped, the inside of the distillation column was inspected. As a result, no polymer was generated.
【0071】(実施例5)実施例4において、N−ニト
ロソフェニルヒドロキシルアミンのアンモニウム塩の水
溶液の投入位置を塔底から,塔底側を基点として総理論
段数の60%の位置に変更した以外は、実施例4と同様
にしてアクリル酸水溶液の共沸蒸留運転を行った。Example 5 Example 4 was repeated except that the injection position of the aqueous solution of the ammonium salt of N-nitrosophenylhydroxylamine was changed from the bottom of the column to 60% of the total theoretical plate number from the bottom of the column as a base point. In the same manner as in Example 4, an azeotropic distillation operation of the acrylic acid aqueous solution was performed.
【0072】この条件で共沸分離塔40を30日間連続
運転したところ、実施例4と同様の分離状態が得られ、
運転停止後、蒸留塔内の点検を行った結果においても塔
内に少量の重合物が認められたのみであり、更に運転の
継続が可能であった。When the azeotropic separation column 40 was continuously operated under these conditions for 30 days, the same separation state as in Example 4 was obtained.
After the operation was stopped, inspection of the inside of the distillation column revealed that only a small amount of polymer was found in the column, and the operation could be continued.
【0073】(実施例6)実施例4において、N−ニト
ロソフェニルヒドロキシルアミンのアンモニウム塩の水
溶液の投入位置を塔底から,塔底側を基点として総理論
段数の25%の位置に変更した以外は、実施例4と同様
にしてアクリル酸水溶液の共沸蒸留運転を行った。Example 6 Example 6 was repeated except that the injection position of the aqueous solution of the ammonium salt of N-nitrosophenylhydroxylamine was changed from the bottom of the column to 25% of the total number of theoretical plates from the bottom of the column as a base point. In the same manner as in Example 4, an azeotropic distillation operation of the acrylic acid aqueous solution was performed.
【0074】この条件で共沸分離塔40を30日間連続
運転したところ、実施例4と同様の分離状態が得られ、
運転停止後、蒸留塔内の点検を行った結果においても重
合物の発生は殆ど認められなかった。When the azeotropic separation column 40 was continuously operated under these conditions for 30 days, the same separation state as in Example 4 was obtained.
After the operation was stopped, the inside of the distillation column was inspected, and almost no generation of a polymer was observed.
【0075】(比較例1)実施例1において、N−ニト
ロソフェニルヒドロキシルアミンのアンモニウム塩の水
溶液の投入位置を塔底から塔頂に変更した以外は実施例
1と同様にしてアクリル酸水溶液の共沸蒸留運転を行っ
た。Comparative Example 1 Acrylic acid aqueous solution was prepared in the same manner as in Example 1 except that the position of the aqueous solution of the ammonium salt of N-nitrosophenylhydroxylamine was changed from the bottom to the top. A boiling distillation operation was performed.
【0076】この条件で共沸分離塔40の連続運転を行
ったところ、稼動当初は実施例1と同様の分離状態が得
られていたが、稼動開始後5日目より塔内の圧損失が認
められ6日目には運転を継続することが困難になった。
運転を停止し、蒸留塔の解体点検を行ったところ、塔内
に多量の重合物の発生を認めた。When the azeotropic separation column 40 was continuously operated under these conditions, a separation state similar to that of Example 1 was obtained at the beginning of the operation, but the pressure loss in the column started 5 days after the start of the operation. On the sixth day, it became difficult to continue driving.
When the operation was stopped and the distillation column was dismantled and inspected, generation of a large amount of polymer in the column was recognized.
【0077】(比較例2)実施例4において、N−ニト
ロソフェニルヒドロキシルアミンのアンモニウム塩の水
溶液の投入位置を塔底から、塔頂に変更した以外は実施
例4と同様にしてアクリル酸水溶液の共沸蒸留運転を行
った。Comparative Example 2 An acrylic acid aqueous solution was prepared in the same manner as in Example 4 except that the position of the aqueous solution of the ammonium salt of N-nitrosophenylhydroxylamine was changed from the bottom to the top. An azeotropic distillation operation was performed.
【0078】この条件で共沸分離塔40を30日間連続
運転したところ、稼動当初は実施例4と同様の分離状態
が得られていたが、稼動開始後7日目より塔内の圧損失
が認められ8日目には運転を継続することが困難になっ
た。運転を停止し、蒸留塔の解体点検を行ったところ、
塔内に多量の重合物の発生を認めた。When the azeotropic separation column 40 was continuously operated under these conditions for 30 days, the same state of separation as in Example 4 was obtained at the beginning of operation, but the pressure loss in the column started 7 days after the start of operation. On the eighth day, it became difficult to continue driving. When the operation was stopped and the distillation column was dismantled and inspected,
Generation of a large amount of polymer was observed in the tower.
【0079】[0079]
【発明の効果】本発明によれば、ニトロソ化合物を総理
論段数の70%の位置以下から供給すると、該化合物が
蒸留塔内で分解し、その結果得られたガス成分が精製塔
内の気相に存在する易重合性物質の重合を有効に防止す
ることができる。また、更にN−オキシル化合物などを
併用すると、特に液相中に存在する易重合性物質の重合
を抑制できる。易重合性物質としては、精製塔内で気液
量相を構成する(メタ)アクリル酸およびそのエステル
である。According to the present invention, when the nitroso compound is supplied from a position of 70% or less of the total number of theoretical plates, the compound is decomposed in the distillation column, and the resulting gas component is removed from the gas in the purification column. Polymerization of the easily polymerizable substance present in the phase can be effectively prevented. Further, when an N-oxyl compound or the like is further used in combination, it is possible to particularly suppress polymerization of the easily polymerizable substance existing in the liquid phase. As the easily polymerizable substance, (meth) acrylic acid and its ester constituting the gas-liquid phase in the purification tower are used.
【0080】本発明の重合防止方法を実施して(メタ)
アクリル酸およびそのエステルを製造すれば、その製造
工程において重合物の発生を抑制して連続運転を可能と
すると共に、製品の収率が向上する。By carrying out the polymerization preventing method of the present invention,
When acrylic acid and its ester are produced, continuous operation is enabled by suppressing the generation of a polymer in the production process, and the product yield is improved.
【図1】 図1は、アクリル酸の製造工程を示す概略フ
ロー図である。FIG. 1 is a schematic flow chart showing a process for producing acrylic acid.
1…プロピレン、 10…反応器、 20…アクリル酸捕集塔、 21…アクリル酸捕集液、 30…アクロレイン分離塔、 40…共沸脱水塔、 41…貯槽、 42…リボイラー、 50…高沸分離塔、 51…アクリル酸。 DESCRIPTION OF SYMBOLS 1 ... propylene, 10 ... reactor, 20 ... acrylic acid collection tower, 21 ... acrylic acid collection liquid, 30 ... acrolein separation tower, 40 ... azeotropic dehydration tower, 41 ... storage tank, 42 ... reboiler, 50 ... high boiling Separation tower, 51 ... acrylic acid.
───────────────────────────────────────────────────── フロントページの続き (72)発明者 大河内 和夫 兵庫県姫路市網干区興浜字西沖992番地の 1 株式会社日本触媒内 (72)発明者 上村 政宏 兵庫県姫路市網干区興浜字西沖992番地の 1 株式会社日本触媒内 (72)発明者 中原 整 兵庫県姫路市網干区興浜字西沖992番地の 1 株式会社日本触媒内 Fターム(参考) 4H006 AA02 AD11 AD41 BD21 BD70 ──────────────────────────────────────────────────続 き Continuing on the front page (72) Inventor Kazuo Okochi 992, Nishioki, Okihama-shi, Abashi-ku, Himeji-shi, Hyogo Japan Nippon Shokubai Co., Ltd. Within Nippon Shokubai (72) Inventor: Osamu Nakahara 992, Nishioki, Okihama-shi, Aboshi-ku, Himeji-shi, Hyogo F-term (reference) in Nippon Shokubai Co., Ltd.
Claims (8)
ル酸およびそのエステルを精製塔で精製する際に、該ニ
トロソ化合物を精製塔の塔底側を基点として総理論段数
の70%の位置以下から供給することを特徴とする、
(メタ)アクリル酸およびそのエステルの重合防止方
法。1. When purifying (meth) acrylic acid and its ester in a purification column using a nitroso compound, the nitroso compound is converted from a position below 70% of the total theoretical plate number with respect to the bottom of the purification column as a base point. Characterized by supplying
A method for preventing polymerization of (meth) acrylic acid and its ester.
のである、請求項1記載の(メタ)アクリル酸およびそ
のエステルの重合防止方法。2. The method for preventing polymerization of (meth) acrylic acid and its ester according to claim 1, wherein said nitroso compound is dissolved in a solvent.
ニルヒドロキシルアミンまたはその塩である、請求項1
または2記載の(メタ)アクリル酸およびそのエステル
の重合防止方法。3. The method according to claim 1, wherein the nitroso compound is N-nitrosophenylhydroxylamine or a salt thereof.
Or the method for preventing polymerization of (meth) acrylic acid and its ester according to 2.
ミンの塩が、N−ニトロソフェニルヒドロキシルアミン
のアンモニウム塩である、請求項3記載の(メタ)アク
リル酸およびそのエステルの重合防止方法。4. The method for preventing polymerization of (meth) acrylic acid and its ester according to claim 3, wherein the salt of N-nitrosophenylhydroxylamine is an ammonium salt of N-nitrosophenylhydroxylamine.
入することを特徴とする、請求項1〜4のいずれかに記
載の(メタ)アクリル酸およびそのエステルの重合防止
方法。5. The method for preventing polymerization of (meth) acrylic acid and esters thereof according to claim 1, further comprising introducing an N-oxyl compound into a purification tower.
−2,2,6,6−テトラメチルピペリジン化合物と、
2,2,6,6−テトラメチルピペリジン化合物とを共
存させることを特徴とする、請求項5記載の(メタ)ア
クリル酸およびそのエステルの重合防止方法。6. An N-oxyl compound comprising: an N-hydroxy-2,2,6,6-tetramethylpiperidine compound;
The method for preventing polymerization of (meth) acrylic acid and its ester according to claim 5, wherein a 2,2,6,6-tetramethylpiperidine compound coexists.
段より上部から導入することを特徴とする、請求項5ま
たは6記載の(メタ)アクリル酸およびそのエステルの
重合防止方法。7. The method for preventing polymerization of (meth) acrylic acid and its ester according to claim 5, wherein the N-oxyl compound is introduced from above the raw material supply stage of the purification tower.
タ)アクリル酸およびそのエステルの重合防止方法を製
造工程に含むことを特徴とする、(メタ)アクリル酸ま
たはそのエステルの製造方法。8. A method for producing (meth) acrylic acid or an ester thereof, which comprises the method for preventing polymerization of (meth) acrylic acid or an ester thereof according to claim 1. .
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MYPI20012597A MY123604A (en) | 2000-06-06 | 2001-05-31 | Method for preventing polymerization of (meth) acrylic acid and esters thereof and method for the production thereof |
US09/875,541 US6599397B2 (en) | 2000-06-06 | 2001-06-06 | Method for preventing polymerization of (meth)acrylic acid and esters thereof and method for the production thereof |
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JP2020500942A (en) * | 2016-12-13 | 2020-01-16 | ビーエーエスエフ ソシエタス・ヨーロピアBasf Se | Method for obtaining pure cyclohexyl (meth) acrylate by distillation |
CN112028770A (en) * | 2019-06-03 | 2020-12-04 | 中国石油天然气股份有限公司 | Environment-friendly polymerization inhibitor, preparation method thereof and application thereof in acrylic ester rectification process |
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WO2003051811A1 (en) * | 2001-12-19 | 2003-06-26 | Mitsubishi Chemical Corporation | Process for producing (meth)acrylic acid |
JP2003342268A (en) * | 2002-05-28 | 2003-12-03 | Nippon Kasei Chem Co Ltd | Method for producing epoxy-terminated (meth) acrylate |
US7319167B2 (en) | 2003-05-09 | 2008-01-15 | Nippon Shokubai Co., Ltd. | Method for distilling (meth)acrylic acid and/or the ester thereof |
EP2505577A1 (en) | 2003-06-05 | 2012-10-03 | Nippon Shokubai Co., Ltd. | Method for production of (meth)acrylic acid |
US7342130B2 (en) | 2005-12-06 | 2008-03-11 | Nippon Shokubai Co., Ltd. | Method for producing acrylic acid |
US7368602B2 (en) | 2006-01-20 | 2008-05-06 | Nippon Shokubai Co., Ltd. | Process for producing (meth) acrylic acid |
US7714164B2 (en) | 2006-09-20 | 2010-05-11 | Nippon Shokubai Co., Ltd. | Method for producing (meth) acrylic acid |
JP2008222610A (en) * | 2007-03-09 | 2008-09-25 | Nippon Shokubai Co Ltd | Method for preventing polymerization of easily polymerizable compound |
WO2008146613A1 (en) * | 2007-05-29 | 2008-12-04 | Nippon Shokubai Co., Ltd. | Process for production of (meth)acrylic acid |
US8278481B2 (en) | 2007-05-29 | 2012-10-02 | Nippon Shokubai Co., Ltd. | Method for producing (meth)acrylic acid |
JP5378207B2 (en) * | 2007-05-29 | 2013-12-25 | 株式会社日本触媒 | Method for producing (meth) acrylic acid |
WO2009133813A1 (en) | 2008-04-27 | 2009-11-05 | 株式会社日本触媒 | Process for producing acrylic acid, and process for producing hydrophilic resin and process for producing water absorptive resin using the process |
JP2020500942A (en) * | 2016-12-13 | 2020-01-16 | ビーエーエスエフ ソシエタス・ヨーロピアBasf Se | Method for obtaining pure cyclohexyl (meth) acrylate by distillation |
JP7009496B2 (en) | 2016-12-13 | 2022-01-25 | ビーエーエスエフ ソシエタス・ヨーロピア | Acquisition method by distillation of pure cyclohexyl (meth) acrylate |
CN112028770A (en) * | 2019-06-03 | 2020-12-04 | 中国石油天然气股份有限公司 | Environment-friendly polymerization inhibitor, preparation method thereof and application thereof in acrylic ester rectification process |
CN112028770B (en) * | 2019-06-03 | 2023-04-07 | 中国石油天然气股份有限公司 | Environment-friendly polymerization inhibitor, preparation method thereof and application thereof in acrylic ester rectification process |
CN114409528A (en) * | 2021-12-07 | 2022-04-29 | 中海油天津化工研究设计院有限公司 | Multifunctional efficient polymerization inhibitor for refining acrylic acid |
CN114409528B (en) * | 2021-12-07 | 2023-08-04 | 中海油天津化工研究设计院有限公司 | Multifunctional efficient polymerization inhibitor for acrylic acid refining |
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