JP2001330837A - Hermetic structure, method of manufacturing the same, liquid crystal display device using the same, and method of manufacturing the same - Google Patents

Abstract

(57) [Problem] To prevent a seal material from flowing and widening a seal width when an empty cell is produced by printing and compressing a seal material in a seal bonding step. SOLUTION: A sealing material 7 is applied to a peripheral portion of at least one of the pair of substrates 1 and 10 on which an electrode and an alignment film are formed, and the pair of substrates 1 and 10 is interposed via the sealing material 7. Are adhered to each other at a predetermined interval, and a liquid crystal 11 is filled between the pair of substrates 1 and 10, wherein at least one of the pair of substrates 1 and 10 has It is characterized in that it has an inner uneven pattern 6a along the inside of the pattern of the sealing material 7 and an outer uneven pattern 6b along the outside of the pattern of the sealing material.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an airtight structure, a liquid crystal display using the same, and a method for manufacturing the same. More specifically, the present invention relates to a sealing method in a bonding step of bonding a pair of substrates to each other via a sealing material.

[0002]

2. Description of the Related Art In recent years, the market for liquid crystal display devices has been greatly expanded with the spread of information devices such as personal computers and word processors. Above all, there has been a remarkable increase in the size of a liquid crystal display device using a thin film transistor (TFT) made of an amorphous silicon film as an active layer.

As described above, as the size of the liquid crystal display device is increased, the size of the glass substrate used is increased, and other performances are also improved. Little improvement has been made in the sealing method.

A conventional sealing method will be specifically described with reference to FIGS. 16 to 18 using an active matrix type liquid crystal display device as an example. FIG. 16 is a schematic plan view of a conventional liquid crystal display device, FIG. 17 is a schematic plan view of an array substrate similarly constituting the conventional liquid crystal display device, and FIG. 18 is a sectional view taken along line DD of FIG. The active matrix type liquid crystal display device 13 has a configuration in which the liquid crystal material 11 is sealed between the array substrate 1 and the color filter substrate 10 via the alignment films 8.8. A plurality of source lines 3 and a plurality of gate lines 2 are arranged in a matrix on the array substrate 1. Pixel electrodes are arranged via thin film transistors (TFTs) 15 arranged at each intersection. 14 ...
Are connected to the source lines 3 and the gate lines 2.

[0005] Such a liquid crystal display device is manufactured as follows.

(1) The array substrate 1 and the color filter substrate 10 are manufactured by a predetermined process.

(2) Spray spherical spacers on the array substrate 1 or the color filter substrate 10.

(3) A sealing material 7 is applied to the periphery of the array substrate 1 or the color filter substrate 10 in a frame shape, and both substrates are bonded to each other.

(4) The sealing material 7 is cured while the two substrates 1 and 10 bonded to each other are pressed, and a liquid crystal cell for sealing the liquid crystal material 11 is assembled.

(5) A liquid crystal material 11 is injected between the substrates 1 and 10 from the liquid crystal injection port 5, and then the liquid crystal injection port 5 is sealed with a sealing member 12.

In the step (3), a method of screen-printing an epoxy-based adhesive on the periphery of the array substrate 1 or the color filter substrate 10 using a screen printing plate, or a dispenser is used. A method of drawing and applying has been performed.

[0012]

However, even when screen-printing an epoxy-based adhesive (sealant) using a screen printing plate, or when drawing and applying using a dispenser, the seal to be applied is used. The amount of material varies at different locations on the substrate. Then, in such a state, when the array substrate 1 and the color filter substrate 10 are pressure-bonded via the seal material 7 in the bonding step, the seal width becomes large at a position where the amount of the seal material applied is large. Was.

[0013] The sealing material at the position where the amount of application is large may flow to the display section, in which case the display performance of the liquid crystal display device is reduced. Therefore, it is necessary to apply the sealing material to a position where the sealing material does not spread to the position of the display unit, and it is not possible to reduce the size of the array substrate (that is, the size of the liquid crystal display device).

Further, when a driving circuit for driving the TFT is mounted on the peripheral portion of the array substrate, the sealing material spreads to a position where the driving circuit is mounted. It becomes difficult to mount on the substrate 1. Therefore, it is necessary to use an array substrate having a size larger than necessary in consideration of the width of the seal member 7, and it is not possible to reduce the size of the array substrate (that is, to reduce the size of the liquid crystal display device). .

Further, since the gate lines 2 and the source lines 3 are arranged on the array substrate 1, the seal width of the sealing material becomes particularly large near the gate lines 2 and the source lines 3. FIG. 19 is a schematic perspective view of a conventional array substrate near a seal material application position, and FIG. 20 is a schematic diagram showing a state in which a seal material is applied to the application position in FIG. 19 and the array substrate and the color filter substrate are pressure-bonded. FIG. 21 is a perspective view, and FIG.
FIG. 5 is a schematic sectional view taken along line EE of FIG. In FIG. 20, the color filter substrate 10 is omitted for convenience of explanation.

As shown in FIGS. 19 to 21, on the array substrate 1, gate lines 2 and source lines (not shown) intersect with the sealing material 7 and are drawn out of the array substrate 1. Therefore, when the array substrate 1 and the color filter substrate 10 are pressure-bonded in the bonding step, the sealing material 7 flows and spreads in the direction in which the gate lines 2 are drawn out (X direction), and the width of the sealing material 7 increases. It will be.

In view of the above drawbacks, the present invention provides a compact hermetic structure, a liquid crystal display device using the same, and a method of manufacturing the same by reducing the sealing width of the sealing material. The purpose is to:

[0018]

According to a first aspect of the present invention, there is provided an airtight structure, wherein a pair of substrates and a peripheral portion of the pair of substrates are separated from each other at a predetermined interval. A sealing material to be adhered, and an inner uneven pattern formed on at least one of the pair of substrates and extending along the inside of the seal material pattern and an outer uneven pattern extending along the outside of the seal material pattern. It is characterized by having.

As described above, since the inner uneven pattern and the outer uneven pattern are formed along the inner and outer sides of the seal material pattern, the seal material is formed by the inner uneven pattern and the outer uneven pattern. This prevents the seal width from increasing. Conventionally, the amount of the sealing material applied on the substrate varies depending on the application position, and when a pair of substrates is adhered in that state, the seal width differs depending on the application position. However, as in the present invention, by forming the inner uneven pattern and the outer uneven pattern, the sealing material at the position where the amount of application is large spreads to the position where the amount of application is small along the inner and outer uneven patterns. ,
Therefore, it is possible to reduce the variation of the sealing material and average the sealing width.

The invention described in claim 2 is the same as the invention described in claim 1.
The airtight structure according to claim 1, wherein an intermediate uneven pattern is formed between the inner uneven pattern and the outer uneven pattern on at least one of the pair of substrates. .

With the above configuration, the intermediate concavo-convex pattern and the sealing material have a function as a spacer for supporting a pair of substrates (more specifically, the sealing material includes a spacer. And the spacer and the intermediate concavo-convex pattern have a function as a spacer for supporting a pair of substrates). Therefore, an airtight structure in which the gap between the pair of substrates is controlled to be constant by the intermediate uneven pattern and the sealing material can be obtained. Further, the intermediate uneven pattern also has an action of preventing the seal material from being widened.

According to a third aspect of the present invention, there is provided an airtight structure, comprising: a pair of substrates; and a sealing material for bonding peripheral portions of the pair of substrates to each other at predetermined intervals. At least one of the substrates is formed with a concave portion at a peripheral portion thereof, into which the sealing material enters.

With this configuration, when the pair of substrates are bonded to each other, the sealing material is prevented from being widened by the recess, so that the sealing width can be reduced.

The invention described in claim 4 is the same as the invention described in claim 2.
The airtight structure according to the above, the inner uneven pattern,
The outer concavo-convex pattern and the intermediate concavo-convex pattern are formed by a coating.

The uniformity can be improved by forming the uneven pattern by a coating film. If the uniformity is high, the gap of the hermetic structure can be further controlled to be uniform. Further, since the concavo-convex pattern composed of the coating can be made thin, it can be applied to the case where the gap between the pair of substrates is made thin.

According to a fifth aspect of the present invention, there is provided the hermetic structure according to the second or fourth aspect, wherein the inner concave-convex pattern, the outer concave-convex pattern, and the intermediate concave-convex pattern have flat ends. There is a feature.

As described above, if the top end of the concavo-convex pattern is flat, the flat portion of the concavo-convex pattern and the substrate surface are parallel to each other, so that the spacer in the sealing material described above can easily be placed on the concavo-convex pattern. . Therefore, the gap can be easily controlled, and the gap of the hermetic structure can be further controlled to make the gap uniform.

The invention described in claim 6 is the same as the claim 2.
In the airtight structure according to the above, a plurality of the intermediate uneven pattern is formed, the volume of the region surrounded between the two intermediate uneven pattern and the pair of substrates among the intermediate uneven pattern is A, the volume Is the minimum amount for bonding the pair of substrates, the inner concave-convex pattern and the outer concave-convex pattern, and the volume of a region surrounded by the pair of substrates is B, and the volume of the sealing material is W, A
It satisfies the relationship of ≦ W ≦ B.

With such a restriction, since the volume W of the sealing material is equal to or larger than A, the pair of substrates can be securely bonded to each other, and the sealing material (for example, gas or gas) is sealed in the airtight structure. Liquid) does not leak out of the hermetic structure. Further, since the volume W of the sealing material is equal to or less than B, when the pair of substrates are pressed, the sealing material does not spread beyond the concave-convex pattern, and provides an airtight structure with a sealing width within a certain range. can do.

According to a seventh aspect of the present invention, a pair of substrates, a sealant for bonding peripheral portions of the pair of substrates to each other at a predetermined interval, and a sealant formed on at least one of the pair of substrates. A method for manufacturing a hermetic structure, comprising: an inner uneven pattern along the inside of the pattern of the sealing material; and an outer uneven pattern along the outside of the pattern of the sealing material, wherein at least one of the pair of substrates is provided. An uneven pattern forming step of forming an inner uneven pattern and an outer uneven pattern on the periphery of the substrate inside and outside the seal material application position, and linearly applying the seal material to the seal material application position Sealing material application process,
Bonding the pair of substrates at a predetermined interval and curing the sealant.

According to the above method, it is possible to prevent the seal width from being increased by the inner and outer uneven patterns formed inside and outside the seal material pattern in the bonding step. The seal width does not increase beyond the interval between them (predetermined interval). Further, since the sealing material at the position where the amount of application is large spreads to the position where the amount of application is small along the inner and outer uneven patterns, it is possible to provide an airtight structure having an averaged seal width.

The invention described in claim 8 is the same as the invention described in claim 7.
The method for manufacturing a hermetic structure according to claim 1, wherein the step of forming a concavo-convex pattern includes the step of forming a concavo-convex pattern on at least one of the pair of substrates, between the inner concavo-convex pattern and the outer concavo-convex pattern. Is formed.

According to the above method, it is possible to provide a function as a spacer for supporting a pair of substrates by the intermediate uneven pattern and the sealing material. The gap can be controlled to be constant. Further, since the intermediate uneven pattern has an action of preventing the seal width from being widened, an airtight structure having a small seal width can be obtained.

According to a ninth aspect of the present invention, there is provided a pair of substrates, and a sealing material for bonding peripheral portions of the pair of substrates to each other at predetermined intervals, and at least one of the pair of substrates. A method for manufacturing an airtight structure in which a concave portion into which the sealing material enters is formed at a peripheral portion of the substrate, wherein a peripheral portion of at least one of the pair of substrates is provided.
Forming a concave portion at a position where the seal material is applied, forming a seal material linearly in the concave portion with the seal material, and bonding the pair of substrates at a predetermined interval; And a bonding step of curing the adhesive.

According to the above method, in the bonding step, it is possible to prevent the seal member from being widened by the concave portion, so that the sealing material can be removed. It is possible to obtain an airtight structure in which the variation in the seal width depending on the application position is reduced.

According to a tenth aspect of the present invention, in the method for manufacturing an airtight structure according to the seventh or eighth aspect, the step of forming the concavo-convex pattern includes forming a film on the entire surface of the substrate. And a step of processing the film by a photolithography method.

When the concavo-convex pattern is formed by photolithography as in the above method, a plurality of concavo-convex patterns can be formed at the same time, and the manufacturing process can be simplified.

The invention according to claim 11 is the method for manufacturing an airtight structure according to claim 10, wherein the film is formed by a CVD method, a plasma CVD method, a vacuum deposition method, a sputtering method, or a sol-gel method. It is characterized by being formed by a method.

As described above, the CVD method and the plasma C
By forming a film by a VD method, a vacuum evaporation method, a sputtering method, or a sol-gel method, the uniformity of the film thickness of the film can be improved, and the gap between a pair of substrates can be controlled by the highly uniform film. Can be performed more easily.

According to a twelfth aspect of the present invention, in the method for manufacturing an airtight structure according to the tenth or eleventh aspect, the coating is a silica film or a silicon nitride film. I do.

When the film is a silica film or a silicon nitride film as in the above method, the silica film or the silicon nitride film has high hardness (high strength).
It is possible to easily adjust the gap between the pair of substrates,
The gap uniformity can be improved. In addition, when the silica film or the silicon nitride film is used, a normal semiconductor manufacturing process can be used, so that a concavo-convex pattern and a convex pattern can be conveniently formed without increasing the number of manufacturing processes.

According to a thirteenth aspect of the present invention, there is provided a liquid crystal display device, wherein a sealing material is applied to a peripheral portion of at least one of a pair of substrates on which an electrode and an alignment film are formed. A liquid crystal display device configured by bonding the pair of substrates to each other at a predetermined interval via a material, and filling a liquid crystal between the pair of substrates, wherein at least one of the pair of substrates has It is characterized in that it has an inner concave-convex pattern along the inside of the seal material pattern and an outer concave-convex pattern along the outside of the seal material pattern.

In the liquid crystal display device, when the pair of substrates are bonded to each other, the seal material is prevented from having a wider seal width by the inner concave and convex pattern and the outer concave and convex pattern. Can be made small and uniform. Accordingly, a liquid crystal display device that has been made compact can be obtained.

According to a fourteenth aspect of the present invention, there is provided the liquid crystal display device according to the thirteenth aspect, wherein the inner uneven pattern and the outer uneven pattern are formed on at least one of the pair of substrates. It is characterized in that an intermediate concavo-convex pattern is formed between them.

According to a fifteenth aspect of the present invention, a sealing material is applied to a peripheral portion of at least one of a pair of substrates on which an electrode and an alignment film are formed, and the pair of substrates is interposed via the sealing material. A liquid crystal display device in which substrates are adhered to each other at a predetermined interval, and a liquid crystal is filled between the pair of substrates, and a concave portion in which the sealing material enters a peripheral portion of at least one of the pair of substrates. Is formed.

With this configuration, when the pair of substrates are bonded to each other, the sealing material is prevented from being widened by the recess, so that the sealing width can be reduced.

According to a sixteenth aspect of the present invention, in the liquid crystal display device according to the fourteenth aspect, the inner uneven pattern, the outer uneven pattern, and the intermediate uneven pattern are formed by a coating. And

The invention according to claim 17 is the liquid crystal display device according to claim 14 or 16,
The inner concave-convex pattern, the outer concave-convex pattern, and the intermediate concave-convex pattern have flat ends.

The invention according to claim 18 is the liquid crystal display device according to claim 14, wherein a plurality of the intermediate concavo-convex patterns are formed, and two of the intermediate concavo-convex patterns are provided. The volume of the region surrounded by the pair of substrates is A, and the volume is a minimum amount for bonding the pair of substrates, and is surrounded by the inner concave-convex pattern and the outer concave-convex pattern, and the pair of substrates. When the volume of the region is B and the volume of the sealing material is W, the relationship of A ≦ W ≦ B is satisfied.

According to a nineteenth aspect of the present invention, in the liquid crystal display device according to the thirteenth aspect, the inner uneven pattern and the outer uneven pattern are formed on one of a pair of substrates. It is characterized in that it is formed so as to surround the part.

When the inner and outer concave and convex patterns are formed so as to surround the display portion as in the above configuration, the seal material flows and spreads by the concave and convex patterns and does not spread to the display portion. Therefore, the display performance of the liquid crystal display device does not deteriorate. In addition, with such a configuration, the sealant does not spread to the display unit, so that the sealant can be applied to a position near the display unit as compared with the related art, and the substrate can be effectively used. Can be used (compact board size).

According to a twentieth aspect of the present invention, in the liquid crystal display device according to the thirteenth aspect, the inner concave-convex pattern and the outer concave-convex pattern are drawn out of the display portion in the outward direction of the substrate. Characterized by being formed so as to intersect with the existing wiring.

As described above, since the inner and outer concave / convex patterns are formed on the substrate so as to intersect with the wirings extending outward from the display section, the concave / convex patterns are used. The sealing material can be prevented from flowing and spreading along the wiring. Therefore, it is possible to provide a liquid crystal display device in which the sealing width of the sealing material is reduced, and it is possible to effectively use the peripheral portion of the substrate (for example, to mount a driving circuit on the peripheral portion of the substrate). The device can be made compact.

According to a twenty-first aspect of the present invention, a sealing material is applied to a peripheral portion of at least one of a pair of substrates on which an electrode and an alignment film are formed, and the pair of substrates is interposed via the sealing material. The substrates are adhered to each other at a predetermined interval, and a liquid crystal is filled between the pair of substrates, and at least one of the pair of substrates is provided with an inner concave / convex pattern along the inner side of the seal material pattern and the inner concave / convex pattern. A method for manufacturing a liquid crystal display device having an outer concavo-convex pattern along an outer side of a pattern of a sealing material, comprising: an electrode forming step of forming electrodes on the pair of substrates; and an alignment film forming an alignment film on the pair of substrates. A forming step, an inner concave / convex pattern and an outer concave / convex pattern on a peripheral portion of at least one of the pair of substrates, inside and outside of the application position of the sealant, leaving a liquid crystal injection port. A step of forming a concavo-convex pattern for forming a seal, a step of applying a sealing material in a line at the application position of the sealing material, leaving a liquid crystal injection port, and bonding the pair of substrates at a predetermined interval; And a bonding step of curing the sealing material.

As in the above-described method, a liquid crystal display device can be manufactured by applying a sealing material while leaving the liquid crystal injection port and injecting liquid crystal from the liquid crystal injection port.
The liquid crystal display device thus manufactured can have a predetermined seal width by forming inner and outer concave and convex patterns in the same manner as the hermetic structure, and can reduce variations due to application positions. , The seal width can be averaged.

According to a twenty-second aspect of the present invention, in the liquid crystal display device according to the twenty-first aspect, the step of forming the concave-convex pattern includes forming the concave-convex pattern on at least one of the pair of substrates. The method is characterized by a step of further forming an intermediate uneven pattern between the pattern and the outer uneven pattern.

According to a twenty-third aspect of the present invention, a sealing material is applied to a peripheral portion of at least one of a pair of substrates on which electrodes and an alignment film are formed, and the pair of substrates is interposed via the sealing material. A liquid crystal in which substrates are adhered to each other at a predetermined interval, and a liquid crystal is filled between the pair of substrates, and a concave portion into which the sealing material enters is formed in a peripheral portion of at least one of the pair of substrates. A method for manufacturing a display device, comprising: an electrode forming step of forming an electrode on the pair of substrates; an alignment film forming step of forming an alignment film on the pair of substrates; and an at least one substrate of the pair of substrates. A concave portion forming step of forming a concave portion in a peripheral portion at a position where the seal material is applied; a seal material applying step of linearly applying the seal material in the concave portion; and bonding the pair of substrates at a predetermined interval , Characterized in that it comprises a bonding step of curing the sealing material, the.

According to the above method, in the bonding step, it is possible to prevent the seal width of the seal material from being widened by the concave portion formed at the position where the seal material is applied. A liquid crystal display device in which the variation due to the application position is reduced.

According to a twenty-fourth aspect of the present invention, in the method for manufacturing a liquid crystal display device according to the twenty-first or twenty-second aspect, the step of forming a concavo-convex pattern includes forming a film on the entire surface of the substrate. And a step of processing the film by a photolithography method.

The invention according to claim 25 is the method for manufacturing a liquid crystal display device according to claim 24, wherein the film is formed by a CVD method, a plasma CVD method, a vacuum evaporation method, a sputtering method, or a sol-gel method. It is characterized by being formed by a method.

The invention according to claim 26 is the liquid crystal display device according to claim 24 or claim 25, wherein:
The coating is a silica film or a silicon nitride film.

According to a twenty-seventh aspect of the present invention, in the method for manufacturing a liquid crystal display device according to the twenty-first or twenty-second aspect, after the step of forming the uneven pattern, an alignment film is provided inside the pair of substrates. A step of forming an alignment film for forming

According to the above method, when the uneven pattern is formed before the alignment film forming step, the alignment film is not contaminated by the photolithography method.
Therefore, the alignment film which is not contaminated by the photolithography method is clean and has excellent alignment function, and thus, a liquid crystal display device having excellent display performance can be obtained.

[0064]

Embodiments of the present invention will be described below with reference to the drawings. However, parts that are not necessary for description are omitted, and some parts are illustrated exaggerated or reduced for ease of description.

(Embodiment 1) In Embodiment 1, an airtight structure that can be used for various purposes will be described with reference to FIGS. FIG. 1 is a schematic diagram of an airtight structure according to Embodiment 1 of the present invention. FIG. 1A is a schematic perspective view, and FIG. 1B is a cross-sectional view taken along line AA of FIG. , FIG. 2
Is a plan view of a substrate on which an inner concave-convex pattern and an outer concave-convex pattern are formed, and FIG. 3 is a schematic cross-sectional view illustrating a method for manufacturing an airtight structure according to Embodiment 1 of the present invention.

Airtight structure 3 according to Embodiment 1 of the present invention
Reference numeral 0 denotes a configuration in which the substrates 31 and 32 are bonded to each other at a predetermined interval via a seal material 33 applied in a frame shape to the peripheral edge of the substrate 31. Further, an inner concave / convex pattern 34 a and an outer concave / convex pattern 34 b are formed along the peripheral portion of the substrate 31 and inside and outside the pattern of the seal material 33 along the pattern of the seal material 33.

As described above, the inner concave-convex pattern 34a and the outer concave-convex pattern 34b are formed on the peripheral portion of the substrate 31 and along the inside and outside of the pattern of the sealing material 33, whereby the inner concave-convex pattern is formed. The pattern 34a and the outer concavo-convex pattern 34b prevent the seal material 33 from spreading, and the seal width of the seal material 33 can be reduced (with a predetermined interval). Further, the sealing material at the position where the amount of application is large is
It spreads to the position where the application amount is small along 4a and the outer concave-convex pattern 34b, so that the dispersion of the seal material 33 can be reduced and the seal width can be averaged.

Next, a method of manufacturing the hermetic structure 30 will be described.

(1) First, a substrate 31 made of glass or the like as shown in FIG. 3A is prepared, and then, as shown in FIG. An inner concavo-convex pattern 34a and an outer concavo-convex pattern 34b were formed inside and outside the application position of the material 33 (a concavo-convex pattern forming step).

(2) Next, as shown in FIG. 3C, at the peripheral portion of the substrate 31,
The seal material 33 was linearly applied between the outer surface 4a and the outer concavo-convex pattern 34b (the seal material application position) (seal material application step).

(3) Next, as shown in FIG. 3D, the substrate 31 and a substrate 32 made of glass or the like are adhered at a predetermined interval and pressed, and the sealing material 33 is cured to form an airtight structure. The body 30 was produced (adhesion step).

The airtight structure 30 constructed as described above
Has various uses, for example, it can be used as a window glass of a house, or can be used as a container for storing a gas such as a gas or a liquid. Furthermore,
The distance between the substrates 31 and 32 can be narrowed by adjusting the amount of the sealing material, and can be used for storing photographs, paintings, and the like. Further, as in Embodiment 2 described later, the airtight structure 30 can be used for a liquid crystal display device.

The inner concave / convex pattern 34a and the outer concave / convex pattern 34b are formed on the periphery of the substrate 31, but as shown in FIG.
a, an inner concavo-convex pattern 34d and an outer concavo-convex pattern 34c are formed on the coating 31a, and a sealing material is applied between the inner concavo-convex pattern 34d and the outer concavo-convex pattern 34c. FIG. 4 is a schematic partial sectional view showing Modification Example 1 of the hermetic structure according to Embodiment 1 of the present invention. With such a configuration, the sealing material 33 is applied between the inner uneven pattern 34d and the outer uneven pattern 34c, and the substrate 31
Even when the sealing material 32 is pressed, the sealing material 33 enters the inside uneven pattern 34d and the outside uneven pattern 34c, so that the seal width of the sealing material 33 can be prevented from spreading. The inner concave / convex pattern 34d is directly formed on the substrate 31.
And the outer concavo-convex pattern 34c can be formed.

Further, a configuration as shown in FIG. 5 can be adopted. FIG. 5 is a schematic partial cross-sectional view showing Modified Example 2 of the hermetic structure according to Embodiment 1 of the present invention. As shown in FIG. 5, a coating 31a is formed on the substrate 31.
A concave portion 34e having a predetermined width is formed in the coating 31a at a position where the seal material 33 is applied, and the seal material 33 is applied in the concave portion 34e. And
Since the seal material 33 is applied in the concave portion 34e having a predetermined width, the seal material 33 is prevented from expanding the seal width at both ends of the concave portion 34e, and does not spread beyond the predetermined width of the concave portion 34e.

FIG. 6 is a schematic partial sectional view showing a third modification of the hermetic structure according to the first embodiment of the present invention. As shown in FIG. 6, inside the inside uneven pattern 34a and the outside uneven pattern 34b, the uneven pattern 34a
Intermediate uneven patterns 34f, 34f having substantially the same shape as 34b
Can also be formed. With such a configuration, the intermediate concavo-convex patterns 34f and 34f and the sealing material 33 (more specifically, the spacer included in the sealing material 33) function as a spacer for supporting the pair of substrates 31 and 32. Will have. Therefore, the airtight structure 30 in which the gap between the pair of substrates 31 and 32 is controlled to be constant can be obtained. The number of the intermediate concave / convex patterns 34f is not limited. The relationship between the sealing material and the intermediate uneven patterns 34f will be described with reference to FIG.

The inner uneven pattern 34a, the outer uneven pattern 34b, and the intermediate uneven patterns 34f
Are formed in the shape of four frames at the peripheral portion of the substrate 3, the intermediate uneven patterns 34 f, 34 f, the substrate 31, and the substrate 3.
2 (see FIG. 7 (a)), the volume of which is the minimum amount for bonding the pair of substrates, and is formed along the inside and outside of the sealing material 33. The volume of a region surrounded by the inner concave and convex pattern 34a and the outer concave and convex pattern 34b and the pair of substrates 31 and 32 is B (see FIG. 7B), and the volume of the sealing material is W (see FIG. 7C). ), The relationship of A ≦ W ≦ B is satisfied.

By satisfying the relationship between the sealing material and the concavo-convex pattern, the substrates 31 and 32 can be securely bonded to each other, so that gas or liquid sealed between the substrates 31 and 32 leaks. There is nothing. Further, as described above, the inner concavo-convex pattern 34a and the outer concavo-convex pattern 34b can prevent the seal material 33 from flowing and spreading.

FIG. 8 is a schematic partial sectional view showing a fourth modification of the hermetic structure according to the first embodiment of the present invention. As shown in FIG. 8, a coating 31a is formed on a substrate 31, and the inner uneven pattern 34d and the outer uneven pattern 3d are formed on the inner and outer sides of the coating 31a where the sealing material is applied.
4c may be formed, and intermediate uneven patterns 34f may be formed inside the uneven patterns 34c and 34d. In this case, the intermediate concavo-convex patterns 34f have a function as a spacer together with the sealing material, and the inner concavo-convex pattern 34d and the outer concavo-convex pattern 34c prevent the sealing material from spreading.

(Other Matters) The inner concave-convex pattern,
The outer concavo-convex pattern and the intermediate concavo-convex pattern are formed on the peripheral portion of the substrate 31, but are not limited thereto, and may be formed on the peripheral portion of the substrate 32.
It may be formed in both 1 and 32.

The seal material 33 is provided at the peripheral portion of the substrate 31 and has an inner concave / convex pattern 34c and an outer concave / convex pattern 3c.
4d, but may be formed in a frame shape, for example, leaving an injection port (uncoated portion) for injecting gas, liquid, or the like. In addition, as described in a second embodiment described later, the inner concave-convex pattern,
The outer concavo-convex pattern and the intermediate concavo-convex pattern can be formed from a silicon nitride film or a silica film, and a resin or the like can be used. Further, the inner uneven pattern, the outer uneven pattern, and the intermediate uneven pattern can be formed by a plasma CVD method, a CVD method, a vacuum evaporation method, a sputtering method, or a sol-gel method.

(Embodiment 2) In Embodiment 2, a liquid crystal display device will be described with reference to FIGS.

FIG. 9 is a schematic plan view of a liquid crystal display device according to Embodiment 2 of the present invention, FIG. 10 is a sectional view taken along line BB of FIG. 9, and FIG. 11 is a partial sectional view of FIG. 12 is a cross-sectional view taken along the line CC of FIG. 9, and FIG. 13 is a schematic plan view of the array substrate 1 of the liquid crystal display device according to the second embodiment of the present invention.

In the liquid crystal display device 13 according to the second embodiment of the present invention, the array substrate 1 and the color filter substrate 10 are adhered to each other via the sealing material 7 so that the array substrate 1 and the color filter substrate 10 It is configured by sealing a liquid crystal material 11 therebetween.

On the array substrate 1, a plurality of source lines 3 and a plurality of gate lines 2 are arranged in a matrix, and through a thin film transistor (TFT) 15 arranged at each intersection. The pixel electrodes 14 are connected to the source lines 3 and the gate lines 2.
(See FIG. 13). Further, a gate line driving circuit and a source line driving circuit (not shown) are connected to the gate lines 2... Incidentally, the gate line driving circuit and the source line driving circuit can be arranged on the peripheral portion of the array substrate 1. In addition, the pixel electrodes 14 formed in this manner, a thin film transistor (TF)
T) An alignment film 8 is formed on 15, the gate lines 2, and the source lines 3.

On the peripheral edge of the array substrate 1, an inner concave / convex pattern 6a and an outer concave / convex pattern 6b, which are essential parts of the present invention, are provided with a sealing material 7 on the peripheral edge of the array substrate 1.
Are formed along the inside and outside of the pattern. Here, the inner concave / convex pattern 6a and the outer concave / convex pattern 6b are formed except for the liquid crystal injection port 5.
Further, the inner uneven pattern 6a and the outer uneven pattern 6
b, an intermediate concavo-convex pattern 6c having substantially the same shape as the inner concavo-convex pattern 6a and the outer concavo-convex pattern 6b is also formed except for the liquid crystal injection port 5, and the inner concavo-convex pattern 6a The concave / convex pattern 6 is formed by the outer concave / convex pattern 6b and the intermediate concave / convex patterns 6c. The uneven pattern 6 is
The gate lines 2 and the source lines 3 are formed so as to intersect with the gate lines 2... And the source lines 3.

A color mosaic filter (not shown) and a common electrode 16 are provided on the color filter substrate 10, and an alignment film 8 is formed thereon.

Then, the alignment films 8.8 formed on the array substrate 1 and the color filter substrate 10 are subjected to alignment processing, and thereafter, the array substrate 1 and the color filter substrate 10 face each other with the alignment films 8.8 facing each other. The array substrate 1 and the color filter substrate 10 are arranged and bonded at a predetermined interval by a sealing material 7 applied in a frame shape.

Further, between the array substrate 1 and the color filter substrate 10, a liquid crystal
Is injected, and the liquid crystal 11 is sealed by a sealing member 12. Further, the gate lines 2... And the source lines 3 are formed outward of the array substrate 1.

Next, the concavo-convex pattern 6 which is a main part of the present invention
Will be described. The concavo-convex pattern 6 includes the inner concavo-convex pattern 6a, the outer concavo-convex pattern 6b, and the intermediate concavo-convex patterns 6c.

The concave / convex pattern 6 corresponds to the array substrate 1
Are formed inside and outside the pattern of the sealing material 7, and are formed in a frame shape except for the liquid crystal injection port 5. The uneven pattern 6 is made of a film, more specifically, a strong silica film or a silicon nitride film.

As described above, by forming the uneven pattern 6, the inner uneven pattern 6a and the outer uneven pattern 6b can prevent the seal material 7 from flowing and spreading (the gate lines 2... The sealing material 7 does not spread along the drawing direction (X direction) or the drawing direction (Y direction) of the source lines 3..., And therefore, the seal width can be set to a predetermined width.

In the second embodiment, each of the inner concave-convex pattern 6a, the outer concave-convex pattern 6b, and the intermediate concave-convex pattern 6c has a width of 1 μm, a height of 1 μm, an inner concave-convex pattern 6a and an outer concave-convex pattern 6b. Is set at an interval of 0.5 mm. Further, the number of the concavo-convex patterns 6 is the same as that of the present embodiment (four).
However, the present invention is not limited to this, and it is also possible to form five or more wires.

As shown in FIG. 11B, the intermediate uneven pattern 6c and the sealing material 7 (more specifically, the sealing material 7 includes spacers 7a,
The spacers 7a...
Has the function of a spacer that supports With such a configuration, it is easy to control the uniformity of the gap between the array substrate 1 and the color filter substrate 10. Further, by forming the intermediate uneven patterns 6c with a coating, the coating has high uniformity, so that the uniformity of the intermediate uneven patterns 6c can be increased. Can be controlled to be uniform. Further, since the concavo-convex pattern composed of the coating film can be made thin, it can be applied particularly to a thin structure such as a liquid crystal display device.

The tips of the intermediate uneven patterns 6c are flat (parallel to the array substrate 1 and the color filter substrate 10), and the spacers 7a... 6c, the gap between the array substrate 1 and the color filter substrate 10 can be further adjusted and made uniform. The inner concave and convex pattern 6a and the outer concave and convex pattern 6b are formed from a film, and their tips are also flat.

In this way, the sealing material does not flow to the peripheral portion on the array substrate 1, that is, the position where the gate line driving circuit and the source line driving circuit are mounted. Therefore, according to the present invention, the sealing width of the sealing material does not increase outwardly of the array substrate 1 along the gate lines 2 and the source lines 3. It is not necessary to use the array substrate 1 having a size of, and the size of the liquid crystal display device 13 can be reduced.

The seal material to be applied varies at positions on the substrate. By forming the inner uneven pattern 6a and the outer uneven pattern 6b, the array substrate 1 and the color filter substrate 10 are formed in the seal bonding step.
Even if pressure is applied via the seal member 7, the seal width of the seal member 7 can be kept within a predetermined width, and therefore, the variation in the seal width can be reduced.

Next, a method for manufacturing the liquid crystal display device according to the second embodiment of the present invention will be described with reference to FIGS. FIG. 14 is a schematic cross-sectional view showing a method for manufacturing a liquid crystal display device according to Embodiment 2 of the present invention, and FIG. 15 is a schematic partial cross-sectional view showing the same manufacturing method.

(1) First, a liquid crystal display device having a display size of 15 inches and a thickness of 0.7 m was prepared.
m, a transparent glass substrate was prepared, and the transparent glass substrate was cut to produce a 15-inch display size glass substrate (hereinafter, referred to as “array substrate 1”).

(2) Next, as shown in FIG.
By a known method, thin film transistors (TFTs) 15, pixel electrodes 14, gate lines 2.
And source lines (not shown).

(3) Next, as shown in FIG.
A passivation film 9 made of silica or silicon nitride was formed on the entire surface of the array substrate 1 to protect the thin film transistors 15 by a plasma CVD method, a sputtering method, or the like.

(4) Next, as shown in FIG.
The pattern of the passivation film 9 was formed by photolithography, and at the same time, a concavo-convex pattern 6 (inner concavo-convex pattern 6a, outer concavo-convex pattern 6b, and intermediate concavo-convex patterns 6c and 6c) was formed on the periphery of the array substrate 1 in a frame shape.

(5) Next, as shown in FIG.
A polyimide resin for an alignment film was applied using a spinner, cured by heating, and then rubbed in a predetermined direction to form an alignment film 8. As described above, when the concavo-convex pattern 6 is formed in a step prior to the alignment film forming step, a liquid crystal display device can be manufactured without contaminating the alignment film 8, and a liquid crystal display device having excellent display performance can be obtained.

(6) Next, as shown in FIG.
A sealing material 7 is linearly applied on the intermediate uneven patterns 6c by using a screen printing method except for the liquid crystal injection port 5.

(7) Next, as shown in FIG.
The surface of the alignment film 8 of the color filter substrate 10 on which the color filter, the counter electrode, and the alignment film are formed is
The liquid crystal cell was manufactured by facing the surface of the alignment film 8, bonding and pressing the sealing material 7, and curing the sealing material 7.
At this time, the sealing material 7 naturally spreads, but the inner concavo-convex pattern 6a and the outer concavo-convex pattern 6b formed substantially parallel to the sealing material 7 prevent the sealing material 7 from flowing and spreading, and accordingly, the sealing width is reduced. It can be prevented from spreading.

(8) Finally, when the predetermined liquid crystal material 11 is vacuum-injected from the liquid crystal injection port 5 and the liquid crystal injection port 5 is sealed by the sealing member 12, the liquid crystal display device 13 as shown in FIG. Could be manufactured.

Since the longitudinal direction of the concavo-convex pattern 6 formed in this manner intersects with the gate lines 2 and the source lines 3 formed on the surface of the array substrate 1, the sealing material spreads. Is highly effective in preventing
The sealing material 7 did not spread along the gate lines 2 and the source lines 3.

Further, the concavo-convex pattern 6 is formed on the liquid crystal display device 1.
Since it is formed so as to surround the display unit 4 constituting 3,
Due to the uneven pattern 6, the sealing material does not spread to the display portion, and therefore, the display performance of the liquid crystal display device does not deteriorate. In addition, 1
Liquid crystal cells could be manufactured at various locations.

(Other Matters) (1) A display unit 4 is formed on four substrates at the same time on a substrate large enough to be able to simultaneously produce four surfaces of a 15-inch display size, and a pair of substrates is attached to form a cell. Then, it is also possible to cut it.

(2) The uneven pattern 6 (the inner uneven pattern 6a, the outer uneven pattern 6b, the intermediate uneven pattern 6)
c) is formed by a plasma CVD method, but is not limited thereto. For example, a CVD method, a vacuum evaporation method,
It is also possible to form by a sputtering method or a sol-gel method and to process by photolithography technology.

(3) The concavo-convex pattern is formed from a silicon nitride film or a silica film and can be formed simultaneously with the formation of the passivation film, but is not limited to this. For example, a resin or the like can be used as the concavo-convex pattern. In that case, the concavo-convex pattern can be formed before forming the pixel electrodes and the TFTs on the array substrate.

(4) The shape of the concavo-convex pattern is not limited to those shown in the first and second embodiments. For example, the cross-sectional shape may be trapezoidal, triangular, or the like.
Further, in the second embodiment, the configuration may be such that the relational expression (A ≦ W ≦ B) between the concave and convex pattern and the amount of the sealing material described in the first embodiment is satisfied.

[0112]

As described above, according to the present invention, an inner uneven pattern and an outer uneven pattern are formed inside and outside the pattern of the sealing material so as to be along the sealing material. When the substrate and the color filter substrate are pressure-bonded to each other, it is possible to prevent the sealing material from spreading and the seal width from being increased, and the liquid crystal display device can be made more compact.

[Brief description of the drawings]

FIG. 1 is a schematic view of an airtight structure according to Embodiment 1 of the present invention, FIG. 1 (a) is a schematic perspective view, and FIG. 1 (b) is FIG.
FIG. 3A is a sectional view taken along line AA of FIG.

FIG. 2 is a plan view of a substrate on which an inner uneven pattern and an outer uneven pattern are formed.

FIG. 3 is a schematic cross-sectional view illustrating a method for manufacturing an airtight structure according to Embodiment 1 of the present invention.

FIG. 4 is a first modification of the airtight structure according to the first embodiment of the present invention.
FIG.

FIG. 5 is a schematic partial sectional view showing Modified Example 2 of the hermetic structure according to Embodiment 1 of the present invention.

FIG. 6 is a third modification of the airtight structure according to the first embodiment of the present invention.
FIG.

FIG. 7 is a schematic cross-sectional view showing a relationship between a sealing material and an uneven pattern.

FIG. 8 is a fourth modification of the hermetic structure according to the first embodiment of the present invention.
FIG.

FIG. 9 is a schematic plan view of a liquid crystal display device according to Embodiment 2 of the present invention.

FIG. 10 is a sectional view taken along line BB of FIG. 9;

FIG. 11 is a partial sectional view of FIG. 10;

FIG. 12 is a sectional view taken along line CC of FIG. 9;

FIG. 13 is a schematic plan view of an array substrate 1 of the liquid crystal display device according to Embodiment 2 of the present invention.

FIG. 14 is a schematic sectional view illustrating the method for manufacturing the liquid crystal display device according to the second embodiment of the present invention.

FIG. 15 is a schematic partial sectional view showing the same manufacturing method.

FIG. 16 is a schematic plan view of a conventional liquid crystal display device.

FIG. 17 is a schematic plan view of an array substrate constituting a conventional liquid crystal display device.

18 is a sectional view taken along line DD of FIG.

FIG. 19 is a schematic perspective view of a conventional array substrate near a sealing material application position.

20 is a schematic perspective view showing a state in which a sealing material is applied to the application position in FIG. 19, and an array substrate and a color filter substrate are pressed.

FIG. 21 is a schematic sectional view taken along line EE of FIG. 20;

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 Array substrate 2 Gate line 3 Source line 4 Display part 5 Liquid crystal inlet 6 Uneven pattern 6a Inner uneven pattern 6b Outer uneven pattern 6c Intermediate uneven pattern 7 Seal material 7a Spacer 8 Alignment film 9 Passivation film 10 Color filter substrate 11 Liquid crystal material 12 Sealing member 13 Liquid crystal display device 14 Pixel electrode 15 TFT 30 Hermetic structure 31 Substrate 32 Substrate 33 Seal material 34a Inner uneven pattern 34b Outer uneven pattern 34c Outer uneven pattern 34d Inner uneven pattern 34e Recess

Continued on the front page F-term (reference) 2H089 LA42 LA44 LA47 NA41 NA42 QA16 TA01 TA05 TA09 2H090 HA05 HB03X HB04X HC03 HC12 JA03 JA05 JC03 LA03 5C094 AA15 AA42 DA07 EB10 FB12 FB15 5G435 AA18 BB12 EE09 KK00 EE00

Claims (27)

[Claims] 1. A pair of substrates, a sealing material for bonding peripheral portions of the pair of substrates to each other at a predetermined interval, and a seal material formed on at least one of the pair of substrates and inside a pattern of the sealing material. And an outer concavo-convex pattern along the outside of the pattern of the sealing material. 2. An intermediate uneven pattern is formed between at least one of the pair of substrates and between the inner uneven pattern and the outer uneven pattern. Airtight structure. 3. A pair of substrates, and a sealing material for bonding peripheral portions of the pair of substrates to each other at a predetermined interval, wherein the sealing material is provided on a peripheral portion of at least one of the pair of substrates. An airtight structure, characterized in that a concave portion into which is inserted is formed. 4. The hermetic structure according to claim 2, wherein the inner uneven pattern, the outer uneven pattern, and the intermediate uneven pattern are formed by a coating. 5. The hermetic structure according to claim 2, wherein tips of the inner uneven pattern, the outer uneven pattern, and the intermediate uneven pattern are flat. 6. The method according to claim 6, wherein a plurality of the intermediate concavo-convex patterns are formed, and a volume of a region surrounded by two of the intermediate concavo-convex patterns and the pair of substrates is A,
The volume is a minimum amount for bonding the pair of substrates, the volume of a region surrounded by the inner concave / convex pattern and the outer concave / convex pattern, and the pair of substrates is B, and the volume of the sealing material is W. The airtight structure according to claim 2, wherein the relationship of A≤W≤B is satisfied. 7. A pair of substrates, a sealing material for bonding peripheral portions of the pair of substrates to each other at predetermined intervals, and an inner surface of the sealing material pattern formed on at least one of the pair of substrates. An outer concavo-convex pattern along the inner concavo-convex pattern and the outer side of the pattern of the sealing material,
A method of manufacturing an airtight structure, comprising: forming an inner concave-convex pattern and an outer concave-convex pattern on a peripheral portion of at least one of the pair of substrates, inside and outside the application position of the sealing material. A pattern forming step, a seal material applying step of applying the seal material in a linear manner to the application position of the seal material, and an adhesive step of bonding the pair of substrates at predetermined intervals and curing the seal material. A method for producing an airtight structure, comprising: 8. The method according to claim 1, wherein the step of forming an uneven pattern is a step of further forming an intermediate uneven pattern between the inner uneven pattern and the outer uneven pattern on at least one of the pair of substrates. Claim 7
3. The method for producing an airtight structure according to item 1. 9. A pair of substrates, and a sealing material for bonding peripheral portions of the pair of substrates to each other at a predetermined interval, wherein the sealing material is attached to a peripheral portion of at least one of the pair of substrates. A manufacturing method of an airtight structure in which a concave portion into which a concave portion is formed is formed, the concave portion forming step of forming a concave portion at a sealing material application position on a peripheral portion of at least one of the pair of substrates, An airtight structure, comprising: a sealing material applying step of applying the sealing material in a linear shape in the concave portion; and an adhering step of bonding the pair of substrates at a predetermined interval and curing the sealing material. Manufacturing method. 10. The hermetic seal according to claim 7, wherein the step of forming the concavo-convex pattern is a step of forming a film on the entire surface of the substrate and processing the film by a photolithography method. The method of manufacturing the structure. 11. The method according to claim 1, wherein the film is formed by a CVD method or a plasma CV method.
The method for producing an airtight structure according to claim 10, wherein the method is formed by a D method, a vacuum evaporation method, a sputtering method, or a sol-gel method. 12. The method for manufacturing an airtight structure according to claim 10, wherein the coating is a silica film or a silicon nitride film. 13. A sealing material is applied to a peripheral portion of at least one of a pair of substrates on which an electrode and an alignment film are formed, and the pair of substrates is adhered to each other at a predetermined interval via the sealing material. A liquid crystal display device configured by filling a liquid crystal between the pair of substrates, wherein on at least one of the pair of substrates, an inner concave / convex pattern along an inner side of the seal material pattern and the seal material are provided. A liquid crystal display device comprising an outer concavo-convex pattern along the outside of the pattern. 14. The method according to claim 13, wherein an intermediate uneven pattern is formed between the inner uneven pattern and the outer uneven pattern on at least one of the pair of substrates. Liquid crystal display device. 15. A sealing material is applied to a peripheral portion of at least one of a pair of substrates on which an electrode and an alignment film are formed, and the pair of substrates is adhered to each other at a predetermined interval via the sealing material. A liquid crystal display device configured by filling a liquid crystal between the pair of substrates, wherein at least one of the pair of substrates has a concave portion in which a sealing material enters at a peripheral portion of the substrate. Liquid crystal display device. 16. The liquid crystal display device according to claim 14, wherein the inner uneven pattern, the outer uneven pattern, and the intermediate uneven pattern are formed by a coating. 17. The liquid crystal display device according to claim 14, wherein tips of the inner uneven pattern, the outer uneven pattern, and the intermediate uneven pattern are flat. 18. A plurality of the intermediate uneven patterns are formed, and a volume of a region surrounded between two intermediate uneven patterns and the pair of substrates in the intermediate uneven patterns is A, and the volume is A When the volume of a region surrounded by the inner concave and convex pattern and the outer concave and convex pattern and the pair of substrates is B, and the volume of the sealing material is W, A ≦ W ≦ B The liquid crystal display device according to claim 14, wherein the following relationship is satisfied. 19. The liquid crystal display according to claim 13, wherein the inner uneven pattern and the outer uneven pattern are formed so as to surround a display portion formed on one of the pair of substrates. apparatus. 20. The device according to claim 13, wherein the inner concave-convex pattern and the outer concave-convex pattern are formed so as to intersect wirings drawn from the display unit to the outside of the substrate. Liquid crystal display. 21. A sealing material is applied to a peripheral portion of at least one of a pair of substrates on which an electrode and an alignment film are formed, and the pair of substrates is bonded to each other at a predetermined interval via the sealing material. A liquid crystal is filled between the pair of substrates, and on at least one of the pair of substrates, an inner concavo-convex pattern along the inside of the pattern of the sealant and an outer side along the outside of the pattern of the sealant A method for manufacturing a liquid crystal display device having a concavo-convex pattern, comprising: an electrode forming step of forming an electrode on the pair of substrates; an alignment film forming step of forming an alignment film on the pair of substrates; A concave / convex pattern pattern in which an inner concave / convex pattern and an outer concave / convex pattern are formed on the periphery of at least one of the substrates, inside and outside of the application position of the sealant, leaving a liquid crystal injection port. Forming step, a sealing material applying step of linearly applying the sealing material leaving a liquid crystal injection port at an application position of the sealing material, and bonding the pair of substrates at predetermined intervals to cure the sealing material. A method for manufacturing a liquid crystal display device, comprising: 22. The uneven pattern forming step may further include forming an intermediate uneven pattern between the inner uneven pattern and the outer uneven pattern on at least one of the pair of substrates. The method for manufacturing a liquid crystal display device according to claim 21, wherein: 23. A sealing material is applied to a peripheral portion of at least one of the pair of substrates on which the electrodes and the alignment film are formed, and the pair of substrates is adhered to each other at a predetermined interval via the sealing material. A method for manufacturing a liquid crystal display device, wherein a liquid crystal is filled between the pair of substrates, and a concave portion in which the sealing material enters is formed on a peripheral portion of at least one of the pair of substrates, An electrode forming step of forming electrodes on the pair of substrates; an alignment film forming step of forming an alignment film on the pair of substrates; Forming a concave portion, applying a sealing material in the concave portion linearly in the sealing material, bonding the pair of substrates at a predetermined interval, and curing the sealing material. The method of manufacturing a liquid crystal display device, characterized in that it comprises a. 24. The liquid crystal according to claim 21, wherein the step of forming the concavo-convex pattern is a step of forming a coating on the entire surface of the substrate and processing the coating by a photolithography method. A method for manufacturing a display device. 25. The method according to claim 25, wherein the film is formed by a CVD method or a plasma CV method.
The method according to claim 24, wherein the method is formed by a D method, a vacuum deposition method, a sputtering method, or a sol-gel method. 26. The method according to claim 24, wherein the coating is a silica film or a silicon nitride film. 27. An alignment film forming step of forming an alignment film inside the pair of substrates after the concave / convex pattern forming step.
3. The method for manufacturing a liquid crystal display device according to item 1.