JP2001279489A - Electrical contact material and method of manufacturing the same - Google Patents
Electrical contact material and method of manufacturing the sameInfo
- Publication number
- JP2001279489A JP2001279489A JP2000093692A JP2000093692A JP2001279489A JP 2001279489 A JP2001279489 A JP 2001279489A JP 2000093692 A JP2000093692 A JP 2000093692A JP 2000093692 A JP2000093692 A JP 2000093692A JP 2001279489 A JP2001279489 A JP 2001279489A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- plating
- matte
- electrical contact
- contact material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000463 material Substances 0.000 title claims abstract description 38
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 13
- 238000007747 plating Methods 0.000 claims abstract description 82
- 239000007769 metal material Substances 0.000 claims abstract description 9
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 88
- 229910052759 nickel Inorganic materials 0.000 claims description 22
- 238000009713 electroplating Methods 0.000 abstract description 13
- 238000003825 pressing Methods 0.000 abstract description 11
- 239000010410 layer Substances 0.000 description 88
- 238000005452 bending Methods 0.000 description 15
- 230000000052 comparative effect Effects 0.000 description 10
- 238000000034 method Methods 0.000 description 9
- 238000011156 evaluation Methods 0.000 description 7
- 229910001220 stainless steel Inorganic materials 0.000 description 6
- 239000010935 stainless steel Substances 0.000 description 6
- 239000013078 crystal Substances 0.000 description 5
- 239000000654 additive Substances 0.000 description 4
- 230000000996 additive effect Effects 0.000 description 4
- 239000012535 impurity Substances 0.000 description 4
- 238000005868 electrolysis reaction Methods 0.000 description 3
- 239000002932 luster Substances 0.000 description 3
- 239000000203 mixture Substances 0.000 description 2
- 239000002356 single layer Substances 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- 102100031083 Uteroglobin Human genes 0.000 description 1
- 108090000203 Uteroglobin Proteins 0.000 description 1
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 1
- 239000004327 boric acid Substances 0.000 description 1
- 238000005282 brightening Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000008094 contradictory effect Effects 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- IIACRCGMVDHOTQ-UHFFFAOYSA-M sulfamate Chemical compound NS([O-])(=O)=O IIACRCGMVDHOTQ-UHFFFAOYSA-M 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
- Y02E60/10—Energy storage using batteries
Landscapes
- Electroplating Methods And Accessories (AREA)
- Sealing Battery Cases Or Jackets (AREA)
Abstract
(57)【要約】
【課題】外装ケース等への利用に適した外観性、電極端
子等への利用に適した電気接触性およびプレスや絞り等
の加工性にすぐれた電気接触材料及びその製造方法を得
る。
【解決手段】 金属素材１に、無光沢Ｎｉめっき層２
１、光沢Ｎｉめっき層２３、無光沢Ｎｉめっき層２３を
それぞれ、電解めっきにより順次形成して３層めっき構
成とする。
(57) [Summary] [Object] To provide an electrical contact material excellent in external appearance suitable for use in an outer case and the like, electrical contact properties suitable for use in an electrode terminal and the like, and excellent in workability such as pressing and drawing, and its manufacture Get the way. SOLUTION: A metal material 1 is provided with a matte Ni plating layer 2
1. Each of the bright Ni plating layer 23 and the matte Ni plating layer 23 is sequentially formed by electrolytic plating to form a three-layer plating structure.
Description
【０００１】[0001]
【発明の属する技術分野】本発明は電気接触材料、とく
に、Ｆｅ系あるいはＣｕ系の金属素材に電解によるＮｉ
（ニッケル）めっきを施してなる電気接触材料及びその
製造方法に関し、たとえばボタン型やコイン型電池など
の電池ケース（電池缶）に適用して有効なものに関す
る。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an electric contact material, in particular, to an Fe-based or Cu-based metal material by electrolytic Ni plating.
The present invention relates to an electrical contact material plated with (nickel) and a method for producing the same, and more particularly to a material that is effective when applied to a battery case (battery can) such as a button-type or coin-type battery.
【０００２】[0002]
【従来の技術】たとえば、ボタン型やコイン型などの小
型電池には外装ケースと電極端子を兼ねた電池ケース
（あるいは電池缶）が使用される。この電池ケースに
は、薄板状の金属とくにＦｅ系素材に電解Ｎｉめっきを
施してなる電気接触材料をプレス絞り加工したものが良
く使われる。この場合、その電気接触材料には、電極端
子としての電気特性すなわち表面での電気接触抵抗が低
く安定していることが要求されるが、これ以外に、プレ
スあるいは絞り等の加工性にすぐれていること、さら
に、外装ケースとしての外観性いわゆる光沢性も要求さ
れる。2. Description of the Related Art For example, a battery case (or battery can) serving as an outer case and an electrode terminal is used for a small battery such as a button type or a coin type. As the battery case, a thin plate-shaped metal, particularly an Fe-based material obtained by subjecting an electrical contact material obtained by electrolytic Ni plating to press drawing is often used. In this case, the electrical contact material is required to have a low and stable electrical property as an electrode terminal, that is, a low electrical contact resistance on the surface. In addition, it is required that the outer case has a so-called glossy appearance.
【０００３】ここで、電解によるＮｉめっきには、光沢
Ｎｉめっきと無光沢Ｎｉめっきがある。光沢Ｎｉめっき
は、表面が鏡面仕上げされたかのような奇麗な光沢を有
していて、とくに外観性を重視する用途に適している。
この光沢Ｎｉめっきは、結晶を微細化するような添加剤
（光沢剤）をめっき浴に加えることで形成することがで
きる。しかし、その添加剤の使用により、めっき層中の
不純物とくにＳおよびＣの含有量が多くなり、これによ
って上記電気接触抵抗が高くなってしまうという問題が
生じる。また、プレスや絞り加工等によってクラックが
発生しやすく、加工性に劣るという問題も生じる。他
方、無光沢Ｎｉめっきは、上記添加剤を使用せずに形成
されるので、めっき層中の不純物含有量が少なく、した
がって上記電気接触抵抗を低くすることができる。ま
た、プレスや絞り加工等によるクラックも発生しにく
く、加工性にすぐれている。しかし、表面が無光沢で外
観性（光沢性）に劣るという問題があった。このよう
に、従来の電解Ｎｉめっきされた電気接触材料では、た
とえば上記電池ケースのように、外装ケースとしての外
観性と、電極端子としての電気接触性およびプレス絞り
等の加工性とが要求されるような用途において、一方の
機能を得ようとすれば他方の機能が損なわれるというよ
うな背反する問題があった。Here, there are bright Ni plating and matte Ni plating as Ni plating by electrolysis. Bright Ni plating has a beautiful luster as if the surface had been mirror-finished, and is particularly suitable for applications where emphasis is placed on appearance.
This bright Ni plating can be formed by adding an additive (brightening agent) that makes crystals finer to the plating bath. However, the use of the additive increases the content of impurities, particularly S and C, in the plating layer, thereby causing a problem that the electric contact resistance increases. In addition, there is a problem that cracks are easily generated by pressing or drawing, and the workability is poor. On the other hand, since the dull Ni plating is formed without using the above-mentioned additive, the content of impurities in the plating layer is small, and thus the electric contact resistance can be reduced. In addition, cracks due to pressing, drawing, and the like hardly occur, and the workability is excellent. However, there is a problem that the surface is dull and poor in appearance (glossiness). As described above, the conventional electrolytic Ni-plated electrical contact material requires, for example, the appearance as an outer case, the electrical contact as an electrode terminal, and the workability such as press drawing as in the above battery case. In such applications, there is a contradictory problem that trying to obtain one function impairs the other function.
【０００４】[0004]
【発明が解決しようとする課題】本発明は以上のような
課題に鑑みてなされたものであり、金属素材に電解Ｎｉ
めっきを施してなる電気接触材料にあって、外装ケース
等への利用に適した外観性、電極端子等への利用に適し
た電気接触性およびプレスや絞り等の加工性の各機能に
すぐれた電気接触材料及びその製造方法を提供すること
を目的とする。DISCLOSURE OF THE INVENTION The present invention has been made in view of the above problems, and has been developed in consideration of the problem of electrolytic Ni.
A plated electrical contact material with excellent appearance suitable for use in exterior cases, etc., electrical contact suitable for use in electrode terminals, etc., and excellent workability such as pressing and drawing. It is an object to provide an electrical contact material and a method for manufacturing the same.
【０００５】[0005]
【課題を解決するための手段】上述の課題を解決するた
めの手段として、第１の手段は、金属素材に電解による
ニッケルめっき層が下層と中間層と上層の３層に形成さ
れているとともに、下層には無光沢ニッケルめっき層、
中間層には光沢ニッケルめっき層、上層には無光沢ニッ
ケルめっき層がそれぞれ形成されていることを特徴とす
る電気接触材料である。第２の手段は、前記３層のニッ
ケルめっきがなす皮膜の合計膜厚が０．５〜１０μｍ、
下層の膜厚が０．３μｍ以上、中間層の膜厚が０．１〜
１．０μｍ、上層の膜厚が０．１〜１．０μｍであるこ
とを特徴とする第１の手段にかかる電気接触材料であ
る。第３の手段は、金属素材に電解によるニッケルめっ
き層を下層と中間層と上層の３層に形成するようにする
とともに、下層には無光沢ニッケルめっき層、中間層に
は光沢ニッケルめっき層、上層には無光沢ニッケルめっ
き層をそれぞれ形成することを特徴とする電気接触材料
の製造方法である。第４の手段は、前記３層のニッケル
めっきがなす皮膜の合計膜厚が０．５〜１０μｍ、下層
の膜厚が０．３μｍ以上、中間層の膜厚が０．１〜１．
０μｍ、上層の膜厚が０．１〜１．０μｍであることを
特徴とする第３の手段にかかる電気接触材料の製造方法
である。上述の第１の手段によれば、めっき仕上げ面の
光沢を確保しつつ、その表面での電気接触性を良好に
し、さらにプレスや絞り等の加工によるクラックの発生
を抑えられることが判明した。したがって、外装ケース
等への利用に適した外観性、電極端子等への利用に適し
た電気接触性およびプレスや絞り等の加工性の各機能を
併せ持つ電気接触材料を得ることができる。また、第２
の手段は、第１の手段において、３層のＮｉめっきがな
す皮膜の合計膜厚が０．５〜１０μｍ、下層の膜厚が
０．３μｍ以上、中間層の膜厚が０．１〜１．０μｍ、
上層の膜厚が０．１〜１．０μｍであることを特徴とす
る電気接触材料である。これにより、めっき仕上げ面の
光沢度と電気接触性および加工性を共に最適な状態にで
きることが判明した。したがって、外観性、電気接触性
および加工性の各機能をさらに向上させた電気接触材料
を得ることができる。第３及び第４の手段によれば、第
１及び第２の手段にかかる電気接触材料を得ることがで
きる。Means for Solving the Problems As means for solving the above-mentioned problems, the first means is that a nickel plating layer formed by electrolysis on a metal material is formed in three layers of a lower layer, an intermediate layer and an upper layer. , The lower layer is a matte nickel plating layer,
The electrical contact material is characterized in that a bright nickel plating layer is formed on the intermediate layer, and a dull nickel plating layer is formed on the upper layer. The second means is that the total thickness of the films formed by the three layers of nickel plating is 0.5 to 10 μm,
The thickness of the lower layer is 0.3 μm or more, and the thickness of the intermediate layer is 0.1 to
The electrical contact material according to the first means, wherein the thickness is 1.0 μm and the thickness of the upper layer is 0.1 to 1.0 μm. The third means is to form a nickel plating layer by electrolysis on a metal material into three layers, a lower layer, an intermediate layer, and an upper layer, a lower layer having a matte nickel plating layer, an intermediate layer having a bright nickel plating layer, A method for producing an electrical contact material, wherein a dull nickel plating layer is formed as an upper layer. The fourth means is that the total thickness of the coatings formed by the three layers of nickel plating is 0.5 to 10 μm, the thickness of the lower layer is 0.3 μm or more, and the thickness of the intermediate layer is 0.1 to 1.
A method for producing an electrical contact material according to a third means, wherein the thickness of the upper layer is 0.1 μm to 1.0 μm. According to the above-mentioned first means, it has been found that while ensuring the gloss of the plated finished surface, the electrical contact on the surface is improved, and the occurrence of cracks due to processing such as pressing and drawing can be suppressed. Therefore, it is possible to obtain an electric contact material having both appearance properties suitable for use in an outer case and the like, electric contact properties suitable for use in an electrode terminal and the like, and workability functions such as pressing and drawing. Also, the second
In the first means, the total thickness of the films formed by the three Ni plating layers is 0.5 to 10 μm, the thickness of the lower layer is 0.3 μm or more, and the thickness of the intermediate layer is 0.1 to 1 μm. 0.0 μm,
An electrical contact material characterized in that the upper layer has a thickness of 0.1 to 1.0 μm. As a result, it has been found that both the glossiness, the electrical contact property, and the workability of the plated surface can be optimized. Therefore, it is possible to obtain an electric contact material with further improved appearance, electric contact and workability functions. According to the third and fourth means, the electric contact material according to the first and second means can be obtained.
【０００６】[0006]
【発明の実施の形態】以下、本発明の好適な実施形態を
図面を参照しながら説明する。図１は本発明による電気
接触材料の断面形態を模式的に示す。同図に示す電気接
触材料は、Ｆｅ系またはＣｕ系の薄板状金属素材（被め
っき素材）１上に、無光沢Ｎｉめっきによる下層２１、
光沢Ｎｉめっきによる中間層２２、無光沢Ｎｉめっきに
よる上層（表層）２３がそれぞれ、電解めっきにより順
次積層形成されている。下層２１および上層２３の無光
沢Ｎｉめっき層はそれぞれ、ＳやＣなどの不純物含有量
が少なくなるようなめっき浴条件にて形成されている。
また、中間層２２の光沢Ｎｉめっき層は、めっき結晶を
微細化するような添加剤をめっき浴に加えて形成されて
いる。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Preferred embodiments of the present invention will be described below with reference to the drawings. FIG. 1 schematically shows a cross-sectional form of an electric contact material according to the present invention. The electric contact material shown in FIG. 1 includes a lower layer 21 made of a matte Ni plating on an Fe-based or Cu-based sheet metal material (material to be plated) 1.
An intermediate layer 22 made of bright Ni plating and an upper layer (surface layer) 23 made of non-glossy Ni plating are sequentially laminated by electrolytic plating. The matte Ni plating layers of the lower layer 21 and the upper layer 23 are formed under plating bath conditions such that the content of impurities such as S and C is reduced.
Further, the bright Ni plating layer of the intermediate layer 22 is formed by adding an additive for making plating crystals finer to the plating bath.
【０００７】ここで、表面に現れる上層２１は無光沢Ｎ
ｉめっきにより形成されているが、この無光沢Ｎｉめっ
きを光沢Ｎｉめっきされた中間層２２の上に形成したこ
とで、その上層２３の表面にも光沢面を得られることが
判明した。これは、中間層２２の微細化されためっき結
晶の状態が、その上に形成される上層２３のめっき結晶
の状態にも引き継がれて、その上層２３の結晶状態が、
不純物を含有しない無光沢めっきでありながら微細化さ
れて光沢を呈する、ということが考えられる。また、上
述した３層の電解めっき構成では、素材１と接する下層
２１および表面に現れる上層をそれぞれ無光沢Ｎｉめっ
きで形成したことにより、プレスや絞り等の加工による
クラックが発生しにくくなることも判明した。これは、
プレスや絞り等の加工によって生じる歪みが、下層２１
と上層２３の無光沢Ｎｉめっき層にて吸収されるためと
考えられる。Here, the upper layer 21 appearing on the surface has a matte N
Although formed by i-plating, it has been found that by forming this matte Ni plating on the bright Ni-plated intermediate layer 22, a glossy surface can also be obtained on the surface of the upper layer 23. This is because the state of the refined plating crystal of the intermediate layer 22 is also taken over by the state of the plating crystal of the upper layer 23 formed thereon, and the crystal state of the upper layer 23 is
It is conceivable that the substrate is refined and presents luster while being a matte plating containing no impurities. Moreover, in the above-described three-layer electrolytic plating configuration, the lower layer 21 in contact with the material 1 and the upper layer appearing on the surface are each formed by matte Ni plating, so that cracks due to processing such as pressing and drawing are less likely to occur. found. this is,
Distortion caused by processing such as pressing and drawing causes lower layer 21
It is considered that this is absorbed by the matte Ni plating layer of the upper layer 23.
【０００８】以上のような３層の電解めっき構成によ
り、外装ケース等への利用に適した外観性、電極端子等
への利用に適した電気接触性およびプレスや絞り等の加
工性の各機能にすぐれた電気接触材料を得ることができ
る。さらに、本発明者は、上述した３層構成の最適条件
範囲を検討したところ、３層のＮｉめっきがなす皮膜の
合計膜厚が０．５〜１０μｍ、下層の膜厚が０．３μｍ
以上、中間層の膜厚が０．１〜１．０μｍ、上層の膜厚
が０．１〜１．０μｍであることが判明した。上述した
電気接触材料を用いて、図２に示すような断面形状の電
池ケース３をプレス絞りにより形成したところ、その表
面の光沢は光沢度１．０以上を得ることができた。ま
た、同図のａ，ｂ部の接触抵抗は３０ｍΩ以下にするこ
とができた。さらに、同図のｃ部をＳＥＭで観察（倍率
５００）したが、クラックの発生はなかった。図３は、
本発明による電気接触材料を製造するための電解めっき
処理手順の実施形態を示すフロー図である。この場合、
同図のフローでは図示を省略したが、各工程の後には水
洗工程が入る。また、最終の無光沢Ｎｉめっき工程の後
には水洗と乾燥の工程が入る。With the above-described three-layer electrolytic plating structure, each function of appearance suitable for use in an outer case, etc., electric contact suitable for use in an electrode terminal and the like, and workability such as pressing and drawing. An excellent electrical contact material can be obtained. Further, the present inventor examined the optimum condition range of the above-described three-layer structure. As a result, the total film thickness of the three-layer Ni-plated films was 0.5 to 10 μm, and the lower film thickness was 0.3 μm.
As described above, it was found that the thickness of the intermediate layer was 0.1 to 1.0 μm and the thickness of the upper layer was 0.1 to 1.0 μm. When the battery case 3 having a sectional shape as shown in FIG. 2 was formed by press-drawing using the above-mentioned electric contact material, gloss of the surface could be obtained with a glossiness of 1.0 or more. In addition, the contact resistance of the portions a and b in the figure could be reduced to 30 mΩ or less. Further, the portion c in the same figure was observed with an SEM (magnification: 500), but no crack was generated. FIG.
FIG. 3 is a flow chart illustrating an embodiment of an electrolytic plating procedure for producing an electrical contact material according to the present invention. in this case,
Although illustration is omitted in the flow of the figure, a water washing step is inserted after each step. After the final matte Ni plating step, steps of washing and drying are performed.
【０００９】[0009]
【実施例】（実施例１）図３に示した電解めっき処理フ
ローにしたがい、ステンレス鋼条（ＳＵＳ４３０、０．
２ｔ×８０ｗ）に、無光沢Ｎｉ、光沢Ｎｉ、無光沢Ｎｉ
の電解めっき層を各０．７μｍの厚さで順次形成し、全
体として２．１μｍの３層めっきを行った。各層の電解
Ｎｉめっきにて使用しためっきき浴の主組成を次の表１
に示す。 表１（めっき浴組成） 下層無光沢Ｎｉ 中間層光沢Ｎｉ 上層無光沢Ｎｉ Ａ ７００ｍＬ／Ｌ ７００ｍＬ／Ｌ ７００ｍＬ／Ｌ Ｂ １５ｇ／Ｌ １５ｇ／Ｌ １５ｇ／Ｌ Ｃ ３０ｇ／Ｌ ３０ｇ／Ｌ ３０ｇ／Ｌ Ｄ なし ３０ｍＬ／Ｌ なし Ｅ なし １ｍＬ／Ｌ なし ただし、Ａはスルファミン酸Ｎｉ（液体）、Ｂは塩化Ｎ
ｉ（粉体）、Ｃはホウ酸、Ｄは１次光沢剤（株式会社ム
ラタ製）、Ｅは２次光沢剤（株式会社ムラタ製）であ
る。以上のようにして得た電気接触材料（電解Ｎｉめっ
きされたステンレス鋼条）に対し、光沢度、折り曲げに
よるクラックの発生具合、接触抵抗値ついての評価をそ
れぞれ行ったところ、次の表２に示すような結果を得
た。 表２（実施例１の評価結果） 折り曲げ後の状態 クラックなし（良好） 光沢度 １．３（良好） 接触抵抗（製造直後） １．２ｍΩ（良好） 接触抵抗（６ヶ月後） ５．５ｍΩ（良好） なお、クラックの検査は倍率５００のＳＥＭ観察で行っ
た。接触抵抗は、被測定区間に一定電流を流しながら、
その被測定区間に現れる電圧（ＩＲ電圧）を測定する方
法、いわゆる４端子法により行った。(Example 1) In accordance with the flow of the electrolytic plating treatment shown in FIG.
2t x 80w), matte Ni, shiny Ni, matte Ni
Were sequentially formed with a thickness of 0.7 μm, and a total of 2.1 μm three-layer plating was performed. Table 1 shows the main composition of the plating bath used for electrolytic Ni plating of each layer.
Shown in Table 1 (Plating bath composition) Lower layer matte Ni Intermediate layer Ni Ni Upper layer matte Ni A 700 mL / L 700 mL / L 700 mL / LB 15 g / L 15 g / L 15 g / LC 30 g / L 30 g / L 30 g / LD None 30mL / L None E None 1mL / L None However, A is Ni sulfamate (liquid), B is N chloride
i (powder), C is boric acid, D is a primary brightener (manufactured by Murata), and E is a secondary brightener (manufactured by Murata). The electrical contact material (electrolytic Ni-plated stainless steel strip) obtained as described above was evaluated for glossiness, occurrence of cracks due to bending, and contact resistance. The results as shown are obtained. Table 2 (Evaluation results of Example 1) Condition after bending No crack (good) Gloss 1.3 (good) Contact resistance (immediately after production) 1.2 mΩ (good) Contact resistance (after 6 months) 5.5 mΩ ( In addition, cracks were inspected by SEM observation at a magnification of 500. The contact resistance is controlled by applying a constant current to the section to be measured.
The measurement was performed by a method of measuring a voltage (IR voltage) appearing in the section to be measured, a so-called four-terminal method.
【００１０】（実施例２）図３に示した電解めっき処理
フローにしたがい、ステンレス鋼条（ＳＵＳ４３０、
０．２ｔ×８０ｗ）に、無光沢Ｎｉめっき層１．０μ
ｍ、光沢Ｎｉめっき層０．４μｍ、無光沢Ｎｉめっき層
０．７μｍを順次形成し、全体として２．１μｍの３層
めっきを行った。このようにして得た電気接触材料に対
し、実施例１の場合と同様、光沢度、折り曲げによるク
ラックの発生具合、接触抵抗値ついての評価をそれぞれ
行ったところ、次の表３に示すような結果を得た。 表３（実施例２の評価結果） 折り曲げ後の状態 クラックなし（良好） 光沢度 １．２（良好） 接触抵抗（製造直後） １．３ｍΩ（良好） 接触抵抗（６ヶ月後） ５．３ｍΩ（良好） （実施例３）図３に示した電解めっき処理フローにした
がい、ステンレス鋼条（ＳＵＳ４３０、０．２ｔ×８０
ｗ）に、無光沢Ｎｉめっき層０．３μｍ、光沢Ｎｉめっ
き層１．０μｍ、無光沢Ｎｉめっき１．０μｍを順次形
成し、全体として２．３μｍの３層めっきを行った。こ
のようにして得た電気接触材料に対し、実施例１，２の
場合と同様に、光沢度、折り曲げによるクラックの発生
具合、接触抵抗値ついての評価をそれぞれ行ったとこ
ろ、次の表４に示すような結果を得た。 表４（実施例３の評価結果） 折り曲げ後の状態 クラックなし（良好） 光沢度 １．２（良好） 接触抵抗（製造直後） １．３ｍΩ（良好） 接触抵抗（６ヶ月後） ５．１ｍΩ（良好） 以上のように、無光沢Ｎｉめっき、光沢Ｎｉめっき、無
光沢Ｎｉめっきの３層構成を有する実施例１〜３の電気
接触材料では、折り曲げによるクラックの発生状態、仕
上げ面の光沢度、および接触抵抗のいずれについても良
好な結果を得ることができた。(Embodiment 2) In accordance with the electrolytic plating process flow shown in FIG. 3, a stainless steel strip (SUS430,
0.2t × 80w), matte Ni plating layer 1.0μ
m, a bright Ni plating layer 0.4 μm, and a matte Ni plating layer 0.7 μm were sequentially formed, and a total of 2.1 μm three-layer plating was performed. The electrical contact material thus obtained was evaluated for glossiness, degree of occurrence of cracks due to bending, and contact resistance in the same manner as in Example 1, and as shown in Table 3 below. The result was obtained. Table 3 (Evaluation results of Example 2) State after bending No crack (good) Gloss 1.2 (good) Contact resistance (immediately after production) 1.3 mΩ (good) Contact resistance (after 6 months) 5.3 mΩ ( (Example 3) (Example 3) A stainless steel strip (SUS430, 0.2t × 80) was used in accordance with the electrolytic plating process flow shown in FIG.
On w), a non-glossy Ni plating layer 0.3 μm, a bright Ni plating layer 1.0 μm, and a non-glossy Ni plating 1.0 μm were sequentially formed, and a total of 2.3 μm three-layer plating was performed. The electrical contact material thus obtained was evaluated for glossiness, degree of occurrence of cracks due to bending, and contact resistance in the same manner as in Examples 1 and 2, and the results are shown in Table 4 below. The results as shown are obtained. Table 4 (Evaluation results of Example 3) Condition after bending No crack (good) Gloss 1.2 (good) Contact resistance (immediately after production) 1.3 mΩ (good) Contact resistance (after 6 months) 5.1 mΩ ( Good) As described above, in the electrical contact materials of Examples 1 to 3 having the three-layer structure of the matte Ni plating, the bright Ni plating, and the matte Ni plating, the state of occurrence of cracks due to bending, the glossiness of the finished surface, Good results were obtained for both the contact resistance and the contact resistance.
【００１１】（比較例１）比較例１として、ステンレス
鋼条（ＳＵＳ４３０、０．２ｔ×８０ｗ）に、電解めっ
きにより２μｍの無光沢Ｎｉめっき層（単層）を形成
し、実施例１，２と同じ条件にて、光沢度、折り曲げに
よるクラックの発生具合、接触抵抗値ついての評価をそ
れぞれ行ったところ、次の表５に示すような結果となっ
た。 表５（比較例１の評価結果） 折り曲げ後の状態 クラックなし（良好） 光沢度 ０．６（劣る） 接触抵抗（製造直後） １．２ｍΩ（良好） 接触抵抗（６ヶ月後） ５．２ｍΩ（良好）Comparative Example 1 As Comparative Example 1, a 2 μm matte Ni plating layer (single layer) was formed on a stainless steel strip (SUS430, 0.2 t × 80 w) by electrolytic plating. Under the same conditions as in the above, the glossiness, the degree of occurrence of cracks due to bending, and the evaluation of the contact resistance value were evaluated, and the results shown in the following Table 5 were obtained. Table 5 (Evaluation results of Comparative Example 1) Condition after bending No crack (good) Gloss 0.6 (poor) Contact resistance (immediately after production) 1.2 mΩ (good) Contact resistance (after 6 months) 5.2 mΩ ( Good)
【００１２】（比較例２）比較例２として、ステンレス
鋼条（ＳＵＳ４３０、０．２ｔ×８０ｗ）に、電解めっ
きにより２μｍの光沢沢Ｎｉめっき層（単層）を形成
し、比較例１と同じ条件にて、光沢度、折り曲げによる
クラックの発生具合、接触抵抗値ついての評価をそれぞ
れ行ったところ、次の表６に示すような結果となった。 表６（比較例２の評価結果） 折り曲げ後の状態 クラック大（不良） 光沢度 １．７（良好） 接触抵抗（製造直後） ４０ｍΩ（劣る） 接触抵抗（６ヶ月後） １１８ｍΩ（不良） （比較例３）比較例３として、ステンレス鋼条（ＳＵＳ
４３０、０．２ｔ×８０ｗ）に、電解めっきにより光沢
沢Ｎｉめっき層を１μｍ、無光沢めっき層を１μｍの厚
さで順次形成し、全体として２μｍの２層めっきを行な
った。比較例１，２と同じ条件にて、光沢度、折り曲げ
によるクラックの発生具合、接触抵抗値ついての評価を
それぞれ行ったところ、次の表７に示すような結果とな
った。 表７（比較例３の評価結果） 折り曲げ後の状態 クラック大（不良） 光沢度 １．１（良好） 接触抵抗（製造直後） １．３ｍΩ（良好） 接触抵抗（６ヶ月後） ５．３ｍΩ（良好） この例では、光沢Ｎｉめっき層の下層に無光沢Ｎｉめっ
き層がないために、折り曲げ時に生じる歪みを吸収でき
ず、クラックの発生が大きくなったためと考えられる。
以上のように、比較例１〜３では、折り曲げによるクラ
ックの発生状態、仕上げ面の光沢度、および接触抵抗の
３項目のいずれかに難点があって、そのすべてを満足さ
せることはできなかった。つまり、電気接触材料として
要求される諸機能が不十分であった。Comparative Example 2 As Comparative Example 2, a 2 μm bright Ni plating layer (single layer) was formed on a stainless steel strip (SUS430, 0.2 t × 80 w) by electrolytic plating. When the glossiness, the degree of crack generation due to bending, and the contact resistance were evaluated under the conditions, the results shown in the following Table 6 were obtained. Table 6 (Evaluation results of Comparative Example 2) State after bending Large crack (poor) Gloss 1.7 (good) Contact resistance (immediately after production) 40 mΩ (poor) Contact resistance (after 6 months) 118 mΩ (poor) Example 3) As Comparative Example 3, a stainless steel strip (SUS
430, 0.2 t × 80 w), a bright Ni plating layer having a thickness of 1 μm and a matte plating layer having a thickness of 1 μm were sequentially formed by electrolytic plating, and a two-layer plating of 2 μm as a whole was performed. The glossiness, the degree of cracking due to bending, and the contact resistance were evaluated under the same conditions as in Comparative Examples 1 and 2, and the results shown in Table 7 below were obtained. Table 7 (Evaluation results of Comparative Example 3) State after bending Large crack (bad) Gloss 1.1 (good) Contact resistance (immediately after production) 1.3 mΩ (good) Contact resistance (after 6 months) 5.3 mΩ ( In this example, it is considered that, since there is no matte Ni plating layer below the bright Ni plating layer, the distortion generated at the time of bending could not be absorbed, and the occurrence of cracks increased.
As described above, in Comparative Examples 1 to 3, there were difficulties in any of the three items of the state of occurrence of cracks due to bending, the glossiness of the finished surface, and the contact resistance, and all of them could not be satisfied. . That is, various functions required as an electric contact material were insufficient.
【００１３】[0013]
【発明の効果】以上の説明で明らかなように、本発明
は、金属素材に、無光沢Ｎｉめっき層、光沢Ｎｉめっき
層、無光沢Ｎｉめっき層をそれぞれ、電解めっきにより
順次形成した３層めっき構成とすることにより、めっき
仕上げ面の光沢を確保しつつ、その表面での電気接触性
を良好にし、さらにプレスや絞り等の加工によるクラッ
クの発生を抑えることができ、これにより、外装ケース
等への利用に適した外観性、電極端子等への利用に適し
た電気接触性およびプレスや絞り等の加工性にすぐれた
電気接触材料を得ることができる。As is apparent from the above description, the present invention provides a three-layer plating method in which a matte Ni plating layer, a bright Ni plating layer, and a matte Ni plating layer are sequentially formed on a metal material by electrolytic plating. By adopting the configuration, it is possible to improve the electrical contact property on the surface of the plated surface while securing the luster of the plated finished surface, and to further suppress the occurrence of cracks due to processing such as pressing and drawing. Thus, it is possible to obtain an electrical contact material which is excellent in external appearance suitable for use in a device, electric contact property suitable for use in an electrode terminal and the like, and excellent in processability such as pressing and drawing.
【図１】本発明による電気接触材料の一実施形態を示す
模式的な断面図である。FIG. 1 is a schematic sectional view showing one embodiment of an electric contact material according to the present invention.
【図２】本発明の電気接触材料の適用例である電池ケー
スの概略断面図である。FIG. 2 is a schematic sectional view of a battery case as an application example of the electric contact material of the present invention.
【図３】本発明による電気接触材料を製造するための電
解めっき処理手順を示すフロー図である。FIG. 3 is a flowchart showing a procedure of an electrolytic plating process for producing an electric contact material according to the present invention.
１ 金属素材 ２１ 下層（無光沢Ｎｉめっき） ２２ 中間層（光沢Ｎｉめっき） ２３ 上層（無光沢Ｎｉめっき） ３ 電池ケース DESCRIPTION OF SYMBOLS 1 Metal material 21 Lower layer (matte Ni plating) 22 Intermediate layer (glossy Ni plating) 23 Upper layer (matte Ni plating) 3 Battery case
───────────────────────────────────────────────────── フロントページの続き (72)発明者 平岡 幸雄 東京都千代田区丸の内一丁目８番２号 同 和鉱業株式会社内 Ｆターム(参考） 4K024 AA03 AB03 BA04 BB09 BB25 BC01 GA02 GA08 GA16 5H011 AA09 AA12 CC06 CC10 DD03 DD09 KK01 ────────────────────────────────────────────────── ─── Continuing from the front page (72) Inventor Yukio Hiraoka 1-8-2 Marunouchi, Chiyoda-ku, Tokyo F-term in Dowa Mining Co., Ltd. 4K024 AA03 AB03 BA04 BB09 BB25 BC01 GA02 GA08 GA16 5H011 AA09 AA12 CC06 CC10 DD03 DD09 KK01
Claims (4)
が下層と中間層と上層の３層に形成されているととも
に、下層には無光沢ニッケルめっき層、中間層には光沢
ニッケルめっき層、上層には無光沢ニッケルめっき層が
それぞれ形成されていることを特徴とする電気接触材
料。An electroless nickel plating layer is formed on a metal material in three layers: a lower layer, an intermediate layer, and an upper layer. The lower layer has a matte nickel plating layer, the intermediate layer has a bright nickel plating layer, and the upper layer has a bright nickel plating layer. Is an electrical contact material having a matte nickel plating layer formed thereon.
合計膜厚が０．５〜１０μｍ、下層の膜厚が０．３μｍ
以上、中間層の膜厚が０．１〜１．０μｍ、上層の膜厚
が０．１〜１．０μｍであることを特徴とする請求項１
記載の電気接触材料。2. The total film thickness of the three nickel plating films is 0.5 to 10 μm, and the lower film thickness is 0.3 μm.
As described above, the thickness of the intermediate layer is 0.1 to 1.0 μm, and the thickness of the upper layer is 0.1 to 1.0 μm.
An electrical contact material as described.
を下層と中間層と上層の３層に形成するようにするとと
もに、下層には無光沢ニッケルめっき層、中間層には光
沢ニッケルめっき層、上層には無光沢ニッケルめっき層
をそれぞれ形成することを特徴とする電気接触材料の製
造方法。3. An electroless nickel plating layer is formed on a metal material in three layers: a lower layer, an intermediate layer, and an upper layer. The lower layer has a matte nickel plating layer, the intermediate layer has a bright nickel plating layer, and the upper layer has Forming a matte nickel plating layer.
合計膜厚が０．５〜１０μｍ、下層の膜厚が０．３μｍ
以上、中間層の膜厚が０．１〜１．０μｍ、上層の膜厚
が０．１〜１．０μｍであることを特徴とする請求項３
記載の電気接触材料の製造方法。4. A total film thickness of the three layers formed by nickel plating is 0.5 to 10 μm, and a lower layer has a thickness of 0.3 μm.
The thickness of the intermediate layer is 0.1 to 1.0 μm, and the thickness of the upper layer is 0.1 to 1.0 μm.
A method for producing the electrical contact material according to the above.
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| JP2000093692A JP4247338B2 (en) | 2000-03-30 | 2000-03-30 | Electrical contact material and manufacturing method thereof |
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|---|---|---|---|
| JP2000093692A JP4247338B2 (en) | 2000-03-30 | 2000-03-30 | Electrical contact material and manufacturing method thereof |
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| Publication Number | Publication Date |
|---|---|
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| WO2019111556A1 (en) * | 2017-12-07 | 2019-06-13 | 株式会社豊田自動織機 | Electricity storage device, method for producing electricity storage device, and electrolytic plating method |
| JPWO2019111556A1 (en) * | 2017-12-07 | 2020-12-24 | 株式会社豊田自動織機 | Power storage device, manufacturing method of power storage device, and electrolytic plating method |
| US11936046B2 (en) | 2017-12-07 | 2024-03-19 | Kabushiki Kaisha Toyota Jidoshokki | Electricity storage device, method for producing electricity storage device, and electrolytic plating method |
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