JP2001266783A - Element mapping apparatus, scanning transmission electron microscope, and element mapping method - Google Patents

Abstract

(57) [Problem] To provide a scanning transmission electron microscope provided with an element mapping device capable of acquiring a mapping image of a plurality of elements in real time when a measurement region and a plurality of measurement elements are designated. An electron beam transmitted through a sample is subjected to energy spectroscopy by an electron spectroscope, and an electron energy loss spectrum is detected by an electron beam detector. Adjust the optical system of the element mapping device to detect all core loss peaks of multiple elements to be measured, calculate the core loss peak electron beam intensity of each element for each element, and change the color of the calculation result of each element To display an image. [Effect] By simultaneously measuring the core loss peaks of a plurality of elements and observing the element distribution image using their electron beam intensities, a highly accurate element distribution of the plurality of elements can be obtained.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

The present invention relates to an element mapping apparatus, a scanning transmission electron microscope, and an element mapping method.

[0002]

2. Description of the Related Art Due to miniaturization and miniaturization of semiconductor devices and magnetic head elements, elements have a structure in which several NM (nanometer) thin films are stacked in a submicron region. Since the structure, element distribution, and crystal structure of such a minute region greatly affect the characteristics of the semiconductor element and the magnetic head element, it is important to analyze the minute region.

[0003] As a method for observing a minute region, there are a scanning electron microscope (SEM) and a transmission electron microscope (Transmission Electron Microscope: SEM).
TEM), Scanning Transmission Electron Microscope (Scanning Transmissio)
n Electron Microscope (STEM). TEM and ST have nanometer-level spatial resolution
EM. The TEM is a device that irradiates a sample with an electron beam almost in parallel, and enlarges the transmitted electron beam with a lens or the like. On the other hand, the STEM is a device that converges an electron beam on a minute area, measures the intensity of a transmitted electron beam while scanning the electron beam two-dimensionally on a sample, and acquires a two-dimensional image.

[0004] The intensity of transmitted electrons detected by TEM and STEM has a correlation with the average atomic number of a portion through which electrons have passed. Therefore, thin films of chromium (Cr), manganese (Mn), iron (Fe), cobalt (Co), nickel (Ni), and copper (Cu) having similar atomic numbers, and silicon oxide films and silicon having similar average atomic numbers A nitride film or the like cannot be identified.

In the case of a metal film, a two-dimensional image is obtained by X-ray fluorescence analysis to obtain Cr, Mn, Fe, Co, N
Although i and Cu can be identified, a long measurement time is required to obtain a two-dimensional image because the intensity of the detectable fluorescent X-ray is weak. X-ray fluorescence analysis is not suitable for light element analysis,
It is difficult to distinguish between a silicon oxide film and a silicon nitride film.

[0006] As an analysis method for solving these problems, electron energy loss spectroscopy (Electron Energy Loss Spectroscop) for analyzing the energy of transmitted electrons by an electron spectrometer.
y: EELS). When electrons pass through the sample, an energy loss peculiar to the element (electronic structure) constituting the sample occurs.
By forming a two-dimensional image, an oxide film or a nitride film of silicon, which cannot be identified by the TEM / STEM image, can be identified. These are a STEM and a parallel detection type electron energy loss spectrometer (Electron Energy L).
oss Spectrometer (EELS) is widely used.

EELS has a structure in which a fan-shaped magnetic sector is used as an electron spectrometer, a quadrupole electromagnetic lens and a hexapole electromagnetic lens are arranged before and after the sector, and a parallel detector is provided at the most downstream. The quadrupole electromagnetic lens is used for adjusting the focus of the EELS spectrum and expanding the EELS spectrum. 6
The dipole electromagnetic lens is used to reduce the aberration of the EELS spectrum projected on the detector. The EELS spectrum enlarged by the quadrupole electromagnetic lens is projected on a parallel detector, and a wide range of electron energy loss spectrum is measured.

Prior art relating to the structure of EELS is disclosed in, for example, US Pat. No. 4,743,756, and JP-A-7-2.
1966, JP-A-7-21967 and JP-A-7-29544.

[0009]

SUMMARY OF THE INVENTION Conventional EELS and ST
In an analyzer combined with EM, the user (1) designates a measurement place → (2) designates an element → (3) measures the energy intensity distribution of an electron beam with an electron beam detection unit → (4) backs up the detection unit Correct ground correction and gain → (5) Designate background area → (6) Power low model (I
= A × Exp [−r]) etc. → (7) Designation of integration area of signal intensity → (8) Display of signal intensity of specified element at measurement location on the image display device → It is necessary to repeat the operation (1) at all measurement points, and it takes a long time to obtain a two-dimensional image, and it is difficult to obtain an element distribution image in real time. Also, a method is conceivable in which after measuring the EELS spectrum at all measurement points, the user specifies (2) to (7) and obtains a two-dimensional image. In the case of this method, the amount of measured data becomes enormous, and an element distribution image cannot be obtained in real time.

When the element distribution image cannot be obtained in real time as described above, there are the following problems.

(A) For example, when analyzing the interface between a silicon oxide film and a nitride film, the analysis area (the interface between the oxide film and the nitride film) is identified in order to confirm the visual field with a TEM / STEM image. Can not. For this reason, until the EELS spectrum is measured and the element distribution image is obtained by analysis, it cannot be determined whether or not the analysis region includes the region to be measured.

(B) For example, in order to obtain a two-dimensional image of the analysis area, the measurement of the EELS spectrum and the above-mentioned operations (1) to (8) are required at each measurement point, so that much time is required for measurement and analysis. It is not suitable for work such as inspection for measuring a large number of samples because of the need for

(C) For example, when analyzing a cross section of a multilayer film, if the elements constituting each layer are observed for each image,
The positional relationship between the layers cannot be determined accurately.

In order to solve the above problems, it is essential to obtain an element distribution image in real time.

An object of the present invention is to provide an apparatus and a method capable of acquiring a distribution image of a plurality of elements in real time with an analyzer that combines EELS and STEM.

[0016]

SUMMARY OF THE INVENTION The present invention is characterized by an electron beam source for generating an electron beam, a scanning unit for scanning the electron beam,
An objective lens for converging the electron beam on the sample, an electron spectroscopy unit for performing energy spectroscopy of the electron beam, an electron beam detection unit for detecting a part or all of the electron beam separated by the electron spectroscopy unit, and an electron beam detector. Core loss peaks of all elements to be measured in a scanning transmission electron microscope equipped with an expanding magnetic field lens that expands the electron energy loss spectrum to be detected and an arithmetic unit that calculates using the electron beam intensity detected by the electron beam detector Has a control device that controls the expanding magnetic field lens so that it is detected by the electron beam detector, and simultaneously or in parallel with scanning the electron beam using the scanning unit, using an electron beam including a core loss peak of a plurality of elements The calculation result calculated for each element is displayed on the image display device.

A feature of the present invention is that, when observing a distribution image of a plurality of elements, a user (operator) is required to (1) specify a measurement place → (2) specify an element → (3) energy of an electron beam. The intensity distribution is measured by the electron beam detector → (4) background correction and gain of the detector are corrected → (5) background area designation → (6) power low model (I = A × E)
xp [-r]) etc. → (7) Designation of signal intensity integration area → (8)
Display the signal intensity of the specified element at the measurement location on the image display device → Repeat (1)
The user (operator) performs the operation of obtaining the element distribution image for each measurement element by performing (1) specifying the measurement area → (2) specifying all the elements to be measured at once, thereby performing other processing. Is performed on the device side. Thereby, an element distribution image of a plurality of specified elements can be obtained in real time. In addition, when the color to be displayed on the image is designated for each designated element, the distribution position of each element can be easily identified. Furthermore, when adjacent elements are mixed at the boundary of each element, the color of the specified element is mixed at the boundary, and the mixed state is quantitatively determined. What you can do is possible. In addition, improved operability
Measurement time can be reduced.

[0018]

Embodiments of the present invention will be described below with reference to the drawings.

FIG. 1 is a schematic configuration diagram of a main part of a scanning transmission electron microscope (also referred to as an electron microscope in this document) provided with an energy filter for an element mapping apparatus according to an embodiment of the present invention. FIG. 1A is a front view, and FIG.
FIG. 2A is a diagram (top view) viewed from the direction of the electron beam source 1. In the figure, the Z-contrast detector 21
Are described as the electron microscope body. Although not shown, the electron microscope main body includes a configuration for controlling scanning of an electron beam for functioning as an electron microscope. Also, a portion from the focus adjustment electromagnetic lens 16 to the electron beam detector 13 is described as an energy filter for an element mapping device. The control device 26 controls the magnifying magnetic field lens 15 and the accelerating tube 19 based on the information from the database 24 and takes in the electron beam intensity from the electron beam detector 13 and the signal from the electron beam scanning coil 3. The electron beam intensity signal from the electron beam detector 13 is sent to the calculation device 23, and the calculation result is transmitted to the control device 26. The calculation result refers to a signal from the electron beam scanning coil 3 and displays an element distribution image on the image display device 25. The element mapping device refers to a configuration including the control device 26, the arithmetic device 23, the database 24, and the image display device 25, but may also refer to a configuration including an energy filter for the element mapping device.

As the electron beam source 1, for example, a cold cathode field emission type electron beam source can be used.

An electron beam 2 generated by an electron beam source 1 is deflected by an electron beam scanning coil 3. The deflected electron beam 2 is converged on the surface of the sample 5 by the objective lens upper magnetic field 4, and forms a scanning object point 7 immediately after the objective lens lower magnetic field 6. The scanning object point 7 does not move even when the electron beam 2 is scanned on the sample surface using the electron beam scanning coil 3.

The electron beam diffracted by the sample forms an image object point 9 in front of the imaging lens 8. The image point 9 moves when the electron beam 2 is scanned, but the transmitted electrons (TE) formed at the image point 9 are moved.
M) The image does not move. In a normal EELS, this image object point 9 is connected to an object point 10 by an imaging lens 8, and EELS is used as a virtual light source.
The spectrum is being measured. In this embodiment, an image of the scanning object point 7 is formed on the object point 10 by the imaging lens 8 to form a virtual light source. EE
This is because in the LS measurement, when the position of the light source moves, the aberration condition of the electron spectroscopic device 11 changes, which is not suitable for measurement with high energy stability.

The electron beam using the object point 10 as a virtual light source enters a fan-shaped electron spectroscope 11 installed downstream. The magnetic field of the magnet constituting the electron spectroscope 11 forms a magnetic field space perpendicular to the plane of FIG. The electron beam incident on the electron spectroscope 11 is deflected by 90 ° and energy-spectroscopy is performed.
Focus on energy dispersive surface 12. In this embodiment, the energy dispersion surface 12 is on the electron beam detector 13.

In this embodiment, the spectrum formed on the energy dispersion surface 12 is about 1 eV / μm when the electron beam of the electron spectroscope 11 has a turning radius of 100 mm. This is magnified 100 times by the magnifying magnetic field lens 15. At this time, the magnetic field of the focus adjustment electromagnetic lens 16 is adjusted so that the focus position of the magnifying magnetic field lens 15 coincides with the energy dispersion surface 12. Thus, the EELS spectrum 18 projected on the electron beam detector 13 becomes 0.01 eV / μm. 25
If a multi-channel plate array of μm / channel is used as the electron beam detector 13, it will be 0.25 eV / channel. Since the detector is composed of 1024 channels, the full range is about 250 eV.

The focus adjusting electromagnetic lens 1 of the present embodiment.
The part composed of 6, the electron spectroscopy device 11, the expanding magnetic field lens 15, and the electron beam detector 13 is called an energy filter for an element mapping device. The energy filter for the element mapping device is configured so that the zero-loss electron beam comes to the center of the electron beam detector 13. The intensity of an electron beam that has lost 250 eV or more, such as a core-loss electron beam, is measured by accelerating the electron beam with an acceleration tube 19 installed inside the electron spectroscope 11. When measuring the intensity of a 500 eV loss electron beam, 500 V is applied to the accelerating tube to accelerate the loss electrons. Thus, the loss electron beam to be measured can be brought to the center of the detector 13.

The conditions necessary when mapping a plurality of elements in real time are that the core loss peak of each of the plurality of elements can be seen and that the electron beam having the same energy loss during the measurement is focused on the same place of the electron beam detector. It is.

Next, an embodiment of a method for mapping a plurality of elements in real time using this embodiment will be described.

An example of a process for obtaining an element mapping image will be described with reference to FIG.

Conventionally, the user selects (1) an analysis element →
(2) Investigate electron beam loss energy → (3) EELS
Voltage adjustment of the drift tube of the device → (4) Spectrum confirmation → (5) Designation of analysis area → (6) Measurement of electron beam energy loss distribution → (7) Background correction and gain correction of detection means → (8) Back Designation of ground area → (9) Power low model (I = A × Exp [-r])
Specify background fitting function such as → (1
0) Designation of integration area of signal intensity → (11) Display of signal intensity of specified element at measurement location on image display device → Repeat (1) for each measurement location and measurement element. An element distribution image was obtained.

In the embodiment of the present invention, the operator (1) designates a plurality of elements and designates a color for displaying each element on the image display device 201 → (4) spectrum confirmation process 204 →
(5) It suffices to be involved in the analysis region designation process 205, which is the process of designating the measurement region. Other processes are (2) check the electron beam loss energy → (3) adjust the voltage of the drift tube of the EELS device → (6) Measurement of electron beam energy intensity distribution including core loss peaks of multiple elements →
(7) Background correction and gain correction of detection means →
(8) Designation of background area → (9) Designation of background fitting function such as power low model (I = A × Exp [−r]) → (10) Designation of integration area of signal intensity for each element → (11) The signal intensity of each element at the measurement location is displayed on the image display device in the designated color. → (1) The processing of the electron microscope body and the energy filter for the element mapping device under the control of the arithmetic unit 23 And the measurement process is executed, so that an element distribution image of the specified plural elements can be obtained in real time.

In other words, as shown in FIG.
(1) A process 201 of designating a plurality of analysis elements and designating a color for image display for each element, (2) a process 202 of examining an EELS table which is a process of examining electron beam loss energy for each element, (3) A) Drift tube voltage adjustment process 20 for adjusting the drift tube voltage
3, (4) a spectrum confirmation process 204, which is a process for confirming the spectrum, and (5) an analysis region designation process 205, which is a process for designating the analysis region.

Further, (6) the measurement process 206 for measuring the electron beam loss energy intensity distribution of each element is executed by repeating the following processes 207 to 212. First, the spectrum acquisition process 207, which is a process of acquiring a spectrum, may include a process of correcting the background and a gain of the electron beam detector 13. (8) In the background correction 208, a process of specifying a background area and a background fitting function is performed.

In the process 209 for calculating the difference between the intensities, the integration region of the signal intensity is specified. Thereafter, (11) an element mapping image display process 210 for displaying the signal intensity of the specified element at the specified measurement location on the image display device is performed. A measurement completion determination process 211 for determining whether measurement has been completed based on whether or not all the measurement points have been measured is performed. If the measurement has not been completed (NO in the figure), a process 212 for changing the electron beam irradiation position on the sample is performed. After that, the process returns to the process 207. If the measurement has been completed (YES in the figure), the element distribution image of a plurality of elements in the analysis region is obtained, and the measurement ends.

FIG. 3 shows the shape of the EELS spectrum of core loss electrons. Core-loss electrons are electrons that have lost element-specific energy when an electron beam excites inner-shell electrons of an atom.

As shown in FIG. 3A, when the core loss spectrum is measured with the range immediately before the core loss peak 27 (pre-window 28) and immediately after the core loss peak (post-window 29) as one window (two-window method), the window And the energy width between the two windows must be determined. The database 24 holds, as data, conditions of core loss energy (eV), window width (number of channels), and window interval (number of channels) corresponding to each element.

The user designates a plurality of measurement elements, and designates a color for image display for each element. The voltages applied to the magnifying magnetic field lens and the accelerating tube 19 are adjusted so that all of the core loss energy of the specified element can be detected by the electron beam detector. The window width and window interval for each element provided by the database 24 are transmitted to the control device 26.
In the control device 26, all the elements to be measured are stored in the electron beam detector 13
The window width and the window interval of each element are applied to the electron beam detector 13 so that the electron beam can be detected. The electron beam intensity obtained from the two windows is calculated by the arithmetic unit 23 using an electron beam detector.
13 After correcting the inherent background and gain,
The arithmetic unit 23 calculates the window intensity ratio for each element, and transmits the calculation result to the control unit 26. The calculation result of each element is displayed on the image display device 25 in a color designated for each element on the basis of a signal from the electron beam scanning coil 3. By performing such processing, an element distribution image of a plurality of elements can be obtained in real time. According to this method, an element distribution image of a plurality of elements without influence of the background can be obtained in a short calculation time.

The three-window method will be described with reference to FIG. Similarly to the two-window method described with reference to FIG. 3A, the database 24 holds condition data of core loss energy (eV), window width (number of channels), and window interval (number of channels).

The user designates a plurality of measurement elements, and designates a color for image display for each element. The voltage applied to the expanding magnetic field lens and the accelerating tube 19 is adjusted so that all the core loss energies of the specified element can be detected by the electron beam detector. The data of the window width and window interval for each element provided by the database 24 is transmitted to the control device 26. The control device 26 applies the window width and window interval of each element to the electron beam detector 13 so that the core loss peaks of all the elements to be measured can be detected by the electron beam detector 13 (see FIG. 3B). ), Measure the EELS spectrum and correct the detector-specific background and gain. For each element, the electron beam intensity of the two windows (pre-1 window 30, pre-2 window 31) on the lower energy side than the core loss of each element is calculated using a power-low model (I × = A × E).
xp [−r]) to calculate the background 32 of one window on the higher energy side than the core loss of each element. For each element, the result obtained by subtracting the background 32 of each element calculated for each element from the electron beam intensity of the post window 29 on the higher energy side than the core loss of each element is the same as in the two-window method. The image is displayed on the image display device 25 in a designated color every time. By performing this operation in conjunction with the signal of the electron beam scanning coil 3 of the electron microscope main body, it is possible to obtain an element distribution image of a plurality of elements in real time.

As an example of the information of the core loss peak 27 included in the database 24, in the case of iron (Fe), EL2:
721 eV, EL3: 708 eV, two-window method: W
1:50 channels, ΔW: 4 channels, W2: 50
Channel, 3-window method: W1: 25 channel,
ΔW12: 0 channel, W2: 25 channel, ΔW
23: 2 channel and W3: 50 channel. The width (W) and interval (ΔW) of the window may be an energy width instead of the number of channels.

In this embodiment, a multi-channel plate array is used as the electron beam detector 13, but scintillation detectors 61 to 63 adapted to each window width may be used (see FIG. 4). In this case, a scintillation detector may be mounted according to the number of elements to be measured. Using a set of scintillation detectors in FIG. 4, a two-dimensional element distribution image is created by a three-window method. Referring to FIG. 3B, the scintillation detector 61 is the pre-1 window 30, and the scintillation detector 62 is the pre-1 window 3.
1. The scintillation detector 63 corresponds to the post window 29. The scintillation detectors 61 to 63 convert the intensity of the incident electron beam into an electric signal and input the electric signal to the control device 26.

In the control device 26, a scintillation detector
The electron beam intensities I1, I2 and I3 incident on 61 to 63 are transmitted to the arithmetic unit 23. The arithmetic unit 23 determines the background electron beam intensity by applying the electron beam intensity I1 and I2 to the power-low model, and obtains a difference from the electron beam intensity I3 detected by the scintillation detector 63 to quantitatively determine the element distribution image. Can be requested. By arranging a plurality of such sets of the scintillation detectors 61 to 63,
An element distribution image of a plurality of elements can be observed.

Using the element mapping apparatus of this embodiment,
FIG. 5 shows an example of measuring a semiconductor element. Sample is DRAM
(Dynamic Random Access Memory), in which a silicon oxide film and a silicon nitride film are used as insulating films. Conventionally, two-dimensional distribution images of oxygen and nitrogen can be obtained independently of each other. However, regarding the positional relationship between the silicon oxide film and the silicon nitride film,
It could not be known from the dimensional distribution image. However, according to the present embodiment, two distributions of oxygen and nitrogen can be obtained by one measurement. Therefore, the positional relationship between the silicon oxide film and the silicon nitride film can be clarified with a resolution of nanometer or less.

The features of the present invention are as follows.

1. An electron beam source for generating an electron beam, a scanning unit for scanning the electron beam, an objective lens for converging the electron beam on a sample, an electron dispersing unit for dispersing the energy of the electron beam, and dispersing by the electron dispersing unit. An electron beam detection unit for detecting a part or all of the electron beam,
In a scanning transmission electron microscope, an expanding magnetic field lens for expanding an energy loss spectrum detected by the electron beam detector, and the expanding so that an energy loss spectrum detected by the electron beam detector includes core loss peaks of a plurality of elements. A control device for controlling a magnetic lens, and a calculation device for calculating using an electron beam intensity including at least the core loss peaks of the plurality of elements detected by the electron beam detection unit, wherein the electron beam is transmitted using the scanning unit. An energy filter for an element mapping device, wherein the calculation result for each element is displayed on an image display device at the same time as scanning by an arithmetic unit, and a scanning transmission electron microscope including the same.

2. The above 1. The scanning transmission electron microscope described above allows a user to (1) specify a measurement area → (2) specify a plurality of elements and a color for displaying each element, thereby obtaining an element distribution image of the specified plurality of elements. An energy filter for an element mapping device, which is obtained in real time, and a scanning transmission electron microscope including the same.

3. The above 1. The scanning transmission electron microscope described has a database of core loss energies of a plurality of elements, and after obtaining core loss energies of a plurality of specified elements from the database, the electron spectroscopy unit and the electron beam detection unit are connected to the plurality of elements. The controller automatically adjusts the electron optical system so that the electron beam of all core loss energies is detected, and simultaneously scans the electron beam with the scanning unit, the core loss energy of each element for each specified element. The electron beam intensity immediately before and immediately after is measured by the electron beam detector, using the arithmetic device, performs background correction and gain correction of the electron beam detector, for each element,
The electron beam intensity immediately after the core loss energy of each element is divided by the electron beam intensity immediately before the core loss energy of each element,
An energy filter for an element mapping device, wherein the obtained calculation result for each element is used in the image display device in real time using colors for each specified element, and a scanning transmission electron microscope including the same.

4. The above 1. The scanning transmission electron microscope described has a database of core loss energies of a plurality of elements, and after obtaining the core loss energies of the specified plurality of elements from the database, the electron spectroscopy unit and the electron beam detection unit are designated. The electron optical system is automatically adjusted by the control device so that the electron beam of the core loss energy of all of the plurality of elements is detected, and the electron beam is scanned by the scanning unit. The electron beam intensity immediately before the energy is measured using the electron beam detection unit, and the electron beam intensity immediately after the core loss energy of each element is measured for each specified element using the electron beam detection unit. The arithmetic unit performs background correction and gain correction of the electron beam detection unit, and calculates the background of the electron beam intensity immediately after the core loss energy of each element from the electron beam intensity distribution immediately before the core loss energy of each element for each element. And automatically corrects the electron beam intensity immediately after the core loss energy of each element, and displays the obtained calculation result for each element on the image display device in real time with the color of each specified element. An energy filter for an element mapping device, and a scanning transmission electron microscope including the same.

5. An electron beam source for generating an electron beam, a scanning unit for scanning the electron beam, an objective lens for converging the electron beam on a sample, an electron dispersing unit for dispersing the energy of the electron beam, and dispersing by the electron dispersing unit. An electron beam detection unit for detecting a part or all of the electron beam,
In a transmission electron microscope, the above-mentioned 1. From 4. A transmission electron microscope comprising the energy filter for element mapping according to any one of the preceding claims.

[0049]

According to the present invention, it is possible to provide an apparatus and a method capable of obtaining an element distribution image of a plurality of elements in real time with an analyzer combining EELS and STEM.

[Brief description of the drawings]

FIG. 1 is a schematic configuration diagram of a main part of an embodiment of the present invention.

FIG. 2 is a diagram showing an example of a process for obtaining an element mapping image.

FIG. 3 is a diagram showing an example of an EELS spectrum of core loss electrons.

FIG. 4 is a diagram showing a relationship between a scintillation detector and an EELS spectrum.

FIG. 5 is a diagram showing an example of observing an oxygen and nitrogen element distribution image of a semiconductor element.

[Explanation of symbols]

DESCRIPTION OF SYMBOLS 1 ... Electron beam source, 2 ... Electron beam, 3 ... Electron beam scanning coil, 4
... Magnetic field above the objective lens, 5... Sample, 6... Magnetic field below the objective lens, 7... Scanning object point, 8.
0: Object point, 11: Electron spectroscope, 12: Energy dispersion surface, 13: Electron beam detector, 15: Magnifying lens, 16
... Electromagnetic lens for focus adjustment, 18 ... EELS spectrum, 19 ... Accelerator tube, 20 ... Secondary electron detector, 21 ... Z
Contrast detector, 23 arithmetic unit, 24 database, 25 image display unit, 26 control unit, 27 unit
Core loss peak, 28 pre window, 29 post window, 30 pre 1 window, 31 pre 2 window, 32 background, 61 scintillation detector corresponding to pre 1 window, 62 corresponding to pre 2 window Scintillation detector, 63
… Scintillation detector corresponding to the post window.

 ──────────────────────────────────────────────────続 き Continuing on the front page (72) Inventor Toshiriku Tatani 882-mo, Oita-shi, Hitachinaka-shi, Ibaraki Prefecture Within the Hitachi Measuring Instruments Group, Inc. Hitachi, Ltd. Measuring Instruments Group (72) Inventor, Shigetoshi Sunagozawa 882, Oji-shi, Hitachinaka-shi, Ibaraki Prefecture F-term in Hitachi, Ltd. Measuring Instruments Group (Reference) 2G001 AA03 BA12 CA03 DA01 DA02 DA06 DA08 EA05 FA06 FA09 FA25 GA01 GA04 GA06 JA13 KA01 LA11 5C033 SS03 SS04 SS07 SS08 SS10

Claims (4)

[Claims] 1. An electron spectroscopy unit for performing energy spectroscopy of an electron beam, an electron beam detection unit for detecting a part or all of the electron beams separated by the electron spectroscopy unit, and detecting by the electron beam detector. An expanding magnetic field lens that expands an energy loss spectrum, a storage unit that stores a database of core loss energies of elements to be analyzed, and an arithmetic unit that calculates based on an output of the electron beam detection unit and an output of the storage unit. An element mapping device having an image display device that displays a calculation result of the arithmetic device.The energy loss spectrum detected by the electron beam detector controls the magnifying magnetic field lens so that a core loss peak of a plurality of elements is included. The result of each element calculated by the arithmetic device using the electron beam intensity including the core loss peak of each of the plurality of elements, Element mapping apparatus characterized by comprising a control device to be displayed on the same location of the image of the image display device. 2. The element mapping device according to claim 1,
An element comprising: a scanning transmission electron microscope including an electron beam source that generates an electron beam, a scanning unit that controls scanning of the electron beam, and an objective lens that converges the electron beam on a sample. Scanning transmission electron microscope equipped with a mapping device. 3. A process for designating a measurement region and a plurality of measurement elements, a process of obtaining core loss energy data of the designated plurality of elements from the storage unit, and measuring a core loss spectrum of the designated plurality of elements. Processing, a process for correcting the gain specific to the measuring device, and, for each of the plurality of specified elements, dividing by the electron beam intensity before and after each of the core loss peaks in the core loss spectrum, and calculating for each of the obtained elements An element mapping method characterized by displaying a result. 4. A process of designating a measurement region and a plurality of measurement elements, a process of obtaining data of core loss energies of the plurality of designated elements from the storage unit, and measuring a core loss spectrum of the designated plurality of elements. Processing, a process of correcting the gain specific to the measurement device, and, for each of a plurality of specified elements, from the electron beam intensity distribution immediately before the core loss energy, calculate the background of the electron beam intensity immediately after the core loss energy, An element mapping method, comprising: performing a process of subtracting the background electron beam intensity from the electron beam intensity immediately after core loss energy, and displaying the obtained calculation result for each element.