JP2001226564A - Epoxy resin composition and semiconductor device - Google Patents
Epoxy resin composition and semiconductor deviceInfo
- Publication number
- JP2001226564A JP2001226564A JP2000179972A JP2000179972A JP2001226564A JP 2001226564 A JP2001226564 A JP 2001226564A JP 2000179972 A JP2000179972 A JP 2000179972A JP 2000179972 A JP2000179972 A JP 2000179972A JP 2001226564 A JP2001226564 A JP 2001226564A
- Authority
- JP
- Japan
- Prior art keywords
- epoxy resin
- red phosphorus
- resin composition
- flame retardant
- semiconductor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000003822 epoxy resin Substances 0.000 title claims abstract description 51
- 229920000647 polyepoxide Polymers 0.000 title claims abstract description 51
- 239000000203 mixture Substances 0.000 title claims abstract description 31
- 239000004065 semiconductor Substances 0.000 title claims abstract description 25
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims abstract description 35
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 claims abstract description 33
- 239000003063 flame retardant Substances 0.000 claims abstract description 33
- 239000005011 phenolic resin Substances 0.000 claims abstract description 22
- 229910000000 metal hydroxide Inorganic materials 0.000 claims abstract description 19
- 150000004692 metal hydroxides Chemical class 0.000 claims abstract description 19
- 239000002245 particle Substances 0.000 claims abstract description 17
- 239000006104 solid solution Substances 0.000 claims abstract description 16
- 229920001568 phenolic resin Polymers 0.000 claims abstract description 10
- 239000011248 coating agent Substances 0.000 claims abstract description 9
- 238000000576 coating method Methods 0.000 claims abstract description 9
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 claims abstract description 8
- WNROFYMDJYEPJX-UHFFFAOYSA-K aluminium hydroxide Chemical compound [OH-].[OH-].[OH-].[Al+3] WNROFYMDJYEPJX-UHFFFAOYSA-K 0.000 claims abstract description 7
- 239000011256 inorganic filler Substances 0.000 claims abstract description 6
- 229910003475 inorganic filler Inorganic materials 0.000 claims abstract description 6
- 229910021645 metal ion Inorganic materials 0.000 claims abstract description 3
- 238000005538 encapsulation Methods 0.000 claims description 4
- OBSZRRSYVTXPNB-UHFFFAOYSA-N tetraphosphorus Chemical compound P12P3P1P32 OBSZRRSYVTXPNB-UHFFFAOYSA-N 0.000 claims description 3
- 238000006243 chemical reaction Methods 0.000 claims description 2
- 229910000679 solder Inorganic materials 0.000 abstract description 11
- 238000000465 moulding Methods 0.000 abstract description 10
- 229910052736 halogen Inorganic materials 0.000 abstract description 9
- 150000002367 halogens Chemical class 0.000 abstract description 9
- 238000003860 storage Methods 0.000 abstract description 9
- 238000007789 sealing Methods 0.000 abstract 2
- 150000001875 compounds Chemical class 0.000 abstract 1
- 239000000243 solution Substances 0.000 abstract 1
- 229920005989 resin Polymers 0.000 description 9
- 239000011347 resin Substances 0.000 description 9
- 150000001463 antimony compounds Chemical class 0.000 description 8
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 7
- 238000000034 method Methods 0.000 description 7
- 238000001721 transfer moulding Methods 0.000 description 6
- 230000000694 effects Effects 0.000 description 5
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 5
- 229920003986 novolac Polymers 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 238000010521 absorption reaction Methods 0.000 description 4
- 238000013329 compounding Methods 0.000 description 4
- 238000002156 mixing Methods 0.000 description 4
- 150000002989 phenols Chemical class 0.000 description 4
- 238000012360 testing method Methods 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- 239000004593 Epoxy Substances 0.000 description 3
- 239000000654 additive Substances 0.000 description 3
- 238000002485 combustion reaction Methods 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 230000002950 deficient Effects 0.000 description 3
- 125000003700 epoxy group Chemical group 0.000 description 3
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 2
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Chemical compound P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 description 2
- IFVTZJHWGZSXFD-UHFFFAOYSA-N biphenylene Chemical group C1=CC=C2C3=CC=CC=C3C2=C1 IFVTZJHWGZSXFD-UHFFFAOYSA-N 0.000 description 2
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 2
- 239000006229 carbon black Substances 0.000 description 2
- 238000003763 carbonization Methods 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 229930003836 cresol Natural products 0.000 description 2
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 2
- 239000010419 fine particle Substances 0.000 description 2
- 238000004898 kneading Methods 0.000 description 2
- 229910044991 metal oxide Inorganic materials 0.000 description 2
- 150000004706 metal oxides Chemical class 0.000 description 2
- 239000000178 monomer Substances 0.000 description 2
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 239000003566 sealing material Substances 0.000 description 2
- 230000002195 synergetic effect Effects 0.000 description 2
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 2
- 239000001993 wax Substances 0.000 description 2
- LXBGSDVWAMZHDD-UHFFFAOYSA-N 2-methyl-1h-imidazole Chemical compound CC1=NC=CN1 LXBGSDVWAMZHDD-UHFFFAOYSA-N 0.000 description 1
- 229930185605 Bisphenol Natural products 0.000 description 1
- 101100321669 Fagopyrum esculentum FA02 gene Proteins 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 239000006087 Silane Coupling Agent Substances 0.000 description 1
- PJANXHGTPQOBST-VAWYXSNFSA-N Stilbene Natural products C=1C=CC=CC=1/C=C/C1=CC=CC=C1 PJANXHGTPQOBST-VAWYXSNFSA-N 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 238000005054 agglomeration Methods 0.000 description 1
- 230000002776 aggregation Effects 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 229910000410 antimony oxide Inorganic materials 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 235000010290 biphenyl Nutrition 0.000 description 1
- 239000004305 biphenyl Substances 0.000 description 1
- 239000004203 carnauba wax Substances 0.000 description 1
- 235000013869 carnauba wax Nutrition 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 230000000295 complement effect Effects 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000000748 compression moulding Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 239000007822 coupling agent Substances 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 229910002026 crystalline silica Inorganic materials 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000018044 dehydration Effects 0.000 description 1
- 238000006297 dehydration reaction Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- WUOBERCRSABHOT-UHFFFAOYSA-N diantimony Chemical compound [Sb]#[Sb] WUOBERCRSABHOT-UHFFFAOYSA-N 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 239000005350 fused silica glass Substances 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 238000001746 injection moulding Methods 0.000 description 1
- VTRUBDSFZJNXHI-UHFFFAOYSA-N oxoantimony Chemical compound [Sb]=O VTRUBDSFZJNXHI-UHFFFAOYSA-N 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910000073 phosphorus hydride Inorganic materials 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229920000137 polyphosphoric acid Polymers 0.000 description 1
- 238000010298 pulverizing process Methods 0.000 description 1
- 230000000979 retarding effect Effects 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 229920002545 silicone oil Polymers 0.000 description 1
- 229920002379 silicone rubber Polymers 0.000 description 1
- PJANXHGTPQOBST-UHFFFAOYSA-N stilbene Chemical compound C=1C=CC=CC=1C=CC1=CC=CC=C1 PJANXHGTPQOBST-UHFFFAOYSA-N 0.000 description 1
- 235000021286 stilbenes Nutrition 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- -1 tetraphenylborate Chemical compound 0.000 description 1
- USFPINLPPFWTJW-UHFFFAOYSA-N tetraphenylphosphonium Chemical compound C1=CC=CC=C1[P+](C=1C=CC=CC=1)(C=1C=CC=CC=1)C1=CC=CC=C1 USFPINLPPFWTJW-UHFFFAOYSA-N 0.000 description 1
- 150000003918 triazines Chemical class 0.000 description 1
Landscapes
- Compositions Of Macromolecular Compounds (AREA)
- Epoxy Resins (AREA)
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、ハロゲン系難燃
剤、アンチモン化合物を含まず、難燃性、高温保管特性
に優れた半導体封止用エポキシ樹脂組成物、及び半導体
装置に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an epoxy resin composition for semiconductor encapsulation which does not contain a halogen-based flame retardant and an antimony compound and has excellent flame retardancy and high-temperature storage characteristics, and a semiconductor device.
【0002】[0002]
【従来の技術】従来、ダイオード、トランジスタ、集積
回路等の電子部品は、主にエポキシ樹脂組成物で封止さ
れている。これらのエポキシ樹脂組成物中には、難燃性
を付与するためにハロゲン系難燃剤、及びアンチモン化
合物が配合されている。ところが、環境・衛生の点から
ハロゲン系難燃剤、及びアンチモン化合物を使用しない
で、難燃性に優れたエポキシ樹脂組成物の開発が要求さ
れている。又、ハロゲン系難燃剤及びアンチモン化合物
を含むエポキシ樹脂組成物で封止された半導体装置を高
温下で保管した場合、これらの難燃剤成分から熱分解し
たハロゲン化物が遊離し、半導体素子の接合部を腐食
し、半導体装置の信頼性を損なうことが知られており、
難燃剤としてハロゲン系難燃剤とアンチモン化合物を使
用しなくても難燃グレードがUL94のV−0を達成で
きるエポキシ樹脂組成物が要求されている。2. Description of the Related Art Conventionally, electronic components such as diodes, transistors, and integrated circuits are mainly sealed with an epoxy resin composition. These epoxy resin compositions contain a halogen-based flame retardant and an antimony compound in order to impart flame retardancy. However, development of an epoxy resin composition having excellent flame retardancy without using a halogen-based flame retardant and an antimony compound is demanded from the viewpoint of environment and hygiene. Further, when a semiconductor device sealed with an epoxy resin composition containing a halogen-based flame retardant and an antimony compound is stored at a high temperature, a thermally decomposed halide is liberated from these flame retardant components and the semiconductor element is bonded. Is known to corrode the semiconductor device and impair the reliability of the semiconductor device.
There is a need for an epoxy resin composition that can achieve a flame retardant grade of UL94 V-0 without using a halogen-based flame retardant and an antimony compound as the flame retardant.
【0003】このように、半導体装置を高温下(例え
ば、185℃等)に保管した後の半導体素子の接合部
(ボンディングパッド部)の耐腐食性のことを高温保管
特性といい、この高温保管特性を改善する手法として
は、五酸化二アンチモンを使用する方法(特開昭55−
146950号公報)や、酸化アンチモンと有機ホスフ
ィンとを組み合わせる方法(特開昭61−53321号
公報)等が提案され、効果が確認されているが、最近の
半導体装置に対する高温保管特性の高い要求レベルに対
して、エポキシ樹脂組成物の種類によっては不満足なも
のもある。又、難燃剤として赤燐系難燃剤が提案されて
おり、多量に添加することにより難燃グレードV−0を
達成でき、高温保管特性も問題ないが、添加量が多いこ
とによる燐酸イオンの発生により耐湿信頼性、成形性、
耐半田クラック性が低下するという問題がある。前記欠
点を改良した技術として、特定の金属水酸化物と特定の
金属酸化物の併用、或いは特定の金属水酸化物と特定の
金属酸化物の複合化金属水酸化物を用いることにより、
難燃性と耐湿信頼性を解決する提案がされているが(特
開平10−251486号公報、特開平11−1194
5号公報等)、十分な難燃性を発現させるためには、多
量の添加を必要とし、そのため成形性、耐半田クラック
性の低下を引きおこす問題がある。即ち、難燃性を維持
し、成形性、高温保管特性、耐湿信頼性及び耐半田クラ
ック性に優れ、ハロゲン系難燃剤、及びアンチモン化合
物を使用しないエポキシ樹脂組成物が求められている。[0003] As described above, the corrosion resistance of the bonding portion (bonding pad portion) of a semiconductor element after storing a semiconductor device at a high temperature (for example, 185 ° C or the like) is called high-temperature storage characteristics. As a method for improving the characteristics, a method using diantimony pentoxide (Japanese Patent Laid-Open No.
146950) and a method of combining antimony oxide with an organic phosphine (Japanese Patent Application Laid-Open No. 61-53321) have been proposed and their effects have been confirmed. On the other hand, some types of epoxy resin compositions are not satisfactory. Also, a red phosphorus-based flame retardant has been proposed as a flame retardant. A flame retardant grade V-0 can be achieved by adding a large amount thereof, and there is no problem in high-temperature storage characteristics. Moisture resistance reliability, moldability,
There is a problem that solder crack resistance is reduced. As a technique for improving the above-mentioned disadvantages, by using a combination of a specific metal hydroxide and a specific metal oxide, or by using a composite metal hydroxide of a specific metal hydroxide and a specific metal oxide,
There have been proposals to solve the flame retardancy and the moisture resistance reliability (JP-A-10-251486, JP-A-11-1194).
No. 5), in order to exhibit sufficient flame retardancy, a large amount of addition is required, and therefore, there is a problem that the moldability and the solder crack resistance are reduced. That is, there is a need for an epoxy resin composition that maintains flame retardancy, is excellent in moldability, high-temperature storage characteristics, moisture resistance reliability, and solder crack resistance, and does not use a halogen-based flame retardant and an antimony compound.
【0004】[0004]
【発明が解決しようとする課題】本発明は、ハロゲン系
難燃剤、及びアンチモン化合物を含まず成形性、難燃
性、高温保管特性、耐湿信頼性及び耐半田クラック性に
優れた半導体封止用エポキシ樹脂組成物、及びこれを用
いて半導体素子を封止してなる半導体装置を提供するも
のである。SUMMARY OF THE INVENTION The present invention is directed to a semiconductor encapsulation which does not contain a halogen-based flame retardant and an antimony compound and has excellent moldability, flame retardancy, high-temperature storage characteristics, moisture resistance reliability and solder crack resistance. An epoxy resin composition and a semiconductor device obtained by encapsulating a semiconductor element using the same are provided.
【0005】[0005]
【課題を解決するための手段】本発明は、(A)エポキ
シ樹脂、(B)フェノール樹脂、(C)硬化促進剤、
(D)無機充填材、(E)一般式(1)で示される金属
水酸化物固溶体、及び(F)赤燐の表面を水酸化アルミ
ニウムで被覆した後、更にその表面をフェノール樹脂で
被覆したもので、平均粒径が平均粒径が0.1〜70μ
m、最大粒径が200μm以下である赤燐系難燃剤を必
須成分とし、 Mg1-xM2+ x(OH)2 (1) (式中M2+は、Mn2+、Fe2+、Co2+、Zn2+、Cu
2+及びNi2+からなる群から選ばれた少なくとも1種の
二価金属イオンを示し、xは0.01≦x≦0.5の数
を示す)より好ましくは、一般式(1)で示される金属
水酸化物固溶体のM2+が、 Zn2 +又はNi2+である半
導体封止用エポキシ樹脂組成物、及びこれを用いて半導
体素子を封止してなる半導体装置である。The present invention provides (A) an epoxy resin, (B) a phenolic resin, (C) a curing accelerator,
The surfaces of (D) an inorganic filler, (E) a metal hydroxide solid solution represented by the general formula (1), and (F) red phosphorus were coated with aluminum hydroxide, and the surfaces were further coated with a phenol resin. The average particle size is 0.1 to 70 μm
m, a red phosphorus-based flame retardant having a maximum particle size of 200 μm or less as an essential component, and Mg 1-x M 2+ x (OH) 2 (1) (where M 2+ is Mn 2+ , Fe 2+ , Co 2+ , Zn 2+ , Cu
Represents at least one type of divalent metal ion selected from the group consisting of 2+ and Ni 2+ , and x represents a number satisfying 0.01 ≦ x ≦ 0.5) More preferably, the general formula (1) M 2+ metal hydroxide solid solution is shown, a semiconductor device obtained by encapsulating a semiconductor element using Zn 2 + or a semiconductor encapsulating epoxy resin composition is Ni 2+, and the same.
【0006】[0006]
【発明の実施の形態】本発明に用いるエポキシ樹脂とし
ては、1分子内にエポキシ基を2個以上有するモノマ
ー、オリゴマー、ポリマー全般を言い、その分子量、分
子構造を特に限定するものではないが、例えば、ビフェ
ニル型エポキシ樹脂、ビスフェノール型エポキシ樹脂、
スチルベン型エポキシ樹脂、フェノールノボラック型エ
ポキシ樹脂、クレゾールノボラック型エポキシ樹脂、ト
リフェノールメタン型エポキシ樹脂、アルキル変性トリ
フェノールメタン型エポキシ樹脂、トリアジン核含有エ
ポキシ樹脂、ジシクロペンタジエン変性フェノール型エ
ポキシ樹脂、フェノールアラルキル型エポキシ樹脂(フ
ェニレン骨格、ジフェニレン骨格等を有する)等が挙げ
られ、これらは単独でも混合して用いても差し支えな
い。BEST MODE FOR CARRYING OUT THE INVENTION The epoxy resin used in the present invention refers to all monomers, oligomers and polymers having two or more epoxy groups in one molecule, and their molecular weight and molecular structure are not particularly limited. For example, biphenyl type epoxy resin, bisphenol type epoxy resin,
Stilbene epoxy resin, phenol novolak epoxy resin, cresol novolak epoxy resin, triphenolmethane epoxy resin, alkyl-modified triphenolmethane epoxy resin, epoxy resin containing triazine nucleus, dicyclopentadiene-modified phenol epoxy resin, phenol aralkyl Type epoxy resin (having a phenylene skeleton, a diphenylene skeleton and the like) and the like, and these may be used alone or in combination.
【0007】本発明に用いるフェノール樹脂としては、
1分子内にフェノール性水酸基を2個以上有するモノマ
ー、オリゴマー、ポリマー全般を言い、その分子量、分
子構造を特に限定するものではないが、例えば、フェノ
ールノボラック樹脂、クレゾールノボラック樹脂、ジシ
クロペンタジエン変性フェノール樹脂、テルペン変性フ
ェノール樹脂、トリフェノールメタン型樹脂、フェノー
ルアラルキル樹脂(フェニレン骨格、ジフェニレン骨格
等を有する)等が挙げられ、これらは単独でも混合して
用いても差し支えない。これらの内では特に、フェノー
ルノボラック樹脂、ジシクロペンタジエン変性フェノー
ル樹脂、フェノールアラルキル樹脂、テルペン変性フェ
ノール樹脂等が好ましい。これらの配合量としては、全
エポキシ樹脂のエポキシ基数と全フェノール樹脂のフェ
ノール性水酸基数の比が0.8〜1.3が好ましい。The phenolic resin used in the present invention includes:
Monomers, oligomers, and polymers generally having two or more phenolic hydroxyl groups in one molecule are not particularly limited in molecular weight and molecular structure. For example, phenol novolak resin, cresol novolak resin, dicyclopentadiene-modified phenol Resins, terpene-modified phenolic resins, triphenolmethane-type resins, phenol aralkyl resins (having a phenylene skeleton, diphenylene skeleton, and the like) and the like can be used alone or in combination. Of these, phenol novolak resins, dicyclopentadiene-modified phenol resins, phenol aralkyl resins, terpene-modified phenol resins, and the like are particularly preferable. The ratio of the number of epoxy groups in all epoxy resins to the number of phenolic hydroxyl groups in all phenolic resins is preferably 0.8 to 1.3.
【0008】本発明に用いる硬化促進剤としては、エポ
キシ基とフェノール性水酸基との硬化反応を促進させる
ものであればよく、一般に封止材料に用いられているも
のを使用することができる。例えば、1,8−ジアザビ
シクロ(5,4,0)ウンデセン−7、トリフェニルホ
スフィン、2−メチルイミダゾール、テトラフェニルホ
スホニウム・テトラフェニルボレート等が挙げられ、こ
れらは単独でも混合して用いても差し支えない。As the curing accelerator used in the present invention, any one can be used as long as it promotes a curing reaction between an epoxy group and a phenolic hydroxyl group, and those generally used for a sealing material can be used. For example, 1,8-diazabicyclo (5,4,0) undecene-7, triphenylphosphine, 2-methylimidazole, tetraphenylphosphonium / tetraphenylborate and the like can be mentioned, and these may be used alone or as a mixture. Absent.
【0009】本発明に用いる無機充填材としては、一般
に封止材料に使用されているものを使用することができ
る。例えば、溶融シリカ、結晶シリカ、タルク、アルミ
ナ、窒化珪素等が挙げられ、これらは単独でも混合して
用いても差し支えない。無機充填材の配合量としては、
金属水酸化物固溶体及び赤燐系難燃剤と前記の無機充填
材との合計量が、成形性と耐半田クラック性のバランス
から、全エポキシ樹脂組成物中に60〜95重量%含有
することが好ましい。60重量%未満だと、吸水率の上
昇に伴う耐半田クラック性が低下し、95重量%を越え
ると、ワイヤースィープ及びパッドシフト等の成形性の
問題が生じ、好ましくない。As the inorganic filler used in the present invention, those generally used for a sealing material can be used. For example, fused silica, crystalline silica, talc, alumina, silicon nitride and the like can be mentioned, and these may be used alone or in combination. As the compounding amount of the inorganic filler,
The total amount of the metal hydroxide solid solution, the red phosphorus-based flame retardant, and the inorganic filler is preferably 60 to 95% by weight in the total epoxy resin composition in view of the balance between moldability and solder crack resistance. preferable. If it is less than 60% by weight, the solder cracking resistance decreases with an increase in water absorption, and if it exceeds 95% by weight, problems such as wire sweep and pad shift are caused, which is not preferable.
【0010】本発明に用いる一般式(1)で示される金
属水酸化物固溶体は、難燃剤として作用し、その難燃機
構としては、燃焼時に金属水酸化物固溶体が脱水を開始
し、吸熱することによって燃焼反応を阻害するものであ
る。又、樹脂硬化物の炭化を促進することが知られてお
り、硬化物表面に酸素を遮断する難燃層を形成すると考
えられる。更に、一般式(1)で示される金属水酸化物
固溶体は、吸熱開始温度を適度に下げ、難燃性能を向上
する効果がある。吸熱開始温度が低いと成形性、信頼性
に悪影響を及ぼし、又、吸熱開始温度が樹脂硬化物の分
解温度より高いと難燃性が低下するが、本発明の金属水
酸化物固溶体の吸熱開始温度は、300〜350℃近辺
で適度な値である。これらの内で特に好ましいM2+とし
てはZn2+、Ni2+である。一般式(1)で示される金
属水酸化物固溶体の配合量としては、全エポキシ樹脂組
成物中に1〜15重量%が好ましく、更に好ましくは1
〜10重量%である。1重量%未満だと難燃性が不足
し、15重量%を越えると耐半田クラック性、成形性が
低下するので好ましくない。一般式(1)で示される金
属水酸化物固溶体の平均粒径としては、0.5〜30μ
mが好ましく、更に好ましくは0.5〜10μmであ
る。The metal hydroxide solid solution represented by the general formula (1) used in the present invention acts as a flame retardant, and its flame retarding mechanism is such that the metal hydroxide solid solution starts dehydration and absorbs heat during combustion. This inhibits the combustion reaction. Further, it is known that carbonization of the cured resin is promoted, and it is considered that a flame retardant layer that blocks oxygen is formed on the surface of the cured product. Further, the metal hydroxide solid solution represented by the general formula (1) has an effect of appropriately lowering the endothermic start temperature and improving the flame retardancy. If the endothermic start temperature is low, the moldability and reliability are adversely affected, and if the endothermic start temperature is higher than the decomposition temperature of the cured resin, the flame retardancy is reduced, but the endothermic start of the metal hydroxide solid solution of the present invention is started. The temperature is an appropriate value around 300 to 350 ° C. Among them, particularly preferred M 2+ are Zn 2+ and Ni 2+ . The amount of the metal hydroxide solid solution represented by the general formula (1) is preferably 1 to 15% by weight, more preferably 1 to 15% by weight, based on the total epoxy resin composition.
-10% by weight. If it is less than 1% by weight, the flame retardancy is insufficient, and if it exceeds 15% by weight, the solder crack resistance and the moldability are undesirably reduced. The average particle size of the metal hydroxide solid solution represented by the general formula (1) is 0.5 to 30 μm.
m is preferred, and more preferably 0.5 to 10 μm.
【0011】本発明に用いる赤燐系難燃剤は、赤燐の表
面を水酸化アルミニウムで被覆され、更にフェノール樹
脂で被覆されたものである。赤燐を微粒子状に破砕する
と、破断面の赤燐が非常に活性が高く不安定となり、耐
湿性が悪化する傾向にある。しかし、予め水酸化アルミ
ニウムで被覆した後、フェノール樹脂で被覆しておくこ
とにより、耐湿性の悪化を防止できる。更に、より好ま
しい赤燐は、黄燐を直接球状体化した赤燐又はその集合
体からなる微粒子であり、これらのものは破壊して用い
る必要はない。被覆された赤燐系難燃剤中の赤燐の含有
量は90〜96重量%であることが好ましい。赤燐の含
有量が90重量%未満だと、エポキシ樹脂組成物中の添
加量を多くする必要があり、耐湿性が悪化する。一方、
96重量%を越えると赤燐の安定性の点で問題である。
赤燐系難燃剤は、平均粒径が0.1〜70μm、最大粒
径が200μm以下のものが好ましい。平均粒径が0.
1μm未満だと凝集等が起こり、70μmを越えると分
散性が悪化する。分散性を良くするためには、最大粒径
が200μm以下のものが好ましく、200μmを越え
ると分散性が悪化する。赤燐系難燃剤の配合量は、全エ
ポキシ樹脂組成物中に0.2〜2重量%が好ましい。
0.2重量%未満だと難燃性が不足し、2重量%を越え
ると耐湿性が大幅に低下する。赤燐系難燃剤としては、
例えば、燐化学工業(株)・製のノーバエクセル等があ
り、市場から容易に入手することができる。The red phosphorus flame retardant used in the present invention is obtained by coating the surface of red phosphorus with aluminum hydroxide and further coating with a phenol resin. When red phosphorus is crushed into fine particles, the red phosphorus in the fractured surface has a very high activity and becomes unstable, and the moisture resistance tends to deteriorate. However, by coating with phenol resin after coating with aluminum hydroxide in advance, deterioration of moisture resistance can be prevented. Further, more preferred red phosphorus is fine particles made of red phosphorus or an aggregate thereof obtained by directly spheroidizing yellow phosphorus, and it is not necessary to use these particles by breaking them. The content of red phosphorus in the coated red phosphorus flame retardant is preferably 90 to 96% by weight. If the content of red phosphorus is less than 90% by weight, it is necessary to increase the amount added in the epoxy resin composition, and the moisture resistance deteriorates. on the other hand,
If it exceeds 96% by weight, there is a problem in the stability of red phosphorus.
The red phosphorus flame retardant preferably has an average particle size of 0.1 to 70 μm and a maximum particle size of 200 μm or less. The average particle size is 0.
If it is less than 1 μm, agglomeration or the like occurs, and if it exceeds 70 μm, dispersibility deteriorates. In order to improve the dispersibility, it is preferable that the maximum particle size is 200 μm or less, and if it exceeds 200 μm, the dispersibility deteriorates. The compounding amount of the red phosphorus-based flame retardant is preferably 0.2 to 2% by weight in the total epoxy resin composition.
If it is less than 0.2% by weight, the flame retardancy is insufficient, and if it exceeds 2% by weight, the moisture resistance is greatly reduced. As a red phosphorus flame retardant,
For example, there is Nova Excel manufactured by Rin Kagaku Kogyo Co., Ltd., which can be easily obtained from the market.
【0012】金属水酸化物固溶体及び赤燐系難燃剤は、
各々単独でも難燃性を付与する性質があるが、十分な難
燃性を発現させるには、多量の配合量が必要となる。し
かし多量に配合すると、成形性及び強度の低下、吸水率
の増加を引き起こす傾向にあり、耐半田クラック性が低
下する。これらの諸物性の低下を防ぐためにも配合量は
極力少なくする必要がある。本発明者は、金属水酸化物
固溶体と赤燐系難燃剤とを併用することにより、その相
乗効果として更に難燃性が向上し、配合量を低減できる
ことを見いだした。金属水酸化物固溶体は燃焼時の吸熱
作用があり、更に樹脂硬化物の炭化を促進させ、赤燐は
ポリ燐酸の被膜形成により炭化層の強度を向上させる作
用がある。理由は定かでないが、両者を併用することに
より、互いの能力を補い合い、その相乗効果として高い
難燃性を得ることができる。その結果として、配合量を
少なくしても難燃性を維持し、成形性及び強度の低下、
吸水率の増加等を防ぐことができる。[0012] The metal hydroxide solid solution and the red phosphorus-based flame retardant are
Each of them has the property of imparting flame retardancy even if used alone, but a large amount of compounding is required to express sufficient flame retardancy. However, if it is blended in a large amount, the moldability and strength tend to decrease, and the water absorption tends to increase, and the solder crack resistance decreases. In order to prevent these physical properties from deteriorating, it is necessary to reduce the compounding amount as much as possible. The present inventor has found that by using a metal hydroxide solid solution and a red phosphorus-based flame retardant in combination, flame retardancy can be further improved as a synergistic effect and the blending amount can be reduced. The metal hydroxide solid solution has an endothermic effect at the time of combustion, further promotes carbonization of the cured resin, and red phosphorus has an effect of improving the strength of the carbonized layer by forming a polyphosphoric acid film. Although the reason is not clear, the combined use of both makes it possible to complement each other's abilities and obtain high flame retardancy as a synergistic effect. As a result, even if the blending amount is reduced, the flame retardancy is maintained, the moldability and the strength are reduced,
An increase in the water absorption can be prevented.
【0013】本発明のエポキシ樹脂組成物は、(A)〜
(F)成分を必須成分とするが、これ以外に必要に応じ
てシランカップリング剤、カーボンブラック等の着色
剤、天然ワックス、合成ワックス等の離型剤、及びシリ
コーンオイル、ゴム等の低応力添加剤等の種々の添加剤
を適宜配合しても差し支えない。又、本発明のエポキシ
樹脂組成物は、(A)〜(F)成分、及びその他の添加
剤等をミキサー等を用いて充分に均一に混合した後、更
に熱ロール又はニーダー等で溶融混練し、冷却後粉砕し
て得られる。本発明のエポキシ樹脂組成物を用いて、半
導体素子等の各種の電子部品を封止し、半導体装置を製
造するには、トランスファーモールド、コンプレッショ
ンモールド、インジェクションモールド等の従来からの
成形方法で硬化成形すればよい。The epoxy resin composition of the present invention comprises (A)
The component (F) is an essential component, but if necessary, a silane coupling agent, a coloring agent such as carbon black, a release agent such as natural wax and synthetic wax, and a low stress such as silicone oil and rubber. Various additives such as additives may be appropriately compounded. In addition, the epoxy resin composition of the present invention is prepared by mixing the components (A) to (F) and other additives sufficiently and uniformly using a mixer or the like, and then melt-kneading with a hot roll or a kneader. , After cooling and pulverized. Various electronic components such as semiconductor elements are encapsulated using the epoxy resin composition of the present invention, and semiconductor devices are manufactured by curing and molding using conventional molding methods such as transfer molding, compression molding, and injection molding. do it.
【0014】[0014]
【実施例】以下に本発明の実施例を示すが、本発明はこ
れらに限定されるものではない。配合割合は重量部とす
る。なお、実施例、及び比較例で用いたエポキシ樹脂、
フェノール樹脂、赤燐系難燃剤の略号及び構造を、以下
にまとめて示す。 エポキシ樹脂(E−1):式(E−1)で示される構造
を主成分とするエポキシ樹脂(エポキシ当量190g/
eq)EXAMPLES Examples of the present invention will be shown below, but the present invention is not limited to these examples. The mixing ratio is by weight. In addition, the epoxy resin used in the Examples and Comparative Examples,
The abbreviations and structures of the phenolic resin and the red phosphorus flame retardant are summarized below. Epoxy resin (E-1): an epoxy resin having a structure represented by the formula (E-1) as a main component (epoxy equivalent 190 g /
eq)
【化1】 Embedded image
【0015】エポキシ樹脂(E−2):式(E−2)で
示されるエポキシ樹脂(エポキシ当量265g/eq)Epoxy resin (E-2): an epoxy resin represented by the formula (E-2) (epoxy equivalent: 265 g / eq)
【化2】 Embedded image
【0016】フェノール樹脂(H−1):式(H−1)
で示されるフェノール樹脂(水酸基当量165g/e
q)Phenol resin (H-1): Formula (H-1)
Phenolic resin (hydroxyl equivalent 165 g / e)
q)
【化3】 Embedded image
【0017】フェノール樹脂(H−2):式(H−2)
で示されるフェノール樹脂(水酸基当量104g/e
q)Phenol resin (H-2): Formula (H-2)
Phenolic resin (hydroxyl equivalent 104g / e)
q)
【化4】 赤燐系難燃剤1:黄燐から直接球状に転化した赤燐の表
面を、水酸化アルミニウムで被覆した後、更にその表面
をフェノール樹脂で被覆したもので、赤燐の含有量94
重量%、平均粒径20μm、最大粒径51μm。 赤燐系難燃剤2:粉砕赤燐の表面を、水酸化アルミニウ
ムで被覆した後、更にその表面をフェノール樹脂で被覆
したもので、赤燐の含有量94重量%、平均粒径22μ
m、最大粒径50μm。Embedded image Red Phosphorus Flame Retardant 1: A surface of red phosphorus converted directly from yellow phosphorus into spheres, coated with aluminum hydroxide, and then further coated with a phenol resin.
% By weight, average particle size 20 μm, maximum particle size 51 μm. Red Phosphorus Flame Retardant 2: A substance obtained by coating the surface of ground red phosphorus with aluminum hydroxide and then further coating the surface with a phenol resin. The content of red phosphorus is 94% by weight, and the average particle size is 22 μm.
m, maximum particle size 50 μm.
【0018】 実施例1 エポキシ樹脂(E−1) 77重量部 フェノール樹脂(H−1) 68重量部 1,8−ジアザビシクロ(5,4,0)ウンデセン−7(以下、DBUという ) 2重量部 溶融球状シリカ 805重量部 金属水酸化物固溶体(Mg0.8Zn0.2(OH)2、平均粒径1μm) 30重量部 赤燐系難燃剤1 5重量部 エポキシシランカップリング剤 5重量部 カーボンブラック 3重量部 カルナバワックス 5重量部 を常温でスーパーミキサーを用いて混合し、70〜10
0℃でロール混練し、冷却後粉砕してエポキシ樹脂組成
物を得た。得られたエポキシ樹脂組成物を以下の方法で
評価した。結果を表1に示す。Example 1 77 parts by weight of epoxy resin (E-1) 68 parts by weight of phenol resin (H-1) 2 parts by weight of 1,8-diazabicyclo (5,4,0) undecene-7 (hereinafter referred to as DBU) Fused spherical silica 805 parts by weight Metal hydroxide solid solution (Mg 0.8 Zn 0.2 (OH) 2 , average particle size 1 μm) 30 parts by weight Red phosphorus-based flame retardant 1 5 parts by weight Epoxysilane coupling agent 5 parts by weight Carbon black 3 parts by weight 5 parts by weight of carnauba wax were mixed at room temperature using a super mixer,
Roll kneading was performed at 0 ° C., followed by cooling and pulverization to obtain an epoxy resin composition. The obtained epoxy resin composition was evaluated by the following method. Table 1 shows the results.
【0019】評価方法 スパイラルフロー:EMMI−1−66に準じたスパイ
ラルフロー測定用金型を用いて、金型温度175℃、圧
力70kg/cm2、硬化時間120秒で測定した。 硬化性:(株)オリエンテック・製、JSRキュラスト
メーターIVPSを用いて、ダイスの直径35mm、振
幅角1°、成形温度175℃、成形開始90秒後のトル
ク値を測定した。数値が小さいほど硬化が遅い。単位は
kgf・cm。 難燃性:低圧トランスファー成形機を用いて、成形温度
175℃、圧力70kg/cm2、硬化時間120秒で
試験片(127mm×12.7mm×3.2mm)を成
形し、アフターベークとして175℃、8時間処理した
後、UL−94垂直法に準じてΣF、Fmaxを測定し、
難燃性を判定した。 熱時強度:低圧トランスファー成形機を用いて、成形温
度175℃、圧力70kg/cm2、硬化時間120秒
で試験片(80mm×10mm×4mm)を成形し、ア
フターベークとして175℃、8時間処理した後、24
0℃での曲げ強度をJIS K 6911に準じて測定
した。単位はN/mm2。 吸水率:低圧トランスファー成形機を用いて、成形温度
175℃、圧力70kg/cm2、硬化時間120秒で
試験円盤(直径50mm、厚さ4mm)を成形し、アフ
ターベークとして175℃、8時間処理した後、150
℃で16時間乾燥処理を行い、85℃、相対湿度85%
で168時間処理を行ったものについて、初期重量に対
する増加重量の百分率を求めた。単位は%。 耐半田クラック性:低圧トランスファー成形機を用い
て、成形温度175℃、圧力70kg/cm2、硬化時
間120秒で80pQFP(2mm厚、チップサイズ
9.0mm×9.0mm)を成形し、アフターベークと
して175℃、8時間処理した後、85℃、相対湿度8
5%で96時間の処理を行い、IRリフロー処理(24
0℃、10秒)を行った。超音波探傷機を用いて、パッ
ケージ内部の剥離、クラック等の不良を観察した。6個
のパッケージ中の不良パッケージ数を示す。 高温保管特性:低圧トランスファー成形機を用いて成形
温度175℃、圧力70kg/cm2、硬化時間120
秒で16pDIP(チップサイズ3.0mm×3.5m
m)を成形し、アフターベークとして175℃、8時間
処理した後、高温保管試験(185℃、1000時間)
を行い、配線間の電気抵抗値が初期値に対し20%増加
したパッケージを不良と判定した。15個のパッケージ
中の不良パッケージ数を示す。Evaluation method Spiral flow: Spiral flow was measured using a mold for measuring spiral flow according to EMMI-1-66 at a mold temperature of 175 ° C., a pressure of 70 kg / cm 2 and a curing time of 120 seconds. Curability: Using a JSR Curastometer IVPS manufactured by Orientec Co., Ltd., the diameter of the die was 35 mm, the amplitude angle was 1 °, the molding temperature was 175 ° C., and the torque value after 90 seconds from the start of molding was measured. The smaller the value, the slower the curing. The unit is kgf · cm. Flame retardancy: A test piece (127 mm × 12.7 mm × 3.2 mm) was molded using a low pressure transfer molding machine at a molding temperature of 175 ° C., a pressure of 70 kg / cm 2 and a curing time of 120 seconds, and 175 ° C. as an after-bake. , After treatment for 8 hours, ΔF and Fmax were measured according to the UL-94 vertical method,
Flame retardancy was determined. Hot strength: A test piece (80 mm × 10 mm × 4 mm) was molded using a low pressure transfer molding machine at a molding temperature of 175 ° C., a pressure of 70 kg / cm 2 and a curing time of 120 seconds, and treated at 175 ° C. for 8 hours as an after-bake. After that, 24
The flexural strength at 0 ° C. was measured according to JIS K 6911. The unit is N / mm 2 . Water absorption: A test disk (diameter 50 mm, thickness 4 mm) was molded using a low-pressure transfer molding machine at a molding temperature of 175 ° C., a pressure of 70 kg / cm 2 , and a curing time of 120 seconds. After that, 150
Dry at 16 ° C for 16 hours, 85 ° C, 85% relative humidity
168 hours, the percentage of increase in weight relative to the initial weight was determined. Units%. Solder crack resistance: 80 pQFP (2 mm thick, chip size 9.0 mm × 9.0 mm) was molded using a low pressure transfer molding machine at a molding temperature of 175 ° C., a pressure of 70 kg / cm 2 , and a curing time of 120 seconds, followed by after-baking. After treatment at 175 ° C for 8 hours, 85 ° C and relative humidity of 8
96 hours processing at 5%, IR reflow processing (24
(0 ° C., 10 seconds). Using an ultrasonic flaw detector, defects such as peeling and cracks inside the package were observed. The number of defective packages in the six packages is shown. High-temperature storage characteristics: using a low-pressure transfer molding machine, molding temperature 175 ° C., pressure 70 kg / cm 2 , curing time 120
16pDIP in seconds (chip size 3.0mm x 3.5m
m) was molded and treated as an after-bake at 175 ° C. for 8 hours, followed by a high-temperature storage test (185 ° C., 1000 hours)
The package in which the electric resistance between the wirings increased by 20% from the initial value was determined to be defective. The number of defective packages in the 15 packages is shown.
【0020】実施例2〜5、比較例1〜5 表1の配合に従い、実施例1と同様にしてエポキシ樹脂
組成物を得て、実施例1と同様にして評価した。結果を
表1に示す。比較例1に用いた臭素化ビスフェノールA
型エポキシ樹脂のエポキシ当量は、365g/eq.。Examples 2 to 5 and Comparative Examples 1 to 5 According to the composition shown in Table 1, an epoxy resin composition was obtained in the same manner as in Example 1, and evaluated in the same manner as in Example 1. Table 1 shows the results. Brominated bisphenol A used in Comparative Example 1
The epoxy equivalent of the epoxy resin is 365 g / eq. .
【表1】 [Table 1]
【0021】[0021]
【発明の効果】本発明に従うと、ハロゲン系難燃剤、及
びアンチモン化合物を含まず、成形性に優れた半導体封
止用エポキシ樹脂組成物が得られ、これを用いた半導体
装置は難燃性、高温保管特性、耐湿信頼性及び耐半田ク
ラック性に優れる。According to the present invention, an epoxy resin composition for encapsulating a semiconductor which does not contain a halogen-based flame retardant and an antimony compound and has excellent moldability can be obtained. Excellent high temperature storage characteristics, moisture resistance reliability and solder crack resistance.
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 FI テーマコート゛(参考) H01L 23/29 H01L 23/30 R 23/31 Fターム(参考) 4J002 CC042 CC052 CC072 CD031 CD051 CD061 CD071 CD131 CD201 DA059 DE078 DE098 DE108 DE118 DE147 DJ007 DJ017 DJ047 EU116 EU136 EW146 EW176 FB079 FB269 FD017 FD138 FD139 FD142 FD156 4J036 AA01 FA01 FA02 FA04 FB07 4M109 AA01 EA02 EB07 EB12 EB18──────────────────────────────────────────────────続 き Continued on the front page (51) Int.Cl. 7 Identification symbol FI Theme coat ゛ (Reference) H01L 23/29 H01L 23/30 R 23/31 F-term (Reference) 4J002 CC042 CC052 CC072 CD031 CD051 CD061 CD071 CD131 CD201 DA059 DE078 DE098 DE108 DE118 DE147 DJ007 DJ017 DJ047 EU116 EU136 EW146 EW176 FB079 FB269 FD017 FD138 FD139 FD142 FD156 4J036 AA01 FA01 FA02 FA04 FB07 4M109 AA01 EA02 EB07 EB12 EB18
Claims (5)
樹脂、(C)硬化促進剤、(D)無機充填材、(E)一
般式(1)で示される金属水酸化物固溶体、及び(F)
赤燐の表面を水酸化アルミニウムで被覆した後、更にそ
の表面をフェノール樹脂で被覆したもので、平均粒径が
0.1〜70μm、最大粒径が200μm以下である赤
燐系難燃剤を必須成分とすることを特徴とする半導体封
止用エポキシ樹脂組成物。 Mg1-xM2+ x(OH)2 (1) (式中M2+は、Mn2+、Fe2+、Co2+、Zn2+、Cu
2+及びNi2+からなる群から選ばれた少なくとも1種の
二価金属イオンを示し、xは0.01≦x≦0.5の数
を示す)1. An epoxy resin, (B) a phenolic resin, (C) a curing accelerator, (D) an inorganic filler, (E) a metal hydroxide solid solution represented by the general formula (1), F)
After coating the surface of red phosphorus with aluminum hydroxide, the surface is further coated with a phenol resin, and a red phosphorus-based flame retardant having an average particle size of 0.1 to 70 μm and a maximum particle size of 200 μm or less is essential. An epoxy resin composition for encapsulating a semiconductor, comprising: a component. Mg 1-x M 2+ x (OH) 2 (1) (where M 2+ is Mn 2+ , Fe 2+ , Co 2+ , Zn 2+ , Cu
Represents at least one type of divalent metal ion selected from the group consisting of 2+ and Ni 2+ , and x represents a number satisfying 0.01 ≦ x ≦ 0.5)
溶体のM2+がZn2+、又はNi2+である請求項1記載の
半導体封止用エポキシ樹脂組成物。2. The epoxy resin composition for semiconductor encapsulation according to claim 1, wherein M 2+ of the metal hydroxide solid solution represented by the general formula (1) is Zn 2+ or Ni 2+ .
した赤燐又はその集合体である請求項1、又は2記載の
エポキシ樹脂組成物。3. The epoxy resin composition according to claim 1, wherein the red phosphorus is red phosphorus or an aggregate thereof which is directly spheroidized upon conversion from yellow phosphorus.
96重量%である請求項1、2、又は3記載のエポキシ
樹脂組成物。4. The content of red phosphorus in the red phosphorus flame retardant is 90 to 90.
The epoxy resin composition according to claim 1, 2 or 3, which is 96% by weight.
止用エポキシ樹脂組成物を用いて半導体素子を封止して
なることを特徴とする半導体装置。5. A semiconductor device comprising a semiconductor element encapsulated with the epoxy resin composition for semiconductor encapsulation according to claim 1.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2000179972A JP2001226564A (en) | 1999-12-07 | 2000-06-15 | Epoxy resin composition and semiconductor device |
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11-347414 | 1999-12-07 | ||
JP34741499 | 1999-12-07 | ||
JP2000179972A JP2001226564A (en) | 1999-12-07 | 2000-06-15 | Epoxy resin composition and semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
JP2001226564A true JP2001226564A (en) | 2001-08-21 |
Family
ID=26578503
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2000179972A Pending JP2001226564A (en) | 1999-12-07 | 2000-06-15 | Epoxy resin composition and semiconductor device |
Country Status (1)
Country | Link |
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JP (1) | JP2001226564A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003082197A (en) * | 2001-09-17 | 2003-03-19 | Sumitomo Bakelite Co Ltd | Epoxy resin composition and semiconductor device |
JP2003089745A (en) * | 2001-09-18 | 2003-03-28 | Sumitomo Bakelite Co Ltd | Epoxy resin composition and semiconductor device |
JP2006008769A (en) * | 2004-06-23 | 2006-01-12 | Sumitomo Bakelite Co Ltd | Epoxy resin composition and semiconductor device |
CN102030968A (en) * | 2009-09-30 | 2011-04-27 | 北京科化新材料科技有限公司 | Epoxy resin composition for encapsulating semiconductor device and preparation method thereof |
-
2000
- 2000-06-15 JP JP2000179972A patent/JP2001226564A/en active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003082197A (en) * | 2001-09-17 | 2003-03-19 | Sumitomo Bakelite Co Ltd | Epoxy resin composition and semiconductor device |
JP2003089745A (en) * | 2001-09-18 | 2003-03-28 | Sumitomo Bakelite Co Ltd | Epoxy resin composition and semiconductor device |
JP2006008769A (en) * | 2004-06-23 | 2006-01-12 | Sumitomo Bakelite Co Ltd | Epoxy resin composition and semiconductor device |
CN102030968A (en) * | 2009-09-30 | 2011-04-27 | 北京科化新材料科技有限公司 | Epoxy resin composition for encapsulating semiconductor device and preparation method thereof |
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