JP2001191442A - Laminated structure with excellent gas barrier properties - Google Patents
Laminated structure with excellent gas barrier propertiesInfo
- Publication number
- JP2001191442A JP2001191442A JP2000001228A JP2000001228A JP2001191442A JP 2001191442 A JP2001191442 A JP 2001191442A JP 2000001228 A JP2000001228 A JP 2000001228A JP 2000001228 A JP2000001228 A JP 2000001228A JP 2001191442 A JP2001191442 A JP 2001191442A
- Authority
- JP
- Japan
- Prior art keywords
- film
- gas barrier
- metal oxide
- laminated structure
- barrier properties
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000004888 barrier function Effects 0.000 title claims abstract description 27
- 239000010408 film Substances 0.000 claims abstract description 64
- 229910044991 metal oxide Inorganic materials 0.000 claims abstract description 23
- 150000004706 metal oxides Chemical class 0.000 claims abstract description 23
- 239000010410 layer Substances 0.000 claims abstract description 20
- 239000002985 plastic film Substances 0.000 claims abstract description 18
- 229920006255 plastic film Polymers 0.000 claims abstract description 18
- 239000000565 sealant Substances 0.000 claims abstract description 17
- 239000011247 coating layer Substances 0.000 claims abstract description 12
- 239000011248 coating agent Substances 0.000 claims abstract description 10
- 238000010030 laminating Methods 0.000 claims abstract description 10
- 238000000576 coating method Methods 0.000 claims abstract description 9
- 239000010409 thin film Substances 0.000 claims abstract description 8
- 239000000758 substrate Substances 0.000 claims abstract description 7
- 230000005540 biological transmission Effects 0.000 claims description 32
- 239000007789 gas Substances 0.000 claims description 25
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 21
- 239000001301 oxygen Substances 0.000 claims description 21
- 229910052760 oxygen Inorganic materials 0.000 claims description 21
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 21
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 claims description 14
- 229920002451 polyvinyl alcohol Polymers 0.000 claims description 10
- 239000004372 Polyvinyl alcohol Substances 0.000 claims description 8
- 230000035699 permeability Effects 0.000 claims description 8
- 238000003475 lamination Methods 0.000 claims description 2
- 239000007788 liquid Substances 0.000 claims 1
- 239000000853 adhesive Substances 0.000 abstract description 11
- 230000001070 adhesive effect Effects 0.000 abstract description 11
- 230000008021 deposition Effects 0.000 abstract description 5
- 238000000034 method Methods 0.000 description 16
- 238000011156 evaluation Methods 0.000 description 13
- 229920005989 resin Polymers 0.000 description 13
- 239000011347 resin Substances 0.000 description 13
- 239000007787 solid Substances 0.000 description 12
- -1 alkyl titanate Chemical compound 0.000 description 8
- 239000007864 aqueous solution Substances 0.000 description 7
- 239000000126 substance Substances 0.000 description 7
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 6
- 239000000203 mixture Substances 0.000 description 6
- 239000004698 Polyethylene Substances 0.000 description 5
- 229920000573 polyethylene Polymers 0.000 description 5
- 238000012360 testing method Methods 0.000 description 5
- 229920000219 Ethylene vinyl alcohol Polymers 0.000 description 4
- 229910004298 SiO 2 Inorganic materials 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 238000000151 deposition Methods 0.000 description 4
- 239000002245 particle Substances 0.000 description 4
- 229920000728 polyester Polymers 0.000 description 4
- 239000002994 raw material Substances 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 3
- 239000004715 ethylene vinyl alcohol Substances 0.000 description 3
- 239000005001 laminate film Substances 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- 238000001771 vacuum deposition Methods 0.000 description 3
- 238000007740 vapor deposition Methods 0.000 description 3
- IMROMDMJAWUWLK-UHFFFAOYSA-N Ethenol Chemical compound OC=C IMROMDMJAWUWLK-UHFFFAOYSA-N 0.000 description 2
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- 239000012790 adhesive layer Substances 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- UFRKOOWSQGXVKV-UHFFFAOYSA-N ethene;ethenol Chemical compound C=C.OC=C UFRKOOWSQGXVKV-UHFFFAOYSA-N 0.000 description 2
- 238000007429 general method Methods 0.000 description 2
- NLYAJNPCOHFWQQ-UHFFFAOYSA-N kaolin Chemical compound O.O.O=[Al]O[Si](=O)O[Si](=O)O[Al]=O NLYAJNPCOHFWQQ-UHFFFAOYSA-N 0.000 description 2
- 239000000314 lubricant Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 2
- 238000004806 packaging method and process Methods 0.000 description 2
- 229920002635 polyurethane Polymers 0.000 description 2
- 239000004814 polyurethane Substances 0.000 description 2
- 229910052814 silicon oxide Inorganic materials 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- 229920003169 water-soluble polymer Polymers 0.000 description 2
- 125000003504 2-oxazolinyl group Chemical group O1C(=NCC1)* 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- 229910052684 Cerium Inorganic materials 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 150000004703 alkoxides Chemical class 0.000 description 1
- 238000004873 anchoring Methods 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 230000003078 antioxidant effect Effects 0.000 description 1
- 239000002216 antistatic agent Substances 0.000 description 1
- 239000003125 aqueous solvent Substances 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 239000002981 blocking agent Substances 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- GWXLDORMOJMVQZ-UHFFFAOYSA-N cerium Chemical compound [Ce] GWXLDORMOJMVQZ-UHFFFAOYSA-N 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000003851 corona treatment Methods 0.000 description 1
- 239000003431 cross linking reagent Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- 208000028659 discharge Diseases 0.000 description 1
- 239000003814 drug Substances 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 238000007765 extrusion coating Methods 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 235000013305 food Nutrition 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- RZXDTJIXPSCHCI-UHFFFAOYSA-N hexa-1,5-diene-2,5-diol Chemical compound OC(=C)CCC(O)=C RZXDTJIXPSCHCI-UHFFFAOYSA-N 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 239000012948 isocyanate Substances 0.000 description 1
- 150000002513 isocyanates Chemical class 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 239000000395 magnesium oxide Substances 0.000 description 1
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 1
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 238000009832 plasma treatment Methods 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 229920005672 polyolefin resin Polymers 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 150000003376 silicon Chemical class 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical compound [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 125000003011 styrenyl group Chemical class [H]\C(*)=C(/[H])C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 239000011135 tin Substances 0.000 description 1
- 239000006097 ultraviolet radiation absorber Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Landscapes
- Laminated Bodies (AREA)
- Non-Insulated Conductors (AREA)
Abstract
(57)【要約】
【課題】 十分なガスバリア性を有し、且つ、シーラン
ト層との高い接着強度を有し、更には蒸着面に印刷を施
してもそれらの性能が低下することのない積層構造体を
提供する。
【解決手段】 金属酸化物から成る薄膜を基材フィルム
の少なくとも一方の面に形成した蒸着プラスチックフィ
ルムの蒸着面上に、金属酸化物ゾルをコーティングして
なるコーテイング層を設け、該コーティング層上にシー
ラント層を積層してなることを特徴とするガスバリア性
に優れた積層構造体。PROBLEM TO BE SOLVED: To provide a laminate having a sufficient gas barrier property, a high adhesive strength with a sealant layer, and a performance that is not deteriorated even when printing is performed on a deposition surface. Provide a structure. SOLUTION: On a vapor-deposited surface of a vapor-deposited plastic film in which a thin film composed of a metal oxide is formed on at least one surface of a substrate film, a coating layer formed by coating a metal oxide sol is provided. A laminated structure having excellent gas barrier properties characterized by laminating a sealant layer.
Description
【0001】[0001]
【発明の属する技術分野】本発明は、ガスバリア性に優
れた積層構造体に関する。The present invention relates to a laminated structure having excellent gas barrier properties.
【0002】[0002]
【従来の技術】従来より、プラスチックフィルムを基材
とし、その表面に酸化珪素、酸化アルミニウム、酸化マ
グネシウム等の金属酸化物の薄膜を形成したガスバリア
性蒸着プラスチックフィルムは、水蒸気や酸素等の各種
ガスの遮断を必要とする物品の包装、食品や工業用品及
び医薬品等の変質を防止するため包装用途に広く利用さ
れている(特公昭53−12953等)。また、このガ
スバリア性蒸着プラスチックフィルムは、包装用途以外
にも、近年、液晶表示素子、太陽電池、電磁波シール
ド、タッチパネル、EL用基板、カラーフィルター等で
使用する透明導電シートの一部などの新しい用途にも注
目されている。2. Description of the Related Art Conventionally, gas-barrier vapor-deposited plastic films having a plastic film as a base material and a thin film of a metal oxide such as silicon oxide, aluminum oxide or magnesium oxide formed on the surface thereof have been used for various gases such as water vapor and oxygen. It is widely used for packaging of articles that require shielding, and for preventing deterioration of foods, industrial supplies, pharmaceuticals, etc. (JP-B-53-12953, etc.). In addition, this gas barrier vapor-deposited plastic film has recently been used in new applications such as liquid crystal display elements, solar cells, electromagnetic wave shields, touch panels, EL substrates, and some of transparent conductive sheets used in color filters, etc., in addition to packaging applications. Has also attracted attention.
【0003】そして、かかるガスバリア性蒸着プラスチ
ックフィルムに関し、ガスバリア性の低下防止を目的と
した種々の改良検討がなされており、各種ポリウレタ
ン、各種ポリエステル、又は、ポリウレタンとポリエス
テルの混合物からなる塗布層を蒸着面に設ける方法が知
られている(特開平2ー50837等)。また、蒸着面
上に水溶性高分子と金属アルコキシドの混合物、塩化ビ
ニリデン系共重合体、エチレンビニルアルコール共重合
体(以下「EVOH」と言う)などのガスバリア性樹脂
をコーティングしたガスバリア性積層フィルムが知られ
ている(特開平8−267637、特開平7−8098
6等)。[0003] Various improvements have been studied for such gas-barrier vapor-deposited plastic films for the purpose of preventing a reduction in gas-barrier properties, and a coating layer made of various polyurethanes, various polyesters, or a mixture of polyurethane and polyester is deposited. There is known a method of providing the surface (Japanese Patent Laid-Open No. 2-50837). Further, a gas barrier laminated film in which a gas barrier resin such as a mixture of a water-soluble polymer and a metal alkoxide, a vinylidene chloride copolymer, an ethylene vinyl alcohol copolymer (hereinafter, referred to as “EVOH”) is coated on a vapor deposition surface is used. Known (JP-A-8-267637, JP-A-7-8098)
6 etc.).
【0004】[0004]
【発明が解決しようとする課題】ガスバリア性積層フィ
ルムが袋状で使用される場合には、ガスバリア性積層フ
ィルムの内側にヒートシール性のポリオレフィン系樹脂
等のシーラント層のフィルムを接着して使用されること
があるが、この際には十分な接着強度が必要となる。従
来のガスバリア性積層フィルムでは、そのガスバリア性
が高くても、シーラント層のフィルムとの接着強度が満
足できなかったり、蒸着面に印刷を施すとガスバリア性
能が低下するなどの問題がある。そこで、優れたガスバ
リアを有し、且つシーラント層フィルムとの接着強度を
有し、さらには、蒸着面に印刷を施してもそれらの性能
が低下することのない積層フィルムが必要とされてい
る。本発明は、上記実情に鑑みなされたものであり、そ
の目的は、ガスバリア性に優れ、且つシーラント層フィ
ルムとの高い接着強度を有し、さらには蒸着面に印刷を
施してもそれらの性能が低下することのない積層構造体
を提供することにある。When the gas barrier laminate film is used in the form of a bag, it is used by adhering a heat sealable polyolefin resin or other sealant layer film inside the gas barrier laminate film. However, in this case, sufficient adhesive strength is required. The conventional gas barrier laminate film has problems such as the fact that even if the gas barrier property is high, the adhesive strength of the sealant layer to the film cannot be satisfied, or the gas barrier performance decreases when printing is performed on the deposition surface. Therefore, there is a need for a laminated film having an excellent gas barrier, having an adhesive strength to a sealant layer film, and not deteriorating their performance even when printing is performed on a deposition surface. The present invention has been made in view of the above circumstances, and its object is to have excellent gas barrier properties and high adhesive strength with a sealant layer film. An object of the present invention is to provide a laminated structure that does not deteriorate.
【0005】[0005]
【課題を解決するための手段】本発明者らは、上記実状
に鑑み、上記目的を解決するために鋭意検討を行った結
果、蒸着フィルムの蒸着面に金属酸化物ゾルを均一に塗
布することができれば、上記性能を満足する積層フィル
ムが得られることを見いだし、本発明を完成するに至っ
た。即ち、本発明は、金属酸化物から成る薄膜を基材フ
ィルムの少なくとも一方の面に形成した蒸着プラスチッ
クフィルムの蒸着面上に、金属酸化物ゾルをコーティン
グしてなるコーテイング層を設け、該コーティング層上
にシーラント層を積層してなることを特徴とするガスバ
リア性に優れた積層構造体に関する。Means for Solving the Problems In view of the above-mentioned circumstances, the present inventors have made intensive studies to solve the above-mentioned problems, and as a result, have found that a metal oxide sol can be uniformly applied to a deposition surface of a deposition film. It was found that if this was achieved, a laminated film satisfying the above performance could be obtained, and the present invention was completed. That is, the present invention provides a coating layer formed by coating a metal oxide sol on a vapor-deposited surface of a vapor-deposited plastic film in which a thin film composed of a metal oxide is formed on at least one surface of a base film, The present invention relates to a laminated structure having excellent gas barrier properties, which is obtained by laminating a sealant layer thereon.
【0006】[0006]
【発明の実施の形態】以下、本発明を詳細に説明する。
本発明の積層構造体の基材プラスチックフィルム原料と
しては、一般ににフィルム用として利用されるような樹
脂原料であれば特に制限はなく、ポリエステル、ポリア
ミド、ポリオレフィン等が用いられる。原料中には、公
知の添加剤、例えば、帯電防止剤、光線遮断剤、紫外線
吸収剤、可塑剤、滑剤、フィラー、着色剤、安定剤、潤
滑剤、架橋剤、ブロッキング防止剤、酸化防止剤等を添
加することができる。本発明のプラスチックフィルムは
以上の原料を用いて成るもので、未延伸フィルムでもよ
いし延伸フィルムでもよい。また、複数の樹脂を積層し
てなるフィルムであってもよい。BEST MODE FOR CARRYING OUT THE INVENTION Hereinafter, the present invention will be described in detail.
The raw material of the base plastic film of the laminated structure of the present invention is not particularly limited as long as it is a resin raw material generally used for films, and polyester, polyamide, polyolefin and the like are used. In the raw materials, known additives, for example, an antistatic agent, a light-blocking agent, an ultraviolet absorber, a plasticizer, a lubricant, a filler, a colorant, a stabilizer, a lubricant, a crosslinking agent, a blocking inhibitor, an antioxidant Etc. can be added. The plastic film of the present invention comprises the above-mentioned raw materials, and may be an unstretched film or a stretched film. Further, a film formed by laminating a plurality of resins may be used.
【0007】かかるプラスチックフィルムは、従来公知
の一般的な方法により製造することができる。例えば、
原料樹脂を押し出し機により溶融し、環状ダイやTダイ
により押し出して、急冷することにより実質的に無定型
で配向していない未延伸フィルムを製造することができ
る。この未延伸フィルムを一軸延伸、テンター式逐次二
軸延伸、テンター式同時二軸延伸、チューブラー式同時
二軸延伸などの従来公知の一般的な方法により、フィル
ムの流れ(縦軸)方向又はフィルムの流れ方向とそれに
直角な(横軸)方向に延伸することにより、少なくとも
一軸方向に延伸したフィルムを製造することができる。
更に、該プラスチックフィルムには、コロナ放電処理、
火炎処理、プラズマ処理、グロー放電処理、薬品処理な
どの従来公知の方法による表面処理などを行うこともで
きる。[0007] Such a plastic film can be manufactured by a conventionally known general method. For example,
The raw resin is melted by an extruder, extruded by an annular die or T die, and quenched to produce a substantially amorphous unoriented film. The unstretched film is subjected to a film flow (vertical axis) direction or a film direction by a conventionally known general method such as uniaxial stretching, tenter-type sequential biaxial stretching, tenter-type simultaneous biaxial stretching, or tubular simultaneous biaxial stretching. By stretching in the flow direction and the direction (horizontal axis) perpendicular to the flow direction, a film stretched in at least a uniaxial direction can be produced.
Further, the plastic film has a corona discharge treatment,
A surface treatment by a conventionally known method such as a flame treatment, a plasma treatment, a glow discharge treatment, and a chemical treatment can also be performed.
【0008】以上のプラスチックフィルムの厚さは、本
発明の積層構造体の基材としての機械強度、可撓性、透
明性等、用途に応じ、通常5〜500μm、好ましくは
10〜200μmの範囲に選択される。また、フィルム
の幅や長さは特に制限はなく、適宜用途に応じて選択す
ることができる。なお、該プラスチックフィルムにおい
ては、その少なくとも片面にアンカーコート剤を塗布し
てもよい。アンカーコート剤としては、溶剤性又は水溶
性のポリエステル樹脂、イソシアネート樹脂、ウレタン
樹脂、アクリル樹脂、エチレンビニルアルコール樹脂、
ビニル変性樹脂、エポキシ樹脂、オキサゾリン基含有樹
脂、変性スチレン樹脂、変性シリコン樹脂及びアルキル
チタネート等を単独、あるいは2種以上併せて使用する
ことができる。[0008] The thickness of the above plastic film is in the range of usually 5 to 500 µm, preferably 10 to 200 µm, depending on the application such as mechanical strength, flexibility and transparency as a substrate of the laminated structure of the present invention. Is selected. Further, the width and length of the film are not particularly limited, and can be appropriately selected depending on the application. In addition, an anchor coat agent may be applied to at least one surface of the plastic film. As the anchor coating agent, a solvent-soluble or water-soluble polyester resin, isocyanate resin, urethane resin, acrylic resin, ethylene vinyl alcohol resin,
A vinyl-modified resin, an epoxy resin, an oxazoline group-containing resin, a modified styrene resin, a modified silicon resin, an alkyl titanate, or the like can be used alone or in combination of two or more.
【0009】本発明の積層構造体において、上記プラス
チックフィルムに蒸着する金属酸化物としては、例え
ば、アルミニウム、珪素、マグネシウム、パラジウム、
亜鉛、錫、ニッケル、銀、銅、金、インジウム、ステン
レス鋼、クロム、チタン等の金属、これらの各金属の酸
化物またはそれらの混合物が挙げられるが、好ましくは
酸化珪素、酸化アルミニウムである。蒸着の方法は、一
般には真空蒸着によるが、イオンプレーティング、スパ
ッタリング、CVD等の方法によってもよい。蒸着膜の
厚さは、蒸着フイルムの最終用途によって適宜選択され
るが、通常50〜2000オングストロームが好まし
い。50オングストローム未満では十分なガスバリア性
が得られにくく、2000オングストロームを越えると
蒸着膜に亀裂や剥離が発生しやすくなるのであまり好ま
しくない。In the laminated structure of the present invention, as the metal oxide deposited on the plastic film, for example, aluminum, silicon, magnesium, palladium,
Metals such as zinc, tin, nickel, silver, copper, gold, indium, stainless steel, chromium, and titanium, oxides of these metals, and mixtures thereof are preferable, and silicon oxide and aluminum oxide are preferable. The method of vapor deposition is generally vacuum deposition, but may be a method such as ion plating, sputtering, or CVD. The thickness of the deposited film is appropriately selected depending on the final use of the deposited film, but is usually preferably 50 to 2,000 angstroms. If it is less than 50 angstroms, it is difficult to obtain a sufficient gas barrier property, and if it exceeds 2000 angstroms, cracks and peeling are likely to occur in the deposited film, which is not preferable.
【0010】本発明の積層構造体では、以上の金属酸化
物から成る薄膜を基材フィルムの少なくとも一方の面に
形成した蒸着プラスチックフィルムの蒸着面上に金属酸
化物ゾルをコーティングすることによりコーテイング層
を設けてなるガスバリアに優れた積層フィルムが主部と
なる。かかる積層フィルムとしては、水蒸気透過率が通
常2.0g/m2・24h以下、好ましくは1.0g/m2
・24h以下であり、酸素透過率が通常1.0cc/m2
・24h・atm以下、好ましくは0.5cc/m2・24h・
atm以下のものが要求される。In the laminated structure of the present invention, a metal oxide sol is coated on a vapor-deposited surface of a vapor-deposited plastic film in which a thin film composed of the above-mentioned metal oxide is formed on at least one surface of a substrate film. The main part is a laminated film which is excellent in gas barrier provided with. Such a laminated film has a water vapor transmission rate of usually 2.0 g / m 2 · 24 h or less, preferably 1.0 g / m 2.
-24 hours or less, oxygen permeability is usually 1.0 cc / m 2
・ 24h ・ atm or less, preferably 0.5cc / m 2・ 24h ・
Less than atm is required.
【0011】ここでの金属酸化物ゾルとしては、シリ
カ、アンチモン、ジルコニウム、アルミニウム、セリウ
ム、チタン等の金属酸化物またはそれらの混合物からな
るゾルが挙げられるが、好ましくはシリカゾルである。
金属酸化物の粒子径は限定しないが、4〜10nmが好
ましく、粒径がこの範囲より大きくなるにつれて塗布し
にくくなり、満足のいくガスバリア性能が得られない可
能性がある。この金属酸化物ゾルは通常10〜90重量
%水性液として使用されるが、コーテイング層の均一
化、塗布の作業性改良、あるいはシーラント層との接着
性改良のために、適宜、アルコール類のような水性溶
媒、ポリビニルアルコール等の水溶性高分子類等で希釈
して使用してもよい。As the metal oxide sol here, a sol composed of a metal oxide such as silica, antimony, zirconium, aluminum, cerium, titanium or a mixture thereof is preferable, but a silica sol is preferable.
Although the particle diameter of the metal oxide is not limited, it is preferably 4 to 10 nm, and as the particle diameter becomes larger than this range, it becomes difficult to apply, and there is a possibility that satisfactory gas barrier performance cannot be obtained. This metal oxide sol is usually used as an aqueous solution of 10 to 90% by weight, and is preferably used as an alcohol such as alcohols in order to make the coating layer uniform, to improve the workability of coating, or to improve the adhesion to the sealant layer. It may be used after being diluted with a suitable aqueous solvent, a water-soluble polymer such as polyvinyl alcohol, or the like.
【0012】金属酸化物ゾルを基材フイルムに塗布液を
塗布する方法としては、リバースロールコーター、グラ
ビアコーター、ロッドコーター、エアドクタコーターな
ど、一般に公知の方法が使用できる。金属酸化物の厚さ
は塗布液乾燥後の固形分厚さを意味するが、該厚さは、
好ましくは0.01〜1.5μm、特に好ましくは0.
05〜1.0μmの範囲である。厚さ0.01μm未満
の場合は十分なガスバリア性が得られず、また、1.5
μmを超える場合はガスバリア性は満足できるが、シー
ラント層フィルムとの密着強度が低下する場合があるの
で、あまり好ましくない。As a method of applying the coating solution of the metal oxide sol to the substrate film, generally known methods such as a reverse roll coater, a gravure coater, a rod coater, and an air doctor coater can be used. The thickness of the metal oxide means the thickness of the solid content after drying the coating solution, the thickness,
It is preferably 0.01 to 1.5 μm, particularly preferably 0.1 to 1.5 μm.
The range is from 0.05 to 1.0 μm. If the thickness is less than 0.01 μm, sufficient gas barrier properties cannot be obtained, and
If it exceeds μm, the gas barrier properties are satisfactory, but the adhesion strength to the sealant layer film may be reduced, so that it is not very preferable.
【0013】本発明の積層構造体は、上記のような、金
属機酸化物から成る薄膜を基材フィルムの少なくとも一
方の面に形成した蒸着プラスチックフィルムの蒸着面上
に、金属酸化物ゾルをコーティングしてなるコーテイン
グ層を設けてなる積層フィルムのコーティング層上に、
シーラント層を積層して使用するのに好適である。シー
ラント層としては、ポリエチレン、ポリプロピレン、エ
チレン共重合体、飽和ポリエステル等のヒートシール性
を有する樹脂であれば目的に応じて使用することができ
る。このシーラント層は、フィルム化した材料をラミネ
ートして設けてもよいし、溶融した樹脂をアンカー剤か
らなる接着層を介して、押出しコーテイングによりラミ
ネートしてもよい。また、ラミネートする場合に、コー
テイング層とシーラント層との間を接着剤からなる接着
層を介して行ってもよい。更には、コーテイング層とシ
ーラント層との間を印刷層を積層してもよい。この印刷
層を形成する印刷インキは特に限定されないが、ウレタ
ン系樹脂をバインダーとしたものが好ましい。The laminated structure of the present invention is characterized in that a metal oxide sol is coated on a vapor-deposited surface of a vapor-deposited plastic film in which a thin film composed of a metal oxide is formed on at least one surface of a substrate film as described above. On the coating layer of the laminated film provided with the coating layer
It is suitable for use by laminating a sealant layer. As the sealant layer, any resin having heat sealing properties such as polyethylene, polypropylene, ethylene copolymer, and saturated polyester can be used according to the purpose. This sealant layer may be provided by laminating a filmed material, or may be laminated by extrusion coating a molten resin via an adhesive layer made of an anchoring agent. In the case of laminating, the lamination may be performed between the coating layer and the sealant layer via an adhesive layer made of an adhesive. Further, a printing layer may be laminated between the coating layer and the sealant layer. The printing ink for forming the printing layer is not particularly limited, but preferably uses a urethane-based resin as a binder.
【0014】かかる本発明の積層構造体はガスバリアに
優れており、好ましくは、水蒸気透過率が2.0g/m
2・24h以下、酸素透過率が1.0cc/m2・24h・at
m以下の性能を有する。また、後述する試験方法により
測定される密着強度の値も良好であり、好ましくは、5
00g/15mm以上の性能を有する。Such a laminated structure of the present invention is excellent in gas barrier, and preferably has a water vapor transmission rate of 2.0 g / m 2.
2 · 24h or less, the oxygen permeability 1.0cc / m 2 · 24h · at
It has a performance of m or less. Further, the value of the adhesion strength measured by the test method described later is also good, and preferably 5
It has a performance of 00 g / 15 mm or more.
【0015】[0015]
【実施例】以下、本発明を実施例により更に詳細に説明
するが、本発明はその要旨を越えない限り以下の例に限
定されるものではない。なお、以下の実施例におけるフ
ィルムの評価方法は以下の通りである。 〈水蒸気透過率(g/m2・24h)〉水蒸気透過率測定
装置(モダンコントロール社製、Permatran−
W1)を使用して、温度40℃、相対湿度90%の条件
下で測定した。 〈酸素透過率(cc/m2・24h・atm)〉ASTM−D
3985に準処して、酸素透過率測定装置(モダンコン
トロール社製、OX−TRAN100)を使用し、温度
25℃、相対湿度95%の条件下で測定した。EXAMPLES Hereinafter, the present invention will be described in more detail with reference to examples, but the present invention is not limited to the following examples unless it exceeds the gist of the present invention. In addition, the evaluation method of the film in the following Examples is as follows. <Water vapor transmission rate (g / m 2 · 24h) > water vapor permeability measuring device (manufactured by Modern Controls, Inc., Permatran-
The measurement was carried out using W1) under the conditions of a temperature of 40 ° C. and a relative humidity of 90%. <Oxygen permeability (cc / m 2 · 24h · atm)> ASTM-D
The measurement was performed under the conditions of a temperature of 25 ° C. and a relative humidity of 95% using an oxygen permeability measuring apparatus (OX-TRAN100, manufactured by Modern Control Co.) according to 3985.
【0016】〈密着強度〉蒸着フィルムの蒸着面、ある
いはその上にPVAが塗布された面、あるいはその上に
印刷が施された面に接着剤として、東洋モートン(株)
社製ウレタン系接着剤(AD−900:CAT−RT8
5=10:1.5の混合物)を塗布した。さらに、厚さ
50μmのポリエチレンフィルム(東セロ(株)社製T
UX−TC50μm)をドライラミネートし、40℃で
3日間エージングした。次いでこの積層フィルムを、幅
15mm、長さ100mmの短冊状に切り出して試験片
とした。この試験片のポリエチレンフィルムと蒸着フィ
ルムが含まれる積層フィルムとの界面の一端を予め50
mm剥離させて、両剥離面をそれぞれオートグラフ(J
IS K7127に準じる試験装置、島津製作所(株)
社製のDSS−100)の固定つかみ具と可動つかみ具
とに、つかみ具間距離100mmで取り付けて、可動つ
かみ具を引っ張り速度300mm/minで60mm移
動させ、この間にひずみ計に記録させた引張荷重の波状
曲線の中心線の値を求め、試験片3本における平均値を
密着強度とした。まお、引っ張り最中に試験片が切れて
しまった場合(これをフィルム破断という。)は、この
際の引張荷重を密着強度とした。<Adhesion Strength> Toyo Morton Co., Ltd. is used as an adhesive on the surface of the vapor-deposited film, or on the surface coated with PVA, or on the surface printed thereon.
Urethane adhesive (AD-900: CAT-RT8)
5 = 10: 1.5 mixture). Further, a polyethylene film having a thickness of 50 μm (T-Cello
UX-TC (50 μm) was dry-laminated and aged at 40 ° C. for 3 days. Next, the laminated film was cut into a strip having a width of 15 mm and a length of 100 mm to obtain a test piece. One end of the interface between the polyethylene film of this test piece and the laminated film containing the vapor-deposited film was previously 50
mm, and both release surfaces are autographed (J
Test equipment conforming to IS K7127, Shimadzu Corporation
(Manufactured by DSS-100) and a movable gripper with a distance between the grippers of 100 mm, and the movable gripper was moved 60 mm at a pulling speed of 300 mm / min. The value of the center line of the wavy curve of the load was determined, and the average value of three test pieces was defined as the adhesion strength. In addition, when the test piece was cut during the pulling (this is referred to as film breakage), the tensile load at this time was regarded as the adhesion strength.
【0017】(実施例1)肉厚が12μmのアンカーコ
ートされた二軸延伸ポリエチレンテレフタレートフィル
ムに真空蒸着装置を使用して、SiOを高周波加熱方式
で蒸発させ蒸着層厚みが約150オングストロームであ
る無機酸化物から成る薄膜を形成した蒸着プラスチック
フィルムを得た。この蒸着フィルムの蒸着面上に、シリ
カゾル(日産化学工業(株)社製スノーテックスXS、
平均粒径4〜6nm、SiO2含有量20〜21wt
%)にイソプロピルアルコールを20wt%含有させた
水溶液を、固形分厚みが0.01μmになるようにコー
ティングし、80℃で1分乾燥した。この積層フィルム
の水蒸気透過率と酸素透過率を測定した。また、このシ
リカゾルをコーティングした積層フィルム上に、上記密
着強度測定方法に記載したようにして、ポリエチレンフ
ィルムをドライラミネートした。このドライラミネート
された積層フィルムの密着強度、水蒸気透過率と酸素透
過率を測定した。さらにシリカゾルをコーティングした
積層フィルム上に白色インキ(東洋インキ製造(株)社
製、NEWLPスーパーR631白:SL302溶剤C
=1:1の混合物)を印刷し、その上に上記密着強度測
定方法に記載したようにして、ポリエチレンフィルムを
ドライラミネートした。このドライラミネートされた積
層フィルムの密着強度、水蒸気透過率と酸素透過率を測
定した。各評価結果を表−1に示す。(Example 1) An inorganic material having a thickness of about 150 angstroms by evaporating SiO by a high frequency heating method using a vacuum deposition apparatus on a biaxially stretched biaxially stretched polyethylene terephthalate film having a thickness of 12 μm using a vacuum deposition apparatus. A vapor-deposited plastic film having a thin film made of an oxide was obtained. Silica sol (Snowtex XS, manufactured by Nissan Chemical Industry Co., Ltd.)
The average particle diameter of 4 to 6 nm, SiO 2 content of 20~21wt
%) Containing 20 wt% of isopropyl alcohol was coated so as to have a solid thickness of 0.01 μm, and dried at 80 ° C. for 1 minute. The water vapor transmission rate and the oxygen transmission rate of this laminated film were measured. Further, a polyethylene film was dry-laminated on the laminated film coated with the silica sol as described in the above-mentioned adhesion strength measuring method. The adhesive strength, water vapor transmission rate and oxygen transmission rate of the dry-laminated laminated film were measured. Further, a white ink (NEWLP Super R631 white: SL302 solvent C, manufactured by Toyo Ink Mfg. Co., Ltd.) is applied on the laminated film coated with silica sol.
= 1: 1 mixture), and a polyethylene film was dry-laminated thereon as described in the adhesion strength measurement method above. The adhesive strength, water vapor transmission rate and oxygen transmission rate of the dry-laminated laminated film were measured. Table 1 shows the results of each evaluation.
【0018】(実施例2)実施例1において、固形分厚
みを1.0μmにしたほかは、実施例1記載の手順でフ
ィルムを製造し、密着強度、水蒸気透過率と酸素透過率
を測定した。各評価結果を表−1に示す。 (実施例3)実施例1において、シリカゾル(日産化学
工業(株)社製スノーテックス40、平均粒径10〜2
0nm、SiO2含有量40〜41wt%)とし、固形
分厚みを0.1μmにしたほかは、実施例1記載の手順
でフィルムを製造し、密着強度、水蒸気透過率と酸素透
過率を測定した。各評価結果を表−1に示す。Example 2 A film was produced in the same manner as in Example 1 except that the solid content thickness was changed to 1.0 μm, and the adhesion strength, water vapor transmission rate and oxygen transmission rate were measured. . Table 1 shows the results of each evaluation. (Example 3) In Example 1, the silica sol (Snowtex 40 manufactured by Nissan Chemical Industries, Ltd., average particle diameter 10 to 2) was used.
0 nm, SiO 2 content of 40 to 41 wt%), and except that the solid content thickness was 0.1 μm, a film was manufactured by the procedure described in Example 1, and the adhesion strength, water vapor transmission rate and oxygen transmission rate were measured. . Table 1 shows the results of each evaluation.
【0019】(実施例4)実施例1において、固形分厚
みを0.1μmにし、固形分混合比がSiO2:PVA
=8:2(重量比)になるように、シリカゾルをPVA
(日本合成化学工業(株)社製ポバール、N−300)
の水溶液で希釈したほかは、実施例1記載の手順でフィ
ルムを製造し、密着強度、水蒸気透過率と酸素透過率を
測定した。各評価結果を表−1に示す。 (実施例5)実施例4において、固形分厚みを1.0μ
mにしたほかは、実施例1記載の手順でフィルムを製造
し、密着強度、水蒸気透過率と酸素透過率を測定した。
各評価結果を表−1に示す。(Example 4) In Example 1, the thickness of the solid was 0.1 μm, and the mixing ratio of the solid was SiO 2: PVA.
= 8: 2 (weight ratio) by adding silica sol to PVA
(Poval, N-300, manufactured by Nippon Synthetic Chemical Industry Co., Ltd.)
A film was manufactured by the procedure described in Example 1 except that the film was diluted with an aqueous solution of Example 1, and the adhesion strength, water vapor transmission rate and oxygen transmission rate were measured. Table 1 shows the results of each evaluation. (Example 5) In Example 4, the solid content thickness was set to 1.0 μm.
A film was manufactured in the same manner as in Example 1 except that the value was changed to m, and the adhesion strength, the water vapor transmission rate and the oxygen transmission rate were measured.
Table 1 shows the results of each evaluation.
【0020】(実施例6)実施例4において、シリカゾ
ルの希釈水溶液をEVOH(日本合成化学工業(株)社
製ソアノール、16DX)の水溶液にし、水溶液中のイ
ソプロピルアルコール含有率を50wt%にしたほか
は、実施例1記載の手順でフィルムを製造し、密着強
度、水蒸気透過率と酸素透過率を測定した。各評価結果
を表−1に示す。 (実施例7)実施例1において、固形分厚みを2.0μ
mにしたほかは、実施例1記載の手順でフィルムを製造
し、密着強度、水蒸気透過率と酸素透過率を測定した。
各評価結果を表−1に示す。(Example 6) In Example 4, the diluted aqueous solution of silica sol was converted to an aqueous solution of EVOH (Soarnol, 16DX manufactured by Nippon Synthetic Chemical Industry Co., Ltd.), and the isopropyl alcohol content in the aqueous solution was adjusted to 50 wt%. Manufactured a film according to the procedure described in Example 1, and measured the adhesion strength, the water vapor transmission rate and the oxygen transmission rate. Table 1 shows the results of each evaluation. (Example 7) In Example 1, the thickness of the solid content was set to 2.0 μm.
A film was manufactured in the same manner as in Example 1 except that the value was changed to m, and the adhesion strength, the water vapor transmission rate and the oxygen transmission rate were measured.
Table 1 shows the results of each evaluation.
【0021】(実施例8)実施例4において、固形分混
合比をSiO2:PVA=5:5(重量比)になるよう
に、シリカゾルをPVA水溶液で希釈したほかは、実施
例1記載の手順でフィルムを製造し、密着強度、水蒸気
透過率と酸素透過率を測定した。各評価結果を表−1に
示す。 (実施例9)実施例1において、固形分厚みを0.00
5μmにしたほかは、実施例1記載の手順でフィルムを
製造し、密着強度、水蒸気透過率と酸素透過率を測定し
た。各評価結果を表−1に示す。Example 8 The procedure of Example 1 was repeated, except that the silica sol was diluted with an aqueous PVA solution so that the mixing ratio of solids was SiO 2 : PVA = 5: 5 (weight ratio). A film was manufactured according to the procedure, and the adhesion strength, the water vapor transmission rate and the oxygen transmission rate were measured. Table 1 shows the results of each evaluation. (Example 9) In Example 1, the solid content thickness was set to 0.00.
A film was manufactured by the procedure described in Example 1 except that the thickness was changed to 5 μm, and the adhesion strength, the water vapor transmission rate and the oxygen transmission rate were measured. Table 1 shows the results of each evaluation.
【0022】(比較例1)実施例1において、シリカゾ
ルのコーティング工程を省略したほかは、実施例1記載
の手順でフィルムを製造し、密着強度、水蒸気透過率と
酸素透過率を測定した。各評価結果を表−1に示す。 (比較例2)実施例1において、シリカゾルをコーティ
ングせずに、シリカゾルを含まないPVA(日本合成化
学工業(株)社製ポバール、N−300)の水溶液を固
形分厚みが0.1μmになるようにコーティングしたほ
かは、実施例1記載の手順でフィルムを製造し、密着強
度、水蒸気透過率と酸素透過率を測定した。各評価結果
を表−1に示す。Comparative Example 1 A film was produced in the same manner as in Example 1 except that the step of coating with silica sol was omitted, and the adhesion strength, water vapor transmission rate and oxygen transmission rate were measured. Table 1 shows the results of each evaluation. (Comparative Example 2) In Example 1, an aqueous solution of PVA (Poval, N-300, manufactured by Nippon Synthetic Chemical Industry Co., Ltd.) containing no silica sol without coating with silica sol had a solids thickness of 0.1 μm. Except for coating as described above, a film was manufactured according to the procedure described in Example 1, and the adhesion strength, water vapor transmission rate and oxygen transmission rate were measured. Table 1 shows the results of each evaluation.
【0023】(比較例3)実施例1において、シリカゾ
ルをコーティングせずに、シリカゾルを含まないEVO
H(日本合成化学工業(株)社製ソアノール、16D
X)水溶液を固形分厚みが0.01μmになるようにコ
ーティングしたほかは、実施例1記載の手順でフィルム
を製造し、密着強度、水蒸気透過率と酸素透過率を測定
した。各評価結果を表−1に示す。(Comparative Example 3) In Example 1, the silica sol was not coated, and the EVO containing no silica sol was used.
H (Soarnol, 16D manufactured by Nippon Synthetic Chemical Industry Co., Ltd.)
X) A film was manufactured by the procedure described in Example 1 except that the aqueous solution was coated so that the solid content thickness became 0.01 μm, and the adhesion strength, the water vapor transmission rate and the oxygen transmission rate were measured. Table 1 shows the results of each evaluation.
【0024】[0024]
【表1】 [Table 1]
【0025】[0025]
【発明の効果】本発明の積層構造体は、十分なガスバリ
ア性を有し、且つ、シーラント層との高い接着強度を有
し、更には蒸着面に印刷を施してもそれらの性能が低下
することない。The laminated structure of the present invention has a sufficient gas barrier property, a high adhesive strength with the sealant layer, and furthermore, their performance is deteriorated even when printing is performed on the vapor deposition surface. No.
フロントページの続き Fターム(参考) 4F100 AA17B AA17C AA20C AK01A AK04 AK21C AK41 AK51G AR00D AR00E BA03 BA04 BA05 BA07 BA10A BA10C BA10D BA25C CB00 EH46C EH461 EH661 GB15 GB41 HB31E JB05C JD02 JD03 JD04 JK06 JL12D JM01C JM02B YY00 YY00C 5G307 FA02 FB01 FC10 Continued on the front page F-term (reference) 4F100 AA17B AA17C AA20C AK01A AK04 AK21C AK41 AK51G AR00D AR00E BA03 BA04 BA05 BA07 BA10A BA10C BA10D BA25C CB00 EH46C EH461 EH661 GB15 GB41 HB31J02 JD05J02 JD05J02
Claims (8)
の少なくとも一方の面に形成した蒸着プラスチックフィ
ルムの蒸着面上に、金属酸化物ゾルをコーティングして
なるコーテイング層を設け、該コーティング層上にシー
ラント層を積層してなることを特徴とするガスバリア性
に優れた積層構造体。1. A coating layer formed by coating a metal oxide sol on a vapor-deposited surface of a vapor-deposited plastic film in which a thin film made of a metal oxide is formed on at least one surface of a substrate film. A laminated structure having excellent gas barrier properties, characterized by laminating a sealant layer on a laminate.
に、印刷層を積層した請求項1のガスバリア性に優れた
積層構造体。2. The laminated structure having excellent gas barrier properties according to claim 1, wherein a printed layer is laminated between the coating layer and the sealant layer.
下、酸素透過率が1.0cc/m2・24h・atm以下であ
る請求項1又は2のガスバリア性に優れた積層構造体。3. The laminated structure having excellent gas barrier properties according to claim 1, wherein the water vapor permeability is 2.0 g / m 2 · 24 h or less and the oxygen permeability is 1.0 cc / m 2 · 24 h · atm or less. .
る請求項1〜3のいずれかのガスバリア性に優れた積層
構造体。4. The laminated structure having excellent gas barrier properties according to claim 1, wherein the laminated structure has an adhesion strength of 500 g / 15 mm or more.
の少なくとも一方の面に形成した蒸着プラスチックフィ
ルムの蒸着面上に、金属酸化物ゾルをコーティングして
なるコーテイング層を設けてなり、水蒸気透過率が2.
0g/m2・24h以下、酸素透過率が1.0cc/m2・
24h・atm以下であることを特徴とするガスバリア性に
優れた積層用フィルム。5. A metal oxide sol-coated coating layer is provided on a vapor-deposited surface of a vapor-deposited plastic film in which a thin film made of a metal oxide is formed on at least one surface of a base film, and water vapor transmission is provided. The rate is 2.
0 g / m 2 · 24 h or less, oxygen permeability 1.0 cc / m 2 ·
A laminating film excellent in gas barrier properties, characterized in that the thickness is 24 h · atm or less.
5μmである請求項5のガスバリア性に優れた積層用フ
ィルム。6. The coating layer having a thickness of 0.01-1.
The film for lamination according to claim 5, which has a thickness of 5 µm.
項5又は6のガスバリア性に優れた積層用フィルム。7. The laminating film according to claim 5, wherein the metal oxide sol is a silica sol.
を含む水性液である請求項5〜7のいずれかのガスバリ
ア性に優れた積層用フィルム。8. The laminating film according to claim 5, wherein the metal oxide sol is an aqueous liquid containing polyvinyl alcohol.
Priority Applications (1)
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JP2000001228A JP3943304B2 (en) | 2000-01-07 | 2000-01-07 | Laminated structure with excellent gas barrier properties |
Applications Claiming Priority (1)
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JP2000001228A JP3943304B2 (en) | 2000-01-07 | 2000-01-07 | Laminated structure with excellent gas barrier properties |
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JP2001191442A true JP2001191442A (en) | 2001-07-17 |
JP3943304B2 JP3943304B2 (en) | 2007-07-11 |
Family
ID=18530477
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Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003326630A (en) * | 2002-05-10 | 2003-11-19 | Dainippon Printing Co Ltd | Laminated material and packaging bag using the same |
JP2003326633A (en) * | 2002-05-10 | 2003-11-19 | Dainippon Printing Co Ltd | Laminated material and packaging bag using the same |
JP2007083409A (en) * | 2005-09-20 | 2007-04-05 | Mitsubishi Plastics Ind Ltd | Gas barrier laminated film |
JP2007090874A (en) * | 2005-08-31 | 2007-04-12 | Mitsubishi Plastics Ind Ltd | Gas barrier laminated film |
WO2007123006A1 (en) * | 2006-04-21 | 2007-11-01 | Konica Minolta Holdings, Inc. | Gas barrier film, resin base for organic electroluminescent device, organic electroluminescent device using the same, and method for producing gas barrier film |
JP2008036863A (en) * | 2006-08-02 | 2008-02-21 | Mitsubishi Plastics Ind Ltd | Gas barrier laminated film |
JP2009302032A (en) * | 2008-05-13 | 2009-12-24 | Nitto Denko Corp | Transparent conductive film and its manufacturing method |
JP2017100451A (en) * | 2012-02-20 | 2017-06-08 | 株式会社クラレ | Vapor-deposited film, packaging material, vacuum insulator and manufacturing method of vapor-deposited film |
-
2000
- 2000-01-07 JP JP2000001228A patent/JP3943304B2/en not_active Expired - Lifetime
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003326630A (en) * | 2002-05-10 | 2003-11-19 | Dainippon Printing Co Ltd | Laminated material and packaging bag using the same |
JP2003326633A (en) * | 2002-05-10 | 2003-11-19 | Dainippon Printing Co Ltd | Laminated material and packaging bag using the same |
JP2007090874A (en) * | 2005-08-31 | 2007-04-12 | Mitsubishi Plastics Ind Ltd | Gas barrier laminated film |
JP2007083409A (en) * | 2005-09-20 | 2007-04-05 | Mitsubishi Plastics Ind Ltd | Gas barrier laminated film |
WO2007123006A1 (en) * | 2006-04-21 | 2007-11-01 | Konica Minolta Holdings, Inc. | Gas barrier film, resin base for organic electroluminescent device, organic electroluminescent device using the same, and method for producing gas barrier film |
JP5163491B2 (en) * | 2006-04-21 | 2013-03-13 | コニカミノルタホールディングス株式会社 | Method for producing gas barrier film, resin base material for organic electroluminescence, and organic electroluminescence device using the same |
JP2008036863A (en) * | 2006-08-02 | 2008-02-21 | Mitsubishi Plastics Ind Ltd | Gas barrier laminated film |
JP2009302032A (en) * | 2008-05-13 | 2009-12-24 | Nitto Denko Corp | Transparent conductive film and its manufacturing method |
JP2017100451A (en) * | 2012-02-20 | 2017-06-08 | 株式会社クラレ | Vapor-deposited film, packaging material, vacuum insulator and manufacturing method of vapor-deposited film |
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