JP2001033875A - Illuminator and projection aligner using the same - Google Patents

Abstract

PROBLEM TO BE SOLVED: To easily obtain an illumination condition suitable for forming a high-integration pattern image by using both of a diaphragm whose aperture diameter is variable and a variable power optical system and varying the illuminating condition of a surface to be irradiated. SOLUTION: In the 1st diaphragm 3 whose aperture diameter is variable, plural diaphragms 3a whose aperture sizes are different each other are arranged in a turret state, and the size of the aperture is changed variously by selecting one of plural diaphragms. An image forming variable power optical system 4 projects the light intensity distribution of the position of the diaphragm 3a so as to vary power on the incident surface 5a of an optical integrator 5 by driving lenses 4b and 4c by a driving means 10. A 2nd variable diaphragm (b) is arranged near the emitting surface 5b of the integrator 5, and plural diaphragms 6a having different aperture shapes such as zonal illumination or fourfold illumination are arranged in the turret state. By selecting the diaphragm 6a, the shape of the aperture is changed.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an illumination apparatus and a projection exposure apparatus using the same, for example, an IC, an LSI, and a CC.
D, a circuit pattern on an original plate (hereinafter referred to as a “reticle”) such as a photomask or a reticle uniformly illuminated with exposure light from an illumination device in a so-called stepper, which is an apparatus for manufacturing various devices such as a liquid crystal panel and a magnetic head. Is projected and transferred onto a wafer surface coated with a photosensitive agent to manufacture a device.

[0002]

2. Description of the Related Art In a projection exposure apparatus for manufacturing a semiconductor device, a reticle on which an electronic circuit pattern is formed is irradiated with a light beam from an illumination system, and the pattern is projected and exposed on a wafer surface by a projection optical system.

In the projection exposure apparatus, as one element for manufacturing a semiconductor element or the like having a finer pattern, there is a case where the NA and illumination conditions of a projection optical system of the projection exposure apparatus are optimized.

An illumination condition is a coherence factor (σ value) corresponding to a ratio of the NA of the illumination optical system to the NA of the projection optical system (NA of the illumination light beam emitted from the illumination optical system).
Is determined by Therefore, conventionally, the NA ratio of both optical systems has been adjusted so as to obtain an optimal illumination condition for obtaining an appropriate balance between the resolving power and the contrast for a predetermined pattern.

In an illumination optical system of a projection exposure apparatus, a secondary light source image formed by an optical integrator arranged in the illumination optical system has a relationship between a surface to be illuminated and a pupil. Therefore, the NA of the illumination optical system is changed by changing the size of the secondary light source image in the illumination optical system.

Conventionally, various methods have been proposed for changing the size of the secondary light source image in an illumination device. For example, in Japanese Unexamined Patent Publication No. S59-155843, a variable aperture stop having a variable aperture is disposed at the position of the emission side of an optical integrator, and the size of the aperture of the variable aperture stop is changed. A method for controlling the size of the secondary light source image has been proposed.

In Japanese Patent Application Laid-Open No. 4-369209,
By disposing a variable focal length optical system between the optical integrator and the light source and changing the magnification of the afocal variable power optical system, the light intensity distribution on the entrance surface of the optical integrator is changed, and the size of the secondary light source image is changed. There has been proposed a method of making the length variable.

[0008]

With the recent miniaturization and diversification of patterns, the optimum combination of the NA of the projection optical system and the illumination conditions has been diversified. From such a background, for example, the projection exposure apparatus continuously varies the NA of the projection optical system from 0.50 to 0.70, and continuously varies the σ of the illumination condition from 0.30 to 0.80. It is desired to design such a projection optical system having a wide selection range of NA and illumination conditions.

In the case of the above example, in order to realize a variable range of the σ value, the NA of the illumination optical system is 0.70 at the maximum and NAo = 0 when the NA of the projection optical system is σ0.80. .5
6, the minimum of NA of the projection optical system is 0.50 and σ is 0.
It must be variable up to NAo = 0.15 at 30.

At this time, the maximum NAo of the illumination optical system is 0.5
Assuming that the radius of the secondary light source image created by the optical integrator is 1 in step 6, the size of the secondary light source image must be continuously variable from the radius 1 to about 0.27 (0.15 / 0.56). .

The size of the secondary light source image is changed from a radius of 1 to 0.27.
Japanese Unexamined Patent Application Publication No. 4-36920
In an optical system using a variable power optical system proposed in Japanese Patent Application Laid-Open No. 9-1997 or the like, a variable power optical system having a zoom ratio of about 3.7 times must be designed. However, since the zoom ratio of the variable power optical system is determined by the stroke of the drive lens of the variable power optical system, there is a problem that as the zoom ratio increases, the stroke of the drive lens increases and the lens length increases. .

[0012] Further, when a variable aperture is arranged at the exit end (exit surface) of an optical integrator proposed in Japanese Patent Application Laid-Open No. 155843/1984 to make the size of a secondary light source continuously variable. Has the following problems. When a variable aperture is used, a variable aperture with a different aperture size is arranged in a turret and the aperture size is adjusted by selecting the aperture. If the variable aperture is used, the variable aperture size is used. Is discrete and there is a problem that the size of the secondary light source image cannot be made continuously variable.

It is also conceivable to dispose a continuously variable stop such as an iris stop in order to make the size of the aperture continuously variable. However, the configuration becomes complicated, and a large space is required for disposing the iris stop. There was a problem that had to be.

According to the present invention, the size or angle distribution of the secondary light source image formed by the optical integrator or the internal reflecting member is continuously variable even if the zoom ratio of the imaging variable power optical system is small, so that desired illumination conditions can be easily adjusted. It is an object of the present invention to provide an illuminating device suitable for forming a highly integrated pattern image and a projection exposure apparatus using the illuminating device.

[0015]

According to a first aspect of the present invention, there is provided an illuminating apparatus comprising: a light source; a variable aperture stop for restricting a light beam from the light source; A variable-magnification optical system that guides the light by changing the magnification, and an optical system that illuminates the surface to be illuminated with a light beam passing through the variable-magnification optical system; The illumination condition of the surface to be illuminated is made variable using both of them.

According to a second aspect of the present invention, there is provided an illuminating device, comprising: a light source; a variable aperture stop for restricting a light beam from the light source; and a light beam passing through the variable aperture stop being collected on an incident surface of the internal reflection member. A variable focal length optical system for guiding light by light; and an optical system for projecting a light intensity distribution on an emission surface of the internal reflection member onto a surface to be irradiated. It has an optically substantially pupil relationship with the entrance surface, and is characterized in that the illumination condition of the surface to be illuminated is variable by using both the variable aperture stop and the variable magnification optical system.

According to a third aspect of the present invention, there is provided an illumination apparatus, comprising: a light source; a variable aperture stop for restricting a light beam from the light source; A variable-magnification optical system for illuminating, and the aperture having a variable aperture diameter and the surface to be irradiated are optically substantially in a pupil relationship.

An illumination apparatus according to a fourth aspect of the present invention is an illumination apparatus for illuminating a surface to be illuminated by using a light beam from a light source. It is characterized in that a variable stop is arranged closer to the light source than the system.

A luminaire according to a fifth aspect of the present invention is a luminaire having a configuration in which a light beam from a light source is made incident on an incident surface of an inner reflecting member, and a light intensity distribution of an emitting surface of the inner reflecting member is projected on an illuminated surface. A variable power optical system for changing the size of a pupil with respect to the entrance surface of the internal reflection member, a light source side of the variable power optical system, and an optically substantially pupil relationship with the entrance surface of the internal reflection member. It is characterized in that a variable aperture is arranged at a certain position.

According to a sixth aspect of the present invention, there is provided an illumination apparatus for illuminating a surface to be illuminated with a light beam from a light source, and a variable power optical system for changing a size of a pupil of the illumination optical system with respect to the surface to be illuminated. The variable aperture is disposed at a position closer to the light source than the variable power optical system and the optical system and has a substantially pupil relationship with the surface to be illuminated.

According to a seventh aspect of the present invention, there is provided an illuminating device, comprising: a light source; an optical integrator for forming a plurality of secondary light source images by using light beams from the light source; And an illumination optical system for converging light beams from a plurality of secondary light source images formed by the optical integrator and illuminating the irradiated surface in a superimposed manner. An image-forming variable-magnification optical system that converges the variable size of the secondary light source image on the incident surface of the optical integrator, and is substantially conjugate with the incident surface of the optical integrator, and An aperture stop having a variable aperture diameter is arranged between the light source and the light source.

According to an eighth aspect of the present invention, in the seventh aspect of the present invention, the condensing optical system includes an internal reflection member for guiding a light beam from a light source, and an exit surface of the internal reflection member is controlled by the variable magnification optical system. The variable aperture stop is arranged near the exit surface of the internal reflection member, and is projected on the entrance surface of the optical integrator.

According to a ninth aspect of the present invention, in the invention of the seventh or eighth aspect, the variable aperture stop comprises a plurality of apertures having different aperture sizes arranged in a turret shape, and one of them is selected. Thus, the aperture is variable.

According to a tenth aspect of the present invention, there is provided a lighting device comprising: a light source;
An optical integrator for forming a plurality of secondary light source images using a light beam from the light source, a condensing optical system for guiding light from the light source to the optical integrator, and a plurality of secondary light source images formed by the optical integrator An illumination optical system for condensing the light beam from the light source and illuminating the irradiated surface in a superimposed manner, wherein the condensing optical system changes the size of the secondary light source image on the incident surface of the optical integrator. A focusing optical system that converges light and an internal reflecting member that internally guides the light by performing internal reflection. The exit surface of the internal reflecting member is incident on an optical integrator by the imaging variable magnification optical system. The internal reflection member is characterized in that a plurality of internal reflection members having different diameters can be replaced.

[0025] According to an eleventh aspect of the present invention, there is provided a projection exposure apparatus using the illumination device according to any one of the first to tenth aspects, wherein a pattern on an object surface provided on an irradiated surface is projected onto an exposure substrate by a projection optical system. It is characterized by projection exposure.

According to a twelfth aspect of the present invention, there is provided a device manufacturing method, wherein the projection exposure apparatus is used to project and expose an exposure substrate by a pattern projection optical system on an object surface, and then develop the exposure substrate. It is characterized by manufacturing a device.

[0027]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS FIG. 1 is a schematic view of a main part of a first embodiment of an illumination apparatus according to the present invention and a projection exposure apparatus using the same. The figure shows a semiconductor chip such as LSI or VLSI,
1 shows a step-and-repeat type or step-and-scan type projection exposure apparatus for manufacturing devices such as a CD, a magnetic sensor, and a liquid crystal element.

In FIG. 1, reference numeral 1 denotes a light source (light source means) such as a high-intensity ultra-high pressure mercury lamp or an excimer laser that emits ultraviolet light or far ultraviolet light, and diverges light in a specific luminance distribution and a specific light distribution. ing.

Reference numeral 2 denotes an elliptical mirror, which is set so that the light emitting point of the light source 1 is located at the first focal point 2a. The light emitting point of the light source 1 is imaged by the elliptical mirror 2 at the second focal point 2b.

Numeral 3 denotes a first aperture stop having a variable aperture diameter. A plurality of apertures 3a having different aperture sizes are arranged in a turret shape. By selecting one from the plurality of apertures, The size of the opening is variously changed.

Reference numeral 3b denotes a driving means for driving a plurality of turret-shaped apertures 3a. 4 is a condensing optical system,
It consists of a variable magnification optical system.

The image-forming variable magnification optical system 4 applies the light intensity distribution at the position of the stop 3a to the incident surface 5a of the optical integrator 5 by the driving means 10 to drive lenses 4b and 4c.
Is driven to project a variable magnification. In addition,
Regarding the power arrangement and the lens configuration of the lens, any configuration may be used as long as it is an imaging variable power optical system.

The optical integrator 5 forms a number of secondary light source images on its exit surface 5b. Reference numeral 6 denotes a second variable stop, which is arranged near the exit surface 5b of the optical integrator 5, and has a plurality of stops 6 having different aperture shapes such as annular illumination and quadrupole illumination as shown in FIG.
a (6a1 to 6a4) are arranged in a turret shape. The shape of the aperture is changed by selecting the stop 6a.

The variable stop 6 is a stop for responding to a change in an illumination mode other than the NA of the illumination optical system, for example, a modified illumination method, and is not necessarily used to change the NA of the illumination optical system. .

Reference numeral 6b denotes a driving means for driving the plurality of turret-shaped apertures 6a. 7 is an illumination optical system,
Consists of a condenser lens.

The condenser lens 7 uses a large number of secondary light source images formed on the exit surface 5b of the optical integrator 5 as an effective light source, and illuminates the reticle R, which is the surface to be irradiated, in a superimposed manner with a light beam therefrom. .

Numeral 8 denotes a projection optical system which projects and forms a pattern on the reticle R onto the wafer W in a satisfactory manner. 9 is the third
And the variable means 11 makes the NA of the projection optical system variable.

In accordance with an input signal from the input means 13, the control device 12 controls the first variable aperture, the second variable aperture 6,
The drive of the third variable stop 9 and the variable-magnification optical system 4 is controlled to realize desired NA of the projection optical system and illumination conditions.

In order to favorably image a fine pattern on the reticle R on the wafer W, it is necessary to optimize the NA of the projection optical system 8 and the illumination conditions. The NA of the projection optical system 8 is made variable by changing the aperture of the variable stop 9.

In this embodiment, in order to change the NA of the illumination optical system, the aperture of the variable stop 3 and the lens of the variable imaging optical system 4 are driven to change the magnification. FIG.
A method of changing the illumination optical system NA will be described with reference to FIG.

FIGS. 2 and 3 show the variable aperture 3 in FIG.
FIG. 3 shows details from a to the incident surface 5a of the optical integrator 5. FIG. FIGS. 2A and 2B show that the magnification is changed by the imaging variable power optical system 4 so that the size of the diameter of the light beam incident on the incident surface 5a to the optical integrator 5 is changed and formed on the exit surface 5b. 2 shows how the size of the secondary light source image to be changed is changed. The operation is the same as, for example, the method disclosed in JP-A-4-369209. The size of the secondary light source image is continuously variable.

FIG. 3 shows a state where the size of the aperture of the stop 3a of the variable stop 3 is changed. The aperture of the stop 3a in FIG. 3A is smaller than in the state of FIG. 2, and the amount of light that enters the variable magnification optical system 4 is small. Image forming optical system 4
Is an imaging optical system in which the position of the stop 3a is the object plane and the position of the entrance plane 5a is the image plane. Therefore, if the magnitude of the light intensity distribution on the object plane is small, the light intensity on the image plane is small. The size of the distribution also decreases.

For example, if the zoom ratio of the variable magnification optical system 4 is 2
If the maximum radius of the secondary light source image is 1, and the size of the secondary light source image is 1 according to the related art,
3 to 0.5, but as shown in FIG. 3, the aperture diameter of the stop 3a is reduced, a stop having a stop diameter of 0.5 is inserted, and the magnification of the imaging variable magnification optical system 4 is increased. By changing the size, the size of the secondary light source can be changed from a radius of 0.5 to 0.25.
Has changed.

That is, according to the present embodiment, it is possible to continuously change the size of the secondary light source image from a radius of 1 to 0.25 using the imaging variable power optical system 4 having a zoom ratio of 2 times. it can.

A plurality of stops having different aperture diameters are placed on the turret of the variable stop 3, and the stop placed at the position of the stop 3a is switched to a smaller stop so that the distribution of the secondary light source image can be continuously varied with a larger width. It is also possible to use In addition, by providing a stop for the modified illumination such as an annular zone or a quadrupole in the stop 3, even if the NA of the projection optical system 8 changes, illumination can be performed under the same modified illumination condition.

For example, in the case of annular illumination, the illumination conditions of the annular zone are determined by σ values inside and outside the annular zone. In the prior art, this illumination condition was realized by providing an annular stop on the exit surface 5b of the optical integrator 5. However, in this case, when the NA of the projection optical system 5 changes, the NA of the illumination optical system cannot be changed accordingly, so the σ values inside and outside the annular zone change, and unless the aperture is changed, When the NA was changed, the inner and outer σ values could not be made constant.

However, the variable magnification optical system 4 of the present embodiment
When the stop of the annular zone is placed on the object plane, the NA of the illumination optical system is changed by changing the magnification of the variable-magnification optical system 4 in accordance with the change in the NA of the projection optical system 8. , The NA of the projection optical system 8 can be
Even if is changed, the same illumination condition in which the σ values inside and outside the annular zone are equal can be achieved.

In the present embodiment, as described above, the variable stop for changing the magnitude of the light intensity distribution is arranged near the object plane of the image-forming variable magnification optical system having the image plane on the incident surface of the optical integrator. Depending on the combination of the magnitude of the light intensity distribution on the object plane of the image magnification optical system and the zoom ratio, two
The size of the secondary light source image is changed.

FIG. 4 is a schematic view of a main part of a second embodiment of a projection exposure apparatus using the illumination apparatus of the present invention.

In this embodiment, as compared with the first embodiment, an optical rod (internal reflection member) 14 is used, its light incident surface 14a is made substantially coincident with the second focal point 2b of the elliptical mirror 2, and its light exit surface 14b in that a substantially uniform illuminance distribution is formed.

The first variable stop 3 is arranged near the light exit surface 14b of the internal reflection member 14. The inner reflecting member 14 and the variable power optical system 4 constitute one element of the light collecting optical system.

The light intensity distribution on the exit surface 14b of the inner reflecting member 14 is projected on the incident surface 5a of the optical integrator 5 by the variable magnification optical system 4.

The inner reflecting member 14 reduces the light intensity, which was not uniform on the incident surface 14a of the inner reflecting member, by reflecting the light incident on the inner reflecting member a plurality of times on the side surface of the inner reflecting member. There is a function of uniformizing the light on the exit surface 14b. The internal reflection member may be, for example, a flat mirror arranged to face each other, or may simply be a rod-shaped glass material. In the case of a rod-shaped glass material, when a light beam strikes the rod-shaped side surface, the light is totally reflected due to the difference between the refractive index of the glass material and the refractive index of air.

In this embodiment, the uniformity of the light intensity on the incident surface 5a of the optical integrator 5 is enhanced, and a more uniform secondary light source image can be obtained.

The method of controlling the size of the secondary light source image is the same as in the first embodiment. That is, in the present embodiment, the inner reflecting member 1
4 is provided with an image-forming variable-magnification optical system 4 having an exit surface 14b as an object surface and an entrance surface 5a of an optical integrator 5 as an image surface, and a variable light intensity distribution near the exit surface 14b of the internal reflection member. The aperture 3 is arranged, and the size of the secondary light source image is continuously changed by a combination of the magnitude of the light intensity distribution on the object plane of the imaging variable magnification optical system 4 and the zoom ratio.

FIG. 5 is a schematic view of a main part of a third embodiment of a projection exposure apparatus using the illumination device of the present invention.

The present embodiment differs from the second embodiment in that a plurality of internal reflection members having different aperture diameters are used as apertures with variable aperture diameters, and thus the first variable aperture 3 is not used. ing.

The internal reflection member has a function of making the non-uniform light intensity distribution incident on the incident surface uniform on the exit surface and emitting the light. When light is blocked by placing a stop on the exit surface as in the second embodiment, the amount of light ahead of the stop is reduced by the blocked area.

For example, assuming that light is blocked at the exit end of the internal reflecting member in order to reduce the size of the object surface of the imaging variable magnification optical system to half, as shown in FIG. 2 by height
One-half of the light is blocked, and the amount of light that reaches the aperture first becomes one-fourth.

In the present embodiment, the light is shielded at the incident surface of the inner reflecting member in order to change the diameter of the inner reflecting member. On the incident surface of the inner reflection member, the light intensity distribution is not uniform, and the central portion has a high light intensity distribution as shown in FIG. For this reason, by changing the diameter of the inner reflecting member and blocking the light on the incident surface of the inner reflecting member, the loss of the light amount can be reduced.

As a method of changing the diameter of the inner reflecting member, as shown in FIG. 8, a plurality of rod-shaped glass members 14 having different diameters are used.
A method of arranging -1 and 14-2 in a turret shape and selecting them can be applied.

As described above, the present embodiment is provided with a variable-magnification optical system in which the exit end of the internal reflection member is used as the object plane and the entrance surface of the optical integrator is used as the image plane. By changing the material, the size of the light intensity distribution on the object plane of the variable magnification optical system is changed, and the size of the secondary light source image is continuously changed in combination with the zoom ratio.

FIG. 9 is a schematic view of a main part of a fourth embodiment of a projection exposure apparatus using the illumination device of the present invention. In the first, second, and third embodiments, the illumination device illuminates the illumination target surface with uniform illuminance using the optical integrator.

On the other hand, in the present embodiment, by using two internal reflection members and projecting a uniform light intensity distribution at the exit end of the internal reflection member onto the surface to be illuminated, the illumination condition (σ ) Is changed to illuminate the illuminated surface with uniform illuminance.

Reference numeral 1 denotes a divergent light source that diverges light with a specific luminance distribution and a specific light distribution. 2 is a condenser mirror,
The luminous flux emitted from the light source 1 is collected. 14 is the first
And has the function of making the angular distribution uniform on the surface to be illuminated. However, the first inner reflection member 14 is not essential and may not be provided, and the same effect can be obtained by using an optical integrator. Reference numeral 3 denotes a first variable stop, and a plurality of stops having different aperture sizes are arranged on the turret. The size of the aperture is changed by selecting the diaphragm of the variable diaphragm 3.

Reference numeral 15 denotes a variable focal length optical system.
The position distribution of the light intensity at the position a is converted into an angular distribution and is incident on the incident surface 16a of the second internal reflection member 16. The maximum value of the angle distribution on the incident surface 16a of the second internal reflection member 16 is determined by the driving means 10 on the driving lens 15b.
It is changed by driving. The second inner reflection member 16 has a function of making the light intensity distribution on the incident surface 16a uniform on the exit surface 16b.

The cross section of the second inner reflecting member 16 is similar to the illuminated area. Reference numeral 17 denotes an illumination optical system for projecting a light intensity distribution on the emission surface 16b of the second internal reflection member 16 onto the reticle R. Since the light intensity distribution on the exit surface 16b of the second internal reflection member 16 is uniform, the reticle R is illuminated by the optical system 17 with a uniform illuminance distribution.

Reference numeral 8 denotes a projection optical system, which projects and forms a pattern on the reticle R on the wafer W in an excellent manner. Numeral 9 denotes a variable stop, which is controlled by a variable means 11 to set the NA of the projection optical system.
Is variable.

The control device 12 controls each of the elements 3, 15 and 9 according to the input of the input means 13, and realizes the NA of the projection optical system 8 and the illumination conditions to desired values.

The angle of incidence on the incident surface 16a of the inner reflecting member 16 is changed by the variable focal length optical system 15, and
The illumination condition (σ) on the reticle R is adjusted by the optical system 17 by changing the exit angle of the light beam from the light source 6b.

This embodiment is provided with a variable focal length optical system 15 having an incident surface 16a of an internal reflecting member 16 for projecting the light intensity distribution at the exit end onto the surface to be illuminated, and an image plane. A variable stop 3 for changing the magnitude of the light intensity distribution is arranged near the pupil of the illumination optical system 15 according to the combination of the magnitude of the light intensity at the pupil position of the variable focal length optical system 15 and the zoom ratio. Is changing.

In the device manufacturing method of the present invention, the device is manufactured by using a known developing process for the wafer that has been exposed by the projection exposure apparatus.

[0073]

According to the present invention, the size or the angle distribution of the secondary light source image formed by the optical integrator or the internal reflection member can be continuously varied even if the zoom ratio of the image-forming variable power optical system is small, and the desired value can be obtained. Illumination conditions can be easily obtained, and an illumination apparatus suitable for forming a highly integrated pattern image and a projection exposure apparatus using the same can be achieved.

In addition, according to the present invention, the size of the secondary light source image formed by the optical integrator can be continuously changed to be equal to or larger than the magnification of the image forming optical system.

[Brief description of the drawings]

FIG. 1 is a schematic diagram of a main part of a first embodiment of a projection exposure apparatus using an illumination device of the present invention.

FIG. 2 is an enlarged explanatory view of a part of FIG. 1;

FIG. 3 is an enlarged explanatory view of a part of FIG. 1;

FIG. 4 is a schematic view of a main part of a second embodiment of a projection exposure apparatus using the illumination device of the present invention.

FIG. 5 is a schematic diagram of a main part of a third embodiment of a projection exposure apparatus using the illumination device of the present invention.

FIG. 6 is an explanatory diagram of the amount of light when a stop is formed on the exit surface of the internal reflection member according to the present invention.

FIG. 7 is an explanatory diagram of the amount of light when a stop is provided on the entrance surface of the internal reflecting member according to the present invention.

FIG. 8 is an explanatory diagram in which the diameter of the internal reflection member according to the present invention is variable.

FIG. 9 is a schematic diagram of a main part of a fourth embodiment of a projection exposure apparatus using the illumination device of the present invention.

FIG. 10 is an explanatory view of a variable aperture stop according to the present invention.

[Explanation of symbols]

 1: Light source 2: Condensing mirror 3: Variable aperture 4: Variable imaging optical system 5: Optical integrator 6: Variable aperture 7: Condenser lens 8: Projection optical system 9: Variable aperture 14: Internal reflection member 15: Focal length Variable optical system 16: Internal reflection member 17: Imaging optical system R: Reticle W: Wafer

Claims (12)

[Claims] 1. A light source, a variable aperture stop for restricting a light beam from the light source, and a variable power optical system for guiding a light beam having passed through the variable aperture stop onto a predetermined surface to guide the light beam. An optical system for illuminating a surface to be illuminated with a light beam passing through the variable-power optical system, and using both the aperture with a variable aperture diameter and the variable-power optical system to change the illumination condition of the surface to be illuminated. A lighting device, characterized in that: 2. A light source, a variable-aperture stop for restricting a light beam from the light source, and a focal length for condensing a light beam passing through the variable-aperture stop on an incident surface of an internal reflection member and guiding the light beam. A variable optical system, and an optical system for projecting a light intensity distribution on an emission surface of the internal reflection member onto a surface to be illuminated, wherein the variable aperture stop is optically substantially pupil with the entrance surface of the internal reflection member. Wherein the illumination condition of the surface to be illuminated is variable by using both the variable aperture stop and the variable magnification optical system. 3. A light source, a variable aperture stop for restricting a light beam from the light source, and a variable power optical system for changing a light beam passing through the variable aperture stop to illuminate a surface to be irradiated. An illumination device comprising: a diaphragm having a variable aperture diameter; and an illuminated surface having an optically substantially pupil relationship. 4. An illumination device for illuminating a surface to be illuminated by using a light beam from a light source, comprising: a variable power optical system for varying illumination conditions of the surface to be illuminated; and a variable stop closer to the light source than the variable power optical system. A lighting device, comprising: 5. A lighting device having a configuration in which a light beam from a light source is made incident on an incident surface of an internal reflection member and a light intensity distribution of an emission surface of the internal reflection member is projected on a surface to be illuminated. A variable power optical system for changing the size of a pupil with respect to a surface, and a variable stop disposed at a position closer to the light source than the variable power optical system and substantially optically related to the entrance surface of the internal reflecting member. A lighting device, comprising: 6. An illumination optical system for illuminating a surface to be illuminated with a light beam from a light source, a variable power optical system for changing the size of a pupil of the illumination optical system with respect to the surface to be illuminated, and a variable power optical system. A variable aperture is disposed on the light source side and at a position optically substantially pupil-related to the surface to be illuminated. 7. A light source, an optical integrator for forming a plurality of secondary light source images by using light beams from the light source, a condensing optical system for guiding light from the light source to the optical integrator, and an optical integrator formed by the optical integrator An illumination optical system for condensing light beams from the plurality of secondary light source images thus obtained and illuminating the irradiated surface in a superimposed manner, wherein the condensing optical system is provided on the incident surface of the optical integrator. A variable-magnification optical system for converging the size of the secondary light source image to be variable, substantially conjugate to the entrance surface of the optical integrator, and between the variable-magnification optical system and the light source. An illuminating device comprising an aperture stop having a variable aperture diameter. 8. The condensing optical system includes an internal reflecting member for guiding a light beam from a light source, and projects an exit surface of the internal reflecting member onto an incident surface of the optical integrator by the variable power optical system. Near the exit surface of the internal reflection member,
The illumination device according to claim 7, wherein the variable aperture stop is arranged. 9. The diaphragm having a variable aperture, wherein a plurality of diaphragms having different sizes of apertures are arranged in a turret shape, and one of the diaphragms is selected to change the aperture. 9. The lighting device according to claim 7, wherein: 10. A light source, an optical integrator for forming a plurality of secondary light source images using a light beam from the light source, a condensing optical system for guiding light from the light source to the optical integrator, and an optical integrator formed by the optical integrator An illumination optical system for condensing light beams from the plurality of secondary light source images thus obtained and illuminating the irradiation surface in a superimposed manner, wherein the condensing optical system is provided on the incident surface of the optical integrator. A variable-magnification optical system for converging the size of the secondary light source image and an internal reflection member for guiding light by internal reflection; A lighting system, wherein a plurality of inner reflecting members having different diameters are replaceable as the inner reflecting member, which is projected onto an incident surface of an optical integrator by a system. 11. A pattern on an object surface provided on a surface to be illuminated is projected and exposed on an exposure substrate by a projection optical system using the illumination device according to any one of claims 1 to 10. Projection exposure equipment. 12. A device is manufactured by projecting and exposing on an exposure substrate by a pattern projection optical system on an object surface using the projection exposure apparatus according to claim 11, and developing the exposure substrate. Device manufacturing method.