JP2000347182A - Color filter substrate, and liquid crystal device and electronic device using the same - Google Patents

Abstract

PROBLEM TO BE SOLVED: To obtain a color filter substrate having good reflection characteristics by successively forming a reflection plate and a color layer from an insulating substrate side between the insulating substrate and a transparent electrode to form a structure such that the reflection plate is formed in a region which includes the display region of a liquid crystal device using this reflection plate and which is smaller than the color layer. SOLUTION: A reflection plate and a color layer are successively formed, from an insulating substrate side, between the insulating substrate and a transparent substrate, and the reflection plate is formed in a region which includes the display region of a liquid crystal device using this reflection plate and which is smaller than the color layer. For example, according to this method for the production, a metal layer 2 as the reflection plate is formed on an insulating substrate (glass substrate) 1, and then the metal layer 2 is patterned to include the area 9 to be used as the display region of the liquid crystal device using this color filter substrate. Then a color layer 4 is formed to cover the whole surface of the metal layer 2. Then an adhesion improving layer 5 and a transparent electrode 7 are continuously formed and the transparent electrode 7 is patterned according to the liquid crystal device using this color filter substrate.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a color filter substrate for forming a colored layer on a metal and a liquid crystal device for forming a colored layer on a metal reflective layer provided on the liquid crystal layer side of the substrate. Further, the present invention relates to an electronic device including the liquid crystal device.

[0002]

2. Description of the Related Art Conventionally, taking advantage of the feature of low power consumption,
Reflective liquid crystal devices have been used in portable information terminals and the like. Further, as the number of exchanges of image information has increased, the trend toward colorization of reflective liquid crystal devices has been increasing, and the market has been expanding.

Here, as a configuration of the device, a reflection plate is provided on either the outer surface or the inner surface of the display device.
Although it is possible to realize a reflection type liquid crystal device, it is necessary to provide a reflection plate on the inner surface in order to eliminate fatal defects on display quality such as parallax and color blur due to the thickness of the glass substrate. preferable.

For example, in an active matrix type liquid crystal device, a pixel electrode on a substrate on which elements are formed is replaced by a reflection plate which also serves as a pixel electrode, instead of a transparent electrode in the case of a transmissive display device. A reflective color liquid crystal device can be realized.

[0005]

However, for example, when aluminum is used as a reflection plate also serving as a pixel electrode, aluminum is exposed on the outermost surface, so that aluminum is damaged due to weak corrosion resistance. It may affect the reflection characteristics and electrical characteristics. In the liquid crystal device manufacturing process, for example, a liquid crystal alignment film forming step includes N-methylpyrrolidone (1-methyl-2-pyrrolidinone) and γ
-Butyrolactone (4-hydroxybutyric acid γ-
Lactone), and apply a solution mainly containing polyimide or polyamic acid dissolved in a polar solvent such as
Since the method includes a step of heating from 250C to 250C, there is a high possibility that aluminum is damaged.

Further, the other pixel electrode is made of ITO (Indium T
In the case of “in Oxide”, a polarity difference is generated between the aluminum electrode sandwiching the liquid crystal layer and the ITO electrode, which affects the display quality of the liquid crystal device, and at the same time, the polarity difference is caused by the liquid crystal device. Decrease long-term reliability.

[0007] These phenomena, although to a certain extent even in aluminum alloys containing a predetermined amount of other atoms,
Occurs similarly.

Further, in the case of a liquid crystal device provided with irregularities of 0.3 μm to 1.5 μm in order to add a scattering function to the reflector, the thickness of the liquid crystal layer and the pretilt angle of the liquid crystal molecules are partially determined by the irregularities. Changes, so that good display characteristics may not be obtained.

In a liquid crystal device, a liquid crystal responds to a region of several μm around a pixel electrode due to a so-called oblique electric field, which is a distortion of lines of electric force caused by a mismatch between widths of opposing electrodes. Since the area also serves as a pixel electrode, the area cannot be effectively utilized.

The present invention has been made in view of the above problems, and an object of the present invention is to provide a color filter substrate having good reflection characteristics and a liquid crystal device having good display characteristics.

[0011]

Means for solving the above problems The means taken by the present invention to solve the above problems are as follows.

The color filter substrate of the present invention is provided with at least a reflector, two or more colored layers, and a transparent electrode on an insulating substrate, and the insulating substrate side is provided between the insulating substrate and the transparent electrode. , A reflector and a colored layer are formed in this order, and the reflector is formed in a region including a display region in a liquid crystal device using the reflector and narrower than the colored layer.

According to the present invention, it is not necessary for the reflector to also function as a pixel electrode, and a wider area than the pixel electrode area can be used as the reflector, so that the reflectance can be improved. .

Further, since the reflector made of a metal layer is separated from the outside by the colored layer, the reflector does not come into direct contact with the liquid chemical, gas, or liquid crystal layer in the liquid crystal device manufacturing process, so that damage to the reflector can be suppressed.

In this case, after the reflector is patterned so as to have a smaller area than the colored layer, a colored layer is formed so as to cover the reflector, and a transparent electrode is formed thereon. Contact between dissimilar metals can be avoided, and damage due to chemical reactions such as electrolytic corrosion can be suppressed.

[0016] It should be noted that I is applied on a resin material such as the colored layer.
When a transparent electrode such as TO is formed, an inorganic oxide film typified by SiO ₂ is provided between the resin material and the transparent electrode to improve the adhesion between the layers, and is used as an adhesion improving layer. Is also good. In the case of a color filter substrate using glass as the insulating substrate, it is necessary to ensure the adhesion of the transparent electrode using ITO to the surface having different surface characteristics, that is, the glass surface and the resin material. A method of continuously forming SiO ₂ and ITO is generally used. Therefore, a transparent electrode provided on a color filter substrate refers to a transparent electrode integrated with an adhesion improving layer unless otherwise specified.

As the metal layer used as the reflection plate, a metal layer containing aluminum, silver, chromium or the like as a main component is used.
In the case of using a metal layer containing aluminum as a main component, a metal layer having high reflectance is realized by using an inexpensive material. The content ratio of aluminum in the metal layer is preferably 85% by weight or more. When a metal layer containing silver as a main component is used, a metal layer having a very high reflectance is realized. The proportion of silver in the metal layer is preferably at least 85% by weight. When a flexible substrate such as a plastic film is used, a metal layer that can be formed by electroless plating or the like, for example, a metal layer containing nickel as a main component, in addition to the metal layer, is used as the reflector. It is also possible to use. When the metal layer used as the reflector may be damaged by a chemical solution or gas exposed in the colored layer forming step formed on the metal layer, the reflectance of the metal layer is not significantly reduced. To the extent it is desirable to add a protective layer on the metal layer. However, since the colored layer becomes a substantial protective layer, it is sufficient that the protective layer provided on the metal layer provided here has resistance to a chemical solution, a gas, or the like exposed at the time of forming the colored layer. is there.

For example, when a colored layer is formed on a metal layer by a printing method, a dyeing method, or the like, a protective layer on the metal layer is unnecessary, but in the case of a colored photosensitive material method using a photosensitive color resist, Depending on the material used, a strong alkaline developer may be used. Therefore, it is desirable to provide a protective layer on the metal layer according to the combination of the developer and the metal layer. In general, when aluminum is used for a metal layer, a protective layer is required. For example, by using aluminum containing 1% by weight of neodymium for a metal layer, corrosion resistance is improved, and sodium carbonate and hydrogen carbonate are used. A developer having a general composition using a mixed aqueous solution of sodium, an aqueous solution of tetramethylammonium hydroxide, or the like is less likely to be damaged so as to lower the reflectance. In addition, by using aluminum containing 3% by weight of neodymium or aluminum containing 3% by weight of neodymium and 3% by weight of titanium (Ti), the corrosion resistance is further improved, so that a protective layer on the metal layer is provided. In addition, a colored layer can be formed. Further, by using a silver alloy containing palladium (Pd) and titanium or a silver alloy containing palladium and copper (Cu) as the metal layer, it is possible to achieve both high reflectance and high corrosion resistance. No protective layer on the metal layer is required for the step of forming a colored layer.

The color filter substrate of the present invention is provided with at least a reflector, two or more colored layers, one or more protective layers, and a transparent electrode on an insulating substrate. A reflective plate, a colored layer, and one or more protective layers are formed in this order from the insulating substrate side, and the reflective plate includes a display region in a liquid crystal device using the same, and Is also formed in a narrow area.

According to the present invention, it is not necessary for the reflector to also function as the pixel electrode, and a wider area than the pixel electrode area can be used as the reflector, so that the reflectance can be improved. .

Further, since the reflection plate made of a metal layer is separated from the outside by the protective layer, it does not come into direct contact with the liquid chemical, gas, or liquid crystal layer in the liquid crystal device manufacturing process, so that damage to the reflection plate can be suppressed.

In this case, a colored layer is provided after patterning the reflector in a range narrower than the protective layer, a protective layer is formed so as to cover the reflector and the colored layer, and a transparent electrode is formed thereon. I do. Therefore, regardless of the pattern of the colored layer, contact between different metals can be avoided more reliably, and damage to the transparent electrode due to a chemical reaction such as electrolytic corrosion can be suppressed.

Here, since the reflection plate is configured to be separated from the outside, the reflectance is high, but the reflection plate is easily oxidized, and therefore silver or an alloy containing silver as a main component, which is difficult to use as an electrode. However, it is possible to adopt a color filter substrate having better reflection characteristics.

As the protective layer, an oxide, an organic insulating film or a nitride can be used. The oxide is Si
Silicon oxide such as O _2, acrylic resin as the organic insulating film, and silicon nitride typified by Si ₃ N ₄ as the nitride can be given. In particular, when an organic insulating film is used, a protective film can be easily formed by spin coating, roll coating, or the like.

Further, two or more kinds of films selected from the above-mentioned oxide films, organic insulating films and nitride films may be appropriately combined to form a protective layer. By doing so, the metal layer, the coloring layer,
Adhesion with the transparent electrode layer can be enhanced, and the effect of the protective layer can be further ensured, and a decrease in reflectance can be minimized.

Further, the color filter substrate of the present invention is characterized in that at least one of the protective layers has a light scattering property.

According to the present invention, the color filter substrate comprises:
A color filter function, a reflector function, and a scattering function can be provided. Since the protective layer also serves as the light scattering layer, it is not necessary to provide a separate means for realizing the scattering function, and the number of steps can be reduced and low cost can be realized.

As the protective layer having a light scattering function, a layer in which particles having different refractive indices are dispersed in an organic insulating film can be used. It is desirable that the particles dispersed in the organic insulating film have a different refractive index from the organic insulating film and have a smaller particle size than the thickness of the insulating film. Thus, a protective film having both flatness and scattering properties can be obtained. As the organic insulating film, an acrylic resin or a polyimide resin can be used, and as the particles dispersed in the organic insulating film, inorganic particles such as glass beads or organic polymer particles such as polystyrene spheres can be used. The scattering properties can be controlled by the thickness of the organic insulating film having a scattering function, the refractive index difference between the organic insulating film and the dispersed particles, the particle diameter, the degree of dispersion of the particles, and the like. In the protective film having a light scattering function used here, it is desirable that the haze value is in the range of 40 to 90%, and the refractive index difference between the organic insulating film and the dispersed particles is in the range of 0.05 to 0.12. The refractive index of each material is, for example, P
MMA (polymethyl methacrylate) is around 1.50,
The polyimide resin is about 1.60 to 1.65, the particles dispersed in the organic insulating film are about 1.35 for PTFE (4-fluoroethylene), about 1.42 for PVDF (vinylidene fluoride), and LF1 optical. Glass is around 1.57, styrene is around 1.59, F2 optical glass is around 1.62,
The SF2 optical glass has a value such as 1.65, and a desired scattering function can be obtained by appropriately using them in combination. The refractive index of the materials mentioned here can have different values depending on the manufacturing method and form. Further, these are some of the materials that can be used, and the present invention is not limited to these, and materials having various characteristics can be used in combination.

Further, the color filter substrate of the present invention is characterized in that one or more adhesion improving layers are formed between the insulating substrate and the reflector.

According to the present invention, at least one adhesion improving layer is provided between the metal layer and the insulating substrate even if the combination is such that the adhesion between the insulating substrate and the metal layer used for the reflector is poor. By providing the color filter, it is possible to enhance the adhesion of the metal layer and provide a color filter substrate having good reflection characteristics and high durability. As a material of the adhesion improving layer, metal, oxide or nitride can be used.
The metal film is made of 5b such as Ta, Cr, Mo, W, etc.
Examples of the oxide such as a transition metal included in Group 6b include T
such as silicon oxide, such as oxide or SiO ₂ of the metal, such as a ₂ O ₅ and the like. As the another examples of oxides, such as TiO ₂ or ZrO ₂ and Combinations of these with SiO ₂ as appropriate, _Al 2 _{O 3,} or _the like. Also,
Examples of the nitride include silicon nitride typified by Si ₃ N ₄ . Since these films are intended to improve adhesion, they are around 100 nm, and in some cases, 30 to 6 nm.
A film thickness of about 0 nm is sufficient. Further, when a non-conductive SiO ₂ film or Ta ₂ O ₅ film is used,
The step of patterning these films into an arbitrary shape can be omitted, and these films may remain on the entire surface of the insulating substrate. For example, when a metal layer made of an alloy containing aluminum or silver as a main component is used as a reflector and glass is used as an insulating substrate, an Mo, Ta ₂ O ₅ , SiO ₂ film, or the like is used to improve adhesion. Is preferably used as the adhesion improving layer. When a flexible substrate such as a plastic film is used as the insulating substrate, a SiO ₂ film, TiO ₂ , ZrO
_It is desirable to use, as an adhesiveness improving layer, _{2 or a} combination of these and SiO ₂ as appropriate.

Further, in the color filter substrate according to the present invention, the reflection plate may be substantially inward of the peripheral portion of each pixel in the liquid crystal device using the same or a distance between the opposing electrodes of the liquid crystal device. It is characterized in that it is formed in a region surrounded by a line connecting a range that is approximately 1/2 outside the distance.

According to the present invention, since the reflection plate can be arranged at a portion outside the pixel electrode but corresponding to the region driven by the oblique electric field in the liquid crystal device,
A substantial aperture ratio can be improved. The design pixel is a region where each pixel electrode on the opposing substrate overlaps, but when the pixel electrode on the opposing substrate is formed outside the pixel electrode end of one substrate, The portion corresponding to a length of about １ ／ of the distance between the opposing electrodes is driven by the electric field. For example, in a certain liquid crystal mode, when the distance between the electrodes of the opposing substrate is 4.0 μm, the oblique electric field causes an area of about 2.0 μm outside the pixel electrode.
The liquid crystal up to the vicinity is driven. In a liquid crystal device adopting a normally black liquid crystal mode in which a non-driving portion performs black display,
When the driving unit performs white display, the liquid crystal outside the peripheral portion of the pixel electrode is driven by the oblique electric field. Therefore, by disposing the reflector so as to extend to the region, the liquid crystal is substantially larger than the pixel electrode area. The aperture ratio can be improved, and a bright display can be realized. Further, in a liquid crystal device employing a normally white liquid crystal mode in which the non-driving section displays white, if a reflection plate is disposed in the non-driving section, a complete black display is obtained even when the driving section performs black display. However, as in the present configuration, the reflection plate is used up to the region driven by the oblique electric field even though it is a non-driving unit, so that the aperture can be reduced without lowering the contrast. Rate can be improved. Further, in a liquid crystal device using a normally white liquid crystal mode of super twisted nematic (STN) liquid crystal, even when a driving portion performs black display on a side of a pixel electrode, the liquid crystal is completely driven by the influence of an oblique electric field. In some cases, a phenomenon occurs in which a region that is not left remains in the pixel electrode and the contrast is reduced.However, in this configuration, the reflector does not need to serve also as the pixel electrode, and the reflector is independent of the pixel electrode. A reflector can be provided outside the pixel electrode for a region driven by an oblique electric field, and a reflector can be provided for a region corresponding to an undriven region on the pixel electrode due to the oblique electric field. The aperture ratio can be eliminated, the substantial aperture ratio can be improved, and a bright display can be provided without lowering the contrast. These will be described with reference to FIGS. FIG.
FIG. 27A is a schematic plan view of a passive matrix type liquid crystal device using a super twisted nematic mode, and FIG. 27B is a diagram illustrating the orientation direction of liquid crystal molecules adjacent to an opposing substrate in the liquid crystal device. FIG. 3 is a diagram illustrating the orientation direction of liquid crystal molecules in a bulk. FIG. 27C shows the GG- in FIG. 27A when no voltage is applied.
FIG. 27D is a schematic cross-sectional view taken along a line GG-GG ′ in FIG. 27A when a drive voltage is applied. In the passive matrix type liquid crystal device, the region where the pixel electrode 22 on the upper substrate 21 and the pixel electrode 32 on the lower substrate 31 facing the same intersects one another.
It becomes the area of the pixel, that is, the driving region 50. For example, when a counterclockwise super-twisted nematic liquid crystal mode is adopted by a combination of the rubbing direction 23 on the upper substrate 21 side and the rubbing direction 33 on the lower substrate 31 side, the liquid crystal molecules 41 in the vicinity of the upper substrate 21 become closer to the upper substrate 21 side. In the rubbing direction 23, the liquid crystal molecules 42 near the lower substrate 31 are oriented along the rubbing direction 33 on the lower substrate 31 side. At this time, the bulk liquid crystal molecules 43 of the liquid crystal layer 40 are oriented so as to be orthogonal to the pixel electrodes 32 on the lower substrate 31 side. When no voltage is applied, as shown in FIG. 27C, the orientation of the liquid crystal molecules 43 in the bulk of the liquid crystal layer 40 is uniform, but when a driving voltage is applied, as shown in FIG. Lines of electric force 53 generated between the pixel electrode 22 on the side of the lower substrate 31 and the pixel electrode 32 on the side of the lower substrate 31 are distorted at the periphery of the pixel,
The orientation of the liquid crystal molecules 43 in the bulk of the liquid crystal layer 40 is disturbed, and a reverse tilt domain and a region 51 in which the liquid crystal molecules 43 in the bulk are not driven are generated. Conversely, on the other electrode end side, a region 52 where the liquid crystal molecules 43 in the bulk outside the pixel electrode 32 on the lower substrate 31 side are driven appears. Since the pixel electrode 22 on the upper substrate 21 and the liquid crystal molecules 43 in the bulk of the liquid crystal layer 40 are aligned in parallel, no reverse tilt domain occurs. For these reasons, it is not necessary to dispose the reflector at the position corresponding to the reverse tilt domain and the region 51 where the liquid crystal molecules 43 in the bulk are not driven, and to extend the reflector outside the drive region 50 otherwise. Accordingly, the aperture ratio is substantially improved without lowering the contrast, and a bright display is provided. This can be realized by adopting this configuration and providing the reflection plate independently of the pixel electrode via an insulating film.

Further, in the color filter substrate according to the present invention, the reflection plate includes a display area in a liquid crystal device using the same and is formed over the entire surface of a region narrower than the protective layer. The reflection plate is provided outside a peripheral portion of one pixel, outside a region surrounded by a line connecting a range between the inside of the liquid crystal device, which is substantially equivalent to the distance between the opposing electrodes of the liquid crystal device, and the outside of the half of the distance between the electrodes. A light-shielding layer is formed between the transparent electrode and the transparent electrode.

According to the present invention, a reflection plate is arranged in a portion outside each pixel electrode but corresponding to a region driven by an oblique electric field in a liquid crystal device, and a light-shielding layer is formed in other regions. Are arranged, so that the aperture ratio can be improved without lowering the contrast. In this configuration, since the substantial periphery of the reflector is defined by the light shielding layer, the metal layer used for the reflector may be patterned over the entire effective display area. Even in the case of patterning the reflector for each pixel, it is sufficient that the peripheral edge of the reflector falls within the range of the light shielding layer. Therefore, in either case, the patterning of the metal layer used for the reflector can be realized with lower accuracy than the pixel electrode or the like. In the case where a semi-transmissive reflection plate is formed by reducing the thickness of the metal layer itself used for the reflection plate, the light-shielding layer also functions as a light-shielding layer in transmission display. On the other hand, when a semi-transmissive reflector is formed by providing an opening in a part of the metal layer used for the reflector, which occupies a desired ratio in one pixel, the metal layer serving as the reflector and the light-shielding layer are separated from each other. Functions as a light-shielding layer during transmissive display.

Further, in the color filter substrate according to the present invention, the reflection plate may be located between the periphery of each pixel in the liquid crystal device using the same and the distance between the facing electrodes of the liquid crystal device substantially equivalent to the distance between the electrodes. A light-shielding layer formed between the insulating substrate and the reflection plate is disposed in a region surrounded by a line connecting a range that is approximately one-half outside of the inter-distance, and the other region. It is characterized by having.

According to the present invention, a reflection plate is disposed in a portion corresponding to a region driven by an oblique electric field outside the pixel electrode but in the liquid crystal device, and a light shielding layer is provided in other regions. Are arranged, so that the aperture ratio can be improved without lowering the contrast. In this configuration, since the light-shielding layer is arranged below the reflector, the patterning of the light-shielding layer may be arranged over the entire effective display area. In the case where a semi-transmissive reflective plate is formed by reducing the thickness of the metal layer itself used for the reflective plate, by providing an opening in the light-shielding layer in the pixel electrode region, it is possible to perform transmissive display with this opening. Other light-shielding layers can also function as light-shielding layers during transmissive display. On the other hand, in the case where a semi-transmissive reflector is formed by providing an opening in a part of a metal layer used for the reflector that occupies a desired ratio in one pixel, the opening is provided at the same position as the metal layer of the light-shielding layer. Or by providing an opening in the light-shielding layer in a slightly wider area so as to include the opening, the metal layer serving as a reflector and the light-shielding layer function as a light-shielding layer during transmissive display.

As the light-shielding layer, a metal or a metal-metal oxide film having a lower reflectance than the above-mentioned reflector can be used. Chromium or the like can be used as the metal having a low reflectance. Since chromium oxide has a lower reflectivity, it is desirable to use a laminated film of chromium oxide and chromium and arrange the chromium oxide layer on the liquid crystal layer side.

As the light-shielding layer, a black resin material can be used. For this, a color resist in which a black pigment is dispersed, a black paint applied by printing, or the like can be used.

As the light-shielding layer, a laminated film formed by laminating two or more colors of the coloring layer can be used. This is used in the case where the light shielding layer is formed between the reflection plate and the pixel electrode. In the case of a reflection type liquid crystal device, since the concentration of the colored layer is low, the OD value (Optical Density) even when two or more colored layers are laminated.
May remain at 1 or less. However, in the case of a reflection type liquid crystal device, since the incident light passes through the light-shielding layer twice, there is no practical problem if the OD value at the time of twice the thickness of the coloring layer is 1 or more. For example, when there are three colored layers of R (red), G (green), and B (blue), these three colored layers are laminated, and the OD value when the layer thickness is doubled is 1 .2 or more. Further, by increasing the density of the colored layer and providing the colored layer in a part of one pixel at an area ratio such that a desired density is averaged in one pixel, the density suitable for reflective display can be improved. In the case where the coloring layer is formed as described above, the concentration of the light-shielding layer provided by stacking two or more coloring layers can be increased. When three colored layers are laminated by this method, the OD value when the laminated thickness is doubled can be 1.5 or more.

The color filter substrate according to the present invention is characterized in that irregularities are formed between the reflection plate and the insulating substrate.

According to the present invention, the color filter substrate
A color filter function, a reflector function, and a scattering function can be provided. 0. Add a good scattering function to the reflector
When the unevenness of 3 μm to 1.5 μm is provided, the thickness of the liquid crystal layer and the pretilt angle of the liquid crystal molecules partially change due to the unevenness, so that good display characteristics may not be obtained. According to the configuration of the present invention, unevenness is absorbed by the colored layer or the colored layer and the protective layer, and flatness on the transparent electrode can be secured. This configuration is also effective for the TN mode having a twist angle of 100 degrees or less, but S is required to have high accuracy for the thickness of the liquid crystal layer.
This is particularly effective in combination with a TN (super twisted nematic) mode.

The irregularities can be formed of a resin material. As the resin material used here, an acrylic or polyimide photosensitive resin or the like is useful. These materials have high heat resistance, and have resistance to a forming process of a reflector, a coloring layer, a protective layer, a transparent electrode layer, and the like provided on the unevenness formed of these materials.
Regarding photosensitivity, a negative type or a positive type may be used.

The irregularities can be formed by performing a roughening treatment on the surface of the insulating substrate. Examples of the surface roughening treatment include a method in which a sol-gel solution in which particles are dispersed is applied and fired, and a method in which the surface of an insulating substrate is unevenly etched. When the insulating substrate is a glass substrate,
A method of forming an oxide film on the substrate surface and then performing non-uniform etching due to the non-uniform composition of the oxide film, or an etchant that dissolves high concentrations of aluminum, boron, and sodium contained in the substrate itself Non-uniform etching by hydro-fluoric acid by LPD (Liquid Phase Deposition) method in which the substrate is immersed in a super-saturated aqueous solution of hydro-fluoric acid to precipitate the composition A method or the like can be used. The latter method does not require a coating step or a sputtering step and only needs to be immersed in a chemical solution, so that it is promising in terms of cost reduction.

A liquid crystal device according to the present invention is characterized in that a liquid crystal layer is sandwiched between a pair of insulating substrates, and the color filter substrate according to any one of the above is used as one of the insulating substrates. And

According to this, it is possible to realize a liquid crystal device capable of performing bright reflective display with high contrast and high aperture ratio.

An electronic apparatus according to the present invention is characterized by using the liquid crystal device.

According to this, it is possible to realize an electronic apparatus capable of performing high-contrast, bright, and excellent reflection-type display.

[0048]

Embodiments of the present invention will be described below with reference to the accompanying drawings.

(First Embodiment) FIG. 1 is a schematic cross-sectional view of a color filter substrate according to the present invention at the stage when a transparent electrode 7 is formed.

First, a method for manufacturing a color filter substrate according to the present embodiment will be described below.

In this embodiment, a metal layer mainly composed of aluminum is formed on a glass substrate 1 as an insulating substrate.
A metal layer 2 serving as a reflector is formed. Next, the metal layer 2 is patterned by a photolithography method so as to include a range 9 to be a display region in a liquid crystal device using the color filter substrate. Next, the coloring layer 4 is formed by a coloring material method. At this time, the coloring layer 4 is formed so as to cover the entire surface of the metal layer 2, and the coloring layer 4 substantially functions as a protective layer for the metal layer 2. Subsequently, an adhesion improving layer 5 using SiO ₂ as an inorganic oxide film and a transparent electrode 7 using ITO are continuously formed, and the transparent electrode 7 is patterned according to a liquid crystal device using this color filter substrate. .

When the transparent electrode 7 using ITO is formed on a resin material such as the colored layer 4 as in the present embodiment, it is necessary to ensure the adhesion between the resin material and the transparent electrode 7.
A method of continuously forming an adhesion improving layer 5 using SiO ₂ having a thickness of about 20 to 80 nm and a transparent electrode 7 using ITO is generally used. Also in this embodiment,
When the transparent electrode 7 has sufficient adhesion to the coloring layer 4 and the insulating substrate 1 provided thereunder, the adhesion improving layer 5 can be omitted. is there.

The insulating substrate 1 is not limited to a transparent glass substrate, but may be a flexible substrate such as a plastic film. In addition, as long as the insulating substrate is limited to a reflective display application, the insulating substrate does not need to be transparent, and therefore, an Si substrate having an insulating film formed on the surface can be used.

As the metal layer 2 serving as the reflection plate, a metal layer containing silver, chromium, nickel or the like as a main component may be used.

The method for forming the colored layer 4 is not limited to the colored light-sensitive material method, but may be formed by a dyeing method, a transfer method, an etching method, a printing method, or the like.

According to the configuration of the present embodiment as described above, a color filter suitable for a liquid crystal device capable of reflection type display can be obtained.

(Second Embodiment) FIG. 2 is a schematic cross-sectional view of a color filter substrate according to the present embodiment at the stage when a transparent electrode 7 is formed.

In this embodiment, a metal layer 2 serving as a reflection plate is formed on a glass substrate 1 as a substrate by using a metal containing aluminum as a main component. Next, the metal layer 2 is patterned by a photolithography method so as to include a range 9 to be a display region in a liquid crystal device using the color filter substrate. Next, a protective layer 3 is formed on the reflection plate 2. Here, an oxide film was formed by anodizing Al, and this was used as the protective layer 3. As the anodizing chemical solution, a solution containing 1 to 10% by weight of ammonium salicylate and 20 to 80% by weight of ethylene glycol was used. The formation voltage is 5 to 250 V, and the current density is 0.001 to 1 mA / c.
Within the terms of m ^2, it may be set in accordance with a desired film thickness. Note that the anodizing chemical solution is not limited to the above solution. The conditions of the formation voltage and the current density may be appropriately set according to the formation solution.

Next, a colored layer 4 was formed by a colored sensitizing material method. At this time, the colored layer 4 is formed so as to cover the entire surface of the metal layer 2, and the protective layer 3 and the colored layer 4 function as a protective layer for the metal layer 2. Subsequently, the inorganic oxide film Si
The adhesion improving layer 5 using O ₂ and the transparent electrode 7 using ITO are continuously formed, and the transparent electrode 7 is patterned according to the liquid crystal device using the color filter substrate.

The insulating substrate 1 is not limited to a transparent glass substrate, but may be a flexible substrate such as a plastic film. In addition, as long as the insulating substrate is limited to a reflective display application, the insulating substrate does not need to be transparent, and therefore, an Si substrate having an insulating film formed on the surface can be used.

The protective layer 3 is not limited to the anodic oxide film, but may be, for example, an S film formed by a chemical vapor deposition method.
It is also possible to use iO ₂ , Si ₃ N ₄ , or an organic insulating film formed by spin coating or roll coating.

The method of forming the colored layer 4 is not limited to this, and the colored layer 4 can be formed by a dyeing method, a transfer method, an etching method, a printing method, or the like. Further, by making the thickness of the protective layer 3 formed by anodic oxidation sufficiently thin within a range in which the reflection plate 2 can be protected from a chemical solution, a gas or the like exposed in the colored layer 4 forming step, The colored layer 4 can be formed by a deposition method.

According to the configuration of the present embodiment as described above, a color filter suitable for a liquid crystal device capable of reflective display can be obtained.

(Third Embodiment) FIG. 3 is a schematic cross-sectional view of a color filter substrate according to the present embodiment at the stage when a transparent electrode 7 is formed.

In this embodiment, a metal containing silver as a main component is used for the metal layer 2, and SiO _{2 formed} by a chemical vapor deposition method is used as the protective layer 3. The other components are the same as those in the second embodiment, and the description is omitted here.

The insulating substrate 1 is not limited to a transparent glass substrate, but may be a flexible substrate such as a plastic film. In addition, since the insulating substrate does not need to be transparent as long as the insulating substrate is limited to the reflective display application, the insulating substrate is formed with an insulating film formed on the surface.
It is also possible to use a substrate.

As the metal layer 2 serving as the reflection plate, a metal layer mainly containing aluminum, chromium, nickel, or the like may be used.

The protective layer 3 is not limited to SiO ₂ , but may be, for example, a Si film formed by a chemical vapor deposition method.
₃ N ₄ silicon nitride represented, it is also possible to use an organic insulating film formed by spin coating or roll coating.

The method of forming the colored layer 4 is not limited to the colored light-sensitive material method, but may be formed by a dyeing method, a transfer method, an etching method, a printing method, or the like.

According to the configuration of the present embodiment as described above, it was possible to obtain a color filter suitable for a liquid crystal device capable of reflective display.

(Fourth Embodiment) FIG. 4 is a schematic cross-sectional view of a color filter substrate according to the present invention at the stage when a transparent electrode 7 is formed.

In this embodiment, a metal layer mainly composed of aluminum is formed on a glass substrate 1 as an insulating substrate.
A metal layer 2 serving as a reflector is formed. Next, the metal layer 2 is patterned by a photolithography method so as to include a range 9 to be a display region in a liquid crystal device using the color filter substrate. Next, a protective layer 3 is formed on the reflecting plate 2 by forming a SiO ₂ film to a thickness of 60 nm by a chemical vapor deposition method. Next, the coloring layer 4 is formed by a coloring material method.
Further, a protective layer 6 using a photosensitive acrylic resin or the like as an organic insulating film is formed so as to cover the entire metal layer 2 and the colored layer 4. Here, the coloring layer 4 and the protective layer 6 function as a protective layer for the metal layer 2. Subsequently, an adhesion improving layer 5 using SiO ₂ as an inorganic oxide film and a transparent electrode 7 using ITO are continuously formed, and the transparent electrode 7 is patterned according to a liquid crystal device using this color filter substrate. .

The insulating substrate 1 is not limited to a transparent glass substrate, but may be a flexible substrate such as a plastic film. In addition, as long as the insulating substrate is limited to a reflective display application, the insulating substrate does not need to be transparent, and therefore, an Si substrate having an insulating film formed on the surface can be used.

As the metal layer 2 serving as the reflection plate, a metal layer mainly containing silver, chromium, nickel or the like may be used.

The method for forming the colored layer 4 is not limited to the colored light-sensitive material method, but may be formed by a dyeing method, a transfer method, an etching method, a printing method, or the like.

As the protective layer 6, another photosensitive resin material can be used. When a method of providing the protective layer 6 only in a predetermined region such as a printing method or a transfer method is used, or when the protective layer 6 may be provided on the entire surface of the color filter substrate, a sol-gel A film or an organic protective film having no photosensitivity can be used.

According to the configuration of the present embodiment as described above, a color filter suitable for a liquid crystal device capable of reflective display can be obtained.

(Fifth Embodiment) FIG. 5A is a schematic plan view of a color filter substrate according to the present invention at the stage where the layers up to the colored layer 4 are formed, and FIG. 5B is a plan view of FIG. A
FIG. 5C is a schematic cross-sectional view at the stage where the transparent electrode 7 is formed.

In this embodiment, a metal layer mainly composed of aluminum is formed on a glass substrate 1 as an insulating substrate.
A metal layer 2 serving as a reflector is formed. Next, the metal layer 2 is patterned by a photolithography method so as to include a range 9 to be a display region in a liquid crystal device using the color filter substrate and further surround a pixel region 9a in the liquid crystal device. Next, by chemical vapor deposition, the SiO
₂ is formed to a thickness of 60 nm to form a protective layer 3. Next, the coloring layer 4 is formed by a coloring material method. Further, a protective layer 6 using a photosensitive acrylic resin or the like as an organic insulating film is provided.
It is formed so as to cover the entire metal layer 2 and the colored layer 4. Here, the coloring layer 4 and the protective layer 6 function as a protective layer for the metal layer 2. Subsequently, an inorganic oxide film of SiO
Adhesion improving layer 5 using ₂ and transparent electrode 7 using ITO
Are continuously formed, and the transparent electrode 7 is patterned according to the liquid crystal device using the color filter substrate.

The insulating substrate 1 is not limited to a transparent glass substrate, but may be a flexible substrate such as a plastic film. In addition, as long as the insulating substrate is limited to a reflective display application, the insulating substrate does not need to be transparent, and therefore, an Si substrate having an insulating film formed on the surface can be used.

As the metal layer 2 serving as the reflection plate, a metal layer mainly containing silver, chromium, nickel, or the like may be used.

The method of forming the colored layer 4 is not limited to the colored light-sensitive material method, but may be formed by a dyeing method, a transfer method, an etching method, a printing method, or the like.

As the protective layer 6, another photosensitive resin material can be used. When a method of providing the protective layer 6 only in a predetermined region such as a printing method or a transfer method is used, or when the protective layer 6 may be provided on the entire surface of the color filter substrate, a sol-gel A film or an organic protective film having no photosensitivity can be used.

According to the configuration of the present embodiment as described above, a color filter suitable for a liquid crystal device capable of reflection type display can be obtained.

(Sixth Embodiment) FIG. 6 is a schematic cross-sectional view of a color filter substrate according to the present invention at the stage where the transparent electrode 7 is formed.

In this embodiment, a metal layer mainly composed of aluminum is formed on a glass substrate 1 as an insulating substrate.
A metal layer 2 serving as a reflector is formed. Next, the metal layer 2 is patterned by a photolithography method so as to include a range 9 to be a display region in a liquid crystal device using the color filter substrate and further surround a pixel region 9a in the liquid crystal device. Next, a protective layer 3 is formed on the reflecting plate 2 by forming a SiO ₂ film to a thickness of 60 nm by a chemical vapor deposition method. Next, the coloring layer 4 is formed by a coloring material method. Furthermore, so as to cover the entire metal layer 2 and the colored layer 4,
The protective layer 6 is formed. The protective layer 6 is formed by dispersing particles 6b using a material having a different refractive index from a resin material 6a such as an acrylic resin, and has a light scattering function by Mie scattering. Subsequently, an adhesion improving layer 5 using SiO ₂ as an inorganic oxide film and a transparent electrode 7 using ITO are continuously formed, and the transparent electrode 7 is patterned according to a liquid crystal device using this color filter substrate. .

The insulating substrate 1 is not limited to a transparent glass substrate, but may be a flexible substrate such as a plastic film. In addition, as long as the insulating substrate is limited to a reflective display application, the insulating substrate does not need to be transparent, and therefore, an Si substrate having an insulating film formed on the surface can be used.

As the metal layer 2 serving as the reflection plate, a metal layer mainly containing silver, chromium, nickel or the like may be used.

The method for forming the colored layer 4 is not limited to the colored light-sensitive material method, but may be formed by a dyeing method, a transfer method, an etching method, a printing method, or the like.

As the resin material 6 a used for the protective layer 6,
Other photosensitive resin materials can be used. Further, when a method of providing the protective layer 6 only in a predetermined region such as a printing method or a transfer method is used, or when the protective layer 6 may be provided on the entire surface of the color filter substrate,
An organic protective film having no photosensitivity can be used.

The protective layer 6 having a scattering property is such that the difference in the refractive index between the resin material 6a used and the particles 6b dispersed in the resin material 6a is in the range of 0.05 to 0.12. It is desirable to combine the materials. For example, PMM
According to a combination in which PVDF (polyvinylidene fluoride) particles are dispersed in an A (polymethyl methacrylate) resin, a refractive index difference of about 0.8 can be obtained. Of course, the combination is not limited to this, and it is possible to use a proper combination of materials so as to obtain a desired difference in refractive index and scattering degree.

According to the configuration of the present embodiment as described above, a color filter suitable for a liquid crystal device capable of reflection type display can be obtained.

(Seventh Embodiment) FIG. 7 is a schematic cross-sectional view of a color filter substrate according to the present invention at the stage when a transparent electrode 7 is formed.

In the present embodiment, an adhesion improving layer 8 is formed on a glass substrate 1 serving as an insulating substrate by depositing SiO ₂ to a thickness of 60 nm by a chemical vapor deposition method. Next, a metal layer 2 serving as a reflection plate is formed using a metal layer mainly containing silver. Next, the metal layer 2 is patterned by a photolithography method so as to include a range 9 to be a display region in a liquid crystal device using the color filter substrate and further surround a pixel region 9a in the liquid crystal device. Next, a protective layer 3 is formed on the reflecting plate 2 by forming a SiO ₂ film to a thickness of 60 nm by a chemical vapor deposition method. Next, the coloring layer 4 is formed by a coloring material method. Further, a protective layer 6 using a photosensitive acrylic resin or the like as an organic insulating film is formed on the metal layer 2 and the colored layer 4.
It is formed so as to cover the whole. Subsequently, an adhesion improving layer 5 using SiO ₂ as an inorganic oxide film and a transparent electrode 7 using ITO are continuously formed, and the transparent electrode 7 is patterned according to a liquid crystal device using this color filter substrate. .

The insulating substrate 1 is not limited to a transparent glass substrate, but may be a flexible substrate such as a plastic film. In addition, as long as the insulating substrate is limited to a reflective display application, the insulating substrate does not need to be transparent, and therefore, an Si substrate having an insulating film formed on the surface can be used.

As the adhesion improving layer 8, TiO ₂ or Zr
O ₂ or a combination of these and SiO ₂ as appropriate,
₂ O ₅ or the like may be used.

As the metal layer 2 serving as the reflector, a metal layer containing aluminum, nickel, chromium, or the like as a main component may be used.

The method of forming the colored layer 4 is not limited to the colored light-sensitive material method, but may be formed by a dyeing method, a transfer method, an etching method, a printing method, or the like.

As the protective layer 6, another resin material having photosensitivity can be used. When a method of providing the protective layer 6 only in a predetermined region such as a printing method or a transfer method is used, or when the protective layer 6 may be provided on the entire surface of the color filter substrate, a sol-gel A film or an organic protective film having no photosensitivity can be used.

According to the configuration of the present embodiment as described above, a color filter suitable for a liquid crystal device capable of reflection type display can be obtained.

(Eighth Embodiment) FIG. 8 is a schematic cross-sectional view of a color filter substrate according to the present invention at the stage where the transparent electrode 7 is formed.

In this embodiment, molybdenum (Mo) is formed on a glass substrate 1 as an insulating substrate by a chemical vapor deposition method, and an adhesion improving layer 8 is formed. Next, a metal layer 2 serving as a reflection plate is formed using a metal layer mainly containing silver.
Next, the metal layer 2 is patterned together with the adhesion improving layer 8 by photolithography so as to include the range 9 serving as a display region in the liquid crystal device using the color filter substrate and further surround the pixel region 9a in the liquid crystal device. . The other components are the same as in the seventh embodiment, and a description thereof will not be repeated.

The adhesion improving layer 8 is not limited to Mo, but may be another metal or a metal oxide film such as Ta ₂ O ₅ .

As the metal layer 2 serving as the reflection plate, a metal layer mainly containing aluminum or nickel may be used.

According to the configuration of the present embodiment as described above, it was possible to obtain a color filter suitable for a liquid crystal device capable of reflection type display.

(Ninth Embodiment) FIG. 9A is a schematic view of a color filter substrate according to the present invention at the stage when the transparent electrode 7 is formed, and FIG. 9B is a schematic view of FIG. 9A. C-
FIG. 9C is a schematic cross-sectional view taken along the line C ′, and FIG.
It is a line sectional schematic diagram.

In this embodiment, a metal layer mainly composed of aluminum is formed on a glass substrate 1 as an insulating substrate.
A metal layer 2 serving as a reflector is formed. Next, in the liquid crystal device using the color filter substrate, the liquid crystal device includes a width 9b of the transparent electrode 7 and a range 9c serving as a driving region surrounded by the width 9a of the opposing electrode arranged to intersect with the width 9b.
The distance (thickness of the liquid crystal layer) between a pair of electrodes facing each other in a liquid crystal device using this color filter substrate is approximately １ ／.
The metal layer 2 is patterned by a photolithography method so as to surround a region 11 wider by the length 10a. Next, the coloring layer 4 is formed on the metal layer 2 by a coloring sensitive material method. Further, a protective layer 6 using a photosensitive acrylic resin or the like as an organic insulating film is formed so as to cover the entire metal layer 2 and the colored layer 4. Subsequently, an adhesion improving layer 5 using SiO ₂ as an inorganic oxide film and a transparent electrode 7 using ITO are continuously formed, and the transparent electrode 7 is patterned according to a liquid crystal device using this color filter substrate. .

The insulating substrate 1 is not limited to a transparent glass substrate, but may be a flexible substrate such as a plastic film. In addition, as long as the insulating substrate is limited to a reflective display application, the insulating substrate does not need to be transparent, and therefore, an Si substrate having an insulating film formed on the surface can be used.

As the metal layer 2 serving as the reflection plate, a metal layer containing silver, chromium, nickel, or the like as a main component may be used. Is also good.

The method for forming the colored layer 4 is not limited to the color sensitive material method, but can be formed by a dyeing method, a transfer method, an etching method, a printing method, or the like.

As the protective layer 6, another resin material having photosensitivity can be used. When a method of providing the protective layer 6 only in a predetermined region such as a printing method or a transfer method is used, or when the protective layer 6 may be provided on the entire surface of the color filter substrate, a sol-gel A film or an organic protective film having no photosensitivity can be used.

The length 10a of the distance (thickness of the liquid crystal layer) between the pair of opposed electrodes is set to be independently set to each side of the entire peripheral portion of the drive region 9c independently. No problem.

The color filter according to the present embodiment is suitable when the liquid crystal device using the same is of a passive matrix type, but is not limited to this, and is represented by a TFT element. It is also applicable to an active matrix type liquid crystal device using a three-terminal switching element, a two-terminal switching element represented by a TFD element, or the like.

According to the configuration of the present embodiment as described above, it was possible to obtain a color filter suitable for a liquid crystal device capable of reflective display.

(Tenth Embodiment) FIG. 10A is a schematic plan view of a color filter substrate according to the present invention at the stage where the transparent electrode 7 is formed, and FIG.
10A is a schematic cross-sectional view taken along the line EE ′, and FIG.
It is an outline sectional view taken on line FF 'of (a).

In this embodiment, a metal layer mainly composed of aluminum is formed on a glass substrate 1 as an insulating substrate.
A metal layer 2 serving as a reflector is formed. Next, in the liquid crystal device using this color filter substrate, the width 9b of the transparent electrode 7 and the range 9c which is a driving area surrounded by the width 9a of the opposing electrode arranged so as to intersect with the width 9b, In one side of the liquid crystal device using this color filter substrate, one of the sides perpendicular to the director direction of the liquid crystal molecules in the bulk of the liquid crystal layer is within approximately the same distance (thickness of the liquid crystal layer) between the pair of opposed electrodes. In other sides, the length 10b is narrower than the distance (thickness of the liquid crystal layer) between the pair of electrodes facing each other.
The metal layer 2 is patterned by a photolithography method into a shape of a region 12 surrounded by a peripheral portion wider by a. Next, the coloring layer 4 is formed on the metal layer 2 by a coloring sensitive material method. Further, a protective layer 6 using a photosensitive acrylic resin or the like as an organic insulating film is formed so as to cover the entire metal layer 2 and the colored layer 4. Subsequently, an adhesion improving layer 5 using SiO ₂ as an inorganic oxide film and a transparent electrode 7 using ITO are continuously formed, and the transparent electrode 7 is patterned according to a liquid crystal device using this color filter substrate. .

The insulating substrate 1 is not limited to a transparent glass substrate, but may be a flexible substrate such as a plastic film. In addition, as long as the insulating substrate is limited to a reflective display application, the insulating substrate does not need to be transparent, and therefore, an Si substrate having an insulating film formed on the surface can be used.

As the metal layer 2 serving as the reflection plate, a metal layer containing silver, chromium, nickel or the like as a main component may be used. If necessary, an adhesion improving layer may be provided between the insulating substrate 1 and the metal layer. Is also good.

The method for forming the colored layer 4 is not limited to the colored light-sensitive material method, but may be formed by a dyeing method, a transfer method, an etching method, a printing method, or the like.

As the protective layer 6, another resin material having photosensitivity can be used. When a method of providing the protective layer 6 only in a predetermined region such as a printing method or a transfer method is used, or when the protective layer 6 may be provided on the entire surface of the color filter substrate, a sol-gel A film or an organic protective film having no photosensitivity can be used.

Further, the length 10a within approximately 1/2 of the distance (thickness of the liquid crystal layer) between the pair of electrodes facing each other may be set independently for each side of the peripheral portion of the drive region 9c. I do not care.

The color filter according to the structure of the present embodiment is suitable when the liquid crystal device using the same is of a passive matrix type, but is not limited to this, and is represented by a TFT element. It is also applicable to an active matrix type liquid crystal device using a three-terminal switching element, a two-terminal switching element represented by a TFD element, or the like.

According to the configuration of the present embodiment as described above, it was possible to obtain a color filter suitable for a liquid crystal device capable of reflection type display.

(Eleventh Embodiment) FIG. 11A is a schematic plan view of a color filter substrate according to the present invention at the stage where the transparent electrode 7 is formed, and FIG.
FIG. 11A is a schematic cross-sectional view taken along the line HH ′, and FIG.
FIG. 3A is a schematic sectional view taken along the line II ′ of FIG.

In this embodiment, a metal layer mainly composed of aluminum is formed on a glass substrate 1 as an insulating substrate.
A metal layer 2 serving as a reflector is formed. Next, in a liquid crystal device using this color filter substrate, a driving region 9c surrounded by the width 9b of the transparent electrode 7 and the width 9e of the pixel electrode driven by the TFD element opposed thereto.
In the liquid crystal device using this color filter substrate, the metal layer 2 is formed so as to surround a region 11 which is wider than the distance (thickness of the liquid crystal layer) between a pair of opposed electrodes by a length 10a. Patterning is performed by photolithography. Next, the coloring layer 4 is formed on the metal layer 2 by a coloring sensitive material method. Further, a protective layer 6 using a photosensitive acrylic resin or the like as an organic insulating film is formed so as to cover the entire metal layer 2 and the colored layer 4. Subsequently, an adhesion improving layer 5 using SiO ₂ as an inorganic oxide film and a transparent electrode 7 using ITO are continuously formed, and the transparent electrode 7 is patterned according to a liquid crystal device using this color filter substrate. .

The insulating substrate 1 is not limited to a transparent glass substrate, but may be a flexible substrate such as a plastic film. In addition, as long as the insulating substrate is limited to a reflective display application, the insulating substrate does not need to be transparent, and therefore, an Si substrate having an insulating film formed on the surface can be used.

As the metal layer 2 serving as the reflection plate, a metal layer containing silver, chromium, nickel, or the like as a main component may be used. Is also good.

The method of forming the colored layer 4 is not limited to the colored light-sensitive material method, but may be formed by a dyeing method, a transfer method, an etching method, a printing method, or the like.

As the protective layer 6, another photosensitive resin material can be used. When a method of providing the protective layer 6 only in a predetermined region such as a printing method or a transfer method is used, or when the protective layer 6 may be provided on the entire surface of the color filter substrate, a sol-gel A film or an organic protective film having no photosensitivity can be used.

Further, the length 10a within approximately 1/2 of the distance (thickness of the liquid crystal layer) between the pair of electrodes facing each other may be set independently for each side of the periphery of the drive region 9c. I do not care.

The color filter according to the structure of the present embodiment is suitable when the liquid crystal device using the same is an active matrix type liquid crystal device using a two-terminal switching element represented by a TFD element. However, the present invention is not limited to this, and can be applied to a three-terminal switching element represented by a TFT element or a passive matrix type liquid crystal device.

According to the configuration of the present embodiment as described above, it was possible to obtain a color filter suitable for a liquid crystal device capable of reflection type display.

(Twelfth Embodiment) FIG. 12A is a schematic plan view of a color filter substrate according to the present invention at the stage when the transparent electrode 7 is formed, and FIG.
FIG. 12A is a schematic cross-sectional view taken along the line JJ ′, and FIG.
It is the KK 'line sectional schematic diagram of (a).

In this embodiment, a metal layer mainly composed of aluminum is formed on a glass substrate 1 as an insulating substrate.
A metal layer 2 serving as a reflector is formed. Next, in the liquid crystal device using the color filter substrate, the color filter substrate includes a range 9c which is a driving region surrounded by the widths 9g and 9h of the pixel electrodes driven by the TFT elements facing the transparent electrode 7. The metal layer 2 is patterned by a photolithography method so as to surround a region 11 which is wide by a length 10a within approximately 以内 of a distance (thickness of a liquid crystal layer) between a pair of electrodes facing each other in the used liquid crystal device. Here, the range 9c to be the driving region is the same as the region 9f of the pixel electrode driven by the TFT element.
Next, the coloring layer 4 is formed on the metal layer 2 by a coloring sensitive material method. Further, a protective layer 6 using a photosensitive acrylic resin or the like as an organic insulating film is formed so as to cover the entire metal layer 2 and the colored layer 4. Subsequently, the inorganic oxide film Si
The adhesion improving layer 5 using O ₂ and the transparent electrode 7 using ITO are continuously formed, and the transparent electrode 7 is patterned according to the liquid crystal device using the color filter substrate.

The insulating substrate 1 is not limited to a transparent glass substrate, but may be a flexible substrate such as a plastic film. In addition, as long as the insulating substrate is limited to a reflective display application, the insulating substrate does not need to be transparent, and therefore, an Si substrate having an insulating film formed on the surface can be used.

As the metal layer 2 serving as the reflection plate, a metal layer containing silver, chromium, nickel, or the like as a main component may be used. Is also good.

The method of forming the colored layer 4 is not limited to the colored light-sensitive material method, but may be formed by a dyeing method, a transfer method, an etching method, a printing method, or the like.

As the protective layer 6, another resin material having photosensitivity can be used. When a method of providing the protective layer 6 only in a predetermined region such as a printing method or a transfer method is used, or when the protective layer 6 may be provided on the entire surface of the color filter substrate, a sol-gel A film or an organic protective film having no photosensitivity can be used.

Further, the length 10a within approximately 1/2 of the distance (the thickness of the liquid crystal layer) between the pair of electrodes facing each other may be set independently for each side of the periphery of the drive region 9c. I do not care.

According to the configuration of the present embodiment as described above, it was possible to obtain a color filter suitable for a liquid crystal device capable of reflective display.

(Thirteenth Embodiment) FIG. 13A is a schematic plan view of a color filter substrate according to the present invention at the stage where the transparent electrode 7 is formed, and FIG.
13A is a schematic cross-sectional view taken along line LL ′, and FIG.
FIG. 3A is a schematic sectional view taken along line MM ′ of FIG.

In this embodiment, a metal layer mainly composed of aluminum is formed on a glass substrate 1 as an insulating substrate.
A metal layer 2 serving as a reflector is formed. Next, in the liquid crystal device using the color filter substrate, the metal layer 2 is patterned by a photolithography method so as to include a range to be a display region over all pixels. Next, a light-shielding layer 13 using a black resin material is formed on the metal layer 2 by a color sensitive material method. The light shielding layer 13 has a width 9 b of the transparent electrode 7.
And the width 9 of the opposing electrodes arranged to intersect it
A region including a range 9c which is a driving region surrounded by a, and which is wider than the distance (thickness of the liquid crystal layer) between a pair of opposed electrodes in a liquid crystal device using this color filter substrate by a length 10a. Patterning is performed so as to provide an opening so as to surround 11. Next, the coloring layer 4 is formed by the coloring material method. Further, a protective layer 6 using a photosensitive acrylic resin or the like as an organic insulating film is provided with a light shielding layer 13,
It is formed so as to cover the entire metal layer 2 and the colored layer 4. Subsequently, an adhesion improving layer 5 using SiO ₂ as an inorganic oxide film and a transparent electrode 7 using ITO are continuously formed, and the transparent electrode 7 is patterned according to a liquid crystal device using this color filter substrate. .

The insulating substrate 1 is not limited to a transparent glass substrate, but may be a flexible substrate such as a plastic film. In addition, as long as the insulating substrate is limited to a reflective display application, the insulating substrate does not need to be transparent, and therefore, an Si substrate having an insulating film formed on the surface can be used.

As the metal layer 2 serving as the reflection plate, a metal layer containing silver, chromium, nickel, or the like as a main component may be used. Is also good. Further, in the present embodiment, since the area of the reflector is defined by the light-shielding layer 13, in a portion hidden by the area where the light-shielding layer is provided, the reflector of each pixel is independent so as to be independent. The metal layer 2 may be patterned.

The formation of the light-shielding layer 13 is not limited to the coloring material method, but can also be formed by a dyeing method, a transfer method, an etching method, a printing method, or the like.

The method of forming the colored layer 4 is not limited to the colored light-sensitive material method, but may be formed by a dyeing method, a transfer method, an etching method, a printing method, or the like.

As the protective layer 6, another resin material having photosensitivity can be used. When a method of providing the protective layer 6 only in a predetermined region such as a printing method or a transfer method is used, or when the protective layer 6 may be provided on the entire surface of the color filter substrate, a sol-gel A film or an organic protective film having no photosensitivity can be used.

Further, the length 10a within approximately 1/2 of the distance (thickness of the liquid crystal layer) between the pair of electrodes facing each other may be set independently for each side of the peripheral portion of the drive region 9c. I do not care.

The color filter according to the structure of the present embodiment is suitable when the liquid crystal device using the same is of a passive matrix type, but is not limited to this, and is represented by a TFT element. It is also applicable to an active matrix type liquid crystal device using a three-terminal switching element, a two-terminal switching element represented by a TFD element, or the like.

According to the configuration of the present embodiment as described above, a color filter suitable for a liquid crystal device capable of reflection type display can be obtained.

(Fourteenth Embodiment) A color filter substrate according to this embodiment will be described with reference to FIGS.
This will be described with reference to FIG.

The present embodiment is different from the first embodiment in that the light-shielding layer 13 is formed by laminating a chromium oxide film on a chromium film and is patterned by photolithography. The other components are the same as in the thirteenth embodiment, and a description thereof will not be repeated.

The insulating substrate 1 is not limited to a transparent glass substrate but may be a flexible substrate such as a plastic film. In addition, as long as the insulating substrate is limited to a reflective display application, the insulating substrate does not need to be transparent, and therefore, an Si substrate having an insulating film formed on the surface can be used.

As the metal layer 2 serving as the reflection plate, a metal layer containing silver, chromium, nickel, or the like as a main component may be used. A degree of adhesion improving layer may be provided. Further, in the present embodiment, since the area of the reflector is defined by the light-shielding layer 13, in a portion hidden by the area where the light-shielding layer is provided, the reflector of each pixel is independent so as to be independent. The metal layer 2 may be patterned.

The light-shielding layer 13 is not limited to a laminated film of a chromium film and a chromium oxide film, but has a lower reflectance than that of the metal layer 2 used for the reflection plate. A stacked film of another metal and a metal oxide film can also be used.

The method for forming the colored layer 4 is not limited to the colored light-sensitive material method, but may be formed by a dyeing method, a transfer method, an etching method, a printing method, or the like.

As the protective layer 6, another resin material having photosensitivity can be used. When a method of providing the protective layer 6 only in a predetermined region such as a printing method or a transfer method is used, or when the protective layer 6 may be provided on the entire surface of the color filter substrate, a sol-gel A film or an organic protective film having no photosensitivity can be used.

Further, the length 10a within approximately 1/2 of the distance (thickness of the liquid crystal layer) between the pair of electrodes facing each other may be set independently for each side of the peripheral portion of the driving region 9c. I do not care.

The color filter according to the structure of the present embodiment is suitable when the liquid crystal device using the same is of a passive matrix type, but is not limited to this, and is represented by a TFT element. It is also applicable to an active matrix type liquid crystal device using a three-terminal switching element, a two-terminal switching element represented by a TFD element, or the like.

According to the configuration of the present embodiment as described above, a color filter suitable for a liquid crystal device capable of reflection type display and transmission type display can be obtained.

(Fifteenth Embodiment) A color filter substrate according to the present embodiment will be described with reference to FIGS.
This will be described with reference to FIG.

In this embodiment, the metal layer 2 has a thickness of about 10
The difference is that a metal layer having a thickness of about 20 nm and containing aluminum as a main component and having a light transmittance of 10% is used as a transflective plate. The other components are the same as in the thirteenth embodiment, and a description thereof will not be repeated.

The insulating substrate 1 is not limited to a transparent glass substrate, but may be a flexible substrate such as a plastic film.

As the metal layer 2 serving as the reflection plate, a metal layer containing silver, chromium, nickel, or the like as a main component may be used. If necessary, the transmittance between the metal layer 2 and the insulating substrate 1 is not significantly reduced. A degree of adhesion improving layer may be provided. Further, the thickness of the metal layer 2 is not limited to 20 nm, and can be appropriately selected so as to obtain a desired transmittance. Further, in the present embodiment, since the area of the reflector is defined by the light-shielding layer 13, in a portion hidden by the area where the light-shielding layer is provided, the reflector of each pixel is independent so as to be independent. The metal layer 2 may be patterned.

The formation of the light-shielding layer 13 is not limited to the coloring material method, but can also be formed by a dyeing method, a transfer method, an etching method, a printing method, or the like.

The method for forming the colored layer 4 is not limited to the colored light-sensitive material method, but may be formed by a dyeing method, a transfer method, an etching method, a printing method, or the like.

As the protective layer 6, another resin material having photosensitivity can be used. When a method of providing the protective layer 6 only in a predetermined region such as a printing method or a transfer method is used, or when the protective layer 6 may be provided on the entire surface of the color filter substrate, a sol-gel A film or an organic protective film having no photosensitivity can be used.

Further, the length 10a of the distance (thickness of the liquid crystal layer) between the pair of electrodes facing each other may be set independently of each side of the periphery of the drive region 9c. I do not care.

The color filter according to the present embodiment is suitable when the liquid crystal device using the same is of a passive matrix type, but is not limited to this, and is represented by a TFT element. It is also applicable to an active matrix type liquid crystal device using a three-terminal switching element, a two-terminal switching element represented by a TFD element, or the like.

According to the configuration of the present embodiment as described above, a color filter suitable for a liquid crystal device capable of reflection type display and transmission type display can be obtained.

(Sixteenth Embodiment) FIG. 14A is a schematic plan view of the color filter substrate according to the present invention at the stage where the transparent electrode 7 is formed, and FIG.
14A is a schematic cross-sectional view taken along the line NN ′, and FIG.
FIG. 3A is a schematic sectional view taken along line OO ′ of FIG.

In this embodiment, a metal layer mainly composed of aluminum is formed on a glass substrate 1 as an insulating substrate.
A metal layer 2 serving as a reflector is formed. Next, in a liquid crystal device using this color filter substrate, an opening 14 having a predetermined area for transmitting light is provided so as to include a range to be a display region over all pixels and to transmit light in each pixel region. Next, the metal layer 2 is patterned by photolithography. The other components are the same as in the thirteenth embodiment, and a description thereof will not be repeated.

The insulating substrate 1 is not limited to a transparent glass substrate but may be a flexible substrate such as a plastic film.

As the metal layer 2 serving as the reflection plate, a metal layer containing silver, chromium, nickel, or the like as a main component may be used. A degree of adhesion improving layer may be provided. Further, in the present embodiment, since the area of the reflector is defined by the light-shielding layer 13, in a portion hidden by the area where the light-shielding layer is provided, the reflector of each pixel is independent so as to be independent. The metal layer 2 may be patterned.

The formation of the light-shielding layer 13 is not limited to the coloring material method, but can also be formed by a dyeing method, a transfer method, an etching method, a printing method, or the like.

The method of forming the colored layer 4 is not limited to the colored light-sensitive material method, but may be formed by a dyeing method, a transfer method, an etching method, a printing method, or the like.

As the protective layer 6, another photosensitive resin material can be used. When a method of providing the protective layer 6 only in a predetermined region such as a printing method or a transfer method is used, or when the protective layer 6 may be provided on the entire surface of the color filter substrate, a sol-gel A film or an organic protective film having no photosensitivity can be used.

The length 10a of the distance (thickness of the liquid crystal layer) between the pair of opposing electrodes may be set independently of each side of the periphery of the drive region 9c. I do not care.

The color filter according to the structure of the present embodiment is suitable when the liquid crystal device using the same is of a passive matrix type, but is not limited to this, and is represented by a TFT element. It is also applicable to an active matrix type liquid crystal device using a three-terminal switching element, a two-terminal switching element represented by a TFD element, or the like.

According to the configuration of the present embodiment as described above, a color filter suitable for a liquid crystal device capable of reflection type display and transmission type display can be obtained.

(Seventeenth Embodiment) FIG. 15A is a schematic plan view of a color filter substrate according to the present invention at the stage where the transparent electrode 7 is formed, and FIG.
15A is a schematic cross-sectional view taken along the line PP ′, and FIG.
It is the QQ 'line sectional schematic diagram of (a).

In the present embodiment, a light-shielding layer 13 in which a chromium oxide film 13b is laminated on a chromium film 13a is formed on a glass substrate 1 as an insulating substrate over all pixels in a liquid crystal device using this color filter substrate. Patterning is performed by photolithography so as to include a range to be a display region. Next, a metal layer 2 serving as a reflection plate is formed using a metal layer mainly containing aluminum. next,
In the liquid crystal device using the color filter substrate, the color filter substrate includes a width 9b of the transparent electrode 7 and a range 9c which is a driving region surrounded by the width 9a of the opposing electrode disposed so as to intersect with the width 9b. Between a pair of electrodes facing each other in a liquid crystal device using a liquid crystal (thickness of liquid crystal layer)
The metal layer 2 is patterned by a photolithography method so as to surround the area 11 which is wide within a length 10a within approximately 1/2 of the above. Next, the coloring layer 4 is formed by the coloring material method. Further, a protective layer 6 using a photosensitive acrylic resin or the like as an organic insulating film is formed so as to cover the light shielding layer 13, the metal layer 2, and the coloring layer 4 as a whole. Subsequently, an adhesion improving layer 5 using SiO ₂ as an inorganic oxide film and ITO
Is formed continuously, and the transparent electrode 7 is patterned according to the liquid crystal device using the color filter substrate.

The insulating substrate 1 is not limited to a transparent glass substrate, but may be a flexible substrate such as a plastic film. In addition, as long as the insulating substrate is limited to a reflective display application, the insulating substrate does not need to be transparent, and therefore, an Si substrate having an insulating film formed on the surface can be used.

As the metal layer 2 serving as the reflection plate, a metal layer containing silver, chromium, nickel, or the like as a main component may be used. Is also good.

The light-shielding layer 13 is not limited to a laminated film of a chromium film and a chromium oxide film, but has a lower reflectivity than the metal layer 2 used for the reflection plate, or another metal or metal oxide film, or A stacked film of another metal and a metal oxide film can also be used. The light-shielding layer 13 can be formed by a coloring material method using a black resin material, and can also be formed by a dyeing method, a transfer method, an etching method, a printing method, or the like.

The method of forming the colored layer 4 is not limited to the colored light-sensitive material method, but may be formed by a dyeing method, a transfer method, an etching method, a printing method, or the like.

As the protective layer 6, another resin material having photosensitivity can be used. When a method of providing the protective layer 6 only in a predetermined region such as a printing method or a transfer method is used, or when the protective layer 6 may be provided on the entire surface of the color filter substrate, a sol-gel A film or an organic protective film having no photosensitivity can be used.

Further, the length 10a within approximately 間 の of the distance (the thickness of the liquid crystal layer) between the pair of electrodes facing each other may be set independently for each side of the peripheral portion of the driving region 9c. I do not care.

The color filter according to the structure of the present embodiment is suitable when the liquid crystal device using the same is of a passive matrix type, but is not limited to this, and is represented by a TFT element. It is also applicable to an active matrix type liquid crystal device using a three-terminal switching element, a two-terminal switching element represented by a TFD element, or the like.

According to the configuration of the present embodiment as described above, it was possible to obtain a color filter suitable for a liquid crystal device capable of reflection type display.

(Eighteenth Embodiment) FIG. 16A is a schematic plan view of a color filter substrate according to the present invention at the stage where the transparent electrode 7 is formed, and FIG.
FIG. 16A is a schematic cross-sectional view taken along the line SS ′, and FIG.
It is the TT 'line sectional schematic diagram of (a).

In this embodiment, a light-shielding layer 13 is formed on a glass substrate 1 as an insulating substrate, in which a chromium oxide film 13b is laminated on a chromium film 13a. Next, in the liquid crystal device using the color filter substrate, the opening 14 having a predetermined area for transmitting light in each pixel region is included so as to include a range to be a display region across all pixels. Alternatively, the light shielding layer 13 is patterned so that the opening 15 is provided so as to include the opening 14. Next, a metal layer 2 serving as a reflection plate is formed of a metal layer mainly containing aluminum.
To form Next, in the liquid crystal device using the color filter substrate, a width 9b of the transparent electrode 7 and a range 9c serving as a driving region surrounded by the width 9a of the opposing electrode arranged so as to intersect the transparent electrode 7 are included. In a liquid crystal device using a color filter substrate, a region 11 that is wider than a distance (thickness of a liquid crystal layer) between a pair of opposing electrodes by approximately a length 10a within a length of about 10a is surrounded by each pixel region. The metal layer 2 is patterned by photolithography so as to provide an opening 14 having a predetermined area for transmitting light. Next, the coloring layer 4 is formed on the metal layer 2 by a coloring sensitive material method. Further, a protective layer 6 using a photosensitive acrylic resin or the like as an organic insulating film is provided with a light shielding layer 13 and a metal layer 2.
And, it is formed so as to cover the entire colored layer 4. Subsequently, an adhesion improving layer 5 using SiO ₂ which is an inorganic oxide film
And the transparent electrode 7 using ITO are continuously formed, and the transparent electrode 7 is patterned according to the liquid crystal device using the color filter substrate.

The insulating substrate 1 is not limited to a transparent glass substrate but may be a flexible substrate such as a plastic film.

The light-shielding layer 13 is not limited to a laminated film of a chromium film and a chromium oxide film, but has a lower reflectivity than the metal layer 2 used for the reflection plate, or another metal or metal oxide film, or A stacked film of another metal and a metal oxide film can also be used. The light-shielding layer 13 can be formed by a coloring material method using a black resin material, and can also be formed by a dyeing method, a transfer method, an etching method, a printing method, or the like.

As the metal layer 2 serving as the reflection plate, a metal layer containing silver, chromium, nickel, or the like as a main component may be used. If necessary, the transmittance between the metal layer 2 and the light shielding layer 13 is not significantly reduced. A degree of adhesion improving layer may be provided.

The method for forming the colored layer 4 is not limited to the colored light-sensitive material method, but may be formed by a dyeing method, a transfer method, an etching method, a printing method, or the like.

As the protective layer 6, another resin material having photosensitivity can be used. When a method of providing the protective layer 6 only in a predetermined region such as a printing method or a transfer method is used, or when the protective layer 6 may be provided on the entire surface of the color filter substrate, a sol-gel A film or an organic protective film having no photosensitivity can be used.

Further, the length 10a within approximately 1/2 of the distance (thickness of the liquid crystal layer) between the pair of electrodes facing each other may be set independently for each side of the periphery of the drive region 9c. I do not care.

The color filter according to the structure of the present embodiment is suitable when the liquid crystal device using the same is of a passive matrix type, but is not limited to this, and is represented by a TFT element. It is also applicable to an active matrix type liquid crystal device using a three-terminal switching element, a two-terminal switching element represented by a TFD element, or the like.

According to the configuration of the present embodiment as described above, a color filter suitable for a liquid crystal device capable of reflection type display and transmission type display can be obtained.

(Nineteenth Embodiment) FIG. 17A is a schematic plan view of a color filter substrate according to the present invention at the stage when the transparent electrode 7 is formed, and FIG.
17A is a schematic cross-sectional view taken along the line UU ′, and FIG.
FIG. 5A is a schematic sectional view taken along line VV ′ of FIG.

In this embodiment, a light-shielding layer 13 in which a chromium oxide film 13b is laminated on a chromium film 13a is formed on a glass substrate 1 as an insulating substrate. Next, in the liquid crystal device using the color filter substrate, an opening 15 having a predetermined area for transmitting light is provided so as to include a range to be a display region over all pixels and to transmit light in each pixel region. The light shielding layer 13 is patterned. Next, about 20% having a light transmittance of about 10% based on aluminum.
A metal layer 2 serving as a semi-transmissive reflection plate is formed from a metal layer having a thickness of nm. Next, in the liquid crystal device using the color filter substrate, a width 9b of the transparent electrode 7 and a range 9c serving as a driving region surrounded by the width 9a of the opposing electrode arranged so as to intersect the transparent electrode 7 are included. In the liquid crystal device using the color filter substrate, the metal layer 2 is formed by a photolithography method so as to surround a region 11 which is wider than the distance (thickness of the liquid crystal layer) between a pair of opposed electrodes by a length 10a. Perform patterning. Next, the coloring layer 4 is formed on the metal layer 2 by a coloring sensitive material method. Further, a protective layer 6 using a photosensitive acrylic resin or the like as an organic insulating film is formed so as to cover the light shielding layer 13, the metal layer 2, and the coloring layer 4 as a whole. Subsequently, an inorganic oxide film of SiO
Adhesion improving layer 5 using ₂ and transparent electrode 7 using ITO
Are continuously formed, and the transparent electrode 7 is patterned according to the liquid crystal device using the color filter substrate.

[0203] The insulating substrate 1 is not limited to a transparent glass substrate, but may be a flexible substrate such as a plastic film.

The light-shielding layer 13 is not limited to a laminated film of a chromium film and a chromium oxide film, but has a lower reflectivity than the metal layer 2 used for the reflection plate, or another metal or metal oxide film, or A stacked film of another metal and a metal oxide film can also be used. The light-shielding layer 13 can be formed by a coloring material method using a black resin material, and can also be formed by a dyeing method, a transfer method, an etching method, a printing method, or the like.

As the metal layer 2 serving as the reflection plate, a metal layer containing silver, chromium, nickel, or the like as a main component may be used. If necessary, the transmittance between the metal layer 2 and the light shielding layer 13 is not significantly reduced. A degree of adhesion improving layer may be provided.

The method for forming the colored layer 4 is not limited to the colored light-sensitive material method, but may be formed by a dyeing method, a transfer method, an etching method, a printing method, or the like.

As the protective layer 6, another resin material having photosensitivity can be used. When a method of providing the protective layer 6 only in a predetermined region such as a printing method or a transfer method is used, or when the protective layer 6 may be provided on the entire surface of the color filter substrate, a sol-gel A film or an organic protective film having no photosensitivity can be used.

Further, the length 10a within approximately 1/2 of the distance (thickness of the liquid crystal layer) between the pair of electrodes facing each other may be set independently for each side of the periphery of the drive region 9c. I do not care.

The color filter according to the structure of the present embodiment is suitable when the liquid crystal device using the same is of a passive matrix type, but is not limited thereto, and is represented by a TFT element. It is also applicable to an active matrix type liquid crystal device using a three-terminal switching element, a two-terminal switching element represented by a TFD element, or the like.

According to the configuration of the present embodiment as described above, a color filter suitable for a liquid crystal device capable of reflection type display and transmission type display can be obtained.

(Twentieth Embodiment) FIG. 18A is a schematic plan view of the color filter substrate according to the present invention at the stage where the transparent electrode 7 is formed, and FIG.
FIG. 18A is a schematic sectional view taken along line WW ′, and FIG.
It is the XX 'line sectional schematic diagram of (a).

In this embodiment, a metal layer mainly composed of aluminum is formed on a glass substrate 1 as an insulating substrate.
A metal layer 2 serving as a reflector is formed. Next, in the liquid crystal device using the color filter substrate, the metal layer 2 is patterned by a photolithography method so as to include a range to be a display region over all pixels. Next, the coloring layer 4 is formed by the coloring material method. The colored layer 4 is R
(Red), G (green) and B (blue) photosensitive color resists are sequentially formed. The region where the three color resists of R, G, and B are stacked becomes the light shielding layer 13. Light shielding layer 13
Includes a width 9b of the transparent electrode 7 and a range 9c to be a driving region surrounded by the width 9a of the opposing electrode arranged in an intersecting manner, and a pair of opposing electrodes in a liquid crystal device using this color filter substrate. Is patterned so as to provide an opening so as to surround a region 11 which is wide by a length 10a within approximately 1/2 of the distance between the electrodes (the thickness of the liquid crystal layer). Further, a protective layer 6 using a photosensitive acrylic resin or the like as an organic insulating film is formed so as to cover the light shielding layer 13, the metal layer 2, and the coloring layer 4 as a whole. Subsequently, an adhesion improving layer 5 using SiO ₂ as an inorganic oxide film and ITO
Is formed continuously, and the transparent electrode 7 is patterned according to the liquid crystal device using the color filter substrate.

The insulating substrate 1 is not limited to a transparent glass substrate, but may be a flexible substrate such as a plastic film. In addition, as long as the insulating substrate is limited to a reflective display application, the insulating substrate does not need to be transparent, and therefore, an Si substrate having an insulating film formed on the surface can be used.

As the metal layer 2 serving as the reflection plate, a metal layer containing silver, chromium, nickel, or the like as a main component may be used. Is also good. Further, in the present embodiment, since the area of the reflector is defined by the light-shielding layer 13, in a portion hidden by the area where the light-shielding layer is provided, the reflector of each pixel is independent so as to be independent. The metal layer 2 may be patterned.

The light-shielding layer 1 formed by laminating the colored layers 4 and 4
The method of forming No. 3 is not limited to the colored photosensitive material method, but can be formed by a dyeing method, a transfer method, an etching method, a printing method, or the like.

For the protective layer 6, another resin material having photosensitivity can be used. When a method of providing the protective layer 6 only in a predetermined region such as a printing method or a transfer method is used, or when the protective layer 6 may be provided on the entire surface of the color filter substrate, a sol-gel A film or an organic protective film having no photosensitivity can be used.

Further, the length 10a within approximately 1/2 of the distance (the thickness of the liquid crystal layer) between the pair of electrodes facing each other may be set independently for each side of the peripheral portion of the driving region 9c. I do not care.

The color filter according to the structure of the present embodiment is suitable when the liquid crystal device using the same is of a passive matrix type, but is not limited to this, and is represented by a TFT element. It is also applicable to an active matrix type liquid crystal device using a three-terminal switching element, a two-terminal switching element represented by a TFD element, or the like.

According to the configuration of the present embodiment as described above, a color filter suitable for a liquid crystal device capable of reflection type display can be obtained.

(Twenty-First Embodiment) A color filter substrate according to the present embodiment will be described with reference to FIGS.
This will be described with reference to FIG.

In this embodiment, the metal layer 2 has a thickness of about 10
The difference is that a metal layer having a thickness of about 20 nm and containing aluminum as a main component and having a light transmittance of 10% is used as a transflective plate. The other components are the same as in the twentieth embodiment, and a description thereof will not be repeated.

The insulating substrate 1 is not limited to a transparent glass substrate but may be a flexible substrate such as a plastic film.

As the metal layer 2 serving as the reflection plate, a metal layer containing silver, chromium, nickel, or the like as a main component may be used. A degree of adhesion improving layer may be provided. Further, the thickness of the metal layer 2 is not limited to 20 nm, and can be appropriately selected so as to obtain a desired transmittance. Further, in the present embodiment, since the area of the reflector is defined by the light-shielding layer 13, in a portion hidden by the area where the light-shielding layer is provided, the reflector of each pixel is independent so as to be independent. The metal layer 2 may be patterned.

Light-shielding layer 1 comprising colored layers 4
The method of forming No. 3 is not limited to the colored photosensitive material method, but can be formed by a dyeing method, a transfer method, an etching method, a printing method, or the like.

For the protective layer 6, another resin material having photosensitivity can be used. When a method of providing the protective layer 6 only in a predetermined region such as a printing method or a transfer method is used, or when the protective layer 6 may be provided on the entire surface of the color filter substrate, a sol-gel A film or an organic protective film having no photosensitivity can be used.

Further, the length 10a within approximately 1/2 of the distance (the thickness of the liquid crystal layer) between the pair of electrodes facing each other may be set independently for each side of the peripheral portion of the driving region 9c. I do not care.

The color filter according to the structure of the present embodiment is suitable when the liquid crystal device using the same is of a passive matrix type, but is not limited to this, and is represented by a TFT element. It is also applicable to an active matrix type liquid crystal device using a three-terminal switching element, a two-terminal switching element represented by a TFD element, or the like.

According to the configuration of the present embodiment as described above, a color filter suitable for a liquid crystal device capable of reflection type display and transmission type display can be obtained.

(Twenty-second Embodiment) FIG. 19A is a schematic plan view of a color filter substrate according to the present invention at the stage where the transparent electrode 7 is formed, and FIG.
19A is a schematic cross-sectional view taken along the line YY ′, and FIG.
FIG. 3A is a schematic sectional view taken along line ZZ ′ of FIG.

In this embodiment, a metal layer containing aluminum as a main component is formed on a glass substrate 1 as an insulating substrate.
A metal layer 2 serving as a reflector is formed. Next, in a liquid crystal device using this color filter substrate, an opening 14 having a predetermined area for transmitting light is provided so as to include a range to be a display region over all pixels and to transmit light in each pixel region. Next, the metal layer 2 is patterned by photolithography. The other components are the same as in the twentieth embodiment, and a description thereof will not be repeated.

As the metal layer 2 serving as the reflection plate, a metal layer containing silver, chromium, nickel, or the like as a main component may be used, and the transmittance between the metal layer 2 and the insulating substrate 1 is not significantly reduced as necessary. A degree of adhesion improving layer may be provided. Further, in the present embodiment, since the area of the reflector is defined by the light-shielding layer 13, in a portion hidden by the area where the light-shielding layer is provided, the reflector of each pixel is independent so as to be independent. The metal layer 2 may be patterned.

The light-shielding layer 1 formed by stacking the colored layers 4 and 4
The method of forming No. 3 is not limited to the colored photosensitive material method, but can be formed by a dyeing method, a transfer method, an etching method, a printing method, or the like.

As the protective layer 6, another resin material having photosensitivity can be used. When a method of providing the protective layer 6 only in a predetermined region such as a printing method or a transfer method is used, or when the protective layer 6 may be provided on the entire surface of the color filter substrate, a sol-gel A film or an organic protective film having no photosensitivity can be used.

Further, the length 10a within approximately 1/2 of the distance (thickness of the liquid crystal layer) between the pair of electrodes facing each other may be set independently for each side of the peripheral portion of the drive region 9c. I do not care.

The color filter according to the structure of the present embodiment is suitable when the liquid crystal device using the same is of a passive matrix type, but is not limited to this, and is represented by a TFT element. It is also applicable to an active matrix type liquid crystal device using a three-terminal switching element, a two-terminal switching element represented by a TFD element, or the like.

According to the configuration of the present embodiment as described above, a color filter suitable for a liquid crystal device capable of reflection type display and transmission type display can be obtained.

(Twenty-third Embodiment) FIG. 20A is a schematic plan view of the color filter substrate according to the present invention at the stage where the transparent electrode 7 is formed, and FIG.
20A is a schematic cross-sectional view taken along line AA-AA ′, and FIG. 20C is a schematic cross-sectional view taken along line BB-BB ′ in FIG.

In this embodiment, a metal layer mainly composed of aluminum is formed on a glass substrate 1 as an insulating substrate.
A metal layer 2 serving as a reflector is formed. Next, in a liquid crystal device using this color filter substrate, an opening 14 having a predetermined area for transmitting light is provided so as to include a range to be a display region over all pixels and to transmit light in each pixel region. Next, the metal layer 2 is patterned by photolithography.

Next, the coloring layer 4 is formed by a coloring material method. The coloring layer 4 is formed sequentially using R (red), G (green), and B (blue) photosensitive color resists having the optimum color density for transmission type display as shown in FIG. Coloring layer 4
Is formed in a predetermined region including the opening 14 provided in the metal layer 2 and a portion to be the light-shielding layer 13, and there is a region 15 in which no colored layer is provided in each pixel. The area of the region 15 where the coloring layer is not provided is substantially equal to the area of one pixel in the reflective display except for the portion which becomes the opening 14 and the light shielding layer 13 and the color density shown in FIG. The area where the colored layer having the color layer is provided and the area of the region 15 where the colored layer is not provided are averaged to adjust the color density so as to be optimal for the reflective display as shown in FIG. The region where the three color resists of R, G, and B are stacked becomes the light shielding layer 13. The light-shielding layer 13 includes a width 9b of the transparent electrode 7 and a range 9c to be a driving region surrounded by the width 9a of the opposing electrode arranged so as to intersect with the transparent electrode 7. In the liquid crystal device using this color filter substrate A region 1 wide by a length 10a which is within approximately 1/2 of the distance between the pair of electrodes facing each other (the thickness of the liquid crystal layer).
1 is formed in such a manner that an opening is provided so as to surround the pattern 1. Further, a protective layer 6 using a photosensitive acrylic resin or the like as an organic insulating film is formed so as to cover the entire light-shielding layer 13, the metal layer 2, and the colored layer 4. continue,
Adhesion improving layer 5 using SiO ₂ which is an inorganic oxide film and I
The transparent electrode 7 using TO is continuously formed, and the transparent electrode 7 is patterned according to the liquid crystal device using the color filter substrate.

At the time of transmissive display, the colored layer 4 causes
As a color filter having a color density characteristic most suitable for the transmission type display as shown in FIG. 21A, the reflection layer as shown in FIG. It can be used as a color filter with optimal color density characteristics for pattern display. Further, the light-shielding layer 13 formed by laminating each of the R, G, and B colors of the colored layer 4 having the optimum color density characteristics for the transmissive display can provide a high OD value.
Note that the color density characteristics of each color shown in FIGS. 21A and 21B are examples, and can be changed according to the liquid crystal device to be combined and the desired transmittance and color density.

[0241] Light-shielding layer 1 comprising colored layers 4
The method of forming No. 3 is not limited to the colored photosensitive material method, but can be formed by a dyeing method, a transfer method, an etching method, a printing method, or the like.

As the metal layer 2 serving as the reflection plate, a metal layer containing silver, chromium, nickel, or the like as a main component may be used, and the transmittance between the metal layer 2 and the insulating substrate 1 is not significantly reduced as necessary. A degree of adhesion improving layer may be provided. Further, in the present embodiment, since the area of the reflector is defined by the light-shielding layer 13, in a portion hidden by the area where the light-shielding layer is provided, the reflector of each pixel is independent so as to be independent. The metal layer 2 may be patterned.

As the protective layer 6, another resin material having photosensitivity can be used. When a method of providing the protective layer 6 only in a predetermined region such as a printing method or a transfer method is used, or when the protective layer 6 may be provided on the entire surface of the color filter substrate, a sol-gel A film or an organic protective film having no photosensitivity can be used.

Further, the length 10a within approximately 1/2 of the distance (the thickness of the liquid crystal layer) between the pair of electrodes facing each other may be set independently for each side of the peripheral portion of the driving region 9c. I do not care.

The color filter according to the structure of the present embodiment is suitable when the liquid crystal device using the same is of a passive matrix type, but is not limited to this, and is represented by a TFT element. It is also applicable to an active matrix type liquid crystal device using a three-terminal switching element, a two-terminal switching element represented by a TFD element, or the like.

According to the configuration of the present embodiment as described above, a color filter suitable for a liquid crystal device capable of reflection type display and transmission type display can be obtained.

(Twenty-fourth Embodiment) FIG. 22A is a schematic plan view of a color filter substrate according to the present invention at the stage where the transparent electrode 7 is formed, and FIG.
22A is a schematic cross-sectional view taken along the line CC-CC ′, and FIG. 22C is a schematic cross-sectional view taken along the line DD-DD ′ in FIG.

In the present embodiment, a sol-gel solution in which particles of 0.2 μm to 2 μm are dispersed is applied to a glass substrate 1 as an insulating substrate and baked, so that an optimal structure as a scattering reflector is obtained. , Unevenness level difference 0.2μm ~
An uneven layer 16 having a random uneven shape with a 1.5 [mu] m and an uneven pitch of 2 [mu] m to 15 [mu] m is formed. Then, the uneven layer 1
A metal layer 2 serving as a reflection plate is formed on the metal layer 6 by using a metal layer containing aluminum as a main component. The other components are the same as in the twentieth embodiment, and a description thereof will not be repeated.

The insulating substrate 1 is not limited to a transparent glass substrate but may be a flexible substrate such as a plastic film. In addition, as long as the insulating substrate is limited to a reflective display application, the insulating substrate does not need to be transparent, and therefore, an Si substrate having an insulating film formed on the surface can be used.

As the metal layer 2 serving as the reflection plate, a metal layer containing silver, chromium, nickel, or the like as a main component may be used. Is also good. Further, in the present embodiment, since the area of the reflector is defined by the light-shielding layer 13, in a portion hidden by the area where the light-shielding layer is provided, the reflector of each pixel is independent so as to be independent. The metal layer 2 may be patterned.

Light-shielding layer 1 composed of colored layers 4
The method of forming No. 3 is not limited to the colored photosensitive material method, but can be formed by a dyeing method, a transfer method, an etching method, a printing method, or the like.

As the protective layer 6, another photosensitive resin material can be used. When a method of providing the protective layer 6 only in a predetermined region such as a printing method or a transfer method is used, or when the protective layer 6 may be provided on the entire surface of the color filter substrate, a sol-gel A film or an organic protective film having no photosensitivity can be used.

Although the other components of the concavo-convex layer 16 are the same as those in the twentieth embodiment, they can be combined with the color filter structures of the other embodiments if necessary. It is.

The color filter according to the structure of the present embodiment is suitable when the liquid crystal device using the same is of a passive matrix type, but is not limited to this, and is represented by a TFT element. It is also applicable to an active matrix type liquid crystal device using a three-terminal switching element, a two-terminal switching element represented by a TFD element, or the like.

According to the configuration of the present embodiment as described above, a color filter suitable for a liquid crystal device capable of reflection type display can be obtained.

(25th Embodiment) A color filter substrate according to the present embodiment will be described with reference to FIG.

In this embodiment, a photosensitive resin containing acrylic as a main component is applied on a glass substrate 1 as an insulating substrate, and a photolithography method using a predetermined photomask is used to form an optimal structure as a scattering reflector. So that
Uneven step 0.2 μm to 1.5 μm, uneven pitch 2 μm
An uneven layer 16 having a random uneven shape of 15 μm is formed. Subsequently, a metal layer 2 serving as a reflector is formed on the uneven layer 16 by using a metal layer containing aluminum as a main component. The other components are the same as in the twentieth embodiment, and a description thereof will not be repeated.

The insulating substrate 1 is not limited to a transparent glass substrate, but may be a flexible substrate such as a plastic film. In addition, as long as the insulating substrate is limited to a reflective display application, the insulating substrate does not need to be transparent, and therefore, an Si substrate having an insulating film formed on the surface can be used.

The uneven layer 16 is not limited to a photosensitive acrylic resin, but may be a photosensitive polyimide resin or the like. Further, by applying an acrylic resin or the like in which particles of 1 μm to 5 μm are dispersed, an uneven layer can be formed without using a photolithography method.

As the metal layer 2 serving as the reflection plate, a metal layer containing silver, chromium, nickel, or the like as a main component may be used. Is also good. Further, in the present embodiment, since the area of the reflector is defined by the light-shielding layer 13, in a portion hidden by the area where the light-shielding layer is provided, the reflector of each pixel is independent so as to be independent. The metal layer 2 may be patterned.

Light-shielding layer 1 comprising colored layer 4 and laminated colored layer 4
The method of forming No. 3 is not limited to the colored photosensitive material method, but can be formed by a dyeing method, a transfer method, an etching method, a printing method, or the like.

As the protective layer 6, another resin material having photosensitivity can be used. When a method of providing the protective layer 6 only in a predetermined region such as a printing method or a transfer method is used, or when the protective layer 6 may be provided on the entire surface of the color filter substrate, a sol-gel A film or an organic protective film having no photosensitivity can be used.

Although the other components of the concavo-convex layer 16 are the same as those in the twentieth embodiment, they can be combined with the color filter structures of the other embodiments if necessary. It is.

The color filter according to the structure of the present embodiment is suitable when the liquid crystal device using the same is of a passive matrix type, but is not limited to this, and is represented by a TFT element. It is also applicable to an active matrix type liquid crystal device using a three-terminal switching element, a two-terminal switching element represented by a TFD element, or the like.

According to the configuration of the present embodiment as described above, a color filter suitable for a liquid crystal device capable of reflection type display can be obtained.

(Twenty-Sixth Embodiment) FIG. 23A is a schematic plan view of a color filter substrate according to the present invention at the stage where the transparent electrode 7 is formed, and FIG.
23A is a schematic sectional view taken along the line EE-EE ′, and FIG. 23C is a schematic sectional view taken along the line FF-FF ′ in FIG.

In this embodiment, the surface of a glass substrate as an insulating substrate is unevenly etched with an aqueous solution containing hydrofluoric acid as a main component, so that an uneven surface is formed so as to have an optimum structure as a scattering reflector. 0.05 μm to 2.0
An uneven surface 17 having a random uneven shape with a pitch of 1 μm to 50 μm is formed. Subsequently, a metal layer 2 serving as a reflector is formed on the uneven surface 17 by using a metal layer containing aluminum as a main component. For other components, refer to
Since this embodiment is the same as the above embodiment, the description is omitted here.

As the insulating substrate 1 is not required to be transparent as long as it is limited to a reflective display application, an Si substrate having an insulating film formed on the surface can be used. Further, when a flexible substrate such as a plastic film is used, the uneven surface 17 can be formed by a chemical solution containing an organic solvent as a main component.

As the metal layer 2 serving as the reflection plate, a metal layer containing silver, chromium, nickel, or the like as a main component may be used. Is also good. Further, in the present embodiment, since the area of the reflector is defined by the light-shielding layer 13, in a portion hidden by the area where the light-shielding layer is provided, the reflector of each pixel is independent so as to be independent. The metal layer 2 may be patterned.

Light-shielding layer 1 formed by laminating colored layers 4
The method of forming No. 3 is not limited to the colored photosensitive material method, but can be formed by a dyeing method, a transfer method, an etching method, a printing method, or the like.

As the protective layer 6, another photosensitive resin material can be used. When a method of providing the protective layer 6 only in a predetermined region such as a printing method or a transfer method is used, or when the protective layer 6 may be provided on the entire surface of the color filter substrate, a sol-gel A film or an organic protective film having no photosensitivity can be used.

Although the other components of the uneven surface 17 are the same as those of the twentieth embodiment, they can be combined with the color filter structure of other embodiments if necessary. It is.

The color filter according to the structure of the present embodiment is suitable when the liquid crystal device using the same is of a passive matrix type, but is not limited to this, and is represented by a TFT element. It is also applicable to an active matrix type liquid crystal device using a three-terminal switching element, a two-terminal switching element represented by a TFD element, or the like.

According to the configuration of the present embodiment as described above, a color filter suitable for a liquid crystal device capable of reflection type display can be obtained.

(Twenty-seventh Embodiment) FIG. 24 is a schematic sectional view of a liquid crystal device using a color filter having the structure of FIG. 9 according to the present invention.

In this embodiment, two transparent substrates 240
The liquid crystal layer 2408 has a frame-like sealing material 2 between
A liquid crystal cell sealed by 409 is formed.
The liquid crystal layer 2408 is made of a nematic liquid crystal having a predetermined twist angle. A plurality of stripe-shaped transparent electrodes 2410 are formed on the inner surface of the upper transparent substrate 2403 by IT.
An alignment film 2412 is formed on the surface of the transparent electrode 2410 and is rubbed in a predetermined direction.

On the other hand, on the inner surface of the lower transparent substrate 2401, a metal layer 240 serving as a reflector made of, for example, Al is provided.
2. Coloring layer 2404, protective layer 2406 also serving as flattening film
Are sequentially formed. For example, R
Colored layers of three colors (red), G (green), and B (blue) are arranged in a predetermined pattern. Protective layer 240 also serving as planarizing film
A plurality of stripe-shaped transparent electrodes 2407 formed on the substrate 6 via an adhesion improving layer 2405 are arranged so as to intersect the transparent electrodes 2410. When the passive matrix type normally white mode is used for the liquid crystal mode,
It is more preferable to use a color filter substrate having the structure shown in FIG. In the case of an active matrix type device including a TFD element and a TFT element, the transparent electrode 2410 is formed in, for example, a rectangular shape, and is connected to a wiring via the active element. However, in the case of an apparatus provided with a TFT element, patterning of the transparent electrode 2407 is unnecessary, and in this case, a color filter substrate having the structure shown in FIG. 11 or 12 can be used. The metal layer 2402 is a reflection surface that reflects light incident from the transparent substrate 2403 side.

On the outer surface of the upper transparent substrate 2403, a forward scattering plate 2421, a phase difference plate 2414, and a polarizing plate 2415 are arranged in this order from the transparent substrate 2403 side.

[0279] The reflection type display will be described. Fig. 2
4, the light passes through the polarizing plate 2415, the phase difference plate 2414, and the forward scattering plate 2421, passes through the liquid crystal layer 2408 and the coloring layer 2404, is reflected by the reflecting plate 2402, and is emitted from the polarizing plate 2415 again. At this time, a bright state, a dark state, and intermediate brightness can be controlled by a voltage applied to the liquid crystal layer 2408.

According to the configuration of the present embodiment as described above, a bright and high-contrast reflective color liquid crystal device without double reflection or display bleeding can be realized.

The present embodiment can also be realized by using a color filter having a light-shielding layer as shown in FIGS. 13, 15, and 18. in this case,
A reflective color liquid crystal device can be realized with the same configuration as that of the above-described embodiment except that the color filter has a light shielding layer. By providing the light-blocking layer, a decrease in contrast due to reflection of incident light at a portion not controlled by the voltage applied to the liquid crystal layer 2408 can be prevented, so that a reflective color liquid crystal device with improved image quality can be obtained. Was completed.

In this embodiment, the protective layer 2406 also serving as a flattening film has a light-scattering function as shown in FIG. 6, or the unevenness as shown in FIGS. 22 and 23. A metal layer is formed on the surface having
It is also possible to use a color filter substrate in which the metal layer serves as a scattering reflection plate.
421 is unnecessary. Further, as shown in FIG.
In the case where an uneven shape is formed on the surface of the transparent substrate on the liquid crystal layer side, a protective layer also serving as a flattening film may be provided on the entire uneven surface of the transparent substrate as necessary.

Further, the transparent substrates 2401 and 2403 are not limited to glass substrates, but may be flexible substrates such as plastic films. Further, as the lower substrate 2401 on which the metal layer 2402 serving as a reflection plate is formed, not a transparent substrate but an Si substrate having an insulating film formed on a surface can be used.

(Twenty-eighth Embodiment) FIG. 25 is a schematic sectional view of a liquid crystal device using a color filter having the structure of FIG. 19 according to the present invention.

[0285] The reflection type liquid crystal device can display a very bright image in a place where sufficient external light exists, but has a drawback that if the external light is insufficient, the display becomes difficult to see.

In this embodiment, by providing an opening for each pixel electrode, a semi-transmissive reflector having a reflectance and a transmittance defined by the ratio of the opening to the pixel area is formed. Where light exists, reflective display is used, and where external light is insufficient, an auxiliary light source is used to perform transmissive display. The shape of the opening is arbitrary.

In this embodiment, two transparent substrates 250 are used.
1 and 2503, the liquid crystal layer 2508 is a frame-shaped sealing material 2
A liquid crystal cell sealed by 509 is formed.
The liquid crystal layer 2508 is made of a nematic liquid crystal having a predetermined twist angle. On the inner surface of the upper transparent substrate 2503, a plurality of stripe-shaped transparent electrodes 2510
An alignment film 2512 is formed on the surface of the transparent electrode 2510 and is rubbed in a predetermined direction.

On the other hand, on the inner surface of the lower transparent substrate 2501, a metal layer 250 serving as a reflector made of, for example, Al is provided.
2. Coloring layer 2504, protective layer 2406 also serving as flattening film
Are sequentially formed, and the coloring layer 2504 includes, for example, R
Colored layers of three colors (red), G (green), and B (blue) are arranged in a predetermined pattern, and a region where the three colored layers of R, G, and B are stacked is a light shielding layer 2513. ing. A plurality of striped transparent electrodes 2507 formed on a protective layer 2506 also serving as a flattening film via an adhesion improving layer 2505 are arranged so as to intersect the transparent electrodes 2510. In the case of an active matrix type device including a TFD element and a TFT element, each transparent electrode 2510 is formed in, for example, a rectangular shape, and is connected to a wiring via the active element. However, in the case of an apparatus including a TFT element, patterning of the transparent electrode 2507 is not necessary. The reflection plate 2502 is a reflection surface that reflects light incident from the transparent substrate 2503 side.

On the outer surface of the upper transparent substrate 2503, a forward scattering plate 2521, a retardation plate 2514, and a polarizing plate 2515 are arranged in this order from the transparent substrate 2503 side. Also,
A retardation plate 2516 is disposed behind the transparent substrate 2501 below the liquid crystal cell, and a polarizing plate 2517 is disposed behind the retardation plate 2516. And the polarizing plate 25
17, a fluorescent tube 2518 for emitting white light and a light guide plate 25 having an incident end face along the fluorescent tube 2518 are provided.
19 is disposed. The light guide plate 2519 is a transparent body such as an acrylic resin plate having a scattering rough surface formed on the entire back surface or a scattering printing layer formed thereon, and receives light from a fluorescent tube 2518 as a light source at an end surface. , And emits substantially uniform light from the upper surface of FIG. As another backlight, an LED (light emitting diode), an EL (electroluminescence), or the like can be used.

[0290] The reflection type display will be described. Fig. 2
5, the light passes through the polarizing plate 2515, the retardation plate 2514, and the forward scattering plate 2521, passes through the liquid crystal layer 2508 and the coloring layer 2504, is reflected by the metal layer 2502 serving as a reflecting plate, and is emitted again from the polarizing plate 2515. . At this time, the bright state, the dark state, and the intermediate brightness can be controlled by the voltage applied to the liquid crystal layer 2508.

Next, the transmission type display will be described. Light from the backlight is applied to a polarizing plate 2517 and a retardation plate 251.
6, and is introduced into the coloring layer 2504 and the liquid crystal layer 2508 through an opening 2522 provided in the metal layer 2502 serving as a semi-transmissive reflection plate.
After passing through No. 8, the light passes through the phase difference plate 2514. At this time,
In accordance with the voltage applied to the liquid crystal layer 2508, the polarizing plate 2515
Transmitting (bright state) and absorbing (dark state)
And an intermediate state (brightness) can be controlled.

In this embodiment, a color filter substrate in which the light-shielding layer 13 is provided independently of the coloring layer as shown in FIGS. 14 and 16 and a color purity at the time of transmissive display as shown in FIG. It is also possible to use a color filter substrate or the like in which an optimum coloring layer is partially provided and the OD value of the light-shielding layer is improved by stacking the coloring layers.

Further, in this embodiment, transmission type display is made possible by providing an opening for each pixel electrode in the metal layer serving as the semi-transmissive reflection plate.
The same effect can be obtained by forming a transflective plate having a reflectivity of about 85% and a transmissivity of about 10% by reducing the thickness to about 20 nm. In this case, it is desirable to use a color filter substrate having the structure shown in FIGS. 13, 17, and 18. The ratio between the reflectance and the transmittance can be set to an arbitrary film thickness. In any case, since the liquid crystal layer is driven by the transparent electrodes provided on the upper and lower substrates, the metal layer serving as the semi-transmissive reflector defines the reflectance and the transmittance.

In this embodiment, the protective layer 2506 also serving as a flattening film has a light scattering function as shown in FIG. 6 or a color filter substrate having unevenness as shown in FIGS. 22 and 23. A metal layer is formed on the surface having
It is also possible to use a color filter substrate in which the metal layer serves as a scattering reflection plate.
521 is unnecessary. Further, as shown in FIG.
In the case where an uneven shape is formed on the surface of the transparent substrate on the liquid crystal layer side, a protective layer also serving as a flattening film may be provided on the entire uneven surface of the transparent substrate as necessary.

In this embodiment, the transparent substrate 2
As the substrates 501 and 2503, a flexible substrate such as a plastic film can be used in addition to a glass substrate. The structure is also capable of transmissive display.
It is not preferable to use the Si substrate as in the seventh embodiment.

According to the configuration of the present embodiment as described above, a color liquid crystal device capable of switching between a reflective display and a transmissive display without double reflection or blurring of display can be realized.

(Twenty-ninth Embodiment) Three examples of the electronic equipment of the present invention will be described.

The liquid crystal device of the present invention is suitable for portable equipment used in various environments and requiring low power consumption.

FIG. 26A shows a portable information device, in which a display portion 261 is provided on the upper side of the main body, and an input portion 263 is provided on the lower side. In addition, a touch panel is often provided on the front surface of the display unit. A normal touch panel has a lot of surface reflections, making it difficult to see the display. Therefore, conventionally, a transmissive liquid crystal device has often been used even though it is portable. However, since the transmissive liquid crystal device always uses a backlight, the power consumption is large and the battery life is short. Even in such a case, the liquid crystal device of the present invention can be used for a portable information device because the display is bright and vivid both in a reflective type and a transflective type.

FIG. 26B shows a mobile phone, which has a display unit 264 at the upper front part of the main body. Mobile phones are used in all environments, both indoors and outdoors. Especially, it is often used in cars, but the inside of cars at night is very dark.
Therefore, it is desirable that the display device used in the mobile phone is a transflective liquid crystal device capable of performing transmissive display using auxiliary light as needed, mainly reflective display with low power consumption. The liquid crystal device according to the twenty-eighth embodiment of the present invention is brighter and has a higher contrast ratio than the conventional liquid crystal device in both reflective display and transmissive display.

FIG. 26C shows a watch having a display unit 266 provided at the center of the main body. An important aspect in watch applications is luxury. The liquid crystal device of the present invention is not only bright and has a high contrast, but also has a small coloring due to a small characteristic change due to the wavelength of light. Therefore, a very high-quality display can be obtained as compared with the conventional liquid crystal device.

[0302]

As described above, according to the present invention, it is possible to obtain a color filter suitable for a reflective display, in which a colored layer is provided on a reflector with good consistency. Using this color filter, a bright reflective color liquid crystal device that does not cause double reflection or bleeding of display can be configured. Also, by taking measures such as providing an opening in the reflection plate of the color filter described above, in a liquid crystal device, if there is sufficient external light, the external light is taken in as a reflective color display and reflected by the reflective surface. The display can be performed, and when there is not enough external light, the backlight can be turned on and the liquid crystal display can be visually recognized.

[Brief description of the drawings]

FIG. 1 is a cross-sectional view showing a schematic structure of a first embodiment of a color filter according to the present invention.

FIG. 2 is a cross-sectional view illustrating a schematic structure of a second embodiment of the color filter according to the present invention.

FIG. 3 is a sectional view showing a schematic structure of a third embodiment of a color filter according to the present invention.

FIG. 4 is a sectional view showing a schematic structure of a fourth embodiment of the color filter according to the present invention.

FIGS. 5A to 5C are a plan view and a cross-sectional view illustrating a schematic structure of a color filter according to a fifth embodiment of the present invention.

FIG. 6 is a sectional view showing a schematic structure of a color filter according to a sixth embodiment of the present invention.

FIG. 7 is a sectional view showing a schematic structure of a color filter according to a seventh embodiment of the present invention.

FIG. 8 is a sectional view showing a schematic structure of an eighth embodiment of a color filter according to the present invention.

FIGS. 9A to 9C are a plan view and a cross-sectional view illustrating a schematic structure of a ninth embodiment of a color filter according to the present invention.

FIGS. 10A to 10C are a plan view and a cross-sectional view illustrating a schematic structure of a color filter according to a tenth embodiment of the present invention.

FIGS. 11A to 11C are a plan view and a sectional view showing a schematic structure of an eleventh embodiment of a color filter according to the present invention.

FIGS. 12A to 12C are a plan view and a sectional view showing a schematic structure of a twelfth embodiment of a color filter according to the present invention.

FIGS. 13A to 13C are a plan view and a cross-sectional view, respectively, showing a schematic structure of a thirteenth, a fourteenth, and a fifteenth embodiment of the color filter according to the present invention.

FIGS. 14A to 14C are a plan view and a sectional view showing a schematic structure of a color filter according to a sixteenth embodiment of the present invention.

FIGS. 15 (a) to (c) are a plan view and a sectional view showing a schematic structure of a seventeenth embodiment of a color filter according to the present invention.

FIGS. 16 (a) to (c) are a plan view and a sectional view showing a schematic structure of an eighteenth embodiment of a color filter according to the present invention.

FIGS. 17 (a) to (c) are a plan view and a sectional view showing a schematic structure of a nineteenth embodiment of a color filter according to the present invention.

FIGS. 18A to 18C are a plan view and a sectional view showing a schematic structure of a twentieth and twenty-first embodiment of a color filter according to the present invention.

FIGS. 19A to 19C are a plan view and a cross-sectional view illustrating a schematic structure of a color filter according to a twenty-second embodiment of the present invention.

FIGS. 20A to 20C are a plan view and a sectional view showing a schematic structure of a color filter according to a twenty-third embodiment of the present invention.

FIGS. 21A and 21B are diagrams showing characteristics of a colored layer of a color filter according to a twenty-third embodiment of the present invention, wherein FIG. 21A shows an example of characteristics for transmissive display, and FIG. 21B shows an example of characteristics for reflective display.

FIGS. 22A to 22C are a plan view and a sectional view showing a schematic structure of a color filter according to a twenty-fourth and twenty-fifth embodiment of the present invention.

FIGS. 23A to 23C are a plan view and a sectional view showing a schematic structure of a color filter according to a twenty-sixth embodiment of the present invention.

FIG. 24 is a sectional view showing a schematic structure of a liquid crystal device according to a twenty-seventh embodiment of the present invention.

FIG. 25 is a sectional view showing a schematic structure of a liquid crystal device according to a twenty-eighth embodiment of the present invention.

26A and 26B are schematic diagrams of an electronic device equipped with the liquid crystal device according to the present invention, wherein FIG. 26A shows a portable information device, FIG. 26B shows a mobile phone, and FIG.

FIGS. 27A to 27D are diagrams showing a phenomenon in which liquid crystal molecules near the edge of a pixel electrode are driven by an oblique electric field.

[Explanation of symbols]

1, 21, 31, 2401, 2403, 2501, 25
03: insulating substrate (transparent substrate) 2, 2402, 2502: reflector (metal layer) 3: protective layer 4, 2404, 2504: colored layer 5, 8, 2405, 2505 Adhesion improving layer 6, 6a, 2406, 2506: protective layer (flattening film) 6b: particles dispersed in protective layer 7, 22, 32, 2407, 2410, 2507, 25
10: Transparent electrode 9: Display area width 9a, 9b, 9e, 9h: Pixel electrode width 9c, 50: Liquid crystal drive area display area 9d, 9f: Connected to active matrix element Transparent pixel electrodes 10a, 10b: distances of about 1/2 or less of the thickness of the liquid crystal layer 13, 2513: light-shielding layer 14, 2522 ... aperture for transmission display 15: coloring on reflector Area where no layer is provided 16: Uneven layer 17 ... Uneven surface of substrate surface 23, 33 ... Rubbing direction on substrate 40, 2408 ... Liquid crystal layer 41, 42, 43 ... Liquid crystal molecule 51 , 52: a region driven by an oblique electric field 53: an oblique electric field (line of electric force) 2409, ... sealing material 2411, 2412, 2511, 2512 ... alignment film 2414, 2514, 2516 ... Phase difference plate 2 415, 2515, 2517: Polarizing plate 2421, 2521: Forward scattering plate 2518: Fluorescent tube 2519: Light guide plate 261, 264, 266 ... Electronic device display unit 262: Portable information Equipment 263: Input unit 265: Mobile phone 267: Watch

 ──────────────────────────────────────────────────の Continued on the front page (72) Inventor Keiji Takizawa 3-3-5 Yamato, Suwa-shi, Nagano F-term in Seiko Epson Corporation (reference) 2H091 FA02Y FA08X FA08Z FA11X FA16Z FA31Y FA32X FA35Y FA42Z FA44Z FA45Z FB04 FB08 FC05 FC12 FC26 GA01 GA13 GA16 HA07 HA10 LA17

Claims (15)

[Claims] 1. A color filter substrate provided with at least a reflector, two or more colored layers, and a transparent electrode on an insulating substrate, between the insulating substrate and the transparent electrode, in order from the insulating substrate side. A color filter substrate, comprising a reflector and a coloring layer, wherein the reflector includes a display region in a liquid crystal device using the reflector and is formed in a region narrower than the coloring layer. 2. A color filter substrate comprising at least a reflector, two or more colored layers, at least one protective layer, and a transparent electrode provided on an insulating substrate, wherein a color filter substrate is provided between the insulating substrate and the transparent electrode. A reflective plate, a colored layer, and one or more protective layers are formed in this order from the insulating substrate side, and the reflective plate includes a display region in a liquid crystal device using the reflective plate, and a region smaller than the protective layer. A color filter substrate, wherein the color filter substrate is formed. 3. The color filter substrate according to claim 2, wherein at least one of the protective layers has a light scattering property. 4. Between the insulating substrate and the reflector, 1
4. The color filter substrate according to claim 1, wherein an adhesion improving layer having at least two layers is formed. 5. The liquid crystal display device according to claim 5, wherein the reflection plate is substantially inward of a peripheral portion of each pixel in a liquid crystal device using the same, and is approximately 1/2 of the distance between the electrodes facing the liquid crystal device. The color filter substrate according to claim 1, wherein the color filter substrate is formed in a region surrounded by a line connecting the ranges. 6. The reflection plate includes a display area in a liquid crystal device using the reflection plate, and is formed over the entire surface of a region narrower than the protective layer, and is located closer to the periphery of each pixel in the liquid crystal device. The liquid crystal device is substantially inward of the distance between the opposing electrodes and approximately 1 of the distance between the electrodes.
/ 2 outside the area surrounded by the line connecting the inside
The color filter substrate according to claim 1, wherein a light-shielding layer is formed between the reflection plate and the transparent electrode. 7. The liquid crystal device using the reflection plate, wherein the reflection plate is substantially inward from a peripheral portion of each pixel in a distance between electrodes facing each other of the liquid crystal device or approximately 外側 outside the distance between electrodes. And a light-shielding layer formed between the insulating substrate and the reflection plate is arranged in the other region in a region surrounded by a line connecting the regions. Item 6. A color filter substrate according to item 1 to item 5. 8. The color filter substrate according to claim 6, wherein said light shielding layer is formed of a metal or a metal-metal oxide film having a lower reflectance than said reflection plate. 9. The color filter substrate according to claim 6, wherein said light shielding layer is formed of a black resin material. 10. The color filter substrate according to claim 6, wherein the light shielding layer is formed by laminating two or more colors of the coloring layer. 11. The semiconductor device according to claim 1, wherein irregularities are formed between said reflector and said insulating substrate.
The color filter substrate as described in the above. 12. The color filter substrate according to claim 11, wherein the unevenness is formed of a resin material. 13. The color filter substrate according to claim 11, wherein the irregularities are formed by performing a roughening treatment on a surface of the insulating substrate. 14. A liquid crystal device having a liquid crystal layer sandwiched between a pair of insulating substrates, and using the color filter substrate according to claim 1 as one of the insulating substrates. 15. An electronic apparatus using the liquid crystal device according to claim 14.